TW200801798A - Photosensitive composition and color filter formed from the same - Google Patents
Photosensitive composition and color filter formed from the sameInfo
- Publication number
- TW200801798A TW200801798A TW096111120A TW96111120A TW200801798A TW 200801798 A TW200801798 A TW 200801798A TW 096111120 A TW096111120 A TW 096111120A TW 96111120 A TW96111120 A TW 96111120A TW 200801798 A TW200801798 A TW 200801798A
- Authority
- TW
- Taiwan
- Prior art keywords
- photosensitive composition
- color filter
- same
- filter formed
- appearance
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
Abstract
To provide a photosensitive composition which ensures the appearance of few creases and excels in surface smoothness, and a color filter having a black matrix formed from the photosensitive composition and pixel parts formed from the photosensitive composition. The photosensitive composition for use in the formation of a thick film having a thickness of ≥ 1 μm contains an alkali-soluble resin, a photopolymerizable monomer, a photopolymerization initiator and a colorant, wherein the photosensitive composition contains an acrylic resin in an amount effective to prevent the appearance of creases on the thick film.
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2006115554A JP4745110B2 (en) | 2006-04-19 | 2006-04-19 | Photosensitive composition and color filter formed with the photosensitive composition |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200801798A true TW200801798A (en) | 2008-01-01 |
TWI350428B TWI350428B (en) | 2011-10-11 |
Family
ID=38758277
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW096111120A TW200801798A (en) | 2006-04-19 | 2007-03-29 | Photosensitive composition and color filter formed from the same |
Country Status (4)
Country | Link |
---|---|
JP (1) | JP4745110B2 (en) |
KR (2) | KR100910085B1 (en) |
CN (1) | CN101059655B (en) |
TW (1) | TW200801798A (en) |
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI397768B (en) * | 2008-02-13 | 2013-06-01 | Fujifilm Corp | Colored photosensitive composition, color filter and method of producing thereof |
Families Citing this family (20)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP4745110B2 (en) * | 2006-04-19 | 2011-08-10 | 東京応化工業株式会社 | Photosensitive composition and color filter formed with the photosensitive composition |
KR100938444B1 (en) | 2007-09-03 | 2010-01-25 | 제일모직주식회사 | Ink composition for color filter, method for manufacturing picture element of color filter, and color filter |
JP5249588B2 (en) * | 2008-01-11 | 2013-07-31 | 東京応化工業株式会社 | Colored photosensitive resin composition |
CN101591423B (en) * | 2008-05-29 | 2012-09-05 | 新日铁化学株式会社 | Alkaline water-soluble resin and manufacture method, as well as photosensitive resin composition, cured resin and color filter |
KR101148548B1 (en) * | 2008-09-30 | 2012-05-21 | 코오롱인더스트리 주식회사 | Photopolymerizable resin composition |
WO2010038978A2 (en) * | 2008-09-30 | 2010-04-08 | Kolon Industries, Inc. | Photopolymer resin composition |
KR101225955B1 (en) | 2008-12-22 | 2013-01-24 | 제일모직주식회사 | Ink jet resin composition |
KR101368539B1 (en) * | 2009-06-26 | 2014-02-27 | 코오롱인더스트리 주식회사 | Photopolymerizable resin composition |
JP5744528B2 (en) * | 2011-01-11 | 2015-07-08 | 東京応化工業株式会社 | Colored photosensitive resin composition for touch panel, touch panel, and display device |
JP5981159B2 (en) * | 2011-02-22 | 2016-08-31 | 東京応化工業株式会社 | Photosensitive resin composition, and color filter and display device using the same |
JP5819693B2 (en) * | 2011-09-26 | 2015-11-24 | 東京応化工業株式会社 | Colored photosensitive resin composition, color filter and display device |
JP2013134263A (en) * | 2011-12-22 | 2013-07-08 | Tokyo Ohka Kogyo Co Ltd | Photosensitive resin composition for black column spacer, black column spacer, display device, and method for forming black column spacer |
TWI483071B (en) * | 2013-03-01 | 2015-05-01 | Chi Mei Corp | Photosensitive resin composition for color filters and uses thereof |
CN103376657B (en) | 2013-07-15 | 2016-12-28 | 京东方科技集团股份有限公司 | Light resistance composition and preparation method thereof, color membrane substrates and display device |
JP6123620B2 (en) * | 2013-09-30 | 2017-05-10 | Jsr株式会社 | Radiation-sensitive resin composition, display element insulating film, method for forming the same, and display element |
JP5916939B2 (en) * | 2015-12-24 | 2016-05-11 | 東京応化工業株式会社 | Method for forming black column spacer |
CN109153915B (en) * | 2016-05-17 | 2022-09-23 | 默克专利股份有限公司 | Polymerizable liquid crystal material and polymerized liquid crystal film |
KR101832097B1 (en) | 2016-10-31 | 2018-02-23 | 롬엔드하스전자재료코리아유한회사 | Colored photosensitive resin composition and light shielding spacer prepared therefrom |
KR20180135375A (en) | 2017-06-12 | 2018-12-20 | 롬엔드하스전자재료코리아유한회사 | Colored photosensitive resin composition and light shielding spacer prepared therefrom |
JP7437872B2 (en) | 2018-10-29 | 2024-02-26 | 日鉄ケミカル&マテリアル株式会社 | Photosensitive resin composition for partition walls, cured product thereof, and manufacturing method thereof |
Family Cites Families (12)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3599866B2 (en) * | 1995-01-05 | 2004-12-08 | ダイセル化学工業株式会社 | Photosensitive coloring composition for color filter, color filter and method for producing the same |
JP3638660B2 (en) * | 1995-05-01 | 2005-04-13 | 松下電器産業株式会社 | Photosensitive resin composition, photosensitive dry film for sandblasting using the same, and etching method using the same |
JP3849950B2 (en) * | 1997-02-06 | 2006-11-22 | 東京応化工業株式会社 | Photosensitive composition for color filter |
JP4245740B2 (en) * | 1999-07-29 | 2009-04-02 | 新日鐵化学株式会社 | Photopolymerizable resin composition and color filter |
JP2002241440A (en) | 2001-02-19 | 2002-08-28 | Toppan Printing Co Ltd | Alkaline soluble polymer and photosensitive resin composition |
JP2003043685A (en) * | 2001-08-03 | 2003-02-13 | Showa Denko Kk | Color composition, and photosensitive color composition for color filter |
JP2003295433A (en) * | 2002-03-28 | 2003-10-15 | Tamura Kaken Co Ltd | Photosensitive resin composition |
JP4290483B2 (en) * | 2003-06-05 | 2009-07-08 | 新日鐵化学株式会社 | Photosensitive resin composition for black resist and light-shielding film formed using the same |
JP2005316388A (en) * | 2004-03-30 | 2005-11-10 | Jsr Corp | Radiation sensitive composition for color filter, color filter and color liquid crystal display |
JP4604559B2 (en) * | 2004-06-02 | 2011-01-05 | 凸版印刷株式会社 | Color filter and manufacturing method thereof |
JP2007279668A (en) * | 2006-03-14 | 2007-10-25 | Asahi Kasei Electronics Co Ltd | Black matrix and method for producing the same |
JP4745110B2 (en) * | 2006-04-19 | 2011-08-10 | 東京応化工業株式会社 | Photosensitive composition and color filter formed with the photosensitive composition |
-
2006
- 2006-04-19 JP JP2006115554A patent/JP4745110B2/en active Active
-
2007
- 2007-03-29 TW TW096111120A patent/TW200801798A/en unknown
- 2007-04-16 KR KR1020070036893A patent/KR100910085B1/en active IP Right Grant
- 2007-04-16 CN CN2007100963625A patent/CN101059655B/en active Active
-
2009
- 2009-04-28 KR KR1020090037040A patent/KR101291480B1/en active IP Right Grant
Cited By (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
TWI397768B (en) * | 2008-02-13 | 2013-06-01 | Fujifilm Corp | Colored photosensitive composition, color filter and method of producing thereof |
Also Published As
Publication number | Publication date |
---|---|
CN101059655B (en) | 2013-05-01 |
KR100910085B1 (en) | 2009-07-30 |
KR20090060236A (en) | 2009-06-11 |
TWI350428B (en) | 2011-10-11 |
JP4745110B2 (en) | 2011-08-10 |
CN101059655A (en) | 2007-10-24 |
JP2007286478A (en) | 2007-11-01 |
KR20070103683A (en) | 2007-10-24 |
KR101291480B1 (en) | 2013-07-30 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
TW200801798A (en) | Photosensitive composition and color filter formed from the same | |
TW200641523A (en) | Photosensitive resin composition for use in forming light-blocking layer, light-blocking layer and color filter | |
TW200734718A (en) | Method for forming pixel isolation wall for color filter, substrate having pixel isolation wall for color filter, color filter for display device, and display device | |
TW200801608A (en) | Polarizing plate and image display including the same | |
WO2008133312A1 (en) | Photosensitive composition, partition wall, black matrix, and method for producing color filter | |
WO2006065373A8 (en) | Optically clear pressure sensitive adhesive | |
JP2009537310A5 (en) | ||
JP2008531824A5 (en) | ||
TW200715054A (en) | Transfer meterial, process for producing a color filter using the same, a color filter and liquid crystal display device | |
TW200628523A (en) | Hard coat film, anti-reflection hard coat film, optical element, and image display device | |
USD601575S1 (en) | Display screen with an animated color image | |
PL1670647T3 (en) | Diffractive security element comprising a half-tone picture | |
WO2009011353A9 (en) | Resin composition and image display device | |
TW200739150A (en) | Polarizer protection film, polarizing plate and image display | |
RS53501B1 (en) | Oriented image coating on transparent substrate | |
WO2008078521A1 (en) | Polarizer protection film, polarizing plate and image display | |
TW200700905A (en) | Color photosensitive resin composition and hardened product of the same | |
TW200643490A (en) | Antireflection film, polarizing plate, and image display device | |
TW200612193A (en) | Method for producing substrate having light-shielding pattern and producing light-shielding pattern, and photosensitive resin composition, transferring material, color filter, and display device | |
TW200630219A (en) | Charge-preventing optical film, charge-preventing adhesive optical film, manufacturing method thereof, and image display device | |
TW200627025A (en) | Light diffusion sheet and backlight unit using the same | |
WO2008093643A1 (en) | Photosensitive element | |
USD570362S1 (en) | Background image for a portion of a display screen | |
TW200628976A (en) | Photosensitive composition for forming shading film and black matrix formed from photosensitive composition | |
TW200600837A (en) | Light diffusing member for Transmission type screen |