CN101059655A - Photosensitive composition and color filter formed from photosensitive composition - Google Patents
Photosensitive composition and color filter formed from photosensitive composition Download PDFInfo
- Publication number
- CN101059655A CN101059655A CNA2007100963625A CN200710096362A CN101059655A CN 101059655 A CN101059655 A CN 101059655A CN A2007100963625 A CNA2007100963625 A CN A2007100963625A CN 200710096362 A CN200710096362 A CN 200710096362A CN 101059655 A CN101059655 A CN 101059655A
- Authority
- CN
- China
- Prior art keywords
- methyl
- photosensitive composite
- acid
- resin
- color filter
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Granted
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Chemical & Material Sciences (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
Abstract
The invention provides a photosensitive composition which rarely generates wrinkling and has excellent surface smoothness, and a color filter sheet provided with a pattern formed by the photosensitive composition. The photosensitive composition contains alkali-soluble resin, photopolymerisable monomers, photopolymerization initiators, colorants, is capable of being used for forming a thick film with a thickness more than 1 mu m, wherein crylic acid resin with a certain quantity for preventing the thick film from wrinkling.
Description
Technical field
The present invention relates to a kind of photosensitive composite.Be specifically related to a kind of photosensitive composite that is used for forming the pattern that is colored at color filter.
Background technology
In display device such as LCD, use red (R), green (G), blue (B) color filter.In this color filter, form the contrast of black matrix" (black matrix) with outstanding above-mentioned each color.
In recent years, more and more trend utilizes photoetching process to form color filter.Particularly, coating is colored as versicolor photosensitive polymer combination successively, and exposes, develops, and forms pattern in the position of regulation, thereby prepares black matrix", R, G, each layer of B.Particularly, require further thick filmization in order to make black matrix" have the optical density (OD) (OD value) of regulation.
Recently, utilize the technology do not need to expose, can be only to prepare color filter to receive publicity at the ink-jetting style of the part coating coloured material of needs.In this ink-jetting style, especially to using black matrix" itself to carry out discussing (referring to patent documentation 1) as the technology of dividing plate.
[patent documentation 1] spy opens the 2005-345667 communique
Summary of the invention
But, exist thickness thick more, cause the film surface to produce the problem of wrinkle more.If the film surface produces wrinkle, then sometimes each pixel in the display device is brought harmful effect.
Wherein, have higher OD value, need further thick filmization, particularly require the above thickness of 1 μ m in order to make black matrix".But,, then sometimes the formation of each color layers is thereafter brought harmful effect if in black matrix", produce wrinkle.
In addition, the situation that produces wrinkle in each color layers is also identical, and the demonstration look to display device also brings harmful effect sometimes.
And when using ink-jetting style to form color filter, black matrix" must be that thickness is the above thick film of 1 μ m.
In view of the above problems, the object of the present invention is to provide a kind of photosensitive composite that seldom produces wrinkle, surface smoothing excellence.The present invention also aims to provide color filter with the pattern that forms by this photosensitive composite.
Discovery acryl resins such as the inventor are effectively to the generation that suppresses wrinkle, thereby have finished the present invention.The present invention specifically provides following product and method.
Promptly, the color filter that the invention provides a kind of photosensitive composite and have the pattern that forms by this photosensitive composite, described photosensitive composite contains alkali soluble resin, Photoepolymerizationinitiater initiater, colorant, wherein, described alkali soluble resin contains the acryl resin that is useful on the generation of inhibition wrinkle.
In addition, the invention provides in above-mentioned photosensitive composite the method for acrylic resin of using as the wrinkle inhibitor.The present invention also provides a kind of wrinkle inhibitor, and described wrinkle inhibitor is that the wrinkle of the thick resin molding more than the 1 μ m add in order to suppress thickness, and is principal ingredient with the acrylic resin.
The present invention can access the dyed layer that seldom produces wrinkle by containing acrylic resin as the wrinkle inhibitor.
Embodiment
Below embodiments of the present invention are described.
Photosensitive composite of the present invention contains alkali soluble resin, photopolymerization monomer, Photoepolymerizationinitiater initiater, colorant, wherein, as alkali soluble resin, also contains to be useful on and suppresses the acrylic resin that wrinkle produce.
[alkali soluble resin]
The present invention is not particularly limited alkali soluble resin, can form the material that material is used for photosensitive polymer combination as tunicle and selects arbitrarily from common.
＜acrylic resin 〉
Alkali soluble resin in the photosensitive composite of the present invention contains acrylic resin.
By adding this acrylic resin, can suppress wrinkle to occur by the black matrix" that the present composition forms.That is to say that this acrylic resin can be used as the wrinkle inhibitor and plays a role.
This acrylic resin is the polymer of monomers that contains acrylic monomer at least.As this acrylic monomer, for example, can enumerate methacrylate, benzyl methacrylate, methyl methacrylate, methacrylic acid 2-Octyl Nitrite, acrylic acid, hydroxyethyl methylacrylate, hydroxy propyl methacrylate, glycidyl methacrylate, methacrylic acid 2-ethyl isocyanate.
As this acrylic resin, for example, the preferred polymkeric substance that uses with carboxyl.As above-mentioned example, can enumerate (methyl) acrylic acid/(methyl) methyl acrylate copolymer with alkali-soluble multipolymer of carboxyl, (methyl) acrylic acid/(methyl) benzyl acrylate multipolymer, (methyl) acrylic acid/(methyl) acrylic acid 2-hydroxy methacrylate/(methyl) benzyl acrylate multipolymer, (methyl) acrylic acid/(methyl) methyl acrylate/polystyrene macromolecular monomer (macromonomer) multipolymer, (methyl) acrylic acid/(methyl) methyl acrylate/polymethylmethacrylate macromonomer multipolymer, (methyl) acrylic acid/(methyl) benzyl acrylate/polystyrene macromolecular monomer copolymer, (methyl) acrylic acid/(methyl) benzyl acrylate/polymethylmethacrylate macromonomer multipolymer, (methyl) acrylic acid/(methyl) acrylic acid 2-hydroxy methacrylate/(methyl) benzyl acrylate/polystyrene macromolecular monomer copolymer, (methyl) acrylic acid/(methyl) acrylic acid 2-hydroxy methacrylate/(methyl) benzyl acrylate/polymethylmethacrylate macromonomer multipolymer, methacrylic acid/styrene/(methyl) benzyl acrylate/N-phenylmaleimide multipolymer, (methyl) acrylic acid/mono succinate (2-acryloxy ethyl) ester/styrene/(methyl) benzyl acrylate/N-phenylmaleimide multipolymer, (methyl) acrylic acid/mono succinate (2-acryloxy ethyl) ester/styrene/(methyl) allyl acrylate/N-phenylmaleimide multipolymer, (methyl) acrylic acid/(methyl) benzyl acrylate/N-phenylmaleimide/styrene/glycerine list (methyl) acrylate copolymer etc.Wherein, the preferred use contained (methyl) acrylic acid multipolymer.Preferably in multipolymer, contain 50 moles more than the %, 90 moles below the % should (methyl) acrylic acid, more preferably contain 60 moles of % above, 85 moles below the %.
Further preferred the use contained above-mentioned (methyl) acrylic acid and (methyl) benzyl acrylate or cinnamic multipolymer.
The quality mean molecular weight of acrylic resin is preferably more than 1000, more preferably is more than 5000.In addition, as its higher limit, being preferably below 50000, more preferably is below 20000.By making the quality mean molecular weight is more than 1000, can improve and suppress the effect that wrinkle produce.By making the quality mean molecular weight is below 50000, can improve coating.
Preferably in alkali soluble resin, contain the above acrylic resin of 15 quality %, more preferably contain more than the 20 quality %.By the content that makes acrylic resin is more than the 15 quality %, can improve and suppress the effect that wrinkle produce.The higher limit of content preferably is less than 60 quality %, more preferably is below the 50 quality %.By making content be less than 60 quality %, can improve light characteristic (particularly Development margin (margin) etc.).So-called Development margin is meant the size of the Best Times scope of carrying out good development treatment in the development treatment.
The aforesaid propylene acid resin is not owing to having optical polymerism, so can be called non-optical polymerism alkali soluble resin.
Above-mentioned alkali soluble resin is preferably more than the 10 quality %, below the 80 quality % with respect to the solid state component in the photosensitive composite, more preferably is more than the 20 quality %, below the 70 quality %.Content by making above-mentioned alkali soluble resin has the trend of the balance that obtains sensitivity, development, sharpness easily in above-mentioned scope, so preferred.
＜optical polymerism alkali soluble resin 〉
As alkali soluble resin, can enumerate the optical polymerism alkali soluble resin.As preferred optical polymerism alkali soluble resin, can enumerate the reactant (c) (hereinafter referred to as composition (c)) that makes the epoxy compound (a) (hereinafter referred to as composition (a)) with epoxy radicals and the carboxylic acid that contains unsaturated group or its acid anhydrides (b) (hereinafter referred to as composition (b)) and further react the resin that obtains with polybasic carboxylic acid or its acid anhydrides (d) (hereinafter referred to as composition (d)).
As above-mentioned epoxy compound (a), the compound that preferably has 2 above epoxy radicals.As this epoxy compound (a), the preferably compound of deriving and obtaining by bisphenols.As having 2 above epoxy radicals, and the compound of deriving and obtaining by bisphenols, can enumerate and contain two (4-hydroxy phenyl) ketone of deriving and obtaining by bisphenols, two (4-hydroxyls-3, the 5-3,5-dimethylphenyl) ketone, two (4-hydroxyls-3, the 5-dichlorophenyl) ketone, two (4-hydroxy phenyl) sulfone, two (4-hydroxyls-3, the 5-3,5-dimethylphenyl) sulfone, two (4-hydroxyls-3, the 5-dichlorophenyl) sulfone, two (4-hydroxy phenyl) HFC-236fa, two (4-hydroxyls-3, the 5-3,5-dimethylphenyl) HFC-236fa, two (4-hydroxyls-3, the 5-dichlorophenyl) HFC-236fa, two (4-hydroxy phenyl) dimethylsilane, two (4-hydroxyls-3, the 5-3,5-dimethylphenyl) dimethylsilane, two (4-hydroxyls-3, the 5-dichlorophenyl) dimethylsilane, two (4-hydroxy phenyl) methane, two (4-hydroxyls-3, the 5-dichlorophenyl) methane, two (4-hydroxyls-3, the 5-dibromo phenyl) methane, 2,2-two (4-hydroxy phenyl) propane, 2,2-two (4-hydroxyl-3, the 5-3,5-dimethylphenyl) propane, 2,2-two (4-hydroxyl-3, the 5-dichlorophenyl) propane, 2,2-two (4-hydroxy-3-methyl phenyl) propane, 2,2-two (4-hydroxyl-3-chlorphenyl) propane, two (4-hydroxy phenyl) ether, two (4-hydroxyls-3, the 5-3,5-dimethylphenyl) ether, two (4-hydroxyls-3, the 5-dichlorophenyl) compound of ether etc., with contain 9,9-two (4-hydroxy phenyl) fluorenes, 9,9-two (4-hydroxy-3-methyl phenyl) fluorenes, 9,9-two (4-hydroxyl-3-chlorphenyl) fluorenes, 9,9-two (4-hydroxyl-3-bromophenyl) fluorenes, 9,9-two (4-hydroxyl-3-fluorophenyl) fluorenes, 9,9-two (4-hydroxy 3-methoxybenzene base) fluorenes, 9,9-two (4-hydroxyl-3, the 5-3,5-dimethylphenyl) fluorenes, 9,9-two (4-hydroxyl-3, the 5-dichlorophenyl) fluorenes, 9,9-two (4-hydroxyl-3, the 5-dibromo phenyl) compound of fluorenes etc., and contain 4,4 '-bis-phenol, 3, the compound of 3 '-bis-phenol etc.Also can use line style phenolic aldehyde (phenolic novolac) type epoxy compound and cresols-line style phenolic epoxy compound etc.Mentioned component (a) may be used alone, two or more kinds can also be used in combination.
As can with the carboxylic acid that contains unsaturated group or its acid anhydrides (b) of above-mentioned epoxy compound (a) reaction, contain monocarboxylic acid or its acid anhydrides of acryloyl group or methacryl isoreactivity unsaturated double-bond in the preferred molecule.As the above-mentioned carboxylic acid that contains unsaturated group, for example, can enumerate acrylic acid, methacrylic acid, β-styrene acrylic, β-furfuryl group acrylic acid, alpha-cyano cinnamic acid, cinnamic acid etc.
Mentioned component (b) may be used alone, two or more kinds can also be used in combination.
Can be by making composition (a) and composition (b) prepared in reaction composition (c).
Amount ratio during about the reaction of composition (a) and composition (b), the ratio calculating with epoxide equivalent with the carboxylic acid equivalent of composition (b) of composition (a) is generally 1: 0.5～1: 2, is preferably 1: 0.8～1: 1.25, more preferably 1: 1.If the amount ratio when making composition (a) with composition (b) reaction in 1: 0.5～1: 2 scope, then has the trend that improves cross-linking efficiency in above-mentioned equivalent proportion, so preferred.
Below, polybasic carboxylic acid or its acid anhydrides (d) with composition (c) reaction are described.
As mentioned component (d), can enumerate carboxylic acid with 2 above carboxyls or its acid anhydrides etc.As above-mentioned carboxylic acid with 2 above carboxyls, for example, can enumerate ethane diacid, malonic acid, succinic acid, glutaric acid, hexane diacid, malic acid, maleic acid, fumaric acid, itaconic acid, citric acid, tartrate, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, methylene tetrahydrophthalic acid in the methyl, chlorendic acid, the methyl tetrahydrophthalic acid, methylhexahydrophthaacid acid, trimellitic acid, pyromellitic acid, the benzophenone dioctyl phthalate, the benzophenone tetracarboxylic acid, bibenzene tetracarboxylic, biphenyl dicarboxylic acid, diphenyl ether tetraformic etc., preferred tetrabydrophthalic anhydride, or benzophenone tetracarboxylic dianhydride, bibenzene tetracarboxylic dianhydride.
The amount ratio of composition (c) and composition (d) in the molal quantity of OH base in the composition (c) and (d) equivalent proportion of anhydride group, is generally 1: 1～1: 0.1, preferred 1: 0.8～1: 0.2.It is if composition (c) and amount ratio (d) in 1: 1～1: 0.1 scope, then have the trend that the dissolubility of developer solution is become appropriateness in said reference, so preferred.
In above-mentioned optical polymerism alkali soluble resin, the preferred resin that uses with following general formula (1) expression.
In the formula, X is the group of following general formula (2) expression.
In the formula, Y sloughs the carboxylic acid anhydride group (residue that CO-O-CO-) obtains, described dicarboxylic anhydride is methylene tetrabydrophthalic anhydride in the maleic anhydride, succinic anhydride, itaconic anhydride, phthalic anhydride, tetrabydrophthalic anhydride, hexahydrophthalic anhydride, methyl, chlorendic anhydride, methyl tetrahydrophthalic anhydride, glutaric anhydride from following dicarboxylic anhydride.
In the formula, Z sloughs the residue that 2 carboxylic acid anhydride groups obtain from following tetracarboxylic dianhydride, and described tetracarboxylic dianhydride is pyromellitic acid acid anhydride, benzophenone tetracarboxylic dianhydride, bibenzene tetracarboxylic dianhydride, diphenyl ether tetraformic dianhydride etc.
The quality mean molecular weight of above-mentioned optical polymerism alkali soluble resin is preferably more than 1000.By making the quality mean molecular weight is more than 1000, can be filmed uniformly.In addition, the quality mean molecular weight is preferably below 100000.By making the quality mean molecular weight is below 100000, can obtain good development.
＜photopolymerization monomer 〉
Preferably in photosensitive composite of the present invention, add photopolymerization monomer.
Has ethene unsaturated group that at least one can polymerization in the photopolymerization monomer molecule as polymerism functional group.This photopolymerization monomer preferably has a plurality of polymerism functional group.By adding photopolymerization monomer, can improve the film strength of the film that is formed and to the cohesive of substrate.
As photopolymerization monomer, can enumerate monofunctional monomer, polyfunctional monomer etc.
As monofunctional monomer, can enumerate (methyl) acrylamide, methylol (methyl) acrylamide, methoxy (methyl) acrylamide, ethoxyl methyl (methyl) acrylamide, propoxyl group methyl (methyl) acrylamide, butoxy methoxy (methyl) acrylamide, acrylic acid, maleic acid, maleic anhydride, itaconic acid, itaconic anhydride, citraconic acid, citraconic anhydride, crotonic acid, 2-acrylamide-2-methyl propane sulfonic acid, tert-butyl group acrylamide sulfonic acid, (methyl) methyl acrylate, (methyl) ethyl acrylate, (methyl) butyl acrylate, (methyl) 2-EHA, (methyl) acrylic acid 2-hydroxy methacrylate, (methyl) acrylic acid 2-hydroxy propyl ester, (methyl) acrylic acid 2-hydroxyl butyl ester, (methyl) acrylic acid 2-phenoxy group-2-hydroxy propyl ester, 2-(methyl) acryloxy-2-hydroxypropyl phthalic ester, glycerine list (methyl) acrylate, (methyl) tetrahydrofurfuryl acrylate, dimethylamino (methyl) acrylate, (methyl) glycidyl acrylate, (methyl) acrylic acid 2,2, the 2-trifluoro ethyl ester, (methyl) acrylic acid 2,2,3,3-tetrafluoro propyl ester, the list of phthalic acid derivatives (methyl) acrylate, N-methylol (methyl) acrylamide etc.Above-mentioned monofunctional monomer may be used alone, two or more kinds can also be used in combination.
On the other hand; as polyfunctional monomer; can enumerate ethylene glycol bisthioglycolate (methyl) acrylate; diglycol two (methyl) acrylate; tetraethylene glycol two (methyl) acrylate; propylene glycol two (methyl) acrylate; polypropylene glycol two (methyl) acrylate; butylene glycol two (methyl) acrylate; neopentyl glycol two (methyl) acrylate; 1; 6-hexanediol two (methyl) acrylate; trimethylolpropane tris (methyl) acrylate; glycerine two (methyl) acrylate; pentaerythrite two (methyl) acrylate; pentaerythrite three (methyl) acrylate; dipentaerythritol five (methyl) acrylate; 2; 2-two (4-(methyl) acryloxy diethoxy phenyl) propane; 2; 2-two (4-(methyl) acryloxy polyethoxy phenyl) propane; 2-hydroxyl-3-(methyl) acryloxy propyl group (methyl) acrylate; ethylene glycol bisthioglycolate glycidyl ether two (methyl) acrylate; diglycol diglycidyl ether two (methyl) acrylate; phthalic acid diglycidyl ester two (methyl) acrylate; glycerol tri-acrylate; glycerine poly epihydric alcohol base ether gathers (methyl) acrylate; urethane (methyl) acrylate (promptly; toluene diisocyanate); the reactant of trimethyl hexamethylene diisocyanate and hexamethylene diisocyanate etc. and (methyl) acrylic acid 2-hydroxy methacrylate; di-2-ethylhexylphosphine oxide (methyl) acrylamide; (methyl) acrylamide methylene ether; the polyfunctional monomers such as condensation product of polyvalent alcohol and N-methylol (methyl) acrylamide; triacryl formal etc.Above-mentioned polyfunctional monomer may be used alone, two or more kinds can also be used in combination.
The content of above-mentioned photopolymerization monomer is preferably more than the 5 quality % below the 50 quality % with respect to the solid state component of photosensitive composite, more preferably is below the above 40 quality % of 10 quality %.Content by making photopolymerization monomer has the trend of the balance of easy acquisition sensitivity, development, sharpness in above-mentioned scope, so preferred.
[Photoepolymerizationinitiater initiater]
As Photoepolymerizationinitiater initiater, can enumerate acetophenone, 2, the 2-diethoxy acetophenone, to dimethyl acetophenone, to the dimethylamino propiophenone, dichloroacetophenone, trichloroacetophenone, acetophenones such as p-tert.-butyl acetophenone, benzophenone, the 2-chloro benzophenone, p, Benzophenones such as p '-two (dimethylamino) benzophenone, benzil, benzoin, benzoin methylether, benzoin iso-propylether, benzoin ethers such as benzoin isobutyl ether, benzyldimethylketal, thioxanthene, 2-diuril ton, 2,4-diethyl thioxanthene, 2-methyl thioxanthene, sulphur compounds such as 2-isopropyl thioxanthene, the 2-EAQ, the prestox anthraquinone, 1,2-benzo anthraquinone, 2, anthraquinone classes such as 3-diphenyl anthraquinone, azoisobutyronitrile, benzoyl peroxide, organic peroxides such as cumene peroxide, 2-mercaptobenzimidazole, the 2-mercaptobenzoxazole, mercaptan compounds such as 2-mercaptobenzothiazole, 2-(Chloro-O-Phenyl)-4,5-two (m-methoxyphenyl)-imidazole-based compounds such as imidazole radicals dimer, to triaizine compounds such as methoxyl triazines, 2,4,6-three (trichloromethyl)-s-triazine, 2-methyl-4,6-two (trichloromethyl)-s-triazine, 2-[2-(5-methylfuran-2-yl) vinyl]-4,6-two (trichloromethyl)-s-triazine, 2-[2-(furans-2-yl) vinyl]-4,6-two (trichloromethyl)-s-triazine, 2-[2-(4-diethylamino-2-aminomethyl phenyl) vinyl]-4,6-two (trichloromethyl)-s-triazine, 2-[2-(3, the 4-Dimethoxyphenyl) vinyl]-4,6-two (trichloromethyl)-s-triazine, 2-(4-methoxyphenyl)-4,6-two (trichloromethyl)-s-triazine, 2-(4-ethoxybenzene vinyl)-4,6-two (trichloromethyl)-s-triazine, 2-(4-n-butoxy phenyl)-4,6-two (trichloromethyl)-s-triazine etc. has the triaizine compounds of halogenated methyl, 2-benzyl-2-dimethylamino-1-(4-morpholino phenyl)-butane-amino ketones compounds such as 1-ketone.Above-mentioned Photoepolymerizationinitiater initiater may be used alone, two or more kinds can also be used in combination.
The content of above-mentioned Photoepolymerizationinitiater initiater compound is with respect to the summation of the solid state component beyond the 100 mass parts solvents, be preferably the scope of 1 mass parts～150 mass parts, more preferably be the scope of 5 mass parts～100 mass parts, the scope of 10 mass parts～50 mass parts more preferably.By making its content is below 150 mass parts, can obtain sufficient thermotolerance, chemical reagent resistance, is more than 1 mass parts by making its content, can improve the formation ability of filming, and it is bad to suppress photocuring.
[colorant]
Photosensitive composite of the present invention contains colorant.
As colorant, for example, preferably use color index (C.I.; The distribution of The Society of Dyersand Colourists society) is categorized as the compound of pigment (Pigment) in, is specially the material of following color index (C.I.) numbering.
C.I. pigment yellow 1 (below, only record be the numbering of " C.I. pigment yellow " equally), 3,11,12,13,14,15,16,17,20,24,31,53,55,60,61,65,71,73,74,81,83,86,93,95,97,98,99,100,101,104,106,108,109,110,113,114,116,117,119,120,125,126,127,128,129,137,138,139,147,148,150,151,152,153,154,155,156,166,167,168,175,180,185;
C.I. pigment orange 1 (below, only record be the numbering of " C.I pigment orange " equally), 5,13,14,16,17,24,34,36,38,40,43,46,49,51,55,59,61,63,64,71,73;
C.I. pigment violet 1 (below, only record be the numbering of " C.I. pigment violet " equally), 19,23,29,30,32,36,37,38,39,40,50;
C.I paratonere 1 (below, only record is the numbering of " C.I. paratonere " equally), 2,3,4,5,6,7,8,9,10,11,12,14,15,16,17,18,19,21,22,23,30,31,32,37,38,40,41,42,48:1,48:2,48:3,48:4,49:1,49:2,50:1,52:1,53:1,57,57:1,57:2,58:2,58:4,60:1,63:1,63:2,64:1,81:1,83,88,90:1,97,101,102,104,105,106,108,112,113,114,122,123,144,146,149,150,151,155,166,168,170,171,172,174,175,176,177,178,179,180,185,187,188,190,192,193,194,202,206,207,208,209,215,216,217,220,223,224,226,227,228,240,242,243,245,254,255,264,265;
C.I. pigment blue 1 (below, only record be the numbering of " C.I. alizarol saphirol " equally), 2,15,15:3,15:4,15:6,16,22,60,64,66;
C.I. pigment Green 7, C.I. pigment green 36, C.I. naphthol green 37;
C.I. bistre 23, C.I. bistre 25, C.I. bistre 26, C.I. bistre 28;
C.I. pigment black 1, C.I. pigment black 7.
When forming black matrix",, preferably use carbon black as black pigment.Can also enumerate the inorganic pigments such as oxide, composite oxides, metal sulfide, metal sulfate or metal carbonate of metals such as titanium is black, copper, iron, manganese, cobalt, chromium, nickel, zinc, calcium, silver etc.Wherein, more preferably use carbon black with high light-proofness.
As carbon black, can use channel black, furnace black, thermal black, known carbon black such as dim, especially preferably use the channel black of light-proofness excellence.In addition, can also use the carbon black of coated with resin.
Because the carbon black of coated with resin is compared with the carbon black of coated with resin not, its electric conductivity is low, and during therefore as the black matrix" of the liquid crystal display cells of LCD and so on, electric current leaks few, can the high low power consumption display of fabrication reliability.
In addition, in order to adjust the tone of carbon black, can suitably add above-mentioned organic pigment as auxiliary pigment.
Make the homodisperse spreading agent of colorant as being used to, preferably use polyethyleneimine: amine, polyurethane type resin, crylic acid resin macromolecule dispersing agent.Particularly when using carbon black, preferably use the crylic acid resin spreading agent as spreading agent as colorant.
Inorganic pigment and organic pigment can be distinguished use separately, also two or more kinds may be used, and the time spent, total amount with respect to 100 mass parts inorganic pigments and organic pigment, the consumption of organic pigment is preferably in the scope of 10 mass parts～80 mass parts, more preferably in the scope of 20 mass parts～40 mass parts.After preferably utilizing spreading agent to disperse above-mentioned inorganic pigment and organic pigment to make solution, add in the photosensitive composite with suitable concentration.
The consumption of colorant is preferably more than the 5 quality % below the 70 quality % with respect to the solid state component of photosensitive composite in the photosensitive composite of the present invention, more preferably be below the above 55 quality % of 25 quality %, more preferably below the above 50 quality % of 30 quality %.Consumption by making colorant can form black matrix" and each dyed layer with target pattern in above-mentioned scope, so preferably.
Particularly when forming black matrix", preferably adjust the amount of black pigment in the photosensitive composite, the OD value that makes per 1 μ m thickness is more than 4.The OD value of per 1 μ m thickness is 4 when above in the black matrix", as the black matrix" of LCD the time, can obtain enough demonstration contrasts.
[other compositions]
In photosensitive composite of the present invention, can cooperate adjuvant as required.Specifically can enumerate sensitizer, curing accelerator, photocrosslinking agent, light sensitizer, dispersing aid, filling agent, adhesion promotor, antioxidant, ultraviolet light absorber, anti-agglomerating agent etc.
In addition, can also add the solvent that is used to dilute or hot polymerization inhibitor, defoamer, surfactant etc. in the photosensitive composite of the present invention.
Wherein, as the solvent that can be added in the photosensitive composite, for example, can enumerate glycol monoethyl ether, ethylene glycol monoethyl ether, ethylene glycol propyl ether, ethylene glycol mono-n-butyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, the diglycol monotertiary positive propyl ether, the diglycol monotertiary n-butyl ether, triethylene glycol monomethyl ether, triethylene glycol list ether, propylene glycol monomethyl ether, dihydroxypropane single-ether, propylene glycol list positive propyl ether, the propylene glycol mono-n-butyl ether, dipropylene glycol monomethyl ether, the single ether of dipropylene glycol, the single positive propyl ether of dipropylene glycol, the dipropylene glycol mono-n-butyl ether, the tripropylene glycol monomethyl ether, (gathering) alkylene glycol monoalkyl ethers such as tripropylene glycol list ether; (gathering) alkylene glycol monoalky lether acetate esters such as ethylene glycol monomethyl ether acetate, ethylene glycol monoethyl ether acetate, diethylene glycol monomethyl ether acetic acid esters, diethylene glycol monoethyl ether acetic acid esters, propylene glycol methyl ether acetate, propylene glycol monoethyl ether acetate; Other ethers such as diethylene glycol dimethyl ether, diglycol ethyl methyl ether, diethyl carbitol, tetrahydrofuran; Ketones such as MEK, cyclohexanone, 2-heptanone, 3-heptanone; Lactic acid alkyl ester classes such as 2 hydroxy propanoic acid methyl esters, 2 hydroxy propanoic acid ethyl ester; 2-hydroxy-2-methyl ethyl propionate, 3-methoxypropionic acid methyl esters, 3-methoxy propyl acetoacetic ester, 3-ethoxy-propionic acid methyl esters, the 3-ethoxyl ethyl propionate, ethoxy ethyl acetate, hydroxyl ethyl acetate, 2-hydroxy-3-methyl methyl butyrate, 3-methyl-3-methoxyl butylacetic acid ester, 3-methyl-3-methoxyl butyl propionic ester, ethyl acetate, n-propyl acetate, isopropyl acetate, n-butyl acetate, isobutyl acetate, the formic acid n-pentyl ester, isoamyl acetate, n-butyl propionate, ethyl butyrate, the butyric acid n-propyl, isopropyl isobutyrate, the positive butyl ester of butyric acid, methyl pyruvate, ethyl pyruvate, the pyruvic acid n-propyl, methyl acetoacetate, ethyl acetoacetate, other ester classes such as 2-oxygen base ethyl butyrate; Toluene, dimethylbenzene etc. are aromatic hydrocarbon based; N-Methyl pyrrolidone, N, amide-types such as dinethylformamide, N,N-dimethylacetamide etc.These solvents can use separately or mix more than 2 kinds and use.
Wherein, because propylene glycol monomethyl ether, ethylene glycol monomethyl ether acetate, propylene glycol methyl ether acetate, propylene glycol monoethyl ether acetate, diethylene glycol dimethyl ether, diglycol ethyl methyl ether, cyclohexanone, 3-methoxyl butylacetic acid ester, optical polymerism compound, Photoepolymerizationinitiater initiater are demonstrated good dissolubility, simultaneously can make the dispersiveness of insoluble compositions such as black pigment become good, therefore be preferred, and especially preferably use propylene glycol methyl ether acetate, 3-methoxyl butylacetic acid ester.With respect to the total amount of 100 mass parts optical polymerism compounds, Photoepolymerizationinitiater initiater and colorant, solvent can use in the scope of 50 mass parts～500 mass parts.
In addition, as hot polymerization inhibitor, can use quinhydrones, quinhydrones list ether etc.As defoamer, can use silicon class, fluoride compound; As surfactant, can use known various surfactants such as anionic species, cationic, nonionic class.
When using photosensitive composite of the present invention to form pattern, as described below, coating and dry photosensitive composite of the present invention on substrate form film.In order to improve coating at this moment and the rerum natura behind the photocuring, except that mentioned component, can also further contain polymer binder as bonding agent.According to improving purposes such as compatibility, tunicle formation property, development, cohesive, suitably select to use bonding agent to get final product.
As the thickness of the black matrix" that on substrate, forms, can be set in usually in the scope of 1 μ m～10 μ m, be preferably 1.5 μ m～8 μ m, and 2 μ m～5 μ m more preferably.Thickness is 2 μ m when above, not only can be used as common color filter black matrix", also can be as the color filter black matrix of ink-jetting style.
As the preparation method of photosensitive composite of the present invention, can obtain by utilizing stirring machine to mix above-mentioned each composition.Can also use filtrator to filter so that the gained potpourri is even.
[the formation method of color filter]
Below the method for using photosensitive composite of the present invention to form color filter is described.
[formation of black matrix" (black colorant layer)]
At first, use contact transfer printing type apparatus for coating or spinners (rotary apparatus for coating) such as print roll coating device, reversion type spreader, bar type spreader, drench curtain-type spreader non-contact type apparatus for coating such as (curtainflow coater), on substrate, be coated with photosensitive composite (containing black colorant).As substrate, can use substrate with photopermeability.
In order to improve the cohesive of glass substrate and photosensitive composite, silane-coating coupling agent on glass substrate in advance.Perhaps can when the preparation photosensitive composite, add silane coupling agent in advance.
After being coated with this photosensitive composite, make its drying, remove and desolvate.Drying means is not particularly limited, for example, can use following any method: (1) is under 80 ℃～120 ℃, preferred 90 ℃～100 ℃ temperature, the method in dry 60 second～120 seconds on hot plate, (2) at room temperature place several hours to several days method, (3) put into storage heater or the infrared heater dozens of minutes was removed the method for desolvating to several hours.
Then, by negative mask irradiation ultraviolet radiation, excimer laser isoreactivity energy-ray, carry out the part exposure.The energy-ray amount of irradiation is according to the composition of photosensitive composite and difference, preference such as 30mJ/cm
2～2000mJ/cm
2About.
Then, make film development after the exposure, form the pattern of desired shape thus by developer solution.Developing method is not particularly limited, and for example, can use infusion process, spray-on process etc.As developer solution, can enumerate organic class developer solutions such as monoethanolamine, diethanolamine, triethanolamine, or the aqueous solution of NaOH, potassium hydroxide, sodium carbonate, ammonia, quaternary ammonium salt etc.
Next, after under the temperature about 200 ℃ the pattern after developing being carried out, cure, form black matrix" thus.In addition, preferably formed pattern is carried out blanket exposure.
The black matrix" of Xing Chenging according to the difference of its pattern form, thickness, can also be used as partition wall, ink-jet dividing plate thus.
(1) forms color filter by photolithographicallpatterned
On the above-mentioned substrate that forms black matrix", use the photosensitive composite contain R, G, the trichromatic colorant of B usually, form the dyed layer of every kind of color in the same manner successively with the formation of above-mentioned black matrix".Can form color filter thus.
(2) form color filter by ink-jetting style
When forming color filter, use the ink jet type color filter that forms by photosensitive composite of the present invention to form with dividing plate (back abbreviates dividing plate as) by ink-jetting style.Because this dividing plate is a black, therefore also can realize effect simultaneously as black matrix".
Particularly, at first, by ink-jetting style with the ink jet of R, G, B to the position that is surrounded by aforementioned barriers, and be trapped in the dividing plate.Then, make the ink solidification of delay by heat or light.Thus, can form color filter.
[embodiment]
[synthesis example 1]
Synthesized the resin that contains the bisphenol fluorene structure (being also referred to as " Cardo resin ") with following general formula (1) expression.
In the formula, X is the group of following general formula (2) expression.
In the 500ml four-necked bottle, add 235g (epoxide equivalent 235) bisphenol fluorene type epoxy resin and 110mg tetramethyl ammonium chloride, 100mg 2,6-di-tert-butyl-4-methy phenol and 72.0g acrylic acid, then, the speed of dividing with 25ml/ is blown into air on one side, on one side be heated to 100 ℃ from 90 ℃, make its dissolving.
Next, under the state of this solution gonorrhoea, slowly be warming up to 120 ℃, it is dissolved fully.The solution of this moment becomes transparent thick gradually, continues to stir under this state.This period detecting acid number continues about 12 hours of heated and stirred, is lower than 1.0mgKOH/g until acid number.Be cooled to room temperature, obtain the bisphenol fluorene type epoxy acrylate of the water white transparency solid shape shown in the following general formula (3).
In the above-mentioned bisphenol fluorene type epoxy acrylate that 307.0g obtains as mentioned above, add 600g propylene glycol methyl ether acetate (PGMEA), after making its dissolving, mix 80.5g benzophenone tetracarboxylic dianhydride and 1g tetraethylammonium bromide, reacted 4 hours down at 110 ℃～115 ℃.After determining no anhydride group, mix 38.0g 1,2,3, the 6-tetrabydrophthalic anhydride reacted 6 hours down at 90 ℃, obtained the Cardo resin shown in the above-mentioned general formula (1).Need to prove, utilize IR spectrum to confirm the disappearance of anhydride group.With this Cardo resin as compound 1.
Compound 1 is the compound of general formula (1) expression, wherein, X is the group of general formula (2) expression, and Y is from 1,2,3, (residue CO-O-CO-), Z are from 3 to slough anhydride group in the 6-tetrahydrophthalic acid dianhydride, 3 ', 4, slough the residue behind the acid anhydrides in 4 '-benzophenone tetracarboxylic acid, four acid anhydrides, the mol ratio Y/Z=50.0/50.0 of Y and Z.
[embodiment and comparative example]
Mix above-mentioned Cardo resin, acryl resin, photopolymerization monomer, pigment liquid by the composition shown in the table 1, use 3-methoxyl butylacetic acid ester/PGMEA/ cyclohexanone=6: 2: 2 (mass ratio) as solvent, making the solid component concentration that comprises pigment is 25 quality %, prepares photosensitive composite thus.
Table 1
| Cardo resin (mass parts) | Acryl resin (mass parts) | Photopolymerization monomer (mass parts) | Photoepolymerizationinitiater initiater (mass parts) | Pigment liquid (mass parts) | |
| Embodiment 1 | 90 | 10 | 40 | 20 | 200 |
| Embodiment 2 | 80 | 20 | 40 | 20 | 200 |
| Embodiment 3 | 60 | 40 | 40 | 20 | 200 |
| Embodiment 4 | 50 | 50 | 40 | 20 | 200 |
| Embodiment 5 | 40 | 60 | 40 | 20 | 200 |
| Embodiment 6 | 80 | 20 | 40 | 20 | 200 |
| Comparative example 1 | 100 | 0 | 40 | 20 | 200 |
Acryl resin:
Embodiment 1～5:(methyl) acrylic acid/(methyl) benzyl acrylate (8: 2 (mol ratio)) multipolymer
Embodiment 6:(methyl) acrylic acid/styrene (8: 2 (mol ratio)) multipolymer
Photopolymerization monomer: tetramethylol methane tetraacrylate
Photoepolymerizationinitiater initiater: trade name OXE-01, Ciba (Ciba SpecialtyChemicals) society's system
Pigment liquid: trade name CF deceives TEN, contains 20 quality % high resistance carbon, Mikoku Pigment Co., Ltd.'s system
Be coated with said sample on glass substrate, cured under 90 ℃ 120 seconds, forming thickness is the film of 2 μ m.Then, with 150mj/cm
2Exposure exposure, use alkaline developer (chemical industry society system is answered in trade name: N-A3K, Tokyo) to develop for 60 seconds, forming live width is the black matrix" of 10 μ m.Then, utilize circulating baking oven after under 220 ℃, to cure 30 minutes.The black matrix" that utilizes observation by light microscope to form is discussed to surperficial wrinkle, Development margin thus.Its result is as shown in table 2.At Development margin, carrying out with 60 seconds is the development of center, front and back 10 seconds (50 seconds, 70 seconds).
The following evaluation: ◎ is illustrated in and can both forms pattern in all development times and obtain the black matrix" that live width is 10 μ m, zero is illustrated in that to exist the partial graph case to form in arbitrary development time bad, for example, pattern comes off, edge roughness, come off bad, * be illustrated in and all fail to form pattern in all development times and obtain the black matrix" that live width is 10 μ m.
Table 2
| The surface wrinkle | Development margin | |
| Embodiment 1 | △ | ◎ |
| Embodiment 2 | ○ | ◎ |
| Embodiment 3 | ◎ | ◎ |
| Embodiment 4 | ◎ | ○ |
| Embodiment 5 | ◎ | × |
| Embodiment 6 | ○ | ◎ |
| Comparative example 1 | × | ◎ |
◎: good especially zero: good △: good slightly *: bad
Claims (10)
1, a kind of photosensitive composite, described photosensitive composite contains alkali soluble resin, Photoepolymerizationinitiater initiater, colorant, and wherein, described alkali soluble resin contains the acrylic resin that is useful on the generation of inhibition wrinkle.
2, photosensitive composite as claimed in claim 1 wherein, contains the described acrylic resin more than the 15 quality % in described alkali soluble resin.
3, photosensitive composite as claimed in claim 1, wherein, the quality mean molecular weight of described acrylic resin is 5000～50000.
4, photosensitive composite as claimed in claim 1, wherein, described acrylic resin is to contain at least a polymer of monomers that is selected from methacrylate, benzyl methacrylate, methyl methacrylate, methacrylic acid 2-Octyl Nitrite, acrylic acid, hydroxyethyl methylacrylate, hydroxy propyl methacrylate, glycidyl methacrylate, the methacrylic acid 2-ethyl isocyanate.
5, photosensitive composite as claimed in claim 1, it is characterized in that described alkali soluble resin contains the resin that the reactant of the carboxylic acid that makes epoxy compound with epoxy radicals and contain unsaturated group or its acid anhydrides and polybasic carboxylic acid or its anhydride reaction obtain.
6, photosensitive composite as claimed in claim 1, wherein, described colorant contains black pigment.
7, photosensitive composite as claimed in claim 1 is characterized in that, it is the above thick film of 1 μ m that described photosensitive composite is used to form thickness.
8, as claim 6 or 7 described photosensitive composites, wherein, described photosensitive composite is used to form the ink jet type color filter black matrix.
9, a kind of color filter, described color filter have the pattern that is formed by the described photosensitive composite of claim 1.
10, a kind of wrinkle inhibitor, described wrinkle inhibitor is that the wrinkle of the thick resin molding more than the 1 μ m add in order to suppress thickness, and is principal ingredient with the acrylic resin.
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP115554/2006 | 2006-04-19 | ||
| JP2006115554A JP4745110B2 (en) | 2006-04-19 | 2006-04-19 | Photosensitive composition and color filter formed with the photosensitive composition |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| CN101059655A true CN101059655A (en) | 2007-10-24 |
| CN101059655B CN101059655B (en) | 2013-05-01 |
Family
ID=38758277
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| CN2007100963625A Active CN101059655B (en) | 2006-04-19 | 2007-04-16 | Photosensitive composition and color filter formed from photosensitive composition |
Country Status (4)
| Country | Link |
|---|---|
| JP (1) | JP4745110B2 (en) |
| KR (2) | KR100910085B1 (en) |
| CN (1) | CN101059655B (en) |
| TW (1) | TW200801798A (en) |
Cited By (7)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102460300A (en) * | 2009-06-26 | 2012-05-16 | 可隆工业株式会社 | Photopolymerizable resin composition |
| CN102591148A (en) * | 2011-01-11 | 2012-07-18 | 东京应化工业株式会社 | Colored photosensitive resin composition for touch panel, touch panel and display device |
| CN103116243A (en) * | 2011-09-26 | 2013-05-22 | 东京应化工业株式会社 | Colored photosensitive resin composition, color filter and display device |
| CN103376657A (en) * | 2013-07-15 | 2013-10-30 | 京东方科技集团股份有限公司 | Photoresist composition and preparation method thereof, color film substrate and display device |
| CN104020641A (en) * | 2013-03-01 | 2014-09-03 | 奇美实业股份有限公司 | Photosensitive resin composition for color filter and application thereof |
| CN102216852B (en) * | 2008-09-30 | 2014-09-10 | 可隆工业株式会社 | Photopolymer resin composition |
| CN109153915A (en) * | 2016-05-17 | 2019-01-04 | 默克专利股份有限公司 | Polymerizable liquid crystal material and aggregated liquid crystal film |
Families Citing this family (14)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP4745110B2 (en) * | 2006-04-19 | 2011-08-10 | 東京応化工業株式会社 | Photosensitive composition and color filter formed with the photosensitive composition |
| KR100938444B1 (en) | 2007-09-03 | 2010-01-25 | 제일모직주식회사 | Ink composition for color filter, method for manufacturing picture element of color filter, and color filter |
| JP5249588B2 (en) * | 2008-01-11 | 2013-07-31 | 東京応化工業株式会社 | Colored photosensitive resin composition |
| JP5147499B2 (en) * | 2008-02-13 | 2013-02-20 | 富士フイルム株式会社 | Photosensitive coloring composition, color filter and method for producing the same |
| CN101591423B (en) * | 2008-05-29 | 2012-09-05 | 新日铁化学株式会社 | Alkaline water-soluble resin and manufacture method, as well as photosensitive resin composition, cured resin and color filter |
| WO2010038978A2 (en) * | 2008-09-30 | 2010-04-08 | Kolon Industries, Inc. | Photopolymer resin composition |
| KR101225955B1 (en) | 2008-12-22 | 2013-01-24 | 제일모직주식회사 | Ink jet resin composition |
| JP5981159B2 (en) * | 2011-02-22 | 2016-08-31 | 東京応化工業株式会社 | Photosensitive resin composition, and color filter and display device using the same |
| JP2013134263A (en) * | 2011-12-22 | 2013-07-08 | Tokyo Ohka Kogyo Co Ltd | Photosensitive resin composition for black column spacer, black column spacer, display device, and method for forming black column spacer |
| JP6123620B2 (en) * | 2013-09-30 | 2017-05-10 | Jsr株式会社 | Radiation-sensitive resin composition, display element insulating film, method for forming the same, and display element |
| JP5916939B2 (en) * | 2015-12-24 | 2016-05-11 | 東京応化工業株式会社 | Method for forming black column spacer |
| KR101832097B1 (en) | 2016-10-31 | 2018-02-23 | 롬엔드하스전자재료코리아유한회사 | Colored photosensitive resin composition and light shielding spacer prepared therefrom |
| KR20180135375A (en) | 2017-06-12 | 2018-12-20 | 롬엔드하스전자재료코리아유한회사 | Colored photosensitive resin composition and light shielding spacer prepared therefrom |
| JP7437872B2 (en) | 2018-10-29 | 2024-02-26 | 日鉄ケミカル＆マテリアル株式会社 | Photosensitive resin composition for partition walls, cured product thereof, and manufacturing method thereof |
Family Cites Families (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| JP3599866B2 (en) * | 1995-01-05 | 2004-12-08 | ダイセル化学工業株式会社 | Photosensitive coloring composition for color filter, color filter and method for producing the same |
| JP3638660B2 (en) * | 1995-05-01 | 2005-04-13 | 松下電器産業株式会社 | Photosensitive resin composition, photosensitive dry film for sandblasting using the same, and etching method using the same |
| JP3849950B2 (en) * | 1997-02-06 | 2006-11-22 | 東京応化工業株式会社 | Photosensitive composition for color filter |
| JP4245740B2 (en) * | 1999-07-29 | 2009-04-02 | 新日鐵化学株式会社 | Photopolymerizable resin composition and color filter |
| JP2002241440A (en) | 2001-02-19 | 2002-08-28 | Toppan Printing Co Ltd | Alkaline soluble polymer and photosensitive resin composition |
| JP2003043685A (en) * | 2001-08-03 | 2003-02-13 | Showa Denko Kk | Color composition, and photosensitive color composition for color filter |
| JP2003295433A (en) * | 2002-03-28 | 2003-10-15 | Tamura Kaken Co Ltd | Photosensitive resin composition |
| JP4290483B2 (en) * | 2003-06-05 | 2009-07-08 | 新日鐵化学株式会社 | Photosensitive resin composition for black resist and light-shielding film formed using the same |
| JP2005316388A (en) * | 2004-03-30 | 2005-11-10 | Jsr Corp | Radiation sensitive composition for color filter, color filter and color liquid crystal display |
| JP4604559B2 (en) * | 2004-06-02 | 2011-01-05 | 凸版印刷株式会社 | Color filter and manufacturing method thereof |
| JP2007279668A (en) * | 2006-03-14 | 2007-10-25 | Asahi Kasei Electronics Co Ltd | Black matrix and method for producing the same |
| JP4745110B2 (en) * | 2006-04-19 | 2011-08-10 | 東京応化工業株式会社 | Photosensitive composition and color filter formed with the photosensitive composition |
-
2006
- 2006-04-19 JP JP2006115554A patent/JP4745110B2/en active Active
-
2007
- 2007-03-29 TW TW096111120A patent/TW200801798A/en unknown
- 2007-04-16 KR KR1020070036893A patent/KR100910085B1/en active IP Right Grant
- 2007-04-16 CN CN2007100963625A patent/CN101059655B/en active Active
-
2009
- 2009-04-28 KR KR1020090037040A patent/KR101291480B1/en active IP Right Grant
Cited By (12)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| CN102216852B (en) * | 2008-09-30 | 2014-09-10 | 可隆工业株式会社 | Photopolymer resin composition |
| CN102460300A (en) * | 2009-06-26 | 2012-05-16 | 可隆工业株式会社 | Photopolymerizable resin composition |
| CN102460300B (en) * | 2009-06-26 | 2013-11-06 | 可隆工业株式会社 | Photopolymerizable resin composition |
| CN102591148A (en) * | 2011-01-11 | 2012-07-18 | 东京应化工业株式会社 | Colored photosensitive resin composition for touch panel, touch panel and display device |
| CN102591148B (en) * | 2011-01-11 | 2016-12-14 | 东京应化工业株式会社 | For the photosensitive composition of contact panel and contact panel and display device |
| CN103116243A (en) * | 2011-09-26 | 2013-05-22 | 东京应化工业株式会社 | Colored photosensitive resin composition, color filter and display device |
| CN103116243B (en) * | 2011-09-26 | 2018-06-15 | 东京应化工业株式会社 | Photosensitive composition, colour filter and display device |
| CN104020641A (en) * | 2013-03-01 | 2014-09-03 | 奇美实业股份有限公司 | Photosensitive resin composition for color filter and application thereof |
| CN103376657A (en) * | 2013-07-15 | 2013-10-30 | 京东方科技集团股份有限公司 | Photoresist composition and preparation method thereof, color film substrate and display device |
| US9261779B2 (en) | 2013-07-15 | 2016-02-16 | Boe Technology Group Co., Ltd. | Photoresist composition and method of preparing the same, color film substrate, and display apparatus |
| CN103376657B (en) * | 2013-07-15 | 2016-12-28 | 京东方科技集团股份有限公司 | Light resistance composition and preparation method thereof, color membrane substrates and display device |
| CN109153915A (en) * | 2016-05-17 | 2019-01-04 | 默克专利股份有限公司 | Polymerizable liquid crystal material and aggregated liquid crystal film |
Also Published As
| Publication number | Publication date |
|---|---|
| KR20090060236A (en) | 2009-06-11 |
| KR20070103683A (en) | 2007-10-24 |
| CN101059655B (en) | 2013-05-01 |
| JP2007286478A (en) | 2007-11-01 |
| TWI350428B (en) | 2011-10-11 |
| KR100910085B1 (en) | 2009-07-30 |
| TW200801798A (en) | 2008-01-01 |
| JP4745110B2 (en) | 2011-08-10 |
| KR101291480B1 (en) | 2013-07-30 |
Similar Documents
| Publication | Publication Date | Title |
|---|---|---|
| CN101059655A (en) | Photosensitive composition and color filter formed from photosensitive composition | |
| CN101038438A (en) | Black photosensitive composition | |
| CN103324031B (en) | Photosensitive resin composition, color filter and liquid crystal display thereof | |
| CN102645845B (en) | Photosensitive polymer combination, colour filter and display device using the photosensitive polymer combination | |
| CN1928714A (en) | Black photosensitive resin composition | |
| CN103885289B (en) | Photosensitive resin composition, color filter and liquid crystal display element thereof | |
| CN1869816A (en) | Photosensitive composition and color filter formed thereof | |
| CN103135344A (en) | Photosensitive resin composition, black matrix, color filter and liquid crystal display element thereof | |
| TW201439293A (en) | Colored photosensitive resin composition suitable for both column spacer and black matrix | |
| CN1233679C (en) | Ultraviolet-curable resin composition and photosolder resist ink containing the composition | |
| CN101051186A (en) | Negative photosensitive resin composition | |
| TWI554567B (en) | Alkali soluble resin and its photosensitive resin composition and its application | |
| CN101093359A (en) | Colored photosensitive polymer combination | |
| CN1259349C (en) | Resins curable with actinic radiation, process for production thereof, and photo- and thermo-setting resin composition | |
| CN101093358A (en) | Colored photosensitive polymer combination | |
| CN101482700A (en) | Colored photosensitive polymer combination | |
| CN1842743A (en) | Photosensitive resin composition and LCD using the same | |
| CN1782874A (en) | Photosensitive composition for forming light shading film, black bottom formed from said light shading film for photosensitive composition | |
| CN101038437A (en) | Black photosensitive composition, shielding film and el device manufactured by the black photosensitive composition | |
| JP2008268894A (en) | Colored photosensitive resin composition, black matrix, color filter and liquid crystal display | |
| CN1800979A (en) | Solder resist composition of light-curing single liquid style and printing circuit board use same | |
| CN104076603A (en) | Photosensitive resin composition | |
| CN1459049A (en) | Ultraviolet-curable resin composition and photosolder resist ink contaning the composition | |
| TWI698712B (en) | Etching resist composition and dry film | |
| CN102109761B (en) | Photosensitive resin composition for color filter protective layer, color filter protective layer including the same, and image sensor including the same |
Legal Events
| Date | Code | Title | Description |
|---|---|---|---|
| C06 | Publication | ||
| PB01 | Publication | ||
| C10 | Entry into substantive examination | ||
| SE01 | Entry into force of request for substantive examination | ||
| C14 | Grant of patent or utility model | ||
| GR01 | Patent grant |