CN102591148B - For the photosensitive composition of contact panel and contact panel and display device - Google Patents
For the photosensitive composition of contact panel and contact panel and display device Download PDFInfo
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- CN102591148B CN102591148B CN201210005343.8A CN201210005343A CN102591148B CN 102591148 B CN102591148 B CN 102591148B CN 201210005343 A CN201210005343 A CN 201210005343A CN 102591148 B CN102591148 B CN 102591148B
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
- G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
- G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers
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- C—CHEMISTRY; METALLURGY
- C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
- C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
- C09B11/00—Diaryl- or thriarylmethane dyes
- C09B11/04—Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
- C09B11/10—Amino derivatives of triarylmethanes
- C09B11/24—Phthaleins containing amino groups ; Phthalanes; Fluoranes; Phthalides; Rhodamine dyes; Phthaleins having heterocyclic aryl rings; Lactone or lactame forms of triarylmethane dyes
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
- G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B5/00—Optical elements other than lenses
- G02B5/20—Filters
- G02B5/22—Absorbing filters
- G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
-
- G—PHYSICS
- G02—OPTICS
- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
- G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
- G02F1/1333—Constructional arrangements; Manufacturing methods
- G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
- G02F1/133509—Filters, e.g. light shielding masks
- G02F1/133512—Light shielding layers, e.g. black matrix
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
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- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Chemical & Material Sciences (AREA)
- Optics & Photonics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Nonlinear Science (AREA)
- Mathematical Physics (AREA)
- Crystallography & Structural Chemistry (AREA)
- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials For Photolithography (AREA)
- Epoxy Resins (AREA)
- Position Input By Displaying (AREA)
- Optical Filters (AREA)
Abstract
The present invention provides a kind of chemical resistance and against weather excellence and is applicable to the photosensitive composition for contact panel of contact panel purposes and uses contact panel and the display device of said composition.The photosensitive composition of the present invention contains (A) binder compound, (B) photopolymerization monomer, (C) Photoepolymerizationinitiater initiater and (D) coloring agent, and (A) binder compound comprises epoxide.As epoxide, the preferably compound represented by following formula (A 1).In formula, Ra1Representing have the residue eliminating activity hydrogen-based in the organic compound of k activity hydrogen-based, n1 ..., nk represent the integer of 0～100, and its summation is 1～100.K represents the integer of 1～100.A represents oxygen hexamethylene skeleton or the oxygen norborene skeleton with substituent groups such as epoxy radicals.
Description
Technical field
The present invention relates to a kind of photosensitive composition for contact panel and contact panel
And display device.
Background technology
At present, as the input equipment in the display device with liquid crystal display etc., it is widely used
Contact panel.Wherein, the reasons such as bright and simple in construction, the touch-control of capacitive way are shown due to optics
Panel is paid close attention to by industry.
The contact panel of capacitive way has: dielectric material, respectively in dielectric material both sides with difference figure
The 1st electric conductor that case is formed and the 2nd electric conductor.1st electric conductor and the 2nd electric conductor are via in activity
Derivation distribution that region (active area) is formed with exterior domain and be connected with external control circuit.According to
The contact panel of this capacitive way, can be based on external conductor (usually finger) contact or close to touch-control
During panel, produced electromagnetic change or capacitance variations detect the position of external conductor.
Patent documentation 1: Japanese Patent Laid-Open 2010-198615 publication
Summary of the invention
But, in order to metal is used as the 1st electric conductor in this contact panel and the 2nd electric conductor,
It has been proposed that the 1st electric conductor and the 2nd electric conductor are hidden in after black-face picture tube (with reference to patent documentation
1).Additionally, in order to make from the invisible derivation in user side distribution, also have tried to deriving distribution hidden
Ensconce after black-face picture tube.In this case, owing to needing after forming black-face picture tube
Being etched metal film waiting and process, therefore its chemical resistance of material as black-face picture tube becomes
Key factor.
Additionally, will there is vehicle-mounted in such as auto-navigation system of the display device applications of contact panel
In the case of Tu, its against weather of material as black-face picture tube becomes key factor.
But, the black-face picture tube photosensitive composition of colored filter is being diverted to
In the case of contact panel purposes, also exist in terms of chemical resistance or against weather, do not reach requirement mark
Accurate problem.
The present invention completes in view of above-mentioned problem, its object is to provide chemical resistance and weatherability
Property excellent and be applicable to the coloring phototonus resin combination for contact panel of contact panel purposes
Thing, there is this for solidified resin pattern that the photosensitive composition of contact panel is formed
Contact panel and there is the display device of this contact panel.
The present inventor etc. have been repeated wholwe-hearted research for achieving the above object.It was found that by adding
Add epoxide and can solve above-mentioned class as the binder compound of photosensitive composition
Topic, thus complete the present invention.Specifically, the present invention provides following content.
First embodiment of the present invention relates to a kind of coloring phototonus resin combination for contact panel
Thing, it contains (A) binder compound, (B) photopolymerization monomer, (C) Photoepolymerizationinitiater initiater and (D)
Coloring agent, and above-mentioned (A) binder compound comprises epoxide.
Second embodiment of the present invention be have use in the first embodiment for contact panel
Photosensitive composition and the contact panel of solidified resin pattern that formed.
Third embodiment of the present invention is to have the display dress of the contact panel in the second embodiment
Put.
According to the present invention, it is possible to provide chemical resistance and against weather are excellent and be applicable to contact panel and use
Way the photosensitive composition for contact panel, have use this for contact panel
The contact panel of the solidified resin pattern that photosensitive composition is formed and there is this touch
The display device of control panel.
Detailed description of the invention
" for the photosensitive composition of contact panel "
The photosensitive composition for contact panel of the present invention (hereinafter referred to as " color sensation
Photosensitive resin composition ") draw containing (A) binder compound, (B) photopolymerization monomer, (C) photopolymerization
Send out agent and (D) coloring agent.Hereinafter, each composition contained in photosensitive composition is entered
Row explanation.
<(A) binder compound>
The photosensitive composition of the present invention contains epoxide as (A) binder compound
(hereinafter also referred to " (A) composition ").
As epoxide, it is not particularly limited, it is possible to use there are the existing public affairs of binding agent effect
The epoxide known, but wherein preferred following formula (A-1) from the viewpoint of chemical resistance and against weather
Represented epoxide.
[changing 1]
[in formula, Ra1It it is the residue having and removing activity hydrogen-based in the organic compound of k activity hydrogen-based；n1、
N2 ..., nk separately represent the integer of 0～100, and its summation is 1～100；K represents 1～100
Integer；A is to have oxygen hexamethylene (oxycyclohexane) skeleton of substituent B or have replacement
Oxygen norborene (oxynorbornene) skeleton of base B, is represented A by following formula (A-2) or (A-3).
[changing 2]
(in formula, B is separately by the group represented by following formula (A-4), formula (A-5) or formula (A-6)；
[changing 3]
Wherein, containing the group represented by above-mentioned formula (A-4) of more than 1 in this epoxide.Ra2
Represent alkyl, alkyl-carbonyl or aryl carbonyl)].
In above-mentioned formula (A-1), Ra1It is the residual of removing activity hydrogen-based in the organic compound of active hydrogen-based
Base；As the organic compound of the most active hydrogen-based of its precursor, can enumerate: alcohols, phenols, carboxylic
Acids, amine, thio-alcohol etc..
As above-mentioned alcohols, can be monohydric alcohol can also be polyhydric alcohol.Specifically can enumerate: methanol,
The aliphatic alcohols such as ethanol, propanol, butanol, amylalcohol, hexanol, capryl alcohol；The aromatic alcohols such as benzyl alcohol；
Ethylene glycol, diethylene glycol, triethylene glycol, Polyethylene Glycol, propylene glycol, dipropylene glycol, 1,3-
Butanediol, BDO, pentanediol, 1,6-hexanediol, neopentyl glycol, hydroxy new pentane acid new penta 2
Alcohol ester (hydroxypivalic acid neopentylglycol ester), cyclohexanedimethanol, glycerol, one
Contract two glycerol, polyglycereol, trimethylolpropane, trimethylolethane, tetramethylolmethane, two seasons penta
The polyhydric alcohol etc. such as tetrol.
As above-mentioned phenols, can enumerate: phenol, cresol, catechol, pyrogallol, to benzene two
Phenol, hydroquinone monomethyl ether, bisphenol-A, Bisphenol F, 4,4'-Dihydroxybenzophenone, bisphenol S, phenolic aldehyde
Resin, cresol novolac resin (cresol novolac resin) etc..
As above-mentioned carboxylic acids, can enumerate: formic acid, acetic acid, propanoic acid, butanoic acid, the fat of vegetable and animals oils
Fat acid, fumaric acid, maleic acid, adipic acid, dodecanedioic acid, trimellitic acid, Pyromellitic Acid,
Polyacrylic acid, phthalic acid, M-phthalic acid, p-phthalic acid etc..In addition, it is possible to enumerate:
Lactic acid, citric acid, hydroxycaproic acid (oxycaproic acid) etc. have the compound of hydroxyl and carboxyl simultaneously.
As above-mentioned amine, can enumerate: monomethyl amine, dimethylamine, monoethyl amine, diethylamine, propylamine,
Monobutylamine (MBA), dibutyl amine, amylamine, hexylamine, cyclohexylamine, octylame, lauryl amine, 4,4 '-diaminourea hexichol
Methylmethane, isophorone diamine, toluenediamine, cyclohexanediamine, xylylene diamine, diethylidene
Triamine, trien, ethanolamine etc..
As above-mentioned thio-alcohol, can enumerate: the mercapto classes such as methanthiol, ethyl mercaptan, propanethiol, phenylmercaptan.；
Glycol dimercaptopropionate (ethylene glycol dimercaptopropionic acid ester), three hydroxyl first
Base propane tri-thiol propionic ester (trimethylolpropane trimercaptopropionic acid ester), season
The sulfydryls such as penta tetrol four mercaptopropionic acid ester (pentaerythritol tetramercaptopropionic acid ester)
Propanoic acid or the polyol ester etc. of mercaptopropionic acid.
Additionally, as the organic compound of active hydrogen-based, it is possible to enumerate: polyvinyl alcohol, poly-second
Vinyl acetate partial hydrolystate, starch, cellulose, cellulose acetate, cellulose acetate-butyrate, hydroxyl
Ethyl cellulose, acrylic polyol resin, styrene-propene alcohol copolymer resins, styrene-maleic acid
Copolymer resins, alkyd resin, polyester polyol resin, polyester carboxylic acid resin, polycaprolactone polyol
Resin, polypropylene polyhydric alcohol, polytetramethylene glycol (polytetramethylene glycol) etc..
The organic compound of this active hydrogen-based, it is possible in its skeleton, there is unsaturated double-bond.Make
For concrete example, can enumerate: propenyl, acrylic acid, methacrylic acid, 3-cyclohexene methanol, tetrahydrochysene are adjacent
Phthalic acid etc..
The organic compound of the most active hydrogen-based, can be used alone or two or more is applied in combination.
In above-mentioned formula (A-1), n1, n2 ..., nk separately represent the integer of 0～100, its summation
It is 1～100.Additionally, k represents the integer of 1～100.
N1, n2 ..., nk are separately preferably the integer of 2～10, the integer of more preferably 3～6.
Additionally, n1, n2 ..., the summation of nk are preferably 4～30, more preferably 4～20.By by above-mentioned always
Be set as more than 4, the crosslink density after solidification can be improved, such that it is able to improve hardness.Additionally,
By above-mentioned summation is set as less than 30, dissolubility in a solvent can be improved, such that it is able to carry
High operability.
In above-mentioned formula (A-1), A is to have the oxygen hexamethylene skeleton of substituent B or have substituent B
Oxygen norborene skeleton, is represented A by above-mentioned formula (A-2) or (A-3).Preferably, by above-mentioned formula (A-2) table
Show A.It addition, k A can be respectively identical can also be different.
In the epoxide represented by above-mentioned formula (A-1), it is necessary to containing the above-mentioned formula (A-4) of more than 1
Represented group, this group is The more the better.On the other hand, the group represented by above-mentioned formula (A-6) is more
Few the best.
Epoxide represented by above-mentioned formula (A-1), can pass through Japanese Patent Laid-Open 7-119270
Following manner manufacture described in publication: using the organic compound of active hydrogen-based as initiator,
With peracetic acid or hydrogen peroxide etc., to making 4 vinyl cyclohexene-1-oxide or 5-vinyl bicyclo-
[2.2.1] hept-2-ene"-2-oxide carries out ring-opening polymerisation with the mixture of the compound with 1 epoxy radicals
The polyether resin obtained (that is, has vinyl sidechain and hexamethylene skeleton or has vinyl sidechain
Polyether resin with norborene skeleton) carry out epoxidation.
As suitable commercially available product, can enumerate: EHPE3150 (n1～nk of ダ イ セ Le chemical industry society
Summation average out to 15).
Additionally, as epoxide, it is possible to use cycloaliphatic epoxy.
As cycloaliphatic epoxy, can enumerate: 3,4-epoxycyclohexyl-methyl-3 ', 4 '-epoxy hexamethylene
Alkane carboxylate, 2-(3,4-epoxycyclohexyl-5,5-spiral shell-3,4-epoxy radicals) cyclohexane-methyl-dioxane
(2-(3,4-epoxycyclohexyl-5,5-spiro-3,4-epoxy) cyclohexane-meta-dioxane), double
(3,4-epoxycyclohexyl-methyl) adipate ester (adipate), double (3,4-epoxy radicals-6-methylcyclohexylmethyl)
Adipate ester, 3,4-epoxy radicals-6-methylcyclohexyl-3 ', 4 '-epoxy radicals-6 '-methylcyclohexanecarboxylic acid ester, ε-
Caprolactone modification 3,4-epoxycyclohexyl-methyl-3 ', 4 '-epoxycyclohexane carboxylate, trimethyl caprolactone change
Property 3,4-epoxycyclohexyl-methyl-3 ' 4 '-epoxycyclohexane carboxylate, Beta-methyl-δ-valerolactone modification 3,4-ring
Oxygen cyclohexyl methyl-3 ', 4 '-epoxycyclohexane carboxylate, di-2-ethylhexylphosphine oxide (3,4-7-oxa-bicyclo[4.1.0), ethylene glycol
Two (3,4-epoxycyclohexyl-methyl) ether, ethylene double (3,4-epoxycyclohexane carboxylate), epoxy basic ring six
Hydrogen dioctyl phthalate, epoxy basic ring di-2-ethylhexyl hexahydrophthalate etc..
As suitable commercially available product, can enumerate: the セ ロ キ サ イ De of ダ イ セ Le chemical industry society
2021,2021P, 2081,2083,2085, エ Port リ mono-De GT-300, GT-301, GT-302,
GT-400,401,403 etc., or the サ Application ト mono-ト ST-3000 of newly daily use chemicals エ Port キ シ manufacture society,
ST-4000, ST-5080, ST-5100 etc..
Additionally, as epoxide, it is possible to use: novolak type epoxy compound, bisphenol A-type ring
Oxygen compound, cresol novolac type epoxy compound, biphenyl type epoxy compound etc..
As the phenolic epoxy that above-mentioned novolak type epoxy compound, preferably epoxide equivalent are 200～220
Compound.As commercially available product, can enumerate: the エ ピ Network ロ Application N-660 of big Japan イ Application キ society, N-665,
N-670、N-673、N-680、N-690、N-695、N-685-EXP、N-672-EXP、N-655-EXP-S、
N-865、N-865-80M、YDCN-701、YDCN-702、YDCN-703、YDCN-704、
YDCN-704L etc..
As the commercially available product of above-mentioned bisphenol A type epoxy compound, can enumerate: new daily use chemicals エ Port キ シ manufactures
The エ Port ト mono-ト YD-115 of society, YD-118T, YD-127, YD-128, YD-134, YD-8125,
YD-7011R, ZX-1059, YDF-8170, YDF-170 etc., or Na ガ セ ケ system テ ツク ス society
デ Na U one Le EX-1101, EX-1102, EX-1103 etc. of system, or ダ イ セ Le chemical industry society system
プ ラ Network セ Le GL-61, GL-62, G101, G102 etc..
As the commercially available product of above-mentioned cresol novolac type epoxy compound, can enumerate: new daily use chemicals エ Port キ シ system
The エ Port ト mono-ト YDPN-638 of society, YDPN-701, YDPN-702, YDPN-703,
YDPN-704 etc., or デ Na U one Le-125 etc. of Na ガ セ ケ system テ ツク ス society.
As above-mentioned biphenyl type epoxy compound, can enumerate: 3,5,3 ', 5 '-tetramethyl-4,4 '-two shrinks are sweet
Oil base biphenyl etc..
Preferably, the photosensitive composition of the present invention, except containing above-mentioned epoxide with
Outward, other binder compound is contained further.As other binder compound this, can
Enumerate: (methyl) acrylic acid, fumaric acid, maleic acid, monomethyl fumarate, monomethyl ester, (first
Base) acrylic acid 2-hydroxyl ethyl ester, glycol monoethyl ether (methyl) acrylate, ethylene glycol monoethyl ether (methyl) third
Olefin(e) acid ester, (methyl) glycerol acrylate, (methyl) acrylamide, acrylonitrile, methacrylonitrile, (first
Base) acrylic acid methyl ester., (methyl) ethyl acrylate, (methyl) Isobutyl 2-propenoate, (methyl) acrylic acid 2-
Octyl Nitrite, (methyl) benzyl acrylate, ethylene glycol bisthioglycolate (methyl) acrylate, diethylene glycol two propylene
Acid esters, triethylene glycol two (methyl) acrylate, TEG two (methyl) acrylate, butanediol two
Methacrylate, propylene glycol two (methyl) acrylate, trimethylolpropane tris (methyl) acrylate,
Tetra methylol propane four (methyl) acrylate, tetramethylolmethane three (methyl) acrylate, tetramethylolmethane four
(methyl) acrylate, dipentaerythritol five (methyl) acrylate, dipentaerythritol six (methyl) propylene
Acid esters, two (methyl) acrylic acid-1, the own diester of 6-, cardo-epoxy diacrylate (cardo epoxy
Etc. diacrylate) there is the oligomeric species of polymerization；Make polyalcohols and monoacid or polyprotic acid condensation gained
Polyester prepolyer and (methyl) acrylic acid polyester (methyl) acrylate of reacting and obtaining；Make many
After unit's alcohol reacts with the compound with 2 NCOs, then react with (methyl) acrylic acid, obtained
Polyurethane (methyl) acrylate obtained；Make bisphenol A type epoxy resin, bisphenol f type epoxy resin, double
Phenol S type epoxy resin, phenol or cresol novolac epoxy resin, solvable phenol aldehyde type epoxy resin, three
Phenolic group methane type epoxy resin, polycarboxylic acids poly glycidyl ester, polyhydric alcohol poly glycidyl ester, fat
The epoxy resin such as race or cycloaliphatic epoxy resin, amine epoxy resin, dihydroxy benzene-type epoxy resin and (first
Base) acrylic acid epoxy radicals (methyl) acrylate etc. that reacts and obtain.Additionally, can be suitable for
Use makes multi-anhydride and epoxy (methyl) acrylate react the resin formed.
Additionally, as other binder compound, it is possible to suitably make to obtain using the following method
Resin, i.e. make epoxide react with the carboxylic acid compound containing unsaturated group and obtain reactant,
This reactant is made to react with multi-anhydride and obtain resin further.Wherein, from the curable of himself
From the standpoint of higher, the preferably compound represented by following formula (A-7).
[changing 4]
In above-mentioned formula (A-7), X represents with the group represented by following formula (A-8).
[changing 5]
In above-mentioned formula (A-8), Ra3Separately represent alkyl that hydrogen atom, carbon number are 1～6,
Or halogen atom, Ra4Separately representing hydrogen atom or methyl, W represents singly-bound or following formula
(A-9) group represented by.
[changing 6]
Additionally, in above-mentioned formula (A-7), Y represents removing anhydride group (-CO-O-CO-) from dicarboxylic anhydride
Residue.As dicarboxylic anhydride, can enumerate: maleic anhydride, succinic anhydrides, itaconic anhydride, adjacent benzene
In dicarboxylic acid anhydride, tetrabydrophthalic anhydride, hexahydrophthalic anhydride, methyl, methine tetrahydrochysene is adjacent
Phthalate anhydride (methyl endomethylenetetrahydrophthalic anhydride), chlorendic anhydride,
Methyl tetrahydrophthalic anhydride, glutaric anhydride etc..
Additionally, in above-mentioned formula (A-7), Z represents the residue removing 2 anhydride group from tetracarboxylic dianhydride.
As tetracarboxylic dianhydride, include, for example: pyromellitic dianhydride, benzophenone tetracarboxylic dianhydride, connection
Benzene tertacarbonic acid's dianhydride, diphenyl ether tetracarboxylic dianhydride etc..
Additionally, in above-mentioned formula (A-7), m represents the integer of 0～20.
The acid value of the compound represented by above-mentioned formula (A-7), in terms of resin solid content, is preferably
10～150mgKOH/g, more preferably 70～110mgKOH/g.By acid value is set as
More than 10mgKOH/g, it is possible to obtain sufficiently developability.Additionally, by acid value is set as 150
Below mgKOH/g, it is possible to obtain sufficiently curable, can improve superficiality.
Additionally, the matter average molecular weight of the compound represented by above-mentioned formula (A-7) is preferably 1000～40000,
More preferably 2000～30000.By matter average molecular weight is set as more than 1000, can improve heat-resisting
Property and film-strength.Additionally, by matter average molecular weight is set as less than 40000, it is possible to obtain fully
The dissolubility to imaging liquid.
Relative to the solid constituent of photosensitive composition of the present invention, the content of (A) composition is preferred
It is 30～90 mass %, more preferably 50～70 mass %.Additionally, relative to (A) composition total amount, ring
The ratio of oxygen compound is preferably 30～70 mass %, more preferably 40～60 mass %.By by epoxy
The ratio of compound is set as more than 30 mass %, can improve chemical resistance and against weather.Additionally,
By the ratio of epoxide is set as below 70 mass %, it is possible to prevent sensitivity or developability
Decline.
<(B) photopolymerization monomer>
As (B) photopolymerization monomer (hereinafter also referred to " (B) composition "), it is not particularly limited, permissible
Use known monofunctional monomer or polyfunctional monomer.
As above-mentioned monofunctional monomer, can enumerate: (methyl) acrylamide, methylol (methyl) acryloyl
Amine, methoxy (methyl) acrylamide, ethoxyl methyl (methyl) acrylamide, propoxy methyl (first
Base) acrylamide, butoxymethoxy methyl (methyl) acrylamide, N-methylol (methyl) acrylamide,
N-methylol (methyl) acrylamide, (methyl) acrylic acid, fumaric acid, maleic acid, maleic anhydride, clothing
Health acid, itaconic anhydride, citraconic acid, citraconic anhydride, butenoic acid, 2-acrylamide-2-methylpropane sulphur
Acid, tert-butyl acrylamide sulfonate (tert-butyl acrylamide sulfonic acid), (methyl) acrylic acid
Methyl ester, (methyl) ethyl acrylate, (methyl) butyl acrylate, (methyl) 2-EHA,
(methyl) cyclohexyl acrylate, (methyl) acrylic acid 2-hydroxyl ethyl ester, (methyl) acrylic acid 2-hydroxypropyl acrylate, (first
Base) acrylic acid 2-hydroxy butyl ester, (methyl) acrylic acid 2-phenoxy group-2-hydroxypropyl acrylate, 2-(methyl) acryloyl-oxy-2-
Hydroxypropylphthalate, glycerol list (methyl) acrylate, (methyl) tetrahydrofurfuryl acrylate, two
Methylamino (methyl) acrylate, (methyl) glycidyl acrylate, 2,2,2-trifluoroethyls (methyl) third
Olefin(e) acid ester, 2,2,3,3-tetra-fluoropropyl (methyl) acrylate, half (methyl) of phthalic acid derivatives
Acrylate etc..These monofunctional monomers, can be used alone or two or more is applied in combination.
On the other hand, as above-mentioned polyfunctional monomer, can enumerate: ethylene glycol bisthioglycolate (methyl) acrylate,
Diethylene glycol two (methyl) acrylate, TEG two (methyl) acrylate, propylene glycol two (methyl)
Acrylate, polypropylene glycol two (methyl) acrylate, butanediol two (methyl) acrylate, new penta 2
Alcohol two (methyl) acrylate, 1,6-hexanediol two (methyl) acrylate (1,6-hexane glycol di (meth)
Acrylate), trimethylolpropane tris (methyl) acrylate, two (methyl) glycerol acrylate, Ji Wusi
Alcohol triacrylate, tetramethylol methane tetraacrylate, Dipentaerythritol Pentaacrylate, two seasons penta 4
Alcohol six acrylate, tetramethylolmethane two (methyl) acrylate, tetramethylolmethane three (methyl) acrylate,
Tetramethylolmethane four (methyl) acrylate, dipentaerythritol five (methyl) acrylate, dipentaerythritol six
(methyl) acrylate, 2, double (4-(methyl) acryloxy diethoxy phenyl) propane of 2-, 2,2-is double
(4-(methyl) acryloxypolyethoxyphenyl) propane, 2-hydroxyl-3-(methyl) acryloxypropyl
(methyl) acrylate, Ethylene glycol diglycidyl ether two (methyl) acrylate, diethylene glycol diglycidyl
Glycerin ether two (methyl) acrylate, o-phthalic acid diglycidyl ester two (methyl) acrylate, sweet
Oil triacrylate, glycerol polyglycidyl ether poly-(methyl) acrylate, carbamate (methyl)
Acrylate (urethane (meth) acrylate) (that is, tolylene diisocyanate), trimethyl six methylene
Group diisocyanate and hexamethylene diisocyanate etc. are anti-with (methyl) acrylic acid 2-hydroxyl ethyl ester three's
Answer thing, di-2-ethylhexylphosphine oxide (methyl) acrylamide, (methyl) acrylamide methylene ether ((meth) acrylamide
Methylene ether), the multifunctional list such as the condensation substance of polyhydric alcohol and N-methylol (methyl) acrylamide
Body or triacryl formal (triacrylformal) etc..These multiple functional radical monomers, can be independent
Use or two or more is applied in combination.
Relative to (A) composition, the content of (B) composition is preferably 20～60 mass %, more preferably 30～50
Quality %.By being set within the above range, curable can be improved, pattern can be made to be formed and become
Obtain easily.
<(C) Photoepolymerizationinitiater initiater>
As (C) Photoepolymerizationinitiater initiater (hereinafter also referred to " (C) composition "), it is not particularly limited, can make
Use known Photoepolymerizationinitiater initiater.As this Photoepolymerizationinitiater initiater, can enumerate: 1-Phenylethanone.,
2,2-diethoxy acetophenones (2,2-diethoxyacetophenone), to dimethyl acetophenone, to diformazan ammonia
The acetophenones such as base propiophenone, dichloroacetophenone, trichloroacetophenone, p-tert.-butyl acetophenone；Hexichol
The benzophenones such as ketone, 2-chlorobenzophenone, p, p '-bis-(dimethylamino) benzophenone；Benzoinum first
The Benzoinum ethers such as ether, benzoin isopropyl ether, benzoin isobutyl ether；Thioxanthene, 2-diuril ton, 2,4-bis-
The sulphur compounds such as ethyl thioxanthene, 2-methyl thioxanthene, 2-isopropylthioxanthones；2-ethyl-anthraquinone, prestox anthracene
Quinone, 1,2-benzo anthraquinone (1,2-benzanthraquinone), 2,3-diphenyl anthraquinone
Anthraquinones such as (2,3-diphenylanthraquinone)；Benzoyl peroxide, dicumyl peroxide (cumene
The organic peroxide such as peroxide)；2-mercaptobenzimidazole, 2-mercaptobenzooxazole, 2-sulfydryl benzo
The mercaptan compounds such as thiazole；The imidazoles such as 2-(Chloro-O-Phenyl)-4,5-bis-(m-methoxyphenyl) imidazole dimer
Compound；To triaizine compounds such as methoxyl group triazines；2,4,6-tri-(trichloromethyl)-s-triazine, 2-methyl-4,6-
Double (trichloromethyl)-s-triazine, 2-[2-(5-methylfuran-2-base) ethylidine]-4,6-double (trichloromethyl)-
S-triazine, 2-[2-(furan-2-base) ethylidine]-4,6-double (trichloromethyl)-s-triazine, 2-[2-(4-diethyl
Amido-2-tolyl) ethylidine]-4,6-double (trichloromethyl)-s-triazine, 2-[2-(3,4-dimethoxy phenyl)
Ethylidine]-4,6-double (trichloromethyl)-s-triazine, 2-(4-anisyl)-4, double (trichloromethyl)-equal three of 6-
Piperazine, 2-(4-ethoxystyrene base)-4,6-double (trichloromethyl)-s-triazine, 2-(4-n-butoxy benzene
Base)-4, double (the trichloromethyl)-s-triazine of 6-etc. have the triaizine compounds of halomethyl；2-benzyl-2-diformazan ammonia
The aminoketone compounds such as base-1-(4-morphlinophenyl)-butane-1-ketone；Ethyl ketone-1-[9-ethyl-6-(2-methylbenzene
Formoxyl)-9H-carbazole-3-base] oxime ester compound etc. such as-1-(O-acetyl oxime).
In these compounds, from maintaining the sensitivity of photosensitive composition, raising fully
From the viewpoint of the rectilinear propagation of pattern, preferably oxime ester compound.As this oxime ester compound, preferably
Compound represented by following formula (C-1).
[changing 7]
In above-mentioned formula (C-1), Rc1Expression-NO2Or-CORc5.Additionally, Rc5Represent heterocyclic radical, condensed ring
Formula aromatic series base or aromatic series base, and substituent group can be contained.Rc2～Rc4Separately represent monovalence
Organic group.
As Rc5Represented heterocyclic radical, can enumerate: containing in nitrogen-atoms, sulphur atom and oxygen atom
At least one atom 5 rings more than heterocyclic radical, preferably 5 rings or the heterocyclic radical of 6 rings.As
Heterocyclic radical, include, for example: nitrogenous 5 yuan of ring groups such as pyrrole radicals, imidazole radicals, pyrazolyl；Pyridine radicals,
Nitrogenous 6 yuan of ring groups such as pyrazinyl, pyrimidine radicals, pyridazinyl；Thiazolyl, isothiazolyl etc. are nitrogenous containing sulfenyl；
The nitrogenous oxygen-containing group such as oxazolyl, isoxazolyl；Thienyl, thiapyran base etc. are containing sulfenyl；Furyl, pyrrole
Mutter the oxygen-containing group etc. such as base.Wherein, 1 nitrogen-atoms or the heterocyclic radical of sulphur atom are preferably comprised.In this heterocycle
Also condensed ring can be contained.As the heterocyclic radical containing condensed ring, include, for example benzothienyl etc..
As Rc5Represented condensed ring formula aromatic series base, can enumerate: naphthyl, anthryl, phenanthryl etc..This
Outward, as Rc1Represented aromatic series base, can enumerate phenyl.
Heterocyclic radical, condensed ring formula aromatic series base or aromatic series base also can have substituent group.Particularly at Rc5
In the case of aromatic series base, preferably there is substituent group.As this substituent group, can enumerate :-NO2、
-CN、-SO2Rc6、-CORc6、-NRc7Rc8、-Rc9、-ORc9、-O-Rc10-O-Rc11Deng.
Rc6Separately representing alkyl, these groups also can be replaced by halogen atom, it is possible to because of ehter bond,
Thioether bond, ester bond and be interrupted.Rc6In the carbon number of alkyl be preferably 1～5, include, for example:
Methyl, ethyl, propyl group, isopropyl, butyl, isobutyl group etc..
Rc7、Rc8Separately representing hydrogen atom, alkyl or alkoxyl, these groups also can be by halogen
Atom replaces, and wherein the alkylene moiety of alkyl and alkoxyl can be because of ehter bond, thioether bond or ester bond
And be interrupted.Additionally, Rc7Also can be with Rc8In conjunction with and form circulus.Rc7、Rc8In alkyl or
The carbon number of alkoxyl is preferably 1～5, include, for example: methyl, ethyl, propyl group, isopropyl,
Butyl, isobutyl group, methoxyl group, ethyoxyl, propoxyl group etc..
As Rc7Can be with Rc8In conjunction with the circulus formed, heterocycle can be enumerated.As this heterocycle, can
Enumerate the heterocycle at least containing more than 5 rings of nitrogen-atoms, the heterocycle of preferably 5～7 rings.In this heterocycle
Also condensed ring can be contained.Include, for example as heterocycle: piperidine ring, morpholine ring, thiomorpholine ring etc..
Wherein preferred morpholine ring.
Rc9Represent the alkyl that all or part of hydrogen atom can be replaced by halogen atom.Rc9In the carbon of alkyl
Atomic number is preferably 1～5, include, for example: methyl, ethyl, propyl group, isopropyl, butyl, isobutyl
Base etc..
Rc10、Rc11Separately representing alkyl, these groups also can be replaced by halogen atom, it is possible to because of,
Ehter bond, thioether bond, ester bond and be interrupted.Preferably carbon number and its concrete example and above-mentioned Rc6Say
Bright identical.
Wherein, as Rc5, preferably enumerate such as: pyrrole radicals, pyridine radicals, thienyl, thiapyran base,
Benzothienyl, naphthyl, there is the phenyl of substituent group.
In above-mentioned formula (C-1), Rc2Represent the organic group of monovalence.As this organic group, preferably-Rc12、
-ORc12、-CORc12、-SRc12、-NRc12Rc13Represented group.Rc12、Rc13Independently earth's surface
Showing alkyl, thiazolinyl, aryl, aralkyl or heterocyclic radical, these groups also can be by halogen atom, alkyl
Or heterocyclic radical replace, wherein the alkylene moiety of alkyl and aralkyl also can because of unsaturated bond, ehter bond,
Thioether bond, ester bond and be interrupted.In addition it is also possible to Rc12With Rc13In conjunction with being collectively forming with nitrogen-atoms again
Circulus.
As Rc12、Rc13Represented alkyl, preferably carbon number is the alkyl of 1～20, more preferably carbon
Atomic number is the alkyl of 1～5.As alkyl, include, for example: methyl, ethyl, n-pro-pyl, isopropyl
Base, normal-butyl, isobutyl group, sec-butyl, the tert-butyl group, n-pentyl, isopentyl, sec-amyl, uncle penta
Base, n-hexyl, n-heptyl, n-octyl, iso-octyl, secondary octyl, t-octyl, n-nonyl, different nonyl
The straight chain shapes such as base, positive decyl, isodecyl or the group of a chain.Additionally, this alkyl also can have
Substituent group.As having the alkyl of substituent group, include, for example: methoxyethoxyethyl, ethoxy
Base oxethyl ethyl, propoxyl group ethoxyethyl group, methoxy-propyl etc..
As Rc12、Rc13Represented thiazolinyl, preferably carbon number is the thiazolinyl of 1～20, more preferably carbon
Atomic number is the thiazolinyl of 1～5.As thiazolinyl, include, for example: vinyl (vinyl), pi-allyl, fourth
The group of the straight or brancheds such as thiazolinyl, ethylidine (ethenyl), propinyl.Additionally, this thiazolinyl also may be used
There is substituent group.As having the thiazolinyl of substituent group, include, for example 2-(benzothiazole-2-base) ethylidine
Deng.
As Rc12、Rc13Represented aryl, preferably carbon number is the aryl of 6～20, more preferably carbon
Atomic number is the aryl of 6～10.As aryl, include, for example: phenyl, tolyl, xylyl,
Ethylbenzene, naphthyl, anthryl, phenanthryl etc..
As Rc12、Rc13Represented aralkyl, preferably carbon number is the aralkyl of 7～20, more excellent
The aralkyl selecting carbon number to be 7～12.As aralkyl, include, for example: benzyl, Alpha-Methyl benzyl
Base, alpha, alpha-dimethylbenzyl, phenethyl, styryl etc..
As Rc12、Rc13Represented heterocyclic radical, can enumerate: containing nitrogen-atoms, sulphur atom and oxygen
Heterocyclic radicals more than 5 rings of at least one atom in atom, the heterocyclic radical of preferably 5～7 rings.This is miscellaneous
Ring group also can contain condensed ring.As heterocyclic radical, include, for example: pyrrole radicals, pyridine radicals, pyrimidine
Base, furyl, thienyl etc..
These Rc12、Rc13In, the alkylene moiety of alkyl and aralkyl also can because of unsaturated bond, ehter bond,
Thioether bond, ester bond and be interrupted.
Additionally, as Rc12With Rc13In conjunction with the circulus formed, heterocycle can be enumerated.Miscellaneous as this
Ring, can enumerate the heterocycle at least containing more than 5 rings of nitrogen-atoms, the heterocycle of preferably 5～7 rings.Should
Heterocycle also can contain condensed ring.As heterocycle, include, for example: piperidine ring, morpholine ring, sulfur generation
Quinoline ring etc..
Wherein, as Rc2, most preferable, ethyl, propyl group, phenyl.
In above-mentioned formula (C-1), Rc3Represent the organic group of monovalence.As this organic group, preferably carbon number
It is the alkyl of 1～5, can have represented by the aryl that carbon number is 6～12 of substituent group, following formula (C-2)
Group or can have the heterocyclic radical of substituent group.Alternatively base, can enumerate and above-mentioned Rc5Situation
Identical group.As the aryl that carbon number is 6～12, can enumerate: phenyl, naphthyl, anthryl,
Phenanthryl etc..
[changing 8]
-Rc14-Rc15 (C-2)
In above-mentioned formula (C-2), Rc14Represent the alkylidene that carbon number is 1～5 that also can be interrupted by oxygen atom.
As this alkylidene, can enumerate: methylene, ethylidene, positive propylidene, isopropylidene, just Asia
Butyl, isobutylene, sec-butylidene, positive pentylidene, isopentylidene, secondary pentylidene straight or branched
Group.In these groups, Rc14Most preferably isopropylidene.
In above-mentioned formula (C-2), Rc15Expression-NRc16Rc17Represented any monovalent organic radical (Rc16、Rc17Respectively
Represent the organic group of monovalence independently).In this organic group, from improving the molten of Photoepolymerizationinitiater initiater
From the standpoint of solution property, if Rc15Structure be the structure represented by following formula (C-3), the most preferably.
[changing 9]
In above-mentioned formula (C-3), Rc18、Rc19Separately represent the alkyl that carbon number is 1～5.Make
For this alkyl, can enumerate: methyl, ethyl, n-pro-pyl, isopropyl, normal-butyl, isobutyl group,
Sec-butyl, the tert-butyl group, n-pentyl, isopentyl, sec-amyl, tertiary pentyl etc..Wherein, Rc18、Rc19
Most preferably methyl.
As Rc3Represented heterocyclic radical, can enumerate: containing in nitrogen-atoms, sulphur atom and oxygen atom
At least one atom 5 rings more than heterocyclic radical, preferably 5 rings or the heterocyclic radical of 6 rings.
As heterocyclic radical, include, for example: the nitrogenous 5 yuan ring groups such as pyrrole radicals, imidazole radicals, pyrazolyl；
The nitrogenous 6 yuan ring groups such as pyridine radicals, pyrazinyl, pyrimidine radicals, pyridazinyl；Thiazolyl, isothiazolyl
Etc. nitrogenous containing sulfenyl；The nitrogenous oxygen-containing group such as oxazolyl, isoxazolyl；The sulfur-bearings such as thienyl, thiapyran base
Base；The oxygen-containing group such as furyl, pyranose etc..Wherein, 1 nitrogen-atoms or sulphur atom are preferably comprised
Heterocyclic radical.This heterocycle also can contain condensed ring.As the heterocyclic radical containing condensed ring, include, for example benzene
Bithiophene base etc..
Additionally, heterocyclic radical also can have substituent group.Alternatively base, can enumerate and above-mentioned Rc5Feelings
The group that condition is identical.
In above-mentioned formula (C-1), Rc4Represent the organic group of monovalence.Wherein, preferably carbon number is 1～5
Alkyl.As this alkyl, can enumerate: methyl, ethyl, n-pro-pyl, isopropyl, normal-butyl,
Isobutyl group, sec-butyl, the tert-butyl group, n-pentyl, isopentyl, sec-amyl, tertiary pentyl etc..Wherein, Rc4
Most preferably methyl.
Relative to the solid constituent of photosensitive composition of the present invention, the content of (C) composition is preferred
It is 0.1～50 mass %, more preferably 1～45 mass %.By the content of (C) composition is set as above-mentioned model
In enclosing, it is possible to obtain sufficiently thermostability and chemical resistance, can suppress to solidify bad simultaneously.
<(D) coloring agent>
As (D) coloring agent (hereinafter also referred to " (D) composition "), it is not particularly limited, it is possible to use in the past
Known coloring agent.
As coloring agent, include, for example: カ ラ mono-イ Application デ Star Network ス (C.I.；THE SOCIETY
The distribution of OF DYERS AND COLOURISTS society) in be classified into the change of pigment (pigment)
Compound, specifically can enumerate the coloring agent enclosing following カ ラ mono-イ Application デ Star Network ス (C.I.) sequence number.
C.I. pigment yellow 1 (below owing to " C.I. pigment yellow " is identical so only recording sequence number), 3,11,
12、13、14、15、16、17、20、24、31、53、55、60、61、65、71、73、
74、81、83、86、93、95、97、98、99、100、101、104、106、108、109、
110、113、114、116、117、119、120、125、126、127、128、129、137、
138、139、147、148、150、151、152、153、154、155、156、166、167、
168、175、180、185；
C.I. pigment orange 1 (below owing to " C.I. pigment orange " is identical so only recording sequence number), 5,13,
14、16、17、24、34、36、38、40、43、46、49、51、55、59、61、63、
64、71、73；
C.I. pigment violet 1 (below owing to " C.I. pigment violet " is identical so only recording sequence number), 19,23,
29、30、32、36、37、38、39、40、50；
C.I. paratonere 1 (below owing to " C.I. paratonere " is identical so only recording sequence number), 2,3,4,
5、6、7、8、9、10、11、12、14、15、16、17、18、19、21、22、23、30、
31、32、37、38、40、41、42、48:1、48:2、48:3、48:4、49:1、49:
2、50:1、52:1、53:1、57、57:1、57:2、58:2、58:4、60:1、63:
1、63:2、64:1、81:1、83、88、90:1、97、101、102、104、105、106、
108、112、113、114、122、123、144、146、149、150、151、155、166、
168、170、171、172、174、175、176、177、178、179、180、185、187、
188、190、192、193、194、202、206、207、208、209、215、216、217、
220、223、224、226、227、228、240、242、243、245、254、255、264、
265；
C.I. pigment blue 1 (below owing to " C.I. alizarol saphirol " is same so only recording sequence number), 2,15,
15:3、15:4、15:6、16、22、60、64、66；
C.I. pigment Green 7, C.I. pigment green 36, C.I. naphthol green 37；
C.I. pigment brown 23, C.I. pigment brown 25, C.I. pigment brown 26, C.I. pigment brown 28；
C.I. pigment black 1, pigment black 7.
Additionally, as coloring agent, black pigment is preferably used.As black pigment, can enumerate: charcoal
Black, the metal of titanium is black (titan black), copper, ferrum, manganese, cobalt, chromium, nickel, zinc, calcium, silver, stannum etc.
Oxide, composite oxides, metal sulfide, metal sulfate, metal alloy or metal carbonate
Deng, Organic substance or inorganic matter all can various pigment.In these black pigments, more preferably use and have
The white carbon black of high light-proofness.
As white carbon black, it is possible to use channel black, furnace black, pyrolytic carbon black, lamp black white carbon black etc. are known
White carbon black, but channel black or furnace black are preferably used.
Relative to the solid constituent of photosensitive composition of the present invention, the content of (D) composition is preferred
It is 5～70 mass %, more preferably 25～55 mass %, more preferably 30～50 mass %.
(S) organic solvent
Preferably, the photosensitive composition of the present invention contains the organic solvent for dilution.
As this organic solvent, can enumerate: glycol monoethyl ether, ethylene glycol monoethyl ether, ethylene glycol list positive third
Ether, ethylene glycol mono-n-butyl ether, diethylene glycol monomethyl ether, diethylene glycol monoethyl ether, diethylene glycol list are just
Propyl ether, diethylene glycol mono-n-butyl ether, triethylene glycol monomethyl ether, Triethylene glycol ethyl ether, propylene glycol list
Methyl ether, dihydroxypropane single-ether, propylene glycol list positive propyl ether, propylene glycol mono-n-butyl ether, dipropylene glycol list first
Ether, DPE, dipropylene glycol list positive propyl ether, dipropylene glycol mono-n-butyl ether, tripropylene glycol
(gathering) the alkylene glycol monoalkyl ethers classes such as monomethyl ether, tripropylene glycol list ether；Glycol monoethyl ether acetic acid
Ester, ethylene glycol monoethylether acetate, diethylene glycol monomethyl ether acetas, diethylene glycol monoethyl ether acetic acid
(gathering) alkylene glycol monoalkyl ethers such as ester, propylene glycol methyl ether acetate, propylene glycol monoethyl ether acetate
Acetate esters；Diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether, diethylene glycol diethyl ether, four
Other ethers such as hydrogen furan；The ketones such as methyl ethyl ketone, Ketohexamethylene, 2-heptanone, 3-heptanone；2-hydroxyl
The lactic acid alkyl ester classes such as methyl propionate, 2 hydroxy propanoic acid ethyl ester；2-hydroxy-2-methyl ethyl propionate, 3-
Methoxy methyl propionate, 3-methoxypropionate, 3-ethoxypropanoate, 3-ethoxy-propionic acid second
Ester, ethoxy ethyl acetate, hydroxyl ethyl acetate, 2-hydroxy-3-methyl methyl butyrate, 3-methyl-3-
2-Methoxyacetic acid butyl ester (3-methyl-3-methoxy butyl acetate), 3-methyl-3-methoxypropionic acid fourth
Ester (3-methyl-3-methoxy butyl propionate), ethyl acetate, n-propyl acetate, isopropyl acetate
Ester, n-butyl acetate, isobutyl acetate, formic acid n-pentyl ester, isoamyl acetate, n-butyl propionate,
Ethyl n-butyrate., propyl butyrate, isopropyl isobutyrate, butanoic acid N-butyl, methyl pyruvate, acetone acid
Ethyl ester, acetone acid n-propyl, methyl acetoacetate, ethyl acetoacetate, 2-ethyl acetoacetate etc. its
His esters；The arene such as toluene, dimethylbenzene；N-Methyl pyrrolidone, DMF,
The amide-types etc. such as N,N-dimethylacetamide.These organic solvents, can be used alone or 2 kinds with
On be applied in combination.
In these organic solvents, propylene glycol monomethyl ether, ethylene glycol monomethyl ether acetate, propylene glycol list first
Ether acetic acid ester, propylene glycol monoethyl ether acetate, diethylene glycol dimethyl ether, diethylene glycol methyl ethyl ether,
Ketohexamethylene, acetic acid 3-methoxybutyl are to (A) composition, (B) composition, the dissolving of (C) composition display excellence
Property, and the dispersibility of the insoluble compositions such as black pigment can be improved, the most preferably.
(S) content of composition preferably makes the solid component concentration of photosensitive composition of the present invention become
It it is the amount of 5～30 mass %.
<other compositions>
The photosensitive composition of the present invention can be added as needed on additive.As additive,
Can enumerate: sensitizer, curing accelerator, cross-linking agent, disperse additive, filler, attachment are made every effort to promote
Enter agent, antioxidant, UV absorbent, anti flocculant, thermal polymerization inhibitor, defoamer, table
Face activating agent etc..
<preparation method of photosensitive composition>
The photosensitive composition of the present invention can pass through all above-mentioned each compositions in blender
Mixed and obtained.It addition, in order to make resulting composition become uniform, available membrane filter enters
Row filters.
" contact panel and display device "
The contact panel of the present invention has and uses consolidating of being formed of photosensitive composition of the present invention
Change resin pattern.Additionally, the display device of the present invention has the contact panel of the present invention.
In order on contact panel formed solidified resin pattern, first by coating roller, reverse coating machine,
The contact transfer printing type apparatus for coating such as bar coating machine or rotator (rotary apparatus for coating), curtain flowing
The non-contact type apparatus for coating such as coating machine, coat base by the photosensitive composition of the present invention
On plate.
Then, applied photosensitive composition is dried, forms film.For
Drying means is not particularly limited, such as, can use any one method following: (1) utilizes hot plate to exist
60～120 seconds dry methods are carried out at a temperature of 80～120 DEG C, preferably 90～100 DEG C；(2) in room temperature
Lower placement a few hours～the method for a couple of days；(3) in warm air heater or infrared heater, tens of points are placed
Clock～a few hours are with the method removing solvent.
Then, through negative mask to this film irradiation ultraviolet radiation, excimer laser isoreactivity energy line
Carry out Partial exposure.The irradiation dose of energy line is also different because of the composition of photosensitive composition
And different, but it is preferably such as 20～200mJ/cm2Left and right.
Then, utilize developer solution to develop, thus make the film after exposure form the figure of intended shape
Case.Developing method is not particularly limited, infusion process, nebulization etc. can be used.As development
Liquid, can enumerate: the organics such as monoethanolamine, diethanolamine, triethanolamine, or sodium hydroxide,
The aqueous solution of potassium hydroxide, sodium carbonate, ammonia, quaternary ammonium salt etc..
Then, at a temperature of about 200～250 DEG C, bakee after the pattern after development is carried out.Now,
Preferably formed pattern is carried out blanket exposure.
Except in the above described manner by Partial exposure and development formed the method for solidified resin pattern with
Outward, ink-jet printer such as it is used as to form solidified resin pattern.In the case, incite somebody to action this
The injection of invention photosensitive composition to forming desired pattern shape on substrate, then drying,
Expose and bakee afterwards and form solidified resin pattern.
Conventionally the contact panel forming solidified resin pattern in the above described manner is assembled to display
In device, thus can manufacture the display device of the present invention.
[embodiment]
Hereinafter, embodiments of the invention are illustrated, but the scope of the present invention is not limited to these
Embodiment.Should illustrate, " portion ", " % " in below describing is respectively on the basis of quality.
<synthesis example 1>
First, in 500ml four-neck flask, bisphenol fluorene type epoxy resin (epoxide equivalent is 235) 235 is put into
G, tetramethyl ammonium chloride 110mg, 2,6-di-t-butyl-4-cresols 100mg and acrylic acid 72.0g,
While being blown into air with the speed of 25ml/ minute in flask while adding thermal melting at 90～100 DEG C.
Then, slowly heat up when solution keeps nebulousurine, be heated to 120 DEG C and make it melt completely.This
Time, solution gradually becomes clear viscous, continues stirring in this case.Therebetween, measure acid value, continue
Continuous heated and stirred is until acid value is less than 1.0mgKOH/g.Acid value reaches desired value and needs 12 hours.So
After, it is cooled to room temperature, it is thus achieved that water white transparency and the bisphenol fluorene represented by following formula (A-10) in solid, shaped
Type epoxy acrylate.
[changing 10]
Then, in the above-mentioned bisphenol fluorene type epoxy acrylate 307.0g obtained in this way, second is added
Acid 3-methoxybutyl 600g makes it dissolve, and is then mixed into benzophenone tetracarboxylic dianhydride 80.5g
With tetraethyl-ammonium bromide 1g, slowly heat up, react 4 hours at 110～115 DEG C.Confirming anhydride group
After disappearance, it is mixed into 1,2,3,6-tetrabydrophthalic anhydride 38.0g, react 6 hours at 90 DEG C,
Obtain Resin A 1.Infrared spectrum is utilized to confirm the disappearance of anhydride group.
This Resin A 1 is equivalent to the compound represented by above-mentioned formula (A-7).
<embodiment 1>
Each composition shown below is dissolved in acetic acid 3-methoxybutyl/Ketohexamethylene/propylene glycol monomethyl ether
In the mixed solvent of acetas=60/20/20 (mass ratio), so that solid component concentration is 15 mass %,
Mix 2 hours with blender, then filter with the membrane filter that aperture is 5 μm, prepare
Color sensation photosensitive resin composition.
Binder compound
The Resin A 1 obtained in synthesis example 1 ... 95 parts
(Resin A 2, matter average molecular weight is the copolymer of styrene/methacrylic acid=80/20 (mass ratio)
13000) ... 60 parts
" EHPE3150 " (ダ イ セ Le chemical industry society system；The 1 of 2,2-double (methylol)-n-butyl alcohols, 2-ring
Epoxide-4-(2-oxirane base) hexamethylene addition product；With reference to following formula (1)) ... 155 parts
Photopolymerization monomer
Dipentaerythritol acrylate (chemical medicine society of Japan system) ... 175 parts
Photoepolymerizationinitiater initiater
" OXE-02 " (BASF society system；-1-[9-ethyl-6-(2-methyl benzoyl)-9H-carbazole-3-base]
Ethyl ketone-1-(O-acetyl oxime)) ... 100 parts
Coloring agent
White carbon black (Yu Guo pigment society system) ... 450 parts
[changing 11]
<embodiment 2～5>
The composition of binder compound is changed shown in table 1, relative to binder compound total amount,
The ratio of epoxide is 40%, 30%, 20%, 10%, in addition, uses and embodiment 1
Same mode prepares photosensitive composition.Should illustrate, the numeric representation matter in table 1
Amount part.
<embodiment 6>
" セ ロ キ サ イ De 2021P " (the ダ イ セ Le represented by following formula (2) is used shown in table 1
Chemical industry society system) replace " EHPE3150 ", in addition, use mode similarly to Example 1
Prepare photosensitive composition.
[changing 12]
<embodiment 7～10>
The composition of binder compound is changed shown in table 1, relative to binder compound total amount,
The ratio of epoxide is 40%, 30%, 20%, 10%, in addition, uses and embodiment 6
Same mode prepares photosensitive composition.Should illustrate, the numeric representation matter in table 1
Amount part.
<embodiment 11>
" セ ロ キ サ イ De 2081 " (the ダ イ セ Le represented by following formula (3) is used shown in table 1
Chemical industry society system) replace " EHPE3150 ", in addition, use mode similarly to Example 1
Prepare photosensitive composition.
[changing 13]
<embodiment 12～15>
The composition of binder compound is changed shown in table 1, relative to binder compound total amount,
The ratio of epoxide is 40%, 30%, 20%, 10%, in addition, uses and embodiment
11 same modes prepare photosensitive composition.Should illustrate, the numeric representation in table 1
Mass parts.
<embodiment 16>
" セ ロ キ サ イ De 2000 " (the ダ イ セ Le represented by following formula (4) is used shown in table 2
Chemical industry society system) replace " EHPE3150 ", in addition, use side similarly to Example 1
Formula prepares photosensitive composition.
[changing 14]
<embodiment 17～20>
The composition of binder compound is changed shown in table 2, relative to binder compound total amount,
The ratio of epoxide is 40%, 30%, 20%, 10%, in addition, uses and embodiment
16 same modes prepare photosensitive composition.Should illustrate, the numeric representation in table 2
Mass parts.
<embodiment 21>
" セ ロ キ サ イ De 3000 " (the ダ イ セ Le represented by following formula (5) is used shown in table 2
Chemical industry society system) replace " EHPE3150 ", in addition, use side similarly to Example 1
Formula prepares photosensitive composition.
[changing 15]
<embodiment 22～25>
The composition of binder compound is changed shown in table 2, relative to binder compound total amount,
The ratio of epoxide is 40%, 30%, 20%, 10%, in addition, uses and embodiment 21
Same mode prepares photosensitive composition.Should illustrate, the numeric representation matter in table 2
Amount part.
<comparative example 1>
Shown in table 2, change the composition of binder compound, and binder compound does not contains ring
Oxygen compound, in addition, uses mode similarly to Example 1 to prepare coloring phototonus resin combination
Thing.Should illustrate, the numeric representation mass parts in table 2.
<evaluation>
[chemical-resistant evaluation]
Use spin coater (chemical industry society system is answered in TR25000: Tokyo) by embodiment 1～25, comparative example
In 1, the photosensitive composition of preparation coats glass substrate (Corning society system, E2K glass)
On, carry out 120 seconds being dried at 90 DEG C, thus form the film that thickness is 1.8 μm.Then, mirror is used
Face projection aligner (mirror projection aligner) (TME-150RTO: ト プ コン society system)
To this film irradiation ultraviolet radiation (wavelength 365nm, irradiation dose 50mJ).Then, in circulating baker,
Bakee after carrying out at 230 DEG C 20 minutes, thus obtain cured film.
The glass substrate that will be formed with this cured film is placed on the etching solution of 40 DEG C
(H3PO4/CH3COOH/HNO3/H2O=65/3/12/22) soak 1 minute in, after washing, pass through air blast
Carry out except water.Additionally, the glass substrate that will be formed with cured film is placed on the stripper (DMSO/ of 60 DEG C
Monoethanolamine=30/70) in soak 1 minute, after washing, carried out except water by air blast.
Then, in order to evaluate the chemical resistance of cured film, and reticulate pattern test is carried out.Specifically, according to
ISO2409 (ASTM D-3359), (is indulging crosscutting for cured film one-tenth 100 lattice (mesh) with the interval of 2.0mm
Each cutting 11 times on transverse direction), make adhesive tape be adhered firmly to this crosscutting position, shell the most rapidly
From adhesive tape, check that cured film is the most peeling-off, be evaluated to B6 grade of class 5 with grade 0B.
Result is such as table 1 below, shown in 2.
[evaluation of against weather]
Use photosensitive composition prepared in embodiment 1～25, comparative example 1, according to
Above-mentioned [chemical-resistant evaluation] same mode forms cured film on the glass substrate.
Use weather-proof tester (Xenon X75: ス ガ testing machine society system) that this cured film is implemented weatherability
Property test.Specifically, by temperature 60 C, humidity 100%RH, 1 exposure experiment having UV and temperature
50 DEG C, humidity 100%RH, 1 dark test irradiating without UV is as 1 circulation (8 hours), implementation
25 circulations (200 hours).
Then, in order to evaluate the against weather of cured film, use same with above-mentioned " chemical-resistant evaluation "
The mode of sample carries out reticulate pattern test.Result is such as table 1 below, shown in 2.
[table 1]
[table 2]
From in table 1,2, using the embodiment containing epoxide as binder compound
In the case of the photosensitive composition of 1～25, chemical resistance test after reticulate pattern test with
And in the reticulate pattern test the two test after weathering test, the adhesiveness of more than display level 0B.
Wherein, in the case of being 40～50% relative to the ratio of binder compound total amount epoxide,
The adhesiveness of display level 5B in reticulate pattern test after chemical resistance is tested, after weathering test
Reticulate pattern test in the adhesiveness of more than display level 3B, particularly using EHPE3150 as ring
In the embodiment 1,2 of oxygen compound, the reticulate pattern test after chemical resistance is tested and against weather examination
In reticulate pattern test the two test after testing, the adhesiveness of display level 5B.
To this, in the coloring using the comparative example 1 not containing the epoxide as binder compound
In the case of photosensitive polymer combination, display level 0B in the reticulate pattern test after weathering test
Adhesiveness, but due to chemical resistance the most poor thus in etch processes or foliation process film send out
Therefore and reticulate pattern test chemical resistance test after is not carried out raw peel off,.
Claims (5)
1., for a photosensitive composition for contact panel, it contains (A) binding agent chemical combination
Thing, (B) photopolymerization monomer, (C) Photoepolymerizationinitiater initiater and (D) coloring agent, and described (A) is viscous
Knot immunomodulator compounds comprises by the epoxide represented by following formula (A-1) and by following formula (A-7) institute
The compound represented:
[changing 1]
In formula, Ra1It it is the residue having and eliminating activity hydrogen-based in the organic compound of k activity hydrogen-based；
N1, n2 ..., nk separately represent the integer of 0～100, and its summation is 1～100；K represents
The integer of 1～100；A is to have the oxygen hexamethylene skeleton of substituent B or have the oxygen of substituent B
Norborene skeleton, is represented by following formula (A-2) or (A-3)；
[changing 2]
In formula, B is separately by the group represented by following formula (A-4), formula (A-5) or formula (A-6)；
[changing 3]
Wherein, containing the group represented by above-mentioned formula (A-4) of more than 1 in this epoxide；Ra2
Represent alkyl, alkyl-carbonyl or aryl carbonyl；
[changing 4]
In above-mentioned formula (A-7), X represents that Y represents from dicarboxylic acids with the group represented by following formula (A-8)
Removing the residue of anhydride group (-CO-O-CO-) in acid anhydride, Z represents 2 anhydride of removing from tetracarboxylic dianhydride
The residue of base, m represents the integer of 0～20；
[changing 5]
In above-mentioned formula (A-8), R3aSeparately represent alkyl that hydrogen atom, carbon number are 1～6,
Or halogen atom, R4aSeparately representing hydrogen atom or methyl, W represents singly-bound or following formula
(A-9) group represented by；
[changing 6]
2. the photosensitive composition for contact panel as claimed in claim 1, wherein,
Relative to the total amount of described (A) binder compound, the ratio of described epoxide is 40～60 matter
Amount %.
3. the photosensitive composition for contact panel as claimed in claim 1, wherein,
Described (D) coloring agent is black pigment.
4. a contact panel, its have use according to any one of claim 1 to 3 for touching
The solidified resin pattern that the photosensitive composition of control panel is formed.
5. a display device, it has the contact panel described in claim 4.
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| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2011-003136 | 2011-01-11 | ||
| JP2011003136A JP5744528B2 (en) | 2011-01-11 | 2011-01-11 | Colored photosensitive resin composition for touch panel, touch panel, and display device |
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| CN102591148B true CN102591148B (en) | 2016-12-14 |
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| JP (1) | JP5744528B2 (en) |
| KR (1) | KR101840055B1 (en) |
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| TWI537678B (en) * | 2011-09-30 | 2016-06-11 | Taiyo Ink Mfg Co Ltd | A photosensitive resin composition, a hardened film thereof, and a printed wiring board |
| JP6529213B2 (en) * | 2012-11-02 | 2019-06-12 | 日鉄ケミカル＆マテリアル株式会社 | Shading composition for touch panel and touch panel |
| KR102138381B1 (en) | 2012-11-02 | 2020-07-27 | 닛테츠 케미컬 앤드 머티리얼 가부시키가이샤 | Light-shielding resin composition for touch panel and touch panel using the same |
| JP6139894B2 (en) * | 2013-01-28 | 2017-05-31 | 新日鉄住金化学株式会社 | Black photosensitive composition for touch panel and touch panel |
| KR102162595B1 (en) * | 2013-03-21 | 2020-10-07 | 닛테츠 케미컬 앤드 머티리얼 가부시키가이샤 | Photosensitive resin composition for insulation layer, and cured product thereof |
| KR102082722B1 (en) | 2013-07-25 | 2020-02-28 | 도레이 카부시키가이샤 | Negative-type photosensitive white composition for touch panel, touch panel, and production method for touch panel |
| KR20160062002A (en) * | 2013-09-25 | 2016-06-01 | 도레이 카부시키가이샤 | Photosensitive light-shielding paste and process for producing laminated pattern for touch sensor |
| JP6307237B2 (en) * | 2013-09-30 | 2018-04-04 | 新日鉄住金化学株式会社 | Black photosensitive resin composition and cured film thereof, and color filter and touch panel having the cured film |
| JP6375236B2 (en) * | 2014-02-04 | 2018-08-15 | 新日鉄住金化学株式会社 | Photosensitive composition for light shielding film and cured product thereof |
| TWI659265B (en) * | 2014-03-07 | 2019-05-11 | 日商日鐵化學材料股份有限公司 | Black resin composition for light shielding film, substrate with light shielding film color filter and touch panel |
| JP6708365B2 (en) * | 2014-03-07 | 2020-06-10 | 日鉄ケミカル＆マテリアル株式会社 | Black photosensitive resin composition for light-shielding film, cured product using the same, and color filter and touch panel using the cured product as a light-shielding film |
| JP6388776B2 (en) * | 2014-03-12 | 2018-09-12 | 新日鉄住金化学株式会社 | White photosensitive resin composition, cured product using the same, and touch panel including the cured product as a constituent component |
| JP6479549B2 (en) * | 2014-04-21 | 2019-03-06 | 日鉄ケミカル＆マテリアル株式会社 | Alkali-soluble resin, photosensitive resin composition containing the same, cured product using the same, and touch panel and color filter containing the cured product as components |
| TWI536103B (en) * | 2014-05-08 | 2016-06-01 | 達興材料股份有限公司 | Photosensitive resin composition, cured film, and electronic device |
| JP2016160420A (en) * | 2015-03-05 | 2016-09-05 | Jnc株式会社 | Thermosetting composition, cured film, substrate with cured film, electronic component, and display device |
| JP2017021346A (en) | 2015-07-10 | 2017-01-26 | Jsr株式会社 | Curable composition, cured film, bezel and display device |
| JP6886782B2 (en) * | 2016-06-30 | 2021-06-16 | 東京応化工業株式会社 | A photosensitive resin composition, a cured film, a bank for partitioning a light emitting layer in an organic EL element, a substrate for an organic EL element, an organic EL element, a method for producing a cured film, a method for producing a bank, and a method for producing an organic EL element. |
| JP6912695B2 (en) * | 2016-12-16 | 2021-08-04 | ナガセケムテックス株式会社 | Composite resin composition and cured composite resin |
| JP6432075B2 (en) * | 2017-02-10 | 2018-12-05 | 東洋インキＳｃホールディングス株式会社 | Photosensitive resin composition and cured film |
| JP6921963B2 (en) * | 2017-03-31 | 2021-08-18 | 東友ファインケム株式会社Ｄｏｎｇｗｏｏ Ｆｉｎｅ−Ｃｈｅｍ Ｃｏ．， Ｌｔｄ． | Blue photosensitive resin composition, color filter and image display device manufactured using this |
| CN107179651A (en) * | 2017-06-07 | 2017-09-19 | 常州慧杰电气技术有限公司 | A kind of water soluble photosensitive |
| JP2020166254A (en) * | 2019-03-29 | 2020-10-08 | 日鉄ケミカル＆マテリアル株式会社 | Photosensitive resin composition, cured film formed by curing photosensitive resin composition, substrate with cured film, and method for manufacturing substrate with cured film |
| KR102483993B1 (en) * | 2019-09-02 | 2023-01-02 | 삼성에스디아이 주식회사 | Photosensitive resin composition, photosensitive resin layer using same, color filter and display device |
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| CN102591148A (en) | 2012-07-18 |
| KR20120081557A (en) | 2012-07-19 |
| JP5744528B2 (en) | 2015-07-08 |
| JP2012145699A (en) | 2012-08-02 |
| TWI578104B (en) | 2017-04-11 |
| KR101840055B1 (en) | 2018-03-19 |
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