TW200710449A - Process for proudcing color filter, color filter and liquid crystal display device - Google Patents

Process for proudcing color filter, color filter and liquid crystal display device

Info

Publication number
TW200710449A
TW200710449A TW095127580A TW95127580A TW200710449A TW 200710449 A TW200710449 A TW 200710449A TW 095127580 A TW095127580 A TW 095127580A TW 95127580 A TW95127580 A TW 95127580A TW 200710449 A TW200710449 A TW 200710449A
Authority
TW
Taiwan
Prior art keywords
color filter
photosensitive composition
liquid crystal
display device
crystal display
Prior art date
Application number
TW095127580A
Other languages
Chinese (zh)
Inventor
Tomohiro Kodama
Original Assignee
Fuji Photo Film Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Fuji Photo Film Co Ltd filed Critical Fuji Photo Film Co Ltd
Publication of TW200710449A publication Critical patent/TW200710449A/en

Links

Classifications

    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters
    • G02F1/133516—Methods for their manufacture, e.g. printing, electro-deposition or photolithography
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/201—Filters in the form of arrays
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/1303—Apparatus specially adapted to the manufacture of LCDs
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133512—Light shielding layers, e.g. black matrix
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/09—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers
    • G03F7/105—Photosensitive materials characterised by structural details, e.g. supports, auxiliary layers having substances, e.g. indicators, for forming visible images
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/133509—Filters, e.g. light shielding masks
    • G02F1/133514—Colour filters

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Nonlinear Science (AREA)
  • Optics & Photonics (AREA)
  • Engineering & Computer Science (AREA)
  • Chemical & Material Sciences (AREA)
  • Crystallography & Structural Chemistry (AREA)
  • Manufacturing & Machinery (AREA)
  • Architecture (AREA)
  • Mathematical Physics (AREA)
  • Structural Engineering (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
  • Materials For Photolithography (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)

Abstract

The present invention provides a process for producing a color filter by using a suitable photosensitive composition without photomask, whereby the line width variation of image is minimized and it can be formed with high prcesion, low-cost and have excellent display characteristic, a color filter, and a liquid crystal display device. Therefore, provided is a process for producing a color filter comprising an exposure step of exposing a photosensitive layer with repect to the photosensitive layer formed from a photosensitive composition and located on the surface of a substrate. The above photosensitive composition comprises a binder, a polymerizable compound, a colorant, and a photopolymerization initiator. The pigment contained in the above colorant has an average particle diameter of at most 100 nm and the content of the pigment based on the solid content of the above photosensitive composition is at least 30% by mass.
TW095127580A 2005-08-02 2006-07-28 Process for proudcing color filter, color filter and liquid crystal display device TW200710449A (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005224734A JP2007041239A (en) 2005-08-02 2005-08-02 Method for producing color filter, the color filter and liquid crystal display

Publications (1)

Publication Number Publication Date
TW200710449A true TW200710449A (en) 2007-03-16

Family

ID=37708672

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095127580A TW200710449A (en) 2005-08-02 2006-07-28 Process for proudcing color filter, color filter and liquid crystal display device

Country Status (5)

Country Link
JP (1) JP2007041239A (en)
KR (1) KR20080044846A (en)
CN (1) CN101238398A (en)
TW (1) TW200710449A (en)
WO (1) WO2007015393A1 (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI791125B (en) * 2018-12-26 2023-02-01 日商鷗爾熙製作所股份有限公司 Exposure device

Families Citing this family (13)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP5417994B2 (en) * 2008-07-17 2014-02-19 Ｊｓｒ株式会社 Radiation-sensitive composition for forming colored layer, color filter, and color liquid crystal display element
JP5579278B2 (en) * 2010-02-23 2014-08-27 エーエスエムエル ネザーランズ ビー．ブイ． Lithographic apparatus
CN102844713B (en) * 2010-02-23 2016-04-20 Asml荷兰有限公司 Lithographic equipment and device making method
WO2011104177A1 (en) * 2010-02-23 2011-09-01 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
CN102169091B (en) * 2011-05-23 2012-06-06 同济大学 Method for analyzing and measuring typical metal in circuit board of discarded electrical equipment
JP2013061619A (en) * 2011-08-24 2013-04-04 Toray Ind Inc Blue colorant composition for color filter and color filter substrate using the same
NL2009902A (en) 2011-12-27 2013-07-01 Asml Netherlands Bv Lithographic apparatus and device manufacturing method.
CN102890426B (en) * 2012-09-18 2014-05-14 天津芯硕精密机械有限公司 Oblique scan display method in direct writing photoetching system
KR102173148B1 (en) * 2015-02-04 2020-11-02 동우 화인켐 주식회사 Photosensitive resin comopsition, photocurable pattern formed from the same and image display comprising the pattern
JP7023601B2 (en) * 2016-11-14 2022-02-22 株式会社アドテックエンジニアリング Direct imaging exposure equipment and direct imaging exposure method
CN108227404B (en) * 2018-01-11 2020-09-22 合肥微睿光电科技有限公司 Platen for substrate exposure machine of liquid crystal display device
CN112236721A (en) * 2018-06-19 2021-01-15 Ev 集团 E·索尔纳有限责任公司 Method and device for exposing image points
JP2024044673A (en) * 2022-09-21 2024-04-02 ウシオ電機株式会社 Optical measuring device

Family Cites Families (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5776642A (en) * 1995-06-27 1998-07-07 Agfa Gevaert, N.V. Method for manufacturing a multicolor filter array element
JPH10142417A (en) * 1996-11-06 1998-05-29 Canon Inc Production of color filters and color liquid crystal display panel
JP2004176000A (en) * 2002-11-28 2004-06-24 Mikuni Color Ltd Pigment dispersion liquid and photosensitive resin composition
JP2005202252A (en) * 2004-01-16 2005-07-28 Dainippon Printing Co Ltd Photosensitive coloring composition for solid-state imaging device color filter, solid-state imaging device color filter, solid-state imaging device and manufacturing method of solid-state imaging device color filter

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI791125B (en) * 2018-12-26 2023-02-01 日商鷗爾熙製作所股份有限公司 Exposure device

Also Published As

Publication number Publication date
WO2007015393A1 (en) 2007-02-08
CN101238398A (en) 2008-08-06
JP2007041239A (en) 2007-02-15
KR20080044846A (en) 2008-05-21

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