JP3938375B2 - Photosensitive coloring composition, color filter, and liquid crystal display device - Google Patents
Photosensitive coloring composition, color filter, and liquid crystal display device Download PDFInfo
- Publication number
- JP3938375B2 JP3938375B2 JP2004006676A JP2004006676A JP3938375B2 JP 3938375 B2 JP3938375 B2 JP 3938375B2 JP 2004006676 A JP2004006676 A JP 2004006676A JP 2004006676 A JP2004006676 A JP 2004006676A JP 3938375 B2 JP3938375 B2 JP 3938375B2
- Authority
- JP
- Japan
- Prior art keywords
- acid
- coloring composition
- color filter
- substrate
- pigment
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Expired - Lifetime
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- 239000000203 mixture Substances 0.000 title claims description 85
- 238000004040 coloring Methods 0.000 title claims description 74
- 239000004973 liquid crystal related substance Substances 0.000 title claims description 34
- -1 color filter Substances 0.000 title description 43
- 239000000758 substrate Substances 0.000 claims description 59
- 229920005989 resin Polymers 0.000 claims description 51
- 239000011347 resin Substances 0.000 claims description 51
- 239000011230 binding agent Substances 0.000 claims description 41
- 150000001732 carboxylic acid derivatives Chemical class 0.000 claims description 30
- 239000003822 epoxy resin Substances 0.000 claims description 24
- 229920000647 polyepoxide Polymers 0.000 claims description 24
- 239000003999 initiator Substances 0.000 claims description 19
- 239000007795 chemical reaction product Substances 0.000 claims description 15
- 150000008064 anhydrides Chemical class 0.000 claims description 12
- 238000006243 chemical reaction Methods 0.000 claims description 11
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 claims description 10
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 claims description 9
- 239000003086 colorant Substances 0.000 claims description 8
- 125000000753 cycloalkyl group Chemical group 0.000 claims description 8
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 claims description 6
- 229930003836 cresol Natural products 0.000 claims description 6
- 230000003287 optical effect Effects 0.000 claims description 5
- 150000002923 oximes Chemical class 0.000 claims description 3
- 239000000049 pigment Substances 0.000 description 58
- 238000000034 method Methods 0.000 description 38
- 239000000463 material Substances 0.000 description 36
- 239000010408 film Substances 0.000 description 35
- 150000001875 compounds Chemical class 0.000 description 30
- 239000011159 matrix material Substances 0.000 description 27
- 238000011161 development Methods 0.000 description 26
- 239000006185 dispersion Substances 0.000 description 22
- 238000000576 coating method Methods 0.000 description 21
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical group [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 20
- 239000002253 acid Substances 0.000 description 19
- 239000011248 coating agent Substances 0.000 description 19
- 239000002270 dispersing agent Substances 0.000 description 18
- 238000001035 drying Methods 0.000 description 17
- 239000000178 monomer Substances 0.000 description 14
- 239000007787 solid Substances 0.000 description 14
- 239000000243 solution Substances 0.000 description 14
- 239000002904 solvent Substances 0.000 description 13
- 239000003960 organic solvent Substances 0.000 description 12
- 239000000126 substance Substances 0.000 description 11
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 10
- NIXOWILDQLNWCW-UHFFFAOYSA-N acrylic acid group Chemical group C(C=C)(=O)O NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 10
- 230000015572 biosynthetic process Effects 0.000 description 10
- 239000006229 carbon black Substances 0.000 description 10
- 210000002858 crystal cell Anatomy 0.000 description 10
- 238000004519 manufacturing process Methods 0.000 description 10
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 9
- 239000000975 dye Substances 0.000 description 9
- LLHKCFNBLRBOGN-UHFFFAOYSA-N propylene glycol methyl ether acetate Chemical compound COCC(C)OC(C)=O LLHKCFNBLRBOGN-UHFFFAOYSA-N 0.000 description 9
- 125000003700 epoxy group Chemical group 0.000 description 8
- 239000011521 glass Substances 0.000 description 8
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 7
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 7
- MPIAGWXWVAHQBB-UHFFFAOYSA-N [3-prop-2-enoyloxy-2-[[3-prop-2-enoyloxy-2,2-bis(prop-2-enoyloxymethyl)propoxy]methyl]-2-(prop-2-enoyloxymethyl)propyl] prop-2-enoate Chemical compound C=CC(=O)OCC(COC(=O)C=C)(COC(=O)C=C)COCC(COC(=O)C=C)(COC(=O)C=C)COC(=O)C=C MPIAGWXWVAHQBB-UHFFFAOYSA-N 0.000 description 7
- 125000001931 aliphatic group Chemical group 0.000 description 7
- 125000003118 aryl group Chemical group 0.000 description 7
- 125000002887 hydroxy group Chemical group [H]O* 0.000 description 7
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 7
- 229910052753 mercury Inorganic materials 0.000 description 7
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 7
- 239000001054 red pigment Substances 0.000 description 7
- 230000035945 sensitivity Effects 0.000 description 7
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 6
- 239000004593 Epoxy Substances 0.000 description 6
- DNIAPMSPPWPWGF-UHFFFAOYSA-N Propylene glycol Chemical compound CC(O)CO DNIAPMSPPWPWGF-UHFFFAOYSA-N 0.000 description 6
- 239000006087 Silane Coupling Agent Substances 0.000 description 6
- ZMANZCXQSJIPKH-UHFFFAOYSA-N Triethylamine Chemical compound CCN(CC)CC ZMANZCXQSJIPKH-UHFFFAOYSA-N 0.000 description 6
- MCMNRKCIXSYSNV-UHFFFAOYSA-N Zirconium dioxide Chemical compound O=[Zr]=O MCMNRKCIXSYSNV-UHFFFAOYSA-N 0.000 description 6
- 239000007864 aqueous solution Substances 0.000 description 6
- 150000002148 esters Chemical class 0.000 description 6
- 239000007788 liquid Substances 0.000 description 6
- 229910052751 metal Inorganic materials 0.000 description 6
- 239000002184 metal Substances 0.000 description 6
- 150000002989 phenols Chemical class 0.000 description 6
- XNGIFLGASWRNHJ-UHFFFAOYSA-N phthalic acid Chemical compound OC(=O)C1=CC=CC=C1C(O)=O XNGIFLGASWRNHJ-UHFFFAOYSA-N 0.000 description 6
- 229920001187 thermosetting polymer Polymers 0.000 description 6
- 239000010409 thin film Substances 0.000 description 6
- KMOUUZVZFBCRAM-OLQVQODUSA-N (3as,7ar)-3a,4,7,7a-tetrahydro-2-benzofuran-1,3-dione Chemical compound C1C=CC[C@@H]2C(=O)OC(=O)[C@@H]21 KMOUUZVZFBCRAM-OLQVQODUSA-N 0.000 description 5
- 229920003171 Poly (ethylene oxide) Polymers 0.000 description 5
- KDYFGRWQOYBRFD-UHFFFAOYSA-N Succinic acid Natural products OC(=O)CCC(O)=O KDYFGRWQOYBRFD-UHFFFAOYSA-N 0.000 description 5
- 239000001055 blue pigment Substances 0.000 description 5
- 125000003178 carboxy group Chemical group [H]OC(*)=O 0.000 description 5
- 230000000052 comparative effect Effects 0.000 description 5
- 239000001056 green pigment Substances 0.000 description 5
- 239000012860 organic pigment Substances 0.000 description 5
- 125000006850 spacer group Chemical group 0.000 description 5
- VVBLNCFGVYUYGU-UHFFFAOYSA-N 4,4'-Bis(dimethylamino)benzophenone Chemical compound C1=CC(N(C)C)=CC=C1C(=O)C1=CC=C(N(C)C)C=C1 VVBLNCFGVYUYGU-UHFFFAOYSA-N 0.000 description 4
- QIGBRXMKCJKVMJ-UHFFFAOYSA-N Hydroquinone Chemical compound OC1=CC=C(O)C=C1 QIGBRXMKCJKVMJ-UHFFFAOYSA-N 0.000 description 4
- SMWDFEZZVXVKRB-UHFFFAOYSA-N Quinoline Chemical compound N1=CC=CC2=CC=CC=C21 SMWDFEZZVXVKRB-UHFFFAOYSA-N 0.000 description 4
- 239000011324 bead Substances 0.000 description 4
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 4
- 238000010438 heat treatment Methods 0.000 description 4
- NWVVVBRKAWDGAB-UHFFFAOYSA-N hydroquinone methyl ether Natural products COC1=CC=C(O)C=C1 NWVVVBRKAWDGAB-UHFFFAOYSA-N 0.000 description 4
- 239000001023 inorganic pigment Substances 0.000 description 4
- XMGQYMWWDOXHJM-UHFFFAOYSA-N limonene Chemical compound CC(=C)C1CCC(C)=CC1 XMGQYMWWDOXHJM-UHFFFAOYSA-N 0.000 description 4
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- KCTAWXVAICEBSD-UHFFFAOYSA-N prop-2-enoyloxy prop-2-eneperoxoate Chemical compound C=CC(=O)OOOC(=O)C=C KCTAWXVAICEBSD-UHFFFAOYSA-N 0.000 description 4
- WQGWDDDVZFFDIG-UHFFFAOYSA-N pyrogallol Chemical compound OC1=CC=CC(O)=C1O WQGWDDDVZFFDIG-UHFFFAOYSA-N 0.000 description 4
- 239000003566 sealing material Substances 0.000 description 4
- WGTYBPLFGIVFAS-UHFFFAOYSA-M tetramethylammonium hydroxide Chemical compound [OH-].C[N+](C)(C)C WGTYBPLFGIVFAS-UHFFFAOYSA-M 0.000 description 4
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 4
- RIOQSEWOXXDEQQ-UHFFFAOYSA-N triphenylphosphine Chemical compound C1=CC=CC=C1P(C=1C=CC=CC=1)C1=CC=CC=C1 RIOQSEWOXXDEQQ-UHFFFAOYSA-N 0.000 description 4
- 239000001052 yellow pigment Substances 0.000 description 4
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- FWLHAQYOFMQTHQ-UHFFFAOYSA-N 2-N-[8-[[8-(4-aminoanilino)-10-phenylphenazin-10-ium-2-yl]amino]-10-phenylphenazin-10-ium-2-yl]-8-N,10-diphenylphenazin-10-ium-2,8-diamine hydroxy-oxido-dioxochromium Chemical compound O[Cr]([O-])(=O)=O.O[Cr]([O-])(=O)=O.O[Cr]([O-])(=O)=O.Nc1ccc(Nc2ccc3nc4ccc(Nc5ccc6nc7ccc(Nc8ccc9nc%10ccc(Nc%11ccccc%11)cc%10[n+](-c%10ccccc%10)c9c8)cc7[n+](-c7ccccc7)c6c5)cc4[n+](-c4ccccc4)c3c2)cc1 FWLHAQYOFMQTHQ-UHFFFAOYSA-N 0.000 description 3
- 239000004925 Acrylic resin Substances 0.000 description 3
- 229920000178 Acrylic resin Polymers 0.000 description 3
- XEKOWRVHYACXOJ-UHFFFAOYSA-N Ethyl acetate Chemical compound CCOC(C)=O XEKOWRVHYACXOJ-UHFFFAOYSA-N 0.000 description 3
- PEDCQBHIVMGVHV-UHFFFAOYSA-N Glycerine Chemical compound OCC(O)CO PEDCQBHIVMGVHV-UHFFFAOYSA-N 0.000 description 3
- KFZMGEQAYNKOFK-UHFFFAOYSA-N Isopropanol Chemical compound CC(C)O KFZMGEQAYNKOFK-UHFFFAOYSA-N 0.000 description 3
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 3
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 3
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical compound [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- 125000000217 alkyl group Chemical group 0.000 description 3
- JFDZBHWFFUWGJE-UHFFFAOYSA-N benzonitrile Chemical compound N#CC1=CC=CC=C1 JFDZBHWFFUWGJE-UHFFFAOYSA-N 0.000 description 3
- 229910052799 carbon Inorganic materials 0.000 description 3
- 150000001735 carboxylic acids Chemical class 0.000 description 3
- XCJYREBRNVKWGJ-UHFFFAOYSA-N copper(II) phthalocyanine Chemical compound [Cu+2].C12=CC=CC=C2C(N=C2[N-]C(C3=CC=CC=C32)=N2)=NC1=NC([C]1C=CC=CC1=1)=NC=1N=C1[C]3C=CC=CC3=C2[N-]1 XCJYREBRNVKWGJ-UHFFFAOYSA-N 0.000 description 3
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 3
- UAOMVDZJSHZZME-UHFFFAOYSA-N diisopropylamine Chemical compound CC(C)NC(C)C UAOMVDZJSHZZME-UHFFFAOYSA-N 0.000 description 3
- 238000004070 electrodeposition Methods 0.000 description 3
- 238000002347 injection Methods 0.000 description 3
- 239000007924 injection Substances 0.000 description 3
- 239000011976 maleic acid Substances 0.000 description 3
- LVHBHZANLOWSRM-UHFFFAOYSA-N methylenebutanedioic acid Natural products OC(=O)CC(=C)C(O)=O LVHBHZANLOWSRM-UHFFFAOYSA-N 0.000 description 3
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- 239000001053 orange pigment Substances 0.000 description 3
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- IZMJMCDDWKSTTK-UHFFFAOYSA-N quinoline yellow Chemical compound C1=CC=CC2=NC(C3C(C4=CC=CC=C4C3=O)=O)=CC=C21 IZMJMCDDWKSTTK-UHFFFAOYSA-N 0.000 description 3
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- 125000000391 vinyl group Chemical group [H]C([*])=C([H])[H] 0.000 description 3
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- QGKMIGUHVLGJBR-UHFFFAOYSA-M (4z)-1-(3-methylbutyl)-4-[[1-(3-methylbutyl)quinolin-1-ium-4-yl]methylidene]quinoline;iodide Chemical compound [I-].C12=CC=CC=C2N(CCC(C)C)C=CC1=CC1=CC=[N+](CCC(C)C)C2=CC=CC=C12 QGKMIGUHVLGJBR-UHFFFAOYSA-M 0.000 description 2
- MYRTYDVEIRVNKP-UHFFFAOYSA-N 1,2-Divinylbenzene Chemical compound C=CC1=CC=CC=C1C=C MYRTYDVEIRVNKP-UHFFFAOYSA-N 0.000 description 2
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- CTMHWPIWNRWQEG-UHFFFAOYSA-N 1-methylcyclohexene Chemical compound CC1=CCCCC1 CTMHWPIWNRWQEG-UHFFFAOYSA-N 0.000 description 2
- KJCVRFUGPWSIIH-UHFFFAOYSA-N 1-naphthol Chemical compound C1=CC=C2C(O)=CC=CC2=C1 KJCVRFUGPWSIIH-UHFFFAOYSA-N 0.000 description 2
- GQCZPFJGIXHZMB-UHFFFAOYSA-N 1-tert-Butoxy-2-propanol Chemical compound CC(O)COC(C)(C)C GQCZPFJGIXHZMB-UHFFFAOYSA-N 0.000 description 2
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- TXBCBTDQIULDIA-UHFFFAOYSA-N 2-[[3-hydroxy-2,2-bis(hydroxymethyl)propoxy]methyl]-2-(hydroxymethyl)propane-1,3-diol Chemical compound OCC(CO)(CO)COCC(CO)(CO)CO TXBCBTDQIULDIA-UHFFFAOYSA-N 0.000 description 2
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- XLLIQLLCWZCATF-UHFFFAOYSA-N 2-methoxyethyl acetate Chemical compound COCCOC(C)=O XLLIQLLCWZCATF-UHFFFAOYSA-N 0.000 description 2
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- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 2
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- KKEYFWRCBNTPAC-UHFFFAOYSA-N Terephthalic acid Chemical compound OC(=O)C1=CC=C(C(O)=O)C=C1 KKEYFWRCBNTPAC-UHFFFAOYSA-N 0.000 description 2
- 239000004974 Thermotropic liquid crystal Substances 0.000 description 2
- WGLPBDUCMAPZCE-UHFFFAOYSA-N Trioxochromium Chemical compound O=[Cr](=O)=O WGLPBDUCMAPZCE-UHFFFAOYSA-N 0.000 description 2
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- FTUYQIPAPWPHNC-UHFFFAOYSA-M sodium;4-[[4-[benzyl(ethyl)amino]phenyl]-[4-[benzyl(ethyl)azaniumylidene]cyclohexa-2,5-dien-1-ylidene]methyl]benzene-1,3-disulfonate Chemical compound [Na+].C=1C=C(C(=C2C=CC(C=C2)=[N+](CC)CC=2C=CC=CC=2)C=2C(=CC(=CC=2)S([O-])(=O)=O)S([O-])(=O)=O)C=CC=1N(CC)CC1=CC=CC=C1 FTUYQIPAPWPHNC-UHFFFAOYSA-M 0.000 description 1
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- YMBCJWGVCUEGHA-UHFFFAOYSA-M tetraethylammonium chloride Chemical compound [Cl-].CC[N+](CC)(CC)CC YMBCJWGVCUEGHA-UHFFFAOYSA-M 0.000 description 1
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- OGIDPMRJRNCKJF-UHFFFAOYSA-N titanium oxide Inorganic materials [Ti]=O OGIDPMRJRNCKJF-UHFFFAOYSA-N 0.000 description 1
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- 150000003918 triazines Chemical class 0.000 description 1
- GKASDNZWUGIAMG-UHFFFAOYSA-N triethyl orthoformate Chemical compound CCOC(OCC)OCC GKASDNZWUGIAMG-UHFFFAOYSA-N 0.000 description 1
- RYFMWSXOAZQYPI-UHFFFAOYSA-K trisodium phosphate Chemical compound [Na+].[Na+].[Na+].[O-]P([O-])([O-])=O RYFMWSXOAZQYPI-UHFFFAOYSA-K 0.000 description 1
- ZUCXUTRTSQLRCV-UHFFFAOYSA-K trisodium;1-amino-4-[3-[[4-chloro-6-(3-sulfonatoanilino)-1,3,5-triazin-2-yl]amino]-2,4,6-trimethyl-5-sulfonatoanilino]-9,10-dioxoanthracene-2-sulfonate Chemical compound [Na+].[Na+].[Na+].CC1=C(S([O-])(=O)=O)C(C)=C(NC=2C=3C(=O)C4=CC=CC=C4C(=O)C=3C(N)=C(C=2)S([O-])(=O)=O)C(C)=C1NC(N=1)=NC(Cl)=NC=1NC1=CC=CC(S([O-])(=O)=O)=C1 ZUCXUTRTSQLRCV-UHFFFAOYSA-K 0.000 description 1
- UJMBCXLDXJUMFB-UHFFFAOYSA-K trisodium;5-oxo-1-(4-sulfonatophenyl)-4-[(4-sulfonatophenyl)diazenyl]-4h-pyrazole-3-carboxylate Chemical compound [Na+].[Na+].[Na+].[O-]C(=O)C1=NN(C=2C=CC(=CC=2)S([O-])(=O)=O)C(=O)C1N=NC1=CC=C(S([O-])(=O)=O)C=C1 UJMBCXLDXJUMFB-UHFFFAOYSA-K 0.000 description 1
- WFKWXMTUELFFGS-UHFFFAOYSA-N tungsten Chemical compound [W] WFKWXMTUELFFGS-UHFFFAOYSA-N 0.000 description 1
- 229910052721 tungsten Inorganic materials 0.000 description 1
- 239000010937 tungsten Substances 0.000 description 1
- 238000009281 ultraviolet germicidal irradiation Methods 0.000 description 1
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- ROVRRJSRRSGUOL-UHFFFAOYSA-N victoria blue bo Chemical compound [Cl-].C12=CC=CC=C2C(NCC)=CC=C1C(C=1C=CC(=CC=1)N(CC)CC)=C1C=CC(=[N+](CC)CC)C=C1 ROVRRJSRRSGUOL-UHFFFAOYSA-N 0.000 description 1
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Images
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- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/14—Polycondensates modified by chemical after-treatment
- C08G59/1494—Polycondensates modified by chemical after-treatment followed by a further chemical treatment thereof
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/02—Polycondensates containing more than one epoxy group per molecule
- C08G59/04—Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof
- C08G59/06—Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof of polyhydric phenols
-
- C—CHEMISTRY; METALLURGY
- C08—ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
- C08G—MACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
- C08G59/00—Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
- C08G59/18—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
- C08G59/40—Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
- C08G59/42—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
- C08G59/4292—Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof together with monocarboxylic acids
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
- G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/004—Photosensitive materials
- G03F7/038—Macromolecular compounds which are rendered insoluble or differentially wettable
- G03F7/0388—Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer
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- Chemical & Material Sciences (AREA)
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- Organic Chemistry (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Medicinal Chemistry (AREA)
- Polymers & Plastics (AREA)
- Health & Medical Sciences (AREA)
- General Physics & Mathematics (AREA)
- Spectroscopy & Molecular Physics (AREA)
- General Chemical & Material Sciences (AREA)
- Materials For Photolithography (AREA)
- Optical Filters (AREA)
- Optics & Photonics (AREA)
Description
本発明は、感光性着色組成物、カラーフィルタ、及び液晶表示装置に関するものである。更に詳しくは、液安定性、耐熱性に優れ、現像時の地汚れが少なく、基板への密着性が良好で、画素のエッジ形状が良好で、かつカラーフィルタの製造に適した感光性着色組成物に関するものである。 The present invention is sensitive light colored composition are those color filters, and a liquid crystal display device. More specifically, the photosensitive coloring composition is excellent in liquid stability and heat resistance, has little background stain during development, has good adhesion to the substrate, has a good pixel edge shape, and is suitable for the production of color filters. It is about things.
従来、顔料を用いたカラーフィルタの製造法としては、染色法、電着法、インクジェット法、顔料分散法などが知られている。
顔料分散法の場合、通常分散剤などにより顔料を分散してなる着色組成物に、バインダー樹脂、光重合開始剤、光重合性モノマー等を添加して感光化した感光性着色組成物をガラス基板上にコートして乾燥後、マスクを用いて露光し、現像を行うことによって着色パターンを形成し、その後これを加熱してパターンを固着して画素を形成する。これらの工程を各色ごとに繰り返し、カラーフィルタを形成する。このように感光性着色組成物を用いたカラーフィルタの画像形成では、十分な解像性、基板との密着性、低現像残渣などが求められている。さらに近年では、色濃度が高い画素や光学濃度の高い樹脂ブラックマトリクスが要求されており、感光性着色組成物中における顔料やカーボンブラックなどの色材の含量が高くなる傾向にある。
Conventionally, as a method for producing a color filter using a pigment, a dyeing method, an electrodeposition method, an ink jet method, a pigment dispersion method, and the like are known.
In the case of the pigment dispersion method, a photosensitive coloring composition obtained by adding a binder resin, a photopolymerization initiator, a photopolymerizable monomer, etc. to a coloring composition obtained by dispersing a pigment with a dispersing agent or the like is usually a glass substrate. After coating on top and drying, exposure is performed using a mask and development is performed to form a colored pattern, which is then heated to fix the pattern to form pixels. These steps are repeated for each color to form a color filter. Thus, in the image formation of the color filter using the photosensitive coloring composition, sufficient resolution, adhesion to the substrate, low development residue and the like are required. Furthermore, in recent years, a pixel having a high color density and a resin black matrix having a high optical density are required, and the content of a coloring material such as a pigment or carbon black in the photosensitive coloring composition tends to be high.
一方、一般に、上記感光性着色組成物を包含する、光によって重合しうる成分と光重合開始剤とバインダー樹脂とを含有する感光性組成物においては、一般に塗布・乾燥・露光・現像の工程を経る光リソグラフィ工程に供されるが、かかる工程においては、現像工程での除去部分に残さや地汚れが生じないことや、除去部分が十分な溶解性を有することや、パターンエッジのシャープさなどの画素形成性を上げることが常に求められている。 On the other hand, in general, a photosensitive composition containing a photopolymerizable component, a photopolymerization initiator, and a binder resin, including the photosensitive coloring composition, generally includes coating, drying, exposure, and development steps. Although it is used for the photolithography process that passes, in such a process, there is no residue or soiling in the removed part in the development process, the removed part has sufficient solubility, the sharpness of the pattern edge, etc. There is always a need to improve the pixel formability.
特に、上記のような色材の含量が高い感光性着色組成物を用いて画素を形成した場合、現像工程で未露光部の基板上に残さや地汚れが生じる、未露光部の良好な溶解性が得られない等の現象や、画素のエッジ形状のシャープ性に劣る、露光部に形成された画素の感度も十分ではなく表面平滑性が悪いという現象問題が顕著に生じやすく、特に大きな問題であった。 In particular, when a pixel is formed using a photosensitive coloring composition having a high content of the coloring material as described above, a residue or background stain is generated on the substrate in the unexposed area in the development process, and the unexposed area is well dissolved. Such as inability to obtain image quality, inferior sharpness of the edge shape of the pixel, and the phenomenon that the sensitivity of the pixel formed in the exposed area is not sufficient and the surface smoothness is notable. Met.
そこでバインダー樹脂として、カルボキシル基を有するノボラックエポキシアクリレートを使用した感光性着色組成物が開示されている(特許文献1参照)。しかしこのバインダー樹脂を使用した場合でも、溶解性と感度のバランスに劣っているため、未露光部の溶解と同時に露光部への現像液の浸透が起こり、画素のエッジががたつく、画素の基板への密着性が悪い、という問題が生じることがわかった。 Then, the photosensitive coloring composition using the novolak epoxy acrylate which has a carboxyl group as binder resin is disclosed (refer patent document 1). However, even when this binder resin is used, the balance between solubility and sensitivity is inferior, so that the developer permeates into the exposed area at the same time as the unexposed area dissolves, and the pixel edge becomes shaky. It has been found that the problem of poor adhesion occurs.
さらに、バインダー樹脂として、カルボキシル基を有するアクリル樹脂に脂環式エポキシ基含有不飽和化合物を使用した感光性樹脂組成物が開示されているが(特許文献2参照)、このバインダー樹脂を使用した場合でも感度が十分ではないため、画素の基板への密着が悪く、高精細な画素の形成が困難という問題を生じることがわかった。
本発明の目的は、色材の濃度が高い場合でも画像形成性に優れる、カラーフィルタ用途に適した感光性着色組成物、及びこれを用いて製造されたカラーフィルタ、液晶表示装置を提供することにある。 An object of the present invention is excellent in image-forming property even when the concentration of the coloring material high photosensitive coloring composition suitable for color filter applications, and color filter manufactured using the same, to provide a liquid crystal display device There is.
そこで、本発明者らは上記課題を解決すべく鋭意検討した結果、特定のバインダー樹脂(A)と光重合開始剤(B)を含有する感光性組成物が、感度及び溶解性のバランスに優れ、さらには画素エッジのシャープ性、密着性に非常に優れることを見出し、又、得られる遮光性パターン(ブラックマトリクス)の形状が良好であることを見い出し、本発明に到達した。
すなわち、本発明の第1の要旨は、エポキシ樹脂(a)と不飽和基含有カルボン酸(b)の反応物をさらに多塩基性カルボン酸またはその無水物(c)と反応させて得られるバインダー樹脂(A)と、光重合開始剤(B)を含有する感光性組成物であって、バインダー樹脂(A)におけるエポキシ樹脂(a)が、1分子あたり2個以上の不飽和基を有する環状炭化水素化合物とフェノール類との重付加反応物と、エピハロヒドリンとの反応生成物であり、且つ、光重合開始剤(B)がオキシム系開始剤である感光性組成物、及び色材(C)を含有することを特徴とする感光性着色組成物、に存する。
Therefore, as a result of intensive studies to solve the above problems, the present inventors have found that a photosensitive composition containing a specific binder resin (A) and a photopolymerization initiator (B) has an excellent balance between sensitivity and solubility. Furthermore, the inventors have found that the sharpness and adhesion of the pixel edge are very excellent, and found that the shape of the obtained light-shielding pattern (black matrix) is good, and have reached the present invention.
That is, the first gist of the present invention is a binder obtained by further reacting a reaction product of an epoxy resin (a) and an unsaturated group-containing carboxylic acid (b) with a polybasic carboxylic acid or its anhydride (c). cyclic with the resin (a), the a photosensitive composition containing the photopolymerization initiator (B), the epoxy resin in the binder resin (a) (a) is two or more unsaturated groups per molecule a polyaddition reaction product of a hydrocarbon compound and a phenol, the reaction product of an epihalohydrin, and a photopolymerization initiator (B) is an oxime-based initiator der Ru sensitive optical composition, and a coloring material ( A photosensitive coloring composition containing C) .
本発明の第2の要旨は、透明基板上に色材(C)が黒色色材である前記感光性着色組成物を用いて遮光性パターンを画像形成したときの断面形状において、遮光性パターンの基板に接する面と、基板面との形成する角度が50度以下であることを特徴とするカラーフィルタに存する。 The second gist of the present invention is that, in the cross-sectional shape when a light-shielding pattern is formed on the transparent substrate using the photosensitive coloring composition in which the color material (C) is a black color material, The color filter is characterized in that an angle formed between the surface in contact with the substrate and the substrate surface is 50 degrees or less.
本発明の第3の要旨は、前記カラーフィルタを用いたことを特徴とする液晶表示装置に存する。
The third gist of the present invention resides in a liquid crystal display device using the color filter.
本発明の感光性組成物は、基板との密着性が良好である。また、これに色材を配合した感光性着色組成物は、顔料やカーボンブラックなどの色材を高い濃度で含有する場合でも、現像性、基板や遮光層への密着性、表面平滑性に優れ、高精細な画素を形成することができる。更に、この感光性着色組成物を使用した高品質なカラーフィルタ、さらにはこのカラーフィルタを使用した高品質な液晶表示装置を提供することができる。 The photosensitive composition of the present invention has good adhesion to the substrate. In addition, a photosensitive coloring composition containing a coloring material is excellent in developability, adhesion to a substrate or a light shielding layer, and surface smoothness even when containing a coloring material such as pigment or carbon black at a high concentration. High-definition pixels can be formed. Furthermore, it is possible to provide a high-quality color filter using the photosensitive coloring composition and a high-quality liquid crystal display device using the color filter.
本発明の感光性組成物は、カラーフィルタ用途以外にも、フレキシブルプリント配線板用ソルダーレジスト、メッキレジスト、多層プリント配線板用相関絶縁膜、感光性光導波路、光硬化型液晶シール材、光硬化型ELシール材、光硬化性接着剤等として有用である。 The photosensitive composition of the present invention is not only used for color filters, but also for solder resists for flexible printed wiring boards, plating resists, correlated insulating films for multilayer printed wiring boards, photosensitive optical waveguides, photo-curable liquid crystal sealing materials, and photo-curing. It is useful as a type EL sealing material, a photocurable adhesive, and the like.
以下、本発明について詳細に説明する。
[感光性組成物]
本発明の感光性組成物は、バインダー樹脂(A)と光重合開始剤(B)を必須成分として含有し、必要に応じて光重合性モノマー等を含有する。
<バインダー樹脂(A)>
バインダー樹脂(A)は、エポキシ樹脂(a)と不飽和基含有カルボン酸(b)の反応
物をさらに多塩基性カルボン酸またはその無水物(c)と反応させて得られる。
Hereinafter, the present invention will be described in detail.
[Photosensitive composition]
The photosensitive composition of this invention contains binder resin (A) and a photoinitiator (B) as an essential component, and contains a photopolymerizable monomer etc. as needed.
<Binder resin (A)>
The binder resin (A) is obtained by further reacting a reaction product of the epoxy resin (a) and the unsaturated group-containing carboxylic acid (b) with a polybasic carboxylic acid or its anhydride (c).
エポキシ樹脂(a)
エポキシ樹脂(a)は、1分子当たり2個以上の不飽和基を有する環状炭化水素化合物(以下、単に「不飽和環状炭化水素化合物」と略記する)とフェノール類との重付加反応物と、エピハロヒドリンとの反応生成物である。
このバインダー樹脂(A)が良好な特性を示すのは、構成成分のエポキシ樹脂(a)が環状炭化水素構造を有するためバルキーであり、適度な疎水性を有するため、露光部の現像液の浸透による浸食を防ぐことが考えられる。
Epoxy resin (a)
The epoxy resin (a) is a polyaddition reaction product of a cyclic hydrocarbon compound having two or more unsaturated groups per molecule (hereinafter simply referred to as “unsaturated cyclic hydrocarbon compound”) and a phenol, It is a reaction product with epihalohydrin.
The binder resin (A) exhibits good characteristics because the constituent epoxy resin (a) has a cyclic hydrocarbon structure, which is bulky, and has an appropriate hydrophobicity, so that the developing solution penetrates the exposed area. It is possible to prevent erosion caused by
不飽和環状炭化水素化合物が有する不飽和基は、1分子当たり通常4個以下であるが、好ましくは2個である。
不飽和環状炭化水素化合物は、特に限定されるものではないが、通常炭素数5〜20、好ましくは6〜12である。具体的には、ジシクロペンタジエン、テトラヒドロインデン、4−ビニルシクロヘキセン、5−ビニルノルボナ−2−エン、α―ピネン、β−ピネン、リモネンなどの不飽和脂肪族炭化水素化合物や、ジビニルベンゼンなどの不飽和芳香族炭化水素化合物が挙げられる。これらの中でもジシクロペンタジエンが特に好ましい。またジシクロペンタジエンは石油留分中に含まれることから、工業用ジシクロペンタジエンには他の脂肪族あるいは芳香族ジエン類等が不純物として含有されることがあるが、耐熱性、硬化性などを考慮すると、ジシクロペンタジエンが90重量%以上のものが望ましい。特に、純度95重量%以上のものが中でも好ましい。
The number of unsaturated groups contained in the unsaturated cyclic hydrocarbon compound is usually 4 or less per molecule, but preferably 2 groups.
The unsaturated cyclic hydrocarbon compound is not particularly limited, but usually has 5 to 20 carbon atoms, preferably 6 to 12 carbon atoms. Specifically, unsaturated aliphatic hydrocarbon compounds such as dicyclopentadiene, tetrahydroindene, 4-vinylcyclohexene, 5-vinylnorborna-2-ene, α-pinene, β-pinene and limonene, and divinylbenzene and the like. A saturated aromatic hydrocarbon compound is mentioned. Of these, dicyclopentadiene is particularly preferred. Since dicyclopentadiene is contained in petroleum fractions, industrial dicyclopentadiene may contain other aliphatic or aromatic dienes as impurities. Considering the above, it is desirable that dicyclopentadiene is 90% by weight or more. Particularly preferred are those having a purity of 95% by weight or more.
次に前記不飽和環状炭化水素化合物と重付加させるフェノール類としては、1分子中に少なくとも1つの芳香族性水酸基を有する化合物であれば、特に限定されないが、具体的には、無置換フェノール、及びアルキル基、アルケニル基、アリル基、アリール基、アラルキル基又はハロゲン基等が結合した置換フェノール類が挙げられる。後者の置換フェノール類としては、クレゾール、キシレノール、エチルフェノール、イソプロピルフェノール、ブチルフェノール、オクチルフェノール、ノニルフェノール、ビニルフェノール、イソプロピルフェノール、アリルフェノール、フェニルフェノール、ベンジルフェノール、クロルフェノール、ブロムフェノール(各々置換位置が異なる異性体を含む)等の一置換フェノール類や、ジメチルフェノール、t−ブチル−メチルフェノール(各々置換位置が異なる異性体を含む)などの二置換フェノール類、又は、トリメチルフェノール(置換位置が異なる異性体を含む)など3置換フェノール類や、1−ナフトール、2−ナフトール、ジヒドロキシナフタレン(1,2−、1,3−、1,4−、1,5−、1,6−、1,7−、1,8−、2,3−、2,6−、2,7−の異性体)などのナフトール類や、ビスフェノールA、ビスフェノールF、ビスフェノールS、ビスフェノールZ、ビスフェノールP、ビスフェノールM、ジヒドロキシナフタレンベンゾフェノン、ビフェニル、ハイドロキノン、レゾルシンなどの2価フェノール類などが挙げられる。中でも硬化性の点からフェノール及びクレゾールが好ましい。 Next, the phenol to be polyadded with the unsaturated cyclic hydrocarbon compound is not particularly limited as long as it is a compound having at least one aromatic hydroxyl group in one molecule, specifically, an unsubstituted phenol, And substituted phenols to which an alkyl group, alkenyl group, allyl group, aryl group, aralkyl group or halogen group is bonded. The latter substituted phenols include cresol, xylenol, ethylphenol, isopropylphenol, butylphenol, octylphenol, nonylphenol, vinylphenol, isopropylphenol, allylphenol, phenylphenol, benzylphenol, chlorophenol, bromophenol (each with different substitution positions) Monosubstituted phenols such as isomers), disubstituted phenols such as dimethylphenol and t-butyl-methylphenol (including isomers having different substitution positions), or trimethylphenol (isomers having different substitution positions). 1-naphthol, 2-naphthol, dihydroxynaphthalene (1,2-, 1,3-, 1,4-, 1,5-, 1,6-, 1,7) -, 1, -, 2,3-, 2,6-, 2,7-isomers), bisphenol A, bisphenol F, bisphenol S, bisphenol Z, bisphenol P, bisphenol M, dihydroxynaphthalenebenzophenone, biphenyl, And dihydric phenols such as hydroquinone and resorcin. Of these, phenol and cresol are preferred from the viewpoint of curability.
不飽和環状炭化水素化合物とフェノール類との重付加反応物との反応に用いられるエピハロヒドリンとしては、エピクロルヒドリン、エピヨードヒドリン、エピブロムヒドリン、β−メチルエピクロルヒドリンなどが用いることができるが、エピクロルヒドリンが最も好ましい。
よって、エポキシ樹脂(a)として、ジシクロペンタジエンとフェノールまたはクレゾールとの重付加反応物と、エピハロヒドリンとの反応生成物であることが最も好ましい。
Epichlorohydrin, epiiodohydrin, epibromohydrin, β-methylepichlorohydrin, and the like can be used as the epihalohydrin used in the reaction of the unsaturated cyclic hydrocarbon compound with the polyaddition reaction product of phenols, but epichlorohydrin can be used. Is most preferred.
Therefore, the epoxy resin (a) is most preferably a reaction product of a polyaddition reaction product of dicyclopentadiene and phenol or cresol and an epihalohydrin.
本発明で用いるエポキシ樹脂(a)には、上記原料を使用する限り、特にその製造方法が限定されるものではなく、例えば、特開平11−209584号公報に記載の方法が挙げられる。
また前述のエポキシ樹脂(a)は、例えば大日本インキ(株)製ジシクロペンタジエン型エポキシ樹脂エピクロンHP7200シリーズ、日本化薬(株)製エポキシ樹脂XD1000シリーズなどが市販されており、好ましく用いられる。
As long as the said raw material is used for the epoxy resin (a) used by this invention, the manufacturing method in particular is not limited, For example, the method as described in Unexamined-Japanese-Patent No. 11-209584 is mentioned.
As the above-mentioned epoxy resin (a), for example, a dicyclopentadiene type epoxy resin Epicron HP7200 series manufactured by Dainippon Ink Co., Ltd. and an epoxy resin XD1000 series manufactured by Nippon Kayaku Co., Ltd. are commercially available and preferably used.
不飽和基含有カルボン酸化合物(b)
不飽和基含有カルボン酸化合物(b)としては、エチレン性不飽和二重結合を有する不飽和カルボン酸が挙げられ、具体例としては、(メタ)アクリル酸(なお、本明細書において、「(メタ)アクリル〜」、「(メタ)アクリレート」等は、「アクリル〜またはメタクリル〜」、「アクリレートまたはメタクリレート」等を意味するものとし、例えば「(メタ)アクリル酸」は「アクリル酸またはメタクリル酸」を意味するものとする)、クロトン酸、o−、m−、p−ビニル安息香酸、(メタ)アクリル酸のα位ハロアルキル、アルコキシル、ハロゲン、ニトロ、シアノ置換体などのモノカルボン酸、2−(メタ)アクリロイロキシエチルコハク酸、2−アクリロイロキシエチルアジピン酸、2−(メタ)アクリロイロキシエチルフタル酸、2−(メタ)アクリロイロキシエチルヘキサヒドロフタル酸、2−(メタ)アクリロイロキシエチルマレイン酸、2−(メタ)アクリロイロキシプロピルコハク酸、2−(メタ)アクリロイロキシプロピルアジピン酸、2−(メタ)アクリロイロキシプロピルテトラヒドロフタル酸、2−(メタ)アクリロイロキシプロピルフタル酸、2−(メタ)アクリロイロキシプロピルマレイン酸、2−(メタ)アクリロイロキシブチルコハク酸、2−(メタ)アクリロイロキシブチルアジピン酸、2−(メタ)アクリロイロキシブチルヒドロフタル酸、2−(メタ)アクリロイロキシブチルフタル酸、2−(メタ)アクリロイロキシブチルマレイン酸(メタ)、アクリル酸にε−カプロラクトン、β−プロピオラクトン、γ−ブチロラクトン、δ−バレロラクトン等のラクトン類を付加させたものである単量体、あるいはヒドロキシアルキル(メタ)アクリレート、ペンタエリスリトールトリ(メタ)アクリレートに(無水)コハク酸、(無水)フタル酸、(無水)マレイン酸などの酸(無水物)を付加させた単量体、(メタ)アクリル酸ダイマーなどが挙げられる。
Unsaturated group-containing carboxylic acid compound (b)
Examples of the unsaturated group-containing carboxylic acid compound (b) include unsaturated carboxylic acids having an ethylenically unsaturated double bond. Specific examples thereof include (meth) acrylic acid (in this specification, “( “(Meth) acrylic”, “(meth) acrylate” and the like mean “acrylic or methacrylic”, “acrylate or methacrylate” and the like, for example, “(meth) acrylic acid” means “acrylic acid or methacrylic acid”. Monocarboxylic acids such as crotonic acid, o-, m-, p-vinylbenzoic acid, α-haloalkyl of (meth) acrylic acid, alkoxyl, halogen, nitro, cyano substituents, -(Meth) acryloyloxyethyl succinic acid, 2-acryloyloxyethyl adipic acid, 2- (meth) acryloyloxyethyl phthalate 2- (meth) acryloyloxyethyl hexahydrophthalic acid, 2- (meth) acryloyloxyethyl maleic acid, 2- (meth) acryloyloxypropyl succinic acid, 2- (meth) acryloyloxypropyl adipic acid 2- (meth) acryloyloxypropyltetrahydrophthalic acid, 2- (meth) acryloyloxypropylphthalic acid, 2- (meth) acryloyloxypropylmaleic acid, 2- (meth) acryloyloxybutyl succinic acid, 2- (meth) acryloyloxybutyl adipic acid, 2- (meth) acryloyloxybutyl hydrophthalic acid, 2- (meth) acryloyloxybutyl phthalic acid, 2- (meth) acryloyloxybutyl maleic acid (meta ), Ε-caprolactone, β-propiolactone, γ-butyrolactone, δ- Monomers to which lactones such as rolactone are added, or hydroxyalkyl (meth) acrylate, pentaerythritol tri (meth) acrylate, (anhydrous) succinic acid, (anhydrous) phthalic acid, (anhydrous) maleic acid, etc. And a monomer to which an acid (anhydride) is added, (meth) acrylic acid dimer, and the like.
特に好ましいものは、(メタ)アクリル酸である。これらは複数種使用してもよい。
エポキシ樹脂(a)と不飽和基含有カルボン酸(b)の反応
エポキシ樹脂中のエポキシ基と不飽和基含有カルボン酸の反応させる方法としては公知の手法を用いることができる。例えば、上記エポキシ樹脂と不飽和基含有カルボン酸とをトリエチルアミン、ベンジルメチルアミン等の3級アミン、ドデシルトリメチルアンモニウムクロライド、テトラメチルアンモニウムクロライド、テトラエチルアンモニウムクロライド、ベンジルトリエチルアンモニウムクロライド等の4級アンモニウム塩、ピリジン、トリフェニルホスフィン等を触媒として有機溶剤中反応温度50〜150℃で数〜数十時間反応させることによりエポキシ樹脂にカルボン酸を付加することができる。該触媒の使用量は、反応原料混合物に対して好ましくは0.01から10重量%、特に好ましくは0.3から5重量%である。また反応中の重合を防止するために、重合防止剤(例えばメトキノン、ハイドロキノン、メチルハイドロキノン、ハイドロキノンモノメチルエーテル、ピロガロール、tert−ブチルカテコール、フェノチアジン等)を使用することが好ましく、その使用量は、反応原料混合物に対して好ましくは0.01〜10重量%、特に好ましくは0.1から5重量%である。エポキシ樹脂のエポキシ基に不飽和基含有カルボン酸を付加させる割合は、通常90〜100モル%である。エポキシ基の残存は保存安定性に悪影響を与えるため、エポキシ基1当量に対して、通常0.8から1.5当量、さらに好ましくは0.9から1.1当量の割合で反応を行う。
Particularly preferred is (meth) acrylic acid. A plurality of these may be used.
Reaction of Epoxy Resin (a) and Unsaturated Group-Containing Carboxylic Acid (b) As a method for reacting the epoxy group in the epoxy resin with the unsaturated group-containing carboxylic acid, a known method can be used. For example, the epoxy resin and unsaturated group-containing carboxylic acid are tertiary amines such as triethylamine and benzylmethylamine, quaternary ammonium salts such as dodecyltrimethylammonium chloride, tetramethylammonium chloride, tetraethylammonium chloride, benzyltriethylammonium chloride, Carboxylic acid can be added to the epoxy resin by reacting in an organic solvent at a reaction temperature of 50 to 150 ° C. for several to several tens of hours using pyridine, triphenylphosphine or the like as a catalyst. The amount of the catalyst used is preferably 0.01 to 10% by weight, particularly preferably 0.3 to 5% by weight, based on the reaction raw material mixture. In order to prevent polymerization during the reaction, it is preferable to use a polymerization inhibitor (for example, methoquinone, hydroquinone, methylhydroquinone, hydroquinone monomethyl ether, pyrogallol, tert-butylcatechol, phenothiazine, etc.). Preferably it is 0.01 to 10 weight% with respect to a raw material mixture, Most preferably, it is 0.1 to 5 weight%. The ratio of adding the unsaturated group-containing carboxylic acid to the epoxy group of the epoxy resin is usually 90 to 100 mol%. Since the remaining epoxy group adversely affects storage stability, the reaction is usually carried out at a ratio of 0.8 to 1.5 equivalents, more preferably 0.9 to 1.1 equivalents per 1 equivalent of epoxy group.
多塩基性カルボン酸またはその無水物(c)
エポキシ樹脂(a)と不飽和基含有カルボン酸(b)に反応させたときに生成される水酸基に付加させる多塩基性カルボン酸またはその無水物(c)としては、公知のものが使用でき、マレイン酸、コハク酸、イタコン酸、フタル酸、テトラヒドロフタル酸、ヘキサ
ヒドロフタル酸、メチルエンドメチレンテトラヒドロフタル酸、クロレンド酸、メチルテトラヒドロフタル酸、5−ノルボルネン−2,3−ジカルボン酸、メチル−5−ノルボルネン−2,3−ジカルボン酸等の二塩基性カルボン酸またはその無水物;トリメリット酸、ピロメリット酸、ベンゾフェノンテトラカルボン酸、ビフェニルテトラカルボン酸等の多塩基性カルボン酸またはその無水物が挙げられる。中でも好ましくは、テトラヒドロ無水フタル酸または無水コハク酸がよい。
Polybasic carboxylic acid or anhydride (c)
As the polybasic carboxylic acid to be added to the hydroxyl group produced when the epoxy resin (a) is reacted with the unsaturated group-containing carboxylic acid (b) or its anhydride (c), known ones can be used. Maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, methylendomethylenetetrahydrophthalic acid, chlorendic acid, methyltetrahydrophthalic acid, 5-norbornene-2,3-dicarboxylic acid, methyl-5 A dibasic carboxylic acid such as norbornene-2,3-dicarboxylic acid or an anhydride thereof; a polybasic carboxylic acid such as trimellitic acid, pyromellitic acid, benzophenone tetracarboxylic acid, biphenyltetracarboxylic acid, or an anhydride thereof. Can be mentioned. Among these, tetrahydrophthalic anhydride or succinic anhydride is preferable.
多塩基性カルボン酸またはその無水物(c)の付加率は、(b)成分を付加させたときに生成される水酸基の、通常10〜100モル%、好ましくは20〜100モル%、より好ましくは30〜100モル%に付加させる。多すぎると、現像時の残膜率が低下することがあり、少なすぎると溶解性が不足したり、基板への密着性が不足することがある。
上記のエポキシ樹脂(a)に、不飽和基含有カルボン酸(b)を付加させた後、多塩基性カルボン酸またはその無水物(c)を付加させる方法としては、公知の方法を用いることが出来る。
The addition rate of the polybasic carboxylic acid or its anhydride (c) is usually 10 to 100 mol%, preferably 20 to 100 mol%, more preferably the hydroxyl group produced when the component (b) is added. Is added to 30 to 100 mol%. If the amount is too large, the remaining film ratio at the time of development may be lowered. If the amount is too small, the solubility may be insufficient or the adhesion to the substrate may be insufficient.
As a method of adding the unsaturated group-containing carboxylic acid (b) to the epoxy resin (a) and then adding the polybasic carboxylic acid or its anhydride (c), a known method may be used. I can do it.
また本発明においては、多塩基酸カルボン酸またはその無水物(c)を付加後、生成したカルボキシル基の一部にエポキシ基含有化合物(d)を付加させて得られるバインダー樹脂を用いてもよい。例えば、(d)成分として、光感度を向上させるために、グリシジル(メタ)アクリレート、3,4−エポキシシクロヘキシル(メタ)アクリレートや、重合性不飽和基を有するグリシジルエーテル化合物などの、エポキシ基含有不飽和化合物を付加させたり、また、現像性を向上させるために、重合性不飽和基を有さないグリシジルエーテル化合物を付加させることもでき、この両者を併用してもよい。重合性不飽和基を有さないグリシジルエーテル化合物の具体例としてはフェニル基やアルキル基を有するグリシジルエーテル化合物(ナガセ化成工業(株)製、商品名:デナコールEX−111、デナコールEX−121、デナコールEX−141、デナコールEX−145、デナコールEX−146、デナコールEX−171、デナコールEX−192)等がある。本発明のバインダー樹脂(A)には、上記の様なエポキシ樹脂(a)と不飽和基含有カルボン酸(b)の反応物をさらに多塩基性カルボン酸またはその無水物(c)と反応させて得られる樹脂のカルボキシル基の一部にエポキシ基含有化合物(d)を付加させて得られるバインダー樹脂も含まれる。 Moreover, in this invention, you may use the binder resin obtained by adding an epoxy-group containing compound (d) to a part of produced | generated carboxyl group after adding polybasic acid carboxylic acid or its anhydride (c). . For example, as a component (d), in order to improve photosensitivity, glycidyl (meth) acrylate, 3,4-epoxycyclohexyl (meth) acrylate, and epoxy group-containing compounds having a polymerizable unsaturated group In order to add an unsaturated compound or improve developability, a glycidyl ether compound having no polymerizable unsaturated group may be added, or both of them may be used in combination. Specific examples of the glycidyl ether compound having no polymerizable unsaturated group include a glycidyl ether compound having a phenyl group or an alkyl group (manufactured by Nagase Chemical Industries, Ltd., trade names: Denacol EX-111, Denacol EX-121, Denacol) EX-141, Denacol EX-145, Denacol EX-146, Denacol EX-171, Denacol EX-192) and the like. In the binder resin (A) of the present invention, the reaction product of the epoxy resin (a) and the unsaturated group-containing carboxylic acid (b) as described above is further reacted with a polybasic carboxylic acid or its anhydride (c). Also included is a binder resin obtained by adding the epoxy group-containing compound (d) to a part of the carboxyl groups of the resin obtained.
本発明のバインダー樹脂(A)のGPCで測定したポリスチレン換算重量平均分子量(Mw)は通常700以上、好ましくは1000以上であり、通常50000以下、好ましくは30000以下である。重量平均分子量が小さすぎると、耐熱性、膜強度に劣り、大きすぎると現像液に対する溶解性が不足するため好ましくない。
本発明のバインダー樹脂(A)の酸価(mgKOH/g)は、通常10以上、好ましくは50以上であり、通常200以下、好ましくは150以下である。酸価が低すぎると十分な溶解性が得られず、酸価が高すぎると硬化性が不足し、表面性が悪化する。
The weight average molecular weight (Mw) in terms of polystyrene measured by GPC of the binder resin (A) of the present invention is usually 700 or more, preferably 1000 or more, and usually 50000 or less, preferably 30000 or less. If the weight average molecular weight is too small, the heat resistance and film strength are inferior, and if too large, the solubility in the developer is insufficient, which is not preferable.
The acid value (mgKOH / g) of the binder resin (A) of the present invention is usually 10 or more, preferably 50 or more, and usually 200 or less, preferably 150 or less. If the acid value is too low, sufficient solubility cannot be obtained, and if the acid value is too high, curability is insufficient and surface properties deteriorate.
これらのバインダー樹脂(A)は、本発明の感光性組成物の全固形分に対して、通常10重量%以上、好ましくは20重量%以上である。バインダー樹脂(A)の含有量が著しく低いと、未露光部分の現像液に対する溶解性が低下し、現像不良を誘起させやすくなる。なお、本発明において「全固形分」とは、溶剤以外の全ての成分を意味する。本発明の感光性組成物中の全固形分は、通常10重量%以上、90重量%以下である。
<光重合開始剤(B)>
本発明に用いられる光重合開始剤は、活性光線によりエチレン性不飽和基を重合させる化合物であれば特に限定されないが、本発明の感光性組成物が、重合可能な基を有する化合物としてエチレン性化合物を含む場合には、光を直接吸収するか光増感されて、分解反応または水素引き抜き反応を起こし、重合活性ラジカルを発生する機能を有する光重合開始剤を使用するのが好ましい。
These binder resins (A) are usually 10% by weight or more, preferably 20% by weight or more based on the total solid content of the photosensitive composition of the present invention. When content of binder resin (A) is remarkably low, the solubility with respect to the developing solution of an unexposed part will fall and it will become easy to induce a development defect. In the present invention, “total solid content” means all components other than the solvent. The total solid content in the photosensitive composition of the present invention is usually 10% by weight or more and 90% by weight or less.
<Photoinitiator (B)>
The photopolymerization initiator used in the present invention is not particularly limited as long as it is a compound that polymerizes an ethylenically unsaturated group by actinic rays, but the photosensitive composition of the present invention is ethylenic as a compound having a polymerizable group. When the compound is contained, it is preferable to use a photopolymerization initiator that has a function of directly absorbing light or photosensitizing to cause a decomposition reaction or a hydrogen abstraction reaction to generate a polymerization active radical.
本発明で用いることができる重合開始剤の具体的な例を以下に列挙する。2−(4−メトキシフェニル)−4,6−ビス(トリクロロメチル)−s−トリアジン、2−(4−メトキシナフチル)−4,6−ビス(トリクロロメチル)−s−トリアジン、2−(4−エトキシナフチル)−4,6−ビス(トリクロロメチル)−s−トリアジン、2−(4−エトキシカルボニルナフチル)−4,6−ビス(トリクロロメチル)−s−トリアジン等のハロメチル化トリアジン誘導体;2−トリクロロメチ−5−(2′−ベンゾフリル)−1,3,4−オキサジアゾール、2−トリクロロメル−5−〔β−(2′−ベンゾフリル)ビニル〕−1,3,4−オキサジアゾール、−トリクロロメチル−5−〔β−(2′−(6″−ベンゾフリル)ビニル)〕
−1,3,4−オキサジアゾール、2−トリクロロメチル−5一フリル−1,3,4−オキサジアゾール等のハロメチル化オキサジアゾール誘導体;2−(2′−クロロフェニル)−4,5−ジフェニルイミダソール2量体、2−(2′−クロロフェニル)−4,5−ビス(3′−メトキシフェニル)イミダゾール2量体、2−(2′−フルオロフェニル)−4,5−ジフェニルイ
ミダゾール2量体、2−(2′−メトキシフエニル)−4,5−ジフェニルイミダゾール2量体、(4′−メトキシフエニル)−4,5−ジフェニルイミダゾール2量体等のイミダゾール誘導体;ベンゾインメチルエーテル、ベンゾインフェニルエーテル、ベンゾインイソブチルエーテル、ベンゾインイソプロピルエーテル等のベンゾインアルキルエーテル類;2−メ
チルアントラキノン、2−エチルアントラキノン、2−t−ブチルアントラキノン、1−クロロアントラキノン等のアントラキノン誘導体;ベンゾフェノン、ミヒラーズケトン、2−
メチルベンゾフェノン、3−メチルベンゾフェノン、4−メチルベンゾフェノン、2−クロ
ロベンゾフェノン、4−ブロモベンゾフェノン、2−カルボキシベンゾフェノン等のベンゾフェノン誘導体;2,2−ジメトキシ−2−フェニルアセトフェノン、2,2−ジエトキシア
セトフェノン、1−ヒドロキシシクロへキシルフェニルケトン、α−ヒドロキシ−2−メチルフェニルプロパノン、1−ヒドロキシ−1−メチルエチル−(p−イソプロピルフェニル
)ケトン、1−ヒドロキシ−1−(p−ドデシルフェニル)ケトン、2−メチル−(4′−(
メチルチオ)フェニル)−2−モルホリノ−1−プロパノン、1,1,1−トリクロロメチル
−(p一ブチルフェニル)ケトン等のアセトフェノン誘導体;チオキサントン、2−エチルチオキサントン、2−イソプロピルチオキサントン、2−クロロチオキサントン、2,4−ジメチルチオキサントン、2、4−ジエチルチオキサントン、2,4−ジイソプロピルチオキサントン等のチオキサントン誘導体;p−ジメチルアミノ安息香酸エチル、P−ジエチルアミノ安息香酸エチル等の安息香酸エステル誘導体;9-フェニルアクリジン、9-(p-メトキシフェニル)アクリジン等のアクリジン誘導体;9,10-ジメチルベンズフェナジン等のフェ
ナジン誘導体;ベンズアンスロン等のアンスロン誘導体;ジ−シクロペンタジエニル−Ti−ジ−クロライド、ジ−シクロペンタジェニル−Ti−ビス−フェニル、ジ−シクロペンタジェニル−Ti−ビス−2,3,4,5,6−ペンタフルオロフェニル−1一イル、ジ−シクロペンタジェニル−Ti−ビス−2,3,5,6−テトラフルオロフェニル−1−イル、ジ−シクロ
ペンタジェニル−Ti−ビス−2,4,6−トリフルオロフェニ−1−イル、ジ−シクロペンタジェニル−Ti−2,6一ジープルオロフェニ−1−イル、ジ−シクロペンタジェニル−Ti−2,4−ジ−フルオロフエニ−1−イル、ジ−メチルシクロペンタジェニル−Ti−ビス−2,3,4,5,6−ペンタフルオロフェニ−1−イル、ジ−メチルシクロペンタジェニル−Ti−ビス−2,6−ジ−フルオロフェニ−1−イル、ジ−シクロペンタジェニル−Ti−2,6−ジ−
フルオロ−3−(ピル−1−イル)−フェニ−1−イル等のチタノセン誘導体。さらには、
特開平2000−80068号公報に記載されているオキシム系開始剤も特に好適に使用できる。
Specific examples of the polymerization initiator that can be used in the present invention are listed below. 2- (4-methoxyphenyl) -4,6-bis (trichloromethyl) -s-triazine, 2- (4-methoxynaphthyl) -4,6-bis (trichloromethyl) -s-triazine, 2- (4 Halomethylated triazine derivatives such as -ethoxynaphthyl) -4,6-bis (trichloromethyl) -s-triazine, 2- (4-ethoxycarbonylnaphthyl) -4,6-bis (trichloromethyl) -s-triazine; 2 -Trichloromethyl-5- (2'-benzofuryl) -1,3,4-oxadiazole, 2-trichloromer-5- [β- (2'-benzofuryl) vinyl] -1,3,4-oxadi Azole, -Trichloromethyl-5-[[beta]-(2 '-(6 "-benzofuryl) vinyl)]
Halomethylated oxadiazole derivatives such as -1,3,4-oxadiazole, 2-trichloromethyl-5-furyl-1,3,4-oxadiazole; 2- (2′-chlorophenyl) -4,5 -Diphenylimidazole dimer, 2- (2'-chlorophenyl) -4,5-bis (3'-methoxyphenyl) imidazole dimer, 2- (2'-fluorophenyl) -4,5-diphenyl Imidazole derivatives such as imidazole dimer, 2- (2'-methoxyphenyl) -4,5-diphenylimidazole dimer, (4'-methoxyphenyl) -4,5-diphenylimidazole dimer; benzoin Benzoin alkyl ethers such as methyl ether, benzoin phenyl ether, benzoin isobutyl ether, benzoin isopropyl ether; 2-methylanthraquinone, 2-ethylanthralkyl Down, 2-t-butyl anthraquinone, anthraquinone derivatives such as 1-chloro anthraquinone; benzophenone, Michler's ketone, 2-
Benzophenone derivatives such as methylbenzophenone, 3-methylbenzophenone, 4-methylbenzophenone, 2-chlorobenzophenone, 4-bromobenzophenone, 2-carboxybenzophenone; 2,2-dimethoxy-2-phenylacetophenone, 2,2-diethoxyacetophenone 1-hydroxycyclohexyl phenyl ketone, α-hydroxy-2-methylphenylpropanone, 1-hydroxy-1-methylethyl- (p-isopropylphenyl) ketone, 1-hydroxy-1- (p-dodecylphenyl) Ketone, 2-methyl- (4 '-(
Acetophenone derivatives such as methylthio) phenyl) -2-morpholino-1-propanone, 1,1,1-trichloromethyl- (p-butylphenyl) ketone; thioxanthone, 2-ethylthioxanthone, 2-isopropylthioxanthone, 2-chlorothioxanthone Thioxanthone derivatives such as 2,4-dimethylthioxanthone, 2,4-diethylthioxanthone, 2,4-diisopropylthioxanthone; benzoic acid ester derivatives such as ethyl p-dimethylaminobenzoate and ethyl p-diethylaminobenzoate; 9-phenyl Acridine derivatives such as acridine and 9- (p-methoxyphenyl) acridine; phenazine derivatives such as 9,10-dimethylbenzphenazine; anthrone derivatives such as benzanthrone; di-cyclopentadienyl-Ti-di-chloride, di- Cyclopentage Ru-Ti-bis-phenyl, di-cyclopentagenyl-Ti-bis-2,3,4,5,6-pentafluorophenyl-1 monoyl, di-cyclopentaenyl-Ti-bis-2, 3,5,6-tetrafluorophenyl-1-yl, di-cyclopentaenyl-Ti-bis-2,4,6-trifluorophen-1-yl, di-cyclopentagenyl-Ti-2, 6-dipuruolophen-1-yl, di-cyclopentagenyl-Ti-2,4-di-fluorophenyl-1-yl, di-methylcyclopentagenyl-Ti-bis-2,3,4 5,6-pentafluorophen-1-yl, di-methylcyclopentaenyl-Ti-bis-2,6-di-fluorophen-1-yl, di-cyclopentaenyl-Ti-2,6- G
Titanocene derivatives such as fluoro-3- (pyr-1-yl) -phen-1-yl. Moreover,
An oxime initiator described in JP-A No. 2000-80068 can also be used particularly suitably.
この他、本発明で用いることができる光重合開始剤は、ファインケミカル、1991年3月1日号、Vol.20、No.4,P.16〜P26や、特開昭59−152396号公報、特開昭61−151197号公報、特公昭45−37377号公報、特開昭58−40302号公報、特開平10−39503号公報にも記載されている。
光重合開始剤の含有率は、本発明の感光性組成物の全固形分に対して、通常0.01重
量%以上、好ましくは0.1重量%以上、更に好ましくは0.5重量以上であり、通常30重量%以下、好ましくは10重量%以下である。含有率が低すぎると感度低下を起こすことがあり、反対に高すぎると未露光部分の現像液に対する溶解性が低下し、現像不良を誘起させやすい。
<光重合性モノマー>
本発明においては、バインダー樹脂(A)と光重合開始剤(B)に加え、さらに光重合性モノマー(光重合性化合物)を使用するのが感度等の点で好ましい。本発明に用いられる光重合性モノマーとしては、エチレン性不飽和基を少なくとも1個有する化合物を挙げることができる。分子内にエチレン性不飽和基を有する化合物の具体例としては、(メタ)アクリル酸、(メタ)アクリル酸のアルキルエステル、アクリロニトリル、スチレン、エチレン性不飽和結合を1個有するカルボン酸と多(単)価アルコールのモノエステル等が挙げられる。
In addition, photopolymerization initiators that can be used in the present invention are described in Fine Chemical, March 1, 1991, Vol. 20, no. 4, P. 16-P26, JP-A-59-152396, JP-A-61-151197, JP-B-45-37377, JP-A-58-40302, JP-A-10-39503 Has been.
The content of the photopolymerization initiator is usually 0.01% by weight or more, preferably 0.1% by weight or more, more preferably 0.5% by weight or more based on the total solid content of the photosensitive composition of the present invention. The amount is usually 30% by weight or less, preferably 10% by weight or less. If the content is too low, the sensitivity may be lowered. On the other hand, if the content is too high, the solubility of the unexposed portion in the developer is lowered, and development failure is likely to be induced.
<Photopolymerizable monomer>
In the present invention, in addition to the binder resin (A) and the photopolymerization initiator (B), it is preferable to use a photopolymerizable monomer (photopolymerizable compound) in terms of sensitivity and the like. Examples of the photopolymerizable monomer used in the present invention include compounds having at least one ethylenically unsaturated group. Specific examples of the compound having an ethylenically unsaturated group in the molecule include (meth) acrylic acid, alkyl ester of (meth) acrylic acid, acrylonitrile, styrene, carboxylic acid having one ethylenically unsaturated bond and many ( And monoesters of monohydric alcohols.
本発明においては、1分子中にエチレン性不飽和基を二個以上有する多官能エチレン性単量体を使用することが望ましい。かかる多官能エチレン性単量体の例としては、例えば脂肪族ポリヒドロキシ化合物と不飽和カルボン酸とのエステル;芳香族ポリヒドロキシ化合物と不飽和カルボン酸とのエステル;脂肪族ポリヒドロキシ化合物、芳香族ポリヒドロキシ化合物等の多価ヒドロキシ化合物と、不飽和カルボン酸及び多塩基性カルボン酸とのエステル化反応により得られるエステルなどが挙げられる。 In the present invention, it is desirable to use a polyfunctional ethylenic monomer having two or more ethylenically unsaturated groups in one molecule. Examples of such polyfunctional ethylenic monomers include, for example, esters of aliphatic polyhydroxy compounds and unsaturated carboxylic acids; esters of aromatic polyhydroxy compounds and unsaturated carboxylic acids; aliphatic polyhydroxy compounds, aromatics Examples thereof include esters obtained by an esterification reaction of a polyvalent hydroxy compound such as a polyhydroxy compound with an unsaturated carboxylic acid and a polybasic carboxylic acid.
前記脂肪族ポリヒドロキシ化合物と不飽和カルボン酸とのエステルとしては、エチレングリコールジアクリレート、トリエチレングリコールジアクリレート、トリメチロールプロパントリアクリレート、トリメチロールエタントリアクリレート、ペンタエリスリトールジアクリレート、ペンタエリスリトールトリアクリレート、ペンタエリスリトールテトラアクリレート、ジペンタエリスリトールテトラアクリレート、ジペンタエリスリトールペンタアクリレート、ジペンタエリスリトールヘキサアクリレート、グリセロールアクリレート等の脂肪族ポリヒドロキシ化合物のアクリル酸エステル、これら例示化合物のアクリレートをメタクリレートに代えたメタクリル酸エステル、同様にイタコネートに代えたイタコン酸エステル、クロネートに代えたクロトン酸エステルもしくはマレエートに代えたマレイン酸エステル等が挙げられる。 Examples of the ester of the aliphatic polyhydroxy compound and the unsaturated carboxylic acid include ethylene glycol diacrylate, triethylene glycol diacrylate, trimethylolpropane triacrylate, trimethylolethane triacrylate, pentaerythritol diacrylate, pentaerythritol triacrylate, Acrylic esters of aliphatic polyhydroxy compounds such as pentaerythritol tetraacrylate, dipentaerythritol tetraacrylate, dipentaerythritol pentaacrylate, dipentaerythritol hexaacrylate, glycerol acrylate, etc. In the same way, itaconic acid ester instead of itaconate, Maleic acid esters in which instead of the crotonic acid ester or maleate was changed to and the like.
芳香族ポリヒドロキシ化合物と不飽和カルボン酸とのエステルとしては、ハイドロキノンジアクリレート、ハイドロキノンジメタクリレート、レゾルシンジアクリレート、レゾルシンジメタクリレート、ピロガロールトリアクリレート等の芳香族ポリヒドロキシ化合物のアクリル酸エステル及びメタクリル酸エステル等が挙げられる。
多塩基性カルボン酸及び不飽和カルボン酸と、多価ヒドロキシ化合物のエステル化反応により得られるエステルとしては必ずしも単一物ではないが代表的な具体例を挙げれば、アクリル酸、フタル酸、及びエチレングリコールの縮合物、アクリル酸、マレイン酸、及びジエチレングリコールの縮合物、メタクリル酸、テレフタル酸及びペンタエリスリトールの縮合物、アクリル酸、アジピン酸、ブタンジオール及びグリセリンの縮合物等がある。
Examples of the ester of an aromatic polyhydroxy compound and an unsaturated carboxylic acid include acrylic acid esters and methacrylic acid esters of aromatic polyhydroxy compounds such as hydroquinone diacrylate, hydroquinone dimethacrylate, resorcin diacrylate, resorcin dimethacrylate, pyrogallol triacrylate and the like. Etc.
The ester obtained by the esterification reaction of a polybasic carboxylic acid and an unsaturated carboxylic acid and a polyvalent hydroxy compound is not necessarily a single substance, but typical examples include acrylic acid, phthalic acid, and ethylene. Condensates of glycols, condensates of acrylic acid, maleic acid and diethylene glycol, condensates of methacrylic acid, terephthalic acid and pentaerythritol, condensates of acrylic acid, adipic acid, butanediol and glycerin.
その他、本発明に用いられる多官能エチレン性単量体の例としては、ポリイソシアネート化合物と水酸基含有(メタ)アクリル酸エステルまたはポリイソシアネート化合物とポリオールおよび水酸基含有(メタ)アクリル酸エステルを反応させて得られる様なウレタン(メタ)アクリレート類;多価エポキシ化合物とヒドロキシ(メタ)アクリレート又は(メタ)アクリル酸との付加反応物のようなエポキシアクリレート類;エチレンビスアクリルアミド等のアクリルアミド類;フタル酸ジアリル等のアリルエステル類;ジビニルフタレート等のビニル基含有化合物等が有用である。 In addition, as an example of the polyfunctional ethylenic monomer used in the present invention, a polyisocyanate compound and a hydroxyl group-containing (meth) acrylate ester or a polyisocyanate compound and a polyol and a hydroxyl group-containing (meth) acrylate ester are reacted. Urethane (meth) acrylates as obtained; epoxy acrylates such as addition reaction product of polyvalent epoxy compound and hydroxy (meth) acrylate or (meth) acrylic acid; acrylamides such as ethylenebisacrylamide; diallyl phthalate Allyl esters such as: vinyl group-containing compounds such as divinyl phthalate are useful.
感光性組成物中の光重合性モノマーの含有率は、全固形分に対して、通常90重量%以下、好ましくは80重量%以下である。光重合性モノマーの含有率が高すぎると、露光部への現像液の浸透性が高くなり、良好な画像を得ることが困難となる。
[感光性着色組成物]
本発明の感光性組成物をカラーフィルター用途などに使用する場合には、感光性組成物に色材を配合して、感光性着色組成物を調製する。
<色材(C)>
色材は、本発明に係る感光性組成物を着色するものをいう。色材としては、染顔料が使用できるが、耐熱性、耐光性等の点から顔料が好ましい。顔料としては青色顔料、緑色顔料、赤色顔料、黄色顔料、紫色顔料、オレンジ顔料、ブラウン顔料、黒色顔料等各種の色の顔料を使用することができる。また、その構造としてはアゾ系、フタロシアニン系、キナクリドン系、ベンズイミダゾロン系、イソインドリノン系、ジオキサジン系、インダンスレン系、ペリレン系等の有機顔料の他に種々の無機顔料等も利用可能である。以下、使用できる顔料の具体例をピグメントナンバーで示す。以下に挙げる「C.I.ピグメントレッド2」等の用語は、カラーインデックス(C.I.)を意味する。
The content of the photopolymerizable monomer in the photosensitive composition is usually 90% by weight or less, preferably 80% by weight or less, based on the total solid content. When the content of the photopolymerizable monomer is too high, the permeability of the developing solution to the exposed portion becomes high, and it becomes difficult to obtain a good image.
[Photosensitive coloring composition]
When using the photosensitive composition of this invention for a color filter use etc., a coloring material is mix | blended with a photosensitive composition and a photosensitive coloring composition is prepared.
<Coloring material (C)>
A coloring material means what colors the photosensitive composition which concerns on this invention. As the coloring material, dyes and pigments can be used, but pigments are preferable from the viewpoint of heat resistance, light resistance and the like. As the pigment, pigments of various colors such as a blue pigment, a green pigment, a red pigment, a yellow pigment, a purple pigment, an orange pigment, a brown pigment, and a black pigment can be used. In addition to organic pigments such as azo, phthalocyanine, quinacridone, benzimidazolone, isoindolinone, dioxazine, indanthrene, and perylene, various inorganic pigments can be used. It is. Hereinafter, specific examples of usable pigments are indicated by pigment numbers. Terms such as “
赤色顔料としては、C.I.ピグメントレッド1、2、3、4、5、6、7、8、9、12、14、15、16、17、21、22、23、31、32、37、38、41、47、48、48:1、48:2、48:3、48:4、49、49:1、49:2、50:1、52:1、52:2、53、53:1、53:2、53:3、57、57:1、57:2、58:4、60、63、63:1、63:2、64、64:1、68、69、81、81:1、81:2、81:3、81:4、83、88、90:1、101、101:1、104、108、108:1、109、112、113、114、122、123、144、146、147、149、151、166、168、169、170、172、173、174、175、176、177、178、179、181、184、185、187、188、190、193、194、200、202、206、207、208、209、210、214、216、220、221、224、230、231、232、233、235、236、237、238、239、242、243、245、247、249、250、251、253、254、255、256、257、258、259、260、262、263、264、265、266、267、268、269、270、271、272、273、274、275、276を挙げることができる。この中でも、好ましくはC.I.ピグメントレッド48:1、122、168、177、202、206、207、209、224、242、254、さらに好ましくはC.I.ピグメントレッド177、209、224、254を挙げることができる。 Examples of red pigments include C.I. I. Pigment Red 1, 2, 3, 4, 5, 6, 7, 8, 9, 12, 14, 15, 16, 17, 21, 22, 23, 31, 32, 37, 38, 41, 47, 48, 48: 1, 48: 2, 48: 3, 48: 4, 49, 49: 1, 49: 2, 50: 1, 52: 1, 52: 2, 53, 53: 1, 53: 2, 53: 3, 57, 57: 1, 57: 2, 58: 4, 60, 63, 63: 1, 63: 2, 64, 64: 1, 68, 69, 81, 81: 1, 81: 2, 81: 3, 81: 4, 83, 88, 90: 1, 101, 101: 1, 104, 108, 108: 1, 109, 112, 113, 114, 122, 123, 144, 146, 147, 149, 151, 166, 168, 169, 170, 172, 173, 174, 175, 176, 177, 178, 17 , 181, 184, 185, 187, 188, 190, 193, 194, 200, 202, 206, 207, 208, 209, 210, 214, 216, 220, 221, 224, 230, 231, 232, 233, 235 236, 237, 238, 239, 242, 243, 245, 247, 249, 250, 251, 253, 254, 255, 256, 257, 258, 259, 260, 262, 263, 264, 265, 266, 267 268, 269, 270, 271, 272, 273, 274, 275, 276. Of these, C.I. I. Pigment Red 48: 1, 122, 168, 177, 202, 206, 207, 209, 224, 242, 254, more preferably C.I. I. Pigment red 177, 209, 224, 254.
青色顔料としては、C.I.ピグメントブルー1、1:2、9、14、15、15:1、15:2、15:3、15:4、15:6、16、17、19、25、27、28、29、33、35、36、56、56:1、60、61、61:1、62、63、66、67、68、71、72、73、74、75、76、78、79を挙げることができる。この中でも、好ましくはC.I.ピグメントブルー15、15:1、15:2、15:3、15:4、15:6、さらに好ましくはC.I.ピグメントブルー15:6を挙げることができる。 Examples of blue pigments include C.I. I. Pigment Blue 1, 1: 2, 9, 14, 15, 15: 1, 15: 2, 15: 3, 15: 4, 15: 6, 16, 17, 19, 25, 27, 28, 29, 33, 35, 36, 56, 56: 1, 60, 61, 61: 1, 62, 63, 66, 67, 68, 71, 72, 73, 74, 75, 76, 78, 79. Of these, C.I. I. Pigment Blue 15, 15: 1, 15: 2, 15: 3, 15: 4, 15: 6, more preferably C.I. I. Pigment blue 15: 6.
緑色顔料としては、C.I.ピグメントグリーン1、2、4、7、8、10、13、14、15、17、18、19、26、36、45、48、50、51、54、55を挙げることができる。この中でも、好ましくはC.I.ピグメントグリーン7、36を挙げることができる。
黄色顔料としては、C.I.ピグメントイエロー1、1:1、2、3、4、5、6、9、10、12、13、14、16、17、24、31、32、34、35、35:1、36、36:1、37、37:1、40、41、42、43、48、53、55、61、6
2、62:1、63、65、73、74、75,81、83、87、93、94、95、97、100、101、104、105、108、109、110、111、116、117、119、120、126、127、127:1、128、129、133、134、136、138、139、142、147、148、150、151、153、154、155、157、158、159、160、161、162、163、164、165、166、167、168、169、170、172、173、174、175、176、180、181、182、183、184、185、188、189、190、191、191:1、192、193、194、195、196、197、198、199、200、202、203、204、205、206、207、208を挙げることができる。この中でも、好ましくはC.I.ピグメントイエロー83、117、129、138、139、150、154、155、180、185、さらに好ましくはC.I.ピグメントイエロー83、138、139、150、180を挙げることができる。
Examples of green pigments include C.I. I.
Examples of yellow pigments include C.I. I. Pigment Yellow 1, 1: 1, 2, 3, 4, 5, 6, 9, 10, 12, 13, 14, 16, 17, 24, 31, 32, 34, 35, 35: 1, 36, 36: 1, 37, 37: 1, 40, 41, 42, 43, 48, 53, 55, 61, 6
2, 62: 1, 63, 65, 73, 74, 75, 81, 83, 87, 93, 94, 95, 97, 100, 101, 104, 105, 108, 109, 110, 111, 116, 117, 119, 120, 126, 127, 127: 1, 128, 129, 133, 134, 136, 138, 139, 142, 147, 148, 150, 151, 153, 154, 155, 157, 158, 159, 160, 161, 162, 163, 164, 165, 166, 167, 168, 169, 170, 172, 173, 174, 175, 176, 180, 181, 182, 183, 184, 185, 188, 189, 190, 191, 191: 1, 192, 193, 194, 195, 196, 197, 198, 199, 200, 202, 203, 20 , Mention may be made of 205, 206, 207, and 208. Of these, C.I. I. Pigment yellow 83, 117, 129, 138, 139, 150, 154, 155, 180, 185, more preferably C.I. I. Pigment yellow 83, 138, 139, 150, 180.
オレンジ顔料としては、C.I.ピグメントオレンジ1、2、5、13、16、17、19、20、21、22、23、24、34、36、38、39、43、46、48、49、61、62、64、65、67、68、69、70、71、72、73、74、75、77、78、79を挙げることができる。この中でも、好ましくは、C.I.ピグメントオレンジ38、71を挙げることができる。
Examples of orange pigments include C.I. I.
紫色顔料としては、C.I.ピグメントバイオレット1、1:1、2、2:2、3、3:1、3:3、5、5:1、14、15、16、19、23、25、27、29、31、32、37、39、42、44、47、49、50を挙げることができる。この中でも、好ましくはC.I.ピグメントバイオレット19、23、さらに好ましくはC.I.ピグメントバイオレット23を挙げることができる。 Examples of purple pigments include C.I. I. Pigment Violet 1, 1: 1, 2, 2: 2, 3, 3: 1, 3: 3, 5, 5: 1, 14, 15, 16, 19, 23, 25, 27, 29, 31, 32, 37, 39, 42, 44, 47, 49, 50. Of these, C.I. I. Pigment violet 19, 23, more preferably C.I. I. And CI Pigment Violet 23.
また感光性着色組成物を用いて、カラーフィルターの樹脂ブラックマトリクスを形成する場合には、黒色の色材を用いることができる。黒色色材は、黒色色材を単独でもよく、または赤、緑、青等の混合によるものでもよい。また、これら色材は無機または有機の顔料、染料の中から適宜選択することができる。無機、有機顔料の場合には平均粒径1μm以下、好ましくは0.5μm以下に分散して用いるのが好ましい。 Moreover, when forming the resin black matrix of a color filter using a photosensitive coloring composition, a black coloring material can be used. The black color material may be a single black color material or a mixture of red, green, blue and the like. These color materials can be appropriately selected from inorganic or organic pigments and dyes. In the case of inorganic and organic pigments, it is preferable to use the pigment dispersed in an average particle size of 1 μm or less, preferably 0.5 μm or less.
黒色色材を調製するために混合使用可能な色材としては、ビクトリアピュアブルー(42595)、オーラミンO(41000)、カチロンブリリアントフラビン(ベーシック13)、ローダミン6GCP(45160)、ローダミンB(45170)、サフラニンOK70:100(50240)、エリオグラウシンX(42080)、No.120/リオノールイエロー(21090)、リオノールイエローGRO(21090)、シムラーファーストイエロー8GF(21105)、ベンジジンイエロー4T−564D(21095)、シムラーファーストレッド4015(12355)、リオノールレッド7B4401(15850)、ファーストゲンブルーTGR−L(74160)、リオノールブルーSM(26150)、リオノールブルーES(ピグメントブルー15:6)、リオノーゲンレッドGD(ピグメントレッド168)、リオノールグリーン2YS(ピグメントグリーン36)等が挙げられる(なお、上記の( )内の数字は、カラーインデックス(C.I.)を意味する)。 Color materials that can be mixed for preparing a black color material include Victoria Pure Blue (42595), Auramin O (41000), Catillon Brilliant Flavin (Basic 13), Rhodamine 6GCP (45160), Rhodamine B (45170). Safranin OK 70: 100 (50240), Erioglaucine X (42080), No. 120 / Lionol Yellow (21090), Lionol Yellow GRO (21090), Shimla First Yellow 8GF (21105), Benzidine Yellow 4T-564D (21095), Shimler First Red 4015 (12355), Lionol Red 7B4401 (15850), Fast Gen Blue TGR-L (74160), Lionol Blue SM (26150), Lionol Blue ES (Pigment Blue 15: 6), Lionogen Red GD (Pigment Red 168), Lionol Green 2YS (Pigment Green 36), etc. (The numbers in parentheses above mean the color index (CI)).
また、さらに他の混合使用可能な顔料についてC.I.ナンバーにて示すと、例えば、C.I.黄色顔料20、24、86、93、109、110、117、125、137、138、147、148、153、154、166、C.I.オレンジ顔料36、43、51、55、59、61、C.I.赤色顔料9、97、122、123、149、168、177、180、192、215、216、217、220、223、224、226、227、228、240、C.I.バイオレット顔料19、23、29、30、37、
40、50、C.I.青色顔料15、15:1、15:4、22、60、64、C.I.緑色顔料7、C.I.ブラウン顔料23、25、26等を挙げることができる。
In addition, other pigments that can be used in combination are C.I. I. For example, C.I. I. Yellow pigments 20, 24, 86, 93, 109, 110, 117, 125, 137, 138, 147, 148, 153, 154, 166, C.I. I. Orange pigments 36, 43, 51, 55, 59, 61, C.I. I. Red pigments 9, 97, 122, 123, 149, 168, 177, 180, 192, 215, 216, 217, 220, 223, 224, 226, 227, 228, 240, C.I. I. Violet pigments 19, 23, 29, 30, 37,
40, 50, C.I. I. Blue pigment 15, 15: 1, 15: 4, 22, 60, 64, C.I. I. Green pigment 7, C.I. I. Examples thereof include brown pigments 23, 25, and 26.
また、単独使用可能な黒色色材としては、カーボンブラック、アセチレンブラック、ランプブラック、ボーンブラック、黒鉛、鉄黒、アニリンブラック、シアニンブラック、チタンブラック等が挙げられる。
これらの中で、カーボンブラックが遮光率、画像特性の観点から好ましい。カーボンブラックの例としては、以下のようなカーボンブラックが挙げられる。
Examples of the black color material that can be used alone include carbon black, acetylene black, lamp black, bone black, graphite, iron black, aniline black, cyanine black, and titanium black.
Among these, carbon black is preferable from the viewpoints of light shielding rate and image characteristics. Examples of carbon black include the following carbon black.
三菱化学社製:MA7、MA8、MA11、MA100、MA100R、MA220、MA230、MA600、#5、#10、#20、#25、#30、#32、#33、#40、#44、#45、#47、#50、#52、#55、#650、#750、#850、#950、#960、#970、#980、#990、#1000、#2200、#2300、#2350、#2400、#2600、#3050、#3150、#3250、#3600、#3750、#3950、#4000、#4010、OIL7B、OIL9B、OIL11B、OIL30B、OIL31Bデグサ社製:Printex3、Printex3OP、Printex30、Printex30OP、Printex40、Printex45、Printex55、Printex60、Printex75、Printex80、Printex85、Printex90、Printex A、Printex L、Printex G、Printex P、Printex U、Printex V、PrintexG、SpecialBlack550、SpecialBlack350、SpecialBlack250、SpecialBlack100、SpecialBlack6、SpecialBlack5、SpecialBlack4、Color Black FW1、Color
Black FW2、Color Black FW2V、Color Black FW18、Color Black FW18、Color Black FW200、Color Black S160、Color Black
S170キャボット社製:Monarch120、Monarch280、Monarch460、Monarch800、Monarch880、Monarch900、Monarch1000、Monarch1100、Monarch1300、Monarch1400、Monarch4630、REGAL99、REGAL99R、REGAL415、REGAL415R、REGAL250、REGAL250R、REGAL330、REGAL400R、REGAL55R0、REGAL660R、BLACK PEARLS480、PEARLS130、VULCAN XC72R、ELFTEX−8コロンビヤン カーボン社製:RAVEN11、RAVEN14、RAVEN15、RAVEN16、RAVEN22RAVEN30、RAVEN35、RAVEN40、RAVEN410、RAVEN420、RAVEN450、RAVEN500、RAVEN780、RAVEN850、RAVEN890H、RAVEN1000、RAVEN1020、RAVEN1040、RAVEN1060U、RAVEN1080U、RAVEN1170、RAVEN1190U、RAVEN1250、RAVEN1500、RAVEN2000、RAVEN2500U、RAVEN3500、RAVEN5000、RAVEN5250、RAVEN5750、RAVEN7000
他の黒色顔料の例としては、チタンブラック、アニリンブラック、酸化鉄系黒色顔料、及び、赤色、緑色、青色の三色の有機顔料を混合して黒色顔料として用いることができる。
Mitsubishi Chemical Corporation: MA7, MA8, MA11, MA100, MA100R, MA220, MA230, MA600, # 5, # 10, # 20, # 25, # 30, # 32, # 33, # 40, # 44, # 45 # 47, # 50, # 52, # 55, # 650, # 750, # 850, # 950, # 960, # 970, # 980, # 990, # 1000, # 2200, # 2300, # 2350, # 2400, # 2600, # 3050, # 3150, # 3250, # 3600, # 3750, # 3950, # 4000, # 4010, OIL7B, OIL9B, OIL11B, OIL30B, OIL31B Made by Degussa: Printex3, Printex3OP, Printex30, Printex30OP Printex40, Printex45, Pri tex55, Printex60, Printex75, Printex80, Printex85, Printex90, Printex A, Printex L, Printex G, Printex P, Printex U, Printex V, PrintexG, SpecialBlack550, SpecialBlack350, SpecialBlack250, SpecialBlack100, SpecialBlack6, SpecialBlack5, SpecialBlack4, Color Black FW1, Color
Black FW2, Color Black FW2V, Color Black FW18, Color Black FW18, Color Black FW200, Color Black S160, Color Black
S170 manufactured by Cabot Corporation: Monarch120, Monarch280, Monarch460, Monarch800, Monarch880, Monarch900, Monarch1000, Monarch1100, Monarch1300, Monarch1400, Monarch4630, REGAL99, REGAL99R, REGAL415, REGAL415R, REGAL250, REGAL250R, REGAL330, REGAL400R, REGAL55R0, REGAL660R, BLACK PEARLS480, PEARLS130, VULCAN XC72R, ELFTEX-8 Colombian Carbon Corporation: RAVEN11, RAVEN14, RAVEN15, RAVEN16, RAVEN22RAV N30, Raven35, Raven40, Raven410, Raven420, Raven450, Raven450, Raven500, Raven780, Raven850, Raven890H, Raven1000, Raven1020, Raven1040, Raven1060U, Raven1080U, Raven1170, Raven1190U, Raven1170, Raven1170U RAVEN7000
As examples of other black pigments, titanium black, aniline black, iron oxide black pigments, and organic pigments of three colors of red, green, and blue can be mixed and used as black pigments.
また、顔料として、硫酸バリウム、硫酸鉛、酸化チタン、黄色鉛、ベンガラ、酸化クロム等を用いることもできる。
これら各種の顔料は、複数種を併用することもできる。例えば、色度の調整のために、顔料として、緑色顔料と黄色顔料とを併用したり、青色顔料と紫色顔料とを併用したりす
ることができる。
In addition, barium sulfate, lead sulfate, titanium oxide, yellow lead, bengara, chromium oxide, and the like can also be used as the pigment.
These various pigments can be used in combination. For example, in order to adjust the chromaticity, a green pigment and a yellow pigment can be used in combination, or a blue pigment and a violet pigment can be used in combination.
なお、これらの顔料の平均粒径は通常1μm、好ましくは0.5μm以下、更に好ましくは0.25μm以下である。また、色材として使用できる染料としては、アゾ系染料、アントラキノン系染料、フタロシアニン系染料、キノンイミン系染料、キノリン系染料、ニトロ系染料、カルボニル系染料、メチン系染料等が挙げられる。
アゾ系染料としては、例えば、C.I.アシッドイエロー11,C.I.アシッドオレンジ7,C.I.アシッドレッド37,C.I.アシッドレッド180,C.I.アシッドブルー29,C.I.ダイレクトレッド28,C.I.ダイレクトレッド83,C.I.ダイレクトイエロー12,C.I.ダイレクトオレンジ26,C.I.ダイレクトグリーン28,C.I.ダイレクトグリーン59,C.I.リアクティブイエロー2,C.I.リアクティブレッド17,C.I.リアクティブレッド120,C.I.リアクティブブラック5,C.I.ディスパースオレンジ5,C.I.ディスパースレッド58,C.I.ディスパースブルー165,C.I.ベーシックブルー41,C.I.ベーシックレッド18,C.I.モルダントレッド7,C.I.モルダントイエロー5,C.I.モルダントブラック7等が挙げられる。
The average particle size of these pigments is usually 1 μm, preferably 0.5 μm or less, more preferably 0.25 μm or less. Examples of dyes that can be used as the colorant include azo dyes, anthraquinone dyes, phthalocyanine dyes, quinoneimine dyes, quinoline dyes, nitro dyes, carbonyl dyes, and methine dyes.
Examples of the azo dye include C.I. I. Acid Yellow 11, C.I. I. Acid Orange 7, C.I. I. Acid Red 37, C.I. I. Acid Red 180, C.I. I. Acid Blue 29, C.I. I. Direct Red 28, C.I. I. Direct Red 83, C.I. I. Direct Yellow 12, C.I. I. Direct Orange 26, C.I. I. Direct Green 28, C.I. I. Direct Green 59, C.I. I. Reactive Yellow 2, C.I. I. Reactive Red 17, C.I. I. Reactive Red 120, C.I. I. Reactive Black 5, C.I. I. Disperse Orange 5, C.I. I. Disperse thread 58, C.I. I. Disperse Blue 165, C.I. I. Basic Blue 41, C.I. I. Basic Red 18, C.I. I. Molded Red 7, C.I. I. Moldant Yellow 5, C.I. I. Examples thereof include Moldant Black 7.
アントラキノン系染料としては、例えば、C.I.バットブルー4,C.I.アシッドブルー40,C.I.アシッドグリーン25,C.I.リアクティブブルー19,C.I.リアクティブブルー49,C.I.ディスパースレッド60,C.I.ディスパースブルー56,C.I.ディスパースブルー60等が挙げられる。
この他、フタロシアニン系染料として、例えば、C.I.パッドブルー5等が、キノンイミン系染料として、例えば、C.I.ベーシックブルー3,C.I.ベーシックブルー9等が、キノリン系染料として、例えば、C.I.ソルベントイエロー33,C.I.アシッドイエロー3,C.I.ディスパースイエロー64等が、ニトロ系染料として、例えば、C.I.アシッドイエロー1,C.I.アシッドオレンジ3,C.I.ディスパースイエロー42等が挙げられる。
Examples of anthraquinone dyes include C.I. I. Bat Blue 4, C.I. I. Acid Blue 40, C.I. I. Acid Green 25, C.I. I. Reactive Blue 19, C.I. I. Reactive Blue 49, C.I. I. Disper thread 60, C.I. I. Disperse Blue 56, C.I. I. Disperse Blue 60 etc. are mentioned.
Other examples of the phthalocyanine dye include C.I. I. Pad Blue 5 and the like are quinone imine dyes such as C.I. I. Basic Blue 3, C.I. I. Basic Blue 9 and the like are quinoline dyes such as C.I. I. Solvent Yellow 33, C.I. I. Acid Yellow 3, C.I. I. Disperse Yellow 64 and the like are nitro dyes such as C.I. I. Acid Yellow 1, C.I. I. Acid Orange 3, C.I. I. Disperse Yellow 42 and the like.
感光性着色組成物中の全固形分中に占める色材(C)の割合は、通常、感光性組成物中の全固形分量に対して1〜70重量%の範囲で選ぶことができる。この範囲の中では、10〜70重量%がより好ましく、中でも20〜60重量%が特に好ましい。色材の割合が少なすぎると、色濃度に対する膜厚が大きくなりすぎて、液晶セル化の際のギャップ制御などに悪影響を及ぼす。また、逆に色材の割合が多すぎると、十分な画像形成性が得られなくなることがある。尚、本発明の感光性着色組成物中の全固形分は、通常10重量%以上、80重量%以下である。 The ratio of the coloring material (C) in the total solid content in the photosensitive coloring composition can be usually selected in the range of 1 to 70% by weight with respect to the total solid content in the photosensitive composition. In this range, 10 to 70% by weight is more preferable, and 20 to 60% by weight is particularly preferable. When the ratio of the color material is too small, the film thickness with respect to the color density becomes too large, which adversely affects the gap control when the liquid crystal cell is formed. On the other hand, if the ratio of the color material is too large, sufficient image formability may not be obtained. In addition, the total solid content in the photosensitive coloring composition of the present invention is usually 10% by weight or more and 80% by weight or less.
また顔料の分散性の向上、分散安定性の向上のために顔料誘導体等を添加しても良い。顔料誘導体としてはアゾ系、フタロシアニン系、キナクリドン系、ベンズイミダゾロン系、キノフタロン系、イソインドリノン系、ジオキサジン系、アントラキノン系、インダンスレン系、ペリレン系、ペリノン系、ジケトピロロピロール系、ジオキサジン系等の誘導体が挙げられるが、中でもキノフタロン系が好ましい。顔料誘導体の置換基としてはスルホン酸基、スルホンアミド基及びその4級塩、フタルイミドメチル基、ジアルキルアミノアルキル基、水酸基、カルボキシル基、アミド基等が顔料骨格に直接またはアルキル基、アリール基、複素環基等を介して結合したものが挙げられ、好ましくはスルホン酸基である。またこれら置換基は一つの顔料骨格に複数置換していても良い。顔料誘導体の具体例としてはフタロシアニンのスルホン酸誘導体、キノフタロンのスルホン酸誘導体、アントラキノンのスルホン酸誘導体、キナクリドンのスルホン酸誘導体、ジケトピロロピロールのスルホン酸誘導体、ジオキサジンのスルホン酸誘導体等が挙げられる。顔料誘導体の添加量は顔料に対して通常0.1〜30重量%、好ましくは0.1〜20重量%以下、より好ましくは0.1〜10重量%、さらに好ましくは0.1〜5重量%以下である。 A pigment derivative or the like may be added to improve the dispersibility of the pigment and improve the dispersion stability. As pigment derivatives, azo, phthalocyanine, quinacridone, benzimidazolone, quinophthalone, isoindolinone, dioxazine, anthraquinone, indanthrene, perylene, perinone, diketopyrrolopyrrole, dioxazine Derivatives such as quinophthalone are preferable. As substituents of pigment derivatives, sulfonic acid groups, sulfonamide groups and their quaternary salts, phthalimidomethyl groups, dialkylaminoalkyl groups, hydroxyl groups, carboxyl groups, amide groups, etc. can be directly in the pigment skeleton or alkyl groups, aryl groups, complex groups. Examples thereof include those bonded via a ring group or the like, and a sulfonic acid group is preferable. Further, a plurality of these substituents may be substituted on one pigment skeleton. Specific examples of the pigment derivative include phthalocyanine sulfonic acid derivatives, quinophthalone sulfonic acid derivatives, anthraquinone sulfonic acid derivatives, quinacridone sulfonic acid derivatives, diketopyrrolopyrrole sulfonic acid derivatives, and dioxazine sulfonic acid derivatives. The addition amount of the pigment derivative is usually 0.1 to 30% by weight, preferably 0.1 to 20% by weight or less, more preferably 0.1 to 10% by weight, still more preferably 0.1 to 5% by weight based on the pigment. % Or less.
また、本発明の感光性組成物および感光性着色組成物には、有機溶剤、顔料分散剤、密着向上剤、塗布性向上剤、現像改良剤、紫外線吸収剤、酸化防止剤、シランカップリング剤等を適宜配合することができる。
<有機溶剤>
有機溶剤としては特に制限は無いが、例えば、ジイソプロピルエーテル、ミネラルスピリット、n−ペンタン、アミルエーテル、エチルカプリレート、n−ヘキサン、ジエチルエーテル、イソプレン、エチルイソブチルエーテル、ブチルステアレート、n−オクタン、バルソル#2、アプコ#18ソルベント、ジイソブチレン、アミルアセテート、ブチルブチレート、アプコシンナー、ブチルエーテル、ジイソブチルケトン、メチルシクロヘキセン、メチルノニルケトン、プロピルエーテル、ドデカン、Socal solvent
No.1およびNo.2、アミルホルメート、ジヘキシルエーテル、ジイソプロピルケトン、ソルベッソ#150、酢酸ブチル(n、sec、t)、ヘキセン、シェル TS28 ソルベント、ブチルクロライド、エチルアミルケトン、エチルベンゾネート、アミルクロライド、エチレングリコールジエチルエーテル、エチルオルソホルメート、メトキシメチルペンタノン、メチルブチルケトン、メチルヘキシルケトン、メチルイソブチレート、ベンゾニトリル、エチルプロピオネート、メチルセロソルブアセテート、メチルイソアミルケトン、メチルイソブチルケトン、プロピルアセテート、アミルアセテート、アミルホルメート、ビシクロヘキシル、ジエチレングリコールモノエチルエーテルアセテート、ジペンテン、メトキシメチルペンタノール、メチルアミルケトン、メチルイソプロピルケトン、プロピルプロピオネート、プロピレングリコール−t−ブチルエーテル、メチルエチルケトン、メチルセロソルブ、エチルセロソルブ、エチルセロソルブアセテート、カルビトール、シクロヘキサノン、酢酸エチル、プロピレングリコール、プロピレングリコールモノメチルエーテル、プロピレングリコールモノメチルエーテルアセテート、プロピレングリコールモノエチルエーテル、プロピレングリコールモノエチルエーテルアセテート、ジプロピレングリコールモノエチルエーテル、ジプロピレングリコールモノメチルエーテル、プロピレングリコールモノエチルエーテルアセテート、ジプロピレングリコールモノメチルエーテルアセテート、3−メトキシプロピオン酸、3−エトキシプロピオン酸、3−エトキシプロピオン酸エチル、3−メトキシプロピオン酸メチル、3−メトキシプロピオン酸エチル、3−メトキシプロピオン酸プロピル、3−メトキシプロピオン酸ブチル、ジグライム、ジプロピレングリコールモノメチルエーテル、エチレングリコールアセテート、エチルカルビトール、ブチルカルビトール、エチレングリコールモノブチルエーテル、プロピレングリコール−t−ブチルエーテル、3−メチル−3−メトキシブタノール、トリプロピレングリコールメチルエーテル、3−メチル−3−メトキシブチルアセテート等の有機溶剤を具体的に挙げることができる。
The photosensitive composition and photosensitive coloring composition of the present invention include an organic solvent, a pigment dispersant, an adhesion improver, a coating improver, a development improver, an ultraviolet absorber, an antioxidant, and a silane coupling agent. Etc. can be suitably blended.
<Organic solvent>
Although there is no restriction | limiting in particular as an organic solvent, For example, diisopropyl ether, mineral spirit, n-pentane, amyl ether, ethyl caprylate, n-hexane, diethyl ether, isoprene, ethyl isobutyl ether, butyl stearate, n-octane,
No. 1 and no. 2, amyl formate, dihexyl ether, diisopropyl ketone, Solvesso # 150, butyl acetate (n, sec, t), hexene, shell TS28 solvent, butyl chloride, ethyl amyl ketone, ethyl benzoate, amyl chloride, ethylene glycol diethyl ether , Ethyl orthoformate, methoxymethylpentanone, methyl butyl ketone, methyl hexyl ketone, methyl isobutyrate, benzonitrile, ethyl propionate, methyl cellosolve acetate, methyl isoamyl ketone, methyl isobutyl ketone, propyl acetate, amyl acetate, Amylformate, bicyclohexyl, diethylene glycol monoethyl ether acetate, dipentene, methoxymethylpentanol, methylamino Ketone, methyl isopropyl ketone, propyl propionate, propylene glycol-t-butyl ether, methyl ethyl ketone, methyl cellosolve, ethyl cellosolve, ethyl cellosolve acetate, carbitol, cyclohexanone, ethyl acetate, propylene glycol, propylene glycol monomethyl ether, propylene glycol monomethyl ether Acetate, propylene glycol monoethyl ether, propylene glycol monoethyl ether acetate, dipropylene glycol monoethyl ether, dipropylene glycol monomethyl ether, propylene glycol monoethyl ether acetate, dipropylene glycol monomethyl ether acetate, 3-methoxypropionic acid, 3- Ethoxypropionic acid , Ethyl 3-ethoxypropionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, propyl 3-methoxypropionate, butyl 3-methoxypropionate, diglyme, dipropylene glycol monomethyl ether, ethylene glycol acetate, ethyl carb Specific organic solvents such as Tol, butyl carbitol, ethylene glycol monobutyl ether, propylene glycol-t-butyl ether, 3-methyl-3-methoxybutanol, tripropylene glycol methyl ether, 3-methyl-3-methoxybutyl acetate Can be mentioned.
溶剤は各成分を溶解または分散させることができるもので、沸点が100〜250℃の範囲のものを選択するのが好ましい。より好ましくは120〜170℃の沸点をもつものである。これらの溶剤は単独もしくは混合して使用することができる。
<顔料分散剤>
分散処理においては、特に顔料分散剤として高分子分散剤を用いると経時の分散安定性に優れるので好ましい。高分子分散剤としては、例えば、ウレタン系分散剤、ポリエチレンイミン系分散剤、ポリオキシエチレンアルキルエーテル系分散剤、ポリオキシエチレングリコールジエステル系分散剤、ソルビタン脂肪族エステル系分散剤、脂肪族変性ポリエステル系分散剤等を挙げることができる。このような分散剤の具体例としては、商品名で、EFKA(エフカーケミカルズビーブイ(EFKA)社製)、Disperbik(ビックケミー社製)、ディスパロン(楠本化成(株)製)、SOLSPERSE(ゼネカ社製)、KP(信越化学工業(株)製)、ポリフロー(共栄社化学(株)社製)等を挙げることができる。これらの分散剤は、単独でまたは2種以上を混合して使用することができる。顔料分散剤の含有量は、感光性着色組成物の固形分中、通常50重量%以下、好まし
くは30重量%以下である。
The solvent is capable of dissolving or dispersing each component, and it is preferable to select a solvent having a boiling point in the range of 100 to 250 ° C. More preferably, it has a boiling point of 120-170 ° C. These solvents can be used alone or in combination.
<Pigment dispersant>
In the dispersion treatment, it is particularly preferable to use a polymer dispersant as the pigment dispersant because the dispersion stability over time is excellent. Examples of the polymer dispersant include a urethane dispersant, a polyethyleneimine dispersant, a polyoxyethylene alkyl ether dispersant, a polyoxyethylene glycol diester dispersant, a sorbitan aliphatic ester dispersant, and an aliphatic modified polyester. And the like, and the like. Specific examples of such a dispersant include trade names of EFKA (manufactured by EFKA Chemicals Beebuy (EFKA)), Disperbik (manufactured by BYK Chemie), Disparon (manufactured by Enomoto Kasei Co., Ltd.), and SOLPERSE (manufactured by GENECA). ), KP (manufactured by Shin-Etsu Chemical Co., Ltd.), polyflow (manufactured by Kyoeisha Chemical Co., Ltd.) and the like. These dispersants can be used alone or in admixture of two or more. The content of the pigment dispersant is usually 50% by weight or less, preferably 30% by weight or less in the solid content of the photosensitive coloring composition.
<シランカップリング剤>
また、基板との密着性を改善するため、シランカップリング剤を添加することも可能である。シランカップリング剤の種類としては、エポキシ系、メタクリル系、アミノ系等種々の物が使用できるが、特にエポキシ系のシランカップリング剤が好ましい。
[感光性着色組成物の製造方法]
本発明の感光性着色組成物は、常法に従って製造される。例えば、まず、色材、溶剤、および分散剤とを各所定量秤量し、分散処理工程において、色材を分散させて液状の着色組成物(インク状液体)とする。この分散処理工程では、ペイントコンディショナー、サンドグラインダー、ボールミル、ロールミル、ストーンミル、ジェットミル、ホモジナイザーなどを使用することができる。この分散処理を行うことによって色材が微粒子化されるため、感光性着色組成物の塗布特性が向上し、製品のカラーフィルタ基板の透過率が向上する。
<Silane coupling agent>
In addition, a silane coupling agent can be added to improve the adhesion to the substrate. Various types of silane coupling agents such as epoxy, methacrylic, amino and the like can be used, and epoxy silane coupling agents are particularly preferable.
[Production method of photosensitive coloring composition]
The photosensitive coloring composition of this invention is manufactured in accordance with a conventional method. For example, first, a predetermined amount of each of the coloring material, the solvent, and the dispersing agent is weighed, and in the dispersion treatment step, the coloring material is dispersed to obtain a liquid colored composition (ink-like liquid). In this dispersion treatment step, a paint conditioner, a sand grinder, a ball mill, a roll mill, a stone mill, a jet mill, a homogenizer, or the like can be used. By performing this dispersion treatment, the coloring material is made fine particles, so that the coating characteristics of the photosensitive coloring composition are improved, and the transmittance of the product color filter substrate is improved.
色材を分散処理する際に、前記のバインダー樹脂、または分散助剤などを適宜併用するのが好ましい。例えば、サンドグラインダーを用いて分散処理を行う場合は、0.1から数mm径のガラスビーズ、または、ジルコニアビーズを用いるのが好ましい。分散処理する際の温度は通常、0℃〜100℃の範囲、好ましくは室温〜80℃の範囲に設定する。なお、分散時間は、インキ状液体の組成{色材、溶剤、分散剤}、およびサンドグラインダーの装置の大きさなどにより適正時間が異なるため、適宜調整する必要がある。 When the color material is subjected to a dispersion treatment, it is preferable to appropriately use the binder resin or the dispersion aid. For example, when the dispersion treatment is performed using a sand grinder, it is preferable to use glass beads or zirconia beads having a diameter of 0.1 to several mm. The temperature for the dispersion treatment is usually set in the range of 0 ° C to 100 ° C, preferably in the range of room temperature to 80 ° C. The dispersion time varies depending on the composition of the ink-like liquid {coloring material, solvent, dispersant}, the size of the sand grinder apparatus, and the like, and therefore needs to be adjusted as appropriate.
上記分散処理によって得られたインキ状液体に、溶剤、バインダー樹脂、場合によっては、所定量の光重合性モノマー、光重合開始剤系成分、および上記以外の成分などを混合し、均一な分散溶液とする。なお、分散処理工程および混合の各工程においては、微細なゴミが混入することがあるため、得られたインキ状液体をフィルターなどによって、ろ過処理することが好ましい。 The ink-like liquid obtained by the above dispersion treatment is mixed with a solvent, a binder resin, and in some cases, a predetermined amount of a photopolymerizable monomer, a photopolymerization initiator system component, and components other than those described above to obtain a uniform dispersion solution And In addition, in each process of a dispersion | distribution process and mixing, since fine refuse may mix, it is preferable to filter the obtained ink-like liquid with a filter etc.
調製された感光性着色組成物中のバインダー樹脂(A)の含有率は、全固形分に対して、通常5重量%以上、好ましくは10重量%以上であり、通常95重量%以下であり、好ましくは80重量%以下である。
感光性着色組成物中の光重合性モノマーの含有量は、全固形分に対して、通常90重量%以下、であり、好ましくは80重量%以下である。含有率が高すぎると、露光部への現像液の浸透性が高くなり、画素のシャープ性や密着性が悪化する。
The content of the binder resin (A) in the prepared photosensitive coloring composition is usually 5% by weight or more, preferably 10% by weight or more, and usually 95% by weight or less, based on the total solid content. Preferably it is 80 weight% or less.
The content of the photopolymerizable monomer in the photosensitive coloring composition is usually 90% by weight or less, preferably 80% by weight or less, based on the total solid content. When the content is too high, the permeability of the developing solution to the exposed portion is increased, and the sharpness and adhesion of the pixel are deteriorated.
また、感光性着色組成物中の、バインダー樹脂(A)の色材に対する比率としては、通常20〜500重量%、好ましくは30〜300重量%、より好ましくは50〜200重量%の範囲である。バインダー樹脂(A)の含有量が低すぎると、未露光部分の現像液に対する溶解性が低下し、現像不良を誘起させやすく、著しく高いと、所望の画素膜厚が得られ難くなる。 Moreover, as a ratio with respect to a coloring material of binder resin (A) in a photosensitive coloring composition, it is 20 to 500 weight% normally, Preferably it is 30 to 300 weight%, More preferably, it is the range of 50 to 200 weight%. . If the content of the binder resin (A) is too low, the solubility of the unexposed portion in the developing solution is lowered and development failure is likely to be induced. If the content is extremely high, it is difficult to obtain a desired pixel film thickness.
感光性着色組成物中の光重合開始剤の含有率は、全固形分に対して、通常0.1重量%以上、好ましくは0.5重量%以上、更に好ましくは0.7重量%以上、通常30重量%以下、好ましくは10重量%以下である。
[3]カラーフィルタ基板の製造
[3-1]透明基板(支持体)
次に、カラーフィルタ基板、およびカラーフィルタの製造方法について説明する。カラーフィルタの透明基板としては、透明で適度の強度があれば、その材質は特に限定されるものではない。材質としては、例えば、ポリエチレンテレフタレートなどのポリエステル系樹脂、ポリプロピレン、ポリエチレンなどのポリオレフィン系樹脂、ポリカーボネート
、ポリメチルメタクリレート、ポリスルホンの熱可塑性樹脂製シート、エポキシ樹脂、不飽和ポリエステル樹脂、ポリ(メタ)アクリル系樹脂などの熱硬化性樹脂シート、または各種ガラスなどが挙げられる。この中でも、耐熱性の観点からガラス、耐熱性樹脂が好ましい。
The content of the photopolymerization initiator in the photosensitive coloring composition is usually 0.1% by weight or more, preferably 0.5% by weight or more, more preferably 0.7% by weight or more, based on the total solid content. Usually, it is 30% by weight or less, preferably 10% by weight or less.
[3] Manufacture of color filter substrate [3-1] Transparent substrate (support)
Next, a color filter substrate and a method for manufacturing the color filter will be described. The transparent substrate of the color filter is not particularly limited as long as it is transparent and has an appropriate strength. Examples of materials include polyester resins such as polyethylene terephthalate, polyolefin resins such as polypropylene and polyethylene, polycarbonate, polymethyl methacrylate, polysulfone thermoplastic resin sheets, epoxy resins, unsaturated polyester resins, and poly (meth) acrylic. Examples thereof include thermosetting resin sheets such as a resin, and various glasses. Among these, glass and heat resistant resin are preferable from the viewpoint of heat resistance.
透明基板およびブラックマトリクス形成基板には、接着性などの表面物性の改良のため、必要に応じ、コロナ放電処理、オゾン処理、シランカップリング剤や、ウレタン系樹脂などの各種樹脂の薄膜形成処理などを行ってもよい。透明基板の厚さは、通常0.05〜10mm、好ましくは0.1〜7mmの範囲とされる。また各種樹脂の薄膜形成処理を行う場合、その膜厚は、通常0.01〜10μm、好ましくは0.05〜5μmの範囲である。 For transparent substrates and black matrix forming substrates, to improve surface properties such as adhesion, corona discharge treatment, ozone treatment, silane coupling agents, and thin film formation treatment of various resins such as urethane resins May be performed. The thickness of the transparent substrate is usually 0.05 to 10 mm, preferably 0.1 to 7 mm. Moreover, when performing the thin film formation process of various resin, the film thickness is 0.01-10 micrometers normally, Preferably it is the range of 0.05-5 micrometers.
[3-2]ブラックマトリクス
透明基板上に、ブラックマトリクスを設け、通常、赤色、緑色、青色の画素画像を形成することにより、本発明のカラーフィルタを製造することができる。上記感光性着色組成物は、黒色、赤色、緑色、青色のうち少なくとも一種のレジスト形成用塗布液として使用される。ブラックレジストに関しては、透明基板上素ガラス面上、赤色、緑色、青色に関しては透明基板上に形成された樹脂ブラックマトリクス形成面上、または、クロム化合物その他の遮光金属材料を用いて形成した金属ブラックマトリクス形成面上に、塗布、加熱乾燥、画像露光、現像および熱硬化の各処理を行って各色の画素画像を形成する。
[3-2] Black matrix The color filter of the present invention can be manufactured by providing a black matrix on a transparent substrate and usually forming red, green, and blue pixel images. The photosensitive coloring composition is used as at least one resist forming coating solution of black, red, green, and blue. For black resist, on the transparent glass substrate glass surface, for red, green, and blue, on the resin black matrix forming surface formed on the transparent substrate, or metal black formed using a chromium compound or other light shielding metal material A pixel image of each color is formed on the matrix forming surface by performing coating, heat drying, image exposure, development and thermosetting.
ブラックマトリックスは、遮光金属薄膜またはブラックマトリクス用感光性着色組成物を利用して、透明基板上に形成される。遮光金属材料としては、金属クロム、酸化クロム、窒化クロムなどのクロム化合物、ニッケルとタングステン合金などが用いられ、これらを複数層状に積層させたものであってもよい。
これらの金属遮光膜は、一般にスパッタリング法によって形成され、ポジ型フォトレジストにより、膜状に所望のパターンを形成した後、クロムに対しては硝酸第二セリウムアンモニウムと過塩素酸および/または硝酸とを混合したエッチング液を用い、その他の材料に対しては、材料に応じたエッチング液を用いて蝕刻され、最後にポジ型フォトレジストを専用の剥離剤で剥離することによって、ブラックマトリクスを形成することができる。
The black matrix is formed on a transparent substrate using a light shielding metal thin film or a photosensitive coloring composition for black matrix. As the light-shielding metal material, chromium compounds such as metal chromium, chromium oxide, and chromium nitride, nickel and tungsten alloys, and the like may be used, and these may be laminated in a plurality of layers.
These metal light shielding films are generally formed by a sputtering method, and after forming a desired pattern in a film shape with a positive photoresist, ceric ammonium nitrate and perchloric acid and / or nitric acid are added to chromium. Other materials are etched using an etchant according to the material, and finally a positive photoresist is stripped with a dedicated stripper to form a black matrix. be able to.
この場合、まず、蒸着またはスパッタリング法などにより、透明基板上にこれら金属または金属・金属酸化物の薄膜を形成する。次いで、この薄膜上に感光性着色組成物の塗布膜を形成した後、ストライプ、モザイク、トライアングルなどの繰り返しパターンを有するフォトマスクを用いて、塗布膜を露光・現像し、レジスト画像を形成する。その後、この塗布膜にエッチング処理を施してブラックマトリクスを形成することができる。 In this case, first, a thin film of these metals or metal / metal oxide is formed on the transparent substrate by vapor deposition or sputtering. Next, after forming a coating film of the photosensitive coloring composition on the thin film, the coating film is exposed and developed using a photomask having a repetitive pattern such as a stripe, a mosaic, and a triangle to form a resist image. Thereafter, this coating film can be etched to form a black matrix.
ブラックマトリクス用感光性着色組成物を利用する場合は、黒色の色材を含有する感光性着色組成物を使用して、ブラックマトリクスを形成する。例えば、カーボンブラック、黒鉛、鉄黒、アニリンブラック、シアニンブラック、チタンブラックなどの黒色色材単独または複数、もしくは、無機または有機の顔料、染料の中から適宜選択される赤色、緑色、青色などの混合による黒色色材を含有する感光性着色組成物を使用し、下記の赤色、緑色、青色の画素画像を形成する方法と同様にして、ブラックマトリクスを形成することができる。 When using the photosensitive coloring composition for black matrix, a black matrix is formed using the photosensitive coloring composition containing a black coloring material. For example, black color material such as carbon black, graphite, iron black, aniline black, cyanine black, titanium black or the like, or red, green, blue or the like appropriately selected from inorganic or organic pigments and dyes A black matrix can be formed in the same manner as described below for forming a red, green, and blue pixel image using a photosensitive coloring composition containing a black color material by mixing.
このようにして形成されたブラックマトリクスパターンは、画像形成したときの断面形状において、遮光性パターンの基板に接する面と、基板面との形成する角度(以下、テーパー角という。)が、通常50度以下、好ましくは40度以下、更に好ましくは30度以下であり、通常5度以上、好ましくは10度以上である。テーパー角が大きすぎると後述する画素内段差が大きくなり、小さすぎると線幅の精度が悪くなる。 In the black matrix pattern formed in this way, the angle formed between the surface of the light-shielding pattern in contact with the substrate and the substrate surface (hereinafter referred to as the taper angle) is usually 50 in the cross-sectional shape when the image is formed. Degrees or less, preferably 40 degrees or less, more preferably 30 degrees or less, and usually 5 degrees or more, preferably 10 degrees or more. If the taper angle is too large, the step in the pixel, which will be described later, becomes large.
ここで、テーパー角は、ブラックマトリックスパターンの断面に於いて、パターンの末端と、末端から2μmの位置におけるパターンの高さ部分とを結ぶ直線と、基板との角度を意味する(図1)。尚、テーパー角が上記範囲であって、しかも、順テーパー形状であるのが好ましい。
[3-3]画素の形成
ブラックマトリクスを設けた透明基板上に、赤色、緑色、青色のうち一色の着色材料を含有する感光性着色組成物を塗布し、乾燥した後、塗布膜の上にフォトマスクを重ね、このフォトマスクを介して画像露光、現像、必要に応じて熱硬化または光硬化により画素画像を形成させ、着色層を作成する。この操作を、赤色、緑色、青色の三色の感光性着色組成物について各々行うことによって、カラーフィルタ画像を形成することができる。
Here, the taper angle means the angle between the substrate and the straight line connecting the end of the pattern and the height of the pattern at a
[3-3] Formation of Pixels A photosensitive coloring composition containing a coloring material of one color of red, green, and blue is applied on a transparent substrate provided with a black matrix, dried, and then applied onto the coating film. A photomask is overlapped, and a pixel image is formed through image exposure, development, and thermosetting or photocuring as necessary through this photomask to form a colored layer. A color filter image can be formed by performing this operation for each of the three color photosensitive coloring compositions of red, green, and blue.
カラーフィルタ用の感光性着色組成物の塗布は、スピナー法、ワイヤーバー法、フローコート法、ダイコート法、ロールコート法、スプレーコート法などによって行うことができる。中でも、ダイコート法によれば、塗布液使用量が大幅に削減され、かつ、スピンコート法によった際に付着するミストなどの影響が全くない、異物発生が抑制されるなど、総合的な観点から好ましい。 The photosensitive coloring composition for the color filter can be applied by a spinner method, a wire bar method, a flow coating method, a die coating method, a roll coating method, a spray coating method, or the like. Above all, according to the die coating method, the amount of coating solution used is greatly reduced, there is no influence of mist adhering to the spin coating method, and the generation of foreign matter is suppressed. To preferred.
塗布膜の厚さは、大きすぎると、パターン現像が困難となるとともに、液晶セル化工程でのギャップ調整が困難となることがあり、小さすぎると顔料濃度を高めることが困難となり所望の色発現が不可能となることがある。塗布膜の厚さは、乾燥後の膜厚として、通常0.2〜20μmの範囲とするのが好ましく、より好ましいのは0.5〜10μmの範囲、さらに好ましいのは0.8〜5μmの範囲である。 If the thickness of the coating film is too large, pattern development will be difficult, and it may be difficult to adjust the gap in the liquid crystal cell forming process. If it is too small, it will be difficult to increase the pigment concentration and the desired color will be exhibited. May become impossible. The thickness of the coating film is usually preferably in the range of 0.2 to 20 μm as the film thickness after drying, more preferably in the range of 0.5 to 10 μm, and still more preferably in the range of 0.8 to 5 μm. It is a range.
[3-4]塗布膜の乾燥
基板に感光性着色組成物を塗布した後の塗布膜の乾燥は、ホットプレート、IRオーブン、コンベクションオーブンを使用した乾燥法によるのが好ましい。通常は、予備乾燥の後、再度加熱させて乾燥させる。予備乾燥の条件は、前記溶剤成分の種類、使用する乾燥機の性能などに応じて適宜選択することができる。乾燥時間は、溶剤成分の種類、使用する乾燥機の性能などに応じて、通常は、40〜80℃の温度で15秒〜5分間の範囲で選ばれ、好ましくは50〜70℃の温度で30秒〜3分間の範囲で選ばれる。
[3-4] Drying of coating film The coating film after the photosensitive coloring composition is applied to the substrate is preferably dried by a drying method using a hot plate, an IR oven, or a convection oven. Usually, after preliminary drying, it is heated again and dried. The conditions for the preliminary drying can be appropriately selected according to the type of the solvent component, the performance of the dryer to be used, and the like. The drying time is usually selected in the range of 15 seconds to 5 minutes at a temperature of 40 to 80 ° C., preferably 50 to 70 ° C., depending on the type of the solvent component and the performance of the dryer used. It is selected in the range of 30 seconds to 3 minutes.
再加熱乾燥の温度条件は、予備乾燥温度より高い50〜200℃、中でも70〜160℃が好ましく、特に70〜130℃が好ましい。また乾燥時間は、加熱温度にもよるが10秒〜10分、中でも15秒〜5分の範囲とするのが好ましい。乾燥温度は、高いほど透明基板に対する接着性が向上するが、高すぎるとバインダー樹脂が分解し、熱重合を誘発して現像不良を生ずる場合がある。乾燥後の感光性着色組成物塗布膜の厚さは、0.5〜3μm、好ましくは1〜2μmの範囲である。なお、この塗布膜の乾燥工程では、温度を高めず、減圧チャンバー内で乾燥を行う、減圧乾燥法であってもよい。 The reheat drying temperature condition is 50 to 200 ° C higher than the predrying temperature, preferably 70 to 160 ° C, particularly preferably 70 to 130 ° C. The drying time is preferably 10 seconds to 10 minutes, and more preferably 15 seconds to 5 minutes, depending on the heating temperature. The higher the drying temperature, the better the adhesion to the transparent substrate. However, if the drying temperature is too high, the binder resin is decomposed, and thermal polymerization may be induced to cause development failure. The thickness of the photosensitive coloring composition coating film after drying is in the range of 0.5 to 3 μm, preferably 1 to 2 μm. The drying process of the coating film may be a vacuum drying method in which drying is performed in a vacuum chamber without increasing the temperature.
[3-5]露光工程
画像露光は、感光性着色組成物の塗布膜上に、ネガのマトリクスパターンを重ね、このマスクパターンを介し、紫外線または可視光線の光源を照射して行う。この際、必要に応じ、酸素による光重合性層の感度の低下を防ぐため、光重合性層上にポリビニルアルコール層などの酸素遮断層を形成した後に露光を行ってもよい。上記の画像露光に使用される光源は、特に限定されるものではない。光源としては、例えば、キセノンランプ、ハロゲンランプ、タングステンランプ、高圧水銀灯、超高圧水銀灯、メタルハライドランプ、中圧水銀灯、低圧水銀灯、カーボンアーク、蛍光ランプなどのランプ光源や、アルゴンイオンレーザー、YAGレーザー、エキシマレーザー、窒素レーザー、ヘリウムカドミニウムレーザー、半導体レーザーなどのレーザー光源などが挙げられる。特定の波長の光を照射
して使用する場合には、光学フィルタを利用することもできる。
[3-5] Exposure Step Image exposure is performed by overlaying a negative matrix pattern on the coating film of the photosensitive coloring composition, and irradiating with an ultraviolet or visible light source through this mask pattern. At this time, if necessary, exposure may be performed after an oxygen blocking layer such as a polyvinyl alcohol layer is formed on the photopolymerizable layer in order to prevent a decrease in sensitivity of the photopolymerizable layer due to oxygen. The light source used for said image exposure is not specifically limited. Examples of the light source include a xenon lamp, a halogen lamp, a tungsten lamp, a high-pressure mercury lamp, an ultra-high pressure mercury lamp, a metal halide lamp, a medium-pressure mercury lamp, a low-pressure mercury lamp, a carbon arc, and a fluorescent lamp, an argon ion laser, a YAG laser, Examples include an excimer laser, a nitrogen laser, a helium cadmium laser, and a laser light source such as a semiconductor laser. An optical filter can also be used when used by irradiating light of a specific wavelength.
[3-6]現像工程
本発明に係るカラーフィルタは、感光性着色組成物による塗布膜を、上記の光源によって画像露光を行った後、有機溶剤、または、界面活性剤とアルカリ性化合物とを含む水溶液を用いる現像によって、基板上に画像を形成して調製することができる。この水溶液には、さらに有機溶剤、緩衝剤、錯化剤、染料または顔料を含ませることができる。
[3-6] Development Step The color filter according to the present invention contains an organic solvent or a surfactant and an alkaline compound after image-exposing the coating film of the photosensitive coloring composition with the above-mentioned light source. An image can be formed on a substrate by development using an aqueous solution. This aqueous solution may further contain an organic solvent, a buffering agent, a complexing agent, a dye or a pigment.
アルカリ性化合物としては、水酸化ナトリウム、水酸化カリウム、水酸化リチウム、炭酸ナトリウム、炭酸カリウム、炭酸水素ナトリウム、炭酸水素カリウム、ケイ酸ナトリウム、ケイ酸カリウム、メタケイ酸ナトリウム、リン酸ナトリウム、リン酸カリウム、リン酸水素ナトリウム、リン酸水素カリウム、リン酸二水素ナトリウム、リン酸二水素カリウム、水酸化アンモニウムなどの無機アルカリ性化合物や、モノ−・ジ−またはトリエタノールアミン、モノ−・ジ−またはトリメチルアミ、モノ−・ジ−またはトリエチルアミン、モノ−またはジイソプロピルアミン、n−ブチルアミン、モノ−・ジ−またはトリイソプロパノールアミン、エチレンイミン、エチレンジイミン、テトラメチルアンモニウムヒドロキシド(TMAH)、コリンなどの有機アルカリ性化合物が挙げられる。これらのアルカリ性化合物は、2種以上の混合物であってもよい。 Examples of alkaline compounds include sodium hydroxide, potassium hydroxide, lithium hydroxide, sodium carbonate, potassium carbonate, sodium bicarbonate, potassium bicarbonate, sodium silicate, potassium silicate, sodium metasilicate, sodium phosphate, potassium phosphate , Inorganic alkaline compounds such as sodium hydrogen phosphate, potassium hydrogen phosphate, sodium dihydrogen phosphate, potassium dihydrogen phosphate, ammonium hydroxide, mono-di- or triethanolamine, mono-di- or trimethyl Ami, mono-di- or triethylamine, mono- or diisopropylamine, n-butylamine, mono-di- or triisopropanolamine, ethyleneimine, ethylenediimine, tetramethylammonium hydroxide (TMAH), coli And organic alkaline compounds such as. These alkaline compounds may be a mixture of two or more.
界面活性剤としては、例えば、ポリオキシエチレンアルキルエーテル類、ポリオキシエチレンアルキルアリールエーテル類、ポリオキシエチレンアルキルエステル類、ソルビタンアルキルエステル類、モノグリセリドアルキルエステル類などのノニオン系界面活性剤、アルキルベンゼンスルホン酸塩類、アルキルナフタレンスルホン酸塩類、アルキル硫酸塩類、アルキルスルホン酸塩類、スルホコハク酸エステル塩類などのアニオン性界面活性剤、アルキルベタイン類、アミノ酸類などの両性界面活性剤が挙げられる。 Examples of the surfactant include nonionic surfactants such as polyoxyethylene alkyl ethers, polyoxyethylene alkyl aryl ethers, polyoxyethylene alkyl esters, sorbitan alkyl esters, monoglyceride alkyl esters, and alkylbenzene sulfonic acids. Examples include anionic surfactants such as salts, alkylnaphthalene sulfonates, alkyl sulfates, alkyl sulfonates, and sulfosuccinate esters, and amphoteric surfactants such as alkylbetaines and amino acids.
有機溶剤としては、例えば、イソプロピルアルコール、ベンジルアルコール、エチルセロソルブ、ブチルセロソルブ、フェニルセロソルブ、プロピレングリコール、ジアセトンアルコールなどが挙げられる。有機溶剤は、単独でも水溶液と併用して使用できる。
現像処理の条件は特に制限はなく、通常、現像温度は10〜50℃の範囲、中でも15〜45℃、特に好ましくは20〜40℃で、現像方法は、浸漬現像法、スプレー現像法、ブラシ現像法、超音波現像法などのいずれかの方法によることができる。
Examples of the organic solvent include isopropyl alcohol, benzyl alcohol, ethyl cellosolve, butyl cellosolve, phenyl cellosolve, propylene glycol, diacetone alcohol and the like. The organic solvent can be used alone or in combination with an aqueous solution.
The development processing conditions are not particularly limited, and the development temperature is usually in the range of 10 to 50 ° C., particularly 15 to 45 ° C., particularly preferably 20 to 40 ° C. The development methods are immersion development, spray development, brush Any of a developing method, an ultrasonic developing method and the like can be used.
なお、本発明のカラーフィルタは、上記した製造方法の他に、(1)溶剤、色材としての
フタロシアニン系顔料、バインダー樹脂としてのポリイミド系樹脂を含む硬化性着色組成物を、基板に塗布し、エッチング法により画素画像を形成する方法によっても製造することができる。また、(2)フタロシアニン系顔料を含む感光性着色組成物を着色インキとし
て用い、印刷機によって、透明基板上に直接画素画像を形成する方法や、(3)フタロシア
ニン系顔料を含む感光性着色組成物を電着液として用い、基板をこの電着液に浸漬させ所定パターンにされたITO電極上に、着色膜を析出させる方法などが挙げられる。さらに、(4)フタロシアニン系顔料を含む感光性着色組成物を塗布したフィルムを、透明基板に
貼りつけて剥離し、画像露光、現像し画素画像を形成する方法や、(5)フタロシアニン系
顔料を含む感光性着色組成物を着色インキとして用い、インクジェットプリンターにより画素画像を形成する方法、などが挙げられる。カラーフィルタの製造方法は、カラーフィルタ用感光性着色組成物の組成に応じ、これに適した方法が採用される。
In addition to the manufacturing method described above, the color filter of the present invention is obtained by applying (1) a curable coloring composition containing a solvent, a phthalocyanine pigment as a coloring material, and a polyimide resin as a binder resin to a substrate. It can also be manufactured by a method of forming a pixel image by an etching method. Further, (2) a method for forming a pixel image directly on a transparent substrate by using a photosensitive coloring composition containing a phthalocyanine pigment as a coloring ink, and (3) a photosensitive coloring composition containing a phthalocyanine pigment. A method of depositing a colored film on an ITO electrode having a predetermined pattern by immersing the substrate as an electrodeposition solution and immersing the substrate in the electrodeposition solution may be used. Further, (4) a method in which a film coated with a photosensitive coloring composition containing a phthalocyanine pigment is attached to a transparent substrate and peeled off, image exposure and development to form a pixel image, and (5) a phthalocyanine pigment. The method of forming a pixel image with an inkjet printer using the photosensitive coloring composition containing as a coloring ink, etc. are mentioned. The manufacturing method of a color filter employ | adopts the method suitable for this according to the composition of the photosensitive coloring composition for color filters.
[3-7]熱硬化処理
現像の後のカラーフィルタ基板には、熱硬化処理を施す。この際の熱硬化処理条件は、温度は100〜280℃の範囲、好ましくは150〜250℃の範囲で選ばれ、時間は5〜60分間の範囲で選ばれる。これら一連の工程を経て、一色のパターニング画像形成は
終了する。この工程を順次繰り返し、ブラック、赤色、緑色、青色をパターニングし、カラーフィルタを形成する。なお、4色のパターニングの順番は、上記した順番に限定されるものではない。
[3-7] Thermosetting treatment The color filter substrate after development is subjected to thermosetting treatment. The thermosetting treatment conditions at this time are selected such that the temperature is in the range of 100 to 280 ° C, preferably 150 to 250 ° C, and the time is in the range of 5 to 60 minutes. Through these series of steps, the patterning image formation for one color is completed. This process is sequentially repeated to pattern black, red, green, and blue to form a color filter. Note that the order of patterning the four colors is not limited to the order described above.
この様にして得られたカラーフィルターは、透明基板上に遮光性パターンを有し、遮光性パターンの基板に接する面と、基板面との形成する角度が50度以下であるが、40度以下が好ましく、30度以下が更に好ましい。
又、このようにして着色パターンの画素画像を形成したとき、テーパー角が小さいと遮光性パターンと赤色、緑色、青色画素画像との重なり部分の厚さが低減されるので、該基板を基準面とする、各画素画像内における表面の最高点と最低点の差(以下、画素内段差という。)がいずれの画素画像についても通常0.7μm以下、好ましくは0.5μm以下、更に好ましくは0.4μm以下である。画素内段差が大きすぎると盛り上がり部分によるITO膜の断線がおそれがあり、良質なカラーフィルターを得ることができない。
The color filter thus obtained has a light-shielding pattern on a transparent substrate, and the angle formed between the surface of the light-shielding pattern in contact with the substrate and the substrate surface is 50 degrees or less, but 40 degrees or less. Is preferably 30 ° or less.
Further, when the pixel image of the colored pattern is formed in this way, if the taper angle is small, the thickness of the overlapping portion between the light shielding pattern and the red, green, and blue pixel images is reduced. The difference between the highest point and the lowest point on the surface in each pixel image (hereinafter referred to as an in-pixel step) is usually 0.7 μm or less, preferably 0.5 μm or less, more preferably 0 for any pixel image. .4 μm or less. If the step in the pixel is too large, the ITO film may be disconnected due to the raised portion, and a high-quality color filter cannot be obtained.
[3-8]透明電極の形成
カラーフィルタは、このままの状態で画像上にITOなどの透明電極を形成して、カラーディスプレー、液晶表示装置などの部品の一部として使用されるが、表面平滑性や耐久性を高めるため、必要に応じ、画像上にポリアミド、ポリイミドなどのトップコート層を設けることもできる。また一部、平面配向型駆動方式(IPSモード)などの用途においては、透明電極を形成しないこともある。
[3-8] Formation of transparent electrode The color filter is used as a part of components such as color displays and liquid crystal displays by forming transparent electrodes such as ITO on the image as it is. In order to enhance the property and durability, a top coat layer such as polyamide or polyimide can be provided on the image as necessary. Further, in some applications such as a planar alignment type drive system (IPS mode), the transparent electrode may not be formed.
[4]液晶表示装置(パネル)
次に、液晶表示装置(パネル)の製造法について説明する。液晶表示装置は、通常、カラーフィルタ上に配向膜を形成し、この配向膜上にスペーサーを散布した後、対向基板と貼り合わせて液晶セルを形成し、形成した液晶セルに液晶を注入し、対向電極に結線して完成する。配向膜は、ポリイミド等の樹脂膜が好適である。配向膜の形成には、通常、グラビア印刷法及び/またはフレキソ印刷法が採用され、配向膜の厚さは数10nmとされる。熱焼成によって配向膜の硬化処理を行った後、紫外線の照射やラビング布による処理によって表面処理し、液晶の傾きを調整しうる表面状態に加工される。
[4] Liquid crystal display device (panel)
Next, a method for manufacturing a liquid crystal display device (panel) will be described. A liquid crystal display device usually forms an alignment film on a color filter, spreads spacers on the alignment film, and then bonds to a counter substrate to form a liquid crystal cell, injects liquid crystal into the formed liquid crystal cell, Complete by connecting to the counter electrode. The alignment film is preferably a resin film such as polyimide. For the formation of the alignment film, a gravure printing method and / or a flexographic printing method is usually employed, and the thickness of the alignment film is several tens of nm. After the alignment film is cured by thermal baking, it is surface-treated by irradiation with ultraviolet rays or a rubbing cloth to be processed into a surface state in which the tilt of the liquid crystal can be adjusted.
スペーサーは、対向基板とのギャップ(隙間)に応じた大きさのものが用いられ、通常2〜8μmのものが好適である。カラーフィルタ基板上に、フォトリソグラフィ法によって透明樹脂膜のフォトスペーサー(PS)を形成し、これをスペーサーの代わりに活用することもできる。対向基板としては、通常、アレイ基板が用いられ、特にTFT(薄膜トランジスタ)基板が好適である。 A spacer having a size corresponding to a gap (gap) with the counter substrate is used, and a spacer of 2 to 8 μm is usually preferable. A photo spacer (PS) of a transparent resin film can be formed on the color filter substrate by photolithography, and this can be used instead of the spacer. As the counter substrate, an array substrate is usually used, and a TFT (thin film transistor) substrate is particularly preferable.
対向基板との貼り合わせのギャップは、液晶表示装置の用途によってことなるが、通常2〜8μmの範囲で選ばれる。対向基板と貼り合わせた後、液晶注入口以外の部分は、エポキシ樹脂等のシール材によって封止する。シール材は、UV照射及び/または加熱することによって硬化させ、液晶セル周辺がシールされる。
周辺をシールされた液晶セルは、パネル単位に切断した後、真空チャンバー内で減圧とし、上記液晶注入口を液晶に浸漬した後、チャンバー内をリークすることによって、液晶を液晶セル内に注入する。液晶セル内の減圧度は、通常、1×10-2〜1×10-7Paであるが、好ましくは1×10-3〜1×10-6Paである。また、減圧時に液晶セルを加温するのが好ましく、加温温度は通常30〜100℃であり、より好ましくは50〜90℃である。減圧時の加温保持は、通常10〜60分間の範囲とされ、その後液晶中に浸漬される。液晶を注入した液晶セルは、液晶注入口をUV硬化樹脂を硬化させて封止することによって、液晶表示装置(パネル)が完成する。
The gap for bonding to the counter substrate varies depending on the use of the liquid crystal display device, but is usually selected in the range of 2 to 8 μm. After bonding to the counter substrate, the portion other than the liquid crystal injection port is sealed with a sealing material such as an epoxy resin. The sealing material is cured by UV irradiation and / or heating, and the periphery of the liquid crystal cell is sealed.
The liquid crystal cell whose periphery is sealed is cut into panel units, then decompressed in a vacuum chamber, the liquid crystal injection port is immersed in liquid crystal, and then the liquid crystal is injected into the liquid crystal cell by leaking in the chamber. . The degree of decompression in the liquid crystal cell is usually 1 × 10 −2 to 1 × 10 −7 Pa, preferably 1 × 10 −3 to 1 × 10 −6 Pa. Moreover, it is preferable to heat a liquid crystal cell at the time of pressure reduction, and heating temperature is 30-100 degreeC normally, More preferably, it is 50-90 degreeC. The warming hold during decompression is usually in the range of 10 to 60 minutes, and then immersed in the liquid crystal. In the liquid crystal cell into which liquid crystal is injected, the liquid crystal display device (panel) is completed by sealing the liquid crystal injection port by curing the UV curable resin.
液晶の種類には特に制限がなく、芳香族系、脂肪族系、多環状化合物等、従来から知ら
れている液晶であって、リオトロピック液晶、サーモトロピック液晶等のいずれでもよい。サーモトロピック液晶には、ネマティック液晶、スメスティック液晶及びコレステリック液晶等が知られているが、いずれであってもよい。
The type of liquid crystal is not particularly limited, and is a conventionally known liquid crystal such as an aromatic, aliphatic, or polycyclic compound, and may be any of lyotropic liquid crystal, thermotropic liquid crystal, and the like. As the thermotropic liquid crystal, nematic liquid crystal, smectic liquid crystal, cholesteric liquid crystal, and the like are known, but any of them may be used.
次に、製造例、実施例及び比較例を挙げて本発明をより具体的に説明するが、本発明はその要旨を超えない限り以下の実施例に限定されるものではない。なお、下記実施例において「部」は「重量部」を表す。
[1]密着性及び画素シャープ性の比較
<合成例1>
日本化薬(株)製XD1000(ジシクロペンタジエン・フェノール重合物のポリグリシジルエーテル、重量平均分子量700、エポキシ当量252)300部、アクリル酸87部、p−メトキシフェノール0.2部、トリフェニルホスフィン5部、プロピレングリコールモノメチルエーテルアセテート255部を反応容器に仕込み、100℃で酸価が3.0mgKOH/gになるまで撹拌した。酸価が目標に達するまで9時間を要した(酸価2.5)。次いで更にテトラヒドロ無水フタル酸145部を添加し、120℃で4時間反応させ、酸価100、GPCで測定したポリスチレン換算の重量平均分子量2600のバインダー樹脂I溶液を得た。
Next, although a manufacture example, an Example, and a comparative example are given and this invention is demonstrated more concretely, this invention is not limited to a following example, unless the summary is exceeded. In the following examples, “part” represents “part by weight”.
[1] Comparison of adhesion and pixel sharpness <Synthesis Example 1>
XD1000 manufactured by Nippon Kayaku Co., Ltd. (polyglycidyl ether of dicyclopentadiene / phenol polymer, weight average molecular weight 700, epoxy equivalent 252) 300 parts, 87 parts acrylic acid, 0.2 parts p-methoxyphenol, triphenylphosphine 5 parts and 255 parts of propylene glycol monomethyl ether acetate were charged into a reaction vessel and stirred at 100 ° C. until the acid value became 3.0 mgKOH / g. It took 9 hours for the acid value to reach the target (acid value 2.5). Next, 145 parts of tetrahydrophthalic anhydride was further added and reacted at 120 ° C. for 4 hours to obtain a binder resin I solution having an acid value of 100 and a weight average molecular weight of 2600 in terms of polystyrene measured by GPC.
<合成例2>
大日本インキ(株)製エピクロンHP7200HH(ジシクロペンタジエン・フェノール重合物のポリグリシジルエーテル、重量平均分子量1000、エポキシ当量270)155部、アクリル酸41部、p−メトキシフェノール0.1部、トリフェニルホスフィン2.5部、プロピレングリコールモノメチルエーテルアセテート130部を反応容器に仕込み、100℃で酸価が3.0mgKOH/g以下になるまで加熱撹拌をした。酸価が目標に達するまで9時間を要した(酸価2.9)。次いで更にテトラヒドロ無水フタル酸74gを添加し、120℃で4時間反応させ、酸価98、重量平均分子量3500のバインダー樹脂II溶液を得た。
<Synthesis Example 2>
Daikoku Ink Co., Ltd. Epiklon HP7200HH (polyglycidyl ether of dicyclopentadiene / phenol polymer, weight average molecular weight 1000, epoxy equivalent 270) 155 parts, acrylic acid 41 parts, p-methoxyphenol 0.1 part, triphenyl A reaction vessel was charged with 2.5 parts of phosphine and 130 parts of propylene glycol monomethyl ether acetate, and the mixture was heated and stirred at 100 ° C. until the acid value was 3.0 mgKOH / g or less. It took 9 hours for the acid value to reach the target (acid value 2.9). Subsequently, 74 g of tetrahydrophthalic anhydride was further added and reacted at 120 ° C. for 4 hours to obtain a binder resin II solution having an acid value of 98 and a weight average molecular weight of 3,500.
<実施例1>
合成例1で得られたバインダー樹脂I溶液を52重量部(固形分換算35重量部)、ジペンタエリスリトールヘキサアクリレートを5重量部、CGI−124(チバガイギー社製)4重量部、更にカーボンブラック分散体(カーボン濃度25%)56重量部を、プロピレングリコールモノメチルエーテルアセテートに混合して感光性黒色組成物を得た。
<Example 1>
52 parts by weight of binder resin I solution obtained in Synthesis Example 1 (35 parts by weight in terms of solid content), 5 parts by weight of dipentaerythritol hexaacrylate, 4 parts by weight of CGI-124 (manufactured by Ciba Geigy), and carbon black dispersion 56 parts by weight of a body (carbon concentration: 25%) was mixed with propylene glycol monomethyl ether acetate to obtain a photosensitive black composition.
このようにして得た感光性黒色組成物を10cm角ガラス基板上にスピンコートし、ホットプレート上で90度150秒乾燥した。乾燥後の膜厚は、1μmであった。次にこのサンプルをマスクを通して高圧水銀灯で像露光した。温度23℃、濃度0.1%KOH水溶液を用いてスプレー現像をすることにより黒色画素(ブラックマトリックス)を形成した。 The photosensitive black composition thus obtained was spin-coated on a 10 cm square glass substrate and dried at 90 ° C. for 150 seconds on a hot plate. The film thickness after drying was 1 μm. Next, this sample was image-exposed with a high-pressure mercury lamp through a mask. A black pixel (black matrix) was formed by spray development using an aqueous solution of KOH having a temperature of 23 ° C. and a concentration of 0.1%.
<実施例2>
実施例1のバインダー樹脂Iをバインダー樹脂IIに変更した以外は実施例1と同様の
処理を行って黒色画素を形成した。
<比較例1>
実施例1のバインダー樹脂IをEA4805(三菱化学社製、クレゾールノボラック型エポキシアクリレートのテトラヒドロ無水フタル酸付加物。酸価100)に変更した以外は実施例1と同様の処理を行って黒色画素を形成した。
<Example 2>
A black pixel was formed by performing the same treatment as in Example 1 except that the binder resin I in Example 1 was changed to the binder resin II.
<Comparative Example 1>
A black pixel was obtained by performing the same treatment as in Example 1 except that the binder resin I of Example 1 was changed to EA4805 (manufactured by Mitsubishi Chemical Corporation, tetrahydrophthalic anhydride adduct of cresol novolac type epoxy acrylate. Acid value 100). Formed.
<比較例2>
実施例1のバインダー樹脂IをZAR(日本化薬社製、ビスフェノールA型エポキシアクリレートのテトラヒドロ無水フタル酸付加物。酸価100。)に変更した以外は実施例1と同様の処理を行って黒色画素を形成した。
<比較例3>
実施例1のバインダー樹脂IをACA200M(ダイセル化学工業社製、カルボン酸を有するアクリル樹脂の3,4−エポキシシクロヘキシルアクリレート付加物。酸価115。)に変更した以外は実施例1と同様の処理を行って黒色画素を形成した。
<Comparative example 2>
A black color was obtained by performing the same treatment as in Example 1 except that the binder resin I of Example 1 was changed to ZAR (Nippon Kayaku Co., Ltd., tetrahydrophthalic anhydride adduct of bisphenol A type epoxy acrylate. Acid value 100). Pixels were formed.
<Comparative Example 3>
The same treatment as in Example 1 except that the binder resin I of Example 1 was changed to ACA200M (manufactured by Daicel Chemical Industries, Ltd., 3,4-epoxycyclohexyl acrylate adduct of acrylic resin having carboxylic acid. Acid value 115). To form a black pixel.
画素の評価
得られた画素を、以下の項目で評価し、表−1に結果を記した。
<密着性>
20μmのマスクパターンを忠実に再現する露光量における解像可能なレジストの最小パターン寸法を200倍の倍率で顕微鏡観察した。最小パターン寸法が10μm以下を密着性が○、10μmを超えるものを×とし、表−1の結果を得た。
Evaluation of Pixels The obtained pixels were evaluated by the following items, and the results are shown in Table-1.
<Adhesion>
The minimum pattern size of a resist that can be resolved at an exposure amount that faithfully reproduces a 20 μm mask pattern was observed with a microscope at a magnification of 200 times. When the minimum pattern dimension was 10 μm or less, the adhesion was good, and the case where the adhesion exceeded 10 μm was evaluated as x, and the results shown in Table 1 were obtained.
<画素シャープ性>
20μmのマスクパターンを忠実に再現する露光量における細線黒色画素の形状を1000倍の倍率で顕微鏡観察した。直線性の良好なものをシャープ性○、突起や凸凹のあるレジストパターンを×し、表−1の結果を得た。
<Pixel sharpness>
The shape of the fine black pixel at an exposure amount that faithfully reproduces a 20 μm mask pattern was observed with a microscope at a magnification of 1000 times. The linearity was good for those having good linearity, and the resist pattern having protrusions and irregularities was crossed, and the results shown in Table 1 were obtained.
[2]テーパー角及び画素内段差の比較
<実施例3>
カーボンブラック(三菱化学(株)製「MA−220」)19.7 g、分散剤としてBykchemie社製「Disperbyk-182」7.7 g、をPGMEA 72.6 gと混合し、粒子系0.5mmのジルコニアビーズ100 ccを加え、ペイントコンディショナーで10時間振とうし、カーボンブラックの分散液を得た。この分散液を50.7 g分取し、バインダー樹脂I溶液10.79g(固形分換算7.26 g)、ジペンタエリスリトールヘキサアクリレート(日本化薬社製「DPHA」)1.82 g、光重合開始材としてチバスペシャリティケミカルズ製CGI-242 2.0 g、界面活性剤として大日本インキ社製メガファックF475 0.025g、有機溶媒としてPGMEA 38.2 gを加え、ブラックレジストを調整した。
[2] Comparison of taper angle and in-pixel step <Example 3>
Carbon black (“MA-220” manufactured by Mitsubishi Chemical Corporation) 19.7 g, “Disperbyk-182” 7.7 g manufactured by Bykchemie as a dispersing agent, and 72.6 g PGMEA are mixed together to give a zirconia bead 100 having a particle size of 0.5 mm. cc was added and shaken with a paint conditioner for 10 hours to obtain a carbon black dispersion. 50.7 g of this dispersion was taken, 10.79 g of binder resin I solution (solid content: 7.26 g), 1.82 g of dipentaerythritol hexaacrylate (“DPHA” manufactured by Nippon Kayaku Co., Ltd.), Ciba Specialty Chemicals as photopolymerization initiator A black resist was prepared by adding 2.0 g of CGI-242, 0.025 g of Megafac F475 manufactured by Dainippon Ink Co., Ltd., and 38.2 g of PGMEA as an organic solvent.
このように調整したレジストをガラス基板(旭硝子社製AN100)上に膜厚1.0μmとなるようにダイコーターにて塗布し、ブラックマトリクス用のフォトマスク(パターン線幅20μm)を用いて、水銀ランプを用いて紫外線を20mW/cm2(i線換算)の照度で3秒間(60mJ/cm2)露光した。フォトマスクとレジスト面とのギャップは150μmであった。露光した基板を、0.1%のKOH水溶液を用いて現像後、230℃のオーブン中で30分間熱処理を行い、ブラックマトリクスパターンを得た。 The resist prepared as described above was applied on a glass substrate (AN100 manufactured by Asahi Glass Co., Ltd.) with a die coater so as to have a film thickness of 1.0 μm, and a mercury lamp using a photomask for black matrix (pattern line width 20 μm). Was exposed for 3 seconds (60 mJ / cm 2 ) with an illuminance of 20 mW / cm 2 (i-line conversion). The gap between the photomask and the resist surface was 150 μm. The exposed substrate was developed using a 0.1% KOH aqueous solution and then heat-treated in an oven at 230 ° C. for 30 minutes to obtain a black matrix pattern.
<比較例4>
実施例3で作成したカーボンブラック分散液を63.4 g分取し、バインダー樹脂としてEA4805(三菱化学社製、クレゾールノボラック型エポキシアクリレートのテトラヒドロ無水フタル酸付加物。酸価100)4.98 g、ジペンタエリスリトールヘキサアクリレート(日本化薬社製「DPHA」)1.25 g、光重合開始材としてチバスペシャリティケミ
カルズ製CGI-242 1.37 g、界面活性剤として大日本インキ社製メガファックF475 0.025g、有機溶媒としてPGMEA 29.0 gを加え、ブラックレジストを調整した。
このようにして得られたブラックレジストを実施例3と同様にして露光・現像・熱処理を施し、ブラックマトリクスパターンを得た。
<Comparative example 4>
63.4 g of the carbon black dispersion prepared in Example 3 was collected, and EA 4805 (manufactured by Mitsubishi Chemical Corporation, cresol novolac type epoxy acrylate tetrahydrophthalic anhydride adduct. Acid value 100) 4.98 g, dipentaerythritol as a binder resin. 1.25 g of hexaacrylate (“DPHA” manufactured by Nippon Kayaku Co., Ltd.), 1.37 g of CGI-242 manufactured by Ciba Specialty Chemicals as a photopolymerization initiator, 0.025 g of MegaFac F475 manufactured by Dainippon Ink Co., Ltd. as a surfactant, and 29.0 PGMEA as an organic solvent g was added to prepare a black resist.
The black resist thus obtained was exposed, developed and heat treated in the same manner as in Example 3 to obtain a black matrix pattern.
画素の評価
得られた画素を、以下の項目で評価し、表−2に結果を記した。
<テーパー角>
上記のようにして得られた黒色画素の断面形状をSEM(日立製S−4500)で観察し、テーパー角を測定した。
<画素内段差>
赤色顔料(チバ・ガイギー社製「Cromophtal Red A2B」及びBASF社製「Paliotol Yellow K1841D」)7.7gとポリエステル系分散剤3.1gにPGMEA6.4gを混合し、0.5mmのジルコニアビーズを10cc加え、ペイントコンディショナーで5時間振とうして赤色顔料の分散液を得た。この分散液を7.48g分取し、バインダーとして化1のアクリル系樹脂1.0g、エチレン性化合物としてジペンタエリスリトールヘキサアクリレート(日本化薬(株)「DPHA」)0.5g、光重合開始系としてビイミダゾール0.075g、ミヒラーズケトン0.045g、フッ素系界面活性剤(住友3M(株)「FC−430」)0.0004g、有機溶媒としてPGMEA1.51gを加え、赤色用カラーレジストを調製した。
Evaluation of pixels The obtained pixels were evaluated according to the following items, and the results are shown in Table-2.
<Taper angle>
The cross-sectional shape of the black pixel obtained as described above was observed with an SEM (Hitachi S-4500), and the taper angle was measured.
<Step in pixel>
7.4g of PGMEA is mixed with 7.7g of red pigment ("Cromophtal Red A2B" manufactured by Ciba Geigy and "Paliotol Yellow K1841D" manufactured by BASF) and 3.1g of polyester dispersant, and 10cc of 0.5mm zirconia beads is mixed. In addition, a red pigment dispersion was obtained by shaking for 5 hours in a paint conditioner. 7.48 g of this dispersion was taken, 1.0 g of the acrylic resin of Chemical 1 as the binder, 0.5 g of dipentaerythritol hexaacrylate (Nippon Kayaku Co., Ltd. “DPHA”) as the ethylenic compound, and photopolymerization started 0.075 g of biimidazole as a system, 0.045 g of Michler's ketone, 0.0004 g of a fluorosurfactant (Sumitomo 3M Co., Ltd. “FC-430”), and 1.51 g of PGMEA as an organic solvent were added to prepare a red color resist. .
得られた赤色用カラーレジストをスピンコート法を用いて、ブラックマトリクスとの重なり幅が5μm、乾燥膜厚が1.3μmになるように塗布し、70℃のホットプレート上で1分間乾燥し、赤色フィルター用のマスクを用いて紫外線を150mj/cm2密着露光
した後、0.5重量%のジエタノールアミン水溶液を用いて現像することにより、ブラックマトリックスパターンの間に赤色画素のパターンを得た。次いで、試料を高圧水銀灯を用いて15000mj/cm2紫外線照射し、更に200℃のオーブン中で10分間熱処
理することにより、赤色画素画像を形成した。
The obtained red color resist was applied using a spin coating method so that the overlap width with the black matrix was 5 μm and the dry film thickness was 1.3 μm, and dried on a hot plate at 70 ° C. for 1 minute, After exposure to 150 mj / cm 2 of ultraviolet rays using a mask for a red filter, development was performed using a 0.5 wt% diethanolamine aqueous solution, thereby obtaining a red pixel pattern between the black matrix patterns. Next, the sample was irradiated with 15000 mj / cm 2 ultraviolet rays using a high-pressure mercury lamp, and further subjected to heat treatment in an oven at 200 ° C. for 10 minutes to form a red pixel image.
得られた試料の赤色画素画像の表面形状について、TENCOR INSTRUMENTS社製「alpha-step」を用いて画素内段差を測定した。
また、赤色顔料の代りに、緑色顔料(東洋インキ製造社製「Lionol Green 6Y501」及びBASF社製「Paliotol Yellow K1841D」)を用いたこと以外は上述と全く同様の方法で緑色画素画像を形成し、画素内段差を測定した。
Regarding the surface shape of the red pixel image of the obtained sample, the step in the pixel was measured using “alpha-step” manufactured by TENCOR INSTRUMENTS.
In addition, a green pixel image was formed in the same manner as described above except that a green pigment ("Lionol Green 6Y501" manufactured by Toyo Ink Co., Ltd. and "Paliotol Yellow K1841D" manufactured by BASF) was used instead of the red pigment. The step in the pixel was measured.
また、赤色顔料の代りに、青色顔料(東洋インキ製造社製「Lionol Blue ES」及びチバ・ガイギー社製「IRGAZIN BLUE A3RN」)を用いたこと以外は上述と全く同様の方法で青
色画素画像を形成し、画素内段差を測定した。
A blue pixel image is obtained in the same manner as described above except that a blue pigment (“Lionol Blue ES” manufactured by Toyo Ink Co., Ltd. and “IRGAZIN BLUE A3RN” manufactured by Ciba Geigy Co., Ltd.) is used instead of the red pigment. Then, the step inside the pixel was measured.
1 ブラックマトリクスパターン
2 基板面
3 テーパー角
1
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JP2004006676A JP3938375B2 (en) | 2003-03-12 | 2004-01-14 | Photosensitive coloring composition, color filter, and liquid crystal display device |
KR1020057005515A KR100820610B1 (en) | 2003-03-12 | 2004-03-09 | Photosensitive composition, photosensitive colored compositions, color filters, and liquid crystal displays |
PCT/JP2004/003016 WO2004081621A1 (en) | 2003-03-12 | 2004-03-09 | Photosensitive composition, photosensitive colored compositions, color filters, and liquid crystal displays |
KR1020077026739A KR20070116695A (en) | 2003-03-12 | 2004-03-09 | Photosensitive composition, photosensitive colored compositions, color filters, and liquid crystal displays |
TW93106657A TW200424773A (en) | 2003-03-12 | 2004-03-12 | Photosensitive composition, photosensitive colored compositions, color filters, and liquid crystal displays |
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KR (2) | KR100820610B1 (en) |
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JP4595374B2 (en) * | 2003-04-24 | 2010-12-08 | 住友化学株式会社 | Black photosensitive resin composition |
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JP2006350153A (en) * | 2005-06-20 | 2006-12-28 | Mitsubishi Chemicals Corp | Photosensitive composition, photosensitive colored composition, color filter and liquid crystal display device |
JP5142175B2 (en) * | 2005-07-07 | 2013-02-13 | 日本化薬株式会社 | Epoxy resin, photosensitive resin and photosensitive resin composition |
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JPH1184126A (en) * | 1997-09-03 | 1999-03-26 | Mitsubishi Chem Corp | Photopolymerizable composition for color filter and color filter |
JP2001302871A (en) * | 2000-04-25 | 2001-10-31 | Taiyo Ink Mfg Ltd | Photocurable/thermosetting resin composition and printed wiring board having solder resist coating film and resin insulating layer formed by using the same |
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WO2004081621A1 (en) | 2004-09-23 |
KR20050113164A (en) | 2005-12-01 |
TWI302637B (en) | 2008-11-01 |
TW200424773A (en) | 2004-11-16 |
KR20070116695A (en) | 2007-12-10 |
JP2004295084A (en) | 2004-10-21 |
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