TW200424773A - Photosensitive composition, photosensitive colored compositions, color filters, and liquid crystal displays - Google Patents

Photosensitive composition, photosensitive colored compositions, color filters, and liquid crystal displays Download PDF

Info

Publication number
TW200424773A
TW200424773A TW93106657A TW93106657A TW200424773A TW 200424773 A TW200424773 A TW 200424773A TW 93106657 A TW93106657 A TW 93106657A TW 93106657 A TW93106657 A TW 93106657A TW 200424773 A TW200424773 A TW 200424773A
Authority
TW
Taiwan
Prior art keywords
color filter
photosensitive
acid
composition
coloring composition
Prior art date
Application number
TW93106657A
Other languages
Chinese (zh)
Other versions
TWI302637B (en
Inventor
Keiko Tanikawa
Hideaki Okamoto
Shigeo Tsuji
Original Assignee
Mitsubishi Chem Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Mitsubishi Chem Corp filed Critical Mitsubishi Chem Corp
Publication of TW200424773A publication Critical patent/TW200424773A/en
Application granted granted Critical
Publication of TWI302637B publication Critical patent/TWI302637B/zh

Links

Classifications

    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/14Polycondensates modified by chemical after-treatment
    • C08G59/1494Polycondensates modified by chemical after-treatment followed by a further chemical treatment thereof
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/02Polycondensates containing more than one epoxy group per molecule
    • C08G59/04Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof
    • C08G59/06Polycondensates containing more than one epoxy group per molecule of polyhydroxy compounds with epihalohydrins or precursors thereof of polyhydric phenols
    • CCHEMISTRY; METALLURGY
    • C08ORGANIC MACROMOLECULAR COMPOUNDS; THEIR PREPARATION OR CHEMICAL WORKING-UP; COMPOSITIONS BASED THEREON
    • C08GMACROMOLECULAR COMPOUNDS OBTAINED OTHERWISE THAN BY REACTIONS ONLY INVOLVING UNSATURATED CARBON-TO-CARBON BONDS
    • C08G59/00Polycondensates containing more than one epoxy group per molecule; Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups
    • C08G59/18Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing
    • C08G59/40Macromolecules obtained by polymerising compounds containing more than one epoxy group per molecule using curing agents or catalysts which react with the epoxy groups ; e.g. general methods of curing characterised by the curing agents used
    • C08G59/42Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof
    • C08G59/4292Polycarboxylic acids; Anhydrides, halides or low molecular weight esters thereof together with monocarboxylic acids
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007Filters, e.g. additive colour filters; Components for display devices
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004Photosensitive materials
    • G03F7/038Macromolecular compounds which are rendered insoluble or differentially wettable
    • G03F7/0388Macromolecular compounds which are rendered insoluble or differentially wettable with ethylenic or acetylenic bands in the side chains of the photopolymer

Landscapes

  • Chemical & Material Sciences (AREA)
  • Physics & Mathematics (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Medicinal Chemistry (AREA)
  • Polymers & Plastics (AREA)
  • Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • General Chemical & Material Sciences (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Optics & Photonics (AREA)

Abstract

The purpose of the present invention is to provide a photosensitive composition capable of forming pixels having good edge shapes, that is, a photosensitive composition comprising a binder resin (A) obtained by reacting a product of reaction of an epoxy resin (a) with an unsaturated carboxylic acid (b) with a polybasic carboxylic acid or an anhydride thereof (c) and a photopolymerization initiator (B), characterized in that the epoxy resin (a) is one obtained by reacting a product of polyaddition of a cyclic hydrocarbon compound having two or more unsaturated groups per molecule with a phenol with an epihalohydrin.

Description

200424773 玖、發明說明: 【發明所屬之技術領域】 本發明係關於感光性組成物、感光性著色組成物、彩色 濾光片及液晶顯示裝置。更詳言之,係關於液安定性、耐 熱性優越,顯影時的表面污染較少,對基板的密接性良好, 晝素邊緣形狀佳,且適於彩色濾光片製造的感光性組成物。 【先前技術】 習知,採用顏料的彩色濾光片之製造方法,已知有如: 染色法、電鍍法、電沉積法、噴墨法、顏料分散法等。 當顏料分散法之情況時,通常將在利用分散劑等而分散 著顏料的著色組成物中,添加黏結劑樹脂、光聚合起始劑、 光聚合性單體等,並經感光化的感光性著色組成物,塗布 於玻璃基板上,經乾燥後,採用光罩進行曝光,藉由施行 顯影而形成著色圖案,然後對其施行加熱而固接著圖案並 形成像素。依各色彩重複該等步驟,而形成彩色濾光片。 依此相關採用感光性著色組成物之彩色濾光片的影像形 成,將要求充分地解像性、和基板間之密接性、低顯影殘 渣等特性。甚至近年更要求色濃度較高的像素、光學濃度 較高的樹脂黑矩陣,出現感光性著色組成物中之顏料、碳 黑等色材含量提高的傾向。 此外,一般而言,包含上述感光性著色組成物在内,含 有可利用光進行聚合之成分、光聚合起始劑、黏結劑樹脂 的感光性組成物,乃供應給經由一般塗布、乾燥、曝光、 顯影步驟的光微影步驟,但是在相關的步驟中,經常要求 5 312/發明說明書(補件)/93-06/93106657 200424773 不發生殘留顯影步驟中的去除部分、與表面污染現象,去 除部分具充分溶解性,且提昇圖案邊緣清晰度等像素形成 性。 特別係當採用如上述色材含量較高之感光性著色組成 物,形成像素之情況時,將明顯地容易在顯影步驟中未曝 光部分的基板上,發生殘留或表面污染,致未曝光部分無 法獲得良好溶解性等現象,且像素邊緣形狀的清晰性差 劣,曝光部上所形成的像素敏感度亦嫌不足,表面平滑性 惡化的顯影問題,此乃屬特別大的問題。 所以,便有揭示黏結劑樹脂採用具羧基之酚醛環氧丙烯 酸酯的感光性著色組成物(參照專利文獻1)。但是,即便 使用此黏結劑樹脂之情況時,因為溶解性與敏感度的均衡 性較差劣,因而在未曝光部的溶解之同時,亦將引發顯影 液對曝光部的滲透現象,像素邊緣將出現不齊情況,得知 將發生像素對基板的密接性惡化之問題。 此外,有揭示黏結劑樹脂使用具羧基之在丙烯酸樹脂 中,含有脂環式環氧基不飽和化合物的感光性著色組成物 (參照專利文獻2 ),但是因為即便使用此黏結劑樹脂之情 況下,敏感度仍嫌不足,因而得知將發生像素對基板的密 接惡化,頗難形成高精細像素的問題。 此外,有揭示因應印刷電路板之高密度化等的阻焊用光 硬化性樹脂組成物,藉由採用在環氧樹脂與不飽和單羧酸 的反應物中,使多鹼性基酸酐進行反應而所獲得感光性樹 脂,俾改良解像性、顯影性、密接性、耐鍍性(參照專利文 312/發明說明書(補件)/93-06/93106657 6 200424773 獻3 )。但是,因為阻焊用光硬化性樹脂組成物中, 彩色濾光片用組成物的色材含有量偏少,因而此樹 能適用於感光性著色組成物中,呈現顏料或碳黑等 量提高傾向的彩色濾、光片用途方面,截至目前尚未 特別在上述顯影步驟中未曝光部的基板上所發生殘 面污染、像素邊緣形狀清晰性、表面平滑性等問題 將無法解決。 [專利文獻1 ] 曰本專利特開平1 1 - 8 4 1 2 6號公報 [專利文獻2 ] 日本專利特開平1 - 2 8 9 8 2 0號公報 [專利文獻1 ] 曰本專利第2 9 3 1 8 6 0號公報 【發明内容】 本發明之目的在於提供一種即便色材濃度偏高之 時,影像形成性仍佳,適用於彩色遽光片用途的感 成物、及使用其所製得感光性著色組成物、彩色濾 液晶顯示裝置。 緣是,本發明者為解決上述問題經深入鑽研結果 含有特定黏結劑樹脂(A )的感光性組成物,敏感度與 之均衡佳,並且像素邊緣清晰性、密接性非常優越, 亦發現所獲得遮光性圖案(黑矩陣)的形狀良好,隨 本發明。 換句話說,本發明第1主旨所存在的感光性組成 含有:使環氧樹脂(a )、與含不飽和基羧酸(b )的反應 與多鹼性基羧酸或其去水物(c )進行反應而獲得的霉 樹脂(A );以及光聚合起始劑(B ); 312/發明說明書(補件)/93-06/93106657 不同於 脂是否 色材含 明確, 留與表 ,預估 情況 光性組 光片、 ,發現 溶解性 此外, 之完成 物,係 物,更 ;結劑 7 200424773 其中,環氧樹脂(a )係平均1分子具有2個以上不飽和 基之環狀碳氫化合物和苯酚類的複加成反應物,與表鹵醇 之反應生成物。 本發明第2主旨所存在的感光性著色組成物,係含有上 述感光性組成物與色材(C )。 本發明第3主旨所存在的遮光性圖案用感光性組成物, 係在透明基板上影像形成遮光性圖案時的截面形狀中,遮 光性圖案銜接於基板的面,在與基板面間所形成的角度係 在50度以下。 本發明第4主旨所存在的彩色濾光片,係在透明基板上 具有遮光性圖案,而該遮光性圖案係採用感光性組成物而 形成,且遮光性圖案銜接於基板的面,在與基板面間所形 成的角度係在50度以下。 本發明的第5主旨所存在的彩色濾光片,係透明基板 上,具有採用上述感光性著色組成物而形成的像素。 本發明的第6主旨所存在的液晶顯示裝置,係採用上述 彩色濾光片而製成。 本發明的感光性組成物係與基板間之密接性良好。且, 經在其中調配入色材的感光性著色組成物,即便依高濃度 含有顏料、碳黑等色材之情況下,顯像性、對基板或遮光 層的密接性、表面平滑性均優越,可形成高精細的像素。 此外,可提供使用此感光性著色組成物高品質彩色濾光 片,甚至尚可提供使用此彩色濾光片的高品質液晶顯示裝 置。 8 312/發明說明書(補件)/93-06/93106657 200424773 本發明的感光性組成物,除彩色濾光片用途之外,尚可 有效地使用為可撓性印刷電路板用防焊劑、防鍍劑、多層 印刷電路板用相關絕緣膜、感光性光導波路、光硬化型液 晶密封材、光硬化型EL密封材、光硬化性黏接劑等。 【實施方式】 以下,針對本發明進行詳細說明。 [感光性組成物] 本發明的感光性組成物係含有必備成分的黏結劑樹脂 (A )與光聚合起始劑(B ),且配合需要尚含有光聚合性單體 等。 &lt;黏結劑樹脂(A ) &gt; 黏結劑樹脂(A )係使環氧樹脂(a )與含不飽和基羧酸(b ) 的反應物,更與多驗性基魏酸或其酐(c )進行反應而獲得。 環氧樹脂(a ) 壞氧樹脂(a )係平均1分子具有2個以上不飽和基之環 狀碳氫化合物(以下簡稱「不飽和環狀碳氫化合物」)、和 苯酚類的複加成反應物,與表鹵醇之反應生成物。 此黏結劑樹脂(A )之所以顯示良好特性的原因,可判斷 乃因為構成成分的環氧樹脂(a )具有環狀碳氫構造而呈大 體積(b u 1 k y ),且因為具有適當的疏水性,所以將防止因顯 影液滲透入曝光部所造成侵#情況的發生。 具不飽和環狀碳氫化合物的不飽和基,係平均1分子通 常為4個以下,最好為2個。 不飽和環狀碳氫化合物雖無特別限制,但是通常為碳數 312/發明說明書(補件)/93-06/93106657 200424773 5〜2 0,以6〜1 2為佳。具體而言,可舉例如:二環戊二烯、 四氫fp、4 -乙烯基環己烷、5 -乙烯基曱為-2 -烯、α-蒎烯、 /3 -蒎烯、檸檬油精(1 i m ο n e n e )等不飽和脂肪族碳氫化合 物;二乙烯基苯等不飽和芳香族碳氫化合物。該等之中, 特別以二環戊二烯為佳。 再者,因為二環戊二烤乃含於石油顧分(petroleumcut) 中,因而在工業用二環戊二烯中含有其他脂肪族或芳香族 二烯類等雜質,若考慮耐熱性、硬化性等因素的話,最好 二環戊二烯在9 0重量%以上。特別以純度9 5重量%以上為 佳。 其次,和上述不飽和環狀碳氫化合物進行複加成的苯酉分 類,係僅要1分子中至少具1個芳香族性氫氧基之化合物 的話便可,其餘並無特別限制,具體而言,可舉例如:無取 代苯紛、及鍵結著烧基、嫦基、婦丙基、芳香基、芳烧基 或鹵基等的取代酚類。後者的取代苯酚類,可舉例如:曱 酚、二甲苯酚、乙基苯酚、異丙基苯酚、丁基苯酚、辛基 苯酚、壬基苯酚、乙烯基苯酚、異丙基苯酚、烯丙基苯酚、 苯基苯酚、辛基苯酚、氯化苯酚、溴苯酚(包含各個取代位 置不同的異構物)等單取代苯酚類;二曱基苯酚、第三丁基 -曱基苯酚(包含各個取代位置不同的異構物)等二取代苯 酚類;或如三曱基苯酚(包含各個取代位置不同的異構物) 等三取代苯S分類;1-萘紛、2-萘S分、二經基萘、(1,2-、1,3-、 1,4-、1,5-、1,6-、1,7-、1,8-' 2,3-、2, 6-、2,7-之異 構物)等萘酚類;雙酚A、雙酚F、雙酚S、雙酚Z、雙酚P、 10 312/發明說明書(補件)/93-〇6/931〇6657 200424773 雙酚Μ、二羥基萘二苯曱酮、聯苯、氫醌、間苯二酚等二 元苯酚類等等。其中,就從硬化性觀點而言,最好為苯酚 與曱酚。 不飽和環狀碳氫化合物與苯酚類間之複加成反應物的 反應中,所使用的表醇,可採用如:表氯醇、表碘醇、表 溴醇、/5 -曱基表氯醇等,以表氯醇為最佳。 所以,環氧樹脂(a)最好為二環戊二烯與苯酚(或曱酚) 之複加成反應物,和表鹵醇的反應生成物。 本發明中所採用環氧樹脂(a )僅要使用上述原料的話便 可,其製造方法並無特別限制,可舉例如:日本專利特開平 1 1 - 2 0 9 5 8 4號公報中所揭示的方法。 再者,上述環氧樹脂(a)最好使用如大日本油墨(股)製 二環戊二烯型環氧樹脂艾比克龍(音譯)HP 7 2 0 0系列、曰本 化藥(股)製環氧樹脂XD 1 0 0 0系列等等市售物。 含不飽和基羧酸化合物(b) 含不飽和基羧酸化合物(b)有如具有乙烯性不飽和雙鍵 的不飽和基羧酸,具體例可舉例如:(曱基)丙烯酸(另外, 在本說明書中,「(曱基)丙烯〜」、「(甲基)丙烯酸酯」等係 蘊含「丙烯〜或曱基丙烯〜」、「丙烯酸酯或甲基丙烯酸酯」 等之涵義,例如「(甲基)丙烯酸」便蘊含「丙烯酸、或曱 基丙烯酸」之涵義)、巴豆油酸、鄰(或間、對)乙烯基苯曱 酸、或如(曱基)丙婦酸之α位_化烧基、烧氧基、ιέ素、 硝基、氰取代物等單羧酸、或如2 -(甲基)丙烯醯氧基乙基 琥珀酸、2 -丙烯醯氧基乙基己二酸、2-(甲基)丙烯醯氧基 11 312/發明說明書(補件)/93-06/93106657 200424773 乙基鄰苯二曱酸、2 -(曱基)丙烯醯氧基乙基六氫鄰苯二曱 酸、2-(曱基)丙烯醯氧基乙基馬來酸、2-(曱基)丙烯醯氧 基丙基琥站酸、2-(曱基)丙烯醯氧基丙基己二酸、2-(曱基) 丙烯醯氧基丙基四氫鄰苯二曱酸、2-(曱基)丙烯醯氧基丙 基鄰苯二曱酸、2-(曱基)丙烯醯氧基丙基馬來酸、2-(曱基) 丙烯醯氧基丁基琥拍酸、2 -(曱基)丙烯醯氧基丁基己二 酸、2-(曱基)丙烯醯氧基丁基氫化鄰苯二曱酸、2-(曱基) 丙烯醯氧基丁基鄰苯二曱酸、2-(曱基)丙烯醯氧基丁基馬 來酸、或經在(曱基)丙烯酸上加成ε -己内酯、yS -丙内酯、 r - 丁内、 (5 -戊内酯等内酯類的單聚物、或如在(曱基) 丙稀酸經基烧S旨、季戊四醇三(曱基)丙稀酸酯上經加成(去 水)琥珀酸、(去水)鄰苯二曱酸、(去水)馬來酸等酸(酐) 的單聚物、或如(曱基)丙烯酸二聚物等。 上述具乙烯性不飽和雙鍵的·不飽和羧酸,最好為脂肪族 不飽和羧酸,特別以(曱基)丙烯酸為佳。該等可使用複數 種。 環氧樹脂(a )與含不飽和基羧酸(b )之反應 使環氧樹脂中之環氧基、與含不飽和基羧酸進行反應的 方法,可使用週知手法。例如將上述環氧樹脂、與含不飽 和基羧酸,以如:三乙胺、革基曱胺等三級胺、氣化十二烷 基三曱銨、氣化四甲銨、氣化四乙銨、氯化芊基三乙銨等 四級銨鹽、吼啶、三苯膦等為觸煤,在有機溶劑中反應溫 度5 0〜1 5 0 °C ,進行反應數小時〜數十小時,便可在環氧 樹脂上加成羧酸。 12 312/發明說明書(補件)/93-06/93106657 200424773 該觸煤的使用量,係相對於反應原料混合物,最好為 0.01〜10重量%,尤以0.3〜5重量%為佳。而且,在反應 中為防止發生聚合,最好使用阻聚劑(例如:曱氧醌 (methoquinone)、氫S昆、甲基氫S昆、氫ϊ昆單曱醚、焦掊紛 (P y r 〇 g a 1 1 ο 1 )、第三丁基兒茶盼、紛嚷嗉等),使用量則相 對於反應原料混合物,最好為0 . 0 1〜1 0重量%,尤以0 . 1 〜5重量%為佳。環氧樹脂之環氧基上加成著含不飽和基羧 酸的比率,通常為9 0〜1 0 0莫耳。為使殘存環氧基不致對 保存安定性造成不良影響,所以相對於環氧基1當量,通 常依0.8〜1.5當量(最好0.9〜1.1當量)的比率進行反應。 多鹼性基羧酸或其酐(c) 使環氧樹脂(a )與含不飽和基羧酸(b )進行反應時,所生 成之經加成氫氧基的多鹼性基羧酸或其酐(c ),可使用週知 者,可舉例如:馬來酸、琥珀酸、衣康酸、鄰苯二甲酸、四 氫鄰苯二甲酸、六氫鄰苯二甲酸、曱基内亞曱基四氫鄰苯 二甲酸(methylendomethylenetetrahydrophthalic acid)、六氣内-曱婦基-四氫苯二曱酸(chlorendic acid)、曱基四氫鄰苯二曱酸、5 -曱篇稀-2,3-二魏酸、5-曱芯烯-2,3 -二羧酸甲酯等二鹼性基羧酸或其去水物;偏苯 三酸、均苯四曱酸、二苯曱酮四羧酸、聯苯基四羧酸等多 鹼性基羧酸或其酐。最好為多鹼性基羧酸之酐,尤以四氫 鄰苯二曱酸酐或琥珀酸酐為佳。 多鹼性基羧酸或其酐(c)之加成率,通常為加成(b)成分 時所生成氫氧基的1 0〜1 0 0莫耳%,最好為2 0〜1 0 0莫耳°/〇, 13 312/發明說明書(補件)/93-06/93106657 200424773 尤以加成3 0〜1 0 0莫耳%為佳。若過多的話,將降低顯影時 的殘膜率,反之若過少的話,溶解性將嫌不足,對基板的 密接性將不足。 在上述環氧樹脂(a )上加成含不飽和基羧酸(b )之後,再 加成上多鹼性基羧酸或其酐(c )的方法,可採用週知方法。 此外,在本發明中,亦可使用在多鹼性基羧酸或其酐(c ) 加成後,再使所生成的部分羧基上加成含環氧基化合物(d ) 而所獲得黏結劑樹脂。例如(d )成分在為提昇光敏感度方 面,可使用如(曱基)丙烯酸縮水甘油_、(曱基)丙烯酸 3,4 -環氧基環己酯、或經加成具有聚合性不飽和基的縮水 甘油喊化合物等含環氧基不飽和化合物者,或者在為提昇 顯影性方面,亦可加成未具聚合性不飽和基的縮水甘油醚 化合物,亦可二者合併使用。未具有聚合性不飽和基之縮 水甘油醚化合物具體例,有如:具笨基或烷基之縮水甘油醚 化合物(N A G A S E化成工業製、商品名:迪納克爾(音譯) E X - 1 1 1、迪納克爾E X - 1 2 1、迪納克爾E X - 1 4 1、迪納克爾 EX-145、迪納克爾EX-146、迪納克爾EX-171、迪納克爾 EX-192)等。 本發明的黏結劑樹脂(A ),亦涵蓋在使如上述的環氧樹 脂(a )與含不飽和基羧酸(b )之反應物,更與多鹼性基羧酸 或其酐(c )進行反應而所獲得樹脂的部分羧基上,加成含環 氧基化合物(d )而所獲得的黏結劑樹脂。 本發明的黏結劑樹脂(A ),經G P C測定得聚苯乙烯換算 重量平均分子量(Mw),通常為700以上,最好為1000以上, 14 312/發明說明書(補件)/93-06/93106657 200424773 通常為50000以下,最好為30000以下。若重量平均分子 量過小的話,耐熱性、膜強度將變差劣,反之若過大的話, 對顯影液的溶解性將嫌不足,因而最好避免。 本發明黏結劑樹脂(A )的酸價(m g Κ Ο H / g ),通常為1 0以 上,最好50以上,通常為200以下,最好150以下。若酸 價過低的話,將無法獲得充分地溶解性,反之若酸價過高 的話,硬化性將嫌不足,表面性將惡化。 該等黏結劑樹脂(A )係相對於本發明感光性組成物總固 形份,通常在1 0重量%以上,最好在2 0重量%以上。若黏 結劑樹脂(A )含有量明顯偏低的話,顯影液對未曝光部分的 溶解性將降低,容易引發顯影不良情況。另外,在本發明 中所謂「總固形份」係指除溶劑以外的所有成分。本發明 之感光性組成物中的總固形份,通常在1 0重量%以上,且 9 0重量%以下。 &lt;光聚合起始劑(B ) &gt; 本發明中所採用光聚合起始劑係僅要利用光化射線 (actinic ray) ?使乙稀性不飽和基進行聚合之化合物的話 便可,其餘並無特別限制,本發明的感光性組成物係當具 有可聚合基之化合物為含乙烯性化合物的情況時,最好使 用具有直接吸收光而光增感,並引發分解反應或脫氫反 應,而發生聚合活性自由基之機能的光聚合起始劑。 本發明中可使用之聚合起始劑的具體例,如下:2 - ( 4 -甲 氧基苯基)-4,6-雙(三氣曱基)-3-三嗉、2-(4-曱氧基萘 基)-4,6-雙(三氯曱基)-s-三嗉、2-(4 -乙氧基萘基)-4,6- 15 312/發明說明書(補件)/93-06/93106657 200424773 雙(三氯甲基)-s-三嗉、2-(4 -乙氧基羰基萘基)-4,6-雙(三 氯曱基)-s -三嗉等鹵甲基化三嗉衍生物;2 -三氯甲基-5 -(2 ’ -苯并呋喃基)-1,3,4 -噁二唑、2 -三氣甲基-5 - [ /3 - ( 2 ’ -苯并呋喃基)乙烯基]-1,3,4 -噁二唑、2 -三氯曱基-5 -[泠 -(2 ’ - ( 6 π -苯并呋喃基)乙烯基)]-1,3,4 -噁二唑、2 -三氯甲 基-5 -呋喃基-1,3,4 -噁二唑等鹵曱基化噁二唑衍生物; 2 -( 2 ’ -氣化苯基)-4,5 -二苯基咪唑二聚物、2 - ( 2 ’ -氯化苯 基)-4,5 -雙(3 ’ -甲氧基苯基)咪唑二聚物、2 - ( 2 ’ -氟化苯 基)-4,5-二苯基咪唑二聚物、2-(2’-曱氧基苯基)-4,5-二 苯基咪唑二聚物、(4 ’ -甲氧基苯)-4,5 -二苯基咪唑二聚物 等咪唑衍生物;苯偶姻甲醚、苯偶姻苯醚、苯偶姻異丁醚、 苯偶姻異丙醚等苯偶姻烷基醚類;2 -曱基蔥醌、2 -乙基蔥 醌、2 -第三丁基蔥醌、1 -氣蔥醌等蔥醌衍生物;二苯甲酮、 米蚩酮(Michler’s ketone)、2 -曱基二苯甲8同、3 -甲基二 苯甲酮、4 -曱基二苯甲酮、2 -氯化二苯甲酮、4 -溴二苯甲 酮、2-羧基二苯曱酮等二苯曱酮衍生物;2, 2-二曱氧基-2 -苯基苯乙酮、2, 2_二乙氧基苯乙酮、1-羥基環己基苯基丙 酮、α-羥基-2-曱基苯基丙酮、1-羥基-1-甲基乙基-(對異 丙基苯基)丙酮、1-羥基-1-(對十二烷基苯基)丙酮、2-甲 基(硫代曱基)苯基)一2-嗎琳代-1-丙酮、1,1,1-三氯 曱基-(對丁基苯)丙酮等苯乙酮衍生物;噻噸酮、2 -乙基噻 噸酮、2 -二異丙基噻噸酮、2 -氯化噻噸酮、2,4 -二曱基噻 噸酮、2,4 -二乙基噻噸酮、2,4 -二異丙基噻噸酮等噻噸酮 衍生物;對二甲胺基苯曱酸乙酯、對二乙胺基苯甲酸乙酯 16 312/發明說明書(補件)/93-06/93106657 200424773 等苯曱酸酯衍生物;9 -苯基吖啶、9 -(對曱氧基苯基)吖啶 等吖啶衍生物;9,1 0 -二曱基苯并吩嗉等吩嗉衍生物 (phenaz ine derivative);苯并蔥酮等蔥綱衍生物 (anthrone derivative);二環戊二婦基 -Ti- 二氣化物、二 環戊二烯基- Ti-雙苯、二環戊二炼基- Ti-雙-2, 3, 4, 5, 6-五氟化苯-1&quot;酿、二環戊二稀基-Ti_雙-2,3,5,6_四氣化苯 -1-醯、二環戊二烯基-Ti -雙- 2,4, 6-三氟化苯-1-醯、二環 戊二烤基- Ti-2,6 -二乳化苯-1-酿、二環戊二婦基- Ti-2,4-二氟化苯-1_酿、二甲基環戊二稀基-Ti -雙-2,3,4,5,6-五 氟*化苯-1-酸、二甲基環戊二稀基-Ti -雙-2,6 -二氟化苯-1 -醯、二環戊二烯基- Ti-2,6 -二氟- 3- (丙-1-醯)-苯-1-醯等 銥稀衍生物(titanocenederivative)。 Jt夕卜,特另1J以曰本 特開平2 0 0 0 - 8 0 0 6 8號公報中所揭示肟系起始劑為佳。 此外,本發明中可使用的光聚合起始劑,亦有如精密化 學(雜誌名,意譯),1 9 9 1年3月1日出刊,V ο 1 · 2 0,N 〇 · 4, P . 1 6〜2 6,或日本專利特開昭5 9 - 1 5 2 3 9 6號公報、特開昭 6 1 - 1 5 1 1 9 7號公報、特公昭4 5 - 3 7 3 7 7號公報、特開昭 5 8 - 4 0 3 0 2號公報、特開平1 0 - 3 9 5 0 3號公報中所揭示者。 光聚合起始劑之含有率,係相對於本發明感光性組成物 總固形份,通常在0 . 0 1重量%以上,以0 . 1重量%以上為佳, 以0 . 5重量%以上更佳,且通常在3 0重量%以下,最好在 1 0重量%以下。若含有率過低的話,將引發敏感度降低情 況;反之,若過高的話,未曝光部分對顯影液的溶解性將 降低,容易引發顯影不良情況。 17 312/發明說明書(補件)/93-06/93106657 200424773 &lt;光聚合性單體&gt; 在本發明中,除黏結劑樹脂(A )與光聚合起始劑(B ) 外,尚使用光聚合性單體(光聚合性化合物),此對敏 等而言,將有所助益。本發明中所使用的光聚合性單 舉例如至少具1個乙稀性不飽和基的化合物。分子内 乙烯性不飽和基化合物的具體例,可舉例如:(曱基)卢 酸、(曱基)丙稀酸之燒S旨、丙稀腈、苯乙烤、具有1 烯性不飽和鍵的羧酸與多(單)元醇的單酯等。 在本發明中,最好使用1分子中具有2個以上乙烯 飽和基的多官能團乙烯性單聚物。相關的多官能團乙 單聚物例子,可舉例如:脂肪族多羥基化合物與不飽和 的酯;芳香族多羥基化合物與不飽和羧酸的酯;利用 族多經基化合物、芳香族多經基化合物等多元經基化 物,與不飽和羧酸及多鹼性基羧酸的酯化反應而所獲 等。 上述脂肪族多羥基化合物與不飽和羧酸的酯,可舉 乙二醇二丙烯酸酯、三乙二醇二丙烯酸酯、三羥曱基 三丙烯酸酯、三羥曱基乙烷三丙烯酸酯、季戊四醇二 酸酯、季戊四醇三丙烯酸酯、季戊四醇四丙烯酸酯、 戊四醇四丙稀酸酯、二季戊四醇五丙稀酸酯、二季戊 六丙稀酸酯、甘油丙稀酸酯等脂肪族多經基化合物的 酸酯;將該等例示化合物的丙烯酸酯取代為曱基丙烯 的曱基丙婦酸酯類;同樣的取代為衣康酸酯(i t a c ο n a 的衣康酸酯類;或取代為氣酸酯的巴豆油酸酯類或馬 312/發明說明書(補件)/93-06/93106657 之 感度 體可 具有 3烯 個乙 性不 烯性 羧酸 脂肪 合 得醋 例如: 丙烧 丙烤 二季 四醇 丙稀 酸醋 t e ) 來酸 18 200424773 酯類等。 芳香族多經基化合物與不飽和叛酸的酯,可舉例如:氫 醌二丙烯酸酯、氫醌二甲基丙烯酸酯、間苯二酚二丙烯酸 酯、間苯二酚二曱基丙烯酸酯、焦掊酚三丙烯酸酯等芳香 族多羥基化合物之丙烯酸酯類及曱基丙烯酸酯類等。 利用多鹼性基羧酸及不飽和羧酸,與多元羥基化合物的 酯化反應而所獲得酯類,未必一定單一物質,代表具體例 有如:丙稀酸、敝酸、及乙二醇的縮聚物(condensation polymer);丙嫦酸、馬來酸、及二乙二醇的縮聚物;曱基 丙烯酸、對苯二曱酸、及季戊四醇的縮聚物;丙烯酸、己 二酸、丁二醇、及甘油的縮聚物等。 其他,本發明中所使用多官能團乙烯性單聚物的例子, 有如:使聚異氰酸酯化合物與含氫氧基之(甲基)丙烤酸 酯,或使聚異氰酸酯化合物、與聚醇及含氫氧基之(甲基) 丙烯酸酯進行反應,而所獲得的各種胺甲酸乙酯(曱基)丙 烯酸酯類;或如多元環氧化合物、及羥基(曱基)丙烯酸酯、 或(甲基)丙烯酸的加成反應物之類的環氧丙烯酸酯類;亞 乙基雙丙烯醯胺等丙烯醯胺類;酞酸二烯丙酯等烯丙酯 類;酞酸二乙烯酯等含乙烯基化合物等。 感光性組成物中的光聚合性單體含有率係相對於總固 形份,通常在9 0重量%以下,以8 0重量%以下為佳。若光 聚合性單體含有率過高的話,顯影液對曝光部的滲透性將 提高,導致頗難獲得良好的影像。 [感光性著色組成物] 19 312/發明說明書(補件)/93-06/93106657 200424773 當將本發明之感光性組成物,使用於彩色濾光片用途等 之情況時,便在感光性組成物中調配色材,而調製感光性 著色組成物。 〈色材(c) &gt; 色材係將本發明的感光性組成物進行著色者。色材雖可 使用染顏料,但是就從耐熱性、耐光性等觀點而言,最好 使用顏料。顏料可使用如:藍色顏料、綠色顏料、紅色顏料、 黃色顏料、紫色顏料、橙色顏料、棕色顏料、黑色顏料等 各種顏色的顏料。此外,亦可利用其構造為偶氮系、酞菁 系、喳吖啶酮系、苯并咪唑酮系、異蚓哚滿酮系、二氧雜 環己烧系、陰丹士林系(i n d a n t h r e n e )、二苯并慧系等有機 顏料,以及其他無機顏料等。以下,將可使用顏料的具體 例以顏料號碼表示。以下所舉「C . I .顏料紅2」等用詞係 指顏料索引(C. I.)。 紅色顏料可舉例如:C. I ·顏料紅1、2、3、4、5、6、7、 8、 9、 12、 14、 15、 16、 17、 21 、 22、 23、 31 、 32、 37、 38、 41、 47、 48、 48:1、 48:2、 48:3、 48:4、 49、 49: 1、 49:2、 50:1' 52:1、 52:2、 53、 53:1 &gt; 53:2、 53:3、 57、 5 7:1、57:2、58:4、60、63、6 3 ·· 1、6 3 ·· 2、64、6 4 ·· 1、68、 69、 81、 81:1' 81:2、 81:3、 81:4' 83、 88' 90:卜 101 &gt; 101]、104、108、108]、109、112、113、114、122、123、 144、 146、 147' 149、 151、 166、 168、 169、 170、 172、 173、 174、 175、 176、 177、 178' 179、 181、 184 &gt; 185、 187、 188、 190、 193、 194、 200、 202、 206、 207、 208、 20 312/發明說明書(補件)/93-06/93106657 200424773 209 ' 210、 214&gt; 216、 220、 221、 224' 230、 231、 232、 233 、 235 &gt; 236 、 237 、 238 、 239 、 242 、 243 、 245 、 247 、 249、 250、 251、 253、 254、 255、 256、 257、 258、 259、 260、 262、 263、 264、 265、 266、 267、 268、 269、 270、 271、272、273、274、275、276 等。其中,以 C-Ι.顏料紅 48]、122、168、177、202、206、207、209、224、242、 2 5 4較佳,尤以C · I .顏料紅1 7 7、2 0 9、2 2 4、2 5 4更佳。 藍色顏料可舉例如:C . I .顏料藍1、1 : 2、9、1 4、1 5、1 5 : ;1、 15:2、15:3、15:4、15:6、16、17、19、 25、27、28、29、 33' 35' 36' 56' 56:1' 60' 61' 61 : 1 &gt; 62' 63' 66' 67' 68、 71、 72、 73、 74、 75、 76、 78、 79。其中,以 C.I.顏 料藍 1 5、1 5 : 1、1 5 : 2、1 5 : 3、1 5 : 4、1 5 : 6 為佳,尤以 C · I · 顏料藍1 5 : 6更佳。 綠色顏料可舉例如:C . I .顏料綠1、2、4、7、8、1 0、1 3、 14、15、17、18、19、26、36、45、48、50、51、54、55 ° 其中,以C. I .顏料綠7、3 6為佳。 黃色顏料可舉例如:C . I .顏料黃1、1 : 1、2、3、4、5、6、 9、10、12、13、14、16、17、24、3 卜 32、34、35、35:1、 36、36:1、37、37:1、40' 41、42' 43、48、53、55、61、 62、62]、63、65、73、74、75' 81、83、87、93、94、 95、97、100、101、104、105、108、109、110、111、116、 117、119、120、126、127、127:1、128、129、133、134、 136、 138、 139、 142、 147、 148、 150、 151、 153、 154、 155' 157^ 158' 159、 160、 16卜 162' 163' 164' 165' 21 312/發明說明書(補件)/93-06/93106657 200424773 166、 167、 168、 169、 170、 172、 173、 174、 175、 176、 180、 181、 182、 183 &gt; 184、 185、 188' 189、 190' 19卜 19 1:1 &gt; 192、193、194、195、196、197、198、199、200、 202、 203、 204、 205、 206、 207、 208。其中,以 C·I.顏 料黃 8 3、117、129、138、139、150、154、155、180、185 為佳,尤以C · I .顏料黃8 3、1 3 8、1 3 9、1 5 0、1 8 0更佳。 橙色顏料可舉例如:C . I .顏色橙1、2、5、1 3、1 6、1 7、 19、20、21、22、23、24、34、36、38、39、43、46' 48、 49、61、62、64、65、67、68、69、70、71、72、73、74、 75、77、78、79。其中,以C.I·顏色橙38、71為佳。 紫色顏料可舉例如:C · I ·顏色紫1、1 : 1、2、2 : 2、3、3 : 1、 3:3、5、5:1、14、15、16、19、23、25、27、29、31、32、 37、39、42、44、47、49、50。其中,以 C.I·顏色紫 19、 2 3為佳,以C · I .顏色紫2 3更佳。 再者,當採用感光性著色組成物,形成彩色濾光片之樹 脂黑矩陣的情況時,可使用黑色的色材。黑色色材可單獨 使用黑色色材,亦可混合紅、綠、藍等。此外,該等色材 可從無機或有機的顏料、染料中適當地選擇。當屬於無機、 有機顏料之情況時,最好使用分散於平均粒徑1 μ m以下(最 好0 , 5 μ ill以下)中者。 為調製黑色色材而可混合使用的色材,可舉例如:鹽性藍 (victoria pure blue)(42595)、驗性槐黃 0(41000)、200424773 (1) Description of the invention: [Technical field to which the invention belongs] The present invention relates to a photosensitive composition, a photosensitive coloring composition, a color filter, and a liquid crystal display device. More specifically, it relates to a photosensitive composition that is superior in liquid stability and heat resistance, has less surface contamination during development, has good adhesion to a substrate, has a good edge shape, and is suitable for manufacturing color filters. [Prior art] Conventionally, manufacturing methods of color filters using pigments are known as: dyeing method, electroplating method, electrodeposition method, inkjet method, pigment dispersion method, and the like. In the case of the pigment dispersion method, a coloring composition in which a pigment is dispersed by a dispersant or the like is usually added with a binder resin, a photopolymerization initiator, a photopolymerizable monomer, and the like, and is subjected to photosensitivity. The coloring composition is coated on a glass substrate, dried, and then exposed with a photomask to form a colored pattern by development, and then heats it to fix the pattern and form pixels. Repeat these steps for each color to form a color filter. Accordingly, image formation using a color filter using a photosensitive coloring composition requires characteristics such as sufficient resolution, adhesion to a substrate, and low development residue. Even in recent years, a pixel having a higher color density and a resin black matrix having a higher optical density have been required, and the content of pigments and carbon black in the photosensitive coloring composition tends to increase. In addition, in general, a photosensitive composition containing a component that can be polymerized by light, a photopolymerization initiator, and a binder resin, including the above-mentioned photosensitive coloring composition, is supplied for general coating, drying, and exposure. The photolithography step of the development step, but in related steps, 5 312 / Invention Specification (Supplement) / 93-06 / 93106657 200424773 does not occur. The removal part and surface contamination in the residual development step do not occur. The part has sufficient solubility, and enhances the formation of pixels such as the sharpness of the pattern edges. In particular, when a photosensitive coloring composition with a relatively high color material content is used to form a pixel, it will obviously be easy to cause residues or surface contamination on the substrate of the unexposed portion in the developing step, making the unexposed portion impossible. Obtain good phenomena such as good solubility, poor sharpness of the shape of the pixel edges, poor sensitivity of the pixels formed on the exposed part, and poor surface smoothness. This is a particularly large problem. Therefore, it has been disclosed that the binder resin uses a photosensitive coloring composition of a phenol epoxy acrylate having a carboxyl group (see Patent Document 1). However, even in the case of using this adhesive resin, because the solubility and sensitivity are poorly balanced, dissolution of the unexposed portion will also cause the developer to penetrate the exposed portion, and pixel edges will appear. It is found that the problem that the adhesion of the pixel to the substrate deteriorates due to the irregularity. In addition, it has been disclosed that a photosensitive resin containing an alicyclic epoxy-based unsaturated compound in an acrylic resin having a carboxyl group is used as a binder resin (see Patent Document 2). However, even when this binder resin is used, However, the sensitivity is still insufficient, so it is known that the adhesion of the pixel to the substrate will deteriorate, and it is quite difficult to form a high-definition pixel. In addition, it has been disclosed that a photo-curable resin composition for soldering resists, which is compatible with the increase in density of a printed circuit board, etc., uses a polybasic acid anhydride to react with a reaction product of an epoxy resin and an unsaturated monocarboxylic acid. The obtained photosensitive resin has improved resolution, developability, adhesion, and plating resistance (refer to Patent Document 312 / Invention Specification (Supplement) / 93-06 / 93106657 6 200424773 sect. 3). However, in the photocurable resin composition for solder resist, the color material content of the color filter composition is relatively small, so the tree can be applied to a photosensitive coloring composition, and the amount of pigment or carbon black can be increased. With regard to the intended use of color filters and light filters, problems such as residual surface contamination, sharpness of pixel edge shapes, and surface smoothness that have not yet occurred particularly on the substrate of the unexposed portion in the above-mentioned development step cannot be solved. [Patent Literature 1] Japanese Patent Laid-Open No. 1 1-8 4 1 2 6 [Patent Literature 2] Japanese Patent Laid-Open No. 1-2 8 9 8 2 0 [Patent Literature 1] Japanese Patent No. 2 9 3 1 8 6 [Summary of the Invention] An object of the present invention is to provide a sensory object suitable for the use of a color phosphor film and having a good image forming property even when the color material density is high, and a product manufactured by using the same. A photosensitive coloring composition and a color filter liquid crystal display device were obtained. The reason is that the inventors have delved into the photosensitive composition containing a specific binder resin (A) in order to solve the above problems. The sensitivity is well-balanced, and the pixel edge has excellent clarity and adhesion. It is also found that the obtained The shape of the light-shielding pattern (black matrix) is good, according to the present invention. In other words, the photosensitive composition existing in the first aspect of the present invention includes: reacting an epoxy resin (a) with an unsaturated group-containing carboxylic acid (b) with a polybasic carboxylic acid or a dehydrated product thereof ( c) mold resin (A) obtained by reaction; and photopolymerization initiator (B); 312 / Invention Specification (Supplement) / 93-06 / 93106657 is different from the fat whether the color material contains a clear, leave with the table, It is estimated that the optical group is a light sheet, and the solubility is found. In addition, the finished product, series, and more; Caking agent 7 200424773 Among them, epoxy resin (a) is an cyclic ring with more than two unsaturated groups per molecule. Hydrocarbons and phenols are a multi-addition reaction product and a reaction product of epihalohydrin. The photosensitive coloring composition existing in the second aspect of the present invention contains the photosensitive composition and a color material (C). The photosensitive composition for a light-shielding pattern existing in the third gist of the present invention is a cross-sectional shape formed when a light-shielding pattern is formed on a transparent substrate. The light-shielding pattern is connected to the surface of the substrate and is formed between the surface of the substrate and the surface of the substrate. The angle is below 50 degrees. The color filter existing in the fourth aspect of the present invention has a light-shielding pattern on a transparent substrate, and the light-shielding pattern is formed by using a photosensitive composition, and the light-shielding pattern is connected to the surface of the substrate, and is in contact with the substrate. The angle formed between the faces is below 50 degrees. The color filter existing in the fifth aspect of the present invention has a pixel formed on the transparent substrate using the above-mentioned photosensitive coloring composition. A liquid crystal display device according to a sixth aspect of the present invention is manufactured using the above-mentioned color filter. The adhesion between the photosensitive composition system of the present invention and a substrate is good. In addition, the photosensitive coloring composition in which a color material is blended has excellent developability, adhesion to a substrate or a light-shielding layer, and surface smoothness even when a color material such as pigment or carbon black is contained at a high concentration. , Can form high-definition pixels. In addition, a high-quality color filter using this photosensitive coloring composition can be provided, and even a high-quality liquid crystal display device using this color filter can be provided. 8 312 / Invention Specification (Supplement) / 93-06 / 93106657 200424773 The photosensitive composition of the present invention can be effectively used as a solder resist for flexible printed circuit boards and a solder resist in addition to a color filter. Plating agents, related insulating films for multilayer printed circuit boards, photosensitive optical waveguides, light-curing liquid crystal sealing materials, light-curing EL sealing materials, light-curing adhesives, and the like. [Embodiment] Hereinafter, the present invention will be described in detail. [Photosensitive composition] The photosensitive composition of the present invention contains a binder resin (A) and a photopolymerization initiator (B) as essential components, and further needs to contain a photopolymerizable monomer in combination. &lt; Binder resin (A) &gt; The binder resin (A) is a reaction product of an epoxy resin (a) and an unsaturated carboxylic acid (b), and is more reactive with a rheulic acid or its anhydride ( c) obtained by performing a reaction. The epoxy resin (a) and the bad oxygen resin (a) are an average of one cyclic hydrocarbon having two or more unsaturated groups (hereinafter referred to as "unsaturated cyclic hydrocarbon") and phenols. Reactant, reaction product with epihalohydrin. The reason why this binder resin (A) exhibits good characteristics can be judged to be that the epoxy resin (a) constituting the component has a large volume (bu 1 ky) because it has a cyclic hydrocarbon structure, and because it has an appropriate hydrophobicity It will prevent the invasion caused by the developer from penetrating into the exposure section. The number of unsaturated groups having unsaturated cyclic hydrocarbons is usually 4 or less, preferably 2 per molecule. Although there are no particular restrictions on unsaturated cyclic hydrocarbons, the number of carbon atoms is usually 312 / Invention (Supplement) / 93-06 / 93106657 200424773 5 to 20, and preferably 6 to 12. Specifically, for example, dicyclopentadiene, tetrahydrofp, 4-vinylcyclohexane, 5-vinylfluorene is 2-ene, α-pinene, / 3-pinene, and lemon oil. Unsaturated aliphatic hydrocarbons such as fine (1 im ο nene); unsaturated aromatic hydrocarbons such as divinylbenzene. Among these, dicyclopentadiene is particularly preferred. Furthermore, because dicyclopentadiene roast is contained in petroleum cut, industrial dicyclopentadiene contains impurities such as other aliphatic or aromatic diene. If heat resistance and hardening properties are considered For other factors, dicyclopentadiene is more than 90% by weight. Particularly, the purity is preferably 95% by weight or more. Second, the classification of phenylhydrazone by addition addition with the above unsaturated cyclic hydrocarbons is only required for compounds having at least one aromatic hydroxyl group in one molecule, and the rest are not particularly limited. Specific examples include unsubstituted benzenes and substituted phenols bonded to an alkyl group, a fluorenyl group, a propyl group, an aromatic group, an aromatic group, or a halogen group. The latter substituted phenols include, for example, acetol, xylenol, ethylphenol, isopropylphenol, butylphenol, octylphenol, nonylphenol, vinylphenol, isopropylphenol, allyl Monosubstituted phenols such as phenol, phenylphenol, octylphenol, chlorinated phenol, bromophenol (including isomers with different substitution positions); difluorenylphenol, third butyl-fluorenylphenol (including each substitution) Isomers with different positions) and other di-substituted phenols; or tri-substituted benzenes such as tris-methylphenol (including isomers with different substitution positions); classification of tri-substituted benzenes; Naphthalene, (1,2-, 1,3-, 1,4-, 1,5-, 1,6-, 1,7-, 1,8- '2,3-, 2, 6-, 2 , 7-isomers) and other naphthols; bisphenol A, bisphenol F, bisphenol S, bisphenol Z, bisphenol P, 10 312 / Invention Specification (Supplement) / 93-〇6 / 931〇 6657 200424773 Bisphenol M, dihydroxynaphthylbenzophenone, biphenyl, hydroquinone, resorcinol and other dihydric phenols, etc. Among them, phenol and resorcinol are preferred from the viewpoint of hardenability. In the reaction of the polyaddition reaction between unsaturated cyclic hydrocarbons and phenols, the epitope used can be, for example, epichlorohydrin, epiiodohydrin, epibromohydrin, / 5-fluorenyl epichlorohydrin. As the alcohol, epichlorohydrin is most preferred. Therefore, the epoxy resin (a) is preferably a reaction product of dicyclopentadiene and phenol (or phenol), and a reaction product of epihalohydrin. The epoxy resin (a) used in the present invention is only required to use the above-mentioned raw materials, and the manufacturing method thereof is not particularly limited. For example, as disclosed in Japanese Patent Laid-Open No. 1 1-2 0 9 5 8 Methods. The epoxy resin (a) is preferably a dicyclopentadiene-type epoxy resin made by Dainippon Ink Co., Ltd. HP 7 2 0 0 series, or a chemical product (stock). ) Made of epoxy resin XD 1 0 0 0 series and other commercially available products. The unsaturated group-containing carboxylic acid compound (b) The unsaturated group-containing carboxylic acid compound (b) has an unsaturated carboxylic acid having an ethylenically unsaturated double bond, and specific examples include (fluorenyl) acrylic acid (in addition, in In this specification, "(fluorenyl) propylene ~", "(meth) acrylate", etc. have the meanings of "propylene ~ or fluorenylpropylene ~", "acrylate or methacrylate", etc., such as "( "Meth) acrylic acid" has the meaning of "acrylic acid, or methacrylic acid"), crotonic acid, ortho (or m-, p-) vinyl benzoic acid, or α-position of (meth) acid Monocarboxylic acids such as alkyl, oxy, nitro, nitro, and cyanide substitutes, or 2- (meth) acryloxyethyl succinic acid, 2-acryloxyethyl adipic acid, 2- (Meth) acrylfluorenyloxy 11 312 / Inventory (Supplement) / 93-06 / 93106657 200424773 Ethylphthalic acid, 2- (fluorenyl) acryloxyethylhexahydrophthalate Diphosphonic acid, 2- (fluorenyl) propenyloxyethylmaleic acid, 2- (fluorenyl) propenyloxypropylsuccinic acid, 2- (fluorenyl) propene Oxypropyl adipic acid, 2- (fluorenyl) propenyloxypropyltetrahydrophthalic acid, 2- (fluorenyl) propenyloxypropylphthalic acid, 2- (fluorenyl) Propyl) propenyloxypropylmaleic acid, 2- (fluorenyl) propenyloxybutylsuccinic acid, 2- (fluorenyl) propenyloxybutyl adipate, 2- (fluorenyl) Acrylic acid oxybutyl hydrogenated phthalic acid, 2- (fluorenyl) Acrylic acid oxybutyl phthalic acid, 2- (fluorenyl) acrylic acid oxybutyl maleic acid, or (Fluorenyl) addition of ε-caprolactone, yS-propiolactone, r-butyrolactone, (5-valerolactone and other lactone monomers, or as in (fluorenyl) acrylic acid After the addition of sodium hydroxide, pentaerythritol tri (fluorenyl) acrylic acid ester (dehydrated) succinic acid, (dehydrated) phthalic acid, (dehydrated) maleic acid and other acids (anhydrides) Monomer, or (dimenyl) acrylic acid dimer, etc. The unsaturated unsaturated carboxylic acid having an ethylenically unsaturated double bond is preferably an aliphatic unsaturated carboxylic acid, and (fluorenyl) acrylic acid is particularly preferred. . These can be used in plural. Epoxy resin (a) and unsaturated The reaction of the carboxylic acid (b) allows the epoxy group in the epoxy resin to react with an unsaturated group-containing carboxylic acid by a known method. For example, the above epoxy resin and an unsaturated group-containing carboxylic acid are used. For example: tertiary amines such as triethylamine, germidine, etc., quaternary ammonium salts such as vaporized dodecyltriammonium ammonium, tetramethylammonium vaporized, tetraethylammonium vaporized, fluorenyl triethylammonium chloride, etc. , Pyrimidine, triphenylphosphine, etc. are coal-fired, and the reaction temperature is 50 ~ 150 ° C in an organic solvent, and the reaction can be performed for several hours to several tens of hours to add carboxylic acid to the epoxy resin. 12 312 / Invention Specification (Supplement) / 93-06 / 93106657 200424773 The amount of the used coal contact is preferably 0.01 to 10% by weight, and more preferably 0.3 to 5% by weight, relative to the reaction raw material mixture. In addition, in order to prevent polymerization during the reaction, it is best to use a polymerization inhibitor (for example: methoquinone, hydrogen hydrogen, methyl hydrogen hydrogen, hydrogen hydrogen monohydrogen ether, pyrofluorine (Pyr). ga 1 1 ο 1), tertiary butyl catechin, variegated, etc.), the amount used is preferably from 0.1 to 10% by weight, especially from 0.1 to 5 relative to the reaction raw material mixture. % By weight is preferred. The ratio of the epoxy group to the epoxy group containing unsaturated carboxylic acid is usually 90 to 100 moles. In order to prevent the residual epoxy group from adversely affecting storage stability, the reaction is usually performed at a ratio of 0.8 to 1.5 equivalents (preferably 0.9 to 1.1 equivalents) with respect to 1 equivalent of epoxy groups. Polybasic carboxylic acid or its anhydride (c) When an epoxy resin (a) is reacted with an unsaturated carboxylic acid (b), a polybasic carboxylic acid having an added hydroxyl group or The anhydride (c) may be a known one, and examples thereof include: maleic acid, succinic acid, itaconic acid, phthalic acid, tetrahydrophthalic acid, hexahydrophthalic acid, and fluorene. Fluorenyl tetrahydrophthalic acid (methylendomethylenetetrahydrophthalic acid), hexakis-tetrahydro-tetrahydrophthalic acid, fluorenyltetrahydrophthalic acid, 5-methylpyridine-2, Dibasic carboxylic acids such as 3-diweilic acid, 5-menthenene-2,3-dicarboxylic acid methyl ester or their dehydrates; trimellitic acid, pyromellitic acid, benzophenone tetra Polybasic carboxylic acids such as carboxylic acids and biphenyltetracarboxylic acids or their anhydrides. An anhydride of a polybasic carboxylic acid is preferred, and tetrahydrophthalic anhydride or succinic anhydride is particularly preferred. The addition rate of the polybasic carboxylic acid or its anhydride (c) is usually 10 to 100 mole% of the hydroxyl group generated when the component (b) is added, and preferably 20 to 10 0 Mohr ° / 〇, 13 312 / Invention Specification (Supplement) / 93-06 / 93106657 200424773 Especially, it is better to add 30 ~ 100 Molar%. If it is too much, the residual film rate at the time of development will be reduced. On the other hand, if it is too small, the solubility will be insufficient, and the adhesion to the substrate will be insufficient. The method of adding an unsaturated group-containing carboxylic acid (b) to the epoxy resin (a) and then adding a polybasic carboxylic acid or its anhydride (c) may be a known method. In addition, in the present invention, it is also possible to use an adhesive obtained by adding an polybasic carboxylic acid or its anhydride (c) and then adding an epoxy group-containing compound (d) to a part of the carboxyl group formed. Resin. For example, the component (d) may use, for example, (fluorenyl) glycidyl acrylate, (fluorenyl) 3,4-epoxycyclohexyl acrylate, or a polymerizable unsaturated group after addition in order to improve light sensitivity. For epoxy-containing unsaturated compounds such as glycidyl compounds, or to improve developability, a glycidyl ether compound having no polymerizable unsaturated group may be added, or the two may be used in combination. Specific examples of the glycidyl ether compound having no polymerizable unsaturated group are, for example, a glycidyl ether compound having a benzyl group or an alkyl group (NAGASE Chemical Industries Ltd., trade name: DINAKEL (transliteration) EX-1 1 1. Nanokel EX-1 2 1, DINAKEL EX-1 4 1, DINAKEL EX-145, DINAKEL EX-146, DINAKEL EX-171, DINAKEL EX-192) and so on. The binder resin (A) of the present invention also covers the reaction between the epoxy resin (a) and the unsaturated carboxylic acid (b) as described above, and the polybasic carboxylic acid or its anhydride (c ) The epoxy resin-containing compound (d) is added to a part of the carboxyl groups of the resin obtained by the reaction to obtain a binder resin. The polystyrene-equivalent weight average molecular weight (Mw) of the binder resin (A) of the present invention measured by GPC is usually 700 or more, and preferably 1,000 or more. 14 312 / Invention Specification (Supplement) / 93-06 / 93106657 200424773 is usually below 50,000, preferably below 30,000. If the weight-average molecular weight is too small, heat resistance and film strength will be inferior. On the other hand, if the weight-average molecular weight is too large, the solubility in the developer will be insufficient, so it is best avoided. The acid value (m g KO H / g) of the binder resin (A) of the present invention is usually 10 or more, preferably 50 or more, usually 200 or less, and most preferably 150 or less. If the acid value is too low, sufficient solubility will not be obtained. On the other hand, if the acid value is too high, hardenability will be insufficient and surface properties will deteriorate. These binder resins (A) are usually 10% by weight or more, preferably 20% by weight or more, with respect to the total solid content of the photosensitive composition of the present invention. If the content of the binder resin (A) is remarkably low, the solubility of the developer in the unexposed portion will be lowered, which may cause poor development. In addition, in the present invention, the "total solid content" means all components except the solvent. The total solid content in the photosensitive composition of the present invention is usually 10% by weight or more and 90% by weight or less. &lt; Photopolymerization initiator (B) &gt; The photopolymerization initiator used in the present invention is only a compound that uses actinic ray to polymerize ethylenically unsaturated groups, and the rest There is no particular limitation. When the photosensitive composition of the present invention is a vinyl-containing compound when the compound having a polymerizable group is used, it is preferable to use light sensitization by directly absorbing light and initiating a decomposition reaction or a dehydrogenation reaction. A photopolymerization initiator that functions as a polymerizing living radical. Specific examples of the polymerization initiator that can be used in the present invention are as follows: 2-(4-methoxyphenyl) -4,6-bis (trifluorofluorenyl) -3-trifluorene, 2- (4- (Methoxynaphthyl) -4,6-bis (trichlorofluorenyl) -s-trifluorene, 2- (4-ethoxynaphthyl) -4,6- 15 312 / Description of the Invention (Supplement) / 93-06 / 93106657 200424773 bis (trichloromethyl) -s-trifluorene, 2- (4-ethoxycarbonylnaphthyl) -4,6-bis (trichlorofluorenyl) -s-trifluorene and other halogens Methylated trifluorene derivatives; 2-trichloromethyl-5-(2'-benzofuranyl) -1,3,4-oxadiazole, 2-trifluoromethyl-5-[/ 3- (2 '-benzofuranyl) vinyl] -1,3,4 -oxadiazole, 2 -trichlorofluorenyl-5-[iling- (2'-(6 π -benzofuranyl) vinyl )] Halogenated oxadiazole derivatives such as -1,3,4-oxadiazole, 2-trichloromethyl-5-furyl-1,3,4-oxadiazole; 2-(2 ' -Gasified phenyl) -4,5-diphenylimidazole dimer, 2- (2'-chlorophenyl) -4,5-bis (3'-methoxyphenyl) imidazole dimer , 2-(2 '-fluorinated phenyl) -4,5-diphenylimidazole dimer, 2- (2'-fluorenyloxy) -4,5-di Imidazole dimers, (4'-methoxybenzene) -4,5-diphenylimidazole dimers, and other imidazole derivatives; benzoin methyl ether, benzoin phenyl ether, benzoin isobutyl ether , Benzoin alkyl ethers such as benzoin isopropyl ether; 2-onium onion quinone, 2-ethyl onion quinone, 2-third butyl onion quinone, 1-onion quinone derivatives such as onion quinone; Benzophenone, Michler's ketone, 2-fluorenylbenzophenone, 8-methylbenzophenone, 4-methylbenzophenone, 2-benzophenone chloride, Dibenzophenone derivatives such as 4-bromobenzophenone and 2-carboxybenzophenone; 2,2-dioxo-2-phenylacetophenone, 2, 2-diethoxyacetophenone Ketone, 1-hydroxycyclohexylphenylacetone, α-hydroxy-2-fluorenylphenylacetone, 1-hydroxy-1-methylethyl- (p-isopropylphenyl) acetone, 1-hydroxy-1- (P-dodecylphenyl) acetone, 2-methyl (thiofluorenyl) phenyl) -2-morpholino-1-acetone, 1,1,1-trichlorofluorenyl- (p-butyl) Benzene) Acetophenone derivatives such as acetone; thioxanthone, 2-ethylthioxanthone, 2-diisopropylthioxanthone, 2-thioxanthone chloride, 2,4-difluorenyl thioxanthone , 2, 4- Derivatives of thioxanthone such as ethyl thioxanthone, 2,4-diisopropyl thioxanthone; ethyl p-dimethylaminobenzoate, ethyl p-diethylaminobenzoate 16 312 / Description of the Invention ( Supplement) / 93-06 / 93106657 200424773 and other benzoic acid ester derivatives; 9-phenylacridine, 9- (p-oxyphenyl) acridine and other acridine derivatives; 9,1 0-difluorene Phenaz ine derivatives such as benzophenofluorene; anthrone derivatives such as benzochiverone; dicyclopentadienyl-Ti- digas, dicyclopentadienyl- Ti-bisbenzene, dicyclopentadienyl-Ti-bis-2, 3, 4, 5, 6-pentafluorobenzene-1 &quot; Brew, dicyclopentadienyl-Ti_bis-2,3, 5,6_tetragasified benzene-1-fluorene, dicyclopentadienyl-Ti-bis-2,4,6-trifluorobenzene-1-fluorene, dicyclopentadienyl-Ti-2, 6-di-emulsified benzene-1-vinyl, dicyclopentanediyl-Ti-2,4-difluorobenzene-1_vinyl, dimethylcyclopentadienyl-Ti-bis-2,3,4 , 5,6-pentafluoro * benzene-1-acid, dimethylcyclopentadienyl-Ti-bis-2,6-difluorobenzene-1 -fluorene, dicyclopentadienyl-Ti- Dilute iridium derivatives such as 2,6-difluoro-3- (propan-1-fluorene) -benzene-1-fluorene (tita nocenederivative). Jt Xibu, Special 1J is preferably based on the oxime-based initiator disclosed in Japanese Patent Publication No. 2000-8000. In addition, photopolymerization initiators that can be used in the present invention are, for example, precision chemistry (magazine name, free translation), published on March 1, 1991, V ο 1 · 2 0, N 〇 4, 4, P 1 6 to 26, or Japanese Patent Laid-Open Sho 5 9-1 5 2 3 9 6, Japanese Patent Laid-Open Sho 6 1-1 5 1 1 9 7, Japanese Patent Laid-Open Sho 4 5-3 7 3 7 7 Those disclosed in Japanese Patent Publication No. 5-8403 0 2 and Japanese Patent Application Laid-open No. 10-395950. The content rate of the photopolymerization initiator is generally 0.01% by weight or more, more preferably 0.1% by weight or more, and 0.5% by weight or more relative to the total solid content of the photosensitive composition of the present invention. It is preferably 30% by weight or less, and preferably 10% by weight or less. If the content rate is too low, sensitivity will be lowered. On the other hand, if the content rate is too high, the solubility of the unexposed portion in the developing solution will be reduced, which will easily cause poor development. 17 312 / Invention Specification (Supplement) / 93-06 / 93106657 200424773 &lt; Photopolymerizable monomer &gt; In the present invention, in addition to the binder resin (A) and the photopolymerization initiator (B), it is still used Photopolymerizable monomers (photopolymerizable compounds), which are useful for sensitive materials. The photopolymerizable compound used in the present invention includes, for example, a compound having at least one ethylenically unsaturated group. Specific examples of intramolecular ethylenically unsaturated compounds include, for example, (fluorenyl) lulic acid, (fluorenyl) acrylic acid, acrylic nitrile, styrene, and ethylenically unsaturated bonds. Monoesters of carboxylic acids and poly (mono) ols. In the present invention, a polyfunctional ethylenic monopolymer having two or more ethylene saturated groups in one molecule is preferably used. Examples of related polyfunctional ethylene monopolymers include, for example: aliphatic polyhydroxy compounds and unsaturated esters; esters of aromatic polyhydroxy compounds and unsaturated carboxylic acids; use of family polymorph compounds and aromatic polymorph groups Polybasic compounds such as compounds are obtained by esterification with unsaturated carboxylic acids and polybasic carboxylic acids. Examples of the ester of the aliphatic polyhydroxy compound and an unsaturated carboxylic acid include ethylene glycol diacrylate, triethylene glycol diacrylate, trihydroxyfluorenyl triacrylate, trihydroxyfluorenylethane triacrylate, and pentaerythritol. Dibasic esters such as dibasic acid esters, pentaerythritol triacrylate, pentaerythritol tetraacrylate, pentaerythritol tetrapropionate, dipentaerythritol pentapropionate, dipentaerythritol acrylate, glycerol acrylate, etc. Acid esters of compounds; methacrylic acid esters of the exemplified compounds substituted with methacrylic acid; similarly substituted with itaconic acid esters (itacon); Croton oleate esters or horse 312 / Invention Specification (Supplement) / 93-06 / 93106657, the sensor body can have 3 ethylenic ethylenic carboxylic acid fats together to make vinegar. Tetraol propionate te) to acid 18 200424773 esters and so on. The esters of aromatic polyacryl compounds and unsaturated acid are, for example, hydroquinone diacrylate, hydroquinone dimethacrylate, resorcinol diacrylate, resorcinol diacrylate, Acrylic esters and aromatic acrylates of aromatic polyhydroxy compounds such as pyrogallol triacrylate. The esters obtained by using polybasic carboxylic acids and unsaturated carboxylic acids and esterified with polyhydroxy compounds may not necessarily be single substances. Representative examples include polycondensation of acrylic acid, osmic acid, and ethylene glycol. (Condensation polymer); polycondensates of malonic acid, maleic acid, and diethylene glycol; polycondensates of methacrylic acid, terephthalic acid, and pentaerythritol; acrylic acid, adipic acid, butanediol, and Glycerin and other polycondensates. Examples of the polyfunctional ethylenic monomers used in the present invention include a polyisocyanate compound and a (meth) propanoic acid ester containing a hydroxyl group, or a polyisocyanate compound, and a polyol and hydrogen. The (meth) acrylic acid esters of oxy groups are reacted, and various urethane (fluorenyl) acrylates obtained; or such as polyhydric epoxy compounds, and hydroxy (fluorenyl) acrylates, or (meth) Epoxy acrylates such as acrylic acid addition reactants; acrylamides such as ethylene bisacrylamide; allyl esters such as diallyl phthalate; vinyl-containing compounds such as divinyl phthalate Wait. The content ratio of the photopolymerizable monomer in the photosensitive composition is usually 90% by weight or less, and preferably 80% by weight or less based on the total solid content. If the content of the photopolymerizable monomer is too high, the permeability of the developer to the exposed portion will increase, making it difficult to obtain a good image. [Photosensitive coloring composition] 19 312 / Invention specification (Supplement) / 93-06 / 93106657 200424773 When the photosensitive composition of the present invention is used in the application of a color filter, etc., the photosensitive composition A color material is blended in the mixture to prepare a photosensitive coloring composition. <Color material (c) &gt; The color material is a coloring material of the photosensitive composition of the present invention. Dyeing pigments can be used as the color material, but from the viewpoints of heat resistance and light resistance, it is preferable to use pigments. As the pigment, pigments of various colors such as blue pigment, green pigment, red pigment, yellow pigment, purple pigment, orange pigment, brown pigment, and black pigment can be used. In addition, its structure can also be used as azo-based, phthalocyanine-based, fluoracridone-based, benzimidazolone-based, isomadolone-based, dioxane-based, indanthrene-based ), Organic pigments such as dibenzopyrene, and other inorganic pigments. In the following, specific examples of usable pigments are indicated by pigment numbers. The terms "C. I. Pigment Red 2" and the like below refer to the pigment index (C. I.). Examples of red pigments include: C.I. Pigment Red 1, 2, 3, 4, 5, 6, 7, 8, 9, 12, 14, 15, 16, 17, 21, 22, 23, 31, 32, 37, 38, 41, 47, 48, 48: 1, 48: 2, 48: 3, 48: 4, 49, 49: 1, 49: 2, 50: 1 '52: 1, 52: 2, 53, 53: 1 &gt; 53: 2, 53: 3, 57, 5 7: 1, 57: 2, 58: 4, 60, 63, 6 3 ... 1, 6 3 ... 2, 64, 6 4 ... 1, 68, 69, 81, 81: 1 '81: 2, 81: 3, 81: 4' 83, 88 '90: Bu 101 &gt; 101], 104, 108, 108], 109, 112, 113, 114, 122, 123, 144, 146, 147 '149, 151, 166, 168, 169, 170, 172, 173, 174, 175, 176, 177, 178' 179, 181, 184 &gt; 185, 187, 188 190, 193, 194, 200, 202, 206, 207, 208, 20 312 / Invention Specification (Supplement) / 93-06 / 93106657 200424773 209 '210, 214 &gt; 216, 220, 221, 224' 230, 231 , 232, 233, 235 &gt; 236, 237, 238, 239, 242, 243, 245, 247, 249, 250, 251, 253, 254, 255, 256, 257, 258, 259, 260, 262, 263 , 264, 265, 266, 267, 268, 269, 270, 271, 272, 273, 274, 275, 276, etc. Among them, C-1. Pigment Red 48], 122, 168, 177, 202, 206, 207, 209, 224, 242, 2 5 4 are preferred, and C · I. Pigment Red 1 7 7, 2 0 9, 2 2 4 and 2 5 4 are more preferable. Examples of blue pigments are: C. I. Pigment Blue 1, 1: 2, 9, 14, 4, 15, 15, 5; 1, 15: 2, 15: 3, 15: 4, 15: 6, 16 , 17, 19, 25, 27, 28, 29, 33 '35' 36 '56' 56: 1 '60' 61 '61: 1 &gt; 62' 63 '66' 67 '68, 71, 72, 73, 74, 75, 76, 78, 79. Among them, CI Pigment Blue 15, 1 5: 1, 15: 2, 15: 3, 1 5: 4, 15: 6 is more preferable, and C · I · Pigment Blue 1 5: 6 is more preferable. . Examples of green pigments include: C. I. Pigment Green 1, 2, 4, 7, 8, 10, 1, 3, 14, 15, 17, 18, 19, 26, 36, 45, 48, 50, 51, 54, 55 ° Among them, C. I. Pigment Green 7, 36 is preferred. Examples of yellow pigments are: C. I. Pigment Yellow 1, 1: 1, 2, 3, 4, 5, 6, 9, 10, 12, 13, 14, 16, 17, 24, 3, 32, 34, 35, 35: 1, 36, 36: 1, 37, 37: 1, 40 '41, 42' 43, 48, 53, 55, 61, 62, 62], 63, 65, 73, 74, 75 '81 , 83, 87, 93, 94, 95, 97, 100, 101, 104, 105, 108, 109, 110, 111, 116, 117, 119, 120, 126, 127, 127: 1, 128, 129, 133 134, 136, 138, 139, 142, 147, 148, 150, 151, 153, 154, 155 '157 ^ 158' 159, 160, 16 162 '163' 164 '165' 21 312 Pieces) / 93-06 / 93106657 200424773 166, 167, 168, 169, 170, 172, 173, 174, 175, 176, 180, 181, 182, 183 &gt; 184, 185, 188 '189, 190' 19 19 1: 1 &gt; 192, 193, 194, 195, 196, 197, 198, 199, 200, 202, 203, 204, 205, 206, 207, 208. Among them, C.I. Pigment Yellow 8 3, 117, 129, 138, 139, 150, 154, 155, 180, and 185 are preferred, and C.I. Pigment Yellow 8 3, 1 3 8, 1 3 9 , 1 5 0, 1 8 0 is better. Examples of orange pigments are: C. I. Color Orange 1, 2, 5, 1 3, 16, 6, 17, 19, 20, 21, 22, 23, 24, 34, 36, 38, 39, 43, 46 '48, 49, 61, 62, 64, 65, 67, 68, 69, 70, 71, 72, 73, 74, 75, 77, 78, 79. Among them, C.I. color oranges 38 and 71 are preferred. Examples of purple pigments are: C · I · Color Violet 1, 1: 1,2,2: 2,3,3: 1, 3: 3,5, 5: 1, 14, 15, 16, 19, 23, 25, 27, 29, 31, 32, 37, 39, 42, 44, 47, 49, 50. Among them, C.I. color violet 19, 2 3 is preferred, and C.I. color violet 23 is more preferred. When a photosensitive coloring composition is used to form a resin black matrix of a color filter, a black color material can be used. Black color material can be used alone or mixed with red, green, and blue. These color materials can be appropriately selected from inorganic or organic pigments and dyes. In the case of inorganic and organic pigments, it is best to use one dispersed in an average particle size of 1 μm or less (preferably 0, 5 μill or less). The color materials that can be mixed for the modulation of black color materials include, for example, salty blue (victoria pure blue) (42595), test locust yellow 0 (41000),

Cathilon 燦爛黃(Cathilon brilliant flavine)(驗性 13)、玫紅(rhodamine)6GCP(45160)、玫紅 B(45170)、藏 22 312/發明說明書(補件)/93-06/93106657 200424773 紅 ΟΚ70:100(50240)、羊毛 f 紅(erioglaucine)X(42080) 、No. 120/聯苯胺黃( 2 1 0 9 0 )、聯苯胺黃GRO( 2 1 0 9 0 )、螢光 黃8 G F ( 2 1 1 0 5 )、聯苯胺黃4 T - 5 6 4 D ( 2 1 0 9 5 )、堅牢玫瑰紅 4015(12355)、酞菁洋紅 7B4401U5850)、酞菁藍 TGR-L(74160)、酞菁藍S M(26150)、酞菁藍ES(顏料藍 1 5 ·· 6 )、酞菁紅G D (顏料1 6 8 )、酞菁綠2 Y S (顏料綠3 6 )等(另 外,上述()内數字係指彩色索引(C · I ·))。 再者,相關其他可使用的顏料,若依C. I .號碼表示的 話,可舉例如:C . I ·黃色顏料2 0、2 4、8 6、9 3、1 0 9、1 1 0、 117、125、137、138、147、148、153、154、166 ; C. I . 橙色顏料 36、43、51、55、59、61; C.I.紅色顏料 9、97、 122、123、149、168、177' 180、192、215' 216、217、 220、223、224、226、227、228、240; C.I.紫色顏料 19、 23、29、30、37、40、50; C.I.藍色顏料 15、15:1、15:4、 2 2、6 0、6 4 ; C · I ·綠色顏料7 ;棕色顏料2 3、2 5、2 6等。 再者,可單獨使用的黑色色材可舉例如:碳黑、乙炔黑、 燈黑(1 a m p b 1 a c k )、骨黑(b ο n e b 1 a c k )、石墨、鐵黑、苯 胺黑(aniline black)、花青黑(cyanine black)、鈥黑等。 該等之中,就遮光率、影像特性觀點而言,最好為碳黑。 碳黑的例子有如下述碳黑。 三菱化學公司製:MA7、MA8、MA11、MA100、MA100R、 MA220、 MA230、 MA600、 #5、 #10、 #20、 #25、 #30、 #32、 #33、#40、#44、#45' #47、#50' # 52、#55、#650' #750 ' #850 ' #950、 #960' #970、 #980' #990 &gt; #1000 &gt; #2200 ' 23 312/發明說明書(補件)/93-06/93106657 200424773 #2300、 #2350、 #2400、 #2600、 #3050、 #3150、 #3250、 #3600、 #3750、 #3950、 #4000 &gt; #4010、 OIL7B、 OIL9B、 OIL11B、 OIL30B、 OIL31B; DEGSSA 公司製:Printex3、 Printex30P、 Printex30、 Printex300P、 Printex40、 Printex45、 Printex55 、 Printex60 、 Printex75 、 Printex80 、 Printex85、 Printex90、 PrintexgA、 PrintexL、 Printex G、 Printex P、 Printex U、 Printex V、 Printex G、 SpecialBlack550' SpecialBlack350、 SpecialBlack250 、 SpecialBlacklOO 、 SpecialBlack6 、 SpecialBlack5 、 SpecialBlack4、Color Black FW 1、Color Black FW2、 Color Black FW2V、 Color Black FW18、 Color Black FW 18、Color Black FW 200、Color Black S160、Color Black S1 7 0 ; CABOT 公司製:Monarchl20、Monarch280、Cathilon brilliant flavine (experience 13), rose red (rhodamine) 6GCP (45160), rose red B (45170), Tibetan 22 312 / Invention Specification (Supplement) / 93-06 / 93106657 200424773 Red ΟΚ70 : 100 (50240), wool f red (erioglaucine) X (42080), No. 120 / benzidine yellow (2 1 0 9 0), benzidine yellow GRO (2 1 0 9 0), fluorescent yellow 8 GF ( 2 1 1 0 5), benzidine yellow 4 T-5 6 4 D (2 1 0 9 5), firm rose red 4015 (12355), phthalocyanine magenta 7B4401U5850), phthalocyanine blue TGR-L (74160), phthalate Cyan Blue SM (26150), Phthalocyanine Blue ES (Pigment Blue 1 5 ·· 6), Phthalocyanine Red GD (Pigment 1 6 8), Phthalocyanine Green 2 YS (Pigment Green 3 6), etc. (In addition, the above () Internal numbers refer to the color index (C · I ·)). In addition, if the other applicable pigments are represented by C. I. numbers, for example: C. I · yellow pigments 20, 24, 8 6, 9, 3, 10 9, 1 1 0, 117, 125, 137, 138, 147, 148, 153, 154, 166; C. I. Orange pigments 36, 43, 51, 55, 59, 61; CI red pigments 9, 97, 122, 123, 149, 168 177 '180, 192, 215' 216, 217, 220, 223, 224, 226, 227, 228, 240; CI purple pigment 19, 23, 29, 30, 37, 40, 50; CI blue pigment 15, 15: 1, 15: 4, 2 2, 6 0, 6 4; C · I · green pigment 7; brown pigment 2 3, 2 5, 2 6 and so on. In addition, the black color materials that can be used alone can be, for example, carbon black, acetylene black, light black (1 ampb 1 ack), bone black (b ο neb 1 ack), graphite, iron black, aniline black , Cyanine black, cyan etc. Among these, carbon black is preferred from the standpoint of light shielding rate and image characteristics. Examples of the carbon black are as follows. Made by Mitsubishi Chemical Corporation: MA7, MA8, MA11, MA100, MA100R, MA220, MA230, MA600, # 5, # 10, # 20, # 25, # 30, # 32, # 33, # 40, # 44, # 45 '# 47, # 50' # 52, # 55, # 650 '# 750' # 850 '# 950, # 960' # 970, # 980 '# 990 &gt;# 1000 &gt;# 2200' 23 312 / Invention specification (Supplement) / 93-06 / 93106657 200424773 # 2300, # 2350, # 2400, # 2600, # 3050, # 3150, # 3250, # 3600, # 3750, # 3950, # 4000 &gt;# 4010, OIL7B, OIL9B, OIL11B, OIL30B, OIL31B; Made by DEGSSA: Printex3, Printex30P, Printex30, Printex300P, Printex40, Printex45, Printex55, Printex60, Printex75, Printex80, Printex85, Printex90, PrintexgA, PrintexL, Printex G, Printex Pex V, Printex G, SpecialBlack550 'SpecialBlack350, SpecialBlack250, SpecialBlacklOO, SpecialBlack6, SpecialBlack5, SpecialBlack4, Color Black FW 1, Color Black FW2, Color Black FW2V, Color Black FW18, Color Black FW 18, Color Black FW 200, Color Black S160 Color Black S1 7 0; CABOT Corporation: Monarchl20, Monarch280,

Monarch4 6 0、Monarch 8 0 0、Monarch8 8 0、Monarch 9 0 0 ^ MonarchlOOO、 MonarchllOO、 Monarchl300、 Monarchl400 、 Monarch4630、 REGAL99、 REGAL99R、 REGAL415、 REGAL415R、 REGAL250、 REGAL250R、 REGAL330、 REGAL400R' REGAL55R0 、 REGAL660R、BLACK PEARLS480、PEARLS1 30' VULCAN XC72R ' ELFTEX-8 ;哥倫比亞碳纖公司製:RAVEN11、RAVEN14、 RAVEN15、 RAVEN16、 RAVEN22、 RAVEN30、 RAVEN35、 RAVEN40、 RAVEN410 、 RAVEN420 、 RAVEN450 、 RAVEN500 、 RAVEN780 、 RAVEN850、RAVEN890H、RAVEN1000、RAVEN1020、RAVEN1040、 RAVEN1060U、 RAVENT1080U、 RAVEN1170 &gt; RAVEN1190U、 RAVENI250 、 RAVEN1500、 RAVEN2000、 RAVEN2500U、 24 312/發明說明書(補件)/93-06/93106657 200424773 RAVEN3500、RAVEN5000、RAVEN5250、RAV EN5750、RAVEN7000 其他的黑色顏料例子,可使用如鈦黑、苯胺黑、氧化鐵 系黑色顏料、及混合著紅色、綠色、藍色三顏色有機顏料 的黑色顏料。 再者,顏料亦可使用如:硫酸鋇、硫酸錯、氧化鈦、錯 黃、氧化鐵紅、氧化鉻等。 該等各種顏料亦可合併複數種使用。譬如為調整色度, 顏料可併用綠色顏料與黃色顏料,亦可併用藍色顏料與紫 色顏料。 再者,該等顏料的平均粒徑通常為1 μ m,以0 . 5 μ m為佳, 尤以0. 2 5 μιη以下更佳。此外,可使用為色材的染料,可 舉例如:偶氮系染料、蔥醌系染料、酞菁系料、醌亞胺 (q u i η ο n i m i n e )系染料、嗜琳系染料、硝基系染料、羰基系 染料、次曱亞(m e t h i n e )系染料等。 偶氮系染料可舉例如:C . I .酸性黃1 1、C . I .酸性橙7、 C . I .酸性紅3 7、C . I .酸性紅1 8 0、酸性藍2 9、直接紅2 8、 C.I.直接紅83、C.I.直接黃12、C.I.直接橙26、C.I.直 接綠2 8、C . I .直接綠5 9、C . I .反應黃2、C . I .反應紅1 7、 C . I .反應紅1 2 0、C . I .反應黑5、C . I .分散橙5、C . I .分散 紅5 8、C . I.分散藍1 6 5、C . I .驗性藍4 1、C . I .驗性紅1 8、 C . I .媒介(Μ o r d a n t )紅7、C . I ·媒介黃5、C · I .媒介黑7等。 蔥醌系染料可舉例如:C . I ·甕藍4、C . I .藍4 0、C . I .酸 性綠2 5、C . I .反應藍1 9、C . I .反應藍4 9、C . I .分散紅6 0、 C . I .分散藍5 6、C , I .分散藍6 0等。 25 312/發明說明書(補件)/93-06/93106657 200424773 其他,酞菁系染料有如:C . I . p a d藍5等,醌亞胺系染料 有如:C . I .鹼性藍3、C . I .鹼性藍9等,嗖啉系染料有如C . I . 冷軋藍(p a d b 1 u e ) 5等,醌亞胺系染料有如:C · I ·鹼性藍3、 C . I .鹼性藍9等,喳啉系染料有如:C . I ·溶劑黃3 3、C . I · 酸性黃3、C . I .分散黃6 4等,硝基系染料有如:C . I .酸性 黃1、C. I .酸性橙3、C. I .分散黃4 2等。 在感光性著色組成物的總固形份(感光性著色組成物中 除溶劑外的總量)中,色材(C )所佔比率係相對感光性組成 物中之總固形份量,係選擇在通常1 0重量%以上(以2 0重 量%以上為佳),且通常7 0重量%以下(以6 0重量%以上為佳) 的範圍内。若色材比率過少的話,相對於色濃度的膜厚將 變得過厚,對施行液晶晶胞化時的間隙控制將造成不良影 響。反之,若色材比率過多的話,將無法獲得充分地影像 形成性。此外,本發明感光性著色組成物中的總固形份, 通常為1 0重量%以上、8 0重量%以下。 再者,為提昇顏料的分散性、分散安定性,亦可添加顏 料衍生物等。顏料衍生物可舉例如:偶氮系、醜菁系、p奎吖 σ定酮系、苯并咪°坐酮系、嗜酜酮(q u i η 〇 p h t h a 1 ο n e )系、異 吲哚滿酮系、二氧雜環己烷系、蔥醌系、陰丹士林系 (i n d a n t h r e n e )系、其系、培利西同(p e r i η ο n e )系、二氧代0比 咯并nb咯系、二氧雜環己烷系等之衍生物,其中,最好為 嗜酜_系為佳。顏料衍生物之取代基可舉例如:將續酸基、 磺醯胺基及其四級鹽、酞醯亞胺曱基、二烷基胺烷基、氫 氧機、羧基、醯胺基等,直接或透過烷基、芳香基、雜環 26 312/發明說明書(補件)/93-06/93106657 200424773 基等鍵結於顏料骨架上者,最好為續酸基。此外,該等取 代基亦可複數取代於一個顏料骨架上。顏料衍生物的具體 例,可舉例如:酜菁之確酸衍生物、p奎駄嗣之續酸衍生物、 蔥醌之磺酸衍生物、喹吖啶酮之磺酸衍生物、二氧代咄咯 并咄咯之磺酸衍生物、二氧雜環己烷之磺酸衍生物等。 顏料衍生物之添加量在相對於顏料之下,通常為0. 1〜 3 0重量%,以0 . 1〜2 0重量%以下為佳,以0 . 1〜1 0重量% 更佳,以0 . 1〜5重量%以下最佳。 再者,在本發明的感光性組成物及感光性著色組成物 中,亦可適當地調配有機溶劑、顏料分散劑、密接提昇劑、 塗布性提昇劑、顯影改良劑、紫外線吸收劑、抗氧化劑、 矽烷偶合劑等。 &lt;有機溶劑&gt; 有機溶劑並無特別限制,具體而言可舉例如:二異丙 醚、礦油精(mineral spirit)、正戊烧、戊、癸酸乙酯、 正己烷、二乙醚、異丙烯、乙基異丁醚、硬脂酸丁酯、正 辛烷、帕蘇爾# 2 (音譯)、阿布可# 1 8 (音譯)溶劑、二異丁烯、 醋酸戊酯、丁酸丁酯、丁醚、二異丁酮、曱基環己烯、甲 壬酉同、丙醚、十二烧、SocalsolventNo.l與Νο·2、曱酸 戊酯、二己醚、二異丙酮、Solvesso#150、醋酸丁酯、己 烯、殼T S 2 8溶劑、丁基氯化物、乙戊酮、苯甲酸乙酯、戊 基氯化物、乙二醇二乙醚、正甲酸乙酯、甲氧基甲基戊酮、 曱丁酮、甲己酮、異丁酸甲酯、苯甲腈、丙酸乙酯、曱基 溶纖劑醋酸酯、甲基異戊酮、曱基異丁酮、醋酸丙酯、醋 27 312/發明說明書(補件)/93-06/93106657 200424773 酸戊酯、曱酸戊酯、雙環己基、二乙二醇單乙醚醋酸酯、 二戊稀(dipentene)、甲氧基曱基戊醇、曱基戊酮、甲基異 丙酮、丙酸丙S旨、丙二醇第三丁醚、甲乙酮、曱基溶纖劑、 乙基溶纖劑、乙基溶纖劑醋酸酯、卡必醇、環己酮、醋酸 乙S旨、丙二醇、丙二醇單曱醚、丙二醇單甲醚醋酸酯、丙 二醇單乙醚、丙二醇單乙醚醋酸酯、二丙二醇單乙醚、二 丙二醇單曱醚、丙二醇單乙醚醋酸酯、二丙二醇單曱醚醋 酸酯、3 -曱氧基丙酸、3 -乙氧基丙酸、3 -乙氧基丙酸乙酯、 3 -甲氧基丙酸曱酯、3-曱氧基丙酸乙S旨、3 -曱氧基丙酸丙 酯、3 -甲氧基丙酸丁酯、二甘醇二曱醚(diglyme)、二丙二 醇單曱醚、乙二醇醋酸酯、乙基卡必醇、丁基卡必醇、乙 二醇單丁醚、丙二醇第三丁醚、3 -曱基-3-甲氧基丁醇、三 丙二醇曱醚、3 -甲氧基丁基醋酸3 -曱酯等有機溶劑。 溶劑最好選擇可溶解或分散各成分,且沸點通常在1 〇 〇 〜2 5 0 °C範圍内的溶劑。尤以具1 2 0〜1 7 0 °C沸點者為佳。 該等溶劑可單獨使用亦可混合使用。 &lt;顏料分散劑&gt; 在分散處理中,特別係顏料分散劑若使用高分子分散劑 的話,因為長期性分散安定性優越,因而屬較佳情況。高 分子分散劑可舉例如:胺酯系分散劑、聚乙烯亞胺系分散 劑、聚氧乙烯烷基醚系分散劑、聚氧化乙二醇二酯系分散 劑、山梨糖醇酐脂肪族酯系分散劑、脂肪族改質聚酯系分 散劑等。此種分散劑的具體例可舉例如:商品名E F K A (艾福 佳化學茹碧畢(音譯)(E F K A )公司製)、D i s p e r b i k (碧克化學 28 312/發明說明書(補件)/93-06/93106657 200424773 (音譯)公司製)、迪斯帕龍(音譯)(楠本化成(股)製) S 0 L S P E R S E (瑞内佳(音譯)公司製)、Κ P (信越化學工I 製)、聚福羅(音譯)(共榮社化學(股)製)等。該等分I 單獨使用,亦可混合2種以上使用。顏料分散劑含有 係在感光性著色組成物的固形份中,通常為5 0重量 下,最好30重量%以下。 &lt;矽烷偶合劑&gt; 再者,為提昇與基板間之密接性,亦可添加矽烷偶 劑。矽烷偶合劑的種類可使用如:環氧系、甲基丙烯® 胺系等各種化合物,特別以環氧系矽烷偶合劑為佳。 [感光性著色組成物之製造方法] 本發明的感光性著色組成物係依常法進行製造。例 先秤取各既定量的色材、溶劑及分散劑,在分散處理 中,使色材分散而形成液狀著色組成物(油墨狀液體: 此分散處理步驟中,可使用如:塗料調理器(p a i n t c ο n d i t i ο n e r )、砂磨機、球磨機(b a 1 1 m i 1 1 )、報碎機( mill)、石磨機(s t ο n e m i 1 1 )、喷射碎機(j e t m i 1 1 )、 機(Η o m o g e n i z e r )等。因為藉由施行此分散處理而將色 粒子化,所以便提昇感光性著色組成物的塗布特性, 昇製品的彩色濾光片基板之穿透率。 在色材的分散處理之際,最好適當地合併使用上述 劑樹脂、或分散助劑等。例如當採用沙磨機施行分散 之情況時,最好使用0 . 1至數m m徑的玻璃珠、或氧化〗 分散處理時的溫度,通常設定於0 °C〜1 0 0 °C範圍内, 312/發明說明書(補件)/93-06/93106657 (股) 劑可 量, 以 合 系、 如首 步驟 。在 roll 均質 材微 並提 黏結 處理 ^珠。 最好 29 200424773 室溫〜8 0 °C範圍内。另外,分散時間乃因為隨油墨狀液體 的組成{色材、溶劑、分散劑丨、及沙磨機裝置大小等因素, 適當時間各有不同,因而必須進行適當地調整。 在經上述分散處理而所獲得油墨狀液體中,混合著溶 劑、黏結劑樹脂,及依情況所需混合著既定量的光聚合性 單體、光聚合起始劑系成分、及除上述以外的成分等,而 形成均勻的分散溶液。另外,在分散處理步驟及混合的各 步驟中,因為有混入細微雜質,因而最好利用過濾器等, 對所獲得油墨狀液體施行過濾處理。 所調製得感光性著色組成物中的黏結劑樹脂(A )含有 率,在相對於總固形份之下,通常為5重量%以上,以1 0 重量%以上為佳,且通常為9 5重量%以下,以8 0重量%以下 為佳。 感光性著色組成物中的光聚合性單體含有量,在相對於 總固形份之下,通常為9 0重量%以下,最好8 0重量%以下。 若含有率過高的話,顯影液對曝光部的滲透性將提高,像 素的清晰性與密接性將惡化。 再者,感光性著色組成物中之黏結劑樹脂(A ),相對於 色材的比率,通常為20〜500重量%,以30〜300重量%為 佳,尤以5 0〜2 0 0重量%範圍内更佳。若黏結劑樹脂(A )含 有量過低的話,未曝光部分對顯影液的溶解性將降低,容 易引發顯影不良情況;反之,若明顯提高的話,將頗難獲 得所需的像素膜厚。 感光性著色組成物中的光聚合起始劑含有率,在相對於 30 312/發明說明書(補件)/93-06/93106657 200424773 總固形份之下,通常為0 . 1重量%以上,以0 . 5重量%以上 為佳,尤以0 . 7重量%以上更佳,且通常在3 0重量%以下, 以1 0重量%以下為佳。 再者,本發明之遮光性圖案用感光性著色組成物的特徵 在於:當於透明基板上影像形成遮光性圖案(以下亦稱「黑 矩陣圖案」)時的截面形狀中,遮光性圖案銜接於基板的 面,在與基板面間所形成的角度係在5 0度以下。具有相關 性質的感光性著色組成物,最好可利用含有黑色色材之上 述本發明感光性著色組成物獲得。遮光性圖案的截面形 狀,容後詳述。 [3 ]彩色濾光片基板之製造 [3-1]透明基板(支撐體) 其次,針對彩色濾光片基板、及彩色濾光片之製造方法 進行說明。彩色濾光片之透明基板,僅要屬於透明且適當 強度的話便可,在材質方面並無特別限制。材質方面可舉 例如:聚對苯二甲酸乙二酯等聚酯系樹脂;聚丙烯、聚乙烯 等聚烯烴系樹脂;聚碳酸酯、聚曱基丙烯酸甲酯、聚颯之 熱可塑性樹脂製薄片;環氧樹脂、不飽和聚酯樹脂、聚(曱 基)丙烯酸系樹脂等熱硬化性樹脂薄片;或各種玻璃。其 中,就從耐熱性觀點而言,最好為玻璃、耐熱性樹脂。 對透明基板與黑矩陣形成基板,在為改良黏接性等表面 物性方面,配合需要亦可施行電暈放電處理、臭氧處理、 矽烷偶合劑、胺酯系樹脂等各種樹脂的薄膜形成處理等。 透明基板厚度通常設定為0.05〜10 mm,最好為0.1〜7 mm 31 312/發明說明書(補件)/93-06/93106657 200424773 範圍内。此外,當施行各種樹脂之薄膜形成處理的情 其膜厚通常為0.01〜ΙΟμπι,最好在0.05〜5μπι範圍户 [3 - 2 ]黑矩陣 藉由在透明基板上設置黑矩陣,且通常形成紅色、 色、藍色的像素影像,便可製造本發明的彩色濾光片 述感光性著色組成物係使用為黑色、紅色、綠色、藍 至少1種的光阻形成用塗布液用。相關黑光阻係對透 板上的素玻璃面上施行塗布、加熱乾燥、影像曝光、 及熱硬化等各種處理,而相關紅色、綠色、藍色則係 明基板上所形成的樹脂黑矩陣形成面上,或者採用鉻 物或其他遮光金屬材料所形成的金屬黑矩陣形成面上 行塗布、加熱乾燥、影像曝光、顯影及熱硬化等各種處 藉此而形成個色彩的像素影像。 黑矩陣係利用遮光金屬薄膜或黑矩陣用感光性著色 成物,形成於透明基板上。遮光金屬材料係採用金屬 氧化鉻、氮化鉻等鉻化合物,或鎳與鎢合金等,亦可 該等積層為複數層狀者。 一般該等金屬遮光膜係利用濺鍍法形成,在利用正 阻,膜狀上形成膜狀所需圖案之後,對鉻乃採用混合 酸第二鈽銨與過氣酸及/或硝酸的蝕刻液,對其他材料 用配合材料的蝕刻液進行蝕刻,最後再利用專用剝離 正型光阻進行剝離,便可形成黑矩陣。 此情況下,首先,利用蒸鍍或濺鍍法等,在透明基 形成該等金屬或金屬•金屬氧化物的薄膜。其次,在 312/發明說明書(補件)/93-06/93106657 ,時, 〇 綠 0上 色中 明基 顯影 對透 化合 ’施 理 , 組 鉻、 為將 型光 著硝 則採 劑將 板上 此薄 32 200424773 膜上形成感光性著色組成物塗布膜之後,採用具有條紋、 馬賽克、三角形等重複圖案的光罩,對塗布膜施行曝光、 顯影,而形成光阻影像。然後,對此塗布膜施行姓刻處理 便可形成黑矩陣。 當利用黑矩陣用感光性著色組成物之情況時,便使用含 黑色色材的感光性著色組成物形成黑矩陣。例如單獨(或複 數)使用碳黑、石墨、鐵黑、苯胺黑、菁黑、鈦黑等黑色色 材,或者含有從無機或有機顏料、染料中選擇適當地紅色、 綠色、藍色等,依混合而形成黑色色材的感光性著色組成 物,並依如同下述紅色、綠色、藍色像素影像的方法,便 可形成黑矩陣。 [3 - 3 ]像素之形成 在已設置黑矩陣的透明基板上,塗布著含紅色、綠色、 藍色中任一色之著色材料的感光性著色組成物,經乾燥 後,在塗布膜上重疊著光罩,並隔著此光罩施行影像曝光、 顯影,並配合需要施行熱硬化或光硬化,而形成像素影像, 便製成著色層。針對紅色、綠色、藍色等三色的感光性著 色組成物,分別施行此操作,便可形成彩色濾光片影像。 彩色濾光片用的感光性著色組成物之塗布,可利用旋塗 法、線棒塗布(w i r e b a r c 〇 a t )法、流動式塗布法、膜頭塗 布法、噴塗法等方法實施。其中,若採用膜頭塗布法的話 將大幅削減塗布液使用量,且完全不受利用旋塗法時所附 著霧粒等的影響,將抑制異物的發生等現象,就從整體觀 點而言,乃屬較佳情況。 33 312/發明說明書(補件)/93-06/93106657 200424773 若塗布膜厚度過厚的話,圖案顯影現象將變為困難,且 液晶經胞化步驟中的間隙調整亦將趨於困難;反之,若過 薄的話,便頗難提高顏料濃度,無法顯現出所需的色彩。 塗布膜厚度最好乾燥後膜厚在通常為0 . 2〜2 0 μιη範圍 内,以0 . 5〜1 0 μ ηι範圍内為佳,以0 . 8〜5 μ m範圍内更佳。 [3 - 4 ]塗布膜之乾燥 將感光性著色組成物塗布於基板後之塗布膜的乾燥,最 好採取利用加熱板、I R烤箱、對流烤箱的乾燥法實施。通 常,預備乾燥之後,施行再度加熱而乾燥。預備乾燥條件, 可配合上述溶劑成分的種類、所使用乾燥機的性能等而適 當地選擇。乾燥時間乃配合溶劑成分的種類、所使用乾燥 機的性能等,通常選擇在4 0〜8 0 °C溫度中施行1 5秒〜5 分鐘範圍,最好選擇在5 0〜7 0 °C溫度中施行3 0秒〜3分鐘 範圍。 再加熱乾燥的溫度條件,係高於預備乾燥溫度5 0〜2 0 0 X:,尤以7 0〜1 6 0 t:為佳,特別以7 0〜1 3 0 °C為佳。此外, 乾燥時間乃隨加熱溫度而異,通常為1 0秒〜1 0分鐘,其 中最好為1 5秒〜5分鐘範圍為佳。乾燥溫度係越高的話, 將提昇對透明基板的黏接性,但是若過高的話,黏結劑樹 脂將分解,而引發熱聚合造成顯影不良的情況發生。乾燥 後的感光性著色組成物塗布膜厚度,係0 . 5〜3 μπ〗,最好在 1〜2 μ in範圍内。另外,此塗布膜的乾燥步驟亦可為提高 溫度,而採取在減壓腔内實施乾燥的減壓乾燥法。 [3 - 5 ]曝光步驟 34 312/發明說明書(補件)/93-06/93106657 200424773 影像曝光係在感光性著色組成物塗布膜上,重疊正的矩 陣圖案,並隔著此遮罩圖案照射紫外線或可見光線的光源 而實施。此時,配合需要,為防止因氧而造成光聚合性層 敏感度的降低,因而亦可在光聚合性層上形成聚乙烯醇層 等氧屏蔽層之後,再施行曝光。上述影像曝光中所使用的 光源並非屬於特別限制。光源可舉例如:氣燈、鹵素燈、鶴 燈、高壓水銀燈、超高壓水銀燈、金屬鹵素燈、中壓水銀 燈、低壓水銀燈、碳弧、螢光燈等燈光源;氬離子雷射、 YAG雷射、準分子雷射、氮雷射、氦鎘雷射、半導體雷射 等雷射光源等。當採取照射特定波長光之情況時,亦可利 用光學濾波器。 [3 - 6 ]顯影步驟 本發明的彩色濾光片,係對尤感光性著色組成物所構成 塗布膜,利用上述光源施行影像曝光之後,再經使用含有 機溶劑、或界面活性劑及驗性化合物的水溶液施行顯影, 便可在基板上調製形成影像。在此水溶液中,亦可更含有 機溶劑、緩衝劑、錯化劑、染料或顏料。 驗性化合物可舉例如:氫氧化納、氫氧化钟、氫氧化I里、 碳酸鈉、碳酸鉀、碳酸氫鈉、碳酸氫鉀、矽酸鈉、矽酸鉀、 偏矽酸鈉、磷酸鈉、磷酸鉀、磷酸氫鈉、磷酸氫鉀、磷酸 二氫鈉、磷酸二氫鉀、氫氧化銨等無機鹼性化合物;單、 二或三乙醇胺、單、二或三甲胺、單、二或三乙胺、單、 或二異丙胺、正丁胺、單、二或三異丙醇胺、乙亞胺、乙 二亞胺、氫氧化四曱基銨(T M A Η )、膽驗(c h ο 1 i n e )等有機鹼 35 312/發明說明書(補件)/93-06/93〗06657 200424773 性化合物。該等鹼性化合物可為2種以上的混合物。 界面活性劑可舉例如:聚環氧乙烧烧基&amp;S類、聚環氧乙 烷烷基芳香醚類、聚環氧乙烷烷酯類、山梨糖醇酐烷酯類、 單縮水甘油酯烷酯類等非離子界面活性劑;烷基苯磺酸鹽 類、烧基|續酸鹽類、烧基硫酸鹽類、烧基項酸鹽類、確 基琥珀酸酯等陰離子性界面活性劑、烧基甜菜领i:類、胺基 酸類等兩性界面活性劑。 有機溶劑可舉例如:異丙醇、苄醇、乙基溶纖劑、丁基 溶纖劑、苯基溶纖劑、丙二醇、二丙酮醇等。有機溶劑可 單獨使用,亦可合併水溶液使用。 顯影處理的條件並無特別限制,通常顯影溫度在1 0〜5 0 °C範圍内,最好在1 5〜4 5 °C範圍内為佳,特別以2 0〜4 0 °C為佳,而顯影方法則可採取浸潰顯影法、喷塗顯影法、 刷塗顯影法、超音波.顯影法等任一種方法。 [3 - 7 ]熱硬化處理 對顯影後的彩色濾光片基板,施行熱硬化處理。此時的 熱硬化處理條件係溫度選擇在1 0 0〜2 8 0 °C範圍,最好在 1 5 0〜2 5 0 °C範圍内,時間則選擇在5〜6 0分鐘範圍内。經 過該等一連串步驟,便完成一色的圖案影像形成。依序重 複此步驟,對黑色、紅色、綠色、藍色施行圖案化處理, 而形成彩色濾光片。另外,4色圖案的順序並不僅限制於 上述順序。 本發明在彩色濾光片的遮光性圖案截面形狀上亦具有 特徵。即,本發明的彩色濾光片係在透明基板上具有遮光 36 312/發明說明書(補件)/93-06/93106657 200424773 性圖案的彩色濾光片,遮光性圖案係採用感光性著 物形成,且遮光性圖案銜接於基板的面,與基板面 形成的角度(以下稱「推拔角」)係5度以上,且5 0 ί 推拔角最好4 0度以下,尤以3 0度以下為佳,最好 度以上。若推拔角過大的話,後述的像素内高度差沐 反之若過小的話,線寬精度將惡化。 在此所謂「推拔角」係指在遮光性圖案截面中, 端,與距末端2 μ in位置的圖案高度部分間所連結的 與基板間所形成的角度(圖1 )。 此外,推拔角係在上述範圍内,且以正推拔形狀 具有此種推拔角之遮光性圖案的彩色濾光片,在形 採用的感光性著色組成物方面並無限制,最好可採 本發明的感光性著色組成物進行製造。 再者,當依此形成著色圖案的像素影像之時,若 偏小的話,因為遮光性圖案與紅色、綠色、藍色像 間之重疊部分的厚度將減少,因而以該基板為基準 像素影像内之表面最高點與最低點間之差(以下稱「 高度差」),不管哪一像素影像通常設為0 . 7 μ m以一 好在0 . 5 μ m以下,尤以0 · 4 μ m以下為佳。若像素内 過大的話,恐將因攏起部分而導致I T 0膜斷線,無 優質的彩色濾光片。具有相關像素内高度差的彩色 片,再形成其時所採用的感光性著色組成物方面並 制,最好可採用上述本發明的感光性著色組成物進4 再者,本發明的彩色濾光片乃除上述製造方法之 312/發明說明書(補件)/93-06/93106657 色組成 之間所 .以下。 在10 變大, 圖案末 直線, 為佳。 成其所 用上述 推拔角 素影像 面的各 像素内 Γ,最 高度差 法獲得 濾光 無限 製造。 外,採 37 200424773 用(1 )將含有:溶劑、色材的酞菁系顏料、黏結劑樹脂聚醯 亞胺系樹脂的熱硬化性著色組成物,塗布於基板上,再利 用蝕刻法形成像素影像的方法亦可進行製造。此外尚可舉 例如.·( 2 )將含酞菁系顏料的感光性著色組成物當作著色油 墨使用,並利用印刷機直接像素影像形成於透明基板上的 方法,或者如(3 )將含酞菁系顏料的感光性著色組成物當作 電鍍液使用,並將基板浸潰於此電鍍液中而形成既定圖案 之ΙΤ0電極,在此ΙΤ0電極上析出著色膜的方法。另外尚 可如:(4 )將已塗布著含酞菁系顏料之感光性著色組成物的 薄膜,貼付於透明基板上再剝離,並施行影像曝光、顯影, 而形成像素影像的方法,或如(5 )將含酞菁系顏料的感光性 著色組成物當作著色油墨使用,並利用噴墨印表機形成像 素影像的方法等等。彩色濾光片的製造方法係配合彩色濾 光片用感光性著色組成物的組成,而採用適合的方法。 [3 - 8 ]透明電極之形成 彩色濾光片係在此狀態下於影像上形成I T 0等透明電 極,並使用為彩色顯示器、液晶顯示裝置等之部分零件, 而為提高表面平滑性或耐久性,配合需要亦可在影像上設 置聚醯胺、聚醯亞胺等頂覆蓋層。此外,其中一部份亦可 因應平面配向式驅動方式(ISP模式)等用途,而未形成透 明電極。 [4]液晶顯不裝置(面板) 其次,針對液晶顯示裝置(面板)的製造法進行說明。通 常’液晶顯不裝置係在彩色濾、光片上形成配向膜^並在此 38 312/發明說明書(補件)/93-06/93106657 200424773 液 於 常 印 膜 處 狀 板 途 封 晶 於 晶 最 胞 為 39 配向膜上散佈著間隙子之後,再貼合著對向基板而形成 晶晶胞’在所形成的液晶晶胞中注入液晶’並線路相I接 對向電極便完成。配向膜最好為聚醯亞胺等樹脂膜。通 在配向膜之形成方面,採用凹版塗布法及/或橡膠版輪轉 刷法,配向膜厚度設定為數1 0 n m。依熱燒成而施行配向 之硬化處理之後,再利用紫外線照射、或利用研磨布的 理而施行表面處理,俾將液晶斜率加工成應調整的表面 態。 間隙子(s p a c e r )係採用對應著與對向基板間之間隙 (g a p )的大小,通常以2〜8 μ m為恰當。在彩色濾光片基 上,亦可利用微影法形成透明樹脂膜光感式間隙子(P S ) 並將此活用為取代間隙子。通常對向基板係採用陣列基 板,特別以T F T (薄膜電晶體)基板為佳。 在與對向基板間之貼合的間隙,雖隨液晶顯示裝置用 而異,通常選擇在2〜8 μηι範圍。在貼合上對向基板之後 除液晶助入口之外的部分,利用環氧樹脂等密封材進行 裝。密封材係利用I) V照射及/或加熱而硬化,俾將液晶 胞周圍密封。 周圍經密封的液晶晶胞,在切斷為面板早位之後’再 真空腔中進行減壓,而將上述液晶注入口浸潰於液晶之 後,再利用將處理腔内施行洩氣,俾將液晶注入於液晶 胞内。通常液晶晶胞内的減壓度為1 X 1 0_ 2〜1 X 1 0 _7 P a, 好為1 X 1 (Γ 3〜1 χ 1 0 _ 6 P a。此外,減壓時,最好對液晶晶 施行加溫,通常加溫溫度為3 0〜1 0 0 °C ,尤以5 0〜9 0 °C 312/發明說明書(補件)/93-06/93106657 200424773 佳。減壓時的加溫保持時間,通常設定為1 0〜6 0分鐘範 圍,然後再浸潰於液晶中。經注入液晶的液晶晶胞係利用 使U V硬化樹脂硬化而封閉液晶注入口 ’便完成液晶顯不裝 置(面板)。 液晶的種類並無特別限制,有如芳香族系、脂肪族系、 多環狀化合物等習知便已週知的液晶,亦可為溶致型液 晶、熱致型液晶等任一種。在熱致型液晶等方面,已知有 如:向列型液晶、層列型液晶、膽固醇型液晶等,可為其中 任一種。 &lt;實施例&gt; 其次,舉製造例、實施例、及比較例,更具體說明本發 明,惟本發明在不逾越主旨之前提下,並不僅限,於下述實 施例。另外,在下述實施例中,「份」係指「重量份」。 [1 ]密接性及像素清晰性的比較 &lt;合成例1 &gt; 將日本化藥(股)製X D 1 0 0 0 (二環戊二烯•苯酚聚合物的 聚縮水甘油醚,重量平均分子量7 0 0,環氧當量2 5 2 ) 3 0 0 份、丙烯酸8 7份、對曱氧基苯酚0. 2份、三苯膦5份、丙 二醇單甲醚醋酸酯2 5 5份,裝填於反應容器中,在1 0 0 °C 中施行攪拌直到酸價變為3 . 0 m g K 0 H / g為止。截至酸價達目 標值為止所需的時間為9小時(酸價2 . 5 )。其次,添加四 氫鄰笨二曱酸酐1 4 5份,於1 2 0 °C中施行反應4小時,獲 得酸價1 0 0,且依G P C測定經聚苯乙烯換算之重量平均分 子量2 6 0 0的黏結劑樹脂I溶液。 40 312/發明說明書(補件)/93-06/93106657 200424773 &lt;合成例2〉 將大曰本油墨(股)製艾比克龍(音譯)Η P 7 2 0 0 Η Η (二環戊 二稀•苯S分聚合物的聚縮水甘油,重量平均分子量 1 0 0 0,環氧當量2 7 0 ) 1 5 5份、丙烯酸4 1份、對曱氧基苯酚 0 . 1份、三苯膦2 . 5份、丙二醇單曱醚醋酸酯1 3 0份,裝 填於反應容器中,在1 0 0 °C中施行攪拌直到酸價變為 3 . 0 m g K 0 H / g為止。截至酸價達目標值為止所需的時間為9 小時(酸價2 . 9 )。其次,添加四氫鄰苯二曱酸酐7 4 g,於 1 2 0 °C中施行反應4小時,獲得酸價9 8,重量平均分子量 3 5 0 0的黏結劑樹月旨Π溶液。 &lt;實施例1 &gt; 將合成例1所獲得黏結劑樹脂I溶液5 2重量份(固形分 換算35重量份)、二季戊四醇六丙婦酸S旨5重量份、 C G I - 1 2 4 (汽巴嘉基公司製)4重量份、以及碳黑分散體(碳 濃度2 5 % ) 5 6重量份,混合於丙二醇單曱醚醋酸酯中,獲得 感光性黑色組成物。 將依此所獲得感光性黑色組成物,旋塗於1 0 c m方塊的 玻璃基板上,再於加熱板上於9 0度中乾燥1 5 0秒。經乾燥 後的膜厚為1 μ 111。其次,將此樣本通過遮罩,利用高壓水 銀燈進行顯影曝光。採用溫度2 3 °C、濃度0 . 1 % Κ 0 Η水溶液, 利用喷塗顯影而形成黑色像素(黑矩陣)。 &lt;實施例2 &gt; 除將實施例1的黏結劑樹脂I改為黏結劑樹脂Π之外, 其餘均施行如同實施例1相同的處理,而形成黑色像素。 41 312/發明說明書(補件)/93-06/93106657 200424773 〈比較例 l &gt; 除將實施例1的黏結劑樹脂I改為E A 4 8 0 5 (三菱化學公 司製,曱酚酚醛型環氧丙烯酸酯的四氫鄰苯二甲酸酐加成 物,酸價1 0 0 )之外,其餘均施行如同實施例1相同的處理, 而形成黑色像素。 &lt;比較例2 &gt; 除將實施例1的黏結劑樹脂I改為Z A R (日本化藥公司 製,雙酚A型環氧丙烯酸酯的四氫鄰苯二甲酸酐加成物, 酸價1 0 0 )之外,其餘均施行如同實施例1相同的處理,而 形成黑色像素。 〈比較例3 &gt; 除將實施例1的黏結劑樹脂I改為A C A 2 0 0 Μ (大溪爾化學 公司(音譯)製,具羧酸之丙烯酸樹脂的丙烯酸3,4 -環氧基 環己酯加成物,酸價1 1 5 )之外,其餘均施行如同實施例1 相同的處理,而形成黑色像素。 像素之評估 針對所獲得像素,依下述項目進行評估,結果如表-1所 示。 &lt;密接性&gt; 針對忠實再現2 0 μ m遮罩圖案的曝光量中,可解像光阻 最小圖案尺寸,依2 0 0倍倍率進行顯微鏡觀察。將最小圖 案尺寸在1 0 μ in以下者,視為密接性「〇」,將超過1 0 μ m 者,視為密接性「x」,結果如表-1所示。 &lt;像素清晰性&gt; 42 312/發明說明書(補件)/93-06/93106657 200424773 針對忠實再現2 0 μ m遮罩圖案的曝光量中之細線黑色像 素形狀,依1 0 0 0倍倍率進行顯微鏡觀察。將直線性良好 者,視為清晰性「〇」,將出現突起、凹凸的光阻圖案視為 「X」,結果如表-1所示。 &lt; 表-1 &gt;Monarch4 6 0, Monarch 8 0 0, Monarch8 8 0, Monarch 9 0 0 ^ MonarchlOOO, MonarchllOO, Monarchl300, Monarchl400, Monarch4630, REGAL99, REGAL99R, REGAL415, REGAL415R, REGAL250, REGAL250R, REGAL330, REGAL400R 'REGAL55R480, RE66055 , PEARLS1 30 'VULCAN XC72R' ELFTEX-8; Columbia Carbon Fiber Company: RAVEN11, RAVEN14, RAVEN15, RAVEN16, RAVEN22, RAVEN30, RAVEN35, RAVEN40, RAVEN410, RAVEN420, RAVEN450, RAVEN500, RAVEN780, RAVEN850, RAVEN890H, RAVEN1000 RAVEN1040, RAVEN1060U, RAVENT1080U, RAVEN1170 &gt; RAVEN1190U, RAVENI250, RAVEN1500, RAVEN2000, RAVEN2500U, 24 312 / Invention Specification (Supplement) / 93-06 / 93106657 200424773 RAVEN3500, RAVEN5000, RAVEN5250, RAV EN5750, RAVEN7000 Other examples of black pigments For example, titanium black, aniline black, iron oxide black pigments, and black pigments mixed with red, green, and blue organic pigments can be used. Furthermore, pigments such as barium sulfate, sulfuric acid, titanium oxide, yellow titanium, iron oxide red, chromium oxide, and the like can also be used. These various pigments may be used in combination. For example, in order to adjust the chromaticity, a green pigment and a yellow pigment may be used in combination with the pigment, and a blue pigment and a purple pigment may be used in combination. Furthermore, the average particle diameter of these pigments is usually 1 μm, preferably 0.5 μm, and more preferably 0.2 5 μιη or less. In addition, a dye that can be used as a color material can be used, and examples thereof include an azo-based dye, an onion quinone-based dye, a phthalocyanine-based material, a quinimide-based dye, a linophilic-based dye, and a nitro-based dye. , Carbonyl-based dyes, methine-based dyes, and the like. Examples of azo dyes are: C. I. Acid Yellow 1 1, C. I. Acid Orange 7, C. I. Acid Red 3 7, C. I. Acid Red 1 80, Acid Blue 2 9. Direct Red 2 8, CI Direct Red 83, CI Direct Yellow 12, CI Direct Orange 26, CI Direct Green 2 8, C. I. Direct Green 5 9, C. I. Reaction Yellow 2, C. I. Reaction Red 1 7 , C. I. Reactive Red 12 0, C. I. Reactive Black 5, C. I. Disperse Orange 5, C. I. Disperse Red 5 8, C. I. Disperse Blue 165, C. I. Test Blue 4 1, C. I. Test Red 1 8, C. I. Medium Red 7, C. I. Medium Yellow 5, C. I. Medium Black 7, etc. Examples of onionquinone-based dyes are: C.I. 瓮 cyanine 4, C.I.blue 40, C.I.acid green 25, C.I.reaction blue 19, C.I.reaction blue 4 9 , C. I. Disperse Red 60, C. I. Disperse Blue 5 6, C, I. Disperse Blue 60. 25 312 / Invention Specification (Supplement) / 93-06 / 93106657 200424773 Others, phthalocyanine dyes are: C. I. Pad Blue 5, etc., quinone imine dyes are: C. I. Basic Blue 3, C I. Basic Blue 9, etc., perylene dyes such as C. I. Cold rolled blue (padb 1 ue) 5, etc., and quinone imine dyes, such as: C. I. Basic Blue 3, C. I. Alkali For example, the blue dyes are: C. I · Solvent Yellow 3 3, C. I · Acid Yellow 3, C. I. Disperse Yellow 6 4 and so on. Nitro dyes are: C. I. Acid Yellow 1. C. I. Acid Orange 3, C. I. Disperse Yellow 4 2 and so on. Of the total solid content of the photosensitive coloring composition (the total amount of the photosensitive coloring composition except for the solvent), the proportion of the color material (C) is relative to the total solid content of the photosensitive composition, and is selected in the ordinary It is in the range of 10% by weight or more (preferably 20% by weight or more), and usually 70% by weight or less (preferably 60% by weight or more). If the color material ratio is too small, the film thickness relative to the color density will become too thick, which will adversely affect the gap control when the liquid crystal cell is applied. Conversely, if the color material ratio is too large, sufficient image formation properties cannot be obtained. The total solids content in the photosensitive coloring composition of the present invention is usually 10% by weight or more and 80% by weight or less. Furthermore, in order to improve the dispersibility and stability of the pigment, pigment derivatives and the like may be added. Examples of the pigment derivative include: azo-based, ugly-cyanine-based, p-quinacridone-based, benzimidone-based, hydrazone (qui η 〇phtha 1 ο ne), and isoindolinone System, dioxane system, onion quinone system, indanthrene system, its system, peri η ο ne system, dioxo 0-pyrrolo-nb-pyrrole system, Derivatives such as dioxane are more preferred. The substituents of the pigment derivative may include, for example, a continuous acid group, a sulfonamido group and a quaternary salt thereof, a phthalohydrazone group, a dialkylaminoalkyl group, a hydroxide group, a carboxyl group, a sulfonamide group, etc. Those bonded directly or through an alkyl group, an aromatic group, a heterocyclic ring 26 312 / Invention Specification (Supplement) / 93-06 / 93106657 200424773 to the pigment skeleton are preferably a continuous acid group. In addition, these substituents can also be substituted for a plurality of pigment skeletons. Specific examples of the pigment derivative include, for example, arsenic acid derivatives, p-quinucleic acid derivatives, onionquinone sulfonic acid derivatives, quinacridone sulfonic acid derivatives, and dioxofluorene. Sulfonic acid derivatives of pyrrozene, sulfonic acid derivatives of dioxane, and the like. The amount of the pigment derivative added is usually 0.1 to 30% by weight relative to the pigment, preferably 0.1 to 20% by weight or less, more preferably 0.1 to 10% by weight, and It is most preferably 0.1 to 5 wt%. Furthermore, in the photosensitive composition and the photosensitive coloring composition of the present invention, organic solvents, pigment dispersants, adhesion promoters, coatability enhancers, development improvers, ultraviolet absorbers, and antioxidants may be appropriately blended. , Silane coupling agent, etc. &lt; Organic solvent &gt; The organic solvent is not particularly limited, and specific examples thereof include diisopropyl ether, mineral spirit, n-pentane, pentyl, ethyl decanoate, n-hexane, diethyl ether, Isopropene, ethyl isobutyl ether, butyl stearate, n-octane, Pasur # 2 (transliteration), Abuco # 1 8 (transliteration) solvents, diisobutylene, amyl acetate, butyl butyrate, Butyl ether, diisobutyl ketone, fluorenylcyclohexene, menonyl isopropyl, propyl ether, dodecyl, Socalsolvent No. 1 and NO 2 · amyl acetate, dihexyl ether, diisoacetone, Solvesso # 150 , Butyl acetate, hexene, shell TS 2 8 solvent, butyl chloride, ethyl pentanone, ethyl benzoate, pentyl chloride, ethylene glycol diethyl ether, ethyl n-formate, methoxymethylpentyl Ketones, methyl ethyl ketone, methylhexanone, methyl isobutyrate, benzonitrile, ethyl propionate, fluorenyl cellosolve acetate, methyl isopentanone, methyl isobutyl ketone, propyl acetate, vinegar 27 312 / Explanation of the invention (Supplement) / 93-06 / 93106657 200424773 Amyl acetate, amyl acetate, dicyclohexyl, diethylene glycol monoethyl ether acetate, dipentene Methoxyfluorenyl alcohol, fluorenyl pentanone, methyl isoacetone, propyl propionate, propylene glycol tert-butyl ether, methyl ethyl ketone, fluorenyl cellosolve, ethyl cellosolve, ethyl cellosolve acetic acid Esters, carbitol, cyclohexanone, ethyl acetate, propylene glycol, propylene glycol monomethyl ether, propylene glycol monomethyl ether acetate, propylene glycol monoethyl ether, propylene glycol monoethyl ether acetate, dipropylene glycol monoethyl ether, dipropylene glycol monoethyl ether, Propylene glycol monoethyl ether acetate, dipropylene glycol monoethyl ether acetate, 3-methoxypropionic acid, 3-ethoxypropionic acid, ethyl 3-ethoxypropionate, ethyl 3-methoxypropionate, Ethyl 3-methoxypropionate, propyl 3-methoxypropionate, butyl 3-methoxypropionate, diglyme, dipropylene glycol monomethyl ether, ethylene glycol Acetate, ethyl carbitol, butyl carbitol, ethylene glycol monobutyl ether, propylene glycol tertiary butyl ether, 3 -fluorenyl-3-methoxybutanol, tripropylene glycol fluorenyl ether, 3-methoxy Organic solvents such as 3-butyl acetic acid. The solvent is preferably a solvent that can dissolve or disperse each component and has a boiling point generally in the range of 1000 to 250 ° C. Especially those with a boiling point of 120 to 170 ° C are preferred. These solvents can be used alone or in combination. &lt; Pigment dispersant &gt; In the dispersing treatment, if a polymer dispersant is used as a special type of pigment dispersant, it is preferable because it has excellent long-term dispersion stability. Examples of the polymer dispersant include: amine ester dispersant, polyethyleneimine dispersant, polyoxyethylene alkyl ether dispersant, polyethylene oxide diester dispersant, sorbitan fatty acid ester Based dispersant, aliphatic modified polyester based dispersant, etc. Specific examples of such a dispersant include, for example, the product name EFKA (manufactured by EFKA), Disperbik (Biker Chemical 28 312 / Invention Specification (Supplement) / 93- 06/93106657 200424773 (transliteration), Disparon (Nanmoto Chemicals Co., Ltd.) S 0 LSPERSE (Reneikai (transliteration) Company), K P (Shin-Etsu Chemical Co., Ltd.), Jufuluo (transliteration) (Kyoeisha Chemical Co., Ltd.) and so on. The fraction I can be used alone or in combination of two or more. The pigment dispersant is contained in the solid content of the photosensitive coloring composition, and is usually 50% by weight or less, and preferably 30% by weight or less. &lt; Silane coupling agent &gt; Furthermore, in order to improve the adhesion with the substrate, a silane coupling agent may be added. Various types of silane coupling agents can be used, such as epoxy-based, methacrylic® amine-based compounds and the like, and epoxy-based silane coupling agents are particularly preferred. [Method for producing photosensitive coloring composition] The photosensitive coloring composition of the present invention is produced by a conventional method. For example, first weigh out each color material, solvent and dispersant. In the dispersing process, disperse the color material to form a liquid coloring composition (ink-like liquid: In this dispersing processing step, a paint conditioner can be used, for example: (Paintc ο nditi ο ner), sand mill, ball mill (ba 1 1 mi 1 1), newspaper mill (mill), stone mill (st ο nemi 1 1), jet mill (jetmi 1 1), machine (Η omogenizer), etc. Because the color particles are granulated by performing this dispersion treatment, the coating characteristics of the photosensitive coloring composition are improved, and the transmittance of the color filter substrate of the product is improved. Dispersion treatment on the color material In this case, it is best to use the above-mentioned additives, resins, or dispersion aids appropriately. For example, when using a sand mill to perform dispersion, it is best to use glass beads with a diameter of 0.1 to several mm or oxidation. The temperature is usually set in the range of 0 ° C ~ 100 ° C. 312 / Invention Specification (Supplement) / 93-06 / 93106657 (shares) The amount of agent can be measured, as in the first step. In the roll Homogeneous material micro-bonding treatment ^ Beads. The best 29 200424773 room temperature ~ 80 ° C. In addition, the dispersion time depends on the composition of the ink-like liquid {color material, solvent, dispersant, and the size of the sander device, etc., the appropriate time each There are differences, so it is necessary to make appropriate adjustments. In the ink-like liquid obtained by the above-mentioned dispersion treatment, a solvent and a binder resin are mixed, and a predetermined amount of a photopolymerizable monomer is mixed in accordance with the circumstances. And other components, etc., to form a uniform dispersion solution. In addition, since fine impurities are mixed in the dispersing process step and each mixing step, it is best to use a filter or the like to obtain the obtained dispersion. The ink-like liquid is subjected to filtration treatment. The content of the binder resin (A) in the prepared photosensitive coloring composition is usually 5 wt% or more, and preferably 10 wt% or more, relative to the total solid content. It is usually 95% by weight or less, and preferably 80% by weight or less. The content of the photopolymerizable monomer in the photosensitive coloring composition is below the total solid content, It is usually 90% by weight or less, and preferably 80% by weight or less. If the content is too high, the permeability of the developer to the exposed portion will be increased, and the sharpness and adhesion of the pixels will be deteriorated. Furthermore, the photosensitive coloration The ratio of the binder resin (A) in the composition to the color material is usually 20 to 500% by weight, preferably 30 to 300% by weight, and more preferably 50 to 200% by weight. If the content of the binder resin (A) is too low, the solubility of the unexposed portion in the developing solution will be reduced, which will easily cause poor development. On the other hand, if it is significantly increased, it will be difficult to obtain the required pixel film thickness. The content ratio of the photopolymerization initiator in the photosensitive coloring composition is generally 0.1% by weight or more relative to the total solid content of 30 312 / Invention Specification (Supplement) / 93-06 / 93106657 200424773. It is preferably 0.5% by weight or more, more preferably 0.7% by weight or more, and usually 30% by weight or less, and preferably 10% by weight or less. Furthermore, the photosensitive coloring composition for a light-shielding pattern of the present invention is characterized in that: when a light-shielding pattern (hereinafter also referred to as a "black matrix pattern") is formed on an image on a transparent substrate, the light-shielding pattern is connected to The angle formed between the surface of the substrate and the substrate surface is 50 degrees or less. The photosensitive coloring composition having related properties is preferably obtained by using the photosensitive coloring composition of the present invention containing a black coloring material. The cross-sectional shape of the light-shielding pattern will be described in detail later. [3] Manufacturing of color filter substrate [3-1] Transparent substrate (support) Next, a method for manufacturing a color filter substrate and a color filter will be described. The transparent substrate of the color filter is only required to be transparent and appropriate in strength, and there is no particular limitation on the material. Examples of materials include polyester resins such as polyethylene terephthalate; polyolefin resins such as polypropylene and polyethylene; polycarbonate, polymethyl acrylate, and thermoplastic resin sheets made of polyfluorene ; Thermosetting resin sheet such as epoxy resin, unsaturated polyester resin, poly (fluorenyl) acrylic resin; or various glass. Among them, glass and a heat-resistant resin are preferred from the viewpoint of heat resistance. The transparent substrate and the black matrix-forming substrate may be subjected to corona discharge treatment, ozone treatment, silane coupling agent, amine ester resin, and other thin-film formation treatments to improve surface physical properties such as adhesion. The thickness of the transparent substrate is usually set to 0.05 to 10 mm, preferably 0.1 to 7 mm. 31 312 / Invention Specification (Supplement) / 93-06 / 93106657 200424773. In addition, when a thin film forming process is performed on various resins, the film thickness is usually 0.01 to 10 μm, preferably in the range of 0.05 to 5 μm. [3-2] Black matrix By setting a black matrix on a transparent substrate, red is usually formed. The color filter of the present invention can be used to produce a color image of blue, blue, and blue. The photosensitive coloring composition is a coating solution for forming a photoresist, which is at least one of black, red, green, and blue. The related black photoresist is applied to the plain glass surface of the transparent plate by various processes such as coating, heating and drying, image exposure, and thermal hardening, while the related red, green, and blue are the resin black matrix forming surfaces formed on the substrate. On the surface, or using a metal black matrix formed of chrome or other light-shielding metal material, various colors such as coating, heating and drying, image exposure, development, and thermal hardening are formed to form a color pixel image. The black matrix is formed on a transparent substrate by using a light-shielding metal film or a photosensitive colored product for the black matrix. The light-shielding metal material is a chromium compound such as metal chromium oxide or chromium nitride, or a nickel and tungsten alloy, and these layers may be a plurality of layers. Generally, these metal light-shielding films are formed by sputtering. After using positive resistance to form a film-like pattern on the film, an etching solution of mixed acid second ammonium ammonium and peroxy acid and / or nitric acid is used for chromium. The black matrix can be formed by etching the etching solution of other materials with a matching material, and finally using a special stripping positive photoresist for stripping. In this case, first, a thin film of such a metal or a metal / metal oxide is formed on a transparent substrate by a vapor deposition method or a sputtering method. Secondly, at 312 / Invention Specification (Supplement) / 93-06 / 93106657, at the time of 〇Green0 coloring, BenQ developed the treatment of the permeation compound, the group of chromium, in order to lighten the type, the agent will be added to the board After forming a photosensitive coloring composition coating film on this thin film 32 200424773, a photomask with repeating patterns such as stripes, mosaics, triangles, etc. is used to expose and develop the coating film to form a photoresist image. Then, a black matrix is formed by subjecting the coating film to a last name. When using a photosensitive coloring composition for a black matrix, a black matrix is formed using a photosensitive coloring composition containing a black coloring material. For example, carbon black, graphite, iron black, aniline black, cyanine black, titanium black, or other black color materials are used alone (or in plural), or red, green, blue, etc. are selected from inorganic or organic pigments and dyes, as appropriate. The black matrix can be formed by mixing the photosensitive coloring composition of the black color material and following the method of the red, green, and blue pixel images described below. [3-3] The pixels are formed on a transparent substrate with a black matrix, and a photosensitive coloring composition containing a coloring material of any one of red, green, and blue is coated. After drying, the coating is superposed on the coating film. A photomask is used to perform image exposure and development through the photomask, and it is necessary to perform thermal hardening or light hardening to form a pixel image, and a colored layer is formed. Performing this operation on the three color-sensitive photosensitive coloring compositions, such as red, green, and blue, can form a color filter image. The coating of the photosensitive coloring composition for a color filter can be performed by methods such as a spin coating method, a wire rod coating method, a flow coating method, a film head coating method, and a spray coating method. Among them, if the film head coating method is used, the amount of coating liquid used will be greatly reduced, and it will not be affected by the mist particles attached when the spin coating method is used, and the phenomenon of foreign matter will be suppressed. From the overall perspective, This is a better situation. 33 312 / Invention Specification (Supplement) / 93-06 / 93106657 200424773 If the thickness of the coating film is too thick, the pattern development phenomenon will become difficult, and the gap adjustment in the liquid crystal cellization step will also become difficult; otherwise, if If it is too thin, it is difficult to increase the pigment concentration, and the desired color cannot be developed. The thickness of the coating film after drying is preferably in a range of 0.2 to 20 μm, preferably in a range of 0.5 to 10 μm, and more preferably in a range of 0.8 to 5 μm. [3-4] Drying of the coating film The drying of the coating film after the photosensitive colored composition is applied to the substrate is preferably performed by a drying method using a hot plate, an IR oven, or a convection oven. Usually, after pre-drying, reheating is performed to dry. The preliminary drying conditions can be appropriately selected in accordance with the type of the solvent component and the performance of the dryer used. The drying time is based on the type of solvent components and the performance of the dryer used. Generally, it is selected to be performed at a temperature of 40 to 80 ° C for 15 seconds to 5 minutes. It is best to choose a temperature of 50 to 70 ° C. In the range of 30 seconds to 3 minutes. The temperature conditions for reheating and drying are higher than the pre-drying temperature 50 ~ 2 0 0 X :, especially 70 ~ 16 0 t: better, especially 70 ~ 130 ° C. In addition, the drying time varies depending on the heating temperature, and is usually from 10 seconds to 10 minutes, and preferably from 15 seconds to 5 minutes. The higher the drying temperature, the higher the adhesion to the transparent substrate. However, if the drying temperature is too high, the adhesive resin will decompose, and thermal development will cause the poor development. The thickness of the coating film of the photosensitive coloring composition after drying is 0.5 to 3 μπ, and preferably in the range of 1 to 2 μin. In addition, in the drying step of the coating film, a reduced-pressure drying method in which drying is performed in a reduced-pressure chamber may be adopted in order to increase the temperature. [3-5] Exposure Step 34 312 / Invention Specification (Supplement) / 93-06 / 93106657 200424773 The image exposure is on a photosensitive coloring composition coating film, a positive matrix pattern is superimposed, and the mask pattern is illuminated through the mask pattern. UV or visible light source. At this time, in order to prevent the sensitivity of the photopolymerizable layer from being lowered due to oxygen, an oxygen shielding layer such as a polyvinyl alcohol layer may be formed on the photopolymerizable layer before exposure. The light source used in the above image exposure is not particularly limited. Examples of the light source include gas lamps, halogen lamps, crane lamps, high-pressure mercury lamps, ultra-high-pressure mercury lamps, metal halogen lamps, medium-pressure mercury lamps, low-pressure mercury lamps, carbon arcs, and fluorescent lamps; argon ion lasers, YAG lasers , Laser light sources such as excimer laser, nitrogen laser, helium cadmium laser, semiconductor laser, etc. In the case of irradiating light of a specific wavelength, an optical filter may also be used. [3-6] Development step The color filter of the present invention is a coating film made of a particularly photosensitive coloring composition. After the image is exposed by using the light source described above, an organic solvent, a surfactant, or a test agent is used. An aqueous solution of the compound is developed to form an image on a substrate. The aqueous solution may further contain an organic solvent, a buffering agent, a dissolving agent, a dye, or a pigment. Examples of test compounds include: sodium hydroxide, sodium hydroxide, sodium hydroxide, sodium carbonate, potassium carbonate, sodium bicarbonate, potassium bicarbonate, sodium silicate, potassium silicate, sodium metasilicate, sodium phosphate, Inorganic basic compounds such as potassium phosphate, sodium hydrogen phosphate, potassium hydrogen phosphate, sodium dihydrogen phosphate, potassium dihydrogen phosphate, ammonium hydroxide; mono, di or triethanolamine, mono, di or trimethylamine, mono, di or triethyl Amine, mono, or diisopropylamine, n-butylamine, mono, di or triisopropanolamine, ethyleneimine, ethylenediimine, tetramethylammonium hydroxide (TMA Η), bile test (ch ο 1 ine ) And other organic bases 35 312 / Invention Specification (Supplement) / 93-06 / 93〗 66657 200424773 sex compounds. These basic compounds may be a mixture of two or more. Examples of the surfactant include: polyethylene oxide & S, polyethylene oxide alkyl aromatic ether, polyethylene oxide alkyl ester, sorbitan alkyl ester, monoglycidyl Non-ionic surfactants such as esters and alkyl esters; anionic interfacial activities such as alkylbenzene sulfonates, alkyls | alkylates, alkylsulphates, alkyls, etc. Agent, charcoal-based beet collar i: amphoteric surfactants, such as amino acids and amino acids. Examples of the organic solvent include isopropyl alcohol, benzyl alcohol, ethyl cellosolve, butyl cellosolve, phenyl cellosolve, propylene glycol, and diacetone alcohol. Organic solvents can be used alone or in combination with aqueous solutions. The conditions of the development process are not particularly limited. Generally, the development temperature is in the range of 10 to 50 ° C, preferably in the range of 15 to 45 ° C, and particularly preferably in the range of 20 to 40 ° C. As the development method, any method such as immersion development method, spray development method, brush coating development method, and ultrasonic development method can be adopted. [3-7] Thermal curing treatment The color filter substrate after development is subjected to a thermal curing treatment. At this time, the temperature of the heat curing treatment is selected in the range of 100 to 2800 ° C, preferably in the range of 150 to 250 ° C, and the time is selected in the range of 5 to 60 minutes. After these series of steps, a one-color pattern image is formed. This step is repeated in order to pattern the black, red, green, and blue colors to form a color filter. The order of the four-color patterns is not limited to the above order. The present invention is also characterized by the cross-sectional shape of the light-shielding pattern of the color filter. That is, the color filter of the present invention is a color filter having a light-shielding pattern on a transparent substrate 36 312 / Invention Manual (Supplement) / 93-06 / 93106657 200424773, and the light-shielding pattern is formed by using a photosensitive object And the light-shielding pattern is connected to the surface of the substrate, and the angle formed with the substrate surface (hereinafter referred to as the "pushing angle") is 5 degrees or more, and the pushing angle of 5 0 is preferably 40 degrees or less, especially 30 degrees The following is better, the best degree is better. If the pushing angle is too large, the height difference in the pixels will be described later; otherwise, the line width accuracy will deteriorate. The "pushing angle" as used herein refers to the angle formed between the end and the pattern height at a position 2 μin from the end in the light-shielding pattern section (Fig. 1). In addition, a color filter having a push-out angle within the above range and having a light-shielding pattern of the push-out angle in a positive push-out shape is not limited in terms of the photosensitive coloring composition to be used. It is manufactured using the photosensitive coloring composition of this invention. Furthermore, when the pixel image of the colored pattern is formed accordingly, if it is too small, the thickness of the overlapping portion between the light-shielding pattern and the red, green, and blue images will be reduced. Therefore, the substrate is used as the reference pixel image. The difference between the highest point and the lowest point on the surface (hereinafter referred to as the "height difference"), whichever pixel image is usually set to 0.7 μm, preferably to 0.5 μm, especially 0. 4 μm. The following is better. If the pixel size is too large, the I T 0 film may be disconnected due to the raised part, and there is no high-quality color filter. The color film having the height difference in the relevant pixels is formed by combining the photosensitive coloring composition used at the time. It is preferable to use the above-mentioned photosensitive coloring composition of the present invention. Furthermore, the color filter of the present invention Except for the above-mentioned manufacturing method 312 / Invention Specification (Supplement) / 93-06 / 93106657 color composition. The following. It becomes larger at 10, and the end of the pattern is straight, preferably. By using the above-mentioned push-push-point pixel image plane in each pixel, the maximum height difference method is used to obtain infinite filtering. In addition, using 37 200424773 (1), a thermosetting coloring composition containing a phthalocyanine pigment, a binder resin, and a polyimide resin, which is a solvent and a coloring material, is coated on a substrate, and pixels are formed by an etching method. The method of imaging can also be manufactured. In addition, for example, (2) a method in which a photosensitive coloring composition containing a phthalocyanine pigment is used as a coloring ink, and a pixel image is directly formed on a transparent substrate by a printer, or (3) A method in which a photosensitive coloring composition of a phthalocyanine pigment is used as a plating solution, and a substrate is immersed in the plating solution to form a ITO electrode of a predetermined pattern, and a colored film is deposited on the ITO electrode. In addition, it can also be: (4) a method of forming a pixel image by attaching a film coated with a photosensitive coloring composition containing a phthalocyanine pigment on a transparent substrate and then peeling it, and performing image exposure and development, or (5) A method of using a photosensitive coloring composition containing a phthalocyanine pigment as a coloring ink, and forming a pixel image using an inkjet printer, and the like. A method for producing a color filter is a suitable method in accordance with the composition of the photosensitive coloring composition for a color filter. [3-8] Forming a transparent electrode A color filter is used to form a transparent electrode such as IT 0 on an image in this state, and is used as a part of a color display, a liquid crystal display device, etc., in order to improve surface smoothness or durability. In order to meet the needs, a top cover such as polyimide and polyimide can also be set on the image. In addition, some of them can be used for applications such as the planar alignment drive method (ISP mode) without forming transparent electrodes. [4] Liquid crystal display device (panel) Next, a method for manufacturing a liquid crystal display device (panel) will be described. Usually, the liquid crystal display device forms an alignment film on a color filter and a light sheet ^ and here 38 312 / Invention Specification (Supplement) / 93-06 / 93106657 200424773 The liquid is sealed on the plate at the place where the film is often printed. After the interstitials are interspersed on the 39-alignment film, the opposite cell is bonded to form a unit cell. The liquid crystal is injected into the formed liquid crystal cell, and the line phase I is connected to the counter electrode. The alignment film is preferably a resin film such as polyimide. In terms of the formation of the alignment film, the gravure coating method and / or the rubber plate rotary brush method are used, and the thickness of the alignment film is set to several 10 nm. After performing the orientation hardening treatment by thermal firing, the surface treatment is performed by ultraviolet irradiation or the treatment of an abrasive cloth, and the slope of the liquid crystal is processed into a surface state to be adjusted. The gap element (s p a c e r) adopts a size corresponding to the gap (g a p) between the substrate and the opposite substrate, and generally 2 to 8 μm is appropriate. On the color filter substrate, a photolithography method can also be used to form a transparent resin film light-sensitive spacer (PS) and this can be used instead of the spacer. Generally, the opposite substrate is an array substrate, and a T F T (thin film transistor) substrate is particularly preferred. Although the gap between the substrate and the counter substrate is different depending on the liquid crystal display device, it is usually selected in the range of 2 to 8 μm. After the opposing substrate is bonded, the parts other than the liquid crystal auxiliary inlet are mounted with a sealing material such as epoxy resin. The sealing material is hardened by 1) V irradiation and / or heating, and seals the periphery of the liquid crystal cell. After the surrounding sealed liquid crystal cell is cut to the early position of the panel, the pressure is reduced in the vacuum chamber, and the liquid crystal injection port is immersed in the liquid crystal, and then the gas is injected into the processing chamber to deflate the liquid crystal. In the liquid crystal cell. Generally, the degree of decompression in the liquid crystal cell is 1 X 1 0_ 2 to 1 X 1 0 _7 P a, preferably 1 X 1 (Γ 3 to 1 χ 1 0 _ 6 P a. In addition, it is best to The liquid crystal is heated, usually at a temperature of 30 ~ 100 ° C, especially at 50 ~ 90 ° C. 312 / Invention Manual (Supplement) / 93-06 / 93106657 200424773 is best. The heating and holding time is usually set in the range of 10 to 60 minutes, and then immersed in the liquid crystal. After the liquid crystal cell is injected into the liquid crystal, the UV curing resin is hardened and the liquid crystal injection port is closed to complete the liquid crystal display. Device (panel). There is no particular limitation on the type of liquid crystal, such as aromatic, aliphatic, polycyclic compounds, and other known liquid crystals. It can also be lyotropic liquid crystal or thermotropic liquid crystal. One type: In terms of thermotropic liquid crystals, nematic liquid crystals, smectic liquid crystals, and cholesteric liquid crystals are known, and any of them can be used. &lt; Examples &gt; Next, the present invention will be described more specifically with reference to manufacturing examples, examples, and comparative examples. However, the present invention is not limited to the gist, and is not limited to the following examples. In the following examples, "part" means "part by weight". [1] Comparison of adhesion and pixel sharpness &lt; Synthesis Example 1 &gt; XD 1 0 0 0 (dicyclopentadiene • phenol polymer polyglycidyl ether, weight average molecular weight 7 0 0, epoxy equivalent 2 5 2) 3 0 0 parts, 8 7 parts of acrylic acid, 0.2 parts of p-methoxyphenol, 5 parts of triphenylphosphine, and 2 5 parts of propylene glycol monomethyl ether acetate, packed in a reaction vessel at 100 ° C Agitation was performed until the acid value became 3.0 mg K 0 H / g. The time required until the acid value reaches the target value is 9 hours (acid value 2.5). Secondly, 145 parts of tetrahydroortho-dibenzoic anhydride was added, and the reaction was performed at 120 ° C for 4 hours to obtain an acid value of 100. The weight-average molecular weight of polystyrene equivalent was measured by GPC according to GPC. 0 binder resin I solution. 40 312 / Invention Specification (Supplement) / 93-06 / 93106657 200424773 &lt; Synthesis example 2> Abiconone (transliteration) made by Daiichi Ink (Stock) Co., Ltd. 7 P 7 2 0 0 环 Η (Polyglycidyl dicyclopentadiene · benzene S polymer), weight average molecular weight 1 0 0 0, epoxy equivalent 2 7 0) 1 5 5 parts, acrylic acid 41 1 part, p-methoxyphenol 0.01 part, triphenylphosphine 2.5 part, propylene glycol monomethyl ether acetate 130 part , Filled in a reaction vessel, and stirred at 100 ° C until the acid value became 3.0 mg K 0 H / g. The time required until the acid value reaches the target value is 9 hours (acid value 2.9). Next, 74 g of tetrahydrophthalic anhydride was added, and the reaction was carried out at 120 ° C for 4 hours to obtain a binder solution of hydrazine, which had an acid value of 98 and a weight average molecular weight of 3,500. &lt; Example 1 &gt; 5 2 parts by weight (35 parts by weight of solid content conversion) of the binder resin I solution obtained in Synthesis Example 1, 5 parts by weight of dipentaerythritol hexapropionic acid S, and CGI-1 2 4 (steam 4 parts by weight of Bakigi Co., Ltd. and 56 parts by weight of carbon black dispersion (25% carbon concentration) were mixed with propylene glycol monomethyl ether acetate to obtain a photosensitive black composition. The photosensitive black composition thus obtained was spin-coated on a 10 cm square glass substrate, and then dried on a hot plate at 90 degrees for 150 seconds. The film thickness after drying was 1 μ111. Next, the sample was passed through a mask and developed and exposed using a high-pressure mercury lamp. A black pixel (black matrix) was formed by spraying and developing using an aqueous solution of a temperature of 2 3 ° C and a concentration of 0.1% K0Η. &lt; Example 2 &gt; Except that the binder resin I of Example 1 was changed to the binder resin II, the rest were subjected to the same treatment as in Example 1 to form black pixels. 41 312 / Invention Specification (Supplement) / 93-06 / 93106657 200424773 <Comparative Example 1> Except changing the binder resin I of Example 1 to EA 4 8 0 5 (manufactured by Mitsubishi Chemical Corporation, phenol novolac ring Except for the tetrahydrophthalic anhydride adduct of oxyacrylate, the acid value is 100 0), the rest are subjected to the same treatment as in Example 1 to form black pixels. &lt; Comparative Example 2 &gt; Except that the binder resin I of Example 1 was changed to ZAR (manufactured by Nippon Kayaku Co., Ltd., a tetrahydrophthalic anhydride adduct of bisphenol A epoxy acrylate, acid value 1 Except for 0 0), the rest are subjected to the same processing as in Example 1 to form black pixels. <Comparative Example 3> Except changing the binder resin I of Example 1 to ACA 2 0 0 M (acrylic 3,4-epoxy ring of acrylic resin with carboxylic acid made by Daxier Chemical Co., Ltd.) Except for the hexyl ester addition product, the acid value is 1 15), and the rest are subjected to the same treatment as in Example 1 to form black pixels. Pixel Evaluation For the obtained pixels, the following items were evaluated. The results are shown in Table-1. &lt; Adhesiveness &gt; With respect to the exposure amount that faithfully reproduces a masking pattern of 20 μm, the smallest pattern size of resolvable photoresist is observed under a microscope at a magnification of 200 times. If the minimum pattern size is less than 10 μin, it is regarded as closeness “0”, and if the minimum pattern size is more than 10 μm, it is regarded as closeness “x”. The results are shown in Table-1. &lt; Pixel Clarity &gt; 42 312 / Invention Specification (Supplement) / 93-06 / 93106657 200424773 For the thin line black pixel shape in the exposure amount that faithfully reproduces the 20 μm mask pattern, at a magnification of 1 0 0 0 Make a microscope observation. Those with good linearity were regarded as sharpness "0", and the photoresist pattern with protrusions and irregularities was regarded as "X". The results are shown in Table-1. &lt; Table-1 &gt;

實施例1 實施例2 比較例1 比較例2 比較例3 密接性 〇 〇 X 〇 X 清晰性 〇 〇 X X XExample 1 Example 2 Comparative Example 1 Comparative Example 2 Comparative Example 3 Adhesiveness 〇 〇 X 〇 X Clarity 〇 〇 X X X

[2 ]推拔角及像素内高度差之比較 &lt;實施例3 &gt; 將碳黑(三菱化學(股)製「MA- 2 2 0」)1 9· 7g、及分散劑 的 Bykcheeniie 公司製「Disperbyk -182」7.7g,與 P G E M A 7 2 . 6 g混合,並添加粒子系0 . 5 in m的氧化錯珠1 0 0 c c, 利用塗料調節器(p a i n t c〇n d i t i ο n e r )振盪1 0小時,獲得 碳黑的分散液。分取此分散液5 Ο . 7 g,並添加黏結劑樹脂I 溶液10. 79g(固形分換算7. 26g)、二季戊四醇六丙烯酸酯 (曰本化藥公司製「D P H A」)1 . 8 2 g、光聚合起始劑的汽巴超 級化學(音譯)製C G I - 2 4 2 2 . 0 g、界面活性劑大日本油墨公 司製美佳發克(音譯)F 4 7 5 0 . 0 2 5 g、有機溶劑的P G Μ E A 3 8 . 2 g,而調製出感光性黑色組成物。 將依此調製出的感光性黑色組成物,利用模頭塗布機塗 布於玻璃基板(旭硝子公司製A N 1 0 0 )上形成膜厚1 · Ο μ m, 採用黑矩陣用光罩(圖案線寬2 Ο μηι ),利用水銀燈依紫外線 2 0 m W / c m 2 ( i線換算)照度曝光3秒鐘(6 0 m J / c in2)。光罩與光 阻面間之間隙為1 5 Ο μ m。經曝光過的基板,採用0 . 1 % K〇Η 43 312/發明說明書(補件)/93-06/93106657 200424773 水溶液進行顯影後,於2 3 0 °C烤箱中施行3 0分鐘的熱處 理,獲得黑矩陣圖案。 &lt;比較例4 &gt; 將實施例3所製得碳黑分散液6 3 . 4 g,並添加黏結劑樹 脂E A 4 8 0 5 (三菱化學公司製,曱酚酚醛型環氧丙烯酸酯的 四氫鄰苯二曱酸酐加成物,酸價100)4. 98g、二季戊四醇 六丙烯酸酯(日本化藥公司製「DPHA」)1.25g、光聚合起始 劑的汽巴超級化學(音譯)製CG I - 2 4 2 1 · 3 7 g、界面活性劑 大曰本油墨公司製美佳發克(音譯)F 4 7 5 0 . 0 2 5 g、有機溶劑 的P G Μ E A 2 9 . 0 g,而調製出感光性黑色組成物。 將依此調製出的感光性黑色組成物,如同實施例3經施 行曝光、顯影、熱處理,獲得黑矩陣圖案。 像素之評估 針對所獲得像素,依下述項目進行評估,結果如表-2所 示。 &lt;推拔角&gt; 針對依此所獲得黑色像素的截面形狀,利用S E Μ (日立製 S _ 4 5 0 0 )進行觀察,而測定推拔角。 &lt;像素内高度差&gt; 將紅色顏料(汽巴嘉基公司製「Cromophtal Red Α2Β」 及 BASF 公司製「Paliotol Yellow K1841D」 )7.7g、與聚 酯系分散劑3 . 1 g,混合於P G Μ E A 6 . 4 g中,並添加0 . 5 m m氧 化鍅珠1 0 c c,利用塗料調節器振盪5小時,獲得紅色顏料 的分散液。分取此分散液7. 4 8 g,並添加黏結劑的化1丙 44 312/發明說明書(補件)/93-06/93106657 200424773 烯酸系樹脂l · 〇 g、乙烤性化合物的二季戊四醇六丙稀酸酯 (曰本化藥公司製「DPHA」)0.5g、光聚合起始系的雙咪唑[2] Comparison of pushing angle and height difference between pixels &lt; Example 3 &gt; Carbon black ("MA- 2 2 0" manufactured by Mitsubishi Chemical Corporation) 19.7 g and dispersant manufactured by Bykcheeniie 7.7 g of "Disperbyk -182" was mixed with PGEMA 7 2.6 g, and 0.5 in m of oxidized beads of particle size 1 0 0 cc were added, and shaken for 10 hours using a paint conditioner (paintc〇nditi ο ner) To obtain a carbon black dispersion. 50.7 g of this dispersion was dispensed, and 10.79 g of a binder resin I solution (7. 26 g in terms of solid content conversion) and dipentaerythritol hexaacrylate ("DPHA" manufactured by Benwa Chemical Co., Ltd.) were added. 8 2 g. CGI-2 4 2 2.0 by Ciba Super Chemical (transliteration), a photopolymerization initiator, and Mikafak (transliteration) by the Dainippon Ink Co., Ltd., a surfactant F 4 7 5 0. 0 2 5 g PG EA 38.2 g, an organic solvent, to prepare a photosensitive black composition. The photosensitive black composition prepared in this manner was applied on a glass substrate (AN 1 0 0 manufactured by Asahi Glass Co., Ltd.) with a die coater to form a film thickness of 1 · 0 μm, and a black matrix mask (pattern line width) was used. 2 〇 μηι), using a mercury lamp according to ultraviolet light 20 m W / cm 2 (i-line conversion) exposure for 3 seconds (60 m J / c in2). The gap between the photomask and the photoresist surface is 15 μm. After the exposed substrate was developed with an aqueous solution of 0.1% K〇Η 43 312 / Invention (Supplement) / 93-06 / 93106657 200424773, it was heat-treated in an oven at 230 ° C for 30 minutes. A black matrix pattern is obtained. &lt; Comparative Example 4 &gt; The carbon black dispersion liquid 6 3.4 g obtained in Example 3 was added with a binder resin EA 4 8 0 5 (manufactured by Mitsubishi Chemical Corporation, phenol novolac epoxy acrylate four Hydrophthalic anhydride adduct, acid value 100) 4. 98g, dipentaerythritol hexaacrylate ("DPHA" manufactured by Nippon Kayaku Co., Ltd.) 1.25g, photobath super-chemical (transliteration) CG I-2 4 2 1 · 3 7 g, surface active agent Daikaiben Ink Co., Ltd. (transliteration) F 4 7 5 0. 0 2 5 g, organic solvent PG Μ EA 2 9 0 g, A photosensitive black composition is prepared. The photosensitive black composition prepared in this way was subjected to exposure, development, and heat treatment as in Example 3 to obtain a black matrix pattern. Pixel Evaluation For the obtained pixels, the evaluation is performed according to the following items. The results are shown in Table-2. &lt; Push-out angle &gt; The cross-sectional shape of the black pixel obtained in this manner was observed with S EM (S_4500 by Hitachi) to measure the push-out angle. &lt; Height difference in pixels &gt; 7.7 g of a red pigment ("Cromophtal Red Α2B" manufactured by Ciba Gage Corporation and "Paliotol Yellow K1841D" manufactured by BASF Corporation) and 3.1 g of a polyester-based dispersant were mixed in PG Into EA 6.4 g, 0.5 cc of oxidized bead beads 10 cc was added and shaken for 5 hours using a paint conditioner to obtain a dispersion of a red pigment. 7. 4 g of this dispersion was dispensed, and propylene 44 312 / Instruction Manual for the Invention (Supplement) / 93-06 / 93106657 200424773 enoic resin l. 〇2, a second compound 0.5 g of pentaerythritol hexapropionate ("DPHA" manufactured by Benhwa Pharmaceutical Co., Ltd.), bisimidazole, a photopolymerization initiator

0.075g、米贵 s同(michler’s ketone)0.045g、I 系、界面活 性劑(住友3 Μ (股)「F C - 4 3 0」)0 · 〇 〇 〇 4 g、有機溶劑的p G Μ E A 1 . 5 1 g,而調製出感光性紅色組成物。0.075g, michler's ketone 0.045g, I series, surfactant (Sumitomo 3 M (share) "FC-4 3 0") 0 · 0.004 g, p G Μ EA of organic solvent 1.5 1 g to prepare a photosensitive red composition.

(a:b:c:d=55:15:20:10(莫耳 %)、 Mw:12,000) 將所獲得感光性紅色組成物採用旋塗法,塗布成與黑矩 陣間之重疊寬度5 μ m,乾燥膜厚1 · 3 μ m狀態,在7 0 °C加熱 板上乾燥1分鐘,並採用紅色濾波器用遮罩,依1 5 〇 m j / c m 2 密接曝光紫外線之後,再採用〇 · 5重量%的二乙醇胺水溶液 進行顯影,而在黑矩陣圖案之間獲得紅色像素圖案。其次, 採用高壓水銀燈依1 5 0 0 0 m j / c m2紫外線照射試料,再於2 0 0 °C的烤箱中進行1 0分鐘熱處理,而形成紅色像素影像。 針對所獲得試料的紅色像素影像的表面形狀,採用 TENCOR INSTRUMENTS公司製「 alpha-step」測定像素内高 度差。 再者,除取代紅色顏料,改為採用綠色顏料(東洋油墨 製造公司製「Lionol Green 6Y501」)及BASF公司製 45 312/發明說明書(補件)/93-06/93106657 200424773 「Paliotol Yellow K1841D」之外,其餘均完全相同的方 法形成綠色像素影像,並測定像素内高度差。(a: b: c: d = 55: 15: 20: 10 (mole%), Mw: 12,000) The obtained photosensitive red composition was spin-coated with an overlap width of 5 μ with the black matrix m, with a dry film thickness of 1 · 3 μm, drying on a 70 ° C heating plate for 1 minute, using a red filter mask, and closely exposing the ultraviolet rays at 150 mj / cm2, and then using 0.5 A weight% diethanolamine aqueous solution is developed, and a red pixel pattern is obtained between the black matrix patterns. Second, a high-pressure mercury lamp was used to irradiate the sample with 1550 m j / c m2 ultraviolet rays, and then heat-treated in an oven at 2000 ° C for 10 minutes to form a red pixel image. For the surface shape of the red pixel image of the obtained sample, the "alpha-step" manufactured by TENCOR INSTRUMENTS was used to measure the height difference within the pixel. In addition, instead of replacing red pigments, green pigments ("Lionol Green 6Y501" manufactured by Toyo Ink Manufacturing Co., Ltd.) and BASF Corporation 45 312 / Invention Specification (Supplement) / 93-06 / 93106657 200424773 "Paliotol Yellow K1841D" were used instead. Except for the other methods, the green pixel image is formed by the same method, and the height difference in the pixel is measured.

此外,除取代紅色顏料,改為採用藍色顏料(東洋油墨 製造公司製「Lionol BlueES」)及汽巴嘉基公司製「IRGAZIN B L ϋ E A 3 R N」之外,其餘均完全相同的方法形成藍色像素影 像,並測定像素内高度差。 &lt; 表-2 &gt; 實施例3 比較例4 推拔角 (度) 40 6. 0 像素内高度 差(μ m ) 紅 0. 5 0.9 綠 0. 4 0. 8 藍 0. 4 0. 8 雖參照實施方式及特定實施態樣說明本發明,但是在不 脫逸本發明的精神與範疇之前提下均可進行各種變更與修 正,此對熟習此技術者而言乃屬可輕易思及。 另外,本申請案係根據2 0 0 3年3月1 2日提出申請的曰 本專利申請案(特願2 0 0 3 - 0 6 7 0 2 1 )、2 0 0 4年1月1 4日提出 申請的日本專利申請案(特願2 0 0 4 - 0 0 6 6 7 6 ),並援引採用 其整體内容。 &lt;產業上可利用性&gt; 依照本發明的話,便可提供一種即便色材濃度較高的情 況時,仍具優越地影像形成性,且適於彩色濾光片用途的 感光性組成物、及採用其所製得感光性著色組成物、彩色 濾光片、液晶顯示裝置。 【圖式簡單說明】 圖1為相關黑矩陣圖案中之推拔角的說明示意圖。 46In addition, except that instead of red pigments, blue pigments ("Lionol BlueES" manufactured by Toyo Ink Manufacturing Co., Ltd.) and "IRGAZIN BL ϋ EA 3 RN" manufactured by Ciba Gage Corporation were used. Color pixel image, and measure the height difference within the pixel. &lt; Table-2 &gt; Example 3 Comparative Example 4 Pushing angle (degrees) 40 6. 0 Height difference in pixels (μm) Red 0.5 5 0.9 Green 0.4 4 0.8 Blue 0 0.8 4 Although the present invention is described with reference to the embodiments and specific implementation modes, various changes and modifications can be made without departing from the spirit and scope of the present invention, which can be easily considered by those skilled in the art. In addition, this application is based on the Japanese patent application filed on March 12, 2003 (Japanese Patent Application No. 2 0 3-0 6 7 0 2 1), 2 January 2004 1 4 Japan Patent Application (Japanese Patent Application No. 2004-0 0 6 6 7 6) filed in Japan and cited its entire content. &lt; Industrial applicability &gt; According to the present invention, it is possible to provide a photosensitive composition which has superior image-forming properties even when the color material density is high, and is suitable for color filter applications. And a photosensitive coloring composition, a color filter, and a liquid crystal display device prepared by using the same. [Brief Description of the Drawings] FIG. 1 is an explanatory diagram of the pushing angle in the related black matrix pattern. 46

312/發明說明書(補件)/93-06/93106657 200424773 (元件符號說明) 1 黑矩陣圖案 2 基板面 3 推拔角 312/發明說明書(補件)/93-06/93106657312 / Invention Specification (Supplement) / 93-06 / 93106657 200424773 (Description of Element Symbols) 1 Black Matrix Pattern 2 Substrate Surface 3 Pushing Angle 312 / Invention Specification (Supplement) / 93-06 / 93106657

Claims (1)

200424773 拾、申請專利範圍: 1 . 一種彩色濾光片用感光性組成物,其含有:使環氧樹 脂(a )、與含不飽和基羧酸(b )的反應物,更與多鹼性基羧 酸或其酐(c )進行反應而獲得的黏結劑樹脂(A );以及光聚 合起始劑(B );其中, 環氧樹脂(a )係平均1分子具有2個以上不飽和基之環 狀碳氫化合物和苯酚類的複加成反應物,與表鹵醇之反應 生成物。 2 ,如申請專利範圍第1項之彩色濾光片用感光性組成 物,其中,平均1分子具有2個以上不飽和基之環狀碳氫 化合物的碳數係5〜2 0。 3 .如申請專利範圍第1或2項之彩色濾光片用感光性組 成物,其中,環氧樹脂(a )係二環戊二烯與苯酚(或曱酚) 的複加成反應物,與表鹵醇之反應生成物。 4 .如申請專利範圍第1項之彩色濾光片用感光性組成 物,其中,黏結劑樹脂(A )係經G P C測定的聚苯乙歸換算重 量平均分子量(M w )為7 0 0以上、5 0 0 0 0以下。 5 .如申請專利範圍第1項之彩色濾光片用感光性組成 物,其中,黏結劑樹脂(A )之酸價(丨丨〗g Κ 0 H / g )係1 0以上、2 0 0 以下。 6 .如申請專利範圍第1項之彩色濾光片用感光性組成’ 物,係含有光聚合性單體。 * 7 . —種彩色濾光片用感光性著色組成物,其含有申請專 利範圍第1項之感光性組成物與色材(C )。 48 312/發明說明書(補件)/93-06/93〗06657 200424773 8 .如申請專利範圍第7項之彩色濾光片用感光性著色組 成物,其中,色材(C )係黑色色材。 9 .如申請專利範圍第7或8項之彩色濾光片用感光性著 色組成物,其中,色材(C )係佔感光性著色組成物總固形分 的1 0重量%以上。 1 0 . —種遮光性圖案用感光性著色組成物,其係在透明 基板上影像形成遮光性圖案時的截面形狀中,遮光性圖案 銜接於基板的面,在與基板面間所形成的角度係在5 0度以 下。 Π . —種彩色濾光片,其係在透明基板上具有採用申請 專利範圍第7項之感光性著色組成物而形成的像素。 1 2 . —種彩色濾光片,其係在透明基板上具有遮光性圖 案,而該遮光性圖案係採用感光性著色組成物而形成,且 遮光性圖案銜接於基板的面,在與基板面間所形成的角度 係在5度以上且50度以下。 1 3 .如申請專利範圍第1 2項之彩色濾光片,其中,遮光 性圖案係採用申請專利範圍第8項之感光性著色組成物而 形成。 1 4 .如申請專利範圍第1 1至1 3項中任一項之彩色濾光 片,其中,係在已形成遮光性圖案的基板上具有2種以上 不同著色圖案的像素影像,且以該基板為基準面的各像素 影像之表面最高點、與最低點間之差,任一像素影像均在 0 . 7 μ丨]〗以下。 1 5 . —種液晶顯示裝置,係採用申請專利範圍第1 1至1 3 49 312/發明說明書(補件)/93-06/93106657 200424773 項中任一項之彩色濾光片。 312/發明說明書(補件)/93-06/93106657 50200424773 The scope of patent application: 1. A photosensitive composition for a color filter, comprising: a reaction product of an epoxy resin (a) and an unsaturated carboxylic acid (b), and more alkaline Binder resin (A) obtained by reacting a carboxylic acid or its anhydride (c); and a photopolymerization initiator (B); wherein the epoxy resin (a) has an average of two or more unsaturated groups per molecule The reaction product of the cyclic hydrocarbon and phenol compound addition reaction with epihalohydrin. 2. The photosensitive composition for a color filter according to item 1 of the application, wherein the average number of carbon atoms of a cyclic hydrocarbon having two or more unsaturated groups is 5 to 20. 3. The photosensitive composition for a color filter according to item 1 or 2 of the scope of patent application, wherein the epoxy resin (a) is a compound addition reaction product of dicyclopentadiene and phenol (or phenol) Reaction product with epihalohydrin. 4. The photosensitive composition for a color filter according to item 1 of the patent application scope, wherein the binder resin (A) is a polystyrene-reduced weight average molecular weight (M w) measured by GPC of 700 or more , 5 0 0 0 0 or less. 5. The photosensitive composition for a color filter according to item 1 of the scope of the patent application, wherein the acid value (丨 丨 g κ 0 H / g) of the binder resin (A) is 10 or more and 2 0 0 the following. 6. The photosensitive composition for a color filter according to item 1 of the patent application scope, which contains a photopolymerizable monomer. * 7. A photosensitive coloring composition for a color filter, which contains the photosensitive composition and color material (C) in the first patent claim. 48 312 / Invention Specification (Supplement) / 93-06 / 93〗 06657 200424773 8. The photosensitive coloring composition for a color filter according to item 7 of the patent application scope, wherein the color material (C) is a black color material . 9. The photosensitive coloring composition for a color filter as claimed in claim 7 or 8, wherein the color material (C) accounts for more than 10% by weight of the total solid content of the photosensitive coloring composition. 1 0. A photosensitive coloring composition for a light-shielding pattern, which is an angle formed between a surface of a substrate and a surface of the substrate in a cross-sectional shape when a light-shielding pattern is formed on a transparent substrate. It is below 50 degrees. Π. A color filter having a pixel formed on a transparent substrate using a photosensitive coloring composition according to item 7 of the patent application. 1 2. A color filter having a light-shielding pattern on a transparent substrate, and the light-shielding pattern is formed using a photosensitive coloring composition, and the light-shielding pattern is connected to the surface of the substrate, and The angle formed between them is 5 degrees or more and 50 degrees or less. 13. The color filter according to item 12 of the application, wherein the light-shielding pattern is formed by using the photosensitive coloring composition of item 8 of the application. 14. The color filter according to any one of claims 11 to 13 in the scope of patent application, wherein the pixel image has two or more different colored patterns on a substrate on which a light-shielding pattern has been formed, and The difference between the highest point and the lowest point of the surface of each pixel image where the substrate is the reference plane, any pixel image is below 0.7 μ 丨]. 1 5. A liquid crystal display device adopting a color filter according to any one of the scope of applications for patents No. 11 to 1 3 49 312 / Invention Specification (Supplement) / 93-06 / 93106657 200424773. 312 / Invention Specification (Supplement) / 93-06 / 93106657 50
TW93106657A 2003-03-12 2004-03-12 Photosensitive composition, photosensitive colored compositions, color filters, and liquid crystal displays TW200424773A (en)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2003067021 2003-03-12
JP2004006676A JP3938375B2 (en) 2003-03-12 2004-01-14 Photosensitive coloring composition, color filter, and liquid crystal display device

Publications (2)

Publication Number Publication Date
TW200424773A true TW200424773A (en) 2004-11-16
TWI302637B TWI302637B (en) 2008-11-01

Family

ID=32992961

Family Applications (1)

Application Number Title Priority Date Filing Date
TW93106657A TW200424773A (en) 2003-03-12 2004-03-12 Photosensitive composition, photosensitive colored compositions, color filters, and liquid crystal displays

Country Status (4)

Country Link
JP (1) JP3938375B2 (en)
KR (2) KR100820610B1 (en)
TW (1) TW200424773A (en)
WO (1) WO2004081621A1 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI398726B (en) * 2005-04-27 2013-06-11 Mitsubishi Chem Corp Curable composition, cured product and liquid crystal display device using same
TWI420205B (en) * 2007-02-20 2013-12-21 Mitsui Chemicals Inc Hardening resin composition for liquid crystal sealing and manufacturing method for liquid crystal display panel using the same
TWI486707B (en) * 2007-05-08 2015-06-01 Taiyo Holdings Co Ltd A photohardenable resin composition and a hardened product thereof
CN107870514A (en) * 2016-09-23 2018-04-03 株式会社田村制作所 Photosensitive polymer combination

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4595374B2 (en) * 2003-04-24 2010-12-08 住友化学株式会社 Black photosensitive resin composition
JP4448381B2 (en) * 2004-05-26 2010-04-07 東京応化工業株式会社 Photosensitive composition
JP4578949B2 (en) * 2004-11-24 2010-11-10 富士フイルム株式会社 Photocurable image recording material, color filter and method for producing the same
JP4611724B2 (en) * 2004-12-03 2011-01-12 東京応化工業株式会社 Photosensitive composition for forming light-shielding film, and black matrix formed with the photosensitive composition for forming light-shielding film
TW200625002A (en) * 2005-01-12 2006-07-16 Chi Mei Corp Photosensitive resin composition for color filter
JP4526964B2 (en) * 2005-01-27 2010-08-18 旭化成イーマテリアルズ株式会社 Photopolymerizable resin laminate, glass substrate with black matrix using the same, and method for producing color filter
JP4844016B2 (en) * 2005-06-03 2011-12-21 大日本印刷株式会社 Color filter and manufacturing method thereof
JP2006350153A (en) * 2005-06-20 2006-12-28 Mitsubishi Chemicals Corp Photosensitive composition, photosensitive colored composition, color filter and liquid crystal display device
JP5142175B2 (en) * 2005-07-07 2013-02-13 日本化薬株式会社 Epoxy resin, photosensitive resin and photosensitive resin composition
CN101107566B (en) * 2005-07-20 2012-08-29 凸版印刷株式会社 Alkali-developable photosensitive color composition
JP2007058172A (en) * 2005-07-28 2007-03-08 Mitsubishi Electric Corp Substrate with light-shielding film, color filter substrate, method of manufacture of both, and display device having substrate with light-shielding film
WO2007094119A1 (en) * 2006-02-13 2007-08-23 Fujifilm Corporation Method for fabricating color filter, color filter, and display device having such color filter
JP4745093B2 (en) 2006-03-17 2011-08-10 東京応化工業株式会社 Black photosensitive composition
JP4954647B2 (en) * 2006-09-11 2012-06-20 太陽ホールディングス株式会社 Plasma display panel having photosensitive paste and fired product pattern formed from the photosensitive paste
JP4949810B2 (en) * 2006-11-14 2012-06-13 東京応化工業株式会社 Colored photosensitive resin composition
JP4949809B2 (en) * 2006-11-14 2012-06-13 東京応化工業株式会社 Colored photosensitive resin composition
JP5030638B2 (en) * 2007-03-29 2012-09-19 富士フイルム株式会社 Color filter and manufacturing method thereof
JP2009031625A (en) * 2007-07-30 2009-02-12 Toppan Printing Co Ltd Method for manufacturing color filter for liquid crystal display device
KR101177119B1 (en) 2007-12-04 2012-08-27 주식회사 엘지화학 Alkali-soluble binder resin, preparing method thereof, and photosensitive resin composition containing the same
CN101978004B (en) * 2008-03-17 2013-11-06 富士胶片株式会社 Pigment-dispersed composition, colored photosensitive composition, photocurable composition, color filter, liquid crystal display element, and solid image pickup element
JP5535444B2 (en) * 2008-03-28 2014-07-02 富士フイルム株式会社 Green curable composition for solid-state image sensor, color filter for solid-state image sensor, and method for producing the same
JP5344843B2 (en) * 2008-03-31 2013-11-20 富士フイルム株式会社 Polymerizable composition and solid-state imaging device
EP2168994A1 (en) 2008-09-25 2010-03-31 Huntsman Advanced Materials (Switzerland) GmbH Photocurable composition
JP2012230224A (en) * 2011-04-26 2012-11-22 Toppan Printing Co Ltd Method for manufacturing color filter substrate for reflective liquid crystal display device and color filter substrate obtained by the method
JP6025245B2 (en) 2012-07-04 2016-11-16 日本化薬株式会社 Novel epoxy carboxylate compound, derivative thereof, active energy ray-curable resin composition containing the same, and cured product thereof
EP3147335A1 (en) 2015-09-23 2017-03-29 BYK-Chemie GmbH Colorant compositions containing wettting and/or dispersing agents with low amine number
US20200347171A1 (en) 2017-11-15 2020-11-05 Byk-Chemie Gmbh Block co-polymer
EP3710505B1 (en) 2017-11-15 2022-01-05 BYK-Chemie GmbH Block co-polymer
JPWO2021230097A1 (en) * 2020-05-12 2021-11-18
KR20230007429A (en) * 2020-05-19 2023-01-12 닛테츠 케미컬 앤드 머티리얼 가부시키가이샤 Alkali-soluble resin containing a polymerizable unsaturated group, method for producing the same, and photosensitive resin composition and cured product thereof

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH04194942A (en) * 1990-11-27 1992-07-14 Sanyo Chem Ind Ltd Colored picture forming material and formation of colored picture
JP2931860B2 (en) * 1992-01-31 1999-08-09 日石三菱株式会社 Photocurable resin composition and photocurable resin composition for solder resist
JPH08292566A (en) * 1995-04-24 1996-11-05 Hitachi Chem Co Ltd Colored image forming material, production of photosensitive solution, photosensitive element and color filter using the same and color filter
JP3610626B2 (en) * 1995-04-25 2005-01-19 三菱化学株式会社 Photopolymerizable composition for color filter and color filter
JPH09120063A (en) * 1995-08-18 1997-05-06 Toray Ind Inc Color filter and liquid crystal display device using the same
JPH1184126A (en) * 1997-09-03 1999-03-26 Mitsubishi Chem Corp Photopolymerizable composition for color filter and color filter
JP2001302871A (en) * 2000-04-25 2001-10-31 Taiyo Ink Mfg Ltd Photocurable/thermosetting resin composition and printed wiring board having solder resist coating film and resin insulating layer formed by using the same

Cited By (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI398726B (en) * 2005-04-27 2013-06-11 Mitsubishi Chem Corp Curable composition, cured product and liquid crystal display device using same
TWI420205B (en) * 2007-02-20 2013-12-21 Mitsui Chemicals Inc Hardening resin composition for liquid crystal sealing and manufacturing method for liquid crystal display panel using the same
TWI486707B (en) * 2007-05-08 2015-06-01 Taiyo Holdings Co Ltd A photohardenable resin composition and a hardened product thereof
CN107870514A (en) * 2016-09-23 2018-04-03 株式会社田村制作所 Photosensitive polymer combination
CN107870514B (en) * 2016-09-23 2022-09-16 株式会社田村制作所 Photosensitive resin composition

Also Published As

Publication number Publication date
JP3938375B2 (en) 2007-06-27
KR100820610B1 (en) 2008-04-10
KR20050113164A (en) 2005-12-01
TWI302637B (en) 2008-11-01
JP2004295084A (en) 2004-10-21
KR20070116695A (en) 2007-12-10
WO2004081621A1 (en) 2004-09-23

Similar Documents

Publication Publication Date Title
TW200424773A (en) Photosensitive composition, photosensitive colored compositions, color filters, and liquid crystal displays
JP6489245B2 (en) Color filter pigment dispersion, color filter coloring composition, color filter, and liquid crystal display device
JP6119922B2 (en) Colored resin composition, color filter, and image display device
JP4911256B1 (en) Dye dispersion, photosensitive resin composition for color filter, color filter, liquid crystal display device, and organic light emitting display device
JP4911253B1 (en) Dye dispersion, photosensitive resin composition for color filter, color filter, liquid crystal display device, and organic light emitting display device
JP5316034B2 (en) Coloring composition for color filter, color filter, and liquid crystal display device
JP5659853B2 (en) Coloring composition, color filter and color liquid crystal display element
JP2019144543A (en) Coloring resin composition, color filter, and image display device
JP2016038584A (en) Pigment dispersion liquid, colored resin composition, color filter, liquid crystal display device, and organic el display device
JP2011068866A (en) Coloring composition, color filter, organic el display and liquid crystal display
JPWO2012005203A1 (en) Triarylmethane colorant, coloring composition, color filter, and display element
JP5742407B2 (en) Coloring composition, color filter and display element
JP2011180169A (en) Coloring composition for color filter, color filter, and color liquid crystal display element
JP2017137483A (en) Coloring resin composition, color filter and image display device
JP2006350153A (en) Photosensitive composition, photosensitive colored composition, color filter and liquid crystal display device
KR101932770B1 (en) Color filter structure comprising a coated layer for control luminance
JP2012078409A (en) Blue pigment dispersion liquid for color filter, blue photosensitive resin composition for color filter, color filter, and liquid crystal display device
JP5381682B2 (en) Colored resin composition, color filter, liquid crystal display device and organic EL display
JP5664127B2 (en) Green pigment colored resin composition, color filter, liquid crystal display device, and organic EL display device
JP7447397B2 (en) Photosensitive colored resin composition, color filter, and image display device
JP2017142480A (en) Coloring resin composition, color filter, and image display device
JP2016147977A (en) Coloring composition, colored cured film, and solid state image sensor and display element
JP2006313379A (en) Photosensitive composition, photosensitive colored composition, color filter, and liquid crystal display
JP2006313379A5 (en)

Legal Events

Date Code Title Description
MK4A Expiration of patent term of an invention patent