TWI300515B - - Google Patents

Description

1300515

V. Description of the invention (1) [Technical field to which the invention pertains]

The present invention relates to a photosensitive resin composition for a color light sheet which is suitable for use in a liquid crystal display (LCD) or a charge coupled device (CCD), particularly a liquid crystal display. More recently, the present invention relates to: the use of high pigment content and good sensitivity when exposed, the chroma (chroma), contrast (contrast), and the bottom of the helmet after development; (, undercut) , color filter without residue (scum) ^ (c〇1〇r, fjite with photosensitive resin composition. 6Γ) [Prior Art] (3) W-shirt color filter has been widely used in office equipment technology such as color fax machines In the above, it is also common, and the color pigment dispersion method is obtained. In general, there is an increasing market demand for applications such as coloring and coloring, which are formed by disposing a light-shielding pigment dispersion resin to form a pixel coloring. The color filter can be used to dye the red, green, blue, etc. pigment dispersion method to the contrast layer (or black matrix) of the current color filter. In the process of the method, a photosensitive resin composition is first formed, and the layer has a pixel coloring layer having a heat resistance of 13⁄4. The process of the dispersion method is usually N-* otj p only. With the color liquid crystal display, the production of color filters, printing methods, electrophotography, and pixels are the mainstream methods in the transparent substrate industry. Degree can be dispersed in the photohardenable layer of the alizarin colored layer, and the resin composition is not required to be dyed, etc., first on the glass substrate, etc.

Page 6 1300515 V. INSTRUCTIONS (2) On a glass substrate with a black matrix, or a red, pigmented photosensitive resin (color resist) by spin coating or ▲When the coating is applied, the photosensitive resin is coated on a transparent support and exposed by a photomask, and after exposure, development is carried out to obtain a red food; The operation mode, that is, repeating the three colors of red, green, and sputum by coating, exposing, ί, ^ support, respectively, the process of the method +, the sensitization used: tree: group: Substance: also,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,,, Chlorophenyl)-4,4,5,5,-tetraphenyl disaccharide, .^-bis(2-chloropheny 1)-4,4' , 5, 5' -tetrapheny 1 - iiji aZ〇le) . (Related documents are described in Japanese Unexamined Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. ^ = Come, the use of color LCD monitors is not only limited to personal computers, but also R is widely used in color TVs and various surveillance screens (especially the large ini TV), and in this application field, most of them have high color: For the use of salty umbrellas 2: Hereby requires 'general correspondence, 75 in color filtration (high pigment content is used in the photosensitive resin composition. The above-mentioned known photosensitive resin grades are applied to high pigments in 4 in L When the composition of the moon is used, it is impossible to solve the problem of the difference in sensitivity and appearance of the exposure 0. The amount of residue on the first knife and the first layer or the undercut [invention] The purpose of the present invention is to apply On a liquid crystal display or charge

Page 7 1300515

The color of the coupling element is a resin composition containing a chroma, a contrast, and a resin. The light sheet is made of a photosensitive resin and has excellent sensitivity when exposed. There is no undercut and no residue. In particular, it provides the photoreceptor for the color formed by the developed image.

General formula (C2-1), Rc - 0 -, wherein Ra, Rb, Rc represent a hydrogen atom. The composition comprises: an alkali-soluble resin (A), an ethylenically unsaturated group-containing compound (B), a photoinitiator (c), pigment (D) and solvent (Ε) 'The alkali-soluble resin (A) comprises at least one ethylidene-free resin/Alkyl-soluble resin (A1) and at least one ethylenically unsaturated group-containing oxime The soil-soluble resin (Α2), and the alkali-soluble resin (A1) accounts for 40% by weight to 95% by weight of the total amount of the alkali-soluble resin and the alkali-soluble resin (A2); ^ The initiator (c) contains at least a biimidazole Photoinitiator (C1) (hereinafter referred to as photoinitiator port = 1)) and photoinitiator (C2) of general formula (C2-1) (hereinafter referred to as light-up agent (C2)), general formula (hereinafter) C2-1) is

An alkyl group, an aromatic group; a z2 hydrogen atom, a ruthenium of 匕~〇4, a halogen, and a photoinitiator (C2) as a photoinitiator (cl) 10% by weight to 98% by weight of the total amount of the photoinitiator (C2); pigment (D) occupies the soluble resin (A), the ethylenically unsaturated group-containing compound (B), light

Page 8 1300515 V. Description of Invention (4) The total amount of the first sword (C) and the pigment (j) is 28% by weight to 46% by weight in the case of the red photosensitive resin composition, and the green photosensitive resin is composed. The content is 32% by weight to 51% by weight, and in the case of the blue photosensitive resin composition, it is 25% by weight to 45% by weight. Hereinafter, each of the components of the present invention will be described in detail: (A) Alkali-soluble resin The alkali-soluble resin (A) of the present invention contains at least one alkali-soluble resin (A丨) containing no ethylenically unsaturated group and at least one ethylene-containing resin. The unsaturated resin (A2) and the alkali-soluble resin (A1) account for 4% by weight to 95% by weight of the total amount of the alkali-soluble resin (A1) and the alkali-soluble resin (42). It is 50% by weight to 90% by weight, more preferably 52% by weight to 88% by weight, and the soluble resin (A丨) is in the total amount of the alkali-soluble resin (A1) and the alkali-soluble resin (A 2 ). When the content is less than 4% by weight, there are residues, undercuts, etc. When the problem exceeds 9.5 wt%, the sensitivity is poor. The soluble resin (A1) is made up of 5 to 5 parts by weight of an ethylenically unsaturated monomer (Mb 1) containing one or more acid-reducing groups (hereinafter referred to as monomer (M1-1)), and the like. The copolymerized ethylenically unsaturated monomer (abbreviated as monomer (Ml-2)) is copolymerized in an amount of 95 to 50 parts by weight. The above single-U and monomer (Ml-2) total 100 parts by weight. Specific examples of the above ethylenically unsaturated monomer having one or more carboxylic acid groups include: acrylonitrile, acryl, crotonic acid α-chloroacrylic acid, ethacrylic acid, and humic acid. Unsaturated monocarboxylic acids; unsaturated dicarboxylic acids & needles such as maleic acid, maleic anhydride, toconic acid, itaconic anhydride, citraconic acid and citraconic anhydride; unsaturated polyvalents above 3 valences Carboxylic acid (anhydride) and the like. 1300515 V. DESCRIPTION OF THE INVENTION (5) The above-mentioned ones are preferably acrylic acid or methacrylic acid. These ethylenically unsaturated monomers having one or more carboxylic acid groups may be used singly or in combination of plural kinds. Specific examples of the above other copolymerizable ethylenically unsaturated monomer (Ml-2) include aromatics such as styrene, α-mercaptostyrene, vinyltoluene, p-ethylene styrene, and methoxystyrene. Vinyl compound; fluorenyl-phenylmaleimide, fluorene-o-p-phenyl-phenyl-male S&imine, hydrazine-m-phenyl-p-maleimide, hydrazine-p-hydroxyphenyl Maleate, fluorene-o-methylphenyl-Malazine|amine, Ν_m-nonylphenylmaleimide, Ν-p-methylphenylmaleimide, hydrazine _ o-methoxyphenyl maleimine, hydrazine-m-methoxyphenyl maleimide, Ν-p-methoxyphenyl maleimide, Ν-cyclohexylmalay Maleimide such as quinone imine; methyl acrylate, methyl methacrylate, ethyl acrylate, ethyl methacrylate, n-propyl acrylate, methacrylic acid, n-propyl ester, isopropyl acrylate Ester, isopropyl methacrylate, n-butyl acrylate, n-butyl methacrylate, isobutyl acrylate, isobutyl methacrylate, second butyl acrylate, second butyl methacrylate, acrylic acid third Butyl ester Tert-butyl methacrylate, 2-hydroxyethyl acrylate, 2-hydroxyethyl methacrylate, 2-hydroxypropyl acrylate, 2-hydroxy methacrylate propyl ester, 3-hydroxypropyl acrylate, A 3-hydroxypropyl acrylate, 2-hydroxybutyl acrylate, 2-hydroxybutyl methacrylate, 3-hydroxybutyl acrylate, 3-hydroxybutyl methacrylate, 4-hydroxybutyl acrylate, methacrylic acid 4-hydroxybutane S, propylene acrylate acrylate, propylene acrylate acrylate, benzyl acrylate, benzyl methacrylate, phenyl acrylate, phenyl methacrylate, triethylene glycol oxime acrylate ( Methoxy triethylene

Page 10 1300515 V. Description of the invention (6) glycol acrylate), meth〇xy triethylene glycol methacrylate, lauryl methacrylate, hydrazine Tertadecyl methacrylate, cetyl methacrylate, octadecyl methacrylate, eicosyl methacrylate , hydrazino acrylate, docosy i methaCry late), etc., unsaturated acid cool type; 0 2 = . Amino vinegar, methacrylic acid 2-aminoethyl vinegar, acrylic acid 2 _ amino acetophenone 2-Aminopropyl acrylate, Acrylic 3 - f and Sa, Tian Gan π μ soil • ^ S曰, methacrylic acid 3 - ammonia-acrylic unsaturated carboxylic acid ammonia-esterified ester; ί clothing propyl propyl ester, A certain oxypropyl propyl ester, unsaturated carboxylic acid, propylene propylene, * yi. ^ ^ 乂 propyl propyl type; vinyl acetate, vinyl propionate, ethylene butyrate Ester and other 铋舻 7 β 卜 ^ ur ^ K ^ A r ^ 夂驮 ethylene rolling; vinyl oxime ether, B _ 暴 暴 B City propyl 哀 罝 罝 ^ ^ ^ M · a soil 稀 propyl propyl propyl propyl _ such as unsaturated ethers, acrylonitrile, 甲 乙 抡 《 《 化 化 化 化 化 化 化 化 化α 'chloroacrylonitrile, cyanide cyanide to find the mouse compound of ethylene · product slightly μ..,,,,0. Μ~7 fDo not, acrylamide, methacrylamide, _ 乳Dilute amine, N-pad Ethyl propyl sulfonium IPP. ! 1 τ olefin female, N_hydroxyethyl decyl acrylamide amide amide, 1,3- succinyl, s τ Alkene. Aliphatic groups such as alkene/propylene, chloropropene, and the like are listed as other copolymerizable vinyl compounds such as stupid ethyl ester, methyl methacrylate, 2-ethyl acetoacetate, and acrylic acid alum. Dilute, N-stupyl maleimide, acrylic acid 2-hydroxyethyl ester, methacrylic acid, and cumene glycol methacrylate are preferred. The unsaturated monomer can be used alone or in combination.

Page 11 1300515 V. INSTRUCTION DESCRIPTION (7) The solvent used in the production of the alkali-soluble resin (A 1 ) of the present invention is generally the most common ones: ethylene glycol methyl ether, ethylene glycol diethyl ether, digan Alcohol methyl ether, diethylene glycol ethyl ether, diethylene glycol n-propyl ether, diethylene glycol n-butyl ether, triethylene glycol methyl ether, triethylene glycol ethyl ether, propylene glycol oxime ether, propylene glycol ethyl ether, dipropylene glycol oxime ether, dipropylene glycol Ethyl ether, dipropylene glycol n-propyl ether, dipropylene glycol n-butyl ether, tripropylene glycol mono methyl ether, tripropylene glycol mono ethyl ether, etc. >poly)alkylene glycol monoalkyl ethers; ethylene glycol oxime ether acetate, ethylene glycol ethyl ether acetate, propylene glycol methyl ether acetate, propylene glycol ethyl ether acetate, etc. (poly) alkylene glycol monoalkane Ether acetates; diethylene glycol dioxime ether, diethylene glycol methyl ethyl ether, diethylene glycol diethyl ether, tetrahydrofuran and other ethers; methyl ethyl ketone, cyclohexanone, 2-heptanone, 3-heptanone and other ketones; -Lactic acid such as methyl hydroxypropionate or ethyl 2-hydroxypropionate Ester; methyl 2-hydroxy-2-mercaptopropionate, ethyl 2-hydroxy-2-mercaptopropionate, methyl 3-methoxypropionate, ethyl 3-methoxypropionate, 3 - decyl ethoxy propionate, ethyl 3-ethoxypropionate, ethyl ethoxyacetate, ethyl hydroxyacetate, methyl 2-hydroxy-3-methylbutanoate, 3-methyl-3 -methoxybutyl acetate, 3-methyl-3-methoxybutyl propionate, ethyl acetate, n-butyl acetate, n-propyl acetate, isopropyl acetate, n-butyl acetate , isobutyl acetate, n-amyl acetate, isoamyl acetate, n-butyl propionate, ethyl butyrate, n-propyl butyrate, isopropyl butyrate, n-butyl butyrate, acetonide acetate Other esters such as ethyl pyruvate, n-propyl pyruvate, methyl acetate, ethyl acetate, ethyl 2-oxybutyrate, etc.; aromatic hydrocarbons such as toluene and xylene; N- Methylpyrrolidone, N,N-dimethyl

Page 12 1300515 V. Description of the invention (8) Carboxamides such as guanamine, N,N-dimethylacetamide, and the like. Among them, propylene glycol oxime ether acetate and 3-ethoxy propyl ketone ester are preferred. These solvents may be used singly or in combination of plural kinds. The initiator used in the production of the alkali-soluble resin (A1) is generally a radical-type polymerization initiator, and specific examples thereof are: 2,2 '-azobisisobutyronitrile (2, 2, _82〇1) 13丄3〇1311七7]:0111七1^16), 2,2'-azobis(2,4-dimercaptocarbonitrile)[2,2'-azobis-(2, 4-dimethylvaler〇nitrile )], 2,2, -azobis(4-methoxy-2,4-dimethylvaleronitrile) [2, 2'-azobis-(4, .methoxy- 2, 4-dimethylvaleronitri le)] An azo compound such as 2,2,- 2,2-azobis-2-methyl butyronitrile, or a benzoic acid compound such as benzoylperoxide. For the purpose of the present invention, the alkali-soluble resin of the present invention contains at least one alkali-soluble resin (A 2 ) containing an ethylenically unsaturated group. Here, the so-called ethylenically unsaturated group-containing alkali-soluble resin (A2) means that the alkali solubility = fat contains an ethylenically unsaturated bond which can participate in photoinitiation polymerization, and has a group such as a carboxylic acid group. a product obtained by reacting a part of a carboxylic acid group of a resin with a carbon-carbon-carbon double bond oxime (eP〇Xy) compound, an acid anhydride group-containing If 2 same day, a carbon-carbon double bond, and a half-vinegar obtained by reacting a compound having a base group Chemical: Anhydrous acrylic resin denatured resin, acrylic acid 4, anti-accumulation of the ester compound and ethylenically unsaturated carboxylic acid compound (It is formed. Among them, the molecular structure It is better to have double-aged seedlings (buphenoi fiu〇rene). Further, τ 3, the alkali-soluble resin (A 2 ) of 5 bisphenolphthalein in the knife and the Ό structure is composed of

1300515 V. Description of Invention (9) A compound having a functional group represented by the general formula (a2-11) is reacted with another copolymerizable compound.

〇— (wherein R represents an independent hydrogen atom, a linear or divalent alkyl group having 1 to 5 carbon atoms, an aromatic group, or a halogen atom), and the functional group represented by the general formula (a2-11) is contained. Specific examples of the compound include an epoxy group-containing bisphenol quinoid compound represented by the general formula (a 2 - 1 2 ) (hereinafter referred to as the compound (A2-12)) and a hydroxyl group represented by the general formula (a2-13). A bisphenol quinoid compound (hereinafter referred to as a compound (A2-13)):

H2c-hch2c—0 V

〇—ch2ch-ch2 General (a2-12) (where R is the same as the general formula (a2-l 1))

Page 14 1300515 V. Description of invention (ίο)

-(RZ〇)mH General formula (a2-13) wherein r is the same as the general formula (a2-11); R1 and R2 are each independently an alkylene group having a carbon number of 1 to 2 0 (a 1 Ky 1 ene ) or an alicyclic oxime functional group having a carbon number of 1 to 20; k, m are each independently an integer of 1 or more. The above other copolymerizable compounds can be exemplified as follows: acrylic acid, mercaptopropionic acid, butyric acid, α-aluminic acid, ethyl acrylate, and cinnamic acid, etc., unsaturated maleic acid, maleic acid No. of acid 'itaconic acid' Benzoic acid, tetrahydrogen phthalic acid, hexahydrophthalic acid, methyl tetrahydro benzene, formic acid, methyl hexahydrophthalic acid, methyl bridge Methyl endo-methylene tet rahydro phthalic acid, chlor end ic acid, dicarboxylic acid such as glutaric acid and its acid anhydride; 1,2,4-benzene a ternary formic acid such as trimellitic acid and an acid anhydride thereof; 1,2,4,5-benzenetetracarboxylic acid ( ❶ pyromellitic acid ) benzophenone tetracarboxy 1i c acid, A tetracarboxylic acid such as bipheny1 tetracarboxylic acid, biphenylether tetracarboxylic acid or the like thereof and a dibasic carboxylic acid thereof. The soluble resin (42) of the present invention is not particularly suitable in the production process. limit

Page 15 1300515 V. Description of Invention (11), the following three methods (Manufacturing Method I to System M) are described below.

Process I The compound (A 2 - 1 2 ) is first reacted with (meth)acrylic acid to obtain the bisphenol oxime epoxy (meth) acrylate represented by the general formula (a2-l 4) (epoxy (meth) )acrylate) compound (hereinafter referred to as compound (A2-14))

In the above formula (a2-14), the above formula "R is different from the general formula (a2-11), and R3 represents hydrogen (j|) biting thiol (CH3). ^ 〆 The compound (A 2 - 1 4 ) is then reacted with a single species of polyhistidic acid or its acid anhydride. For example, the acid anhydride of the compound (A2-14) and the dicarboxylic acid is heated in a solvent such as ethoxyethyl acetate or butyloxyacetate to obtain an ethylenic unsaturation. A double bond and an alkali-soluble resin which can be represented by the following general formula (hereinafter referred to as a resin (A 2 - 15 )). 0—x—0—CO—Y — C0 ^ General formula (a 2 _ 1 5)

Page 16 1300515 V. Description of Invention (12) In the general formula (a2-15), X can be expressed as follows: general formula (a2-16) (hereinafter referred to as compound (a 2 - 16)); Y table binary tickic acid The residue remaining in the acid anhydride compound to remove the acid anhydride group, that is, the acid anhydride of the dicarboxylic acid can be represented by the following general formula (^-17) (hereinafter referred to as the compound (A2';; 17)); The integer of m or more is preferably an integer of 1 to 2 〇.

General formula (a2-16) (in the above formula, 'R and R3 are the same as the general formula (a2-14))

General formula (a2-17) In the above, "a single type of polycarboxylic acid or an acid anhydride thereof" means that the type of polycarboxylic acid or its acid anhydride can only be selected from dicarboxylic acids or It is an acid anhydride, a tricarboxylic acid or an acid anhydride thereof, a tetracarboxylic acid or an acid anhydride thereof. Process method Π Mixture of compound (A2-14) with dicarboxylic acid of the dicarboxylic acid and dibasic acid of the carboxylic acid in acetic acid ethoxylate: or butyl acetate

Page 17 1300515 V. INSTRUCTION DESCRIPTION (13) An alcohol-soluble solvent such as an ethyl ester is heated to obtain an alkali-soluble resin containing an ethylenic unsaturated double bond and a carboxyl group. The alkali-soluble resin of the oxime method can be represented by the following general formula (a2-18) (hereinafter referred to as the resin (A2-18)). C〇〇H 〜X—〇一CO—Y—CO — P 〇X~0—CO—z—CO— General formula (a2-18) In the above formula, X, Y and general formula (a2 - 15) Representing the same; Z table four $ carboxylic acid acid di-anhydride compound, the residue remaining after removing the dianhydride group, that is, the acid anhydride of the tetracarboxylic acid can be represented by the general formula (a2 - 19) The integers of P and q above 1 are preferably integers between 1 and 2 0. 9 9 V V general formula (a2_19) δ ό

In the above, "a mixture of a dibasic acid-acidic anhydride and a tetrabasic carboxylic acid hydrolysate" means that the reaction is required to be in the acid anhydride of the quaternary acid and the acid of the quaternary carboxylic acid. The conditions are carried out under the same conditions. Process H The compound (A2-14) is first reacted with a tetrabasic carboxylic acid di-anhydride in an ester solvent such as ethoxyethyl acetate or butoxyethyl acetate. After the reaction, a dicarboxylic acid is further added. The acid anhydride of the acid is subjected to a heating reaction to obtain an alkali-soluble resin containing an ethylenically unsaturated double bond and a carboxyl group.

1300515 V. INSTRUCTION DESCRIPTION (14) The alkali-soluble resin of the melon can be expressed by the following general formula U2-20 (hereinafter referred to as resin (A2-20)).

COOH

HOOC—Y—C-0-X—0—CO—one of the c〇—〇 COOH

〇^ II 0-CY-COOH General formula (a2-20) Upper / '乂' ¥ and 2 are the same as the general formula (a2-18), r is an integer above 1 but an integer of 1~2〇 Preferably. In the synthesis reaction of the above-mentioned Process I~m for the determination of the soluble resin, the reaction temperature of the compound (A 2 - 14 ) and the polyoxonic acid and its acid anhydride is preferably 50 to 130 C 'more preferably ~i2〇 °c. In the synthesis reaction of the alkali-soluble resin (A2) of the above Process I to HI, '1 hydroxy group based on the compound (A 2 - 1 4 ), and the acid anhydride contained in the acid anhydride of the polycarboxylic acid used The base is preferably 〇. 4 to 1 equivalent, more preferably 0. 7 5 to 1 equivalent. In the above synthesis process and the synthesis reaction of the soluble resin (a 2 ), the molar ratio of the acid anhydride of the dicarboxylic acid to the acid anhydride of the tetracarboxylic acid is preferably 1 / 9 9 to 9 0 / 1 0, more preferably 5 / 9 5 to 8 0 / 2 0 〇 (B) The compound containing an ethylenically unsaturated group is based on the alkali-soluble resin (A) 100 parts by weight, and the present invention contains ethylenic unsaturated The compound (B) is used in an amount of usually 1 to 500 parts by weight, preferably 30 to 400 parts by weight, more preferably 50 to 300 parts by weight. The above ethylenically unsaturated group-containing compound (B) has at least one

Page 19 1300515 V. INSTRUCTIONS (15) Ethylene-unsaturated compounds of ethylenically unsaturated groups. Specific examples of the compound having an ethylenically unsaturated group include: acrylamide, (mercapto) propylene morpholine, (mercapto) acrylate-7-amino-3,7-dimethyloctyl ester, isobutylene Oxidyl (meth) acrylamide, isobornyl oxyethyl (meth) acrylate, isobornyl (meth) acrylate, 2-ethylhexyl (meth) acrylate, ethyl dian Alcohol (mercapto) acrylate, third octyl (meth) acrylamide, diacetone (meth) acrylamide, dimethyl amino (meth) acrylate, dodecyl (meth) acrylate , (meth)acrylic acid > dicyclopenteneoxyethyl ester, dicyclopentenyl (meth)acrylate, N,N-dimercapto (meth) acrylamide, tetrachlorobenzene (mercapto) acrylate Ester, (mercapto)acrylic acid-2-tetrachlorooxyethyl acetonate, (meth)propionic acid four rat syrup, tetrabromophenyl (meth) acrylate, (mercapto) acrylate-2 - tetrabromo Phenoxyethyl ester, (meth)acrylic acid-2-trichlorophenoxyethyl ester, tribromophenyl (meth)acrylate, (trisyl)acrylic acid-2-tribromophenoxy Ester, 2-hydroxyethyl (meth) acrylate, 2-hydroxypropyl (meth) acrylate, vinyl caprolactam, N-vinyl tyrosinone, phenoxy (meth) acrylate Ethyl ester, pentachlorophenyl (meth) acrylate, pentabromophenyl (meth) acrylate, polyethylene glycol mono (meth) acrylate, propylene glycol (meth) acrylate, (mercapto) acrylic acid Borneol ester and the like. Specific examples of the ethylenically unsaturated compound having two or more ethylenically unsaturated groups include ethylene glycol di(meth)acrylate, di(indenyl)acrylic acid dicyclopentenyl ester, and three Glycol diacrylate, tetraethylene glycol di(meth)acrylate, tris(2-hydroxyethyl)isocyanate bis(indenyl)acrylate, tris(2-hydroxyethyl)isocyanate tri(meth)acrylate , caprolactone modified three (2

Page 20 1300515 V. INSTRUCTIONS (16) -Hydroxyethyl)isocyanate tris(meth)acrylate, tris(methyl)propyl tris(meth)acrylate, ethylene oxide (hereinafter referred to as E0) modified Trimethylolpropyl tris(meth)acrylate, propylene oxide (hereinafter referred to as hydrazine) modified tris(meth) acrylate trimethylol propyl ester, triethylene glycol di(meth) acrylate, neopentyl Diol (meth) acrylate, 1,4-butanediol di(meth) acrylate, 1,6-hexanediol di(meth) acrylate, pentaerythritol tri(meth) acrylate, pentaerythritol Tetra (meth) acrylate, polyester di(meth) acrylate, polyethylene glycol di(meth) acrylate, dipentaerythritol hexa(methyl) propylene > acid ester, dipentaerythritol penta (methyl) Acrylate, dipentaerythritol tetrakis(meth)acrylate, caprolactone modified dipentaerythritol hexa(meth) acrylate, caprolactone modified dipentaerythritol penta (meth) acrylate, tetra(methyl) Ditrihydroxydecyl acrylate, E0 modified bisphenol A II Acrylate, P0 modified bisphenol A di(meth) acrylate, E0 modified hydrogenated bisphenol A bis(indenyl) acrylate, P 0 modified hydrogenated bisphenol A bis(indenyl) acrylate Ester, P0 modified tripropionate, E0 modified bisphenol F bis(indenyl) acrylate, phenolic polyglycidyl ether (meth) acrylate, and the like. Among the above ethylenically unsaturated compounds, preferred are tripropyl methyl propyl triacrylate, E 0 modified trimethylol propyl triacrylate, and P 0 modified tris acrylate trimethylol propyl acrylate. Ester, pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol hexaacrylate, dipentaerythritol pentaacrylate, dipentaerythritol tetraacrylate, caprolactone modified dipentaerythritol hexaacrylate, ditrihydroxymethyl propyl tetraacrylate Ester, P0 modified glycerol propionic acid S. (C) Photoinitiator

Page 21 1300515 V. INSTRUCTION DESCRIPTION (17) ^ The photoinitiator (C) of the present invention contains at least a photoinitiator containing a bisimidazole photoinitiator (ci) and a general formula (c2 - fluorene) ( C2), and 10% by weight to 98% by weight of the photoinitiator (c2) f photoinitiator (Cl) and the photoinitiator (C2) is preferably 20% by weight to 95% by weight. Preferably, the light-initiating agent (C 2 ) accounts for less than 10% by weight of the total amount of the photoinitiator (c 1 ) and the photoinitiator (c 2 ), and the sensitivity is poor, exceeding 98. At the weight %, there is a problem of undercutting.

General formula (c2-l)

(wherein Z!-Table Ra -, Rb - S -, Rc - 〇-, wherein Ra, Rb, hydrogen atom, alkyl group, aromatic group; Z2 hydrogen atom, q to C4 alkyl group, halogen ). The total amount of the photoinitiator (C1) and the photoinitiator (C2) of the present invention is generally 1 to 1 part by weight based on 100 parts by weight of the ethylenically unsaturated group-containing compound (B).

200 parts by weight, preferably 5 to 150 parts by weight, more preferably 1 to 1 part by weight. Specific examples of the photoinitiator (C1) in the present invention are: 2, 2, - double (o-gas) 4,4',5,5'-tetraphenyl-diimidazole (2,2,-1,3,5,5'-tetraphenyl-biimidazole), 2 , 2'-bis(o-fluorophenyl)-4,4',5,5'-tetraphenyl dimium (2,2,-bis (o-fluoropheny 1)-4, 4',5, 5, -tetraphenyl-bi imidazole

Page 22 1300515 V. INSTRUCTIONS (18) ), 2, 2'-Bis(2,4-diphenyl)-4,4',5,5'-tetraphenyldiimidazole (2, 2' -bis(2,4-dichlorophenyl)-4,4',5,5'-tetraphenyl-biimidazole), 2,2'-bis(o-nonyloxyphenyl)-4,4',5,5' - four stupid base: ^^(2,2'-1) ί3(〇-πΐ6ΐ:1ιοχγρ1ΐ6ηγ1)-4,4',5,5'-tetraphenyl-biimidazole), 2, 2'-bis(p-oxyl Stupid)-4, 4',5,5'-tetraphenyldipropion (2,2'-bis(p-methoxyphenyl)-4, 4',5,5'-seven 61:factory &01161171 -1) 111111(182〇16), 2,2'-bis(2,4-dimethoxyoxyphenyl)-4,4',5,5'-tetraphenyldiimidazole (2,2'- 1^8(2,4-^diethoxyphenyl)-4,4J, 5,5,-tetraphenyl-biimidazole) and the like. Specific examples of the photoinitiator (C 2 ) in the present invention are: ethane ketone, 1-[9-ethyl-6-(2-mercaptobenzoic acid)-9-hydrogen-yield--3 Base]-, 1-(oxy-B' 醯月亏) [Ethauone, l-[9-ethyl-6-(2-methylbenzoyl)-9H .-carbazole-3-yl] -, 1-(0-acetyloxime )] (trade name: CGI-242, manufactured by Ciba Specialty Chemicals, the structural formula is as shown in formula (c2-ll)), saponin, 1-[9-ethyl-6-(2-chloro-4-phenylene) Yellow-based benzoquinone-based -9-nitrogen--------------------------------- Benzyl sulfonyl benzoyl)-9H-❶carbazole-3-yl] -, l-(0-acetyloxime)] (manufactured by Asahi Kasei Co., Ltd., the structural formula is as shown in formula (c 2 - :l - 2 )).

Page 23 1300515 V. Description of invention (19)

Further, in the photosensitive resin composition of the present invention, a photoinitiator (c') other than the pre-lighting initiator (c) may be further added as needed. Specific examples of the photoinitiator (C ') are, for example, a photoinitiator (after (2), a compound of the formula (ο X ime ), an acetophenone compound, a benzophenone _ ^,>f complex, α-二西同di ketone ) class 4 conjugate, keto alcohol (acy 1 〇i η ) compound, ketone ether (acy 1 〇inether) compound, phosphine An acylphosphine oxide compound, a qui η ο ne compound, an iS-containing compound, a peroxide, or the like. Specific examples of the compound other than the above photoinitiator (C 2 ) are: 1-(4-phenyl-thio-phenyl)-butan-1,2-dione 2-posto-oxy-benzene Acid ester

Page 24 1300515 V. Description of the invention (20) [l-4-phenyl-thio-phenyl)-butane-l, 2_dion 2-oxime-〇-benzoate], 1-(4-phenyl-thio-phenyl )-辛烧-1,2 -keto-2-indole-oxy-benzoate [1-(4-卩1^1^1-1:1^〇11^1^1)-〇(:7 81^-1,2-dion 2-〇xime - Ο-benzoate 】(Product name: CGI-124 '

Ciba Specialty Chemicals, 1-(4-phenyl-thio-phenyl)-octane-1-one post-oxy-acetate [1-(4-?[161^1-1:1^〇 -01161171)-octane-1- on oxime-〇-acetate], 1-(4-phenyl-thio-phenyl)-butan-1-one post-oxy-acetate [1-(4-? 1^1171-七1^〇-|Phenyl)-butane-l-on oxime- Ο-acetate], etc.; specific examples of the acetophenone compound: p-dimethylamino-acetophenone, ,, α'-dimethoxy azo acetophenone (α, α'-dimethoxyazoxyacetophenone), 2,2'-dimethyl-2-phenylacetophenone (2,2'-(11111611171-2 -01161^13〇61:〇011〇11〇116), p-methoxy acetophenone, 2-mercapto-l-(4-mercaptostone through phenyl)-2 2-methyl-l-(4-methylthio phenyl)-2-morpholino propane-1-on, 2_mercapto-2-N,N-dimethylamine-1-( 4-benzyl-2-N, N-dimethylamino-l-(4-morpholinophenyl)-l-butanone, etc.; specific examples of benzophenone compounds such as thiophene Thioxonth ο ne , 2,4-: 6*_Ι_(2,4-(Η6ΐ1ιγΗΜοχ3ηΐΙι&ηοη6), _thioxanthone-4-sulfone, benzophenone, 4,4'-bis(diamine) Benzene [4,4'-bis( dimethylamino)benzophenone], 4,4'-bis(diethylamino)benzophenone, etc.; α-diketones

Page 25 1300515 V. Description of the invention (21) Specific examples of the compound, for example, benzil, acetyl, etc.; specific examples of keto alcohol compounds such as: benzophenone (beηζ 〇i η ) Etc.; specific examples of ketol ether compounds such as: benzophenone oxime ether (be η ζ ο i η me thy 1 ether ), diphenyl ethene oxime ether (be nzo ine thy 1 ether ), benzophenone Specific examples of benzoin isopropyl ether; phosphine oxide compounds: 2,4,6-trimethyl adenyl phosphine oxide (2,4,6-trimethyl-benzoyl

(11 mouth 1161171 mouth 11〇30]^116〇1(16), bis-(2,6-dimethoxybenzoquinone)-2,4,4-trimercaptophenylphosphine oxide [1) 13-(2,6-(^11161±〇乂7-匕6112〇71) -2,4,4-trimethylbenzyl phosphineoxide], etc.; specific examples of quinone-like compounds: anthraqui η ο ne , 1 , 4-naphthoquinone, etc.; specific examples of halogen-containing compounds such as: phenacyl chloride, tribromomethy1 pheny1su1fone, tris(trichloromethyl) - s - tris (trichloromethyl)-s-triazine, etc.; specific examples of peroxides such as: di-tertbutylperoxide, etc. The above photoinitiator (C1) In the photoinitiator of the photoinitiator (c 2 ) and the photoinitiator (c), the photoinitiator of the same type may be selected as a single specific example or may be mixed in two types. Or two or more specific examples. The photoinitiator (C') of the present invention may be used in an amount of 〇~1 5 基于 based on the weight of the compound (β ) 1 〇 Q by weight of the ethylenically unsaturated group-containing compound. The amount of parts, preferably 1 parts by weight 〇~ 80 'more preferably 〇~5〇 parts by weight. (D) a pigment

Page 26 1300515, invention description (22) red; (8), photoinitiator (c), pigment (8) total amount V τ 戌 precursor resin composition is 28 wt% ~ 46 cc /, in two ° ~ 44 The weight %, more preferably 36% by weight to 42% by weight Q / · ° 2 is preferably 32 Μ ^ when the fat composition is 32% by weight to 51% by weight, compared to / in the green photosensitive weight. /. More preferably, 38 weights, 48 weights, V, two weights, 36 weights, weights, weights, weights, weights, weights, weights, weights, weights, weights, weights, weights, weights, weights, weights, weights, weights, weights, weights, weights, weights, weights, weights, The physical balance of sensitivity. The pigment (8) may be an inorganic pigment or a few people belonging to the genus of the genus, the metal, and the salt, and the weight of the bismuth, and the weight of the bismuth. ~42% by weight, 81, such as magnesium, chromium, lead, and antimony, iron, cobalt, aluminum, cadmium, lead, copper, titanium metal oxides, and specific examples of the aforementioned metal organic pigments are:丨·Pigment Yellow 1,3, 11, 12, 20, 24, 31, 53, 55, 60, 61, 83, 93, 95, 97, 98, 99, 100, 109, 113, 114, 116, 117 128 , 129,138,139, 150, 151 156, 166,167,168, 175 〇C· I·Pigment Orange 1,5, 13, 14, 38, 4〇, 43, 46, 49, 51, 61, C · I·Pigment Red 1,2, 3, 4, 5, 12, 14, 15, 16, 17, 18, 19,:

Page 27 48:1, 48:2, 48: 3,48: 4, 53:1, 57,57:1, 57:2, 63:2, 6 4:1, 81: 1,83, 88, 105, 106, 108, 112, 113, 149, 150, 151, 155, 166, 175, 176, 177, 178, 179, 193, 194, 20 2, 2 0 6, 2 0 7, 224, 2 26, 242, 2 43, 24 5, 29, 32, 36, 38, 39. 15:3, 15:4, 15: 6, 16, 22, used or mixed in two or more

1300515 V. INSTRUCTIONS (23) 32, 37, 38, 40, 41, 42, 49:1, 49 : 2,50 : 1,52 :1, 58:2, 58 : 4, 60:1, 63 : 1, 90:1, 97, 101, 102, 104, 114, 122, 123, 144, 146, 168, 170, 171, 172, 174, 180, 185, 187, 188, 190, 208, 2 0 9, 215, 216, 2 20, fc254, 2 5 5, 2 64, 2 6 5 〇C :.I. j Pigment 'Purple 1, 19, 23, C :.I. j Pigment Blue 1, 2, 15, 60 , 66 〇 CI Pigment Green 7, 3 6, 3 7. C. I. Pigment brown 23, 25, 28. C. I. Pigment Black 1, 7. The pigment may be used alone in the photosensitive resin composition for the color filter of the present invention. The average particle diameter of the primary particles of the pigment (D) is preferably from 1 to 2 nm, more preferably from 2 to 150 nm. Li Jia is 3〇~i〇〇nm. Grinding is carried out by pulverization and refining (referred to as the specific example of the researcher's hand>, the pigment is mechanically, and then the lean solvent is used, and the method is used to dissolve the pigment in the good solvent precipitation method); or in the pigment Synthesis: Pigment precipitation of the parent fine particle size (referred to as ° k, to produce a finer particle size)

1300515 V. Description of invention (24) Materials (referred to as synthetic precipitation method) and so on. In the photosensitive resin composition for a color filter of the present invention, (1) the alkali-soluble resin (A1) accounts for the total amount of the alkali-soluble resin (A1) and the alkali-soluble resin (A2) under the conditions according to the present invention. 4% by weight to 95% by weight, (2) the photoinitiator (C2) accounts for 10% by weight to 98% by weight of the total amount of the photoinitiator (c丨) and the photoinitiator (c 2 ), And (3) the content of the pigment (D) in the alkali-soluble resin (A), the compound containing the gastric ethylenically unsaturated group (B), the photoinitiator (C), and the pigment (D) 3 in red In the case of the photosensitive resin composition, it is 28% by weight to 4.66%. The % of the green photosensitive resin composition is 32% by weight to 55% by weight. When the photosensitive resin composition is used, it is 25 % by weight. ～45 wt%, the photosensitive resin composition is coated, and the sensitivity is good when exposed, and the amount of residue on the unexposed portion and the light-shielding layer on the substrate after development is small, no undercut, and formed. The color filter and contrast of the color filter are good. When the photosensitive resin composition for a shirt color filter of the present invention is applied to a high-precision liquid crystal or a television, the average particle diameter of the high-content secondary particles can be used in the photosensitive resin composition. The pigment is obtained by the pigment; in particular, the method of coating, drying, pre-baking and post-baking the photosensitive resin composition is formed on the substrate - after (4) === 'The photosensitive resin was measured by a colorimeter (C light source). It was not x, y, and its chromaticity coordinate value was in the following range (1) Red photosensitive resin layer (〇· 62 Sx $〇 · 67) and (〇· 26 $〇_ 41) (2) Green photosensitive resin layer

Page 29 1300515 V. INSTRUCTIONS (25) (3) Also, (1) (2) (3) (〇·11 Sx $0.32) and (〇. 58 $〇·75) Blue photosensitive resin layer (〇·10 Sx $0· 21) and (〇· 04 $〇· 13) The chroma values of high chroma are in the following ranges: red photosensitive resin layer (〇· 65 $0.67) and (〇. 29 $〇· 37) green Photosensitive resin layer (〇·12 $0.29) and (〇·6〇$y $〇·75) Blue photosensitive resin layer (〇· 11 Sx $0· 19) and (〇· 04 gy $〇·1〇) The pigment (D) of the present invention may be accompanied by a dispersing agent if necessary. Such dispersants are, for example, surfactants such as cationic, anionic, nonionic, amphoteric, polyoxyalkylene, and fluorine. Specific examples of the second surfactant are: polyethylene oxide dodecyl ether, oxirane stearyl ether, polyethylene oxide oleyl ether, etc. Polyethoxyethylene alkyl phenyl ethers such as polyethylene oxide octyl phenyl ether, polyethylene oxide nonyl phenyl ether; polyethylene glycol dilaurate, polyethylene glycol distearyl Polyethylene glycol diesters such as acid esters; sorbitan fatty acid esters; fatty acid modified polyesters; tertiary amine modified urethane oxime, the following trade name ΚΡ (Shinoshi Chemical industry), sf?_8427 (

Toray Dow Corning Silicon Co., Ltd., Polyfl〇w (manufactured by Kyoei Oil & Fat Chemical Industry Co., Ltd.), Evdop [F_Top, manufactured by Tochem Products Co., Ltd.], Kafak (Megafac 'Daily Ink Chemical Industry Co., Ltd.), Frodo (Fiuorade, Sumitomo 3M system

Page 30 1300515

'Asahi's species above five, invention description (26)), Assac (Asah i Guard), Safron (Surf Ion) and so on. These surfactants may be used singly or in combination. (E) Solvent In the photosensitive resin composition of the present invention, the pigment (the other components are usually dissolved in a suitable organic solvent (E) to prepare a liquid mixture, and then the pigment (D) is uniformly mixed. For the choice of solvent (E), it is necessary to select an alkali-soluble resin (VIII), an ethylenically unsaturated group-containing compound I (B), α and a photoinitiator (6), and do not interact with the components. The solvent having a suitable volatility is used. The solvent (Ε) of the photosensitive resin of the present invention is generally used in an amount of 5 〇〇 5 5, 〇〇〇 by weight, based on 100 parts by weight of the alkali-soluble resin (Α). The soil is 80 〇 to 4,500 parts by weight, more preferably 1, 〇〇〇 4, 〇〇〇 by weight. 乂 # π The above solvent (Ε) may be selected from the above-mentioned alkali-soluble resin (Α) polymerization process. The solvent is not mentioned here. It is also preferred to use propylene glycol alpha propyl propionic acid. The solvent may be used alone or in combination. 'The photosensitive resin composition of the present invention is used for improving the coating purity = using the interface ?[Based on the test of soluble resin (A".: part, more preferably 0~3 parts by weight , the above car is also 0~4 weight

^ C D) t ^ φ ^ ^ ^ -I ^ II Adding a charge, if necessary, adding a high score other than the individual resin (A)

Page 31 1300515 V. INSTRUCTIONS (27) Sub-compounds, adhesion promoters, antioxidants, ultraviolet absorbers, anti-agglomerates, and the like. In addition, based on 100 parts by weight of the alkali-soluble resin (A), the filler of the present invention, a polymer compound other than the soluble resin (A), an adhesion promoter, an antioxidant, an ultraviolet absorber, an anti-agglomerating agent, and the like are added. The amount of the substance to be used is usually 0 to 10 parts by weight, preferably 0 to 6 parts by weight, more preferably 0 to 3 parts by weight. Specific examples of the above additives include glass or aluminum fillers; alkali-soluble trees such as polyvinyl alcohol, polyethylene glycol monoalkyl ether, and polyfluoroalkyl acrylate; and polymer compounds other than the lipid (A); Vinyl trimethoxy decane, vinyl triethoxy sulphur, ethylene tris(2-decyloxyethoxy), N-(2-aminoethyl)-3-aminopropyl Alkyl oxalate, N-(2-aminoethyl)-3-aminopropyltrimethoxy sulphate, 3-aminopropyldiethoxy sylvestre, 3-glycidylpropyl propylate曱oxydecane, 3-glycidylpropyl decyl decyloxydecane, 2-(3,4-epoxycyclohexyl)ethyltrimethoxy decane, 3-apropyl propylmethyl hydrazine a adhesion promoter such as oxydecane, 3-chloropropyltrimethoxydecane, 3-methylpropoxypropyltrimethoxy decane, 3-thiolpropyltrimethoxydecane; 2, 2 - An antioxidant such as thiobis(4-methyl-6-tert-butylphenol) or 2,6-di-tert-butylphenol; 2-(3-tert-butyl-5 >-A Ultraviolet absorption of benzyl-2-hydroxyphenyl)-5-phenylphenyl azide, alkoxyphenone, etc. ; And anti-coagulant such as sodium polyacrylate. In the method of forming a color filter of the present invention, the above-described color filter photosensitive composition is applied onto a substrate by a coating method such as rotary coating, cast coating or roll coating. After coating, most of the solvent is removed by drying under reduced pressure, and the solvent is pre-baked (p r e - b a k e )

Page 32 1300515 V. INSTRUCTIONS (28) Remove to form a pre-baked film. The conditions for drying under reduced pressure and pre-baking vary depending on the type of each component and the blending ratio. Usually, the drying under reduced pressure is carried out under a pressure of 0 to 20 Omm-Hg for 1 second to 60 seconds, and pre-baked. It is carried out at a temperature of 70 to 1 10 ° C for 1 minute to 1 5 minutes. After pre-baking, the pre-baked film is exposed to a designated mask, and is immersed in a developing solution at a temperature of 23 ± 2 ° C for 15 seconds to 5 minutes for development, and is partially removed to form a pattern. For the light used for exposure, ultraviolet rays such as g-line, h-line, and i-line are preferable, and the ultraviolet device may be a (super) high-pressure mercury lamp and a metal halide lamp. > specific examples of the substrate of the present invention: an alkali-free glass, a soda-lime glass, a hard glass (Pyrus glass), a quartz glass, and a transparent conductive film attached to the glass, etc., for use in a liquid crystal display device or the like; or A photoelectric conversion device substrate (for example, a germanium substrate) used for a solid-state imaging device or the like. These substrates generally form a light-shielding layer that separates the colored layers of the respective pixels. Further, specific examples of the developer include: sodium hydroxide, potassium hydroxide, sodium carbonate, sodium hydrogencarbonate, potassium carbonate, potassium hydrogencarbonate, sodium citrate, sodium methyl citrate, ammonia, ethylamine, diethylamine, Dimethylethanolamine, tetraammonium hydroxide, tetraethylammonium hydroxide, choline, pyrrole, acridine, 1,8-diazabicyclo-(5, 4, 0)-7-undecene 01〜1重量百分比。 The alkaline aqueous solution of the present invention, the concentration of the present invention is generally 〇 001 〜 10% by weight, preferably 〇 005 〜 5 wt%, more preferably 0. 01~1 wt%. When a developer composed of such an alkaline aqueous solution is used, it is usually washed with water after development, and then air-dried with compressed air or compressed nitrogen. After that, the final heat treatment (post-bake) is performed by a heating device such as a hot plate or an oven. The heating temperature is 150~250 °C, when using hot plate

Page 33 1300515 V. Description of the invention (29), the heating time is 5 minutes to 60 minutes, and when heated in an oven, the heating time is 15 minutes to 150 minutes. Each color (mainly including red, green, and blue colors) is repeated in the above steps to obtain a halogen colored layer of the color filter. Next, an ITO (Indium Tin Oxide) deposited film is formed on the halogen colored layer at a temperature of 220 ° C to 250 ° C under vacuum, and if necessary, the ITO film is etched and etched, and then coated. The liquid crystal alignment film is fired with polyimide and can be used as a color filter for liquid crystal displays. 〜I [Embodiment] The technical contents, features and effects of the present invention will be clearly shown below in conjunction with the description of the embodiments and comparative examples. [Synthesis Example of Alkali-Soluble Resin (A)] Synthesis Example a 500 Φ liter separable flask was equipped with an air inlet, a stirrer, a heater, a condenser, and a thermometer, and introduced air to be added to the feed composition. The feed composition comprises: a bisphenol fluorene type compound containing 1 part by weight of an epoxy group (ep〇xy) (a compound represented by the formula (a2-21), an epoxy equivalent of 230 , tetramethyl ammonium chloride 0.3 parts by weight, 2 6-di-t-butyl-p-cresol (2,6-di-t-butyl-p-cresol) 〇 · 1 part by weight, 30 parts by weight of acrylic acid and propylene glycol monoterpene ether acetate 丨 3 〇 by weight. Wherein the feeding composition of the feed composition was continuously added, and the feed rate was controlled at 25 parts by weight/min. The reaction temperature during the polymerization was maintained at 丨〇 丨丨〇 丨丨〇 t ' polymerization time of 15 hours. After the reaction is completed, a solid concentration of 5 〇 can be obtained.

Page 34 1300515 V. INSTRUCTIONS (30) % bisphenol seedling type epoxy acrylate (ep〇XyaCry lat color transparent mixed solution (E A )).

e) Light yellow of the compound h2c-hch2c-〇x^^^ ^^/〇-ch2ch-ch

Formula U2-21) 丨 Next 'In a 30 0 ml separable flask, a mixed solution of the above materials is added 1 〇 0 parts by weight, propylene glycol monomethyl ether acetate: dans, benzene tetracarboxylic acid dihydrate 13 parts by weight, And ^, 3, 6 - Si Li - knife = 6 parts by weight, reacted at a temperature of "〇~n5t for 2 hours of chylo: alkali-soluble resin solution. The resin had an acid value of 9.8 g's mg KOH/g and a weight average molecular weight of 42 Å. After the completion of the ☆: completion, the polymerization product was taken out from the separable flask, A2-1). Yikun 14 unsaturated base alkali soluble resin (in the synthesis example b ml separable flask 'added to the pale yellow compound obtained in the synthesis example a: the solution (ΕΑ)_ parts by weight, propylene glycol monomethyl ether acetic acid (iv). Benzene tetracarboxylic acid di-anhydrous 13 4 parts by weight, in the liquid of 9.~95., after 1 hour, after the disappearance of the acid anhydride group, in the reaction ~95Χ:&., 匕2,3' 6 parts by weight of 4 tetrahydro phthalic anhydride, and reacted at 90 ° level for 4 hours to produce a pale yellow transparent alkali soluble tree

1300515 V. Description of invention (31) Lipid solution. The acid value of the resin is 99·3 mg K0H/g, and the weight average molecular weight is 400 〇〇5. After the completion, the polymerization product is taken out from the separable flask, and the gluten is devolatilized to obtain The ethylenically unsaturated group was tested for soluble resin (A 2 - 2 ). In a synthetic volume c, a nitrogen inlet was placed on a four-necked three-necked flask of a volume of 3 ml, and the mixture was stirred: a heating element, a condenser, a thermometer, and a nitrogen gas was introduced into the feed group. The feed composition included · 35 parts by weight of methacrylic acid monomer, 40 parts by weight of 曱J acrylic benzyl acetate monomer, 1 part by weight of styrene monomer, 15 parts by weight of I methyl monomer, and 2 2 for polymerization initiator The base, 8 parts by weight, and 21 parts by weight of ethyl ethoxyacetate, and the mixture of the initiators for polymerization are once all = after polymerization, the polymerization product is from Sihe" 6 Hours. It can be obtained without the suspicion of the squid fishing method. The solvent is detached and the solvent is detached. [The color is not fine and the alkali-soluble resin (Α1). The photosensitive resin of Example t Examples and Comparative Examples of the Compositions] The bases obtained by the synthesis examples, the protrusions and the alkali-soluble tree rU2^;" resin (M-1) 7 parts by weight (solid: starting agent α) 2,2,_: (Guang / II: DPHA for short) 13 parts by weight of stupid diimidazolium 5 heavy 'monochlorophenyl)-4, 4,5, 5' ~tetrasubstituted]- 1- (acetyl oxo ~

Page 36 6~(2~ 曱 贫 贫 々 々 々 先 ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( ( , , , , , 1- 1- 、 、 、 、 、 、 、 、 、 、 、 、 、 (32) 肟) 35 parts by weight, photoinitiator (C') 2 -phenyl-2-N,N-diguanamine oxime: 4 - morpholine phenyl) - 1 - butanone (hereinafter referred to as 3 6 9 ) 2 0 parts by weight, as shown in Table 1, 2500 parts by weight of green pigment, adding solvent propylene glycol oxime ether acetate (hereinafter referred to as PGMEA) 1 300 parts by weight and 3-ethoxypropionic acid B After the ester (hereinafter abbreviated as ΕΕΡ) 1 〇〇〇 by weight, the mixture is prepared by dissolving and mixing with a shaking stirrer to obtain a photosensitive resin composition for a color filter, and the photosensitive resin composition is as follows. The evaluation evaluation method was carried out, and the results obtained are shown in Table 1. In Table 1, A1 / (Α1 + Α 2)% by weight indicates that the alkali-soluble resin (A1) accounts for % by weight of the total amount of the alkali-soluble resin (A 1) and the alkali-soluble resin (a 2 ), C2/(C1+C2) The weight % indicates that the photoinitiator (C2) accounts for the weight % of the total amount of the photoinitiator (C 1) and the photoinitiator (c 2 ), and d / ( a + B + C + D ) wt% represents the pigment. (D) The weight % of the total amount of the alkali-soluble resin (a), the ethylenically unsaturated group-containing compound (B), the photoinitiator (c), and the pigment (j). Examples 2 to 10, ~ The operation method of the same embodiment 1, the formulation and evaluation results are shown in Table 1.

Comparative Examples 1 to 11 The procedure and evaluation results of the operation method of Example 1 are shown in Table 1. [Evaluation Method] (I) Sensitivity The photosensitive resin composition was applied by spin coating to a glass of 100 mm x 100 mm. On the substrate, 4, ^ Q n „ first dry under reduced pressure, pressure 100 _ H g, time 30 seconds, 鈇德爯推/..., Jundan 仃 pre-baked, temperature 80 °C, time 3

1300515 V. INSTRUCTIONS (33) Minutes can form a pre-baked film with a film thickness of 2.5 (four). Optical density level difference table (t D n +

Stouffer company, type, T2 R nSParent SteP Wedge, ,, LA, also #ϋΤ 2 1 1 5 ' optical density level difference is 2 1 etc.) Sticker 'The above pre-baked film, use? ^ After the amount of irradiation, re-impregnated in the heart of the water to control the water of the ^ 80-2, observe the development of the situation, etc.::: 2 points "1 shadow, washed with pure water, Bubu welding #古土士The number of gradings is used as the basis for judging the sensitivity. Here, the more the number of * in the square, the higher the sensitivity. 〇: the number of levels 9~21 | △: the number of levels 7~8 X · the number of special grades 1~6 (2), chroma • PLA-5^ ιηΐ^ο ^ mf # ^ aCan〇n 9 , 〇/, m Cm light illuminate the pre-baked coating film, then immerse in the smear liquid 2 Minutes, washed with pure water, and then baked for 2 〇〇t for 8 〇 minutes to form a photosensitive resin layer with a film thickness of 2·〇 on the glass substrate. ^其—人,色色计(大冢The electronic company, model MCPD) measures the chromaticity coordinates (X, y) of the fortune 5 tree layer, and uses the C light source for measurement. The judgment criteria for chroma are as follows. , Color: (0·12$χ $〇·29) and (0.60sy$0.75) Blue 〇: (ο·ιι$χ^〇·19) and (004 sy$010) Red △ : (0·62$χ<〇·65) and (〇· 26^$〇·41) Green △ : (0· 11 $〇· 32) and (〇· 58 <〇·6〇)

Red 〇: (0·6 5$χ$〇·67) and (〇29^y‘〇37) Page 38 1300515

V. Description of invention (34) Blue △ ••(0·10$χ'0.21) and (〇·ι〇<γ^〇13) Red)Κ: The range other than the above red 〇 and △ green X: above Range other than green 〇 and △ blue X: range other than the above blue 〇 and △ (3), contrast method measured by the method shown in the figure of the brother and the figure of the younger brother (2) The photosensitive resin layer (1) obtained is placed between the two plates (2) and (3), and the light emitted from the light source (4) is sequentially transmitted through the light plate (2), and the photosensitivity The resin layer (1), the polarizing plate (3), and finally the luminance (cd/cm2) of the polarizing plate (3) is measured by a luminance meter (5) (manufactured by T〇pC〇n Co., Ltd., model BM-5 A) Make measurements. As shown in the first figure, when the polarizing direction of the polarizing plate (3) and the polarizing direction of the polarizing plate (2) are parallel to each other, the measured luminance is A (cd/cm2); and „, as shown in the second figure. As shown, when the polarizing direction of the polarizing plate (3) and the polarizing direction of the polarizing plate (2) are perpendicular to each other, the measured luminance is B (cd/cm 2 ); the contrast can be obtained by the luminance A and the luminance B. The ratio (luminance A/luminance B) was calculated and the evaluation criteria were as follows.

Crimson 1200 $ contrast 〇 green 1500 $ contrast 〇 blue 1000 $ contrast Δ red 7 0 0 $ contrast < 1200 Δ green 9 0 0 $ contrast < 1500 Δ blue 6 0 0 S contrast < 1000 X red contrast <700 Page 39 1300515 V. Invention Description (35) X: Green contrast < 9 0 0 X • Blue contrast < 6 0 0 (4), undercut will be evaluated in the evaluation method (22) The resin pattern 'is observed by a scanning electron microscope (SEM), and the undercut was evaluated according to the shape of the edge side. 〇 • As shown in the third figure, the edge angle of the photosensitive resin pattern (1 2 ) (the side wall angle with respect to the substrate (1 4 )) is 0° 1$60°. △ As shown in the fourth figure, the edge angle of the photosensitive resin pattern (2 2 ) (the side wall angle with respect to the substrate (1 4 )) is 60 ° < 0 2 $ 90 ° . X • As shown in the fifth figure, the edge angle of the photosensitive resin pattern (3 2 ) is 90 ° < 0 3 < 180 ° 〇 (5), and the residue is evaluated by the pre-baked coating method of (- -) The specified mask pattern is applied to the above pre-baked film and irradiated with ultraviolet light (Canon PLA-501F) at a light amount of 300 m J / c m2 and then impregnated at 23 ° C. The developer is developed for 2 minutes, the unexposed portion of the substrate is removed, washed with pure water, and baked at 200 ° C for 80 minutes to form a desired photosensitive resin pattern on the glass substrate. Microscopic observation to determine if there is residue in the unexposed part. 〇 No residue Δ A little residue X Residues are reported according to the above evaluation methods. The results are summarized in Table 1.

Page 40 1300515 V. INSTRUCTIONS (36) The above is only the scope of the present invention to limit the equivalent of the scope of the invention, and the equivalent changes are shown in the [Schedule] Table 1 : The composition of the photosensitive resin composition of the present invention is proportional and evaluated. The preferred embodiments are not included in the scope of the invention without departing from the invention. Group of each of the examples and comparative examples 1300515 V. Description of the invention (37)

Page 42 1300515 Brief description of the drawing [Simple description of the drawing] The first figure is a schematic diagram of the comparative measurement state (1) of the photosensitive resin layer. The second drawing is a schematic view of the comparative measurement state (2) of the photosensitive resin layer. The third figure is the first edge side state of the photosensitive resin pattern. The fourth figure is a second edge side state of the photosensitive resin pattern. The fifth figure is a third edge side state of the photosensitive resin pattern. [Explanation of main component symbols] Photosensitive resin layer (1) 0 Polarizing plate (2) Polarizing plate (3) Light source (4) Luminometer (5) • Photosensitive resin pattern (i 2 ) _ Substrate (14) Photosensitive resin Pattern (2 2 ) photosensitive resin pattern (3 2 )

Page 43

Claims (1)

1300515 VI. Patent Application No. 1 · A photosensitive resin composition for a color filter comprising: (1) an alkali-soluble resin (A); (2) a compound (B) containing an ethylenically unsaturated group; a photoinitiator (C) comprising at least one bisimidazole photoinitiator (C1) and at least one photoinitiator (C2) represented by the general formula (c2-1); " (4) Pigment (D); (5) Solvent (Ε); φ wherein 'the alkali-soluble resin (A) comprises at least one alkali-soluble resin (A 1 ) containing no ethylenically unsaturated group and at least one ethylenically unsaturated group The soluble resin (A 2 ) is tested, and the alkali-soluble resin (a 1 ) accounts for 4% by weight to 9.55% by weight of the total amount of the soluble resin (A1) and the alkali-soluble resin (A 2 ); (wherein m ϋ, RC-0-, wherein Ra, Rb, RC represents a hydrogen atom, an alkyl group, an aromatic group; Z2 represents a hydrogen atom, an alkyl group of Ci~C4, a halogen), and a photoinitiator ( C2) 1% by weight of the total amount of photoinitiator (C1) and photoinitiator (C2) / 〇~9 8 8% by weight; pigment (D) is alkali-soluble resin (A), containing ethylene Unsaturated compound (B), photoinitiator (c), pigment Page 44 1300515 6. The content in the total amount of the patent application range (D) is 28% by weight to 46% by weight in the case of the red photosensitive resin composition, and 32% by weight in the case of the green photosensitive resin composition. The weight % is 25% by weight to 45% by weight in the case of the blue photosensitive resin composition. i » I第45页