TW201009498A - Colored photosensitive resin composition, method of forming pattern using ultraviolet laser, method of producing color filter using the pattern forming method, color filter, and display device - Google Patents

Colored photosensitive resin composition, method of forming pattern using ultraviolet laser, method of producing color filter using the pattern forming method, color filter, and display device Download PDF

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TW201009498A
TW201009498A TW098122744A TW98122744A TW201009498A TW 201009498 A TW201009498 A TW 201009498A TW 098122744 A TW098122744 A TW 098122744A TW 98122744 A TW98122744 A TW 98122744A TW 201009498 A TW201009498 A TW 201009498A
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group
substituent
compound
photosensitive resin
resin composition
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TW098122744A
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Chinese (zh)
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Kenta Yamazaki
Masanori Hikita
Tomotaka Tsuchimura
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Fujifilm Corp
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • C—CHEMISTRY; METALLURGY
    • C09—DYES; PAINTS; POLISHES; NATURAL RESINS; ADHESIVES; COMPOSITIONS NOT OTHERWISE PROVIDED FOR; APPLICATIONS OF MATERIALS NOT OTHERWISE PROVIDED FOR
    • C09B—ORGANIC DYES OR CLOSELY-RELATED COMPOUNDS FOR PRODUCING DYES, e.g. PIGMENTS; MORDANTS; LAKES
    • C09B11/00—Diaryl- or thriarylmethane dyes
    • C09B11/04—Diaryl- or thriarylmethane dyes derived from triarylmethanes, i.e. central C-atom is substituted by amino, cyano, alkyl
    • C09B11/10—Amino derivatives of triarylmethanes
    • C09B11/24—Phthaleins containing amino groups ; Phthalanes; Fluoranes; Phthalides; Rhodamine dyes; Phthaleins having heterocyclic aryl rings; Lactone or lactame forms of triarylmethane dyes
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B1/00—Optical elements characterised by the material of which they are made; Optical coatings for optical elements
    • G02B1/04—Optical elements characterised by the material of which they are made; Optical coatings for optical elements made of organic materials, e.g. plastics
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B5/00—Optical elements other than lenses
    • G02B5/20—Filters
    • G02B5/22—Absorbing filters
    • G02B5/223—Absorbing filters containing organic substances, e.g. dyes, inks or pigments
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/0005—Production of optical devices or components in so far as characterised by the lithographic processes or materials used therefor
    • G03F7/0007—Filters, e.g. additive colour filters; Components for display devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/028—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with photosensitivity-increasing substances, e.g. photoinitiators
    • G03F7/031—Organic compounds not covered by group G03F7/029
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/004—Photosensitive materials
    • G03F7/027—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds
    • G03F7/032—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders
    • G03F7/033—Non-macromolecular photopolymerisable compounds having carbon-to-carbon double bonds, e.g. ethylenic compounds with binders the binders being polymers obtained by reactions only involving carbon-to-carbon unsaturated bonds, e.g. vinyl polymers

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Spectroscopy & Molecular Physics (AREA)
  • Optics & Photonics (AREA)
  • Chemical & Material Sciences (AREA)
  • Organic Chemistry (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • Materials For Photolithography (AREA)
  • Optical Filters (AREA)
  • Liquid Crystal (AREA)
  • Polymerisation Methods In General (AREA)

Abstract

The present invention provides a colored photosensitive resin composition and a pattern forming method using ultraviolet laser with high line-width stability for displaying and capable of forming high-resolution patterns. More particularly, the present invention provides a colored photosensitive resin composition and a pattern forming method using ultraviolet laser suitable for forming colored pixels of a color filter. The colored photosensitive resin composition containing: (A) an ethylenically unsaturated compound; (B) a binder resin; (C) a coloring agent; and (D) a photopolymerization initiator of the following general formula (I). In the general formula (I), R and X are respectively a monovalent substituent, A and Y are respectively a divalent organic group, Ar represents an aryl, and n is an integer selected from 0 and 5.

Description

201009498 六、發明說明： 【發明所屬之技術領域】 本發明關於紫外光雷射用著色感光性樹脂組成物、藉 由紫外光雷射曝光之圖案形成方法、使用該圖案形成方法 製造彩色濾光片（color filter)之方法、彩色濾光片、及顯 示裝置。 【先前技術】 彩色濾光片係液晶顯示器（LCD : Liquid Crystal ® Display)所不可欠缺的構成零件。與使用CRT(Cathode Ray Tube)的顯示裝置比較下，液晶顯示器係小型，謀求省電力 化，而且隨著技術的進歩，在性能方面係成爲同等以上， 故正替換CRT當作電視畫面、個人電腦畫面及其它顯示裝 置。 近年來，液晶顯示器的開發係在畫面比較小面積的個 人電腦（personal computer)及監視器（monitor)之用途，而 且在畫面大型且要求高度畫質的TV用途亦展開。 w 於TV用途中，與以往的監視器用途相比，要求更高度 的畫質，即對比（contrast)及色純度的提高。爲了對比的提 高’要求彩色濾光片之形成時所用的感光性樹脂組成物中 所使用的著色劑（有機顏料等）之粒子大小係更微小者。又 ，爲了色純度的提高’要求該感光性樹脂組成物的固體成 分中所佔有的著色劑（有機顏料）之含有率爲更高者。 對於如上述的要求，與將顏料的粒徑更微細化的同時 ’需要分散性更高的顏料分散組成物。爲了提高顔料的分 201009498 散性’通常例如駄花青（phthalocyanine)顔料的表面係被其 衍生物化合物進行顏料表面的改質，使用具有容易吸附所 改質的表面之極性官能基的低分子量樹脂等分散劑，謀求 顏料的分散化或分散安定化，同時得到含有顏料、表面改 質劑及分散劑的顏料分散組成物。然後，於所得到的顔料 分散組成物中’更添加鹼可溶性樹脂、光聚合性化合物、 光聚合引發劑及其它成分而成爲感光性組成物，使用此藉 由微影法（photolithography)等而得到彩色濾光片。 若顏料微細化且顏料的含有率變高，則在以微影法形 ® 成影像圖案時，有損害線寬的安定性等之問題。在TV用 途中特別要求提供廉價的彩色濾光片，以上述顯像步驟爲 中心的問題係降低良率，使生產性變差，故要求改良。 爲了解決上述問題點，有許多提案嘗試藉由彩色濾光 片用的光硬化性組成物所用的光聚合引發劑之改良來提高 感度。例如，有揭示使用特定構造的三畊（triazine)化合物 之光聚合性組成物（例如參照特開平6-2896 1 1號公報）或混 合使用1個或2個以上的二苯甲酮化合物、苯乙酮化合物 © 、噻噸酮化合物之彩色濾光片用光阻（photoresist)(例如參 照特開平9-80225號公報）等。 又，作爲其它提案，有揭示規定由合計感光性組成物 中的黏結劑樹脂與聚合性單體而成的有機化合物之平均雙 鍵當量，而且藉由指定黏結劑樹脂的分子量，經由培燒而 形成順錐形形狀的技術（參照特開2007-938 1 1號公報）。 然而，於此等技術中，曝光步驟、顯像步驟的生產性 201009498 差，無法確保充分的生產性，因此無法減低彩色濾光片的 價格。 爲了提高曝光步驟、顯像步驟的生產性，有提案以雷 射光進行曝光而形成圖案（參照特開2003-287614號公報） 。雷射係與通常使用的水銀燈不同，直進性高，輸出亦大 ，而且也可集中焦點，具有不需要於曝光步驟的圖案形成 時所使用的光罩（mask)之特徴，故被期待。然而，即使用 上述先前技術，在顯像步驟中畫素表面也會皸裂，圖案的 ® 安定性亦不足等，無法滿足彩色濾光片所要求的特性。又 ，從降低彩色濾光片全體的成本（cost)之點來看，作爲曝 光裝置，有提案不使用大的光罩（photomask)者（參照特開 2008-76709號公報、特開2008-5 1 866號公報）。然而，沒 有提示具體的材料，而期望適合於彼等裝置材料之提案。 【發明內容】 發明所欲解決的問題 本發明之目的爲提供對於顯像而言線寬安定性高、可 ^ 形成高解像度的圖案之紫外光雷射用著色感光性樹脂組成 物及藉由紫外光雷射曝光的圖案形成方法，尤其適合於彩 色濾光片的著色畫素等之形成的著色感光性樹脂組成物， 以及藉由紫外光雷射曝光的圖案形成方法。 本發明的再一目的爲提供藉由前述圖案形成方法所得 ，具備對於顯像而言線寬安定性高的畫素，色特性良好， 具有高生產性的彩色濾光片及其製造方法，以及具備該彩 色濾光片而成之對比及色純度高的畫質之顯示裝置。 201009498 解決問題的手段 本發明者進行專心致力的檢討，結果發現藉由以下方 法，可解決上述問題。 <ι>一種紫外光雷射用著色感光性樹脂組成物，其包 含（A)乙烯性不飽和化合物、（B)黏結劑樹脂、（C)著色劑及 (D)下述通式（I)所示的光聚合引發劑：201009498 VI. Technical Field of the Invention: The present invention relates to a coloring photosensitive resin composition for ultraviolet laser light, a pattern forming method by ultraviolet light exposure, and a color filter using the pattern forming method. (color filter) method, color filter, and display device. [Prior Art] A component that is indispensable for a color filter liquid crystal display (LCD). Compared with a display device using a CRT (Cathode Ray Tube), the liquid crystal display is small, and it is required to save power. With the advancement of technology, the performance is equal to or higher, so the CRT is being replaced as a TV screen or a personal computer. Screens and other display devices. In recent years, the development of liquid crystal displays has been used for personal computers and monitors with a relatively small screen size, and the use of TVs with large screens and high image quality has also begun. w In TV applications, higher image quality, that is, contrast and color purity improvement, is required compared to conventional monitor applications. For the purpose of comparison, the particle size of the coloring agent (organic pigment or the like) used in the photosensitive resin composition used for forming the color filter is required to be smaller. Further, in order to improve the color purity, the content of the coloring agent (organic pigment) which is contained in the solid component of the photosensitive resin composition is required to be higher. With respect to the above requirements, a pigment dispersion composition having a higher dispersibility is required while making the particle diameter of the pigment finer. In order to improve the pigment's fraction 201009498, the surface of the phthalocyanine pigment is usually modified by the derivative compound, and the low molecular weight resin having a polar functional group which easily adsorbs the modified surface is used. A dispersant is used to obtain a pigment dispersion composition containing a pigment, a surface modifier, and a dispersant, in order to achieve dispersion or dispersion stabilization of the pigment. Then, an alkali-soluble resin, a photopolymerizable compound, a photopolymerization initiator, and other components are added to the obtained pigment dispersion composition to form a photosensitive composition, which is obtained by photolithography or the like. Color filter. When the pigment is made fine and the content of the pigment is high, there is a problem that the stability of the line width is impaired when the image is formed by lithography. In the case of TV, it is particularly required to provide an inexpensive color filter, and the problem centering on the above-described developing step is to reduce the yield and deteriorate the productivity, so that improvement is required. In order to solve the above problems, many proposals have been made to improve the sensitivity by improving the photopolymerization initiator used for the photocurable composition for color filters. For example, there is a photopolymerizable composition which discloses a triazine compound having a specific structure (for example, refer to JP-A-6-2896 1 1) or a mixture of one or two or more benzophenone compounds and benzene. A color filter for a color filter of an ketone compound, or a thioxanthone compound (for example, see JP-A-9-80225). In addition, as an alternative, it is disclosed that the average double bond equivalent of the organic compound obtained by adding the binder resin and the polymerizable monomer in the photosensitive composition is specified, and by specifying the molecular weight of the binder resin, by firing A technique of forming a tapered shape (refer to Japanese Laid-Open Patent Publication No. 2007-9381-1). However, in such techniques, the productivity of the exposure step and the development step of 201009498 is poor, and sufficient productivity cannot be ensured, so the price of the color filter cannot be reduced. In order to improve the productivity of the exposure step and the development step, it is proposed to form a pattern by exposure with laser light (refer to Japanese Laid-Open Patent Publication No. 2003-287614). Unlike the commonly used mercury lamps, the laser system is expected to have high straightness, large output, and concentrated focus, and has a feature of a mask which is not required for pattern formation in the exposure step. However, even with the above prior art, the surface of the pixel is cleaved in the developing step, and the stability of the pattern is insufficient, so that the characteristics required for the color filter cannot be satisfied. In addition, it is proposed that a large photomask is not used as an exposure apparatus from the point of view of the cost of the entire color filter (see JP-A-2008-76709, JP-A-2008-5). Bulletin No. 1866). However, specific materials are not suggested, and proposals suitable for their device materials are desired. DISCLOSURE OF THE INVENTION PROBLEM TO BE SOLVED BY THE INVENTION An object of the present invention is to provide a coloring photosensitive resin composition for ultraviolet laser light which has high line width stability and can form a high resolution image for development and by ultraviolet light. The pattern forming method of the light laser exposure is particularly suitable for the coloring photosensitive resin composition formed by the coloring pixels of the color filter, and the pattern forming method by laser exposure by ultraviolet light. Still another object of the present invention is to provide a color filter having high line width stability and high color productivity, a method for producing the same, and a method for producing the same, which are obtained by the pattern forming method described above, and have high color stability. A display device having a contrast and color purity of the color filter. 201009498 Means for Solving the Problem The inventors conducted a dedicated review and found that the above problems can be solved by the following methods. <ι> A coloring photosensitive resin composition for ultraviolet light laser comprising (A) an ethylenically unsaturated compound, (B) a binder resin, (C) a colorant, and (D) a general formula (I) ) Photopolymerization initiator shown:

上述通式（I)中，R及X各自獨立地表示一價取代基，A及 Y各自獨立地表示二價有機基’ Ar表示芳基，n係〇〜5的 整數，當X以複數存在時，複數的X各自獨立地表示一價 取代基。 <2>如< 1>記載的紫外光雷射用著色感光性樹脂組 成物，其中前述（D)通式（I)所示的光聚合引發劑係通式（I) 的Υ爲下述構造所示的光聚合引發劑：In the above formula (I), R and X each independently represent a monovalent substituent, and A and Y each independently represent a divalent organic group 'Ar represents an aryl group, and n is an integer of 〇~5, when X is present in plural In the meantime, the plural X each independently represents a monovalent substituent. (2) The coloring photosensitive resin composition for ultraviolet laser light according to the above-mentioned (D), wherein the photopolymerization initiator represented by the above formula (I) is a hydrazine of the formula (I) The photopolymerization initiator shown in the structure:

此處，「*」表示通式（I)中Υ與鄰接的碳原子之鍵結 位置。 < 3>如< 1>記載的紫外光雷射用著色感光性樹脂組 成物，其中前述（D)通式（I)所示的光聚合引發劑係下述通 式（Π)所示的光聚合引發劑： 201009498 ο οHere, "*" represents a bonding position of hydrazine and an adjacent carbon atom in the formula (I). (3) The coloring photosensitive resin composition for ultraviolet laser light according to the above-mentioned (D), wherein the photopolymerization initiator represented by the above formula (I) is represented by the following formula (Π) Photopolymerization initiator: 201009498 ο ο

上述通式（II)中，R及X各自獨立地表示一價取代基，Α表 不一價有機基，Ar表示芳基，η係0〜5的整數，當X以 複數存在時，複數的X各自獨立地表示一價取代基。 &lt;4&gt;如&lt;1&gt;記載的著色感光性樹脂組成物，其中前 φ 述通式（1)中的R所示的一價取代基係可有取代基的烷基、 可有取代基的芳基、可有取代基的烯基、可有.取代基的炔 基、可有取代基的烷基亞磺醯基、可有取代基的芳基亞磺 _基 '可有取代基的烷基磺醯基、可有取代基的芳基磺醯 基、可有取代基的醯基、可有取代基的烷氧羰基、可有取 代基的芳氧羰基、可有取代基的膦醯基、可有取代基的雜 環基、可有取代基的烷基硫羰基、可有取代基的芳基硫羰 基 '可有取代基的二烷基胺基羰基、或可有取代基的二烷 Q 基胺基硫羰基。 &lt;5&gt;如&lt;1&gt;記載的著色感光性樹脂組成物，其中前 述通式（I)中的X所示的一價取代基係可有取代基的烷基、 可有取代基的芳基、可有取代基的烯基、可有取代基的炔 基、可有取代基的烷氧基、可有取代基的芳氧基、可有取 代基的烷基硫氧基、可有取代基的芳基硫氧基、可有取代 基的胺基、可有取代基的鹵化烷基、或在N上可有取代基 的醯胺基。 &lt;6&gt;如&lt;1&gt;記載的著色感光性樹脂組成物，其中前 201009498 述通式（I)中的A所示的二價有機基係可有取代基的碳數1 〜12的伸烷基、可有取代基的伸環己基或可有取代基的伸 炔基。 &lt;7&gt;如&lt;1&gt;記載的著色感光性樹脂組成物，其中前 述通式（I)中的Ar所示的芳基係可有取代基的碳數6〜30 的芳基。 &lt;8&gt;如&lt;1&gt;記載的著色感光性樹脂組成物，其中前 述通式（I)中的η係0〜2的整數。 &lt;9&gt;如&lt;1&gt;記載的著色感光性樹脂組成物，其中更 含有鏈轉移劑。 &lt;1〇&gt;如&lt;9&gt;記載的著色感光性樹脂組成物，其中前 述鏈轉移劑係Ν，Ν-二烷基胺基苯甲酸烷基酯、具有雜環的 锍基化合物或脂肪族多官能毓基化合物。 &lt; 1 1 &gt;如&lt; 9 &gt;記載的著色感光性樹脂組成物，其中相 對於全部固體成分而言，前述鏈轉移劑的量爲0.01〜15質 量％的範圍。 &lt;12&gt;如&lt;1&gt;記載的著色感光性樹脂組成物，其中前 述（C)著色劑係經高分子化合物所被覆的顏料。 &lt;13&gt;如&lt;12&gt;記載的著色感光性樹脂組成物，其中 前述髙分子化合物係含有從下述通式（2)所示的單體而來的 聚合單位之聚合物： R1 H2C=C ⑵In the above formula (II), R and X each independently represent a monovalent substituent, Α represents a monovalent organic group, Ar represents an aryl group, and η is an integer of 0 to 5, and when X is present in a plural number, plural X each independently represents a monovalent substituent. (4) The colored photosensitive resin composition according to the above-mentioned <1>, wherein the monovalent substituent represented by R in the above formula (1) is an alkyl group which may have a substituent, may have a substituent Aryl group, optionally substituted alkenyl group, alkynyl group which may have a substituent, alkylsulfinyl group which may have a substituent, aryl sulfinyl group which may have a substituent may have a substituent Alkylsulfonyl, optionally substituted arylsulfonyl, substituted fluorenyl, substituted alkoxycarbonyl, substituted aryloxycarbonyl, substituted phosphine a heterocyclic group which may have a substituent, an alkylthiocarbonyl group which may have a substituent, a arylthiocarbonyl group which may have a substituent, a dialkylaminocarbonyl group which may have a substituent, or a substituent which may have a substituent Alkyl Q-aminothiocarbonyl. The colored photosensitive resin composition of the above-mentioned general formula (I), wherein the monovalent substituent represented by X in the above formula (I) is an alkyl group which may have a substituent, and a aryl group which may have a substituent Alkenyl group which may have a substituent, alkynyl group which may have a substituent, an alkoxy group which may have a substituent, an aryloxy group which may have a substituent, an alkylthio group which may have a substituent, may be substituted The arylthiol group, the amine group which may have a substituent, the halogenated alkyl group which may have a substituent, or the sulfhydryl group which may have a substituent on N. &lt;6&gt; The colored photosensitive resin composition as described in <1>, wherein the divalent organic group represented by A in the above formula (I) in the above-mentioned 201009498 has a carbon number of 1 to 12 which may have a substituent. An alkyl group, a cyclohexyl group which may have a substituent or an alkynyl group which may have a substituent. The colored photosensitive resin composition according to the above-mentioned item (I), wherein the aryl group represented by Ar in the above formula (I) is a aryl group having 6 to 30 carbon atoms which may have a substituent. The colored photosensitive resin composition according to the above-mentioned formula (I), wherein η is an integer of 0 to 2 in the above formula (I). <9> The colored photosensitive resin composition according to <1>, which further comprises a chain transfer agent. The colored photosensitive resin composition according to the item <9>, wherein the chain transfer agent is an anthracene, an alkylidene-dialkylaminobenzoic acid ester, a mercapto compound having a heterocyclic ring or a fat. A polyfunctional thiol compound. The colored photosensitive resin composition according to the above-mentioned item, wherein the amount of the chain transfer agent is in the range of 0.01 to 15% by mass based on the total solid content. The colored photosensitive resin composition according to the above-mentioned item (1), wherein the coloring agent (C) is a pigment coated with a polymer compound. The colored photosensitive resin composition according to the above-mentioned item, wherein the oxime molecular compound contains a polymer of a polymerization unit derived from a monomer represented by the following formula (2): R1 H2C= C (2)

[R2-Z 201009498 通式（2)中，R1表示氫原子、或取代或未取代的烷基；R2 表示單鍵或2價連結基；Y表示- CO-、-C( = O)0·、-CONH-、-oc( = o) -或伸苯基；z表不具有雜環構造的基。 &lt;14&gt;如&lt;1&gt;記載的著色感光性樹脂組成物，其中相 對於100質量份的著色感光性樹脂組成物中之全部固體成 分而言，前述（D)通式（I)所示的光聚合引發劑之量爲〇·5〜 40質量份。 &lt;15&gt; —種圖案形成方法，其具有：將&lt;1&gt;至&lt;14&gt; © 中任一項記載的紫外光雷射用著色感光性樹脂組成物在基 板上製膜，藉由紫外光雷射進行圖案狀曝光，使曝光區域 硬化的曝光步驟，及去除未曝光區域的顯像步驟。 &lt;16&gt;如&lt;15&gt;記載的圖案形成方法，其中前述紫外 光雷射的曝光波長爲300nm〜3 80nm的範圍。 &lt;17&gt;如&lt;15&gt;記載的圖案形成方法，其中前述紫外 光雷射係以20〜2000Hz的頻率所振盪的脈衝雷射。 &lt;18&gt;—種彩色濾光片之製造方法，其中包含藉由&lt; ® 15&gt;記載的圖案形成方法在基板上形成著色圖案的步驟。 &lt;19&gt; 一種彩色濾光片，其係由&lt;18&gt;記載之製造方 法所製造。 &lt;20&gt;—種顯示裝置，其具備&lt;19&gt;記載之彩色濾光 片。 作爲本發明中的曝光之光，使用紫外光雷射。紫外光 雷射由於輸出高，故生產性提高，但是有圖案的線寬不安 定之問題。此理由經推測爲曝光之光所硬化的膜亦進行分 201009498 解，由於著色劑使紫外光無法到達膜深部爲止，而發生硬 化不良等。 於本發明的圖案形成時所用的感光性樹脂組成物中， 特別地藉由添加至少下述通式（I)所示的化合物當作（D)光 聚合引發劑，而在使用紫外光雷射進行曝光時，也可提高 線寬安定性[R2-Z 201009498 In the formula (2), R1 represents a hydrogen atom or a substituted or unsubstituted alkyl group; R2 represents a single bond or a divalent linking group; and Y represents -CO-, -C(=O)0· , -CONH-, -oc(=o)- or phenyl group; z represents a group having no heterocyclic structure. The coloring photosensitive resin composition of the above-mentioned (D) is represented by the above-mentioned (D) general formula (I) with respect to all the solid components in 100 parts by mass of the colored photosensitive resin composition. The amount of the photopolymerization initiator is 〇·5 to 40 parts by mass. &lt;15&gt; A pattern forming method for forming a film on a substrate by using the colored photosensitive resin composition for ultraviolet laser light according to any one of &lt;1&gt; to &lt;14&gt; The laser performs pattern exposure, an exposure step for hardening the exposed region, and a developing step of removing the unexposed region. The pattern forming method according to <15>, wherein the exposure wavelength of the ultraviolet laser is in the range of 300 nm to 380 nm. The pattern forming method according to <15>, wherein the ultraviolet laser is a pulsed laser oscillated at a frequency of 20 to 2000 Hz. &lt;18&gt; - A method of producing a color filter comprising the step of forming a colored pattern on a substrate by the pattern forming method described in &lt;&gt;&gt;&lt;19&gt; A color filter manufactured by the manufacturing method described in &lt;18&gt;. &lt;20&gt; A display device comprising the color filter described in &lt;19&gt;. As the light for exposure in the present invention, an ultraviolet laser is used. Ultraviolet light Due to the high output, the productivity is improved, but there is a problem that the line width of the pattern is unstable. For this reason, it is presumed that the film which is cured by the exposure light is also subjected to the solution of 201009498, and since the coloring agent prevents the ultraviolet light from reaching the deep portion of the film, hardening failure or the like occurs. In the photosensitive resin composition used in the pattern formation of the present invention, in particular, by adding at least a compound represented by the following formula (I) as a (D) photopolymerization initiator, and using an ultraviolet laser Line width stability can also be improved when performing exposure

⑴ Ο 0(1) Ο 0

上述通式（I)中，R及X各自獨立地表示一價取代基，A及 Y各自獨立地表示二價有機基，Ar表示芳基。η係0〜5的 整數。當X以複數存在時，複數的X各自獨立地表示一價 取代基。 本發明的作用雖然不明確，但如以下地推定。 茲認爲藉由上述通式（I)所示的光聚合引發劑，產生高 效率的自由基，可使膜的硬化進一步進行。茲認爲藉此可 提供對於顯像而言的線寬安定性，而且所產生的自由基擴 散到膜底部爲止，而提高感光性樹脂組成物層與基板的密 接性。 發明的效果 依照本發明，可提供對於顯像而言線寬安定性高、可 形成高解像度的圖案之紫外光雷射用著色感光性樹脂組成 物及藉由紫外光雷射曝光的圖案形成方法，尤其適合於彩 色濾光片的著色畫素等之形成的著色感光性樹脂組成物， -10- 201009498 以及藉由紫外光雷射曝光的圖案形成方法。 又，依照本發明，可提供藉由前述圖案形成方法所得 ，具備對於顯像而言線寬安定性高的畫素，色特性良好， 具有高生產性的彩色濾光片及其製造方法，以及具備該彩 色濾光片而成之對比及色純度高的畫質之顯示裝置。 【實施方式】 實施發明的最佳形態 以下詳細說明用於實施發明的最佳形態。 © 紫外光雷射用著色感光性樹脂組成物 本發明的紫外光雷射用著色感光性樹脂組成物包含（A) 乙烯性不飽和化合物、（B)黏結劑樹脂、（C)著色劑及（D)下 述通式（I)所示的光聚合引發劑。以下詳述紫外光雷射用著 色感光性樹脂組成物（以下亦僅稱「感光性樹脂組成物」） 中所含有的各成分》 (A)乙烯性不飽和化合物 本發明所用的著色感光性樹脂組成物含有（A)乙烯性不 ®飽和化合物。 本發明所可用的乙烯性不飽和化合物係具有至少一個 乙烯性不飽和雙鍵的加成聚合性化合物，選自於具有至少 1個、較佳2個以上的末端乙烯性不飽和鍵之化合物。如 此的化合物群係該產業領域中所廣泛已知者，於本發明中 可沒有特別限定地使用此等。此等例如具有單體（monomer) 、預聚物（prepolymer)，即二聚物、三聚物及寡聚物 (oligomer)、或彼等的混合物以及彼等的共聚物等之化學 201009498 形態。 再者，於本說明書中，將丙烯醯基與甲基丙烯醯基總 稱記載爲（甲基）丙烯醯基，而且將丙烯酸酯與甲基丙烯酸 酯總稱記載爲（甲基）丙烯酸酯。 作爲（A)乙烯性不飽和化合物之例，可舉出不飽和羧酸（ 例如丙烯酸、甲基丙烯酸、伊康酸、巴豆酸、異巴豆酸、 馬來酸等），或其酯類、醣胺類，較佳爲使用不飽和羧酸與 脂肪族多元醇化合物的酯、不飽和羧酸與脂肪族多元胺化 合物的醯胺類。又，具有羥基或胺基、锍基等的親核性取 ❹ 代基之不飽和羧酸酯類或不飽和羧酸醯胺類、與單官能或 多官能異氰酸酯類或單官能或多官能環氧類的加成反應生 成物，及上述不飽和羧酸酯或不飽和羧酸醯胺類，與單官 能或多官能的羧酸之脫水縮合反應生成物等亦適用。 又，具有異氣酸酯基或環氧基等的親電子性取代基之 不飽和羧酸酯類或不飽和羧酸醯胺類，與單官能或多官能 的醇類、胺類或硫醇類之加成反應物，以及具有鹵基或甲 苯磺醯氧基等的脫離性取代基之不飽和羧酸酯類或不飽和 ® 羧酸醯胺類，與單官能或多官能的醇類、胺類或硫醇類的 取代反應物亦合適。又，作爲其它例，亦可以使用上述不 飽和羧酸經置換成不飽和膦酸、苯乙烯或乙烯基醚等的化 合物群。 當作脂肪族多元醇化合物與不飽和羧酸的酯之單體的 具體例，作爲丙烯酸酯，可舉出乙二醇二丙烯酸酯、三乙 二醇二丙烯酸酯、丨，3_ 丁二醇二丙烯酸酯、四亞甲基二醇 -12- 201009498 二丙烯酸酯、丙二醇二丙烯酸酯、新戊二醇二丙烯酸酯、 三羥甲基丙烷三丙烯酸酯、三羥甲基丙烷三（丙烯醯氧基丙 基）醚、二經甲基乙院三丙嫌酸酯、己二醇二丙嫌酸醋、 1，4-環己二醇二丙烯酸酯、四乙二醇二丙烯酸酯、季戊四 醇二丙烯酸酯、季戊四醇三丙烯酸酯、季戊四醇四丙烯酸 酯、二季戊四醇二丙烯酸酯、二季戊四醇六丙烯酸酯、三 季戊四醇聚丙烯酸酯（丙烯酸酯基數：1〜8)、四季戊四醇 聚丙烯酸酯（丙烯酸酯基數：1〜10)、五季戊四醇聚丙烯酸 ® 酯（丙烯酸酯基數：1〜12)、山梨糖醇三丙烯酸酯、山梨糖 醇四丙烯酸酯、山梨糖醇五丙烯酸酯、山梨糖醇六丙烯酸 酯、三（丙烯醯氧基乙基）異氰尿酸酯、聚酯丙烯酸酯寡聚 物、異氰尿酸EO改性三丙烯酸酯等 作爲甲基丙烯酸酯，可舉出四亞甲基二醇二甲基丙烯 酸酯、三乙二醇二甲基丙烯酸酯、新戊二醇二甲基丙烯酸 酯、三羥甲基丙烷三甲基丙烯酸酯、三羥甲基乙烷三甲基 丙烯酸酯、乙二醇二甲基丙烯酸酯、1，3-丁二醇二甲基丙 V 烯酸酯、己二醇二甲基丙烯酸酯、季戊四醇二甲基丙烯酸 酯、季戊四醇三甲基丙烯酸酯、季戊四醇四甲基丙烯酸酯 、二季戊四醇二甲基丙烯酸酯、二季戊四醇六甲基丙烯酸 酯、山梨糖醇三甲基丙烯酸酯、山梨糖醇四甲基丙烯酸酯 、雙[對（3-甲基丙烯醯氧基-2-羥基丙氧基）苯基]二甲基甲 烷、雙-[對（甲基丙烯醯氧基乙氧基）苯基]二甲基甲烷等。 作爲伊康酸酯，可舉出乙二醇二伊康酸酯、丙二醇二 伊康酸酯、1，3-丁二醇二伊康酸酯、1，4-丁二醇二伊康酸酯 -13- 201009498 、四亞甲基二醇二伊康酸酯、季戊四醇二伊康酸酯、山梨 糖醇四伊康酸酯等。 作爲巴豆酸酯，可舉出乙二醇二巴豆酸酯、四亞甲基 二醇二巴豆酸酯、季戊四醇二巴豆酸酯、山梨糖醇四二巴 豆酸酯等。 作爲異巴豆酸酯，可舉出乙二醇二異巴豆酸酯、季戊 四醇二異巴豆酸酯、山梨糖醇四異巴豆酸酯等。 作爲馬來酸酯，可舉出乙二醇二馬來酸酯、三乙二醇 二馬來酸酯、季戊四醇二馬來酸酯、山梨糖醇四馬來酸酯 © 等。 作爲其它酯之例，例如亦較佳爲使用特公昭5 1 -473 34 號公報、特開昭57- 1 9623 1號公報記載的脂肪族醇酯類， 或特開昭5 9-5240號公報、特開昭59-524 1號公報、特開 平2-2261 49號公報記載的具有芳香族系骨架者，特開平 1-165613號公報記載的含有胺基者等。再者，也可使用前 述酯單體的混合物。 作爲脂肪族多元胺化合物與不飽和羧酸的醯胺之單體 © 的具體例，可舉出亞甲基雙丙烯醯胺、亞甲基雙甲基丙烯 醯胺、1，6·六亞甲基雙丙烯醯胺、1，6-六亞甲基雙甲基丙烯 醯胺、二伸乙基三胺三丙烯醯胺、苯二甲基雙丙烯醯胺、 苯二甲基雙甲基丙烯醯胺等》作爲其它較佳醯胺單體之例 ，可舉出特公昭54-21726號公報記載的具有伸環己基構造 者。 又，使用異氰酸酯與羥基的加成反應所製造的胺甲酸 -14- 201009498 酯加成聚合性化合物亦合適，作爲其具體例，例如可舉出 於特公昭48-41 70 8號公報中記載的1分子中具有2個以上 的異氰酸酯基之聚異氰酸酯化合物，附加下述通式（V)所示 之含有羥基的乙烯基單體而得之1分子中含有2個以上的 聚合性乙烯基之乙烯基胺甲酸酯化合物等。 CH2 = C(R4)COOCH2CH(R5)OH 通式（V) 但是，R4及R5各自獨立地表示Η或CH3。 又，如特開昭5 1 -3 7 1 93號公報、特公平2-32293號公 ® 報、特公平2-16765號公報中記載的胺甲酸酯丙烯酸酯類 、或特公昭58_49860號、特公昭56-1 7654號公報、特公 昭62-394 1 7號公報、特公昭62-3941 8號公報記載的具有 環氧乙烷骨架的胺甲酸酯化合物類亦合適》再者，藉由使 用特開昭63-277653號公報、特開昭63-260909號公報、 特開平1 - 1 0523 8號公報中記載的在分子內具有胺基構造或 硫絡構造的加成聚合性化合物類，可得到感光速率非常優 異的光聚合性組成物。 ^ 作爲其它例，可舉出如特開昭48-64 1 83號公報、特公 昭49-43 19 1號公報、特公昭52-3 0490號公報的各公報中 所記載的聚酯丙烯酸酯類、環氧樹脂與（甲基）丙烯酸反應 而得之環氧丙烯酸酯類等之多官能丙烯酸酯或甲基丙烯酸 酯。又，亦可舉出特公昭 46-43946號公報、特公平1-403 3 7號公報、特公平1 -403 36號公報記載的特定不飽和 化合物、或特開平2-25493號公報記載的乙烯基膦酸化合 物等。另外，於某些情況下，較佳爲使用特開昭61-22048 201009498 號公報記載的含有全氟烷基的構造。再者，亦可以使用曰 本接著協會誌（Journal of the Adhesion Society of Japan)vol.20，No.7，第 300 〜308 頁（1 984 年）中當作光硬 化性單體及寡聚物所介紹者。 關於此等乙烯性不飽和化合物，其構造、單獨使用或 倂用、或添加量等的使用方法之詳細，可配合最終感材的 性能設計來任意設定。例如，根據如下的觀點來選擇。 於感度之點，較佳爲每1分子的不飽和基含量多的乙 烯性不飽和化合；於多的情況下，較佳爲2官能以上的乙 © 烯性不飽和化合物。又，爲了提高著色圖像部即感光性樹 脂組成物層的強度，可爲3官能以上的乙烯性不飽和化合 物，再者藉由倂用具有不同官能數及/或不同聚合性基（例 如丙烯酸酯、甲基丙烯酸酯、苯乙烯系化合物、乙烯醚系 化合物）的乙烯性不飽和化合物，亦有效於調節感度與強度 兩者。從硬化感度的觀點來看，較佳爲使用含有2個以上 的（甲基）丙烯酸酯構造之化合物，更佳爲使用含有3個以 上的化合物，最佳爲使用含有4個以上的化合物。又，從 ® 硬化感度及未曝光部的顯像性之觀點來看，較佳爲含有EO 改性物。另外，從硬化感度及曝光部強度的観點來看，較 佳爲含有胺甲酸酯鍵。 又，關於與感光性樹脂組成物層中的其它成分（例如鹼 可溶性樹脂、引發劑）之相溶性，加成聚合化合物的選擇· 使用法亦爲重要的因素，例如，藉由使用低純度化合物或 倂用2種以上，可提高相溶性。又，以提高與基板的密接 -16- 201009498 性爲目的，亦可選擇特定構造。 根據以上的觀點，作爲乙烯性不飽和化合物，可舉出 雙酚A二（甲基）丙烯酸酯、雙酚A二（甲基）丙烯酸酯EO 改性物、三羥甲基丙烷三（甲基）丙烯酸酯、三羥甲基丙烷 三（（甲基）丙烯醯氧基丙基）醚、三羥甲基乙烷三（甲基）丙烯 酸酯、四乙二醇二（甲基）丙烯酸酯、季戊四醇二（甲基）丙 烯酸酯、季戊四醇三（甲基）丙烯酸酯、季戊四醇四（甲基） 丙烯酸酯、二季戊四醇四（甲基）丙烯酸酯、二季戊四醇五（ β 甲基）丙烯酸酯、二季戊四醇六（甲基）丙烯酸酯、山梨糖醇 三（甲基）丙烯酸酯、山梨糖醇四（甲基）丙烯酸酯、山梨糖 醇五（甲基）丙烯酸酯、山梨糖醇六（甲基）丙烯酸酯、三（（甲 基）丙烯醯氧基乙基）異氰尿酸酯、季戊四醇四（甲基）丙烯 酸酯ΕΟ改性物、二季戊四醇六（甲基）丙烯酸酯ΕΟ改性物 等當作較佳者。又，爲市售品，較佳爲胺甲酸酯寡聚物 (urethane oligomer)UAS-10、UAB-140(日本製紙化學（股 )(Nippon Paper Chemicals)製）、KAYARAD DPHA(日本化 . 藥公司（Nipp ο n Kay aku Cο ·， Ltd.)製）、NK 酯（NK ESTER)A-TMMT、NK 醋 A-TMPT、NK 酯 A-TMM-3(以上爲 新中村化學工業公司（Shin-Nakamura Chemical Co.，Ltd.) 製）、八1*〇1^乂（八1101^1又）\1-3 05、八1'〇1^乂厘-306、八1'〇1^乂1^- 3 09、Aronix M-450、Aronix M-402(以上爲東亞合成公司 (TOAGOSEI Co·，Ltd.)製）、V#802(大阪有機化學工業公司 (Osaka Organic chemical I n du s tr y L t d _)製）、U A - 3 0 6 H、 UA-3 06T、UA-3 06I、AH - 6 0 0、T - 6 0 0、AI-600(以上爲共榮 -17- 201009498 社化學工業（股）（Ky〇eisha Chemical c〇·，Ltd.)製）。 其中，更佳爲雙酚A二（甲基）丙烯酸酯EO改性物、季 戊四醇三（甲基）丙烯酸酯、季戊四醇四（甲基）丙烯酸酯、 二季戊四醇五（甲基）丙烯酸酯、二季戊四醇六（甲基）丙烯 酸酯、三（（甲基）丙烯醯氧基乙基）異氰尿酸酯、季戊四醇 四（甲基）丙烯酸酯EO改性物、二季戊四醇六（甲基）丙烯酸 酯EO改性物等，以及作爲市售品的KAYARAD DPHA(日 本化藥公司製）、NK酯 A-TMMT、NK酯 A-TMPT、NK酯 A-TMM-3(以上爲新中村化學工業公司製）' Aronix M-305 © ' Aronix M-3 06 ' Aronix M-309 ' Aronix M-450 ' Aronix M-402(以上爲東亞合成公司製）、V#8 02(大阪有機化學工業 公司製）。 (A)乙烯性不飽和化合物的含量較佳爲本發明的紫外光 雷射用著色感光性樹脂組成物層中的全部固體成分中之5 質量％〜5 5質量％，尤佳爲1 0質量％〜5 0質量％，更佳爲 1 5質量％〜4 5質量％ (B)黏結劑樹脂 © 本發明所用的（B)黏結劑樹脂係線狀有機高分子聚合物 ，較佳例如可從以丙烯酸共聚物、苯乙烯共聚物當作主鏈 的高分子聚合物等之分子內具有至少1個促進鹼可溶性基 的鹼可溶性樹脂之中適宜地選擇。作爲促進鹼可溶性的基 ，例如可舉出羧基、磷酸基、磺酸基等。其中較佳爲在有 機溶劑中可溶且可由鹼水溶液所顯像者。 於黏結劑樹脂的製造中，可採用例如眾所周知的自由 -18 - 201009498 基聚合法之方法。以自由基聚合法製造鹼可溶性樹脂時的 溫度、壓力、自由基引發劑的種類及其量、溶劑的種類等 等聚合條件係熟習該項技術者所可容易設定，亦可實驗地 決定條件。 作爲上述線狀有機高分子聚合物，較佳爲在側鏈具有 羧酸的聚合物。例如可舉出如特開昭5 9-446 1 5號、特公昭 54-34327號、特公昭58-12577號' 特公昭54-25957號、 特開昭5 9-53 83 6號、特開昭59-7 1048號的各公報中記載 ® 地，（甲基）丙烯酸共聚物、伊康酸共聚物、巴豆酸共聚物 、馬來酸共聚物、部分酯化（partially-esterified)馬來酸共 聚物等，以及在側鏈具有羧酸的酸性纖維素衍生物、於具 有羥基的聚合物附加酸酐者等，再者亦可舉出在側鏈具有（ 甲基）丙烯醯基、烯丙基等的反應性基之高分子聚合物當作 較佳例。 作爲可與前述（甲基）丙烯酸共聚合的其它單體之例，可 舉出（甲基）丙烯酸烷基酯、（甲基）丙烯酸芳基酯、乙烯基 胃 化合物等。此處，烷基及芳基的氫原子亦可被取代基所取 代。 作爲前述（甲基）丙烯酸烷基酯及（甲基）丙烯酸芳基酯的 具體例，可舉出（甲基）丙烯酸甲酯、（甲基）丙烯酸乙酯、（ 甲基）丙烯酸丙酯、（甲基）丙烯酸丁酯、（甲基）丙烯酸異丁 酯、（甲基）丙烯酸戊酯、（甲基）丙烯酸己酯、（甲基）丙烯酸 辛酯、（甲基）丙烯酸苯酯、（甲基）丙烯酸苄酯、（甲基）丙烯 酸甲苯酯、（甲基）丙烯酸萘酯、（甲基）丙烯酸環己酯、（甲 -19- 201009498 基）丙烯酸二環戊酯、（甲基）丙烯酸二環戊烯酯等。 又’作爲前述乙烯基化合物，例如可舉出苯乙烯、 甲基苯乙烯、乙烯基甲苯、（甲基）丙烯酸縮水甘油酯、丙 烯腈、醋酸乙烯酯、Ν -乙烯基吡咯啶酮、（甲基）丙烯酸四 氫糠酯、（甲基）丙烯酸烯丙酯、聚苯乙烯巨單體、聚（甲基） 丙烯酸甲酯巨單體、CH2 = CR6R7、CH2 = C(R6)(COOR8)[此處 ，R6表示氫原子或碳數1〜5的烷基，R7表示碳數6〜10 的芳香族烴環，R8表示碳數1〜8的烷基或碳數6〜12的 芳烷基]等。 ® 合成側鏈具有（甲基）丙烯醯基的高分子聚合物之方法係 可從眾所周知者之中適宜地選擇。例如可舉出在具有酸性 基的重複單元附加具有環氧基的（甲基）丙烯酸酯之方法， 在具有羥基的重複單元附加具有異氰酸酯基的（甲基）丙烯 酸酯之方法，在具有異氰酸酯基的重複單元附加具有羥基 的（甲基）丙烯酸酯之方法等。其中，從最容易製造，低成 本之點來看，較佳爲在具有酸性基的重複單元附加具有環 氧基的（甲基）丙烯酸酯之方法。 ® 於此等之中，尤其可舉出（甲基）丙烯酸苄酯/(甲基）丙 烯酸共聚物、（甲基）丙烯酸烯丙酯/(甲基）丙烯酸共聚物、（ 甲基）丙烯酸苄酯/(甲基）丙烯酸2-羥乙酯/(甲基）丙烯酸共 聚物、（甲基）丙烯酸環己酯/(甲基）丙烯酸甲酯/(甲基）丙烯 酸-(甲基）丙烯酸縮水甘油酯加成物/(甲基）丙烯酸共聚物、 (甲基）丙烯酸二環戊烯酯/(甲基）丙烯酸-(甲基）丙烯酸縮水 甘油酯加成物/(甲基）丙烯酸共聚物等當作合適例。又，該 -20- 201009498 聚合物係可以任意之量混合而使用。 (B)黏結劑樹脂在著色感光性樹脂組成物中的含量，相 對於該組成物的全部固體成分而言，較佳爲1〜40質量％ ，更佳爲2〜3 5質量％，特佳爲3〜3 0質量％。 (C)著色劑 爲了形成著色圖案，本發明的著色感光性樹脂組成物 含有（C)著色劑。 作爲著色劑’可適宜選擇染料及顏料而使用。從耐熱 〇 性等的觀點來看，更佳爲顔料。 作爲彩色系的顏料，可使用習知的各種無機顏料或有 機顏料。又’無機顏料與有機顏料，若考慮高透過率爲佳 ’則較佳爲皆使用粒子大小盡可能小的顏料。若亦考慮處 理性’則上述顏料的平均粒徑較佳爲0.01/zm〜O.lgm， 更佳爲 0.01/zm 〜0.05/^m。 作爲當作著色圖案（著色畫素）形成用的著色劑之無機顔 料’可舉出以金屬氧化物、金屬錯鹽等所示的金屬化合物 ® ’具體地可舉出鐵、鈷、鋁、鎘、鉛、銅、鈦、鎂、鉻、 鋅、銻等的金屬氧化物、及前述金屬的複合氧化物。 作爲前述有機顏料，例如可舉出： C.I.顏料紅 1、2' 3、4、5、6、7、9、10、14、17、22 、23、 3 1、 3 8、41 &gt; 48:1 ' 48:2 ' 48:3、 48:4、 49、 49:1、 49:2、 52:1 、52_2 、 53:1 、 57:1、 60:1、 63:1、66、67、 8 1:1' 8 1:2 ' 81:3' 83 ' 88 、90、 105、 112、 119、 122、 123 ' 144、 146、 149、 150 ' 155、 16 6、 168 、 169 、 170 、 -21- 201009498 17 1 、172 ' 1 75 &gt; 176 177、 178、 179、 184 185' 15 8 、190 ' 200 、202 206、 207、 208、 209 210、 220 、224 &gt; 226 、242 、 246、 2 54、 25 5、 264 &gt; 270 ' 279 &gt; C. I.顏料黃 1 、2、 3、 4、: 5、6、 10、 11' 12 、13 15、 16、 17、 1 8 ' 20 、 24、 31、 32 、 34 ' 3 5 、 35:1 36:1 、37 ' 37:1 、40 - 、42 ' 43 、 53 、55、 60、 61 &gt; 6 ' 65 &gt; 73 、74、 77、 8 1 ' 83 、86、 93、 94、 95 、97 100 &gt; 101 ' 1 04 ' 106 108、 109、 110、 113 、 114、 116 、117 ' 1 15 、119 、 120、 123、 125、 126 、 127 ' 129 、13 7 ' 1 3 8 、139 、 147、 148、 150、 15 1 、 152 ' 154 ' 155 ' 1 56 、161 、 162、 164、 166 ' 167 168、 170 、17 1 ' 1 72 、173 、 174、 175' 176 ' 177 179、 18 1 、1 82 ' 1 85 、187 、 188' 193、 194、 199 、213、 C. I.顏料橙 2 、5、 13 、16 ' 17:1 、3 1 、34 36 ' 、46 、 45 、49、 5 1、 52 、55 、59、 60、 61、 62 、6 4 73， C. I.顏料綠 7、 10、 36 、3 7 、58 C. I.顏料藍 1 、2、 15 、15 :1、1 5 :2 ' 1 5:3 ' 1 5:4、 16、 22、 60、 64、66 、 79 ' 79的 C1 φ [代基經變更 者、 80 C .1.顏料紫 1、 19 &gt; 23 1 ' 27 、32、 37、 42， c .1.顏料棕 25 、28 等 〇 作爲此等 之 中所可i 較佳使用的 顏料 ，可 舉 出以 187、 216、 272 ' 、14、 '36、 2、63 、98、 115&gt; 128 ' 153 ' 169、 180、 214， 38、4 3 、71、 15:6、In the above formula (I), R and X each independently represent a monovalent substituent, and A and Y each independently represent a divalent organic group, and Ar represents an aryl group. η is an integer from 0 to 5. When X is present in a plural number, the plural Xs each independently represent a monovalent substituent. Although the effect of the present invention is not clear, it is estimated as follows. It is considered that the photopolymerization initiator represented by the above formula (I) produces highly efficient radicals, and the hardening of the film can be further progressed. It is considered that the line width stability for development can be provided, and the generated radicals are diffused to the bottom of the film to improve the adhesion between the photosensitive resin composition layer and the substrate. Advantageous Effects of Invention According to the present invention, it is possible to provide a coloring photosensitive resin composition for ultraviolet laser light having a high line width stability and a high resolution pattern for development, and a pattern forming method by laser exposure by ultraviolet light. In particular, it is suitable for a colored photosensitive resin composition formed by a coloring element of a color filter, -10-201009498, and a pattern forming method by laser exposure by ultraviolet light. Moreover, according to the present invention, it is possible to provide a color filter having high linearity stability, high color performance, high productivity, and a method for producing the same, which are obtained by the above-described pattern forming method, and have high productivity. A display device having a contrast and color purity of the color filter. [Embodiment] BEST MODE FOR CARRYING OUT THE INVENTION The best mode for carrying out the invention will be described in detail below. © Coloring photosensitive resin composition for ultraviolet laser irradiation The colored photosensitive resin composition for ultraviolet laser of the present invention comprises (A) an ethylenically unsaturated compound, (B) a binder resin, (C) a coloring agent, and D) A photopolymerization initiator represented by the following formula (I). In the following, each component contained in the coloring photosensitive resin composition for ultraviolet laser irradiation (hereinafter also referred to simply as "photosensitive resin composition") will be described. (A) Ethylene unsaturated compound The colored photosensitive resin used in the present invention The composition contains (A) an ethylenic acid-free saturated compound. The ethylenically unsaturated compound usable in the present invention is an addition polymerizable compound having at least one ethylenically unsaturated double bond, and is selected from the group consisting of compounds having at least one, preferably two or more terminal ethylenically unsaturated bonds. Such a compound group is widely known in the industrial field, and it is not particularly limited to use in the present invention. These include, for example, the chemical 201009498 form of a monomer, a prepolymer, a dimer, a trimer, an oligomer, or a mixture thereof, and a copolymer thereof. In the present specification, the propylene fluorenyl group and the methacryl fluorenyl group are collectively referred to as a (meth) acrylonitrile group, and the acrylate and methacrylate are collectively referred to as a (meth) acrylate. Examples of the (A) ethylenically unsaturated compound include unsaturated carboxylic acids (for example, acrylic acid, methacrylic acid, itaconic acid, crotonic acid, isocrotonic acid, maleic acid, etc.), or esters thereof and sugars. The amines are preferably esters of an unsaturated carboxylic acid and an aliphatic polyol compound, amides of an unsaturated carboxylic acid and an aliphatic polyamine compound. Further, an carboxylic acid having a hydroxyl group, an amine group, a thiol group or the like, an unsaturated carboxylic acid ester or an unsaturated carboxylic acid oxime amine, and a monofunctional or polyfunctional isocyanate or a monofunctional or polyfunctional ring. An oxygen addition reaction product, and the above-mentioned unsaturated carboxylic acid ester or unsaturated carboxylic acid decylamine, and a dehydration condensation reaction product with a monofunctional or polyfunctional carboxylic acid are also applicable. Further, an unsaturated carboxylic acid ester or an unsaturated carboxylic acid decyl amine having an electrophilic substituent such as an isophthalate group or an epoxy group, and a monofunctional or polyfunctional alcohol, an amine or a thiol Addition reactants, and unsaturated carboxylic acid esters having a derivatizing substituent such as a halogen group or a tosyloxy group, or an unsaturated carboxylic acid decyl amine, and a monofunctional or polyfunctional alcohol, A substituted reactant of an amine or a thiol is also suitable. Further, as another example, a compound group in which the above unsaturated carboxylic acid is substituted with an unsaturated phosphonic acid, styrene or vinyl ether may be used. Specific examples of the monomer which is an ester of an aliphatic polyol compound and an unsaturated carboxylic acid include ethylene glycol diacrylate, triethylene glycol diacrylate, hydrazine, and 3-butanediol as the acrylate. Acrylate, tetramethylene glycol-12- 201009498 diacrylate, propylene glycol diacrylate, neopentyl glycol diacrylate, trimethylolpropane triacrylate, trimethylolpropane tris(propylene decyloxy) Propyl)ether, dimethicone tripropionate, hexanediol dipropylene acid vinegar, 1,4-cyclohexanediol diacrylate, tetraethylene glycol diacrylate, pentaerythritol diacrylate , pentaerythritol triacrylate, pentaerythritol tetraacrylate, dipentaerythritol diacrylate, dipentaerythritol hexaacrylate, tripentaerythritol polyacrylate (acrylate number: 1 to 8), pentaerythritol polyacrylate (acrylate number: 1~) 10), pentaerythritol polyacrylic acid ester (acrylate number: 1 to 12), sorbitol triacrylate, sorbitol tetraacrylate, sorbitol pentaacrylate, sorbitol Examples of methacrylates, tris(propylene decyloxyethyl)isocyanurate, polyester acrylate oligomers, isocyanuric acid EO modified triacrylate, etc., as tetramethine Diol dimethacrylate, triethylene glycol dimethacrylate, neopentyl glycol dimethacrylate, trimethylolpropane trimethacrylate, trimethylolethane trimethacrylate , ethylene glycol dimethacrylate, 1,3-butylene glycol dimethyl propionate, hexanediol dimethacrylate, pentaerythritol dimethacrylate, pentaerythritol trimethacrylate, pentaerythritol Tetramethacrylate, dipentaerythritol dimethacrylate, dipentaerythritol hexamethacrylate, sorbitol trimethacrylate, sorbitol tetramethacrylate, bis [p-(methyl methacrylate) Oxy-2-hydroxypropoxy)phenyl]dimethylmethane, bis-[p-(methacryloxyethoxy)phenyl]dimethylmethane, and the like. Examples of the econic acid ester include ethylene glycol diconconate, propylene glycol diconconate, 1,3-butylene glycol diconconate, and 1,4-butanediol diiconate. -13- 201009498, tetramethylene glycol diconconate, pentaerythritol diconconate, sorbitol tetraconcanate, and the like. Examples of the crotonate include ethylene glycol dicrotonate, tetramethylene glycol dicrotonate, pentaerythritol dicrotonate, and sorbitol tetradodetoic acid ester. Examples of the isocrotonate include ethylene glycol diisocrotonate, pentaerythritol diisocrotonate, and sorbitol tetraisocrotonate. Examples of the maleic acid ester include ethylene glycol dimaleate, triethylene glycol dimaleate, pentaerythritol dimaleate, sorbitol tetramaleate, and the like. For example, it is preferable to use an aliphatic alcohol ester described in Japanese Patent Publication No. Sho 57-47332, or Japanese Patent Laid-Open Publication No. SHO 57-9 924. In the case of an aromatic group described in Japanese Laid-Open Patent Publication No. Hei No. Hei. No. Hei. No. Hei. Further, a mixture of the above ester monomers can also be used. Specific examples of the monomer of the aliphatic polyamine compound and the decylamine of the unsaturated carboxylic acid include methylenebis propylene amide, methylene bis methacrylamide, and 1,6 hexamethylene. Bis-acrylamide, 1,6-hexamethylene bis methacrylamide, di-ethyltriamine trisuccinimide, benzodimethyl bis decylamine, benzodimethyl bis methacrylate The amine or the like is exemplified as the other preferred guanamine monomer, and the structure having the stretched cyclohexyl group described in Japanese Patent Publication No. 54-21726 is mentioned. In addition, the amine-formic acid-14-201009498 ester-addition polymerizable compound produced by the addition reaction of an isocyanate and a hydroxyl group is also suitable, and a specific example is mentioned, for example, as described in Japanese Patent Publication No. 48-41 70 8 A polyisocyanate compound having two or more isocyanate groups in one molecule, and a vinyl group-containing vinyl monomer represented by the following formula (V), and having two or more polymerizable vinyl groups in one molecule A carbamate compound or the like. CH2 = C(R4)COOCH2CH(R5)OH General formula (V) However, R4 and R5 each independently represent hydrazine or CH3. In addition, the urethane acrylates described in Japanese Unexamined Patent Publication No. Hei No. Hei. No. Hei. Further, a urethane compound having an oxirane skeleton described in Japanese Patent Publication No. Sho 56-1, 7654, JP-A-62-394, No. 7 and No. 62-3941, is also suitable. An addition polymerizable compound having an amine group structure or a sulfur network structure in a molecule, which is described in JP-A-H05-260, A photopolymerizable composition having a very excellent light-sensing rate can be obtained. For example, the polyester acrylates described in each of the publications of Japanese Patent Publication No. Sho-48-64 No. A multifunctional acrylate or methacrylate such as an epoxy acrylate obtained by reacting an epoxy resin with (meth)acrylic acid. Further, the specific unsaturated compound described in Japanese Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. a phosphinic acid compound or the like. Further, in some cases, a structure containing a perfluoroalkyl group described in JP-A-61-22048 201009498 is preferably used. Furthermore, it can also be used as a photocurable monomer and oligomer in the Journal of the Adhesion Society of Japan vol. 20, No. 7, pp. 300-308 (1 984). Introduced. Regarding such an ethylenically unsaturated compound, the details of the method of use, structure, use, use, or addition amount can be arbitrarily set in accordance with the performance design of the final material. For example, it is selected according to the following points. At the point of sensitivity, an ethylenically unsaturated compound having a large content of an unsaturated group per molecule is preferred; in the case of a large amount, a bifunctional or ethylenically unsaturated compound is preferred. In addition, in order to increase the strength of the photosensitive resin composition layer which is a colored image portion, it may be a trifunctional or higher ethylenically unsaturated compound, and further have a different functional number and/or a different polymerizable group (for example, acrylic acid). The ethylenically unsaturated compound of an ester, a methacrylate, a styrene compound, or a vinyl ether compound is also effective in adjusting both sensitivity and strength. From the viewpoint of the curing sensitivity, it is preferred to use a compound having two or more (meth) acrylate structures, more preferably three or more compounds, and most preferably four or more compounds. Further, from the viewpoint of the hardening sensitivity of the ® and the developability of the unexposed portion, it is preferred to contain an EO modified product. Further, from the viewpoint of the hardening sensitivity and the strength of the exposed portion, it is preferred to contain a urethane bond. Further, regarding the compatibility with other components (for example, an alkali-soluble resin or an initiator) in the photosensitive resin composition layer, the selection and use of the addition polymerization compound are also important factors, for example, by using a low-purity compound. Either two or more types can be used to improve compatibility. Further, for the purpose of improving the adhesion to the substrate -16-201009498, a specific structure can be selected. From the above viewpoints, examples of the ethylenically unsaturated compound include bisphenol A di(meth)acrylate, bisphenol A di(meth)acrylate EO modified product, and trimethylolpropane tri(methyl group). Acrylate, trimethylolpropane tris((meth)acryloxypropyl)ether, trimethylolethane tri(meth)acrylate, tetraethylene glycol di(meth)acrylate, Pentaerythritol di(meth)acrylate, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol tetra(meth)acrylate, dipentaerythritol penta(beta)methacrylate, dipentaerythritol Hexa(meth)acrylate, sorbitol tri(meth)acrylate, sorbitol tetra(meth)acrylate, sorbitol penta(meth)acrylate, sorbitol hexa(meth)acrylic acid Ester, tris((meth)acryloxyethyl)isocyanurate, pentaerythritol tetrakis(meth)acrylate oxime modified, dipentaerythritol hexa(meth)acrylate oxime modified, etc. Better. Further, in the case of a commercially available product, urethane oligomer UAS-10, UAB-140 (manufactured by Nippon Paper Chemicals), KAYARAD DPHA (Japan). Company (Nipp ο n Kay aku Cο ·, Ltd.), NK ESTER A-TMMT, NK vinegar A-TMPT, NK ester A-TMM-3 (above is Shin-Nakamura Chemical Industry Co., Ltd. (Shin- Nakamura Chemical Co., Ltd.), 八1*〇1^乂(八1101^1又)\1-3 05,八1'〇1^乂-306, 八1'〇1^乂1 ^- 3 09, Aronix M-450, Aronix M-402 (above is manufactured by TOAGOSEI Co., Ltd.), V#802 (Osaka Organic Chemical I n du s tr y L td _), UA - 3 0 6 H, UA-3 06T, UA-3 06I, AH - 6 0 0, T - 60 0, AI-600 (above is glory -17- 201009498 chemistry Industrial (stock) (Ky〇eisha Chemical c〇·, Ltd.)). Among them, more preferred are bisphenol A di(meth)acrylate EO modification, pentaerythritol tri(meth)acrylate, pentaerythritol tetra(meth)acrylate, dipentaerythritol penta(meth)acrylate, dipentaerythritol. Hexa(meth)acrylate, tris((meth)acryloxyethyl)isocyanurate, pentaerythritol tetra(meth)acrylate EO modification, dipentaerythritol hexa(meth)acrylate EO A modified product, etc., and KAYARAD DPHA (manufactured by Nippon Kayaku Co., Ltd.), NK ester A-TMMT, NK ester A-TMPT, and NK ester A-TMM-3 (manufactured by Shin-Nakamura Chemical Co., Ltd.) ' Aronix M-305 © ' Aronix M-3 06 ' Aronix M-450 ' Aronix M-450 ' Aronix M-402 (above is made by Toagosei Co., Ltd.), V#8 02 (made by Osaka Organic Chemical Industry Co., Ltd.). The content of the (A) ethylenically unsaturated compound is preferably 5% by mass to 5% by mass, and more preferably 10% by mass of all the solid components in the coloring photosensitive resin composition layer for ultraviolet light laser of the present invention. % to 50% by mass, more preferably 15% by mass to 45% by mass. (B) Adhesive Resin © (B) The binder resin used in the present invention is a linear organic high molecular polymer, preferably, for example, An alkali-soluble resin having at least one alkali-promoting-promoting group in the molecule of a polymer such as an acrylic copolymer or a styrene copolymer as a main chain is suitably selected. Examples of the base which promotes alkali solubility include a carboxyl group, a phosphoric acid group, and a sulfonic acid group. Among them, those which are soluble in an organic solvent and which can be visualized by an aqueous alkali solution are preferred. In the production of the binder resin, for example, a well-known method of the free polymerization method of -18 - 201009498 can be employed. The polymerization conditions such as the temperature, the pressure, the type and amount of the radical initiator, the type of the solvent, and the like when the alkali-soluble resin is produced by the radical polymerization method can be easily set by those skilled in the art, and the conditions can be experimentally determined. The linear organic high molecular polymer is preferably a polymer having a carboxylic acid in a side chain. For example, for example, JP-A-59-446, No. 5, No. 54-34327, Special Public Show No. 58-12577, 'Special Public Show No. 54-25957, Special Open No. 5 9-53 83 No. 6, Special Opening Each of the publications of Sho 59-7 1048 describes a (meth)acrylic acid copolymer, an itaconic acid copolymer, a crotonic acid copolymer, a maleic acid copolymer, and a partially-esterified maleic acid. a copolymer or the like, an acidic cellulose derivative having a carboxylic acid in a side chain, an acid anhydride added to a polymer having a hydroxyl group, and the like, and a (meth)acrylonyl group and an allyl group in a side chain. A reactive polymer such as a reactive group is preferred. Examples of other monomers copolymerizable with the above (meth)acrylic acid include alkyl (meth)acrylate, aryl (meth)acrylate, and vinyl stomach compound. Here, the hydrogen atom of the alkyl group and the aryl group may also be substituted by a substituent. Specific examples of the (meth)acrylic acid alkyl ester and the (meth)acrylic acid aryl ester include methyl (meth)acrylate, ethyl (meth)acrylate, and propyl (meth)acrylate. Butyl (meth)acrylate, isobutyl (meth)acrylate, amyl (meth)acrylate, hexyl (meth)acrylate, octyl (meth)acrylate, phenyl (meth)acrylate, ( Benzyl (meth) acrylate, toluene (meth) acrylate, naphthyl (meth) acrylate, cyclohexyl (meth) acrylate, dicyclopentanyl (methyl-19-201009498), (methyl) Dicyclopentyl acrylate or the like. Further, examples of the vinyl compound include styrene, methyl styrene, vinyl toluene, glycidyl (meth)acrylate, acrylonitrile, vinyl acetate, and fluorene-vinyl pyrrolidone. Base) tetrahydrofurfuryl acrylate, allyl (meth) acrylate, polystyrene macromonomer, poly(methyl) methacrylate macromonomer, CH2 = CR6R7, CH2 = C(R6)(COOR8) [ Here, R6 represents a hydrogen atom or an alkyl group having 1 to 5 carbon atoms, R7 represents an aromatic hydrocarbon ring having 6 to 10 carbon atoms, and R8 represents an alkyl group having 1 to 8 carbon atoms or an aralkyl group having 6 to 12 carbon atoms. ]Wait. The method of synthesizing a polymer having a (meth)acryl fluorenyl group in a side chain can be suitably selected from among those skilled in the art. For example, a method of adding a (meth) acrylate having an epoxy group to a repeating unit having an acidic group, a method of adding a (meth) acrylate having an isocyanate group to a repeating unit having a hydroxyl group, and having an isocyanate group may be mentioned. A method in which a repeating unit is added with a (meth) acrylate having a hydroxyl group or the like. Among them, from the viewpoint of easiest production and low cost, a method of adding a (meth) acrylate having an epoxy group to a repeating unit having an acidic group is preferred. ® Among them, benzyl (meth)acrylate/(meth)acrylic acid copolymer, allyl (meth)acrylate/(meth)acrylic acid copolymer, and (meth)acrylic acid acrylate are mentioned. Ester/2-hydroxyethyl (meth)acrylate/(meth)acrylic acid copolymer, cyclohexyl (meth)acrylate/methyl (meth)acrylate/(meth)acrylic acid-(meth)acrylic acid shrinkage Glyceride adduct/(meth)acrylic acid copolymer, dicyclopentenyl (meth)acrylate/(meth)acrylic acid-glycidyl (meth)acrylate adduct/(meth)acrylic acid copolymer Etc. as a suitable example. Further, the -20-201009498 polymer can be used in any amount. (B) The content of the binder resin in the coloring photosensitive resin composition is preferably from 1 to 40% by mass, more preferably from 2 to 5% by mass, based on the total solid content of the composition. It is 3 to 30% by mass. (C) Colorant The colored photosensitive resin composition of the present invention contains (C) a colorant in order to form a colored pattern. As the coloring agent, a dye and a pigment can be appropriately selected and used. From the viewpoint of heat resistance and the like, it is more preferably a pigment. As the color-based pigment, various conventional inorganic pigments or organic pigments can be used. Further, in the case of inorganic pigments and organic pigments, it is preferable to use a pigment having a particle size as small as possible in consideration of high transmittance. If the rationality is also considered, the average particle diameter of the above pigment is preferably from 0.01/zm to O.lgm, more preferably from 0.01/zm to 0.05/m. The inorganic pigment which is a coloring agent for forming a coloring pattern (coloring pixel) can be exemplified by a metal compound such as a metal oxide or a metal salt, and the like. Specifically, iron, cobalt, aluminum, and cadmium are mentioned. a metal oxide such as lead, copper, titanium, magnesium, chromium, zinc or bismuth, or a composite oxide of the above metals. Examples of the organic pigment include CI Pigment Red 1, 2' 3, 4, 5, 6, 7, 9, 10, 14, 17, 22, 23, 3 1 , 3 8 , 41 &gt; 48: 1 ' 48:2 ' 48:3, 48:4, 49, 49:1, 49:2, 52:1, 52_2, 53:1, 57:1, 60:1, 63:1, 66, 67, 8 1:1' 8 1:2 '81:3' 83 ' 88 , 90 , 105 , 112 , 119 , 122 , 123 ' 144 , 146 , 149 , 150 ' 155 , 16 6 , 168 , 169 , 170 , - 21- 201009498 17 1 , 172 ' 1 75 &gt; 176 177, 178, 179, 184 185' 15 8 , 190 ' 200 , 202 206 , 207 , 208 , 209 210 , 220 , 224 &gt; 226 , 242 , 246 , 2 54, 25 5, 264 &gt; 270 ' 279 &gt; CI Pigment Yellow 1, 2, 3, 4,: 5, 6, 10, 11' 12, 13 15, 16, 17, 1 8 ' 20, 24, 31, 32, 34 ' 3 5 , 35:1 36:1 , 37 ' 37:1 , 40 - , 42 ' 43 , 53 , 55 , 60 , 61 &gt; 6 ' 65 &gt; 73 , 74 , 77 , 8 1 ' 83 , 86 , 93 , 94 , 95 , 97 100 &gt; 101 ' 1 04 ' 106 108 , 109 , 110 , 113 , 114 , 116 , 117 ' 1 15 , 119 , 120 , 123 , 125 , 126 , 127 ' 129 , 13 7 ' 1 3 8 , 139 , 147 , 148 , 150 , 15 1 , 152 ' 154 ' 155 ' 1 56 , 161 , 162 , 164 , 166 ' 167 168 , 170 , 17 1 ' 1 72 , 173 , 174 , 175 ' 176 ' 177 179 , 18 1 , 1 82 ' 1 85 , 187 , 188 ' 193 , 194 , 199 , 213 , CI Pigment Orange 2 , 5 , 13 , 16 ' 17:1 , 3 1 , 34 36 ' , 46 , 45 , 49 , 5 1 , 52 , 55 , 59 , 60 , 61 , 62 , 6 4 73 , CI Pigment Green 7, 10, 36 , 3 7 , 58 CI Pigment Blue 1 , 2, 15 , 15 : 1, 1 5 : 2 ' 1 5: 3 ' 1 5: 4, 16, 22, 60, 64, 66, 79 '79 C1 φ [代基经改者, 80 C .1 Pigment Violet 1, 19 &gt; 23 1 '27, 32, 37, 42, c.1. Pigment Brown 25, 28, etc. As a pigment which is preferably used in these, 187, 216, 272 ', 14, '36, 2, 63, 98, 115> 128 ' 153 ' 169, 180, 214, 38, 4 3 , 71, 15: 6,

爲 OH 下者。 -22- 201009498 但是，於本發明中，並不受此等所限定。 C.I.顏料黃 11、24、108、109、11〇、138、139、150、 151、 154、 167、 180' 185， C.I.顔料橙 36、71， C_I.顔料紅 122、 150、 171、 175、 177、 209、 224、 242 、254 、 255 &gt; 264 ， C.I.顏料紫 1 9、23、32， C.I.顏料藍 15:1、15:3、15:6、〜16、22、60、66， © C.I·顔料綠 7、36、37、58 » 此等有機顔料可爲單獨，或爲了提高色純度，可以使 用各種的組合。以下顯示組合的具體例。 例如’作爲紅色相（R)用的顔料，可使用蒽醌 (anthraquinone)顏料、菲（perylene)顔料、二酮基吡略并吡 咯（diketopyrrolopyrrole)顏料的單獨或彼等的至少—種， 與雙偶氮（disazo)黃色顏料、異吲哚啉（is〇ind〇line)黃色顏 料、唾啉黃（quinophthalone)黃色顏料或茈紅色顏料、惠醒 紅色顔料、二酮基吡咯并吡咯紅色顏料的混合等。例如， 作爲蒽醌顏料，可舉出C.I.顏料紅177;作爲茈系顏料， 可舉出C.I·顔料紅155、C.I.顏料紅224;作爲二酮基吡略 并吡咯顔料，可舉出C.I.顔料紅254，從色再現性之點來 看’較佳爲此等的至少1種與C.I·顔料黃139、或C.〗.顏 料黃150與C.I.顔料紅的混合。又，紅色顏料與其它顏料（ 黃色顔料或紅色顔料）之質量比（紅色顔料：其他顏料）較佳 爲1〇〇:5〜1〇〇:8〇。藉由在該範圍，可抑制4〇〇nm〜 5〇()nm -23- 201009498 的光透過率’可提高色純度，可維持顯色力。特別地，作 爲上述質量比’ 100:10〜100:65的範圍係最合適。再者， 於紅色顔料彼此組合時，可配合色度來調整。 又，作爲綠色相（G)用的顔料，可以單獨地使用鹵化酞 花青顏料，或使用其與雙偶氮黃色顏料、喹啉黃黃色顔料 、甲亞胺（azomethine)黃色顔料或異吲哚啉黃色顏料的混 合。例如，作爲如此的例子，較佳爲C · I ·顔料綠7、3 6、 37、58與C.I.顏料黃138、C.I.顏料黃139、C.I.顏料黃 150、C.I.顏料黃180或C.I顏料黃185的混合。綠顏料與 ® 黃色顏料的質量比（綠顏料：黃色顔料），從得到充分的色純 度及抑制與 NTSC(National Television Standards Committee)目標色相的偏離之觀點來看，較佳爲1〇〇:5〜 1 00:1 50，特佳爲 1〇〇:30 〜1 00:1 20 的範圍。 作爲藍色相（B)用的顏料，可以單獨地使用酞花青顏料 ’或使用其與二噚畊紫色顔料的混合。例如，較佳爲C I 顏料藍15:6與C.I.顏料紫23的混合。藍色顏料與紫色顏 料的質量比（藍色顔料：紫色顏料）較佳爲100:0〜1〇〇:50， G 更佳爲1 00:0〜1 00:40。 本發明的著色感光性樹脂組成物中之顏料的含量，相 對於該組成物的全部固體成分而言爲10〜55質量％，更佳 爲15〜50質量％。顔料的含量若在前述範圍內，則有效於 確保色濃度充分的優異色特性》 於本發明中，視需要可使用微細且整粒化的有機顏料 。顔料的微細化係將顏料與水溶性有機溶劑及水溶性無機 -24- 201009498 鹽類一起磨碎成高黏度的液狀組成物的步驟。 作爲水溶性有機溶劑，可舉出甲醇、乙醇、異丙醇、 正丙醇、異丁醇、正丁醇、乙二醇、二甘醇、二甘醇單甲 基醚、二甘醇單乙基醚、二甘醇單丁基醚、丙二醇、丙二 醇單甲基醚醋酸酯等。然而，若僅少量使用，吸附在顏料 而不流失在廢水，則亦可使用苯、甲苯、二甲苯、乙苯、 氯苯、硝基苯、苯胺、吡啶、喹啉、四氫呋喃 (tetrahydrofuran)、二噚烷、醋酸乙酯、醋酸異丙酯、醋酸 〇 丁酯、己烷、庚烷、辛烷、壬烷、癸烷、十一烷、十二烷 、環己烷、甲基環己烷、鹵化烴、丙酮、甲基乙基酮、甲 基異丁基酮、環己酮、二甲基甲醯胺、二甲亞碾、N-甲基 吡咯啶酮等，而且視需要也可混合2種類以上的溶劑來使 用。 作爲本發明中的水溶性無機鹽之例，可舉出氯化鈉、 氯化鉀、氯化鈣、氯化鋇、硫酸鈉等。 水溶性無機鹽的使用量係顏料的1〜50倍質量，愈多 ® 愈有磨碎效果，從生產性之點來看，更佳的量爲1〜10倍 質量，特佳爲水分在1 %以下。 相對於顔料而言，水溶性有機溶劑的使用量爲50質量 %〜300質量％的範圍，較佳爲100質量％〜200質量％的範 圍。本發明的濕式粉碎裝置之運轉條件係沒有特別的限制 ，爲了有效地進行以粉碎介質的磨碎，使用捏合機 (kneader)當作裝置時的運轉條件係裝置內的葉片（bUde)之 回轉數較佳爲10〜200rpm，而且2軸的回轉比相對地愈大 -25- 201009498 則磨碎效果愈大而較佳。運轉時間與乾式粉碎時間合計較 佳爲1小時〜8小時，裝置的內溫較佳爲5〇〜15(rc。又 ’粉碎介質的水溶性無機鹽較佳爲粉碎粒度5〜5〇;/m、粒 徑分布窄且球形。 於本發明中，特別在顏料的微細化步驟或分散步驟中 ’較佳爲使用經高分子化合物被覆的顏料。藉由以高分子 化合物被覆顏料，即使爲微細化的顔料，也可得到抑制2 次凝聚物的形成，可以1次粒子的狀態分散的分散性提高 之被覆顏料’安定地維持所分散的1次粒子之分散安定性 ❹ 優異的被覆顏料而使用。For OH. -22- 201009498 However, in the present invention, it is not limited thereto. CI Pigment Yellow 11, 24, 108, 109, 11〇, 138, 139, 150, 151, 154, 167, 180' 185, CI Pigment Orange 36, 71, C_I. Pigment Red 122, 150, 171, 175, 177 , 209, 224, 242, 254, 255 &gt; 264 , CI Pigment Violet 9, 9, 32, CI Pigment Blue 15:1, 15:3, 15:6, ~16, 22, 60, 66, © CI • Pigment Green 7, 36, 37, 58 » These organic pigments may be used alone or in order to improve color purity, various combinations may be used. Specific examples of the combination are shown below. For example, 'as a pigment for the red phase (R), anthraquinone pigment, phenanthrene pigment, diketopyrrolopyrrole pigment alone or at least one of them, and double A mixture of disazo yellow pigment, is〇ind〇line yellow pigment, quinophthalone yellow pigment or crimson pigment, awake red pigment, diketopyrrolopyrrole red pigment Wait. For example, CI Pigment Red 177 is exemplified as the ruthenium pigment, CI·Pigment Red 155 and CI Pigment Red 224 are exemplified as the ruthenium pigment, and CI Pigment Red is exemplified as the diketopipyrrolopyrrole pigment. 254. From the viewpoint of color reproducibility, it is preferable to mix at least one of CI·Pigment Yellow 139 or C., Pigment Yellow 150 and CI Pigment Red. Further, the mass ratio of the red pigment to other pigments (yellow pigment or red pigment) (red pigment: other pigment) is preferably 1 〇〇: 5 〜 1 〇〇: 8 〇. By this range, the light transmittance of 4 〇〇 nm 〜 5 〇 () nm -23 - 201009498 can be suppressed, the color purity can be improved, and the color development power can be maintained. In particular, the range of the above mass ratio '100:10 to 100:65 is most suitable. Further, when the red pigments are combined with each other, they can be adjusted in accordance with the chromaticity. Further, as the pigment for the green phase (G), a halogenated phthalocyanine pigment may be used alone, or it may be used together with a disazo yellow pigment, a quinoline yellow pigment, an azomethine yellow pigment or an isoindole. Mixing of porphyrin yellow pigments. For example, as such an example, C · I · Pigment Green 7, 3 6, 37, 58 and CI Pigment Yellow 138, CI Pigment Yellow 139, CI Pigment Yellow 150, CI Pigment Yellow 180 or CI Pigment Yellow 185 are preferred. mixing. The mass ratio of the green pigment to the yellow pigment (green pigment: yellow pigment) is preferably 1 〇〇:5 from the viewpoint of obtaining sufficient color purity and suppressing deviation from the target color of the NTSC (National Television Standards Committee). ~ 1 00:1 50, especially good for 1 〇〇:30 ~1 00:1 20 range. As the pigment for the blue phase (B), a phthalocyanine pigment ’ can be used alone or a mixture thereof can be used. For example, a mixture of C I Pigment Blue 15:6 and C.I. Pigment Violet 23 is preferred. The mass ratio of the blue pigment to the purple pigment (blue pigment: purple pigment) is preferably 100:0 to 1 〇〇: 50, and more preferably 100 00:1 to 00:40. The content of the pigment in the colored photosensitive resin composition of the present invention is 10 to 55 mass%, more preferably 15 to 50 mass%, based on the total solid content of the composition. When the content of the pigment is within the above range, it is effective in ensuring excellent color characteristics in which the color density is sufficient. In the present invention, a fine and sized organic pigment can be used as needed. The refinement of the pigment is a step of grinding the pigment together with a water-soluble organic solvent and a water-soluble inorganic compound, the salt of the water, into a high-viscosity liquid composition. Examples of the water-soluble organic solvent include methanol, ethanol, isopropanol, n-propanol, isobutanol, n-butanol, ethylene glycol, diethylene glycol, diethylene glycol monomethyl ether, and diethylene glycol monoethyl bromide. Ethyl ether, diethylene glycol monobutyl ether, propylene glycol, propylene glycol monomethyl ether acetate, and the like. However, if it is used only in a small amount and adsorbed on the pigment without being lost to the wastewater, benzene, toluene, xylene, ethylbenzene, chlorobenzene, nitrobenzene, aniline, pyridine, quinoline, tetrahydrofuran, and Decane, ethyl acetate, isopropyl acetate, butyl acetate, hexane, heptane, octane, decane, decane, undecane, dodecane, cyclohexane, methylcyclohexane, Halogenated hydrocarbon, acetone, methyl ethyl ketone, methyl isobutyl ketone, cyclohexanone, dimethylformamide, dimethyl amide, N-methylpyrrolidone, etc., and may be mixed as needed 2 Use more than one type of solvent. Examples of the water-soluble inorganic salt in the present invention include sodium chloride, potassium chloride, calcium chloride, barium chloride, sodium sulfate, and the like. The amount of water-soluble inorganic salt used is 1 to 50 times the mass of the pigment. The more the product, the more grinding effect. From the point of view of productivity, the better amount is 1 to 10 times the mass, and the better is the moisture in 1 %the following. The amount of the water-soluble organic solvent to be used is in the range of 50% by mass to 300% by mass, preferably 100% by mass to 200% by mass based on the pigment. The operating conditions of the wet pulverizing apparatus of the present invention are not particularly limited, and in order to efficiently perform the grinding of the pulverizing medium, the operating condition when the kneader is used as the apparatus is the rotation of the blade (bUde) in the apparatus. The number is preferably from 10 to 200 rpm, and that the rotation ratio of the two axes is relatively large -25 - 201009498, the larger the grinding effect is. The total operation time and the dry pulverization time are preferably from 1 hour to 8 hours, and the internal temperature of the apparatus is preferably from 5 〇 to 15 (rc. Further, the water-soluble inorganic salt of the pulverization medium is preferably pulverized by 5 to 5 Å; m. The particle size distribution is narrow and spherical. In the present invention, in particular, in the pigment refining step or the dispersing step, it is preferred to use a pigment coated with a polymer compound. By coating the pigment with a polymer compound, even if it is fine In addition, it is possible to obtain a coating pigment which is capable of suppressing the formation of a secondary aggregate, and which is capable of maintaining the dispersion stability of the dispersed primary particles by maintaining the dispersion property of the primary particles dispersed in the state of the primary particles. .

被覆處理較佳爲與顏料的微細化步驟同時進行，具體 地經由：添加⑴顏料、（ii)水溶性的無機鹽、（iii)實質上不 溶解（ii)的少量水溶性有機溶劑、及（iv)高分子化合物，藉 由捏合機等進行機械混煉的步驟（稱爲鹽磨（salt milling)步 驟），將此混合物投入水中，以高速混合器等來攪拌而成爲 漿體（slurry)狀的步驟，及將此漿體過濾、水洗及視需要進 行乾燥的步驟而實施。 G 更具體地說明上述鹽磨。首先，在（i)有機顏料與（ii)水 溶性的無機鹽之混合物中，添加少量的（iii)水溶性有機溶 劑當作濕潤劑，藉由捏合機等強力混入後，將此混合物投 入水中，以高速混合器等來攪拌而成爲漿體狀。其次，將 此漿體過濾、水洗及視需要進行乾燥，而得到微細化的顔 料。再者，於分散在油性清漆（varnish)中而使用的情況中 ，亦可能對乾燥前的處理顏料（稱爲濾餅（cake))，藉由一般 -26- 201009498 稱爲沖洗（flushing)的方法，邊去除水邊分散在油性的清漆 中。又，於分散在水系的清漆中之情況，處理顏料係不需 要乾燥，可將濾餅照原樣地分散在清漆中。 於本發明中，藉由在鹽磨時於上述（iii)有機溶劑中倂用 (iv)至少一部分可溶的樹脂，可得到微細且表面經（iv)至少 一部分可溶的樹脂所被覆，乾燥時的顏料之凝聚少者。 再者，（iv)高分子化合物係可在鹽磨步驟的初期全部添 加，或可在鹽磨步驟中分割地添加。又，亦可在分散步驟 ® 中添加。 顔料之被覆所用的高分子化合物，可以使用對顏料具 有吸附性基的任何者。特別地，較佳爲經側鏈具有雜環的 高分子化合物所被覆處理者。作爲如此的高分子化合物， 較佳爲含有從下述通式（2)所示的單體或是由馬來醯亞胺或 馬來醯亞胺衍生物所成的單體而來的聚合單位之聚合物， 特佳爲含有從下述通式（2)所示的單體而來的聚合單位之聚 合物。 ® R1 h2c=c ⑵The coating treatment is preferably carried out simultaneously with the step of refining the pigment, specifically by adding (1) a pigment, (ii) a water-soluble inorganic salt, (iii) a small amount of a water-soluble organic solvent which does not substantially dissolve (ii), and Iv) a polymer compound, which is subjected to mechanical kneading by a kneader or the like (referred to as a salt milling step), and the mixture is poured into water and stirred by a high-speed mixer or the like to become a slurry. The steps are carried out by the steps of filtering, washing, and drying as needed. G more specifically describes the above salt mill. First, a small amount of (iii) a water-soluble organic solvent is added as a wetting agent to a mixture of (i) an organic pigment and (ii) a water-soluble inorganic salt, and the mixture is poured into water after being strongly mixed by a kneader or the like. The mixture is stirred by a high-speed mixer or the like to form a slurry. Next, the slurry is filtered, washed with water, and dried as needed to obtain a fine pigment. Further, in the case of being used in dispersion in an oily varnish, it is also possible to treat a pre-drying treatment pigment (referred to as a cake) by means of general -26-201009498 as flushing. The method is dispersed in an oily varnish while removing water. Further, in the case of being dispersed in a water-based varnish, the treatment pigment does not need to be dried, and the filter cake can be dispersed as it is in the varnish. In the present invention, by using (iv) at least a portion of the soluble resin in the above (iii) organic solvent during salt milling, it is possible to obtain a fine and surface-coated (iv) at least partially soluble resin, dried. When the aggregation of pigments is small. Further, the (iv) polymer compound may be added all at the beginning of the salt milling step or may be added in a divided manner in the salt milling step. Alternatively, it can be added in the dispersion step ® . Any polymer compound used for coating the pigment may be any one having an adsorbing group for the pigment. In particular, it is preferred that the polymer compound having a heterocyclic ring in the side chain is coated with a handle. As such a polymer compound, a polymerization unit containing a monomer represented by the following formula (2) or a monomer derived from a maleimide or a maleimine derivative is preferred. The polymer is particularly preferably a polymer containing a polymerization unit derived from a monomer represented by the following formula (2). ® R1 h2c=c (2)

i-R2-Z 前述通式（2)中，R1表示氫原子、或取代或未取代的烷 基。R2表示單鍵或2價連結基。Y表示-CO-、-C( = 0)〇- 、-CONH-、-0C( = 0)-或伸苯基。Z表示具有雜環構造的基 〇 作爲R1的烷基，較佳爲碳數1〜12的烷基，更佳爲碳 數1〜8的烷基，特佳爲碳數1〜4的烷基。 -27- 201009498 當R1所示的烷基具有取代基時，作爲該取代基，例如 可舉出羥基、烷氧基（較佳爲碳數1〜5的烷氧基，更佳爲 碳數1〜3的烷氧基）、甲氧基 '乙氧基、環己氧基等。 作爲R1所示的較佳烷基之具體例，可舉出甲基、乙基 、丙基、正丁基、異丁基、第三丁基、正己基、環己基、 2-羥乙基、3-羥丙基、2-羥丙基' 2·甲氧基乙基。 作爲R1，最佳爲氫原子或甲基。 通式（2)中，R2表示單鍵或2價連結基。作爲該2價連 結基，較佳爲取代或未取代的伸烷基。作爲該伸烷基，較 ® 佳爲碳數1〜12的伸烷基，尤佳爲碳數1〜10的伸烷基， 更佳爲碳數1〜8的伸烷基，特佳爲碳數1〜4的伸烷基。 R2所示的伸烷基亦可爲經由雜原子（例如氧原子、氮原 子或硫原子）而連結2個以上者。 作爲R2所示的較佳伸烷基之具體例，可舉出亞甲基、 伸乙基、伸丙基、三亞甲基、四亞甲基。 當R2所示的伸烷基具有取代基時，作爲該取代基，例 如可舉出羥基等。 © 作爲R2所示的2價連結基，可爲在上述伸烷基之末端 ，具有從-〇-、-s-、-C( = 0)0-、-CONH-、-C( = 0)S-、-NHCONH-、 -NHC( = 0)0-、-NHC( = 0)S-、 -0C( = 0)-、-OCONH-及-NHCO-所選出之雜原子或含雜原子的部分構造 ，經由該雜原子或含雜原子的部分構造而與Z連結者。 通式（2)中，Z表示具有雜環構造的基》作爲具有雜環 構造的基，例如可舉出酞花青、不溶性偶氮、偶氮色淀 -28- 201009498 (azo lake)、蒽醌、唾 fff 陡酮、二 if 哄（dioxadine)、二酮基 吡格并耻略、蒽吡陡、惠酮探恵酮（anthanthrone)、陰丹酮 (indanthrone)、黃院酮（flavanthrone)、花酮（perinone)、菲 (perylene)、及硫靛的色素構造，以及例如噻吩（thiophene) 、呋喃（furan)、咕噸、吡咯、吡略啉、吡略啶、二噚茂烷 、吡唑、吡唑啉、吡唑啶、咪唑、噚唑、噻唑、噚二唑、 三唑、噻二唑、吡喃、吡啶、哌啶、二噚烷、味啉、嗒畊 、嘧啶、哌阱、三阱、三噻烷（trithiane)、異吲哚啉、異 V 吲哚啉酮、苯并咪唑酮、苯并噻唑、琥珀醯亞胺、苯二甲 醯亞胺、萘二甲醯亞胺、乙丙醯脲（hydantoin)、吲哚、喹 啉、咔唑、吖啶、吖啶酮、蒽醌、吡阱、四唑、啡噻哄、 啡噚畊、苯并咪唑、苯并三唑、環狀醯胺、環狀脲及環狀 ϋ亞胺等的雜環構造。此等雜環構造亦可具有取代基，作 爲該取代基，例如可舉出烷基、烷氧基、鹵素原子、脂肪 族醋基、芳香族酯基、烷氧羰基等。 Ζ更佳爲具有碳數6以上的含氮雜環構造之基，特佳爲 ❹ 具有碳數6〜12的含氮雜環構造之基。作爲碳數6以上的 含氮雜環構造，具體地較佳爲啡噻阱環、啡噚畊環、吖啶 酮環、蒽醌環、苯并咪唑構造、苯并三唑構造、苯并噻唑 構造、環狀醯胺構造、環狀脲構造及環狀醯亞胺構造，特 佳爲下述通式（3)、（4)或（5)所示的構造。i-R2-Z In the above formula (2), R1 represents a hydrogen atom or a substituted or unsubstituted alkyl group. R2 represents a single bond or a divalent linking group. Y represents -CO-, -C(=0)〇-, -CONH-, -0C(=0)- or phenyl. Z represents a fluorene having a heterocyclic structure as an alkyl group of R1, preferably an alkyl group having 1 to 12 carbon atoms, more preferably an alkyl group having 1 to 8 carbon atoms, particularly preferably an alkyl group having 1 to 4 carbon atoms. . -27-201009498 When the alkyl group represented by R1 has a substituent, examples of the substituent include a hydroxyl group and an alkoxy group (preferably an alkoxy group having 1 to 5 carbon atoms, more preferably a carbon number of 1). ～3 alkoxy), methoxy 'ethoxy, cyclohexyloxy and the like. Specific examples of the preferred alkyl group represented by R1 include a methyl group, an ethyl group, a propyl group, a n-butyl group, an isobutyl group, a tert-butyl group, a n-hexyl group, a cyclohexyl group, and a 2-hydroxyethyl group. 3-hydroxypropyl, 2-hydroxypropyl ' 2 methoxyethyl. As R1, it is preferably a hydrogen atom or a methyl group. In the formula (2), R2 represents a single bond or a divalent linking group. As the divalent linking group, a substituted or unsubstituted alkylene group is preferred. The alkylene group is preferably an alkylene group having a carbon number of from 1 to 12, more preferably an alkylene group having a carbon number of from 1 to 10, more preferably an alkylene group having a carbon number of from 1 to 8, particularly preferably carbon. A number 1 to 4 of an alkyl group. The alkylene group represented by R2 may be a group in which two or more are bonded via a hetero atom (for example, an oxygen atom, a nitrogen atom or a sulfur atom). Specific examples of the preferred alkylene group represented by R2 include a methylene group, an exoethyl group, a propyl group, a trimethylene group, and a tetramethylene group. When the alkylene group represented by R2 has a substituent, examples of the substituent include a hydroxyl group and the like. © as a divalent linking group represented by R2, may have a radical from -〇-, -s-, -C(=0)0-, -CONH-, -C(=0) at the end of the above alkylene group. S-, -NHCONH-, -NHC(=0)0-, -NHC(=0)S-, -0C(=0)-, -OCONH-, and -NHCO- selected heteroatoms or heteroatom-containing Partially constructed, linked to Z via the heteroatom or heteroatom-containing moiety. In the formula (2), Z represents a group having a heterocyclic structure as a group having a heterocyclic structure, and examples thereof include phthalocyanine, insoluble azo, azo lake -28-201009498 (azo lake), and hydrazine.醌, salivation fff steep ketone, di oxa oxime (dioxadine), diketopipyridone and ruthenium, pyridoxine, anthanthrone, indanthrone, flavanthrone, Pigment structures of perinone, perylene, and thioindigo, and, for example, thiophene, furan, xanthene, pyrrole, pyroline, pirolidin, dioxane, pyrazole , pyrazoline, pyrazole, imidazole, oxazole, thiazole, oxadiazole, triazole, thiadiazole, pyran, pyridine, piperidine, dioxane, porphyrin, sorghum, pyrimidine, pipe trap, Tritrap, trithiane, isoporphyrin, iso-V porphyrin, benzimidazolone, benzothiazole, amber imine, phthalimide, naphthyl imine, Hydantoin, hydrazine, quinoline, oxazole, acridine, acridone, hydrazine, pyrazole, tetrazole, morphine, porphyrin, benzopyrimidine , Benzotriazole, cyclic acyl amines, cyclic ureas and cyclic imine ϋ heterocyclic structure. These heterocyclic structures may have a substituent. Examples of the substituent include an alkyl group, an alkoxy group, a halogen atom, an aliphatic acetoxy group, an aromatic ester group, and an alkoxycarbonyl group. More preferably, it is a group having a nitrogen-containing heterocyclic ring structure having a carbon number of 6 or more, and particularly preferably a group having a nitrogen-containing heterocyclic ring having a carbon number of 6 to 12. The nitrogen-containing heterocyclic ring structure having a carbon number of 6 or more is specifically preferably a phenothiazine ring, a porphyrin ring, an acridone ring, an anthracene ring, a benzimidazole structure, a benzotriazole structure, or a benzothiazole. The structure, the cyclic guanamine structure, the cyclic urea structure, and the cyclic quinone imine structure are particularly preferably those represented by the following general formula (3), (4) or (5).

通式（3) 通式（4) 通式（5) -29- 201009498 通式（3 )中，E係從單鍵、伸烷基（例如亞甲基、伸乙基 、伸丙基、三亞甲基、四亞甲基等）、_〇_、_S-、-NRA-及_ c( = o)-所組成族群所選出的任一者。此處’ RA表示氫原子 或烷基。RA表示烷基時的烷基較佳爲碳數1〜18的烷基， 更佳爲碳數1〜6的烷基，例如可舉出甲基、乙基、正丙 基、異丙基、正丁基、第三丁基、正己基、正辛基、2-乙 基己基、正十八基等。 於上述之中，作爲通式（3)的E，較佳爲單鍵、亞甲基 、-0-或-C( = 0)-，特佳爲-C( = 0)-。 © 通式（5)中，Y1及 Y2各自獨立地表示-N=、-NH-、 N(RB)-、-S-或- Ο-。RB表示烷基，RB表示烷基時的烷基較 佳爲碳數1〜18的烷基，更佳爲碳數1〜6的烷基，例如 可舉出甲基、乙基、正丙基、異丙基、正丁基、第三丁基 、正己基、正辛基、2-乙基己基、正十八基等。 於上述之中，作爲通式（5)的Y1及Y2，特佳爲-N=、-NH-及-N(RB)-。作爲γ1及Y2的組合，可舉出γΐ及γ2的 任一方爲-Ν =且另一方爲-ΝΗ-的組合，即咪唑基。 ® 通式（3)、（4)及（5)中，環Β1、環Β2、環C及環D各自 獨立地表示芳香環。作爲該芳香環，例如可舉出苯環、萘 環、節環、莫（azulene)環、莽環、恵環、卩比陡環、吡畊環 、嘧啶環、吡咯環、咪唑環、吲哚環、喹啉環、吖啶環、 啡噻阱環、啡噚畊環、吖啶酮環、蒽醌環等，其中較佳爲 苯環、萘環、蒽環、吡啶環、啡噚阱環、吖啶環、啡噻阱 環、啡噚畊環、吖啶酮環、蒽醌環’特佳爲苯環、萘環、 -30- 201009498 吡啶環。 · 具體地’作爲通式（3)的環B1或環B2，例如可舉出苯 環、萘環、吡啶環、吡畊環等。作爲通式（4)的環C，例如 可舉出苯環、萘環、吡啶環、吡阱環等。作爲通式（5)的環 D，例如可舉出苯環、萘環、吡啶環、吡阱環等。 於通式（3)、（4)及（5)所示的構造之中，從分散性、分散 液的經時安定性之點來看，更佳爲苯環、萘環，於通式（3) 或（5)中，更佳爲苯環，於通式（4)中，更佳爲萘環。 作爲用於顏料之被覆的高分子化合物之具體例，除了 以下所示者，例如亦可使用特開2008-8 3089號的[0029]〜 [0030]、特開 2009-62457 號的[0045]〜[0047]及[0075]〜 [0076]中所揭示者。General formula (3) General formula (4) General formula (5) -29- 201009498 In the general formula (3), E is a single bond, an alkyl group (for example, methylene, ethyl, propyl, s. Any of the selected groups of methyl, tetramethylene, etc., _〇_, _S-, -NRA-, and _c(=o)-. Here, 'RA' represents a hydrogen atom or an alkyl group. The alkyl group in the case where RA represents an alkyl group is preferably an alkyl group having 1 to 18 carbon atoms, more preferably an alkyl group having 1 to 6 carbon atoms, and examples thereof include a methyl group, an ethyl group, a n-propyl group, and an isopropyl group. n-Butyl, tert-butyl, n-hexyl, n-octyl, 2-ethylhexyl, n-octadecyl and the like. Among the above, as the E of the formula (3), a single bond, a methylene group, a-0- or -C(=0)-, and particularly preferably -C(=0)- are preferable. © In the general formula (5), Y1 and Y2 each independently represent -N=, -NH-, N(RB)-, -S- or -Ο-. RB represents an alkyl group, and an alkyl group in the case of RB represents an alkyl group is preferably an alkyl group having 1 to 18 carbon atoms, more preferably an alkyl group having 1 to 6 carbon atoms, and examples thereof include a methyl group, an ethyl group, and a n-propyl group. , isopropyl, n-butyl, tert-butyl, n-hexyl, n-octyl, 2-ethylhexyl, n-octadecyl and the like. Among the above, Y1 and Y2 of the formula (5) are particularly preferably -N=, -NH- and -N(RB)-. As a combination of γ1 and Y2, one of γΐ and γ2 is a combination of -Ν = and the other is -ΝΗ-, that is, an imidazole group. ® In the general formulae (3), (4) and (5), the ring Β 1, the ring Β 2, the ring C and the ring D each independently represent an aromatic ring. Examples of the aromatic ring include a benzene ring, a naphthalene ring, a pitch ring, an azulene ring, an anthracene ring, an anthracene ring, a rhodium ring, a pyridine ring, a pyrimidine ring, a pyrrole ring, an imidazole ring, and an anthracene ring. a ring, a quinoline ring, an acridine ring, a morphine ring, a porphyrin ring, an acridone ring, an anthracene ring, etc., preferably a benzene ring, a naphthalene ring, an anthracene ring, a pyridine ring, a porphyrin ring , acridine ring, morphine trap ring, brown cultivating ring, acridone ring, anthracene ring 'excellently benzene ring, naphthalene ring, -30- 201009498 pyridine ring. Specifically, the ring B1 or the ring B2 of the formula (3) may, for example, be a benzene ring, a naphthalene ring, a pyridine ring or a pyridin ring. The ring C of the formula (4) may, for example, be a benzene ring, a naphthalene ring, a pyridine ring or a pyridene ring. The ring D of the formula (5) may, for example, be a benzene ring, a naphthalene ring, a pyridine ring or a pyridene ring. Among the structures represented by the general formulae (3), (4), and (5), from the viewpoint of dispersibility and stability with time of the dispersion liquid, a benzene ring or a naphthalene ring is more preferable. In the 3) or (5), more preferably a benzene ring, and in the formula (4), more preferably a naphthalene ring. Specific examples of the polymer compound to be coated with the pigment include, for example, [0029] to [0030] of JP-A-2008-8309, and [0045] of JP-A-2009-62457. ~ [0047] and [0075] ~ [0076].

-31- 201009498-31- 201009498

C〇2C〇2

OH Η ,ΝOH Η , Ν

Xs*Xs*

ΜΑ-8 HA-9ΜΑ-8 HA-9

ΜΑ-ΠΜΑ-Π

-32- 201009498-32- 201009498

ΠΠ

-33- 201009498 / Η Η Ηc〇p 丫 ΧΧΗ-33- 201009498 / Η Η Ηc〇p 丫 ΧΧΗ

CO Μ-15 Η ΊΟ' 2 Η Η Ν ) Ν ΗCO Μ-15 Η ΊΟ' 2 Η Η Ν ) Ν Η

Ο Μ-16Ο Μ-16

〇〇ΓΥ^〇Χ OH Ν, Μ-19 CH3〇〇ΓΥ^〇Χ OH Ν, Μ-19 CH3

co^y^o OH ΝCo^y^o OH Ν

? M-24 ΟΟΓ^^Ο^ &gt; Μ-23 Ν. C〇2M-24 ΟΟΓ^^Ο^ &gt; Μ-23 Ν. C〇2

CONHT M-25CONHT M-25

CONKCONK

M-26 M-27 |sTNVCH3M-26 M-27 |sTNVCH3

-34- 201009498-34- 201009498

M-28 H-Z9 M-30M-28 H-Z9 M-30

〇r -35- 201009498〇r -35- 201009498

於使用上述被覆處理的顔料時，更佳爲使用分散劑的 至少1種將顏料分散，而成爲顔料分散組成物。藉由含有 此分散劑，可提高顏料的分散性。 作爲分散劑’例如可適宜選擇眾所周知的顏料分散劑 或界面活性劑而使用》 具體地，可使用許多種類的化合物，例如可舉出有機 矽氧烷聚合物（organosiloxane polymer)KP341(信越化學工 業（股）（Shin-Etsu Chemical Co.，Ltd.)製）、（甲基）丙烯酸系 (共）聚合物波利弗若（POLYFLOW)No. 75、No· 90、No. 95( 共榮社化學工業（股）（Ky〇eisha Chemical Co.，Ltd.)製）、 W001(裕商（股）公司（Yusho Co·，Ltd.)製）等的陽離子界面活 性劑；聚氧化乙烯月桂基醚、聚氧化乙烯硬脂基醚、聚氧 化乙烯油基醚、聚氧化乙烯辛基苯基醚、聚氧化乙烯壬基 -36- 201009498 苯基醚、聚乙二醇二月桂酸酯、聚乙二醇二硬脂酸酯、山 梨糖醇酐脂肪酸酯等的非離子界面活性劑；W004、W005 、W017(裕商（股）公司製）等的陰離子界面活性劑；EFKA-46、EFKA-47、EFKA-47EA、EFKA 聚合物 100、EFKA 聚 合物400、EFKA聚合物401、EFKA聚合物450(皆爲汽巴 特殊化學公司（Ciba Japan K.K.)製）、狄司帕司艾得 (DISPERSE AID)6、狄司帕司艾得 8、狄司帕司艾得 15、 狄司帕司艾得9100(皆爲山羅普康公司（San Nopco Limited) ® 製）等的高分子分散劑；索如帕司（SOLSPERSE)3000、5000 、9000 、 12000 ' 13240 、 13940 ' 17000 、 24000 &gt; 26000 、 2 8000等的各種索如帕司分散劑；（日本路比若魯（股）公司 (The L· ub i zo 1 C orp 〇 r at i ο η)製）；阿典卡卜路若尼可（Adeka Pluronic)L31、F38、L42、L44、L61、L64、F68、L72、 P95 、 F77 、 P84 、 F87 、 P94 、 L101 、 P103 、 F108 、 L121 、 P-1 23(旭電化工業（股）（ADEKA Corporation)製）及尹歐涅特 (IONET)S-20(三洋化成（股）Sanyo Chemical Industries Ltd.) ® 製）、Disperbyk 101、103、106、108、109、111、112、 116、 130、 140、 142、 162、 163、 164、 166、 167、 170、 171 、 174 、 176 、 180 ' 182 、 2000 ' 2001 、 2050 、 2150(BYK化學（股）公司（BYK Japan KK)製）。其它可舉出 丙烯酸共聚物等在分子末端或側鏈具有極性基的寡聚物或 聚合物。 分散劑在顏料分散組成物中的量，相對於前述顏料的 質量而言，較佳爲1〜100質量％，更佳爲3〜70質量％。 -37- 201009498 上述顏料分散組成物視需要亦可加有顏料衍生物。藉 由使與分散劑有親和性的部分或導入有極性基的顏料衍生 物吸附於顏料表面，使用其當作分散劑的吸附點，可使顏 料以微細粒子分散在著色感光性樹脂組成物中，防止其再 凝聚，而有效於構成對比高、透明性優異的彩色減光片。 顔料衍生物具體地係以有機顏料當作母體骨架，在側 鏈導入有酸性基或鹼性基、芳香族基當作取代基的化合物 。作爲有機顏料’具體地可舉出唾V陡嗣（quinacridone)顏 料、酞花青顔料、偶氮顏料、喹啉黃（quinophthalone)顏料 © 、異吲哚啉顔料、異吲哚啉酮顔料、唾啉顏料、二酮基吡 咯并吡咯顏料、苯并咪唑酮（ben zimidazolone)顏料等 ° 一 般地’亦含有不稱爲色素的萘系、蒽醌系、三畊（triazine) 系、喹啉系等的淡黃色芳香族多環化合物。作爲色素衍生 物’可使用特開平11-49974號公報、特開平11-189732號 公報、特開平1 0-245 5 0 1號公報、特開2006-265 528號公 報、特開平8-295810號公報、特開平11-199796號公報、 特開2005-234478號公報、特開2003-240938號公報、特 © 開200 1 -3 562 1 0號公報等中記載者。 本發明的顏料衍生物在顏料分散組成物中的含量，相 對於顏料的質量而言，較佳爲1〜30質量％，更佳爲3〜20 質量％。該含量若在前述範圍內，則可邊壓低黏度，邊進 行良好的分散，同時提高分散後的分散安定性，得到透過 率高的優異色特性，於製作彩色濾光片時可構成具有良好 色特性的高對比。 -38 * 201009498 分散的方法例如藉由將顏料與分散劑預先混合，以均 化器等預先分散者，使用採用氧化鉻珠等的珠分散機等使 微分散而進行。 再者’於本發明中，除了顏料，亦可併用染料當作著 色劑。作爲可當作著色劑使用的染料，並沒有特別的限制 ’可使用以往彩色濾光片用途所用的眾所周知之染料。例 如，特開昭64-90403號公報、特開昭64-91102號公報、 特開平1-94301號公報、特開平6-11614號公報、特登 ^ 2592207號、美國專利第4,808,501號說明書、美國專利第 5,667,920號說明書、美國專利第5,〇59,500號說明書、特 開平5-333207號公報、特開平6-35183號公報、特開平6-51115號公報、特開平6-194828號公報、特開平8-211599 號公報、特開平4-249549號公報、特開平1〇_123316號公 報、特開平1 1 -302283號公報、特開平7-2861 07號公報、 特開2001-4823號公報、特開平8-15522號公報、特開平 8-29771號公報、特開平8-146215號公報、特開平11-343437號公報、特開平8-62416號公報、特開2002-14220 號公報、特開2002- 1422 1號公報、特開2002-14222號公 報、特開2002- 14223號公報、特開平8-3 02224號公報、 特開平8-73758號公報、特開平8-1 79120號公報、特開平 8-151531號公報等中記載的色素。 作爲化學構造，可使用具有吡唑偶氮構造、苯胺偶氮 構造、三苯基甲烷構造、蒽醌構造、蒽吡啶酮 (anthrapyridone)構造、亞苄基（benzylidene)構造、氧雜菁 -39- 201009498 (oxonol)構造、吡唑并三唑偶氮（pyrozolotriazoleazo)構造 、吡啶酮偶氮構造、花青構造、啡噻畊構造、吡咯并吡唑 甲亞胺構造、阽噸構造、酞花青構造、苯并吡喃構造、靛 藍構造等的染料。 (D)光聚合引發劑 本發明的紫外光雷射用著色感光性樹脂組成物所用的 光聚合引發劑係下述通式⑴所示的化合物。When the pigment to be coated is used, it is more preferred to disperse the pigment by using at least one of the dispersant to form a pigment dispersion composition. By containing this dispersant, the dispersibility of the pigment can be improved. As the dispersing agent, for example, a well-known pigment dispersing agent or a surfactant can be appropriately selected and used. Specifically, many kinds of compounds can be used, and for example, an organosiloxane polymer KP341 (Shin-Etsu Chemical Industry Co., Ltd.) (Shin-Etsu Chemical Co., Ltd.), (meth)acrylic (co)polymer (POLYFLOW) No. 75, No. 90, No. 95 (Kyoeisha Chemical Co., Ltd.) a cationic surfactant such as Ky〇eisha Chemical Co., Ltd., W001 (manufactured by Yusho Co., Ltd.); polyoxyethylene lauryl ether, Polyoxyethylene stearyl ether, polyoxyethylene oleyl ether, polyoxyethylene octyl phenyl ether, polyoxyethylene fluorenyl-36- 201009498 phenyl ether, polyethylene glycol dilaurate, polyethylene glycol Nonionic surfactant such as distearate or sorbitan fatty acid ester; anionic surfactant such as W004, W005, W017 (manufactured by Yusei Co., Ltd.); EFKA-46, EFKA-47, EFKA-47EA, EFKA Polymer 100, EFKA Polymer 400, EFKA Polymerization 401, EFKA Polymer 450 (all manufactured by Ciba Japan KK), DISPERSE AID 6, Dispassa Aid 8, Dispasi Aid 15, Dispexide 9100 (all manufactured by San Nopco Limited); polymer dispersing agents such as SOLSPERSE 3000, 5000, 9000, 12000 ' 13240 , 13940 ' 17000 , 24000 &gt; 26000, 2 8000, etc., such as Sorpast Dispersant; (The L. ub i zo 1 C orp 〇r at i ο η); Adian Adeka Pluronic L31, F38, L42, L44, L61, L64, F68, L72, P95, F77, P84, F87, P94, L101, P103, F108, L121, P-1 23 ADEKA Corporation and IONET S-20 (Sanyo Chemical Industries Ltd.) ®, Disperbyk 101, 103, 106, 108, 109, 111 , 112, 116, 130, 140, 142, 162, 163, 164, 166, 167, 170, 171, 174, 176, 180 ' 182, 2000 ' 2001 , 2050, 2150 (BYK Japan KK). Other examples include oligomers or polymers having a polar group at a molecular terminal or a side chain such as an acrylic copolymer. The amount of the dispersant in the pigment dispersion composition is preferably from 1 to 100% by mass, more preferably from 3 to 70% by mass, based on the mass of the pigment. -37- 201009498 The above pigment dispersion composition may optionally contain a pigment derivative. By adsorbing a moiety having affinity with a dispersant or a pigment derivative having a polar group adsorbed on the surface of the pigment, using the adsorption point as a dispersing agent, the pigment can be dispersed as fine particles in the colored photosensitive resin composition. To prevent re-agglomeration, it is effective for forming a color dimming film with high contrast and excellent transparency. The pigment derivative is specifically a compound in which an organic pigment is used as a parent skeleton, an acidic group or a basic group is introduced into a side chain, and an aromatic group is used as a substituent. Specific examples of the organic pigment include a quinacridone pigment, a phthalocyanine pigment, an azo pigment, a quinophthalone pigment ©, an isoindoline pigment, an isoindolinone pigment, and saliva. A porphyrin pigment, a diketopyrrolopyrrole pigment, a benzimidazolone pigment, etc. generally contain a naphthalene, an anthraquinone, a triazine, a quinoline, etc., which are not called pigments. Light yellow aromatic polycyclic compound. As the dye-derivatives, JP-A-H09-49974, JP-A-H11-189732, JP-A-H05-2455-1, JP-A-2006-265 528, JP-A No. 8-295810 Japanese Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. The content of the pigment derivative of the present invention in the pigment dispersion composition is preferably from 1 to 30% by mass, more preferably from 3 to 20% by mass, based on the mass of the pigment. When the content is within the above range, the dispersion can be made low, the dispersion can be well dispersed, and the dispersion stability after dispersion can be improved, and excellent color characteristics with high transmittance can be obtained, and a good color can be formed when the color filter is produced. High contrast of characteristics. -38 * 201009498 The dispersion method is carried out by, for example, preliminarily mixing a pigment with a dispersant, dispersing it in a homogenizer or the like, and finely dispersing it using a bead disperser or the like using chrome oxide beads or the like. Further, in the present invention, in addition to the pigment, a dye may be used in combination as a coloring agent. The dye which can be used as a coloring agent is not particularly limited. A well-known dye used in the conventional color filter can be used. For example, JP-A-64-90403, JP-A-64-91102, JP-A-1-94301, JP-A-6-11614, JP-A-2592207, US Patent No. 4,808,501, US Patent No. 5,667,920, U.S. Patent No. 5, 〇59,500, and Japanese Patent Laid-Open No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. In the case of the Japanese Unexamined Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. The dye described in the publication No. 8-151531 or the like. As the chemical structure, a pyrazole azo structure, an aniline azo structure, a triphenylmethane structure, a ruthenium structure, an anthrapyridone structure, a benzylidene structure, or an oxaphthalocyanine-39- can be used. 201009498 (oxonol) structure, pyrozolotriazoleazo structure, pyridone azo structure, cyanine structure, thiophene structure, pyrrolopyrazole-imine structure, xanthene structure, indigo structure A dye such as a benzopyran structure or an indigo structure. (D) Photopolymerization Initiator The photopolymerization initiator used in the coloring photosensitive resin composition for ultraviolet laser irradiation of the present invention is a compound represented by the following formula (1).

上述通式（I)中，R及X各自獨立地表示一價取代基，A 及Y各自獨立地表示二價有機基，Ar表示芳基，η係〇〜5 的整數。當X以複數存在時，複數的χ各自獨立地表示一 價取代基。 作爲前述R所示的一價取代基，較佳爲以下所示的一 價非金屬原子團。 作爲R所示的一價非金屬原子團，可舉出可有取代基 的烷基、可有取代基的芳基、可有取代基的烯基、可有取 代基的炔基、可有取代基的烷基亞磺醯基、可有取代基的 芳基亞擴釀基、可有取代基的烷基磺醯基、可有取代基的 方基磺醯基、可有取代基的醯基、可有取代基的烷氧羰基 、可有取代基的芳氧羰基、可有取代基的膦醯基、可有取 代基的雜環基、可有取代基的烷基硫羰基、可有取代基的 芳基硫羰基、可有取代基的二烷基胺基羰基、可有取代基 -40- 201009498 的二烷基胺基硫羰基等。 作爲可有取代基的烷基，較佳爲碳數1〜30的烷基， 例如可舉出甲基、乙基、丙基、丁基、己基、辛基、癸基 、十二基、十八基、異丙基、異丁基、第二丁基、第三丁 基、1-乙基戊基、環戊基、環己基、三氟甲基、2-乙基己 基、苯甲醯甲基、1-萘甲醯基甲基、2_萘甲醯基甲基、4-甲基磺醯基苯甲醯甲基、4_苯基磺醯基苯甲醯甲基、4-二 甲胺基苯甲醯甲基、4-氰基苯甲醯甲基、4 -甲基苯甲醯甲 ® 基、2·甲基苯甲醯甲基、3-氟苯甲醯甲基、3-三氟甲基苯 甲醯甲基、3-硝基苯甲醯甲基等。 作爲可有取代基的芳基，較佳爲碳數6〜30的芳基， 例如可舉出苯基、聯苯基、1-萘基、2-萘基、9-蒽基、9-菲基、1-芘基、5-丁省基、1-茚基、2-葜基、9-荛基、聯三 苯基、聯四苯基、0_、m-及p-甲苯基、二甲苯基、〇_、m· 及P-枯烯基、采基、戊搭烯基、聯二萘基、聯三萘基、聯 四萘基、庚搭烯基、伸聯苯基、苯并二茚基、螢蒽基、苊 ❹ 烯（aCenaphthylenyl)基、醋蒽烯基、菲烯基、菲基、蒽基 、聯二蒽基、聯三蒽基、聯四蒽基、蒽醌基、菲基、伸三 苯基、芘基、菌基、丁省基、七曜烯（pleiadenyl)基、匠 (picenyl)基、茈基、聯五苯基、戊省基、伸四苯基、聯六 本基、己省基、玉紅省（rubicenyl)基、暈苯（coronenyl)基 、伸三萘基、聯七苯基、庚省基、吡蒽基、卵苯（ovalenyl) 基等。 作爲可有取代基的烯基，較佳爲碳數2〜10的烯基， -41- 201009498 例如可舉出乙烯基、烯丙基、苯乙烯基等。 作爲可有取代基的炔基，較佳爲碳數2〜10的炔基， 例如可舉出乙炔基、丙炔基、炔丙基等》 作爲可有取代基的烷基亞磺醯基，較佳爲碳數1〜20 的烷基亞磺醯基，例如可舉出甲基亞磺醯基、乙基亞磺醯 基、丙基亞磺醯基、異丙基亞磺醯基、丁基亞磺醯基、己 基亞磺醯基、環己基亞磺醯基、辛基亞磺醯基、2-乙基己 基亞磺醯基、癸醯基亞磺醯基、十二醯基亞磺醯基、十八 醯基亞磺醯基、氰基甲基亞磺醯基、甲氧基甲基亞磺醯基 〇 等。 作爲可有取代基的芳基亞磺醯基，較佳爲碳數6〜30 的芳基亞磺醯基，例如可舉出苯基亞磺醯基' 1-萘基亞磺 酿基、2-萘基亞磺醯基、2-氯苯基亞磺醯基、2-甲基苯基 亞磺醯基、2 -甲氧基苯基亞磺醯基、2-丁氧基苯基亞磺醯 基、3-氯苯基亞磺醯基、3_三氟甲基苯基亞磺醯基、3_氰 基苯基亞磺醯基、3-硝基苯基亞磺醯基、4-氟苯基亞磺醯 基、4-氰基苯基亞磺醯基、4_甲氧基苯基亞磺醯基、4_甲 © 基磺醯基苯基亞磺醯基、4_苯基磺醯基苯基亞磺醯基、4-—甲胺基苯基亞磺醯基等。 作爲可有取代基的烷基磺醯基，較佳爲碳數1〜2〇的 院基磺酿基’例如可舉出甲基磺醯基、乙基磺醯基、丙基 碌酿基、異丙基磺醯基、丁基磺醯基、己基磺醯基、環己 基磺醯基' 辛基磺醯基、2_乙基己基磺醯基、癸醯基磺醯 ® '十二酿基磺醯基、十八醯基磺醯基、氰基甲基磺醯基 -42- 201009498 、甲氧基甲基磺醯基、全氟烷基磺醯基等。 作爲可有取代基的芳基磺醯基，較佳爲碳數 芳基磺醯基，例如可舉出苯基磺醯基、1-萘基磺 萘基磺醯基、2-氯苯基磺醯基、2 -甲基苯基磺醯 氧基苯基磺醯基、2-丁氧基苯基磺醯基、3-氯苯 、3-三氟甲基苯基磺醯基、3-氰基苯基磺醯基、 基磺醯基、4-氟苯基磺醯基、4-氰基苯基磺醯基 基苯基磺醯基、4-甲基磺醯基苯基磺醯基、4-苯 β 苯基磺醯基、4-二甲胺基苯基磺醯基等。 作爲可有取代基的醯基，較佳爲碳數2〜20 例如可舉出乙醯基、丙醯基、丁醯基、三氟甲基 醯基、苯甲醯基、1-萘甲醯基、2-萘甲醯基、4-基苯甲醯基、4-苯基磺醯基苯甲醯基、4-二甲胺 基、4-二乙基胺基苯甲醯基、2-氯苯甲醯基、2-醯基、2-甲氧基苯甲醯基、2-丁氧基苯甲醯基、 醯基、3-三氟甲基苯甲醯基、3-氰基苯甲醯基、 ® 甲醯基、4-氟苯甲醯基、4-氰基苯甲醯基、4-甲 醯基等。 作爲可有取代基的烷氧羰基，較佳爲碳數2 -氧羰基，例如可舉出甲氧羰基、乙氧羰基、丙氧 氧羰基、己氧羰基、辛氧羰基、癸氧羰基、十八 三氟甲氧羰基等。 作爲可有取代基的芳氧羰基，可舉出苯氧羰基 羰基、2-萘氧羰基、4-甲基磺醯基苯氧羰基、4- 6〜30的 醯基、2-基、2-甲 基磺醯基 3 -硝基苯 、4-甲氧 基磺醯基 的醯基， 羰基、戊 甲基磺醯 基苯甲醯 甲基苯甲 3-氯苯甲 3-硝基苯 氧基苯甲 …20的烷 羰基、丁 氧羰基、 、1-萘氧 苯基磺醯 -43- 201009498 基苯氧羰基、4-二甲胺基苯氧羰基、4-二乙基胺基苯氧羰 基、2-氯苯氧羰基、2·甲基苯氧羰基、2-甲氧基苯氧羰基 、2-丁氧基苯氧羰基、3-氯苯氧羰基、3-三氟甲基苯氧羰 基、3-氰基苯氧羰基、3-硝基苯氧羰基、4-氟苯氧羰基、 4 -氣基苯氧鑛基、4 -甲氧基苯氧擬基等。 作爲可有取代基的鱗醯基’較佳爲碳數2〜50的膦醯 基，例如可舉出二甲基膦醯基、二乙基膦醯基、二丙基膦 醯基、二苯基膦醯基、二甲氧基膦醯基、二乙氧基膦醯基 、二苯甲醯基膦醯基、雙（2，4,6-三甲基苯基）膦醯基等。 © 作爲可有取代基的雜環基，較佳爲含有氮原子、氧原 子、硫原子、磷原子的芳香族或脂肪族的雜環。例如，可 舉出噻吩基、苯并[b]噻吩基、萘并[2, 3-b]噻吩基、噻蒽 基、呋喃基、吡喃基、異苯并呋喃基、色烯基、咕噸基、 啡噚哄（phenoxathiinyl)基、2H-吡略基、毗咯基、咪唑基 、吡唑基、吡啶基、吡畊基、嘧啶基、嗒哄基、吲哚阱基 、異吲哚基、3H-吲哚基、吲哚基、1H-吲唑基、嘌呤基、 4H-喹畊基、異唾啉基、喹啉基、酞阱基、萘啶基、喹嗶 琳基、喹唑啉基、噌啉基、蝶啶基、4aH-咔唑基、咔唑基 、冷-咔啉基、菲啶基、吖啶基、咱啶基、菲繞啉基、啡阱 基、吩吡阱基、異噻唑基、啡噻畊基、異噚唑基、呋咱基 、啡噚哄基、異色滿基、色滿基、吡咯啶基、吡咯基、咪 唑啶基、咪唑基、吡唑啶基、吡唑基、哌啶基、哌畊基、 吲哚滿基、異吲哚滿基、奎寧環基、味啉基、氧硫卩ill嗶基 等。 -44- 201009498 ί乍有取代基的烷基硫羰基，例如可舉出甲基硫羰 基 '丙基硫幾基、丁基硫羰基、己基硫羰基、辛基硫羰基 '癸基硫幾基、十八基硫羰基、三氟甲基硫羰基等。 作爲可有取代基的芳基硫羰基，可舉出1-萘基硫羰基 、2-萘基硫羯基、4_甲基磺醯基苯基硫羰基、4苯基磺醯 基苯基硫鑛基、4_二甲胺基苯基硫羰基、4_二乙基胺基苯 基硫Μ基' 2-氯苯基硫羰基、2_甲基苯基硫羰基、2_甲氧 基苯基硫簾基、2_ 丁氧基苯基硫羰基、3_氯苯基硫羰基、 © 3_三氟甲基苯基硫羰基、3 -氰基苯基硫羰基、3 -硝基苯基 硫Μ基、4-氟苯基硫羰基、4_氰基苯基硫羰基、4_甲氧基 苯基硫羰基等。 作爲可有取代基的二烷基胺基羰基，可舉出二甲胺基 幾基、二乙胺基羰基、二丙胺基羰基、二丁胺基羰基等。 作爲可有取代基的二烷基胺基硫羰基，可舉出二甲胺 基硫羯基、二丙胺基硫羰基、二丁胺基硫羰基等。 其中’從高感度化之點來看，R更佳爲醯基，具體地較 參 佳爲乙醯基、丙醯基、苯甲醯基、甲苯醯基。 作爲前述Α所示的二價有機基，可舉出可有取代基的 碳數1〜12的伸烷基、可有取代基的伸環己基、可有取代 基的伸炔基。 作爲可導入此等基的取代基，例如可舉出氟原子、氯 原子、溴原子、碘原子等的鹵基、甲氧基、乙氧基、第三 丁氧基等的烷氧基，苯氧基、對甲苯氧基等的芳氧基，甲 氧羰基、丁氧羰基、苯氧羰基等的烷氧羰基，乙醯氧基、 -45- 201009498 丙醯氧基、苯甲醯氧基等的醯氧基，乙醯基、苯甲醯基、 異丁醯基、丙烯醯基、甲基丙烯醯基、甲草醯基等的醯基 ’甲基磺醯基、第三丁基磺醯基等的烷基磺醢基，苯基磺 醯基、對甲苯基磺醯基等的芳基磺醯基，甲胺基、環己基 胺基等的烷基胺基，二甲胺基、二乙胺基、味啉基、哌啶 基等的二烷基胺基，苯基胺基、對甲苯基胺基等的芳基胺 基’甲基、乙基、第三丁基、十二基等的烷基，苯基、對 甲苯基、二甲苯基、枯烯基、萘基、蒽基、菲基等的芳基 等’以及羥基、羧基、甲醯基、锍基、磺基、甲磺醯基、 © 對甲苯磺醯基、胺基、硝基、氰基、三氟甲基、三氯甲基 、三甲基矽烷基'氧鱗基、膦醯基、三甲基銨基、二甲基 銃基、三苯基苯甲醯甲基鱗基等。 其中作爲A ’從提高感度、抑制加熱經時所致的著色 之點來看’較佳爲未取代的伸烷基、經烷基（例如甲基、乙 基、第三丁基、十二基）取代的伸烷基、經烯基（例如乙烯 基、烯丙基）取代的伸烷基、經芳基（例如苯基、對甲苯基 、二甲苯基、枯嫌基、萘基、蒽基、菲基、苯乙烯基）取代 〇 的伸烷基。 作爲前述Ar所示的芳基，較佳爲碳數6〜30的芳基’ 而且亦可具有取代基。 具體地’可舉出苯基、聯苯基、萘基、2-萘基、9-蒽 基、9-菲基、1-芘基、5-丁省基、卜茚基、2_莫基、9_莽基 、聯三苯基、聯四苯基、〇-、m-及p_甲苯基、二甲苯基、 〇-、m-及p-枯嫌基、采基、戊搭烯基、聯二萘基、聯三萘 -46- 201009498 基、聯四萘基、庚搭烯基、伸聯苯基、苯并二節基、 基、苊烯基、醋蒽烯基、菲烯基、弗基、蒽基、聯二 、聯三蒽基、聯四蒽基、蒽醌基、菲基、三鄰亞苯基 基、菌基、丁省基、七曜烯基、匠基、茈基、聯五苯 戊省基、伸四苯基、聯六苯基、己省基、玉紅省基、 基、伸三萘基、聯七苯基、庚省基、吡蒽基、卵苯基 其中，從提高感度、抑制加熱經時所致的著色之點來 較佳爲取代或末取代的苯基。 ® 當上述苯基具有取代基時，作爲其取代基，例如 出氟原子、氯原子、溴原子、換原子等的鹵基，甲氧 乙氧基、第三丁氧基等的烷氧基，苯氧基、對甲苯氧 的方氧基’甲基硫氧基、乙基硫氧基、第三丁基硫氧 的院基硫氧基，苯基硫氧基、對甲苯基硫氧基等的芳 氧基’甲氧羰基、丁氧羰基、苯氧羰基等的烷氧羰基 醯氧基、丙酿氧基、苯甲酶氧基等的醯氧基，乙醯基 甲醯基、異丁醯基、丙烯醯基、甲基丙烯醯基、甲草 ❹ 等的醯基’甲基磺醯基、第三丁基磺醯基等的烷基磺 、苯基磺醯基、對甲苯基磺醯基等的芳基磺醯基，甲 、環己基胺基等的烷基胺基，二甲胺基、二乙胺基、 基、峨陡基等的二烷朞胺基，苯基胺基、對甲苯基胺 的芳基胺基，乙基、第三丁基、十二基等的烷基，羥 竣基、甲醯基、锍基、磺基、甲磺醯基、對甲苯磺酸 胺基、硝基、氰基、三氟甲基、三氯甲基、三甲基矽 、氧膦基、膦醯基、三甲基銨基、二甲基鏑基、三苯 蒽基 、芘 基、 暈苯 等。 看， 可舉 基、 基等 基等 基硫 ，乙 、苯 醯基 醯基 胺基 味啉 基等 基、 基、 烷基 基苯 -47- 201009498 甲醯甲基鳞基等。 通式（I)中，前述Ar與鄰接的S所形成的「SAr」構造 ’從感度之點來看，較佳爲以下所示的構造。In the above formula (I), R and X each independently represent a monovalent substituent, and A and Y each independently represent a divalent organic group, Ar represents an aryl group, and η is an integer of 〇~5. When X is present in a plural number, the plural oximes each independently represent a monovalent substituent. The monovalent substituent represented by the above R is preferably a monovalent non-metal atom group shown below. The monovalent non-metal atom group represented by R may, for example, be an alkyl group which may have a substituent, an aryl group which may have a substituent, an alkenyl group which may have a substituent, an alkynyl group which may have a substituent, may have a substituent Alkyl sulfinyl group, a aryl group which may have a substituent, an alkylsulfonyl group which may have a substituent, a sulfonyl group which may have a substituent, a thiol group which may have a substituent, Alkoxycarbonyl group which may have a substituent, an aryloxycarbonyl group which may have a substituent, a phosphinyl group which may have a substituent, a heterocyclic group which may have a substituent, an alkylthiocarbonyl group which may have a substituent, may have a substituent An arylthiocarbonyl group, a dialkylaminocarbonyl group which may have a substituent, a dialkylaminothiocarbonyl group which may have a substituent of -40 to 201009498, and the like. The alkyl group which may have a substituent is preferably an alkyl group having 1 to 30 carbon atoms, and examples thereof include a methyl group, an ethyl group, a propyl group, a butyl group, a hexyl group, an octyl group, a decyl group, a dodecyl group and a tenth group. Octa, isopropyl, isobutyl, t-butyl, tert-butyl, 1-ethylpentyl, cyclopentyl, cyclohexyl, trifluoromethyl, 2-ethylhexyl, benzamidine 1, 1-naphthylmethylmethyl, 2-naphthylmethylmethyl, 4-methylsulfonyl benzhydrylmethyl, 4-phenylsulfonylbenzimidylmethyl, 4-dimethyl Aminobenzhydrylmethyl, 4-cyanobenzhydrylmethyl, 4-methylbenzhydryl®, 2-methylbenzhydrylmethyl, 3-fluorobenzhydrylmethyl, 3- Trifluoromethyl benzamidine methyl, 3-nitrobenzhydrylmethyl, and the like. The aryl group which may have a substituent is preferably an aryl group having 6 to 30 carbon atoms, and examples thereof include a phenyl group, a biphenyl group, a 1-naphthyl group, a 2-naphthyl group, a 9-fluorenyl group, and a 9-phenanthrene group. Base, 1-fluorenyl, 5-butylene, 1-indenyl, 2-indenyl, 9-fluorenyl, triphenyl, tetraphenyl, 0, m-, and p-tolyl, xylene Base, 〇_, m· and P- cumenyl, decyl, pentylene, dinaphthyl, dinaphthyl, dinaphthyl, heptyl, phenyl, benzo Sulfhydryl, fluorenyl, aCenaphthylenyl, acenaphthyl, phenanthryl, phenanthryl, fluorenyl, hydrazino, hydrazinyl, hydrazino, fluorenyl, phenanthrene Base, exotriphenyl, fluorenyl, bacterio, butyl, pleiadenyl, picenyl, fluorenyl, pentacene, pentane, tetraphenyl, hexa , the provincial base, the rubicenyl group, the coronenyl group, the trinaphthyl group, the hexaphenyl group, the heptyl group, the pyridinyl group, the ovalenyl group, and the like. The alkenyl group which may have a substituent is preferably an alkenyl group having 2 to 10 carbon atoms, and the -41 to 201009498 may, for example, be a vinyl group, an allyl group or a styryl group. The alkynyl group which may have a substituent is preferably an alkynyl group having 2 to 10 carbon atoms, and examples thereof include an ethynyl group, a propynyl group, a propargyl group, and the like, and an alkylsulfinyl group which may have a substituent. Preferred examples of the alkylsulfinyl group having 1 to 20 carbon atoms include a methylsulfinyl group, an ethylsulfinyl group, a propylsulfinyl group, an isopropylsulfinyl group, and a butyl group. Isosulfonyl, hexylsulfinyl, cyclohexylsulfinyl, octylsulfinyl, 2-ethylhexylsulfinyl, fluorenylsulfinyl, decylsulfinyl Sulfhydryl, octadecylsulfinyl, cyanomethylsulfinyl, methoxymethylsulfinylhydrazine, and the like. The arylsulfinyl group which may have a substituent is preferably an arylsulfinyl group having a carbon number of 6 to 30, and examples thereof include a phenylsulfinyl ' 1-naphthylsulfinyl alcohol group, and 2 -naphthylsulfinyl, 2-chlorophenylsulfinyl, 2-methylphenylsulfinyl, 2-methoxyphenylsulfinyl, 2-butoxyphenylsulfin Sulfhydryl, 3-chlorophenylsulfinyl, 3-trifluoromethylphenylsulfinyl, 3-cyanophenylsulfinyl, 3-nitrophenylsulfinyl, 4- Fluorophenylsulfinyl, 4-cyanophenylsulfinyl, 4-methoxyphenylsulfinyl, 4-methylsulfonylphenylsulfinyl, 4-phenyl Sulfonylphenylsulfinyl, 4-methylaminophenylsulfinyl, and the like. The alkylsulfonyl group which may have a substituent, preferably a sulfonyl group having a carbon number of 1 to 2 Å, may, for example, be a methylsulfonyl group, an ethylsulfonyl group or a propyl sulfonyl group. Isopropylsulfonyl, butylsulfonyl, hexylsulfonyl, cyclohexylsulfonyl 'octylsulfonyl, 2-ethylhexylsulfonyl, fluorenylsulfonate® Sulfonyl, octadecylsulfonyl, cyanomethylsulfonyl-42-201009498, methoxymethylsulfonyl, perfluoroalkylsulfonyl and the like. The arylsulfonyl group which may have a substituent is preferably a arylsulfonyl group, and examples thereof include a phenylsulfonyl group, a 1-naphthylsulfonaphthylsulfonyl group, and a 2-chlorophenylsulfonyl group. Mercapto, 2-methylphenylsulfonyloxyphenylsulfonyl, 2-butoxyphenylsulfonyl, 3-chlorobenzene, 3-trifluoromethylphenylsulfonyl, 3-cyano Phenyl sulfonyl, sulfonyl, 4-fluorophenylsulfonyl, 4-cyanophenylsulfonylphenylsulfonyl, 4-methylsulfonylphenylsulfonyl, 4-Benzene β phenylsulfonyl, 4-dimethylaminophenylsulfonyl and the like. The fluorenyl group which may have a substituent is preferably a carbon number of 2 to 20, and examples thereof include an ethyl fluorenyl group, a propyl fluorenyl group, a butyl fluorenyl group, a trifluoromethyl fluorenyl group, a benzamidine group, and a 1-naphthomethyl fluorenyl group. 2-naphthylmethyl, 4-ylbenzimidyl, 4-phenylsulfonylbenzylidene, 4-dimethylamino, 4-diethylaminobenzimidyl, 2-chlorobenzene Mercapto, 2-indenyl, 2-methoxybenzimidyl, 2-butoxybenzimidyl, fluorenyl, 3-trifluoromethylbenzhydryl, 3-cyanobenzamide Base, ®-mercapto, 4-fluorobenzhydryl, 4-cyanobenzylidene, 4-methylindenyl, and the like. The alkoxycarbonyl group which may have a substituent is preferably a carbon number 2-oxocarbonyl group, and examples thereof include a methoxycarbonyl group, an ethoxycarbonyl group, a propoxycarbonyl group, a hexyloxycarbonyl group, an octyloxycarbonyl group, a decyloxycarbonyl group, and ten. Octatrifluoromethoxycarbonyl and the like. Examples of the aryloxycarbonyl group which may have a substituent include a phenoxycarbonylcarbonyl group, a 2-naphthyloxycarbonyl group, a 4-methylsulfonylphenoxycarbonyl group, a 4- to 30-amino group, a 2-yl group, and a 2- Methylsulfonyl 3-nitrobenzene, 4-methoxysulfonyl fluorenyl, carbonyl, pentylsulfonyl benzamidine methyl benzo-3-chlorobenzyl 3-nitrophenoxy Benzene 20 alkylcarbonyl, butoxycarbonyl, 1-naphthyloxyphenylsulfonyl-43- 201009498 phenyloxycarbonyl, 4-dimethylaminophenoxycarbonyl, 4-diethylaminophenoxycarbonyl , 2-chlorophenoxycarbonyl, 2-methylphenoxycarbonyl, 2-methoxyphenoxycarbonyl, 2-butoxyphenoxycarbonyl, 3-chlorophenoxycarbonyl, 3-trifluoromethylphenoxycarbonyl , 3-cyanophenoxycarbonyl, 3-nitrophenoxycarbonyl, 4-fluorophenoxycarbonyl, 4-oxophenoxylate, 4-methoxyphenoxy, and the like. The sulfhydryl group which may be a substituent is preferably a phosphinium group having a carbon number of 2 to 50, and examples thereof include a dimethylphosphonium group, a diethylphosphonium group, a dipropylphosphonium group, and a diphenyl group. A phosphinyl group, a dimethoxyphosphonium fluorenyl group, a diethoxyphosphonium fluorenyl group, a dibenzoylphosphonium fluorenyl group, a bis(2,4,6-trimethylphenyl)phosphonium group or the like. The heterocyclic group which may be a substituent is preferably an aromatic or aliphatic heterocyclic ring containing a nitrogen atom, an oxygen atom, a sulfur atom or a phosphorus atom. Examples thereof include a thienyl group, a benzo[b]thienyl group, a naphtho[2,3-b]thienyl group, a thioxanyl group, a furyl group, a pyranyl group, an isobenzofuranyl group, a chromenyl group, and a fluorenyl group. Tonsyl, phenoxathiinyl, 2H-pyridyl, pyrrolyl, imidazolyl, pyrazolyl, pyridyl, pyridinyl, pyrimidinyl, fluorenyl, hydrazine, isoindole , 3H-fluorenyl, fluorenyl, 1H-carbazolyl, fluorenyl, 4H-quinoline, iso- phenyl-phenyl, quinolinyl, anthracene, naphthyridyl, quinalinyl, quin Oxazolinyl, porphyrinyl, pteridinyl, 4aH-carbazolyl, oxazolyl, cold-carboline, phenanthryl, acridinyl, acridinyl, phenanthroline, morphine, phenanth Pyridyl, isothiazolyl, phenothiphenyl, isoxazolyl, furazinyl, morphyl, heterochroman, chromanyl, pyrrolidinyl, pyrrolyl, imidazolidinyl, imidazolyl, pyridyl An oxazolidinyl group, a pyrazolyl group, a piperidinyl group, a piperidinyl group, an indanyl group, an isoindanyl group, a quinuclidinyl group, a morpholinyl group, an oxysulfonium yl group, and the like. -44- 201009498 烷基 The alkylthiocarbonyl group having a substituent may, for example, be a methylthiocarbonyl 'propylthio group, a butylthiocarbonyl group, a hexylthiocarbonyl group, an octylthiocarbonyl 'mercaptothio group, Octadecylthiocarbonyl, trifluoromethylthiocarbonyl, and the like. Examples of the arylthiocarbonyl group which may have a substituent include 1-naphthylthiocarbonyl, 2-naphthylthiononyl, 4-methylsulfonylphenylthiocarbonyl, and 4-phenylsulfonylphenylsulfide. Olefin, 4-dimethylaminophenylthiocarbonyl, 4-diethylaminophenylthiomethyl '2-chlorophenylthiocarbonyl, 2-methylphenylthiocarbonyl, 2-methoxybenzene Sulphate, 2-butoxyphenylthiocarbonyl, 3-chlorophenylthiocarbonyl, ©3-trifluoromethylphenylthiocarbonyl, 3-cyanophenylthiocarbonyl, 3-nitrophenylsulfide Anthracenyl, 4-fluorophenylthiocarbonyl, 4-cyanophenylthiocarbonyl, 4-methoxyphenylthiocarbonyl, and the like. The dialkylaminocarbonyl group which may have a substituent may, for example, be a dimethylamino group, a diethylaminocarbonyl group, a dipropylaminocarbonyl group or a dibutylaminocarbonyl group. The dialkylaminothiocarbonyl group which may have a substituent may, for example, be a dimethylaminothiol group, a dipropylaminothiocarbonyl group or a dibutylaminothiocarbonyl group. Among them, R is more preferably a sulfhydryl group from the viewpoint of high sensitivity, and specifically, it is preferably an ethyl fluorenyl group, a propyl fluorenyl group, a benzamidine group or a toluene group. The divalent organic group represented by the above fluorene may, for example, be an alkylene group having 1 to 12 carbon atoms which may have a substituent, a cyclohexylene group which may have a substituent, or an alkynyl group which may have a substituent. Examples of the substituent which can introduce such a group include a halogen group such as a fluorine atom, a chlorine atom, a bromine atom or an iodine atom, an alkoxy group such as a methoxy group, an ethoxy group or a third butoxy group, and a benzene group. An aryloxy group such as an oxy group or a p-tolyloxy group; an alkoxycarbonyl group such as a methoxycarbonyl group, a butoxycarbonyl group or a phenoxycarbonyl group; an ethoxy group, an -45-201009498 a propyloxy group, a benzamidine group or the like. a fluorenyl group, a methyl sulfonyl group, a butyl sulfonyl group, a butyl fluorenyl group, a methacryl fluorenyl group, a methicone group, a fluorenyl group, a methyl sulfonyl group, a t-butyl sulfonyl group, etc. An alkylsulfonyl group such as an alkylsulfonyl group, a phenylsulfonyl group, a p-tolylsulfonyl group, an alkylamino group such as a methylamino group or a cyclohexylamino group, a dimethylamino group or a diethylamine. a dialkylamino group such as a thiol group or a piperidinyl group; an arylamino group such as a phenylamino group or a p-tolylamino group; a methyl group, an ethyl group, a tert-butyl group, a dodecyl group or the like. An alkyl group, a phenyl group, a p-tolyl group, a xylyl group, a cumenyl group, a naphthyl group, an anthracenyl group, an aryl group such as a phenanthryl group, etc., and a hydroxyl group, a carboxyl group, a decyl group, a fluorenyl group, a sulfo group Base, © p-Toluenesulfonyl, amine, nitro, cyano, trifluoromethyl, trichloromethyl, trimethyldecyl'oxycarbonyl, phosphinodecyl, trimethylammonium, dimethylhydrazine , triphenyl benzamidine methyl fluorenyl and the like. Wherein A' is preferably an unsubstituted alkylene group or an alkyl group (for example, methyl group, ethyl group, tert-butyl group, or dodecyl group) from the viewpoint of improving the sensitivity and suppressing the coloring caused by heating. a substituted alkylene group, an alkyl group substituted with an alkenyl group (e.g., a vinyl group, an allyl group), an aryl group (e.g., phenyl, p-tolyl, xylyl, cumyl, naphthyl, anthracenyl) , phenanthryl, styryl) substituted alkyl of hydrazine. The aryl group represented by the above Ar is preferably an aryl group having 6 to 30 carbon atoms and may have a substituent. Specifically, a phenyl group, a biphenyl group, a naphthyl group, a 2-naphthyl group, a 9-fluorenyl group, a 9-phenanthryl group, a 1-fluorenyl group, a 5-butylene group, a diphenyl group, a 2-methyl group, and a _ fluorenyl, triphenyl, tetraphenyl, fluorene, m- and p-tolyl, xylyl, hydrazine, m- and p- cumene, decyl, pentenyl, hydrazine Di-naphthyl, tris-naphthalene-46- 201009498, tetratetraphthyl, heptyl, phenyl, benzodiphenyl, decyl, decyl, phenanthryl, phenanthrene Base, fluorenyl, hydrazine, hydrazinyl, hydrazino, fluorenyl, phenanthryl, tri-o-phenylene, bacterio, butyl, decyl, sulfhydryl, sulfhydryl, hydrazine Pentabone, tetraphenyl, hexaphenyl, hexanyl, ruthenium, phenyl, trinaphthyl, hexaphenyl, heptyl, pyridyl, egg phenyl The phenyl group which is substituted or substituted is preferred because it enhances the sensitivity and suppresses the coloring caused by the heating. When the phenyl group has a substituent, examples of the substituent include a halogen atom such as a fluorine atom, a chlorine atom, a bromine atom or a substituted atom, and an alkoxy group such as a methoxyethoxy group or a third butoxy group. a phenoxy group, a p-toluene oxygen aryloxy group, a methyl thiooxy group, an ethyl thiooxy group, a tert-butyl thiooxy group thiol group, a phenyl thio group, a p-tolyl thio group, etc. An alkoxycarbonyl methoxy group such as an oxyoxy group, a methoxycarbonyl group, a butoxycarbonyl group or a phenoxycarbonyl group, a methoxy group such as a propyloxy group or a benzyloxy group, an ethyl fluorenyl group or an isobutyl group. An alkyl sulfonate such as a fluorenyl group, a methacryl fluorenyl group or a mazyl group, a sulfonyl group such as a methyl sulfonyl group or a tributyl sulfonyl group, a phenyl sulfonyl group or a p-tolylsulfonyl group. Or an alkylsulfonyl group, an alkylamino group such as a methyl group or a cyclohexylamino group, a dialkylamino group such as a dimethylamino group, a diethylamino group, a hydrazino group or the like, a phenylamino group, a phenyl group An arylamine group of a tolylamine, an alkyl group of an ethyl group, a tert-butyl group, a dodecyl group, a hydroxy group, a decyl group, a fluorenyl group, a sulfo group, a methanesulfonyl group, an amino group of p-toluenesulfonate Nitro, , Trifluoromethyl, trichloromethyl, trimethyl silicon, phosphinyl, acyl phosphine, trimethyl ammonium, dimethyl dysprosium group, trityl anthracenyl, pyrenyl, coronene. The base, the phenyl group, the phenyl fluorenyl amide group, the phenyl group, the alkyl group, the alkyl group, the alkyl group, the alkyl group, and the like. In the general formula (I), the "SAr" structure formed by Ar and the adjacent S is preferably the structure shown below from the viewpoint of sensitivity.

作爲前述X所示的一價取代基，可舉出可有取代基的 院基、可有取代基的芳基、可有取代基的烯基、可有取代 基的炔基、可有取代基的烷氧基、可有取代基的芳氧基、 可有取代基的烷基硫氧基、可有取代基的芳基硫氧基、可 有取代基的醯氧基、可有取代基的烷基磺醯基、可有取代 -48- 201009498 基的芳基磺醯基、可有取代基的烷基亞磺醯基、可有取代 基的芳基亞磺醯基、可有取代基的烷基磺醯基、可有取代 基的芳基磺醯基、可有取代基的醯基、可有取代基的烷氧 鑛基、可有取代基的胺甲醯基、可有取代基的胺磺醯基、 可有取代基的胺基、可有取代基的膦醯基、可有取代基的 雜環基、鹵基、可有取代基的鹵化烷基、於N上可有取代 基的醯胺基等。 作爲可有取代基的烷基，較佳爲碳數丨〜30的烷基， ® 例如可舉出甲基、乙基、丙基、丁基、己基、辛基、癸基 、十二基、十八基、異丙基、異丁基、第二丁基、第三丁 基、1-乙基戊基、環戊基、環己基、三氟甲基、2_乙基己 基、苯甲酿甲基、卜萘甲醯基甲基、2_萘甲醯基甲基、4_ @基擴酶基苯甲醯甲基、4-苯基磺醯基苯甲醯甲基、4-二 甲胺基苯甲酿甲基、4-氰基苯甲醯甲基、4-甲基苯甲醯甲 基、2_甲基苯甲醯甲基、3-氟苯甲醯甲基、3-三氟甲基苯 _ 甲醯甲基、3-硝基苯甲醯甲基等。 作爲可有取代基的芳基，較佳爲碳數6〜30的芳基， 例如可舉出苯基、聯苯基、1-萘基、2-萘基、9-蒽基、9_ 菲基、1_苑基、S-丁省基、1-茚基、2 —莫基、9-蕗基、聯 二苯基、聯四笨基、o-、m-、及p-甲苯基、二甲苯基、0_ 、m-、及p_枯烯基、莱基、戊搭烯基、聯二萘基、聯三萘 基、聯四察基、庚搭烯基、伸聯苯基、苯并二茚基、螢蒽 基、危嫌基、醋蒽烯基、菲烯基、苐基、蒽基、聯二蒽基 、聯二葱基、聯四蒽基、蒽醌基、菲基、三鄰亞苯基、东 -49- 201009498 基、菌基、丁省基、七曜烯基、茜基、茈基、聯五苯基、 戊省基、伸四苯基、聯六苯基、己省基、玉紅省基、暈苯 基、伸三萘基、聯七苯基、庚省基、吡蒽基、卵苯基等。 作爲可有取代基的烯基，較佳爲碳數2〜10的烯基’ 例如可舉出乙烯基、烯丙基、苯乙烯基等。 作爲可有取代基的炔基，較佳爲碳數2〜10的炔基， 例如可舉出乙炔基、丙炔基、炔丙基等。 作爲可有取代基的烷氧基，較佳爲碳數1〜30的烷氧 基，例如可舉出甲氧基、乙氧基、丙氧基、異丙氧基、丁 D 氧基、異丁氧基、第二丁氧基、第三丁氧基、戊氧基、異 戊氧基、己氧基、庚氧基、辛氧基、2-乙基己氧基、癸氧 基、十二氧基、十八氧基、乙氧羰基甲基、2-乙基己氧羰 基甲氧基、胺基羰基甲氧基、N，N-二丁基胺基羥基甲氧基 、N-甲基胺基羰基甲氧基、N-乙基胺基羰基甲氧基、N-辛 基胺基羰基甲氧基、N-甲基-N-苄基胺基羰基甲氧基、苄氧 基、氰基甲氧基等》 作爲可有取代基的芳氧基，較佳爲碳數6〜30的芳氧 © 基，例如可舉出苯氧基、1-萘氧基、2-萘氧基、2-氯苯氧 基、2-甲基苯氧基、2-甲氧基苯氧基、2-丁氧基苯氧基、 3·氯苯氧基、3-三氟甲基苯氧基、3-氰基苯氧基、3-硝基 苯氧基、4-氟苯氧基、4-氰基苯氧基、4-甲氧基苯氧基、 4-二甲胺基苯氧基、4-甲基磺醯基苯氧基、4-苯基磺醯基 苯氧基等。 作爲可有取代基的烷基硫氧基，較佳爲碳數1〜30的 -50- 201009498 硫烷氧基，例如可舉出甲基硫氧基、乙基硫氧基、丙基硫 氧基、異丙基硫氧基、丁基硫氧基、異丁基硫氧基、第二 丁基硫氧基、第三丁基硫氧基、戊基硫氧基、異戊基硫氧 基、己基硫氧基、庚基硫氧基、辛基硫氧基、2 -乙基己基 硫氧基、癸基硫氧基、十二基硫氧基、十八基硫氧基、苄 基硫氧基等。 作爲可有取代基的芳基硫氧基，較佳爲碳數6〜30的 芳基硫氧基，例如可舉出苯基硫氧基、1-萘基硫氧基、2-® 萘基硫氧基、2-氯苯基硫氧基、2-甲基苯基硫氧基、2-甲 氧基苯基硫氧基、2-丁氧基苯基硫氧基、3-氯苯基硫氧基 、3-三氟甲基苯基硫氧基、3-氰基苯基硫氧基、3-硝基苯 基硫氧基、4-氟苯基硫氧基、4-氟基苯基硫氧基、4 -甲氧 基苯基硫氧基、4-二甲胺基苯基硫氧基、4-甲基磺醯基苯 基硫氧基、4-苯基磺醯基苯基硫氧基等。 作爲可有取代基的醯氧基，較佳爲碳數2〜20的醢氧 基，例如可舉出乙醯氧基、丙醯氧基、丁醯氧基、戊醯氧 ® 基、三氟甲基羰氧基、苯甲醯氧基、1-萘基羰氧基、2-萘 基羰氧基等。 作爲可有取代基的烷基磺醯基’較佳爲碳數1〜20的 烷基磺醯基，例如可舉出甲基磺醯基、乙基磺醯基、丙基 磺酿基、異丙基磺醯基、丁基磺醯基、己基磺醯基、環己 基磺醯基、辛基磺醯基、2_乙基己基磺醯基、癸醯基磺醯 基、十二醯基磺醯基、十八醯基磺醯基、氰基甲基磺醯基 、甲氧基甲基磺醯基等。 -51- 201009498 作爲可有取代基的芳基磺醯基，較佳爲碳數6〜30的 芳基磺醯基，例如可舉出苯基磺醯基、1-萘基磺醯基、2-萘基磺醯基、2-氯苯基磺醯基、2-甲基苯基磺醯基、2-甲 氧基苯基磺醯基、2-丁氧基苯基磺醯基、3-氯苯基磺醯基 、3 -三氟甲基苯基磺醯基、3 -氰基苯基磺醯基、3 -硝基苯 基磺醯基、4-氟苯基磺醯基、4-氰基苯基磺醯基、4_甲氧 基苯基磺醯基、4-甲基磺醯基苯基磺醯基、4-苯基磺醯基 苯基磺醯基、4-二甲胺基苯基磺醯基等。 作爲可有取代基的烷基亞磺醯基，較佳爲碳數1〜20 © 的烷基亞磺醯基，例如可舉出甲基亞磺醯基、乙基亞磺醯 基、丙基亞磺醯基、異丙基亞磺醯基、丁基亞磺醯基、己 基亞磺醯基、環己基亞磺醯基、辛基亞磺醯基、2-乙基己 基亞磺醯基、癸醯基亞磺醯基、十二醯基亞磺醯基、十八 醯基亞磺醯基、氰基甲基亞磺醯基、甲氧基甲基亞磺醯基 等。 作爲可有取代基的芳基亞磺醯基，較佳爲碳數6〜30 的芳基亞磺醯基，例如可舉出苯基亞磺醯基、1-萘基亞磺 ® 醯基、2-萘基亞磺醯基、2-氯苯基亞磺醯基、2-甲基苯基 亞磺醯基、2-甲氧基苯基亞磺醯基、2-丁氧基苯基亞磺醯 基、3-氯苯基亞磺醯基、3-三氟甲基苯基亞磺醯基、3-氰 基苯基亞磺醯基、3-硝基苯基亞磺醯基、4-氟苯基亞磺醯 基、4-氰基苯基亞磺醯基、4-甲氧基苯基亞磺醯基、4-甲 基磺醯基苯基亞磺醯基、4-苯基磺醯基苯基亞磺醯基、4-二甲胺基苯基亞磺醯基等。 -52- 201009498 作爲可有取代基的烷基磺醯基，較佳爲碳數1〜20的 烷基磺醯基，例如可舉出甲基磺醯基、乙基磺醯基、丙基 磺醯基、異丙基磺醯基、丁基磺醯基、己基磺醯基、環己 基磺醯基、辛基磺醯基、2-乙基己基磺醯基、癸醯基磺醯 基、十二醯基磺醯基、十八醯基磺醯基、氰基甲基磺醯基 、甲氧基甲基磺醯基等。 作爲可有取代基的芳基磺醯基，較佳爲碳數6〜30的 芳基磺醯基，例如可舉出苯基磺醯基、1-萘基磺醯基、2-β 萘基磺醯基、2-氯苯基磺醯基、2-甲基苯基磺醯基、2-甲 氧基苯基磺醯基、2-丁氧基苯基磺醯基、3-氯苯基磺醯基 、3-三氟甲基苯基磺醯基、3-氰基苯基磺醯基、3-硝基苯 基磺醯基、4-氟苯基磺醯基、4-氰基苯基磺醯基、4-甲氧 基苯基磺醯基、4-甲基磺醯基苯基磺醯基、4-苯基磺醯基 苯基磺醯基、4-二甲胺基苯基磺醯基等。 作爲可有取代基的醯基，較佳爲碳數2〜20的醯基， 例如可舉出乙醯基、丙醯基、丁醯基、三氟甲基羰基、戊 ® 醯基、苯甲醯基、1-萘甲醯基、2-萘甲醯基、4-甲基磺醯 基苯甲醯基、4-苯基磺醯基苯甲醯基、4-二甲胺基苯甲醯 基、4-二乙基胺基苯甲醯基、2-氯苯甲醯基、2-甲基苯甲 醯基、2-甲氧基苯甲醯基、2-丁氧基苯甲醯基、3-氯苯甲 醯基、3 -三氟甲基苯甲醯基、3 -氰基苯甲醯基、3 -硝基苯 甲醯基、4-氟苯甲醯基、4-氰基苯甲醯基、4 -甲氧基苯甲 醯基等。 作爲可有取代基的烷氧羰基，較佳爲碳數2〜20的烷 -53- 201009498 氧羰基，例如可舉出甲氧羰基、乙氧羰基、丙氧羰基、丁 氧羰基、己氧羰基、辛氧羰基、癸氧羰基、十八氧羰基、 苯氧羰基、三氟甲氧羰基、1-萘氧羰基、2-萘氧羰基、4-甲基磺醯基苯氧羰基、4-苯基磺醯基苯氧羰基、4-二甲胺 基苯氧羰基、4-二乙基胺基苯氧羰基、2-氯苯氧羰基、2-甲基苯氧羰基、2-甲氧基苯氧羰基、2-丁氧基苯氧羰基、 3-氯苯氧羰基、3-三氟甲基苯氧羰基、3-氰基苯氧羰基、 3-硝基苯氧羰基、4-氟苯氧羰基、4-氰基苯氧羰基、4-甲 氧基苯氧羰基等。 © 作爲可有取代基的胺甲醯基，較佳爲總碳數1〜30的 胺甲醯基，例如可舉出N-甲基胺甲醯基、N-乙基胺甲醯基 、N-丙基胺甲醯基、N-丁基胺甲醯基、N-己基胺甲醯基、 N-環己基胺甲醯基、N-辛基胺甲醯基、N-癸基胺甲醯基、 N-十八基胺甲醯基、N-苯基胺甲醯基、N-2-甲基苯基胺甲 醯基、N-2-氯苯基胺甲醯基、N-2-異丙氧基苯基胺甲醯基 、N-2-(2-乙基己基）苯基胺甲醯基、N-3-氯苯基胺甲醯基 、N-3-硝基苯基胺甲醯基、N-3-氰基苯基胺甲醯基、N-4- 〇 甲氧基苯基胺甲醯基、N-4-氰基苯基胺甲醯基、N-4-甲基 磺醯基苯基胺甲醯基、N-4-苯基磺醯基苯基胺甲醯基、N-甲基-N-苯基胺甲醯基、N，N-二甲基胺甲醯基、N，N-二丁基 胺甲醯基、N，N-二苯基胺甲醯基等。 作爲可有取代基的胺磺醯基，較佳爲總碳數〇〜30的 胺磺醯基，例如可舉出胺磺醯基、N-烷基胺磺醯基、N-芳 基胺磺醯基、Ν,Ν-二烷基胺磺酿基、Ν,Ν·二芳基胺磺醯基 -54- 201009498 、N-烷基-N-芳基磺醯基等。更具體地，可舉tt 磺醯基、N-乙基胺磺醯基、N-丙基胺磺醯基、 醯基、N-己基胺磺醯基、N-環己基胺磺醯基、 醯基、N-2-乙基己基胺磺醯基、N-癸基胺磺醯 基胺磺醯基、N-苯基胺磺醯基、N-2-甲基苯基 N-2-氯苯基胺磺醯基、N-2-甲氧基苯基胺磺醯 丙氧基苯基胺磺醯基、N-3-氯苯基胺磺醯基、 基胺磺醯基、N-3-氰基苯基胺磺醯基、N-4-甲 Ο 磺醯基、N-4-氰基苯基胺磺醯基、N-4-二甲胺 醯基、N-4 -甲基磺醯基苯基胺磺醯基、N-4-苯 基胺磺醯基、N-甲基-N-苯基胺磺醯基、N，N-二 基、N，N-二丁基胺磺醯基、N，N-二苯基胺磺醯_ 作爲可有取代基的胺基，較佳爲總碳數〇-，例如可舉出-NH2、N-烷基胺基、N-芳基胺基 基、N-磺醯基胺基、Ν,Ν-二烷基胺基、N，N-二 N-烷基-N-芳基胺基、N，N-二磺醯基胺基等。更 ❹ 舉出N-甲基胺基、N-乙基胺基、N-丙基胺基、 基、N-丁基胺基、N-第三丁基胺基、N-己基胺 基胺基、N-辛基胺基、N-2-乙基己基胺基、N-N-十八基胺基、N-苄基胺基、N-苯基胺基、N_ 胺基、N-2-氯苯基胺基、N-2-甲氧基苯基胺基 氧基苯基胺基、N-2-(2-乙基己基）苯基胺基、 胺基、N-3-硝基苯基胺基、N-3-氰基苯基胺基 甲基苯基胺基、N-4-甲氧基苯基胺基、N-4-氰 i N-甲基胺 N-丁基胺磺 N-辛基胺磺 基、N-十八 胺磺醯基、 基、N-2-異 N-3-硝基苯 氧基苯基胺 基苯基胺磺 基磺醯基苯 甲基胺磺醯 塞等。 -5 0的胺基 、N-醯基胺 芳基胺基、 具體地，可 N-異丙基胺 基、N-環己 癸基胺基、 -2-甲基苯基 、N-2-異丙 N-3-氯苯基 、N-3-三氟 基苯基胺基 -55- 201009498 、N-4-三氟甲基苯基胺基、N-4-甲基磺醯基苯基胺基、N-4-苯基磺醯基苯基胺基、NM4-二甲胺基苯基胺基、N-甲 基-N-苯基胺基、N，N-二甲基胺基、N，N-二乙基胺基、Ν,Ν-二丁基胺基、Ν，Ν-二苯基胺基、Ν，Ν·二乙醯基胺基、Ν，Ν-二苯甲醯基胺基、Ν，Ν-(二丁基羰基）胺基、Ν,Ν·(二甲基磺 醯基）胺基、Ν,Ν-(二乙基磺醯基）胺基、ν，Ν-(二丁基磺醯 基）胺基、Ν，Ν-(二苯基磺醯基）胺基、味啉基、3,5-二甲基 味啉基、咔唑基等。 作爲可有取代基的隣醯基，較佳爲總碳數2〜50的膦 © 醯基，例如可舉出二甲基膦醯基、二乙基膦醯基、二丙基 膦醯基、二苯基膦醯基、二甲氧基膦醯基、二乙氧基膦醯 基、二苯甲醯基膦醯基、雙（2,4,6-三甲基苯基）膦醯基等。 作爲可有取代基的雜環基，較佳爲含有氮原子、氧原 子、硫原子、磷原子的芳香族或脂肪族的雜環。例如、噻 吩基、苯并[b]噻吩基、萘并[2，3-b]噻吩基、噻蒽基、呋 喃基、吡喃基、異苯并呋喃基、色烯基、咕噸基、啡噚阱 基、2H-吡咯基、吡略基、咪唑基、吡唑基、吡啶基、吡 阱基、嘧啶基、嗒阱基、吲哚畊基、異吲哚基、3H·吲哚 基、吲哚基、1H-吲唑基、嘌呤基、4H-喹畊基、異嗤啉基 、喹啉基、酞阱基、萘啶基、喹噚啉基、喹唑啉基、噌啉 基、蝶啶基、4aH-咔唑基、咔唑基、沒-咔啉基、菲啶基、 吖啶基、咱啶基、菲繞啉基、啡畊基、吩吡畊基、異噻唑 基、啡噻畊基、異噚唑基、呋咱基、啡噚畊基、異色滿基 、色滿基、吡咯啶基、吡咯基、咪唑啶基、咪唑基、吡唑 -56- 201009498 啶基、吡唑基、哌啶基、哌畊基、吲哚滿基、異吲哚滿基 、奎寧環基' 味啉基、氧硫卩山哩基等。 作爲鹵基，有氟原子、氯原子、溴原子、碘原子等。 作爲可有取代基的鹵化烷基，可舉出一氟甲基、二氟 甲基、三氟甲基、一氯甲基、二氯甲基、三氯甲基'一溴 甲基、二溴甲基、三溴甲基。 作爲於N上可有取代基的醯胺基，可舉出N，N_二甲基 醯胺基、N，N-二乙基醯胺基。 再者，前述可有取代基的烷基、可有取代基的芳基、 可有取代基的烯基、可有取代基的炔基、可有取代基的烷 氧基、可有取代基的芳氧基、可有取代基的烷基硫氧基、 可有取代基的芳基硫氧基、可有取代基的醯氧基、可有取 代基的烷基磺醯基、可有取代基的芳基磺醯基、可有取代 基的烷基亞磺醯基、可有取代基的芳基亞磺醯基、可有取 代基的烷基磺醯基、可有取代基的芳基磺醯基、可有取代 基的醯基、可有取代基的烷氧羰基、可有取代基的胺甲醯 ❹ 基、可有取代基的胺磺醯基、可有取代基的胺基、可有取 代基的雜環基亦可更經其它取代基所取代。 作爲如此的取代基，例如可舉出氟原子、氯原子、溴 原子、碘原子等的鹵基、甲氧基、乙氧基、第三丁氧基等 的烷氧基’苯氧基、對甲苯氧基等的芳氧基，甲氧羰基、 丁氧羰基、苯氧羰基等的烷氧羰基，乙醯氧基、丙醯氧基 、苯甲醯氧基等的醯氧基，乙醯基、苯甲醯基、異丁醯基 、丙烯醯基、甲基丙烯醯基、甲草醯基等的醯基，甲基磺 -57- 201009498 醯基、第三丁基磺醯基等 寺的烷基磺醯基，苯基磺醯基、對 甲苯基磺醯基等的芳甚溫_# m 基磺醯基，甲基胺基、環己基胺基等 的烷基胺基，二甲基胺基、_ 基一乙基胺基、味啉基、哌啶基 等的二烷基胺基，苯基 m ^ _ 胺基、對甲本基胺基等的芳基胺基 ，甲基、乙基、第三T：tt· ^ _ 基、十一基等的烷基，苯基、對甲 苯基、二甲苯基、枯饶 基、蔡基、蒽基、菲基等的芳基等 ’以及經基、殘基、田驗甘 酸基、疏基、磺基、甲磺醯（mesyl) 基、對甲苯磺醯基、胺 — 収基硝基、氰基、三氟甲基、三氯Examples of the monovalent substituent represented by the above X include a group which may have a substituent, an aryl group which may have a substituent, an alkenyl group which may have a substituent, an alkynyl group which may have a substituent, and a substituent Alkoxy group, aryloxy group which may have a substituent, alkylthio group which may have a substituent, arylthio group which may have a substituent, a methoxy group which may have a substituent, may have a substituent Alkylsulfonyl group, arylsulfonyl group which may have a substituent -48-201009498 group, alkylsulfinyl group which may have a substituent, an arylsulfinyl group which may have a substituent, may have a substituent Alkyl sulfonyl group, arylsulfonyl group which may have a substituent, fluorenyl group which may have a substituent, alkoxylate group which may have a substituent, an amine carbenyl group which may have a substituent, may have a substituent Aminesulfonyl group, amine group which may have a substituent, a phosphinyl group which may have a substituent, a heterocyclic group which may have a substituent, a halogen group, a halogenated alkyl group which may have a substituent, may have a substituent on N Amidoxime and the like. The alkyl group which may have a substituent is preferably an alkyl group having a carbon number of from 丨30 to 30, and examples thereof include a methyl group, an ethyl group, a propyl group, a butyl group, a hexyl group, an octyl group, a decyl group, and a dodecyl group. Octadecyl, isopropyl, isobutyl, t-butyl, tert-butyl, 1-ethylpentyl, cyclopentyl, cyclohexyl, trifluoromethyl, 2-ethylhexyl, benzoyl Methyl, bnaphthylmethyl, 2-naphthylmethyl, 4_@), benzoylmethyl, 4-phenylsulfonylbenzhydrylmethyl, 4-dimethylamine Benzoyl methyl, 4-cyanobenzhydrylmethyl, 4-methylbenzhydrylmethyl, 2-methylbenzhydrylmethyl, 3-fluorobenzhydrylmethyl, 3-trifluoro Methylbenzene_methylhydrazine methyl, 3-nitrobenzhydrylmethyl, and the like. The aryl group which may have a substituent is preferably an aryl group having 6 to 30 carbon atoms, and examples thereof include a phenyl group, a biphenyl group, a 1-naphthyl group, a 2-naphthyl group, a 9-fluorenyl group, and a 9-phenanthryl group. , 1_Yuanji, S-Ding, 1, 1-decyl, 2-methyl, 9-fluorenyl, biphenyl, phenyl, o-, m-, and p-tolyl, Tolyl, 0_, m-, and p_ cumenyl, lenyl, pentyl, dinaphthyl, dinaphthyl, hydrazinyl, heptyl, phenyl, benzo Dimercapto, fluorenyl, susceptibility, vinegar, alkenyl, phenanthryl, fluorenyl, fluorenyl, hydrazino, hydrazine, hydrazino, fluorenyl, phenanthryl, tri O-phenylene, East-49-201009498, bacterio, butyl, heptaenyl, fluorenyl, fluorenyl, quinolyl, pentane, tetraphenyl, hexaphenyl, hex Base, jade red base, halo phenyl, tris-naphthyl, hexaphenyl, heptyl, pyridyl, egg phenyl and the like. The alkenyl group which may have a substituent is preferably an alkenyl group having 2 to 10 carbon atoms. Examples thereof include a vinyl group, an allyl group, and a styryl group. The alkynyl group which may have a substituent is preferably an alkynyl group having 2 to 10 carbon atoms, and examples thereof include an ethynyl group, a propynyl group, and a propargyl group. The alkoxy group which may have a substituent is preferably an alkoxy group having 1 to 30 carbon atoms, and examples thereof include a methoxy group, an ethoxy group, a propoxy group, an isopropoxy group, a D-oxy group, and a different basis. Butoxy, second butoxy, tert-butoxy, pentyloxy, isopentyloxy, hexyloxy, heptyloxy, octyloxy, 2-ethylhexyloxy, decyloxy, ten Dioxy, octadecyloxy, ethoxycarbonylmethyl, 2-ethylhexyloxycarbonylmethoxy, aminocarbonylmethoxy, N,N-dibutylaminohydroxymethoxy, N-A Aminocarbonylcarbonyl, N-ethylaminocarbonylmethoxy, N-octylaminocarbonylmethoxy, N-methyl-N-benzylaminocarbonylmethoxy, benzyloxy, The aryloxy group which may be a substituent is preferably an aryloxy group having 6 to 30 carbon atoms, and examples thereof include a phenoxy group, a 1-naphthyloxy group, and a 2-naphthyloxy group. , 2-chlorophenoxy, 2-methylphenoxy, 2-methoxyphenoxy, 2-butoxyphenoxy, 3·chlorophenoxy, 3-trifluoromethylphenoxy , 3-cyanophenoxy, 3-nitrophenoxy, 4-fluorophenoxy, 4-cyanophenoxy, 4-methoxyphenoxy, 4-dimethylamino Group, 4-methyl-benzene Sulfonic group, 4-phenyl sulfonic acyl phenoxy and the like. The alkylthio group which may have a substituent is preferably a -50-09409498 thioalkoxy group having a carbon number of 1 to 30, and examples thereof include a methylthiooxy group, an ethylthio group, and a propylthio group. Base, isopropylthiooxy, butyl thiooxy, isobutyl thiooxy, t-butyl thiooxy, tert-butyl thiooxy, pentyl thiooxy, isopentyl thiooxy , hexyl thiooxy, heptyl thiooxy, octyl thiooxy, 2-ethylhexyl thiooxy, decyl thiooxy, dodecyl thiooxy, octadecyl thiooxy, benzyl sulfide Oxyl and the like. The arylthiooxy group which may have a substituent is preferably an arylthiooxy group having 6 to 30 carbon atoms, and examples thereof include a phenylthiooxy group, a 1-naphthylthiooxy group, and a 2-ylnaphthyl group. Thiooxy, 2-chlorophenylthiooxy, 2-methylphenylthiooxy, 2-methoxyphenylthiooxy, 2-butoxyphenylthiooxy, 3-chlorophenyl Thiooxy, 3-trifluoromethylphenyl thiooxy, 3-cyanophenyl thiooxy, 3-nitrophenyl thiooxy, 4-fluorophenyl thiooxy, 4-fluorophenyl Thioryloxy, 4-methoxyphenylthiooxy, 4-dimethylaminophenylthiooxy, 4-methylsulfonylphenylthiooxy, 4-phenylsulfonylphenyl Thioxy group and the like. The decyloxy group which may have a substituent is preferably a decyloxy group having 2 to 20 carbon atoms, and examples thereof include an ethyl methoxy group, a propenyloxy group, a butoxy group, a pentyloxy group, and a trifluoro group. Methylcarbonyloxy, benzylideneoxy, 1-naphthylcarbonyloxy, 2-naphthylcarbonyloxy, and the like. The alkylsulfonyl group which may be a substituent is preferably an alkylsulfonyl group having 1 to 20 carbon atoms, and examples thereof include a methylsulfonyl group, an ethylsulfonyl group, a propylsulfonyl group, and a different Propylsulfonyl, butylsulfonyl, hexylsulfonyl, cyclohexylsulfonyl, octylsulfonyl, 2-ethylhexylsulfonyl, decylsulfonyl, dodecylsulfonate Sulfhydryl, octadecylsulfonyl, cyanomethylsulfonyl, methoxymethylsulfonyl and the like. -51- 201009498 The arylsulfonyl group which may be a substituent, preferably an arylsulfonyl group having 6 to 30 carbon atoms, and examples thereof include a phenylsulfonyl group, a 1-naphthylsulfonyl group, and 2 -naphthylsulfonyl, 2-chlorophenylsulfonyl, 2-methylphenylsulfonyl, 2-methoxyphenylsulfonyl, 2-butoxyphenylsulfonyl, 3- Chlorophenylsulfonyl, 3-trifluoromethylphenylsulfonyl, 3-cyanophenylsulfonyl, 3-nitrophenylsulfonyl, 4-fluorophenylsulfonyl, 4- Cyanophenylsulfonyl, 4-methoxyphenylsulfonyl, 4-methylsulfonylphenylsulfonyl, 4-phenylsulfonylphenylsulfonyl, 4-dimethylamine Phenyl sulfonyl group and the like. The alkylsulfinyl group which may be a substituent is preferably an alkylsulfinyl group having a carbon number of 1 to 20 ©, and examples thereof include a methylsulfinyl group, an ethylsulfinyl group, and a propyl group. Sulfosyl, isopropylsulfinyl, butylsulfinyl, hexylsulfinyl, cyclohexylsulfinyl, octylsulfinyl, 2-ethylhexylsulfinyl, Mercaptosulfonyl, decylsulfenyl, octadecylsulfenyl, cyanomethylsulfinyl, methoxymethylsulfinyl, and the like. The arylsulfinyl group which may have a substituent is preferably an arylsulfinylene group having 6 to 30 carbon atoms, and examples thereof include a phenylsulfinyl group and a 1-naphthylsulfinyl fluorenyl group. 2-naphthylsulfinyl, 2-chlorophenylsulfinyl, 2-methylphenylsulfinyl, 2-methoxyphenylsulfinyl, 2-butoxyphenyl Sulfonyl, 3-chlorophenylsulfinyl, 3-trifluoromethylphenylsulfinyl, 3-cyanophenylsulfinyl, 3-nitrophenylsulfinyl, 4 -fluorophenylsulfinyl, 4-cyanophenylsulfinyl, 4-methoxyphenylsulfinyl, 4-methylsulfonylphenylsulfinyl, 4-phenyl Sulfonylphenylsulfinyl, 4-dimethylaminophenylsulfinyl, and the like. -52- 201009498 The alkylsulfonyl group which may be a substituent, preferably an alkylsulfonyl group having 1 to 20 carbon atoms, and examples thereof include a methylsulfonyl group, an ethylsulfonyl group, and a propylsulfonyl group. Sulfhydryl, isopropylsulfonyl, butylsulfonyl, hexylsulfonyl, cyclohexylsulfonyl, octylsulfonyl, 2-ethylhexylsulfonyl, decylsulfonyl, ten Dimercaptosulfonyl, octadecylsulfonyl, cyanomethylsulfonyl, methoxymethylsulfonyl and the like. The arylsulfonyl group which may have a substituent is preferably an arylsulfonyl group having 6 to 30 carbon atoms, and examples thereof include a phenylsulfonyl group, a 1-naphthylsulfonyl group, and a 2-β naphthyl group. Sulfonyl, 2-chlorophenylsulfonyl, 2-methylphenylsulfonyl, 2-methoxyphenylsulfonyl, 2-butoxyphenylsulfonyl, 3-chlorophenyl Sulfonyl, 3-trifluoromethylphenylsulfonyl, 3-cyanophenylsulfonyl, 3-nitrophenylsulfonyl, 4-fluorophenylsulfonyl, 4-cyanobenzene Sulfosyl, 4-methoxyphenylsulfonyl, 4-methylsulfonylphenylsulfonyl, 4-phenylsulfonylphenylsulfonyl, 4-dimethylaminophenyl Sulfonyl and the like. The fluorenyl group which may have a substituent is preferably a fluorenyl group having 2 to 20 carbon atoms, and examples thereof include an ethyl fluorenyl group, a propyl fluorenyl group, a butyl fluorenyl group, a trifluoromethylcarbonyl group, a pentyl fluorenyl group, and a benzamidine group. , 1-naphthylmethyl, 2-naphthylmethyl, 4-methylsulfonyl benzhydryl, 4-phenylsulfonyl benzhydryl, 4-dimethylaminobenzimidyl, 4-Diethylaminobenzimidyl, 2-chlorobenzhydryl, 2-methylbenzhydryl, 2-methoxybenzimidyl, 2-butoxybenzylidene, 3 -Chlorobenzylidene, 3-trifluoromethylbenzhydryl, 3-cyanobenzhydryl, 3-nitrobenzhydryl, 4-fluorobenzhydryl, 4-cyanobenzoyl Mercapto, 4-methoxybenzylidene and the like. The alkoxycarbonyl group which may have a substituent is preferably an alkyl-53-201009498 oxycarbonyl group having a carbon number of 2 to 20, and examples thereof include a methoxycarbonyl group, an ethoxycarbonyl group, a propoxycarbonyl group, a butoxycarbonyl group, and a hexyloxycarbonyl group. , octyloxycarbonyl, oxime oxycarbonyl, octacarbonylcarbonyl, phenoxycarbonyl, trifluoromethoxycarbonyl, 1-naphthyloxycarbonyl, 2-naphthyloxycarbonyl, 4-methylsulfonylphenoxycarbonyl, 4-benzene Sulfosylphenoxycarbonyl, 4-dimethylaminophenoxycarbonyl, 4-diethylaminophenoxycarbonyl, 2-chlorophenoxycarbonyl, 2-methylphenoxycarbonyl, 2-methoxybenzene Oxycarbonyl, 2-butoxyphenoxycarbonyl, 3-chlorophenoxycarbonyl, 3-trifluoromethylphenoxycarbonyl, 3-cyanophenoxycarbonyl, 3-nitrophenoxycarbonyl, 4-fluorophenoxy Carbonyl group, 4-cyanophenoxycarbonyl group, 4-methoxyphenoxycarbonyl group and the like. The amine carbenyl group which may be a substituent, preferably an amine carbenyl group having a total carbon number of 1 to 30, and examples thereof include N-methylamine methyl sulfonyl group, N-ethylamine methyl fluorenyl group, and N. -propylaminemethanyl, N-butylaminecarbamyl, N-hexylaminecarbamyl, N-cyclohexylaminecarbamyl, N-octylaminemethylhydrazine, N-decylamine formazan , N-octadecylamine, N-phenylamine, mercapto, N-2-methylphenylamine, N-2-chlorophenylamine, N-2- Isopropoxyphenylaminecarbamyl, N-2-(2-ethylhexyl)phenylaminecarbamyl, N-3-chlorophenylaminecarbamyl, N-3-nitrophenylamine Methyl, N-3-cyanophenylamine, N-4-decyloxyphenylamine, N-4-cyanophenylamine, N-4-methyl Sulfosylphenylamine methyl sulfonyl, N-4-phenylsulfonylphenylamine methyl sulfhydryl, N-methyl-N-phenylamine methyl sulfhydryl, N,N-dimethylamine Anthracenyl, N,N-dibutylaminecarbamyl, N,N-diphenylaminecarbamyl, and the like. The aminesulfonyl group which may have a substituent is preferably an aminesulfonyl group having a total carbon number of 〇30, and examples thereof include an aminesulfonyl group, an N-alkylaminesulfonyl group, and an N-arylaminesulfonate. Mercapto, anthracene, fluorene-dialkylamine sulfonyl, hydrazine, hydrazine, diarylamine sulfonyl-54-201009498, N-alkyl-N-arylsulfonyl and the like. More specifically, it may be tt sulfonyl, N-ethylamine sulfonyl, N-propylamine sulfonyl, fluorenyl, N-hexylamine sulfonyl, N-cyclohexylamine sulfonyl, hydrazine , N-2-ethylhexylamine sulfonyl, N-decylamine sulfonylamine sulfonyl, N-phenylamine sulfonyl, N-2-methylphenyl N-2-chlorobenzene Amidoxime, N-2-methoxyphenylamine sulfonyloxyphenylamine sulfonyl, N-3-chlorophenylamine sulfonyl, sulfhydryl, N-3- Cyanophenylamine sulfonyl, N-4-carbosulfonyl, N-4-cyanophenylamine sulfonyl, N-4-dimethylamine sulfhydryl, N-4 -methylsulfonate Phenylaminosulfonyl, N-4-phenylamine sulfonyl, N-methyl-N-phenylamine sulfonyl, N,N-diyl, N,N-dibutylamine sulfonate The group, N,N-diphenylamine sulfonium hydrazide _ as the amine group which may have a substituent, preferably a total carbon number ,-, for example, -NH2, N-alkylamino group, N-arylamine A base group, an N-sulfonylamino group, an anthracene, a fluorenyl-dialkylamino group, an N,N-di-N-alkyl-N-arylamino group, an N,N-disulfonylamino group or the like. Further, N-methylamino group, N-ethylamino group, N-propylamino group, yl group, N-butylamino group, N-tert-butylamino group, N-hexylamino group , N-octylamino, N-2-ethylhexylamino, NN-octadecylamino, N-benzylamine, N-phenylamine, N-amino, N-2-chlorobenzene Amino group, N-2-methoxyphenylaminooxyphenylamino group, N-2-(2-ethylhexyl)phenylamino group, amine group, N-3-nitrophenylamine , N-3-cyanophenylaminomethylphenylamino, N-4-methoxyphenylamino, N-4-cyanoi N-methylamine N-butylamine sulfonate N- Octylamine sulfo, N-octadecylsulfonyl, yl, N-2-iso N-3-nitrophenoxyphenylaminophenylamine sulfosulfonylbenzylamine sulfonate Wait. -5 0 amino group, N-decylamine arylamine group, specifically, N-isopropylamino group, N-cyclohexylamino group, -2-methylphenyl group, N-2- Isopropyl N-3-chlorophenyl, N-3-trifluorophenylamino-55- 201009498, N-4-trifluoromethylphenylamino, N-4-methylsulfonylphenyl Amine, N-4-phenylsulfonylphenylamino, NM4-dimethylaminophenylamino, N-methyl-N-phenylamino, N,N-dimethylamino, N,N-diethylamino, hydrazine, hydrazine-dibutylamino, hydrazine, hydrazine-diphenylamino, hydrazine, hydrazine, diethylaminomethyl, hydrazine, fluorene-diphenylmethyl fluorenyl Amine, hydrazine, hydrazine-(dibutylcarbonyl)amine, hydrazine, hydrazine (dimethylsulfonyl)amine, hydrazine, hydrazine-(diethylsulfonyl)amine, ν, Ν- (Dibutylsulfonyl)amino, anthracene, fluorenyl-(diphenylsulfonyl)amino, morpholinyl, 3,5-dimethylmorpholinyl, oxazolyl, and the like. The ortho-fluorenyl group which may have a substituent is preferably a phosphine fluorenyl group having a total carbon number of 2 to 50, and examples thereof include a dimethylphosphonium group, a diethylphosphonium group, and a dipropylphosphonium group. Diphenylphosphonium, dimethoxyphosphonium, diethoxyphosphonium, benzoylphosphonium, bis(2,4,6-trimethylphenyl)phosphonium, etc. . The heterocyclic group which may have a substituent is preferably an aromatic or aliphatic heterocyclic ring containing a nitrogen atom, an oxygen atom, a sulfur atom or a phosphorus atom. For example, thienyl, benzo[b]thienyl, naphtho[2,3-b]thienyl, thioxyl, furyl, pyranyl, isobenzofuranyl, chromenyl, xanthene, Peptide, 2H-pyrrolyl, pyridyl, imidazolyl, pyrazolyl, pyridyl, pyridyl, pyrimidinyl, fluorene, hydrazine, isodecyl, 3H·fluorenyl , fluorenyl, 1H-carbazolyl, fluorenyl, 4H-quinacyl, isoindolyl, quinolyl, hydrazine, naphthyridyl, quinoxalinyl, quinazolinyl, porphyrin , pteridinyl, 4aH-carbazolyl, carbazolyl, pentazolinyl, phenanthryl, acridinyl, acridinyl, phenanthroline, phenyl phenyl, phenoxypyrylene, isothiazolyl , thiophene, isoxazolyl, furazan, porphyrin, heterochroman, chromanyl, pyrrolidinyl, pyrrolyl, imidazolidinyl, imidazolyl, pyrazole-56-201009498 pyridine , pyrazolyl, piperidinyl, piperidinyl, indanyl, isoindolyl, quinuclidinyl 'morinyl group, oxysulfonyl fluorenyl group and the like. Examples of the halogen group include a fluorine atom, a chlorine atom, a bromine atom, and an iodine atom. Examples of the halogenated alkyl group which may have a substituent include a monofluoromethyl group, a difluoromethyl group, a trifluoromethyl group, a monochloromethyl group, a dichloromethyl group, a trichloromethyl 'monobromomethyl group, and a dibromo group. Methyl, tribromomethyl. The guanamine group which may have a substituent on N may, for example, be N,N-dimethylammonium or N,N-diethylammonium. Further, the above-mentioned alkyl group which may have a substituent, a aryl group which may have a substituent, an alkenyl group which may have a substituent, an alkynyl group which may have a substituent, an alkoxy group which may have a substituent, and a substituent Aryloxy group, alkylthio group which may have a substituent, arylthio group which may have a substituent, a decyloxy group which may have a substituent, an alkylsulfonyl group which may have a substituent, may have a substituent Arylsulfonyl group, alkylsulfonyl group which may have a substituent, arylsulfinylene group which may have a substituent, alkylsulfonyl group which may have a substituent, arylsulfonyl which may have a substituent An anthracenyl group, a thiol group which may have a substituent, an alkoxycarbonyl group which may have a substituent, an amine carbenyl group which may have a substituent, an aminesulfonyl group which may have a substituent, an amine group which may have a substituent, The heterocyclic group having a substituent may be further substituted with other substituents. Examples of such a substituent include a halogen group such as a fluorine atom, a chlorine atom, a bromine atom or an iodine atom, and an alkoxy 'phenoxy group such as a methoxy group, an ethoxy group or a third butoxy group. An aryloxy group such as a tolyloxy group; an alkoxycarbonyl group such as a methoxycarbonyl group, a butoxycarbonyl group or a phenoxycarbonyl group; an anthraceneoxy group such as an ethoxycarbonyl group, a propyloxy group or a benzyl group; , anthracenyl group such as benzamidine, isobutyl fluorenyl, acryl fluorenyl, methacryl fluorenyl, methionyl, etc., alkyl sulfonyl-57-201009498 alkyl group, tert-butylsulfonyl group, etc. An aryl group such as a sulfonyl group, a phenylsulfonyl group or a p-tolylsulfonyl group, an alkylamine group such as a methylamino group or a cyclohexylamino group, and a dimethylamino group. a arylamino group such as a monoethylamino group, a morpholinyl group or a piperidinyl group, an aryl group such as a phenyl group, an alkyl group, a p-methylamino group, a methyl group or an ethyl group. , an alkyl group of the third T: tt·^ _ group, eleven or the like, an aryl group such as a phenyl group, a p-tolyl group, a xylyl group, a benzoyl group, a decyl group, a fluorenyl group, a phenanthryl group, etc. Base, residue, field test , Mercapto, sulfo, acyl methanesulfonamide (mesyl) group, p-toluene sulfonic acyl, amine - group received nitro, cyano, trifluoromethyl, trichloromethyl,

甲基、三甲基矽烷基、氧膦基、膦醯基、Ξ甲基銨基、二 甲基鏑基、三苯基苯甲酿甲基銹基等。 於此等之中，作爲γ ^ ’ x’從溶劑溶解性與長波長區域的 吸收效率提高之點來看， 甸較佳爲可有取代基的烷基、可有 取代基的芳基、可有取#甘Μ Μβ 驭代基的嫌基、可有取代基的炔基、 可有取代基的院氧基、可有取代基的芳氧基、㈣Ms 的院基硫氧基、可有取代基的芳基硫氧基、可有取代基的Methyl, trimethyldecyl, phosphinyl, phosphinium, fluorenylmethylammonium, dimethylindenyl, triphenylbenzene, methyl rust, and the like. Among these, γ ^ ' x ' is preferably a substituent-containing alkyl group or a substituent-containing aryl group from the viewpoint of improvement in solvent solubility and absorption efficiency in a long wavelength region. There are stimulating groups of the Μβ 驭β oxime group, an alkynyl group which may have a substituent, an alkoxy group which may have a substituent, an aryloxy group which may have a substituent, a thiol group of a (M) Ms, which may be substituted Arylthio group, may have a substituent

胺基、可有取代基的鹵化烷基、或於N上可有取代基的醯 胺基。 又’通式（I)中的n表示〇〜5的整數，從合成的容易性 之觀點來看，較佳爲0〜3的整數，更佳爲〇〜2的整數。 通式（I)中，當X以複數存在時，複數的X可爲相同或 不同。 作爲前述Y所示的二價有機基，可舉出以下所示的構 造。再者’於以下所示的基中，「*」表示通式（I)中γ與 鄰接的碳原子之鍵結位置。 -58- 201009498An amine group, a halogenated alkyl group which may have a substituent, or a guanamine group which may have a substituent on N. Further, n in the formula (I) represents an integer of 〇 5 and 5, and is preferably an integer of 0 to 3, more preferably an integer of 〇 2 or 2 from the viewpoint of easiness of synthesis. In the general formula (I), when X is present in plural, the plural X may be the same or different. The divalent organic group represented by the above Y may be exemplified by the structure shown below. Further, in the group shown below, "*" indicates the bonding position of γ and the adjacent carbon atom in the formula (I). -58- 201009498

*as^**as^*

其中，從高感度化之觀點來看，較佳爲下述所示的構 造。Among them, from the viewpoint of high sensitivity, the structure shown below is preferred.

尤其在闻感度方面，前述通式（I)所不的先聚合引發 @ 劑較佳爲下述通式（II)所示的光聚合引發劑。 Ο ΟIn particular, the first polymerization initiation agent which is not in the above formula (I) is preferably a photopolymerization initiator represented by the following formula (II). Ο Ο

上述通式（Π)中，R及X各自獨立地表示一價取代基， Α表示二價有機基，Ar表示芳基。η係〇〜5的整數。當χ 以複數存在時，複數的X各自獨立地表示一價取代基。 通式（II)中的R、A、Ar、X及η係與前述通式⑴中的 -59- 201009498 R、A、Ar、X及η同義，較佳例亦同樣。 以下顯示上述通式⑴所示的光聚合引發劑之具體例。In the above formula (Π), R and X each independently represent a monovalent substituent, Α represents a divalent organic group, and Ar represents an aryl group. η is an integer of 〜5. When χ is present in plural, the plural X each independently represents a monovalent substituent. The R, A, Ar, X and η in the formula (II) are synonymous with -59-201009498 R, A, Ar, X and η in the above formula (1), and preferred examples are also the same. Specific examples of the photopolymerization initiator represented by the above formula (1) are shown below.

-60- 201009498 ο-60- 201009498 ο

-61- 201009498-61- 201009498

-62- 201009498-62- 201009498

-63- 201009498 ο-63- 201009498 ο

-64- 201009498-64- 201009498

-65- 201009498-65- 201009498

-66 - .201009498-66 - .201009498

-67- 201009498-67- 201009498

-68- 201009498-68- 201009498

-69- 201009498-69- 201009498

-70- 201009498-70- 201009498

-71- 201009498 ο ο-71- 201009498 ο ο

C4F9C4F9

-72- 201009498 ο-72- 201009498 ο

73- 20100949873- 201009498

-74- 201009498-74- 201009498

-75- 201009498 ο-75- 201009498 ο

-76- 201009498 Ο Ο-76- 201009498 Ο Ο

本發明所用的上述通式（I)所示的化合物係在250nm〜 -77- 201009498 500nm的波長區域具有吸收波長者。更佳可舉出在3 00nm 〜3 80nm的波長區域具有吸收波長者。特別地，較佳爲 3〇8nm及3 5 5nm的吸光度高者。 本發明所可用的（D)上述通式（I)所示的聚合引發劑係可 單獨使用，也可與其它光聚合引發劑倂用。 相對於著色感光性樹脂組成物中的全部固體成分100 質量份而言，（D)通式（I)所示的光聚合引發劑之使用量爲 0.5〜25質量份’較佳爲1〜20質量份。若在此範圍內， 則顯像處理後的圖案截面形狀良好。 © 其它光聚合引發劑 作爲其它光聚合引發劑，係藉由曝光之光而感光，開 始及促進前述（A)乙烯性不飽和化合物的聚合之化合物，較 佳爲在紫外光雷射的波長具有吸收者。 作爲前述其它光聚合引發劑，例如可舉出有機鹵化化 合物、噚二唑（oxidi azole)化合物、羰基化合物、縮酮 (ketal)化合物、苯偶姻（benzoin)化合物、吖陡（acridine)化 合物、有機過氧化化合物、偶氮化合物、香豆素（coumarin) ® 化合物 '疊氮（azide)化合物、金屬茂（metallocene)化合物 、六芳基雙咪唑（hexaarylbiimidazole)化合物、有機硼酸化 合物、二磺酸化合物、鑰鹽（onium salt)化合物、醯基膦（ 氧化物）（acylphosphine oxide)化合物。 作爲有機鹵素化化合物，具體地可舉出若林等「Bull Chem.Soc Japan」42、2924(1 969)、美國專利第 3,905,8 1 5 號說明書、特公昭46-4605號公報、特開昭48-3 62 8 1號公 -78- 201009498 報、特開昭5 5-32070號公報、特開昭60-239736號公報、 特開昭6 1 - 1 69835號公報、特開昭6 1 -1 69837號公報、特 開昭62-58241號公報、特開昭62-212401號公報、特開昭 63-70243號公報、特開昭63 -298 3 3 9號公報公報、M.P. Hutt“雜環化學雜誌”1(Νο3)，（ 1 970)」等中記載的化合物， 尤其三鹵甲基取代的噚唑化合物、s·三畊化合物。 作爲s-三畊化合物之例，更合適爲至少一個單、二或 三鹵素取代甲基鍵結於s-三畊環的s-三阱衍生物，具體地 β 例如可舉出2,4,6-三（單氯甲基）-s-三阱、2,4,6-三（二氯甲 基）-s-三阱、2,4,6-三（三氯甲基）-s_三畊、2-甲基-4,6-雙（ 三氯甲基）-3-三畊、2-正丙基-4,6-雙（三氯甲基）_3_三畊、2_ (α，α，/3-三氯乙基）-4,6-雙（三氯甲基）-s-三哄、2-苯基_ 4.6- 雙（三氯甲基）-8-三畊、2-(對甲氧基苯基）-4,6-雙（三氯 甲基）-s-三畊、2-(3,4-環氧基苯基）-4,6-雙（三氯甲基）_s-三 阱、2-(對氯苯基）-4,6-雙（三氯甲基）-s-三畊、2-[1-(對甲氧 基苯基）-2,4-丁二烯基]-4,6-雙（三氯甲基）-s-三畊、2-苯乙 ® 烯基-4,6-雙（三氯甲基）-3-三畊、2-(對甲氧基苯乙烯基）_ 4.6- 雙（三氯甲基）+三畊、2-(對異丙氧基苯乙烯基）-4、6-雙（三氯甲基）-s-三哄、2-(對甲苯基）-4,6-雙（三氯甲基）_s_ 三哄、2-(4 -察氧基禁基）-4,6 -雙（二氯甲基）-s -三哄、2 -苯 硫基-4,6-雙（三氣甲基）-s-三哄、2-亨硫基-4,6-雙（三氯甲基 )-s-三畊、4-(鄰溴-p-N，N-(二乙氧基羰基胺基）-苯基）-2,6-二（三氯甲基）-s-三畊、2,4,6-三（二溴甲基）-s-三畊、2,4,6-三（三溴甲基）-s-三阱、2-甲基-4,6-雙（三溴甲基）_s_三阱、 -79- 201009498 2-甲氧基-4,6-雙（三溴甲基）-s-三畊等。 作爲噚二唑化合物之例，可舉出2_三氯甲基_5_苯乙烯 基·1，3,4-曙二唑、2-三氯甲基-5-(氰基苯乙烯基）-1，3,4-噚 二唑、2-三氯甲基-5-(萘甲醯-1-基卜1，3,4-噚二唑、2_三氯 甲基-5-(4-苯乙烯基）苯乙烯基-1，3,4-噚二唑等。 作爲羰基化合物之例，可舉出二苯甲酮（benz〇Phenone) 、米蚩酮（Michler’s ketone)、苯甲醯基苯甲酸、4_苯基二 苯甲酮、4,4-二乙基胺基二苯甲酮、3，3’-二甲基-4-甲氧基 二苯甲酮、4 -苯甲醯基- 4，-甲基二苯基硫化物、2_甲基二苯 €) 甲酮、3 -甲基二苯甲酮、4 -甲基二苯甲酮、2_氯二苯甲酮 、4 —溴二苯甲酮、2 -羧基二苯甲酮等的二苯甲酮衍生物， 2,2-二甲氧基-2-苯基苯乙酮、2,2-二乙氧基苯乙酮、1-羥 基環己基苯基萌、&lt;2-羥基-2-甲基苯基丙酮、1-經基-1-甲 基乙基-(對異丙基苯基）酮、1-羥基-1-(對十二基苯基）酮、 2-甲基-1-(4，-(甲硫基）苯基）-2-味啉基-1-丙酮、2-苄基-2· 二甲胺基-1-(4-味啉基苯基）-丁酮-1、2，4,6三甲基苯甲醯 基-二苯基-膦氧化物、1，1，1-三氯甲基-(對丁基苯基）酮、2- © 苄基-2-二甲胺基-4-味啉基苯基丙基甲酮等的苯乙酮衍生 物，噻噸酮、2-乙基噻噸酮、2-異丙基噻噸酮、2-氯噻噸 酮' 2,4-二甲基噻噸酮、2,4-二乙基噻噸酮、2,4-二異丙基 噻噸酮等的噻噸酮衍生物，對二甲胺基苯甲酸乙酯、對二 乙基胺基苯甲酸乙酯等的苯甲酸酯衍生物等。 作爲縮酮化合物之例，可舉出苄基二甲基縮酮、苄基-冷·甲氧基乙基乙基縮醛等。 -80- 201009498 作爲苯偶姻化合物之例，可舉出間苯偶姻異丙基醚、 苯偶姻異丁基醚、苯偶姻甲基醚、甲基鄰苯甲醯基苯甲酸 酯等。 作爲吖啶化合物之例，可舉出9·苯基吖啶、9-吡啶基 吖啶、9-吡畊吖啶、l，2-二（9-吖啶基）乙烷、1,3-二（9-吖啶 基）丙烷、1，4-二（9-吖啶基）丁烷、1,5-二（9-吖啶基）戊烷、 1，6-二（9-吖啶基）己烷、l，7-二（9-吖啶基）庚烷、1，8-二（9-吖啶基）辛烷、1，9-二（9-吖啶基）壬烷、1，10-二（9-吖啶基） ® 癸烷、1，1 1-二（9-吖啶基）十一烷、1,12-(9-吖啶基）十二烷 等的二（9-吖啶基）烷等。 作爲有機過氧化化合物，例如可舉出三甲基環己酮過 氧化物、乙醯基丙酮過氧化物、1，1-雙（第三丁基過氧）-3,3,5-三甲基環己烷、1，1-雙（第三丁基過氧）環己烷、2,2-雙（第三丁基過氧）丁烷、第三丁基氫過氧化物、異丙苯氫 過氧化物（cumene hydroperoxide)、二異丙基苯氫過氧化物 、2,5-二甲基己烷-2,5-二氫過氧化物、1，1，3,3-四甲基丁基 〇 氫過氧化物、第三丁基枯基過氧化物、二枯基過氧化物 (dicumyl peroxide)、2,5-二甲基-2,5-二（第三丁基過氧）己 烷、2,5-噚唑基過氧化物、過氧化琥珀酸、過氧化苯甲醯 、2，4-二氯苯甲醯基過氧化物、二異丙基過氧二碳酸酯、 二-2-乙基己基過氧二碳酸酯、二-2-乙氧基乙基過氧二碳 酸酯、二甲氧基異丙基過氧碳酸酯、二（3-甲基-3-甲氧基 丁基）過氧二碳酸酯、第三丁基過氧醋酸酯、第三丁基過氧 三甲基乙酸酯（tert-butyl peroxypivalate)、第三丁基過氧 -81 - 201009498 新癸酸酯、第三丁基過氧辛酸酯、第三丁基過氧月桂酸酯 、碳酸第三酯、3,3’，4,4’-四-(第三丁基過氧羰基）二苯甲酮 、3,3’，4,4’-四-(第三己基過氧羰基）二苯甲酮、3,3’，4,4，-四-(對異丙基枯基過氧羰基）二苯甲酮、羰基二（第三丁基 過氧二氫二苯二甲酸酯）、羰基二（第三己基過氧二氫二苯 二甲酸酯）等。 作爲偶氮化合物，例如可舉出特開平8- 1 08 62 1號公報 記載的偶氮化合物等。 作爲香豆素化合物，例如可舉出3-甲基-5-胺基-((s-三 ® 畊-2-基）胺基）-3-苯基香豆素、3-氯-5-二乙基胺基-((s·三 畊-2-基）胺基）-3·苯基香豆素、3-丁基-5-二甲胺基-((s-三 畊-2-基）胺基）-3-苯基香豆素等。 作爲叠氮化合物之例，可舉出美國專利第2848328號 說明書、美國專利第 2852379號說明書及美國專利第 2940853號說明書記載的有機叠氮化合物、2,6-雙（4-叠氮 亞苄基）-4-乙基環己酮（BAC-E)等。 作爲金屬茂化合物之例，可舉出特開昭59- 1 52396號公 © 報、特開昭61-151197號公報、特開昭63-41484號公報、 特開平2-249號公報、特開平2-4705號公報、特開平5-83 5 88號公報記載的各種二茂鈦（titanocene)化合物，例如 二環戊二烯基-Ti-雙-苯基、二環戊二烯基-Ti-雙-2,6-二氟 苯基-1·基、二環戊二烯基-Ti-雙-2,4-二-氟苯基-1-基、二 環戊二烯基-Ti-雙-2,4,6-三氟苯基-1-基、二環戊二烯基-Ti-雙-2,3,5,6-四氟苯基-1-基、二環戊二烯基-Ti-雙- -82- 201009498 2,3,4,5,6-五氟苯基-1-基、二甲基環戊二烯基-Ti-雙-2,6-二 氟苯基-1-基、二甲基環戊二烯基-Ti-雙-2,4,6-三氟苯基-1-基、二甲基環戊二烯基-Ti-雙-2,3,5,6-四氟苯基-1·基、二-甲基環戊二烯基-Ti-雙-2,3,4,5,6-五氟苯基-1-基、特開平 1 -3 0445 3號公報、特開平1 - 1 52 1 09號公報記載的鐵-芳烴 (arene)錯合物等。 作爲六芳基雙咪唑化合物，例如可舉出特公平6-29285 號公報、美國專利第3,479，185號、同第4,31 1，783號、同 ® 第4,622,286號等的各說明書記載的各種化合物，具體地 如2,2’-雙（〇-氯苯基）-4,4’，5,5’-四苯基雙咪唑、2,2’-雙（〇-溴苯基））4,4’，5,5’-四苯基雙咪唑、2,2’-雙（〇,?-二氯苯基）-4,4’，5,5’-四苯基雙咪唑、2,2’-雙（〇-氯苯基）-4,4’，5,5’-四 (m-甲氧基苯基）雙咪唑、2,2’-雙（〇,〇’·二氯苯基）-4,4’，5,5’-四苯基雙咪唑、2,2’-雙（〇-硝基苯基）-4,4’，5,5’-四苯基雙咪 唑、2,2’-雙（〇-甲基苯基）-4,4’，5,5’-四苯基雙咪唑、2,2’-雙 (〇-三氟苯基）·4,4’，5,5’-四苯基雙咪唑等》 W 作爲有機硼酸鹽化合物，例如可舉出特開昭62- 1 43044 號公報、特開昭62- 1 50242號公報、特開平9- 1 8 86 8 5號公 報、特開平9-188686號公報、特開平9-188710號公報、 特開2000-131837號公報、特開2002-107916號公報、日 本發明專利第2764769號公報、特開2002- 1 1 6539號公報 等的各公報、及 Kunz，Martin “Rad Tech’98. Proceeding April 19-22，1 998，Chicago”等記載的有機硼酸鹽、特開平 6- 1 57623號公報、特開平6- 1 755 64號公報、特開平6- -83- 201009498 175561號公報記載的有機硼鏑錯合物或有機硼氧代鏑 (boron oxosulfonium)錯合物、特開平 6-175554 號公報、 特開平 6- 1 75 5 5 3號公報中記載的有機砸碘鎗（boron iodonium)錯合物、特開平9-188710號公報記載的有機硼 鱗（boron phosphonium)錯合物、特開平6-3480 1 1號公報、 特開平7- 1 2878 5號公報、特開平7- 1 405 89號公報、特開 平7-306527號公報、特開平7-2920 1 4號公報等的有機砸 過渡金羼配位錯合物等當作具體例。 作爲二楓化合物之例，可舉出特開昭6 1 - 1 66544號公報 © 、特願200卜1 3 23 1 8號說明書等記載的化合物等。 作爲鎗鹽化合物，例如可舉出 S.I. Schlesinger， Photogr. Sci. Eng.， 18，3 87( 1 974)、T.S. Bal 等人在The compound represented by the above formula (I) used in the present invention has an absorption wavelength in a wavelength region of from 250 nm to -77 to 201009498 500 nm. More preferably, it has an absorption wavelength in a wavelength region of 300 nm to 3 80 nm. In particular, those having a high absorbance of 3 〇 8 nm and 35 5 nm are preferred. The polymerization initiator represented by the above formula (I) which can be used in the present invention can be used singly or in combination with other photopolymerization initiators. The photopolymerization initiator represented by the formula (I) is used in an amount of from 0.5 to 25 parts by mass, preferably from 1 to 20, based on 100 parts by mass of the total solid content of the coloring photosensitive resin composition. Parts by mass. If it is within this range, the cross-sectional shape of the pattern after development processing is good. © Other photopolymerization initiators, as other photopolymerization initiators, which are photosensitive by exposure light, start and promote the polymerization of the above (A) ethylenically unsaturated compound, preferably at the wavelength of the ultraviolet laser Absorber. Examples of the other photopolymerization initiator include an organic halogenated compound, an oxidi azole compound, a carbonyl compound, a ketal compound, a benzoin compound, an acride compound, and the like. Organic peroxy compound, azo compound, coumarin ® compound 'azide compound, metallocene compound, hexaarylbiimidazole compound, organic boronic acid compound, disulfonic acid compound , an onium salt compound, an acylphosphine oxide compound. Specific examples of the organic halogenated compound include "Bull Chem. Soc Japan" 42 and 2924 (1 969), and the specification of U.S. Patent No. 3,905,8,5, and the Japanese Patent Publication No. 46-4605, and the special opening. 48-3 62 8 No. 1 -78-201009498, Japanese Laid-Open Patent Publication No. 5-32070, JP-A-60-239736, JP-A-6-1-1693835, JP-A-6-101 Japanese Unexamined Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Sho. A compound described in Chemical Journal 1 (Νο3), (1 970), and the like, in particular, a trihalomethyl-substituted carbazole compound and an s·three-till compound. As an example of the s-three-till compound, it is more suitable that the at least one mono-, di- or tri-halogen-substituted methyl group is bonded to the s-triple trap derivative of the s-triple ring, and specifically β is, for example, 2, 4. 6-tris(monochloromethyl)-s-tripper, 2,4,6-tris(dichloromethyl)-s-tripper, 2,4,6-tris(trichloromethyl)-s_ Three tillage, 2-methyl-4,6-bis(trichloromethyl)-3-three tillage, 2-n-propyl-4,6-bis(trichloromethyl)_3_three tillage, 2_ (α ,α,/3-trichloroethyl)-4,6-bis(trichloromethyl)-s-triterpene, 2-phenyl_4.6-bis(trichloromethyl)-8-three tillage, 2 -(p-methoxyphenyl)-4,6-bis(trichloromethyl)-s-three tillage, 2-(3,4-epoxyphenyl)-4,6-bis(trichloromethane) Base)_s-tripper, 2-(p-chlorophenyl)-4,6-bis(trichloromethyl)-s-trin, 2-[1-(p-methoxyphenyl)-2,4 -butadienyl]-4,6-bis(trichloromethyl)-s-three tillage, 2-phenylethyl alkenyl-4,6-bis(trichloromethyl)-3-trin, 2 -(p-methoxystyryl)_ 4.6-bis(trichloromethyl)+three tillage, 2-(p-isopropoxystyryl)-4,6-bis(trichloromethyl)-s - triterpenoid, 2-(p-tolyl)-4,6-bis(trichloromethyl) _s_ triterpenoid, 2-(4-o-oxy-indenyl)-4,6-bis(dichloromethyl)-s-triterpene, 2-phenylthio-4,6-bis(trimethylmethyl) -s-triterpene, 2-henylthio-4,6-bis(trichloromethyl)-s-three tillage, 4-(o-bromo-pN,N-(diethoxycarbonylamino)-benzene -2,6-bis(trichloromethyl)-s-three-pill, 2,4,6-tris(dibromomethyl)-s-three tillage, 2,4,6-tris (tribromomethyl) Base)-s-tripper, 2-methyl-4,6-bis(tribromomethyl)_s_tri-trap, -79- 201009498 2-methoxy-4,6-bis(tribromomethyl) -s-three tillage and so on. Examples of the oxadiazole compound include 2-trichloromethyl-5-styryl-1,3,4-oxadiazole and 2-trichloromethyl-5-(cyanostyryl). -1,3,4-oxadiazole, 2-trichloromethyl-5-(naphthoquinone-1-yl b, 1,3,4-oxadiazole, 2-trichloromethyl-5-(4 - Styryl) styryl-1,3,4-oxadiazole, etc. Examples of the carbonyl compound include benzophenone (benz〇Phenone), Michler's ketone, and benzamidine. Benzoic acid, 4-phenylbenzophenone, 4,4-diethylaminobenzophenone, 3,3'-dimethyl-4-methoxybenzophenone, 4-phenylene Mercapto- 4,-methyldiphenyl sulfide, 2-methyldiphenyl €) ketone, 3-methylbenzophenone, 4-methylbenzophenone, 2-chlorobenzophenone a benzophenone derivative such as 4-bromobenzophenone or 2-carboxybenzophenone, 2,2-dimethoxy-2-phenylacetophenone, 2,2-diethoxy Acetophenone, 1-hydroxycyclohexylphenyl bud, &lt;2-hydroxy-2-methylphenylacetone, 1-yl-1-methylethyl-(p-isopropylphenyl)one, 1 -hydroxy-1-(p-dodecylphenyl) ketone, 2-methyl-1-(4,-(methylthio)benzene )-2-zilinyl-1-acetone, 2-benzyl-2·dimethylamino-1-(4-morpholinylphenyl)-butanone-1, 2,4,6-trimethylbenzene Mercapto-diphenyl-phosphine oxide, 1,1,1-trichloromethyl-(p-butylphenyl) ketone, 2- benzyl-2-dimethylamino-4- morpholinyl Acetophenone derivatives such as phenylpropyl ketone, thioxanthone, 2-ethylthioxanthone, 2-isopropylthioxanthone, 2-chlorothioxanthone '2,4-dimethylthiophene Thiophenone derivatives such as ketone, 2,4-diethylthioxanthone, 2,4-diisopropylthioxanthone, ethyl p-dimethylaminobenzoate, p-diethylaminobenzene a benzoate derivative such as ethyl formate or the like. Examples of the ketal compound include a benzyldimethylketal, a benzyl-cold methoxyethylethylacetal, and the like. -80- 201009498 Examples of the benzoin compound include m-benzoin isopropyl ether, benzoin isobutyl ether, benzoin methyl ether, and methyl phthalyl benzoyl benzoate. Wait. Examples of the acridine compound include 9-phenyl acridine, 9-pyridyl acridine, 9-pyridinium, 1,2-bis(9-acridinyl)ethane, and 1,3-. Bis(9-acridinyl)propane, 1,4-bis(9-acridinyl)butane, 1,5-bis(9-acridinyl)pentane, 1,6-di(9-acridine Hexyl, 1,7-bis(9-acridinyl)heptane, 1,8-bis(9-acridinyl)octane, 1,9-bis(9-acridinyl)decane, 1,10-bis(9-acridinyl) ® decane, 1,1 1-di(9-acridinyl)undecane, 1,12-(9-acridinyl)dodecane, etc. (9-Aridinyl) alkane and the like. Examples of the organic peroxidic compound include trimethylcyclohexanone peroxide, etidylacetone peroxide, and 1,1-bis(t-butylperoxy)-3,3,5-trimethyl. Cyclohexane, 1,1-bis(t-butylperoxy)cyclohexane, 2,2-bis(t-butylperoxy)butane, tert-butyl hydroperoxide, cumene Hydrogen peroxide (cumene hydroperoxide), diisopropylbenzene hydroperoxide, 2,5-dimethylhexane-2,5-dihydroperoxide, 1,1,3,3-tetramethyl Butyl hydrazine hydroperoxide, tert-butyl cumyl peroxide, dicumyl peroxide, 2,5-dimethyl-2,5-di(t-butylperoxy) Hexane, 2,5-carbazolyl peroxide, peroxysuccinic acid, benzammonium peroxide, 2,4-dichlorobenzhydryl peroxide, diisopropylperoxydicarbonate, 2-ethylhexylperoxydicarbonate, di-2-ethoxyethyl peroxydicarbonate, dimethoxyisopropyl peroxycarbonate, bis(3-methyl-3-methoxy Butyl)peroxydicarbonate, tert-butylperoxyacetate, tert-butylperoxytrimethylacetate (tert-but Yl peroxypivalate), tert-butylperoxy-81 - 201009498 neodecanoate, tert-butylperoxyoctanoate, tert-butylperoxylaurate, third ester, 3,3',4 , 4'-tetrakis-(t-butylperoxycarbonyl)benzophenone, 3,3',4,4'-tetra-(t-hexylperoxycarbonyl)benzophenone, 3,3', 4,4,-tetra-(p-isopropyl-cumylperoxycarbonyl)benzophenone, carbonyl di(t-butylperoxydihydrodicarboxylate), carbonyl di(third hexylperoxy) Dihydrodicarboxylate) and the like. Examples of the azo compound include an azo compound described in JP-A-8-10862, and the like. The coumarin compound may, for example, be 3-methyl-5-amino-((s-tris(t-butyl-2-yl)amino)-3-phenylcoumarin, 3-chloro-5- Diethylamino-((s. triacetin-2-yl)amino)-3·phenylcoumarin, 3-butyl-5-dimethylamino-((s-three tillage-2- Amino)-3-phenylcoumarin and the like. Examples of the azide compound include an organic azide compound, 2,6-bis(4-azidobenzylidene) described in the specification of U.S. Patent No. 2,848,328, U.S. Patent No. 2,852,379, and U.S. Patent No. 2,940,853. ) 4-ethylcyclohexanone (BAC-E) and the like. As an example of the metallocene compound, JP-A-59-52396, JP-A-61-151197, JP-A-63-41484, JP-A-2-249, JP-A-2002 Various titanocene compounds described in JP-A-H05-83-588, for example, dicyclopentadienyl-Ti-bis-phenyl, dicyclopentadienyl-Ti- Bis-2,6-difluorophenyl-1·yl, dicyclopentadienyl-Ti-bis-2,4-di-fluorophenyl-1-yl, dicyclopentadienyl-Ti-double -2,4,6-trifluorophenyl-1-yl, dicyclopentadienyl-Ti-bis-2,3,5,6-tetrafluorophenyl-1-yl, dicyclopentadienyl -Ti-bis--82- 201009498 2,3,4,5,6-pentafluorophenyl-1-yl, dimethylcyclopentadienyl-Ti-bis-2,6-difluorophenyl- 1-yl, dimethylcyclopentadienyl-Ti-bis-2,4,6-trifluorophenyl-1-yl, dimethylcyclopentadienyl-Ti-bis-2,3,5 ,6-tetrafluorophenyl-1·yl, bis-methylcyclopentadienyl-Ti-bis-2,3,4,5,6-pentafluorophenyl-1-yl, special open 1-3 An iron-aromatic (arene) complex or the like described in Japanese Laid-Open Patent Publication No. Hei. No. Hei. Examples of the hexaarylbisimidazole compound include various types described in each specification, such as JP-A-6-29285, US Pat. No. 3,479,185, and No. 4,31,783, and No. 4,622,286. a compound, in particular as 2,2'-bis(indolyl-chlorophenyl)-4,4',5,5'-tetraphenylbisimidazole, 2,2'-bis(indolyl-bromophenyl))4 , 4',5,5'-tetraphenylbisimidazole, 2,2'-bis(indole,?-dichlorophenyl)-4,4',5,5'-tetraphenylbisimidazole, 2, 2'-bis(〇-chlorophenyl)-4,4',5,5'-tetrakis(m-methoxyphenyl)biimidazole, 2,2'-bis(〇,〇'·dichlorobenzene -4,4',5,5'-tetraphenylbisimidazole, 2,2'-bis(indolyl-nitrophenyl)-4,4',5,5'-tetraphenylbisimidazole, 2,2'-bis(〇-methylphenyl)-4,4',5,5'-tetraphenylbisimidazole, 2,2'-bis(〇-trifluorophenyl)·4,4' And 5,5'-tetraphenylbisimidazole, etc., as the organic borate compound, for example, JP-A-62-144044, JP-A-62-150242, JP-A-9-108 86 8 No. 5, JP-A-9-188686, and JP-A 9-188710 Japanese Laid-Open Patent Publication No. 2000-131837, JP-A-2002-107916, Japanese Patent No. 2764769, and JP-A-2002-1169539, and Kunz, Martin "Rad Tech'98. Proceeding April 19-22, 1 998, "Chicago", etc., as described in the Unexamined Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. Boron iodonium, which is described in Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. In the case of the organic boride, the boron phosphonium complex, and the unexamined-Japanese Patent Publication No. Hei 9-188710, JP-A-6-3480, No. 1-7878, and JP-A-7- 1 405 An organic ruthenium transition metal ruthenium complex complex or the like, which is disclosed in Japanese Laid-Open Patent Publication No. Hei 7-306527, and Japanese Patent Publication No. Hei 7-29201-4, is a specific example. Examples of the compound of the smectites include the compounds described in the specification of JP-A-61-136654, and the specification of the Japanese Patent Publication No. 200-136. As the gun salt compound, for example, S.I. Schlesinger, Photogr. Sci. Eng., 18, 3 87 (1 974), T.S. Bal et al.

Polymer，21，423(1980)中記載的重氮鑰鹽、美國專利第 4,069,055號說明書、特開平4-365049號等中記載的銨鹽 、美國專利第4,069,055號、同4,069,056號的各說明書中 記載的鱗鹽、歐洲專利第1 04,1 43號的各說明書、特開平 2- 1 50848號公報、特開平2-2965 1 4號公報的各公報中記 © 載的碘鎗鹽等。 本發明所可適用的碘鎗鹽係二芳基碘鑰鹽，從安定性 的觀點來看，較佳爲經烷基、烷氧基、芳氧基等的供電子 基以2個以上取代者。 作爲本發明所可適用的鏑鹽之例，可舉出歐洲專利第 370,693號、同390,214號說明書、同233,567號說明書、 同297,443號說明書、同297,442號說明書、美國專利第 -84- 201009498 4,933,377 號說明書、同 4，760,0 1 3 號說明書、同 4,734,444號說明書、同2,833,827號說明書、德國專利第 2,904,626 號說明書、同 3,604,5 80 號說明書、同 3，604,5 8 1號說明書的各說明書中記載的锍鹽。從安定性及 感度之點來看，此锍鹽較佳爲經吸電子基取代者。吸電子 基的哈曼特（Hammett)値較佳爲大於0。作爲較佳的吸電子 基之例，可舉出鹵素原子、羧酸等。 又，作爲其它較佳的鏡鹽之例，可舉出三芳基锍鹽的1 © 個取代基具有香豆素構造或蒽醌構造，在300nm以上具有 吸收的鏑鹽，作爲其它較佳的銃鹽之例，可舉出三芳基鏑 鹽在取代基具有芳氧（aryloxy)基、芳硫基的在3 00nm以上 具有吸收的鏡鹽。 再者，作爲鎗鹽化合物之例，可舉出J.V· Crivello等 人在 Macromolecules，10(6)，1 307(1977)、J.V.C rivello 等 人在 J. Polymer Sci.，Polymer Chem. Ed., 17，1 047(1979) 中記載的硒鎗（selenonium)鹽、C.S. Wen等人在Teh, Proc. ® Conf. Rad. Curing ASIA，p478 Tokyo，Oct(1 988)中記載的 砷鐵（arsonium)鹽等的鑰鹽等。 作爲醯基膦（氧化物）化合物之例，可舉出汽巴特殊化學 品公司製的伊加克耳（IRGACURE)819、達諾克耳 (DAROCURE)4265、達諾克耳 TPO 等。 作爲光聚合引發劑，從曝光感度的觀點來看，較佳爲 從三鹵甲基三阱化合物、苄基二甲基縮酮化合物、α-羥基 酮化合物、α-胺基酮化合物、醯基膦化合物、氧化膦化合 -85- 201009498 物、金屬茂化合物、三芳基咪哇二聚物（triarylimidazole dimer)、鎗化合物、苯并噻唑化合物、二苯甲酮化合物、 苯乙酮化合物及其衍生物、環戊二烯·苯-鐵錯合物及其鹽 、鹵甲基噚二唑化合物、3-芳基取代香豆素化合物所組成 族群所選出的化合物。 更佳爲三鹵甲基三畊化合物、α-胺基酮化合物、醯基 膦化合物、氧化膦化合物、六芳基雙咪唑化合物、鎗化合 物、二苯甲酮化合物、苯乙酮化合物，最佳爲從三鹵甲基 三阱化合物、α-胺基酮化合物、六芳基雙咪唑化合物、二 ❿ 苯甲酮化合物所組成族群所選出的至少一種化合物。 作爲上述較佳的其它光聚合引發劑之具體例，可舉出 4-[〇-溴-ρ-Ν，Ν-二（乙氧羰基）胺基苯基]-2,6-二（三氯甲基）-s-三哄、Irgacure 18 4、Irgacure 3 6 9、Irgacure 3 7 9、 Irgacure 651、Irgacure 907、Irgacure 819(以上爲汽巴特 殊化學品製）、Darocure 4265、Darocure TPO(以上爲默克 (Merck)製）、阿帶克（ADEKA)1717(旭電化工業製）、2,2’-雙（〇-氯苯基）-4,5,4’-四苯基-1,2’-雙咪唑（黑金化成 © (Kurogane kasei Co.，Ltd.)製）、EABF(保 土谷化學公司 (Hodogaya Chemical Co.，Ltd.)製）等。其它光聚合引發劑 係可組合1種或2種以上而使用。 又，當使用曝光波長不具有吸收的引發劑時，必須使 用曝光波長具有吸收的化合物當作增感劑。 本發明所用之通式（I)所示的光聚合引發劑與其它引發 劑的總量，相對於著色感光性樹脂組成物中之全部固體成 -86- 201009498 分100質量份而言，通常爲0.5〜40質量份，較佳爲 3 〇質量份。 本發明的著色感光性樹脂組成物係藉由將上述（A) -加到溶劑中而調製。 作爲本發明所用的溶劑，可舉出酯類，例如醋酸 、醋酸正丁酯、醋酸異丁酯、甲酸戊酯、醋酸異戊酯 酸異丁酯、丙酸丁酯、丁酸異丙酯、丁酸乙酯、丁酸 、烷基酯類、乳酸甲酯、乳酸乙酯、氧基醋酸甲酯、 參 醋酸乙酯、氧基醋酸丁酯、甲氧基醋酸甲酯、甲氧基 乙醋、甲氧基醋酸丁酯、乙氧基醋酸甲酯、乙氧基醋 酯、3-氧基丙酸甲酯、3-氧基丙酸乙酯等的3_氧基丙 基醋類；3 -甲氧基丙酸甲醋、3 -甲氧基丙酸乙醋、3 -乙 丙酸甲酯、3 -乙氧基丙酸乙酯、2-氧基丙酸甲酯、2-丙酸乙酯、2-氧基丙酸丙酯、2_甲氧基丙酸甲酯、2_ 基丙酸乙醋、2 -甲氧基丙酸丙酯、2_乙氧基丙酸甲醋 乙氧基丙酸乙酯、2_氧基-2-甲基丙酸甲酯、2-氧基_2_ 丙酸乙酯、2 -甲氧基-2-甲基丙酸甲酯、2_乙氧基_2_甲 酸乙酯、丙酮酸甲酯、丙酮酸乙醋、丙酮酸丙酯、乙 酸甲酯、乙醯乙酸乙酯、2_氧代丁酸甲酯、八氧代丁 酯等；醚類，例如二甘醇二甲基醚、四氫呋喃、乙二 甲基醚、乙二醇單乙基酸、甲基溶纖劑醋酸酯、乙基 劑醋酸醋、二甘醇單甲基酸、二甘醇單乙基醚、二甘 丁基醚、丙二醇單甲基酸醋酸醋、丙二醇乙基酸醋酸 丙二醇丙基醚醋酸酯等；酮類，例如甲基乙基酮、環 “（D) 乙酯 、醋 丁酯 氧基 醋酸 酸乙 酸烷 氧基 氧基 甲氧 ' 2- 甲基 基丙 醯乙 酸乙 醇單 溶纖 醇單 醋、 己酮 -87- 201009498 、2-庚酮、3-庚酮等；芳香族烴類’例如甲苯、二甲苯等 〇 於此等之中，較佳爲3-乙氧基丙酸甲酯、3-乙氧基丙 酸乙酯、乙基溶纖劑醋酸酯、乳酸乙酯、二甘醇二甲基醚 、醋酸丁酯、3 -甲氧基丙酸甲酯、2-庚酮、環己酮、乙基 卡必醇醋酸酯、丁基卡必醇醋酸酯 '丙二醇單甲基醚醋酸 酯等。 溶劑可以單獨使用，也可組合2種以上來使用。 本發明的著色感光性樹脂組成物按照所欲’亦可更含 © 有界面活性劑、鏈轉移劑、熱聚合引發劑、烷氧基矽烷化 合物、熱聚合成分、聚合抑制劑等的其它添加物。 氟系界面活性劑 本發明的著色感光性樹脂組成物，藉由含有氟有機化 合物，可改善當作塗佈液時的液特性（尤其流動性）’可改 善塗佈厚度的均一性或省液性。即，降低基板與塗佈液的 界面張力而改善對基板的潤濕性，由於提高對基板的塗佈 性，故即使以少量的液量形成數微米左右的薄膜時，也有 © 效於形成不均小的均勻厚度之膜。 氟有機化合物的氟含有率較佳爲3〜40質量％，更佳爲 5〜30質量％，特佳爲7〜25質量％。氟含有率若在前述範 圍內，則在塗佈厚度均勻性或省液性之點係有效，在組成 物中的溶解性亦良好。 作爲氟系界面活性劑，可合適地使用末端、主鏈及側 鏈的至少任一部位具有氟烷基或氟伸烷基的化合物。作爲 -88- 201009498 具體的市售品，例如可舉出美加發克（MEGAFAC)F142D、 同 F172 、同 F173、同 F176、同 F177、同 F183、同 F479 、同 F482、同 F780、同 F781、同 R30、同 R08、同 F-472SF、同 BL20、同 R-61、同 R-90、同 F-554(DIC(股 )(DIC Corporation)製）、福若雷得（FLUORAD)FC-135、同 FC-170C、同 FC-430、同 FC-431、Novec FCN4430(住友 3 Μ(股）（sumit〇m〇 3 M Limited)製）、阿沙尹卡德（Asahi Guard) AG7 1 05、7000、950、7600、沙氟龍（S U RF L ON) S-© 112 、同 S-113 、同 S-131 、同 S-141 、同 S-145 、同 S_382 、同 SC-101、同 SC-102、同 SC-103、同 SC-104、同 SC-105、同 SC-106(旭玻璃（股）（Asahi Glass Co·，Ltd.)製）、艾 福特普（EFTOP)EF3 5 1、同 352、同 801、同 802(JEMCO(股 )(JEMCO Inc.)製）等。 聚矽氧界面活性劑 作爲聚矽氧界面活性劑，例如可舉出具有矽氧烷鍵結 的界面活性劑等。具體地，可舉出FZ-2122、FZ-2191、 ® SH-28PA (東麗.道康寧股份有限公司（Dow Corning Toray Co.，Ltd·)製）、東麗聚矽氧（Toray Silicone)DC3PA、東麗 聚矽氧SH7PA、東麗聚矽氧DC11PA、東麗聚矽氧SH21PA 、東麗聚矽氧SH28PA、東麗聚矽氧29SHPA、東麗聚矽氧 SH30PA、聚醚改性砂油SH8400(東麗聚矽氧（股）製）、1^-6001 ' KF-6002、KF-6003、X22-170BX、X-22-170DX、 KP321、KP322 ' KP323 ' KP324、KP326、KP340、KP34 1 ( 信越聚矽氧股份有限公司（Shin-Etsu Silicones)製）、 -89- 201009498 TSF400、TSF401、TSF410、TSF4300、TSF4440、TSF4445 、TSF-4446、TSF4452、TSF4460(Momentive Performance M a t e r i a 1 s I n c ·製）等。 聚矽氧界面活性劑 本發明的氟界面活性劑或聚矽氧界面活性劑，係可以 相對於著色感光性樹脂組成物中的全部固體成分而言， 0.01質量％以上的量來使用，較佳爲〇.〇1〜1.0質量％，特 佳爲0.02〜0.7質量％。 若在此範圍，則塗佈性及硬化膜的均勻性成爲良好。 ® 於本發明中，除了前述氟界面活性劑或聚砂氧界面活 性劑，亦可倂用非離子界面活性劑、陽離子界面活性劑、 及/或陰離子界面活性劑。 作爲非離子界面活性劑之例’例如特佳爲聚氧化乙稀 烷基醚類、聚氧化乙烯烷基芳基醚類、聚氧化乙燃院基酯 類、山梨糖醇酐烷基酯類、單甘油酯烷基酯類等的非離子 界面活性劑。作爲具體例’可舉出聚氧化乙嫌月桂基醚、 聚氧化乙烯硬脂基醚、聚氧化乙儲油基酸等的聚氧化乙稀 ® 烷基醚類；聚氧化乙烯辛基苯基醚、聚氧化乙嫌聚乙嫌基 酸、聚氧化乙燃三节基苯基酸、聚氧化乙嫌_丙烯聚苯乙稀 基醚、聚氧化乙烯壬基苯基酸等的聚氧化乙嫌芳基酸類； 聚氧化乙烯二月桂酸酯、聚氧化乙烯二硬脂酸酯等的聚氧 化乙烯二烷基酯、山梨糖醇酐脂肪酸醋、聚氧化乙嫌山梨 糖醇肝脂肪酸醋類、乙二胺聚氧化乙嫌_聚氧化丙儲縮合物 等的非離子界面活性劑’此等可適宜使用花王（股）（Kao -90- 201009498The diazo salt described in Polymer, 21, 423 (1980), the ammonium salt described in the specification of U.S. Patent No. 4,069,055, the Japanese Patent No. 4, 069, 055, and the specification of U.S. Patent No. 4,069,055, the disclosure of which is incorporated herein by reference. In the respective publications of the Japanese Patent Publication No. Hei. The iodine salt-based diaryl iodine salt to which the present invention is applicable is preferably one or more substituents of an electron-donating group such as an alkyl group, an alkoxy group or an aryloxy group from the viewpoint of stability. . Examples of the cerium salt to which the present invention is applicable include European Patent No. 370, 693, the specification of 390, 214, the specification of 233, 567, the specification of 297, 443, the specification of 297, 442, and the US Patent No. -84-201009498 4,933,377. The specification, the same as the specification of 4,760,0 1 3, the specification of the same 4,734,444, the specification of the same 2,833,827, the specification of the German Patent No. 2,904,626, the specification of the same 3,604,5 80, and the specification of the 3,604,5 8 1 The phosphonium salt described in the specification. From the standpoint of stability and sensitivity, the cerium salt is preferably substituted by an electron withdrawing group. The Hammett(R) of the electron withdrawing group is preferably greater than zero. As an example of a preferable electron-attracting group, a halogen atom, a carboxylic acid, etc. are mentioned. Further, as another preferable example of the mirror salt, one of the substituents of the triarylsulfonium salt has a coumarin structure or a fluorene structure, and an ytterbium salt having absorption at 300 nm or more is preferable as other preferred ruthenium salts. Examples of the salt include a mirror salt in which the triarylsulfonium salt has an aryloxy group and an arylthio group having an absorption at 300 nm or more. Further, examples of the gun salt compound include JV Crivello et al., Macromolecules, 10 (6), 1 307 (1977), JVC rivello et al., J. Polymer Sci., Polymer Chem. Ed., 17 , selenonium salt described in 1 047 (1979), arsonium salt described by CS Wen et al., Teh, Proc. ® Conf. Rad. Curing ASIA, p478 Tokyo, Oct (1 988) Such as key salts and so on. Examples of the mercaptophosphine (oxide) compound include IRGACURE 819, DAROCURE 4265, Danoke TPO, and the like manufactured by Ciba Specialty Chemicals. The photopolymerization initiator is preferably a trihalomethyl tritrap compound, a benzyldimethylketal compound, an α-hydroxyketone compound, an α-aminoketone compound or a mercapto group from the viewpoint of exposure sensitivity. Phosphine compound, phosphine oxide compound-85-201009498, metallocene compound, triarylimidazole dimer, gun compound, benzothiazole compound, benzophenone compound, acetophenone compound and its derivative A compound selected from the group consisting of a cyclopentadiene benzene-iron complex and a salt thereof, a halomethyl oxadiazole compound, and a 3-aryl-substituted coumarin compound. More preferably, it is a trihalomethyl tri-till compound, an α-amino ketone compound, a mercaptophosphine compound, a phosphine oxide compound, a hexaarylbisimidazole compound, a gun compound, a benzophenone compound, an acetophenone compound, and the like. It is at least one compound selected from the group consisting of a trihalomethyl tritrap compound, an α-amino ketone compound, a hexaarylbisimidazole compound, and a benzophenone compound. Specific examples of the other preferred photopolymerization initiators mentioned above include 4-[〇-bromo-ρ-Ν, Ν-bis(ethoxycarbonyl)aminophenyl]-2,6-di(trichloro). Methyl)-s-tritium, Irgacure 18 4, Irgacure 3 6 9, Irgacure 3 7 9, Irgacure 651, Irgacure 907, Irgacure 819 (above Ciba Specialty Chemicals), Darocure 4265, Darocure TPO (above Merck (Aerck) 1717 (made by Asahi Kasei Co., Ltd.), 2,2'-bis(〇-chlorophenyl)-4,5,4'-tetraphenyl-1,2 '-Biimidazole (manufactured by Kurogane Kasei Co., Ltd.), EABF (manufactured by Hodogaya Chemical Co., Ltd.), and the like. Other photopolymerization initiators may be used alone or in combination of two or more. Further, when an initiator having no absorption wavelength at the exposure wavelength is used, it is necessary to use a compound having absorption at an exposure wavelength as a sensitizer. The total amount of the photopolymerization initiator and other initiators represented by the formula (I) used in the present invention is usually -86 to 201009498 parts by mass of 100 parts by mass based on the total solids in the colored photosensitive resin composition. 0.5 to 40 parts by mass, preferably 3 parts by mass. The colored photosensitive resin composition of the present invention is prepared by adding the above (A) - to a solvent. Examples of the solvent to be used in the present invention include esters such as acetic acid, n-butyl acetate, isobutyl acetate, amyl formate, isobutyl acetate isobutylate, butyl propionate, and isopropyl butyrate. Ethyl butyrate, butyric acid, alkyl esters, methyl lactate, ethyl lactate, methyl oxyacetate, ethyl acetate, butyl oxyacetate, methyl methoxyacetate, methoxyethyl vinegar , 3-methoxypropyl vinegar such as butyl methoxyacetate, methyl ethoxyacetate, ethoxyacetate, methyl 3-oxypropionate or ethyl 3-oxypropionate; -Methyl methoxypropionic acid, ethyl 3-methoxypropionate, methyl 3-propionate, ethyl 3-ethoxypropionate, methyl 2-oxypropionate, 2-propionic acid Ethyl ester, propyl 2-oxypropionate, methyl 2-methoxypropionate, ethyl 2-acetoxyacetate, propyl 2-methoxypropionate, 2-ethoxypropyl ethoxylate Ethyl propyl propionate, methyl 2- oxy-2-methylpropanoate, ethyl 2-oxy-2-propanoate, methyl 2-methoxy-2-methylpropanoate, 2-ethoxy Base_2_ethyl formate, methyl pyruvate, ethyl acetonate, propyl pyruvate, methyl acetate, ethyl acetate 2_oxobutanoic acid methyl ester, octaoxybutyl butyl ester, etc.; ethers, such as diethylene glycol dimethyl ether, tetrahydrofuran, ethylene glycol ether, ethylene glycol monoethyl acid, methyl cellosolve acetate Ester, ethyl acetate acetate, diethylene glycol monomethyl acid, diethylene glycol monoethyl ether, diethylene glycol ether, propylene glycol monomethyl acid acetic acid vinegar, propylene glycol ethyl acid propylene glycol propyl ether acetate, etc.; Classes, such as methyl ethyl ketone, ring "(D) ethyl ester, acetobutyl oxyacetate acetic acid alkoxy methoxy methoxy ' 2- methyl propyl hydrazine acetic acid ethanol monosolvate mono vinegar, Ketone-87-201009498, 2-heptanone, 3-heptanone, etc.; aromatic hydrocarbons such as toluene, xylene, etc., among them, preferably 3-ethoxypropionate methyl ester, 3- Ethyl ethoxy propionate, ethyl cellosolve acetate, ethyl lactate, diethylene glycol dimethyl ether, butyl acetate, methyl 3-methoxypropionate, 2-heptanone, cyclohexanone Ethyl carbitol acetate, butyl carbitol acetate propylene glycol monomethyl ether acetate, etc. The solvent may be used singly or in combination of two or more. The color-sensitive photosensitive resin composition may further contain, as desired, other additives such as a surfactant, a chain transfer agent, a thermal polymerization initiator, an alkoxydecane compound, a thermal polymerization component, a polymerization inhibitor, and the like. Interfacial surfactant The color-sensitive photosensitive resin composition of the present invention can improve liquid properties (especially fluidity) when used as a coating liquid by containing a fluorine-containing organic compound, which can improve uniformity or liquid-saving property of coating thickness. That is, the interfacial tension between the substrate and the coating liquid is lowered to improve the wettability to the substrate, and since the coating property to the substrate is improved, even when a film having a small amount of liquid is formed in a small amount of liquid, the effect is formed. The fluorine-containing content of the fluorine-containing organic compound is preferably from 3 to 40% by mass, more preferably from 5 to 30% by mass, particularly preferably from 7 to 25% by mass. When the fluorine content is within the above range, it is effective at the point of coating thickness uniformity or liquid-saving property, and the solubility in the composition is also good. As the fluorine-based surfactant, a compound having a fluoroalkyl group or a fluoroalkyl group in at least any of a terminal, a main chain and a side chain can be suitably used. Specific examples of the commercial products of -88-201009498 include MEGAFAC F142D, F172, F173, F176, F177, F183, F479, F482, F780, and F781. Same as R30, the same R08, the same F-472SF, the same BL20, the same R-61, the same R-90, the same F-554 (DIC (DIC) system), FLUORAD FC-135 , with FC-170C, with FC-430, with FC-431, Novec FCN4430 (Sumitomo 3 Μ (share) (sumit〇m〇3 M Limited)), Asahi Guard (Asahi Guard) AG7 1 05, 7000 , 950, 7600, Sharon (SU RF L ON) S-© 112, with S-113, with S-131, with S-141, with S-145, with S_382, with SC-101, with SC- 102, the same SC-103, the same SC-104, the same SC-105, the same SC-106 (Asahi Glass Co., Ltd.), EFTOP EF3 5 1 352, the same 801, the same 802 (JEMCO (shares) (JEMCO Inc.)) and so on. Polyoxymethylene surfactant The polyphosphonium surfactant is exemplified by a surfactant having a siloxane coupling. Specifically, FZ-2122, FZ-2191, ® SH-28PA (manufactured by Dow Corning Toray Co., Ltd.), Toray Silicone DC3PA, and the like are mentioned. Toray polyoxyn SH7PA, Toray polyoxynium DC11PA, Toray polyoxynium SH21PA, Toray polyoxynium SH28PA, Toray polyoxyn 29SHPA, Toray polyoxyn SH30PA, polyether modified sand oil SH8400 ( Toray Polyxylene Co., Ltd., 1^-6001 'KF-6002, KF-6003, X22-170BX, X-22-170DX, KP321, KP322 'KP323 'KP324, KP326, KP340, KP34 1 (Shin-Etsu Poly-Otsu Silicones Co., Ltd., -89- 201009498 TSF400, TSF401, TSF410, TSF4300, TSF4440, TSF4445, TSF-4446, TSF4452, TSF4460 (Momentive Performance M ateria 1 s I nc · system) Wait. Polyfluorene surfactant The fluorosurfactant or polyfluorene surfactant of the present invention can be used in an amount of 0.01% by mass or more based on the total solid content of the colored photosensitive resin composition. It is 〜. 〇1 to 1.0% by mass, particularly preferably 0.02 to 0.7% by mass. When it is in this range, the coatability and the uniformity of the cured film become good. In the present invention, in addition to the above-mentioned fluorine surfactant or polyoxalate surfactant, a nonionic surfactant, a cationic surfactant, and/or an anionic surfactant may be used. Examples of the nonionic surfactant are, for example, particularly polyethylene oxide alkyl ethers, polyoxyethylene alkyl aryl ethers, polyoxyethylene oxyalkyl esters, sorbitan alkyl esters, A nonionic surfactant such as a monoglyceride alkyl ester. Specific examples thereof include polyoxyethylene methyl ethers such as polyoxyethylene b-sodium lauryl ether, polyoxyethylene stearyl ether, polyoxyethylene oleic acid, and the like; polyoxyethylene octyl phenyl ether; Polyoxyethylene B is suspected to be poly(ethyl bromide), polyoxyethylene triacetate, polyoxyethylene b, propylene polystyrene ether, polyoxyethylene nonyl phenyl acid, etc. Acids; polyoxyethylene dialkyl esters such as polyoxyethylene dilaurate, polyoxyethylene distearate, sorbitan fatty acid vinegar, polyoxyethylene b sorbitol liver fatty acid vinegar, ethylenediamine Poly-2-oxide non-ionic surfactants such as polyoxypropylene storage condensate', etc. can be suitably used in Kao (Ko-90-201009498)

Corporation)、日本油脂（股）（N〇F Corporation)、竹本油脂 (股 KTAKEMOTO OIL &amp; FAT Co., Ltd.) ' (股 )ADEKA(ADEKA Corporation)、三洋化成（股）（Sanyo Chemical Industries, Ltd.)等所市售者。除了上述，亦可使 用前述的分散劑。 作爲在本發明的著色感光性樹脂組成物中所可添加的 鏈轉移劑，例如可舉出N，N-二甲胺基苯甲酸乙酯等的 N，N-二烷基胺基苯甲酸烷基酯、2·锍基苯并噻唑、2-锍基 β 苯并噚唑、2-锍基苯并咪唑、Ν·苯基锍基苯并咪唑、1，3,5-三（3-锍基丁氧基乙基）-1，3,5-三哄-2,4,6(111，311，5以-三酮等 之具有雜環的巯基化合物，及季戊四醇四（3-锍基丁酸酯） 、1，4-雙（3-锍基丁醯氧基）丁烷等的脂肪族多官能锍基化合 物等。 鏈轉移劑係可使用單獨1種，也可倂用2種以上。 從減低感度變動的觀點來看，鏈轉移劑的添加量，相 對於全部固體成分而言，較佳爲0.01〜15質量％的範圍， ® 更佳爲0.1〜10質量％，特佳爲0·5〜5質量％。 於本發明的著色感光性樹脂組成物中，含有熱聚合引 發劑係亦有效。作爲熱聚合引發劑，例如可舉出各種的偶 氮化合物、過氧化物化合物；作爲前述偶氮化合物，可舉 出偶氮雙化合物；作爲前述過氧化物化合物，可舉出酮過 氧化物、過氧縮酮、氫過氧化物、二烷基過氧化物、二醯 基過氧化物、過氧酯、過氧二碳酸酯等。 於本發明的著色感光性樹脂組成物中，可含有熱聚合 -91- 201009498 成分。作爲熱聚合成分，可舉出多官能環氧化合物等。 多官能環氧化合物係指與鹼可溶性樹脂的羧基進行熱 交聯的化合物，藉由熱交聯而使交聯密度變高，謀求耐藥 品性的提高。 作爲本發明所可使用的多官能環氧化合物，可舉出雙 酚A型環氧化合物、甲酚-酚醛清漆型環氧化合物、聯苯 型環氧化合物、脂環式環氧化合物等。 例如作爲雙酚 A型環氧化合物，可舉出艾泊托多 (EPOTOTHO)YD-1 1 5、YD -1 1 8 T、YD -1 2 7、YD -1 2 8、YD - © 134、YD-8125、YD-7011R、ZX-1 059、YDF-8170、YDF-170等（以上爲東都化成（Tohto KaseiCo.，Ltd·)製）、丹納柯 樂（DENACOL)EX-llOl、EX-1102、EX-1103 等（以上爲納 加榭化成（Nagase ChemiteX Corporation)製）、普拉庫賽樂 (PLACCEL)GL-61、GL-62、G101、G102(以上爲戴西爾化 學（DAICEL Chemical I n du s t r i e s，L t d ·)製），以及此等類似 的雙酚F型環氧化合物、雙酚S型環氧化合物。又，亦可 使用 Ebecryl 3700、370 1、600(以上爲戴西爾優西比 © (DAICEL-CYTEC COMPANY Ltd.)製）等的環氧丙烯酸酯。 作爲甲酚-酚醛清漆型環氧化合物，可舉出Epototho YDPN-63 8、YDPN-701、YDPN-702、YDPN-703、YDPN-704等（以上爲東都化成製）、丑？丨〇1〇11]^-660、：^-670、：^-680、N-690、N-695、YDCN-704L(以上 DIC 公司製）、 Denacol EM-125等（以上爲納加榭化成製），作爲聯苯型環 氧化合物，可舉出3,5,3’，5’-四甲基-4,4’-二縮水甘油基聯 -92- .201009498 苯等。 作爲脂環式環氧化合物，可舉出西若幾赛德 (CELLOXIDE)202 1 、208 1 、2083、2085 、艾泊里德 (EPOLEAD)GT-301、GT-302、GT-401、GT-403、EHPE-3 150(以上戴西爾化學製）、山托多（SANTOHTO)ST-3 000、 ST-4000、ST-5 080、ST-5100 等（以上爲東都化成（Tohto Kasei Co.，Ltd.)製）等。另外，亦可使用胺型環氧樹脂的艾 泊托多YH-4 34、YH-4 3 4L、雙酚A型環氧樹脂之在骨架中 〇 將二聚酸改性的縮水甘油基酯等。 於此等環氧樹脂之中，較佳爲酚醛清漆型環氧化合物 、脂環式環氧化合物，特佳爲環氧當量180〜250者，作 爲如此的原材料，可舉出艾比庫隆（£?1&lt;：1^〇1^)1^-660、1^-670、N-680、N-690、N-695、YDCN-704L(以上爲 DIC 公 司製）、EHPE3150(戴西爾化學製）。 於本發明的組成物中，亦可含有2種以上的多官能環 氧化合物。 β 本發明的多官能環氧化合物在著色感光性樹脂組成物 中的含量，相對於顏料以外的全部固體成分而言，較佳爲 〇〜20質量％，更佳爲2〜10質量％。該含量若在前述範圍 內，則可有效地提高膜的耐溶劑性。 於本發明所用的感光性樹脂組成物中，從提高與基板 的密接性等觀點來看，可使用烷氧基矽烷化合物，尤其矽 烷偶合劑。 矽烷偶合劑較佳爲具有烷氧基矽烷基當作可與無機材 -93- 201009498 料化學鍵結的水解性基者，較佳爲在與有機樹脂之間相互 作用或形成鍵結而顯示親和性的（甲基）丙烯醯基、苯基、 锍基、環氧矽烷，其中更佳爲爲（甲基）丙烯醯基丙基三甲 氧基矽烷。作爲如此的原材料，可舉出 ΚΒΜ-3 03、KBM-402、KBM-403、KBM-502、KBM-503、KBM-802、KBM-803 (信越化學工業（股）製）。 使用矽烷偶合劑時的添加量，在本發明所用的感光性 樹脂組成物中之全部固體成分中，較佳爲0.2質量％〜5.0 質量％的範圍，更佳爲0.5質量％〜3.0質量％。 ❿ 於本發明的著色感光性樹脂組成物中，除了以上，較 佳爲更添加聚合抑制劑，例如可使用氫醌（hydroquinone)、 對甲氧基苯酚、二第三丁基對甲酚、焦桔酚（pyrogallol)、 第三丁基兒苯酚、苯酚、4,4’-硫雙（3-甲基-6-第三丁基苯 酚）、2,2’-亞甲基雙（4-甲基-6-第三丁基苯酚）、2-锍基苯并 咪唑等。 除了上述以外，亦可在著色感光性樹脂組成物中添加 各種的添加物。作爲添加物的具體例，有2-(3-第三丁基- © 5-甲基-2-羥基苯基）-5-氯苯并三唑、烷氧基二苯甲酮等的 紫外線吸收劑，聚丙烯酸鈉等的防凝聚劑，玻璃、氧化鋁 等的塡充劑；伊康酸共聚物、巴豆酸共聚物、馬來酸共聚 物、部分酯化馬來酸共聚物、酸性纖維素衍生物、於具有 羥基的聚合物附加酸酐者、醇可溶性耐隆、由雙酚A與環 氧氯丙烷所形成的苯氧基樹脂等之鹼可溶樹脂等。 當爲了促進未硬化部的鹼溶解性，謀求著色感光性樹 -94- 201009498 脂組成物的顯像性之進一步提高時，可在著色感光性樹脂 組成物中添加有機羧酸，較佳爲分子量1000以下的低分 子量有機羧酸。作爲有機羧酸的具體例，可舉出甲酸、乙 酸、丙酸、丁酸、戊酸、三甲基乙酸、己酸、二乙基乙酸 、庚酸、辛酸等的脂肪族單羧酸；草酸、丙二酸、琥珀酸 、戊二酸、己二酸、庚二酸、辛二酸、壬二酸、癸二酸、 巴西基酸、甲基丙二酸、乙基丙二酸、二甲基丙二酸 '甲 基琥珀酸、四甲基琥珀酸、檸康酸等的脂肪族二羧酸；丙 β 三羧酸、烏頭酸、樟腦三酸等的脂肪族三羧酸；苯甲酸、 甲苯酸、枯茗酸、2，3-二甲基苯甲酸、莱林酸等的芳香族 單羧酸；苯二甲酸、間苯二甲酸、對苯二甲酸、偏苯三酸 、均苯三酸、偏苯四酸、均苯四酸等的芳香族多羧酸；苯 基乙酸、氫化阿托酸、氫化肉桂酸、扁桃酸、苯基琥珀酸 、阿托酸、肉桂酸、肉桂酸甲酯、肉桂酸苄酯、亞肉桂基 乙酸、香豆酸、傘形酸等的其它羧酸。 由於使用上述成分，本發明的著色感光性樹脂組成物 ^ 即使藉由紫外區域的雷射之曝光，也以高感度形成被膜’ 故藉由紫外光雷射的高輸出曝光，可抑制膜的分解’維持 所欲的圖案形狀。因此，含有前述各種成分的著色感光性 樹脂組成物，係能形成線寬安定的圖案，而可適用於本發 明的方法，較佳地使用於彩色濂光片的著色圖案形成。 圖案形成方法 本發明的圖案形成方法包括：將含有（Α)乙烯性不飽和 化合物、（Β)黏結劑樹脂、（C)著色劑及（D)通式（I)所示的光 -95- 201009498 聚合引發劑之著色感光性樹脂組成物，藉由紫外光雷射曝 光成圖案狀，使曝光區域硬化。Corporation), Nippon Oil & Fats Co., Ltd. (N〇F Corporation), Nippon Oil & Fats Co., Ltd. (KTAKEMOTO OIL & FAT Co., Ltd.) 'ADEKA (ADEKA Corporation), Sanyo Chemical Industries, (Sanyo Chemical Industries, Ltd.) and other marketers. In addition to the above, the aforementioned dispersing agent can also be used. The chain transfer agent which can be added to the colored photosensitive resin composition of the present invention is, for example, N,N-dialkylaminobenzoic acid such as N,N-dimethylaminobenzoic acid ethyl ester. Base ester, 2·mercaptobenzothiazole, 2-mercaptoβ benzoxazole, 2-mercaptobenzimidazole, fluorenylphenylbenzimidazole, 1,3,5-tris(3-quinone Butyloxyethyl)-1,3,5-tris-2,4,6 (111,311,5-trione or the like having a heterocyclic fluorenyl compound, and pentaerythritol tetrakis(3-mercaptobutyl) An aliphatic polyfunctional fluorenyl compound such as 1,4-bis(3-mercaptobutyloxy) butane, etc. The chain transfer agent may be used alone or in combination of two or more. The amount of the chain transfer agent to be added is preferably in the range of 0.01 to 15% by mass, more preferably 0.1 to 10% by mass, particularly preferably 0, from the viewpoint of reducing the sensitivity variation. 5 to 5 mass%. The coloring photosensitive resin composition of the present invention is also effective in containing a thermal polymerization initiator. Examples of the thermal polymerization initiator include various azo compounds and peroxide compounds; The azo compound may, for example, be an azobis compound; examples of the peroxide compound include a ketone peroxide, a peroxyketal, a hydroperoxide, a dialkyl peroxide, and a dimercapto group. Oxidizing agent, peroxyester, peroxydicarbonate, etc. The coloring photosensitive resin composition of the present invention may contain a component of thermal polymerization-91-201009498. Examples of the thermopolymerizable component include a polyfunctional epoxy compound and the like. The polyfunctional epoxy compound is a compound which is thermally crosslinked with a carboxyl group of an alkali-soluble resin, and has a high crosslinking density by thermal crosslinking, thereby improving chemical resistance. Examples of the epoxy compound include a bisphenol A type epoxy compound, a cresol novolac type epoxy compound, a biphenyl type epoxy compound, an alicyclic epoxy compound, etc., for example, as a bisphenol A type epoxy compound, Etototo (EPOTOTHO) YD-1 1 5, YD -1 1 8 T, YD -1 2 7 , YD -1 2 8 , YD - © 134, YD-8125, YD-7011R, ZX- 1 059, YDF-8170, YDF-170, etc. (The above is Tohto Kasei Co., Ltd.) ), DENACOL EX-llOl, EX-1102, EX-1103, etc. (above is Nagase ChemiteX Corporation), Placcel GL-61, GL- 62, G101, G102 (above is manufactured by DAICEL Chemical I n du Stries, Ltd), and similar bisphenol F type epoxy compounds, bisphenol S type epoxy compounds. Further, an epoxy acrylate such as Ebecryl 3700, 370 1, or 600 (above, manufactured by DAICEL-CYTEC COMPANY Ltd.) can also be used. Examples of the cresol-novolac type epoxy compound include Epototho YDPN-63 8, YDPN-701, YDPN-702, YDPN-703, YDPN-704 (the above is Dongdu Chemical), and ugly?丨〇1〇11]^-660, :^-670,:^-680, N-690, N-695, YDCN-704L (made by DIC company), Denacol EM-125, etc. The biphenyl type epoxy compound may, for example, be 3,5,3',5'-tetramethyl-4,4'-diglycidyl group-92-.201009498 benzene or the like. Examples of the alicyclic epoxy compound include CELLOXIDE 202 1 , 208 1 , 2083 , 2085 , EPOLEAD GT-301, GT-302, GT-401, and GT-. 403, EHPE-3 150 (above Daisy Chemical), SANTOHTO ST-3 000, ST-4000, ST-5 080, ST-5100, etc. (The above is Tohto Kasei Co., Ltd.)). Further, an amino-type epoxy resin such as Epoto-poly YH-4 34, YH-4 3 4L, or a bisphenol A-type epoxy resin may be used, and a dimer acid-modified glycidyl ester may be used in the skeleton. . Among these epoxy resins, a novolac type epoxy compound or an alicyclic epoxy compound is preferable, and an epoxy equivalent of 180 to 250 is particularly preferable. As such a raw material, Abby Coulon (Abby Coulomb) £?1&lt;:1^〇1^)1^-660, 1^-670, N-680, N-690, N-695, YDCN-704L (above DIC), EHPE3150 (Dai Sil Chemical system). The composition of the present invention may contain two or more kinds of polyfunctional epoxy compounds. The content of the polyfunctional epoxy compound of the present invention in the colored photosensitive resin composition is preferably from 〇 20 to 20% by mass, and more preferably from 2 to 10% by mass based on the total solid content of the pigment. When the content is within the above range, the solvent resistance of the film can be effectively improved. In the photosensitive resin composition used in the present invention, an alkoxydecane compound, particularly a decane coupling agent, can be used from the viewpoint of improving adhesion to a substrate. The decane coupling agent preferably has an alkoxyalkyl group as a hydrolyzable group which can be chemically bonded to the inorganic material -93-201009498, and preferably exhibits affinity by interacting with or forming a bond with the organic resin. (Meth)propenyl fluorenyl, phenyl, decyl, epoxy decane, more preferably (meth) propylene decyl propyl trimethoxy decane. Examples of such a raw material include ΚΒΜ-3 03, KBM-402, KBM-403, KBM-502, KBM-503, KBM-802, and KBM-803 (manufactured by Shin-Etsu Chemical Co., Ltd.). The amount of the solid content of the photosensitive resin composition used in the present invention is preferably 0.2% by mass to 5.0% by mass, more preferably 0.5% by mass to 3.0% by mass, based on the total amount of the solid content of the photosensitive resin composition used in the present invention. In the color-sensitive photosensitive resin composition of the present invention, in addition to the above, it is preferred to further add a polymerization inhibitor, for example, hydroquinone, p-methoxyphenol, di-tert-butyl-p-cresol, or coke may be used. Pyrogallol, tert-butyl phenol, phenol, 4,4'-thiobis(3-methyl-6-tert-butylphenol), 2,2'-methylenebis(4-methyl Base-6-tert-butylphenol), 2-mercaptobenzimidazole, and the like. In addition to the above, various additives may be added to the colored photosensitive resin composition. Specific examples of the additive include ultraviolet absorption of 2-(3-t-butyl--- 5-methyl-2-hydroxyphenyl)-5-chlorobenzotriazole, alkoxybenzophenone, and the like. Agent, anti-agglomerating agent such as sodium polyacrylate, chelating agent for glass, alumina, etc.; itaconic acid copolymer, crotonic acid copolymer, maleic acid copolymer, partially esterified maleic acid copolymer, acid cellulose A derivative, an alkali-soluble resin such as a phenolic resin formed of a phenol having a hydroxyl group, an alcohol-soluble lanthanone, a phenoxy resin formed of bisphenol A or epichlorohydrin, or the like. When the alkali solubility of the uncured portion is promoted, and the development of the coloring photosensitive tree-94-201009498 lipid composition is further improved, an organic carboxylic acid may be added to the colored photosensitive resin composition, preferably molecular weight. A low molecular weight organic carboxylic acid of 1000 or less. Specific examples of the organic carboxylic acid include aliphatic monocarboxylic acids such as formic acid, acetic acid, propionic acid, butyric acid, valeric acid, trimethylacetic acid, caproic acid, diethyl acetic acid, heptanoic acid, and octanoic acid; and oxalic acid; , malonic acid, succinic acid, glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid, sebacic acid, benzoic acid, methylmalonic acid, ethylmalonic acid, dimethyl An aliphatic dicarboxylic acid such as propyl succinic acid, tetramethyl succinic acid or citraconic acid; an aliphatic tricarboxylic acid such as propylene β tricarboxylic acid, aconitic acid or camphor tricarboxylic acid; benzoic acid, Aromatic monocarboxylic acids such as toluic acid, cumanoic acid, 2,3-dimethylbenzoic acid, lysine, etc.; phthalic acid, isophthalic acid, terephthalic acid, trimellitic acid, benzene An aromatic polycarboxylic acid such as acid, pyromellitic acid or pyromellitic acid; phenylacetic acid, hydrogenated atropic acid, hydrogenated cinnamic acid, mandelic acid, phenylsuccinic acid, atropic acid, cinnamic acid, cinnamic acid Other carboxylic acids such as esters, benzyl cinnamate, cinnamyl acetic acid, coumaric acid, umbrella acids, and the like. By using the above-mentioned components, the colored photosensitive resin composition of the present invention can form a film with high sensitivity even by exposure by a laser in an ultraviolet region, so that high-exposure exposure by ultraviolet light laser can suppress decomposition of the film. 'Maintain the desired pattern shape. Therefore, the colored photosensitive resin composition containing the above various components can form a pattern having a line width stability, and can be suitably used in the method of the present invention, and is preferably used for forming a colored pattern of a color calender. Pattern Forming Method The pattern forming method of the present invention comprises: containing (Α) an ethylenically unsaturated compound, a (Β) binder resin, (C) a colorant, and (D) a light-95- represented by the formula (I) 201009498 The coloring photosensitive resin composition of the polymerization initiator is exposed to a pattern by ultraviolet laser exposure to harden the exposed region.

上述通式（I)中，R及X各自獨立地表示一價取代基，A 及Y各自獨立地表示二價有機基，Ar表示芳基。n係〇〜5 的整數。當X以複數存在時，複數的X各自獨立地表示一 價取代基。 © 曝光步驟 於本發明的曝光方式中，使用紫外光雷射當作光源。 雷射係英語的 Light Amplification by Stimulated Emission of Radiation(受激發射的光之增幅）之首字母。利用有粒子 數反轉（population inversion)的物質中所發生的受激發射 之現象，藉由光波的增幅、振盪作出干渉性與指向性更強 的單色光之振盪器及增幅器，激發介質有結晶、玻璃、液 體、色素、氣體等，可使用來此等介質的固體雷射、液體 〇 雷射、氣體雷射、半導體雷射等之眾所周知的在紫外光具 有振盪波長的雷射。其中，從雷射的輸出及振盪波長的觀 點來，較佳爲固體雷射、氣體雷射。 作爲本發明所可用的波長，較佳爲300nm〜3 80nm的範 圍之波長範圍的紫外光雷射，更佳爲3 00nm〜3 60nm的範 圍之波長的紫外光雷射，此從符合光阻的感光波長之點來 看係較宜。 -96- 201009498 具體地，較宜使用尤其輸出大、比較廉價的固體雷射 之Nd: YAG雷射的第三高次諧波（3 5 5nm)或準分子雷射 (excimer laser)的 XeCl(308nm)、XeF(3 5 3nm)。 被曝光物（圖案）的曝光量爲ImJ/cm2〜100mJ/cm2的範 圍，更佳爲ImJ/cm2〜50mJ/cm2的範圍。曝光量若在此範 圍，則在圖案形成的生產性之點較佳。 又，本發明所用的雷射，從在所欲的位置容易形成圖 案之觀點來看，較佳爲間歇振盪。間歇振盪的脈衝雷射之 ® 振盪頻率較佳爲 20〜2000Hz，更佳爲 30〜1000Hz。若以 此範圍的頻率進行振盪，則可期待高的生產性。 作爲本發明所可使用的曝光裝置，並沒有特別的限制 ，作爲市售者，可以使用Callisto(V科技股份有限公司（V Technology Co.，Ltd.)製）或AEGIS(V科技股份有限公司製） 或 DF2200G(大日本斯古林股份有限公司（DAINIPPON SCREEN MFG Co.，Ltd·)製）等。又，上述以外的裝置亦適 用。 ® 紫外光雷射係平行度良好，曝光時不使用光罩，故可 能圖案曝光，但是圖案形狀係受到輸出光的形狀、輸廓之 影響。因此，較佳使爲用光罩將圖案曝光，因爲圖案的直 線性變高。 紫外光雷射的特徵之一爲照度高，但曝光步驟所產生 熱會使著色畫素發生硬化不均。爲了控制設有著色畫素的 被曝光物之溫度，較佳爲將曝光台保持恒溫，而且亦必須 考曝光台的形狀。又，爲了提高光的平行度，亦較佳爲與 -97- 201009498 基材的距離之影響小，邊以空氣浮動搬送邊進行曝光。 本發明的紫外光雷射曝光用樹脂組成物及圖案形成方 法係適合於液晶顯示裝置用彩色濾光片。以下說明本發明 的紫外光雷射曝光用樹脂組成物及圖案形成方法，當作液 晶顯示裝置用彩色濾光片的製造方法中之著色圖案的形成 用組成物及形成方法，但本發明不受此方法所限定。 液晶顯示裝置用彩色濾光片的製造方法 本發明的彩色濾光片係可藉由在光透過性基板上使用 感光性樹脂組成物形成著色圖案而製造，但視需要亦可更 H 設置其它步驟。 圖案形成步驟 於本發明中，著色圖案係可藉由在光透過性基板上， 使用感光性樹脂組成物形成感光性樹脂組成物層（感光性樹 脂組成物層形成步驟），藉由紫外光雷射將前述感光性樹脂 組成物層曝光成圖案狀（曝光步驟），將曝光後的前述感光 性樹脂組成物層顯像而去除未硬化區域（顯像步驟），按照 所欲，對顯像後的前述感光性樹脂組成物層進行烘烤（烘烤 © 步驟）而形成。圖案形成步驟，除了上述各步驟，亦可視需 要更設置預烘烤步驟等的其它步驟。 感光性樹脂組成物層形成步驟 作爲前述光透過性基板（以下亦僅稱爲「基板」）’例如 可舉出液晶顯示裝置等中所用的無鹼玻璃、鈉玻璃、派瑞 克司（PYREX)(註冊商標）玻璃、石英玻璃及於此等上附著 有透明導電膜者，或固體攝像元件等中所用的光電轉換元 -98- 201009498 件基板。再者，塑膠基板係亦可能》此等基板可形成方格 狀等的黑色矩陣，在方格空出的部分上形成著色圖案。 又，於此等基板上，視需要爲了改良與上部層的密著 性，防止物質的擴散或使基板表面平坦化，亦可設置底塗 層。從更達成本發明的效果之點來看，基板較佳爲大型（大 致1邊1 m以上）者。 作爲在基板上形成感光性樹脂組成物層的方法，可採 用狹縫塗佈、噴墨法、旋轉塗佈、流延塗佈、輥塗佈、網 β 版印刷法等各種塗佈之賦予方法。其中從精度及速度的観 點來看，較佳爲狹縫塗佈。 又，預先在臨時支持體上藉由上述賦予方法來賦予而 形成的塗膜，亦可採用在基板上轉印的方法。 關於轉印方法，特開2006-23 696號公報的段落編號 [0023]、 [0036]〜[0051]、或特開 2006-47592 號公報的段 落編號[0096]〜[0108]中記載的製作方法亦可適用於本發 明。 ® 感光性樹脂組成物層的層厚（例如塗佈厚），爲了得到充 分的色再現區域且得到充分的面板亮度，較佳爲以乾燥後 的膜厚成爲〇.5#m〜3.0/zm的方式來形成，更佳爲 m 〜2.5 /z m。 曝光步驟 於本發明的圖案形成方法中，在曝光步驟使用紫外光 雷射當作光源將前述感光性樹脂組成物層曝光。此情況下 ，可通過光罩進行圖案曝光，也可集中曝光之光的焦點進 -99- 201009498 行圖案狀曝光。從圖案形狀的觀點來看，較佳爲使用光罩 進行曝光。較佳的曝光量係如前述。 顯像步驟 於顯像步驟中，將曝光後的前述感光性樹脂組成物層 顯像。曝光區域係硬化成圖案狀，於顯像處理中，可藉由 進行鹼顯像處理，使上述曝光步驟的未照射部分（未硬化部 分）在鹼水溶液中溶出而去除，僅殘留光硬化的部分，而形 成圖案。 作爲顯像液，使用有機鹼顯像液或無機鹼顯像液或其 II 混合液。 作爲顯像液所用的鹼劑，例如可舉出氫氧化鈉、氫氧 化鉀、碳酸鈉、碳酸氫鈉、矽酸鈉、偏矽酸鈉、氨水、乙 胺、二乙胺、二甲基乙醇胺、氫氧化四甲銨、氫氧化四乙 銨、膽鹼（choline)、吡咯、哌啶、1，8-二氮雜雙環-[5.4.0]· 7-十一烯等的有機鹼性化合物，較佳爲使用此等鹸劑經純 水稀釋而濃度成爲0.001〜10質量％、較佳0.01〜1質量％ 的鹼性水溶液當作顯像液。再者，於使用由如此的鹼性水 © 溶液所成的顯像液時，·一般在顯像後以純水來洗淨（沖洗） 〇 顯像溫度較佳爲20°C〜35°C，更佳爲23°C〜30°C。顯 像時間較佳爲10秒〜100秒，更佳爲20秒〜80秒。 又，噴淋壓力較佳爲 O.OIMPa〜0.5MPa，更佳爲 0_05MPa〜0.3MPa，特佳爲0 · 1 Μ P a〜〇 . 3 Μ P a。藉由選擇此 等條件’可將圖案的形狀形成矩形或順錐形或任意地設計 -100- 201009498 烘烤步驟 於烘烤步驟中，爲了使感光性樹脂組成物的硬化成爲 完全’對顯像後的前述感光性樹脂組成物層進行烘烤。烘 烤的方法係可使用加熱板（hot plate)或對流烘箱 (convection oven :熱風循環式乾燥機）、高頻加熱機等的 加熱手段’以連續式或分批式，對顯像•沖洗後的具有感 光性樹脂組成物圖案層之基板進行加熱。 β 作爲烘烤的條件，溫度較佳爲150°C〜26(TC，更佳爲 180°C〜26 0 °C，最佳爲 200 °C〜240°C。烘烤時間較佳爲 10分鐘〜150分鐘，更佳爲20分鐘〜120分鐘，最佳爲 30分鐘〜90分鐘。 再者，當形成RGB 3色相的著色圖案時，可僅以所欲 的色相數重複感光性樹脂組成物層的形成、曝光、顯像及 烘烤之循環，也可對每一色相進行感光性樹脂組成物層的 形成、曝光及顯像後，最後彙總全部色相部分進行烘烤。 ® 藉此，製作具有由所欲色相所成的著色畫素之彩色濾光片 〇 其它步驟 在曝光步驟之前，爲了使由塗佈等所形成的感光性樹 脂組成物層乾燥，亦可設置預烘烤步驟。 感光性樹脂組成物層的預烘烤溫度較佳爲60°C〜140°C ，更佳爲80°C〜120°C。預烘烤時間較佳爲30秒〜300秒 ，更佳爲8 0秒〜2 0 0秒。 -101- 201009498 液晶顯示裝置 液晶顯示裝置用彩色濾光片係適合於製作液晶顯示裝 置，使用以本發明的圖案形成方法所製作的彩色濾光片之 液晶顯示裝置，係可顯示高品位的圖像。 顯示裝置的定義或各顯示裝置的說明例如在「電子顯 示器裝置（佐佐木昭夫著，（股）工業調査會（Kogyo Chosakai Publishing，Inc.) 1 990年發行）」、「顯示裝置（伊吹順章著， 產業圖書（股KSangyo Tosho)平成元年發行）」等中有記載 。又，關於液晶顯示裝置，例如在「下一世代液晶顯示器 技術（內田龍男編集，（股）工業調査會1 994年發行）」中有 記載。本發明所可適用的液晶顯示裝置係沒有特別的限制 ，例如可適用於上述「下一世代液晶顯示器技術」中記載 的各式各樣方式的液晶顯示裝置。 液晶顯示裝置用彩色濾光片係特別有效於對於彩色 TFT方式（薄膜電晶體）的液晶顯示裝置。關於彩色TFT方 式的液晶顯示裝置，例如在「彩色TFT液晶顯示器（共立 出版（股）（Kyoritsu shuppan Co.，Ltd.)1996 年發行）」中有 記載。再者，本發明也可適用於IPS (面內切換）等的橫電 場驅動方式、MVA(多域垂直配向）等的畫素分割方式等之 視野角經擴大的液晶顯示裝置，或STN(超扭曲向列）、TN( 扭曲向列）、VA(垂直配向）、〇CS(On Chip Spacer)、FFS( 邊緣電場切換）及R-0CB(反射光學補償彎曲）等。關於此等 方式，例如在「el、PDP、LCD顯示器-技術與市場的最新 動向-(東麗硏究中心調査（T〇ray Research Center Inc·)硏究 201009498 部門200 1年發行）」的第43頁中有記載。 液晶顯示裝置，除了由彩色濾光片，亦由電極基板、 偏光薄膜、相位差薄膜、背光（backlight)、間隔物（spacer) 、視野角補償薄膜等各式各樣的構件所構成。本發明的液 晶顯示裝置用彩色濾光片係可適用於由此等眾所周知的構 件所構成的液晶顯示裝置。 關於此等構件，例如在^ ’94液晶顯示器周邊材料•化 學品的市場（島健太郎（股）CMC 1994年發行）」、「2003液 β 晶關聯市場的現狀與將來展望（下卷）（表良吉，（股）富士 Chimera總硏，2003等發行）」中有記載。 關於背光，在 SID meeting Digest 1 3 8 0 (2005)(A . Konno等人）或月刊顯示器2005年12月號的第18〜24頁（ 島康裕）、同第25〜30頁（八木隆明）等中有記載。 使用本發明的圖案形成方法所製作的彩色濾光片於液 晶顯示裝置，當與習知的冷陰極管之三波長管組合時，可 實現高對比，而且藉由以紅、綠、藍的LED光源（RGB-® LED)當作背光，可提供亮度高且色純度高的色再現性良好 之液晶顯示裝置。 【實施例】 以下藉由實施例來更具體說明第一實施形態，惟本發 明只要不超越其主旨，則不受以下的實施例所限定。再者 ，只要沒有預先指明，則「份」係以質量爲基準。 下述顯示實施例及比較例所用的化合物（化合物1〜15) 之詳細。 -103- 201009498 化合物 化合物 1 構造 化合物 2 化合物 3 化合物 4 (χχ^? 化合物 化合物 6 〇Ol^P 0 I 化合物 7 化合物 8 〇4〇 化合物 構造 化合物 9 CI3C | /)~C~^~n(ch2C〇2C2Hs)2 丨 CI3C Br 化合物 10 Ν^ΝϋγΝ &lt;^bua 化合物 11 Ά」 化合物 12 〇6^Β 化合物 13 Ρ CX，sh 化合物 14 Ο 化合物 15 V-SH HS 0 〇f η5 合成例1 :上述通式（I)所示的光聚合引發劑之化合物2的 合成 首先，藉由下述方案來合成化合物D。 -104- 201009498 將乙基咔唑（lOO.Og，〇.512mol)溶解在260ml的氯苯中 ，冷卻到〇°C後，添加氯化鋁（70.3g，0_527mol)。接著，費 40分鐘滴下鄰甲苯基氯（81.5g，0·527ιηο1)，升溫到室溫， 攪拌3小時。接著，冷卻到0°C後，添加氯化鋁（75.1 g， 0.563mol)。費 40 分鐘滴下 4-氯丁醯氯（79_4g, 0.5 63mol) ，升溫到室溫，攪拌3小時。將156ml的35質量％鹽酸水 溶液與392ml的蒸餾水之混合溶液冷卻到〇°C，滴下反應 溶液。抽吸過濾所析出的固體後，以蒸餾水及甲醇來洗淨 〇 ，用乙腈再結晶後’得到下述構造的化合物D(產量164.4g， 收率7 7 %)。In the above formula (I), R and X each independently represent a monovalent substituent, and A and Y each independently represent a divalent organic group, and Ar represents an aryl group. n is an integer from 〇 to 5. When X is present in a plural number, the plural Xs each independently represent a monovalent substituent. © Exposure Step In the exposure mode of the present invention, an ultraviolet laser is used as a light source. The first letter of the Light Amplification by Stimulated Emission of Radiation. Exciting medium using a phenomenon of stimulated emission occurring in a substance having population inversion, a monochromatic light oscillator and an amplitude enhancer which are more dry and directional by light wave amplification and oscillation There are crystals, glasses, liquids, pigments, gases, etc., which can be used for such solid-state lasers, liquid helium lasers, gas lasers, semiconductor lasers, etc., which are well-known lasers having an oscillating wavelength in ultraviolet light. Among them, solid lasers and gas lasers are preferred from the viewpoint of the output of the laser and the oscillation wavelength. As the wavelength usable in the present invention, an ultraviolet laser having a wavelength in the range of 300 nm to 380 nm is preferable, and an ultraviolet laser having a wavelength in the range of 300 nm to 3 60 nm is more preferable, which is compatible with the photoresist. It is preferred to look at the wavelength of the light. -96- 201009498 Specifically, it is preferable to use a third high harmonic (35 5 nm) of a Nd:YAG laser or a XeCl (excimer laser) of a solid laser which is large in output and relatively inexpensive. 308 nm), XeF (3 5 3 nm). The exposure amount of the exposed object (pattern) is in the range of ImJ/cm2 to 100 mJ/cm2, and more preferably in the range of ImJ/cm2 to 50 mJ/cm2. If the amount of exposure is in this range, it is preferable at the point of productivity of pattern formation. Further, the laser used in the present invention is preferably intermittently oscillated from the viewpoint of easily forming a pattern at a desired position. The intermittently oscillating pulsed laser oscillating frequency is preferably 20 to 2000 Hz, more preferably 30 to 1000 Hz. When the oscillation is performed at a frequency within this range, high productivity can be expected. The exposure apparatus which can be used in the present invention is not particularly limited, and as a commercially available person, Callisto (V Technology Co., Ltd.) or AEGIS (V Technology Co., Ltd.) can be used. Or DF2200G (manufactured by DAINIPPON SCREEN MFG Co., Ltd.) or the like. Further, devices other than the above are also applicable. ® UV lasers have good parallelism and do not use a mask when exposed, so pattern exposure is possible, but the shape of the pattern is affected by the shape and shape of the output light. Therefore, it is preferable to expose the pattern with a photomask because the linearity of the pattern becomes high. One of the characteristics of the ultraviolet laser is that the illuminance is high, but the heat generated by the exposure step causes the colored pixels to harden unevenly. In order to control the temperature of the exposed object provided with the colored pixels, it is preferable to keep the exposure stage at a constant temperature, and it is also necessary to examine the shape of the exposure stage. Further, in order to increase the parallelism of the light, it is also preferable to carry out the exposure while floating with air by a small influence on the distance from the substrate of -97 to 201009498. The resin composition for ultraviolet laser exposure of the present invention and the pattern forming method are suitable for a color filter for a liquid crystal display device. In the following, the resin composition for ultraviolet laser exposure and the pattern forming method of the present invention are described as a composition for forming a colored pattern in a method for producing a color filter for a liquid crystal display device, and a method for forming the same, but the present invention is not This method is defined. Color filter for liquid crystal display device The color filter of the present invention can be produced by forming a colored pattern on a light-transmitting substrate using a photosensitive resin composition, but other steps can be set as needed. . In the present invention, the colored pattern can be formed by forming a photosensitive resin composition layer on the light-transmitting substrate using a photosensitive resin composition (photosensitive resin composition layer forming step), by ultraviolet light ray Exposing the photosensitive resin composition layer to a pattern (exposure step), and developing the exposed photosensitive resin composition layer to remove an uncured region (development step), and after performing the image as desired The photosensitive resin composition layer is formed by baking (baking © step). In the pattern forming step, in addition to the above steps, other steps such as a pre-baking step may be further required. The photosensitive resin composition layer forming step is, for example, an alkali-free glass, soda glass, or Pyrex (PYREX) used in a liquid crystal display device or the like as the light-transmitting substrate (hereinafter also referred to simply as "substrate"). Registered trademark) Glass, quartz glass, and a photoelectric conversion element-98-201009498 substrate used in a transparent conductive film or a solid-state imaging device. Further, it is also possible for the plastic substrate to form a black matrix having a square shape or the like, and a colored pattern is formed on the portion where the square is vacant. Further, on such a substrate, an undercoat layer may be provided in order to improve the adhesion to the upper layer, prevent the diffusion of the substance, or flatten the surface of the substrate as needed. From the viewpoint of achieving the effects of the present invention, the substrate is preferably large (approximately one side and more than 1 m). As a method of forming a photosensitive resin composition layer on a substrate, various coating methods such as slit coating, inkjet method, spin coating, cast coating, roll coating, and net beta printing can be employed. . Among them, from the viewpoint of accuracy and speed, slit coating is preferred. Further, the coating film formed by the above-described application method on the temporary support may be a method of transferring onto the substrate. Regarding the transfer method, the production described in Paragraph No. [0023], [0036] to [0051], or Paragraph No. [0096] to [0108] of JP-A-2006-47592 The method is also applicable to the present invention. ® Thickness (for example, coating thickness) of the photosensitive resin composition layer, in order to obtain a sufficient color reproduction region and to obtain sufficient panel brightness, it is preferable that the film thickness after drying is 〇.5#m~3.0/zm The way to form, better for m ~ 2.5 / zm. Exposure Step In the pattern forming method of the present invention, the photosensitive resin composition layer is exposed in the exposure step using an ultraviolet laser as a light source. In this case, the pattern exposure can be performed through the reticle, or the focus of the concentrated exposure light can be patterned in the -99-201009498 line. From the viewpoint of the pattern shape, it is preferred to use a photomask for exposure. The preferred amount of exposure is as described above. Developing step In the developing step, the exposed photosensitive resin composition layer is developed. The exposure region is cured into a pattern, and in the development process, the unexposed portion (unhardened portion) of the exposure step is removed by elution in an aqueous alkali solution by alkali development treatment, and only the portion where the light is cured remains. And form a pattern. As the developing liquid, an organic alkali developing solution or an inorganic alkali developing solution or a mixed solution thereof is used. Examples of the alkaline agent used as the developing solution include sodium hydroxide, potassium hydroxide, sodium carbonate, sodium hydrogencarbonate, sodium citrate, sodium metasilicate, aqueous ammonia, ethylamine, diethylamine, and dimethylethanolamine. Organic basic compound such as tetramethylammonium hydroxide, tetraethylammonium hydroxide, choline, pyrrole, piperidine, 1,8-diazabicyclo-[5.4.0]·7-undecene Preferably, an alkaline aqueous solution having a concentration of 0.001 to 10% by mass, preferably 0.01 to 1% by mass, diluted with pure water is used as a developing solution. Further, when a developing solution made of such an alkaline water solution is used, it is usually washed with pure water (flushing) after development, and the developing temperature is preferably 20 ° C to 35 ° C. More preferably, it is 23 ° C ~ 30 ° C. The imaging time is preferably from 10 seconds to 100 seconds, more preferably from 20 seconds to 80 seconds. Further, the spray pressure is preferably O.OIMPa to 0.5 MPa, more preferably 0_05 MPa to 0.3 MPa, particularly preferably 0·1 Μ P a~〇. 3 Μ P a. By selecting these conditions, the shape of the pattern can be formed into a rectangular shape or a tapered shape or arbitrarily designed. -100 - 201009498 Baking step in the baking step, in order to make the hardening of the photosensitive resin composition into a complete 'opposite image The subsequent photosensitive resin composition layer is baked. The baking method can be performed by using a heating plate (hot plate) or a convection oven (convection oven), a high-frequency heating device, or the like, in a continuous or batch manner, after the image is developed and rinsed. The substrate having the photosensitive resin composition pattern layer is heated. As the baking condition, the temperature is preferably from 150 ° C to 26 (TC, more preferably from 180 ° C to 260 ° C, most preferably from 200 ° C to 240 ° C. The baking time is preferably 10 minutes. 〜150 minutes, more preferably 20 minutes to 120 minutes, and most preferably 30 minutes to 90 minutes. Further, when the RGB 3 color gradation pattern is formed, the photosensitive resin composition layer can be repeated only with the desired number of hues. The formation, exposure, development, and baking cycle can also be performed by forming, exposing, and developing the photosensitive resin composition layer for each hue, and finally collecting all the hue portions for baking. The color filter of the colored pixel formed by the desired hue 〇 other steps Before the exposure step, in order to dry the photosensitive resin composition layer formed by coating or the like, a prebaking step may be provided. The prebaking temperature of the resin composition layer is preferably from 60 ° C to 140 ° C, more preferably from 80 ° C to 120 ° C. The prebaking time is preferably from 30 seconds to 300 seconds, more preferably 80 seconds. ~200 seconds. -101- 201009498 Liquid crystal display device color filter for liquid crystal display device is suitable for system A liquid crystal display device using a color filter produced by the pattern forming method of the present invention can display a high-quality image. The definition of the display device or the description of each display device is, for example, "electronic display device" In the first year of the "Korean Chosakai Publishing, Inc." (the release of the "Korean Chosakai Publishing, Inc."), and the "display device (Isumi Shoji, the industrial book (the KSangyo Tosho) issued in the first year of the year)" Further, the liquid crystal display device is described in, for example, "Next Generation Liquid Crystal Display Technology (issued by Uchida Natsuo, Ltd., issued by the Industrial Research Association, 1994)". There is no particular limitation, and for example, it can be applied to various types of liquid crystal display devices described in the "Next Generation Liquid Crystal Display Technology". The color filter for liquid crystal display devices is particularly effective for the color TFT method (thin film type). Liquid crystal display device of a crystal. For a color TFT liquid crystal display device, for example, "color TFT liquid crystal display In addition, the present invention is also applicable to a horizontal electric field driving method such as IPS (In-Plane Switching), MVA (indicated by Kyoritsu shuppan Co., Ltd.). Liquid crystal display device with enlarged viewing angle, such as multi-domain vertical alignment), or STN (Super Twisted Nematic), TN (Twisted Nematic), VA (Vertical Alignment), 〇CS (On Chip Spacer) ), FFS (edge electric field switching) and R-0CB (reflective optical compensation bending), etc. For these methods, for example, "el, PDP, LCD display - technology and market trends - (Dongli Research Center Survey ( T〇ray Research Center Inc.) is published on page 43 of 201009498 Department 200 1 Year Issue). The liquid crystal display device is composed of a wide variety of members such as an electrode substrate, a polarizing film, a retardation film, a backlight, a spacer, and a viewing angle compensation film, in addition to the color filter. The color filter for a liquid crystal display device of the present invention can be applied to a liquid crystal display device comprising such a well-known member. For such components, for example, in the market of chemicals and chemicals in the '94 liquid crystal display (issued by Kentaro K.C., CMC, 1994), "The current status and future prospects of the 2003 liquid crystal-related market (volume) (Table) "Good luck, (share) Fuji Chimera, 2003, 2003, etc.)" is documented. For the backlight, in SID meeting Digest 1 3 8 0 (2005) (A. Konno et al.) or monthly publication December 2005, pages 18 to 24 (Island Kang Yu), same as pages 25 to 30 (Yamamu Longming) It is recorded in etc. The color filter produced by the pattern forming method of the present invention can realize high contrast when combined with a conventional three-wavelength tube of a cold cathode tube, and is made of red, green, and blue LEDs. The light source (RGB-® LED) is used as a backlight to provide a liquid crystal display device with high brightness and high color purity. [Examples] The first embodiment will be described in more detail below by way of examples, but the present invention is not limited by the following examples. Furthermore, as long as it is not specified in advance, the "parts" are based on quality. The details of the compounds (compounds 1 to 15) used in the examples and comparative examples are shown below. -103- 201009498 Compound Compound 1 Structural Compound 2 Compound 3 Compound 4 (χχ^? Compound Compound 6 〇Ol^P 0 I Compound 7 Compound 8 〇4〇 Compound Structure Compound 9 CI3C | /)~C~^~n(ch2C 〇2C2Hs)2 丨CI3C Br Compound 10 Ν^ΝϋγΝ &lt;^bua Compound 11 Ά" Compound 12 〇6^Β Compound 13 Ρ CX,sh Compound 14 Ο Compound 15 V-SH HS 0 〇f η5 Synthesis Example 1: The above Synthesis of Compound 2 of Photopolymerization Initiator of Formula (I) First, Compound D was synthesized by the following scheme. -104-201009498 Ethyl carbazole (100.Og, 512. 512 mol) was dissolved in 260 ml of chlorobenzene, and after cooling to 〇 ° C, aluminum chloride (70.3 g, 0-527 mol) was added. Next, o-tolyl chloride (81.5 g, 0·527 ιηο1) was added dropwise over 40 minutes, and the mixture was warmed to room temperature and stirred for 3 hours. Then, after cooling to 0 ° C, aluminum chloride (75.1 g, 0.563 mol) was added. 4-Chlorobutyryl chloride (79_4 g, 0.5 63 mol) was added dropwise over 40 minutes, warmed to room temperature, and stirred for 3 hours. A mixed solution of 156 ml of a 35 mass% aqueous hydrochloric acid solution and 392 ml of distilled water was cooled to 〇 ° C, and the reaction solution was dropped. The precipitated solid was suction filtered, and then washed with distilled water and methanol, and then recrystallized from acetonitrile to give Compound D (yield: 164.4 g, yield: 77%).

其次’使用化合物D藉由下述方案來合成化合物E。 將化合物D(20.0g，47.9mmol)溶解在64ml的THF(四氫 呋喃）中，添加4-氯苯硫醇（7.27g，50.2mmol)及碘化鈉 (0.7g，4.79mmol)。接著，將氫氧化鈉（2.〇g，50.2mmol)加 到反應液中，回流2小時。然後，冷卻到〇 〇C後，費2 0分 -105- 201009498 鐘滴下甲醇鈉28%甲醇溶液（日本觸媒（股）製：SM-28(11.lg，57.4mm〇l)，升溫到室溫，攪拌2小時。接著， 冷卻到〇°C後’費20分鐘滴下亞硝酸異戊酯（6.73g， 57.4mmol)，升溫到室溫，攪拌3小時。在120ml的丙酮 中稀釋反應液’滴下到經冷卻到〇°C的〇·1Ν鹽酸水溶液中 。抽吸過濾所析出的固體後’以蒸餾水洗淨。然後，用乙 腈再結晶化，得到下述構造的化合物E(產量17.〇g，收率 6 4%) 〇Next, Compound E was synthesized by using the compound D by the following scheme. Compound D (20.0 g, 47.9 mmol) was dissolved in 64 ml of THF (tetrahydrofuran), and 4-chlorobenzenethiol (7.27 g, 50.2 mmol) and sodium iodide (0.7 g, 4.79 mmol) were added. Next, sodium hydroxide (2. g, 50.2 mmol) was added to the reaction mixture, followed by reflux for 2 hours. Then, after cooling to 〇〇C, the solvent is 20-105-201009498, and sodium methoxide 28% methanol solution (made by Nippon Shokubai Co., Ltd.: SM-28 (11.lg, 57.4 mm〇l)) is heated. After stirring at room temperature for 2 hours, then, after cooling to 〇 ° C, 'isoamyl nitrite (6.73 g, 57.4 mmol) was added dropwise for 20 minutes, warmed to room temperature, and stirred for 3 hours. The reaction solution was diluted in 120 ml of acetone. 'Dropped into a 〇·1Ν aqueous hydrochloric acid solution cooled to 〇 ° C. The solid precipitated was filtered off with suction and washed with distilled water. Then, it was recrystallized from acetonitrile to give the compound E of the following structure. 〇g, yield 6 4%) 〇

NalNal

接著，使用化合物E藉由下述方案來合成化合物2。 將化合物E(18.0g，32.4mmol)溶解在90ml的N-甲基吡 咯啶酮（NMP)中，添加三乙胺（Et3N)(3.94g，38.9mmol)。接 著，冷卻到0°C後，費20分鐘滴下乙醯氯（AcC1)(3.05g， 3 8.9mm〇l)後，升溫到室溫，攪拌2小時。將反應液滴下到 -106- .201009498 經冷卻到0°C的150ml之蒸餾水中，抽吸過濾所析出的固 體後，以經冷卻到〇°C的200ml之異丙醇來洗淨，乾燥後 得到下述構造的化合物2(產量19.5g，收率99%)。Next, Compound 2 was synthesized using Compound E by the following scheme. Compound E (18.0 g, 32.4 mmol) was dissolved in 90 ml of N-methylpyrrolidone (NMP), and triethylamine (Et3N) (3.94 g, 38.9 mmol) was added. Then, after cooling to 0 ° C, ethyl acetate (AcC1) (3.05 g, 3 8.9 mm 〇l) was added dropwise over 20 minutes, and the mixture was warmed to room temperature and stirred for 2 hours. The reaction was dropped to -106-.201009498 in 150 ml of distilled water cooled to 0 ° C, and the precipitated solid was suction filtered, and then washed with 200 ml of isopropyl alcohol cooled to 〇 ° C, and dried. Compound 2 having the following structure (yield 19.5 g, yield 99%) was obtained.

以NMR來鑑定所得到的化合物2之構造。 (!H-NMR 400MHz CDC13) : 8.86(s, 1H), 8.60(s, 1H), 8.3 l(d, 1H, J = 8.0Hz), 8.8 l(d, 1H, J = 8.0Hz), 7.5 1- 7.24(m,. 1 OH), 7.36(q, 2H, J = 7.4Hz), 3.24-3.13(m, 4H), 2.36(s, 3H), 2.2 1 (s, 3H), 1.50(t, 3H, J = 7.4Hz) 合成例2 :上述通式（I)所示的光聚合引發劑之化合物3的 合成 首先，進行與合成例1同樣的操作，合成化合物D。 將所得到的化合物D(86.5g，209mmol)溶解在277ml的 THF中，添加 6-二甲基苯硫醇（30g，217mmol)及碘化鈉 (3.0g，20.0mmol)，在40°C攪拌。接著，將氫氧化鈉（8.66g， 2 16mm〇l)加到反應液中，在4(TC回流2小時。然後，冷卻 到〇°C後，費20分鐘滴下甲醇鈉28%甲醇溶液（日本觸媒（ 股）製：SM-2 8(48g，24 9mmol)，升溫到室溫，攪拌2小時 -107- 201009498 。冷卻到〇°C後，費20分鐘滴下亞硝酸異戊醋（29 3 g, 25 0mmol)，升温到室溫，攪拌3小時。以i05ml的丙酮來 稀釋反應液，用經冷卻到0 °C的0.1 N鹽酸水溶液來洗淨。 使用醋酸乙酯來萃取有機相後，添加甲醇，抽吸過濾所析 出的固體。接著，用乙腈再結晶化，得到下述構造的化合 物F(產量76.6g，收率67%)。The structure of the obtained Compound 2 was identified by NMR. (!H-NMR 400MHz CDC13): 8.86(s, 1H), 8.60(s, 1H), 8.3 l(d, 1H, J = 8.0Hz), 8.8 l(d, 1H, J = 8.0Hz), 7.5 1- 7.24(m,. 1 OH), 7.36(q, 2H, J = 7.4Hz), 3.24-3.13(m, 4H), 2.36(s, 3H), 2.2 1 (s, 3H), 1.50(t 3H, J = 7.4 Hz) Synthesis Example 2: Synthesis of Compound 3 of Photopolymerization Initiator represented by the above formula (I) First, Compound D was synthesized in the same manner as in Synthesis Example 1. The obtained Compound D (86.5 g, 209 mmol) was dissolved in 277 ml of THF, and 6-dimethylbenzenethiol (30 g, 217 mmol) and sodium iodide (3.0 g, 20.0 mmol) were added, and stirred at 40 ° C. . Next, sodium hydroxide (8.66 g, 2 16 mm 〇l) was added to the reaction solution, and refluxed at 4 (TC for 2 hours. Then, after cooling to 〇 ° C, sodium methoxide 28% methanol solution was dropped for 20 minutes (Japan) Catalyst (stock): SM-2 8 (48g, 24 9mmol), warmed to room temperature, stirred for 2 hours -107-201009498. After cooling to 〇 °C, it took 20 minutes to drip isopropyl nitrite (29 3 g, 25 0 mmol), warmed to room temperature and stirred for 3 hours. The reaction solution was diluted with i05 ml of acetone and washed with 0.1 N aqueous hydrochloric acid cooled to 0 ° C. After extracting the organic phase with ethyl acetate, Methanol was added, and the precipitated solid was filtered under suction, and then recrystallized from acetonitrile to obtain Compound F (yield: 76.6 g, yield: 67%).

接著，使用化合物F藉由下述方案來合成化合物3。 將化合物F(46. 4, 85mmol)溶解在230ml的醋酸乙酯中 ，添加三乙胺（10.3，lOlmmol)。接著，冷卻到01後，費 20分鐘滴下乙醯氯（8.0g, 102mmol)後，升溫到室溫，攪拌 1小時。以經冷卻到0°C的1 〇〇〇ml之蒸餾水來洗淨反應液 ，使用醋酸乙酯進行萃取。減壓濃縮後，滴下到100ml的 蒸餾水中，抽吸過濾所析出的固體後，以經冷卻到〇 °C的 150ml之異丙醇來洗淨，乾燥後得到下述構造的化合物3( 產量49.7g，收率99%)。Next, Compound 3 was synthesized using Compound F by the following scheme. Compound F (46. 4, 85 mmol) was dissolved in 230 ml of ethyl acetate and triethylamine (10.3, 10 mmol) was added. Then, after cooling to 01, ethyl chloroform (8.0 g, 102 mmol) was added dropwise over 20 minutes, and the mixture was heated to room temperature and stirred for 1 hour. The reaction solution was washed with 1 ml of distilled water cooled to 0 ° C, and extracted with ethyl acetate. After concentration under reduced pressure, the mixture was dropped into 100 ml of distilled water, and the precipitated solid was filtered off with suction, and then washed with 150 ml of isopropyl alcohol cooled to 〇 ° C, and dried to give compound 3 of the following structure (yield 49.7) g, yield 99%).

-108 - 201009498 (*H-NMR 4〇〇MHz CDC13) : 8.84(s， 1H), 8.57(s, 1H), 8.31(d, 1H, J=B.0Hz), 8.08(d, 1H, J = 8.0Hz), 7.4 4 6 - 7.24 (m, 4H)，7.48(q，2H，7.4Hz)，7.09(d，3H)，3.10-2.90(m，4H), 2.50(s, 6H), 2.35(s, 3H), 2.17(s, 3H), 1.48(t, 3H, 7.4Hz) 本發明的其它肟衍生物亦可藉由同樣的方法來合成。 茲詳細顯示實施例及比較例所用的在側鏈具有雜環的 高分子化合物。 在側鏈具有雜環的高分子化合物之合成 〇 合成例3:聚合物1的合成 將27.0份的單體1(下述構造）、126.0份的甲基丙烯酸 甲酯、27.0份的甲基丙烯酸及42 0.0份的1-甲氧基-2-丙醇 導入經氮氣置換的三口燒瓶中，以攪拌機（新東科學（股 )(Shinto S c i e n t i f i c C 0 .， L t d ·):三一馬達（Three-One Motor))來攪拌，邊使氮氣流到燒瓶內邊加熱而升溫到90 t爲止。於其中加入1.69份的2，2-偶氮雙（2，4-二甲基戊腈 )(和光純藥（股）（Wako Pure Chemical Industries Ltd·)製 V-W 65)，在90°C進行2小時的加熱攪拌。2小時後，再添加 1.69份的V-65，加熱攪拌3小時後，得到聚合物1的30 質量％溶液。藉由以聚苯乙烯當作標準物質的凝膠滲透層 析法（Gel Permeation Chromatography ： GPC)來測定所得到 的聚合物1之重量平均分子量，結果爲2.0萬。又，每固 體成分的酸價爲98mgKOH/g。 合成例4:聚合物2的合成 將27.0份的單體2(下述構造）、126.0份的甲基丙烯酸 -109- 201009498 甲酯、甲基丙烯酸27.0份及420.0份的1-甲氧基-2_丙醇 導入經氮氣置換的三口燒瓶中’以攪拌機（新東科學（股）： 三一馬達）來攪拌，邊使氮氣流到燒瓶內邊加熱而升溫到 90 °C爲止。於其中加入1·8〇份的2,2-偶氮雙（2,4-二甲基戊 腈）（和光純藥（股）製V-65)，在90°C進行2小時的加熱攪拌 。2小時後，再添加1 .80份的V-65，加熱攪拌3小時後， 得到聚合物2的30質量％溶液。藉由以聚苯乙烯當作標準 物質的凝膠滲透層析法（GPC) ’測定所得到的聚合物2之 重量平均分子量，結果爲2.1萬。又，根據使用氫氧化鈉 的滴定，每固體成分的酸價爲99mgKOH/g。-108 - 201009498 (*H-NMR 4〇〇MHz CDC13) : 8.84(s, 1H), 8.57(s, 1H), 8.31(d, 1H, J=B.0Hz), 8.08(d, 1H, J = 8.0 Hz), 7.4 4 6 - 7.24 (m, 4H), 7.48 (q, 2H, 7.4 Hz), 7.09 (d, 3H), 3.10-2.90 (m, 4H), 2.50 (s, 6H), 2.35 (s, 3H), 2.17 (s, 3H), 1.48 (t, 3H, 7.4 Hz) Other anthracene derivatives of the present invention can also be synthesized by the same method. The polymer compound having a hetero ring in the side chain used in the examples and the comparative examples is shown in detail. Synthesis of a polymer compound having a heterocyclic ring in a side chain Synthesis Example 3: Synthesis of Polymer 1 27.0 parts of monomer 1 (structure described below), 126.0 parts of methyl methacrylate, and 27.0 parts of methacrylic acid were used. And 42 parts of 1-methoxy-2-propanol were introduced into a nitrogen-substituted three-necked flask with a stirrer (Shinto Scientific C 0 ., L td ·): Trinity Motor ( Three-One Motor)) While stirring, the nitrogen gas was heated inside the flask and heated to 90 t. 1.69 parts of 2,2-azobis(2,4-dimethylvaleronitrile) (WW 65 manufactured by Wako Pure Chemical Industries Ltd.) was added thereto, and it was carried out at 90 ° C. Heating and stirring for an hour. After 2 hours, 1.69 parts of V-65 was further added, and after heating and stirring for 3 hours, a 30 mass% solution of the polymer 1 was obtained. The weight average molecular weight of the obtained polymer 1 was measured by Gel Permeation Chromatography (GPC) using polystyrene as a standard material, and it was 20,000. Further, the acid value per solid component was 98 mgKOH/g. Synthesis Example 4: Synthesis of Polymer 2 27.0 parts of the monomer 2 (structure described below), 126.0 parts of methyl methacrylate-109-201009498, 27.0 parts of methacrylic acid, and 420.0 parts of 1-methoxy- 2_Propanol was introduced into a three-necked flask which was replaced with nitrogen, and the mixture was stirred with a stirrer (Xindong Science Co., Ltd.: Trinity Motor), and nitrogen gas was heated inside the flask to be heated to 90 °C. 1·8 〇 parts of 2,2-azobis(2,4-dimethylvaleronitrile) (V-65 manufactured by Wako Pure Chemical Industries Co., Ltd.) was added thereto, and heated and stirred at 90 ° C for 2 hours. . After 2 hours, another 1.80 parts of V-65 was added, and after heating and stirring for 3 hours, a 30 mass% solution of the polymer 2 was obtained. The weight average molecular weight of the obtained polymer 2 was measured by gel permeation chromatography (GPC) using polystyrene as a standard material, and was found to be 21,000. Further, the acid value per solid component was 99 mgKOH/g based on titration using sodium hydroxide.

Η Η 'C〇r^N 丫 Ν Ο 單體1 茲詳細顯示用於調製實施例及比較例所用的顏料分散 液1〜5之被覆顏料1〜6。 被覆顏料1的調製 將 50份的顏料（C.I.顏料紅 254汽巴特殊化學品製 CROMOPHTAL RED ΒΡ)、5 00份的氯化鈉、20份的上述聚 合物1之溶液及1〇〇份的二甘醇投入不銹鋼製1加侖捏合 機（井上製作所（Inoue Manufacturing Co·, Ltd.)製）中，混 煉9小時。接著，將此混合物投入約3升的水中，以高速 混合器攪拌約1小時後，過濾、水洗以去除氯化鈉及溶劑 •110- 201009498 ，乾燥而調製被覆顏料1。 被覆顏料2的調製 除了於被覆顏料1的調製中，代替顏料紅254，使用 C_I.顏料紅177(汽巴特殊化學品製CROMOPHTAL RED A2B)以外’與被覆顏料i之調製同樣地，調製被覆顏料2 被覆顏料3的調製 除了於被覆顔料1的調製中，代替顏料紅254，使用 n w C·1·顔料綠 36(日本 LUBRIZOL 公司製 Monastral Green 6Y-CL)，而且代替聚合物！，使用聚合物2以外，與被覆 顔料1之調製同樣地，調製被覆顏料3。 被覆顔料4的調製 除了於被覆顏料1的調製中，代替顏料紅254，使用 C.I·顏料藍15:6以外，與被覆顏料1之調製同樣地，調製 被覆顔料4。 被覆顔料5的調製 〇 除了於被覆顏料1的調製中，代替顏料紅254，使用黃 顔料E4GN-GT(拉克涉斯公司（LANXESS)製），而且代替聚 合物1，使用聚合物2以外，與被覆顔料1之調製同樣地 ’調製被覆顏料5。 被覆顔料6的調製 除了於被覆顔料1的調製中’代替顏料紅254，使用 C.1·顏料紫23以外’與被覆顏料i之調製同樣地，調製被 覆顔料6。 -111- 201009498 茲詳細顯示實施例及比較例所用的顏料分散液1〜7。 顏料分散液1的調整 於相對於35份的被覆顏料1之顏料相當分而言，14份 的 Disper BYK161(BYK-CHEMIE 公司製）當作分散劑，200 份的溶劑：丙二醇單甲基醚醋酸酯之組成，使用均化器以 回轉數3,000r_p_m.攪拌3小時而混合，調製混合溶液，再 者於用O.lmm0氧化鉻珠的珠分散機超巔峰硏磨機（ULTRA APEX MILL)(壽工業公司（Kotobuki Industries Co.，Ltd.)製） 中進行6小時分散處理。 顏料分散液2的調整 除了於顏料分散液1的調製中，代替被覆顏料1，使用 被覆顏料2以外，與顏料分散液i之調製同樣地，調製顏 料分散液2。 顏料分散液3的調整 除了於顏料分散液1的調製中，代替被覆顔料〗，使用 被覆顔料3以外’與顔料分散液1之調製同樣地，調製顔 料分散液3。 顏料分散液4的調整 除了於顏料分散液1的調製中，代替被覆顏料i，使用 被覆顔料5以外’與顏料分散液1之調製同樣地，調製顏 料分散液4。 _料分散液5的調整 除了於顏料分散液1的調製中，代替被覆顏料1，以被 壤顔料4/被覆顏料6=1〇〇/4〇的質量比之方式，其總量與 -112- .201009498 顔料分散液1之調製的被覆顔料丨相同量的方式，使用被 覆顔料4與被覆顏料6以外，與顔料分散液丨之調製同樣 地，調製顏料分散液5。 顔料分散液6的調整 以下顯示顏料分散液6所用的顔料之合成法及使用其 的分散液之調製法。 合成例5:鹵化鋅酞花青顏料的合成 以苯二甲腈、氯化鋅當作原料，製造鋅酞花青。 鹵化係在40 °C混合3.1份的硫醯氯、3.7份的無水氯化 鋁、0.46份的氯化鈉、1份的鋅酞花青，滴下2 2份的溴 而進行。在80°C反應15小時，然後，將反應混合物投入 水中’使析出部分溴化鋅酞花青粗顏料。過濾此水性漿體 ’以80°C的熱水進行洗淨，在90°C使乾燥，而得到2.6份 的經精製之部分溴化鋅酞花青粗顏料。 將1份的部分溴化鋅酞花青粗顏料、7份的粉碎氯化鈉 、1.6份的二甘醇、0.09份的二甲苯投入雙腕型捏合機中 ，在100 °C混煉6小時。混煉後，在80 °C的100份之水中 取出，攪拌1小時後，過濾、熱水洗、乾燥，而得到粉碎 的部分溴化鋅酞花青顏料》 所得到的部分溴化鋅酞花青顏料，根據質量分析的鹵 素含量分析，平均組成爲ZnPcBr1()Cl4H2(Pc:酞花青），1 分子中含有平均10個溴。 綠色顏料鹵化鋅酞花青的分散液之調製Η Η 'C〇r^N 丫 Ν 单体 Monomer 1 The coated pigments 1 to 6 for preparing the pigment dispersions 1 to 5 used in the examples and the comparative examples are shown in detail. Preparation of coated pigment 1 50 parts of pigment (CROMOPHTAL RED CI by CI Pigment Red 254 Ciba Specialty Chemicals), 500 parts of sodium chloride, 20 parts of the solution of the above polymer 1 and 1 part of the second Glycol was placed in a stainless steel one gallon kneader (manufactured by Inoue Manufacturing Co., Ltd.) and kneaded for 9 hours. Next, this mixture was poured into about 3 liters of water, stirred by a high speed mixer for about 1 hour, filtered, washed with water to remove sodium chloride and a solvent • 110 - 201009498, and dried to prepare a coated pigment 1. Preparation of the coated pigment 2 In addition to the pigment red 1, in place of the pigment red 254, the coating pigment is prepared in the same manner as in the preparation of the coating pigment i except that C_I. Pigment Red 177 (CROMOPHTAL RED A2B manufactured by Ciba Specialty Chemicals) is used. 2 Preparation of the coated pigment 3 In addition to the preparation of the pigmented pigment 1, instead of the pigment red 254, nw C·1·Pigment Green 36 (Monastral Green 6Y-CL manufactured by LUBRIZOL Co., Ltd.) was used, and the polymer was replaced. The coated pigment 3 was prepared in the same manner as in the preparation of the coated pigment 1 except for using the polymer 2. Preparation of the coated pigment 4 In addition to the pigment red 1, in place of the pigment red 254, the coated pigment 4 was prepared in the same manner as in the preparation of the coated pigment 1 except that C.I. Pigment Blue 15:6 was used. In the preparation of the coated pigment 5, in place of the pigment red 254, a yellow pigment E4GN-GT (manufactured by LANXESS) is used instead of the polymer 1, and the polymer 2 is used instead of the polymer 2. The preparation of the coated pigment 1 similarly 'modulates the coated pigment 5'. Preparation of the coated pigment 6 In addition to the preparation of the coated pigment 1, 'in addition to the pigment red 254, the same as the preparation of the coated pigment i, the coating pigment 6 was prepared in the same manner as in the case of the coating pigment i. -111-201009498 The pigment dispersions 1 to 7 used in the examples and comparative examples are shown in detail. The pigment dispersion 1 was adjusted to a pigment equivalent of 35 parts of the coated pigment 1, 14 parts of Disper BYK161 (manufactured by BYK-CHEMIE Co., Ltd.) as a dispersant, and 200 parts of a solvent: propylene glycol monomethyl ether acetate The composition of the ester was mixed with a homogenizer at a number of revolutions of 3,000 r_p_m. for 3 hours to prepare a mixed solution, and further used in a bead disperser with a 0.1 mm0 chrome oxide bead (ULTRA APEX MILL). A dispersion treatment was carried out for 6 hours in an industrial company (Kotobuki Industries Co., Ltd.). Adjustment of the pigment dispersion liquid 2 In addition to the preparation of the pigment dispersion liquid 1, the pigment dispersion liquid 2 is prepared in the same manner as the preparation of the pigment dispersion liquid i, except that the coating pigment 2 is used instead of the coating pigment 1. Adjustment of the pigment dispersion liquid 3 In addition to the preparation of the pigment dispersion liquid 1, the pigment dispersion liquid 3 is prepared in the same manner as the preparation of the pigment dispersion liquid 1 except for the coating pigment 3. Adjustment of the pigment dispersion liquid 4 In addition to the preparation of the pigment dispersion liquid 1, the pigment dispersion liquid 4 is prepared in the same manner as the preparation of the pigment dispersion liquid 1 except for the coating pigment 5. The adjustment of the material dispersion 5 is in addition to the pigment pigment 1 in the preparation of the pigment dispersion 1, in the mass ratio of the soil pigment 4 / coating pigment 6 = 1 〇〇 / 4 ,, the total amount of -112 -201009498 The pigment dispersion liquid 5 is prepared in the same manner as the preparation of the pigment dispersion liquid, except that the coating pigment 4 and the coating pigment 6 are used in the same manner as the coating pigment 调制 prepared by the pigment dispersion liquid 1. Adjustment of Pigment Dispersion Liquid 6 The synthesis method of the pigment used for the pigment dispersion liquid 6 and the preparation method of the dispersion liquid using the same are shown below. Synthesis Example 5: Synthesis of a zinc halide phthalocyanine pigment Zinc phthalocyanine was produced by using phthalonitrile or zinc chloride as a raw material. The halogenation was carried out by mixing 3.1 parts of thioindigo chloride, 3.7 parts of anhydrous aluminum chloride, 0.46 parts of sodium chloride, 1 part of zinc phthalocyanine at 40 ° C, and dropping 22 parts of bromine. The reaction was carried out at 80 ° C for 15 hours, and then the reaction mixture was poured into water to precipitate a part of the zinc bromide phthalocyanine crude pigment. The aqueous slurry was filtered and washed with hot water at 80 ° C, and dried at 90 ° C to obtain 2.6 parts of purified crude zinc bromide phthalocyanine pigment. 1 part of a portion of zinc bromide phthalocyanine pigment, 7 parts of pulverized sodium chloride, 1.6 parts of diethylene glycol, and 0.09 parts of xylene are put into a double-winch kneader and kneaded at 100 ° C for 6 hours. . After kneading, it is taken out in 100 parts of water at 80 ° C, stirred for 1 hour, filtered, washed with hot water, and dried to obtain a part of zinc bromide phthalocyanine obtained by pulverizing a part of zinc bromide phthalocyanine pigment. The pigment, according to the halogen content analysis of the mass analysis, has an average composition of ZnPcBr1()Cl4H2 (Pc: phthalocyanine), and an average of 10 bromines in one molecule. Modulation of green pigment zinc halide phthalocyanine dispersion

於加有直徑〇.5mm的氧化鍩珠之髙速分散機「TSC-6H -113- 201009498 J (愛美庫司（股）（Aimex Co·，Ltd.))中，投入14.9份的前 述所得之部分溴化鋅酞花青顏料、7.2份的丙烯酸分散劑 「BYK-2001」（BYK化學公司製）、78份的丙二醇甲基醚 醋酸酯，以毎分鐘2000回轉攪拌8小時，調製顏料分散 液6。 顏料分散液7的調整 除了於顔料分散液1的調製中，代替被覆顏料1，使用 被覆顔料4以外，與顏料分散液1之調製同樣地，調製顏 料分散液7。 茲詳細顯示實施例及比較例所用的黏結劑樹脂。 合成例6:黏結劑樹脂：甲基丙烯酸烯丙酯/甲基丙烯酸共 聚物（莫耳比=80/20)的合成 於具備有攪拌翼的攪拌棒、回流冷卻管、溫度計之 200M1的三口燒瓶中，加入54克1-甲氧基-2-丙醇，在氮 氣流下加熱到70°C。使用柱塞泵，費2.5小時，將10.07 克甲基丙烯酸烯丙酯、1.93克甲基丙烯酸、0.185克當作 聚合引發劑的2,2’-偶氮雙（2,4-二甲基戊腈）溶解在54克 1-甲氧基-2-丙醇中而成的溶液，滴下到三口燒瓶內。滴下 結束後，再於70 °C攪拌2小時。加熱結束後，投入到1L 的水中，使再沈澱。過濾析出物後，使真空乾燥，得到9 克（收率75%)的聚合物化合物。 以10mL的量瓶秤取0.01克重量平均分子量的測定試 料，添加約8mL的THF，在室溫溶解後，總量成爲10mL 。使用GPC，於下述條件下測定此溶液，結果上述聚合物 -114- 201009498 化合物的重量平均分子量爲35000。 實施例及比較例所用的（A)乙烯性不飽和化合物、（B)黏 結劑樹脂及環氧化合物係如以下。 (A) 乙烯性不飽和化合物： (A-l) KAYARAD DPHA(日本化藥（股）輿） (A-2) NK酯A-TMMT(新中村化學工業（股）製） (A-3) V#802(大阪有機化學工業（股）製） (B) 黏結劑樹脂： ® (B-1)甲基丙烯酸苄酯與甲基丙烯酸的共聚物（莫耳比 = 70/30)重量平均分子量=5,000 固體成分100wt% (Β·2)甲基丙烯酸烯丙酯/甲基丙烯酸共聚物（莫耳比 = 80/20)固體成分 1 0 0 wt % (B-3) Cyclomer-P ACA230AA(戴西爾化學工業（股）製）固體 成分5 0 wt % 環氧化合物： (E-l) Epiclon 695(DIC(股）製） W (E-2) EHPE3150(戴西爾化學工業（股）製） 實施例1 感光性樹脂組成物CB-1的調製 將以下組成的成分攪拌混合而調製藍色用感光性樹脂 組成物CB-1。 •乙烯性不飽和化合物：（A-1) 4.4份 •黏結劑樹脂：（B-1) 3.9份 .著色劑：顔料分散液5 14.6份 -115- 201009498 通式（I)所示的光聚合引發劑：化合物2 其它引發劑：無 鏈轉移劑：無 環氧化合物：（E -1) 溶劑：丙二醇甲基醚醋酸酯 聚合抑制劑：對甲氧基苯酚 3·4份 0.5份 73份 0.002 份 •界面活性劑：美加發克F781F(DIC股份有限公司製） 0.00 7 份 畫素的形成 於無驗玻璃基板（Corning公司，1 737，5 50mmx660mm) 的表面上，使用狹縫塗佈機（平田機工（股KHirata Corporation), HC-6000)，塗佈 CB-1 後，在 90°C 的潔淨烘 箱內進行120秒的預烘烤，形成膜厚1.7#m的塗膜。 接著，使用AEGIS (V科技（股），YAG雷射的第3高次 諧波波長3 5 5nm，脈衝寬度6nsec)當作雷射曝光裝置， 對於感光性樹脂組成物層表面，通過光罩進行約lmJ/cm2 的脈衝寬度照射。然後，對此基板，使用顯像裝置（日立高 科技公司（Hitachi High-Technologies Corporation)製）’以 氫氧化鉀顯像液CDK-1(富士軟片電子材料（股）製）的1.0% 顯像液（1質量份的CDK-1經99質量份的純水所稀釋的液， 25°C)，將噴淋壓力設定在0.20MPa，進行50秒的顯像， 以純水洗淨後，進行風乾。然後，在22 0 °C的潔淨烘箱內 ，進行30分鐘的後烘烤，在基板上形成藍色條狀畫素陣 列β -116- .201009498 實施例2〜6 感光性樹脂組成物CB-2〜6的調製 除了於實施例1所用的感光性樹脂組成物中’將光聚 合引發劑與鏈轉移劑變更爲表1所記載的添加量以外，與 實施例1所調製的CB-1同樣地，調製藍色用感光性樹脂 組成物CB-2〜6» 畫素的形成 代替實施例1所用的CB-1，使用CB-2〜6，藉由與實 ® 施例1同樣的操作，在基板上形成藍色條狀畫素陣列。 實施例7 感光性樹脂組成物CR-1的調製 攪拌混合以下組成的成分，調製紅色用感光性樹脂組 成物CR-1。 乙烯性不飽和化合物：（A-1) 2.9份 黏結劑樹脂：（B-1) 1.2份 著色劑：顏料分散液1 15.4 份 著色劑：顔料分散液2 1 3.8 份 著色劑：顏料分散液4 6.6份 通式（I)所示的光聚合引發劑：化合物2 1.6份 環氧化合物：（E -1) 0.5份 溶劑：丙二醇甲基醚醋酸酯 58份 聚合抑制劑：對甲氧基苯酚 0.002 份 界面活性劑：美加發克F781F(DIC股份有限公司製） 0.007 份 ❹ -117- 201009498 畫素的形成 代替實施例1所用的CB-1，使用CR-1，藉由與實施例 1同樣的操作，在基板上形成紅色條狀畫素陣列。 實施例8 感光性樹脂組成物CG-1的調製 攪拌混合以下組成的成分，調製綠色用感光性樹脂組 成物CG-1。 •乙烯性不飽和化合物：（Α·1) 3.2份 •黏結劑樹脂：（Β-1) i.5份 .著色劑：顏料分散液3 20.6份 •著色劑：顏料分散液4 11.4份 •通式（1)所示的光聚合引發劑：化合物2 2.4份 .環氧化合物：（E-1) 〇.5份 •溶劑：丙二醇甲基醚醋酸酯 60份 •聚合抑制劑：對甲氧基苯酚 0.002份 .界面活性劑：美加發克F781F(DIC股份有限公司製） 0.007 份 畫素的形成 代替實施例1所用的CB-ι，使用CG-1，藉由與實施例 1同樣的操作，在基板上形成綠色條狀畫素陣列。 實施例9〜1 3 感光性樹脂組成物CB-7〜11的調製 除了於實施例1所用的組成物中，如袠2地變更（A)乙 烯性不飽和化合物、（B)黏結劑樹脂、環氧化合物以外，與 -118- 201009498 ， 實施例1所調製的CB-1同樣地’調製藍色用感光性樹脂 組成物CB-7〜10。而且，CB-11係在CB-10中更添加0.3 份當作矽烷偶合劑的KBM-503 (信越化學工業（股）製）。 畫素的形成 代替實施例1所用的CB-1，分別使用CB-7〜1 1，藉由 與實施例1同樣的操作，在基板上形成藍色條狀畫素陣列 實施例1 4 ® 感光性樹脂組成物CB-12的調製 攪拌混合以下組成的成分，調製藍色用感光性樹脂組 成物CB-12。 .乙烯性不飽和化合物：（A-2) 3.5份 •黏結劑樹脂：（B-2) 3.2份 •著色劑：顏料分散液5 2.7份 •著色劑：顏料分散液7 1 8.1份 •通式⑴所示的光聚合引發劑：化合物2 2.1份In an idling disperser "TSC-6H-113-201009498 J (Aimex Co., Ltd.)) having a yttrium oxide bead having a diameter of 55 mm, 14.9 parts of the aforementioned fraction was supplied. Zinc bromide phthalocyanine pigment, 7.2 parts of acrylic dispersant "BYK-2001" (manufactured by BYK Chemical Co., Ltd.), and 78 parts of propylene glycol methyl ether acetate were stirred at 20002000 for 8 hours to prepare a pigment dispersion liquid 6 . Adjustment of the pigment dispersion liquid 7 In addition to the coating pigment 4, the pigment dispersion liquid 7 is prepared in the same manner as the preparation of the pigment dispersion liquid 1 except for the preparation of the pigment dispersion liquid 1. The binder resin used in the examples and comparative examples is shown in detail. Synthesis Example 6: Synthesis of a binder resin: allyl methacrylate/methacrylic acid copolymer (mol ratio = 80/20) in a 200 M1 three-necked flask equipped with a stirring bar with a stirring blade, a reflux cooling tube, and a thermometer Medium, 54 g of 1-methoxy-2-propanol was added and heated to 70 ° C under a nitrogen stream. Using a plunger pump, it took 2.5 hours to apply 10.07 g of allyl methacrylate, 1.93 g of methacrylic acid, and 0.185 g of 2,2'-azobis(2,4-dimethylpentane) as a polymerization initiator. A solution of the nitrile dissolved in 54 g of 1-methoxy-2-propanol was dropped into a three-necked flask. After the completion of the dropwise addition, the mixture was further stirred at 70 ° C for 2 hours. After the completion of the heating, the mixture was poured into 1 L of water to reprecipitate. After the precipitate was filtered, it was dried under vacuum to give 9 g (yield: 75%) of a polymer compound. A measurement sample of 0.01 g of a weight average molecular weight was weighed in a 10 mL measuring flask, and about 8 mL of THF was added thereto, and after dissolving at room temperature, the total amount was 10 mL. The solution was measured under the following conditions using GPC, and as a result, the above polymer-114-201009498 compound had a weight average molecular weight of 35,000. The (A) ethylenically unsaturated compound, (B) binder resin and epoxy compound used in the examples and the comparative examples are as follows. (A) Ethylene unsaturated compound: (Al) KAYARAD DPHA (Nippon Chemical Co., Ltd.) (A-2) NK ester A-TMMT (manufactured by Shin-Nakamura Chemical Industry Co., Ltd.) (A-3) V# 802 (Osaka Organic Chemical Industry Co., Ltd.) (B) Adhesive Resin: ® (B-1) Copolymer of benzyl methacrylate and methacrylic acid (Morby = 70/30) Weight average molecular weight = 5,000 Solid content 100wt% (Β·2) allyl methacrylate/methacrylic acid copolymer (Morby = 80/20) Solid content 1 0 0 wt % (B-3) Cyclomer-P ACA230AA (Dai Sil Chemical Industry Co., Ltd.) Solid content 50% by weight Epoxy compound: (El) Epiclon 695 (made by DIC) W (E-2) EHPE3150 (made by Daisy Chemical Industry Co., Ltd.) Example 1 Preparation of Photosensitive Resin Composition CB-1 A component for the following composition was stirred and mixed to prepare a blue photosensitive resin composition CB-1. • Ethylene unsaturated compound: (A-1) 4.4 parts • Adhesive resin: (B-1) 3.9 parts. Colorant: Pigment dispersion 5 14.6 parts - 115 - 201009498 Photopolymerization represented by the general formula (I) Initiator: Compound 2 Other initiator: No chain transfer agent: Epoxy-free compound: (E -1) Solvent: Propylene glycol methyl ether acetate polymerization inhibitor: p-methoxyphenol 3 · 4 parts 0.5 parts 73 parts 0.002 • Surfactant: Mecca F781F (manufactured by DIC Corporation) 0.00 7 parts of the pixels were formed on the surface of a glass-free substrate (Corning, 1 737, 5 50 mm x 660 mm) using a slit coater ( Hirata Machinko (KHirata Corporation), HC-6000), after coating CB-1, pre-baking in a clean oven at 90 ° C for 120 seconds to form a coating film having a film thickness of 1.7 #m. Next, using AEGIS (V technology (share), YAG laser's 3rd harmonic wavelength 355 nm, pulse width 6nsec) as a laser exposure device, for the surface of the photosensitive resin composition layer, through the mask A pulse width of about lmJ/cm2 is illuminated. Then, a 1.0% imaging of potassium hydroxide imaging solution CDK-1 (manufactured by Fujifilm Electronic Materials Co., Ltd.) was used for the substrate using a developing device (manufactured by Hitachi High-Technologies Corporation) The liquid (1 mass part of CDK-1 diluted with 99 parts by mass of pure water, 25 ° C), the spray pressure was set at 0.20 MPa, and the image was developed for 50 seconds, and then washed with pure water. Air dried. Then, after 30 minutes of post-baking in a clean oven at 22 ° C, a blue stripe pixel array β-116-.201009498 was formed on the substrate. Examples 2 to 6 Photosensitive resin composition CB-2 In the photosensitive resin composition used in Example 1, the photopolymerization initiator and the chain transfer agent were changed to the addition amounts described in Table 1, and the same as the CB-1 prepared in Example 1, except for the CB-1 prepared in Example 1. The blue color photosensitive resin composition CB-2 to 6» pixel was formed instead of the CB-1 used in Example 1, and CB-2 to 6 was used, and the same operation as in the actual example 1 was used. A blue stripe pixel array is formed on the substrate. [Example 7] Preparation of photosensitive resin composition CR-1 The components of the following composition were stirred and mixed to prepare a photosensitive resin composition CR-1 for red. Ethylene unsaturated compound: (A-1) 2.9 parts of binder resin: (B-1) 1.2 parts of colorant: pigment dispersion 1 15.4 parts of colorant: pigment dispersion 2 1 3.8 parts of colorant: pigment dispersion 4 6.6 parts of photopolymerization initiator represented by the formula (I): compound 2 1.6 parts of epoxy compound: (E -1) 0.5 part solvent: propylene glycol methyl ether acetate 58 parts polymerization inhibitor: p-methoxyphenol 0.002 Surfactant: Mecca F781F (manufactured by DIC Corporation) 0.007 parts ❹ -117- 201009498 The formation of pixels instead of CB-1 used in Example 1, using CR-1, the same as in Example 1. Operation, forming a red stripe pixel array on the substrate. [Example 8] Preparation of photosensitive resin composition CG-1 The components of the following composition were stirred and mixed to prepare a green photosensitive resin composition CG-1. • Ethylene unsaturated compound: (Α·1) 3.2 parts • Adhesive resin: (Β-1) i.5 parts. Colorant: Pigment dispersion 3 20.6 parts • Colorant: Pigment dispersion 4 11.4 parts • Pass Photopolymerization initiator represented by the formula (1): Compound 2 2.4 parts. Epoxy compound: (E-1) 〇. 5 parts • Solvent: propylene glycol methyl ether acetate 60 parts • Polymerization inhibitor: p-methoxy group 0.002 parts of phenol. Surfactant: Mecca F781F (manufactured by DIC Corporation) 0.007 parts of pixels were formed in place of CB-I used in Example 1, and CG-1 was used, and the same operation as in Example 1 was carried out. A green stripe array is formed on the substrate. Example 9 to 1 3 Preparation of Photosensitive Resin Composition CB-7 to 11 In addition to the composition used in Example 1, the (A) ethylenically unsaturated compound, (B) binder resin, and (B) binder resin were changed as in Example 2. In the same manner as in the case of CB-1 prepared in Example 1, except for the epoxy compound, the blue photosensitive resin compositions CB-7 to 10 were prepared. Further, CB-11 was further added with 0.5 part of KBM-503 (manufactured by Shin-Etsu Chemical Co., Ltd.) as a decane coupling agent in CB-10. Formation of pixels instead of CB-1 used in Example 1, respectively, using CB-7~1 1, forming a blue strip pixel array on the substrate by the same operation as in Example 1 Example 1 4 sensitization The resin composition CB-12 was prepared by mixing and mixing the components of the following composition to prepare a photosensitive resin composition CB-12 for blue. Ethylene unsaturated compound: (A-2) 3.5 parts • Adhesive resin: (B-2) 3.2 parts • Colorant: Pigment dispersion 5 2.7 parts • Colorant: Pigment dispersion 7 1 8.1 parts • General formula (1) Photopolymerization initiator shown: Compound 2 2.1 parts

•其它引發劑：無 •鏈轉移劑··無 •環氧化合物：（E-2) 0.5份 •矽烷偶合劑：KBM-5 03 (信越化學工業（股）製）0.3份 •溶劑：丙二醇甲基醚醋酸酯 70份 •聚合抑制劑：對甲氧基苯酚 0.002份 •界面活性劑：美加發克F781F(DIC股份有限公司製） 0.006 份 -119- 201009498 .. 畫素的形成 代替實施例1所用的CB-1，使用CB-12，藉由與實施 例1同樣的操作，在基板上形成藍色條狀畫素陣列。 實施例15〜20、22、23及26〜33 感光性樹脂組成物CB-13〜1 8及CB-20〜29的調製 除了於實施例14所用的組成物中，如表1及表2所記 載地變更光聚合引發劑與鏈轉移劑的種類及量，再者亦如 表1及表2地變更（A)乙烯性不飽和化合物、（B)黏結劑樹 脂及環氧化合物以外，與實施例14所調製的CB-12同樣 地，調製藍色用感光性樹脂組成物CB-13〜18及CB-20〜 29 = 畫素的形成 代替實施例1所用的CB-1，分別使用CB-13〜18及 CB-20〜29，藉由與實施例1同樣的操作，在基板上形成 藍色條狀畫素陣列。 實施例2 1 感光性樹脂組成物CB-19的調製 攪拌混合以下組成的成分，調製藍色用感光性樹脂組 成物CB-19。 •乙烯性不飽和化合物：（Α·2) 2 .4 份 •黏結劑樹脂：（Β - 2) 3 .2 份 •著色劑：顏料分散液5 2 .7 份 •著色劑：顔料分散液7 1 8. 1份 •通式（I)所示的光聚合引發劑：化合物2 2 • 1 份 -120- 201009498 •其它引發劑：無 •鏈轉移劑：化合物1 5 •環氧化合物：（E-2) •矽烷偶合劑：KBM-503 (信越化學工業（股）製） •溶劑：丙二醇甲基醚醋酸酯 •聚合抑制劑：對甲氧基苯酚 •界面活性劑：美加發克F781F(DIC股份有 β 畫素的形成 代替實施例1所用的CB-1，使用CB-19，I 例1同樣的操作，在基板上形成藍色條狀畫素陣 實施例24 感光性樹脂組成物CG-2的調製 攪拌混合以下組成的成分，調製綠色用感光 成物CG-2。 .乙烯性不飽和化合物：（Α-2) . .黏結劑樹脂：（Β - 2 ) •著色劑：顔料分散液6 •著色劑：顏料分散液4 •通式（I)所示的光聚合引發劑：化合物2 .其它引發劑：無 .鏈轉移劑：無 .環氧化合物：（Ε-2) .矽烷偶合劑·· ΚΒΜ-503 (信越化學工業（股） 1.1份 0.5份 0.3份 70份 0.002 份 艮公司製） 0.0 06 份 ί由與實施 列0 性樹脂組 4.7份 2.4份 26.1 份 14.3 份 0.9份 0.5份 0.96 份 -121- 201009498 •溶劑：丙二醇甲基醚醋酸酯 51.4份 •聚合抑制劑：對甲氧基苯酚 0.002份 •界面活性劑：美加發克F781F(DIC股份有限公司製） 0.006 份 畫素的形成 代替實施例1所用的CB-1，使用CG-2，藉由與實施例 1同樣的操作，在基板上形成綠色條狀畫素陣列。 實施例2 5 感光性樹脂組成物CG-3的調製 除了於實施例24所用的感光性樹脂組成物中，如表2 地變更（A)乙烯性不飽和化合物、（B)黏結劑樹脂以外，與 實施例25所調製的CG-2同樣地，調製綠色用感光性樹脂 組成物CG-3。 畫素的形成 代替實施例1所用的CB-1，使用CG-3，藉由與實施例 1同樣的操作，在基板上形成綠色條狀畫素陣列。 比較例1〜6 感光性樹脂組成物CB-30〜35的調製 除了於實施例1所用的感光性樹脂組成物中，代替（D) 通式（1)所示的光聚合引發劑，如表2般使用不是通式（I)所 示的光聚合引發劑之引發劑以外，與實施例1所調製的 CB-1同樣地，調製藍色用感光性樹脂組成物CB-30〜35。 畫素的形成 代替實施例1所用的CB-1，分別使用CB-30〜35，藉 201009498 由與實施例1同樣的操作，在基板上形成藍色條狀畫素陣 列。 比較例7 感光性樹脂組成物CR-2的調製 除了於實施例7所用的感光性樹脂組成物中，代替（D) 通式（1)所示的光聚合引發劑，如表2般使用不是通式（I)所 示的光聚合引發劑之引發劑以外，與實施例7所調製的 CR-1同樣地，調製紅色用感光性樹脂組成物CR-2。 © 畫素的形成 代替實施例1所用的CB-1，使用CR-2，藉由與實施例 1同樣的操作，在基板上形成紅色條狀畫素陣列。 比較例8 感光性樹脂組成物CG-4的調製 除了於實施例8所用的感光性樹脂組成物中，代替（D) 通式（1)所示的光聚合引發劑，如表2般使用不是通式（I)所 示的光聚合引發劑之引發劑以外，與實施例8所調製的 β CG-1同樣地，調製綠色用感光性樹脂組成物CG-4。 畫素的形成 代替實施例1所用的CB-1 ’使用CG-4 ’藉由與實施例 1同樣的操作，在基板上形成綠色條狀畫素陣列。 表1及表2中顯示上述實施例1〜33及比較例1〜8的 感光性樹脂組成物之詳細。 -123- 201009498 ms 师蓉 舞涯4π ΚΙΚ-^ li蚁绝S騮 Co蘅粼 jrlr. cvle鏹一&amp; Φ0^ L· 蘅鹬 jrtn Φ0^ s ti宋躁 τ ι LU τ ι LU Τ Ι LU V 1 LU τ ι LU 1 LU 1 UJ 1 LU I E-2 | τ ι UJ τ ι Llf | E-2 I E-2 E-2 E-2 E-2 Ε-2 Ε-2 Ε-2 E-2 χ— 1 GO 1 GQ 1 00 τ~ 1 ω 1 CQ τ ι ω τ ι CQ 1 B-1 | 1 CQ 1 CQ I Β-2Π I B-2 I B-2 I B-2 I B-2 I B-2 Β-2 Β-2 Β-2 B-2 1 &lt; A-1 Α-1 &lt; &lt; 1 &lt; τ ι &lt; τ ι &lt; x— ! &lt; 1 A-2 1 T&quot; 1 &lt; L.A-2 I A-2 | [A-2 I A-2 I A-2 | Α-2 Α-2 Α-3 A-3 0.4份 0.4份 0.4份 0.2份 0.4份 0.2份 0.3 份| 壊 化合物14 化合物14 摧 摧 m m m m m m 壊 m m 化合物13 化合物13 化合物15 化合物15 m 化合物15 00 〇 Csl ό 0.2份 摧 m I化合物11 堞 m 摧 摧 摧 摧 摧 m 壊 摧 鞋 化合物11| 摧 化合物11 壊 m 1_1份 |0.2 份 | |〇.6 份 | Φ CD Ο 0.7 份 I 0.7份 摧 摧 I化合物10 1化合物9| I化合物6| 1化合物7| m 摧 m m m 璀 m m m I化合物1〇| 摧 化合物10 m 摧 13.4 份 | 丨3.0份 Φ CD 丨3.2份| C0 cvi |2_8份丨 |1_6 份 1 |2.4 份 I |3.4 份 | 以份丨 心份」 寸 CO 3.4 份 | φ t— cvi N 〇 1.7份 〇 φ cvi 00 T— 1化合物2| [i匕合物2| I化合物2 [Jh合物2 I 1化合物2| |化合物2| [i匕合物2 1 I化合物2 I |化合物2| 1化合物2」 1化合物2j |化合物2J [i匕合物2 I |化合物2」 |化合物2 | 化合物2」 化合物2 ^化合物2 化合物2 化合物2 1 CQ 〇 I CB-2 I CB-3 I CB-4 I I CB-5J | CB-6 I 1 CR-1 I I CG-1 I I CB-7 I I CB-8 1 I CB-9 I |CB-1〇| CB-11J CB-121 CB-131 CB-14I CB-15 CB-16 CB-17 CB-18 實施例1 實施例2 實施例3 實施例4 |實施例5 I 實施例6 |實施例7 I |實施例8i 實施例9 I實施例1〇| |實施例11| |實施例12| |實施例13| |實施例14| |實施例15| |實施例16| 1實施例17 實施例18 |實施例19| 實施例20 © S , ο 201009498 【c\l揪】 環氧 化合物 I E-2 I LE-2 I I E-2 I 1 E-2 j E-2 m 1 E-2 1 1 E-2 I I E-2 j I E-2 I I E-2 I E-2 | E-2 τ ι LiJ χ— 1 LiJ τ ι UJ τ ι UJ E-2 τ ι LU τ— Lil 黏結劑 樹脂 _1 I B-2 I B-2 j I B-2_ 1 B-2 I 1 B-1 I 1 B-2 1 1 B-3 1 1 B-2 1 I B-2 I | B-2 I I B-2 j l B-2 j B-2 1 GO τ ι ω τ ι ω τ ι CQ 1 CQ B-2 τ ι m 1 CQ 乙烯性 不飽和 化合物 A-3 I A-2 I A-2 1 A-2 j 1 &lt; 1 A-2 I Γ A-2 I 1 A-2 I I A-2 I Γ A-2 j I A-2 j 「A-2 j I A-1/A-2=1/1 &lt; τ ι &lt; Α-1 τ ι &lt; &lt; A-2 Α-1 τ ι &lt; 鏈轉移劑 _1 1·1份 〇·2份 \O.2m I化合物15| 摧 m 壊 m 壊 m 摧 I化合物13| m m I化合物131 m m 摧 摧 m 摧 摧 m 摧 光聚合 引發劑3 〇·2份 Φ C\l ο 〇_2份 〇_2份 CM d 摧 摧 摧 璀 m 摧 I化合物11| I化合物11| I化合物12| I化合物12| i化合物12| 摧 摧 m 摧 璀 m m 摧 m 光聚合 引發劑2 CNJ d CVI d 04 〇 l〇.2 份 | d 0.4 份 I 摧 m m 摧 摧 m I化合物6 I I化合物6 I I化合物6 I I化合物8 | i化合物8 I 摧 m 摧 I化合物12| m 摧 壊 m 壊 光聚合 引發劑1 丨2.1份| φ T— cvi 2_1份 |〇·9 份 | σ&gt; o c\i |2.1 份 | |1_7 份 I in τ— |1_7 份 | |1.7 份 I in r— cvi |3.4fJ |3.4 份 1 丨3.4份I 寸 CO 3.4 份 1 Φ CO 2.4 份 j I化合物2| I化合物3J I化合物Λ] 1化合物2 ι 1化合物2 1 1化合物2| 1化合物U I化合物2 I I化合物2」 |化合物2J |化合物2J |化合物2 | 化合物2 1化合物6| 1化合物7J I化合物7 I I化合物4 I 1化合物5| 1化合物5| 化合物5 化合物5 感光性 樹脂組 成物 ICB-19I |CB-20| ICB-211 1 CG-2 1 I CG-3J ICB-22J ICB-231 |CB-24| [CB-25I |CB-26| ICB-271 |CB-28| CB-29 ICB-301 CB-31 |CB-32| CB-33 CB-34 CB-35 CR-2 I CG-4 1 實施例21 實施例22丨 實施例231 實施例24」 丨實施例25l |實施例26| |實施例27| I實施例28| I實施例29| 實施例30 |實施例31| |實施例32| 實施例33 比較例1 比較例2 I比較例3 I 比較例4 比較例5 比較例6 比較例7 比較例8 201009498 表面粗糙度的評價 使用 AFM(原子力顯微鏡）（Dimension3 100，Veeco Instruments公司製），測定各自的表面粗糙度，測定面積 爲1 0 V m平方。 表面粗糙度的評價係如下述地進行。 ◎ : 6nm以下。 〇：大於6nm〜8nm以下。 △:大於8nm〜10nm以下。 X :大於 1 〇nm。 線寬安定性的評價 藉由電場發射型掃描電子顯微鏡S-4800(HITACHI公司 製）來觀察所形成的畫素圖案，評價線寬安定性。 ◎:圖案端的凹凸爲0.3μπι以下，線寬係安定。 〇：圖案端的凹凸大於0.3/zm且爲0.8;/m以下，線寬大 致安定 △:圖案端的凹凸大於0.8#m且爲1.5#m以下，線寬稍 微不安定。 X:無法形成安定的圖案。 耐熱性的評價 對形成有畫素的基板，在220°C的潔淨烘箱內進行60 分鐘的追加烘烤，使用大塚電子（股）（〇tsuka Electronics Co·，Ltd.)製的分光測光器MCPD-2000來評價追加烘烤前 後的色變化（△ E*ab)。此處，△ E*ab係意味L*a*b*表色系 的色差。以色差的變化△ E*ab値來評價。 -126- 201009498 ◎ : 1 · 5以下。 〇：大於1.5〜2.5以下。 △:大於2.5〜3_5以下。 X :大於3.5。 表3中顯示上述實施例1〜33及比較例1〜8的表面粗 糙度之評價、線寬安定性的評價、耐熱性的評價之結果。• Other initiators: None • Chain transfer agent • None • Epoxy compound: (E-2) 0.5 parts • Decane coupling agent: KBM-5 03 (manufactured by Shin-Etsu Chemical Co., Ltd.) 0.3 parts • Solvent: propylene glycol Ethyl ether acetate 70 parts • Polymerization inhibitor: 0.002 parts of p-methoxyphenol • Surfactant: Mecca F781F (manufactured by DIC Corporation) 0.006 parts -119- 201009498 .. The formation of pixels instead of the example 1 Using CB-1, a blue stripe pixel array was formed on the substrate by the same operation as in Example 1 using CB-12. Examples 15 to 20, 22, 23 and 26 to 33 Preparation of photosensitive resin compositions CB-13 to 18 and CB-20 to 29 In addition to the compositions used in Example 14, as shown in Tables 1 and 2 The type and amount of the photopolymerization initiator and the chain transfer agent are changed as described, and the (A) ethylenically unsaturated compound, (B) binder resin, and epoxy compound are also changed as shown in Tables 1 and 2, and Similarly, the CB-12 prepared in Example 14 was prepared by modulating the blue photosensitive resin compositions CB-13 to 18 and CB-20 to 29 = the formation of pixels instead of the CB-1 used in Example 1, respectively, using CB- 13 to 18 and CB-20 to 29, a blue stripe pixel array was formed on the substrate by the same operation as in the first embodiment. [Example 2] Preparation of photosensitive resin composition CB-19 The components of the following composition were stirred and mixed to prepare a photosensitive resin composition CB-19 for blue. • Ethylene unsaturated compound: (Α·2) 2 .4 parts • Adhesive resin: (Β - 2) 3.2 parts • Colorant: Pigment dispersion 5 2 .7 parts • Colorant: Pigment dispersion 7 1 8. 1 part • Photopolymerization initiator represented by the formula (I): Compound 2 2 • 1 part - 120 - 201009498 • Other initiator: None • Chain transfer agent: Compound 1 5 • Epoxy compound: (E -2) • Decane coupling agent: KBM-503 (Shin-Etsu Chemical Co., Ltd.) • Solvent: propylene glycol methyl ether acetate • Polymerization inhibitor: p-methoxyphenol • Surfactant: Mecca F781F (DIC The formation of β-pixels in place of CB-1 used in Example 1, using CB-19, I Example 1, the same operation, forming a blue strip pixel array on the substrate Example 24 Photosensitive resin composition CG- 2 Preparation and mixing The components of the following composition are mixed to prepare a green photosensitive material CG-2. Ethylene unsaturated compound: (Α-2) . . Adhesive resin: (Β - 2 ) • Colorant: Pigment dispersion 6 • Colorant: Pigment Dispersion 4 • Photopolymerization initiator represented by the formula (I): Compound 2. Other initiation Agent: No. Chain transfer agent: None. Epoxy compound: (Ε-2) . Decane coupling agent ··ΚΒΜ-503 (Shin-Etsu Chemical Industry Co., Ltd. 1.1 parts 0.5 parts 0.3 parts 70 parts 0.002 parts 艮 company system) 0.0 06 parts and implementation of the group 0 resin group 4.7 parts 2.4 parts 26.1 parts 14.3 parts 0.9 parts 0.5 parts 0.96 parts -121-201009498 • Solvent: propylene glycol methyl ether acetate 51.4 parts • Polymerization inhibitor: p-methoxyphenol 0.002 parts • Surfactant: Mecca F781F (manufactured by DIC Co., Ltd.) 0.006 parts of pixels were formed instead of CB-1 used in Example 1, and CG-2 was used, and the same operation as in Example 1 was carried out. A green stripe array was formed on the substrate. Example 2 5 Preparation of Photosensitive Resin Composition CG-3 In addition to the photosensitive resin composition used in Example 24, as shown in Table 2, (A) ethylenic unsaturation was changed. In the same manner as the CG-2 prepared in Example 25, the green photosensitive resin composition CG-3 was prepared in the same manner as the CG-2 prepared in Example 25. The formation of the pixel was used instead of the CB-1 used in Example 1. CG-3, on the substrate by the same operation as in the first embodiment The green stripe array was formed. Comparative Examples 1 to 6 The preparation of the photosensitive resin composition CB-30 to 35 was carried out in the photosensitive resin composition used in Example 1, instead of (D) the formula (1). In the same manner as in the case of the CB-1 prepared in the first embodiment, the photopolymerization initiator was prepared in the same manner as in the case of the photopolymerization initiator represented by the formula (I). CB-30~35. Formation of pixels Instead of CB-1 used in Example 1, CB-30 to 35 were respectively used, and a blue stripe pixel array was formed on the substrate by the same operation as in Example 1 by 201009498. Comparative Example 7 Preparation of Photosensitive Resin Composition CR-2 In place of the photopolymerization initiator represented by the formula (1), the photopolymerization initiator represented by the formula (1) was used instead of the photosensitive resin composition used in Example 7. In the same manner as the initiator of the photopolymerization initiator represented by the formula (I), the red photosensitive resin composition CR-2 was prepared in the same manner as the CR-1 prepared in Example 7. © Formation of a pixel Instead of the CB-1 used in Example 1, a red stripe pixel array was formed on the substrate by the same operation as in Example 1 using CR-2. Comparative Example 8 Preparation of Photosensitive Resin Composition CG-4 In place of the photopolymerization initiator represented by the formula (1), the photopolymerization initiator represented by the formula (1) was used instead of the photosensitive resin composition used in Example 8. In the same manner as the β CG-1 prepared in Example 8, the green photosensitive resin composition CG-4 was prepared in the same manner as the initiator of the photopolymerization initiator represented by the formula (I). Formation of pixels Instead of the CB-1' used in Example 1, CG-4' was used to form a green stripe array on the substrate by the same operation as in Example 1. The details of the photosensitive resin compositions of the above Examples 1 to 33 and Comparative Examples 1 to 8 are shown in Tables 1 and 2. -123- 201009498 ms 师蓉舞涯4π ΚΙΚ-^ li 蚁绝S骝Co蘅粼jrlr. cvle镪一& Φ0^ L· 蘅鹬jrtn Φ0^ s ti Song 躁τ ι LU τ ι LU Τ Ι LU V 1 LU τ ι LU 1 LU 1 UJ 1 LU I E-2 | τ ι UJ τ ι Llf | E-2 I E-2 E-2 E-2 E-2 Ε-2 Ε-2 Ε-2 E -2 χ— 1 GO 1 GQ 1 00 τ~ 1 ω 1 CQ τ ι ω τ ι CQ 1 B-1 | 1 CQ 1 CQ I Β-2Π I B-2 I B-2 I B-2 I B- 2 I B-2 Β-2 Β-2 Β-2 B-2 1 &lt; A-1 Α-1 &lt;&lt; 1 &lt; τ ι &lt; τ ι &lt; x- ! &lt; 1 A-2 1 T&quot; 1 &lt; LA-2 I A-2 | [A-2 I A-2 I A-2 | Α-2 Α-2 Α-3 A-3 0.4 parts 0.4 parts 0.4 parts 0.2 parts 0.4 parts 0.2 Parts 0.3 parts | 壊 compound 14 compound 14 destroy mmmmmm 壊mm compound 13 compound 13 compound 15 compound 15 m compound 15 00 〇Csl ό 0.2 part destroy m I compound 11 堞m destroy destroy m 壊 鞋 shoes compound 11| Destroy compound 11 壊m 1_1 parts|0.2 parts| |〇.6 parts| Φ CD Ο 0.7 parts I 0.7 parts of destroying I compound 10 1 compound 9| I compound 6| 1 compound 7| m destroy mmm 璀mm m I compound 1〇| Destroy compound 10 m to destroy 13.4 parts|丨3.0 parts Φ CD 丨3.2 parts|C0 cvi|2_8 parts丨|1_6 parts 1 |2.4 parts I |3.4 parts| Φ t— cvi N 〇1.7 parts 〇φ cvi 00 T-1 compound 2| [i conjugate 2| I compound 2 [Jh conjugate 2 I 1 compound 2| | compound 2 | [i 匕 2 1 I compound 2 I | compound 2| 1 compound 2" 1 compound 2j | compound 2J [i chelate 2 I | compound 2" | compound 2 | compound 2" compound 2 ^ compound 2 compound 2 compound 2 1 CQ 〇I CB-2 I CB-3 I CB-4 II CB-5J | CB-6 I 1 CR-1 II CG-1 II CB-7 II CB-8 1 I CB-9 I |CB-1〇| CB- 11J CB-121 CB-131 CB-14I CB-15 CB-16 CB-17 CB-18 Example 1 Example 2 Example 3 Example 4 | Example 5 I Example 6 | Example 7 I | Example 8i Example 9 I Example 1||Example 11| |Example 12| |Example 13| |Example 14| |Example 15| |Example 16|1 Example 17 Example 18 |Example 19| Example 20 © S , ο 201009498 [c\l揪] Epoxide I E-2 I LE-2 II E-2 I 1 E-2 j E-2 m 1 E-2 1 1 E-2 II E- 2 j I E-2 II E-2 I E-2 | E-2 τ ι LiJ χ— 1 LiJ τ ι UJ τ ι UJ E-2 τ ι LU τ— Lil Adhesive Resin_1 I B-2 I B-2 j I B-2_ 1 B-2 I 1 B-1 I 1 B-2 1 1 B-3 1 1 B-2 1 I B-2 I | B-2 II B-2 jl B-2 j B-2 1 GO τ ι ω τ ι ω τ ι CQ 1 CQ B-2 τ ι m 1 CQ Ethylene unsaturated compound A-3 I A-2 I A-2 1 A-2 j 1 &lt; 1 A-2 I Γ A-2 I 1 A-2 II A-2 I Γ A-2 j I A-2 j "A-2 j I A-1/A-2=1/1 &lt; τ ι &lt ; Α-1 τ ι &lt;&lt; A-2 Α-1 τ ι &lt; chain transfer agent _1 1·1 part 〇·2 parts \O.2m I compound 15| destroy m 壊m 壊m destroy I compound 13| mm I compound 131 mm Destroy m Destroy m Destruction polymerization initiator 3 〇·2 parts Φ C\l ο 〇_2 parts 〇2 parts CM d Destroy 璀 m I I compound 11| I compound 11| I Compound 12| I Compound 12| i Compound 12| Destroy m Destroy mm Destroy m Photopolymerization initiator 2 CNJ d CVI d 04 〇l〇.2 parts | d 0.4 parts I destroy mm Destroy m I compound 6 II compound 6 II compound 6 II compound 8 | i compound 8 I destroy m destroy I Compound 12| m 壊 m 壊 photopolymerization initiator 1 丨 2.1 parts | φ T — cvi 2_1 parts | 〇 · 9 parts | σ> oc\i | 2.1 parts | |1_7 parts I in τ— |1_7 parts | |1.7 parts I in r- cvi |3.4fJ |3.4 parts 1 丨3.4 parts I inch CO 3.4 parts 1 Φ CO 2.4 parts j I compound 2| I compound 3J I compound Λ] 1 compound 2 ι 1 compound 2 1 1 compound 2|1 compound UI compound 2 II compound 2" | compound 2J | compound 2J | compound 2 | compound 2 1 compound 6| 1 compound 7J I compound 7 II compound 4 I 1 compound 5| 1 compound 5| compound 5 compound 5 Resin composition ICB-19I |CB-20| ICB-211 1 CG-2 1 I CG-3J ICB-22J ICB-231 |CB-24| [CB-25I |CB-26| ICB-271 |CB- 28| CB-29 ICB-301 CB-31 |CB-32| CB-33 CB-34 CB-35 CR-2 I CG-4 1 Example 21 Example 22 丨 Example 231 Example 24 丨 Example 25l |Example 26| |Example 27|I Example 28|I Example 29| Example 30|Example 31| |Example 32| Example 33 Comparative Example 1 Comparative Example 2 I Comparative Example 3 I Comparative Example 4 Comparative Example 5 Comparative Example 6 Comparative Example 7 Comparative Example 8 201009498 Evaluation of Surface Roughness The surface roughness was measured by AFM (Atomic Force Microscope) (Dimension 3 100, manufactured by Veeco Instruments Co., Ltd.), and the measurement area was 10 V m square. The evaluation of the surface roughness was carried out as follows. ◎ : 6 nm or less. 〇: greater than 6 nm to 8 nm or less. △: more than 8 nm to 10 nm or less. X : greater than 1 〇 nm. Evaluation of line width stability The formed pixel pattern was observed by an electric field emission type scanning electron microscope S-4800 (manufactured by HITACHI Co., Ltd.) to evaluate the line width stability. ◎: The unevenness at the end of the pattern was 0.3 μm or less, and the line width was stable. 〇: The unevenness of the pattern end is greater than 0.3/zm and is 0.8;/m or less, and the line width is large and stable. Δ: The unevenness of the pattern end is greater than 0.8#m and is less than 1.5#m, and the line width is slightly unstable. X: A stable pattern cannot be formed. Evaluation of heat resistance The substrate on which the pixel was formed was additionally baked in a clean oven at 220 ° C for 60 minutes, and a spectrophotometer MCPD manufactured by Otsuka Electronics Co., Ltd. was used. -2000 to evaluate the color change (Δ E*ab) before and after additional baking. Here, Δ E*ab means the color difference of the L*a*b* color system. It is evaluated by the change of chromatic aberration Δ E*ab値. -126- 201009498 ◎ : 1 · 5 or less. 〇: Greater than 1.5~2.5. △: more than 2.5 to 3_5 or less. X : Greater than 3.5. Table 3 shows the results of evaluation of the surface roughness of the above Examples 1 to 33 and Comparative Examples 1 to 8, evaluation of the line width stability, and evaluation of heat resistance.

-127- 201009498 【表3】-127- 201009498 [Table 3]

感光性樹脂組成物 表面粗糙度 線寬安定性 耐熱性 實施例1 CB-1 〇 〇 〇 實施例2 CB-2 〇 ◎ 〇 實施例3 CB-3 Δ ◎ 〇 實施例4 CB-4 〇 〇 〇 實施例5 CB-5 Δ 〇 〇 實施例6 CB-6 △ 〇 〇 實施例7 CR-1 〇 ◎ ◎ 實施例8 CG-1 〇 ◎ ◎ 實施例9 CB-7 〇 〇 ◎ 實施例10 CB-8 〇 ◎ ◎ 實施例11 CB-9 ◎ 〇 ◎ 實施例12 CB-10 ◎ ◎ ◎ 實施例13 CB-11 ◎ ◎ ◎ 實施例14 CB-12 ◎ ◎ ◎ 實施例15 CB-13 ◎ ◎ ◎ 實施例16 CB-14 〇 ◎ ◎ 實施例17 CB-15 ◎ ◎ ◎ 實施例18 CB-16 ◎ ◎ ◎ 實施例19 CB-17 ◎ ◎ ◎ 實施例20 CB-18 ◎ ◎ ◎ 實施例21 CB-19 〇 ◎ 〇 實施例22 CB-20 ◎ ◎ ◎ 實施例23 CB-21 ◎ ◎ ◎ 實施例24 CG-2 ◎ ◎ ◎ 實施例25 CG-3 〇 ◎ ◎ 實施例26 CB-22 ◎ ◎ ◎ 實施例27 CB-23 〇 〇 〇 實施例28 CB-24 ◎ ◎ ◎ 實施例29 CB-25 ◎ ◎ ◎ 實施例30 CB-26 ◎ ◎ ◎ 實施例31 CB-27 ◎ ◎ ◎ 實施例32 CB-28 ◎ ◎ ◎ 實施例33 CB-29 ◎ ◎ ◎ 比較例1 CB-30 X X △ 比較例2 CB-31 X X Δ 比較例3 CB-32 X X Δ 比較例4 CB-33 Δ Δ 〇 比較例5 CB-34 〇 Δ X 比較例6 CB-35 〇 〇 X 比較例7 CR-2 〇 〇 Δ 比較例8 CG-4 〇 〇 X -128- 201009498 由表3的結果可知，使用本發明的紫外光雷射曝光用 著色感光性樹脂組成物，藉由紫外光雷射進行曝光所形成 的畫素（著色圖案），係圖案形狀及線寬安定性極良好，耐 熱性試驗所致的色變化小。 再者，可知以本發明的紫外光雷射用感光性樹脂組成 物及圖案形成方法所製作感光性樹脂組成物層之RGB著色 畫素用的表面，係非常平滑。 又，藉由本發明的紫外光雷射用感光性樹脂組成物及 典 圖案形成方法來製作，圖案之線寬安定性係變大，即便使 用小型光罩或沒有光罩而使用雷射來曝光時，製造的寬裕 度也產生，可期待生產性的提高。相對於此，可知欠缺本 發明的感光性樹脂組成物之構成的比較例，係表面粗糙度 大，而且圖案的線寬安定性差，故不適合於用雷射的曝光 方式。 再者，分別使用實施例及比較例所製作完成的彩色濾 光片，組裝液晶顯示裝置，結果實施例者在暗處的漏光少 ，畫質提高。 © 而且，如實施例1〜8般，藉由對表面粗糙度有改良餘 地的樣品，從顯像處理後的基板之背面側，以雷射或水銀 燈進行100mJ/Cm2的追加曝光，然後進行後烘烤處理，表 面粗糙度皆成爲5nm以下。 【圖式簡單說明】 無。 【主要元件符號說明】 無。 -129-Photosensitive resin composition surface roughness line width stability heat resistance Example 1 CB-1 〇〇〇 Example 2 CB-2 〇 ◎ 〇 Example 3 CB-3 Δ ◎ 〇 Example 4 CB-4 〇〇〇 Example 5 CB-5 Δ 〇〇 Example 6 CB-6 △ 〇〇 Example 7 CR-1 〇 ◎ ◎ Example 8 CG-1 〇 ◎ ◎ Example 9 CB-7 〇〇 ◎ Example 10 CB- 8 〇 ◎ ◎ Example 11 CB-9 ◎ 〇 ◎ Example 12 CB-10 ◎ ◎ ◎ Example 13 CB-11 ◎ ◎ ◎ Example 14 CB-12 ◎ ◎ ◎ Example 15 CB-13 ◎ ◎ ◎ Implementation Example 16 CB-14 〇 ◎ Example 17 CB-15 ◎ ◎ ◎ Example 18 CB-16 ◎ ◎ ◎ Example 19 CB-17 ◎ ◎ ◎ Example 20 CB-18 ◎ ◎ ◎ Example 21 CB-19 〇 〇 〇 Example 22 CB-20 ◎ ◎ ◎ Example 23 CB-21 ◎ ◎ ◎ Example 24 CG-2 ◎ ◎ ◎ Example 25 CG-3 〇 ◎ ◎ Example 26 CB-22 ◎ ◎ ◎ Example 27 CB-23 〇〇〇 Example 28 CB-24 ◎ ◎ ◎ Example 29 CB-25 ◎ ◎ ◎ Example 30 CB-26 ◎ ◎ ◎ Example 31 CB-27 ◎ ◎ ◎ Example 32 CB-28 ◎ ◎ ◎ Example 33 CB-29 ◎ ◎ ◎ Comparative Example 1 CB-30 XX △ Comparative Example 2 CB-31 XX Δ Comparative Example 3 CB-32 XX Δ Comparative Example 4 CB-33 Δ Δ 〇 Comparative Example 5 CB-34 〇Δ X Comparative Example 6 CB-35 〇〇X Comparative Example 7 CR-2 〇〇Δ Comparative Example 8 CG-4 〇〇X -128- 201009498 From the results of Table 3, it is known that The coloring photosensitive resin composition for ultraviolet laser exposure of the present invention has a pixel (coloring pattern) formed by exposure by ultraviolet laser light, and has excellent pattern shape and line width stability, and is caused by heat resistance test. The color change is small. In addition, it is understood that the surface for the RGB coloring elements of the photosensitive resin composition layer produced by the photosensitive resin composition for ultraviolet laser irradiation of the present invention and the pattern forming method is very smooth. Moreover, the photosensitive resin composition for ultraviolet laser irradiation of the present invention and the pattern forming method are used, and the line width stability of the pattern is increased, and even when a small mask or a mask is used, the laser is used for exposure. The manufacturing allowance is also generated, and productivity improvement can be expected. On the other hand, in the comparative example in which the composition of the photosensitive resin composition of the present invention is lacking, the surface roughness is large and the line width stability of the pattern is poor, so that it is not suitable for a laser exposure method. Further, the color filter fabricated in the examples and the comparative examples was used to assemble a liquid crystal display device. As a result, the light leakage in the dark portion was small and the image quality was improved. © In addition, as in Examples 1 to 8, a sample having room for improvement in surface roughness was subjected to additional exposure of 100 mJ/cm 2 from a back side of the substrate after the development process by a laser or a mercury lamp, and then performed. In the baking treatment, the surface roughness is 5 nm or less. [Simple description of the diagram] None. [Main component symbol description] None. -129-

Claims (1)

201009498 七、申請專利範圍： 1. 一種紫外光雷射用著色感光性樹脂組成物，其包含（A)乙 烯性不飽和化合物、（B)黏結劑樹脂、（C)著色劑及（D)下 述通式（I)所示的光聚合引發劑：201009498 VII. Patent application scope: 1. A coloring photosensitive resin composition for ultraviolet laser, comprising (A) an ethylenically unsaturated compound, (B) a binder resin, (C) a coloring agent, and (D) The photopolymerization initiator represented by the above formula (I): ⑴ ❹ 上述通式（I)中，R及X各自獨立地表示一價取代基，A 及Y各自獨立地表示二價有機基，Ar表示芳基，n係〇 〜5的整數，當X以複數存在時，複數的X各自獨立地 表示一價取代基。 2.如申請專利範圍第1項之紫外光雷射用著色感光性樹脂 組成物，其中該（D)通式（I)所示的光聚合引發劑係通式⑴ 的Υ爲下述構造所示的光聚合引發劑：(1) ❹ In the above formula (I), R and X each independently represent a monovalent substituent, and A and Y each independently represent a divalent organic group, Ar represents an aryl group, and n is an integer of 〇~5, when X is When plural is present, the plural Xs each independently represent a monovalent substituent. 2. The coloring photosensitive resin composition for ultraviolet laser light according to the first aspect of the invention, wherein the photopolymerization initiator represented by the formula (I) is a structure of the following formula (1). Photopolymerization initiator: ❹ 置。 如申請專利範圍第1項之紫外光雷射用著色感光性樹脂 組成物，其中該（D)通式（I)所示的光聚合引發劑係下述通 式（II)所示的光聚合引發劑： -130-Set. The coloring photosensitive resin composition for ultraviolet laser light according to the first aspect of the invention, wherein the photopolymerization initiator represented by the formula (I) is a photopolymerization represented by the following formula (II). Initiator: -130- 201009498201009498 上^_通式（II)中，R &amp; X各自獨立地表示一價取代基，A 表不-價有機基’ Ar表示芳基，“系〇〜5的整數，當X 以複數存在時’複數的X各自獨立地表示-價取代基。 4. 如申請專利範圍n i項之著色感光性樹脂組成物，其中 該通式（1)中的R所示的一價取代基係可有取代基的烷 基、可有取代基的芳基、可有取代基的烯基、可有取代參 基的炔基、可有取代基的院基亞磺醯基、可有取代基的 方基亞磺醯基、可有取代基的烷基磺醯基、可有取代基 的芳基磺_、可有取代基關基、可有取代基的院氧 羰基、可有取代基的芳氧羰基、可有取代基的膦醯基、 可有取代基的雜環基、可有取代基的烷基硫羰基、可有 取代基的芳基硫羯基、可有取代基的二院基胺基擬基、 或可有取代基的二烷基胺基硫羰基。 5. 如申請專利範圍第i項之著色感光性樹脂組成物，其中鲁 該通式（I)中的X所示的一價取代基係可有取代基的烷 基可有取代基的芳基、可有取代基的烯基、可有取代 基的炔基、可有取代基的烷氧基、可有取代基的芳氧 基、可有取代基的烷基硫氧基、可有取代基的芳基硫氧 基、可有取代基的胺基、可有取代基的鹵化烷基、或在 Ν上可有取代基的醯胺基. 6. 如申請專利範圍帛！項之著色感光性樹脂組成物其中 -131- 201009498 該通式（I)中的A所示的二價有機基係可有取代基的碳數 1〜12的伸烷基、可有取代基的伸環己基或可有取代基 的伸炔基。 7. 如申請專利範圍第1項之著色感光性樹脂組成物，其中 該通式（I)中的Ar所示的芳基係可有取代基的碳數6〜30 的芳基。 8. 如申請專利範圍第1項之著色感光性樹脂組成物，其中 該通式（I)中的η係0〜2的整數。 β 9.如申請專利範圍第1項之著色感光性樹脂組成物，其中 更含有鏈轉移劑》 10. 如申請專利範圍第9項之著色感光性樹脂組成物，其中 該鏈轉移劑係Ν，Ν-二烷基胺基苯甲酸烷基酯、具有雜 環的锍基化合物或脂肪族多官能锍基化合物。 11. 如申請專利範圍第9項之著色感光性樹脂組成物，其中 相對於全部固體成分而言，該鏈轉移劑的量爲〇.〇1〜15 質量％的範圍。 ® 12.如申請專利範圍第1項之著色感光性樹脂組成物，其中 該（C)著色劑係經高分子化合物所被覆的顏料。 13.如申請專利範圍第12項之著色感光性樹脂組成物，其 中該高分子化合物係含有從下述通式（2)所示的單體而 來的聚合單位之聚合物： R1 h2c=c ⑵ ^-r2-z -132- 201009498 通式（2)中，R1表示氫原子、或取代或未取代的烷基； R2表示單鍵或2價連結基；Y表示- CO-、-C( = 0)〇-、-CONH-、·0(：( = 0)-或伸苯基；Z表示具有雜環構造的 基。 14. 如申請專利範圍第1項之著色感光性樹脂組成物，其中 相對於1 〇〇質量份的著色感光性樹脂組成物中之全部固 體成分而言，該（D)通式（I)所示的光聚合引發劑之量爲 0.5〜40質量份。 15. —種圖案形成方法，其具有： 將如申請專利範圍第1至14項中任一項之紫外光雷 射用著色感光性樹脂組成物在基板上製膜，藉由紫外光 雷射進行圖案狀曝光，使曝光區域硬化的曝光步驟，及 去除未曝光區域的顯像步驟。 16. 如申請專利範圍第15項之圖案形成方法，其中該紫外 光雷射的曝光波長爲30〇nm〜3 80nm的範圍。 17. 如申請專利範圍第15項之圖案形成方法，其中該紫外 光雷射係以20〜2000Hz的頻率所振盪的脈衝雷射。 18. —種彩色濾光片之製造方法，其中包含藉由如申請專利 範圍第15項之圖案形成方法在基板上形成著色圖案的 步驟。 19. 一種彩色濾光片’其係經由如申請專利範圍第18項之 製造方法所製造。 2 0·—種顯示裝置，其具備如申請專利範圍第19項之彩色 濾光片。 -133- 201009498 四、指定代表圖： (一) 本案指定代表圖為：無。 (二) 本代表圖之元件符號簡單說明： te。 yt、、In the above formula (II), R &amp;X each independently represents a monovalent substituent, and A represents a non-valent organic group 'Ar represents an aryl group, and 'an integer of 〇~5, when X exists in a plural number 'The plural X's each independently represent a valence substituent. 4. The colored photosensitive resin composition of claim ni, wherein the monovalent substituent represented by R in the general formula (1) may be substituted Alkyl group, aryl group which may have a substituent, an alkenyl group which may have a substituent, an alkynyl group which may have a substituted substituent group, a sulfinyl group which may have a substituent, a sulfhydryl group which may have a substituent Sulfhydryl, alkylsulfonyl group which may have a substituent, arylsulfonyl which may have a substituent, a substituent which may have a substituent, a oxycarbonyl group which may have a substituent, an aryloxycarbonyl group which may have a substituent, A substituted phosphonium group, a heterocyclic group which may have a substituent, an alkylthiocarbonyl group which may have a substituent, an arylthiomethyl group which may have a substituent, a diasterial amine group which may have a substituent Or a dialkylaminothiocarbonyl group which may have a substituent. 5. The colored photosensitive resin composition of claim i, wherein Lutongtong The monovalent substituent represented by X in (I) is an alkyl group which may have a substituent, an aryl group which may have a substituent, an alkenyl group which may have a substituent, an alkynyl group which may have a substituent, and a substituent which may have a substituent Alkoxy group, aryloxy group which may have a substituent, alkylthio group which may have a substituent, arylthio group which may have a substituent, amine group which may have a substituent, halogenyl group which may have a substituent a guanamine group which may have a substituent on the oxime. 6. A colored photosensitive resin composition as claimed in the scope of the patent application, wherein -131- 201009498 is a divalent product represented by A in the general formula (I) The organic group may have a substituent of an alkylene group having 1 to 12 carbon atoms, a cyclohexylene group which may have a substituent or an alkynyl group which may have a substituent. 7. The colored photosensitive resin of the first aspect of the patent application a composition in which the aryl group represented by Ar in the formula (I) is a aryl group having 6 to 30 carbon atoms which may have a substituent. 8. The colored photosensitive resin composition of claim 1 of the patent application, Wherein the η of the formula (I) is an integer of 0 to 2. β 9. The color-sensitive photosensitive resin composition of the first aspect of the patent application, which further contains 10. A coloring photosensitive resin composition according to claim 9, wherein the chain transfer agent is an anthracene, an alkylene group of a bismuth-dialkylaminobenzoate, a mercapto compound having a heterocyclic ring or a fat. The colored polyfunctional thiol compound according to claim 9, wherein the amount of the chain transfer agent is in the range of 〜1 to 15% by mass based on the total solid content. The colored photosensitive resin composition of the first aspect of the invention, wherein the (C) colorant is a pigment coated with a polymer compound. 13. The colored photosensitive resin of claim 12 A composition in which the polymer compound contains a polymer unit derived from a monomer represented by the following formula (2): R1 h2c=c (2) ^-r2-z -132- 201009498 Formula (2) In the formula, R1 represents a hydrogen atom, or a substituted or unsubstituted alkyl group; R2 represents a single bond or a divalent linking group; and Y represents -CO-, -C(=0)〇-, -CONH-, ·0(: (= 0)- or a phenyl group; Z represents a group having a heterocyclic structure. 14. The colored photosensitive resin composition of claim 1, wherein (D) the general formula (I) is based on 1 to 10,000 parts by mass of all the solid components in the colored photosensitive resin composition The amount of the photopolymerization initiator shown is from 0.5 to 40 parts by mass. A pattern forming method comprising: forming a film of a photosensitive photosensitive resin for ultraviolet laser light according to any one of claims 1 to 14 on a substrate, and patterning by ultraviolet laser Exposure, an exposure step for hardening the exposed area, and a developing step of removing the unexposed area. 16. The pattern forming method of claim 15, wherein the ultraviolet laser has an exposure wavelength in the range of 30 〇 nm to 380 nm. 17. The pattern forming method of claim 15, wherein the ultraviolet laser is a pulsed laser oscillated at a frequency of 20 to 2000 Hz. A method of producing a color filter comprising the step of forming a colored pattern on a substrate by a pattern forming method according to claim 15 of the patent application. A color filter' manufactured by the manufacturing method of claim 18 of the patent application. A display device comprising a color filter as in claim 19 of the patent application. -133- 201009498 IV. Designated representative map: (1) The representative representative of the case is: None. (2) A brief description of the component symbols of this representative figure: te. Yt,, 五、本案若有化學式時，請揭示最能顯示發明特徵的化學式：5. If there is a chemical formula in this case, please disclose the chemical formula that best shows the characteristics of the invention: (I)(I)
TW098122744A 2008-07-07 2009-07-06 Colored photosensitive resin composition, method of forming pattern using ultraviolet laser, method of producing color filter using the pattern forming method, color filter, and display device TW201009498A (en)

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