TW201126269A - Colored photosensitive resin composition for ultraviolet laser, pattern forming method, method for producing color filter, color filter, and display device provided with the same - Google Patents

Abstract

This invention is to provide a colored photosensitive resin composition for ultraviolet pattern forming method, method for producing color filter, color filter, and display device that is capable of forming patterns having higher line width sensitivity and excellent straightness and heat-resistance. This invention relates to a colored photosensitive resin composition for ultraviolet laser, which includes (A) colorant, (B) compound with polymerization properties, (C) photo-polymerization initiator, (D) resin, (E) surfactant. The molecules of resin (D) contain 50-90 mole% of structure unit selected from at least one of the following groups composed of: (D-1) the structure unit expressed by general formula (I) and (D-2) the structure element of N-p substituted phenyl maleimide and structure unit with acid group, and have weight-average molecular weight in the range between 10000 to 100000.

Description

I 201126269 VI. [Technical Field] The present invention relates to a coloring photosensitive resin composition for ultraviolet light laser, a pattern forming method, a method for producing a color filter, a color light-emitting sheet, and the like Display device. [Prior Art] A color-based light-film-based liquid crystal display is an indispensable component. Compared with CRTs, liquid crystal displays are smaller and more power-efficient than CRTs, and as technology advances to the same level as CRTs in terms of performance, TV screens, computer screens, and other display devices are gradually being converted from CRTs to liquid crystal displays. ‘In recent years, the development of liquid crystal displays has been carried out by the use of computers and screens with relatively small screens, and for the use of large-size images that require high image quality. In TV applications, the quality, ie contrast and color purity, is improved compared to previous screen applications. In order to improve the contrast, it is required that the color of the colored color (organic pigment or the like) used in the colored photosensitive resin composition for forming a color filter or a light sheet is further small. Further, in order to increase the color clock degree, the coloring agent (organic pigment) is required to have a higher content ratio in the solid content of the (four) photo-resin composition. A ~ Ή 又 又 σ 佩 佩 且 且 且 且 且 且 高 高 高 高 高 高 高4, to improve the dispersibility of the pigment, (5) the surface of the phthalocyanine pigment is modified with its derivative compound, so that the low molecular weight tree dispersant having a polar functional group adsorbed on the modified surface is realized as a pigment. Dispersion or even dispersion stabilization, while obtaining the pigment dispersion composition of pigment, surface modifier and dispersant, is obtained from the word I47900.doc 201126269. Thereafter, the obtained (four) sub-compound contains a male soluble resin, a photopolymerizable compound, a photopolymerization initiator, and other components to prepare a photosensitive composition, and the photosensitive composition is used for photolithography. When the color is reduced by the method, and the pigment content is improved, there is a problem that the image width of the line width is reduced (the line width is reduced) when the image pattern is formed by the photolithography method. In TV applications, it is particularly desirable to provide color calenders inexpensively, and in order to cope with the problems mainly caused by the development steps described above, it is necessary to increase the exposure amount in the exposure step, that is, to extend the exposure time. The above situation will reduce the yield and make the production change and require improvement. In order to solve the above problems, it has been proposed to improve the feeling of line width by improving the photopolymerization initiator used in the photosensitive resin composition for color filters, for example, by using a specific structure. Light of the ρ well compound = the composition of the '11' (for example, refer to the patent document υ, or the color of the mixture of the benzophenone ketone and the 9-oxo sulphate stellate compound or more or more In the organic compound obtained by adding the binder resin and the polymerizable monomer in the colored resin composition, The technique of forming a taper by calcination by specifying the molecular weight of the binder resin by an average double bond equivalent '$ (refer to Patent Document 3). Further, it is proposed to use a coloring photosensitive resin which is not used for exposure by ultraviolet light. The composition is a enamel-containing resin containing a propylene group to prepare a colored resin composition having a south sensitivity and a wide development latitude (for example, refer to 147900.doc 201126269 Patent Documents 4 and 5). · 钕山钕出. By using N-stupyl maleimide copolymer for the resin, it provides a linear composition for blue color calender with good color reproducibility (for example, refer to the patent) However, these techniques are incapable of ensuring sufficient productivity in the exposure step by ultraviolet laser exposure, and the productivity in the step is not sufficient to reduce the price of the color light-emitting sheet. In order to improve the exposure step and the development step In terms of productivity, it is proposed to perform exposure by laser light exposure (for example, the patented ray is different from the mercury lamp which is usually used, and it is expected to have the following characteristics: the linearity is high, and the output is also Larger, it is also possible to focus on the mask formed without the pattern in the exposure step. However, even with the above prior art, the surface of the pixel of the material is becoming (10), or the line width sensitivity of the pattern is insufficient. It satisfies the characteristics required for color light-emitting sheets. Moreover, as far as the total cost of color filters is reduced, as an exposure device, there is a case where a large mask is not used (for example) As described in Patent Document 8, however, specific materials are not suggested, and the industry expects to propose a material suitable for such devices. [Prior Art Document] [Patent Document] [Patent Document 1] Japanese Patent Laid-Open No. Hei 6_2896 No. Japanese Patent Laid-Open Publication No. Hei. No. 2007-93811 [Patent Document 4] Japanese Patent Laid-Open Publication No. Hei No. Hei. No. Hei. International Publication No. 2007/29871 Handbook No. 147900.doc 201126269 [Patent Document 6] Japanese Patent No. 3632532 [Patent Document 7] Japanese Patent Laid-Open No. 2003-2876 No. 14 [Patent Document 8] Japanese Patent Laid-Open No. 2008- [Patent Document 9] Japanese Laid-Open Patent Publication No. 2008-5 1866 [Draft of the Invention] [Problems to be Solved by the Invention] An object of the present invention is to provide a line width sensitivity, linearity, and heat resistance. The coloring photosensitive resin composition for ultraviolet lasers having excellent pattern and the pattern forming method using the same, and in particular to provide a coloring photosensitive resin for ultraviolet laser which is suitable for forming colored pixels of a color filter And a pattern forming method thereof. Moreover, a further object of the present invention is to provide a method for producing a color filter having a color pattern having a high line width sensitivity and further excellent heat resistance, which is obtained by the method of the present invention, and a color filter obtained by the method. A light sheet and a display device having the color filter. [Means for Solving the Problems] As a result of intensive research, the inventors have found that the above problems can be solved by the following methods. A coloring photosensitive resin composition for ultraviolet light laser containing at least (A) a coloring agent, (B) a polymerizable compound, (C) a photopolymerization initiator, (D) a resin, and (E) a surfactant The above (D) resin contains 5 〇 mol% to 90 mol% in the molecule selected from the group consisting of the structural unit represented by the following formula (1) and (D-2) having the oxime-substituted Malay. At least one structural unit consisting of a structural unit of a quinone imine group, and a structural unit having an acidic group, and 147900.doc 201126269 has a weight average molecular weight in the range of 10,000 to 100,000. (CH2CR6^- c=oo P"1 (I) °~~c-c=c R5 R2 In the formula (1), R to R5 independently represent a nitrogen atom, a dentate atom, an aryl group, an alkyl group or The aryl group, the R6 is a ruthenium atom or a methyl group. The coloring photosensitive resin composition for ultraviolet laser light according to <1>, wherein the (c) photopolymerization initiator is the following formula (II) ) the compound represented. [Chemical 2] 〇

The valence organic group 'Ar is expressed as its 1 (II) soil. n is an integer from 0 to 5. When there are a plurality of X, a plurality of Xs are independent of each other * - ^ α „ Table--valent substituents may be the same or different. &lt;3&gt; For coloring of ultraviolet lasers such as &lt;1&gt; or &lt;2&gt; In the above-mentioned (B) polymerizable compound, the compound (B) contains a polymerizable group having more than 15 or less polymerizable groups in the molecule, and contains at least one or more polymerizable groups in the molecule. The coloring photosensitive resin composition for ultraviolet lasers according to any one of the above-mentioned, which further comprises (7) a sensitizer, wherein the (F) sensitizer is The coloring photosensitive resin composition for ultraviolet laser light of any one of <2> to <4>, wherein the photopolymerization represented by the above formula („) The content of the initiator is 5 to 20 parts by mass based on 100 parts by mass of all the solid components in the color photosensitive resin combination 4 of the ultraviolet light laser. &lt;6&gt; A pattern forming method having a step of forming a layer containing a coloring photosensitive resin composition for ultraviolet laser light as small as &lt;5&gt; An exposure step of exposing the laser to a pattern and hardening the exposed region; and a developing step of removing the unexposed region, &lt;7&gt;, a pattern forming method according to &lt;6&gt;, wherein the ultraviolet laser has an exposure wavelength of 300 In the range of nm ~ 38 〇 nm. &lt;8&gt; The pattern forming method of &lt;6&gt; or &lt;7&gt;, the pulse of the ultraviolet laser system oscillating at a frequency of 20 to 2000 Hz. 9&gt; A method for producing a color light film having the following steps: a step of patterning a substrate by a pattern forming method of any of = &gt; to &lt;8&gt;. &gt; Taker Bar &lt;10&gt; Made. A color filter which is manufactured by a manufacturing method such as &lt;9&gt; 147900.doc 201126269&lt;1&gt; A display device comprising a color filter as &lt;10&gt;. In the present invention, the exposure light system uses an ultraviolet light laser. However, when the ultraviolet light laser is used as the exposure light as described above, there is a problem that the pixel surface becomes thick #, and the line width sensitivity of the pattern is insufficient. In the present invention, by using a resin having an allyl group or a maleimide group in a coloring photosensitive resin composition for pattern formation, a smooth pixel surface can be obtained, and a line width sensitivity of the pattern can be obtained. 'The pattern of excellent finernity. This effect has not yet been clarified, but it is considered as follows: by using a resin having an allyl group or a maleimide group having 5 〇 mol% or more and 90 mol% or less, heat hardening occurs after pattern formation. In combination, the decomposition of the composition at the time of baking at a temperature lower than 2 〇〇 can be reduced. In addition, it is considered that it is less likely to be affected by polymerization inhibition by oxygen during exposure, and the surface of the pixel does not become rough during the development step, and the surface of the pixel is roughened in the development step. It is presumed that the line width sensitivity is improved by these effects, and the heat resistance is excellent. The pattern. [Effects of the Invention] According to the present invention, it is possible to provide a coloring photosensitive resin composition for ultraviolet laser light which can form a pattern having high line width sensitivity and excellent linearity and heat resistance, and a pattern forming method using the same, and particularly provide A colored photosensitive resin composition for ultraviolet laser light and a pattern forming method suitable for forming a coloring pixel or the like of a color filter. Moreover, a method of manufacturing a color filter having a color pattern having a higher line width sensitivity and further excellent heat resistance using the pattern forming method of the present invention, the color filter obtained by the manufacturing method, and the color filter can be provided. A display device including the color filter. 147900.doc 201126269 [Embodiment] Hereinafter, embodiments for carrying out the invention will be described in detail. <Coloring photosensitive resin composition> The colored photosensitive resin composition for ultraviolet laser of the present invention is characterized by comprising at least (A) a coloring agent, (B) a polymerizable compound, and (C) a photopolymerization initiator. And (D) a resin, and (E) a surfactant, wherein the (D) resin has a structural unit represented by (dj) the following general formula (1), and has a molecular weight of from 50 mol% to 90 mol% in the molecule; (D-2) at least one of the structural units of the group consisting of the structural unit of the substituted maleimine group, and having a structural unit having an acidic group, and having a weight average molecular weight of 1〇〇〇 〇~1〇〇〇〇〇 within the range. Hereinafter, each constituent component of the colored photosensitive resin composition of the present invention will be described in detail. First, the (D) resin component will be described. &lt;(D) Resin&gt; The resin component used in the coloring photosensitive resin composition of the present invention is characterized in that it has a molecular weight of 50 mol% to 9 mol% selected from (D-1) a structural unit represented by the general formula (1) and at least one of the group of structural units including the n-substituted maleimine group, and a structural unit having an acidic group, and The weight average molecular weight is in the range of 10,000 to 100,000. [(D-1) A structural unit represented by the following formula (1)] [Chemical 3] 147900.doc • 11 - 201126269 2

\^J/ 6-ο R IIC——C 1 2 丨o IR.3 II R—C 4 — 5R—CIR I——〇\—/ /|\ Halogen Atom (1), R1 to R5 are independent Represents a hydrogen atom group, an alkyl group or an aryl group, and R6 represents a hydrogen atom or a methyl group. The aryl group having a carbon group or a carbon number of 5 to 10 is ri~r5 in the formula (1), and each of them is preferably a hydrogen atom, an atom, a cyano group, an alkyl group having a carbon number of 1 to 12 or a carbon number of 5, respectively. More preferably, the aryl group of 1-4 is a hydrogen atom, a bromine atom, a gas atom, a cyano group, or a carbon number. The above alkyl group may have a substituent, and as the substituent, it may be a straight chain, a chain, or a ring. The aryl group, the n-propyl group, the isopropyl group, the third butyl group, etc., preferably an alkyl group having a carbon number of 1 to 7. Further, the above aryl group may have a substituent, and examples of the substituent include a carbon number. Preferably, the alkyl group having i to 7 or the carbon number is 5 or the group is preferably a phenyl group, a sigma fluorenyl group or a phenyl group. Among these, the preferred ones of the formula (I) are R1 to R5 respectively. It is a hydrogen atom or a group, a phenyl group, or a hydroxyl atom. [(D-2) A structural unit containing a oxime-substituted maleimine group] A structural unit containing a oxime-substituted maleimine group In the case of a structural unit containing a substituted maleimine group as a partial structure, there is no particular limitation 'there may be a fluorene-substituted maleidino group on the primary bond, or a fluorene-substituted male on the bond. mince As the amine-containing ν bits -. Specific examples of substituted acyl horse I47900.doc • 12- 201126269 structural units of the alkylene group include the following structural units [Chemical Formula 4].

The (D) resin of the present invention has at least the above-mentioned structural unit selected from the group consisting of the structural unit represented by the formula (1) (1) and (D-2) having the N-substituted maleimine group. The type of structural unit may be used, or two or more types may be used. When there are two kinds of cases, it may have at least one structural unit represented by (D_i) formula (并且) and have at least one kind of structural unit containing (1)-substituted maleidinium group. Further, at least one of (D-丨) and (D-2) of two or more types may be provided. The (D) resin of the present invention contains 5 〇 mol% or more and 9 〇 mol% or less of the above (D 1) structural unit represented by the formula (1), and (1) _2) contains n-position _ substituted maleimide The structural unit of the base is preferably 5 〇 mol% or more and 8 〇 mol% or less, more preferably 6 〇 mol% or more, and 8 〇 mol% or less. If the content of the constituent unit in the above-mentioned tree is within this range, the film reduction is reduced at the time of development after exposure, and the surface smoothness and development latitude are good. Further, the resin of the present invention contains a structural unit having an acidic group. 147900.doc 13 201126269 As the structural unit having an acidic group, a structural unit derived from an unsaturated monomer having a carboxyl group can be cited. As the carboxyl group-containing unsaturated monomer, it is an unsaturated monocarboxylic acid such as (meth)acrylic acid, crotonic acid, α-chloroacrylic acid or cinnamic acid; maleic acid, maleic anhydride, fumaric acid, itaconic acid, Unsaturated dicarboxylic acid or its anhydrides such as itaconic anhydride, citraconic acid citraconic anhydride, mesaconic acid; unsaturated polycarboxylic acid or anhydride thereof having more than 3 yuan; succinic acid mono[2_(indenyl) propylene a monomethyl)propenyloxyalkyl ester of a polyvalent carboxylic acid having 2 or more elements such as methoxyethyl ester] or phthalic acid mono [2-(methyl) propylene methoxy ethoxy vinegar]; a mono(indenyl) acrylate having a polymer having a carboxyl group and a hydroxyl group at both terminals, such as a carboxypolycaprolactone mono(meth)acrylate. Among the carboxyl group-containing unsaturated monomers, succinic acid mono(2-propenyloxyacetate) and phthalic acid mono(2-propenyloxyethyl ester) are respectively μ-5300 and Μ-5400 ( The trade names of the above-mentioned East Asia Synthetic (Stock) manufacturing are available on the market. The carboxyl group-containing unsaturated monomer may be contained alone or in combination of two or more kinds in the resin. The structural unit having an acidic group is preferably derived from a carboxylic acid, a chalcogen analog of a carboxylic acid, a hydrazoic acid [RC(=NNH2)OH], and a imienoic acid [rc(=nh)oh ], sulfonic acid [rs(o)2oh], sulfinic acid [RS(0)0H], sulfenic acid [RSOH], selenate [RSe(0)2OH], selenite [RSe(〇)〇H The structural unit of the secondary acid [RSeOH], phosphoric acid and its acid-related compound, citric acid or boric acid analog is particularly preferably a structural unit derived from acrylic acid, methacrylic acid, and phosphoric acid. The (D) resin of the present invention contains a structural unit having an acidic group, and its content is 147,900.doc 14 201126269, preferably 5 mol% or more, less than 50 mol%, more preferably 10 mol% or more, relative to the resin. , 3 0% or less. When it is in this range, the surface smoothness and heat resistance at the time of development are good. The resin of the present invention may contain other constituent components in addition to the above-described respective constituent components. The other constituent components include constituent components derived from the following unsaturated monomers. Styrene, α-methylstyrene, o-vinyltoluene, m-vinylstyrene, p-vinyl anthracene, p-styrene, o-methoxy stupylene, m-decyloxystyrene, p-methoxy Styrene, o-vinylbenzyl methyl ether, m-vinylbenzyl decyl ether, p-vinylbenzyl methyl ether 'o-vinyl benzyl glycidyl ether, m-vinyl benzyl glycidyl ether, An aromatic vinyl compound such as a vinyl benzyl glycidyl scale; an anthracene such as fluorene or 1-methyl hydrazine; an oxime (meth) acrylate, an ethyl (meth) acrylate, or a propylene (meth) acrylate Ester, isopropyl (meth)acrylate, n-butyl (meth)acrylate, isobutyl (meth)acrylate, second butyl (meth)acrylate, tert-butyl (meth)acrylate, ( 2-hydroxyethyl acrylate, 2-hydroxypropyl (meth) acrylate, 3-hydroxypropyl (meth) acrylate, 2-hydroxybutyl (meth) acrylate, 3-(meth) acrylate Hydroxybutyl ester, (meth)acrylic acid butyl butyl ester, benzyl (meth) methacrylate, (mercapto) propyl Cyclohexyl acrylate, phenyl (meth) acrylate, 2-methoxyethyl (meth) acrylate, 2-phenyloxyethyl (meth) acrylate, methoxy diethylene glycol (fluorenyl) Acrylate, decyloxytriethylene glycol (decyl) acrylate, methoxypropanediol (mercapto) acrylate, methoxydipropanol (meth) acrylate, isodecyl (decyl) acrylate ,(曱基)acrylic acid 147900.doc 15 201126269 Tricyclic [5.2.1.〇2'6]decane·8-ester, 2-hydroxy-3-hydroxypropenyl (meth)acrylate, glycerol mono (methyl) ) unsaturated carboxylic acid esters such as acrylate; 2-aminoethyl (meth)acrylate, 2-dimethylaminoethane (meth)acrylate, 2-aminopropyl (meth)acrylate, 2-methylaminopropyl (meth)acrylate, 3-aminopropyl (meth)acrylate, 3-dimethylaminopropionate (meth)acrylate·#Unsaturated enemy &amp; amine-based Alkyl esters; glycidyl esters of unsaturated carboxylic acid such as glycidyl (meth)acrylate; unsaturated sulphuric Isl oxetane such as (meth)acrylic acid oxetane; Vinyl esters of vinegar, ethyl acetonate, vinyl butyrate, vinyl benzoate; unsaturated ethers such as vinyl methyl ether 'vinyl ethyl ether, allyl glycidyl ether; a cyanated vinyl compound such as methyl acrylonitrile, α-gas acrylonitrile or divinyl cyanoethylene; (meth) acrylamide, α-chloropropenylamine, hydrazine-2-hydroxyethyl (methyl methacrylate) Unsaturated guanamines such as acrylamide; unsaturated quinones such as maleimide; aliphatic, dicholine, etc.; 1,3 - butyl, isopentyl, chloroprene, etc. a macromonomer having a mono(methyl)propyl aryl group at the end of a polymer molecular chain such as styrene, poly(methyl methacrylate), poly(methyl) acrylate butyl acrylate or polyoxy siloxane The constituent components derived from the unsaturated monomers may be contained alone or in combination of two or more. Hereinafter, specific examples (M) to (1-7) and 2 to 37 of the (D) resin of the present invention are disclosed. The (D) resin of the present invention is not limited to the exemplified compounds. 147900.doc • 16 - 201126269 [Chemical 5] Composition molar ratio Weight average molecular weight 1-1 C〇r^ C〇2H 80/20 35000 1-2 Same as above 90/10 35000 1-3 Same as above 50/50 35000 1- 4 Same as above 80/20 100000 1-5 Same as above 80/20 10000 1-6 Same as above 80/20 20000 1-7 Same as above 80/20 50000 2 -(ch2-ch)-{-ch2-ch)- C=0 COOH I O-ch2-ch=ch2 80/20 35000 3 ch3 ch3 ^-ch2-c)—(-ch2—c)- C=0 COOH och2ch=ch-^^ 80/20 35000 4 -f〇H2-CH) -{CH2-CH]- C=0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 0 6 ch3 ch3 ~fCH2-〒)^(CH2-〒)- C=0 COOH I och2ch=ch CN 80/20 35000 7 CH3 ch3 -(•ch2-c)—(ch2—c}- C=0 COOH I Och2ch=ch Cl 80/20 35000 •17- 147900.doc 201126269 [Chem. 6] 147900.doc Composition Moerby c〇r^ co2h CO;

70/20/10 35000 c〇r^ c〇2h

70/20/10 35000 cof^ co2h 0 70/20/10 35000 11 12 13 15 C〇f^ co2h

OH r 70/20/10 35000 COp^ co2h 〇人〇〆,r 弋丫厂' c〇r^ 〇〇2h c〇2^L/ C〇P^ co2h

~OH 70/20/10 70/20/10 70/20/10 35000 35000 35000 C〇C^ C02H o人o Η OVN'C H" ]| ^6M12 〇c2h5 70/20/10 35000 -18- 201126269 [化7] Composition of Moerby

C〇2H 〇^〇-^〇2h4〇^-CH 70/20/10 35000 17 cof^^ C02H ο八 oh 70/20/10 35000

Cof^' C〇2H

70/20/10 35000 C〇f^

70/20/10 35000 cof^ C〇2H 〇&lt;

OH 70/20/10 35000 21 cop^ co2h

0=P-0H I OH 70/20/10 35000 22 C〇f^ C02H C〇〇^&lt;? 70/20/10 35000 23

70/20/10 35000 147900.doc -19- 201126269 [Chemical 8] Composition Mohby Weight average molecular weight 24 co2h COO 丫70/20/10 35000 25 Η ^ 0 people 乂0 c〇2H ό 80/20 35000 26 tJ ^ 0乂c〇2H ό 80/20 35000 27 ό Ύ7C〇2H ( ,,6 70/20/10 35000 28 03⁄4 ^ ό 02H 0*^^ 70/20/10 35000 29 Η β 0乂Ν^0 C( ό r ^ &quot;H C02^ 70/20/10 35000 30 ό y for o2h CO 2^0 70/20/10 35000 31 L[: ό f 〇C〇,} co2h 30/50 /20 35000 -20- 147900.doc 201126269 [Chemistry 9] 32

Composition co2h Mobi ratio 30/50/20 Weight average molecular weight 35000 33

C〇fN^ C〇2H 50/30/20 35000 34 Λ

i〇2H 50/30/20 35000 5 3 o

H 60/40 18000 36 ch2

Co2h 50/30/20 35000 7 3 o

H 30/50/20 35000 The weight average molecular weight of the (D) resin of the present invention is required to be in the range of 10,000 to 100,000, preferably in the range of 10,000 to 50,000, more preferably in the range of 10,000 to 40,000. When it is in this range, developability and linearity are good. The content of the (D) resin in the colored photosensitive resin composition of the present invention is preferably 10 mass 147900.doc 21 - 201126269 with respect to the solid content of the colored photosensitive resin composition. The range of the amount of % to 5% by mass, more preferably 15% by mass to (4% by weight), the color photosensitive resin composition of the present invention may contain a resin having a structure of (D) resin. The resin which is a structure other than the resin (1)) is a developer which can be used as a binder for the coloring agent and which is soluble in the development processing step in the production of the color calendering sheet, and particularly preferably an in-vivo developer. Further, it is not particularly limited, and is preferably a hydroxyl-based acrylic copolymer, particularly preferably a copolymer of an ethylenically unsaturated monomer having more than one carboxyl group and another copolymerizable ethylenically unsaturated monomer. . The usable amount of the resin other than the resin (D) in the colored photosensitive resin composition of the present invention is preferably not more than 5% by mass based on the total amount of the resin, and is preferably 30% by mass or less. When it is in this range, the effect of the present invention can be exhibited. The heat resistance and the line width sensitivity are preferable. In the present invention, specific examples of the resin other than the (D) resin include (meth)acrylic acid/(meth)acrylic acid decyl ester copolymer, (meth)acrylic acid/benzyl (meth)acrylate. Copolymer, (meth)acrylic acid / 2-hydroxyethyl (meth) acrylate / (meth) acrylate copolymer, (meth) acrylate / methyl (meth) acrylate / polystyrene Copolymer, (meth)acrylic acid / methyl (meth) acrylate / polymethyl methacrylate macromonomer copolymer, (meth) acrylate / (benzyl) benzyl acrylate / polystyrene macromonomer copolymer 147900.doc •22- 201126269, (meth)acrylic acid/benzyl (meth)acrylate/polymethyl methacrylate macromonomer copolymer, (meth)acrylic acid/(mercapto)acrylic acid 2-hydroxyethyl Ester/(indenyl) acrylate/polystyrene macromonomer copolymer, '(methyl)propionic acid/2-hydroxyethyl (meth)acrylate/(mercapto) acrylate/polyfluorenyl A decyl acrylate macromonomer copolymer or the like. Further, the following resin containing an epoxy ring or an oxetane ring can also be used. Stupid ethylene/mercaptoacrylic acid/mercaptoacrylic acid tricyclo [5.2.1.02,6]decane- 8-S/methacrylic acid glycidic vinegar copolymer, styrene/acrylic acid/acrylic tricyclic [5.2.1 · 02 '6】癸烧-8-ester/acrylic glycidic vinegar copolymer, benzyl methacrylate/mercaptoacrylic acid/3-(mercapto propylene fluorenyloxy) oxetane/methacrylic acid third Butyl ester copolymer, benzyl methacrylate / methacrylic acid / 3-(decyl propylene fluorenyloxy) - 3-ethyl oxetane / styrene copolymer, benzyl methacrylate / A Acrylic acid / 3-(mercapto propylene methoxymethyl) • oxetane / N-phenyl maleimide copolymer, • styrene / methacrylic acid / N-phenyl malayan Amine/Methylacrylic acid glycidyl self-assembled copolymer, styrene/acrylic acid/N-phenyl maleimide/acrylic acid glycidyl cool copolymer, stupid ethylene/mercaptoacrylic acid/N_cyclohexylmalay Imine/mercaptopropyl sulphide 147900.doc • 23· 201126269 Water glyceride copolymer, butadiene/styrene/mercaptopropionate/mercaptopropionic acid tricyclic p H 〇2,6] Decane-8-ester/mercaptopropene Glycidyl ester copolymer, butyl dithiol/mercapto-acrylic acid/mercapto-acrylic acid tricyclo[5 2丨〇2,6] 癸院·8_ ester/mercapto-acrylic acid glycidyl ester copolymer, benzene Ethylene/methacrylic acid/mercaptoacrylic acid tricyclo[5 2 1〇2,6]癸8_ester/methacrylic acid-6,7-epoxyheptyl ester copolymer, styrene/acrylic acid/maleic anhydride/ Mercaptoacrylic acid_6,7·epoxyheptyl ester copolymer, butyl methacrylate/acrylic acid/maleic anhydride/methacrylic acid_6,7_epoxyheptyl ester copolymer, styrene/methacrylic acid/ Methyl methacrylate/glycidyl methacrylate copolymer, p-nonyl styrene/mercapto acrylate/cyclohexyl acrylate/glycidyl acrylate copolymer methacrylate/styrene/(fluorenyl) Benzyl acrylate/Ν-phenylmaleimide copolymer, (meth)acrylic acid/succinic acid mono[2-(methyl)propenyloxyethyl]/styrene/benzyl (meth)acrylate /Ν-phenylmaleimide copolymer, (meth)acrylic acid / succinic acid mono [2-(methyl) propylene methoxyethyl ester; | / styrene / allyl (meth) acrylate / Ν-phenyl maleimide Polymer (mercapto) acrylic acid / styrene / benzyl (meth) acrylate / glycerol mono (meth) acrylate / Ν - phenyl maleimide copolymer, (meth) acrylic acid / ω - carboxyl group Caprolactone mono(indenyl) acrylate / phenylethyl 147900.doc • 24 - 201126269 Benzene / (mercapto) benzyl acrylate / glycerol imidate copolymer. Mono(indenyl)acrylate/N_phenylmalay &lt;(A) Colorant&gt; The colored photosensitive resin composition of the present invention contains (A) a colorant. As a coloring agent, it is suitable to use the remaining ^ #k and use the 枓 and 枓. From the viewpoint of heat resistance and the like, it is more preferably a pigment. The pigment of the colorant may be an inorganic pigment, or a pigment which is preferably a small particle size as small as possible in terms of obtaining an organic pigment. The average particle size is preferably in the range of nm to 100 nm, more preferably in the range of 1 〇 nm to 50 nm. The coloring photosensitive resin composition used in the present invention is a polymer dispersing agent, and even if the size of the pigment is small, the dispersibility and the dispersion stability are good, because even if the film thickness is thin, A colored pixel excellent in color purity is formed. Further, in the present invention, in the pigment contained in the colored photosensitive resin composition, it is preferred that the ratio of the primary particle diameter to less than 2 μη 2 pigment is less than 10% in the total amount of the pigment, and the primary particle diameter exceeds 〇. The ratio of the pigment of 〇8 μιη is less than 5 〇/0 in the total amount of the pigment. By making the ratio of the pigment having a primary particle size of less than 〇·02 μηι less than 1%, the heat resistance can be improved and the chromaticity change can be prevented; by making the ratio of the pigment having a primary particle diameter exceeding 〇μηι less than 5% The contrast can be made good, the stability of the colored photosensitive resin composition over time is good, and foreign matter failure can be prevented. In terms of heat sensitivity and prevention of chromaticity change, the ratio of the primary particle diameter of less than 147900.doc •25·201126269 0.02 μπι is preferably less than 5%. From the viewpoint of optimizing the contrast, the ratio of the secondary particle diameter exceeding (10) is preferably less than 3%.一次 The primary particle size of the pigment can be measured using ΤΕΜ (transmission electron microscope). That is, 'analyze the image of the sputum and investigate the particle size distribution, thereby measuring the primary particle size of the pigment." For example, by measuring the total number of particles in the pulverized material at 3 to 1 million times, .〇2(4) and the number of particles of the pigment exceeding 〇〇8' Τ Master the particle size distribution. More specifically, a photomicrograph of a pigment powder was observed by a transmission electron microscope at a magnification of 3 to 100,000 times, and the long diameter of one --person particle was measured, and it was calculated that it did not reach (2 (four) and exceeded 〇 (four). The ratio of primary particles. The position of the pigment powder was changed, and the operation was carried out at a total of three places to obtain an average value. Examples of the inorganic pigment which can be used as a coloring agent for forming a color pattern (colored pixel) include a metal compound such as a metal oxide or a metal salt, and specific examples thereof include iron, cobalt, aluminum, cadmium, lead, copper, and titanium. a metal oxide such as magnesium, chromium, zinc or bismuth, or a composite oxide of the above metals. Examples of the organic pigment include CI·Pigment Red 1, 2, 3, 4, 5, ό, 7, 9, 1 〇, 14, 17, 22, 23, 31, 38, 41, 48:1. 48 : 2, 48:3, 48: 4, 49, 49.1, 49 . 2 , 52:1 , 52 : 2 , 53:1 , 57:1 , 60:1 , 63:1 , 66 67 , 81:1 , 81: 2, 81:3, 83, 88, 90, 105, 112, 119, 122, 123, 144, 146, 149, 150, 155, 166, 168, 169, 170, 171, 172, 175, 176 , 177 , 178 , 179 , 184 , 185 , 187 , 188 , 190 , 200 , 202 , 206 , 207 , 208 , 209 , 147900.doc -26 · 201126269 210 ' 216 ' 220 ' 224 ' 226 ' 242 , 246 ' 254 ' 255 , 264 , 270 ' 272, 279 ' CI Pigment Yellow 1, 2, 3, 4, 5, 6, 10, 11, 12, 13, 14, 15, 16, 17, 18, 20, 24, 31 , 32, 34, 35, 35:1, 36, 36:1, 37, 37:1, 40, 42, 43, 53, 55, 60, 61, 62, 63, 65, 73, 74, 77, 81 , 83, 86, 93, 94, 95, 97, 98, 100, 101, 104, 106, 108, 109, 110, 113, 114, 115, 1 16 , 117 , 118 , 119 , 120 , 123 , 125 , 126 , 127 , 128 , 129 , 137 , 138 , 139 , 147 , 148 , 150 , 151 , 152 , 153 , 154 , 155 , 156 , 161 , 162 , 164 , 166 , 167 ' 168 , 169 , 170 , 171 , 172 , 173 , 174 , 175 , 176 , 177 , 179 , 180 , 181 , 182 , 185 , 187 , 188 , 193 , 194 , 199 , 213 , 214 CI Pigment Lights 2, 5, 13, 16, 17: 1, 31, 34, 36, 38, 43, 46, 48, 49 '51, 52, 55, 59, 60, 61, 62, 64, 71, 73 CI Pigment Green 7, i〇, 36, 37, 58 CI Pigment Blue 1, 2, 15, 15:1, 15:2, 15:3, 15:4, ι5.6, 16, 22, 60 '64, 66 79. Change the substituent of 79 to (10), 80 C·1. Pigment Violet 1, 19, 23, 27, 32, 37, 42 CI Pigment Brown 25, 28, and the like. Among these, as the pigment which can be preferably used, the following are mentioned. However, the present invention is not limited to these. 147900.doc -27· 201126269 CI pigment yellow u, 24, 108, 109, 110, 138, 139, 150, 151, 154, 167, 180, 185 CI pigment dial 36, 71 cI pigment red 122, 150, 171, 175, 177, 209, 224, 242, 254, 255, 264 CI Pigment Violet 19, 23, 32 CI Pigment Blue I5: i, 15:3, 15:6, 16, 22, 60, 66 CI Pigment Green 7, 36, 37, 58 These organic pigments may be used singly or in combination for the purpose of improving color purity. Specific examples of the combination are disclosed below. For example, as the pigment for the red phase (R), an anthraquinone pigment, an anthraquinone pigment, a diketone pyrrole and a pyrene pigment may be used alone, or at least one of these may be used together with a disazo yellow pigment. a mixture of an isoporphyrin yellow pigment, a quinucone-based yellow pigment, or a mixture of an anthraquinone red pigment, an anthraquinone red pigment, and a diketopyrrolopyrrole red pigment. For example, C 丄 Pigment Red 177 is exemplified as the pigment of the brewing system, CI Pigment Red 155 and CI. Pigment Red 224 are exemplified as the flower pigment, and Pigment Red 254 is exemplified as the diketopyrrolopyrrole pigment; In terms of color reproducibility, it is preferably mixed with C.1·Pigment Yellow 139 or CI·Pigment Red 177. In addition, the quality of red pigments and other pigments is better than 5~100:80. When it is 1 or less: 4 or less, it is difficult to suppress the (10) to 鸠 (10), and the transmittance may not improve the color purity. Further, when it is 1 00:8 or more, the coloring ability may be lowered. In particular, the above mass ratio is preferably 100:10~1GG:65F. Furthermore, in the case of the combination of the color-collecting pigments 147900.doc •28- 201126269, the adjustment can be made according to the chromaticity. Further, as the pigment for the green phase (6), the "green crystal pigment" may be used alone, or it may be used together with a disazo yellow yellow, 18 (four) yellow pigment, a sub-f-azo yellow pigment or an iso-t-line. Mixing of yellow pigments. For example, CJ Pigment Green 7, %, 37, Μ and ^. Pigment Yellow 138, CJ. Pigment Yellow 139, C·!. Pigment Yellow (4) Heart·Pig Yellow 180 or Mixing of CI Pigment Yellow 185. From the viewpoint of obtaining sufficient color purity and suppressing deviation of the target color, the quality of the green pigment and the yellow pigment is preferably 1 0 0:5 ~ 1 〇〇: 15 0. In the temporary county,, ',, quality, especially good for the range of 10〇··3〇~ΐ〇〇·ΐ2〇. As a pigment for the blue phase (Β), g-based pigment can be used alone. Or use a mixture of eight and - 7 p well rabbit color pigments. For example, it is preferred to mix CI pigment f 15:6 with C.1·Pigment Violet 23. The quality of blue pigment and purple pigment is better. _: 5 〇, more preferably 100: 5 〜 1 () 0: 30. (4) The coloring agent in the colored photosensitive resin composition of each month contains = denier. The total solid content (mass) of the material is preferably 15% = 〇 to 75% by mass. More preferably, it is 20% by mass to 70% by mass. If the content of the coloring agent is within the above range, the color concentration is sufficient. In the present invention, it is particularly preferable to use an organic pigment as a coloring agent and to use a polymer compound to be coated with a finening step or a dispersion step. The polymer compound is coated with a pigment, and the finely pigmented pigment can also be used: it can inhibit the formation of two aggregates and the pseudo-particles 147900.doc • 29- 201126269 The dispersion of the state of the sub-distribution improves the coated pigment and stabilizes The coated pigment having excellent dispersion stability of the dispersed primary particles is maintained. The coated pigment according to a preferred embodiment of the present invention is obtained by coating a pigment with a polymer compound, but the coating is applied to a surface produced by miniaturization. The new interface of the pigment having a higher activity than the pigment has a strong electrostatic interaction with the polymer compound having a heterocyclic ring in the side chain, and the polymer compound is firmly formed into two layers. In the present invention, even if the pigment after the coating treatment is washed with an organic solvent capable of dissolving the polymer compound, the polymer compound coated is hardly released. In the invention, the stomach-coated pigment is a coating of a polymer compound such as an organic pigment, which has a polar group having a polar group such as a heterocyclic ring, and is strongly coated with a surface of the pigment particle by the polymer compound. Part or all of it can exert a higher dispersion stability effect, unlike the general polymer dispersant adsorbed on the pigment. The coated state can be confirmed by using an organic solvent as shown below Wash, measure high score: free amount of compound (free rate). That is, after the high-adsorption adsorption of the high-mass compound is carried out by washing with an organic solvent, most of the (4) Gan Gu is removed. However, as the surface-coated surface of the present invention, the liberation rate is extremely small, and is 30. %the following. The amount of 1-methoxy-2-propanthene, and the main-soil 4 + was utilized. With a flaw, the pigment is treated first, and the free is calculated.

5, the pigment 10 g was put into j _ formazan I 1 , etched m VIII main methoxy-2-propanol loo mL using a vibrating machine at room temperature for 3 hours off the machine, 〇, _ ah under 8 drop 'Using centrifugation to make Yanke sedimentation, from the dry method 147900.doc -30- 201126269 supernatant solid part of the composition of the ingredients' to determine the polymer from the pigment free In the substance quality, the liberation rate (%) was calculated from the ratio of the mass of the polymer compound used for the coating treatment. . The liberation rate of the pigment can be determined by the following method. That is, after dissolving all the pigments by a solvent capable of dissolving the pigment (for example, dimethyl sulphur, dimethylformamide, formic acid, sulfuric acid, etc.), the polymer is used to pulverize the polymer by an organic solvent. The knife compound is separated from the pigment, and the "quality of the two molecules used in the coating treatment" is calculated. In addition, use as above! - The amount of free radical obtained by the amount of free radical obtained from the pigment-free high-knife nucleating material is divided by the mass of the polymer compound used for coating treatment, and the liberation rate is determined (%) ). The smaller the liberation rate, the stronger the pigment is coated with the polymer compound, and the better the dispersibility is. The range of the liberation ratio is preferably %% or less, more preferably 20% or less, and most preferably 15% or less. The ideal is (4). Preferably, a coating treatment is carried out simultaneously with the miniaturization step of _, specifically, a ' t is carried out by adding: 丨) pigment, (1) a water-soluble inorganic salt, a small amount of water-soluble organic substance substantially insoluble ii} a solvent, a polymer compound, a step of mechanical kneading by a kneading machine or the like (referred to as a salt milling step), in which a mixture is poured into water, and a high-speed mixer or the like is used to prepare a _ shape; The material aggregate is subjected to a step of washing and washing as needed. The following steps are specifically described in the following paragraphs. First, a small amount of the (four) agent is added to the mixture of the cerium organic pigment and the water-soluble linear salt. The water-soluble organic solvent is kneaded by a kneader or the like, and the mixture is put into water by I47900.doc -31 · 201126269, and is mixed with an ancient "(4) machine to obtain a slurry. Next, The slurry is subjected to hydrazine filtration, water washing, and drying as needed: a finely refined pigment. Further, when it is used in an oil varnish, it can also be used as a flashing side. The method of treating the pigment (called a cake) removes the water, and disperses it into the oil varnish. Further, when it is dispersed into the water varnish &gt; μ π τ 夂匮 shape, the treated pigment does not need to be dried by the lamp, and The filter cake is directly dispersed into the varnish. When salt milling, by using the above iH) organic solvent and iv) polymer compounding less: partially soluble resin), a more fine, and surface-based compound can be obtained (IV) At least a part of the pigment is coated with less pigment. When the coating is dried: the two (nine) polymer compound may be added at the beginning of the salt milling step, or may be added by knife cutting. It may also be added in the dispersion step. The polymer compound to be used may be any one having an adsorptivity base to a pigment. It is preferably a polymer compound having a heterocyclic ring in a side chain. As such a polymer compound, for example, it is possible to use: In the case of the above-mentioned coated paint, the above-mentioned [0044]~[〇〇47] of the Japanese Patent Publication No. 2009-62457 , at least one of the better powders The pigment is dispersed and used in the form of a pigment dispersion composition. By containing the dispersant, the dispersibility of the pigment can be improved. &gt; As the dispersing agent, for example, a known active agent can be suitably selected. In terms of 'a variety of compounds can be used, for example, 』 j j. Organic 矽 oxygen 147900.doc • 32· 201126269 alkane ΚΡ 341 (manufactured by Shin-Etsu Chemical Co., Ltd.), (meth)acrylic (co)polymer Polyfl 〇w No.75, No.90, No.95 (the above is manufactured by Kyoeisha Chemical Industry Co., Ltd.), w〇〇1 (manufactured by Yusho Co., Ltd.), and other cationic surfactants; Lauryl ether, polyoxyethylene stearyl, polyoxyethylene oleyl ether, polyoxyethylene octyl phenyl ether, polyoxyethylene hydrazine base, polyethylene glycol dilaurate, polyethylene glycol Nonionic surfactants such as fatty acid vinegar and sorbitan fatty acid ester; anionic surfactants such as w〇〇4, W005, W017 (above, manufactured by Yushang Co., Ltd.); 46, £卩1&lt;: eight-47, £? 〖eight-47 ugly eight, £? 八八-

Polymer 100, EFKA-Polymer 400, EFKA-Polymer 401, EFKA-Polymer 450 (above manufactured by Ciba Specialty Chemicals), Disperse Aid 6, Disperse Aid 8, Disperse Aid 15, Disperse Aid 9 100 (above manufactured by San Nopco) ) a polymeric dispersant;

Solsperse 3000, 5000, 9000, 12000, 13240, 13940, 17000, 24000, 26000, 28000 and other Solsperse dispersants (above are manufactured by Sakamoto Lubrizol (share)); Adeka Pluronic L3 1, F38, L42, L44, L61, L64, F68, L72, P95, F77, P84, F87, P94, L101, P103, F108, L121, P-123 (the above are manufactured by ADEKA (share)) and Isonet S-20 (manufactured by Sanyo Chemical (stock)), Disperbyk 101, 103, 106, 108, 109, 111, 112, 116, 130, 140, 142, 161, 162, 163' 164, 166, 167, 170, 171, 174, 176, 180, 182, 2000, 2001 2050, 2150 (above 8 丫 〇 ^ 11 ^ (share) company). Further, a propylene 147900.doc • 33·201126269 n, a polymer or the like, or a molecular group having a polar group or a side compound having a polar group may be mentioned. The content of the dispersant in the pigment dispersion composition is preferably W00% by mass, more preferably 3 to 7 Å by mass, based on the mass of the pigment. A pigment derivative may be added to the above pigment dispersion composition as needed. By dispersing a part having affinity with a dispersant or a pigment having a polar group on the surface of the pigment and using it as a adsorption point of the dispersant, the pigment can be dispersed as a fine particle to the photosensitive resin. The composition is prevented from re-aggregating, and a transparent filter having a high contrast can be effectively formed. The pigment is specifically a compound in which an organic pigment is used as a matrix and an acid group or an organic group or an aromatic group is introduced as a substituent in the side chain. Specific examples of the organic pigment include hydrazine. Hey. A ketone-based pigment, an ugly-based pigment, an azo-based pigment, a quinophthalone-based pigment, an iso-dosyl-based pigment, an iso-p-porphyrin-based pigment, a phthalocyanine pigment, a diketone D ratio, a slightly parallel pigment, Benzo-flavored salvia pigments, etc. Also included are pale yellow aromatic polycyclic compounds which are not commonly referred to as pigments, such as Tsai, onion, and three-calling 'Salina. As a pigment derivative, it is possible to use: Japanese Patent Laid-Open Publication No. H-49974, Japanese Patent Laid-Open Publication No. Hei No. Hei. No. Hei. No. Hei. No. Hei. Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. The bulletin and other contentants are recorded. 147900.doc -34- 201126269 The content of the pigment derivative in the pigment dispersion composition is preferably (four) mass%, more preferably 3 to 2 mass%, based on the pigment. If the content is within the above range, the degree of suppression can be lowered, and the dispersion can be performed well, and the dispersion after dispersion can be improved (4), and excellent color characteristics with high transmittance can be obtained, and when a color calender sheet is produced, Good color contrast. For example, the method of dispersing the pigment can be carried out by mixing the pigment-dispersing agent in advance, dispersing in advance (four), f (four), and using a bead dispersing machine such as bead or the like for the obtained person. In the present invention, when a dye is used as a coloring agent, a colored photosensitive resin composition which can be uniformly dissolved can be obtained. As the coloring agent, there is no particular limitation, and it can be used for color filtration. A known dye for the use of a light sheet, for example, Japanese Patent Laid-Open Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. - No. 11614, Japanese Patent No. 25,922, No. 7, U.S. Patent No. 4,8,8,5,1, U.S. Patent No. 5,667,92 (), U.S. Patent No. 5, 〇59,5G Japanese Patent Laid-Open Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. Hei. No. Hei. Japanese Laid-Open Patent Publication No. Hei. No. 4,249,549, Japanese Patent Laid-Open Publication No. Hei. No. Hei. No. Hei. No. Hei. Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. 8-29771, Japanese Patent Laid-Open No. Hei. Japanese Patent Laid-Open No. 62416, Japanese Patent Laid-Open No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. 2002-14221, Japanese Patent Laid-Open No. Hei No. Hei. Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. The dye described in the above. As the chemical structure, "» benzazole azo, anilinoazo, diphenylnonane, anthraquinone, acridone, benzylidene, oxygen Lanthanide, pyrazolotriazole azo, pyridone azo, cyanine, phenothiline, bis-oxazolyl azo, galaxies, phthalocyanines, benzopyrans (B) polymerizable compound&gt; The coloring photosensitive resin composition for ultraviolet laser exposure of the present invention contains (B) a polymerizable compound. The polymerizable compound which can be used in the present invention is an addition polymerizable compound having at least one ethylenically unsaturated double bond, and can be selected from compounds having at least one, preferably two or more terminal ethylenically unsaturated bonds. . Such a compound group is widely known in the industrial field, and the present invention can be used without any particular limitation. These include, for example, the following chemical forms: monomers, prepolymers, i.e., dimers, trimers, and oligomers, or mixtures thereof, and the like. Examples of the monomer and the copolymer thereof include unsaturated acid (for example, acrylic acid, methacrylic acid, itaconic acid, crotonic acid, butyl 147900.doc • 36·201126269 acid, maleic acid, etc.) or The esters and guanamines are preferably those which use an unsaturated carboxy hydrazine and a 7C alcohol compound, an unsaturated acid and an aliphatic polyamine compound. Also suitable for use. Addition of unsaturated carboxylic acid esters or guanamines having a nucleophilic substituent such as a hydroxyl group, an amine group or a cyclyl group to a monofunctional or polyfunctional isocyanate or epoxy group The product and a product obtained by dehydration condensation reaction with a monofunctional or polyfunctional carboxylic acid. Further, an addition reaction of an unsaturated carboxylic acid ester having an electrophilic substituent such as an isocyanate group or an epoxy group or an oxime amine with a monofunctional or polyfunctional alcohol, an amine or a thiol is also suitably used. And a substituted carboxylic acid ester having a detachable substituent such as a halogen group or a sulfonyloxy group or a substituted reactant of a monofunctional or polyfunctional alcohol, an amine or a thiol. Further, as another example, a compound group obtained by replacing the above unsaturated carboxylic acid with an unsaturated phosphonic acid, styrene or vinyl ether may be used. Further, in the present specification, acrylate and methacrylate are described as (mercapto) acrylate. Specific examples of the monomer of the ester of the aliphatic polyol compound and the unsaturated carboxylic acid are referred to as (mercapto) acrylate, and ethylene glycol bis(meth)acrylate or triethylene glycol is preferred. Alcohol (indenyl) acrylate, 1,3-butanediol di(indenyl) acrylate, 1,4-butanediol di(indenyl) acrylate, propylene glycol di(meth) acrylate, neopentyl Diol bis(indenyl) acrylate, trimethylolpropane, alkane tris(mercapto) acrylate, trishydroxypropyl propane tris((meth)propenyl propyl)ether, trishydroxymethyl Alkane (mercapto) acrylate, hexanediol di(meth) acrylate vinegar, 1,4-cyclohexanediol bis(indenyl) acrylate vinegar, tetraethylene 147900.doc -37- 201126269 Alcohol bis(mercapto) acrylate, pentaerythritol bis(indenyl) acrylate, pentaerythritol tri(meth) acrylate, pentaerythritol tetra (meth) acrylate, dipentaerythritol di(decyl) acrylate, dipentaerythritol five ( Mercapto) acrylate, dipentaerythritol hexa(meth) acrylate, sorbitol triacrylate , sorbitol tetrakis(meth) acrylate, sorbitol penta (meth) acrylate, sorbitol hexa(meth) acrylate, tris((mercapto) propylene methoxyethyl) isocyanuric acid Acid ester, polyester (meth) acrylate oligomer, isocyanuric acid EO modified tris(fluorenyl) acrylate, bisphenol A di(meth) acrylate, bisphenol A bis(indenyl) acrylate E〇 modified body, trishydroxypropyl propane tri(meth)acrylate, trimethylolpropane tris((meth)acryloxypropyl)ether, trimethylolethane tris(fluorenyl) Acrylic vinegar, tetraethylene glycol bis(indenyl) acrylate, pentaerythritol diacrylate, pentaerythritol tris(decyl) acrylate, quaternary tetraol tetra(indenyl) acrylic acid § 曰, pentaerythritol tetra (methyl) Acrylate, pentaerythritol tetraacetic acid EO modified product, dipentaerythritol hexaacrylate E 〇 modified body, and the like. As the itaconate, there are ethylene glycol diitaric acid ester, propylene glycol II itaconate, 1,3-butylene glycol isaconate, L4-butanediol diitaconate, hydrazine, 4 • Butanediol diitaconate, pentaerythritol diitaconate, sorbitol tetraconate, and the like. Examples of the butenoate include ethylene glycol dimethyl acrylate, hydrazine, 4-butylene glycol bis acrylate, pentaerythritol dimethyl acrylate, and sorbitol tetrabutyl sorbate. Examples of the methacrylate include ethylene glycol dimethacrylate, quaternary phosphonol monomethacrylate, and sorbitol tetraisobutyl acrylate. As a Malay 夂 曰 乙 乙 乙 乙 曰 曰 曰 曰 曰 曰 曰 曰 曰 马 马 马 马 马 马 马 马 马 马 马 马 马 马 马 马 马 马 马 马 马 马 。 。 。 。 。 。 。 。 。 147900.doc •38· 201126269 乍 其他 其他 ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' ' 脂肪 脂肪 脂肪 脂肪 脂肪 脂肪 脂肪 脂肪 脂肪 脂肪 脂肪 脂肪 脂肪 脂肪 脂肪 脂肪 脂肪 脂肪 脂肪 脂肪 脂肪 脂肪 脂肪 脂肪 脂肪 脂肪 脂肪 脂肪 脂肪 脂肪 脂肪Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. Those having an amine group and the like. Further, as a specific example of the grass of the aliphatic polyamine compound and the unsaturated tartile amine, there are methylene bis acrylamide, methylene bis decyl acrylamide ' 1,6 hexane propylene Amidoxime, hydrazine, 6-hexyl dimethyl decylamine, diethylenetriamine tripropylene decylamine, phthaldimethyl bis decyl decylamine, benzodimethyl bis methacrylamide, and the like. Preferred examples of the other amide-based monomer include those having a cyclohexylene structure described in Japanese Patent Publication No. Sho 54-21726, and the use of isocyanide (tetra) and a base group are also suitably used. The urethane-based addition-polymerizable compound produced by the reaction, as described in Japanese Patent Publication No. Sho 48-417G8, has two or more isocyanate groups per molecule. The polyisocyanate compound is a compound obtained by adding a vinyl group-containing monomer represented by the following formula (V), and a vinyl urethane compound containing two or more polymerizable vinyl groups in the molecule. CH2=C(R4)CO〇CH2CH(R5)〇H (V) (wherein 'R4 and R5 each independently represent η or CH3). In addition, it is also suitable to use: Japanese Patent Laid-Open No. Sho. 5, No. 3, No. 3, No. 3, 293, Japanese Patent Laid-Open No. Hei 2-32293, Japanese Patent Publication No. Hei. Amino formic acid is intended for use in the category of acrylic acid, and is disclosed in Japanese Patent Publication No. Sho 58-49860, Japanese Patent Publication No. Sho. No. sho. No., Japanese Patent Publication No. Sho 62.39417, Japanese Patent Special Publication No. Sho. The urethane carboxylic acid compound having an epoxy group (tetra) or a skeleton described in the above. Further, the addition polymerization having an amine group structure or a sulfide structure in the molecule described in Japanese Laid-Open Patent Publication No. SHO63-277-93 As the compound, a photopolymerizable composition having a very excellent photospeed can be obtained. Other examples include polyester acrylates and epoxy resins disclosed in Japanese Laid-Open Patent Publication No. SHO-48-64183, Japanese Patent Publication No. SHO-49-43191, and Japanese Patent Publication No. Sho. A polyfunctional acrylate or mercapto acrylate such as an epoxy acrylate obtained by reacting a resin with (meth)acrylic acid. In addition, it can be cited as follows: The specific unsaturated compound described in the Japanese Patent Publication No. Hei. No. 4,403, the Japanese Patent Publication No. Hei. K-based compound 4. Further, a structure containing a perfluoroalkyl group described in JP-A-61-22048 may be suitably used. Further, 'as a commercial product' is preferably a urethane oligomer UAS-1, UAB-140 (the above is manufactured by Sanyo Guoce Pulp Co., Ltd.), 〇ρηα (manufactured by Nippon Kayaku Co., Ltd.), UA-306H, UA-306T, UA-306I, AH-600, T-600, AI-600 (the above is manufactured by Co., Ltd.). In addition, photocurable monomers and oligomers described in Japanese Society of Associations, 乂〇 〇, pp. 7, 7, 300 to 308, 147900.doc • 40·201126269 (984) can be used. The preferred cancerous sample of the (B) polymerizable compound in the colored photosensitive resin composition of the present invention is a compound containing at least 5 or more than 5 or less polymerizable groups in the molecule of i or more. The above molecule contains one or more compounds having four or less polymerizable groups. The compound containing five or more polymerizable groups in the molecule and the compound having more than one or more polymerizable groups in the molecule are preferably the following compounds. Examples of the compound containing 5 or more and 15 or less polymerizable groups in the molecule are dipentaerythritol penta(indenyl) acrylate, dipentaerythritol hexa(methyl) acrylate, and sorbitol penta (methyl). Acrylate, sorbitol hexa(meth) acrylate, and U-6HA, U-15HA, UA-32P, UA-7200 (above, manufactured by Shin-Nakamura Chemical Co., Ltd.), TO-2248, 2349, 13 82 ( The above is manufactured by East Asia Synthesis Co., Ltd.). Further, neopentyl glycol oligomeric (mercapto) acrylate ' 1,4 - butanediol condensed (meth) acrylate, hydrazine, 6-hexane diol oligomeric (meth) acrylate, trishydroxyl The base propane oligomeric (meth)acrylic acid vinegar, pentaerythritol oligomeric (meth) acrylate, urethane (meth) acrylate, and (meth) acrylate epoxy ester contain 5 or more molecules, 15 The following (fluorenyl) propylene fluorenyl compound preferably has a molecular weight in the range of from 1,000 to 5,000 when such an oligomer is used. Examples of the compound which contains one or more and four or less polymerizable groups in the molecule include trishydroxypropyl propane tri(indenyl)acrylate and trishydroxypropylpropane PO (propylene oxide) modified tris(曱). Acrylate, trioxin propane EO (ethylene oxide) modified tri(meth) acrylate, pentaerythritol tetrakis(meth) acrylate, pentaerythritol tri(meth) acrylate, tetrahydroxymethyl hydrazine Alkane 147900.doc •41 · 201126269 (meth) acrylate, pentaerythritol tetra (meth) acrylate, bis (trimethylolpropane) tetra (meth) acrylate, ethoxylated pentaerythritol tetra (methyl) (Acrylate, etc.) A compound containing 5 or more and 15 or less polymerizable groups in one or more kinds of molecules, and one or more compounds containing more than one or four Z-polymerizable groups in the molecule. In the case of a compound containing 5 or more and 15 or less polymerizable groups in the molecule, and a compound containing at least one or more polymerizable groups in the molecule, the ratio of the compound containing more than one or more than 15 molecules is contained in the molecule. Polymerization below The compound: a compound containing i or more and 4 or less polymerizable groups in the molecule preferably has a mass ratio of 60:40 to 95:5, more preferably 70:3 〇 to 9 〇:1 〇. . The total content of the polymerizable compound in the colored photosensitive resin composition layer of the present invention is preferably 5% by mass to 55% by mass, more preferably 1% by mass to 5% by mass. 〇% by mass, better. Mass %~45% by mass. &lt;(C) Photopolymerization Initiator&gt; The colored photosensitive resin composition of the present invention contains a photopolymerization initiator. (c) The photopolymerization initiator is used for the present invention to be photosensitive by exposure light, thereby The compound which initiates and promotes the polymerization of the above (B) polymerizable compound is preferably one which absorbs the exposure wavelength of the ultraviolet laser. The (c) photopolymerization initiator is particularly preferably an oxime ester compound represented by the formula (11). [Chem. 10] 147900.doc • 42· 201126269 Ο 〇

The valence organic group 'Ar represents an aryl group. ! ^ is an integer of 〇~5. When a plurality of χ exist, a plurality of X each independently represent a monovalent substituent. The one-valent non-metal atom group represented by the above-mentioned R is preferably a monovalent valent non-metal atom group represented by R. The alkyl group which may have a substituent may have a substituent. An aryl group, an alkenyl group which may have a substituent, an alkynyl group which may have a substituent, an alkylsulfinyl group which may have a substituent, an arylsulfinyl group which may have a substituent, an alkane which may have a substituent A sulfonyl group, an arylsulfonyl group which may have a substituent, a mercapto group which may have a substituent, an alkoxycarbonyl group which may have a substituent, an aryloxycarbonyl group which may have a substituent, may have a substituent A phosphinium group, a heterocyclic group which may have a substituent, an alkylthiocarbonyl group which may have a substituent, an arylthiocarbonyl group which may have a substituent, a dialkylaminocarbonyl group which may have a substituent, may have a substitution A dialkylaminothiocarbonyl group or the like. The alkyl group which may have a substituent is preferably an alkyl group having 1 to 30 carbon atoms, and examples thereof include a methyl group, an ethyl group, a propyl group, a butyl group, a hexyl group, an octyl group, a decyl group, and a dodecyl group. , octadecyl, isopropyl, isobutyl, t-butyl, tert-butyl, ethethylpentyl, cyclopentyl, cyclohexyl, trifluoromethyl, 2-ethylhexyl, phenyl fluorenyl , 1-naphthylfluorenyl fluorenyl, 2-naphthylfluorenyl fluorene 147900.doc •43- 201126269 benzyl, 4-(p-methylaminophenylsulfonyl)phenylhydrazine methyl, 4_(p-anilinobenzene Sulfonic acid) benzyl methyl, 4-dimethylaminophenyl fluorenyl, 4-cyanobenzoyl methyl, 4-methylbenzoinyl 2 - fluorenyl benzoquinone Base, % fluorophenyl fluorenyl, 3-difluoromethylphenyl fluorenyl, 3-nitrobenzhydrylmethyl, and the like. The aryl group which may have a substituent is preferably an aryl group having a carbon number of 6 to 3 Å, and examples thereof include a phenyl group, a biphenyl group, a "naphthyl group, a 2-naphthyl group, a 9-fluorenyl group, and a 9- Phenylidene, 1-indenyl, 5-tallow tetraphenyl, i_indenyl, 2_founding, 9-fluorenyl, triphenyl, tetraphenyl, o-, m-, and p-phenyl, two Tolyl, ortho, meta, and p-cumyl, decyl, cyclopentadienyl, binaphthyl, binaphthyl, tetratetraphthyl, cycloheptatrienyl, phenyl, Dicyclopentadienylphenyl, propadienyldiyl, thiol, vinyl fluorenyl, propylene naphthyl, anthracenyl, fluorene s, hydrazino, hydrazine, hydrazine, hydrazine Sulfhydryl, phenanthryl, tert-triphenyl, fluorenyl, chopsticks, condensed tetraphenyl, lower, fluorenyl, fluorenyl, pentaphenyl, fused pentabenzene, tetraphenyl, hexaphenyl, thick Hexylphenyl, ruthenyl, fluorenyl, exemplified trinaphthyl, heptaphenyl, hexaphenyl, fluorenyl, fluorenyl, etc. As the alkenyl group which may have a substituent, the carbon number is preferably 2 to 1 Å. Examples of the alkenyl group include a vinyl group, an allyl group, a styryl group, and the like. The alkynyl group of the substituent is preferably an alkynyl group having a carbon number of 2 to 1 fluorene, and examples thereof include an ethynyl group, a propynyl group, a propargyl group, etc. As the sulfinyl sulfinyl group which may have a substituent, The alkyl sulfinyl group having a carbon number of i to 2 Å is exemplified by a mercaptosulfinyl group, an ethylsulfinyl group, a propyl sulfhydryl group, an isopropyl subgroup fluorenyl group, Butyl sulfonyl, hexylsulfinyl, cyclohexylsulfinyl, octylsulfinyl, 2_ethyl 147900.doc •44· 201126269 Hexyl sulfinyl, sulfhydryl a group, a dodecyl sulfinyl group, an octadecyl sulfinyl group, a cyanomethyl sulfinyl group, a methoxy fluorenyl sulphate, etc. as a aryl group having a substituent The sulfinyl group is preferably an arylsulfinyl group having a carbon number of 6 to 30, and examples thereof include a phenylsulfinyl group, a 1-naphthylsulfinyl group, and a 2-naphthylsulfinyl group. Indenyl, 2-chlorophenylsulfinyl, 2-methylphenylsulfinyl, 2-methoxyphenylsulfinyl, 2-butoxyphenylsulfinyl, 3- Chlorophenylsulfinyl, 3-trifluorodecylphenylsulfinyl, 3-cyanobenzene亚 醯, 3 -> 6 Schottylphenyl sulfhydryl, 4-fluorophenyl sulfite, 4-cyano sulfinyl, 4-methoxyphenyl sulfinylene 4-(p-Methylaminophenylsulfonyl)phenylsulfinyl, 4-(p-anilinophenylsulfonyl)phenylsulfinyl, 4-dimethylaminophenylsulfinyl The alkylsulfonyl group which may have a substituent is preferably an alkylsulfonyl group having a carbon number of 1 to 20, and examples thereof include a mercaptosulfonyl group, an ethylsulfonyl group, and a propylsulfonyl group. Base, isopropylsulfonyl, butylsulfonyl, hexylsulfonyl, cyclohexylsulfonyl, octylsulfonyl, 2-ethylhexylsulfonyl, decylsulfonyl &amp; The twelve carbon-based base, the eighteen carbon-based base, the cyano-based fluorenyl fluorenyl group, the decyloxymethyl sulfhydryl group, the perfluoroalkyl sulphate, and the like. The arylsulfonyl group which may have a substituent is preferably an arylsulfonyl group having a carbon number of 6 to 30, and examples thereof include a phenylsulfonyl group, a 1-naphthylsulfonyl group, and a 2-naphthalene group. Sulfosyl, 2-oxophenylsulfonyl, 2-methylphenylsulfonyl, 2-methoxyphenylsulfonyl, 2-butoxyphenylsulfonyl, 3-gasbenzene Sulfosyl, 3-trifluoromethylphenylsulfonyl, 3-cyanophenylsulfonyl, 3-nitrophenylsulfonyl, 4-fluorophenylsulfonyl, 4-cyano Phenylsulfonyl, 4-曱147900.doc -45- 201126269 Oxyphenyl phenyl, 4·(p-methylaminophenylsulfonyl)phenylsulfonyl, 4-(p-anilinobenzenesulfonate) Phenylsulfonyl, 4-dimethylaminophenylsulfonyl and the like. The fluorenyl group which may have a substituent is preferably a fluorenyl group having a carbon number of 2 to 20, and examples thereof include an ethyl fluorenyl group, a propyl fluorenyl group, a butyl group, a trifluoromethylcarbonyl group, a amyl group, and a benzamidine group. , 1_naphthylmethyl, 2_naphthyl, 4_(p-methylamino sulfonyl) benzhydryl, 4-(p-anilinophenylsulfonyl) benzhydryl, 4·- Aminophenyl fluorenyl, 4-diethylaminobenzimidyl, 2-chlorobenzoinyl, 2-methylbenzhydryl, 2-methoxybenzylidene, 2-butoxybenzene Mercapto, 3-chlorophenyl fluorenyl, 3-trifluoromethylbenzhydryl, 3-cyanobenzylidene, 3-nitrobenzhydryl, 4-fluorobenzhydryl, 4 - Cyanobenzoyl, 4-decyl benzhydryl, and the like. The alkoxycarbonyl group which may have a substituent is preferably an alkoxycarbonyl group having a carbon number of 2 to 2 Å, and examples thereof include a methoxycarbonyl group, an ethoxycarbonyl group, a propoxycarbonyl group, and a butoxycarbonyl group. And a hexyloxycarbonyl group, an octyloxycarbonyl group, a decyloxycarbonyl group, an octadecyloxycarbonyl group, a trifluoromethyloxycarbonyl group or the like. Examples of the aryloxycarbonyl group which may have a substituent include a phenoxycarbonyl group, a 1-naphthyloxycarbonyl group, a 2-naphthyloxycarbonyl group, and a 4-(p-methylaminophenylsulfonyl)phenyl group. Oxycarbonyl, 4-(p-anilinophenylsulfonyl)phenyloxycarbonyl, 4-dimethylaminophenyloxycarbonyl, 4-diethylaminophenyloxycarbonyl, 2-phenylphenyl Oxycarbonyl, 2-methylphenyloxycarbonyl, 2-methoxyphenyloxycarbonyl, 2-butoxyphenyloxycarbonyl, 3-phenylphenyloxycarbonyl, 3-trifluoromethyl Phenyloxycarbonyl, 3-cyanophenyloxycarbonyl, 3_147900.doc •46· 201126269 Nitrophenyloxycarbonyl, 4-fluorophenyloxycarbonyl, 4-cyanophenyloxy A carbonyl group, a 4-decyloxyphenyloxycarbonyl group or the like. The phosphinyl group which may have a substituent is preferably a phosphinium group having a total carbon number of 2 to 50, and examples thereof include a dimethylphosphonium group, a diethylphosphonium group, and a dipropylphosphonium group. Diphenylphosphonium fluorenyl, dimethoxyphosphonium fluorenyl, diethoxyphosphonium decyl, dim-decylphosphonium decyl, bis(2,4,6-tridecylphenyl)phosphonium fluorenyl, etc. . The heterocyclic group which may have a substituent is preferably a heterocyclic ring containing a nitrogen atom, an oxygen atom, a sulfur atom, a argon atom of a lining atom or an aliphatic group. For example, a thienyl group, a benzo[b]thienyl group, a naphtho[2,3-b]thienyl group, a thienyl group, a furyl group, an 11-pyranyl group, an isobenzofuranyl group, a benzopiperidyl group , 咄p star base, brown 4. Secchi, 2H- ° ratio σ base,. Than σ base, D m saliva, ° ratio. Sitrate, pyridyl, pyridinyl, pyrimidinyl, hydrazine, argon, isodecyl, 3H-. Bow 丨哚 base, called | 哚 base, 1H-. Borazolyl, fluorenyl, 4H-quinoline, isoindolinyl, sulfhydryl, blown ruthenium, naphthalene thiol, fluorene, hydrazine. Sitting on the Linji,. Xin Linji, dish σ base, sitting base, D card. Sit-base, β-α-carbopeptide, morphine, base, vomit. Fixed base, ° non-琳基,. Non-cultivated base, brown peas, base sigh. Guiki,. Non-morphine-based, different------- Fujiji, morphine, well, base, 11 gram base, bite base, ° ratio of 17 bases, ° ratio of 11 Linke. Sitting on the base of σ, mouth m D base Lin, ° ratio ° sitting σ fixed base, ° ratio. Sitting on the Linji, the mark σ base, the D bottom σ well base. 11 is a poly(indenyl) group, an isoindolyl group, an acridinyl group, a morpholinyl group, a 9-oxothioindole 4 group, and the like. Examples of the alkylthiocarbonyl group which may have a substituent include a mercaptothiocarbonyl group, a propylthiocarbonyl group, a butylthiocarbonyl group, a hexylthiocarbonyl group, an octylthiocarbonyl group, and a mercaptothiocarbonyl group. , octadecylthiocarbonyl, 147900.doc • 47- 201126269 trifluoromethylthiocarbonyl, and the like. Examples of the arylthiocarbonyl group which may have a substituent include a 1-naphthylthiocarbonyl group, a 2-naphthylthiocarbonyl group, a 4-(p-methylaminophenylsulfonyl)phenylthiocarbonyl group, and 4 -(p-anilinophensulfonyl)phenylthiocarbonyl, 4-dimethylaminophenylthiocarbonyl, 4-diethylaminophenylthiocarbonyl, 2-phenylphenylthiocarbonyl, 2 -nonylphenylthiocarbonyl, 2-decyloxyphenylthiocarbonyl, 2-butoxyphenylthiocarbonyl, 3-phenylphenylthiocarbonyl, 3-trifluorodecylphenylthio Carbonyl, 3-cyanophenylthiocarbonyl, 3-nitrophenylthiocarbonyl, 4-fluorophenylthiocarbonyl, 4-cyanophenylthiocarbonyl, 4-methoxyphenylthio Carbonyl group and the like. The dialkylaminocarbonyl group which may have a substituent may, for example, be a dimethylaminocarbonyl group, a diethylaminocarbonyl group, a dipropylaminocarbonyl group or a dibutylaminocarbonyl group. The dialkylaminothiocarbonyl group which may have a substituent may, for example, be a dimethylaminothiocarbonyl group, a dipropylaminothiocarbonyl group or a dibutylaminothiocarbonyl group. Among them, R is more preferably a mercapto group in terms of high sensitivity, and specifically, an ethylidene group, a propenyl group, a benzamidine group or a tolylylene group is preferable. The divalent organic group represented by the above A may, for example, be an alkylene group having a substituent of 1 to 12, a cyclohexylene group which may have a substituent, and an alkynyl group which may have a substituent. Examples of the substituent which can be introduced into the group include a halogen group such as a fluorine atom, a chlorine atom, a bromine atom or an iodine atom, an alkoxy group such as a methoxy group, an ethoxy group or a third butoxy group, and a benzene group. An aryl group such as an oxy group or a fluorenyl phenyloxy group 147900.doc _ 48 · 201126269 an alkoxycarbonyl group such as an oxy 'oxime oxycarbonyl group or a butoxycarbonyl group, an aryloxycarbonyl group such as a phenoxycarbonyl group a thiol group such as an oxy group, a propenyloxy group or a benzoquinone group; an oxime group such as a methoxy group, an ethyl fluorenyl group, a benzoinyl group, an isobutyl fluorenyl group, an acryl fluorenyl group, a methyl propylene group, or a methoxy oxa group; Aminoamine benzene sulfonyl group, p-tertylamino phenylsulfonyl group, p-anilinobenzenesulfonyl group, p-phenylphenylaminophenylsulfonyl group, etc. An alkylamino group such as a phenylsulfonyl group, a methylamino group or a cyclohexylamino group, a diammonium group, a diethylamino group, a morpholinyl group, and a oxime. a dialkylamino group such as a benzyl group, an arylamine group such as a phenylamino group or a p-tolylamino group; an alkyl group such as a methyl group, an ethyl group, a t-butyl group or a dodecyl group; a phenyl group or a p-tolyl group; Examples of the aryl group such as a diphenyl group, a cumyl group, a naphthyl group, an anthracenyl group, and a phenanthryl group include a hydroxyl group, a carboxyl group, a fluorenyl group, a fluorenyl group, a hydroxy group, a methyl group, and a phthalic acid. Gf group, amine group, nitro group, cyano group, trifluoromethyl group, trimethyl group, tridecyl decyl group, phosphonic acid subunit, phosphonic acid group, dimercapto Qiangen ion, dimethyl sulphonate ion , triphenyl benzhydryl sulphate ion and the like. Among them, as A, in terms of the sensitivity of the south, and suppressing the coloring caused by the passage of time during heating, it is preferably an unsubstituted alkylene group, an alkyl group (for example, a methyl group, an ethyl group, or a third group). a group, a dodecyl group substituted alkyl group, a dilute group (e.g., an ethyl fluorenyl group, an allyl group) substituted by an aryl group (e.g., phenyl, p-phenylene, xylyl, iso) a propylphenyl, naphthyl, anthracenyl, phenanthryl, styryl) substituted alkyl group. The aryl group represented by the above Ar is preferably an aryl group having a carbon number of 6 to 3 Å, and may have a substituent. Specific examples thereof include: phenyl, biphenyl, 丨-naphthyl, 2·naphthyl, 9_蒽147900.doc •49- 201126269, 9-phenanthryl, 1-3⁄4, 5-_tetraphenyl, i• Xueji, 2_founding, basal, triphenyl, hydrazine, ortho, meta, and p-tolyl, dimethylphenyl, o-p-isopropylidene, decyl, and diene Base, liancai^, bis-naphthyl, bis-tetracayl, gemenganone, phenyl, dicyclopentadienyl phenyl, propadienyl 1 yl, ethyl fluorenyl , propylene naphthyl, anthracenyl, fluorenyl, hydrazino, hydrazine, hydrazino, bromo, phenanthryl, co-triphenyl, fenyl, thiol, fused tetraphenyl, fluorenyl , fluorenyl, fluorenyl, pentaphenyl, pentacene, tetraphenyl, hexaphenyl, hexaphenyl, ruthenyl, fluorenyl, exemplified trinaphthyl, heptaphenyl, hexaphenyl, hydrazine蒽基, 莪基, etc. Among them, a phenyl group which is substituted or unsubstituted is preferred in terms of improving the sensitivity and suppressing the coloring caused by the passage of time during heating. In the case where the phenyl group has a substituent, examples of the substituent include a dentate group such as a deficient atom, a gas atom, a desert atom or a broken atom, a methoxy group, an ethoxy group, a third butoxy group or the like. Alkoxy, alkyloxy, p-tolyloxy-4-brothyloxy, decylthio, ethylthio, tert-butylthio, alkylthio, phenylthio, p-tolylthio An alkoxycarbonyl group such as an arylthio group, a decyloxycarbonyl group or a butoxycarbonyl group; an aryloxycarbonyl group such as a phenoxycarbonyl group; an ethoxy group such as an ethoxycarbonyl group, a propyloxy group or a phenoxy group; Base, ethyl fluorenyl, benzhydryl, isobutyl fluorenyl, propyl fluorenyl, decyl acryl fluorenyl, methoxycyanyl and the like, styrene-p-methylaminobenzene hydrazino, p-tert-butylaminobenzene Further, the arylamino phenylsulfonyl group, the p-anilinobenzenesulfonyl group, the p-nonylphenyl phenylsulfonyl group, the arylamino benzenesulfonyl group, the decylamino group, the cyclohexylamine group, etc. Alkylamino group, diammonium group, diethylamino group, morpholinyl group, N-piperidinyl group, etc. 147900.doc •50· 201126269 Alkylamino group, phenylamino group, p-tolylamino group, etc. Amino group, Alkyl groups such as butyl, butyl, dodecyl, etc., hydroxy, carboxy, fluorenyl, fluorenyl, sulfo, sulfonyl, p-toluenesulfonyl, amine, nitro, cyano, tri Fluorinyl, trichloroindenyl, tridecyldecylalkyl, phosphonic acid subunit, phosphonic acid group, trimethylammonium ion, dimercaptopurine ion, triphenyl benzamidine methyl sulphonate, etc. . In terms of sensitivity, in the general formula (II), the "S Ar" structure formed by the above Ar and the adjacent S is preferably the structure shown below. [化11]

147900.doc •51 · 201126269

The monovalent substituent represented by the above-mentioned x may, for example, be an alkyl group which may have a substituent, an aryl group which may have a substituent, an alkenyl group which may have a substituent, an alkynyl group which may have a substituent, may have a substituent Alkoxy group, aryloxy group which may have a substituent, alkylthio group which may have a substituent, arylthio group which may have a substituent, halogenated alkyl group which may have a substituent, may have a substituent on N a mercaptoamine group, an anthracene group which may have a substituent, a phenyl sulfonyl group which may have a substituent, a arylaminophenylsulfonyl group which may have a substituent, and an alkyl group which may have a substituent An aryl group which may have a substituent, an indenyl group which may have a substituent, an aryl group which may have a substituent, an fluorenyl group which may have a substituent, may have a substituent An alkoxy or aryloxycarbonyl group, an amine group which may have a substituent, an amine carboxylic group which may have a substituent, an amine group which may have a substituent, a phosphinium group which may have a substituent, may have a heterocyclic group of a substituent, a self-priming group, or the like. The alkyl group which may have a substituent is preferably an alkyl group having a carbon number of 1 to 30, and examples thereof include a methyl group, an ethyl group, a propyl group, a butyl group, a hexyl group, an octyl group, a decyl group, and a dodecyl group. , octadecyl, isopropyl, isobutyl, t-butyl, tert-butyl, 1-ethylpentyl, cyclopentyl, cyclohexyl, trifluoromethyl, 2_•52·^790〇 .d〇c 201126269 Ethylhexyl, benzamidine methyl, "naphthylmethylmethyl" 2 -naphthylmethylmethyl, 4-(p-methylaminophenylsulfonyl)phenylhydrazine methyl, 4 (p-anilinobenzenesulfonic acid) benzamidine methyl, 4-di-t-aminobenzazole methyl, 4_enyl benzoylmethyl, 4-methylbenzamide &amp;, 2 _Methylbenzoquinone, 3-fluorobenzhydryl, 3-difluoromethylbenzylidene, 3-nitroindolyl, etc. As an aryl group which may have a substituent, For example, it may be exemplified by: stupid base, phenyl group, 9-phenanthryl group, 1-mercapto group, 5-slightly stupid base-bensyl, biphenylene, o-, m-, m-, and p-cumene. Base, vegetable dinaphthyl, tetratetraphthyl, cycloheptadienyl and styryl, propadienyl, naphthyl, I, hydrazine A group, a hydrazino group, a benzyl group, a phenanthrenyl group, a triphenylphenyl group, a fluorenyl fluorenyl group, a 3 yl group, a pentaphenyl group, a fused pentacene group, a ruthenyl group, a fluorenyl group, a ternary group, a fluorenyl group, and the like. Preferred is an aryl group having a carbon number of 6 to 30, a 1-naphthyl group, a 2-naphthyl group, a 9-fluorenyl group, a 1-nonyl group, a 2-based group, a 9-fluorenyl group, and a p-tolyl group. Phenyl phenyl, p-cyclopentadienyl, binaphthyl, dilute, phenyl, dicyclopentanyl, vinyl fluorenyl, propylene hydrazino, hydrazino, onion Kun, chopstick base, fused tetraphenyl, fluorenyl, phenyltetraphenyl 'hexaphenyl, dog naphthyl, heptaphenyl, hexaphenyl hydrazine as an alkenyl group which may have a substituent, (iv) is (iv) Examples of the dilute group of 2 to 10, such as a vinyl group, an allyl group, a styryl group, etc.: an alkynyl group which may have a substituent is preferably an alkynyl group having a carbon number of 2 to exemplified by acetylene. Or alkynyl group, propargyl group, etc. As the alkoxy group which may have a substituent, the carbon number is preferably methoxy, ethoxy, propyloxy, isopropyloxylactyl, isobutyl Oxyl, second butoxy, tert-butoxy, pentyl 147900.d〇 C-53- 201126269 oxy, isopentyloxy, hexyloxy, heptyloxy, octyloxy, 2-ethylhexyloxy, decyloxy, dodecyloxy, octadecyl Alkyloxy, ethoxycarbonylmethyloxy, 2-ethylhexyloxycarbonyldecyloxy, aminocarbonylcarbonyloxy, N,N-dibutylaminocarbonylmethyloxy, N - mercaptoaminocarbonylcarbonyloxy, N-ethylaminocarbonylmethyloxy, N-octylaminocarbonylmethyloxy, N-fluorenyl-N-benzylaminocarbonylcarbonyloxy The aryloxy group which may have a substituent is preferably an aryloxy group having a carbon number of from 6 to 30, and examples thereof include a phenyloxy group. , 1-naphthyloxy, 2-naphthyloxy, 2-phenylphenyloxy, 2-nonylphenyloxy, 2-methoxyphenyloxy, 2-butoxyphenyloxy , 3- gas phenyloxy, 3-trifluorodecyl phenyloxy, 3-cyanophenyloxy, 3-nitrophenyloxy, 4-fluorophenyloxy, 4-cyano Phenyloxy, 4-decyloxyphenyloxy, 4-didecylaminophenyloxy, 4-(p-nonylaminophenylsulfonyl)phenyloxy, 4-(p-phenylene) Benzenesulfonamide acyl) phenyl group and the like. The alkylthio group which may have a substituent is preferably an alkylthio group having a carbon number of 1 to 30, and examples thereof include a mercaptothio group, an ethylthio group, a propylthio group, and an isopropylthio group. Butylthio, isobutylthio, t-butylthio, tert-butylthio, pentylthio, isopentylthio, hexylthio, heptylthio, octylthio , 2-ethylhexylthio, decylthio, dodecylthio, octadecylthio, benzylthio and the like. The arylthio group which may have a substituent is preferably an arylthio group having 6 to 30 carbon atoms, and examples thereof include a phenylthio group, a 1-naphthylthio group, a 2-naphthylthio group, and 2 -Phenylthio, 2-methylphenylthio, 2-methoxyphenylsulfide 147900.doc -54- 201126269, 2-butoxyphenylthio, 3-phenylphenylthio , 3-trifluorodecylphenylthio, 3-cyanophenylthio, 3-nitrophenylthio, 4-fluorophenylthio, 4-cyanophenylthio, 4-methyl Oxyphenylthio group, 4-dimethylaminophenylthio group, 4-(p-amidinophenylsulfonyl)phenylthio group, 4-(p-anilinophthalonitrile, fluorenyl)phenylthio group, etc. . The oxime group which may have a substituent is preferably an oxime group having a carbon number of 2 to 20, and examples thereof include an ethoxycarbonyl group, a propenyloxy group, a butoxy group, a pentyloxy group, and a trifluoro group. Mercaptocarbonyloxy, benzomethoxy, 1-naphthylcarbonyloxy, 2-naphthylcarbonyloxy and the like. The p-alkylaminobenzenesulfonyl group which may have a substituent is preferably a p-alkylaminobenzenesulfonyl group having a carbon number of 1 to 20, and examples thereof include p-aminophenylsulfonyl group and p-ethylamine. Benzosulfonyl, p-propylaminosulfonyl, p-isopropylaminophenylsulfonyl, p-butylaminobenzenesulfonyl, p-hexylaminobenzenesulfonyl, p-cyclohexylaminobenzenesulfonyl , p-octylaminobenzenesulfonyl, p-ethyl-2-aminohexylbenzenesulfonyl, p-nonylphenylsulfonyl, p-dodecylsulfonyl, p-octadecyl Amino phenylsulfonyl, p-cyanoguanidinobenzenesulfonyl, p-nonyl oxime phenylsulfonyl and the like. The arylaminophenylsulfonyl group which may have a substituent is preferably a para-arylaminosulfonyl group having a carbon number of 6 to 30, and examples thereof include p-anilinobenzenesulfonyl and p-naphthalene. Amino phenylsulfonyl, p-naphthylaminophenylsulfonyl, p-chloroanilinobenzenesulfonyl, p-methylanilinophenylsulfonyl, p-nonyloxyaniline Benzosulfonyl, p-butoxyanilinobenzenesulfonyl, p-trichloroanilinobenzenesulfonyl, p-trifluoromethylanilinobenzenesulfonyl, p-cyanoaniline Benzosulfonyl, p-trinitroanilinobenzenesulfonyl, p-fluoro-4-900749.doc -55- 201126269 anilinobenzenesulfonyl, p-cyanoanilinobenzenesulfonyl, p. -Methoxyanilinobenzenesulfonyl, p-[4-(p-methylaminophenylsulfonyl)phenylamino]benzenesulfonyl, p-[4-(p-anilinophenylsulfonyl)phenyl Amino] benzenesulfonyl, p-(4-dimethylaminophenylamino)benzenesulfonyl and the like. The alkylsulfinyl group which may have a substituent is preferably an alkylsulfinyl group having a carbon number of 1 to 20, and examples thereof include a mercaptosulfinyl group, an ethylsulfinyl group, and a propyl group. Sulfosyl, isopropylsulfinyl, butylsulfinyl, hexylsulfinyl, cyclohexylsulfinyl, octylsulfinyl, 2-ethylhexylsulfinyl, Mercaptosulfonyl, dodecylsulfenyl, octadecylsulfenyl, cyanomethylsulfinyl, methoxymethyl, and the like. The arylsulfinyl group which may have a substituent is preferably an arylsulfinylene group having a carbon number of 6 to 30, and examples thereof include a phenylsulfinyl group and a 1-naphthylsulfinyl group. 2-naphthylsulfinyl, 2-phenylphenylsulfinyl, 2-methylphenylsulfinylene, 2-decyloxysulfinyl, 2-butoxyphenyl Sulfonyl, 3-phenylphenylsulfinyl, 3-trifluoromethylphenylsulfinyl, 3-cyanophenylsulfinyl, 3-nitrophenylsulfinyl, 4 -fluorophenylsulfinyl, 4-cyanophenylsulfinyl, 4-methoxyphenylsulfinyl, 4-(p-methylaminophenylsulfonyl)phenylsulfinyl 4-(p-anilinophensulfonyl)phenylsulfinyl, 4-dimethylaminophenylsulfinyl, and the like. The alkylsulfonyl group which may have a substituent is preferably an alkylsulfonyl group having a carbon number of 1 to 20, and examples thereof include a mercaptosulfonyl group, an ethylsulfonyl group, and a propylsulfonyl group. Isopropyl sulfonyl, butyl sulfonyl, hexyl sulfonyl, cyclohexyl fluorenyl, octyl fluorenyl, 2-ethylhexyl fluorenyl, fluorenyl 147900.doc -56· 201126269 sulfhydryl, Dodecylsulfonyl, octadecylsulfonyl, cyanosulfonylsulfonyl, decyloxymethylsulfonyl and the like. The arylsulfonyl group which may have a substituent is preferably an arylsulfonyl group having a carbon number of 6 to 30, and examples thereof include a phenylsulfonyl group, a 1-naphthylsulfonyl group, and a 2-naphthalene group. Sulfosyl, 2-chlorophenylsulfonyl, 2-methylphenylsulfonyl, 2-decyloxyphenylsulfonyl, 2-butoxyphenylsulfonyl, 3-gasbenzene Sulfosyl, 3-trifluoromethylphenylsulfonyl, 3-cyanophenylsulfonyl, 3-nitrophenyl, 4-cyclophenyl, 4-n-based Phenyl continuation, 4-methoxyoxyphenylsulfonyl, 4-(p-amidophenylsulfonyl)phenylsulfonyl, 4-(p-anilinophenylsulfonyl)phenylsulfonate Base, 4-diamidophenylsulfonyl group and the like. The fluorenyl group which may have a substituent is preferably a fluorenyl group having 2 to 20 carbon atoms, and examples thereof include an ethyl fluorenyl group, a propyl fluorenyl group, a butyl fluorenyl group, a trifluoromethylcarbonyl group, a pentyl group, and a benzoinyl group. , 1-naphthylfluorenyl, 2-naphthylfluorenyl, 4-(p-amidophenylsulfonyl)phenylhydrazine, 4-(p-anilinophenylsulfonyl)phenylhydrazino, 4- Dimethylaminobenzhydryl, 4-diethylaminobenzhydryl, 2-oxobenzylidene, 2-methylbenzhydryl, 2-methoxyphenylhydrazino, 2-butyl Oxylbenzhydryl, 3-oxophenylhydrazino, 3-trifluoromethylphenylhydrazino, 3-cyanobenzoinyl, 3-nitrobenzhydryl, 4-fluorophenylhydrazine A group, a 4-cyanobenzylidene group, a 4-decyloxybenzoinyl group or the like. The alkoxy group or the aryloxycarbonyl group which may have a substituent is preferably an alkoxy group or an aryloxycarbonyl group having a carbon number of 2 to 20, and examples thereof include a decyloxycarbonyl group and an ethoxycarbonyl group. Propyloxycarbonyl, butoxycarbonyl, hexyloxycarbonyl, octyloxycarbonyl, decyloxycarbonyl, octadecyloxycarbonyl 147900.doc -57- 201126269, phenoxycarbonyl, trifluoro Methyloxycarbonyl, 1·naphthyloxycarbonyl, 2-naphthyloxycarbonyl, 4-(p-methylaminophenylsulfonyl)phenyloxycarbonyl, 4-(p-anilinophenylsulfonyl) Phenyloxycarbonyl, 4-dimethylaminophenyloxy, 4-diethylaminophenyloxycarbonyl, 2-hydroxyphenyloxycarbonyl, 2-nonylphenyloxycarbonyl , 2-methoxyphenyloxycarbonyl, 2-butoxyphenyloxycarbonyl, 3-phenylphenyloxycarbonyl, 3-trifluoromethylphenyloxy, 3-cyanobenzene Alkoxycarbonyl group, 3-nitrophenyloxycarbonyl group, 4-fluorophenyloxycarbonyl group, 4-cyanophenyloxycarbonyl group, 4-methoxyphenyloxycarbonyl group and the like. The amine mercapto group which may have a substituent is preferably an amine ketone group having a total carbon number of 丨~川, and examples thereof include Ν_methylamine carbaryl group, Ν_ethylamine mercapto group, and Propylamine-methyl fluorenyl 'Ν-butylamine fluorenyl, hydrazine-hexylamine fluorenyl, fluorenyl-cyclohexylamine carbhydryl, N-octylamine carbyl, Ν-mercaptoamine fluorenyl , octadecylamine fluorenyl, fluorenyl-phenylamine, hydrazino, hydrazine, 2-methylphenylamine, fluorenyl-2-indole-2-indole Phenylamine, mercapto, Ν_2_(2-ethylhexyl)phenylamine, mercapto-3-indolyl-3-phenylphenylcarbyl, indole-3-nitrophenylamine, mercapto, ν-3 -Cyanophenylamine-mercaptopurine-4-methoxyphenylamine fluorenyl, hydrazin-4-cyanophenylaminecarbamyl, hydrazine 4 (proline phenylsulfonyl) phenylamine Mercapto, Ν_4_(p-anilinobenzoyl), phenylaminomethyl, hydrazine, hydrazine, hydrazine, hydrazine, hydrazine, hydrazine - Dibutylamine-methyl hydrazino, hydrazine, hydrazine-diphenylamine fluorenyl and the like. The amine fluorenyl group which may have a substituent, preferably an amine % fluorenyl group having a total carbon number of 〇 〜 3 〇, for example, an amine sulfonyl group, a fluorenyl-alkylamine sulfonyl group, Ν_147900.doc -58- 201126269 Arylamine sulphate, N,N-dialkylamine aryl, n,N-diarylamine, N-alkyl-N-arylamine fluorenyl and the like. More specifically, N-methylamine sulfonyl group, N-ethylamine sulfonyl group, n-propylamine sulfonyl group, N-butylamine sulfonyl group, N-hexylamine fluorenyl group, N- Cyclohexylamine sulfonyl group, N-octylamine fluorenyl group, N-2-ethylhexylamine fluorenyl group, N-decylamine fluorenyl group, N-octadecylate amine, N- Phenylamine sulfhydryl, N-2 -nonylphenylamine, N-2-chlorophenylamine sulfonyl, N-2-decyloxyphenylsulfonyl, N_ 2- Propyloxyphenylamine fluorenyl, N-3-chlorophenylamine hydrazino, N-3-nitrophenylamine, N-3-cyanophenyl sulfonate, N- 4-nonyloxymethanesulfonyl, N-4-cyanophenylamine sulfonyl, N-4-didecylphenylamine sulfonyl, N-4-(p-amidinobenzene Sulfhydryl)phenylamine sulfonyl, N_4_(p-anilinophensulfonyl)phenylamine sulfonyl, N-fluorenyl-N-phenylamine sulfonyl, N,N-didecylamine Further, anthracenyl group, N,N-dibutylamine fluorenyl group, N,N-diphenylamine sulfonyl group and the like. The amine group which may have a substituent, preferably an amine group having a total carbon number of from 〇 to 50, is exemplified by -NH 2 , N-alkylamino group, N-arylamino group, N-decylamino group. , N-sulfonylamino, N,N-dialkylamino, N,N-diarylamine, N-alkyl-N-arylamine, hydrazine, hydrazine-disulfonylamine Base. More specifically, it may be exemplified by anthracene-fluorenylamino group, anthracene-ethylamino group, n-propylamino group, fluorenyl-isopropylamino group, anthracene-butylamino group, anthracene-tert-butylamino group, anthracene -hexylamino, fluorene-cyclohexylamino, fluorenyl-octylamino, fluoren-2-ethylhexylamino, fluorenyl-decylamino, decyl-octadecylamino, hydrazine Base, Ν-phenylamino group, Ν_2_τ-phenylphenyl group, Ν-2-chlorophenylamino group, Ν-2-nonyloxyphenylamino group, Ν-2-isopropoxyphenylamino group, Ν-2-(2-ethylhexyl)phenylamino, indole-3- 147900.doc •59- 201126269 chlorophenylamino, N-3-nitrophenylamino, N-3-cyano Phenylamino, N-3-trifluorodecylphenylamino, N-4-methoxyphenylamino, N-4-cyanophenylamino, N-4-trifluoromethylbenzene Amino group, N-4-(p-methylaminophenylsulfonyl)phenylamino, N-4-(p-anilinophenylsulfonyl)phenylamino, N-4-dimethylaminobenzene Amino, N-fluorenyl-N-phenylamino, N,N-diamine, N,N-diethylamino, N,N-dibutylamino, hydrazine, fluorenyl-diphenyl Amine, N,N-diethylhydrazino, N,N-diphenylhydrazino, anthracene, fluorene-dibutylcarbonylamino, hydrazine Ν-dimethylsulfonylamino, hydrazine, hydrazine-diethylsulfonylamino, hydrazine, hydrazine-dibutylsulfonylamino, hydrazine, fluorene-diphenylsulfonylamino, morpholinyl, 3,5·dimercaptomorpholinyl, oxazolyl, and the like. The phosphinyl group which may have a substituent, preferably a phosphino group having a total carbon number of 2 to 50, may, for example, be a dimethylphosphonium group, a diethylphosphonium group or a dipropylphosphonium group. Diphenylphosphonium sulfhydryl, dimethoxyphosphonium decyl, diethoxyphosphoryl, diphenylmethylphosphonium decyl, bis(2,4,6-trimethylphenyl)phosphonium, etc. . The heterocyclic group which may have a substituent is preferably an aromatic or aliphatic heterocyclic ring containing a nitrogen atom, an oxygen atom, a sulfur atom or a phosphorus atom. For example, there are: thienyl, benzo[b]thienyl, naphtho[2,3-b]thienyl, thienyl, furyl, indolyl, isobenzofuranyl, benzopyranyl, anthracene Indenyl, morphinyl, 2H-pyrrolyl, pyrrolyl, imidazolyl, pyrazolyl, &quot;pyridyl, pyridinyl, pyrimidinyl, hydrazine, hydrazine, isodecyl, 3H·indenyl, fluorenyl, 1H-carbazolyl, fluorenyl, 4H•quinacyl, isoquinolinyl, quinolinyl, hydrazine, naphthyridyl, quinoxalinyl, quinazoline Base, 4 phenyl group, acridinyl group, 4aH-carbazolyl, oxazolyl porphyrin 147900.doc -60- 201126269 aryl, phenidinyl, acridinyl, acridinyl, morpholinyl, brown, well Base, morphing. Well base, iso-pyrazolyl, brown. Plug-in base, isoxazolyl, furazinyl, morphine, hexyl, octyl, pyrrolidinyl, pyrrolinyl, pyrazolidinyl, 0 metre, lin, η Base, 吼. Sitting on the Linji, sent bite base, η Chen cultivating base, % 丨 朵 朵 基 基 、, 吲哚 吲哚 基 嗫, 嗫 基 base, 琳 基 、, 9- oxysulfide IT mountain 星 star base, etc. The halogen group has a fluorine atom, a chlorine atom, a bromine atom, a ruthenium atom, etc. Examples of the sulfonyl group which may have a substituent include a monomethyl group, a difluoromethyl group, a trifluoromethyl group, and a dichloromethyl group. And a trimethyl sulfhydryl group, a monobromomethyl group, a dibromomethyl group, a tribromomethyl group, etc. Examples of the fluorenylamino group which may have a substituent on N include n,N-dimethylnonylamino group and N. N-diethylguanamine group, etc. Further, the above-mentioned alkyl group which may have a substituent, an aryl group which may have a substituent, an alkenyl group which may have a substituent, an alkynyl group which may have a substituent, may have a substituent Alkoxy group, aryloxy group which may have a substituent, alkylthio group which may have a substituent, arylthio group which may have a substituent, an oxime group which may have a substituent, a para-alkyl group which may have a substituent A phenylsulfonyl group, a arylaminophenylsulfonyl group which may have a substituent, an alkylsulfinyl group which may have a substituent, an arylsulfinyl group which may have a substituent, an alkyl group which may have a substituent A sulfonyl group, an arylsulfonyl group which may have a substituent, a fluorenyl group which may have a substituent, an alkoxy group or an aryloxycarbonyl group which may have a substituent, an amine fluorenyl group which may have a substituent, The aminesulfonyl group having a substituent, the amine group which may have a substituent, and the heterocyclic group which may have a substituent may be further substituted with another substituent. Examples of such a substituent include, for example, a fluorine atom and a gas atom. Bromine 147900.doc -61 · 201126269 A halogen group such as an atom or a halogen atom, an aryloxy group such as a methoxy group such as a methoxy group, an ethoxy group or a third butoxy group; An alkoxycarbonyl group such as a methoxy group or a butoxycarbonyl group such as an aryloxycarbonyl group such as a phenoxycarbonyl group, an ethoxy group such as an ethoxycarbonyl group, a propyloxy group or a phenyl anthracene group; , phenyl fluorenyl, isobutyl fluorenyl, acryl fluorenyl, methyl propyl sulfhydryl, methoxy sulfhydryl, etc. Aromatic phenyl sulfonyl group, p-tertylamino phenyl sulfonyl group, p-anilinobenzene sulfonyl group, p-tolylamino phenyl fluorenyl group, etc. a dialkylamino group such as a methylamino group or a cyclohexylamino group, a dialkylamino group such as a dimethylamino group, a diethylamino group, a morphine group or a N-Nanthene group, a phenylamino group and a p-phenylene group. An arylamino group such as an amino group, an alkyl group such as a decyl group, an ethyl group, a tert-butyl group or a dodecyl group, a phenyl group, a p-tolyl group, a xylyl group, a cumyl group, a naphthyl group or a fluorenyl group. An aryl group such as phenanthryl group, and the like, and may also be exemplified by a hydroxyl group, a carboxyl group, a decyl group, a sulfhydryl group, a sulfo group, a methanesulfonyl group, a p-toluene fluorenyl group, an amine group, an exact group, a cyano group, and a tris-yl group. , trichloromethyl, tridecyl sulphate, phosphonic acid subunit, phosphonic acid group, triterpene ketone ion, dimethyl sulphonate ion, triphenyl benzamidine methyl quinone ion, etc. In addition, as X, in terms of improving solvent solubility and absorption efficiency in a long wavelength region, an alkyl group which may have a substituent, an aryl group which may have a substituent, an alkenyl group which may have a substituent, and the like may be used. With Alkynyl group of a substituent, an alkoxy group which may have a substituent, an aryloxy group which may have a substituent, an alkylthio group which may have a substituent, an arylthio group which may have a substituent, may have a substituent An alkyl group, an amine group which may have a substituent, or an amine group which may have a substituent on N. Further, η in the formula (II) represents an integer of 0 to 5, and is easy to synthesize. 147900.doc • 62- 201126269 and 0 is preferably an integer of 0 to 3, more preferably an integer of 〇2. When a plurality of 'X' are present in the formula (II), the plurality of X's may be the same or different. The following is a specific example of the photopolymerization initiator represented by the above formula (11). [化 12]

I47900.doc -63 - 201126269

[Chem. 13]

147900.doc -64· 201126269

The compound represented by the above formula (II) used in the present invention is one having an absorption wavelength in a wavelength region of from 250 nm to 500 nm. More preferably, it has an absorption wavelength in a wavelength range of 300 nm to 380 nm. Especially preferred are those with higher absorbance at 308 nm and 355 nm. As the (C) photopolymerization initiator which can be used in the present invention, in addition to the compound represented by the above formula (11), the following initiator may be used, and a compound represented by the formula (II) is preferred. Further, two or more kinds of such photopolymerization initiators may be used. Examples of the photopolymerization initiator other than the compound represented by the formula (II) include an organic halide, an oxadiazole compound, a carbonyl compound, a condensed compound, a benzoin compound, an acridine compound, and an organic peroxide. Azo compound, coumarin compound, azide compound, metallocene compound, hexaarylbiimidazole compound, organoboric acid compound, disulfonic acid compound, phosphonium salt compound, mercaptophosphine (oxide) compound, general formula ( An oxime ester compound having a structure other than π). Specific examples of such a product include: "BuU Chem Japan" 42 and 2924 (1969), and U.S. Patent No. 3,9,5,8i5, and Japanese Patent Publication No. 46_46〇5, Japan. Japanese Laid-Open Patent Publication No. SHO-48-36281, Japanese Patent Laid-Open Publication No. Hei No. 55-32-7, No. 60-239736, Japanese Patent Laid-Open No. Hei. No. 60-239736, Japanese Patent Laid-Open No. 61- sho (10) 147900.doc • 65-201126269 Japanese Patent Laid-Open Publication No. SHO No. SHO No. SHO No. Sho. No. Sho. Kai Zhao 63_298339 ^ Μ. P. Hutt r Journal of Heterocyclic Chemistry jl (No3) '(1970), Japanese Patent Special Publication No. 629285, US Patent No. 3,479,185, US Patent No. 4,311,783, money patent Japanese Patent Laid-Open No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. -188710 Japanese Patent Laid-Open Publication No. Hei. No. Hei. No. 2,131,837, Japanese Patent Application Laid-Open No. Hei. No. 2, No. Hei. Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. Japanese Laid-Open Patent Publication No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. No. Hei. Japanese Patent Laid-Open No. Hei 7-128785, Japanese Patent Laid-Open No. Hei 7- No. 0589, Japanese Patent Laid-Open No. Hei 7-306527, and Japanese Patent Laid-Open No. Hei 7-292014, (.8) .611011 11 (1979) 1653-1660, J. C. S. Perkin II (1979) 156-162, Journal of Photopolymer Science and Technology (1995) 202-232, 曰本专利开开 2000-66385, Japanese Patent Special Open 2000-80068 147900.doc The photopolymerization initiator described in JP-A-2004-534797, and the like. The photopolymerization initiator may be used alone or in combination of two or more. Further, in the case of using a photopolymerization initiator which does not absorb the exposure wavelength, a compound which absorbs the exposure wavelength is used as a sensitizer. The sensitizer is as follows. The content of the photopolymerization initiator used in the present invention is preferably in the range of 5% by mass to 2% by mass per gram of the total solid content of the colored photosensitive resin composition, more preferably 5% by mass. The range of 15% by mass, more preferably 1% by mass to 15% by mass. &lt;(Ε) Surfactant&gt; The colored photosensitive resin composition of the present invention contains a surfactant. When the pigment concentration is added, the thixotropy of the coating liquid generally increases. Therefore, it is difficult to apply or transfer the colored photosensitive resin composition onto the substrate to form the colored photosensitive resin composition layer (colored layer coating film). Uneven film thickness is produced. Further, in particular, when the color photosensitive resin composition layer (colored layer coating film) is formed by a slit coating method, it is important to homogenize the coating liquid for forming a coloring photosensitive composition layer to After drying, a coating film having a uniform thickness is formed. Therefore, it is preferred to contain a suitable surfactant in the above-mentioned color-sensitive photosensitive composition. As the above-mentioned surfactant, a surfactant disclosed in Japanese Laid-Open Patent Publication No. Hei No. 33, No. 33, No. 33, No. The surface may be a nonionic surfactant, a fluorine-based surfactant, or a (4) surfactant as a surfactant for improving the coating property. As the nonionic surfactant, for example, polyoxyethylene glycol 147900.doc •67- 201126269, polyoxypropylene glycol, protective 7 頬 polyoxyethylene alkyl ether, polyoxyethylene alkyl aryl group are preferable. Test class, polyoxyethylene B is suspected according to its soil - steroids, polyoxypropylene alkyl ethers, polyoxypropylene aryl aryl (four), polyoxypropylene phthalate esters, sorbitol liver burning vinegar Non-ionic surfactants such as monoglycerin and vinegar. Specifically, there are polyoxyalkylene glycols such as polypyridyl 7 and polyoxypropylene glycol; polyoxymethylene laurel, polyoxypropylene, and polyoxyethylene ethyl ketone: Polyoxyalkylene alkyl ethers, polyoxyethylene octylbenzene (IV), polyoxyethylene polystyrene ether, polyoxyethylene tribenzyl phenyl ether 'polyoxyethylene ― propylene polystyrene based assay, Polyoxyethylene ethene aryl ethers, polyoxyethylene dilacates such as polyoxyethylene dilaurate, polyoxyethylene distearate, sorbitan fat A nonionic surfactant such as an acid ester or a polyoxyalkylene sorbitan fatty acid ester. Specific examples of these are, for example, Adeka Pluronic series, Adekanol series, Tetronic series (above ADEKA (manufactured by ADEKA), Emulgen series, Rheodol series (above is Kao (share) manufacturing), Eleminol series, Nonipole series, 〇 Ctapole series, D〇decap〇le series, Newpol series (above is manufactured by Sanyo Chemicals Co., Ltd.), pi〇nine series (manufactured by Takeshi Oil & Fats Co., Ltd.), Nissan Nonion series (manufactured by Oyster Sauce (share)). The commercially available product can be used. The HLB value is preferably from 8 to 20, more preferably from 10 to 17. As the fluorine-based surfactant, a compound having a fluoroalkyl group or a fluoroalkyl group in at least a part of the terminal, the main chain and the side chain can be suitably used. As a specific commercial item, for example, there are: Megafac F142D, Megafac F172, Megafac F173, Megafac F176, Megafac F177, H7900.doc-68-201126269

Megafac F183, Megafac F780, Megafac F781, Megafac F782, Megafac F784, Megafac F552, Megafac F554, Megafac R30, Megafac R08 (above DIC), Fluorad FC-135, Fluorad FC-170C 'Floror FC-430 , Fluorad FC-431 (above Sumitomo 3M (share)), Surflon S-112, Surflon S-113, Surflon S-131, Surflon S-141, Surflon S-145, Surflon S-382, Surflon SC-101 Surflon SC-102 ' Surflon SC-103 ' Surflon SC-104 ' Surflon SC-105, Surflon SC-1 06 (above is manufactured by Asahi Kasei), Eftop EF351, Eftop 352, Eftop 801, Eftop 802 ( The above is manufactured by JEMCO (shares) and so on. Examples of the Shishi system surfactant include Toray Silicone DC3PA, Toray Silicone DC7PA, Toray Silicone SHI 1PA, Toray Silicone SH21PA, Toray Silicone SH28PA, Toray Silicone SH29PA, Toray Silicone SH30PA, Toray Silicone SH-190 'Toray Silicone SH -193 ' Toray Silicone SZ-6032, Toray Silicone SF-8428, Toray Silicone DC-57, Toray Silicone DC-190 (above manufactured by Toray Dow Corning Silicone), TSF-4440, TSF-4300, TSF-4445 , TSF-4446, TSF-4460, TSF-4452 (the above is manufactured by GE Toshiba Silicone (share)). Preferred surfactants for the present invention are Megafac F780, Megafac F781, Megafac F782, Megafac F784, Megafac F552, and Megafac F554 (all manufactured by DIC). -69-147900.doc 201126269 The amount of the surfactant used is preferably 5 parts by mass or less, more preferably 2 parts by mass or less, based on 1 part by weight of the coating liquid for forming the colored photosensitive resin composition layer. More preferably, it is 5 parts by mass or less. When the amount of the surfactant is more than 5 parts by mass, the coating is dry (4), and streaks or surface cracks are likely to occur, and the smoothness is liable to be deteriorated. The colored photosensitive resin composition of the present invention may further contain (7) a sensitizer, a thermosetting resin, a solvent, and the like as needed. &lt;(F) Sensitizer&gt; In the colored photosensitive resin composition of the present invention, it is preferred to use at least one of a compound having absorption at an exposure wavelength and a thiol compound having a chain transfer function as a sensitizer To increase (4) the polymerization initiation efficiency of the photopolymerization initiator. By irradiating light of a wavelength which the sensitizer of the compound which absorbs the exposure wavelength absorbs, it is possible to promote the (C) radical polymerization reaction of the photopolymerization initiator component or the polymerization reaction of the polymerizable compound thereby initiated. As such a sensitizer for a compound which absorbs at an exposure wavelength, it is known that it is a photosensitizing dye or dye, or a dye or pigment which absorbs light and interacts with a photopolymerization initiator. Preferred examples of the spectrally sensitizing dye or dye which can be used in the sensitizer of the present invention include polynuclear aromatics (for example, ruthenium, osmium, and benzene), and oximes (for example, fluorescene red, blush, and red). Blush, rhodamine B, bengal rose red), phthalocyanine (such as thiocarbonate, oxaphthalocyanine), merocyanine (such as °Mfc month, carbon merocyanine), sorghum (such as sulfur堇, fluorene blue, indole amide blue, acridine (eg acridine orange, aflatoxin, acridine flavin) 'phthalocyanine 147900.doc 201126269 (eg phthalocyanine, metal phthalocyanine), porphyrin Classes (such as W Feng D Dulin, central metal replaces foreign Lin), chlorophyll (for example, chlorophyll, chlorophyllin replaces chlorophyll), metal complex, onion (eg 'Lian Luneng') Squaric acid rust (such as squalene rust). The thiol compound having a chain transfer function has the following effects of further improving the sensitivity of the initiator to the actinic radiation or suppressing polymerization inhibition of the polymerizable compound by oxygen. Examples of such a thiol compound include ethylene glycol dithiopropionic acid vinegar (EGTP), butanediol dithiopropionate (10) τρ), trimethylolpropane bis = propionic acid (ΤΜΤΡ), and pentaerythritol. Tetrathiopropionic acid cool (ρΕτρ) = polyfunctional thiol compound, 2 provincial benzopyrene, 2 benzophenanthene, 2-mercaptobenzimidazole, 2_mercapto-4 (yang) _ quinazoline Monofunctional thiol compounds such as porphyrin, quinone-naphthyl naphthalene, and phenyl phenyl sulfhydryl imidazole. The monofunctional thiol compound is particularly preferred in terms of stability over time and solubility in a solvent. The = balance between the growth rate of the polymerization and the chain transfer improves the curing speed. The thiol compound 3 ink in the colored photosensitive resin composition of the present invention is preferably in the form of G.5 to 1 G% by mass of the total solid content of the photosensitive resin composition, and more preferably G. 5 to 5 mass% of the thermosetting resin The color-sensitive photosensitive resin composition used for the fluorination may contain a thermosetting resin such as yttrium oxide or oxetane resin as needed. Examples of the epoxy resin include bisphenol A type, cresol novolak type, biphenyl 147900.doc 201126269 type, and alicyclic epoxy compound. For example, as the bisphenol A type, there are mentioned: 卩(^〇1^〇丫0-115, 丫0-118T 'YD-127 ' YD-128 &gt; YD-134 ' YD-8125 ' YD-7011R, ZX -1059, YDF-8170, YDF-170, etc. (the above are manufactured by Tohto Kasei), Denacol EX-1101, EX-1102, EX-1103, etc. (the above are manufactured by Nagase Kasei), Placcel GL-61, GL-62, G101, G102 (the above is manufactured by Daicel Chemical)' can also be exemplified by similar bisphenol p type and double brewed S type. Epcryl 3700, 3701, 600 (above, manufactured by Daicel UCB) can also be used. Examples of the cresol phenolic varnish type include Epotohto YDPN-638, YDPN-701, YDPN-702, YDPN-703, YDPN-704 (the above are manufactured by Tohto Kasei Co., Ltd.), and Denacol EM-125 (the above is long).濑化成制造); as the biphenyl type, 3, 5, 3, 5, _tetradecyl _4, 4, diglycidylbiphenyl, etc. may be mentioned. As the alicyclic epoxy compound, a Ceii〇xide 2021, 2081, 2083, 2085, Epolead GT-301, GT-302, GT-401, GT-403, EHPE-3150 (above manufactured by Daicel Chemical), Sun T〇ht〇ST-3000, ST_4000, ST_5 〇8〇, ST_51〇〇, etc. (the above is manufactured by Toho Chemical Co., Ltd.), etc. Ep〇t〇ht〇γΗ_ 434, YH-434L, and bisphenolphthalein type epoxy resin can be used as the amine type epoxy resin. A glycidyl ester modified by a dimer acid, etc. Among the epoxy resins, a novolak type epoxy compound, an alicyclic type oxygen compound, and preferably an epoxy equivalent of 18 〇 25 25 As a raw material, 'Epiclon Ν·66〇, ν_67〇, ν_680, Ν_ 147900.doc -72- 201126269 690, YDCN-704L (above DIC), EHpE315〇 (Daicel Chemical) As an oxetane resin, you can use Ar〇n 〇xetane 〇χτ_1〇ι, ΟΧΤ-121 &gt; ΟΧΤ-211 ^ ΟΧΤ-221 ' ΟΧΤ-212 ' ΟΧΤ-610 ' OX-SQ, ΡΝ〇χ ( The above is manufactured by East Asia Synthetic.) The oxetane resin can be used alone or in combination with an acrylic copolymer, an epoxy resin or a maleimide resin. In particular, when used in combination with an epoxy resin, the heat generated by ultraviolet laser exposure makes the reaction higher, and is preferable from the viewpoint of adhesion to the substrate. The content of the epoxy resin and the oxetane resin of the present invention in the colored photosensitive resin composition is preferably from 5% to 15% by mass based on the total solid content of the colored photosensitive resin composition. From the viewpoint of the solubility in the alkali and the adhesion to the substrate, it is preferably from 1 to 10% by mass. (Solvent) The colored photosensitive resin composition used in the present invention can be usually produced by using a solvent. Further, the above pigment dispersion composition is also prepared using a solvent. The solvent may, for example, be an ester such as ethyl acetate, n-butyl acetate, isobutyl acetate, amyl decanoate, isoamyl acetate, isobutyl acetate, butyl propionate or isopropyl butyrate. Ethyl butyrate, butyl butyrate, alkyl esters, methyl lactate, ethyl lactate, hydroxyacetate, ethyl hydroxyacetate, butyl glycolate, decyloxyacetate, decyloxyacetate Vinegar, butyl methoxyacetate, methyl ethoxyacetate, ethyl ethoxylate, and methyl 3-oxypropionate, ethyl 3-oxypropionate, etc. Ester 147900.doc -73· 201126269 Classes (eg methyl 3-methoxypropionate, ethyl 3-methoxypropionate, decyl 3-ethoxypropionate, ethyl 3-ethoxypropionate Ethyl 2-oxopropionate such as methyl 2-oxypropionate, ethyl 2-oxypropionate or propyl 2-oxypropionate (eg 2-methoxypropionic acid) Ester, ethyl 2-methoxypropionate, propyl 2-methoxypropionate, methyl 2-ethoxypropionate, ethyl 2-ethoxypropionate, 2-yl-2-yl Ethyl propyl propionate, ethyl 2-oxy-2-methylpropionate, 2-methoxy-2-methylpropionic acid Ester, ethyl 2-ethoxy-2-methylpropionate, etc., and methyl pyruvate, ethyl pyruvate, propyl pyruvate, methyl acetate, ethyl acetate, 2-oxygen Ethyl butyrate, ethyl 2-oxobutyrate, 1,3-butanediol diacetate, etc.; _, such as diethylene glycol dimethyl shunt, tetrahydrogen.夫南, ethylene glycol monomethyl ether, ethylene glycol monoethyl ether, methyl sarbuta acetate, ethyl sirolimus acetate, diethylene glycol monomethyl test, two ethylene Alcohol monoethyl ether, diethylene glycol monobutyl ether, propylene glycol methyl ether acetate, propylene glycol ethyl ether acetate vinegar, propylene glycol propyl ether acetate, diethylene glycol diethyl bond, diethylene Alcohol monoethyl ether acetate, diethylene glycol monobutyl ether, diethylene glycol monobutyl ether acetate, propylene glycol n-propyl ether acetate, propylene glycol diacetate, propylene glycol n-butyl ether Acetate, propylene glycol phenyl ether, propylene glycol phenyl ether acetate, dipropylene glycol monodecyl ether acetate 'dipropylene glycol n-propyl ether acetate, dipropylene glycol n-butyl ether acetate, tripropylene glycol single N-butyl ether, tripropylene glycol methyl ether acetate, etc.; acetic acid alkoxyalkyl esters, such as 3-decyloxybutyl acetate, 4-methoxybutyrate acetate, 2-methyl-3-acetate曱oxybutyl ester, acetic acid 3·mercapto_3_methoxybutyl ester, 3-mercapto-3-oxobutyl butyl acetate, acetic acid 2_ethoxybutyl 147900.doc -74· 201126269 ester' Acetic acid G emulsion Butyl ester, 2-methoxypentyl acetate, 3-methoxypenta-acetate 4-foxypentanyl, ethyl 3-methyl-2-methyl peroxide, acetic acid 3-methyl某1田# # , 丞-3-mercapto pentyl ester, acetic acid 3·methyl _4 • methoxypentyl ester, etc.; ketone 1 from, _ q such as acetone, mercapto ethyl ketone, cyclohexanone, 2-heptanone, 3-heptanone, etc.; alcohols such as ethanol, isopropanol, propylene glycol decyl ether, propylene glycol mono-n-propyl bond, propylene glycol mono-n-butyl ether; aromatic hydrocarbons such as toluene, two Toluene, etc. The calculation of φ A 'is suitable for 3-ethoxymethyl propionate, 3-ethoxyethyl oxime ethyl succinate acetate, ethyl lactate, diethylene glycol dimethyl ether, acetonitrile Butyl ester, 3-methoxypropionate, 2-heptanone, cyclohexanone, ethyl carbitol acetate, butyl carbitol acetate, propylene glycol decyl ether, propylene glycol methyl ether An acid ester, propylene glycol ethyl ether acetate, 3-methoxyoxybutyl vinegar acetate, 3-methyl-3-methoxybutyl acetate, and the like. The solvent may be used alone or in combination of two or more. (Organic carboxylic acid) An organic carboxylic acid may be added to promote the developability of the colored photosensitive resin composition in order to promote the alkali solubility of the uncured portion, and a low molecular weight organic carboxylic acid having a molecular weight of 1,000 or less is preferable. Specific examples thereof include aliphatic monocarboxylic acids such as capric acid, acetic acid, propionic acid, butyric acid, valeric acid, trimethylacetic acid, caproic acid, diethylacetic acid, heptanoic acid, and caprylic acid; oxalic acid and propylene; Acid, succinic acid, glutaric acid, adipic acid, pimelic acid, suberic acid, azelaic acid, sebacic acid, tridecanedioic acid, methylmalonic acid, ethylmalonic acid, dimercapto Malonic acid, methyl succinic acid, tetradecyl succinic acid, citraconic acid and other fats 147900.doc -75- 201126269 Group dicarboxylic acid; 1'2,3-propanetricarboxylic acid, aconitic acid, camphoric acid Aliphatic tricarboxylic acid; benzoic acid 'toluic acid, small formic acid, 2,5 • dimethyl benzoic acid and other aromatic mono- ortho-phthalic acid, stupid Erman, stupid tricarboxylic acid, homobenzene Aromatic poly(tetra), trisodium decanoic acid, 1,2,3,5-benzenetetracarboxylic acid, 1,2,4,5-benzenetetracarboxylic acid, etc.; phenyl-acetic acid, phenoxyacetic acid, methoxyphenoxy Acetic acid, hydrogen atropic acid, cinnamic acid, mandelic acid, phenyl succinic acid, atopic acid, cinnamic acid, cinnamic acid, cinnamic acid, phenyl allyl acetic acid, coumaric acid, umbrella acid Other carboxylic acids. (Cerane coupling agent) A decane coupling agent can be used for the coloring photosensitive resin composition used in the present invention from the viewpoint of further improving the adhesion to the substrate. The decane coupling agent preferably has an alkoxyalkyl group as a hydrolyzable group which can be chemically bonded to an inorganic material. Further, it is preferred to have a group which exhibits an affinity with an organic resin or forms a bond, and as such a group, it preferably has a (meth)acryl fluorenyl group, a phenyl group, a fluorenyl group, or a glycidyl group. Or oxetanyl, especially preferably having a (meth) acrylonitrile group or a glycidyl group. In other words, the decane coupling agent used in the present invention is preferably a compound having an alkoxy group and a (meth) acryl fluorenyl group or an epoxy group, and specific examples thereof include (meth) propylene having the following structure. A mercapto-trimethoxydecane compound 'condensed' hydroglyceryl-trimethoxydecane compound or the like. 147900.doc -76· 201126269 Ο [Chemical Formula 15] (^&gt;^sO/N^Si(OCH3)3 The coloring photosensitive resin used in the present invention as an additive amount when a decane coupling agent is used The total solid content of the composition is preferably in the range of 〇2% by mass to 5.0% by mass, more preferably 〇5% by mass to 3% by mass. (Polymerization inhibitor) - I. In order to prevent unwanted polymerization of the polymerizable ethylenically unsaturated compound, it is desirable to add a small amount of thermal polymerization inhibitor. : It can be used in the thermal polymerization inhibitor of the present invention. It can be exemplified: p-Benzene has its p-methoxybenzene age, di-tert-butyl (tetra), o-benzotriene, and: butyl-butyr dioxin. Λ '♦ί *θ )), 22, - Kun, 4,4,-thiobis(3-mercapto-6-t-butylphenyl)-methylenebis(4-methyl-based third basally amine oxime (m) salt, morphine (iv) for basic thermal polymerization inhibition Preferably, the amount of the agent is _ mass%~=^ for the coloring photosensitive resin composition, causing polymerization inhibition, and adding: two 'as needed to prevent the gas by acid or acid 147900.doc • 77. 201126269 higher fatty acid derivatives, etc., which are biased on the surface of the photosensitive layer during the drying process after coating. The amount of the fatty acid derivative added is preferably coloring sensitivity. In the present invention, an inorganic filler or a plasticizer may be added in order to improve the physical properties of the colored photosensitive resin composition, as in the case of the resin composition. The plasticizer 'for example, dioctyl phthalate, di-dodecyl phthalate, triethylene glycol dicaprylate, dimethyl glycol phthalate, phosphoric acid The phenyl ester, dioctyl adipate, dibutyl sebacate, and diethyl glycerin may be added in an amount of 10% by mass or less based on the total mass of the (B) polymerizable compound and the (D) resin. By using the above-mentioned components, the colored photosensitive resin composition of the present invention is hardened by high-sensitivity by exposure to ultraviolet light, and exhibits adhesion to the substrate. Further, due to high sensitivity Forming a film, so by ultraviolet laser The output of the exposure can also maintain the smoothness of the surface. Therefore, the colored photosensitive resin composition containing the above various components is suitable for the method of the present invention, and can be preferably used for forming a color filter of a color filter. Method for Producing Color Filters&gt; The colored photosensitive resin composition for ultraviolet laser exposure of the present invention and the pattern forming method are suitable for color filters for liquid crystal display devices. Hereinafter, the ultraviolet light exposure for the present invention is colored for exposure. The photosensitive resin composition and the pattern forming method are described as a composition for forming a colored pattern in a method for producing a color filter for a liquid crystal display device, and a method for forming the same. However, the present invention is not limited to the case of 147900.doc-78-201126269. this method. It can be produced by using a colored photosensitive resin composition to form a colored pattern on a light-transmitting substrate, and other steps can be provided as needed. The pattern forming method of the present invention is characterized by the step of forming a layer containing a coloring photosensitive resin composition for ultraviolet light irradiation on a base plate = 'exposure by ultraviolet light exposure, and exposing an exposed area a curing exposure step of the ultraviolet light laser containing at least (A) a colorant, (B) a polymerizable compound, (c) a photopolymerization initiator, (1)) a resin, and (E) an interface The active agent, and the (D) resin contains "mol% to 90 mol% selected from (1)") structural unit represented by the formula (1) and (D-2) contains N-substituted mala At least one structural unit of the group consisting of the structural units of the imine group, and the structural unit having an acidic group has a weight average molecular weight of (7) (9) (7) (9) (10); and a developing step of removing the unexposed regions. The pattern forming method of the present invention has an exposure step of being exposed to a pattern by ultraviolet laser. It is presumed that the principle is to cause (c) a photopolymerization initiator to generate a starting species by the exposure step in the pattern-like exposed region of the photosensitive resin composition, and to initiate and carry out (B) by the starting species. Polymerization. The polymerization hardening reaction of the compound, while the heat generated by the ultraviolet laser exposure causes the allyl or N-substituted maleidinium group present in the molecule of the (D) resin to be heated. The reaction is initiated and subjected to a hardening reaction to cause the exposed region to be 'thermal double hardened', thereby forming a pattern comprising a hardened region and an uncured region. After the exposure step, the development step may be carried out as needed to remove the uncured regions to form a pattern. 147900.doc -79- 201126269 [Exposure step] The exposure mode of the present invention uses an ultraviolet laser as a light source. Laser Department English Light Amplification by Stimulated Emission of

The first letter of Radiation (enhanced by stimulated radiation). As an oscillator, an amplifier, and an excitation medium that utilizes the phenomenon of stimulated emission occurring in a substance having a reversed distribution, and which produces a monochromatic light having stronger interference and directivity by the amplification and oscillation of light waves, there is crystallization. For glass, liquid, pigment, gas, etc., a solid laser having a oscillating wavelength to ultraviolet light, such as a solid laser, a liquid laser, a gas laser, or a semiconductor laser, which is derived from a medium such as δ hai can be used. In terms of the output of the laser and the wavelength of the oscillation, it is preferably a solid laser or a gas laser. With respect to the wavelength which can be used in the present invention, it is preferable that the ultraviolet light having a wavelength in the range of 3 〇〇 nm to 380 nm is better than the wavelength in terms of the wavelength of the photosensitive photosensitive resin composition. 3 〇〇nrn ~ 360 nm range of ultraviolet laser. Specifically, 'especially the third harmonic (355 nm) of the Nd:YAG laser with a relatively large output, the relatively inexpensive solid laser, or the XeCl (308 nm) and XeF (353 nm) of the excimer laser . Further, the exposure amount of the object to be exposed (pattern) is preferably in the range of 1 mJ/cm 2 to 100 mJ/cm 2 , more preferably in the range of 1 mJ/cm 2 to 50 mJ/cm 2 . When the exposure amount is within this range, it is preferable in terms of productivity in pattern formation. The exposure apparatus which can be used in the present invention is not particularly limited, and as the commercially available product, EGIS (manufactured by V Technology Co., Ltd.) or DF2200G (manufactured by Dainippon Screen Co., Ltd.) or the like can be used. It is also suitable to use 147900.doc -80- 201126269 other than the above. In the ultraviolet laser, the parallelism of the light is good. The pattern can be exposed without using a mask at the first time, and the pattern shape is affected by the output mask m, ~ shape, and distribution. Therefore, in terms of improving the linearity of the pattern, 曰 y π ^ χ is better to use a mask for pattern exposure. [Pattern forming method] In the present invention, the colored pattern can be formed by forming a photosensitive resin group on the light-transmitting substrate by using a colored photosensitive resin composition. The color layer (the color photosensitive resin composition layer forming step) exposes the colored photosensitive resin composition layer into a pattern by an ultraviolet laser (exposure step) 'the coloring photosensitive resin combination after exposure The layer is developed to remove the uncured region (developing step), and the developed colored photosensitive resin composition layer is baked as necessary (baking step). In the drawing/file forming method, in addition to the above steps, other steps such as a pre-baking step may be further provided as needed. (Coloring photosensitive resin composition layer forming step _) The above-mentioned translucent substrate (hereinafter referred to as "substrate"), for example, an alkali-free glass, a soda glass, or a Pyrex (registered trademark) used in a liquid crystal display device, etc. A quartz glass and a photoelectric conversion element substrate used for attaching a transparent conductive film to the above, or a solid-state image sensor. Further, a plastic substrate can also be used. On the substrates, a black matrix having a lattice shape or the like can be formed, and a colored pattern is formed in the void portion of the lattice. Further, on the substrates, an undercoat layer may be provided as needed to improve the adhesion to the upper layer, to prevent diffusion of substances, or to realize the surface of the substrate by 147900.doc 201126269 In terms of the effect, the substrate is relatively large (the side length is about or more) of the substrate. In order to form a colored photosensitive resin composition on a substrate, the following application methods are applied: slit coating, inkjet method, and spin coating flow; various coatings such as coating, light coating, and screen printing. From the viewpoint of accuracy and speed, it is preferably slit coating. ^ ' The method of transferring the formed coating film onto the substrate by the above-mentioned imparting method in advance to the support of I can also be applied. The transfer method 'is also suitable for use in the present invention: Paragraph No. [〇〇23], [〇〇36]~[〇〇51] of Japanese Patent Laid-Open No. 2006-23696, or Japanese Patent Laid-Open No. 2006 The method of production described in paragraphs [〇〇96]~[〇1〇8] of the '47592 publication. Regarding the thickness (for example, coating thickness) of the colored photosensitive resin composition layer, in order to obtain a sufficient color reproduction region and to obtain sufficient brightness of the panel, it is preferable that the film thickness after drying becomes 〇5 to 3 〇pm. The formation of the layer is more preferably from 1·5 μηι to 2.5 μιη. - Exposure step - In the pattern forming method of the present invention, the colored photosensitive resin composition layer is exposed by using an ultraviolet laser as a light source in the exposure step. In this case, the pattern exposure may be performed via a mask, or the focus of the exposure light may be focused and exposed to a pattern. From the viewpoint of the shape of the pattern, it is preferable to use a mask for exposure. The preferred illuminance and exposure are the same as above. 0 147900.doc 82- 201126269 -Developing step _ The developing step develops the above-mentioned lines after exposure. The exposed region is hardened into a layer of the photosensitive resin composition, and subjected to a development and development treatment to partially elute into the aqueous solution of the test solution in the above-mentioned exposure and development treatment = = shot portion (unhardened portion, thereby forming a pattern. As the developing solution, the organic curing property or a mixture thereof can be used as the developing solution. For example, sodium hydroxide or water can be used as the developer for use in the liquid solution of the liquid or inorganic alkaline developer. Sodium bicarbonate, sodium (tetra), ammoxidation-amine, -methylethanolamine, tetramethylammonium hydroxide, hydrogen dioxane; (d), ... ° bottom ~ ^ undecene and other organic basic compounds, Can be used: Washing with water (flushing) The concentration of the test compound is diluted to 0 001~10% by mass, preferably 〇.〇1~1 by mass. When using a water-soluble (iv) developer such as &amp;, 'usually using pure as development temperature after development, preferably 2 (rc~35t, more preferably 23t:~3 (rc. better development time) It is 30 seconds to 12 seconds, more preferably 4 seconds to 9 seconds. A preferred combination of degree and development time is, for example, a temperature of 25. (:, 50 seconds to 1 sec., temperature 30. 〇, 40 seconds to 80 seconds. Further, the spray pressure is preferably 〇·〇1 MPa~0.5 MPa, more preferably 〇·〇5 MPa~0.3 MPa, more preferably 〇·ι MPa~0.3 MPa. By selecting these conditions, the pattern can be formed into a rectangular shape or formed into a tapered shape and optionally Design: 147900.doc • 83 - 201126269 - Baking step _ fire and copying step in order to completely cure the colored photosensitive resin composition, #4· Λ - θ ^ • The above-mentioned colored photosensitive resin composition layer Baking can be carried out in the following manner: using a heating plate or a convection oven (hot air circulation dryer), a high-frequency heating machine and other heating mechanisms, in a continuous manner or by gas to the shirt, after washing, coloring The substrate of the photosensitive resin composition layer is heated. &gt; As a baking condition, the temperature is preferably 150. (: ～260. (:, more preferably 18 〇 &lt;: 〜26 〇. (:, most Good for 200. (: ~240£) (:. Baking time is preferably 1 minute, 150 minutes, more preferably 2 Minutes to 12 minutes, preferably minutes to %. Further, in the case of forming RGB3 hue, light-shielding layer, or the like, a plurality of hue, η* will form a coloring photosensitive resin composition layer, exposure development, and baking cycle. Only the desired number of defects is repeated, and the formation, exposure, and display of the colored photosensitive resin composition layer are performed for each color, and then all the hue is baked. Thus, (4) color including the color of the desired color: Filter - Other Steps - Before the exposure step, a prebaking step may be provided in order to dry the photosensitive resin composition layer formed by coating or the like. The coloring photosensitive resin composition layer is 60 〇C~140 〇C* ϋ.^Λ80°Γ120°Γ, 'temperature is better'. More preferably 80CC 1 baking~300 seconds, more preferably 80 seconds~2〇 Leap second.权佳为3 (Μ &lt;liquid crystal display device&gt; 147900.doc • 84 - 201126269 color filter for liquid crystal display device is suitable for producing liquid crystal display device using color filter manufactured by the pattern forming method of the present invention The liquid crystal display device can display a high-quality image. The definition of the display device or the description of each display device is, for example, "Electronic display device (sasaki Sasaki, (Investigation) Industrial Research Association issued in 1990)", "Display device ( In the case of the liquid crystal display device, for example, in the next generation of liquid crystal display technology (the compilation of the next generation of liquid crystal display technology, the (Investigation) Industrial Research Association was issued in 1994). The liquid crystal display device to which the present invention is applied is not particularly limited, and can be applied to, for example, various types of liquid crystal display devices described in the "Second Generation Liquid Crystal Display Technology". Color filters for liquid crystal display devices. In particular, it can be effectively used in a liquid crystal display device of a color TFT (thin-film transistr) The liquid crystal display device of the color TFT type is described in, for example, "Color TFT LCD (issued by Kyoritsu Publishing Co., Ltd., 1996)." The present invention is also applicable to a horizontal electric field switching method such as IPS, and the like. A wide range of liquid crystal display devices, such as STN, TN, VA, IPS, 0CS, FFS, and R_〇CB#. For such methods, for example, in "anal, pan, coffee display, technology and market" The latest developments - (Toray Research Center survey and research department issued in 2002) are described on page 43. The liquid crystal display device consists of a color filter, an electrode substrate, a polarized beam, a retardation film, a backlight, a spacer, and a viewing angle. A color filter for a liquid crystal display device of the present invention can be applied to a liquid crystal display device comprising the above-mentioned known components of 147900.doc-85-201126269. For such components, for example, 94 LCD Peripheral Materials • Chemical Market (Island Kentaro (share) CMC issued in 1994), "2〇〇3 LCD-related market status and future prospects (volume) ( Table Liangji (share) Fuji

It is documented in the Chimera Research Institute in 2003). About the backlight 'in SID meeting Digest 1380 (2005) (A. Konno et al), or monthly publication December 2005 issue number 18 to 24 pages (Island Kang Yu), ibid. 25 to 30 pages (Yamamu Longming), etc. There are records. The color filter produced by the pattern forming method of the present invention is used in a liquid crystal display device to achieve a high contrast ratio when combined with a three-wavelength tube of a conventionally known cold cathode tube, and further by red and green The blue LED light source (rgb-led) is used as a backlight to provide a liquid crystal display device having high brightness and high color purity with good color reproducibility. [Examples] Hereinafter, the present invention will be specifically described by way of examples, but the present invention is not limited to the following examples as long as the scope of the invention is not exceeded. In addition, "parts" are quality standards unless otherwise specified. Hereinafter, a synthesis example of an alkali-soluble resin containing an allyl group will be disclosed. (Synthesis Example 1: Synthesis of alkali-soluble resin i (exemplified compound U)) 丨·曱oxy-2-propanol M g was added to a 200 mL three-necked flask equipped with a stirring bar with a stirring blade, a reflux cooling tube, and a thermometer. , heated to 70 ° C under a stream of nitrogen. Using a plunger pump, 10.07 g of allyl methacrylate, 193 g of methacrylic acid, and 2,2,-azobis (2,4- as a polymerization initiator) were added dropwise to a three-necked flask over 25 hours. Dimethyl valeronitrile) 〇·ΐ 85 g was dissolved in 147900.doc -86 · 201126269 methoxy-2-propanol 54 g obtained. After the dropwise addition was completed, the mixture was further mixed at 70 ° C for 2 hours. After the completion of the heating, the mixture was poured into 1 L of water to carry out reprecipitation. After the precipitate was filtered, it was vacuum dried to obtain 9 g (yield: 75%) of a polymer compound. 0.01 g of the obtained polymer was weighed as a weight average molecular weight. The sample was placed in a 1 〇 mL volumetric flask to add tetrahydrogen. After about 8 mL of cumin, the solution was dissolved at room temperature, and the total volume was adjusted to 1 〇 mL. The solution was measured using a gel permeation analyzer (GPC). As a result, the weight-average molecular weight of the alkali-soluble resin hydrazine (allyl mercapto acrylate/mercaptoacrylic acid copolymer, molar ratio = 8 Å / 2 Torr) was 35,000. [Example 1] (Preparation of coloring photosensitive resin composition) (Preparation of pigment dispersion liquid 1) A pigment dispersion liquid 1 was prepared by the following manner. In other words, the mixture was stirred and mixed for 3 hours at a rotation number of 3,000 rpm using a homogenizer to prepare a mixed solution, and further used by a Apmm(j) bead bead disperser Ultra Apex Mill (Shou Industrial Co., Ltd.) Dismantled by the company for 8 hours.

• C.I. Pigment Blue 15:6, 1 O.V • C·1. Pigment Violet 23 〗. 〇 24 parts 63.2 parts

Disperbyk 161 BYK Chemie Co., Ltd. (30 〇 / 〇 solution). Propyl alcohol methyl ether acetate (hereinafter referred to as PGMEA) Total 100 parts (preparation of photosensitive resin composition); g obtained pigment dispersion 1 The 147900.doc •87-201126269 component of the following composition was further added, and the mixture was stirred and mixed to prepare a photosensitive resin composition for blue (B). • Alkali-soluble resin 1 (exemplified compound 1-1): allyl methacrylate/methacrylic acid copolymer, molar ratio = 80/20, weight average molecular weight = 35000) 20% PGMEA solution 16.4 parts • Polymerizability Compound: Dipentaerythritol hexaacrylate (manufactured by Nippon Kayaku Co., Ltd., KAYARAD DPHA) 3.9 parts • Polymerizable compound: Tetramethyl methacrylate tetraacetic acid vinegar (New. Nakamura Chemical Co., Ltd., NK ESTER AT MMT) 0.69 parts • Photopolymerization initiator: Compound A (structure described below) 2.74 parts • Monofunctional thiol compound SH-1 (the following structure) as a sensitizer 0.55 parts • Epoxy compound: (Daicel Chemistry ( Manufactured, EHPE3150) 0.60 parts • Solvent: 35.9 parts of a mixture of propylene glycol methyl ether acetate and ethyl 3-ethoxypropionate (=80/20 [mass ratio]) • Polymerization inhibitor: 0.001 parts of oxyphenol and a surfactant 1 Megafac F-554 (manufactured by DIC Corporation) 0.02 parts (formation of pixels) Coloring photosensitive resin composition using a nip coater (Hirata Machine Co., Ltd., HC-6000) Coated to a glass-free substrate (Corning, 1737) On the surface of 55 0 mm x 660 mm), it was pre-baked in a clean oven at 90 ° C for 120 seconds to form a coating film having a film thickness of 2.0 μm. Then, using EGIS (V Technology (share), YAG laser three harmonics (355 nm), pulse width 6 ns) as a laser exposure device, through the light 147900.doc •88- 201126269 mJ/cmz pulse 20

A blue striped pixel array is formed thereon. The cover irradiates the surface of the photosensitive resin composition layer with about 丨(7)-person. Thereafter, a developing device was used (Hitachi Hi-Tech Co., Ltd. [Examples 2 to 26, Comparative Examples 1 to 3] In addition to the preparation of the coloring photosensitive resin composition of Example 1, the materials used were changed to the expressions. In the same manner as in the preparation of the colored photosensitive resin composition of Example ,, each of the colored photosensitive resin compositions was prepared. In Examples 2 to 26 and Comparative Examples, CI Pigment Violet was used as a coloring agent. Part 23 is replaced by C. 〖·Pigment Blue 15:6, and only the coloring photosensitive resin composition is prepared using c丄Pigment Blue 1 5:6 as a coloring agent. Each coloring photosensitive resin composition is used, and Example 丨The pixel arrays of Examples 2 to 26 and Comparative Examples 1 to 3 were formed in the same manner as in the case of the pixel formation. [Example 27] In addition to the preparation of the color-sensitive photosensitive resin composition of Example 1, the alkali-soluble resin 1 was used. The % PGMEA solution was changed to 20% of the PGMEA solution of the exemplified compound 35 (N-benzylmaleimide/methacrylic acid copolymer, molar ratio = 60/40, weight average molecular weight = 18,000), and Example 1 Preparation of colored photosensitive resin composition The coloring photosensitive 147900.doc •89-201126269 resin composition was prepared. The pixel array of Example 27 was formed in the same manner as the pixel formation of Example 1 using the obtained colored photosensitive resin composition. [Table 1] Resin Colorant Polymerizable Compound Photopolymerization Initiator Sensitizer Exemplary Compound No. 5 or More 1 to 4 Ratios Example 1 1-1 Blue/Violet = 92/8 DPHA ATMMT 85/15 Compound A SH-1 Example 2 1-1 Blue=100 DPHA ATMMT 85/15 Compound A SH-1 Example 3 1-2 Blue=100 DPHA ATMMT 85/15 Compound A SH-1 Example 4 1-3 Blue=100 DPHA ATMMT 85/15 Compound A SH-1 Example 5 1-1 B] ue = 00 00 DPHA ATMMT 85/15 Compound D SH-1 Example 6 1-1 Blue = 100 DPHA ATMMT 85/15 Compound E SH-1 Example 7 1 -1 Blue=100 DPHA ATMMT 85/15 Compound F SH-1 Example 8 1-1 Blue=100 DPHA ATMMT 85/15 Compound G SH-1 Example 9 1-2 Blue=100 DPHA ATMMT 85/15 Compound A None Example 10 25 Blue=100 DPHA ATMMT 85/15 Compound A SH-1 Example 11 26 Blue=100 DPHA ATMMT 85/15 Compound A SH-1 Example 12 1-4 Blue= 100 DPHA ATMMT 85/15 Compound A SH-1 Example 13 1-5 Blue=100 DPHA ATMMT 85/15 Compound A SH-1 Example 14 1-1 Blue=100 DPHA No 100/0 Compound A SH-1 Implementation Example 15 1-1 Blue=100 No ATMMT 0/100 Compound A SH-1 Example 16 1-1 Blue=100 DPHA ATMMT 85/15 Compound B SH-1 Example 17 1-1 Blue=100 DPHA ATMMT 85/ 15 Compound C SH-1 Example 18 1-6 Blue = 100 DPHA ATMMT 85/15 Compound A SH-1 Example 19 1-7 Blue = 100 DPHA ATMMT 85/15 Compound A SH-1 Example 20 31 Blue= 100 DPHA ATMMT 85/15 Compound A SH-1 Example 21 32 Blue=100 DPHA ATMMT 85/15 Compound A SH-1 Example 22 33 Blue=100 DPHA ATMMT 85/15 Compound A SH-1 Example 23 34 Blue =100 DPHA ATMMT 85/15 Compound A SH-1 Example 24 22 Blue=100 DPHA ATMMT 85/15 Compound A SH-1 -90- 147900.doc 201126269 Example 25 1-1 Blue=100 V#802 ATMMT 85 /15 Compound A SH-1 Example 26 1-1 Blue = 100 DPHA A-BPE-20 90/10 Compound A SH-1 Example 27 35 Blue/Violet = 92/8 DPHA ATMMT 85/15 Compound A SH- 1 Comparative Example 1 Comparative Compound 1 Blue=100 DPHA ATMMT 85/15 Compound A SH-1 Comparative Example 2 Comparative Compound 2 Blue=100 DPHA ATMMT 85/15 Compound A SH-1 Comparative Example 3 Comparative Compound 3 Blue=100 DPHA ATMMT 85/15 Compound A SH-1 Polymerization of Table 1 In the column of the compound, "5 or more" means a compound having 5 or more and 15 or less polymerizable groups in the molecule, and "1 to 4" means a polymerization having 1 or more and 4 or less in the molecule. The ratio of the compound "the ratio" indicates the mass ratio of the compound having 5 or more and 15 or less polymerizable groups in the molecule to the amount of the compound having one or more polymerizable groups of 4 or less. In Examples 14 and 15 in which the polymerizable compound was used alone, a portion of the polymerizable compound which was not used was replaced with a polymerizable compound to be used, and a colored photosensitive resin composition was prepared. DPHA is a dipentaerythritol hexaacrylate, which is manufactured by using a pharmaceutically acceptable chemical product: KAYARAD DPHA, and ATMMT is a tetramethylolethane tetraacrylate, which is manufactured by Shin-Nakamura Chemical Co., Ltd., trade name: NK ESTER ATMMT. Comparative compound 1 is a copolymer of benzyl methacrylate and methacrylic acid (copolymerization molar ratio of 80:20, weight average molecular weight of 35000) 'Comparative compound 2 is copolymerization of n-propyl methacrylate and methacrylic acid (copolymerized molar ratio of 80:20, weight average molecular weight of 35,000), comparative compound 3 is a copolymer of allyl methacrylate and methacrylic acid (copolymerized molar ratio of 40:60, weight average molecular weight) It is 35000). The polymerizable compound is blocked by V # 802, which has 8 polymerizable groups. 147900.doc •91 - 201126269 The compound is manufactured by Osaka Organic Chemical Industry. A-BPE-20 was a polymerizable compound having two polymerizable groups, and NK ESTER A-BPE-20 manufactured by Shin-Nakamura Chemical Co., Ltd. was used. Hereinafter, the structure of the compound used in Table 1 is disclosed.

n=2 (85%) n=3(15%) n=4 (5%) V#802 [化17] h^C^HC—C__0—CH2-CH2—0

CH3 -o--ch2-ch2-oc-ch=ch2 δ m+n=17 A-BPE-20 [Chem. 18]

Compound A

S

Br 147900.doc •92· 201126269

Compound B

s compound c

〇 〇/, /\ /S

N^, 〇〇人

Compound D 〇 〇

/

N

[Chemical 19] Compound E r\

N 147900.doc •93- 201126269

Compound F

n(ch2c〇2c2h5)2

Compound G

SH-I αΝ

SH

N The following evaluations were performed using each of the obtained pixel arrays, and the results are summarized in Table 2. (Evaluation of line width sensitivity) Using a mask having a line and a gap of 20 μηι, the gap between the surface of the photosensitive resin composition layer on the substrate and the mask was set to 200 μm to 20 mJ/cm 2 . The exposure amount was a line pattern, and the line pattern was observed with an optical microscope, and the evaluation line width was measured. A : 30 μηι or more 147900.doc •94· 201126269 B . 27 μπι or more, less than 30 μιη C. 25 μηι or more, less than 27 μηι D : less than 25 μηη Ε. No pattern is formed. Or peeling occurs and evaluation cannot be performed. (Evaluation of Linearity) Using a mask having a line and a gap of 20 μηι, the gap between the surface of the photosensitive resin composition layer on the substrate and the mask was set to 2 μm, at 20 mJ/ The exposure amount of cm2 was formed into a line pattern 'The line pattern was observed by an optical microscope (2 times magnification) to visually evaluate the linearity (sloshing condition) of the line width. Evaluation criteria A: No sloshing, no defects, straight lines. B: There are several places shaking, and the line is almost straight. C • The line is shaken left and right and produces a line deviation of around 2 μπι. D. The line sways to the left and right and produces a line deviation of about 5 claws. Ε · Not open &gt; into a pattern. Or peeling occurs and evaluation cannot be performed. (Evaluation of heat resistance) The substrate on which the pixels were formed was 240. The baking oven was additionally baked for 6 minutes, and the spectrophotometer McpD_2 manufactured by Otsuka Electronics Co., Ltd. was used to evaluate the color change Myab before and after the additional baking. Here, the term "Ά" means the color difference of the L*a*b* color system. The evaluation was performed using the value of chromatic aberration (color change) ΔΕ* ab. Evaluation criteria 5. ΔΕ ab is above 〇, not up to 1.〇. 4.5 : ΔΕ'Ι) is more than ΐ·〇, less than 2〇. 147900.doc -95- 201126269 4 : ΔΕ* ab is 2.0 or more and less than 3.0. 3.5 : ΔΕ+ab is 3.0 or more and less than 3.5. 3 : ΔΕ*αΙ) is 3.5 or more and less than 4.0. 2.5 : ΔΕ* ab is 4.0 or more and less than 5.0. 2 : ΔΕ* ab is 5.0 or more. 1 : There is peeling, and ΔΕ* ab is 5.0 or more. (Comprehensive evaluation) Comprehensive evaluation of line width sensitivity, linearity, and heat resistance. Evaluation Criteria 5: Very good. 4.5: Excellent. 4: Usually use the level of no problem. 3.5: Although the performance is slightly poor but no problem. 3: The limit level usually used. 2.5: A little below the limit, there is a problem. 2: Performance is insufficient and cannot be used. 1 : Unqualified level. [Table 2] Line width sensitivity linearity and heat accumulation performance Example 1 AA 4 4.5 Example 2 AA 5 5 Example 3 AA 5 5 Example 4 BA 5 4.5 Example 5 B to CB 3.5 3.5 Example 6 BA 4 4 Example 7 B~CB 3.5 3.5 147900.doc -96- 201126269 Example 8 Β B 4 3.5 Example 9 Β A 5 4.5 Example 10 Β B 5 4 Example 11 Β B 5 3.5 Example 12 AB 5 4 Example 13 BA 4.5 4.5 Example 14 AB 5 4.5 Example 15 AA 5 5 Example 16 AA 5 5 Example 17 AA 5 5 Example 18 AA 5 5 Example 19 AA 5 5 Example 20 BA 5 4.5 Example 21 BB 5 3.5 Example 22 BA 5 4 Example 23 CC 5 3 Example 24 BC 5 3 Example 25 AB 4.5 4 Example 26 AA 4 4 Example 27 AB 4 4 Comparative Example 1 DE 1 1 Comparative Example 2 EE 2 1 Comparative Example 3 CC 2 2 As is apparent from Table 2, in Examples 1 to 27 in which the colored photosensitive resin composition of the present invention was used, the line width sensitivity was high, and the linearity and heat resistance were excellent. In particular, Examples 1 to 4 and 9 to 27 using the photopolymerization initiator of the formula (Π) have a high average width sensitivity, and are excellent in linearity and heat resistance. 147900.doc 97-

Claims (1)

201126269 VII. Patent Application Range: 1. A coloring photosensitive resin composition for ultraviolet light laser containing at least (A) a coloring agent, (B) a polymerizable compound, (C) a photopolymerization initiator, (D) The resin (E) surfactant, wherein the (D) resin contains 50 mol% to 90 mol% of a molecular unit selected from the group consisting of (D-1) represented by the following formula (1) and (D- 2) at least one structural unit of a group consisting of structural units having a N-substituted maleimine group, and a structural unit having an acidic group and having a weight average molecular weight of 10,000 to 100,000, [ 1] C-〇 (1) R4 R3 R1 〇~C—C—C _ I I I R5 R2 , a halogen atom, a barren resin composition, which is represented by the following formula (II) 147900.doc 201126269 [Chemical 2] 〇 ο In the formula (II), R and X each independently represent a monovalent substituent ', Α represents a divalent organic group, Ar represents an aryl group; η is an integer of 0 to 5; when X is plural, 'multiple X' are independently represented The monovalent substituents may be the same or different. 3. The coloring photosensitive resin composition for ultraviolet lasers according to claim 1, wherein the (Β) polymerizable compound contains a compound having 5 or more and 15 or less polymerizable groups in the molecule, and one molecule is contained in the molecule. The above four or less polymerizable group compounds. 4. The colored photosensitive resin composition for ultraviolet laser irradiation according to claim 1, which further comprises (F) a sensitizer, wherein the (F) sensitizer is a monofunctional thiol compound. 5. The coloring photosensitive resin composition for ultraviolet laser irradiation according to claim 2, wherein the content of the photopolymerization initiator represented by the above formula (II) is relative to the coloring photosensitive resin composition for ultraviolet laser irradiation The solid content of all the components is 5 to 20 parts by mass. 6. A pattern forming method having the following steps: forming a package on the substrate, such as a request item! The step of the layer of the coloring photosensitive resin composition for ultraviolet laser irradiation according to any one of the five items; the exposure step of curing the exposed region by ultraviolet laser exposure, and the development step of removing the unexposed area; Doc 201126269. The method of forming a pattern according to claim 6, wherein the wavelength of the ultraviolet light of the ultraviolet light is in the range of 300 nm to 380 nm. 8. The pattern forming method of claim 6, wherein the ultraviolet laser system has a pulsed laser that oscillates at a frequency of 20 to 2000 Hz. 9. A method of manufacturing a color filter or a light sheet, comprising the step of forming a colored pattern on a substrate by the pattern forming method of claim 6. 10. A color filter' which is produced by the manufacturing method of claim 9. A U-type display device 'has a color light film as claimed in claim 1'. 147900.doc 201126269 IV. Designated representative drawings: (1) The representative representative of the case is: (none) (2) The symbolic symbol of the representative figure is simple: 5. If there is a chemical formula in this case, please reveal the best indication of the characteristics of the invention. Chemical formula: ch2 cr6+ c=o R4 R3 R1 I | | o—c—c= I R5 R2 (I) 147900.doc