CN114450608A - 真空布拉格光栅和制造方法 - Google Patents
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- G02B6/02—Optical fibres with cladding with or without a coating
- G02B6/02057—Optical fibres with cladding with or without a coating comprising gratings
- G02B6/02076—Refractive index modulation gratings, e.g. Bragg gratings
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- G02—OPTICS
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- G02B5/00—Optical elements other than lenses
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- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/10—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type
- G02B6/12—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind
- G02B6/12007—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind forming wavelength selective elements, e.g. multiplexer, demultiplexer
- G02B6/12009—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind forming wavelength selective elements, e.g. multiplexer, demultiplexer comprising arrayed waveguide grating [AWG] devices, i.e. with a phased array of waveguides
- G02B6/12023—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings of the optical waveguide type of the integrated circuit kind forming wavelength selective elements, e.g. multiplexer, demultiplexer comprising arrayed waveguide grating [AWG] devices, i.e. with a phased array of waveguides characterised by means for reducing the polarisation dependence, e.g. reduced birefringence
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- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/26—Optical coupling means
- G02B6/28—Optical coupling means having data bus means, i.e. plural waveguides interconnected and providing an inherently bidirectional system by mixing and splitting signals
- G02B6/293—Optical coupling means having data bus means, i.e. plural waveguides interconnected and providing an inherently bidirectional system by mixing and splitting signals with wavelength selective means
- G02B6/29302—Optical coupling means having data bus means, i.e. plural waveguides interconnected and providing an inherently bidirectional system by mixing and splitting signals with wavelength selective means based on birefringence or polarisation, e.g. wavelength dependent birefringence, polarisation interferometers
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/24—Coupling light guides
- G02B6/26—Optical coupling means
- G02B6/34—Optical coupling means utilising prism or grating
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- G—PHYSICS
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- G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
- G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
- G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour
- G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour based on liquid crystals, e.g. single liquid crystal display cells
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B27/00—Optical systems or apparatus not provided for by any of the groups G02B1/00 - G02B26/00, G02B30/00
- G02B27/01—Head-up displays
- G02B27/017—Head mounted
- G02B27/0172—Head mounted characterised by optical features
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/02—Optical fibres with cladding with or without a coating
- G02B6/02057—Optical fibres with cladding with or without a coating comprising gratings
- G02B6/02066—Gratings having a surface relief structure, e.g. repetitive variation in diameter of core or cladding
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- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B6/00—Light guides; Structural details of arrangements comprising light guides and other optical elements, e.g. couplings
- G02B6/02—Optical fibres with cladding with or without a coating
- G02B6/02057—Optical fibres with cladding with or without a coating comprising gratings
- G02B6/02076—Refractive index modulation gratings, e.g. Bragg gratings
- G02B6/02123—Refractive index modulation gratings, e.g. Bragg gratings characterised by the method of manufacture of the grating
Abstract
本文中描述了用于波导中的光栅和产生光栅的方法的改进。与常规SRG和布拉格(Bragg)光栅相比,深表面起伏光栅(SRG)可提供许多优点,重要的一个优点为较高的S衍射效率。在一个实施例中,深SRG可实施为聚合物表面起伏光栅或真空布拉格光栅(EBG)。可通过首先记录全息聚合物分散液晶(HPDLC)光栅来形成EBG。从经固化光栅去除液晶提供聚合物表面起伏光栅。聚合物表面起伏光栅具有许多应用,包括用于基于波导的显示器中。
Description
相关申请的交叉引用
本申请要求于2019年8月29日提交的美国临时申请第62/893,715号的优先权,所述申请的公开内容以全文引用的方式包括在本文中。
技术领域
本发明大体上涉及波导和用于制造波导的方法,且更确切地说,涉及包含形成在多组分混合物中的光栅的波导显示器,从所述多组分混合物去除一种材料组分类型,和用于制造所述光栅的方法。
背景技术
波导可称为具有约束和引导波(即,限制波可在其中传播的空间区)的能力的结构。一个子类别包括光波导,其为可导引电磁波(通常为在可见光谱中的电磁波)的结构。波导结构可设计成使用多个不同机构来控制波的传播路径。举例来说,平面波导可设计成利用衍射光栅来衍射且将入射光耦合到波导结构中,使得内耦合光可经由全内反射(TIR)在平面结构内继续行进。
制造波导可包括使用允许在波导的表面内或上记录全息光学元件的材料系统。一种类别的这种材料包括聚合物分散液晶(PDLC)混合物,其为含有光可聚合单体和液晶的混合物。另一子类别的这种混合物包括全息聚合物分散液晶(HPDLC)混合物。可通过用两个彼此相干的激光束照射材料将例如体积相位光栅的全息光学元件记录在这种液体混合物中。在记录过程期间,使单体聚合,且混合物经历光聚合诱导的相分离,从而产生散布有清透聚合物区的由液晶(LC)微液滴致密填充的区。交替的富含液晶的区和耗尽液晶的区形成光栅的条纹平面。
波导光学器件(例如上文所描述的波导光学器件)可视为用于一系列显示器和传感器应用。在许多应用中,可使用各种波导架构和材料系统实现含有编码多个光学功能的一或多个光栅层的波导,从而实现对用于扩增现实(AR)和虚拟现实(VR)的近眼显示器、用于航空和道路运输的小型平视显示器(HUD),和用于生物计量和激光雷达(LiDAR)应用的传感器的新创新。因为这些应用中的许多应用是针对消费型产品的,所以对用于大批量制造全息波导的高效低成本方法的需求不断增长。
发明内容
许多实施例涉及聚合物光栅结构、其设计、制造方法和材料。
各种实施例涉及基于波导的装置,其包括:
●波导,其支撑用于衍射在所述波导中以全内反射传播的光的聚合物光栅结构,
●其中聚合物光栅结构包含:
○聚合物网络;和
○气隙,其位于聚合物网络的邻近部分之间。
在又各种其它实施例中,聚合物光栅结构可进一步包括聚合物网络的邻近部分之间的各向同性材料,其中各向同性材料具有高于或低于聚合物网络的折射率的折射率。
在又各种其它实施例中,各向同性材料可占据聚合物网络的邻近部分之间的空间的底部部分处的空间,且空气可占据从各向同性材料的顶部表面上方到调制深度的空间。
在又各种其它实施例中,各向同性材料可包括双折射晶体材料。
在又各种其它实施例中,双折射晶体材料可包括液晶材料。
在又各种其它实施例中,双折射晶体材料可为折射率比聚合物高的材料。
在又各种其它实施例中,聚合物光栅结构可具有大于可见光的波长的调制深度。
在又各种其它实施例中,聚合物光栅结构可包括调制深度和光栅间距,其中调制深度大于光栅间距。
在又各种其它实施例中,波导可包括两个衬底,且聚合物光栅结构可包夹在两个衬底之间或安置在任一衬底的外部表面上。
在又各种其它实施例中,聚合物网络的布拉格(Bragg)条纹间隔可为0.35μm到0.8μm,且聚合物网络的光栅深度可为1μm到3μm。
在又各种其它实施例中,聚合物网络的光栅深度与布拉格条纹间隔的比率可为1:1到5:1。
在又各种其它实施例中,波导显示器可进一步包括图片产生单元,其中聚合物光栅结构可包括波导衍射光栅。
在又各种其它实施例中,波导衍射光栅可配置为多路复用光栅。
在又各种其它实施例中,波导衍射光栅可配置成接收来自包括多个图像的图片产生单元的光。
在又各种其它实施例中,波导衍射光栅可配置成外耦合来自波导的光。
在又各种其它实施例中,波导衍射光栅可配置为扩束器。
在又各种其它实施例中,波导衍射光栅可配置成内耦合包括从图片产生单元产生的图像数据的光。
在又各种其它实施例中,波导衍射光栅可进一步配置成以高效率内耦合S偏振光。
在又各种其它实施例中,衍射光栅可进一步配置成以布拉格角以70%到95%的效率内耦合S偏振光。
在又各种其它实施例中,衍射光栅可进一步配置成以布拉格角以25%到50%的效率内耦合P偏振光。
在又各种其它实施例中,聚合物网络与气隙之间的折射率差可为0.25到0.4。
在又各种其它实施例中,聚合物网络与双折射晶体材料之间的折射率差可为0.05到0.2。
在又各种其它实施例中,聚合物光栅结构可包括二维晶格结构或三维晶格结构。
在又各种其它实施例中,波导显示器可进一步包括另一光栅结构。
在又各种其它实施例中,聚合物光栅结构可包括内耦合光栅,且另一光栅结构包含扩束器或外耦合光栅。
此外,各种实施例涉及一种包括以下的波导显示器:
●波导,其支撑用于衍射在所述波导中以全内反射传播的光的聚合物光栅结构,
○其中聚合物光栅结构包括:
■聚合物网络;和
■双折射晶体材料,其位于聚合物网络的邻近部分之间,其中双折射晶体材料具有比聚合物更高的折射率。
此外,各种实施例针对一种用于制造深表面起伏光栅(SRG)的方法,所述方法包括:
●提供单体与液晶的混合物;
●提供衬底;
●将混合物的层施加在衬底的表面上;
●将全息记录光束施加到所述层以形成包含交替的富含聚合物的区和富含液晶的区的全息聚合物分散液晶光栅;和
●去除富含液晶的区中的液晶的至少一部分以形成聚合物表面起伏光栅。
在又各种其它实施例中,单体包含丙烯酸酯、甲基丙烯酸酯、乙烯基、异氰尿酸酯、硫醇、异氰酸酯-丙烯酸酯和/或硫堇。
在又各种其它实施例中,混合物可进一步包括光引发剂、共引发剂或额外添加剂中的至少一种。
在又各种其它实施例中,硫醇可包括硫醇丙烯酸乙烯酯。
在又各种其它实施例中,光引发剂可包括感光组分。
在又各种其它实施例中,感光组分可包括染料和/或自由基产生剂。
在又各种其它实施例中,提供单体与液晶的混合物可包括:
●混合单体、液晶和光引发剂、共引发剂、多官能硫醇或额外添加剂中的至少一种;
●在22℃或更低的温度下将混合物存储在无光的位置处;
●添加额外单体;
●通过0.6μm或更小的过滤器过滤混合物;和
●将经过滤混合物存储在无光的位置处。
在又各种其它实施例中,衬底可包括玻璃衬底或塑料衬底。
在又各种其它实施例中,衬底可包括透明衬底。
在又各种其它实施例中,方法可进一步包括用一或多个间隔物将混合物包夹在衬底与另一衬底之间以用于维持内部尺寸。
在又各种其它实施例中,方法可进一步包括将不粘释放层施加在另一衬底的一个表面上。
在又各种其它实施例中,不粘释放层可包括含氟聚合物。
在又各种其它实施例中,方法可进一步包括用液晶材料再填充富含液晶的区。
在又各种其它实施例中,液晶材料可具有与先前去除的液晶不同的分子结构。
在又各种其它实施例中,去除液晶的至少一部分可包括去除富含液晶的区中的大体上所有液晶。
在又各种其它实施例中,去除液晶的至少一部分可进一步包括将液晶的至少一部分留在富含聚合物的区中。
在又各种其它实施例中,方法可进一步包括在深SRG上方施加保护层。
在又各种其它实施例中,保护层可包括抗反射层。
在又各种其它实施例中,保护层可包括硅酸盐或氮化硅。
在又各种其它实施例中,施加保护层可包括在深SRG上沉积保护层。
在又各种其它实施例中,沉积保护层可包括化学气相沉积。
在又各种其它实施例中,化学气相沉积可为纳米涂覆工艺。
在又各种其它实施例中,保护层可包括聚对二甲苯涂层。
在又各种其它实施例中,在去除富含液晶的区中的所述液晶的至少一部分之后,富含液晶的区可包括气隙。
在又各种其它实施例中,方法可进一步包括含在气隙中产生真空或用惰性气体填充气隙。
在又各种其它实施例中,去除液晶的至少一部分可包括用溶剂洗涤全息聚合物分散液晶光栅。
在又各种其它实施例中,洗涤全息聚合物分散液晶光栅可包括将全息聚合物分散液晶光栅浸没在溶剂中。
在又各种其它实施例中,溶剂可包括异丙醇。
在又各种其它实施例中,在洗涤全息聚合物分散液晶光栅时,可使溶剂保持在低于室温的温度下。
在又各种其它实施例中,去除液晶的至少一部分可进一步包括用高流量空气源干燥全息聚合物分散液晶光栅。
在又各种其它实施例中,方法可进一步包括使全息聚合物分散液晶光栅固化。
在又各种其它实施例中,使全息聚合物分散液晶光栅固化可包括将全息聚合物分散液晶光栅暴露于低强度白光下,持续约一小时的时段。
在又各种其它实施例中,聚合物表面起伏光栅可配置成以70%到95%的效率内耦合S偏振光。
在又各种其它实施例中,聚合物表面起伏光栅可进一步配置成以25%到50%的效率内耦合P偏振光。
在又各种其它实施例中,聚合物网络与气隙之间的折射率差可为0.25到0.4。
在又各种其它实施例中,聚合物网络与液晶材料之间的折射率差可为0.05到0.2。
在又各种其它实施例中,聚合物表面起伏光栅可包括0.35μm到0.8μm的布拉格条纹间隔和1μm到3μm的光栅深度。
在又各种其它实施例中,聚合物表面起伏光栅可包括1:1到5:1的布拉格条纹间隔与光栅深度的比率。
在又各种其它实施例中,单体与液晶的混合物中的液晶含量可为约20%到50%。
在又各种其它实施例中,单体与液晶的混合物中的液晶可包括液晶单晶。
在又各种其它实施例中,液晶单晶可包括氰基联苯和/或戊基氰基联苯(pentylcynobiphenyl)。
此外,各种实施例针对一种用于制造深SRG的方法,所述方法可包括:
●提供单体与物质的混合物;
●提供衬底;
●将混合物的层施加在衬底的表面上;
●将全息记录光束施加到所述层以形成包含交替的富含聚合物的区和富含物质的区的全息聚合物分散光栅;和
●去除富含物质的区中的物质的至少一部分以形成聚合物表面起伏光栅。
在又各种其它实施例中,单体可对全息记录光束具有反应性且物质可对全息记录光束不具有反应性。
在又各种其它实施例中,在施加全息记录光束之前,单体和物质为可混溶混合物,而在施加全息记录光束之后,单体和物质变成不可混溶混合物。
在又各种其它实施例中,物质可包括液晶。
在又各种其它实施例中,物质可包括液晶单晶。
在又各种其它实施例中,物质可包括各向同性材料、溶剂、非反应性单体、无机物和/或纳米粒子。
此外,各种实施例涉及波导显示器,所述波导显示器可包括:
●发射阵列,其发射第一波长带中的光;
●准直透镜,其用于将来自所述发射阵列的图像调制光投影在视场上;和
●波导,其支撑:
○对所述第一波长带中的S偏振光具有高衍射效率的输入和输出SBG;和
○对所述第一波长带中的P偏振光具有高衍射效率的输入和输出SBG。
在又各种其它实施例中,所述波导可进一步支撑用于衍射由所述发射阵列发射的第二波长带中的S偏振和P偏振光的SBG。
在又各种其它实施例中,所述发射阵列可为OLED阵列。
在又各种其它实施例中,所述波导可在至少一个平面中弯曲。
在又各种其它实施例中,所述波导可由塑料制造。
在又各种其它实施例中,所述发射阵列可在空间上失真以预补偿由所述波导中的弯曲表面产生的波前失真。
在又各种其它实施例中,所述发射阵列可形成在弯曲或柔性衬底上以预补偿由所述波导中的弯曲表面产生的波前失真。
在又各种其它实施例中,所述光栅中的至少一个可为感光聚合物中所记录的布拉格光栅、记录在液晶和单体混合物中的布拉格光栅、深表面起伏光栅、混合式表面起伏/布拉格光栅中的一个。
在又各种其它实施例中,所述波导可支撑眼睛处方光学表面。
在又各种其它实施例中,所述发射可具有使用元件的多重性图案化的像素阵列,所述元件包括选自以下的群组的至少一个:相同大小的多边形、相同形状的多边形、在所述阵列中大小不同的多边形、在所述阵列中形状不同的多边形、彭罗斯图块和形成非重复图案的元件。
此外,各种实施例涉及一种用于使用波导形成图像的方法,所述方法包括:
●提供在第一波长带范围内发射光的发射阵列、准直透镜和波导,所述波导支撑对所述第一波长带中的S偏振光具有高衍射效率的输入和输出光栅以及对所述第一波长带中的P偏振光具有高衍射效率的输入和输出光栅;
●使用准直透镜来准直由发射阵列发射的图像光;
●使用S衍射输入光栅将来自所述OLED阵列的图像调制S偏振光耦合到波导中的全内反射路径中;
●使用P衍射输入光栅将来自所述OLED阵列的图像调制P偏振光耦合到波导中的全内反射路径中;
●光束扩展且从波导提取S偏振光以供查看;和
●光束扩展且从波导提取P偏振光以供查看。
在又各种其它实施例中,所述发射阵列可为OLED阵列。
在又各种其它实施例中,方法可进一步包括以下步骤:提供由所述波导支撑的弯曲光学表面;使所述发射阵列上的像素图案预失真,从而使用所述准直透镜来形成预失真波前;在所述弯曲光学表面处反射所述预失真波前光;和使用所述弯曲光学表面的光功率从所述预失真波前形成平面波前。
在又各种其它实施例中,所述弯曲光学表面可为处方光学表面。
附图说明
将参考以下图式和数据图表更充分地理解所述描述,所述图式和数据图表呈现为本发明的示例性实施例,且不应解释为对本发明的范围的完整叙述。
图1A在概念上说明根据本发明的实施例的用于制造表面起伏光栅的方法的步骤,其中沉积在透明衬底上的单体与液晶的混合物暴露于全息曝光光束。
图1B在概念上说明根据本发明的实施例的用于根据形成在透明衬底上的HPDLC布拉格光栅来制造表面起伏光栅的方法的步骤。
图1C在概念上说明根据本发明的实施例的用于制造表面起伏光栅的方法的步骤,其中从HPDLC布拉格光栅去除液晶以形成聚合物表面起伏光栅。
图1D在概念上说明根据本发明的实施例的用保护层覆盖表面起伏光栅的方法的步骤。
图2为在概念上说明根据本发明的实施例的用于根据形成在透明衬底上的HPDLC布拉格光栅来形成聚合物表面起伏光栅的方法的流程图。
图3为聚合物表面起伏光栅或真空布拉格光栅的实例实施方案。
图4A在概念上说明根据本发明的实施例的用于制造表面起伏光栅的方法的步骤,其中沉积在透明衬底上的单体与液晶的混合物暴露于全息曝光光束。
图4B在概念上说明根据本发明的实施例的用于根据形成在透明衬底上的HPDLC布拉格光栅来制造表面起伏光栅的方法的步骤。
图4C在概念上说明根据本发明的实施例的用于制造表面起伏光栅的方法的步骤,其中从HPDLC布拉格光栅去除液晶以形成聚合物表面起伏光栅。
图4D在概念上说明根据本发明的实施例的用于制造表面起伏光栅的方法的步骤,其中用液晶部分地再填充表面起伏光栅以形成混合式表面起伏-布拉格光栅。
图4E在概念上说明根据本发明的实施例的用于制造表面起伏光栅的方法的步骤,其中用保护层覆盖混合式表面起伏-布拉格光栅层。
图5为在概念上说明根据本发明的实施例的用于形成混合式表面起伏-布拉格光栅的方法的流程图。
图6为展示根据本发明的实施例的针对1微米厚度的深表面起伏光栅计算的P偏振和S偏振衍射效率与入射角的图。
图7为展示根据本发明的实施例的针对2微米厚度的深表面起伏光栅计算的P偏振和S偏振衍射效率与入射角的图。
图8为展示根据本发明的实施例的针对3微米厚度的深表面起伏光栅计算的P偏振和S偏振衍射效率与入射角的图。
图9A和9B说明包括不同硫醇浓度的多个实施例的扫描电子显微镜图像。
图10A和10B为将HPDLC布拉格光栅与聚合物表面起伏光栅或真空布拉格光栅进行比较的图像。
图11A和11B为将HPDLC布拉格光栅与聚合物表面起伏光栅或真空布拉格光栅进行比较的两个曲线图。
图12A和12B为具有不同深度的两个实例聚合物表面起伏光栅的S衍射效率和P衍射效率的两个曲线图。
图13A和13B为以不同初始液晶浓度产生的各种实例聚合物表面起伏光栅的S衍射效率和P衍射效率的两个不同曲线图。
图14A和14B为以不同初始液晶浓度产生的各种实例聚合物表面起伏光栅的S衍射效率和P衍射效率的两个不同曲线图。
图15在概念上说明根据本发明的实施例的波导显示器。
图16在概念上说明根据本发明的实施例的具有两个空气间隔开的波导层的波导显示器。
图17在概念上说明根据本发明的实施例的波导显示器的典型光线路径。
图18在概念上说明根据本发明的实施例的波导显示器,其中波导支撑弯曲光学表面。
图19在概念上说明根据本发明的实施例的波导显示器,其中波导支撑上部和下部弯曲光学表面。
图20在概念上说明根据本发明的实施例的波导显示器,其中波导支撑弯曲光学表面且使用预失真以补偿由弯曲光学表面引入的像差的像素阵列来提供输入图像。
图21在概念上说明根据本发明的实施例的波导显示器,其中波导支撑弯曲光学表面且使用由弯曲衬底支撑且经预失真以补偿由弯曲光学表面引入的像差的像素阵列来提供输入图像。
图22为在概念上说明根据本发明的实施例的用于使用含有S衍射和P衍射光栅的波导来投影图像光以供查看的方法的流程图。
图23为在概念上说明根据本发明的实施例的用于使用支撑光学处方表面且含有S衍射和P衍射光栅的波导来投影图像光以供查看的方法的流程图。
图24A在概念上说明根据本发明的实施例的具有不同大小和纵横比的矩形元件以供在发射型显示面板中使用的像素图案的一部分。
图24B在概念上说明根据本发明的一个实施例的具有彭罗斯图块(Penrose tile)以供在发射型显示面板中使用的像素图案的一部分。
图24C在概念上说明根据本发明的一个实施例的具有六边形元件以供在发射型显示面板中使用的像素图案的一部分。
图24D在概念上说明根据本发明的一个实施例的具有正方形元件以供在发射型显示面板中使用的像素图案的一部分。
图24E在概念上说明根据本发明的一个实施例的具有菱形元件以供在发射型显示面板中使用的像素图案的一部分。
图24F在概念上说明根据本发明的一个实施例的具有等腰三角形元件以供在发射型显示面板中使用的像素图案的一部分。
图24G在概念上说明根据本发明的一个实施例的具有纵横比水平偏置的六边形元件以供在发射型显示面板中使用的像素图案的一部分。
图24H在概念上说明根据本发明的一个实施例的具有纵横比水平偏置的矩形元件以供在发射型显示面板中使用的像素图案的一部分。
图24I在概念上说明根据本发明的一个实施例的具有纵横比水平偏置的菱形元件以供在发射型显示面板中使用的像素图案的一部分。
图24J在概念上说明根据本发明的一个实施例的具有纵横比水平偏置的三角形以供在发射型显示面板中使用的像素图案的一部分。
图25在概念上说明根据本发明的实施例的具有菱形元件的像素图案的一部分,其中不同像素可具有不同发射特征。
具体实施方式
在波导上使用各种光栅以便提供各种功能受到越来越多的关注。这些光栅包括:角度多路复用光栅、色彩多路复用光栅、折叠光栅、双交互光栅、滚动K-向量光栅、交叉折叠光栅、棋盘状光栅、啁啾光栅、具有在空间上变化的折射率调节的光栅、具有在空间上变化的光栅厚度的光栅、具有在空间上变化的平均折射率的光栅、具有在空间上变化的折射率调节张量的光栅,和具有在空间上变化的平均折射率张量的光栅。在特定实例中,用于衍射各种偏振光(例如,S偏振光和P偏振光)的光栅可为有益的。将特别有利的是具有衍射S偏振光或P偏振光的光栅。用于这一技术的特定应用包括基于波导的显示器,例如增强现实显示器和虚拟现实显示器。一个实例为可用于将S偏振光或P偏振光中的一个或两者输入到波导中的输入光栅。然而,在许多情况下,将有利的是具有衍射S偏振光或P偏振光的光栅。举例来说,使用例如OLED光源的非偏振光源的波导显示器产生S偏振和P偏振光两者,且因此将有利的是具有可衍射S偏振和P偏振光两者的光栅。
一种特定类别的光栅包括可用于衍射S偏振光或P偏振光的表面起伏光栅(SRG)。另一类别的光栅为表面起伏布拉格光栅(SBG),其通常为P偏振选择性的,从而引起例如有机发光二极管(OLED)和发光二极管(LED)的非偏振光源的50%效率损失。与仅使用P衍射光栅的波导相比,组合S偏振衍射光栅与P偏振衍射光栅的混合物可提供理论上2倍的改进。因此,将有利的是具有高效率的S偏振衍射光栅。在许多实施例中,S偏振衍射光栅可由形成在全息光聚合物中的布拉格光栅提供。在一些实施例中,S偏振衍射光栅可由形成在全息聚合物分散液晶(HPDLC)中的布拉格光栅提供,其中使用对准层或用于再对准液晶(LC)引导器的其它过程来更改双折射。在若干实施例中,可使用液晶、单体和在相分离下自然地组织成S衍射光栅的其它添加剂来形成S偏振衍射光栅。在一些实施例中,这些HPDLC光栅可形成具有优良的S偏振衍射效率的深SRG。
一种类别的深SRG为聚合空气SRG或真空布拉格光栅(EBG),其可展现高S衍射效率(高达99%)和低P衍射效率且可实施为用于波导的输入光栅。可通过从由液晶和单体混合物的全息相分离形成的SBG中去除液晶来形成这类光栅。通过这一方法形成的深SRG通常具有在1到3微米范围内的厚度,其中布拉格条纹间隔为0.35到0.80微米。在一些实施例中,光栅深度与布拉格条纹间隔的比率可为1:1到5:1。如可容易地了解,取决于对给定应用的特定要求,这类光栅可形成有不同尺寸。结合图6到8描述SRG的厚度可如何产生不同的所得衍射效率的实例。
在许多实施例中,深SRG的条件的特征在于高的光栅深度-条纹间隔比。在一些实施例中,用于形成深SRG的条件在于光栅深度约为光栅周期的两倍。使用科格尔尼克(Kogelnik)理论给这类深SRG建模可产生对衍射效率的相当精确的估计,从而避免对更先进的建模的需要,这通常需要麦克斯韦方程组的数值解。可使用从HPDLC光栅去除的液晶达到的光栅深度极大地超过使用常规纳米印刷光刻方法达到的那些可能的光栅深度,后者无法达到深SRG的条件(通常仅在350到460 nm的光栅周期内提供250到300 nm的深度)。(佩卡艾拉斯(Pekka)、帕西萨里科(Pasi Saarikko)、塔帕尼莱沃拉(Tapani Levola),“基于衍射光学器件的大视场出瞳扩展器(Exit pupil expander with a large field ofview based on diffractive optics)”,SID杂志17/8,(2009),第659-664页)。此处应强调,虽然在本申请内强调了S偏振衍射的深SRG,但如将在下文论述,深SRG可取决于光栅处方的厚度(且确切地说,光栅深度)而提供一系列的偏振响应特征。因此,可在各种不同应用中实施深SRG。
文献支持深SRG和布拉格光栅的等效物。一份参考文件(横森清(KiyoshiYokomori),“具有高衍射效率的介电表面起伏光栅(Dielectric surface-reliefgratings with high diffraction efficiency)”《所施加光学器件(Applied Optics)》;第23卷;第14期;(1984);第2303-2310页)公开了通过在数值上求解麦克斯韦方程组对介电表面起伏光栅的衍射特性进行研究。发现凹槽深度约为光栅周期的深度的两倍的光栅的衍射效率与体积相位光栅的效率相当。横森的建模预测:以干涉方式记录在光阻中的介电表面起伏光栅可具有高达94%的高衍射效率(吞吐量效率85%)。还在戈卢布(Golub)的另一文章(M.A.戈卢布、A.A.弗里森(Friesem)、L.爱森(Eisen)“高效表面起伏光栅在共振区域中的布拉格特性(Bragg properties of efficient surface relief gratings in theresonance domain)”,光学器件通信;235;(2004);第261-267页)中论述了深SRG和布拉格光栅的等效物。格里森(Gerritsen)的另一文章(格里森HJ、桑顿(Thornton)DK、博尔顿(Bolton)SR;“将科格尔尼克的双波理论应用于深、倾斜、高效的起伏透射光栅(Application of Kogelnik's two-wave theory to deep,slanted,highly efficient,relief transmission gratings)”《所施加光学器件》;第30卷;第7期;(1991);第807-814页)论述了在光阻中形成布拉格式SRG。
本公开的许多实施例提供制造SRG(例如深SRG)的方法,与用于倾斜光栅的纳米印刷光刻工艺粒子相比,所述方法可提供极显著的优点。可使用干涉或主控和接触复本复制(copy replication)来制成任何复杂的布拉格光栅。在一些实施例中,在去除LC之后,可用与LC具有不同特性的材料回填SRG。这允许布拉格光栅具有不受光栅形成所需的光栅化学物质限制的调制特性。
在一些实施例中,回填材料可以不是LC材料。在一些实施例中,回填材料可具有比空气高的折射率,这可增加波导的角带宽。在若干实施例中,可用LC部分地回填深SRG以提供混合式SRG/布拉格光栅。替代地,在一些实施例中,可通过从HPDLC的富含LC的区去除LC的仅一部分以提供混合式SRG/布拉格光栅来避免再填充步骤。再填充方法具有不同LC可用于形成混合式光栅的优点。可使用喷墨沉积工艺来沉积所述材料。
在一些实施例中,可使用本文中所描述的方法来产生光子晶体。可实施光子晶体以产生包括布拉格光栅的多种衍射结构。布拉格光栅可用作衍射光栅以提供包括但不限于输入光栅、输出光栅、光束扩展光栅、衍射超过一种原色的功能性。光子晶体可为可具有无法由基础布拉格光栅实现的衍射能力的三维晶格结构。光子晶体可包括许多结构,包括所有2-D和3-D布拉维晶格。这类结构的记录可受益于超过两个记录光束。
在一些实施例中,并入有光子晶体的波导可布置在波导的堆叠中,每一波导具有用于衍射唯一光谱带宽的光栅处方。在许多实施例中,通过液晶提取形成的光子晶体提供深SRG。在许多实施例中,使用液晶提取工艺形成的深SRG可通常具有在1到3微米范围内的厚度,其中布拉格条纹间隔为0.35微米到0.80微米。在许多实施例中,深SRG的条件的特征在于高的光栅深度-条纹间隔比。在一些实施例中,用于形成深SRG的条件在于光栅深度可约为光栅周期的两倍。此处应强调,虽然在本申请中主要关注S偏振衍射的深SRG,但如将在下文论述,深SRG可取决于光栅处方的厚度(且确切地说,光栅深度)而提供一系列的偏振响应特征。深SRG还可结合常规布拉格光栅一起使用以增强波导显示器的色彩、均一性和其它特性。
已使用激光全息曝光在玻璃态单体偶氮苯材料中制造了深SRG(O.萨赫诺(Sakhno)、L.M.戈登堡(Goldenberg)、M.韦格纳(Wegener)、J.斯坦普(Stumpe),“使用低强度的532nm激光在含偶氮苯材料中制造深表面起伏光栅(Deep surface relief gratingin azobenzene-containing materials using a low intensity 532nm laser)”,光学材料:X,1,(2019),100006,第3-7页)。萨赫诺参考文件还公开了可如何使用两个线性正交偏振激光束将SRG记录在全息光聚合物中。
本公开提供一种用于制备表面起伏光栅的方法,与纳米印刷光刻工艺(特别是用于倾斜光栅)相比,所述方法可提供极显著的优点。可使用干涉或主控和接触复本复制来制成任何复杂的布拉格光栅。在一些实施例中,在去除LC之后,可用与LC具有不同特性的材料回填SRG。这允许布拉格光栅具有不受光栅形成所需的光栅化学物质限制的调制特性。在一些实施例中,可用LC部分地回填SRG以提供混合式SRG/布拉格光栅。替代地,在一些实施例中,可通过从HPDLC的富含LC的区去除LC的仅一部分以提供混合式SRG/布拉格光栅来避免再填充步骤。再填充方法具有不同LC可用于形成混合式光栅的优点。可使用如由本发明人的较早存档中所公开的喷墨工艺来沉积所述材料。在一些实施例中,再填充材料可具有比空气高的折射率,这可增加光栅的衍射效率。
虽然已在制造深SRG的上下文中进行本公开,但应了解,可使用本文中所描述的技术来产生许多其它光栅结构。举例来说,还可制造任何类型的SRG,包括其中光栅深度小于光栅频率的SRG,例如拉曼纳斯光栅(Raman-Nath grating)。
图1A到1D说明根据实施例的可在用于制造深SRG或EBG的方法中使用的处理装置。图1A在概念上说明根据本发明的实施例的可在用于制造表面起伏光栅的方法的步骤中使用的设备190A,其中沉积在透明衬底192上的单体与液晶的混合物191暴露于全息曝光光束193、194。在一些实例中,混合物还可包括光引发剂、共引发剂、多官能硫醇、助粘剂、表面活性剂和/或额外添加剂中的至少一种。在一些实施例中,单体可为基于异氰酸酯-丙烯酸酯的或基于硫醇烯的。在一些实施例中,液晶可为全液晶混合物或仅包括全液晶混合物的一部分的液晶单晶(liquid crystal single)。液晶单晶的各种实例包括氰基联苯或戊基氰基联苯中的一个或两者。在一些实施例中,可用在暴露期间与单体相分离以产生富含聚合物的区和富含物质的区的另一物质来替换液晶。有利地,物质和液晶单晶可为在如下文所描述的稍后步骤中去除的全液晶混合物的具成本效益的替代品。
图1B在概念上说明根据本发明的实施例的可在用于根据使用全息曝光光束形成在透明衬底上的HPDLC布拉格光栅195来制造表面起伏光栅的方法的步骤中使用的设备190B。在一些区域中,全息曝光光束可将单体转换成聚合物。全息曝光光束可包括相交的记录光束且包括交替的亮照明区和暗照明区。聚合驱动的扩散过程可使得单体和LC在相反方向上扩散,其中单体经历胶凝以形成富含聚合物的区(在亮区中),且在聚合物基质中捕获液晶以形成富含液晶的区(在暗区中)。
图1C在概念上说明根据本发明的实施例的可在用于制造深聚合物表面起伏光栅196或EBG的方法的步骤中使用的设备190C,其中从图1B的HPDLC布拉格光栅去除液晶以形成聚合物表面起伏光栅。有利地,聚合物表面起伏光栅196可包括具有相对较小的光栅周期的大深度,以便形成深SRG。可通过用例如异丙醇(IPA)的溶剂洗涤来去除液晶。溶剂应足够强以洗掉液晶,但足够弱以维持聚合物。在一些实施例中,可在洗涤光栅之前在低于室温下冷却溶剂。图1D在概念上说明根据本发明的实施例的可在用于制造聚合物表面起伏光栅的方法的步骤中使用的设备190D,其中用保护层197覆盖聚合物表面起伏光栅。
图2在概念上说明根据实施例的用于根据形成在透明衬底上的HPDLC布拉格光栅来形成深SRG的方法。如所展示,提供形成深SRG或EBG的方法200。参考流程图,方法200包括提供(201)至少一种单体与至少一种液晶的混合物。至少一种单体可包括异氰酸酯-丙烯酸酯单体或硫醇烯。在一些实施例中,至少一种液晶可为全液晶混合物,或可为可包括液晶混合物的仅一部分的液晶单晶,例如液晶混合物的单一组分。在一些实施例中,至少一种液晶可替代可在曝光期间与单体相分离的溶液。这一溶液的标准可包括在暴露期间与单体相分离、在固化之后和洗涤期间易于去除和易于处置的能力。实例替代溶液包括溶剂、非反应性单体、有机物和纳米粒子。
提供单体与液晶的混合物还可包括将以下中的一或多种与至少一种单体和液晶混合:例如光引发剂或共引发剂的引发剂、多官能硫醇、染料、助粘剂、表面活性剂和/或例如其它交联剂的额外添加剂。可使这一混合物静置以便允许共引发剂催化单体与硫醇之间的反应。可在低温(例如,20℃)下在暗空间或具有红光(例如,红外光)的空间中出现静置期,持续约8小时的时段。在静置之后,可将额外单体混合到单体中。可接着通过具有小孔径(例如,0.45μm的孔径)的过滤器来沥滤或过滤这一混合物。在沥滤之后,在施加之前,可在室温下将这一混合物存储在暗空间或具有红光的空间中。
接着,可提供透明衬底(202)。在某些实施例中,透明衬底可为玻璃衬底或塑料衬底。混合物的层可沉积或施加(203)到衬底的表面上。在一些实施例中,使用玻璃间隔物将混合物包夹在透明衬底与另一衬底之间以维持内部尺寸。可在包夹混合物之前将不粘涂层施加到另一衬底。不粘涂层可包括含氟聚合物,例如OPTOOL UD509(由大金化工(DaikinChemicals)生产)、道康宁2634、Fluoropel(由Cytonix生产)和EC200(由PPG工业公司(PPGIndustries,Inc)生产)。可将全息记录光束施加(204)到混合物层。全息记录光束可为可引起LC和聚合物的相分离的双波干涉图案。响应于全息记录光束,液体单体变成固体聚合物,而中性非反应性物质(例如,LC)在全息曝光期间响应于由聚合驱动的化学电位变化而扩散。虽然LC可为中性非反应性物质的一个实施方案,但也可使用其它物质。所述物质和所述单体可在全息曝光之前形成可混溶混合物,且在全息曝光后变得不可混溶。
在施加全息记录光束之后,可使混合物固化。固化过程可包括使混合物在低强度白光下保留一段时间直到混合物完全固化。低强度白光还可引起光漂白染色过程发生。因此,可以形成具有交替的富含聚合物的区和富含液晶的区的HPDLC光栅(205)。在一些实施例中,固化过程可在两小时或更短时间内发生。在固化之后,可去除衬底中的一个,从而暴露HPDLC光栅。有利地,不粘涂层可允许在保持HPDLC光栅的情况下去除其它衬底。
HPDLC光栅可包括富含液晶的区和富含聚合物的区的交替区段。可去除富含液晶的区中的液晶(206)以形成可用作深SRG的聚合物表面起伏光栅或EBG。可通过将光栅轻缓地浸没到溶剂(例如IPA)中来去除液晶。IPA可经冷却且可保持在低于室温的温度下,同时将光栅浸没在IPA中。接着从溶剂中去除光栅且干燥。在一些实施例中,使用例如压缩空气的高流量空气源来干燥光栅。在从光栅去除LC之后,形成聚合物-空气表面起伏布拉格光栅。
如图1A到1D中所展示,可进一步用保护层覆盖形成的表面起伏光栅。在一些情况下,保护层可为具有耐刮擦能力的湿气和氧气阻隔。在一些情况下,保护层可为不填充在其中LC一旦存在就去除的气隙区中的涂层。可使用低温工艺来沉积涂层。在一些实施方案中,保护层可具有抗反射(AR)特性。涂层可为硅酸盐或氮化硅。可通过例如纳米涂覆工艺的等离子体辅助式化学气相沉积(CVD)工艺来预先形成涂覆工艺。涂层可为聚对二甲苯涂层。保护层可为玻璃层。在实施保护层之前,真空或惰性气体可填充其中LC一旦存在就去除的间隙。在一些实施例中,涂覆工艺可与LC去除工艺(206)相结合。举例来说,涂层材料可与用于从光栅洗涤LC的溶剂混合。
图3说明实施于波导3002上的聚合物-空气表面起伏布拉格光栅3000的示例性实施例的横截面示意图。聚合物-空气表面起伏布拉格光栅3000包括周期性聚合物区段3004a。邻近聚合物区段包夹空气区段3004b。空气区段3004b由聚合物区段3004a包夹。空气区段3004b和聚合物区段3004a具有不同折射率。有利地,可以可产生深SRG的高的光栅深度3006a与布拉格条纹间隔3006b的比率形成聚合物-空气表面起伏布拉格光栅3000。如先前所论述,深SRG可展现许多有益质量,例如,可能不存在于典型SRG内的高S衍射效率。
在一个实例中,聚合物-空气表面起伏布拉格光栅3000可具有0.35μm到0.8μm的布拉格条纹间隔3006b和1μm到3μm的光栅深度。在一些实施例中,当在结合图2描述的步骤206期间未完全去除液晶时,聚合物区段3004a可包括至少一些残余液晶。在一些实施例中,富含聚合物的区内的残余LC的存在可增加最终聚合物SRG的折射率调制。在一些实施例中,如果在步骤206期间未从这些空气区段3004b完全去除液晶,那么空气区段3004b可包括一些残余液晶。在一些实施例中,通过在空气区段3004b内留下一些残余液晶,可产生如结合图4到5描述的混合式光栅。
如上文所论述,在许多实施例中,本发明还提供一种用于制造混合式表面起伏/布拉格光栅的方法。图4A在概念上说明根据本发明的实施例的可在用于制造混合式表面起伏光栅(混合式SRG)的方法的步骤中使用的设备210A,其中沉积在透明衬底212上的单体与液晶的混合物211暴露于全息曝光光束213、214。图4B在概念上说明根据本发明的实施例的可在用于使用全息曝光光束根据形成在透明衬底上的HPDLC布拉格光栅215来制造混合式SRG的方法的步骤中使用的设备210B。图4C在概念上说明根据本发明的实施例的可在用于制造表面起伏光栅的方法的步骤中使用的设备210C,其中从HPDLC布拉格光栅去除液晶以形成聚合物-空气SRG 216。这些聚合物-空气SRG 216或EBG可为深SRG。应了解,在产生聚合物-空气SRG的过程中,结合图4A到4C所说明和描述的步骤大致上对应于结合图2A到2C所说明和描述的步骤,且因此先前描述将可适用于图4A到4C。
另外,图4D在概念上说明可执行以产生混合式光栅的额外步骤。根据本发明的实施例,设备210D可在用于制造表面起伏光栅的方法的步骤中使用,其中用液晶至少部分地再填充表面起伏光栅以形成混合式SRG 217。再填充液晶可与先前在图4C去除的先前去除的液晶具有不同的一致性。此外,应了解,可仅在形成混合式SRG 217的替代方法中部分地去除图3C中去除的液晶。另外,图4E在概念上说明根据本发明的实施例的设备210E可在用于制造表面起伏光栅的方法的步骤中使用,其中用保护层218覆盖在图4D中所说明的步骤中形成的混合式SRG 217。
图5为展示根据本发明的实施例的用于根据形成在透明衬底上的HPDLC布拉格光栅来形成混合式表面起伏-布拉格光栅的示例性方法的流程图。如所展示,提供形成混合式表面起伏-布拉格光栅的方法220。参考流程图,方法220包括提供(221)至少一种单体与至少一种液晶的混合物。至少一种单体可包括异氰酸酯-丙烯酸酯单体。提供单体与液晶的混合物还可包括将以下中的一或多种与至少一种单体和液晶混合:光引发剂、共引发剂、多官能硫醇和/或额外添加剂。可使这一混合物静置以便允许共引发剂催化单体与硫醇之间的反应。可在低温(例如,20℃)下在暗空间或具有红光(例如,红外光)的空间中出现静置期,持续约8小时的时段。在静置之后,可将额外单体混合到单体中。可接着通过具有小孔径(例如,0.45μm的孔径)的过滤器来沥滤或过滤这一混合物。在沥滤之后,在施加之前,可在室温下将这一混合物存储在暗空间或具有红光的空间中。
接着,可提供透明衬底(222)。在某些实施例中,透明衬底可为玻璃衬底或塑料衬底。在将混合物施加在衬底上之前,可将不粘涂层施加在透明衬底上。混合物的层可沉积(223)到衬底的表面上。在一些实施例中,使用玻璃间隔物将混合物包夹在透明衬底与另一衬底之间以维持内部尺寸。可将全息记录光束施加(224)到混合物层。全息记录光束可为可引起LC和聚合物的相分离的双波干涉图案。在施加全息记录光束之后,可使混合物固化。固化过程可包括使混合物在混合物充分固化下在低强度白光下保留一段时间。低强度白光还可引起光漂白染色过程发生。因此,可以形成具有交替的富含聚合物的区和富含液晶的区的HPDLC光栅(225)。在一些实施例中,固化过程可在2小时或更短时间内发生。在固化之后,可去除衬底中的一个,从而暴露HPDLC光栅。
HPDLC光栅可包括富含液晶的区和富含聚合物的区的交替区段。可去除富含液晶的区中的液晶(226)以形成为一种形式的深SRG的聚合物表面起伏光栅或EBG。可通过将光栅轻缓地浸没到溶剂(例如异丙醇(IPA))中来去除液晶。IPA可保持在较低温度下,同时将光栅浸没在IPA中。接着从溶剂中去除光栅且干燥。在一些实施例中,使用例如压缩空气的高流量空气源来干燥光栅。在从光栅去除LC之后,形成聚合物-空气表面起伏布拉格光栅。在产生聚合物-空气SRG时,图5的步骤221到226大致上对应于结合图2描述的步骤,且因此这些描述适用于图5。
此外,方法220包括用液晶至少部分地再填充(227)清除的富含液晶的区以形成混合式SRG。再填充液晶可与先前在步骤226中去除的先前去除的液晶具有不同的一致性。此外,应了解,可仅在形成混合式SRG的替代方法中部分地去除在步骤226中去除的液晶。有利地,混合式SRG可提供调整SRG的特定有益特征的能力。可通过将至少一些液晶包括在SRG内来改进的一个特定特征为雾度(haze)特性的降低。
如图4E中所展示,可进一步用保护层覆盖形成的表面起伏光栅。在一些情况下,保护层可为具有耐刮擦能力的湿气和氧气阻隔。在一些情况下,保护层可为不填充在其中LC一旦存在就去除的气隙区中的涂层。可使用低温工艺来沉积涂层。在一些实施方案中,保护层可具有抗反射(AR)特性。涂层可为硅酸盐或氮化硅。可通过例如等离子处理纳米涂覆工艺的等离子体辅助式化学气相沉积(CVD)工艺来预先形成涂覆工艺。涂层可为聚对二甲苯涂层。保护层可为玻璃层。在实施保护层之前,真空或惰性气体可填充其中LC一旦存在就去除的间隙。在一些实施例中,涂覆工艺可与LC去除工艺(226)相结合。举例来说,涂层材料可与用于从光栅洗涤LC的溶剂混合。在一些实施方案中,涂层材料可为具有比聚合物低或高的折射率的材料且填充邻近聚合物部分之间的空间。聚合物与涂层材料之间的折射率差可允许聚合物SRG继续衍射。
尽管图1到5说明用于形成深SRG和混合式表面起伏/布拉格光栅的特定方法和设备,但可利用实施不同步骤或这类步骤的变体的各种制造方法。如可容易地了解,所利用的特定工艺可取决于对给定应用的特定要求。举例来说,许多实施例利用另一光栅作为保护层。
具有浅SRG结构的混合式SRG/布拉格光栅可产生低SRG衍射效率。本公开中所公开的方法允许通过优化液晶在富含液晶的区中的深度,使得SRG具有高的深度与光栅间距比,同时允许布拉格光栅足够厚以用于有效衍射来形成更有效的SRG结构。在许多实施例中,混合式光栅的布拉格光栅组件可具有在1到3微米范围内的厚度。在一些实施例中,混合式光栅的SRG组件可具有在0.25到3微米范围内的厚度。初始HPDLC光栅将具有等于最终SRG与布拉格光栅组件的总和的厚度。如可容易地了解,两个光栅组件的厚度比可取决于波导应用。在一些实施例中,SRG与布拉格光栅的组合可用于微调光栅结构的角带宽。在一些情况下,SRG可增加光栅结构的角带宽。
在许多实施例中,在图4A到4E中所说明的混合式SRG中,可跨光栅改变光栅的液晶区的再填充深度以提供空间上变化的相对SRG/布拉格光栅强度。在一些实施例中,在如在步骤206、226和227中所定义的液晶去除和再填充期间,可完全或部分地去除富含液晶的光栅区中的液晶。在若干实施例中,用于再填充或部分地再填充已清除液晶的区的液晶可具有与用于形成初始HPDLC光栅的液晶不同的化学组成。在各种实施例中,可指定具有与单体兼容的相分离特性的第一液晶以提供具有最优调制和光栅定义的HPDLC光栅,而可指定第二再填充液晶以在最终混合式光栅中提供所要折射率调制特性。在多个实施例中,混合式光栅的布拉格部分可以可通过施加到衬底和覆盖层的表面的电极来切换。在许多实施例中,再填充液晶可含有添加剂,所述添加剂可包括但不限于改进切换电压、切换时间、偏振、透明度和其它参数的特征。使用再填充工艺形成的混合式光栅将具有以下另外的优点:LC将形成连续区(而不是LC小液滴的组合件),由此降低雾度。
虽然可在S衍射光栅和P衍射光栅的上下文中描述深SRG、EBG和/或混合式SRG,但这些光栅在许多其它光栅类型中具有适用性。这些光栅包括但不限于:角度多路复用光栅、色彩多路复用光栅、折叠光栅、双交互光栅、滚动K-向量光栅、交叉折叠光栅、棋盘状光栅、啁啾光栅、具有在空间上变化的折射率调节的光栅、具有在空间上变化的光栅厚度的光栅、具有在空间上变化的平均折射率的光栅、具有在空间上变化的折射率调节张量的光栅,和具有在空间上变化的平均折射率张量的光栅。此外,深SRG、EBG和/或混合式SRG可取决于其特定实施方案而为可切换或不可切换的光栅。可在塑料衬底或玻璃衬底上制造深SRG、EBG和/或混合式SRG。还可在一个衬底上制造这些光栅且将其转移到另一衬底。
对深SRG或EBG的各种实施方案的论述
在许多实施例中,深SRG可提供用于控制波导中的偏振的构件。SBG通常为P偏振选择性的,从而引起非偏振光源(例如OLED和LED)的50%效率损失。因此,与仅使用P衍射光栅的波导相比,组合S偏振衍射光栅与P偏振衍射光栅可提供理论上2倍的改进。在许多实施例中,S偏振衍射光栅可由形成在常规全息光聚合物中的布拉格光栅提供。在一些实施例中,S偏振衍射光栅可由形成在HPDLC中的布拉格光栅提供,其中使用对准层或用于重新对准液晶导引件的其它过程来更改双折射。在若一些实施例中,可使用液晶、单体和在相分离下自然地组织成S衍射光栅的其它添加剂来形成S偏振衍射光栅。在许多实施例中,可由SRG提供S偏振衍射光栅。使用上文所描述的方法,可通过从由液晶和单体混合物的全息相分离形成的SBG去除液晶来形成展现高S衍射效率(至多99%)和低P衍射效率的深SRG。
深SRG还可提供其它偏振响应特征。若干现有技术理论研究,例如穆罕默德(Moharam)的文章(穆罕默德M.G.等人“光阻表面-起伏光栅的衍射特征(Diffractioncharacteristics of photoresist surface-relief gratings)”,《所施加光学器件》,第23卷第,第3214页,1984年9月15日)指向具有S和P灵敏度两者(其中S为主要的)的深表面起伏光栅。在一些实施例中,深SRG显示提供S偏振响应的能力。然而,深SRG还可提供其它偏振响应特征。在许多实施例中,实施具有S和P灵敏度两者(其中S为主要的)的深表面起伏光栅。在一些实施例中,可调整SRG的厚度以提供多种S和P衍射特征。在若干实施例中,在光谱带宽和角带宽内,P的衍射效率可较高,且在相同的光谱带宽和角带宽内,S的衍射效率可较低。在多个实施例中,在光谱带宽和角带宽内,S的衍射效率可较高,且在相同的光谱带宽和角带宽内,P的衍射效率可较低。在一些实施例中,可提供S和P偏振光两者的高效率。在图5到7中展示对浸没在周期为0.48微米的空气中(因此提供1.3的平均光栅折射率)的折射率为1.6的SRG的理论分析,其中对于0.532微米的波长,入射角为0度且衍射角为45度。图5为展示针对1微米厚度的深表面起伏光栅计算的P偏振和S偏振衍射效率与入射角的图,从而显示在这种情况下可达成高S和P响应。图6为展示针对2微米厚度的深表面起伏光栅计算的P偏振衍射效率和S偏振衍射效率与入射角的图,从而显示在这种情况下,在光栅的大部分角范围内,S偏振响应为主要的。图7为展示针对3微米厚度计算的P偏振衍射效率和S偏振衍射效率与入射角的图,从而显示在这种情况下,在光栅的绝大部分角范围内,P偏振响应为主要的。
在许多实施例中,光子晶体可为通过LC提取工艺形成的反射布拉格光栅或深SRG。使用相分离随后通过LC减除来获得反射深SRG可实现宽的角带宽和光谱带宽。在许多实施例中,用反射光子晶体代替当前输入SBG可用于减少从图片产生单元(PGU)到波导的光学路径。在一些实施例中,可使PGU光瞳与波导接触。在许多实施例中,反射深SRG的厚度可为约3微米。提取LC的布拉格光栅的衍射特性主要由聚合物与空气之间的折射率间隙(而不是如在典型SRG的情况下的光栅的深度)产生。
对初始混合物内的硫醇添加剂的论述
图9A和9B说明用于制造聚合物-空气SRG的实例混合物的比较散射电子显微术(SEM)图像。如先前所论述,初始混合物内的单体可为基于丙烯酸酯或硫醇的。已发现,对于一些单体,例如基于丙烯酸酯的单体,在全息曝光之后,在洗涤期间,溶剂不仅去除了液晶材料,而且去除了不理想的聚合物。已发现,多官能硫醇添加剂可通过加强聚合物来解决这一问题,且因此使其足够强以承受溶剂洗涤。在不受任何特定理论限制的情况下,硫醇添加剂可改良由低官能度丙烯酸酯单体组成的调配物的机械强度,所述低官能丙烯酸酯单体归因于减少的交联而趋向于以机械方式形成弱聚合物。丙烯酸酯单体调配物可为有利的,这是因为其可展现高衍射效率与较低雾度。因此,添加硫醇可允许丙烯酸酯单体形成为聚合物SRG的制造中的可行选项。
在相分离、光栅形成和不同调配物之间的机械强度之间可存在折衷。光栅形成可受益于含有低官能度单体的混合物,所述低官能单体反应较慢、形成较少交联且在全息曝光期间允许非反应性组分(例如LC)的更大扩散。相反地,由高官能度单体组成的混合物可归因于较多交联而展现较好的相分离和聚合物机械强度,但可快速地反应以使得非反应性组分不具有足够的时间来扩散,且因此可展现较低衍射效率。
在不受任何特定理论限制的情况下,硫醇添加剂可通过在全息暴露之前与丙烯酸酯或异氰酸酯-丙烯酸酯反应以形成松散骨架来绕过这些限制。这一骨架可以改进经固化聚合物的机械强度和均一性。因此,可通过轻微调整硫醇官能度和浓度而不显著提高单体混合物的平均官能度且破坏光栅形成来调节机械强度。
图9A说明初始混合物,而图9B说明包括1.5wt%硫醇的比较混合物。然而,已考虑硫醇添加剂的其它重量百分比。举例来说,硫醇添加剂的重量百分比可为1%到4%或1.5%到3%。在一些实施例中,多官能硫醇可为三羟甲基丙烷三(3-巯基丙酸酯)。图9A和9B两者包括聚合物致密区902a/902b和空气区904a/904b。如所说明,与可增加光栅性能的图9A的聚合物致密区902b相比,所添加的硫醇可在图9B的聚合物致密区902a内产生更致密的聚合物结构。已发现,应平衡硫醇添加剂的重量百分比,以便在聚合物结构内提供稳定性以承受溶剂洗涤,但不为刚性的,以便不允许在溶剂洗涤期间释放液晶。
HPDLC光栅性能与聚合物-空气SRG性能之间的比较
图10A和10B说明HPDLC光栅和聚合物SRG或EBG的比较实例的图像。图10A说明尚未去除液晶的实例HPDLC光栅的性能。图10A的光栅包括20%到30%的P衍射效率,同时展现标称或几乎0%的S衍射效率。图10B说明已去除LC的实例聚合物-空气SRG的性能。图10B的光栅包括18%到28%的P衍射效率,同时展现51%到77%的S衍射效率。因此,已去除LC的聚合物-空气SRG显示相对较高的S衍射效率,同时维持相当的P衍射效率。此外,图10B的光栅包括0.11%到0.15%的P衍射雾度和0.12%到0.16%的S衍射雾度。
图11A和11B说明尚未去除液晶的HPDLC光栅与已去除液晶的聚合物SRG或EBG的比较实例的曲线图。图11A说明保留液晶的HPDLC光栅的P衍射效率和S衍射效率。第一线1102a对应于P衍射效率,且第二线1104a对应于S衍射效率。图11B说明已去除液晶的聚合物SRG或EBG的P衍射效率和S衍射效率。第一线1102b对应于P衍射效率,且第二线1104b对应于S衍射效率。如所说明,在去除液晶之后,S衍射效率显著增加,而P衍射效率保持相对类似。
在一些实施例中,可通过使用不同光栅周期、光栅倾斜角和光栅厚度来调节S衍射效率与P衍射效率的比率。
各种实例深SRG深度
图12A和12B说明具有各种深度的深SRG的P衍射效率和S衍射效率的各种比较实例。这些曲线图中的每一个展示衍射效率与角度的关系。在图12A中,深SRG具有约1.1μm的深度。第一线1102a表示S衍射效率,且第二线1104a表示P衍射效率。如所说明,S衍射效率的峰值为约58%,且P衍射效率的峰值为23%。应注意,对于本实例,S衍射的雾度为0.12%,且P衍射的雾度为0.11%。具有低雾度的这一高衍射效率可使具有约1.1μm的深度的深SRG尤其适用于多路复用光栅。
在图12B中,深SRG具有约1.8μm的深度。第一线1102b表示S衍射效率,且第二线1104b表示P衍射效率。如所说明,S衍射效率的峰值为约92%,且P衍射效率的峰值为63%。应注意,对于本实例,S衍射的雾度为0.34,且P衍射的雾度为0.40%。因此,S衍射和P衍射效率两者随光栅深度增加而显著增加。应注意,雾度似乎随光栅深度增加而增加。
混合物中的各种实例初始LC浓度
图13A和13B说明对初始混合物中具有各种初始LC浓度的EBG的比较研究的结果。图13A说明S衍射效率与角度的关系。图13B说明P衍射效率与角度的关系。在图13A中,第一线1202a对应于20%的初始LC含量,第二线1204a对应于30%的初始LC含量,且第三线1206a对应于40%的初始LC含量。在图13B中,第一线1202b对应于20%的初始LC含量,第二线1204b对应于30%的初始LC含量,且第三线1206b对应于40%的初始LC含量。表1说明比较研究的各种结果的概述。
表1:
如图13A和13B中所说明和表1中所标注,最大S衍射和最大P衍射似乎均随着较高的初始LC含量而增加,而S衍射雾度和P衍射雾度保持大致恒定。
图14A和14B说明各种初始LC浓度的额外实例S衍射效率和P衍射效率。图14A说明包括各种初始LC含量的各种实例EBG的S衍射效率。图14B说明包括各种LC含量的各种实例EBG的P衍射效率。对于图14A和14B两者,线从上到下依序表示:32%的LC含量、30%的LC含量、28%的LC含量、26%的LC含量、24%的LC含量、22%的LC含量和20%的LC含量。如所说明,S衍射和P衍射效率与LC含量的量直接相关(例如,较高的LC含量产生较高的S衍射和P衍射效率)。
在不受任何特定理论限制的情况下,初始LC含量涉及在全息曝光过程和聚合过程期间发生的LC与单体之间的相分离的量。因此,较高的LC含量将增加经去除以在洗涤之后形成更多空气区的富含LC的区的量。增加的空气区使空气区(先前为富含液晶的区)与富含聚合物的区之间的折射率差(Δn)增加,这增加了S衍射和P衍射效率两者。在一些实施例中,可通过调节初始中性物质(例如LC)含量来调节聚合物SRG的平均折射率,由此在去除中性物质之后增加或减少聚合物的体积。此外,增加初始中性物质含量可影响机械强度。因此,机械增强剂(例如硫醇添加剂)的增加或减少可用于平衡机械强度的增加或减少。
包括OLED阵列作为图像产生器的实施例
使用有机发光二极管(OLED)阵列作为波导显示器中的图像产生器受到越来越多的关注。OLED在波导显示器应用中具有许多优点。作为发射技术,OLED不需要光源。可在大区域内经济高效地印刷OLED。可将非矩形像素阵列图案印刷到弯曲或柔性衬底上。如下文将论述,使像素阵列预失真且产生弯曲焦平面的能力增加了新的设计维度,这可实现对弯曲波导和由波导支撑的处方透镜引起的引导光束波前失真的补偿。与可由例如硅上液晶(LCoS)和微机电系统(MEMS)装置(例如数字光处理(DLP)装置)的技术提供的OLED相比,分辨率为4K×4K像素的OLED当前可在短期内获得更高分辨率的良好前景,从而提供到高分辨率、宽FOV AR显示器的更快路径。与LCoS相比的另一显著优点为OLED可按微秒(与LC装置的毫秒相比)切换。
OLED具有某些缺点。在其基本形式中,OLED为朗伯(Lambertian)发射体,这使得高效光收集比使用LCoS和DLP微显示器更具挑战性。OLED的红色、绿色和蓝色光谱带宽比发光二极管(LED)的所述光谱带宽更宽,从而在全息波导中呈现另外的光管理问题。OLED的最显著缺点在于:在使用往往为P偏振选择性的HPDLC光栅(例如可切换布拉格光栅(SBG))的波导中,浪费了来自OLED的可用光的一半。因此,本发明的许多实施例涉及与可为非偏振光提供高光效率的发射型非偏振图像源一起使用的波导显示器,且涉及制造这类波导显示器的相关方法。
出于描述实施例的目的,已省略或简化光学设计和视觉显示器领域的技术人员已知的光学技术的一些熟知特征,以便不混淆本发明的基本原理。除非另外陈述,否则相对于光线或光束方向的术语“轴上”是指平行于垂直于相对于本发明所描述的光学组件的表面的轴的传播。在以下描述中,术语光、光线、光束和方向可互换地且彼此相关联地使用以指示电磁辐射沿着直线轨迹的传播方向。术语光和照射可相对于电磁光谱的可见和红外波段使用。将使用光学设计领域的技术人员通常采用的术语来呈现以下描述的部分。如本文中所使用,在一些实施例中,术语光栅可涵盖由一组光栅构成的光栅。出于说明性目的,应理解,除非另外陈述,否则图式未按比例绘制。
现转向图式,说明根据本发明的各种实施例的用于使用发射型输入图像面板来提供波导显示器的方法和设备。图15在概念上说明根据本发明的实施例的波导显示器。如所展示,设备100包括波导101,其支撑对第一波长带中的P偏振光具有高衍射效率的输入光栅102和输出光栅103以及对第一波长带中的S偏振光具有高衍射效率的输入光栅104和输出光栅105。
设备100进一步包括:OLED微显示器106,其发射具有包括第一波长带的发射型光谱带宽的非偏振光;和准直透镜107,其用于将来自OLED微显示器106的光投影到视场中。在说明性实施例中,S和P衍射光栅102-105可在不需要气隙的情况下分层。在其它实施例中,光栅层可由气隙或透明层分离。S和P衍射光栅102-105可为上文所描述的深SRG或EBG。
图16在概念上说明根据本发明的实施例的波导显示器,其中P衍射和S衍射光栅安置在单独的空气间隔开的波导层中。如所展示,设备110包含由气隙113间隔开的上部波导层111和下部波导层112(其分别支撑光栅102、103和104、105)。光栅102、103和104、105可为上文所描述的深SRG和EBG。
图17在概念上说明根据本发明的实施例的波导显示器中的典型光线路径。在图17中所说明的实施例120中,微显示器106配置成发射第一波长带中的非偏振光121,其经准直且通过准直器透镜107投影到视场中。来自微显示器106的S偏振发射光可通过S衍射输入光栅104耦合到波导101中的全内反射路径中,且通过S衍射输出光栅105从波导101提取。来自微显示器106的P偏振光可以类似方式使用P衍射输入和P衍射输出光栅102、103来耦合和提取。可针对S和P光两者校正分散,前提是输入和输出光栅空间频率相匹配。输入和输出光栅102、103可为上文所描述的深SRG或EBG。
尽管图15到17展示特定的波导显示器配置,但可实施包括对所展示配置进行修改的各种配置,其特定实施方案可取决于对给定应用的特定要求。此外,可使用多种不同方法来制造这类显示器。举例来说,在许多实施例中,使用喷墨印刷工艺来形成两个光栅层。
在许多实施例中,波导在单色频带中操作。在一些实施例中,波导在绿色频带中操作。在若干实施例中,可堆叠在不同光谱带(例如红、绿和蓝(RGB))中操作的波导层以提供三层波导结构。在其它实施例中,层在波导层之间有气隙的情况下堆叠。在各种实施例中,波导层在较宽带(例如蓝-绿和绿-红)中操作以提供双导层解决方案(two-waveguidelayer solution)。在其它实施例中,对光栅进行色彩多路复用以减少光栅层的数目。可实施各种类型的光栅。在一些实施例中,每一层中的至少一个光栅为可切换光栅。
可使用多种波导架构,包括文献中所公开的那些波导架构来应用本发明。在多个实施例中,波导可并入以下中的至少一个:角度多路复用光栅、色彩多路复用光栅、折叠光栅、双交互光栅、滚动K-向量光栅、交叉折叠光栅、棋盘状光栅、啁啾光栅、具有在空间上变化的折射率调节的光栅、具有在空间上变化的光栅厚度的光栅、具有在空间上变化的平均折射率的光栅、具有在空间上变化的折射率调节张量的光栅,和具有在空间上变化的平均折射率张量的光栅。在一些实施例中,波导可并入以下中的至少一个:半波板、四分之一波板、抗反射涂层、光束分裂层、对准层、用于眩光减少的光致变色背层,和用于眩光减少的百叶窗膜。在若干实施例中,波导可支撑为不同偏振提供单独光学路径的光栅。在各种实施例中,波导可支撑为不同光谱带宽提供单独光学路径的光栅。在多个实施例中,在本发明中使用的光栅可为HPDLC光栅、记录在HPDLC(例如可切换布拉格光栅)中的切换光栅、记录在全息光聚合物中的布拉格光栅或表面起伏光栅。
在许多实施例中,波导显示器可提供至少50°对角线的图像视场。在其它实施例中,波导显示器可提供至少70°对角线的图像视场。在一些实施例中,OLED显示器可具有大于4000尼特的亮度和4k×4k像素的分辨率。在若干实施例中,波导可具有大于10%的光学效率,使得可使用亮度为4000尼特的OLED显示器来提供大于400尼特的图像亮度。实施P衍射光栅的波导显示器通常具有5%到6.2%的波导效率。提供如上文所述的S衍射光栅可使波导的效率增加2倍。在各种实施例中,可提供大于10mm的可视区(eyebox),其中眼距(eyerelief)大于25mm。在许多实施例中,波导厚度可在2.0到5.0mm之间。
图18在概念上说明根据本发明的实施例的波导显示器,其中波导光学表面中的至少一个的至少一个部分为弯曲的,和弯曲表面部分对引导光束波前的影响。如所展示,设备130包括支撑弯曲表面部分132的波导131。在说明性实施例中,波导131支撑对第一波长带中的P偏振光具有高衍射效率的输入光栅102和输出光栅103,和对第一波长带中的S偏振光具有高衍射效率的输入光栅104和输出光栅105。显示矩形像素阵列133的微显示器106发射第一波长带中的非偏振光134,其经准直且通过准直器透镜107投影到视场中。来自微显示器106的P偏振发射光可通过P衍射输入光栅102耦合到波导中的全内反射路径中,且通过P衍射输出光栅103从波导提取。波导中的任何非平面表面的存在可使所引导光的波前失真,使得在从可视区观看时,输出光展现出离焦、几何失真和其它像差。举例来说,在图18中,由准直器透镜107从单一像素投影的光具有平面波前135,其在沿着TIR路径136传播穿过波导131之后形成垂直于弯曲输出波前139A的非平行输出光线137到139。另一方面,完美平面波导将实际上提供平行光束扩展光。图19在概念上说明波导的版本140,其中波导衬底141支撑两个重叠的上部弯曲表面142和下部弯曲表面143。
图20在概念上说明根据本发明的实施例的波导显示器,其中可通过使OLED微显示器的像素图案预失真来校正由弯曲表面部分引入的像差。在说明性实施例中,波导设备150与图18中所说明的波导设备类似。如所展示,设备150包括支撑预失真像素图案152的微显示器151。由微显示器发射的非偏振第一波长光153由透镜107聚焦,所述透镜107大致上准直进入波导的光束,同时形成少量预失真的波前154。在通过波导131内耦合和传播155之后,预失真波前由弯曲表面132聚焦以形成垂直于平面输出波前159的平行输出光线156到158。
图21在概念上说明根据本发明的实施例的波导显示器,其中可通过使形成在弯曲衬底上的OLED微显示器的像素图案预失真来校正由弯曲表面部分引入的像差。弯曲微显示器衬底可有助于校正与失真像素图案相关联的焦点误差场曲率、失真和其它像差。在说明性实施例中,波导设备160与图18中所说明的波导设备类似。如所展示,弯曲衬底微显示器161支持预失真像素图案164。由微显示器发射的非偏振第一波长光163由透镜107聚焦以形成具有稍微预失真的波前164的大致上准直的引导光束,在通过波导131内耦合和传播165之后,所述预失真波前164形成垂直于平面输出波前169的平行输出光线166到168。
尽管图18到21展示具有弯曲表面的波导的特定配置,但可实施许多其它不同配置和修改。举例来说,在这类实施例中所说明的技术和基本理论还可应用于支撑眼睛处方(eye prescription)光学表面的波导。在许多实施例中,可使用与用于制造眼睛处方眼镜的那些工艺类似的工艺来定制处方波导衬底,其中针对个别用户要求微调标准基线处方。在一些实施例中,波导光栅可用标准基线处方进行喷墨印刷。在若干实施例中,OLED显示器可由所形成的预失真像素图案进行定制印刷。在各种实施例中,可将OLED显示器印刷到弯曲背板衬底上。在多个实施例中,额外折射或衍射预补偿元件可由波导支撑。在一些实施例中,可在输入和输出光栅中的至少一个中编码额外校正函数。输入和输出光栅可为上文所描述的深SRG或EBG或混合式光栅,且可按结合图1到5所描述的方法制造。输入和输出光栅还可具有结合图6到8所描述的厚度。
图22为在概念上说明根据本发明的实施例的用于使用含有S衍射和P衍射光栅的波导来投影图像光以供查看的方法的流程图。如所展示,提供形成图像的方法170。参看流程图,方法170包括提供(171)在第一波长范围内发射光的OLED阵列、准直透镜和波导,所述波导支撑对第一波长带中的S偏振光具有高衍射效率的输入和输出光栅以及对第一波长带中的P偏振光具有高衍射效率的输入和输出光栅。在一些实施例中,输入和输出光栅可为先前论述的深SRG、EBG或混合式光栅。可使用准直透镜准直(172)由OLED阵列发射的图像光。可使用S衍射输入光栅将S偏振光耦合(173)到波导中的全内反射路径中。可使用P衍射输入光栅将P偏振光耦合(174)到波导中的全内反射路径中。S偏振光可进行光束扩展且从波导提取(175)以供查看。P偏振光可进行光束扩展且从波导提取(176)以供查看。
图23为在概念上说明根据本发明的实施例的用于使用支撑光学处方表面且含有S衍射和P衍射光栅的波导来投影图像光以供查看的方法的流程图。如所展示,提供形成图像的方法180。参看流程图,方法180包括提供(181)具有在第一波长范围内发射光的预失真像素图案的OLED阵列、准直透镜和波导,所述波导支撑对第一波长带中的S偏振光具有高衍射效率的输入和输出光栅以及对第一波长带中的P偏振光具有高衍射效率的输入和输出光栅,且进一步提供(182)由波导支撑的处方光学表面。在一些实施例中,输入和输出光栅可为先前论述的深SRG、EBG或混合式光栅。可使用准直透镜准直(183)由OLED阵列发射的图像光。可使用S衍射输入光栅将S偏振光耦合(184)到波导中的全内反射路径中。可使用P衍射输入光栅将P偏振光耦合(185)到波导中的全内反射路径中。可在处方表面处反射(186)预失真波前。可使用处方表面的光功率根据预失真波前形成(187)平面波前。S偏振光可进行光束扩展且从波导提取(188)以供查看。P偏振光可进行光束扩展且从波导提取(189)以供查看。
对包括不同像素几何形状的实施例的论述
可使用具有许多不同几何形状的输入像素阵列的发射型显示器来应用本公开中所论述的各种设备,所述几何形状仅受几何约束和实施所述阵列的实际问题限制。在许多实施例中,像素阵列可包括非周期性(非重复)的像素。在这类实施例中,几何形状的非对称性和像素的分布可用于产生来自波导的输出照明的均一性。尽管输出和输入光栅(和折叠光栅,如果使用的话)位于像素阵列上,但可使用反向向量光线追踪从可视区确定最优像素大小和几何形状。本发明中可使用多种非对称像素图案。举例来说,图24A在概念上说明根据本发明的实施例的包含不同大小和纵横比的矩形元件230A到230F以供在发射型显示面板中使用的像素图案的部分230。在一些实施例中,像素阵列可基于基于多边形基底元件的有限集合的非重复图案。举例来说,图24B在概念上说明根据本发明的一个实施例的具有彭罗斯图块240A到240J以供在发射型显示面板中使用的像素图案的部分240。图块可基于在彭罗斯的标题为“用于覆盖表面的图块集(Set of tiles for covering a surface)”的美国专利第4,133,152号中所公开的原理。也可在许多实施例中使用自然界中出现的图案,其中蜂窝为众所周知的实例。
在许多实施例中,像素可包括相同规则多边形的阵列。举例来说,图24C在概念上说明根据本发明的一个实施例的具有六边形元件的像素图案的部分250。图24D在概念上说明根据本发明的一个实施例的具有正方形元件250A到250C的像素图案的部分260。图24E在概念上说明根据本发明的一个实施例的具有菱形元件270A到270D的像素图案的部分270。图24F在概念上说明根据本发明的一个实施例的具有等腰三角形元件280A到280H的像素图案的部分280。
在许多实施例中,像素具有竖直或水平偏置纵横比。图24G在概念上说明具有水平偏置纵横比的六边形元件290A到290C的像素图案的部分290。图24H在概念上说明根据本发明的一个实施例的具有水平偏置纵横比的矩形元件300A到300D的像素图案的部分300。图24I在概念上说明根据本发明的一个实施例的具有水平偏置纵横比的菱形元件310A到310D的像素图案的部分310。图24J在概念上说明根据本发明的一个实施例的具有水平偏置纵横比的三角形元件320A到320H的像素图案的部分320。
在许多实施例中,OLED可制造有用于形成OLED的光谱发射特征的空腔形状和多层结构。在一些实施例中,可使用优化成提供窄光谱带宽的微腔OLED。在一些实施例中,光谱带宽可小于40nm。在一些实施例中,可提供20nm或更小的光谱带宽。在一些实施例中,OLED可由在中心靠近所选光谱区的相对窄带中提供电致发光发射的材料制成,所述光谱区对应于三原色中的一种。图25在概念上说明其中不同像素可具有不同发射特征的像素图案。在一些实施例中,像素可根据其在像素阵列中的位置而具有不同光谱发射特征。在一些实施例中,像素可根据其在像素阵列中的位置而具有不同的角发射特征。在一些实施例中,像素可具有跨像素阵列在空间上变化的光谱和角发射特征两者。像素图案可基于图24A到24J中所说明的图案中的任一个。在许多实施例中,不同大小和几何形状的像素可布置成提供空间发射变化以用于控制最终图像中的均一性。
在许多实施例中,OLED可具有设计成用于将给定光分布转换成自定义形式的空腔结构。这通常通过对于可佩戴显示应用来说可能是庞大的二级光学元件来实现。这类设计还受以下问题影响:其将最终光源限制于单一永久操作模式,这仅可通过采用可机械调整的光学元件来克服。在一些实施例中,OLED可实现光束形状的实时调节而不依赖于二级光学元件且不使用任何机械调节。在一些实施例中,OLED可在正向与离轴主发射方向之间连续调谐,同时在如傅瑞斯(Fries)的文章(傅瑞斯F.等人,“无需额外光学元件的实时光束成形(Real-time beam shaping without additional optical elements)”《光科学与应用(Light Science&Applications)》,7(1),18,(2018))中所公开的任何设置中维持高量子效率。
在一些实施例中,重要的OLED开发(“微腔OLED”)可提供更多受控光谱带宽和发射角的可能性。然而,微腔OLED尚未准备进行商业开发。在一个实施例(对应于2微米光栅,其中折射率调制为0.1、平均折射率为1.65且波导中的入射角为45度)中,与OLED发射光谱(在峰值点的25%之间)相比,SBG的衍射效率大于75%。使用更深空腔结构的更窄带宽OLED将使带宽减少40nm及以上。
有利地,本发明可使用优化成在460nm下的蓝光中使用的OLED,与更常用的440nmOLED相比,其在日光AR显示应用中提供更好的蓝光对比度以及更好的可靠性和寿命。
在一些实施例中,发射型显示器可为与高平公司(Kopin Corporation)(西波格(Westborough),MA)开发的显示器类似的OLED全彩硅背板微显示器。高平微显示器提供0.99英寸的图像对角线和2490像素/英寸的像素密度。微显示器使用高平的获专利的PantileTM放大镜来实现密致的外观尺寸。
尽管已在使用OLED微显示器作为输入图像源的实施例方面对本发明进行了论述,但在许多其它实施例中,本发明可应用于任何其它类型的发射型微显示器技术。在一些实施例中,发射型微显示器可为微LED。微LED得益于减少的电力消耗且可在比OLED显示器的亮度更高的亮度下有效地操作。然而,微LED本质上为单色荧光体,通常用于转换LED中的颜色但不能充分缩放到较小大小,从而产生难以按比例缩放为微显示器应用的更复杂的装置架构。
尽管已在基于OLED阵列的波导显示器内使用方面对聚合物光栅结构进行了论述,但聚合物光栅结构具有具备其它类别的显示器的有利协同应用。这些显示器的实例包括使用基于非发射型显示器技术(例如LCoS和MEMS)的显示器的图像产生器。虽然基于LCoS的显示器通常发射偏振光,这可使聚合物光栅结构的基于偏振的优点不太适用,但与常规压印光栅相比,聚合物光栅结构可提供有利效率且节省制造成本。此外,聚合物光栅结构可适用于各种其它的基于非显示器波导的实施方案,例如波导传感器和/或波导照明装置。
等同原则
虽然以上描述含有本发明的许多具体实施例,但这些不应解释为对本发明的范围的限制,而是作为本发明的实施例的实例。因此应了解,在不脱离本发明的范围和精神的情况下,可用除具体描述的方式之外的方式来实践本发明。因此,本发明的实施例应在所有方面中视为说明性的而不是限制性的。因此,本发明的范围不应由所说明的实施例确定,而应由所附权利要求书和其等效物确定。
Claims (86)
1.一种波导装置,其包含:
波导,其支撑用于衍射在所述波导中以全内反射传播的光的聚合物光栅结构,
其中所述聚合物光栅结构包含:
聚合物网络;和
气隙,其位于所述聚合物网络的邻近部分之间。
2.根据权利要求1所述的波导装置,其中所述聚合物光栅结构进一步包含所述聚合物网络的邻近部分之间的各向同性材料,其中所述各向同性材料具有高于或低于所述聚合物网络的折射率的折射率。
3.根据权利要求2所述的波导装置,其中所述各向同性材料占据所述聚合物网络的邻近部分之间的空间的底部部分处的所述空间,且空气占据从所述各向同性材料的顶部表面上方到调制深度的空间。
4.根据权利要求2所述的波导装置,其中所述各向同性材料包含双折射晶体材料。
5.根据权利要求4所述的波导装置,其中所述双折射晶体材料包含液晶材料。
6.根据权利要求1所述的波导装置,其中所述聚合物光栅结构具有大于可见光的波长的调制深度。
7.根据权利要求1所述的波导装置,其中所述聚合物光栅结构包含调制深度和光栅间距,且其中所述调制深度大于所述光栅间距。
8.根据权利要求1所述的波导装置,其中所述波导包含两个衬底,且所述聚合物光栅结构包夹在所述两个衬底之间或安置在任一衬底的外部表面上。
9.根据权利要求1所述的波导装置,其中所述聚合物网络的布拉格(Bragg)条纹间隔为0.35μm到0.8μm,且所述聚合物网络的光栅深度为1μm到3μm。
10.根据权利要求1所述的波导装置,其中所述聚合物网络的光栅深度与所述布拉格条纹间隔的比率为1:1到5:1。
11.根据权利要求1所述的波导装置,其进一步包含图片产生单元,且其中所述聚合物光栅结构包含波导衍射光栅。
12.根据权利要求11所述的波导装置,其中所述波导衍射光栅配置为多路复用光栅。
13.根据权利要求12所述的波导装置,其中所述波导衍射光栅配置成接收来自包括多个图像的所述图片产生单元的光。
14.根据权利要求11所述的波导装置,其中所述波导衍射光栅配置成外耦合来自所述波导的光。
15.根据权利要求11所述的波导装置,其中所述波导衍射光栅配置为扩束器。
16.根据权利要求11所述的波导装置,其中所述波导衍射光栅配置成内耦合包括从所述图片产生单元产生的图像数据的光。
17.根据权利要求16所述的波导装置,其中所述波导衍射光栅进一步配置成以高效率内耦合S偏振光。
18.根据权利要求17所述的波导装置,其中所述衍射光栅进一步配置成以布拉格角以70%到95%的效率内耦合S偏振光。
19.根据权利要求17所述的波导装置,其中所述衍射光栅进一步配置成以布拉格角以25%到50%的效率内耦合P偏振光。
20.根据权利要求1所述的波导装置,其中所述聚合物网络与所述气隙之间的折射率差为0.25到0.4。
21.根据权利要求3所述的波导装置,其中所述聚合物网络与所述双折射晶体材料之间的所述折射率差为0.05到0.2。
22.根据权利要求1所述的波导装置,其中所述聚合物光栅结构包含二维晶格结构或三维晶格结构。
23.根据权利要求1所述的波导装置,其进一步包含另一光栅结构。
24.根据权利要求23所述的波导装置,其中所述聚合物光栅结构包含内耦合光栅,且所述另一光栅结构包含扩束器或外耦合光栅。
25.一种波导装置,其包含:
波导,其支撑用于衍射在所述波导中以全内反射传播的光的聚合物光栅结构,
其中所述聚合物光栅结构包含:
聚合物网络;和
双折射晶体材料,其位于所述聚合物网络的邻近部分之间,其中所述双折射晶体材料具有比所述聚合物更高的折射率。
26.一种用于制造深表面起伏光栅(SRG)的方法,所述方法包含:
提供单体与液晶的混合物;
提供衬底;
将所述混合物的层施加在所述衬底的表面上;
将全息记录光束光束施加到所述层以形成包含交替的富含聚合物的区和富含液晶的区的全息聚合物分散液晶光栅;和
去除所述富含液晶的区中的所述液晶的至少一部分以形成聚合物表面起伏光栅。
27.根据权利要求26所述的方法,其中所述单体包含丙烯酸酯、甲基丙烯酸酯、乙烯基、异氰酸酯、硫醇、异氰酸酯-丙烯酸酯和/或硫堇。
28.根据权利要求26所述的方法,其中所述混合物进一步包含光引发剂、共引发剂或额外添加剂中的至少一种。
29.根据权利要求27所述的方法,其中所述硫醇包含硫醇丙烯酸乙烯酯。
30.根据权利要求28所述的方法,其中所述光引发剂包含感光组分。
31.根据权利要求30所述的方法,其中所述感光组分包含染料和/或自由基产生剂。
32.根据权利要求26所述的方法,其中提供单体与液晶的混合物包含:
混合所述单体、液晶和光引发剂、共引发剂、多官能硫醇或额外添加剂中的至少一种;
在22℃或更低的温度下将所述混合物存储在无光的位置处;
添加额外单体;
通过0.6μm或更小的过滤器过滤所述混合物;和
将所述过滤后的混合物存储在无光的位置处。
33.根据权利要求26所述的方法,其中所述衬底包含玻璃衬底或塑料衬底。
34.根据权利要求26所述的方法,其中所述衬底包含透明衬底。
35.根据权利要求26所述的方法,其进一步包含用一或多个间隔物将所述混合物包夹在所述衬底与另一衬底之间以用于维持内部尺寸。
36.根据权利要求35所述的方法,其进一步包含将不粘释放层施加在所述另一衬底的一个表面上。
37.根据权利要求36所述的方法,其中所述不粘释放层包含含氟聚合物。
38.根据权利要求26所述的方法,其进一步包含用液晶材料再填充所述富含液晶的区。
39.根据权利要求38所述的方法,其中所述液晶材料具有与所述先前去除的液晶不同的分子结构。
40.根据权利要求26所述的方法,其中去除所述液晶的至少一部分包含去除所述富含液晶的区中的大体上所有所述液晶。
41.根据权利要求26所述的方法,其中去除所述液晶的至少一部分进一步包含将所述液晶的至少一部分留在所述富含聚合物的区中。
42.根据权利要求26所述的方法,其进一步包含在所述深SRG上方施加保护层。
43.根据权利要求42所述的方法,其中所述保护层包含抗反射层。
44.根据权利要求42所述的方法,其中所述保护层包含硅酸盐或氮化硅。
45.根据权利要求42所述的方法,其中施加保护层包含在所述深SRG上沉积所述保护层。
46.根据权利要求45所述的方法,其中沉积所述保护层包含化学气相沉积。
47.根据权利要求46所述的方法,其中所述化学气相沉积为纳米涂覆工艺。
48.根据权利要求42所述的方法,其中所述保护层包含聚对二甲苯涂层。
49.根据权利要求26所述的方法,其中在去除所述富含液晶的区中的所述液晶的至少一部分之后,所述富含液晶的区包含气隙。
50.根据权利要求49所述的方法,其进一步包含在所述气隙中产生真空或用惰性气体填充所述气隙。
51.根据权利要求26所述的方法,其中去除液晶的至少一部分包含用溶剂洗涤所述全息聚合物分散液晶光栅。
52.根据权利要求51所述的方法,其中洗涤所述全息聚合物分散液晶光栅包含将所述全息聚合物分散液晶光栅浸没在所述溶剂中。
53.根据权利要求51所述的方法,其中所述溶剂包含异丙醇。
54.根据权利要求51所述的方法,其中在洗涤所述全息聚合物分散液晶光栅时,使所述溶剂保持在低于室温的温度下。
55.根据权利要求51所述的方法,其中去除所述液晶的至少一部分进一步包含用高流量空气源干燥所述全息聚合物分散液晶光栅。
56.根据权利要求26所述的方法,其进一步包含使所述全息聚合物分散液晶光栅固化。
57.根据权利要求56所述的方法,其中使所述全息聚合物分散液晶光栅固化包含将所述全息聚合物分散液晶光栅暴露于低强度白光下,持续约一小时的时段。
58.根据权利要求26所述的方法,其中所述聚合物表面起伏光栅配置成以70%到95%的效率内耦合S偏振光。
59.根据权利要求58所述的方法,其中所述聚合物表面起伏光栅进一步配置成以25%到50%的效率内耦合P偏振光。
60.根据权利要求26所述的方法,其中所述聚合物网络与所述气隙之间的折射率差为0.25到0.4。
61.根据权利要求38所述的方法,其中所述聚合物网络与所述液晶材料之间的所述折射率差为0.05到0.2。
62.根据权利要求26所述的方法,其中所述聚合物表面起伏光栅包含0.35μm到0.8μm的布拉格条纹间隔和1μm到3μm的所述光栅深度。
63.根据权利要求26所述的方法,其中所述聚合物表面起伏光栅包含1:1到5:1的布拉格条纹间隔与光栅深度的比率。
64.根据权利要求26所述的方法,其中单体与液晶的所述混合物中的所述液晶含量为约20%到50%。
65.根据权利要求26所述的方法,其中单体与液晶的所述混合物中的所述液晶包含液晶单晶。
66.根据权利要求65所述的方法,其中所述液晶单晶包含氰基联苯和/或戊基氰基联苯。
67.一种用于制造深SRG的方法,所述方法包含:
提供单体与物质的混合物;
提供衬底;
将所述混合物的层施加在所述衬底的表面上;
将全息记录光束光束施加到所述层以形成包含交替的富含聚合物的区和富含物质的区的全息聚合物分散光栅;和
去除所述富含物质的区中的所述物质的至少一部分以形成聚合物表面起伏光栅。
68.根据权利要求67所述的方法,其中所述单体对所述全息记录光束光束具有反应性且其中所述物质对所述全息记录光束光束不具有反应性。
69.根据权利要求67所述的方法,其中在所述施加全息记录光束光束之前,所述单体和所述物质为可混溶混合物,而在所述施加全息记录光束光束之后,所述单体和所述物质变成不可混溶混合物。
70.根据权利要求67所述的方法,其中所述物质包含液晶。
71.根据权利要求67所述的方法,其中所述物质包含液晶单晶。
72.根据权利要求67所述的方法,其中所述物质包含各向同性材料、溶剂、非反应性单体、无机物和/或纳米粒子。
73.一种波导显示器,其包含:
发射阵列,其发射第一波长带中的光;
准直透镜,其用于将来自所述发射阵列的图像调制光投影在视场上;和
波导,其支撑:
对所述第一波长带中的S偏振光具有高衍射效率的输入和输出SBG;和
对所述第一波长带中的P偏振光具有高衍射效率的输入和输出SBG。
74.根据权利要求73所述的波导显示器,其中所述波导进一步支撑用于衍射由所述发射阵列发射的第二波长带中的S偏振和P偏振光的SBG。
75.根据权利要求73所述的波导显示器,其中所述发射阵列为OLED阵列。
76.根据权利要求73所述的波导显示器,其中所述波导在至少一个平面中弯曲。
77.根据权利要求73所述的波导显示器,其中所述波导由塑料制造。
78.根据权利要求73所述的波导显示器,其中所述发射阵列在空间上失真以预补偿由所述波导中的弯曲表面产生的波前失真。
79.根据权利要求73所述的波导显示器,其中所述发射阵列形成在弯曲或柔性衬底上以预补偿由所述波导中的弯曲表面产生的波前失真。
80.根据权利要求73所述的波导显示器,其中所述光栅中的至少一个为记录在感光聚合物中的布拉格光栅、记录在液晶和单体混合物中的布拉格光栅、深表面起伏光栅、混合式表面起伏/布拉格光栅中的一个。
81.根据权利要求73所述的波导显示器,其中所述波导支撑眼睛处方光学表面。
82.根据权利要求73所述的波导显示器,其中所述发射具有使用元件的多重性图案化的像素阵列,所述元件包含选自以下的群组的至少一个:相同大小的多边形、相同形状的多边形、在所述阵列中大小不同的多边形、在所述阵列中形状不同的多边形、彭罗斯(Penrose)图块和形成非重复图案的元件。
83.一种用于使用波导形成图像的方法,所述方法包含
提供在第一波长带范围内发射光的发射阵列、准直透镜和波导,所述波导支撑对所述第一波长带中的S偏振光具有高衍射效率的输入和输出光栅且支撑对所述第一波长带中的P偏振光具有高衍射效率的输入和输出光栅;
使用所述准直透镜来准直由所述发射阵列发射的图像光;
使用S衍射输入光栅将来自所述OLED阵列的图像调制S偏振光耦合到所述波导中的全内反射路径中;
使用P衍射输入光栅将来自所述OLED阵列的图像调制P偏振光耦合到所述波导中的全内反射路径中;
光束光束扩展且从所述波导提取S偏振光以供查看;和
光束光束扩展且从所述波导提取P偏振光以供查看。
84.根据权利要求83所述的方法,其中所述发射阵列为OLED阵列。
85.根据权利要求83所述的方法,其进一步包含以下步骤:提供由所述波导支撑的弯曲光学表面;使所述发射阵列上的像素图案预失真,从而使用所述准直透镜来形成预失真波前;在所述弯曲光学表面处反射所述预失真波前光;和使用所述弯曲光学表面的光功率从所述预失真波前形成平面波前。
86.根据权利要求83所述的方法,其中所述弯曲光学表面为处方光学表面。
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US11754842B2 (en) | 2015-10-05 | 2023-09-12 | Digilens Inc. | Apparatus for providing waveguide displays with two-dimensional pupil expansion |
US11543594B2 (en) | 2019-02-15 | 2023-01-03 | Digilens Inc. | Methods and apparatuses for providing a holographic waveguide display using integrated gratings |
US11592614B2 (en) | 2019-08-29 | 2023-02-28 | Digilens Inc. | Evacuated gratings and methods of manufacturing |
US11899238B2 (en) | 2019-08-29 | 2024-02-13 | Digilens Inc. | Evacuated gratings and methods of manufacturing |
CN115047683A (zh) * | 2022-08-15 | 2022-09-13 | 歌尔光学科技有限公司 | 一种液晶光栅的制备方法、光波导结构及其制备方法 |
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US11899238B2 (en) | 2024-02-13 |
US11592614B2 (en) | 2023-02-28 |
WO2021041949A1 (en) | 2021-03-04 |
US20220155623A1 (en) | 2022-05-19 |
US20230078253A1 (en) | 2023-03-16 |
US11442222B2 (en) | 2022-09-13 |
EP4022370A4 (en) | 2023-08-30 |
EP4022370A1 (en) | 2022-07-06 |
KR20220054386A (ko) | 2022-05-02 |
US20210063634A1 (en) | 2021-03-04 |
JP2022546413A (ja) | 2022-11-04 |
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