EP1699278A3 - Mehrlagen Schaltungsplatte und Verfahren zur Herstellung - Google Patents

Mehrlagen Schaltungsplatte und Verfahren zur Herstellung Download PDF

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Publication number
EP1699278A3
EP1699278A3 EP06115380A EP06115380A EP1699278A3 EP 1699278 A3 EP1699278 A3 EP 1699278A3 EP 06115380 A EP06115380 A EP 06115380A EP 06115380 A EP06115380 A EP 06115380A EP 1699278 A3 EP1699278 A3 EP 1699278A3
Authority
EP
European Patent Office
Prior art keywords
multilayer printed
producing
same
wiring board
printed wiring
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Granted
Application number
EP06115380A
Other languages
English (en)
French (fr)
Other versions
EP1699278A2 (de
EP1699278B1 (de
Inventor
Honchin En
Masayuki Hayashi
Dongdong Wang
Kenichi Shimada
Motoo Asai
Koji Sekine
Tohru Nakai
Shinichiro Ichikawa
Yukihiko Toyoda
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Ibiden Co Ltd
Original Assignee
Ibiden Co Ltd
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=27580227&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=EP1699278(A3) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Priority claimed from JP27601198A external-priority patent/JP2000114678A/ja
Priority claimed from JP27601098A external-priority patent/JP2000114726A/ja
Priority claimed from JP29045098A external-priority patent/JP2000124601A/ja
Priority claimed from JP31044598A external-priority patent/JP2000138456A/ja
Priority claimed from JP35157298A external-priority patent/JP3710635B2/ja
Priority claimed from JP35473398A external-priority patent/JP2000178754A/ja
Priority claimed from JP37227498A external-priority patent/JP4132331B2/ja
Priority claimed from JP10618499A external-priority patent/JP2000299557A/ja
Priority claimed from JP18741899A external-priority patent/JP4197805B2/ja
Priority to EP07108839A priority Critical patent/EP1893006B1/de
Application filed by Ibiden Co Ltd filed Critical Ibiden Co Ltd
Publication of EP1699278A2 publication Critical patent/EP1699278A2/de
Publication of EP1699278A3 publication Critical patent/EP1699278A3/de
Publication of EP1699278B1 publication Critical patent/EP1699278B1/de
Application granted granted Critical
Anticipated expiration legal-status Critical
Expired - Lifetime legal-status Critical Current

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Classifications

    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/46—Manufacturing multilayer circuits
    • C—CHEMISTRY; METALLURGY
    • C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
    • C23G—CLEANING OR DE-GREASING OF METALLIC MATERIAL BY CHEMICAL METHODS OTHER THAN ELECTROLYSIS
    • C23G1/00—Cleaning or pickling metallic material with solutions or molten salts
    • C23G1/02—Cleaning or pickling metallic material with solutions or molten salts with acid solutions
    • C23G1/10—Other heavy metals
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/067—Etchants
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
    • H05K3/108—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by semi-additive methods; masks therefor
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/382—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal
    • H05K3/384—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal by plating
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/382—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal
    • H05K3/385—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal by conversion of the surface of the metal, e.g. by oxidation, whether or not followed by reaction or removal of the converted layer
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
    • H05K3/388—Improvement of the adhesion between the insulating substrate and the metal by the use of a metallic or inorganic thin film adhesion layer
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/46—Manufacturing multilayer circuits
    • H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
    • H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
    • H01L2924/0001—Technical content checked by a classifier
    • H01L2924/0002—Not covered by any one of groups H01L24/00, H01L24/00 and H01L2224/00
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/01—Dielectrics
    • H05K2201/0104—Properties and characteristics in general
    • H05K2201/0129—Thermoplastic polymer, e.g. auto-adhesive layer; Shaping of thermoplastic polymer
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/01—Dielectrics
    • H05K2201/0137—Materials
    • H05K2201/0158—Polyalkene or polyolefin, e.g. polyethylene [PE], polypropylene [PP]
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/03—Conductive materials
    • H05K2201/0332—Structure of the conductor
    • H05K2201/0335—Layered conductors or foils
    • H05K2201/0338—Layered conductor, e.g. layered metal substrate, layered finish layer or layered thin film adhesion layer
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/09—Shape and layout
    • H05K2201/09209—Shape and layout details of conductors
    • H05K2201/095—Conductive through-holes or vias
    • H05K2201/09563—Metal filled via
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/09—Shape and layout
    • H05K2201/09209—Shape and layout details of conductors
    • H05K2201/095—Conductive through-holes or vias
    • H05K2201/0959—Plated through-holes or plated blind vias filled with insulating material
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
    • H05K2201/09—Shape and layout
    • H05K2201/09209—Shape and layout details of conductors
    • H05K2201/095—Conductive through-holes or vias
    • H05K2201/096—Vertically aligned vias, holes or stacked vias
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/03—Metal processing
    • H05K2203/0307—Providing micro- or nanometer scale roughness on a metal surface, e.g. by plating of nodules or dendrites
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/03—Metal processing
    • H05K2203/0315—Oxidising metal
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
    • H05K2203/0703—Plating
    • H05K2203/072—Electroless plating, e.g. finish plating or initial plating
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
    • H05K2203/11—Treatments characterised by their effect, e.g. heating, cooling, roughening
    • H05K2203/1105—Heating or thermal processing not related to soldering, firing, curing or laminating, e.g. for shaping the substrate or during finish plating
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/0094—Filling or covering plated through-holes or blind plated vias, e.g. for masking or for mechanical reinforcement
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/02—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding
    • H05K3/06—Apparatus or processes for manufacturing printed circuits in which the conductive material is applied to the surface of the insulating support and is thereafter removed from such areas of the surface which are not intended for current conducting or shielding the conductive material being removed chemically or electrolytically, e.g. by photo-etch process
    • H05K3/061—Etching masks
    • H05K3/062—Etching masks consisting of metals or alloys or metallic inorganic compounds
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/46—Manufacturing multilayer circuits
    • H05K3/4602—Manufacturing multilayer circuits characterized by a special circuit board as base or central core whereon additional circuit layers are built or additional circuit boards are laminated
    • H—ELECTRICITY
    • H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
    • H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
    • H05K3/00—Apparatus or processes for manufacturing printed circuits
    • H05K3/46—Manufacturing multilayer circuits
    • H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
    • H05K3/4661—Adding a circuit layer by direct wet plating, e.g. electroless plating; insulating materials adapted therefor
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49117—Conductor or circuit manufacturing
    • Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49117—Conductor or circuit manufacturing
    • Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49147—Assembling terminal to base
    • Y10T29/49151—Assembling terminal to base by deforming or shaping
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49117—Conductor or circuit manufacturing
    • Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49155—Manufacturing circuit on or in base
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49117—Conductor or circuit manufacturing
    • Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49155—Manufacturing circuit on or in base
    • Y10T29/49163—Manufacturing circuit on or in base with sintering of base
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T29/00—Metal working
    • Y10T29/49—Method of mechanical manufacture
    • Y10T29/49002—Electrical device making
    • Y10T29/49117—Conductor or circuit manufacturing
    • Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
    • Y10T29/49155—Manufacturing circuit on or in base
    • Y10T29/49165—Manufacturing circuit on or in base by forming conductive walled aperture in base
    • Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
    • Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
    • Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
    • Y10T428/00—Stock material or miscellaneous articles
    • Y10T428/24—Structurally defined web or sheet [e.g., overall dimension, etc.]
    • Y10T428/24802—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.]
    • Y10T428/24917—Discontinuous or differential coating, impregnation or bond [e.g., artwork, printing, retouched photograph, etc.] including metal layer

Landscapes

  • Engineering & Computer Science (AREA)
  • Manufacturing & Machinery (AREA)
  • Microelectronics & Electronic Packaging (AREA)
  • Chemical & Material Sciences (AREA)
  • Chemical Kinetics & Catalysis (AREA)
  • General Chemical & Material Sciences (AREA)
  • Inorganic Chemistry (AREA)
  • Materials Engineering (AREA)
  • Mechanical Engineering (AREA)
  • Metallurgy (AREA)
  • Organic Chemistry (AREA)
  • Production Of Multi-Layered Print Wiring Board (AREA)
  • Manufacturing Of Printed Wiring (AREA)
  • Insulated Metal Substrates For Printed Circuits (AREA)
  • Laminated Bodies (AREA)
EP06115380A 1998-09-28 1999-09-28 Mehrlagenleiterplatte und Verfahren zu ihrer Herstellung Expired - Lifetime EP1699278B1 (de)

Priority Applications (1)

Application Number Priority Date Filing Date Title
EP07108839A EP1893006B1 (de) 1998-09-28 1999-09-28 Leiterplatte und Herstellungsverfahren dafür

Applications Claiming Priority (11)

Application Number Priority Date Filing Date Title
JP27279998 1998-09-28
JP27601098A JP2000114726A (ja) 1998-09-29 1998-09-29 プリント配線板
JP27601198A JP2000114678A (ja) 1998-09-29 1998-09-29 プリント配線板
JP29045098A JP2000124601A (ja) 1998-10-13 1998-10-13 プリント配線板の製造方法
JP31044598A JP2000138456A (ja) 1998-10-30 1998-10-30 多層プリント配線板およびその製造方法
JP35157298A JP3710635B2 (ja) 1998-12-10 1998-12-10 プリント配線板の製造方法
JP35473398A JP2000178754A (ja) 1998-12-14 1998-12-14 金属膜の形成方法およびプリント配線板の製造方法
JP37227498A JP4132331B2 (ja) 1998-09-28 1998-12-28 多層プリント配線板
JP10618499A JP2000299557A (ja) 1999-04-14 1999-04-14 多層プリント配線板の製造方法および多層プリント配線板
JP18741899A JP4197805B2 (ja) 1999-07-01 1999-07-01 多層プリント配線板およびその製造方法
EP99943468A EP1119227B1 (de) 1998-09-28 1999-09-28 Gedruckte leiterplatte und verfahren zu ihrer herstellung

Related Parent Applications (2)

Application Number Title Priority Date Filing Date
EP99943468.1 Division 1999-09-28
EP99943468A Division EP1119227B1 (de) 1998-09-28 1999-09-28 Gedruckte leiterplatte und verfahren zu ihrer herstellung

Related Child Applications (2)

Application Number Title Priority Date Filing Date
EP07108839A Division EP1893006B1 (de) 1998-09-28 1999-09-28 Leiterplatte und Herstellungsverfahren dafür
EP07108839.7 Division-Into 2007-05-24

Publications (3)

Publication Number Publication Date
EP1699278A2 EP1699278A2 (de) 2006-09-06
EP1699278A3 true EP1699278A3 (de) 2007-04-18
EP1699278B1 EP1699278B1 (de) 2011-04-27

Family

ID=27580227

Family Applications (11)

Application Number Title Priority Date Filing Date
EP08157080A Withdrawn EP1968368A3 (de) 1998-09-28 1999-09-28 Leiterplatte und Herstellungsverfahren dafür
EP06115385A Expired - Lifetime EP1699280B1 (de) 1998-09-28 1999-09-28 Mehrlagen Schaltungsplatte und Verfahren zur Herstellung
EP99943468A Revoked EP1119227B1 (de) 1998-09-28 1999-09-28 Gedruckte leiterplatte und verfahren zu ihrer herstellung
EP07110631A Expired - Lifetime EP1830617B1 (de) 1998-09-28 1999-09-28 Mehrschichtleiterplatte und Herstellungsverfahren dafür
EP06115380A Expired - Lifetime EP1699278B1 (de) 1998-09-28 1999-09-28 Mehrlagenleiterplatte und Verfahren zu ihrer Herstellung
EP07108839A Expired - Lifetime EP1893006B1 (de) 1998-09-28 1999-09-28 Leiterplatte und Herstellungsverfahren dafür
EP08160963A Expired - Lifetime EP1978797B1 (de) 1998-09-28 1999-09-28 Mehrschichtige Leiterplatte und Herstellungsverfahren dafür
EP07110630A Expired - Lifetime EP1830616B1 (de) 1998-09-28 1999-09-28 Verfahren zur Herstellung einer Mehrschichtleiterplatte
EP06115382A Expired - Lifetime EP1699279B8 (de) 1998-09-28 1999-09-28 Mehrlagen Schaltungsplatte und Verfahren zur Herstellung
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Families Citing this family (128)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
MY139405A (en) 1998-09-28 2009-09-30 Ibiden Co Ltd Printed circuit board and method for its production
DE60031680T2 (de) 1999-06-02 2007-09-06 Ibiden Co., Ltd., Ogaki Mehrschichtige, gedruckte leiterplatte und herstellungsmethode für eine mehrschichtige, gedruckte leiterplatte
US8178188B2 (en) 2001-04-20 2012-05-15 Panasonic Corporation Base layer for manufacturing an electronic component by an etching process
US7147141B2 (en) * 2002-11-13 2006-12-12 Intel Corporation Preconditioning via plug material for a via-in-pad ball grid array package
JPWO2004054337A1 (ja) * 2002-12-09 2006-04-13 株式会社野田スクリーン プリント配線基板の製造方法
US20040126547A1 (en) * 2002-12-31 2004-07-01 Coomer Boyd L. Methods for performing substrate imprinting using thermoset resin varnishes and products formed therefrom
JP4133560B2 (ja) * 2003-05-07 2008-08-13 インターナショナル・ビジネス・マシーンズ・コーポレーション プリント配線基板の製造方法およびプリント配線基板
JP4081052B2 (ja) * 2003-12-05 2008-04-23 三井金属鉱業株式会社 プリント配線基板の製造法
KR100828979B1 (ko) * 2004-03-03 2008-05-14 이비덴 가부시키가이샤 에칭액, 에칭 방법 및 프린트 배선판
WO2005093817A1 (ja) * 2004-03-29 2005-10-06 Nec Corporation 半導体装置及びその製造方法
JP4426900B2 (ja) * 2004-05-10 2010-03-03 三井金属鉱業株式会社 プリント配線基板、その製造方法および半導体装置
DE102004032706A1 (de) 2004-07-06 2006-02-02 Epcos Ag Verfahren zur Herstellung eines elektrischen Bauelements und das Bauelement
US7307022B2 (en) * 2004-11-19 2007-12-11 Endicott Interconnect Technologies, Inc. Method of treating conductive layer for use in a circuitized substrate and method of making said substrate having said conductive layer as part thereof
JP4564342B2 (ja) * 2004-11-24 2010-10-20 大日本印刷株式会社 多層配線基板およびその製造方法
JP4346541B2 (ja) * 2004-11-26 2009-10-21 日東電工株式会社 配線回路基板およびその製造方法
TWI307308B (en) * 2005-01-31 2009-03-11 Ps Japan Corp Material of backup board for drilling and cutting operation, and its molded product
JP2006216714A (ja) * 2005-02-02 2006-08-17 Ibiden Co Ltd 多層プリント配線板
TWI394504B (zh) * 2005-05-31 2013-04-21 Hitachi Via Mechanics Ltd 印刷配線板之製造方法與使用該方法製出的銅箔層積板以及處理液
US7670951B2 (en) 2005-06-27 2010-03-02 Intel Corporation Grid array connection device and method
JP4787559B2 (ja) * 2005-07-26 2011-10-05 ルネサスエレクトロニクス株式会社 半導体装置およびその製造方法
KR100689233B1 (ko) * 2005-08-23 2007-03-02 주식회사 토픽 폴리이미드 다이렉트 도금 방법
GB0518613D0 (en) * 2005-09-13 2005-10-19 Eastman Kodak Co Method of forming conductive tracks
US7906850B2 (en) * 2005-12-20 2011-03-15 Unimicron Technology Corp. Structure of circuit board and method for fabricating same
TWI295102B (en) * 2006-01-13 2008-03-21 Ind Tech Res Inst Multi-functional substrate structure
JP4478115B2 (ja) * 2006-01-27 2010-06-09 三共化成株式会社 導電性回路の形成方法
KR100717909B1 (ko) * 2006-02-24 2007-05-14 삼성전기주식회사 니켈층을 포함하는 기판 및 이의 제조방법
CN101058893B (zh) * 2006-04-19 2010-05-26 鸿富锦精密工业（深圳）有限公司 镁制品镀膜电解液
US7776734B2 (en) * 2006-05-26 2010-08-17 Intel Corporation Barrier layer for fine-pitch mask-based substrate bumping
US8193076B2 (en) 2006-10-09 2012-06-05 Solexel, Inc. Method for releasing a thin semiconductor substrate from a reusable template
JP5214139B2 (ja) * 2006-12-04 2013-06-19 新光電気工業株式会社 配線基板及びその製造方法
KR101372147B1 (ko) * 2007-01-23 2014-03-10 엘지이노텍 주식회사 인쇄 회로기판 및 인쇄 회로기판의 제조방법
US20080239684A1 (en) * 2007-04-02 2008-10-02 Shinko Electric Industries Co., Ltd. Wiring board and method of manufacturing the same
TW200906263A (en) * 2007-05-29 2009-02-01 Matsushita Electric Ind Co Ltd Circuit board and method for manufacturing the same
JP5015705B2 (ja) * 2007-09-18 2012-08-29 ルネサスエレクトロニクス株式会社 層間絶縁膜形成方法、層間絶縁膜、半導体デバイス、および半導体製造装置
US7759787B2 (en) * 2007-11-06 2010-07-20 International Business Machines Corporation Packaging substrate having pattern-matched metal layers
TW200926379A (en) * 2007-12-05 2009-06-16 Phoenix Prec Technology Corp Package substrate having electrical connecting structure and method of fabricating the same
US20090218119A1 (en) 2008-03-03 2009-09-03 Ibiden Co., Ltd Method of manufacturing multilayer printed wiring board
JP2009224492A (ja) * 2008-03-14 2009-10-01 Oki Semiconductor Co Ltd 半導体装置及びその製造方法
US8240036B2 (en) 2008-04-30 2012-08-14 Panasonic Corporation Method of producing a circuit board
JP2009283739A (ja) * 2008-05-23 2009-12-03 Shinko Electric Ind Co Ltd 配線基板および配線基板の製造方法
TWI407534B (zh) * 2008-06-03 2013-09-01 Unimicron Technology Corp 具雙面線路之封裝基板及其製法
KR100976149B1 (ko) * 2008-06-25 2010-08-16 (주)바이오버드 나노패턴화된 에폭시 기판의 제조방법
JP5344394B2 (ja) * 2008-07-10 2013-11-20 山栄化学株式会社 硬化性樹脂組成物、並びにハロゲンフリー樹脂基板及びハロゲンフリービルドアッププリント配線板
US7943862B2 (en) * 2008-08-20 2011-05-17 Electro Scientific Industries, Inc. Method and apparatus for optically transparent via filling
WO2010038532A1 (ja) 2008-09-30 2010-04-08 イビデン株式会社 多層プリント配線板、及び、多層プリント配線板の製造方法
JP5033192B2 (ja) 2008-09-30 2012-09-26 イビデン株式会社 多層プリント配線板、及び、多層プリント配線板の製造方法
WO2010065071A2 (en) 2008-11-25 2010-06-10 Regents Of The University Of Minnesota Replication of patterned thin-film structures for use in plasmonics and metamaterials
MY164452A (en) * 2009-01-29 2017-12-15 Jx Nippon Mining & Metals Corp Rolled copper foil or electrolytic copper foil for electronic circuit, and method of forming electronic circuit using same
TW201031301A (en) * 2009-02-04 2010-08-16 Unimicron Technology Corp Method of manufacturing circuit board
US8410374B2 (en) * 2009-02-27 2013-04-02 Ibiden Co., Ltd. Printed wiring board
US8592691B2 (en) * 2009-02-27 2013-11-26 Ibiden Co., Ltd. Printed wiring board
JP4844904B2 (ja) * 2009-03-27 2011-12-28 Ｔｄｋ株式会社 多層配線板及びその製造方法
KR101050214B1 (ko) * 2009-04-09 2011-07-19 대덕지디에스 주식회사 다층 인쇄회로기판 및 그 제조방법
KR101619380B1 (ko) * 2009-05-14 2016-05-11 삼성디스플레이 주식회사 식각액 조성물 및 이를 이용한 어레이 기판의 제조방법
US8426959B2 (en) * 2009-08-19 2013-04-23 Samsung Electronics Co., Ltd. Semiconductor package and method of manufacturing the same
TW201110839A (en) * 2009-09-04 2011-03-16 Advanced Semiconductor Eng Substrate structure and method for manufacturing the same
TWI479968B (zh) * 2009-09-09 2015-04-01 Advanced Semiconductor Eng 線路板製作方法、線路板及晶片封裝結構
JP2011060686A (ja) * 2009-09-14 2011-03-24 Konica Minolta Holdings Inc パターン電極の製造方法及びパターン電極
JP5436995B2 (ja) * 2009-09-14 2014-03-05 新光電気工業株式会社 配線基板及びその製造方法
KR101070098B1 (ko) 2009-09-15 2011-10-04 삼성전기주식회사 인쇄회로기판 및 그의 제조 방법
KR101089959B1 (ko) 2009-09-15 2011-12-05 삼성전기주식회사 인쇄회로기판 및 그의 제조 방법
JP5367523B2 (ja) * 2009-09-25 2013-12-11 新光電気工業株式会社 配線基板及び配線基板の製造方法
KR20110037332A (ko) * 2009-10-06 2011-04-13 삼성전기주식회사 인쇄회로기판 및 그 제조방법
JP2011096900A (ja) * 2009-10-30 2011-05-12 Fujitsu Ltd 導電体およびプリント配線板並びにそれらの製造方法
WO2011052211A1 (ja) 2009-10-30 2011-05-05 パナソニック電工株式会社 回路基板及び回路基板に部品が実装された半導体装置
US9332642B2 (en) * 2009-10-30 2016-05-03 Panasonic Corporation Circuit board
US20110114372A1 (en) * 2009-10-30 2011-05-19 Ibiden Co., Ltd. Printed wiring board
US8278214B2 (en) 2009-12-23 2012-10-02 Intel Corporation Through mold via polymer block package
TWI405317B (zh) * 2010-03-04 2013-08-11 Unimicron Technology Corp 封裝基板及其製法
US8621749B2 (en) 2010-03-12 2014-01-07 Taiwan Green Point Enterprises Co., Ltd Non-deleterious technique for creating continuous conductive circuits
US20120273261A1 (en) 2010-10-20 2012-11-01 Taiwan Green Point Enterprises Co., Ltd. Circuit substrate having a circuit pattern and method for making the same
US8952919B2 (en) 2011-02-25 2015-02-10 Taiwan Green Point Enterprises Co., Ltd. Capacitive touch sensitive housing and method for making the same
JP5476185B2 (ja) * 2010-03-31 2014-04-23 ルネサスエレクトロニクス株式会社 半導体装置及び半導体装置の製造方法
US8519538B2 (en) * 2010-04-28 2013-08-27 Taiwan Semiconductor Manufacturing Company, Ltd. Laser etch via formation
US8492896B2 (en) 2010-05-21 2013-07-23 Panasonic Corporation Semiconductor apparatus and semiconductor apparatus unit
KR101138542B1 (ko) * 2010-08-09 2012-04-25 삼성전기주식회사 다층 인쇄회로기판의 제조방법
KR101781517B1 (ko) 2010-09-30 2017-09-26 삼성디스플레이 주식회사 블록 공중합체 및 이를 이용한 패턴 형성 방법
FR2966692B1 (fr) * 2010-10-26 2012-12-14 Sagem Defense Securite Carte electronique, dispositif electronique comportant une telle carte et procede de protection d'une carte electronique
CN103229605B (zh) * 2011-07-25 2016-06-08 日本特殊陶业株式会社 布线基板
KR101776923B1 (ko) * 2011-08-05 2017-09-11 삼성디스플레이 주식회사 식각액 조성물, 이를 이용한 금속 패턴의 형성 방법 및 표시 기판의 제조 방법
DE102011083223B4 (de) * 2011-09-22 2019-08-22 Infineon Technologies Ag Leistungshalbleitermodul mit integrierter Dickschichtleiterplatte
US8895873B2 (en) * 2011-09-28 2014-11-25 Ibiden Co., Ltd. Printed wiring board
US20130155629A1 (en) * 2011-12-19 2013-06-20 Tong Hsing Electronic Industries, Ltd. Hermetic Semiconductor Package Structure and Method for Manufacturing the same
US9117730B2 (en) * 2011-12-29 2015-08-25 Ibiden Co., Ltd. Printed wiring board and method for manufacturing printed wiring board
KR101921258B1 (ko) * 2012-05-09 2018-11-22 삼성전자주식회사 배선 기판 및 이를 포함하는 반도체 패키지
JP5502139B2 (ja) * 2012-05-16 2014-05-28 日本特殊陶業株式会社 配線基板
US9188871B2 (en) * 2012-05-17 2015-11-17 Taiyo Ink Mfg. Co., Ltd. Pattern forming method, alkali-developable thermosetting resin composition, printed circuit board and manufacturing method thereof
WO2014033648A1 (en) * 2012-08-31 2014-03-06 Basf Se Particles containing one or more multi-layered dots on their surface, their use, and production of such particles
TWM450934U (zh) * 2012-10-09 2013-04-11 Unimicron Technology Corp 軟性電路板
JP2014086651A (ja) * 2012-10-26 2014-05-12 Ibiden Co Ltd プリント配線板及びプリント配線板の製造方法
JP6282425B2 (ja) * 2012-10-29 2018-02-21 新光電気工業株式会社 配線基板の製造方法
JP6056446B2 (ja) 2012-12-17 2017-01-11 三菱マテリアル株式会社 パワーモジュール用基板の製造方法
KR20140090961A (ko) * 2013-01-10 2014-07-18 주식회사 두산 절연수지 필름, 상기 필름을 포함하는 금속박 적층판 및 인쇄회로기판, 및 상기 필름을 포함하는 회로기판의 제조방법
JP2014216375A (ja) * 2013-04-23 2014-11-17 イビデン株式会社 プリント配線板及び多層コア基板の製造方法
JP6266907B2 (ja) * 2013-07-03 2018-01-24 新光電気工業株式会社 配線基板及び配線基板の製造方法
KR101548421B1 (ko) * 2013-08-27 2015-08-28 삼성전기주식회사 다층인쇄회로기판의 제조방법
KR20150043135A (ko) * 2013-10-14 2015-04-22 삼성전자주식회사 금속막을 포함한 인쇄회로기판 및 그것을 포함한 반도체 패키지
US9559064B2 (en) 2013-12-04 2017-01-31 Taiwan Semiconductor Manufacturing Company, Ltd. Warpage control in package-on-package structures
JP6601814B2 (ja) * 2014-05-21 2019-11-06 住友電工プリントサーキット株式会社 プリント配線板及びプリント配線板の製造方法
US9699914B2 (en) * 2014-10-20 2017-07-04 Averatek Corporation Patterning of electroless metals by selective deactivation of catalysts
JP2016092292A (ja) * 2014-11-07 2016-05-23 イビデン株式会社 配線板およびその製造方法
US20170064821A1 (en) * 2015-08-31 2017-03-02 Kristof Darmawikarta Electronic package and method forming an electrical package
CN108141967B (zh) * 2015-10-22 2020-12-01 Ａｇｃ株式会社 配线基板的制造方法
CN105420701B (zh) * 2015-12-24 2018-02-06 竞陆电子(昆山)有限公司 Pcb化金线镍槽排水系统结构
US10211071B2 (en) * 2016-01-29 2019-02-19 Nxp B.V. IC packaging method and a packaged IC device
US9999134B2 (en) 2016-03-14 2018-06-12 Multek Technologies Limited Self-decap cavity fabrication process and structure
JP6885161B2 (ja) * 2016-04-06 2021-06-09 Ａｇｃ株式会社 貫通孔を有するガラス基板の製造方法およびガラス基板に貫通孔を形成する方法
KR20180060687A (ko) * 2016-11-29 2018-06-07 삼성전기주식회사 인쇄회로기판 제조방법
JP6819268B2 (ja) * 2016-12-15 2021-01-27 凸版印刷株式会社 配線基板、多層配線基板、及び配線基板の製造方法
JP7055049B2 (ja) * 2017-03-31 2022-04-15 Ｊｘ金属株式会社 表面処理銅箔及びそれを用いた積層板、キャリア付銅箔、プリント配線板、電子機器、並びに、プリント配線板の製造方法
CN108738241A (zh) * 2017-04-20 2018-11-02 鹏鼎控股(深圳)股份有限公司 电路板的制作方法及其制得的电路板
CN110636897B (zh) * 2017-05-18 2022-10-14 株式会社大赛璐 含有离子液体的层叠体及其制造方法
KR102459308B1 (ko) * 2017-07-31 2022-10-31 삼성전자주식회사 반도체 패키지의 제조 방법
JP6860451B2 (ja) * 2017-09-05 2021-04-14 株式会社荏原製作所 機能性チップを備える基板を研磨する方法
CN109788653B (zh) * 2017-11-15 2022-05-27 奥特斯奥地利科技与系统技术有限公司 具有不同表面精饰的部件承载件及其制造方法
US11160163B2 (en) * 2017-11-17 2021-10-26 Texas Instruments Incorporated Electronic substrate having differential coaxial vias
CN108270011B (zh) * 2018-01-26 2020-09-08 山东大学 一种锂离子电池负极材料及其制备方法
US11224117B1 (en) 2018-07-05 2022-01-11 Flex Ltd. Heat transfer in the printed circuit board of an SMPS by an integrated heat exchanger
KR102698875B1 (ko) * 2018-12-13 2024-08-27 엘지이노텍 주식회사 인쇄회로기판
CN110195244B (zh) * 2019-06-05 2021-04-20 博敏电子股份有限公司 一种用于抑制印制电路板电镀锡锡须生长的方法
CN110344066A (zh) * 2019-07-30 2019-10-18 中国船舶重工集团公司第七二五研究所 一种船体钢海水腐蚀断口的清洗剂及用该清洗剂清洗方法
US11417841B2 (en) 2019-08-13 2022-08-16 Micron Technology, Inc. Techniques for forming self-aligned memory structures
WO2021081867A1 (zh) * 2019-10-31 2021-05-06 鹏鼎控股(深圳)股份有限公司 薄型电路板及其制造方法
CN113130334B (zh) * 2019-12-31 2024-06-18 盛合晶微半导体(江阴)有限公司 提高底部金属与焊垫辨识度的方法
EP3911132B1 (de) * 2020-05-12 2024-07-03 AT & S Austria Technologie & Systemtechnik Aktiengesellschaft Bauteilträger mit einem festen körper, der ein bauteilträgerloch vor dem eindringen von fremdkörpern schützt
CZ309388B6 (cs) * 2020-08-25 2022-11-09 Preciosa, A.S. Souvrství tenkých depozitních a lakových vrstev ozdobného facetovaného funkčního kamene
JP2022097857A (ja) * 2020-12-21 2022-07-01 イビデン株式会社 プリント配線板
CN115449875A (zh) * 2022-10-10 2022-12-09 昆山丰景拓电子有限公司 一种基于普通塑胶选择性区域电镀工艺

Citations (5)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1985000379A1 (en) * 1983-07-06 1985-01-31 Fotodyne, Inc. Acid based variable viscosity compositions such as corrosion and grease removers and polishers
EP0620703A1 (de) * 1993-04-12 1994-10-19 Ibiden Co, Ltd. Harzzusammensetzungen und diese verwendende Leiterplatten
JPH0835086A (ja) * 1994-07-21 1996-02-06 Nippon Steel Corp Ｎｉ系ステンレス鋼板の酸洗方法
EP0743812A1 (de) * 1994-12-01 1996-11-20 Ibiden Co, Ltd. Mehrschichtige leiterplatte und verfahren für deren herstellung
EP0817549A2 (de) * 1996-06-28 1998-01-07 NGK Spark Plug Co. Ltd. Leiterplatte und Verfahren zu ihrer Herstellung

Family Cites Families (148)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US3310432A (en) 1963-07-11 1967-03-21 Corning Glass Works Method for applying electrical conductors on a smooth vitreous surface and article
US3925578A (en) 1971-07-29 1975-12-09 Kollmorgen Photocircuits Sensitized substrates for chemical metallization
JPS493851A (de) 1972-05-01 1974-01-14
US3972755A (en) * 1972-12-14 1976-08-03 The United States Of America As Represented By The Secretary Of The Navy Dielectric circuit board bonding
US4211603A (en) * 1978-05-01 1980-07-08 Tektronix, Inc. Multilayer circuit board construction and method
JPS55150292A (en) * 1979-05-11 1980-11-22 Fujitsu Ltd Method of fabricating printed circuit board
JPS5750489A (en) 1980-09-11 1982-03-24 Nippon Electric Co Method of producing hybrid circuit board
JPS5798676A (en) 1980-11-18 1982-06-18 Nippon Peroxide Co Ltd Etching agent for electroless nickel thin film
DE3111355A1 (de) * 1981-03-23 1982-10-07 Hermann 7742 St Georgen Stockburger Verfahren zum betreiben automatischer vorrichtungen wie kassen oder aehnliches und vorrichtung zur durchfuehrung des verfahrens
JPS5848432A (ja) 1981-09-17 1983-03-22 Denki Kagaku Kogyo Kk 混成集積回路の製法
JPS5982746A (ja) * 1982-11-04 1984-05-12 Toshiba Corp 半導体装置の電極配線方法
JPS5984491A (ja) 1982-11-05 1984-05-16 電気化学工業株式会社 混成集成回路基板の製造方法
JPS60379A (ja) 1983-06-16 1985-01-05 Mitsubishi Electric Corp 移動目標指示レ−ダ装置
JPS60137092A (ja) * 1983-12-19 1985-07-20 株式会社東芝 回路基板の製造方法
JPS61224492A (ja) 1985-03-29 1986-10-06 信越化学工業株式会社 フレキシブルプリント回路基板
JPS61247090A (ja) * 1985-04-24 1986-11-04 日本ペイント株式会社 半田スル−ホ−ルを有する回路板の製造方法
US4666551A (en) * 1985-06-17 1987-05-19 Thaddeus Soberay Vacuum press
JPH0235032B2 (ja) 1985-12-03 1990-08-08 Seikosha Kk Nanjiseiseimitsubuhinnohyomenkokashorihoho
JPH0244902B2 (ja) 1985-12-03 1990-10-05 Seikosha Kk Nanjiseiseimitsubuhinnohyomenkokashorihoho
IN168456B (de) 1985-12-16 1991-04-06 Goodrich Co B F
US4692205A (en) * 1986-01-31 1987-09-08 International Business Machines Corporation Silicon-containing polyimides as oxygen etch stop and dual dielectric coatings
JPH0754770B2 (ja) 1986-02-19 1995-06-07 松下電工株式会社 セラミツク配線基板の製法
JPS62242395A (ja) * 1986-04-14 1987-10-22 松下電工株式会社 高周波用プリント回路板の製造方法
MY101308A (en) 1986-06-09 1991-09-05 Minnesota Mining & Mfg Presensitized circuit material.
JPH0645691B2 (ja) * 1986-09-09 1994-06-15 呉羽化学工業株式会社 ポリアリ−レンチオエ−テル組成物
JPS63126297A (ja) 1986-11-14 1988-05-30 イビデン株式会社 多層プリント配線板並びにそれの製造方法と無電解めっき用絶縁剤
JPS63153894A (ja) 1986-12-18 1988-06-27 伊勢電子工業株式会社 多層プリント配線板
JPS63153893A (ja) 1986-12-18 1988-06-27 伊勢電子工業株式会社 多層プリント配線板
JPS63182894A (ja) 1987-01-26 1988-07-28 松下電工株式会社 セラミツクス配線基板の製法
JP2512762B2 (ja) 1987-08-25 1996-07-03 東芝ケミカル株式会社 多層プリント配線用基板
JPS6453495U (de) * 1987-09-30 1989-04-03
JPH01173695A (ja) * 1987-12-28 1989-07-10 Nippon Petrochem Co Ltd 高周波回路用積層板
US5084355A (en) 1988-04-13 1992-01-28 Hitachi, Ltd. Laminar structure comprising organic material and inorganic material
US4910077A (en) * 1988-08-04 1990-03-20 B.F. Goodrich Company Polynorbornene laminates and method of making the same
US5274026A (en) 1988-09-23 1993-12-28 The B. F. Goodrich Company Curable polycycloolefin resin solutions, their use in making printed circuit boards and the boards so made
US4902556A (en) * 1989-01-27 1990-02-20 The B. F. Goodrich Company Multi-layer polynorbornene and epoxy laminates and process for making the same
US4923734A (en) * 1988-12-23 1990-05-08 The B. F. Goodrich Company Laminates of polynorbornene and polyolefins derived from C2 -C4 monomers
JPH0734505B2 (ja) 1989-01-18 1995-04-12 イビデン株式会社 多層プリント配線板およびその製造方法
JPH02252294A (ja) 1989-03-25 1990-10-11 Matsushita Electric Works Ltd 多層板の製造法
JP3069356B2 (ja) * 1989-05-31 2000-07-24 イビデン株式会社 多層プリント配線板およびその製造方法
US5071701A (en) 1989-11-22 1991-12-10 B. F. Goodrich Corporation Copolymer for use in preparing prepregs, printed circuit wiring boards prepared from such prepregs and processes for preparing such printed circuit wiring boards
US4994903A (en) * 1989-12-18 1991-02-19 Texas Instruments Incorporated Circuit substrate and circuit using the substrate
JPH03229484A (ja) 1990-02-05 1991-10-11 Fujikura Ltd プリント配線板の製造方法
KR930010063B1 (ko) * 1990-03-19 1993-10-14 가부시끼가이샤 히다찌세이사꾸쇼 다층배선기판 및 그 제조 방법
EP0453785A1 (de) * 1990-04-24 1991-10-30 Oerlikon Contraves AG Verfahren zur Herstellung von mehrlagigen Dünnschichtschaltungen mit integrierten Dünnschichtwiderständen
JPH0455555A (ja) 1990-06-25 1992-02-24 Misawa Homes Co Ltd 建物の手摺支柱の設置構造
JP2739726B2 (ja) * 1990-09-27 1998-04-15 インターナシヨナル・ビジネス・マシーンズ・コーポレーシヨン 多層プリント回路板
JP2982323B2 (ja) 1991-01-11 1999-11-22 住友金属鉱山株式会社 ポリイミド基板の製造方法
JPH04264797A (ja) 1991-02-20 1992-09-21 Nec Corp 多層配線基板の製造方法
US5137597A (en) * 1991-04-11 1992-08-11 Microelectronics And Computer Technology Corporation Fabrication of metal pillars in an electronic component using polishing
US5118385A (en) * 1991-05-28 1992-06-02 Microelectronics And Computer Technology Corporation Multilayer electrical interconnect fabrication with few process steps
JPH0548269A (ja) * 1991-08-13 1993-02-26 Matsushita Electric Ind Co Ltd 多層配線基板の製造方法
US5209817A (en) 1991-08-22 1993-05-11 International Business Machines Corporation Selective plating method for forming integral via and wiring layers
US5248853A (en) * 1991-11-14 1993-09-28 Nippondenso Co., Ltd. Semiconductor element-mounting printed board
JPH05136559A (ja) 1991-11-15 1993-06-01 Matsushita Electric Works Ltd 高周波プリント回路用積層板
AU691645B2 (en) 1992-04-03 1998-05-21 California Institute Of Technology High activity ruthenium or osmium metal carbene complexes for olefin metathesis reactions and synthesis thereof
US5312940A (en) 1992-04-03 1994-05-17 California Institute Of Technology Ruthenium and osmium metal carbene complexes for olefin metathesis polymerization
US5710298A (en) 1992-04-03 1998-01-20 California Institute Of Technology Method of preparing ruthenium and osmium carbene complexes
JPH0620703A (ja) 1992-06-30 1994-01-28 Hitachi Maxell Ltd 乾電池
US5461202A (en) * 1992-10-05 1995-10-24 Matsushita Electric Industrial Co., Ltd. Flexible wiring board and its fabrication method
JP2819523B2 (ja) * 1992-10-09 1998-10-30 インターナショナル・ビジネス・マシーンズ・コーポレイション 印刷配線板及びその製造方法
JP3319116B2 (ja) 1992-12-28 2002-08-26 日本ゼオン株式会社 架橋性ノルボルネン系樹脂組成物、及びそれから成る成形品
JP3069476B2 (ja) 1993-01-26 2000-07-24 イビデン株式会社 多層プリント配線板およびその製造方法
JP3093072B2 (ja) 1993-01-29 2000-10-03 伊藤忠ファインケミカル株式会社 表面改質方法
JP2790956B2 (ja) 1993-03-03 1998-08-27 株式会社日立製作所 多層配線板の製法
JPH06275950A (ja) 1993-03-22 1994-09-30 Hitachi Chem Co Ltd 配線板の製造法
JPH06314865A (ja) 1993-04-30 1994-11-08 Toppan Printing Co Ltd プリント配線板
JP3380817B2 (ja) 1993-06-18 2003-02-24 紀和化学工業株式会社 積層樹脂フィルム
JPH0745948A (ja) 1993-07-28 1995-02-14 Ibiden Co Ltd 多層配線板及びその製造方法
JP3087152B2 (ja) * 1993-09-08 2000-09-11 富士通株式会社 樹脂フィルム多層回路基板の製造方法
JPH0794865A (ja) 1993-09-21 1995-04-07 Ibiden Co Ltd 多層配線板の製造方法
US5609704A (en) * 1993-09-21 1997-03-11 Matsushita Electric Industrial Co., Ltd. Method for fabricating an electronic part by intaglio printing
JPH07147483A (ja) 1993-09-30 1995-06-06 Ibiden Co Ltd プリント配線板及びその製造方法
JPH07173638A (ja) 1993-12-21 1995-07-11 Hitachi Chem Co Ltd 無電解銅めっきの前処理方法
JPH07314603A (ja) 1993-12-28 1995-12-05 Nippon Denkai Kk 銅張積層体、多層プリント回路板及びそれらの処理方法
JPH07235743A (ja) 1994-02-22 1995-09-05 Nitto Denko Corp アブレーション加工用フッ素系樹脂組成物および加工フッ素系樹脂基板の製造方法
JPH07235768A (ja) 1994-02-25 1995-09-05 Toshiba Corp 薄膜多層配線基板の製造方法
US5751256A (en) 1994-03-04 1998-05-12 Flexcon Company Inc. Resonant tag labels and method of making same
JP3588498B2 (ja) 1994-03-14 2004-11-10 日本ゼオン株式会社 エポキシ基を有する環状オレフィン系樹脂組成物および該樹脂組成物を用いた絶縁材料
KR100365545B1 (ko) 1994-03-14 2003-04-11 후지쯔 가부시끼가이샤 에폭시기를갖는시클로올레핀수지조성물
JP3210520B2 (ja) * 1994-03-18 2001-09-17 富士通株式会社 薄膜多層基板
TW289900B (de) * 1994-04-22 1996-11-01 Gould Electronics Inc
JPH07321444A (ja) 1994-05-24 1995-12-08 Fujitsu Ltd 金属パターン形成方法
US5460767A (en) * 1994-05-31 1995-10-24 Delco Electronics Corporation Hot melt masking materials
JPH07336017A (ja) 1994-06-08 1995-12-22 Hitachi Ltd 電流反転電解法による薄膜回路製造方法ならびにそれを用いた薄膜回路基板、薄膜多層回路基板および電子回路装置
US5503286A (en) * 1994-06-28 1996-04-02 International Business Machines Corporation Electroplated solder terminal
JPH0820692A (ja) 1994-07-07 1996-01-23 Nippon Zeon Co Ltd 環状オレフィン樹脂組成物およびその架橋物
US5739476A (en) 1994-10-05 1998-04-14 Namgung; Chung Multilayer printed circuit board laminated with unreinforced resin
JPH08107275A (ja) 1994-10-06 1996-04-23 Hitachi Chem Co Ltd 多層プリント配線板用積層板の製造方法
GB2294709B (en) * 1994-11-04 1998-03-04 Rolls Royce Plc A method of manufacturing a porous material
JP3101197B2 (ja) 1994-12-01 2000-10-23 イビデン株式会社 多層プリント配線板およびその製造方法
US5583376A (en) * 1995-01-03 1996-12-10 Motorola, Inc. High performance semiconductor device with resin substrate and method for making the same
JP3296400B2 (ja) 1995-02-01 2002-06-24 東芝マイクロエレクトロニクス株式会社 半導体装置、その製造方法およびＣｕ製リード
JPH08255981A (ja) 1995-03-16 1996-10-01 Fujitsu Ltd 回路基板形成方法及び回路基板
JPH08264956A (ja) * 1995-03-23 1996-10-11 Internatl Business Mach Corp <Ibm> 電気的接続構造
JPH08288657A (ja) 1995-04-18 1996-11-01 Hitachi Chem Co Ltd 多層配線板
JPH08309918A (ja) 1995-05-22 1996-11-26 Nippon Denkai Kk 銅張積層板とそれを用いたプリント回路板およびこれらの製法
JPH091728A (ja) 1995-06-20 1997-01-07 Asahi Chem Ind Co Ltd 樹脂付金属箔、逐次多層積層板及びその製法
US5831108A (en) 1995-08-03 1998-11-03 California Institute Of Technology High metathesis activity ruthenium and osmium metal carbene complexes
JP3084352B2 (ja) 1995-08-28 2000-09-04 太陽インキ製造株式会社 銅箔ラミネート方式ビルドアップ用絶縁樹脂組成物とこれを用いた多層プリント配線板の製造方法
JPH0987366A (ja) 1995-09-22 1997-03-31 Hitachi Ltd 感光性樹脂組成物とそれを用いた多層配線板の製法
US5699613A (en) * 1995-09-25 1997-12-23 International Business Machines Corporation Fine dimension stacked vias for a multiple layer circuit board structure
EP1720392A3 (de) * 1995-11-10 2009-04-08 Ibiden Co., Ltd. Mehrschichtige Leiterplatte und ihre Herstellung
US5939504A (en) 1995-12-07 1999-08-17 Advanced Polymer Technologies Method for extending the pot life of an olefin metathesis polymerization reaction
JPH09162514A (ja) 1995-12-08 1997-06-20 Ibiden Co Ltd プリント配線板とその製造方法
WO1997024229A1 (fr) * 1995-12-26 1997-07-10 Ibiden Co., Ltd. Corps sur lequel est lie un film metallique, couche d'agent de liaison et agent de liaison
US6020443A (en) 1996-02-08 2000-02-01 Advanced Polymer Technologies, Inc. Polymerization of low grade DCPD monomers using an olefin metathesis catalyst
JPH09265186A (ja) * 1996-03-28 1997-10-07 Fujitsu Ltd レジスト材料及び薄膜多層回路基板の製造方法
JPH1098271A (ja) 1996-03-29 1998-04-14 Ibiden Co Ltd 層間絶縁剤および多層プリント配線板
US6343001B1 (en) * 1996-06-12 2002-01-29 International Business Machines Corporation Multilayer capacitance structure and circuit board containing the same
JPH1051113A (ja) 1996-07-29 1998-02-20 Ibiden Co Ltd 多層プリント配線板の製造方法
JPH1056099A (ja) * 1996-08-12 1998-02-24 Shinko Electric Ind Co Ltd 多層回路基板およびその製造方法
JPH10126040A (ja) 1996-08-26 1998-05-15 Ibiden Co Ltd プリント配線板の製造方法
JPH1070365A (ja) 1996-08-28 1998-03-10 Shinko Electric Ind Co Ltd 多層回路基板の製造方法
JP4187269B2 (ja) 1996-10-29 2008-11-26 日本ゼオン株式会社 架橋性重合体組成物
US5766979A (en) * 1996-11-08 1998-06-16 W. L. Gore & Associates, Inc. Wafer level contact sheet and method of assembly
JPH10163627A (ja) 1996-12-04 1998-06-19 Nippon Steel Chem Co Ltd バイアホールの形成方法
JPH10242638A (ja) * 1996-12-19 1998-09-11 Ibiden Co Ltd 多層プリント配線板およびその製造方法
JPH10190224A (ja) * 1996-12-27 1998-07-21 Ibiden Co Ltd 多層プリント配線板およびその製造方法
JPH10224036A (ja) 1997-02-07 1998-08-21 Nippon Avionics Co Ltd ビルドアッププリント配線板およびその製造方法
US5936627A (en) 1997-02-28 1999-08-10 International Business Machines Corporation Method and system for performing perspective divide operations on three-dimensional graphical object data within a computer system
TW398165B (en) * 1997-03-03 2000-07-11 Hitachi Chemical Co Ltd Circuit boards using heat resistant resin for adhesive layers
JPH10247784A (ja) 1997-03-04 1998-09-14 Ibiden Co Ltd 多層プリント配線板およびその製造方法
JP3049215B2 (ja) 1997-03-04 2000-06-05 イビデン株式会社 配線板の製造方法
JPH10247783A (ja) 1997-03-04 1998-09-14 Ibiden Co Ltd 多層プリント配線板およびその製造方法
JPH10256724A (ja) 1997-03-06 1998-09-25 Ibiden Co Ltd 多層プリント配線板
JPH10256736A (ja) 1997-03-17 1998-09-25 Matsushita Electric Works Ltd 多層配線板及びその製造方法
JP3143408B2 (ja) 1997-04-01 2001-03-07 イビデン株式会社 プリント配線板の製造方法
JPH10335826A (ja) 1997-05-30 1998-12-18 Toppan Printing Co Ltd 多層配線回路基板及びその製造方法
KR100480548B1 (ko) 1997-06-06 2005-04-07 제온 코포레이션 환상 올레핀계 중합체를 포함하는 수지부착 금속박, 이를사용하는 적층판 및 다층적층판, 및 다층적층판의제조방법
JPH1117345A (ja) 1997-06-19 1999-01-22 Ibiden Co Ltd 多層プリント配線板
JPH1187928A (ja) 1997-07-08 1999-03-30 Ibiden Co Ltd 多層プリント配線板
US6337522B1 (en) * 1997-07-10 2002-01-08 International Business Machines Corporation Structure employing electrically conductive adhesives
JPH1143566A (ja) 1997-07-29 1999-02-16 Nippon Zeon Co Ltd ノルボルネン系樹脂組成物
JP3098729B2 (ja) 1997-08-22 2000-10-16 イビデン株式会社 多層プリント配線板の製造方法
US6071597A (en) * 1997-08-28 2000-06-06 3M Innovative Properties Company Flexible circuits and carriers and process for manufacture
WO1999021224A1 (fr) * 1997-10-17 1999-04-29 Ibiden Co., Ltd. Substrat d'un boitier
JPH11145621A (ja) 1997-11-04 1999-05-28 Sumitomo Metal Ind Ltd 多層配線基板とその製造方法
JP3311977B2 (ja) 1997-12-05 2002-08-05 イビデン株式会社 無電解めっき用接着剤および多層プリント配線板
DE19756818A1 (de) * 1997-12-19 1999-06-24 Bosch Gmbh Robert Mehrlagen-Leiterplatte
US6045866A (en) * 1998-08-18 2000-04-04 Jin Yee Enterprise Co., Ltd. Method of forming electroless metal plating layers on one single surface of a plastic substrate and the product thereof
EP1843650B1 (de) * 1998-09-03 2012-03-07 Ibiden Co., Ltd. Verfahren zur Herstellung einer mehrschichtigen Leiterplatte
MY139405A (en) * 1998-09-28 2009-09-30 Ibiden Co Ltd Printed circuit board and method for its production
KR100556818B1 (ko) * 1999-05-13 2006-03-10 이비덴 가부시키가이샤 다층 프린트 배선판 및 그 제조방법
US6245696B1 (en) * 1999-06-25 2001-06-12 Honeywell International Inc. Lasable bond-ply materials for high density printed wiring boards
DE60045566D1 (de) 1999-08-06 2011-03-03 Ibiden Co Ltd Mehrschicht-Leiterplatte
US6296949B1 (en) * 1999-09-16 2001-10-02 Ga-Tek Inc. Copper coated polyimide with metallic protective layer
JP2004014848A (ja) 2002-06-07 2004-01-15 Murata Mfg Co Ltd 薄膜回路基板及びその製造方法

Patent Citations (6)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1985000379A1 (en) * 1983-07-06 1985-01-31 Fotodyne, Inc. Acid based variable viscosity compositions such as corrosion and grease removers and polishers
EP0620703A1 (de) * 1993-04-12 1994-10-19 Ibiden Co, Ltd. Harzzusammensetzungen und diese verwendende Leiterplatten
US5589250A (en) * 1993-04-12 1996-12-31 Ibiden Co., Ltd. Resin compositions and printed circuit boards using the same
JPH0835086A (ja) * 1994-07-21 1996-02-06 Nippon Steel Corp Ｎｉ系ステンレス鋼板の酸洗方法
EP0743812A1 (de) * 1994-12-01 1996-11-20 Ibiden Co, Ltd. Mehrschichtige leiterplatte und verfahren für deren herstellung
EP0817549A2 (de) * 1996-06-28 1998-01-07 NGK Spark Plug Co. Ltd. Leiterplatte und Verfahren zu ihrer Herstellung

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EP1968368A2 (de) 2008-09-10
US7994433B2 (en) 2011-08-09
KR20060088573A (ko) 2006-08-04
EP1893006A1 (de) 2008-02-27
KR20060090311A (ko) 2006-08-10
MY139405A (en) 2009-09-30
US20090183904A1 (en) 2009-07-23
EP1699279B1 (de) 2011-06-29
KR20060090735A (ko) 2006-08-14
EP1699278B1 (de) 2011-04-27
DE69934130T2 (de) 2007-09-20

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