JP2007208279A5 - - Google Patents
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- JP2007208279A5 JP2007208279A5 JP2007065471A JP2007065471A JP2007208279A5 JP 2007208279 A5 JP2007208279 A5 JP 2007208279A5 JP 2007065471 A JP2007065471 A JP 2007065471A JP 2007065471 A JP2007065471 A JP 2007065471A JP 2007208279 A5 JP2007208279 A5 JP 2007208279A5
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Claims (25)
- −放射線の投影ビームを共有する放射線システムと、
−パターン形成手段を支持する支持構造とを備え、パターン形成手段が、所望のパターンに従って投影ビームにパターン形成する働きをし、さらに、
−基板を保持する基板テーブルと、
−パターン形成したビームを基板の標的部分に投影する投影システムと、
−前記投影システムの最終要素と、基板テーブル上に配置されたオブジェクト間の空間を液体で少なくとも部分的に充填する液体供給システムとを備え、
前記基板テーブルが、さらに、前記投影システムとオブジェクトの間で中間プレートを支持し、オブジェクトと接触しない支持表面を備えることを特徴とするリソグラフィ投影装置。 - 前記液体供給システムが、前記中間プレートと前記オブジェクト間の空間を液体で充填するために液体供給孔を含む、請求項1に記載の装置。
- 前記基板テーブルが、さらに、ビームを感知する透過像センサを備え、前記中間プレートが、前記センサと前記投影システムの間に配置される、請求項1または2に記載の装置。
- 前記液体供給システムが、前記投影システムの最終要素を前記中間プレート間の空間を液体で充填するために投影システム液体供給システムを含む、請求項1、2または3に記載の装置。
- 前記中間プレートが、装置の光軸に対して直角の面に、前記オブジェクトより大きい断面積を有し、したがって前記オブジェクトの縁を全て、前記中間プレートで覆うことができる、請求項1から4いずれか1項に記載の装置。
- −放射線の投影ビームを共有する放射線システムと、
−パターン形成手段を支持する支持構造とを備え、パターン形成手段が、所望のパターンに従って投影ビームにパターン形成する働きをし、さらに、
−基板を保持する基板テーブルと、
−パターン形成したビームを基板の標的部分に投影する投影システムと、
−前記投影システムの最終要素と、基板テーブル上に配置されたオブジェクト間の空間を液体で少なくとも部分的に充填する液体供給システムとを備える装置で、
さらに、
−前記空間の境界の少なくとも一部に沿って、前記投影システムの最終要素と前記基板テーブルの間に延在する液体供給システムの部材と、
−前記基板テーブルから延在し、前記部材と前記投影システムの前記最終要素との間に配置された毛管とを備えることを特徴とするリソグラフィ投影装置。 - 前記毛管がチューブである、
請求項6に記載の装置。 - 前記毛管が多孔質膜で形成される、
請求項7に記載の装置。 - 前記毛管の内部コーティングが疎水性である、
請求項6から8いずれか1項に記載の装置。 - さらに、前記空間内の前記液体と前記毛管との間に電位差を与える手段を備える、
請求項6から9いずれか1項に記載の装置。 - 撮像すべき前記オブジェクトが基板またはセンサである、
請求項1から10いずれか1項に記載の装置。 - 前記縁密封部材、または前記第1または第2のさらなる縁密封部材を、前記オブジェクトの周囲で前記オブジェクトに接着する、
請求項1から11いずれか1項に記載の装置。 - リソグラフィ装置の基板取り扱いシステムであって、
基板を保持するように構築された基板テーブルと、
基板テーブルを囲む周囲構造と、
基板のレベルパラメータを求めるように構成されたセンサと、
少なくとも周囲構造の表面に対して直角の方向で、基板テーブルおよび周囲構造を相対的に移動させるように構成したアクチュエータと、
レベルパラメータを使用して基板テーブルおよび周囲構造を相対的に移動させて、基板テーブル上に保持された場合に基板の表面が周囲構造の表面とほぼ同一レベルの位置になるようにアクチュエータを駆動するように構成した制御装置とを有するシステム。 - センサが、基板の表面と周囲構造の表面とのレベル差を測定するように構成されたレベル差センサを有し、レベルパラメータがレベル差を有する、請求項13に記載のシステム。
- レベル差センサが、リソグラフィ装置の平坦さ測定位置に設けられ、レベル差センサ、基板を保持する基板テーブル、またはその両方が、基板の縁部を走査するように構成される、請求項14に記載のシステム。
- センサが、基板テーブルで保持された場合に基板の表面のレベルを測定するように構成され、レベルパラメータが基板の表面のレベルを有する、請求項13〜15のいずれかに記載のシステム。
- センサが、基板上の複数の個別位置で基板のレベルパラメータを求めるように構成される、請求項13〜16のいずれかに記載のシステム。
- アクチュエータが複数のアクチュエータを有し、複数のアクチュエータがそれぞれ、制御装置によって個々に駆動されるように構成される、請求項17に記載のシステム。
- 複数のアクチュエータがそれぞれ、制御装置によって駆動されて、周囲構造の表面に対して基板テーブルを、複数の個別位置で基板テーブルで保持されている基板の表面が周囲構造の表面とほぼ同一レベルになる位置へと移動させる、請求項18に記載のシステム。
- デバイス製造方法であって、
基板テーブルを囲む周囲構造の表面に対して基板テーブルを、基板テーブル上に保持された基板の表面が周囲構造の表面とほぼ同一レベルにある位置に位置決めすることと、
パターン形成した放射線ビームを基板に投影することとを含む方法。 - 光学素子を使用してパターン形成したビームを投影する、請求項20に記載の方法。
- 光学素子が浸漬流体リザーバを有する、請求項21に記載の方法。
- さらに、基板のレベルパラメータを求めることと、基板テーブルの位置決めにレベルパラメータを使用することとを含む、請求項20〜22のいずれかに記載の方法。
- レベルパラメータが、基板の表面と周囲構造の表面とのレベル差、又は基板テーブルで保持された場合の基板表面のレベルを有する、請求項23に記載の方法。
- 周囲構造の表面に対する基板テーブルを、複数の個別位置で基板テーブルで保持されている基板の表面が周囲構造の表面とほぼ同一レベルである位置に位置決めすることを含む、請求項20〜24のいずれかに記載の方法。
Applications Claiming Priority (2)
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EP02257822 | 2002-11-12 | ||
EP03253636 | 2003-06-09 |
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JP2003417260A Division JP3953460B2 (ja) | 2002-11-12 | 2003-11-11 | リソグラフィ投影装置 |
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JP2010102149A Division JP5005793B2 (ja) | 2002-11-12 | 2010-04-27 | リソグラフィ投影装置 |
Publications (3)
Publication Number | Publication Date |
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JP2007208279A JP2007208279A (ja) | 2007-08-16 |
JP2007208279A5 true JP2007208279A5 (ja) | 2009-05-14 |
JP4553913B2 JP4553913B2 (ja) | 2010-09-29 |
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JP2003417260A Expired - Fee Related JP3953460B2 (ja) | 2002-11-12 | 2003-11-11 | リソグラフィ投影装置 |
JP2007065471A Expired - Fee Related JP4553913B2 (ja) | 2002-11-12 | 2007-03-14 | リソグラフィ投影装置 |
JP2010102149A Expired - Fee Related JP5005793B2 (ja) | 2002-11-12 | 2010-04-27 | リソグラフィ投影装置 |
JP2012027270A Expired - Fee Related JP5400910B2 (ja) | 2002-11-12 | 2012-02-10 | リソグラフィ投影装置 |
Family Applications Before (1)
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JP2003417260A Expired - Fee Related JP3953460B2 (ja) | 2002-11-12 | 2003-11-11 | リソグラフィ投影装置 |
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JP2010102149A Expired - Fee Related JP5005793B2 (ja) | 2002-11-12 | 2010-04-27 | リソグラフィ投影装置 |
JP2012027270A Expired - Fee Related JP5400910B2 (ja) | 2002-11-12 | 2012-02-10 | リソグラフィ投影装置 |
Country Status (6)
Country | Link |
---|---|
US (10) | US7199858B2 (ja) |
JP (4) | JP3953460B2 (ja) |
KR (1) | KR100588124B1 (ja) |
CN (2) | CN100568101C (ja) |
SG (1) | SG121819A1 (ja) |
TW (1) | TWI251127B (ja) |
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