KR100588124B1 - 리소그래피장치 및 디바이스제조방법 - Google Patents
리소그래피장치 및 디바이스제조방법 Download PDFInfo
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- KR100588124B1 KR100588124B1 KR1020030079619A KR20030079619A KR100588124B1 KR 100588124 B1 KR100588124 B1 KR 100588124B1 KR 1020030079619 A KR1020030079619 A KR 1020030079619A KR 20030079619 A KR20030079619 A KR 20030079619A KR 100588124 B1 KR100588124 B1 KR 100588124B1
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- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
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- G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
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Abstract
Description
Claims (45)
- 리소그래피투영장치에 있어서,- 방사선의 투영빔을 제공하는 방사선시스템;- 소정 패턴에 따라 상기 투영빔을 패터닝하는 역할을 하는 패터닝수단을 지지하는 지지구조체;- 기판을 잡아주는 기판테이블;- 상기 기판의 타겟부상으로 패터닝된 빔을 투영하는 투영시스템; 및- 상기 투영시스템의 최종요소와 상기 기판테이블상에 위치된 물체 사이의 공간을 적어도 부분적으로 액체로 채우는 액체공급시스템을 포함하여 이루어지고,상기 기판테이블은 상기 물체의 에지를 적어도 부분적으로 둘러싸는 에지시일부재, 및 상기 에지시일부재와 상기 투영시스템의 반대쪽상에 놓인 상기 물체 사이의 갭에 진공 또는 액체를 제공하도록 위치된 진공포트 또는 액공급포트를 더 포함하는 것을 특징으로 하는 리소그래피투영장치.
- 제1항에 있어서,상기 기판테이블은 상기 진공포트의 반경방향 안쪽으로 위치된 채널을 더 포함하고, 상기 채널은 가스원에 연결되어 있어, 상기 진공원의 작동시에 상기 채널로부터 상기 진공원을 향하여 반경방향 바깥쪽으로 가스의 흐름이 조성될 수 있는 것을 특징으로 하는 리소그래피투영장치.
- 제2항에 있어서,상기 기판과 접촉하는 버얼(burl)은, 상기 채널의 반경방향 바깥쪽을 향하여 그리고 상기 진공포트의 안쪽을 향하여 존재하는 것을 특징으로 하는 리소그래피투영장치.
- 제1항 내지 제3항 중 어느 한 항에 있어서,상기 기판테이블은, 물체의 아래에서 연장되며 상기 진공포트의 반경방향 바깥쪽으로 있는 부분을 더 포함하는 것을 특징으로 하는 리소그래피투영장치.
- 제4항에 있어서,상기 부분은, 상기 물체까지 연장되어 상기 물체를 적어도 부분적으로 지지하는 부품들을 가지는 것을 특징으로 하는 리소그래피투영장치.
- 제3항에 있어서,상기 버얼, 부분 및 부품들 중 하나 이상은 상기 기판테이블을 지지하는 핌플테이블의 일부인 것을 특징으로 하는 리소그래피투영장치.
- 제1항 내지 제3항 중 어느 한 항에 있어서,상기 진공포트를 통한 상기 갭 및 상기 진공원과 유체 연결된 상기 기판테이블내의 격실을 더 포함하는 것을 특징으로 하는 리소그래피투영장치.
- 제1항 내지 제3항 중 어느 한 항에 있어서,상기 진공포트는 고리형인 것을 특징으로 하는 리소그래피투영장치.
- 제1항 내지 제3항 중 어느 한 항에 있어서,상기 진공포트는 연속해 있지 않은 것을 특징으로 하는 리소그래피투영장치.
- 제1항 내지 제3항 중 어느 한 항에 있어서,상기 진공포트는 연속해 있는 것을 특징으로 하는 리소그래피투영장치.
- 제1항 내지 제3항 중 어느 한 항에 있어서,상기 진공포트는 상기 에지시일부재의 에지부에 인접하여 위치되는 것을 특징으로 하는 리소그래피투영장치.
- 리소그래피투영장치에 있어서,- 방사선의 투영빔을 제공하는 방사선시스템;- 소정 패턴에 따라 상기 투영빔을 패터닝하는 역할을 하는 패터닝수단을 지지하는 지지구조체;- 기판을 잡아주는 기판테이블;- 상기 기판의 타겟부상으로 패터닝된 빔을 투영하는 투영시스템; 및- 상기 투영시스템의 최종요소와 상기 기판테이블상에 위치된 물체 사이의 공간을 적어도 부분적으로 액체로 채우는 액체공급시스템을 포함하여 이루어지고,상기 기판테이블은, 상기 물체의 주표면과 실질적으로 공면인(co-planar) 상기 투영시스템을 향하는 주표면을 제공하고 상기 물체의 에지를 적어도 부분적으로 둘러싸는 에지시일부재를 더 포함하고, 상기 액체공급시스템은 상기 물체, 상기 에지시일부재 및 상기 기판 중 하나 이상의 국한된 영역에 액체를 제공하는 것을 특징으로 하는 리소그래피투영장치.
- 제12항에 있어서,상기 에지시일부재 및 물체는 서로에 대하여 이동가능하게 장착되는 것을 특징으로 하는 리소그래피투영장치.
- 제12항 또는 제13항에 있어서,상기 에지시일부재는 상기 에지시일부재와 상기 물체 사이의 거리를 변화시키기 위하여 상기 에지시일부재의 상기 주표면과 실질적으로 평행인 평면내에서 이동가능한 것을 특징으로 하는 리소그래피투영장치.
- 제12항 또는 제13항에 있어서,상기 기판테이블은 상기 장치의 광축선에 실질적으로 평행한 방향으로 상기 기판테이블의 잔여부에 대하여 상기 에지시일부재를 이동시키는 액츄에이터를 더 포함하는 것을 특징으로 하는 리소그래피투영장치.
- 제15항에 있어서,상기 액츄에이터는, 상기 에지시일부내의 상기 주표면과 실질적으로 평행한 방향으로 이동시에, 상기 장치의 광축선에 실질적으로 평행한 방향으로 상기 기판테이블의 잔여부에 대하여 상기 에지시일부재를 이동시키는 데 효과적인 웨지부재(wedge member)를 포함하는 것을 특징으로 하는 리소그래피투영장치.
- 제16항에 있어서,상기 웨지는, 상기 웨지의 마찰계수에 의하여 작동력을 제거하여 제자리에 고정되도록 구성되는 것을 특징으로 하는 리소그래피투영장치.
- 제12항 또는 제13항에 있어서,상기 기판테이블은, 상기 투영시스템에 대하여 상기 에지시일부재와 상기 물체의 반대쪽상에서 상기 에지시일부재와 상기 물체의 에지부들에 인접한 소수층을 더 포함하는 것을 특징으로 하는 리소그래피투영장치.
- 제18항에 있어서,상기 액체는 상기 소수층과 90°보다 큰 접촉각을 가지는 것을 특징으로 하 는 리소그래피투영장치.
- 제12항 또는 제13항에 있어서,상기 에지시일부재는, 상기 에지시일부재의 주표면과 공면이고 상기 장치의 광축선을 향하여 연장되는 최상면이 있는 돌출부를 가지는 것을 특징으로 하는 리소그래피투영장치.
- 제12항 또는 제13항에 있어서,상기 기판테이블은, 상기 광축선의 방향으로 상기 에지시일부재와 상기 물체 둘 모두를 적어도 부분적으로 맞닿게 하거나 오버랩시키는 갭시일부재를 더 포함하는 것을 특징으로 하는 리소그래피투영장치.
- 제21항에 있어서,상기 갭시일부재는 상기 주표면과 접촉하여, 상기 에지시일부재와 상기 물체 사이의 갭을 메우는(spanning) 것을 특징으로 하는 리소그래피투영장치.
- 제21항에 있어서,상기 갭시일부재는 내측 및 외측 에지를 가지며, 그들 중 적어도 하나의 에지는, 상기 에지시일부재 또는 상기 물체의 주표면으로부터 떨어져 있는 상기 갭시일부재의 표면의 거리가 상기 갭시일부재의 에지를 향하여 감소하도록 테이퍼진 것을 특징으로 하는 리소그래피투영장치.
- 제21항에 있어서,상기 기판테이블은 상기 갭시일부재를 제자리에 잡아주기 위하여 상기 에지시일부재의 상기 주표면에 진공포트를 더 포함하는 것을 특징으로 하는 리소그래피투영장치.
- 제12항 또는 제13항에 있어서,상기 기판테이블은 상기 기판테이블의 잔여부에 대하여 상기 물체의 주표면의 거리를 변화시키는 수단을 포함하는 것을 특징으로 하는 리소그래피투영장치.
- 리소그래피투영장치에 있어서,- 방사선의 투영빔을 제공하는 방사선시스템;- 소정 패턴에 따라 상기 투영빔을 패터닝하는 역할을 하는 패터닝수단을 지지하는 지지구조체;- 기판을 잡아주는 기판테이블;- 상기 기판의 타겟부상으로 패터닝된 빔을 투영하는 투영시스템; 및- 상기 투영시스템의 최종요소와 상기 기판테이블상에 위치된 물체 사이의 공간을 적어도 부분적으로 액체로 채우는 액체공급시스템을 포함하여 이루어지고,상기 기판테이블은 상기 물체의 에지를 적어도 부분적으로 둘러싸는 에지시일부재, 및 상기 에지시일부재와 상기 물체 사이의 갭에 걸쳐 연장되고 상기 물체와 접촉해 있는 또 다른 에지시일부재를 더 포함하는 것을 특징으로 하는 리소그래피투영장치.
- 제26항에 있어서,상기 또 다른 에지시일부재는 유연한 것을 특징으로 하는 리소그래피투영장치.
- 제27항에 있어서,상기 유연한 또 다른 에지부재는 상기 에지시일부재에 부착되는 것을 특징으로 하는 리소그래피투영장치.
- 제26항 내지 제28항 중 어느 한 항에 있어서,상기 유연한 또 다른 에지시일부재는, 진공원에 연결되고 상기 에지시일부재로부터 그 끝단에 인접한 포트를 가져서, 상기 진공원의 작동시 상기 유연한 또 다른 에지시일부재는 상기 물체에 대하여 접촉하도록 위쪽으로 편향될 수 있어, 상기 물체에 작용하는 상기 진공원에 의하여 발생된 힘에 의하여 상기 유연한 또 다른 에지시일부재와 상기 물체 사이의 밀봉을 형성하는 것을 특징으로 하는 리소그래피투영장치.
- 제26항 또는 제27항에 있어서,상기 물체의 아래에서 상기 기판테이블에 부착되고, 또한 부착점으로부터 반경방향 바깥쪽으로의 자유단을 가지는 유연한 또 다른 제2에지시일부재를 더 포함하는 것을 특징으로 하는 리소그래피투영장치.
- 제26항 또는 제27항에 있어서,상기 유연한 또 다른 에지시일부재는, 상기 에지시일부재와 상기 물체 사이에 배치되고 상기 물체와 상기 에지시일부재의 상기 주표면과 실질적으로 공면인 표면을 가지도록 배치되는 것을 특징으로 하는 리소그래피투영장치.
- 제31항에 있어서,상기 유연한 또 다른 에지시일부재는 그 주표면과 반대인 표면상에서 상기 물체와 접촉하기 위한 형상을 가지는 것을 특징으로 하는 리소그래피투영장치.
- 제31항에 있어서,상기 유연한 또 다른 에지시일부재는, 상기 물체가 상기 기판테이블상에 잡혀 있는 경우, 상기 기판테이블로부터 떨어지도록 상기 물체에 힘을 가하는 데 효과적인 것을 특징으로 하는 리소그래피투영장치.
- 리소그래피투영장치에 있어서,- 방사선의 투영빔을 제공하는 방사선시스템;- 소정 패턴에 따라 상기 투영빔을 패터닝하는 역할을 하는 패터닝수단을 지지하는 지지구조체;- 기판을 잡아주는 기판테이블;- 상기 기판의 타겟부상으로 패터닝된 빔을 투영하는 투영시스템; 및- 상기 투영시스템의 최종요소와 상기 기판테이블상에 위치된 물체 사이의 공간을 적어도 부분적으로 액체로 채우는 액체공급시스템을 포함하여 이루어지고,상기 기판테이블은, 상기 투영시스템과 상기 물체 사이에 있는 중간판(intermediary plate)을 지지하고 상기 물체와 접촉하지 않는 지지면을 더 포함하는 것을 특징으로 하는 리소그래피투영장치.
- 제34항에 있어서,상기 액체공급시스템은 상기 중간판과 상기 물체 사이의 공간을 액체로 채우는 액체공급포트를 포함하는 것을 특징으로 하는 리소그래피투영장치.
- 제34항 또는 제35항에 있어서,상기 기판테이블은 빔을 감지하는 투과이미지센서를 더 포함하고, 상기 중간판이 상기 센서와 상기 투영시스템사이에 위치될 수 있는 것을 특징으로 하는 리소그래피투영장치.
- 제34항 또는 제35항에 있어서,상기액체공급시스템은 상기 투영시스템의 최종요소와 상기 중간판사이의 공간을 액체로 채우는 투영시스템 액체공급시스템을 포함하는 것을 특징으로 하는 리소그래피투영장치.
- 제34항 또는 제35항에 있어서,상기 중간판은 상기 장치의 광축선에 대하여 수직인 평면에서 상기 물체의 단면적보다 큰 단면적을 가져서, 상기 물체의 모든 에지가 상기 중간판에 의하여 덮일 수 있는 것을 특징으로 하는 리소그래피투영장치.
- 리소그래피투영장치에 있어서,- 방사선의 투영빔을 제공하는 방사선시스템;- 소정 패턴에 따라 상기 투영빔을 패터닝하는 역할을 하는 패터닝수단을 지지하는 지지구조체;- 기판을 잡아주는 기판테이블;- 상기 기판의 타겟부상으로 패터닝된 빔을 투영하는 투영시스템; 및- 상기 투영시스템의 최종요소와 상기 기판테이블상에 위치된 물체 사이의 공간을 적어도 부분적으로 액체로 채우는 액체공급시스템을 포함하여 이루어지고,상기 투영시스템의 최종요소와 상기 기판테이블 사이의 상기 공간의 경계의 적어도 일부를 따라 연장되는 액체공급시스템의 부재; 및상기 기판테이블로부터 멀리 연장되고, 상기 부재와 상기 투영시스템의 상기 최종요소 사이에 위치된 모세관들을 더 포함하는 것을 특징으로 하는 리소그래피투영장치.
- 제39항에 있어서,상기 모세관들은 튜브인 것을 특징으로 하는 리소그래피투영장치.
- 제40항에 있어서,상기 모세관들은 다공성 멤브레인으로 형성되는 것을 특징으로 하는 리소그래피투영장치.
- 제39항 내지 제41항 중 어느 한 항에 있어서,상기 모세관들의 내측코팅은 소수성인 것을 특징으로 하는 리소그래피투영장치.
- 제39항 내지 제41항 중 어느 한 항에 있어서,상기 공간내의 상기 액체와 상기 모세관들 사이에 전위차를 인가하는 수단을 더 포함하는 것을 특징으로 하는 리소그래피투영장치.
- 제1항 내지 제3항 중 어느 한 항에 있어서,묘화되는 상기 물체는 기판 또는 센서인 것을 특징으로 하는 리소그래피투영장치.
- 제1항 내지 제3항 중 어느 한 항에 있어서,상기 에지시일부재 또는, 상기 제1 또는 또 다른 제2에지시일부재는 상기 물체의 원주 주변에서 상기 물체에 접착되는 것을 특징으로 하는 리소그래피투영장치.
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