JP4444920B2 - 露光装置及びデバイス製造方法 - Google Patents
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
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- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
Description
本願は、2003年9月19日に出願された特願2003−328997号について優先権を主張し、その内容をここに援用する。
δ=±k2・λ/NA2 ・・・ (2)
ここで、λは露光波長、NAは投影光学系の開口数、k1、k2はプロセス係数である。(1)式、(2)式より、解像度Rを高めるために、露光波長λを短くして、開口数NAを大きくすると、焦点深度δが狭くなることが分かる。
図1は本実施形態に係る露光装置を示す概略構成図である。図1において、露光装置EXは、マスクMを支持するマスクステージMSTと、基板Pを支持する基板ステージPSTと、マスクステージMSTに支持されているマスクMを露光光ELで照明する照明光学系ILと、露光光ELで照明されたマスクMのパターン像を基板ステージPSTに支持されている基板Pに投影露光する投影光学系PLと、露光装置EX全体の動作を統括制御する制御装置CONTとを備えている。
本発明のデバイス製造方法は、上記の露光装置を用いるデバイス製造方法に関する。
Claims (12)
- 投影光学系と液体とを介してパターンの像を基板上に投影することによって前記基板を露光する露光装置であって、
前記パターンの像が投影される投影領域の近くに供給口を有し、前記基板の上方から前記供給口を通じて前記基板上に液体を供給する液体供給機構と;
前記供給口よりも前記投影領域から遠い位置に設けられた第1回収口と、前記第1回収口よりも前記投影領域から遠い位置に設けられた第2回収口とを有し、前記基板の上方から前記第1回収口および第2回収口を通じて前記基板上の液体を回収する液体回収機構と;
前記第1回収口の内部に配置された多孔部材と;
前記投影光学系と前記基板との間に形成される液浸領域の端部を検出する検出器と;
を備えている。 - 請求項1に記載した露光装置であって、
前記第2回収口は、前記投影領域に対して前記第1回収口の外側に配置されている。 - 請求項1に記載した露光装置であって、
前記第1回収口は、前記投影領域を囲むように配置されている。 - 請求項1に記載した露光装置であって、
前記供給口は、前記投影領域の両側に配置されている。 - 請求項1に記載した露光装置であって、
前記第2回収口は、前記投影領域を囲むように配置されている。 - 請求項1に記載した露光装置であって、
前記多孔質材は、スポンジ状の部材を含む。 - 請求項1に記載した露光装置であって、
前記第1回収口から液体だけが回収されるように、前記供給口からの液体供給量と前記第1回収口からの液体回収量の少なくともいずれか一方を制御する制御系を備える。 - 請求項7に記載した露光装置において、
前記制御系は、前記検出器の検出結果に基づいて、前記液体供給機構の液体供給量と前記液体回収機構の液体回収量の少なくともいずれか一方を制御する。 - 請求項7に記載した露光装置であって、
前記制御系は、前記液浸領域の端部が前記投影領域を含む所定範囲内に収まるように、前記検出器の検出結果に基づいて、前記液体供給機構の液体供給量と前記液体回収機構の液体回収量の少なくとも一方を制御する。 - 請求項7に記載した露光装置であって、
前記液体供給機構は、液体供給量を計測する第1計測器を有し、
前記制御系は、前記第1計測器の計測結果に基づいて、前記供給口からの液体供給量と前記第1回収口からの液体回収量の少なくともいずれか一方を制御する。 - 請求項7に記載した露光装置であって、
前記液体回収機構は、液体回収量を計測する第2計測器を有し、
前記制御系は、前記第2計測器の計測結果に基づいて、前記供給口からの液体供給量と前記第1回収口からの液体回収量の少なくともいずれか一方を制御する。 - 請求項1〜請求項11のいずれか一項記載の露光装置を用いるデバイス製造方法。
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JP2003328997 | 2003-09-19 | ||
JP2003328997 | 2003-09-19 | ||
PCT/JP2004/014000 WO2005029559A1 (ja) | 2003-09-19 | 2004-09-16 | 露光装置及びデバイス製造方法 |
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JPWO2005029559A1 JPWO2005029559A1 (ja) | 2006-11-30 |
JP4444920B2 true JP4444920B2 (ja) | 2010-03-31 |
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JP (1) | JP4444920B2 (ja) |
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