TWI553701B - - Google Patents

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Publication number
TWI553701B
TWI553701B TW101117751A TW101117751A TWI553701B TW I553701 B TWI553701 B TW I553701B TW 101117751 A TW101117751 A TW 101117751A TW 101117751 A TW101117751 A TW 101117751A TW I553701 B TWI553701 B TW I553701B
Authority
TW
Taiwan
Application number
TW101117751A
Other versions
TW201243910A (en
Inventor
安田雅彥
正田隆博
金谷有步
長山匡
白石健一
Original Assignee
尼康股份有限公司
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2003350628 priority Critical
Priority to JP2004045103 priority
Application filed by 尼康股份有限公司 filed Critical 尼康股份有限公司
Publication of TW201243910A publication Critical patent/TW201243910A/zh
Application granted granted Critical
Publication of TWI553701B publication Critical patent/TWI553701B/zh

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Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70216Systems for imaging mask onto workpiece
    • G03F7/70341Immersion
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70058Mask illumination systems
    • G03F7/70141Illumination system adjustment, alignment during assembly of illumination system
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70691Handling of masks or wafers
    • G03F7/70716Stages
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
TW101117751A 2003-10-09 2004-10-11 TWI553701B (zh)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2003350628 2003-10-09
JP2004045103 2004-02-20

Publications (2)

Publication Number Publication Date
TW201243910A TW201243910A (en) 2012-11-01
TWI553701B true TWI553701B (zh) 2016-10-11

Family

ID=34436914

Family Applications (4)

Application Number Title Priority Date Filing Date
TW106122876A TW201738932A (en) 2003-10-09 2004-10-11 Exposure apparatus, exposure method, and device producing method
TW101117751A TWI553701B (zh) 2003-10-09 2004-10-11
TW104138732A TWI598934B (zh) 2003-10-09 2004-10-11
TW093130706A TWI376724B (zh) 2003-10-09 2004-10-11

Family Applications Before (1)

Application Number Title Priority Date Filing Date
TW106122876A TW201738932A (en) 2003-10-09 2004-10-11 Exposure apparatus, exposure method, and device producing method

Family Applications After (2)

Application Number Title Priority Date Filing Date
TW104138732A TWI598934B (zh) 2003-10-09 2004-10-11
TW093130706A TWI376724B (zh) 2003-10-09 2004-10-11

Country Status (10)

Country Link
US (5) US8130361B2 (zh)
EP (6) EP3410216A1 (zh)
JP (9) JP5136565B2 (zh)
KR (8) KR101261774B1 (zh)
CN (1) CN102360167B (zh)
HK (3) HK1094090A1 (zh)
IL (1) IL174854A (zh)
SG (3) SG147431A1 (zh)
TW (4) TW201738932A (zh)
WO (1) WO2005036624A1 (zh)

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US7528929B2 (en) 2003-11-14 2009-05-05 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
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KR101554772B1 (ko) 2004-02-04 2015-09-22 가부시키가이샤 니콘 노광 장치, 노광 방법 및 디바이스 제조 방법
KR101555707B1 (ko) 2005-04-18 2015-09-25 가부시키가이샤 니콘 노광 장치 및 노광 방법, 그리고 디바이스 제조 방법
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