JP6332395B2 - 液浸露光装置及び液浸露光方法、デバイス製造方法 - Google Patents
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- G03F7/70—Microphotolithographic exposure; Apparatus therefor
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- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
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- H01L21/0273—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34 comprising organic layers characterised by the treatment of photoresist layers
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Description
δ=±k2・λ/NA2 … (2)
ここで、λは露光波長、NAは投影光学系の開口数、k1、k2はプロセス係数である。(1)式、(2)式より、解像度Rを高めるために、露光波長λを短くして、開口数NAを大きくすると、焦点深度δが狭くなることが分かる。
これにより、基板アライメント系5の検出基準位置と、基板ステージPSTに載置された基板P上の各ショット領域との位置関係が決定される。すなわち、制御装置CONTは、レーザ干渉計56の出力から基板アライメント系5の検出基準位置に対して基板P上の各ショット領域がどこに位置しているかを知ることができる。
なお本実施形態のマスクアライメント系6では、マークに対して光を照射し、CCDカメラ等で撮像したマークの画像データを画像処理してマーク位置を検出するVRA(ビジュアル・レチクル・アライメント)方式が採用されている。
こうすることで、基準部材3上の液体LQが回収される。なお、基準部材3と補助プレート57とが一体的に設けられ、基準部材3bと基板Pとが補助プレート57を介してほぼ同じ高さで連続している構成が好ましく、この場合には、液体供給機構10の液体供給動作を停止することなく、投影光学系PLの像面側に液体LQを保持した状態で、液体LQの液浸領域を基準部材3上から基板P上に移動することができる。
基板アライメント系5は残留した液体LQの影響を受けることなく基準マークPFMの検出を精確に行うことができる。
また、マスク側基準マークMFMと基板側基準マークPFMとを別々の基準部材に形成してもよい。その場合、本実施形態のように、マスク側基準マークMFMと基板側基準マークPFMとを非同時に検出するようにすることで、基準マークPFMが形成された基準部材上には液浸領域を形成する必要がなくなる。したがって、基準マークPFMの無段差化などの液浸対応を行う必要がないばかりでなく、ウォーターマークなどの発生も防止できる。
Claims (18)
- 基板の表面の一部を覆う液体を介して前記基板を露光する液浸露光装置であって、
投影光学系と、
前記基板を保持する基板ホルダと前記基板ホルダ周囲のステージ上面とを有し、前記投影光学系の下で移動可能な基板ステージと、
前記基板ステージに設けられた基準部材と、
前記基準部材の上面の少なくとも一部は撥液性であり、
前記基板ホルダは、前記基板の表面が前記ステージ上面とほぼ同じ高さになるように前記基板を保持し、
前記基準部材の上面は、前記ステージ上面とほぼ同じ高さになるように設けられ、
前記ステージ上面の一部は、前記基準部材と前記基板ホルダとの間に設けられ、前記投影光学系の像面側に液体を保持したまま、前記基準部材上に液浸領域が形成されている状態から前記基板ホルダに保持された前記基板の表面の一部に液浸領域が形成されている状態となるように前記基板ステージを前記投影光学系に対して移動可能である液浸露光装置。 - 前記投影光学系の像面側に液体を保持したまま、前記基板ホルダに保持された前記基板の表面の一部に液浸領域が形成されている状態から前記基準部材上に液浸領域が形成されている状態となるように前記基板ステージを前記投影光学系に対して移動可能である請求項1記載の液浸露光装置。
- 基板の表面の一部を覆う液体を介して前記基板を露光する液浸露光装置であって、
投影光学系と、
前記基板を保持する基板ホルダと前記基板ホルダ周囲のステージ上面とを有し、前記投影光学系の下で移動可能な基板ステージと、
前記基板ステージに設けられた基準部材と、
前記基準部材の上面の少なくとも一部は撥液性であり、
前記基板ホルダは、前記基板の表面が前記ステージ上面とほぼ同じ高さになるように前記基板を保持し、
前記基準部材の上面は、前記ステージ上面とほぼ同じ高さになるように設けられ、
前記投影光学系の像面側に液体を保持したまま、前記基板ホルダに保持された前記基板の表面の一部に液浸領域が形成されている状態から前記基準部材上に液浸領域が形成されている状態となるように前記基板ステージを前記投影光学系に対して移動可能である液浸露光装置。 - 前記基板ホルダに保持された前記基板上のアライメントマークを検出する検出系をさらに備え、
前記検出系は、前記基準部材の基準マークを検出可能である請求項1〜3のいずれか一項記載の液浸露光装置。 - 前記基準部材の上面の少なくとも一部を撥液性にするために撥液化処理が施される請求項1〜4のいずれか一項記載の液浸露光装置。
- 前記撥液化処理は、撥液性材料のコーティングを含む請求項5記載の液浸露光装置。
- 前記基準部材は、前記ステージ上面に設けられた凹部内に配置される請求項1〜6のいずれか一項記載の液浸露光装置。
- 液体供給口と液体回収口とを有し、
前記基板ステージは、前記液体供給口と前記液体回収口の下で移動可能であり、
前記液体供給口からの液体供給と前記液体回収口からの液体回収を行って、前記投影光学系の像面側に液浸領域が形成される請求項1〜7のいずれか一項記載の液浸露光装置。 - 請求項1〜8のいずれか一項記載の液浸露光装置を用いるデバイス製造方法。
- 投影光学系によって基板の表面の一部を覆う液体を介して前記基板を露光する液浸露光方法であって、
前記投影光学系の下で、前記基板を保持する基板ホルダと前記基板ホルダ周囲のステージ上面とを有する基板ステージを移動させることを含み、
前記基板は、前記基板の表面が前記ステージ上面とほぼ同じ高さになるように前記基板ホルダに保持され、
前記基板ステージには、上面の少なくとも一部が撥液性である基準部材が設けられ、
前記基準部材の上面は、前記ステージ上面とほぼ同じ高さになるように設けられ、
前記基板ステージを移動させることは、前記ステージ上面の一部が、前記基準部材と前記基板ホルダとの間に設けられ、前記投影光学系の像面側に液体を保持したまま、前記基準部材上に液浸領域が形成されている状態から前記基板ホルダに保持された前記基板の表面の一部に液浸領域が形成されている状態となるように前記基板ステージを前記投影光学系に対して移動させることを含む液浸露光方法。 - 前記基板ステージを移動させることは、前記投影光学系の像面側に液体を保持したまま、前記基板ホルダに保持された前記基板の表面の一部に液浸領域が形成されている状態から前記基準部材上に液浸領域が形成されている状態となるように前記基板ステージを前記投影光学系に対して移動させることを含む請求項10記載の液浸露光方法。
- 投影光学系によって基板の表面の一部を覆う液体を介して前記基板を露光する液浸露光方法であって、
前記投影光学系の下で、前記基板を保持する基板ホルダと前記基板ホルダ周囲のステージ上面とを有する基板ステージを移動させることを含み、
前記基板は、前記基板の表面が前記ステージ上面とほぼ同じ高さになるように前記基板ホルダに保持され、
前記基板ステージには、上面の少なくとも一部が撥液性である基準部材が設けられ、
前記基準部材の上面は、前記ステージ上面とほぼ同じ高さになるように設けられ、
前記基板ステージを移動させることは、前記投影光学系の像面側に液体を保持したまま、前記基板ホルダに保持された前記基板の表面の一部に液浸領域が形成されている状態から前記基準部材上に液浸領域が形成されている状態となるように前記基板ステージを前記投影光学系に対して移動させることを含む液浸露光方法。 - 前記基板ホルダに保持された前記基板上のアライメントマークを検出することと、
前記基準部材の基準マークを検出することと、
をさらに含む請求項10〜12のいずれか一項記載の液浸露光方法。 - 前記基準部材の上面の少なくとも一部を撥液性にするために撥液化処理が施される請求項10〜13のいずれか一項記載の液浸露光方法。
- 前記撥液化処理は、撥液性材料のコーティングを含む請求項14記載の液浸露光方法。
- 前記基準部材は、前記ステージ上面に設けられた凹部内に配置される請求項10〜15のいずれか一項記載の液浸露光方法。
- 液体供給口からの液体供給と液体回収口からの液体回収を行って、前記投影光学系の像面側に液浸領域を形成することをさらに含み、
前記基板ステージを移動させることは、前記液体供給口と前記液体回収口の下で前記基板ステージを移動させることを含む請求項10〜16のいずれか一項記載の液浸露光方法。 - 請求項10〜17のいずれか一項記載の液浸露光方法を用いるデバイス製造方法。
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