HK1164462A1 - 曝光裝置和曝光方法以及器件製造方法 - Google Patents

曝光裝置和曝光方法以及器件製造方法

Info

Publication number
HK1164462A1
HK1164462A1 HK12105144.0A HK12105144A HK1164462A1 HK 1164462 A1 HK1164462 A1 HK 1164462A1 HK 12105144 A HK12105144 A HK 12105144A HK 1164462 A1 HK1164462 A1 HK 1164462A1
Authority
HK
Hong Kong
Prior art keywords
method
exposure
device producing
exposure apparatus
producing method
Prior art date
Application number
HK12105144.0A
Other languages
English (en)
Inventor
安田雅彥
正田隆博
金谷有步
長山匡
白石健
Original Assignee
株式會社尼康
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2003350628 priority Critical
Priority to JP2004045103 priority
Application filed by 株式會社尼康 filed Critical 株式會社尼康
Publication of HK1164462A1 publication Critical patent/HK1164462A1/zh

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70216Systems for imaging mask onto workpiece
    • G03F7/70341Immersion
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70058Mask illumination systems
    • G03F7/70141Illumination system adjustment, alignment during assembly of illumination system
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70691Handling of masks or wafers
    • G03F7/70716Stages
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F9/00Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically
    • G03F9/70Registration or positioning of originals, masks, frames, photographic sheets or textured or patterned surfaces, e.g. automatically for microlithography
    • G03F9/7088Alignment mark detection, e.g. TTR, TTL, off-axis detection, array detector, video detection
HK12105144.0A 2003-10-09 2012-05-25 曝光裝置和曝光方法以及器件製造方法 HK1164462A1 (zh)

Priority Applications (2)

Application Number Priority Date Filing Date Title
JP2003350628 2003-10-09
JP2004045103 2004-02-20

Publications (1)

Publication Number Publication Date
HK1164462A1 true HK1164462A1 (zh) 2015-08-21

Family

ID=34436914

Family Applications (3)

Application Number Title Priority Date Filing Date
HK06110605.0A HK1094090A1 (en) 2003-10-09 2006-09-22 Exposure apparatus, exposure method, and device producing method
HK12105144.0A HK1164462A1 (zh) 2003-10-09 2012-05-25 曝光裝置和曝光方法以及器件製造方法
HK16102384.2A HK1214373A1 (zh) 2003-10-09 2016-03-02 曝光裝置、曝光方法以及用於製造器件的方法

Family Applications Before (1)

Application Number Title Priority Date Filing Date
HK06110605.0A HK1094090A1 (en) 2003-10-09 2006-09-22 Exposure apparatus, exposure method, and device producing method

Family Applications After (1)

Application Number Title Priority Date Filing Date
HK16102384.2A HK1214373A1 (zh) 2003-10-09 2016-03-02 曝光裝置、曝光方法以及用於製造器件的方法

Country Status (10)

Country Link
US (5) US8130361B2 (zh)
EP (6) EP2284614B1 (zh)
JP (9) JP5136565B2 (zh)
KR (8) KR101613062B1 (zh)
CN (1) CN102360167B (zh)
HK (3) HK1094090A1 (zh)
IL (1) IL174854A (zh)
SG (3) SG147431A1 (zh)
TW (4) TWI553701B (zh)
WO (1) WO2005036624A1 (zh)

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