AU2003302831A1 - Exposure method, exposure apparatus and method for manufacturing device - Google Patents

Exposure method, exposure apparatus and method for manufacturing device

Info

Publication number
AU2003302831A1
AU2003302831A1 AU2003302831A AU2003302831A AU2003302831A1 AU 2003302831 A1 AU2003302831 A1 AU 2003302831A1 AU 2003302831 A AU2003302831 A AU 2003302831A AU 2003302831 A AU2003302831 A AU 2003302831A AU 2003302831 A1 AU2003302831 A1 AU 2003302831A1
Authority
AU
Australia
Prior art keywords
method
exposure
manufacturing device
exposure apparatus
apparatus
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Abandoned
Application number
AU2003302831A
Inventor
Shigeru Hirukawa
Naoyuki Kobayashi
Nobutaka Magome
Masahiro Nei
Soichi Owa
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Nikon Corp
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority to JP2002-357959 priority Critical
Priority to JP2002357959 priority
Priority to JP2003169903 priority
Priority to JP2003-169903 priority
Application filed by Nikon Corp filed Critical Nikon Corp
Priority to PCT/JP2003/015408 priority patent/WO2004053951A1/en
Publication of AU2003302831A1 publication Critical patent/AU2003302831A1/en
Application status is Abandoned legal-status Critical

Links

Classifications

    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70216Systems for imaging mask onto workpiece
    • G03F7/70341Immersion
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/70425Imaging strategies, e.g. for increasing throughput, printing product fields larger than the image field, compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching, double patterning
    • G03F7/70466Multiple exposures, e.g. combination of fine and coarse exposures, double patterning, multiple exposures for printing a single feature, mix-and-match
    • GPHYSICS
    • G03PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03FPHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70Exposure apparatus for microlithography
    • G03F7/708Construction of apparatus, e.g. environment, hygiene aspects or materials
    • G03F7/70991Connection with other apparatus, e.g. multiple exposure stations, particular arrangement of exposure apparatus and pre-exposure and/or post-exposure apparatus, shared apparatus, e.g. having shared radiation source, shared mask or workpiece stage, shared base-plate, utilities, e.g. cable, pipe or wireless arrangements for data, power, fluids, vacuum
AU2003302831A 2002-12-10 2003-12-02 Exposure method, exposure apparatus and method for manufacturing device Abandoned AU2003302831A1 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
JP2002-357959 2002-12-10
JP2002357959 2002-12-10
JP2003169903 2003-06-13
JP2003-169903 2003-06-13
PCT/JP2003/015408 WO2004053951A1 (en) 2002-12-10 2003-12-02 Exposure method, exposure apparatus and method for manufacturing device

Publications (1)

Publication Number Publication Date
AU2003302831A1 true AU2003302831A1 (en) 2004-06-30

Family

ID=32510637

Family Applications (1)

Application Number Title Priority Date Filing Date
AU2003302831A Abandoned AU2003302831A1 (en) 2002-12-10 2003-12-02 Exposure method, exposure apparatus and method for manufacturing device

Country Status (2)

Country Link
AU (1) AU2003302831A1 (en)
WO (1) WO2004053951A1 (en)

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