|
US2380887A
(en)
|
1941-05-22 |
1945-07-31 |
Taylor Taylor & Hobson Ltd |
Optical system
|
|
DE1064734B
(de)
|
1953-09-23 |
1959-09-03 |
Optische Ind De Oude Delft Nv |
Optisches Abbildungssystem
|
|
SU124665A1
(ru)
|
1959-03-30 |
1959-11-30 |
В.А. Панов |
Безиммерсионный зеркально-линзовый ахроматический объектив микроскопа
|
|
NL269391A
(enExample)
|
1961-09-19 |
|
|
|
|
DE1447207A1
(de)
|
1963-12-21 |
1968-12-05 |
Jenaoptik Jena Gmbh |
Katadioptrisches Mikroskop-Objektiv
|
|
US3762801A
(en)
|
1972-02-24 |
1973-10-02 |
Polaroid Corp |
Compact three component objective lenses
|
|
JPS6019484B2
(ja)
|
1975-11-07 |
1985-05-16 |
キヤノン株式会社 |
複写用レンズ
|
|
US4293186A
(en)
|
1977-02-11 |
1981-10-06 |
The Perkin-Elmer Corporation |
Restricted off-axis field optical system
|
|
US4171871A
(en)
|
1977-06-30 |
1979-10-23 |
International Business Machines Corporation |
Achromatic unit magnification optical system
|
|
CH624776A5
(enExample)
|
1977-12-08 |
1981-08-14 |
Kern & Co Ag |
|
|
US4241390A
(en)
|
1978-02-06 |
1980-12-23 |
The Perkin-Elmer Corporation |
System for illuminating an annular field
|
|
US4232969A
(en)
|
1979-05-30 |
1980-11-11 |
International Business Machines Corporation |
Projection optical system for aligning an image on a surface
|
|
CH651943A5
(de)
|
1980-08-16 |
1985-10-15 |
Ludvik Dr Canzek |
Katadioptrisches objektiv hoher oeffnung.
|
|
JPS5744115A
(en)
|
1980-08-30 |
1982-03-12 |
Asahi Optical Co Ltd |
Reflex telephoto zoom lens system
|
|
US4346164A
(en)
|
1980-10-06 |
1982-08-24 |
Werner Tabarelli |
Photolithographic method for the manufacture of integrated circuits
|
|
US4391494A
(en)
|
1981-05-15 |
1983-07-05 |
General Signal Corporation |
Apparatus for projecting a series of images onto dies of a semiconductor wafer
|
|
US4595295A
(en)
|
1982-01-06 |
1986-06-17 |
International Business Machines Corporation |
Alignment system for lithographic proximity printing
|
|
US4469414A
(en)
|
1982-06-01 |
1984-09-04 |
The Perkin-Elmer Corporation |
Restrictive off-axis field optical system
|
|
US4443228A
(en)
|
1982-06-29 |
1984-04-17 |
Texaco Inc. |
Partial oxidation burner
|
|
US4871237A
(en)
|
1983-07-27 |
1989-10-03 |
Nikon Corporation |
Method and apparatus for adjusting imaging performance of projection optical apparatus
|
|
DE3443856A1
(de)
|
1983-12-02 |
1985-06-13 |
Nippon Kogaku K.K., Tokio/Tokyo |
Optisches projektionsgeraet
|
|
GB2153543B
(en)
|
1983-12-28 |
1988-09-01 |
Canon Kk |
A projection exposure apparatus
|
|
JPS60184223A
(ja)
|
1984-03-01 |
1985-09-19 |
Nippon Kogaku Kk <Nikon> |
反射屈折式望遠レンズ
|
|
US4812028A
(en)
|
1984-07-23 |
1989-03-14 |
Nikon Corporation |
Reflection type reduction projection optical system
|
|
US4701035A
(en)
|
1984-08-14 |
1987-10-20 |
Canon Kabushiki Kaisha |
Reflection optical system
|
|
US4834515A
(en)
|
1984-11-29 |
1989-05-30 |
Lockheed Missiles & Space Company, Inc. |
Catadioptric imaging system with dioptric assembly of the petzval type
|
|
US4779966A
(en)
|
1984-12-21 |
1988-10-25 |
The Perkin-Elmer Corporation |
Single mirror projection optical system
|
|
JPS61156737A
(ja)
|
1984-12-27 |
1986-07-16 |
Canon Inc |
回路の製造方法及び露光装置
|
|
DE3501594A1
(de)
|
1985-01-18 |
1986-07-24 |
Planatolwerk Willy Hesselmann Chemische- und Maschinenfabrik für Klebetechnik GmbH & Co KG, 8200 Rosenheim |
Schmelzklebstoff zum klebebinden von papierblocks und ableimen fadengehefteter buecher
|
|
US4775613A
(en)
|
1985-03-30 |
1988-10-04 |
Fuji Photo Film Co., Ltd. |
Heat-developable light-sensitive material
|
|
US4610125A
(en)
|
1985-05-03 |
1986-09-09 |
Pemco Inc. |
Method and apparatus for confining wrapped reams of paper sheets in cardboard boxes
|
|
US4711535A
(en)
|
1985-05-10 |
1987-12-08 |
The Perkin-Elmer Corporation |
Ring field projection system
|
|
DE3518529C1
(de)
|
1985-05-23 |
1986-05-07 |
Nordischer Maschinenbau Rud. Baader GmbH + Co KG, 2400 Lübeck |
Vorrichtung zur Abgabe von pastosem Fuellgut in Portionen
|
|
DE3519388A1
(de)
|
1985-05-30 |
1986-12-04 |
Linde Ag, 6200 Wiesbaden |
Verfahren zum reinigen eines sauerstoff und schwefelverbindungen enthaltenden gasstroms
|
|
DE3520093A1
(de)
|
1985-06-05 |
1986-12-11 |
Fa. Carl Freudenberg, 6940 Weinheim |
Deck- oder einlegesohle
|
|
DE3520327A1
(de)
|
1985-06-07 |
1986-12-11 |
Bayer Ag, 5090 Leverkusen |
5-amino-4-cyano-1-pyridyl-pyrazole
|
|
DE3520834A1
(de)
|
1985-06-11 |
1986-12-11 |
Montblanc-Simplo Gmbh, 2000 Hamburg |
Magnetisch angetriebene zylinderpumpe
|
|
US4861148A
(en)
|
1986-03-12 |
1989-08-29 |
Matsushita Electric Industrial Co., Inc. |
Projection optical system for use in precise copy
|
|
US4757354A
(en)
|
1986-05-02 |
1988-07-12 |
Matsushita Electrical Industrial Co., Ltd. |
Projection optical system
|
|
EP0947882B1
(en)
|
1986-07-11 |
2006-03-29 |
Canon Kabushiki Kaisha |
X-ray reduction projection exposure system of reflection type
|
|
US4772107A
(en)
|
1986-11-05 |
1988-09-20 |
The Perkin-Elmer Corporation |
Wide angle lens with improved flat field characteristics
|
|
GB2197962A
(en)
|
1986-11-10 |
1988-06-02 |
Compact Spindle Bearing Corp |
Catoptric reduction imaging apparatus
|
|
EP0332201B1
(en)
|
1988-03-11 |
1994-06-29 |
Matsushita Electric Industrial Co., Ltd. |
Optical projection system
|
|
US4951078A
(en)
|
1988-05-16 |
1990-08-21 |
Minolta Camera Kabushiki Kaisha |
Camera system including catadioptric lens and catadioptric lens system used therein
|
|
US4953960A
(en)
|
1988-07-15 |
1990-09-04 |
Williamson David M |
Optical reduction system
|
|
US5105075A
(en)
|
1988-09-19 |
1992-04-14 |
Canon Kabushiki Kaisha |
Projection exposure apparatus
|
|
US5004331A
(en)
|
1989-05-03 |
1991-04-02 |
Hughes Aircraft Company |
Catadioptric projector, catadioptric projection system and process
|
|
US5071240A
(en)
|
1989-09-14 |
1991-12-10 |
Nikon Corporation |
Reflecting optical imaging apparatus using spherical reflectors and producing an intermediate image
|
|
US5063586A
(en)
|
1989-10-13 |
1991-11-05 |
At&T Bell Laboratories |
Apparatus for semiconductor lithography
|
|
US5031977A
(en)
|
1989-12-27 |
1991-07-16 |
General Signal Corporation |
Deep ultraviolet (UV) lens for use in a photolighography system
|
|
US5114238A
(en)
|
1990-06-28 |
1992-05-19 |
Lockheed Missiles & Space Company, Inc. |
Infrared catadioptric zoom relay telescope
|
|
US5241423A
(en)
|
1990-07-11 |
1993-08-31 |
International Business Machines Corporation |
High resolution reduction catadioptric relay lens
|
|
US5089913A
(en)
|
1990-07-11 |
1992-02-18 |
International Business Machines Corporation |
High resolution reduction catadioptric relay lens
|
|
US5078502A
(en)
|
1990-08-06 |
1992-01-07 |
Hughes Aircraft Company |
Compact afocal reimaging and image derotation device
|
|
US5159172A
(en)
|
1990-08-07 |
1992-10-27 |
International Business Machines Corporation |
Optical projection system
|
|
US5052763A
(en)
|
1990-08-28 |
1991-10-01 |
International Business Machines Corporation |
Optical system with two subsystems separately correcting odd aberrations and together correcting even aberrations
|
|
US5031976A
(en)
|
1990-09-24 |
1991-07-16 |
Kla Instruments, Corporation |
Catadioptric imaging system
|
|
GB9020902D0
(en)
|
1990-09-26 |
1990-11-07 |
Optics & Vision Ltd |
Optical systems,telescopes and binoculars
|
|
US5315629A
(en)
|
1990-10-10 |
1994-05-24 |
At&T Bell Laboratories |
Ringfield lithography
|
|
JP3041939B2
(ja)
|
1990-10-22 |
2000-05-15 |
株式会社ニコン |
投影レンズ系
|
|
US5734496A
(en)
|
1991-06-03 |
1998-03-31 |
Her Majesty The Queen In Right Of New Zealand |
Lens system
|
|
JP3353902B2
(ja)
|
1990-12-12 |
2002-12-09 |
オリンパス光学工業株式会社 |
投影レンズ系
|
|
US5212588A
(en)
|
1991-04-09 |
1993-05-18 |
The United States Of America As Represented By The United States Department Of Energy |
Reflective optical imaging system for extreme ultraviolet wavelengths
|
|
EP0523303B1
(en)
|
1991-07-19 |
2000-05-03 |
AT&T Corp. |
Ringfield lithography
|
|
JP3085481B2
(ja)
|
1991-09-28 |
2000-09-11 |
株式会社ニコン |
反射屈折縮小投影光学系、及び該光学系を備えた露光装置
|
|
JP3203719B2
(ja)
|
1991-12-26 |
2001-08-27 |
株式会社ニコン |
露光装置、その露光装置により製造されるデバイス、露光方法、およびその露光方法を用いたデバイス製造方法
|
|
US5212593A
(en)
|
1992-02-06 |
1993-05-18 |
Svg Lithography Systems, Inc. |
Broad band optical reduction system using matched multiple refractive element materials
|
|
US5220590A
(en)
|
1992-05-05 |
1993-06-15 |
General Signal Corporation |
X-ray projection lithography camera
|
|
US5353322A
(en)
|
1992-05-05 |
1994-10-04 |
Tropel Corporation |
Lens system for X-ray projection lithography camera
|
|
JP3246615B2
(ja)
|
1992-07-27 |
2002-01-15 |
株式会社ニコン |
照明光学装置、露光装置、及び露光方法
|
|
JPH06188169A
(ja)
|
1992-08-24 |
1994-07-08 |
Canon Inc |
結像方法及び該方法を用いる露光装置及び該方法を用いるデバイス製造方法
|
|
AU4953993A
(en)
|
1992-08-28 |
1994-03-29 |
Optics & Vision Limited |
Optical system especially for binoculars and other viewing instruments
|
|
US5477304A
(en)
|
1992-10-22 |
1995-12-19 |
Nikon Corporation |
Projection exposure apparatus
|
|
EP0604093B1
(en)
|
1992-12-24 |
1997-11-19 |
Nikon Corporation |
Catadioptric reduction projection optical system
|
|
US5537260A
(en)
|
1993-01-26 |
1996-07-16 |
Svg Lithography Systems, Inc. |
Catadioptric optical reduction system with high numerical aperture
|
|
US6078381A
(en)
|
1993-02-01 |
2000-06-20 |
Nikon Corporation |
Exposure method and apparatus
|
|
US5323263A
(en)
|
1993-02-01 |
1994-06-21 |
Nikon Precision Inc. |
Off-axis catadioptric projection system
|
|
US5592329A
(en)
|
1993-02-03 |
1997-01-07 |
Nikon Corporation |
Catadioptric optical system
|
|
US5401934A
(en)
|
1993-03-08 |
1995-03-28 |
International Business Machines Corporation |
Lens system for scanning laser apparatus
|
|
JP3747951B2
(ja)
|
1994-11-07 |
2006-02-22 |
株式会社ニコン |
反射屈折光学系
|
|
JP3635684B2
(ja)
|
1994-08-23 |
2005-04-06 |
株式会社ニコン |
反射屈折縮小投影光学系、反射屈折光学系、並びに投影露光方法及び装置
|
|
US5636066A
(en)
|
1993-03-12 |
1997-06-03 |
Nikon Corporation |
Optical apparatus
|
|
JP3747958B2
(ja)
|
1995-04-07 |
2006-02-22 |
株式会社ニコン |
反射屈折光学系
|
|
JPH06331941A
(ja)
|
1993-05-19 |
1994-12-02 |
Olympus Optical Co Ltd |
投影レンズ系
|
|
US6157497A
(en)
|
1993-06-30 |
2000-12-05 |
Nikon Corporation |
Exposure apparatus
|
|
US5410434A
(en)
|
1993-09-09 |
1995-04-25 |
Ultratech Stepper, Inc. |
Reflective projection system comprising four spherical mirrors
|
|
US5515207A
(en)
|
1993-11-03 |
1996-05-07 |
Nikon Precision Inc. |
Multiple mirror catadioptric optical system
|
|
JP3360387B2
(ja)
|
1993-11-15 |
2002-12-24 |
株式会社ニコン |
投影光学系及び投影露光装置
|
|
JP3396935B2
(ja)
|
1993-11-15 |
2003-04-14 |
株式会社ニコン |
投影光学系及び投影露光装置
|
|
US6084724A
(en)
|
1993-12-30 |
2000-07-04 |
Eastman Kodak Company |
Glass coated cemented plastic doublets and method for making
|
|
JP3395801B2
(ja)
|
1994-04-28 |
2003-04-14 |
株式会社ニコン |
反射屈折投影光学系、走査型投影露光装置、及び走査投影露光方法
|
|
DE4417489A1
(de)
|
1994-05-19 |
1995-11-23 |
Zeiss Carl Fa |
Höchstaperturiges katadioptrisches Reduktionsobjektiv für die Miktrolithographie
|
|
US5793473A
(en)
|
1994-06-09 |
1998-08-11 |
Nikon Corporation |
Projection optical apparatus for projecting a mask pattern onto the surface of a target projection object and projection exposure apparatus using the same
|
|
US5488229A
(en)
|
1994-10-04 |
1996-01-30 |
Excimer Laser Systems, Inc. |
Deep ultraviolet microlithography system
|
|
JPH08166542A
(ja)
|
1994-10-13 |
1996-06-25 |
Nisshin Koki Kk |
反射屈折式光学系及びこれを用いた光学装置
|
|
JPH08127117A
(ja)
|
1994-11-02 |
1996-05-21 |
Komori Corp |
エアシャッタ装置
|
|
JP3781044B2
(ja)
|
1994-11-07 |
2006-05-31 |
株式会社ニコン |
反射屈折光学系および投影露光装置
|
|
JPH08179204A
(ja)
|
1994-11-10 |
1996-07-12 |
Nikon Corp |
投影光学系及び投影露光装置
|
|
JP3500745B2
(ja)
|
1994-12-14 |
2004-02-23 |
株式会社ニコン |
投影光学系、投影露光装置及び投影露光方法
|
|
JP3445045B2
(ja)
|
1994-12-29 |
2003-09-08 |
キヤノン株式会社 |
投影露光装置及びそれを用いたデバイスの製造方法
|
|
JP3454390B2
(ja)
|
1995-01-06 |
2003-10-06 |
株式会社ニコン |
投影光学系、投影露光装置及び投影露光方法
|
|
US5608526A
(en)
|
1995-01-19 |
1997-03-04 |
Tencor Instruments |
Focused beam spectroscopic ellipsometry method and system
|
|
JPH08203812A
(ja)
|
1995-01-30 |
1996-08-09 |
Nikon Corp |
反射屈折縮小投影光学系及び露光装置
|
|
JP3819048B2
(ja)
|
1995-03-15 |
2006-09-06 |
株式会社ニコン |
投影光学系及びそれを備えた露光装置並びに露光方法
|
|
US5757469A
(en)
|
1995-03-22 |
1998-05-26 |
Etec Systems, Inc. |
Scanning lithography system haing double pass Wynne-Dyson optics
|
|
IL113350A
(en)
|
1995-04-12 |
1998-06-15 |
State Rafaelel Ministry Of Def |
Catadioptric optics working staring detector system
|
|
US6229595B1
(en)
|
1995-05-12 |
2001-05-08 |
The B. F. Goodrich Company |
Lithography system and method with mask image enlargement
|
|
JP3711586B2
(ja)
|
1995-06-02 |
2005-11-02 |
株式会社ニコン |
走査露光装置
|
|
US6512631B2
(en)
*
|
1996-07-22 |
2003-01-28 |
Kla-Tencor Corporation |
Broad-band deep ultraviolet/vacuum ultraviolet catadioptric imaging system
|
|
US5650877A
(en)
|
1995-08-14 |
1997-07-22 |
Tropel Corporation |
Imaging system for deep ultraviolet lithography
|
|
US5684636A
(en)
|
1995-08-24 |
1997-11-04 |
Lockheed Martin Corporation |
Polymer-optical liquid matrix for use as a lens element
|
|
DE29514454U1
(de)
|
1995-09-11 |
1995-12-21 |
Fett, Helmut, 50968 Köln |
Federvorrichtungen an Sattelstangen für Zwei-Dreiräder, insbesondere für Fahrräder, wodurch Stöße von Unebenheiten von Fahrbelägen abgefangen werden
|
|
US5805365A
(en)
|
1995-10-12 |
1998-09-08 |
Sandia Corporation |
Ringfield lithographic camera
|
|
JP3624973B2
(ja)
|
1995-10-12 |
2005-03-02 |
株式会社ニコン |
投影光学系
|
|
JP3456323B2
(ja)
|
1995-11-01 |
2003-10-14 |
株式会社ニコン |
顕微鏡対物レンズ
|
|
JPH09148241A
(ja)
|
1995-11-27 |
1997-06-06 |
Canon Inc |
走査露光装置及びそれを用いたデバイスの製造方法
|
|
US5815310A
(en)
|
1995-12-12 |
1998-09-29 |
Svg Lithography Systems, Inc. |
High numerical aperture ring field optical reduction system
|
|
JPH09246179A
(ja)
|
1996-03-13 |
1997-09-19 |
Canon Inc |
投影露光装置及びそれを用いたデバイスの製造方法
|
|
JPH09251097A
(ja)
|
1996-03-15 |
1997-09-22 |
Nikon Corp |
Ｘ線リソグラフィー用反射縮小結像光学系
|
|
JP3750123B2
(ja)
|
1996-04-25 |
2006-03-01 |
株式会社ニコン |
投影光学系
|
|
US5686728A
(en)
|
1996-05-01 |
1997-11-11 |
Lucent Technologies Inc |
Projection lithography system and method using all-reflective optical elements
|
|
JP3352325B2
(ja)
|
1996-05-21 |
2002-12-03 |
キヤノン株式会社 |
走査露光装置及びそれを用いたデバイスの製造方法
|
|
JPH103039A
(ja)
|
1996-06-14 |
1998-01-06 |
Nikon Corp |
反射屈折光学系
|
|
JPH103041A
(ja)
|
1996-06-14 |
1998-01-06 |
Nikon Corp |
反射屈折縮小光学系
|
|
US6157498A
(en)
|
1996-06-19 |
2000-12-05 |
Nikon Corporation |
Dual-imaging optical system
|
|
JPH1010431A
(ja)
|
1996-06-20 |
1998-01-16 |
Nikon Corp |
反射屈折光学系
|
|
JPH1020195A
(ja)
|
1996-06-28 |
1998-01-23 |
Nikon Corp |
反射屈折光学系
|
|
US5729376A
(en)
|
1996-07-01 |
1998-03-17 |
The United States Of America As Represented By The Secretary Of The Army |
Catadioptric multi-functional optical assembly
|
|
US5808814A
(en)
|
1996-07-18 |
1998-09-15 |
Nikon Corporation |
Short wavelength projection optical system
|
|
JPH1039217A
(ja)
|
1996-07-19 |
1998-02-13 |
Nisshin Koki Kk |
反射屈折式光学系及びこれを用いた光学装置
|
|
US5999310A
(en)
|
1996-07-22 |
1999-12-07 |
Shafer; David Ross |
Ultra-broadband UV microscope imaging system with wide range zoom capability
|
|
US5717518A
(en)
|
1996-07-22 |
1998-02-10 |
Kla Instruments Corporation |
Broad spectrum ultraviolet catadioptric imaging system
|
|
JPH1039208A
(ja)
|
1996-07-23 |
1998-02-13 |
Nikon Corp |
投影光学系
|
|
JPH1048517A
(ja)
|
1996-08-07 |
1998-02-20 |
Nikon Corp |
投影光学系
|
|
JP3864399B2
(ja)
|
1996-08-08 |
2006-12-27 |
株式会社ニコン |
投影露光装置及び該投影露光装置に用いられる投影光学系並びにデバイス製造方法
|
|
JPH1079345A
(ja)
|
1996-09-04 |
1998-03-24 |
Nikon Corp |
投影光学系及び露光装置
|
|
US6169627B1
(en)
|
1996-09-26 |
2001-01-02 |
Carl-Zeiss-Stiftung |
Catadioptric microlithographic reduction objective
|
|
US6631036B2
(en)
|
1996-09-26 |
2003-10-07 |
Carl-Zeiss-Stiftung |
Catadioptric objective
|
|
US5852490A
(en)
|
1996-09-30 |
1998-12-22 |
Nikon Corporation |
Projection exposure method and apparatus
|
|
JP3757536B2
(ja)
|
1996-10-01 |
2006-03-22 |
株式会社ニコン |
投影光学系及びそれを備えた露光装置並びにデバイス製造方法
|
|
JP3283767B2
(ja)
|
1996-10-02 |
2002-05-20 |
キヤノン株式会社 |
露光装置およびデバイス製造方法
|
|
US5825043A
(en)
|
1996-10-07 |
1998-10-20 |
Nikon Precision Inc. |
Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus
|
|
CN1144263C
(zh)
|
1996-11-28 |
2004-03-31 |
株式会社尼康 |
曝光装置以及曝光方法
|
|
JP4029182B2
(ja)
|
1996-11-28 |
2008-01-09 |
株式会社ニコン |
露光方法
|
|
JP4029183B2
(ja)
|
1996-11-28 |
2008-01-09 |
株式会社ニコン |
投影露光装置及び投影露光方法
|
|
EP0890136B9
(en)
|
1996-12-24 |
2003-12-10 |
ASML Netherlands B.V. |
Two-dimensionally balanced positioning device with two object holders, and lithographic device provided with such a positioning device
|
|
US5969882A
(en)
|
1997-04-01 |
1999-10-19 |
Nikon Corporation |
Catadioptric optical system
|
|
JP3823436B2
(ja)
|
1997-04-03 |
2006-09-20 |
株式会社ニコン |
投影光学系
|
|
JPH10284408A
(ja)
|
1997-04-08 |
1998-10-23 |
Nikon Corp |
露光方法
|
|
JP3747566B2
(ja)
|
1997-04-23 |
2006-02-22 |
株式会社ニコン |
液浸型露光装置
|
|
JPH116957A
(ja)
|
1997-04-25 |
1999-01-12 |
Nikon Corp |
投影光学系および投影露光装置並びに投影露光方法
|
|
JPH10325922A
(ja)
|
1997-05-26 |
1998-12-08 |
Nikon Corp |
投影光学系
|
|
US5990926A
(en)
|
1997-07-16 |
1999-11-23 |
Nikon Corporation |
Projection lens systems for excimer laser exposure lithography
|
|
US5856884A
(en)
|
1997-09-05 |
1999-01-05 |
Nikon Corporation |
Projection lens systems
|
|
US5956192A
(en)
|
1997-09-18 |
1999-09-21 |
Svg Lithography Systems, Inc. |
Four mirror EUV projection optics
|
|
JPH1195095A
(ja)
|
1997-09-22 |
1999-04-09 |
Nikon Corp |
投影光学系
|
|
US5940222A
(en)
|
1997-10-27 |
1999-08-17 |
Wescam Inc. |
Catadioptric zoom lens assemblies
|
|
WO1999025008A1
(en)
|
1997-11-07 |
1999-05-20 |
Nikon Corporation |
Projection exposure device, projection exposure method, and method of manufacturing projection exposure device
|
|
US6199991B1
(en)
|
1997-11-13 |
2001-03-13 |
U.S. Philips Corporation |
Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system
|
|
US5920380A
(en)
|
1997-12-19 |
1999-07-06 |
Sandia Corporation |
Apparatus and method for generating partially coherent illumination for photolithography
|
|
JPH11214293A
(ja)
|
1998-01-22 |
1999-08-06 |
Nikon Corp |
投影光学系及び該光学系を備えた露光装置並びにデバイス製造方法
|
|
US6014252A
(en)
|
1998-02-20 |
2000-01-11 |
The Regents Of The University Of California |
Reflective optical imaging system
|
|
US6097537A
(en)
|
1998-04-07 |
2000-08-01 |
Nikon Corporation |
Catadioptric optical system
|
|
WO1999052004A1
(en)
|
1998-04-07 |
1999-10-14 |
Nikon Corporation |
Projection exposure apparatus and method, and reflection refraction optical system
|
|
US6185049B1
(en)
|
1998-04-13 |
2001-02-06 |
Minolta Co., Ltd. |
Zoom lens system
|
|
JPH11316343A
(ja)
|
1998-05-01 |
1999-11-16 |
Nikon Corp |
カタディオプトリックレンズ
|
|
US6396067B1
(en)
|
1998-05-06 |
2002-05-28 |
Koninklijke Philips Electronics N.V. |
Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system
|
|
US6255661B1
(en)
|
1998-05-06 |
2001-07-03 |
U.S. Philips Corporation |
Mirror projection system for a scanning lithographic projection apparatus, and lithographic apparatus comprising such a system
|
|
DE19822510A1
(de)
|
1998-05-19 |
1999-11-25 |
Nikon Corp Intellectual Proper |
Katadioptrische Projektionslinsenanordnung
|
|
US7112772B2
(en)
|
1998-05-29 |
2006-09-26 |
Carl Zeiss Smt Ag |
Catadioptric projection objective with adaptive mirror and projection exposure method
|
|
DE19923609A1
(de)
|
1998-05-30 |
1999-12-02 |
Zeiss Carl Fa |
Ringfeld-4-Spiegelsysteme mit konvexem Primärspiegel für die EUV-Lithographie
|
|
EP0964307A3
(en)
|
1998-06-08 |
2001-09-05 |
Nikon Corporation |
Projection exposure apparatus and method
|
|
US6142641A
(en)
|
1998-06-18 |
2000-11-07 |
Ultratech Stepper, Inc. |
Four-mirror extreme ultraviolet (EUV) lithography projection system
|
|
US5969803A
(en)
|
1998-06-30 |
1999-10-19 |
Nikon Corporation |
Large NA projection lens for excimer laser lithographic systems
|
|
US6198576B1
(en)
|
1998-07-16 |
2001-03-06 |
Nikon Corporation |
Projection optical system and exposure apparatus
|
|
EP0989434B1
(en)
*
|
1998-07-29 |
2006-11-15 |
Carl Zeiss SMT AG |
Catadioptric optical system and exposure apparatus having the same
|
|
JP2000058436A
(ja)
|
1998-08-11 |
2000-02-25 |
Nikon Corp |
投影露光装置及び露光方法
|
|
US6451507B1
(en)
|
1998-08-18 |
2002-09-17 |
Nikon Corporation |
Exposure apparatus and method
|
|
US6213610B1
(en)
|
1998-09-21 |
2001-04-10 |
Nikon Corporation |
Catoptric reduction projection optical system and exposure apparatus and method using same
|
|
JP2000100694A
(ja)
|
1998-09-22 |
2000-04-07 |
Nikon Corp |
反射縮小投影光学系、該光学系を備えた投影露光装置および該装置を用いた露光方法
|
|
DE59913116D1
(de)
|
1998-11-30 |
2006-04-20 |
Zeiss Carl Smt Ag |
Hochaperturiges projektionsobjektiv mit minimalem blendenfehler
|
|
DE19942281A1
(de)
|
1999-05-14 |
2000-11-16 |
Zeiss Carl Fa |
Projektionsobjektiv
|
|
DE19855157A1
(de)
|
1998-11-30 |
2000-05-31 |
Zeiss Carl Fa |
Projektionsobjektiv
|
|
DE19855108A1
(de)
|
1998-11-30 |
2000-05-31 |
Zeiss Carl Fa |
Mikrolithographisches Reduktionsobjektiv, Projektionsbelichtungsanlage und -Verfahren
|
|
WO2000039623A1
(en)
|
1998-12-25 |
2000-07-06 |
Nikon Corporation |
Reflection refraction image-forming optical system and projection exposure apparatus comprising the optical system
|
|
EP1772775B1
(de)
|
1999-02-15 |
2008-11-05 |
Carl Zeiss SMT AG |
Mikrolithographie-Reduktionsobjektiveinrichtung sowie Projektionsbelichtungsanlage
|
|
US6033079A
(en)
|
1999-03-15 |
2000-03-07 |
Hudyma; Russell |
High numerical aperture ring field projection system for extreme ultraviolet lithography
|
|
US6188513B1
(en)
|
1999-03-15 |
2001-02-13 |
Russell Hudyma |
High numerical aperture ring field projection system for extreme ultraviolet lithography
|
|
US6426506B1
(en)
|
1999-05-27 |
2002-07-30 |
The Regents Of The University Of California |
Compact multi-bounce projection system for extreme ultraviolet projection lithography
|
|
US6600550B1
(en)
|
1999-06-03 |
2003-07-29 |
Nikon Corporation |
Exposure apparatus, a photolithography method, and a device manufactured by the same
|
|
US6867922B1
(en)
|
1999-06-14 |
2005-03-15 |
Canon Kabushiki Kaisha |
Projection optical system and projection exposure apparatus using the same
|
|
DE50015549D1
(de)
|
1999-07-08 |
2009-03-26 |
Siemens Ag |
PC-System für Echtzeit- und Nicht-Echtzeitprogramme
|
|
US6361176B1
(en)
|
1999-07-09 |
2002-03-26 |
Nikon Corporation |
Reflection reduction projection optical system
|
|
JP4717974B2
(ja)
|
1999-07-13 |
2011-07-06 |
株式会社ニコン |
反射屈折光学系及び該光学系を備える投影露光装置
|
|
WO2001023933A1
(en)
|
1999-09-29 |
2001-04-05 |
Nikon Corporation |
Projection optical system
|
|
WO2001023935A1
(en)
|
1999-09-29 |
2001-04-05 |
Nikon Corporation |
Projection exposure method and apparatus and projection optical system
|
|
EP1093021A3
(en)
|
1999-10-15 |
2004-06-30 |
Nikon Corporation |
Projection optical system as well as equipment and methods making use of said system
|
|
US6600608B1
(en)
|
1999-11-05 |
2003-07-29 |
Carl-Zeiss-Stiftung |
Catadioptric objective comprising two intermediate images
|
|
EP1102100A3
(de)
|
1999-11-12 |
2003-12-10 |
Carl Zeiss |
Katadioptrisches Objektiv mit physikalischem Strahlteiler
|
|
US6590715B2
(en)
|
1999-12-21 |
2003-07-08 |
Carl-Zeiss-Stiftung |
Optical projection system
|
|
US6995930B2
(en)
*
|
1999-12-29 |
2006-02-07 |
Carl Zeiss Smt Ag |
Catadioptric projection objective with geometric beam splitting
|
|
EP1115019A3
(en)
|
1999-12-29 |
2004-07-28 |
Carl Zeiss |
Projection exposure lens with aspheric elements
|
|
EP1242843B1
(de)
|
1999-12-29 |
2006-03-22 |
Carl Zeiss SMT AG |
Projektionsobjektiv mit benachbart angeordneten asphärischen linsenoberflächen
|
|
US7187503B2
(en)
|
1999-12-29 |
2007-03-06 |
Carl Zeiss Smt Ag |
Refractive projection objective for immersion lithography
|
|
US6621557B2
(en)
*
|
2000-01-13 |
2003-09-16 |
Nikon Corporation |
Projection exposure apparatus and exposure methods
|
|
TW538256B
(en)
|
2000-01-14 |
2003-06-21 |
Zeiss Stiftung |
Microlithographic reduction projection catadioptric objective
|
|
US6285737B1
(en)
|
2000-01-21 |
2001-09-04 |
Euv Llc |
Condenser for extreme-UV lithography with discharge source
|
|
DE10005189A1
(de)
|
2000-02-05 |
2001-08-09 |
Zeiss Carl |
Projektionsbelichtungsanlage mit reflektivem Retikel
|
|
JP2005233979A
(ja)
|
2000-02-09 |
2005-09-02 |
Nikon Corp |
反射屈折光学系
|
|
JP2001228401A
(ja)
|
2000-02-16 |
2001-08-24 |
Canon Inc |
投影光学系、および該投影光学系による投影露光装置、デバイス製造方法
|
|
US7301605B2
(en)
*
|
2000-03-03 |
2007-11-27 |
Nikon Corporation |
Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices
|
|
JP2001343589A
(ja)
|
2000-03-31 |
2001-12-14 |
Canon Inc |
投影光学系、および該投影光学系による投影露光装置、デバイス製造方法
|
|
WO2001075501A1
(en)
*
|
2000-03-31 |
2001-10-11 |
Nikon Corporation |
Method and device for holding optical member, optical device, exposure apparatus, and device manufacturing method
|
|
US6381077B1
(en)
|
2000-04-05 |
2002-04-30 |
Ultratech Stepper, Inc. |
Scanning microlithographic apparatus and method for projecting a large field-of-view image on a substrate
|
|
US6411426B1
(en)
|
2000-04-25 |
2002-06-25 |
Asml, Us, Inc. |
Apparatus, system, and method for active compensation of aberrations in an optical system
|
|
US7203007B2
(en)
|
2000-05-04 |
2007-04-10 |
Carl Zeiss Smt Ag |
Projection exposure machine comprising a projection lens
|
|
JP2001343582A
(ja)
|
2000-05-30 |
2001-12-14 |
Nikon Corp |
投影光学系、当該投影光学系を備えた露光装置、及び当該露光装置を用いたマイクロデバイスの製造方法
|
|
JP4811623B2
(ja)
|
2000-06-14 |
2011-11-09 |
株式会社ニコン |
投影光学系および該投影光学系を備えた露光装置
|
|
JP2002083766A
(ja)
|
2000-06-19 |
2002-03-22 |
Nikon Corp |
投影光学系、該光学系の製造方法、及び前記光学系を備えた投影露光装置
|
|
JP2002032290A
(ja)
|
2000-07-13 |
2002-01-31 |
Canon Inc |
検査方法及び検査システム
|
|
US6842298B1
(en)
|
2000-09-12 |
2005-01-11 |
Kla-Tencor Technologies Corporation |
Broad band DUV, VUV long-working distance catadioptric imaging system
|
|
EP1191379B1
(de)
*
|
2000-09-22 |
2008-03-19 |
Leica Microsystems Schweiz AG |
Mikrosokop mit einer Handhabe bzw. Handgriff für ein Mikroskop
|
|
JP2002116382A
(ja)
|
2000-10-05 |
2002-04-19 |
Nikon Corp |
投影光学系および該投影光学系を備えた露光装置
|
|
EP1327172A1
(de)
|
2000-10-20 |
2003-07-16 |
Carl Zeiss |
8-spiegel-mikrolithographie-projektionsobjektiv
|
|
JP4245286B2
(ja)
|
2000-10-23 |
2009-03-25 |
株式会社ニコン |
反射屈折光学系および該光学系を備えた露光装置
|
|
TW573234B
(en)
|
2000-11-07 |
2004-01-21 |
Asml Netherlands Bv |
Lithographic projection apparatus and integrated circuit device manufacturing method
|
|
JP2002217095A
(ja)
|
2000-11-14 |
2002-08-02 |
Canon Inc |
露光装置、半導体デバイス製造方法、半導体製造工場及び露光装置の保守方法並びに位置検出装置
|
|
JP2002151397A
(ja)
|
2000-11-15 |
2002-05-24 |
Nikon Corp |
投影光学系、露光装置及び露光方法
|
|
JP2004514943A
(ja)
|
2000-11-28 |
2004-05-20 |
カール・ツアイス・エスエムテイ・アーゲー |
１５７ｎｍリソグラフィ用の反射屈折投影系
|
|
KR100866818B1
(ko)
|
2000-12-11 |
2008-11-04 |
가부시키가이샤 니콘 |
투영광학계 및 이 투영광학계를 구비한 노광장치
|
|
JP2002182116A
(ja)
|
2000-12-18 |
2002-06-26 |
Nikon Corp |
対物レンズ系
|
|
US7405884B2
(en)
*
|
2000-12-21 |
2008-07-29 |
Olympus Corporation |
Optical apparatus
|
|
DE10064685A1
(de)
|
2000-12-22 |
2002-07-04 |
Zeiss Carl |
Lithographieobjektiv mit einer ersten Linsengruppe, bestehend ausschließlich aus Linsen positiver Brechkraft
|
|
EP1344112A2
(de)
|
2000-12-22 |
2003-09-17 |
Carl Zeiss SMT AG |
Projektionsobjektiv
|
|
JP2002208551A
(ja)
|
2001-01-10 |
2002-07-26 |
Nikon Corp |
反射屈折光学系及び投影露光装置
|
|
DE10104177A1
(de)
|
2001-01-24 |
2002-08-01 |
Zeiss Carl |
Katadioptrisches Reduktionsobjektiv
|
|
JP2002244034A
(ja)
|
2001-02-21 |
2002-08-28 |
Nikon Corp |
投影光学系および該投影光学系を備えた露光装置
|
|
JP2002323653A
(ja)
|
2001-02-23 |
2002-11-08 |
Nikon Corp |
投影光学系，投影露光装置および投影露光方法
|
|
JP2002323652A
(ja)
|
2001-02-23 |
2002-11-08 |
Nikon Corp |
投影光学系，該投影光学系を備えた投影露光装置および投影露光方法
|
|
JP2002287023A
(ja)
|
2001-03-27 |
2002-10-03 |
Nikon Corp |
投影光学系、該投影光学系を備えた投影露光装置及び投影露光方法
|
|
RU2192028C1
(ru)
|
2001-04-04 |
2002-10-27 |
Общество С Ограниченной Ответственностью "Инсмат Технология" |
Катадиоптрическая система
|
|
DE10120446C2
(de)
|
2001-04-26 |
2003-04-17 |
Zeiss Carl |
Projektionsbelichtungsanlage sowie Verfahren zur Kompensation von Abbildungsfehlern in einer Projektionsbelichtungsanlage, insbesondere für die Mikro-Lithographie
|
|
WO2002091078A1
(en)
*
|
2001-05-07 |
2002-11-14 |
Massachusetts Institute Of Technology |
Methods and apparatus employing an index matching medium
|
|
US6753947B2
(en)
|
2001-05-10 |
2004-06-22 |
Ultratech Stepper, Inc. |
Lithography system and method for device manufacture
|
|
DE10123230A1
(de)
|
2001-05-12 |
2002-11-28 |
Zeiss Carl |
Diffraktives optisches Element sowie optische Anordnung mit einem diffraktiven optischen Element
|
|
DE10127227A1
(de)
|
2001-05-22 |
2002-12-05 |
Zeiss Carl |
Katadioptrisches Reduktionsobjektiv
|
|
JP4780364B2
(ja)
|
2001-06-14 |
2011-09-28 |
株式会社ニコン |
反射屈折光学系および該光学系を備えた露光装置
|
|
JPWO2002103413A1
(ja)
|
2001-06-15 |
2004-10-07 |
株式会社ニコン |
光学部材及びその製造方法、並びに投影露光装置
|
|
KR20030023761A
(ko)
|
2001-06-21 |
2003-03-19 |
코닌클리케 필립스 일렉트로닉스 엔.브이. |
광학 주사장치
|
|
US20030058494A1
(en)
|
2001-06-27 |
2003-03-27 |
Roberts Kim B. |
Control of parameters in a global optical controller
|
|
US6831731B2
(en)
*
|
2001-06-28 |
2004-12-14 |
Nikon Corporation |
Projection optical system and an exposure apparatus with the projection optical system
|
|
JP2003015040A
(ja)
|
2001-07-04 |
2003-01-15 |
Nikon Corp |
投影光学系および該投影光学系を備えた露光装置
|
|
US6822805B2
(en)
|
2001-07-09 |
2004-11-23 |
Olympus Corporation |
Objective lens
|
|
US6775063B2
(en)
*
|
2001-07-10 |
2004-08-10 |
Nikon Corporation |
Optical system and exposure apparatus having the optical system
|
|
DE10139177A1
(de)
|
2001-08-16 |
2003-02-27 |
Zeiss Carl |
Objektiv mit Pupillenobskuration
|
|
TW575904B
(en)
*
|
2001-08-21 |
2004-02-11 |
Asml Us Inc |
Optical projection for microlithography
|
|
US7136220B2
(en)
|
2001-08-21 |
2006-11-14 |
Carl Zeiss Smt Ag |
Catadioptric reduction lens
|
|
DE10143385C2
(de)
|
2001-09-05 |
2003-07-17 |
Zeiss Carl |
Projektionsbelichtungsanlage
|
|
US6821794B2
(en)
|
2001-10-04 |
2004-11-23 |
Novellus Systems, Inc. |
Flexible snapshot in endpoint detection
|
|
JP2003114387A
(ja)
|
2001-10-04 |
2003-04-18 |
Nikon Corp |
反射屈折光学系および該光学系を備える投影露光装置
|
|
DE10151309A1
(de)
|
2001-10-17 |
2003-05-08 |
Carl Zeiss Semiconductor Mfg S |
Projektionsbelichtungsanlage der Mikrolithographie für Lambda <200 nm
|
|
TW559885B
(en)
|
2001-10-19 |
2003-11-01 |
Nikon Corp |
Projection optical system and exposure device having the projection optical system
|
|
US20040075894A1
(en)
|
2001-12-10 |
2004-04-22 |
Shafer David R. |
Catadioptric reduction objective
|
|
WO2003050587A2
(de)
*
|
2001-12-10 |
2003-06-19 |
Carl Zeiss Smt Ag |
Katadioptrisches reduktionsobjektiv
|
|
AU2002358638A1
(en)
|
2001-12-18 |
2003-06-30 |
Carl Zeiss Smt Ag |
Catadioptric reduction lens
|
|
JP2003185920A
(ja)
|
2001-12-18 |
2003-07-03 |
Nikon Corp |
結像光学系及び投影露光装置
|
|
US7046459B1
(en)
|
2001-12-18 |
2006-05-16 |
Carl Zeiss Smt Ag |
Catadioptric reductions lens
|
|
JP2003233001A
(ja)
|
2002-02-07 |
2003-08-22 |
Canon Inc |
反射型投影光学系、露光装置及びデバイス製造方法
|
|
US7140699B2
(en)
|
2002-02-14 |
2006-11-28 |
Continental Teves Ag & Co. Ohg |
Method for regulating a predetermined modifiable brake pressure
|
|
AU2003210214A1
(en)
|
2002-03-01 |
2003-09-16 |
Carl Zeiss Smt Ag |
Refractive projection lens
|
|
DE10229249A1
(de)
|
2002-03-01 |
2003-09-04 |
Zeiss Carl Semiconductor Mfg |
Refraktives Projektionsobjektiv mit einer Taille
|
|
US7190527B2
(en)
|
2002-03-01 |
2007-03-13 |
Carl Zeiss Smt Ag |
Refractive projection objective
|
|
DE10332112A1
(de)
|
2003-07-09 |
2005-01-27 |
Carl Zeiss Smt Ag |
Projektionsbelichtungsverfahren und Projektionsbelichtungssystem
|
|
DE10210899A1
(de)
*
|
2002-03-08 |
2003-09-18 |
Zeiss Carl Smt Ag |
Refraktives Projektionsobjektiv für Immersions-Lithographie
|
|
JP4239212B2
(ja)
|
2002-03-25 |
2009-03-18 |
株式会社ニコン |
投影光学系、露光装置および露光方法
|
|
US6912042B2
(en)
|
2002-03-28 |
2005-06-28 |
Carl Zeiss Smt Ag |
6-mirror projection objective with few lenses
|
|
JP2003297729A
(ja)
|
2002-04-03 |
2003-10-17 |
Nikon Corp |
投影光学系、露光装置および露光方法
|
|
JP2003307680A
(ja)
|
2002-04-17 |
2003-10-31 |
Nikon Corp |
反射屈折光学系
|
|
JP2003309059A
(ja)
*
|
2002-04-17 |
2003-10-31 |
Nikon Corp |
投影光学系、その製造方法、露光装置および露光方法
|
|
JP4292497B2
(ja)
|
2002-04-17 |
2009-07-08 |
株式会社ニコン |
投影光学系、露光装置および露光方法
|
|
DE10304599A1
(de)
|
2002-05-13 |
2003-11-27 |
Zeiss Carl Smt Ag |
Verfahren zur Herstellung von mindestens zwei Projektionsobjektiven
|
|
DE10221386A1
(de)
|
2002-05-14 |
2003-11-27 |
Zeiss Carl Smt Ag |
Projektionsbelichtungssystem
|
|
JP2004023020A
(ja)
|
2002-06-20 |
2004-01-22 |
Nikon Corp |
投影光学系及び縮小投影露光装置
|
|
JP2004029458A
(ja)
|
2002-06-26 |
2004-01-29 |
Nikon Corp |
投影光学系及び縮小投影露光装置
|
|
JP2004029625A
(ja)
|
2002-06-28 |
2004-01-29 |
Nikon Corp |
投影光学系、露光装置及び露光方法
|
|
JP2004086128A
(ja)
|
2002-07-04 |
2004-03-18 |
Nikon Corp |
投影光学系、露光装置、およびデバイス製造方法
|
|
US20060109559A1
(en)
|
2002-07-17 |
2006-05-25 |
Carl Zeiss Semiconductor Manufacturing Technologies Ag |
Catadioptric multi-mirror systems for projection lithography
|
|
WO2004010200A1
(en)
|
2002-07-17 |
2004-01-29 |
Carl Zeiss Semiconductor Manufacturing Technologies Ag |
Catadioptric multi-mirror systems for protection lithography
|
|
WO2004010164A2
(en)
|
2002-07-18 |
2004-01-29 |
Carl Zeiss Smt Ag |
Catadioptric projection objective
|
|
US6842277B2
(en)
|
2002-07-23 |
2005-01-11 |
Nikon Corporation |
Deformable mirror with high-bandwidth servo for rigid body control
|
|
JP2005536775A
(ja)
|
2002-08-23 |
2005-12-02 |
株式会社ニコン |
投影光学系、フォトリソグラフィ方法および露光装置、並びに露光装置を用いた方法
|
|
JP2004138926A
(ja)
|
2002-10-21 |
2004-05-13 |
Nikon Corp |
投影光学系および該投影光学系を備えた露光装置
|
|
JP2004252362A
(ja)
|
2003-02-21 |
2004-09-09 |
Canon Inc |
反射型投影光学系、露光装置及びデバイス製造方法
|
|
JP2004170869A
(ja)
|
2002-11-22 |
2004-06-17 |
Nikon Corp |
結像光学系、露光装置および露光方法
|
|
JP2003241099A
(ja)
|
2002-12-02 |
2003-08-27 |
Nikon Corp |
反射屈折投影光学系、並びに投影露光方法及び装置
|
|
US6731374B1
(en)
|
2002-12-02 |
2004-05-04 |
Asml Holding N.V. |
Beam-splitter optics design that maintains an unflipped (unmirrored) image for a catadioptric lithographic system
|
|
US7450300B2
(en)
|
2002-12-06 |
2008-11-11 |
Newport Corporation |
High resolution objective lens assembly
|
|
DE10258718A1
(de)
|
2002-12-09 |
2004-06-24 |
Carl Zeiss Smt Ag |
Projektionsobjektiv, insbesondere für die Mikrolithographie, sowie Verfahren zur Abstimmung eines Projektionsobjektives
|
|
JP2004205698A
(ja)
|
2002-12-24 |
2004-07-22 |
Nikon Corp |
投影光学系、露光装置および露光方法
|
|
JP2003233009A
(ja)
|
2002-12-25 |
2003-08-22 |
Nikon Corp |
反射屈折投影光学系、反射屈折光学系、投影露光装置、及び投影露光方法
|
|
JP3938040B2
(ja)
|
2002-12-27 |
2007-06-27 |
キヤノン株式会社 |
反射型投影光学系、露光装置及びデバイス製造方法
|
|
US6879383B2
(en)
|
2002-12-27 |
2005-04-12 |
Ultratech, Inc. |
Large-field unit-magnification projection system
|
|
US6813098B2
(en)
|
2003-01-02 |
2004-11-02 |
Ultratech, Inc. |
Variable numerical aperture large-field unit-magnification projection system
|
|
JP4300509B2
(ja)
|
2003-01-10 |
2009-07-22 |
株式会社ニコン |
投影光学系、露光装置、および露光方法
|
|
CN100383660C
(zh)
|
2003-01-22 |
2008-04-23 |
三洋电机株式会社 |
照明装置和投影型图像显示器
|
|
JP4328940B2
(ja)
|
2003-02-20 |
2009-09-09 |
株式会社ニコン |
投影光学系、露光装置、および露光方法
|
|
US8675276B2
(en)
|
2003-02-21 |
2014-03-18 |
Kla-Tencor Corporation |
Catadioptric imaging system for broad band microscopy
|
|
US7180658B2
(en)
|
2003-02-21 |
2007-02-20 |
Kla-Tencor Technologies Corporation |
High performance catadioptric imaging system
|
|
JP2004252358A
(ja)
|
2003-02-21 |
2004-09-09 |
Canon Inc |
反射型投影光学系及び露光装置
|
|
JP2004252363A
(ja)
|
2003-02-21 |
2004-09-09 |
Canon Inc |
反射型投影光学系
|
|
JP2004259844A
(ja)
|
2003-02-25 |
2004-09-16 |
Nikon Corp |
投影光学系の製造方法、投影光学系、露光装置の製造方法、露光装置、露光方法、および光学系の製造方法
|
|
TWI305872B
(en)
|
2003-03-17 |
2009-02-01 |
Nikon Corp |
Optical projection system, light-exposure apparatus and light-exposure method
|
|
DE10316428A1
(de)
|
2003-04-08 |
2004-10-21 |
Carl Zeiss Smt Ag |
Katadioptrisches Reduktionsobjektiv
|
|
JP2004317534A
(ja)
|
2003-04-11 |
2004-11-11 |
Nikon Corp |
反射屈折型の結像光学系、露光装置、および露光方法
|
|
DE10318805A1
(de)
|
2003-04-16 |
2004-11-04 |
Carl Zeiss Smt Ag |
Katadioptrisches Reduktionsobjektiv mit Polarisationsstrahlteiler
|
|
TWI237307B
(en)
|
2003-05-01 |
2005-08-01 |
Nikon Corp |
Optical projection system, light exposing apparatus and light exposing method
|
|
EP2672307A3
(en)
|
2003-05-06 |
2014-07-23 |
Nikon Corporation |
Projection optical system, exposure apparatus, and exposure method
|
|
US7348575B2
(en)
|
2003-05-06 |
2008-03-25 |
Nikon Corporation |
Projection optical system, exposure apparatus, and exposure method
|
|
JP2004333761A
(ja)
|
2003-05-06 |
2004-11-25 |
Nikon Corp |
反射屈折型の投影光学系、露光装置、および露光方法
|
|
JP4366990B2
(ja)
|
2003-05-08 |
2009-11-18 |
株式会社ニコン |
投影光学系、露光装置及び露光方法
|
|
US6995833B2
(en)
|
2003-05-23 |
2006-02-07 |
Canon Kabushiki Kaisha |
Projection optical system, exposure apparatus, and device manufacturing method
|
|
JP2005039211A
(ja)
|
2003-06-30 |
2005-02-10 |
Canon Inc |
投影光学系、露光装置及びデバイスの製造方法
|
|
US6863403B2
(en)
|
2003-05-27 |
2005-03-08 |
Ultratech, Inc. |
Deep ultraviolet unit-magnification projection optical system and projection exposure apparatus
|
|
JP2004354555A
(ja)
|
2003-05-28 |
2004-12-16 |
Nikon Corp |
反射屈折型の投影光学系、露光装置および露光方法
|
|
JP2005003982A
(ja)
|
2003-06-12 |
2005-01-06 |
Nikon Corp |
投影光学系、露光装置および露光方法
|
|
JP2005017734A
(ja)
|
2003-06-26 |
2005-01-20 |
Nikon Corp |
投影光学系、露光装置、およびデバイス製造方法
|
|
WO2005001544A1
(ja)
|
2003-06-26 |
2005-01-06 |
Nikon Corporation |
光学ユニット、結像光学系、結像光学系の収差調整方法、投影光学系、投影光学系の製造方法、露光装置、および露光方法
|
|
WO2005015316A2
(en)
|
2003-08-12 |
2005-02-17 |
Carl Zeiss Smt Ag |
Projection objective for microlithography
|
|
US7085075B2
(en)
|
2003-08-12 |
2006-08-01 |
Carl Zeiss Smt Ag |
Projection objectives including a plurality of mirrors with lenses ahead of mirror M3
|
|
US8208198B2
(en)
|
2004-01-14 |
2012-06-26 |
Carl Zeiss Smt Gmbh |
Catadioptric projection objective
|
|
JP2005107362A
(ja)
|
2003-10-01 |
2005-04-21 |
Canon Inc |
投影光学系及び露光装置、デバイスの製造方法
|
|
JP2005114881A
(ja)
|
2003-10-06 |
2005-04-28 |
Nikon Corp |
投影光学系、露光装置、および露光方法
|
|
US6906866B2
(en)
|
2003-10-15 |
2005-06-14 |
Carl Zeiss Smt Ag |
Compact 1½-waist system for sub 100 nm ArF lithography
|
|
JP2007508591A
(ja)
*
|
2003-10-17 |
2007-04-05 |
カール・ツァイス・エスエムティー・アーゲー |
反射屈折投影対物レンズ
|
|
DE10394297D2
(de)
|
2003-10-22 |
2006-07-06 |
Zeiss Carl Smt Ag |
Refraktives Projektionsobjektiv für Immersions-Lithographie
|
|
WO2005054956A2
(en)
|
2003-12-02 |
2005-06-16 |
Carl Zeiss Smt Ag |
Projection optical system
|
|
US20070077418A1
(en)
|
2003-12-12 |
2007-04-05 |
Aizo Sakurai |
Pressure sensitive adhesive composition and article
|
|
EP1700163A1
(en)
*
|
2003-12-15 |
2006-09-13 |
Carl Zeiss SMT AG |
Objective as a microlithography projection objective with at least one liquid lens
|
|
WO2005106589A1
(en)
|
2004-05-04 |
2005-11-10 |
Carl Zeiss Smt Ag |
Microlithographic projection exposure apparatus and immersion liquid therefore
|
|
US7466489B2
(en)
|
2003-12-15 |
2008-12-16 |
Susanne Beder |
Projection objective having a high aperture and a planar end surface
|
|
US20050185269A1
(en)
*
|
2003-12-19 |
2005-08-25 |
Carl Zeiss Smt Ag |
Catadioptric projection objective with geometric beam splitting
|
|
US7460206B2
(en)
|
2003-12-19 |
2008-12-02 |
Carl Zeiss Smt Ag |
Projection objective for immersion lithography
|
|
JP5102492B2
(ja)
|
2003-12-19 |
2012-12-19 |
カール・ツァイス・エスエムティー・ゲーエムベーハー |
結晶素子を有するマイクロリソグラフィー投影用対物レンズ
|
|
JP2005195713A
(ja)
|
2004-01-05 |
2005-07-21 |
Nikon Corp |
投影光学系、露光装置、および露光方法
|
|
CN1910494B
(zh)
|
2004-01-14 |
2011-08-10 |
卡尔蔡司Smt有限责任公司 |
反射折射投影物镜
|
|
US20080151365A1
(en)
|
2004-01-14 |
2008-06-26 |
Carl Zeiss Smt Ag |
Catadioptric projection objective
|
|
US7239450B2
(en)
|
2004-11-22 |
2007-07-03 |
Carl Zeiss Smt Ag |
Method of determining lens materials for a projection exposure apparatus
|
|
US7463422B2
(en)
|
2004-01-14 |
2008-12-09 |
Carl Zeiss Smt Ag |
Projection exposure apparatus
|
|
WO2005076084A1
(en)
|
2004-02-09 |
2005-08-18 |
Carl Zeiss Smt Ag |
Projection objective for a microlithographic projection exposure apparatus
|
|
WO2005081067A1
(en)
|
2004-02-13 |
2005-09-01 |
Carl Zeiss Smt Ag |
Projection objective for a microlithographic projection exposure apparatus
|
|
EP1721201A1
(en)
|
2004-02-18 |
2006-11-15 |
Corning Incorporated |
Catadioptric imaging system for high numerical aperture imaging with deep ultraviolet light
|
|
JP2005257740A
(ja)
|
2004-03-09 |
2005-09-22 |
Nikon Corp |
投影光学系、露光装置、および露光方法
|
|
US8064040B2
(en)
|
2004-03-30 |
2011-11-22 |
Carl Zeiss Smt Gmbh |
Projection objective, projection exposure apparatus and reflective reticle for microlithography
|
|
WO2005098504A1
(en)
|
2004-04-08 |
2005-10-20 |
Carl Zeiss Smt Ag |
Imaging system with mirror group
|
|
KR101213831B1
(ko)
|
2004-05-17 |
2012-12-24 |
칼 짜이스 에스엠티 게엠베하 |
중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
|
|
JP4482874B2
(ja)
|
2004-07-02 |
2010-06-16 |
株式会社ニコン |
投影光学系、露光装置、および露光方法
|
|
EP1771771B1
(en)
|
2004-07-14 |
2009-12-30 |
Carl Zeiss SMT AG |
Catadioptric projection objective
|
|
JP2006113533A
(ja)
|
2004-08-03 |
2006-04-27 |
Nikon Corp |
投影光学系、露光装置、および露光方法
|
|
JP2006049527A
(ja)
|
2004-08-03 |
2006-02-16 |
Canon Inc |
反射屈折型投影光学系及び当該反射屈折型投影光学系を有する露光装置、デバイス製造方法
|
|
US7301707B2
(en)
|
2004-09-03 |
2007-11-27 |
Carl Zeiss Smt Ag |
Projection optical system and method
|
|
JP2006086141A
(ja)
|
2004-09-14 |
2006-03-30 |
Nikon Corp |
投影光学系、露光装置、および露光方法
|
|
US7224520B2
(en)
|
2004-09-28 |
2007-05-29 |
Wavefront Research, Inc. |
Compact fast catadioptric imager
|
|
US20060082905A1
(en)
|
2004-10-14 |
2006-04-20 |
Shafer David R |
Catadioptric projection objective with an in-line, single-axis configuration
|
|
US7697198B2
(en)
*
|
2004-10-15 |
2010-04-13 |
Carl Zeiss Smt Ag |
Catadioptric projection objective
|
|
JP2006114839A
(ja)
|
2004-10-18 |
2006-04-27 |
Nikon Corp |
投影光学系、露光装置、および露光方法
|
|
DE102005045862A1
(de)
|
2004-10-19 |
2006-04-20 |
Carl Zeiss Smt Ag |
Optisches System für Ultraviolettlicht
|
|
JP2006119244A
(ja)
|
2004-10-20 |
2006-05-11 |
Canon Inc |
反射屈折型投影光学系及び当該反射屈折型投影光学系を有する露光装置、デバイス製造方法
|
|
JP2006119490A
(ja)
|
2004-10-25 |
2006-05-11 |
Canon Inc |
反射屈折型投影光学系及び当該反射屈折型投影光学系を有する露光装置、デバイス製造方法
|
|
US7148953B2
(en)
|
2004-11-01 |
2006-12-12 |
Ultratech, Inc. |
Apochromatic unit-magnification projection optical system
|
|
WO2006051689A1
(ja)
|
2004-11-10 |
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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|
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|
|
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(ja)
|
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|
|
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(en)
|
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|
|
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|
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|
|
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(en)
|
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|
|
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(ja)
|
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|
|
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(ja)
|
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|