JP2015111673A5 - - Google Patents

Download PDF

Info

Publication number
JP2015111673A5
JP2015111673A5 JP2014236390A JP2014236390A JP2015111673A5 JP 2015111673 A5 JP2015111673 A5 JP 2015111673A5 JP 2014236390 A JP2014236390 A JP 2014236390A JP 2014236390 A JP2014236390 A JP 2014236390A JP 2015111673 A5 JP2015111673 A5 JP 2015111673A5
Authority
JP
Japan
Prior art keywords
scanning direction
along
object area
objective
light entrance
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Pending
Application number
JP2014236390A
Other languages
English (en)
Japanese (ja)
Other versions
JP2015111673A (ja
Filing date
Publication date
Priority claimed from EP14155685.2A external-priority patent/EP2876498B1/en
Application filed filed Critical
Publication of JP2015111673A publication Critical patent/JP2015111673A/ja
Publication of JP2015111673A5 publication Critical patent/JP2015111673A5/ja
Pending legal-status Critical Current

Links

JP2014236390A 2013-11-22 2014-11-21 マイクロリソグラフィ投影露光装置の照明系 Pending JP2015111673A (ja)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
EP13194135.3 2013-11-22
EP13194135 2013-11-22
EP14155685.2 2014-02-19
EP14155685.2A EP2876498B1 (en) 2013-11-22 2014-02-19 Illumination system of a microlithographic projection exposure apparatus

Publications (2)

Publication Number Publication Date
JP2015111673A JP2015111673A (ja) 2015-06-18
JP2015111673A5 true JP2015111673A5 (enExample) 2016-05-19

Family

ID=49626852

Family Applications (4)

Application Number Title Priority Date Filing Date
JP2016533545A Active JP6343344B2 (ja) 2013-11-22 2014-11-13 マイクロリソグラフィ投影露光装置の照明系
JP2014236390A Pending JP2015111673A (ja) 2013-11-22 2014-11-21 マイクロリソグラフィ投影露光装置の照明系
JP2014236389A Active JP6034845B2 (ja) 2013-11-22 2014-11-21 マイクロリソグラフィ投影露光装置の照明系
JP2016210859A Active JP6434473B2 (ja) 2013-11-22 2016-10-27 マイクロリソグラフィ投影露光装置の照明系

Family Applications Before (1)

Application Number Title Priority Date Filing Date
JP2016533545A Active JP6343344B2 (ja) 2013-11-22 2014-11-13 マイクロリソグラフィ投影露光装置の照明系

Family Applications After (2)

Application Number Title Priority Date Filing Date
JP2014236389A Active JP6034845B2 (ja) 2013-11-22 2014-11-21 マイクロリソグラフィ投影露光装置の照明系
JP2016210859A Active JP6434473B2 (ja) 2013-11-22 2016-10-27 マイクロリソグラフィ投影露光装置の照明系

Country Status (7)

Country Link
US (3) US9310690B2 (enExample)
EP (2) EP2876498B1 (enExample)
JP (4) JP6343344B2 (enExample)
KR (3) KR101922314B1 (enExample)
CN (3) CN105745580B (enExample)
TW (1) TWI638238B (enExample)
WO (1) WO2015074746A1 (enExample)

Families Citing this family (43)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE102014203041A1 (de) 2014-02-19 2015-08-20 Carl Zeiss Smt Gmbh Beleuchtungssystem einer mikrolithographischen Projektionsbelichtungsanlage und Verfahren zum Betreiben eines solchen
DE102014203040A1 (de) 2014-02-19 2015-08-20 Carl Zeiss Smt Gmbh Beleuchtungssystem einer mikrolithographischen Projektionsbelichtungsanlage und Verfahren zum Betreiben eines solchen
KR20180010242A (ko) * 2015-05-21 2018-01-30 칼 짜이스 에스엠티 게엠베하 마이크로리소그래픽 투영 장치의 작동 방법
CN105068381A (zh) * 2015-07-27 2015-11-18 江苏影速光电技术有限公司 一种曝光机光阑承载结构及曝光机光阑更换方法
TWI575300B (zh) 2015-08-31 2017-03-21 中強光電股份有限公司 投影裝置以及照明系統
JP6643466B2 (ja) * 2015-09-23 2020-02-12 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影装置を動作させる方法およびそのような装置の照明システム
DE102015221991A1 (de) * 2015-11-09 2017-05-11 Carl Zeiss Microscopy Gmbh Mikroskopierverfahren zur Ermittlung eines Kontrastbildes und Mikroskop
DE102015224521B4 (de) 2015-12-08 2018-06-21 Carl Zeiss Smt Gmbh Mikrolithographische Projektionsanlage und Verfahren zum Betreiben einer solchen Anlage
DE102015224522B4 (de) 2015-12-08 2018-06-21 Carl Zeiss Smt Gmbh Beleuchtungssystem einer mikrolithographischen Projektionsanlage und Verfahren zum Betreiben eines solchen Systems
WO2017108448A1 (en) * 2015-12-22 2017-06-29 Carl Zeiss Smt Gmbh Illumination system of a microlithographic apparatus
CN106933049B (zh) * 2015-12-30 2020-06-16 上海微电子装备（集团）股份有限公司 一种用于半导体光刻的曝光系统与曝光方法
US10061201B2 (en) 2016-10-24 2018-08-28 Hrl Laboratories, Llc Bottom up apparatus design for formation of self-propagating photopolymer waveguides
US11473081B2 (en) 2016-12-12 2022-10-18 xCella Biosciences, Inc. Methods and systems for screening using microcapillary arrays
EP3559747B1 (de) * 2016-12-20 2026-03-18 EV Group E. Thallner GmbH Vorrichtung und verfahren zur belichtung einer lichtempfindlichen schicht
US10852528B2 (en) 2016-12-20 2020-12-01 Ev Group E. Thallner Gmbh Method and device for exposure of photosensitive layer
US11156626B2 (en) 2016-12-30 2021-10-26 xCella Biosciences, Inc. Multi-stage sample recovery system
CN109654392B (zh) * 2017-01-11 2020-09-04 哈尔滨理工大学 第一遮挡板和具有第一遮挡板的鼻孔照明装置
US11099007B2 (en) * 2017-02-16 2021-08-24 Nikon Corporation Test of operational status of a digital scanner during lithographic exposure process
CN107421439B (zh) * 2017-04-21 2019-05-14 上海交通大学 一种无成像目标显著性检测与坐标跟踪系统及方法
PT3642674T (pt) 2017-06-19 2023-05-02 Suss Microtec Solutions Gmbh & Co Kg Compensação de ampliação e/ou direcionamento de feixe em sistemas óticos
US11175487B2 (en) 2017-06-19 2021-11-16 Suss Microtec Photonic Systems Inc. Optical distortion reduction in projection systems
WO2019064502A1 (ja) * 2017-09-29 2019-04-04 株式会社ニコン 電子ビーム装置及びデバイス製造方法
WO2019064503A1 (ja) * 2017-09-29 2019-04-04 株式会社ニコン 電子ビーム装置、照明光学系、及びデバイス製造方法
JP7020859B2 (ja) 2017-10-24 2022-02-16 キヤノン株式会社 照明光学系、露光装置および物品の製造方法
US11597033B2 (en) * 2018-03-23 2023-03-07 Primetals Technologies Japan, Ltd. Laser processing head, laser processing device, and method for adjusting laser processing head
CN118672074A (zh) * 2018-06-19 2024-09-20 Ev 集团 E·索尔纳有限责任公司 用于像点曝光的方法和设备
US10503076B1 (en) * 2018-08-29 2019-12-10 Applied Materials, Inc. Reserving spatial light modulator sections to address field non-uniformities
CN109116554B (zh) * 2018-10-11 2020-12-04 北京环境特性研究所 光学积分器的设计方法
EP3640735A1 (en) 2018-10-18 2020-04-22 ASML Netherlands B.V. Methods and apparatus for inspection of a structure and associated apparatuses
EP3890876B1 (en) 2018-12-06 2024-05-01 Xcella Biosciences, Inc. Lateral loading of microcapillary arrays
KR102651647B1 (ko) * 2019-03-12 2024-03-26 루머스 리미티드 이미지 프로젝터
CN111856745B (zh) * 2019-04-30 2023-03-17 上海微电子装备（集团）股份有限公司 一种光照射装置
EP3736550A1 (en) * 2019-05-10 2020-11-11 X-Rite Switzerland GmbH Illumination device for a spectrophotometer having integrated mixing optics, and method for illuminating a sample
US12523940B2 (en) 2020-08-18 2026-01-13 Nikon Corporation Exposure apparatus, measuring device, measuring method, and device manufacturing method
US11366307B2 (en) * 2020-08-27 2022-06-21 Kla Corporation Programmable and reconfigurable mask with MEMS micro-mirror array for defect detection
DE102021202847A1 (de) 2021-03-24 2022-09-29 Carl Zeiss Smt Gmbh Beleuchtungsoptik für eine Projektionsbelichtungsanlage für die Lithografie
CN113189848B (zh) * 2021-04-21 2024-02-13 之江实验室 一种基于光纤阵列的多通道并行式超分辨直写式光刻系统
CN115390362A (zh) * 2021-05-25 2022-11-25 赫智科技(苏州)有限公司 一种4k光刻的方法
US20230123834A1 (en) * 2021-10-19 2023-04-20 Meta Platforms Technologies, Llc Euv lithography using polymer crystal based reticle
CN115128809B (zh) * 2022-05-17 2023-11-28 南京工业职业技术大学 一种实现全息波导显示系统均匀成像的光栅效率分布表征与优化方法
DE102022116214B4 (de) * 2022-06-29 2024-06-13 Carl Zeiss Industrielle Messtechnik Gmbh Messkamera und Verfahren zur zweidimensionalen Vermessung von Gegenständen
CN116027641A (zh) * 2022-12-29 2023-04-28 中国科学院光电技术研究所 一种兼容同轴和离轴的照明装置及照明的方法
DE102024205430A1 (de) * 2024-06-13 2025-12-18 Carl Zeiss Smt Gmbh Optomechanisches System für die Projektionslithographie

Family Cites Families (48)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US5517279A (en) 1993-08-30 1996-05-14 Hugle; William B. Lens array photolithography
JP2674579B2 (ja) * 1995-08-29 1997-11-12 株式会社ニコン 走査露光装置および走査露光方法
JP2674578B2 (ja) * 1995-08-29 1997-11-12 株式会社ニコン 走査露光装置及び露光方法
US6404499B1 (en) 1998-04-21 2002-06-11 Asml Netherlands B.V. Lithography apparatus with filters for optimizing uniformity of an image
EP1107064A3 (en) 1999-12-06 2004-12-29 Olympus Optical Co., Ltd. Exposure apparatus
GB9930529D0 (en) * 1999-12-23 2000-02-16 Screen Tech Ltd Optical arrangement for flat-panel displays
JP4838430B2 (ja) * 2001-01-26 2011-12-14 キヤノン株式会社 露光装置及びデバイス製造方法
GB0107076D0 (en) * 2001-03-21 2001-05-09 Screen Technology Ltd Liquid-crystal display using emissive elements
US6737662B2 (en) 2001-06-01 2004-05-18 Asml Netherlands B.V. Lithographic apparatus, device manufacturing method, device manufactured thereby, control system, computer program, and computer program product
KR100480620B1 (ko) 2002-09-19 2005-03-31 삼성전자주식회사 마이크로 미러 어레이를 구비한 노광 장치 및 이를 이용한노광 방법
US7714983B2 (en) * 2003-09-12 2010-05-11 Carl Zeiss Smt Ag Illumination system for a microlithography projection exposure installation
DE10343333A1 (de) * 2003-09-12 2005-04-14 Carl Zeiss Smt Ag Beleuchtungssystem für eine Mikrolithographie-Projektionsbelichtungsanlage
WO2005040927A2 (en) 2003-10-18 2005-05-06 Carl Zeiss Smt Ag Device and method for illumination dose adjustments in microlithography
US20060087634A1 (en) 2004-10-25 2006-04-27 Brown Jay M Dynamic illumination uniformity and shape control for lithography
CN100521089C (zh) * 2004-12-27 2009-07-29 株式会社尼康 光学积分器、照明光学装置、曝光装置、方法及元件制法
TWI456267B (zh) * 2006-02-17 2014-10-11 卡爾蔡司Ｓｍｔ有限公司 用於微影投射曝光設備之照明系統
JP2007279113A (ja) * 2006-04-03 2007-10-25 Nikon Corp 走査型露光装置及びデバイスの製造方法
US7932993B2 (en) 2006-09-16 2011-04-26 Wenhui Mei Divided sub-image array scanning and exposing system
WO2008076114A1 (en) 2006-12-19 2008-06-26 Thomson Licensing High resolution dmd projection system
CN101796460B (zh) 2007-08-30 2013-05-01 卡尔蔡司Smt有限责任公司 微光刻投射曝光设备中用于照明掩模的照明系统
US8451427B2 (en) * 2007-09-14 2013-05-28 Nikon Corporation Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
US20090091730A1 (en) * 2007-10-03 2009-04-09 Nikon Corporation Spatial light modulation unit, illumination apparatus, exposure apparatus, and device manufacturing method
SG185313A1 (en) * 2007-10-16 2012-11-29 Nikon Corp Illumination optical system, exposure apparatus, and device manufacturing method
KR101562073B1 (ko) * 2007-10-16 2015-10-21 가부시키가이샤 니콘 조명 광학 시스템, 노광 장치 및 디바이스 제조 방법
US8379187B2 (en) * 2007-10-24 2013-02-19 Nikon Corporation Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
US9116346B2 (en) 2007-11-06 2015-08-25 Nikon Corporation Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
WO2009060744A1 (ja) 2007-11-06 2009-05-14 Nikon Corporation 照明光学装置及び露光装置
KR101708943B1 (ko) * 2007-11-06 2017-02-21 가부시키가이샤 니콘 제어 장치, 노광 방법 및 노광 장치
JP5326259B2 (ja) * 2007-11-08 2013-10-30 株式会社ニコン 照明光学装置、露光装置、およびデバイス製造方法
NL1036108A1 (nl) * 2007-11-09 2009-05-12 Asml Netherlands Bv Device Manufacturing Method and Lithographic Apparatus, and Computer Program Product.
KR101591610B1 (ko) * 2008-02-15 2016-02-03 칼 짜이스 에스엠티 게엠베하 마이크로리소그래피용 투영 노광 장치에 사용하기 위한 패싯 미러
DE102008001511A1 (de) 2008-04-30 2009-11-05 Carl Zeiss Smt Ag Beleuchtungsoptik für die EUV-Mikrolithografie sowie Beleuchtungssystem und Projektionsbelichtungsanlage mit einer derartigen Beleuchtungsoptik
JP5048869B2 (ja) * 2008-05-20 2012-10-17 ホ チョン，ジン マスクレス露光装置用光学部品
DE102008002749A1 (de) 2008-06-27 2009-12-31 Carl Zeiss Smt Ag Beleuchtungsoptik für die Mikrolithografie
EP2146248B1 (en) 2008-07-16 2012-08-29 Carl Zeiss SMT GmbH Illumination system of a microlithographic projection exposure apparatus
WO2010024106A1 (ja) * 2008-08-28 2010-03-04 株式会社ニコン 照明光学系、露光装置、およびデバイス製造方法
JP5403244B2 (ja) * 2009-07-16 2014-01-29 株式会社ニコン 空間光変調ユニット、照明光学系、露光装置、およびデバイス製造方法
JP5608233B2 (ja) * 2009-07-31 2014-10-15 カール・ツァイス・エスエムティー・ゲーエムベーハー 光学ビーム偏向要素及び調節方法
JP2011108851A (ja) * 2009-11-17 2011-06-02 Canon Inc 露光装置及びデバイスの製造方法
KR101703830B1 (ko) 2009-11-18 2017-02-08 에이에스엠엘 네델란즈 비.브이. 리소그래피 장치 및 디바이스 제조방법
DE102009054540B4 (de) 2009-12-11 2011-11-10 Carl Zeiss Smt Gmbh Beleuchtungsoptik für die EUV-Mikrolithographie
JP2012004561A (ja) 2010-06-16 2012-01-05 Nikon Corp 照明方法、照明光学装置、及び露光装置
WO2012028158A1 (en) * 2010-08-30 2012-03-08 Carl Zeiss Smt Gmbh Illumination system of a microlithographic projection exposure apparatus
JP2012069656A (ja) 2010-09-22 2012-04-05 Nikon Corp 空間光変調器、照明装置及び露光装置、並びにデバイス製造方法
JP2012099686A (ja) 2010-11-04 2012-05-24 Nikon Corp 光源形成方法、露光方法、及びデバイス製造方法
JP6016169B2 (ja) 2011-01-29 2016-10-26 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置の照明系
US8823921B2 (en) * 2011-08-19 2014-09-02 Ultratech, Inc. Programmable illuminator for a photolithography system
US8390917B1 (en) 2011-08-24 2013-03-05 Palo Alto Research Center Incorporated Multiple line single-pass imaging using spatial light modulator and anamorphic projection optics

Similar Documents

Publication Publication Date Title
EP3509529A4 (en) Simultaneous white light and hyperspectral light imaging systems
JP2015014814A5 (enExample)
EP3652572A4 (en) OPTICAL CONNECTOR WITH ULTRA-SMALL FORM FACTOR
EP3696587C0 (en) AUTOMATIC FOCUS AND OPTICAL IMAGE STABILIZATION IN A COMPACT FOLDED CAMERA
PT3855745T (pt) Aparelho de descodificação de vídeo, aparelho de codificação de vídeo, meio de armazenamento e processo de transmissão
JP2015111672A5 (enExample)
IN2015DE00002A (enExample)
JP2014044445A5 (enExample)
EP2899573A3 (en) Photonic apparatus with periodic structures
EP3535616A4 (en) Multispectral super resolution microscopy
JP2017122871A5 (enExample)
JP2019537753A5 (enExample)
EP3411437A4 (en) NANOVEROUS FUND FORMULATIONS FOR OPTICAL APPLICATIONS
EP3437548A4 (en) ULTRA-SMALL ENDOSCOPE CAMERA MODULE AND ULTRA-SMALL ENDOSCOPE WITH IT
JP2016048221A5 (enExample)
EP2921894A3 (en) Five-piece lens set for capturing images
EP3414612A4 (en) MICROSCOPE LENS WITH INTEGRATED WIDE-FIELD CAMERA AND RADIATION SCANNER
JP2016133626A5 (enExample)
EP3517020A4 (en) SCAN LASER MICROSCOPE
JP2015145913A5 (enExample)
JP2015132637A5 (enExample)
JP2017083563A5 (enExample)
JP2016071283A5 (enExample)
EP3040755A3 (en) Optical lens and display device including the same
JP2018004963A5 (enExample)