JP2015111673A5 - - Google Patents

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Publication number
JP2015111673A5
JP2015111673A5 JP2014236390A JP2014236390A JP2015111673A5 JP 2015111673 A5 JP2015111673 A5 JP 2015111673A5 JP 2014236390 A JP2014236390 A JP 2014236390A JP 2014236390 A JP2014236390 A JP 2014236390A JP 2015111673 A5 JP2015111673 A5 JP 2015111673A5
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JP
Japan
Prior art keywords
scanning direction
along
object area
objective
light entrance
Prior art date
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Pending
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JP2014236390A
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Japanese (ja)
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JP2015111673A (en
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Priority claimed from EP14155685.2A external-priority patent/EP2876498B1/en
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Publication of JP2015111673A publication Critical patent/JP2015111673A/en
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Description

矩形物体区域１１０が正方形光入射ファセット７５上に結像されることになる場合に、対物系５８はアナモフィックのものでなければならない。より具体的には、倍率Ｍの絶対値は、走査方向Ｙに沿ってよりも交差走査方向Ｘに沿って小さく、すなわち、｜ＭX｜＜｜ＭY｜である必要がある。これを図２３に例示しており、この図では、単一矩形物体区域１１０と光学ラスター要素７４の光入射ファセット７５との間に対物系５８の２つの円柱レンズ１２４、１２６が配置されている。交差走査方向Ｘに沿った物体区域１１０の長さがＬXであり、走査方向Ｙに沿った長さがＬYである場合に、｜Ｍ X ／Ｍ Y ｜は、ＬY／ＬXに等しくなければならない。 If the rectangular object area 110 is to be imaged on the square light entrance facet 75, the objective 58 must be anamorphic. More specifically, the absolute value of the magnification M needs to be smaller along the cross scanning direction X than along the scanning direction Y, that is, | M X | <| M Y |. This is illustrated in FIG. 23 where two cylindrical lenses 124, 126 of the objective 58 are arranged between a single rectangular object area 110 and the light entrance facet 75 of the optical raster element 74. . When the length of the object area 110 along the cross scanning direction X is L X and the length along the scanning direction Y is L Y , | M X / M Y | becomes L Y / L X Must be equal.

JP2014236390A 2013-11-22 2014-11-21 Illumination system of micro lithography projection exposure device Pending JP2015111673A (en)

Applications Claiming Priority (4)

Application Number Priority Date Filing Date Title
EP13194135.3 2013-11-22
EP13194135 2013-11-22
EP14155685.2A EP2876498B1 (en) 2013-11-22 2014-02-19 Illumination system of a microlithographic projection exposure apparatus
EP14155685.2 2014-02-19

Publications (2)

Publication Number Publication Date
JP2015111673A JP2015111673A (en) 2015-06-18
JP2015111673A5 true JP2015111673A5 (en) 2016-05-19

Family

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Family Applications (4)

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JP2016533545A Active JP6343344B2 (en) 2013-11-22 2014-11-13 Illumination system of microlithographic projection exposure apparatus
JP2014236389A Active JP6034845B2 (en) 2013-11-22 2014-11-21 Illumination system of microlithographic projection exposure apparatus
JP2014236390A Pending JP2015111673A (en) 2013-11-22 2014-11-21 Illumination system of micro lithography projection exposure device
JP2016210859A Active JP6434473B2 (en) 2013-11-22 2016-10-27 Illumination system of microlithographic projection exposure apparatus

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JP2016533545A Active JP6343344B2 (en) 2013-11-22 2014-11-13 Illumination system of microlithographic projection exposure apparatus
JP2014236389A Active JP6034845B2 (en) 2013-11-22 2014-11-21 Illumination system of microlithographic projection exposure apparatus

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JP2016210859A Active JP6434473B2 (en) 2013-11-22 2016-10-27 Illumination system of microlithographic projection exposure apparatus

Country Status (7)

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US (3) US9500954B2 (en)
EP (2) EP2876498B1 (en)
JP (4) JP6343344B2 (en)
KR (3) KR101922314B1 (en)
CN (3) CN105745580B (en)
TW (1) TWI638238B (en)
WO (1) WO2015074746A1 (en)

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