JP2015111673A5 - - Google Patents
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- JP2015111673A5 JP2015111673A5 JP2014236390A JP2014236390A JP2015111673A5 JP 2015111673 A5 JP2015111673 A5 JP 2015111673A5 JP 2014236390 A JP2014236390 A JP 2014236390A JP 2014236390 A JP2014236390 A JP 2014236390A JP 2015111673 A5 JP2015111673 A5 JP 2015111673A5
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矩形物体区域110が正方形光入射ファセット75上に結像されることになる場合に、対物系58はアナモフィックのものでなければならない。より具体的には、倍率Mの絶対値は、走査方向Yに沿ってよりも交差走査方向Xに沿って小さく、すなわち、|MX|<|MY|である必要がある。これを図23に例示しており、この図では、単一矩形物体区域110と光学ラスター要素74の光入射ファセット75との間に対物系58の2つの円柱レンズ124、126が配置されている。交差走査方向Xに沿った物体区域110の長さがLXであり、走査方向Yに沿った長さがLYである場合に、|M X /M Y |は、LY/LXに等しくなければならない。
Applications Claiming Priority (4)
Application Number | Priority Date | Filing Date | Title |
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EP13194135 | 2013-11-22 | ||
EP13194135.3 | 2013-11-22 | ||
EP14155685.2 | 2014-02-19 | ||
EP14155685.2A EP2876498B1 (en) | 2013-11-22 | 2014-02-19 | Illumination system of a microlithographic projection exposure apparatus |
Publications (2)
Publication Number | Publication Date |
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JP2015111673A JP2015111673A (ja) | 2015-06-18 |
JP2015111673A5 true JP2015111673A5 (ja) | 2016-05-19 |
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Family Applications (4)
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JP2016533545A Active JP6343344B2 (ja) | 2013-11-22 | 2014-11-13 | マイクロリソグラフィ投影露光装置の照明系 |
JP2014236389A Active JP6034845B2 (ja) | 2013-11-22 | 2014-11-21 | マイクロリソグラフィ投影露光装置の照明系 |
JP2014236390A Pending JP2015111673A (ja) | 2013-11-22 | 2014-11-21 | マイクロリソグラフィ投影露光装置の照明系 |
JP2016210859A Active JP6434473B2 (ja) | 2013-11-22 | 2016-10-27 | マイクロリソグラフィ投影露光装置の照明系 |
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JP2016533545A Active JP6343344B2 (ja) | 2013-11-22 | 2014-11-13 | マイクロリソグラフィ投影露光装置の照明系 |
JP2014236389A Active JP6034845B2 (ja) | 2013-11-22 | 2014-11-21 | マイクロリソグラフィ投影露光装置の照明系 |
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JP2016210859A Active JP6434473B2 (ja) | 2013-11-22 | 2016-10-27 | マイクロリソグラフィ投影露光装置の照明系 |
Country Status (7)
Country | Link |
---|---|
US (3) | US9500954B2 (ja) |
EP (2) | EP2876498B1 (ja) |
JP (4) | JP6343344B2 (ja) |
KR (3) | KR101922314B1 (ja) |
CN (3) | CN105745580B (ja) |
TW (1) | TWI638238B (ja) |
WO (1) | WO2015074746A1 (ja) |
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2014
- 2014-02-19 EP EP14155685.2A patent/EP2876498B1/en active Active
- 2014-02-19 EP EP14155686.0A patent/EP2876499B1/en active Active
- 2014-11-13 CN CN201480063069.7A patent/CN105745580B/zh active Active
- 2014-11-13 WO PCT/EP2014/003049 patent/WO2015074746A1/en active Application Filing
- 2014-11-13 JP JP2016533545A patent/JP6343344B2/ja active Active
- 2014-11-13 KR KR1020167016113A patent/KR101922314B1/ko active IP Right Grant
- 2014-11-17 US US14/543,079 patent/US9500954B2/en active Active
- 2014-11-17 US US14/543,110 patent/US9310690B2/en active Active
- 2014-11-19 TW TW103140015A patent/TWI638238B/zh active
- 2014-11-20 KR KR1020140162782A patent/KR101736549B1/ko active IP Right Grant
- 2014-11-21 KR KR1020140163298A patent/KR101751581B1/ko active IP Right Grant
- 2014-11-21 JP JP2014236389A patent/JP6034845B2/ja active Active
- 2014-11-21 JP JP2014236390A patent/JP2015111673A/ja active Pending
- 2014-11-24 CN CN201410858447.2A patent/CN104656378B/zh active Active
- 2014-11-24 CN CN201410858448.7A patent/CN104656379B/zh active Active
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2016
- 2016-03-31 US US15/086,475 patent/US9910359B2/en active Active
- 2016-10-27 JP JP2016210859A patent/JP6434473B2/ja active Active
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