TWI638238B - 微影投影曝光設備的照明系統 - Google Patents
微影投影曝光設備的照明系統 Download PDFInfo
- Publication number
- TWI638238B TWI638238B TW103140015A TW103140015A TWI638238B TW I638238 B TWI638238 B TW I638238B TW 103140015 A TW103140015 A TW 103140015A TW 103140015 A TW103140015 A TW 103140015A TW I638238 B TWI638238 B TW I638238B
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- Prior art keywords
- light
- illumination system
- plane
- object region
- optical
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Links
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Classifications
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
- G02B26/08—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light
- G02B26/0816—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements
- G02B26/0833—Optical devices or arrangements for the control of light using movable or deformable optical elements for controlling the direction of light by means of one or more reflecting elements the reflecting element being a micromechanical device, e.g. a MEMS mirror, DMD
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70066—Size and form of the illuminated area in the mask plane, e.g. reticle masking blades or blinds
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70075—Homogenization of illumination intensity in the mask plane by using an integrator, e.g. fly's eye lens, facet mirror or glass rod, by using a diffusing optical element or by beam deflection
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70091—Illumination settings, i.e. intensity distribution in the pupil plane or angular distribution in the field plane; On-axis or off-axis settings, e.g. annular, dipole or quadrupole settings; Partial coherence control, i.e. sigma or numerical aperture [NA]
- G03F7/70116—Off-axis setting using a programmable means, e.g. liquid crystal display [LCD], digital micromirror device [DMD] or pupil facets
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70383—Direct write, i.e. pattern is written directly without the use of a mask by one or multiple beams
- G03F7/70391—Addressable array sources specially adapted to produce patterns, e.g. addressable LED arrays
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70425—Imaging strategies, e.g. for increasing throughput or resolution, printing product fields larger than the image field or compensating lithography- or non-lithography errors, e.g. proximity correction, mix-and-match, stitching or double patterning
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/02—Manufacture or treatment of semiconductor devices or of parts thereof
- H01L21/027—Making masks on semiconductor bodies for further photolithographic processing not provided for in group H01L21/18 or H01L21/34
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Computer Hardware Design (AREA)
- Manufacturing & Machinery (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Microscoopes, Condenser (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Mechanical Light Control Or Optical Switches (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| ??13194135.3 | 2013-11-22 | ||
| EP13194135 | 2013-11-22 |
Publications (2)
| Publication Number | Publication Date |
|---|---|
| TW201523167A TW201523167A (zh) | 2015-06-16 |
| TWI638238B true TWI638238B (zh) | 2018-10-11 |
Family
ID=49626852
Family Applications (1)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| TW103140015A TWI638238B (zh) | 2013-11-22 | 2014-11-19 | 微影投影曝光設備的照明系統 |
Country Status (7)
| Country | Link |
|---|---|
| US (3) | US9310690B2 (enExample) |
| EP (2) | EP2876498B1 (enExample) |
| JP (4) | JP6343344B2 (enExample) |
| KR (3) | KR101922314B1 (enExample) |
| CN (3) | CN105745580B (enExample) |
| TW (1) | TWI638238B (enExample) |
| WO (1) | WO2015074746A1 (enExample) |
Cited By (1)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI721601B (zh) * | 2018-10-18 | 2021-03-11 | 荷蘭商Ａｓｍｌ荷蘭公司 | 用於結構及相關設備之檢測方法和設備 |
Families Citing this family (40)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| DE102014203040A1 (de) | 2014-02-19 | 2015-08-20 | Carl Zeiss Smt Gmbh | Beleuchtungssystem einer mikrolithographischen Projektionsbelichtungsanlage und Verfahren zum Betreiben eines solchen |
| DE102014203041A1 (de) | 2014-02-19 | 2015-08-20 | Carl Zeiss Smt Gmbh | Beleuchtungssystem einer mikrolithographischen Projektionsbelichtungsanlage und Verfahren zum Betreiben eines solchen |
| WO2016184560A1 (en) * | 2015-05-21 | 2016-11-24 | Carl Zeiss Smt Gmbh | Method of operating a microlithographic projection apparatus |
| CN105068381A (zh) * | 2015-07-27 | 2015-11-18 | 江苏影速光电技术有限公司 | 一种曝光机光阑承载结构及曝光机光阑更换方法 |
| TWI575300B (zh) * | 2015-08-31 | 2017-03-21 | 中強光電股份有限公司 | 投影裝置以及照明系統 |
| WO2017050360A1 (en) * | 2015-09-23 | 2017-03-30 | Carl Zeiss Smt Gmbh | Method of operating a microlithographic projection apparatus and illuminations system of such an apparatus |
| DE102015221991A1 (de) * | 2015-11-09 | 2017-05-11 | Carl Zeiss Microscopy Gmbh | Mikroskopierverfahren zur Ermittlung eines Kontrastbildes und Mikroskop |
| DE102015224521B4 (de) | 2015-12-08 | 2018-06-21 | Carl Zeiss Smt Gmbh | Mikrolithographische Projektionsanlage und Verfahren zum Betreiben einer solchen Anlage |
| DE102015224522B4 (de) | 2015-12-08 | 2018-06-21 | Carl Zeiss Smt Gmbh | Beleuchtungssystem einer mikrolithographischen Projektionsanlage und Verfahren zum Betreiben eines solchen Systems |
| WO2017108448A1 (en) * | 2015-12-22 | 2017-06-29 | Carl Zeiss Smt Gmbh | Illumination system of a microlithographic apparatus |
| CN106933049B (zh) * | 2015-12-30 | 2020-06-16 | 上海微电子装备（集团）股份有限公司 | 一种用于半导体光刻的曝光系统与曝光方法 |
| US10061201B2 (en) | 2016-10-24 | 2018-08-28 | Hrl Laboratories, Llc | Bottom up apparatus design for formation of self-propagating photopolymer waveguides |
| EP3551745A4 (en) | 2016-12-12 | 2020-07-15 | Xcella Biosciences, Inc. | SCREENING METHODS AND SYSTEMS USING MICROCAPILLARY NETWORKS |
| JP6951446B2 (ja) * | 2016-12-20 | 2021-10-20 | エーファウ・グループ・エー・タルナー・ゲーエムベーハー | 感光性の層を露光するための装置および方法 |
| WO2018113918A1 (de) * | 2016-12-20 | 2018-06-28 | Ev Group E. Thallner Gmbh | Vorrichtung und verfahren zur belichtung einer lichtempfindlichen schicht |
| US11156626B2 (en) | 2016-12-30 | 2021-10-26 | xCella Biosciences, Inc. | Multi-stage sample recovery system |
| CN109654392B (zh) * | 2017-01-11 | 2020-09-04 | 哈尔滨理工大学 | 第一遮挡板和具有第一遮挡板的鼻孔照明装置 |
| US11099007B2 (en) * | 2017-02-16 | 2021-08-24 | Nikon Corporation | Test of operational status of a digital scanner during lithographic exposure process |
| CN107421439B (zh) * | 2017-04-21 | 2019-05-14 | 上海交通大学 | 一种无成像目标显著性检测与坐标跟踪系统及方法 |
| US11175487B2 (en) | 2017-06-19 | 2021-11-16 | Suss Microtec Photonic Systems Inc. | Optical distortion reduction in projection systems |
| EP3642674B1 (en) | 2017-06-19 | 2023-03-15 | SUSS MicroTec Solutions GmbH & Co. KG | Magnification compensation and/or beam steering in optical systems |
| WO2019064503A1 (ja) * | 2017-09-29 | 2019-04-04 | 株式会社ニコン | 電子ビーム装置、照明光学系、及びデバイス製造方法 |
| WO2019064502A1 (ja) * | 2017-09-29 | 2019-04-04 | 株式会社ニコン | 電子ビーム装置及びデバイス製造方法 |
| JP7020859B2 (ja) | 2017-10-24 | 2022-02-16 | キヤノン株式会社 | 照明光学系、露光装置および物品の製造方法 |
| EP3744468B1 (en) * | 2018-03-23 | 2024-03-06 | Primetals Technologies Japan, Ltd. | Laser processing device, and method for adjusting a laser processing head |
| KR102604859B1 (ko) * | 2018-06-19 | 2023-11-21 | 에베 그룹 에. 탈너 게엠베하 | 이미지 포인트 노출 방법 및 장치 |
| US10503076B1 (en) * | 2018-08-29 | 2019-12-10 | Applied Materials, Inc. | Reserving spatial light modulator sections to address field non-uniformities |
| CN109116554B (zh) * | 2018-10-11 | 2020-12-04 | 北京环境特性研究所 | 光学积分器的设计方法 |
| US12318775B2 (en) | 2018-12-06 | 2025-06-03 | xCella Biosciences, Inc. | Lateral loading of microcapillary arrays |
| EP3939246B1 (en) * | 2019-03-12 | 2025-02-12 | Lumus Ltd. | Image projector |
| CN111856745B (zh) * | 2019-04-30 | 2023-03-17 | 上海微电子装备（集团）股份有限公司 | 一种光照射装置 |
| EP3736550A1 (en) * | 2019-05-10 | 2020-11-11 | X-Rite Switzerland GmbH | Illumination device for a spectrophotometer having integrated mixing optics, and method for illuminating a sample |
| US20240027917A1 (en) * | 2020-08-18 | 2024-01-25 | Nikon Corporation | Exposure apparatus, measuring device, measuring method, and device manufacturing method |
| US11366307B2 (en) * | 2020-08-27 | 2022-06-21 | Kla Corporation | Programmable and reconfigurable mask with MEMS micro-mirror array for defect detection |
| CN113189848B (zh) * | 2021-04-21 | 2024-02-13 | 之江实验室 | 一种基于光纤阵列的多通道并行式超分辨直写式光刻系统 |
| CN115390362A (zh) * | 2021-05-25 | 2022-11-25 | 赫智科技(苏州)有限公司 | 一种4k光刻的方法 |
| US20230123834A1 (en) * | 2021-10-19 | 2023-04-20 | Meta Platforms Technologies, Llc | Euv lithography using polymer crystal based reticle |
| CN115128809B (zh) * | 2022-05-17 | 2023-11-28 | 南京工业职业技术大学 | 一种实现全息波导显示系统均匀成像的光栅效率分布表征与优化方法 |
| DE102022116214B4 (de) * | 2022-06-29 | 2024-06-13 | Carl Zeiss Industrielle Messtechnik Gmbh | Messkamera und Verfahren zur zweidimensionalen Vermessung von Gegenständen |
| DE102024205430A1 (de) * | 2024-06-13 | 2025-12-18 | Carl Zeiss Smt Gmbh | Optomechanisches System für die Projektionslithographie |
Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2002075440A1 (en) * | 2001-03-21 | 2002-09-26 | Screen Technology Limited | Photoluminescent liquid crystal display |
| US20090122290A1 (en) * | 2007-11-09 | 2009-05-14 | Asml Netherlands B.V. | Device manufacturing method and lithographic apparatus,and computer program product |
| US20130148092A1 (en) * | 2006-02-17 | 2013-06-13 | Carl Zeiss Smt Gmbh | Illumination system for a microlithographic projection exposure apparatus |
| US20130293861A1 (en) * | 2011-01-29 | 2013-11-07 | Carl Zeiss Smt Gmbh | Illumination system of a microlithographic projection exposure apparatus |
Family Cites Families (44)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| US5517279A (en) | 1993-08-30 | 1996-05-14 | Hugle; William B. | Lens array photolithography |
| JP2674578B2 (ja) * | 1995-08-29 | 1997-11-12 | 株式会社ニコン | 走査露光装置及び露光方法 |
| JP2674579B2 (ja) * | 1995-08-29 | 1997-11-12 | 株式会社ニコン | 走査露光装置および走査露光方法 |
| US6404499B1 (en) | 1998-04-21 | 2002-06-11 | Asml Netherlands B.V. | Lithography apparatus with filters for optimizing uniformity of an image |
| EP1107064A3 (en) | 1999-12-06 | 2004-12-29 | Olympus Optical Co., Ltd. | Exposure apparatus |
| GB9930529D0 (en) * | 1999-12-23 | 2000-02-16 | Screen Tech Ltd | Optical arrangement for flat-panel displays |
| JP4838430B2 (ja) * | 2001-01-26 | 2011-12-14 | キヤノン株式会社 | 露光装置及びデバイス製造方法 |
| KR100576746B1 (ko) | 2001-06-01 | 2006-05-03 | 에이에스엠엘 네델란즈 비.브이. | 리소그래피장치, 디바이스제조방법, 그 디바이스,제어시스템, 컴퓨터프로그램, 및 컴퓨터프로그램물 |
| KR100480620B1 (ko) | 2002-09-19 | 2005-03-31 | 삼성전자주식회사 | 마이크로 미러 어레이를 구비한 노광 장치 및 이를 이용한노광 방법 |
| DE10343333A1 (de) * | 2003-09-12 | 2005-04-14 | Carl Zeiss Smt Ag | Beleuchtungssystem für eine Mikrolithographie-Projektionsbelichtungsanlage |
| KR101159867B1 (ko) * | 2003-09-12 | 2012-06-26 | 칼 짜이스 에스엠티 게엠베하 | 마이크로리소그래피 투사 노출 장치용 조명 시스템 |
| WO2005040927A2 (en) | 2003-10-18 | 2005-05-06 | Carl Zeiss Smt Ag | Device and method for illumination dose adjustments in microlithography |
| US20060087634A1 (en) | 2004-10-25 | 2006-04-27 | Brown Jay M | Dynamic illumination uniformity and shape control for lithography |
| CN100521089C (zh) * | 2004-12-27 | 2009-07-29 | 株式会社尼康 | 光学积分器、照明光学装置、曝光装置、方法及元件制法 |
| JP2007279113A (ja) * | 2006-04-03 | 2007-10-25 | Nikon Corp | 走査型露光装置及びデバイスの製造方法 |
| US7932993B2 (en) | 2006-09-16 | 2011-04-26 | Wenhui Mei | Divided sub-image array scanning and exposing system |
| US8334935B2 (en) | 2006-12-19 | 2012-12-18 | Thomson Licensing | High resolution DMD projection system |
| WO2009026947A1 (en) | 2007-08-30 | 2009-03-05 | Carl Zeiss Smt Ag | Illumination system for illuminating a mask in a microlithographic projection exposure apparatus |
| US8451427B2 (en) * | 2007-09-14 | 2013-05-28 | Nikon Corporation | Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method |
| US20090091730A1 (en) * | 2007-10-03 | 2009-04-09 | Nikon Corporation | Spatial light modulation unit, illumination apparatus, exposure apparatus, and device manufacturing method |
| KR101562073B1 (ko) * | 2007-10-16 | 2015-10-21 | 가부시키가이샤 니콘 | 조명 광학 시스템, 노광 장치 및 디바이스 제조 방법 |
| EP2179329A1 (en) * | 2007-10-16 | 2010-04-28 | Nikon Corporation | Illumination optical system, exposure apparatus, and device manufacturing method |
| US8379187B2 (en) * | 2007-10-24 | 2013-02-19 | Nikon Corporation | Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method |
| US9116346B2 (en) | 2007-11-06 | 2015-08-25 | Nikon Corporation | Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method |
| JP5418230B2 (ja) * | 2007-11-06 | 2014-02-19 | 株式会社ニコン | 露光方法、及び露光装置 |
| WO2009060744A1 (ja) | 2007-11-06 | 2009-05-14 | Nikon Corporation | 照明光学装置及び露光装置 |
| JP5326259B2 (ja) * | 2007-11-08 | 2013-10-30 | 株式会社ニコン | 照明光学装置、露光装置、およびデバイス製造方法 |
| EP2243047B1 (en) * | 2008-02-15 | 2021-03-31 | Carl Zeiss SMT GmbH | Facet mirror for use in a projection exposure apparatus for microlithography |
| DE102008001511A1 (de) | 2008-04-30 | 2009-11-05 | Carl Zeiss Smt Ag | Beleuchtungsoptik für die EUV-Mikrolithografie sowie Beleuchtungssystem und Projektionsbelichtungsanlage mit einer derartigen Beleuchtungsoptik |
| JP5048869B2 (ja) * | 2008-05-20 | 2012-10-17 | ホ チョン，ジン | マスクレス露光装置用光学部品 |
| DE102008002749A1 (de) | 2008-06-27 | 2009-12-31 | Carl Zeiss Smt Ag | Beleuchtungsoptik für die Mikrolithografie |
| EP2146248B1 (en) | 2008-07-16 | 2012-08-29 | Carl Zeiss SMT GmbH | Illumination system of a microlithographic projection exposure apparatus |
| JPWO2010024106A1 (ja) * | 2008-08-28 | 2012-01-26 | 株式会社ニコン | 照明光学系、露光装置、およびデバイス製造方法 |
| JP5403244B2 (ja) * | 2009-07-16 | 2014-01-29 | 株式会社ニコン | 空間光変調ユニット、照明光学系、露光装置、およびデバイス製造方法 |
| KR101624009B1 (ko) * | 2009-07-31 | 2016-05-24 | 칼 짜이스 에스엠티 게엠베하 | 광학 빔 편향 소자 및 조정 방법 |
| JP2011108851A (ja) * | 2009-11-17 | 2011-06-02 | Canon Inc | 露光装置及びデバイスの製造方法 |
| NL2005331A (en) | 2009-11-18 | 2011-05-19 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method. |
| DE102009054540B4 (de) | 2009-12-11 | 2011-11-10 | Carl Zeiss Smt Gmbh | Beleuchtungsoptik für die EUV-Mikrolithographie |
| JP2012004561A (ja) | 2010-06-16 | 2012-01-05 | Nikon Corp | 照明方法、照明光学装置、及び露光装置 |
| CN103097955B (zh) * | 2010-08-30 | 2015-08-19 | 卡尔蔡司Smt有限责任公司 | 微光刻投射曝光装置的照明系统 |
| JP2012069656A (ja) | 2010-09-22 | 2012-04-05 | Nikon Corp | 空間光変調器、照明装置及び露光装置、並びにデバイス製造方法 |
| JP2012099686A (ja) | 2010-11-04 | 2012-05-24 | Nikon Corp | 光源形成方法、露光方法、及びデバイス製造方法 |
| US8823921B2 (en) | 2011-08-19 | 2014-09-02 | Ultratech, Inc. | Programmable illuminator for a photolithography system |
| US8390917B1 (en) | 2011-08-24 | 2013-03-05 | Palo Alto Research Center Incorporated | Multiple line single-pass imaging using spatial light modulator and anamorphic projection optics |
-
2014
- 2014-02-19 EP EP14155685.2A patent/EP2876498B1/en active Active
- 2014-02-19 EP EP14155686.0A patent/EP2876499B1/en active Active
- 2014-11-13 JP JP2016533545A patent/JP6343344B2/ja active Active
- 2014-11-13 KR KR1020167016113A patent/KR101922314B1/ko active Active
- 2014-11-13 WO PCT/EP2014/003049 patent/WO2015074746A1/en not_active Ceased
- 2014-11-13 CN CN201480063069.7A patent/CN105745580B/zh active Active
- 2014-11-17 US US14/543,110 patent/US9310690B2/en active Active
- 2014-11-17 US US14/543,079 patent/US9500954B2/en active Active
- 2014-11-19 TW TW103140015A patent/TWI638238B/zh active
- 2014-11-20 KR KR1020140162782A patent/KR101736549B1/ko active Active
- 2014-11-21 JP JP2014236389A patent/JP6034845B2/ja active Active
- 2014-11-21 JP JP2014236390A patent/JP2015111673A/ja active Pending
- 2014-11-21 KR KR1020140163298A patent/KR101751581B1/ko active Active
- 2014-11-24 CN CN201410858448.7A patent/CN104656379B/zh active Active
- 2014-11-24 CN CN201410858447.2A patent/CN104656378B/zh active Active
-
2016
- 2016-03-31 US US15/086,475 patent/US9910359B2/en active Active
- 2016-10-27 JP JP2016210859A patent/JP6434473B2/ja active Active
Patent Citations (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| WO2002075440A1 (en) * | 2001-03-21 | 2002-09-26 | Screen Technology Limited | Photoluminescent liquid crystal display |
| US20130148092A1 (en) * | 2006-02-17 | 2013-06-13 | Carl Zeiss Smt Gmbh | Illumination system for a microlithographic projection exposure apparatus |
| US20090122290A1 (en) * | 2007-11-09 | 2009-05-14 | Asml Netherlands B.V. | Device manufacturing method and lithographic apparatus,and computer program product |
| US20130293861A1 (en) * | 2011-01-29 | 2013-11-07 | Carl Zeiss Smt Gmbh | Illumination system of a microlithographic projection exposure apparatus |
Cited By (4)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| TWI721601B (zh) * | 2018-10-18 | 2021-03-11 | 荷蘭商Ａｓｍｌ荷蘭公司 | 用於結構及相關設備之檢測方法和設備 |
| CN112867970A (zh) * | 2018-10-18 | 2021-05-28 | Asml荷兰有限公司 | 用于结构和相关联设备的检查方法和设备 |
| US11175592B2 (en) | 2018-10-18 | 2021-11-16 | Asml Netherlands B.V. | Methods and apparatus for inspection of a structure and associated apparatuses |
| TWI774219B (zh) * | 2018-10-18 | 2022-08-11 | 荷蘭商Ａｓｍｌ荷蘭公司 | 用於結構及相關設備之檢測方法和設備 |
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| JP2015111672A (ja) | 2015-06-18 |
| US20150146184A1 (en) | 2015-05-28 |
| TW201523167A (zh) | 2015-06-16 |
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| CN104656378B (zh) | 2018-06-05 |
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| CN104656378A (zh) | 2015-05-27 |
| EP2876498A1 (en) | 2015-05-27 |
| JP2016541021A (ja) | 2016-12-28 |
| US9910359B2 (en) | 2018-03-06 |
| KR20160088365A (ko) | 2016-07-25 |
| WO2015074746A1 (en) | 2015-05-28 |
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