PT3642674T - Compensação de ampliação e/ou direcionamento de feixe em sistemas óticos - Google Patents
Compensação de ampliação e/ou direcionamento de feixe em sistemas óticosInfo
- Publication number
- PT3642674T PT3642674T PT187381702T PT18738170T PT3642674T PT 3642674 T PT3642674 T PT 3642674T PT 187381702 T PT187381702 T PT 187381702T PT 18738170 T PT18738170 T PT 18738170T PT 3642674 T PT3642674 T PT 3642674T
- Authority
- PT
- Portugal
- Prior art keywords
- optical systems
- beam steering
- magnification compensation
- magnification
- compensation
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0896—Catadioptric systems with variable magnification or multiple imaging planes, including multispectral systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B15/00—Optical objectives with means for varying the magnification
- G02B15/14—Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective
- G02B15/16—Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective with interdependent non-linearly related movements between one lens or lens group, and another lens or lens group
- G02B15/177—Optical objectives with means for varying the magnification by axial movement of one or more lenses or groups of lenses relative to the image plane for continuously varying the equivalent focal length of the objective with interdependent non-linearly related movements between one lens or lens group, and another lens or lens group having a negative front lens or group of lenses
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/008—Systems specially adapted to form image relays or chained systems
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B17/00—Systems with reflecting surfaces, with or without refracting elements
- G02B17/08—Catadioptric systems
- G02B17/0892—Catadioptric systems specially adapted for the UV
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
- G02B7/04—Mountings, adjusting means, or light-tight connections, for optical elements for lenses with mechanism for focusing or varying magnification
- G02B7/09—Mountings, adjusting means, or light-tight connections, for optical elements for lenses with mechanism for focusing or varying magnification adapted for automatic focusing or varying magnification
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B7/00—Mountings, adjusting means, or light-tight connections, for optical elements
- G02B7/02—Mountings, adjusting means, or light-tight connections, for optical elements for lenses
- G02B7/04—Mountings, adjusting means, or light-tight connections, for optical elements for lenses with mechanism for focusing or varying magnification
- G02B7/10—Mountings, adjusting means, or light-tight connections, for optical elements for lenses with mechanism for focusing or varying magnification by relative axial movement of several lenses, e.g. of varifocal objective lens
- G02B7/102—Mountings, adjusting means, or light-tight connections, for optical elements for lenses with mechanism for focusing or varying magnification by relative axial movement of several lenses, e.g. of varifocal objective lens controlled by a microcomputer
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B13/00—Viewfinders; Focusing aids for cameras; Means for focusing for cameras; Autofocus systems for cameras
- G03B13/18—Focusing aids
- G03B13/24—Focusing screens
- G03B13/26—Focusing screens with magnifiers for inspecting image formed on screen
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70058—Mask illumination systems
- G03F7/70191—Optical correction elements, filters or phase plates for controlling intensity, wavelength, polarisation, phase or the like
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70258—Projection system adjustments, e.g. adjustments during exposure or alignment during assembly of projection system
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/68—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for positioning, orientation or alignment
- H01L21/682—Mask-wafer alignment
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
- G02B13/26—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances for reproducing with unit magnification
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Engineering & Computer Science (AREA)
- Spectroscopy & Molecular Physics (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Nonlinear Science (AREA)
- Lenses (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US201762522062P | 2017-06-19 | 2017-06-19 |
Publications (1)
Publication Number | Publication Date |
---|---|
PT3642674T true PT3642674T (pt) | 2023-05-02 |
Family
ID=62842324
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PT187381702T PT3642674T (pt) | 2017-06-19 | 2018-06-18 | Compensação de ampliação e/ou direcionamento de feixe em sistemas óticos |
Country Status (8)
Country | Link |
---|---|
US (2) | US10539770B2 (pt) |
EP (1) | EP3642674B1 (pt) |
JP (1) | JP6803483B2 (pt) |
KR (1) | KR102290482B1 (pt) |
CN (1) | CN110998453A (pt) |
PT (1) | PT3642674T (pt) |
TW (1) | TWI706158B (pt) |
WO (1) | WO2018236770A1 (pt) |
Families Citing this family (10)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US11175487B2 (en) | 2017-06-19 | 2021-11-16 | Suss Microtec Photonic Systems Inc. | Optical distortion reduction in projection systems |
US11835838B2 (en) | 2017-10-27 | 2023-12-05 | Exciting Technology LLC | System, method and apparatus for non-mechanical optical and photonic beam steering |
US11835841B2 (en) | 2017-10-27 | 2023-12-05 | Exciting Technology LLC | System, method and apparatus for non-mechanical optical and photonic beam steering |
US10845671B2 (en) | 2017-10-27 | 2020-11-24 | Exciting Technology, Llc | System, method and apparatus for non-mechanical optical and photonic beam steering |
US11561451B2 (en) | 2018-10-23 | 2023-01-24 | Exciting Technology LLC | System, method and apparatus for non-mechanical optical and photonic beam steering |
CN110646091B (zh) * | 2019-10-08 | 2021-08-20 | 中国科学院光电研究院 | 一种采用自由曲面的大视场Dyson光谱成像系统 |
EP4127813A4 (en) * | 2020-04-17 | 2024-04-03 | Exciting Tech Llc | DECENTRATED LENS BEAM CONTROL |
US11822205B2 (en) | 2020-04-17 | 2023-11-21 | Exciting Technology LLC | System, method, and apparatus for high precision light beam steering using rotating lens elements |
CN111399202B (zh) * | 2020-05-12 | 2020-12-15 | 西安交通大学 | 无零级衍射光的空间光调制器耦合装置 |
US20220014682A1 (en) * | 2020-07-08 | 2022-01-13 | Cognex Corporation | System and method for extending depth of field for 2d vision system cameras in the presence of moving objects |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3451721B2 (ja) * | 1994-06-06 | 2003-09-29 | 株式会社ニコン | 投影光学装置及びそれを備えた露光装置並びにその調整方法 |
US5729331A (en) | 1993-06-30 | 1998-03-17 | Nikon Corporation | Exposure apparatus, optical projection apparatus and a method for adjusting the optical projection apparatus |
JPH088169A (ja) * | 1994-06-23 | 1996-01-12 | Nikon Corp | 露光装置 |
JP3610597B2 (ja) * | 1994-07-29 | 2005-01-12 | 株式会社ニコン | 露光装置及び方法 |
US5559629A (en) | 1994-08-19 | 1996-09-24 | Tamarack Scientific Co., Inc. | Unit magnification projection system and method |
US5557469A (en) | 1994-10-28 | 1996-09-17 | Ultratech Stepper, Inc. | Beamsplitter in single fold optical system and optical variable magnification method and system |
US5757469A (en) * | 1995-03-22 | 1998-05-26 | Etec Systems, Inc. | Scanning lithography system haing double pass Wynne-Dyson optics |
US7301605B2 (en) * | 2000-03-03 | 2007-11-27 | Nikon Corporation | Projection exposure apparatus and method, catadioptric optical system and manufacturing method of devices |
US7116404B2 (en) * | 2004-06-30 | 2006-10-03 | Asml Netherlands B.V | Lithographic apparatus and device manufacturing method |
US7924406B2 (en) | 2005-07-13 | 2011-04-12 | Asml Netherlands B.V. | Stage apparatus, lithographic apparatus and device manufacturing method having switch device for two illumination channels |
US8654307B2 (en) * | 2006-03-20 | 2014-02-18 | Nikon Corporation | Scanning type exposure apparatus, method of manufacturing micro-apparatus, mask, projection optical apparatus, and method of manufacturing mask |
EP2126636B1 (en) | 2007-01-30 | 2012-06-13 | Carl Zeiss SMT GmbH | Illumination system of a microlithographic projection exposure apparatus |
WO2009008999A1 (en) | 2007-07-06 | 2009-01-15 | Enodis Corporation | System and method for distributing air within a display case |
DE102008004762A1 (de) * | 2008-01-16 | 2009-07-30 | Carl Zeiss Smt Ag | Projektionsbelichtungsanlage für die Mikrolithographie mit einer Messeinrichtung |
EP2649493A1 (en) * | 2010-08-30 | 2013-10-16 | Carl Zeiss SMT GmbH | Illumination system of a microlithographic projection exposure apparatus |
US8830590B2 (en) * | 2012-05-30 | 2014-09-09 | Ultratech, Inc. | Unit magnification large-format catadioptric lens for microlithography |
US9488811B2 (en) * | 2013-08-20 | 2016-11-08 | Ultratech, Inc. | Wynne-Dyson optical system with variable magnification |
EP2876498B1 (en) * | 2013-11-22 | 2017-05-24 | Carl Zeiss SMT GmbH | Illumination system of a microlithographic projection exposure apparatus |
WO2016045945A1 (en) * | 2014-09-26 | 2016-03-31 | Asml Netherlands B.V. | Inspection apparatus and device manufacturing method |
CN105549327B (zh) | 2014-10-29 | 2018-03-02 | 上海微电子装备(集团)股份有限公司 | 曝光装置的调整装置及调整方法 |
US20170256465A1 (en) * | 2016-03-01 | 2017-09-07 | Asml Netherlands B.V. | Method and apparatus to determine a patterning process parameter |
-
2018
- 2018-06-18 WO PCT/US2018/038119 patent/WO2018236770A1/en unknown
- 2018-06-18 US US16/011,564 patent/US10539770B2/en active Active
- 2018-06-18 KR KR1020207001353A patent/KR102290482B1/ko active IP Right Grant
- 2018-06-18 EP EP18738170.2A patent/EP3642674B1/en active Active
- 2018-06-18 PT PT187381702T patent/PT3642674T/pt unknown
- 2018-06-18 JP JP2019572844A patent/JP6803483B2/ja active Active
- 2018-06-18 CN CN201880052979.3A patent/CN110998453A/zh active Pending
- 2018-06-19 TW TW107120991A patent/TWI706158B/zh active
-
2020
- 2020-01-16 US US16/745,273 patent/US11209635B2/en active Active
Also Published As
Publication number | Publication date |
---|---|
JP2020524309A (ja) | 2020-08-13 |
KR20200020812A (ko) | 2020-02-26 |
US11209635B2 (en) | 2021-12-28 |
TW201905535A (zh) | 2019-02-01 |
KR102290482B1 (ko) | 2021-08-13 |
US10539770B2 (en) | 2020-01-21 |
EP3642674B1 (en) | 2023-03-15 |
JP6803483B2 (ja) | 2020-12-23 |
US20180364463A1 (en) | 2018-12-20 |
US20200150409A1 (en) | 2020-05-14 |
CN110998453A (zh) | 2020-04-10 |
EP3642674A1 (en) | 2020-04-29 |
WO2018236770A1 (en) | 2018-12-27 |
TWI706158B (zh) | 2020-10-01 |
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