KR101213831B1 - 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈 - Google Patents

중간이미지를 갖는 카타디옵트릭 투사 대물렌즈 Download PDF

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Publication number
KR101213831B1
KR101213831B1 KR1020067026564A KR20067026564A KR101213831B1 KR 101213831 B1 KR101213831 B1 KR 101213831B1 KR 1020067026564 A KR1020067026564 A KR 1020067026564A KR 20067026564 A KR20067026564 A KR 20067026564A KR 101213831 B1 KR101213831 B1 KR 101213831B1
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KR
South Korea
Prior art keywords
objective lens
mirror
image
projection objective
lens
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Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
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KR1020067026564A
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English (en)
Korean (ko)
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KR20070017414A (ko
Inventor
아우렐리안 도독
빌헬름 울리히
알렉산더 에플레
Original Assignee
칼 짜이스 에스엠티 게엠베하
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Publication of KR20070017414A publication Critical patent/KR20070017414A/ko
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Publication of KR101213831B1 publication Critical patent/KR101213831B1/ko
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020067026564A 2004-05-17 2005-05-13 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈 Expired - Fee Related KR101213831B1 (ko)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US57153304P 2004-05-17 2004-05-17
US60/571,533 2004-05-17
PCT/EP2005/005250 WO2005111689A2 (en) 2004-05-17 2005-05-13 Catadioptric projection objective with intermediate images

Related Child Applications (1)

Application Number Title Priority Date Filing Date
KR1020127017806A Division KR101376931B1 (ko) 2004-05-17 2005-05-13 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈

Publications (2)

Publication Number Publication Date
KR20070017414A KR20070017414A (ko) 2007-02-09
KR101213831B1 true KR101213831B1 (ko) 2012-12-24

Family

ID=34966631

Family Applications (10)

Application Number Title Priority Date Filing Date
KR1020067026564A Expired - Fee Related KR101213831B1 (ko) 2004-05-17 2005-05-13 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
KR1020147005016A Ceased KR20140043485A (ko) 2004-05-17 2005-05-13 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
KR1020147030687A Ceased KR20140138350A (ko) 2004-05-17 2005-05-13 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
KR1020187018897A Ceased KR20180078354A (ko) 2004-05-17 2005-05-13 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
KR1020167018315A Ceased KR20160085375A (ko) 2004-05-17 2005-05-13 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
KR1020177005924A Ceased KR20170028451A (ko) 2004-05-17 2005-05-13 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
KR1020177032380A Ceased KR20170129271A (ko) 2004-05-17 2005-05-13 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
KR1020127017806A Expired - Fee Related KR101376931B1 (ko) 2004-05-17 2005-05-13 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
KR1020157020996A Expired - Fee Related KR101639964B1 (ko) 2004-05-17 2005-05-13 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈를 포함하는 투사 노광 시스템
KR1020137007683A Expired - Fee Related KR101391470B1 (ko) 2004-05-17 2005-05-13 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈

Family Applications After (9)

Application Number Title Priority Date Filing Date
KR1020147005016A Ceased KR20140043485A (ko) 2004-05-17 2005-05-13 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
KR1020147030687A Ceased KR20140138350A (ko) 2004-05-17 2005-05-13 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
KR1020187018897A Ceased KR20180078354A (ko) 2004-05-17 2005-05-13 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
KR1020167018315A Ceased KR20160085375A (ko) 2004-05-17 2005-05-13 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
KR1020177005924A Ceased KR20170028451A (ko) 2004-05-17 2005-05-13 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
KR1020177032380A Ceased KR20170129271A (ko) 2004-05-17 2005-05-13 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
KR1020127017806A Expired - Fee Related KR101376931B1 (ko) 2004-05-17 2005-05-13 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
KR1020157020996A Expired - Fee Related KR101639964B1 (ko) 2004-05-17 2005-05-13 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈를 포함하는 투사 노광 시스템
KR1020137007683A Expired - Fee Related KR101391470B1 (ko) 2004-05-17 2005-05-13 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈

Country Status (7)

Country Link
US (7) US8107162B2 (enExample)
EP (1) EP1751601B1 (enExample)
JP (7) JP5769356B2 (enExample)
KR (10) KR101213831B1 (enExample)
CN (1) CN100483174C (enExample)
DE (1) DE602005003665T2 (enExample)
WO (1) WO2005111689A2 (enExample)

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US20140118713A1 (en) 2014-05-01
DE602005003665D1 (de) 2008-01-17
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US20140111786A1 (en) 2014-04-24
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US9019596B2 (en) 2015-04-28
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