DE602005026375D1 - Projektionsobjektiv und projektionsbelichtungsvorrichtung - Google Patents

Projektionsobjektiv und projektionsbelichtungsvorrichtung

Info

Publication number
DE602005026375D1
DE602005026375D1 DE602005026375T DE602005026375T DE602005026375D1 DE 602005026375 D1 DE602005026375 D1 DE 602005026375D1 DE 602005026375 T DE602005026375 T DE 602005026375T DE 602005026375 T DE602005026375 T DE 602005026375T DE 602005026375 D1 DE602005026375 D1 DE 602005026375D1
Authority
DE
Germany
Prior art keywords
projection
exposure device
objective
projection exposure
projection objective
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Active
Application number
DE602005026375T
Other languages
English (en)
Inventor
Aurelian Dodoc
Wilhelm Ulrich
Dieter Bader
Alexander Epple
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Carl Zeiss SMT GmbH
Original Assignee
Carl Zeiss SMT GmbH
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Carl Zeiss SMT GmbH filed Critical Carl Zeiss SMT GmbH
Publication of DE602005026375D1 publication Critical patent/DE602005026375D1/de
Active legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
    • G03F7/70291—Addressable masks, e.g. spatial light modulators [SLMs], digital micro-mirror devices [DMDs] or liquid crystal display [LCD] patterning devices
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F1/00—Originals for photomechanical production of textured or patterned surfaces, e.g., masks, photo-masks, reticles; Mask blanks or pellicles therefor; Containers specially adapted therefor; Preparation thereof
    • G03F1/52—Reflectors
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70283—Mask effects on the imaging process
DE602005026375T 2004-03-30 2005-03-18 Projektionsobjektiv und projektionsbelichtungsvorrichtung Active DE602005026375D1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US55738404P 2004-03-30 2004-03-30
PCT/EP2005/002898 WO2005096098A2 (en) 2004-03-30 2005-03-18 Projection objective, projection exposure apparatus and reflective reticle for microlithography

Publications (1)

Publication Number Publication Date
DE602005026375D1 true DE602005026375D1 (de) 2011-03-31

Family

ID=34961349

Family Applications (1)

Application Number Title Priority Date Filing Date
DE602005026375T Active DE602005026375D1 (de) 2004-03-30 2005-03-18 Projektionsobjektiv und projektionsbelichtungsvorrichtung

Country Status (6)

Country Link
US (1) US8064040B2 (de)
EP (1) EP1730596B1 (de)
JP (1) JP5106099B2 (de)
KR (1) KR101101493B1 (de)
DE (1) DE602005026375D1 (de)
WO (1) WO2005096098A2 (de)

Families Citing this family (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
KR20180078354A (ko) 2004-05-17 2018-07-09 칼 짜이스 에스엠티 게엠베하 중간이미지를 갖는 카타디옵트릭 투사 대물렌즈
US7283209B2 (en) 2004-07-09 2007-10-16 Carl Zeiss Smt Ag Illumination system for microlithography
US7511890B2 (en) 2005-02-04 2009-03-31 Carl Zeiss Smt Ag Refractive optical imaging system, in particular projection objective for microlithography
JP4425239B2 (ja) * 2005-05-16 2010-03-03 エーエスエムエル ネザーランズ ビー．ブイ． リソグラフィ装置およびデバイス製造方法
EP1956431A4 (de) 2005-11-15 2009-06-24 Nikon Corp Belichtungsvorrichtung, belichtungsverfahren und bauelemente-herstellungsverfahren
DE102007005875A1 (de) 2007-02-06 2008-08-14 Carl Zeiss Smt Ag Vorrichtung und Verfahren zur Bestimmung der Ausrichtung von Oberflächen von optischen Elementen
JP5194030B2 (ja) 2007-02-06 2013-05-08 カール・ツァイス・エスエムティー・ゲーエムベーハー マイクロリソグラフィ投影露光装置の照明系のマルチミラーアレイを監視するための方法および装置
CN101669071B (zh) 2007-04-25 2012-03-21 卡尔蔡司Smt有限责任公司 微光刻曝光装置中照明掩模的照明系统
JP2010537414A (ja) 2007-08-30 2010-12-02 カール・ツァイス・エスエムティー・アーゲー マイクロリソグラフィ投影露光装置においてマスクを照明するための照明システム
WO2009080231A1 (en) 2007-12-21 2009-07-02 Carl Zeiss Smt Ag Illumination system for illuminating a mask in a microlithographic exposure apparatus
CN102279459B (zh) * 2010-06-09 2014-06-18 上海微电子装备有限公司 一种投影物镜
WO2011157643A1 (en) * 2010-06-15 2011-12-22 Carl Zeiss Smt Gmbh Mask for euv lithography, euv lithography system and method for optimising the imaging of a mask
TWI450019B (zh) * 2011-10-06 2014-08-21 Acer Inc 照明系統與投影裝置
CN105425553B (zh) * 2011-12-20 2018-08-28 株式会社尼康 基底处理装置、器件制造系统、以及器件制造方法
JP6069941B2 (ja) * 2012-08-08 2017-02-01 株式会社ニコン 投影露光装置及びデバイス製造方法
CN105445824B (zh) * 2014-08-20 2017-02-22 清华大学 Led光通信接收透镜及led光通信系统
US9791786B1 (en) * 2016-04-08 2017-10-17 Applied Materials, Inc. Method to reduce line waviness
KR102650388B1 (ko) * 2016-11-23 2024-03-25 삼성전자주식회사 검사 장치 및 그를 이용한 반도체 소자의 제조 방법
FI128407B (en) 2017-06-02 2020-04-30 Dispelix Oy Projection lens and waveguide display device

Family Cites Families (21)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE1522285A1 (de) * 1966-03-17 1969-08-07 Telefunken Patent Verfahren zur Erzeugung von Mikrostrukturen auf einem Substrat
US5523193A (en) 1988-05-31 1996-06-04 Texas Instruments Incorporated Method and apparatus for patterning and imaging member
NL8802517A (nl) 1988-10-13 1990-05-01 Philips Nv Beeldprojektie-inrichting.
JPH02160237A (ja) * 1988-12-14 1990-06-20 Nikon Corp マスク基板及びマスク製造方法、並びに該マスク基板を用いた露光方法
US5031976A (en) 1990-09-24 1991-07-16 Kla Instruments, Corporation Catadioptric imaging system
JPH04333011A (ja) 1991-05-09 1992-11-20 Nikon Corp 反射縮小投影光学装置
US5691541A (en) 1996-05-14 1997-11-25 The Regents Of The University Of California Maskless, reticle-free, lithography
US5870176A (en) 1996-06-19 1999-02-09 Sandia Corporation Maskless lithography
US6064517A (en) 1996-07-22 2000-05-16 Kla-Tencor Corporation High NA system for multiple mode imaging
US5999310A (en) 1996-07-22 1999-12-07 Shafer; David Ross Ultra-broadband UV microscope imaging system with wide range zoom capability
US5717518A (en) 1996-07-22 1998-02-10 Kla Instruments Corporation Broad spectrum ultraviolet catadioptric imaging system
US6312134B1 (en) 1996-07-25 2001-11-06 Anvik Corporation Seamless, maskless lithography system using spatial light modulator
SE9800665D0 (sv) 1998-03-02 1998-03-02 Micronic Laser Systems Ab Improved method for projection printing using a micromirror SLM
DE19832317C1 (de) 1998-07-17 2000-05-11 Zeiss Carl Jena Gmbh Anordnung, bei der von einer Lichtquelle aus Licht auf eine Fläche gerichtet wird
US6238852B1 (en) 1999-01-04 2001-05-29 Anvik Corporation Maskless lithography system and method with doubled throughput
DE10005189A1 (de) 2000-02-05 2001-08-09 Zeiss Carl Projektionsbelichtungsanlage mit reflektivem Retikel
JP4846167B2 (ja) 2000-04-12 2011-12-28 エヌエックスピー ビー ヴィ 半導体装置の製造方法
JP4016576B2 (ja) * 2000-07-14 2007-12-05 株式会社日立製作所 投射用レンズ装置および投射型画像表示装置
DE10139177A1 (de) 2001-08-16 2003-02-27 Zeiss Carl Objektiv mit Pupillenobskuration
MXPA04004982A (es) 2001-11-27 2004-08-11 Hoffmann La Roche Derivados de benzotiazol.
US7511890B2 (en) 2005-02-04 2009-03-31 Carl Zeiss Smt Ag Refractive optical imaging system, in particular projection objective for microlithography

Also Published As

Publication number Publication date
JP2007531024A (ja) 2007-11-01
WO2005096098A3 (en) 2006-07-06
KR20060130233A (ko) 2006-12-18
EP1730596A2 (de) 2006-12-13
US8064040B2 (en) 2011-11-22
KR101101493B1 (ko) 2012-01-03
EP1730596B1 (de) 2011-02-16
WO2005096098A2 (en) 2005-10-13
JP5106099B2 (ja) 2012-12-26
US20080198353A1 (en) 2008-08-21

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Legal Events

Date Code Title Description
8327 Change in the person/name/address of the patent owner

Owner name: CARL ZEISS SMT GMBH, 73447 OBERKOCHEN, DE