DE602005025289D1 - Lichtquelle und dieselbe verwendende Belichtungsvorrichtung - Google Patents
Lichtquelle und dieselbe verwendende BelichtungsvorrichtungInfo
- Publication number
- DE602005025289D1 DE602005025289D1 DE602005025289T DE602005025289T DE602005025289D1 DE 602005025289 D1 DE602005025289 D1 DE 602005025289D1 DE 602005025289 T DE602005025289 T DE 602005025289T DE 602005025289 T DE602005025289 T DE 602005025289T DE 602005025289 D1 DE602005025289 D1 DE 602005025289D1
- Authority
- DE
- Germany
- Prior art keywords
- light source
- device used
- exposure device
- same exposure
- same
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Active
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70008—Production of exposure light, i.e. light sources
- G03F7/70033—Production of exposure light, i.e. light sources by plasma extreme ultraviolet [EUV] sources
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/003—X-ray radiation generated from plasma being produced from a liquid or gas
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05G—X-RAY TECHNIQUE
- H05G2/00—Apparatus or processes specially adapted for producing X-rays, not involving X-ray tubes, e.g. involving generation of a plasma
- H05G2/001—X-ray radiation generated from plasma
- H05G2/008—X-ray radiation generated from plasma involving a beam of energy, e.g. laser or electron beam in the process of exciting the plasma
Applications Claiming Priority (1)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2004207856A JP4878108B2 (ja) | 2004-07-14 | 2004-07-14 | 露光装置、デバイス製造方法、および測定装置 |
Publications (1)
Publication Number | Publication Date |
---|---|
DE602005025289D1 true DE602005025289D1 (de) | 2011-01-27 |
Family
ID=35106785
Family Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
DE602005025289T Active DE602005025289D1 (de) | 2004-07-14 | 2005-07-13 | Lichtquelle und dieselbe verwendende Belichtungsvorrichtung |
Country Status (4)
Country | Link |
---|---|
US (1) | US7276710B2 (de) |
EP (1) | EP1617292B1 (de) |
JP (1) | JP4878108B2 (de) |
DE (1) | DE602005025289D1 (de) |
Families Citing this family (15)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP2005235959A (ja) * | 2004-02-18 | 2005-09-02 | Canon Inc | 光発生装置及び露光装置 |
US7164144B2 (en) * | 2004-03-10 | 2007-01-16 | Cymer Inc. | EUV light source |
JP4574211B2 (ja) * | 2004-04-19 | 2010-11-04 | キヤノン株式会社 | 光源装置、当該光源装置を有する露光装置 |
JP5025236B2 (ja) * | 2006-11-29 | 2012-09-12 | キヤノン株式会社 | 露光装置及び方法、並びに、デバイス製造方法 |
JP5149514B2 (ja) * | 2007-02-20 | 2013-02-20 | ギガフォトン株式会社 | 極端紫外光源装置 |
NL2003192A1 (nl) * | 2008-07-30 | 2010-02-02 | Asml Netherlands Bv | Alignment of collector device in lithographic apparatus. |
ATE536567T1 (de) | 2008-08-14 | 2011-12-15 | Asml Netherlands Bv | Strahlungsquelle und verfahren zur strahlungserzeugung |
JP5168489B2 (ja) * | 2008-09-12 | 2013-03-21 | 株式会社ニコン | 計測装置、光源装置、露光装置及びデバイスの製造方法 |
US8283643B2 (en) * | 2008-11-24 | 2012-10-09 | Cymer, Inc. | Systems and methods for drive laser beam delivery in an EUV light source |
JP5670174B2 (ja) | 2010-03-18 | 2015-02-18 | ギガフォトン株式会社 | チャンバ装置および極端紫外光生成装置 |
WO2012031841A1 (en) * | 2010-09-08 | 2012-03-15 | Asml Netherlands B.V. | Lithographic apparatus, euv radiation generation apparatus and device manufacturing method |
US9029813B2 (en) * | 2011-05-20 | 2015-05-12 | Asml Netherlands B.V. | Filter for material supply apparatus of an extreme ultraviolet light source |
US9678431B2 (en) | 2015-03-16 | 2017-06-13 | Taiwan Semiconductor Manufacturing Company, Ltd. | EUV lithography system and method with optimized throughput and stability |
US9826615B2 (en) * | 2015-09-22 | 2017-11-21 | Taiwan Semiconductor Manufacturing Co., Ltd. | EUV collector with orientation to avoid contamination |
WO2018131146A1 (ja) * | 2017-01-13 | 2018-07-19 | ギガフォトン株式会社 | 極端紫外光生成システム |
Family Cites Families (21)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0309281B1 (de) * | 1987-09-25 | 1995-03-08 | Matsushita Electric Industrial Co., Ltd. | Vorrichtung zur Kontrolle des Lageverhältnisses zwischen einer Photomaske und einem Plättchen |
US5149972A (en) * | 1990-01-18 | 1992-09-22 | University Of Massachusetts Medical Center | Two excitation wavelength video imaging microscope |
JPH0697027A (ja) * | 1992-09-10 | 1994-04-08 | Toshiba Corp | X線リソグラフィ装置 |
US5390203A (en) * | 1994-06-13 | 1995-02-14 | The United States Of America As Represented By The Secretary Of The Navy | Method and apparatus for locking laser wavelength to an atomic transition |
US6355570B1 (en) * | 1998-03-04 | 2002-03-12 | Hitachi, Ltd. | Semiconductor manufacturing methods, plasma processing methods and plasma processing apparatuses |
JP3833810B2 (ja) * | 1998-03-04 | 2006-10-18 | 株式会社日立製作所 | 半導体の製造方法並びにプラズマ処理方法およびその装置 |
US6324255B1 (en) * | 1998-08-13 | 2001-11-27 | Nikon Technologies, Inc. | X-ray irradiation apparatus and x-ray exposure apparatus |
JP2000056099A (ja) * | 1998-08-13 | 2000-02-25 | Nikon Corp | X線照射装置及びx線発生位置検出器 |
JP4273574B2 (ja) * | 1999-05-27 | 2009-06-03 | 株式会社ニコン | X線発生装置及びこれを有するx線露光装置及びx線の発生方法 |
JP2000346817A (ja) * | 1999-06-07 | 2000-12-15 | Nikon Corp | 測定装置、照射装置および露光方法 |
JP2001032096A (ja) | 1999-07-23 | 2001-02-06 | Daihatsu Motor Co Ltd | 自動車車体の電着塗装方法 |
EP1139521A4 (de) * | 1999-09-10 | 2006-03-22 | Nikon Corp | Lichtquelle und verfahren zur wellenlängenstabilisation, belichtungsgerät und -verfahren, verfahren zur herstellung eines belichtungsgeräts und vorrichtungsherstellungsverfahren und vorrichtung |
JP2001267239A (ja) * | 2000-01-14 | 2001-09-28 | Nikon Corp | 露光方法及び装置、並びにデバイス製造方法 |
JP4505664B2 (ja) * | 2000-03-24 | 2010-07-21 | 株式会社ニコン | X線発生装置 |
JP2002006096A (ja) * | 2000-06-23 | 2002-01-09 | Nikon Corp | 電磁波発生装置、これを用いた半導体製造装置並びに半導体デバイスの製造方法 |
US6826424B1 (en) * | 2000-12-19 | 2004-11-30 | Haishan Zeng | Methods and apparatus for fluorescence and reflectance imaging and spectroscopy and for contemporaneous measurements of electromagnetic radiation with multiple measuring devices |
US7253032B2 (en) * | 2001-04-20 | 2007-08-07 | Semiconductor Energy Laboratory Co., Ltd. | Method of flattening a crystallized semiconductor film surface by using a plate |
JP4298336B2 (ja) * | 2002-04-26 | 2009-07-15 | キヤノン株式会社 | 露光装置、光源装置及びデバイス製造方法 |
JP2004128105A (ja) * | 2002-10-01 | 2004-04-22 | Nikon Corp | X線発生装置及び露光装置 |
JP2005294087A (ja) * | 2004-04-01 | 2005-10-20 | Nikon Corp | 光源ユニット、照明光学装置、露光装置および露光方法 |
JP4574211B2 (ja) * | 2004-04-19 | 2010-11-04 | キヤノン株式会社 | 光源装置、当該光源装置を有する露光装置 |
-
2004
- 2004-07-14 JP JP2004207856A patent/JP4878108B2/ja not_active Expired - Fee Related
-
2005
- 2005-07-13 US US11/181,192 patent/US7276710B2/en not_active Expired - Fee Related
- 2005-07-13 DE DE602005025289T patent/DE602005025289D1/de active Active
- 2005-07-13 EP EP05254383A patent/EP1617292B1/de not_active Expired - Fee Related
Also Published As
Publication number | Publication date |
---|---|
JP2006032578A (ja) | 2006-02-02 |
US7276710B2 (en) | 2007-10-02 |
JP4878108B2 (ja) | 2012-02-15 |
EP1617292A2 (de) | 2006-01-18 |
EP1617292B1 (de) | 2010-12-15 |
EP1617292A3 (de) | 2009-05-20 |
US20060011870A1 (en) | 2006-01-19 |
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