AU2003210214A1 - Refractive projection lens - Google Patents
Refractive projection lensInfo
- Publication number
- AU2003210214A1 AU2003210214A1 AU2003210214A AU2003210214A AU2003210214A1 AU 2003210214 A1 AU2003210214 A1 AU 2003210214A1 AU 2003210214 A AU2003210214 A AU 2003210214A AU 2003210214 A AU2003210214 A AU 2003210214A AU 2003210214 A1 AU2003210214 A1 AU 2003210214A1
- Authority
- AU
- Australia
- Prior art keywords
- projection lens
- refractive projection
- refractive
- lens
- projection
- Prior art date
- Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
- Abandoned
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70975—Assembly, maintenance, transport or storage of apparatus
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B9/00—Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or -
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US36084502P | 2002-03-01 | 2002-03-01 | |
US60/360,845 | 2002-03-01 | ||
PCT/EP2003/001147 WO2003075096A2 (en) | 2002-03-01 | 2003-02-06 | Refractive projection lens |
Publications (1)
Publication Number | Publication Date |
---|---|
AU2003210214A1 true AU2003210214A1 (en) | 2003-09-16 |
Family
ID=27789034
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2003210214A Abandoned AU2003210214A1 (en) | 2002-03-01 | 2003-02-06 | Refractive projection lens |
AU2003230593A Abandoned AU2003230593A1 (en) | 2002-03-01 | 2003-03-03 | Refractive projection objective |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
AU2003230593A Abandoned AU2003230593A1 (en) | 2002-03-01 | 2003-03-03 | Refractive projection objective |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP1483626A2 (en) |
JP (1) | JP2005519332A (en) |
KR (1) | KR20040089688A (en) |
AU (2) | AU2003210214A1 (en) |
WO (2) | WO2003075096A2 (en) |
Families Citing this family (34)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10229249A1 (en) | 2002-03-01 | 2003-09-04 | Zeiss Carl Semiconductor Mfg | Refractive projection lens with a waist |
US8208198B2 (en) | 2004-01-14 | 2012-06-26 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
DE10394297D2 (en) * | 2003-10-22 | 2006-07-06 | Zeiss Carl Smt Ag | Refractive projection objective for immersion lithography |
EP1690139B1 (en) | 2003-12-02 | 2009-01-14 | Carl Zeiss SMT AG | Projection optical system |
US20080151365A1 (en) | 2004-01-14 | 2008-06-26 | Carl Zeiss Smt Ag | Catadioptric projection objective |
WO2005111689A2 (en) | 2004-05-17 | 2005-11-24 | Carl Zeiss Smt Ag | Catadioptric projection objective with intermediate images |
US7301707B2 (en) | 2004-09-03 | 2007-11-27 | Carl Zeiss Smt Ag | Projection optical system and method |
US7508488B2 (en) | 2004-10-13 | 2009-03-24 | Carl Zeiss Smt Ag | Projection exposure system and method of manufacturing a miniaturized device |
DE102005045862A1 (en) | 2004-10-19 | 2006-04-20 | Carl Zeiss Smt Ag | Optical system for ultraviolet light has liquid lens arranged in space between first and second limiting optical elements and containing liquid transparent for wavelength less than or equal to 200 nm |
US7508489B2 (en) | 2004-12-13 | 2009-03-24 | Carl Zeiss Smt Ag | Method of manufacturing a miniaturized device |
CN101107570B (en) | 2004-12-30 | 2011-02-09 | 卡尔蔡司Smt股份公司 | Projection optical system |
JP2007114750A (en) | 2005-09-09 | 2007-05-10 | Asml Netherlands Bv | Projection system design method, lithography apparatus, and device manufacturing method |
KR101235492B1 (en) | 2006-07-03 | 2013-02-20 | 칼 짜이스 에스엠테 게엠베하 | Method for revising/repairing a lithographic projection objective |
DE102006045075A1 (en) | 2006-09-21 | 2008-04-03 | Carl Zeiss Smt Ag | Controllable optical element |
JP5154564B2 (en) | 2006-12-01 | 2013-02-27 | カール・ツァイス・エスエムティー・ゲーエムベーハー | Optical system with interchangeable and operable correction arrangement for reducing image aberrations |
DE102008000790A1 (en) | 2007-03-20 | 2008-09-25 | Carl Zeiss Smt Ag | A method for improving imaging properties of an optical system and such an optical system |
JP5462791B2 (en) | 2007-08-03 | 2014-04-02 | カール・ツァイス・エスエムティー・ゲーエムベーハー | Projection objective, projection exposure apparatus, and projection exposure method for microlithography |
DE102008041144A1 (en) | 2007-08-21 | 2009-03-05 | Carl Zeiss Smt Ag | Optical arrangement for e.g. projection lens, has structure for optimizing arrangement with respect to angle of incident angle-dependent polarization division in phase and amplitude, and another structure compensating change of wave front |
EP2181357A1 (en) | 2007-08-24 | 2010-05-05 | Carl Zeiss SMT AG | Controllable optical element and method for operating an optical element with thermal actuators and projection exposure apparatus for semiconductor lithography |
EP2048540A1 (en) | 2007-10-09 | 2009-04-15 | Carl Zeiss SMT AG | Microlithographic projection exposure apparatus |
DE102007055567A1 (en) | 2007-11-20 | 2009-05-28 | Carl Zeiss Smt Ag | Optical system |
JP5533656B2 (en) * | 2008-09-18 | 2014-06-25 | 株式会社ニコン | Imaging optical system, exposure apparatus, and electronic device manufacturing method |
DE102008042356A1 (en) | 2008-09-25 | 2010-04-08 | Carl Zeiss Smt Ag | Projection exposure system with optimized adjustment option |
WO2011116792A1 (en) | 2010-03-26 | 2011-09-29 | Carl Zeiss Smt Gmbh | Optical system, exposure apparatus, and waverfront correction method |
KR102047584B1 (en) | 2013-09-09 | 2019-11-21 | 칼 짜이스 에스엠티 게엠베하 | Microlithographic projection exposure apparatus and method of correcting optical wavefront deformations in such an apparatus |
US9726859B1 (en) | 2014-03-16 | 2017-08-08 | Navitar Industries, Llc | Optical assembly for a wide field of view camera with low TV distortion |
US9494772B1 (en) | 2014-03-16 | 2016-11-15 | Hyperion Development, LLC | Optical assembly for a wide field of view point action camera with low field curvature |
US9091843B1 (en) | 2014-03-16 | 2015-07-28 | Hyperion Development, LLC | Optical assembly for a wide field of view point action camera with low track length to focal length ratio |
US9995910B1 (en) | 2014-03-16 | 2018-06-12 | Navitar Industries, Llc | Optical assembly for a compact wide field of view digital camera with high MTF |
US10545314B1 (en) | 2014-03-16 | 2020-01-28 | Navitar Industries, Llc | Optical assembly for a compact wide field of view digital camera with low lateral chromatic aberration |
US9316808B1 (en) | 2014-03-16 | 2016-04-19 | Hyperion Development, LLC | Optical assembly for a wide field of view point action camera with a low sag aspheric lens element |
US10139595B1 (en) | 2014-03-16 | 2018-11-27 | Navitar Industries, Llc | Optical assembly for a compact wide field of view digital camera with low first lens diameter to image diagonal ratio |
US10386604B1 (en) | 2014-03-16 | 2019-08-20 | Navitar Industries, Llc | Compact wide field of view digital camera with stray light impact suppression |
US9316820B1 (en) | 2014-03-16 | 2016-04-19 | Hyperion Development, LLC | Optical assembly for a wide field of view point action camera with low astigmatism |
Family Cites Families (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3624973B2 (en) * | 1995-10-12 | 2005-03-02 | 株式会社ニコン | Projection optical system |
DE19855108A1 (en) * | 1998-11-30 | 2000-05-31 | Zeiss Carl Fa | Microlithographic reduction lens, projection exposure system and method |
DE19855157A1 (en) * | 1998-11-30 | 2000-05-31 | Zeiss Carl Fa | Projection lens |
DE50012452D1 (en) * | 1999-12-29 | 2006-05-11 | Zeiss Carl Smt Ag | PROJECTION LENS WITH ADJUSTABLE ASPHARIC LENS SURFACES |
-
2003
- 2003-02-06 WO PCT/EP2003/001147 patent/WO2003075096A2/en active Application Filing
- 2003-02-06 KR KR10-2004-7013547A patent/KR20040089688A/en not_active Application Discontinuation
- 2003-02-06 JP JP2003573496A patent/JP2005519332A/en active Pending
- 2003-02-06 EP EP03743308A patent/EP1483626A2/en not_active Withdrawn
- 2003-02-06 AU AU2003210214A patent/AU2003210214A1/en not_active Abandoned
- 2003-03-03 WO PCT/US2003/006592 patent/WO2003075049A2/en not_active Application Discontinuation
- 2003-03-03 AU AU2003230593A patent/AU2003230593A1/en not_active Abandoned
Also Published As
Publication number | Publication date |
---|---|
KR20040089688A (en) | 2004-10-21 |
WO2003075096A3 (en) | 2003-11-13 |
WO2003075049A3 (en) | 2004-04-08 |
WO2003075096A2 (en) | 2003-09-12 |
EP1483626A2 (en) | 2004-12-08 |
WO2003075049A2 (en) | 2003-09-12 |
AU2003230593A8 (en) | 2003-09-16 |
JP2005519332A (en) | 2005-06-30 |
AU2003230593A1 (en) | 2003-09-16 |
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Legal Events
Date | Code | Title | Description |
---|---|---|---|
MK6 | Application lapsed section 142(2)(f)/reg. 8.3(3) - pct applic. not entering national phase |