WO2003075049A3 - Refractive projection objective - Google Patents
Refractive projection objective Download PDFInfo
- Publication number
- WO2003075049A3 WO2003075049A3 PCT/US2003/006592 US0306592W WO03075049A3 WO 2003075049 A3 WO2003075049 A3 WO 2003075049A3 US 0306592 W US0306592 W US 0306592W WO 03075049 A3 WO03075049 A3 WO 03075049A3
- Authority
- WO
- WIPO (PCT)
- Prior art keywords
- projection objective
- refractive projection
- convexity
- maximum diameter
- diameter denoted
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70975—Assembly, maintenance, transport or storage of apparatus
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B9/00—Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or -
-
- G—PHYSICS
- G02—OPTICS
- G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
- G02B13/00—Optical objectives specially designed for the purposes specified below
- G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
- G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Optics & Photonics (AREA)
- Lenses (AREA)
- Prostheses (AREA)
- Endoscopes (AREA)
Abstract
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
AU2003230593A AU2003230593A1 (en) | 2002-03-01 | 2003-03-03 | Refractive projection objective |
US10/931,051 US7190527B2 (en) | 2002-03-01 | 2004-09-01 | Refractive projection objective |
US10/931,062 US7154676B2 (en) | 2002-03-01 | 2004-09-01 | Very-high aperture projection objective |
US11/528,379 US7339743B2 (en) | 2002-03-01 | 2006-09-28 | Very-high aperture projection objective |
US11/716,679 US7382540B2 (en) | 2002-03-01 | 2007-03-12 | Refractive projection objective |
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
US36084502P | 2002-03-01 | 2002-03-01 | |
US60/360,845 | 2002-03-01 |
Related Child Applications (3)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
US10/428,946 Continuation-In-Part US20040004757A1 (en) | 2002-03-01 | 2003-05-05 | Very-high aperture projection objective |
US10/931,062 Continuation-In-Part US7154676B2 (en) | 2002-03-01 | 2004-09-01 | Very-high aperture projection objective |
US10/931,051 Continuation-In-Part US7190527B2 (en) | 2002-03-01 | 2004-09-01 | Refractive projection objective |
Publications (2)
Publication Number | Publication Date |
---|---|
WO2003075049A2 WO2003075049A2 (en) | 2003-09-12 |
WO2003075049A3 true WO2003075049A3 (en) | 2004-04-08 |
Family
ID=27789034
Family Applications (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2003/001147 WO2003075096A2 (en) | 2002-03-01 | 2003-02-06 | Refractive projection lens |
PCT/US2003/006592 WO2003075049A2 (en) | 2002-03-01 | 2003-03-03 | Refractive projection objective |
Family Applications Before (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
PCT/EP2003/001147 WO2003075096A2 (en) | 2002-03-01 | 2003-02-06 | Refractive projection lens |
Country Status (5)
Country | Link |
---|---|
EP (1) | EP1483626A2 (en) |
JP (1) | JP2005519332A (en) |
KR (1) | KR20040089688A (en) |
AU (2) | AU2003210214A1 (en) |
WO (2) | WO2003075096A2 (en) |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9091843B1 (en) | 2014-03-16 | 2015-07-28 | Hyperion Development, LLC | Optical assembly for a wide field of view point action camera with low track length to focal length ratio |
US9316820B1 (en) | 2014-03-16 | 2016-04-19 | Hyperion Development, LLC | Optical assembly for a wide field of view point action camera with low astigmatism |
US9316808B1 (en) | 2014-03-16 | 2016-04-19 | Hyperion Development, LLC | Optical assembly for a wide field of view point action camera with a low sag aspheric lens element |
US9494772B1 (en) | 2014-03-16 | 2016-11-15 | Hyperion Development, LLC | Optical assembly for a wide field of view point action camera with low field curvature |
Families Citing this family (30)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
DE10229249A1 (en) | 2002-03-01 | 2003-09-04 | Zeiss Carl Semiconductor Mfg | Refractive projection lens with a waist |
US8208198B2 (en) | 2004-01-14 | 2012-06-26 | Carl Zeiss Smt Gmbh | Catadioptric projection objective |
AU2003304557A1 (en) * | 2003-10-22 | 2005-06-08 | Carl Zeiss Smt Ag | Refractive projection objective for immersion lithography |
DE602004019142D1 (en) | 2003-12-02 | 2009-03-05 | Zeiss Carl Smt Ag | OPTICAL PROJECTION SYSTEM |
US20080151364A1 (en) | 2004-01-14 | 2008-06-26 | Carl Zeiss Smt Ag | Catadioptric projection objective |
KR101213831B1 (en) | 2004-05-17 | 2012-12-24 | 칼 짜이스 에스엠티 게엠베하 | Catadioptric projection objective with intermediate images |
US7301707B2 (en) | 2004-09-03 | 2007-11-27 | Carl Zeiss Smt Ag | Projection optical system and method |
US7508488B2 (en) | 2004-10-13 | 2009-03-24 | Carl Zeiss Smt Ag | Projection exposure system and method of manufacturing a miniaturized device |
DE102005045862A1 (en) | 2004-10-19 | 2006-04-20 | Carl Zeiss Smt Ag | Optical system for ultraviolet light has liquid lens arranged in space between first and second limiting optical elements and containing liquid transparent for wavelength less than or equal to 200 nm |
US7508489B2 (en) | 2004-12-13 | 2009-03-24 | Carl Zeiss Smt Ag | Method of manufacturing a miniaturized device |
JP2008527403A (en) | 2004-12-30 | 2008-07-24 | カール・ツァイス・エスエムティー・アーゲー | Projection optical system |
JP2007114750A (en) | 2005-09-09 | 2007-05-10 | Asml Netherlands Bv | Projection system design method, lithography apparatus, and device manufacturing method |
TWI439815B (en) | 2006-07-03 | 2014-06-01 | Zeiss Carl Smt Gmbh | Method for revising/repairing a projection objective of a lithography projection expose apparatus and such projection objective |
DE102006045075A1 (en) | 2006-09-21 | 2008-04-03 | Carl Zeiss Smt Ag | Controllable optical element |
EP2097789B1 (en) | 2006-12-01 | 2012-08-01 | Carl Zeiss SMT GmbH | Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations |
DE102008000790A1 (en) | 2007-03-20 | 2008-09-25 | Carl Zeiss Smt Ag | A method for improving imaging properties of an optical system and such an optical system |
EP2188673A1 (en) | 2007-08-03 | 2010-05-26 | Carl Zeiss SMT AG | Projection objective for microlithography, projection exposure apparatus, projection exposure method and optical correction plate |
DE102008041144A1 (en) | 2007-08-21 | 2009-03-05 | Carl Zeiss Smt Ag | Optical arrangement for e.g. projection lens, has structure for optimizing arrangement with respect to angle of incident angle-dependent polarization division in phase and amplitude, and another structure compensating change of wave front |
CN101784954B (en) | 2007-08-24 | 2015-03-25 | 卡尔蔡司Smt有限责任公司 | Controllable optical element and method for operating an optical element with thermal actuators and projection exposure apparatus for semiconductor lithography |
EP2048540A1 (en) | 2007-10-09 | 2009-04-15 | Carl Zeiss SMT AG | Microlithographic projection exposure apparatus |
DE102007055567A1 (en) | 2007-11-20 | 2009-05-28 | Carl Zeiss Smt Ag | Optical system |
JP5533656B2 (en) * | 2008-09-18 | 2014-06-25 | 株式会社ニコン | Imaging optical system, exposure apparatus, and electronic device manufacturing method |
DE102008042356A1 (en) | 2008-09-25 | 2010-04-08 | Carl Zeiss Smt Ag | Projection exposure system with optimized adjustment option |
JP5478773B2 (en) | 2010-03-26 | 2014-04-23 | カール・ツァイス・エスエムティー・ゲーエムベーハー | Optical system, exposure apparatus, and wavefront correction method |
KR102047584B1 (en) | 2013-09-09 | 2019-11-21 | 칼 짜이스 에스엠티 게엠베하 | Microlithographic projection exposure apparatus and method of correcting optical wavefront deformations in such an apparatus |
US10545314B1 (en) | 2014-03-16 | 2020-01-28 | Navitar Industries, Llc | Optical assembly for a compact wide field of view digital camera with low lateral chromatic aberration |
US10139595B1 (en) | 2014-03-16 | 2018-11-27 | Navitar Industries, Llc | Optical assembly for a compact wide field of view digital camera with low first lens diameter to image diagonal ratio |
US9995910B1 (en) | 2014-03-16 | 2018-06-12 | Navitar Industries, Llc | Optical assembly for a compact wide field of view digital camera with high MTF |
US9726859B1 (en) | 2014-03-16 | 2017-08-08 | Navitar Industries, Llc | Optical assembly for a wide field of view camera with low TV distortion |
US10386604B1 (en) | 2014-03-16 | 2019-08-20 | Navitar Industries, Llc | Compact wide field of view digital camera with stray light impact suppression |
Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6349005B1 (en) * | 1998-11-30 | 2002-02-19 | Carl-Zeiss-Stiftung | Microlithographic reduction objective, projection exposure equipment and process |
Family Cites Families (3)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
JP3624973B2 (en) * | 1995-10-12 | 2005-03-02 | 株式会社ニコン | Projection optical system |
DE19855157A1 (en) * | 1998-11-30 | 2000-05-31 | Zeiss Carl Fa | Projection lens |
WO2001050171A1 (en) * | 1999-12-29 | 2001-07-12 | Carl Zeiss | Projection lens comprising adjacent aspheric lens surfaces |
-
2003
- 2003-02-06 WO PCT/EP2003/001147 patent/WO2003075096A2/en active Application Filing
- 2003-02-06 JP JP2003573496A patent/JP2005519332A/en active Pending
- 2003-02-06 EP EP03743308A patent/EP1483626A2/en not_active Withdrawn
- 2003-02-06 AU AU2003210214A patent/AU2003210214A1/en not_active Abandoned
- 2003-02-06 KR KR10-2004-7013547A patent/KR20040089688A/en not_active Application Discontinuation
- 2003-03-03 AU AU2003230593A patent/AU2003230593A1/en not_active Abandoned
- 2003-03-03 WO PCT/US2003/006592 patent/WO2003075049A2/en not_active Application Discontinuation
Patent Citations (1)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US6349005B1 (en) * | 1998-11-30 | 2002-02-19 | Carl-Zeiss-Stiftung | Microlithographic reduction objective, projection exposure equipment and process |
Cited By (4)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
US9091843B1 (en) | 2014-03-16 | 2015-07-28 | Hyperion Development, LLC | Optical assembly for a wide field of view point action camera with low track length to focal length ratio |
US9316820B1 (en) | 2014-03-16 | 2016-04-19 | Hyperion Development, LLC | Optical assembly for a wide field of view point action camera with low astigmatism |
US9316808B1 (en) | 2014-03-16 | 2016-04-19 | Hyperion Development, LLC | Optical assembly for a wide field of view point action camera with a low sag aspheric lens element |
US9494772B1 (en) | 2014-03-16 | 2016-11-15 | Hyperion Development, LLC | Optical assembly for a wide field of view point action camera with low field curvature |
Also Published As
Publication number | Publication date |
---|---|
AU2003230593A8 (en) | 2003-09-16 |
WO2003075096A3 (en) | 2003-11-13 |
AU2003210214A1 (en) | 2003-09-16 |
KR20040089688A (en) | 2004-10-21 |
WO2003075096A2 (en) | 2003-09-12 |
EP1483626A2 (en) | 2004-12-08 |
AU2003230593A1 (en) | 2003-09-16 |
JP2005519332A (en) | 2005-06-30 |
WO2003075049A2 (en) | 2003-09-12 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
WO2003075049A3 (en) | Refractive projection objective | |
USD539837S1 (en) | Type font | |
AU2001251742A1 (en) | Lenses and uses, including microscopes | |
EP1518873A3 (en) | Process of producing plastic lens and plastic lens | |
AU2001292336A1 (en) | Monomer, polymer, and ocular lens comprising the same | |
AU2001284662A1 (en) | Toric-shaped lenses and goggle assembly | |
WO2004113959A3 (en) | Bifocal multiorder diffractive lenses for vision correction | |
AU2001288111A1 (en) | Polymer and ocular lens comprising the same | |
AU2002361916A1 (en) | Iris-supported intraocular lenses | |
AU2002238883A1 (en) | Monomers, polymers, and ophthalmic lenses and contact lenses made by using the same | |
GB2374946B (en) | Goggles with removable lenses | |
EP1111425A3 (en) | Optical projection system | |
AU2002343727A1 (en) | Tampon with non-aggressive, fluid wicking overwrap | |
USD527040S1 (en) | Type font | |
WO2007038469A3 (en) | Ophthalmic lens package with a frangible pouch and methods of its use | |
AU2002364974A1 (en) | Objective with birefringent lenses | |
USD538843S1 (en) | Type font | |
USD464430S1 (en) | Tampon | |
AU2001242742A1 (en) | Copper-tolerant yeast and pectinase produced by the copper-tolerant yeast | |
USD477630S1 (en) | Type font | |
USD457624S1 (en) | Tampon with a tassel | |
USD470070S1 (en) | Watchback | |
AU2002303818A1 (en) | Low surface-glare intraocular lenses | |
AU2001212993A1 (en) | Improved spectacles, particularly of the type with a lightweight frame | |
AU2001262282A1 (en) | 3-(4,5-dihydroisoxazole-5-yl)benzoylcyclohexenones and the use thereof as herbicides |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
AK | Designated states |
Kind code of ref document: A2 Designated state(s): AE AG AL AM AT AU AZ BA BB BG BR BY BZ CA CH CN CO CR CU CZ DE DK DM DZ EC EE ES FI GB GD GE GH GM HR HU ID IL IN IS JP KE KG KP KR KZ LC LK LR LS LT LU LV MA MD MG MK MN MW MX MZ NO NZ OM PH PL PT RO RU SD SE SG SK SL TJ TM TN TR TT TZ UA UG US UZ VN YU ZA ZM ZW |
|
AL | Designated countries for regional patents |
Kind code of ref document: A2 Designated state(s): GH GM KE LS MW MZ SD SL SZ TZ UG ZM ZW AM AZ BY KG KZ MD RU TJ TM AT BE BG CH CY CZ DE DK EE ES FI FR GB GR HU IE IT LU MC NL PT RO SE SI SK TR BF BJ CF CG CI CM GA GN GQ GW ML MR NE SN TD TG |
|
121 | Ep: the epo has been informed by wipo that ep was designated in this application | ||
WWE | Wipo information: entry into national phase |
Ref document number: 10931051 Country of ref document: US |
|
122 | Ep: pct application non-entry in european phase | ||
NENP | Non-entry into the national phase |
Ref country code: JP |
|
WWW | Wipo information: withdrawn in national office |
Country of ref document: JP |