WO2003075049A3 - Refractive projection objective - Google Patents

Refractive projection objective Download PDF

Info

Publication number
WO2003075049A3
WO2003075049A3 PCT/US2003/006592 US0306592W WO03075049A3 WO 2003075049 A3 WO2003075049 A3 WO 2003075049A3 US 0306592 W US0306592 W US 0306592W WO 03075049 A3 WO03075049 A3 WO 03075049A3
Authority
WO
WIPO (PCT)
Prior art keywords
projection objective
refractive projection
convexity
maximum diameter
diameter denoted
Prior art date
Application number
PCT/US2003/006592
Other languages
French (fr)
Other versions
WO2003075049A2 (en
Inventor
Russell Hudyma
Hans-Juergen Rostalski
Wilhelm Ulrich
Rolf Freimann
Original Assignee
Zeiss Carl Smt Ag
Russell Hudyma
Hans-Juergen Rostalski
Wilhelm Ulrich
Rolf Freimann
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Zeiss Carl Smt Ag, Russell Hudyma, Hans-Juergen Rostalski, Wilhelm Ulrich, Rolf Freimann filed Critical Zeiss Carl Smt Ag
Priority to AU2003230593A priority Critical patent/AU2003230593A1/en
Publication of WO2003075049A2 publication Critical patent/WO2003075049A2/en
Publication of WO2003075049A3 publication Critical patent/WO2003075049A3/en
Priority to US10/931,051 priority patent/US7190527B2/en
Priority to US10/931,062 priority patent/US7154676B2/en
Priority to US11/528,379 priority patent/US7339743B2/en
Priority to US11/716,679 priority patent/US7382540B2/en

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70975—Assembly, maintenance, transport or storage of apparatus
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B9/00—Optical objectives characterised both by the number of the components and their arrangements according to their sign, i.e. + or -
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B13/00—Optical objectives specially designed for the purposes specified below
    • G02B13/24—Optical objectives specially designed for the purposes specified below for reproducing or copying at short object distances
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70241—Optical aspects of refractive lens systems, i.e. comprising only refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7095—Materials, e.g. materials for housing, stage or other support having particular properties, e.g. weight, strength, conductivity, thermal expansion coefficient
    • G03F7/70958—Optical materials or coatings, e.g. with particular transmittance, reflectance or anti-reflection properties

Landscapes

  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Prostheses (AREA)
  • Endoscopes (AREA)

Abstract

Refractive projection objective with a numerical aperture greater than 0.7, consisting of a first convexity, a second convexity, and a waist arranged between the two convexities. The first convexity has a maximum diameter denoted by D1, and the second convexity has a maximum diameter denoted by D2, and 0.8 <D1/D2<1.1.
PCT/US2003/006592 2002-03-01 2003-03-03 Refractive projection objective WO2003075049A2 (en)

Priority Applications (5)

Application Number Priority Date Filing Date Title
AU2003230593A AU2003230593A1 (en) 2002-03-01 2003-03-03 Refractive projection objective
US10/931,051 US7190527B2 (en) 2002-03-01 2004-09-01 Refractive projection objective
US10/931,062 US7154676B2 (en) 2002-03-01 2004-09-01 Very-high aperture projection objective
US11/528,379 US7339743B2 (en) 2002-03-01 2006-09-28 Very-high aperture projection objective
US11/716,679 US7382540B2 (en) 2002-03-01 2007-03-12 Refractive projection objective

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
US36084502P 2002-03-01 2002-03-01
US60/360,845 2002-03-01

Related Child Applications (3)

Application Number Title Priority Date Filing Date
US10/428,946 Continuation-In-Part US20040004757A1 (en) 2002-03-01 2003-05-05 Very-high aperture projection objective
US10/931,062 Continuation-In-Part US7154676B2 (en) 2002-03-01 2004-09-01 Very-high aperture projection objective
US10/931,051 Continuation-In-Part US7190527B2 (en) 2002-03-01 2004-09-01 Refractive projection objective

Publications (2)

Publication Number Publication Date
WO2003075049A2 WO2003075049A2 (en) 2003-09-12
WO2003075049A3 true WO2003075049A3 (en) 2004-04-08

Family

ID=27789034

Family Applications (2)

Application Number Title Priority Date Filing Date
PCT/EP2003/001147 WO2003075096A2 (en) 2002-03-01 2003-02-06 Refractive projection lens
PCT/US2003/006592 WO2003075049A2 (en) 2002-03-01 2003-03-03 Refractive projection objective

Family Applications Before (1)

Application Number Title Priority Date Filing Date
PCT/EP2003/001147 WO2003075096A2 (en) 2002-03-01 2003-02-06 Refractive projection lens

Country Status (5)

Country Link
EP (1) EP1483626A2 (en)
JP (1) JP2005519332A (en)
KR (1) KR20040089688A (en)
AU (2) AU2003210214A1 (en)
WO (2) WO2003075096A2 (en)

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9091843B1 (en) 2014-03-16 2015-07-28 Hyperion Development, LLC Optical assembly for a wide field of view point action camera with low track length to focal length ratio
US9316820B1 (en) 2014-03-16 2016-04-19 Hyperion Development, LLC Optical assembly for a wide field of view point action camera with low astigmatism
US9316808B1 (en) 2014-03-16 2016-04-19 Hyperion Development, LLC Optical assembly for a wide field of view point action camera with a low sag aspheric lens element
US9494772B1 (en) 2014-03-16 2016-11-15 Hyperion Development, LLC Optical assembly for a wide field of view point action camera with low field curvature

Families Citing this family (30)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
DE10229249A1 (en) 2002-03-01 2003-09-04 Zeiss Carl Semiconductor Mfg Refractive projection lens with a waist
US8208198B2 (en) 2004-01-14 2012-06-26 Carl Zeiss Smt Gmbh Catadioptric projection objective
AU2003304557A1 (en) * 2003-10-22 2005-06-08 Carl Zeiss Smt Ag Refractive projection objective for immersion lithography
DE602004019142D1 (en) 2003-12-02 2009-03-05 Zeiss Carl Smt Ag OPTICAL PROJECTION SYSTEM
US20080151364A1 (en) 2004-01-14 2008-06-26 Carl Zeiss Smt Ag Catadioptric projection objective
KR101213831B1 (en) 2004-05-17 2012-12-24 칼 짜이스 에스엠티 게엠베하 Catadioptric projection objective with intermediate images
US7301707B2 (en) 2004-09-03 2007-11-27 Carl Zeiss Smt Ag Projection optical system and method
US7508488B2 (en) 2004-10-13 2009-03-24 Carl Zeiss Smt Ag Projection exposure system and method of manufacturing a miniaturized device
DE102005045862A1 (en) 2004-10-19 2006-04-20 Carl Zeiss Smt Ag Optical system for ultraviolet light has liquid lens arranged in space between first and second limiting optical elements and containing liquid transparent for wavelength less than or equal to 200 nm
US7508489B2 (en) 2004-12-13 2009-03-24 Carl Zeiss Smt Ag Method of manufacturing a miniaturized device
JP2008527403A (en) 2004-12-30 2008-07-24 カール・ツァイス・エスエムティー・アーゲー Projection optical system
JP2007114750A (en) 2005-09-09 2007-05-10 Asml Netherlands Bv Projection system design method, lithography apparatus, and device manufacturing method
TWI439815B (en) 2006-07-03 2014-06-01 Zeiss Carl Smt Gmbh Method for revising/repairing a projection objective of a lithography projection expose apparatus and such projection objective
DE102006045075A1 (en) 2006-09-21 2008-04-03 Carl Zeiss Smt Ag Controllable optical element
EP2097789B1 (en) 2006-12-01 2012-08-01 Carl Zeiss SMT GmbH Optical system with an exchangeable, manipulable correction arrangement for reducing image aberrations
DE102008000790A1 (en) 2007-03-20 2008-09-25 Carl Zeiss Smt Ag A method for improving imaging properties of an optical system and such an optical system
EP2188673A1 (en) 2007-08-03 2010-05-26 Carl Zeiss SMT AG Projection objective for microlithography, projection exposure apparatus, projection exposure method and optical correction plate
DE102008041144A1 (en) 2007-08-21 2009-03-05 Carl Zeiss Smt Ag Optical arrangement for e.g. projection lens, has structure for optimizing arrangement with respect to angle of incident angle-dependent polarization division in phase and amplitude, and another structure compensating change of wave front
CN101784954B (en) 2007-08-24 2015-03-25 卡尔蔡司Smt有限责任公司 Controllable optical element and method for operating an optical element with thermal actuators and projection exposure apparatus for semiconductor lithography
EP2048540A1 (en) 2007-10-09 2009-04-15 Carl Zeiss SMT AG Microlithographic projection exposure apparatus
DE102007055567A1 (en) 2007-11-20 2009-05-28 Carl Zeiss Smt Ag Optical system
JP5533656B2 (en) * 2008-09-18 2014-06-25 株式会社ニコン Imaging optical system, exposure apparatus, and electronic device manufacturing method
DE102008042356A1 (en) 2008-09-25 2010-04-08 Carl Zeiss Smt Ag Projection exposure system with optimized adjustment option
JP5478773B2 (en) 2010-03-26 2014-04-23 カール・ツァイス・エスエムティー・ゲーエムベーハー Optical system, exposure apparatus, and wavefront correction method
KR102047584B1 (en) 2013-09-09 2019-11-21 칼 짜이스 에스엠티 게엠베하 Microlithographic projection exposure apparatus and method of correcting optical wavefront deformations in such an apparatus
US10545314B1 (en) 2014-03-16 2020-01-28 Navitar Industries, Llc Optical assembly for a compact wide field of view digital camera with low lateral chromatic aberration
US10139595B1 (en) 2014-03-16 2018-11-27 Navitar Industries, Llc Optical assembly for a compact wide field of view digital camera with low first lens diameter to image diagonal ratio
US9995910B1 (en) 2014-03-16 2018-06-12 Navitar Industries, Llc Optical assembly for a compact wide field of view digital camera with high MTF
US9726859B1 (en) 2014-03-16 2017-08-08 Navitar Industries, Llc Optical assembly for a wide field of view camera with low TV distortion
US10386604B1 (en) 2014-03-16 2019-08-20 Navitar Industries, Llc Compact wide field of view digital camera with stray light impact suppression

Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6349005B1 (en) * 1998-11-30 2002-02-19 Carl-Zeiss-Stiftung Microlithographic reduction objective, projection exposure equipment and process

Family Cites Families (3)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP3624973B2 (en) * 1995-10-12 2005-03-02 株式会社ニコン Projection optical system
DE19855157A1 (en) * 1998-11-30 2000-05-31 Zeiss Carl Fa Projection lens
WO2001050171A1 (en) * 1999-12-29 2001-07-12 Carl Zeiss Projection lens comprising adjacent aspheric lens surfaces

Patent Citations (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US6349005B1 (en) * 1998-11-30 2002-02-19 Carl-Zeiss-Stiftung Microlithographic reduction objective, projection exposure equipment and process

Cited By (4)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US9091843B1 (en) 2014-03-16 2015-07-28 Hyperion Development, LLC Optical assembly for a wide field of view point action camera with low track length to focal length ratio
US9316820B1 (en) 2014-03-16 2016-04-19 Hyperion Development, LLC Optical assembly for a wide field of view point action camera with low astigmatism
US9316808B1 (en) 2014-03-16 2016-04-19 Hyperion Development, LLC Optical assembly for a wide field of view point action camera with a low sag aspheric lens element
US9494772B1 (en) 2014-03-16 2016-11-15 Hyperion Development, LLC Optical assembly for a wide field of view point action camera with low field curvature

Also Published As

Publication number Publication date
AU2003230593A8 (en) 2003-09-16
WO2003075096A3 (en) 2003-11-13
AU2003210214A1 (en) 2003-09-16
KR20040089688A (en) 2004-10-21
WO2003075096A2 (en) 2003-09-12
EP1483626A2 (en) 2004-12-08
AU2003230593A1 (en) 2003-09-16
JP2005519332A (en) 2005-06-30
WO2003075049A2 (en) 2003-09-12

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