|
US7198055B2
(en)
*
|
2002-09-30 |
2007-04-03 |
Lam Research Corporation |
Meniscus, vacuum, IPA vapor, drying manifold
|
|
SG121819A1
(en)
|
2002-11-12 |
2006-05-26 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
|
US9482966B2
(en)
|
2002-11-12 |
2016-11-01 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US10503084B2
(en)
|
2002-11-12 |
2019-12-10 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
SG121822A1
(en)
*
|
2002-11-12 |
2006-05-26 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
|
KR100585476B1
(ko)
|
2002-11-12 |
2006-06-07 |
에이에스엠엘 네델란즈 비.브이. |
리소그래피 장치 및 디바이스 제조방법
|
|
US7372541B2
(en)
*
|
2002-11-12 |
2008-05-13 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7110081B2
(en)
*
|
2002-11-12 |
2006-09-19 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
DE60335595D1
(de)
*
|
2002-11-12 |
2011-02-17 |
Asml Netherlands Bv |
Lithographischer Apparat mit Immersion und Verfahren zur Herstellung einer Vorrichtung
|
|
EP1571695A4
(en)
|
2002-12-10 |
2008-10-15 |
Nikon Corp |
EXPOSURE DEVICE AND METHOD FOR PRODUCING THE DEVICE
|
|
US7242455B2
(en)
*
|
2002-12-10 |
2007-07-10 |
Nikon Corporation |
Exposure apparatus and method for producing device
|
|
JP4352874B2
(ja)
*
|
2002-12-10 |
2009-10-28 |
株式会社ニコン |
露光装置及びデバイス製造方法
|
|
AU2003289271A1
(en)
*
|
2002-12-10 |
2004-06-30 |
Nikon Corporation |
Exposure apparatus, exposure method and method for manufacturing device
|
|
CN101872135B
(zh)
*
|
2002-12-10 |
2013-07-31 |
株式会社尼康 |
曝光设备和器件制造法
|
|
US7948604B2
(en)
*
|
2002-12-10 |
2011-05-24 |
Nikon Corporation |
Exposure apparatus and method for producing device
|
|
SG171468A1
(en)
*
|
2002-12-10 |
2011-06-29 |
Nikon Corp |
Exposure apparatus and method for producing device
|
|
USRE48515E1
(en)
|
2002-12-19 |
2021-04-13 |
Asml Netherlands B.V. |
Method and device for irradiating spots on a layer
|
|
DE10261775A1
(de)
|
2002-12-20 |
2004-07-01 |
Carl Zeiss Smt Ag |
Vorrichtung zur optischen Vermessung eines Abbildungssystems
|
|
EP2466621B1
(en)
|
2003-02-26 |
2015-04-01 |
Nikon Corporation |
Exposure apparatus, exposure method, and method for producing device
|
|
KR101181688B1
(ko)
|
2003-03-25 |
2012-09-19 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
|
JP4902201B2
(ja)
*
|
2003-04-07 |
2012-03-21 |
株式会社ニコン |
露光装置、露光方法及びデバイス製造方法
|
|
KR20170018113A
(ko)
|
2003-04-09 |
2017-02-15 |
가부시키가이샤 니콘 |
노광 방법 및 장치, 그리고 디바이스 제조 방법
|
|
WO2004093159A2
(en)
|
2003-04-09 |
2004-10-28 |
Nikon Corporation |
Immersion lithography fluid control system
|
|
EP2921905B1
(en)
*
|
2003-04-10 |
2017-12-27 |
Nikon Corporation |
Run-off path to collect liquid for an immersion lithography apparatus
|
|
WO2004090634A2
(en)
*
|
2003-04-10 |
2004-10-21 |
Nikon Corporation |
Environmental system including vaccum scavange for an immersion lithography apparatus
|
|
KR101177330B1
(ko)
*
|
2003-04-10 |
2012-08-30 |
가부시키가이샤 니콘 |
액침 리소그래피 장치
|
|
JP4656057B2
(ja)
*
|
2003-04-10 |
2011-03-23 |
株式会社ニコン |
液浸リソグラフィ装置用電気浸透素子
|
|
WO2004092830A2
(en)
|
2003-04-11 |
2004-10-28 |
Nikon Corporation |
Liquid jet and recovery system for immersion lithography
|
|
KR20170016014A
(ko)
|
2003-04-11 |
2017-02-10 |
가부시키가이샤 니콘 |
액침 리소그래피에 의한 광학기기의 세정방법
|
|
KR101159564B1
(ko)
|
2003-04-11 |
2012-06-25 |
가부시키가이샤 니콘 |
액침 리소그래피 머신에서 웨이퍼 교환동안 투영 렌즈 아래의 갭에서 액침액체를 유지하는 장치 및 방법
|
|
ATE542167T1
(de)
|
2003-04-17 |
2012-02-15 |
Nikon Corp |
Lithographisches immersionsgerät
|
|
TWI295414B
(en)
|
2003-05-13 |
2008-04-01 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
|
CN100437358C
(zh)
*
|
2003-05-15 |
2008-11-26 |
株式会社尼康 |
曝光装置及器件制造方法
|
|
TWI421911B
(zh)
|
2003-05-23 |
2014-01-01 |
尼康股份有限公司 |
An exposure method, an exposure apparatus, and an element manufacturing method
|
|
TWI424470B
(zh)
|
2003-05-23 |
2014-01-21 |
尼康股份有限公司 |
A method of manufacturing an exposure apparatus and an element
|
|
CN100541717C
(zh)
|
2003-05-28 |
2009-09-16 |
株式会社尼康 |
曝光方法、曝光装置以及器件制造方法
|
|
TWI347741B
(en)
*
|
2003-05-30 |
2011-08-21 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
|
US7213963B2
(en)
|
2003-06-09 |
2007-05-08 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7317504B2
(en)
*
|
2004-04-08 |
2008-01-08 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
EP2261742A3
(en)
|
2003-06-11 |
2011-05-25 |
ASML Netherlands BV |
Lithographic apparatus and device manufacturing method.
|
|
KR101520591B1
(ko)
*
|
2003-06-13 |
2015-05-14 |
가부시키가이샤 니콘 |
노광 방법, 기판 스테이지, 노광 장치, 및 디바이스 제조 방법
|
|
TWI515770B
(zh)
|
2003-06-19 |
2016-01-01 |
尼康股份有限公司 |
An exposure apparatus, an exposure method, and an element manufacturing method
|
|
US6867844B2
(en)
*
|
2003-06-19 |
2005-03-15 |
Asml Holding N.V. |
Immersion photolithography system and method using microchannel nozzles
|
|
US6809794B1
(en)
*
|
2003-06-27 |
2004-10-26 |
Asml Holding N.V. |
Immersion photolithography system and method using inverted wafer-projection optics interface
|
|
EP1975721A1
(en)
*
|
2003-06-30 |
2008-10-01 |
ASML Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
WO2005006026A2
(en)
*
|
2003-07-01 |
2005-01-20 |
Nikon Corporation |
Using isotopically specified fluids as optical elements
|
|
EP2466382B1
(en)
*
|
2003-07-08 |
2014-11-26 |
Nikon Corporation |
Wafer table for immersion lithography
|
|
ATE513309T1
(de)
*
|
2003-07-09 |
2011-07-15 |
Nikon Corp |
Belichtungsvorrichtung und verfahren zur bauelementeherstellung
|
|
WO2005006418A1
(ja)
|
2003-07-09 |
2005-01-20 |
Nikon Corporation |
露光装置及びデバイス製造方法
|
|
WO2005006416A1
(ja)
*
|
2003-07-09 |
2005-01-20 |
Nikon Corporation |
結合装置、露光装置、及びデバイス製造方法
|
|
SG109000A1
(en)
*
|
2003-07-16 |
2005-02-28 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
|
EP1500982A1
(en)
|
2003-07-24 |
2005-01-26 |
ASML Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
EP1650787A4
(en)
|
2003-07-25 |
2007-09-19 |
Nikon Corp |
INVESTIGATION METHOD AND INVESTIGATION DEVICE FOR AN OPTICAL PROJECTION SYSTEM AND METHOD OF MANUFACTURING AN OPTICAL PROJECTION SYSTEM
|
|
CN102043350B
(zh)
*
|
2003-07-28 |
2014-01-29 |
株式会社尼康 |
曝光装置、器件制造方法、及曝光装置的控制方法
|
|
EP1503244A1
(en)
|
2003-07-28 |
2005-02-02 |
ASML Netherlands B.V. |
Lithographic projection apparatus and device manufacturing method
|
|
US7326522B2
(en)
|
2004-02-11 |
2008-02-05 |
Asml Netherlands B.V. |
Device manufacturing method and a substrate
|
|
US7779781B2
(en)
|
2003-07-31 |
2010-08-24 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
KR101381563B1
(ko)
|
2003-08-21 |
2014-04-04 |
가부시키가이샤 니콘 |
노광 장치, 노광 방법 및 디바이스 제조 방법
|
|
US8149381B2
(en)
*
|
2003-08-26 |
2012-04-03 |
Nikon Corporation |
Optical element and exposure apparatus
|
|
EP2278402B1
(en)
|
2003-08-26 |
2013-03-06 |
Nikon Corporation |
Exposure apparatus
|
|
CN100407371C
(zh)
*
|
2003-08-29 |
2008-07-30 |
株式会社尼康 |
曝光装置和器件加工方法
|
|
EP2261740B1
(en)
|
2003-08-29 |
2014-07-09 |
ASML Netherlands BV |
Lithographic apparatus
|
|
EP3163375B1
(en)
*
|
2003-08-29 |
2019-01-09 |
Nikon Corporation |
Exposure apparatus and exposure method
|
|
TWI263859B
(en)
*
|
2003-08-29 |
2006-10-11 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
|
TWI245163B
(en)
|
2003-08-29 |
2005-12-11 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
|
KR101523180B1
(ko)
|
2003-09-03 |
2015-05-26 |
가부시키가이샤 니콘 |
액침 리소그래피용 유체를 제공하기 위한 장치 및 방법
|
|
CN100394244C
(zh)
*
|
2003-09-03 |
2008-06-11 |
株式会社尼康 |
为浸没光刻提供流体的装置和方法
|
|
WO2005029559A1
(ja)
*
|
2003-09-19 |
2005-03-31 |
Nikon Corporation |
露光装置及びデバイス製造方法
|
|
KR101664642B1
(ko)
*
|
2003-09-29 |
2016-10-11 |
가부시키가이샤 니콘 |
노광장치, 노광방법 및 디바이스 제조방법
|
|
US7158211B2
(en)
*
|
2003-09-29 |
2007-01-02 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
DE60302897T2
(de)
*
|
2003-09-29 |
2006-08-03 |
Asml Netherlands B.V. |
Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
|
|
JP2005136364A
(ja)
*
|
2003-10-08 |
2005-05-26 |
Zao Nikon Co Ltd |
基板搬送装置、露光装置、並びにデバイス製造方法
|
|
WO2005036621A1
(ja)
|
2003-10-08 |
2005-04-21 |
Zao Nikon Co., Ltd. |
基板搬送装置及び基板搬送方法、露光装置及び露光方法、デバイス製造方法
|
|
EP1672682A4
(en)
|
2003-10-08 |
2008-10-15 |
Zao Nikon Co Ltd |
SUBSTRATE TRANSPORT DEVICE AND METHOD, EXPOSURE DEVICE AND METHOD AND COMPONENT MANUFACTURING METHOD
|
|
TWI598934B
(zh)
|
2003-10-09 |
2017-09-11 |
尼康股份有限公司 |
Exposure apparatus, exposure method, and device manufacturing method
|
|
EP1524558A1
(en)
|
2003-10-15 |
2005-04-20 |
ASML Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
EP1524557A1
(en)
*
|
2003-10-15 |
2005-04-20 |
ASML Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7352433B2
(en)
|
2003-10-28 |
2008-04-01 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
TW201834020A
(zh)
|
2003-10-28 |
2018-09-16 |
日商尼康股份有限公司 |
照明光學裝置、曝光裝置、曝光方法以及元件製造方法
|
|
US7411653B2
(en)
*
|
2003-10-28 |
2008-08-12 |
Asml Netherlands B.V. |
Lithographic apparatus
|
|
JP2005159322A
(ja)
*
|
2003-10-31 |
2005-06-16 |
Nikon Corp |
定盤、ステージ装置及び露光装置並びに露光方法
|
|
CN100461336C
(zh)
|
2003-10-31 |
2009-02-11 |
株式会社尼康 |
曝光装置以及器件制造方法
|
|
US7528929B2
(en)
|
2003-11-14 |
2009-05-05 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
TW201809801A
(zh)
|
2003-11-20 |
2018-03-16 |
日商尼康股份有限公司 |
光學照明裝置、曝光裝置、曝光方法、以及元件製造方法
|
|
US7545481B2
(en)
|
2003-11-24 |
2009-06-09 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US8854602B2
(en)
*
|
2003-11-24 |
2014-10-07 |
Asml Netherlands B.V. |
Holding device for an optical element in an objective
|
|
EP2717295B1
(en)
|
2003-12-03 |
2018-07-18 |
Nikon Corporation |
Exposure apparatus, exposure method, and method for producing a device
|
|
CN1890779B
(zh)
*
|
2003-12-03 |
2011-06-08 |
株式会社尼康 |
曝光装置、曝光方法和器件制造方法
|
|
JP4513534B2
(ja)
*
|
2003-12-03 |
2010-07-28 |
株式会社ニコン |
露光装置及び露光方法、デバイス製造方法
|
|
JP2005175016A
(ja)
*
|
2003-12-08 |
2005-06-30 |
Canon Inc |
基板保持装置およびそれを用いた露光装置ならびにデバイス製造方法
|
|
US20070081133A1
(en)
*
|
2004-12-14 |
2007-04-12 |
Niikon Corporation |
Projection exposure apparatus and stage unit, and exposure method
|
|
DE602004030481D1
(de)
*
|
2003-12-15 |
2011-01-20 |
Nippon Kogaku Kk |
Bühnensystem, belichtungsvorrichtung und belichtungsverfahren
|
|
KR101111363B1
(ko)
*
|
2003-12-15 |
2012-04-12 |
가부시키가이샤 니콘 |
투영노광장치 및 스테이지 장치, 그리고 노광방법
|
|
WO2005059977A1
(ja)
*
|
2003-12-16 |
2005-06-30 |
Nikon Corporation |
ステージ装置、露光装置、及び露光方法
|
|
US7394521B2
(en)
*
|
2003-12-23 |
2008-07-01 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7589818B2
(en)
*
|
2003-12-23 |
2009-09-15 |
Asml Netherlands B.V. |
Lithographic apparatus, alignment apparatus, device manufacturing method, and a method of converting an apparatus
|
|
JP2005191394A
(ja)
*
|
2003-12-26 |
2005-07-14 |
Canon Inc |
露光方法及び装置
|
|
EP3376523A1
(en)
*
|
2004-01-05 |
2018-09-19 |
Nikon Corporation |
Exposure apparatus, exposure method, and device producing method
|
|
JP4572539B2
(ja)
*
|
2004-01-19 |
2010-11-04 |
株式会社ニコン |
露光装置及び露光方法、デバイス製造方法
|
|
CN1938646B
(zh)
|
2004-01-20 |
2010-12-15 |
卡尔蔡司Smt股份公司 |
曝光装置和用于投影透镜的测量装置
|
|
US7589822B2
(en)
|
2004-02-02 |
2009-09-15 |
Nikon Corporation |
Stage drive method and stage unit, exposure apparatus, and device manufacturing method
|
|
EP1713114B1
(en)
|
2004-02-03 |
2018-09-19 |
Nikon Corporation |
Exposure apparatus and device manufacturing method
|
|
EP1713115B1
(en)
*
|
2004-02-04 |
2016-05-04 |
Nikon Corporation |
Exposure apparatus, exposure method, and device producing method
|
|
TWI389174B
(zh)
|
2004-02-06 |
2013-03-11 |
尼康股份有限公司 |
偏光變換元件、光學照明裝置、曝光裝置以及曝光方法
|
|
US7050146B2
(en)
|
2004-02-09 |
2006-05-23 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US20070030467A1
(en)
*
|
2004-02-19 |
2007-02-08 |
Nikon Corporation |
Exposure apparatus, exposure method, and device fabricating method
|
|
JP4797984B2
(ja)
*
|
2004-02-19 |
2011-10-19 |
株式会社ニコン |
露光装置及びデバイス製造方法
|
|
WO2005081063A1
(ja)
*
|
2004-02-20 |
2005-09-01 |
Daikin Industries, Ltd. |
液浸リソグラフィーに用いるレジスト積層体
|
|
JP4973754B2
(ja)
*
|
2004-03-04 |
2012-07-11 |
株式会社ニコン |
露光方法及び露光装置、デバイス製造方法
|
|
JP4622340B2
(ja)
*
|
2004-03-04 |
2011-02-02 |
株式会社ニコン |
露光装置、デバイス製造方法
|
|
JP2005259870A
(ja)
*
|
2004-03-10 |
2005-09-22 |
Nikon Corp |
基板保持装置、ステージ装置及び露光装置並びに露光方法
|
|
EP1737024A4
(en)
*
|
2004-03-25 |
2008-10-15 |
Nikon Corp |
Exposure equipment, exposure method and device manufacturing method
|
|
KR101851511B1
(ko)
|
2004-03-25 |
2018-04-23 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
|
US7034917B2
(en)
*
|
2004-04-01 |
2006-04-25 |
Asml Netherlands B.V. |
Lithographic apparatus, device manufacturing method and device manufactured thereby
|
|
JP2005302880A
(ja)
*
|
2004-04-08 |
2005-10-27 |
Canon Inc |
液浸式露光装置
|
|
US7898642B2
(en)
|
2004-04-14 |
2011-03-01 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7379159B2
(en)
|
2004-05-03 |
2008-05-27 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
EP1747499A2
(en)
|
2004-05-04 |
2007-01-31 |
Nikon Corporation |
Apparatus and method for providing fluid for immersion lithography
|
|
US7616383B2
(en)
|
2004-05-18 |
2009-11-10 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7486381B2
(en)
*
|
2004-05-21 |
2009-02-03 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
JP4517341B2
(ja)
*
|
2004-06-04 |
2010-08-04 |
株式会社ニコン |
露光装置、ノズル部材、及びデバイス製造方法
|
|
EP1774405B1
(en)
|
2004-06-04 |
2014-08-06 |
Carl Zeiss SMT GmbH |
System for measuring the image quality of an optical imaging system
|
|
CN1954408B
(zh)
*
|
2004-06-04 |
2012-07-04 |
尼康股份有限公司 |
曝光装置、曝光方法及元件制造方法
|
|
SG186621A1
(en)
*
|
2004-06-09 |
2013-01-30 |
Nikon Corp |
Substrate holding device, exposure apparatus having same, exposure method, method for producing device, and liquid repellent plate
|
|
WO2005122218A1
(ja)
|
2004-06-09 |
2005-12-22 |
Nikon Corporation |
露光装置及びデバイス製造方法
|
|
JP4826146B2
(ja)
*
|
2004-06-09 |
2011-11-30 |
株式会社ニコン |
露光装置、デバイス製造方法
|
|
KR20070026603A
(ko)
*
|
2004-06-10 |
2007-03-08 |
가부시키가이샤 니콘 |
노광 장치, 노광 방법, 및 디바이스 제조 방법
|
|
JP5130609B2
(ja)
*
|
2004-06-10 |
2013-01-30 |
株式会社ニコン |
露光装置及び露光方法、並びにデバイス製造方法
|
|
US8717533B2
(en)
*
|
2004-06-10 |
2014-05-06 |
Nikon Corporation |
Exposure apparatus, exposure method, and method for producing device
|
|
KR20180072867A
(ko)
|
2004-06-10 |
2018-06-29 |
가부시키가이샤 니콘 |
노광 장치, 노광 방법 및 디바이스 제조 방법
|
|
US8508713B2
(en)
*
|
2004-06-10 |
2013-08-13 |
Nikon Corporation |
Exposure apparatus, exposure method, and method for producing device
|
|
CN101639631B
(zh)
*
|
2004-06-10 |
2012-07-18 |
尼康股份有限公司 |
曝光装置、曝光方法及元件制造方法
|
|
US8373843B2
(en)
|
2004-06-10 |
2013-02-12 |
Nikon Corporation |
Exposure apparatus, exposure method, and method for producing device
|
|
US20070222959A1
(en)
*
|
2004-06-10 |
2007-09-27 |
Nikon Corporation |
Exposure apparatus, exposure method, and method for producing device
|
|
US7481867B2
(en)
*
|
2004-06-16 |
2009-01-27 |
Edwards Limited |
Vacuum system for immersion photolithography
|
|
US8698998B2
(en)
*
|
2004-06-21 |
2014-04-15 |
Nikon Corporation |
Exposure apparatus, method for cleaning member thereof, maintenance method for exposure apparatus, maintenance device, and method for producing device
|
|
EP3098835B1
(en)
*
|
2004-06-21 |
2017-07-26 |
Nikon Corporation |
Exposure apparatus, exposure method and device manufacturing method
|
|
US8368870B2
(en)
|
2004-06-21 |
2013-02-05 |
Nikon Corporation |
Exposure apparatus and device manufacturing method
|
|
US7501226B2
(en)
*
|
2004-06-23 |
2009-03-10 |
Taiwan Semiconductor Manufacturing Co., Ltd. |
Immersion lithography system with wafer sealing mechanisms
|
|
US7517639B2
(en)
*
|
2004-06-23 |
2009-04-14 |
Taiwan Semiconductor Manufacturing Co., Ltd. |
Seal ring arrangements for immersion lithography systems
|
|
US7463330B2
(en)
|
2004-07-07 |
2008-12-09 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
DE102004033208B4
(de)
*
|
2004-07-09 |
2010-04-01 |
Vistec Semiconductor Systems Gmbh |
Vorrichtung zur Inspektion eines mikroskopischen Bauteils mit einem Immersionsobjektiv
|
|
KR101433491B1
(ko)
*
|
2004-07-12 |
2014-08-22 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
|
US7161663B2
(en)
*
|
2004-07-22 |
2007-01-09 |
Asml Netherlands B.V. |
Lithographic apparatus
|
|
CN102998910A
(zh)
*
|
2004-08-03 |
2013-03-27 |
株式会社尼康 |
曝光装置的控制方法、曝光方法及组件制造方法
|
|
US7304715B2
(en)
|
2004-08-13 |
2007-12-04 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
KR20070048164A
(ko)
*
|
2004-08-18 |
2007-05-08 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
|
US7701550B2
(en)
*
|
2004-08-19 |
2010-04-20 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US20060044533A1
(en)
*
|
2004-08-27 |
2006-03-02 |
Asmlholding N.V. |
System and method for reducing disturbances caused by movement in an immersion lithography system
|
|
KR101187611B1
(ko)
*
|
2004-09-01 |
2012-10-08 |
가부시키가이샤 니콘 |
기판 홀더, 스테이지 장치, 및 노광 장치
|
|
US8102512B2
(en)
*
|
2004-09-17 |
2012-01-24 |
Nikon Corporation |
Substrate holding device, exposure apparatus, and device manufacturing method
|
|
US20080318152A1
(en)
*
|
2004-09-17 |
2008-12-25 |
Takeyuki Mizutani |
Substrate for Exposure, Exposure Method and Device Manufacturing Method
|
|
US7522261B2
(en)
*
|
2004-09-24 |
2009-04-21 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7355674B2
(en)
*
|
2004-09-28 |
2008-04-08 |
Asml Netherlands B.V. |
Lithographic apparatus, device manufacturing method and computer program product
|
|
US7894040B2
(en)
|
2004-10-05 |
2011-02-22 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7209213B2
(en)
*
|
2004-10-07 |
2007-04-24 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
EP2426700B1
(en)
*
|
2004-10-15 |
2018-01-10 |
Nikon Corporation |
Exposure apparatus and device manufacturing method
|
|
JP4625673B2
(ja)
*
|
2004-10-15 |
2011-02-02 |
株式会社東芝 |
露光方法及び露光装置
|
|
US7119876B2
(en)
*
|
2004-10-18 |
2006-10-10 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7379155B2
(en)
*
|
2004-10-18 |
2008-05-27 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
WO2006047127A1
(en)
*
|
2004-10-21 |
2006-05-04 |
Saint-Gobain Ceramics & Plastics, Inc. |
Optical lens elements, semiconductor lithographic patterning apparatus, and methods for processing semiconductor devices
|
|
TWI436403B
(zh)
*
|
2004-10-26 |
2014-05-01 |
尼康股份有限公司 |
A cleaning method, a substrate processing method, an exposure apparatus, and an element manufacturing method
|
|
WO2006049134A1
(ja)
|
2004-11-01 |
2006-05-11 |
Nikon Corporation |
露光装置及びデバイス製造方法
|
|
US7583357B2
(en)
*
|
2004-11-12 |
2009-09-01 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7423720B2
(en)
|
2004-11-12 |
2008-09-09 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7251013B2
(en)
|
2004-11-12 |
2007-07-31 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7414699B2
(en)
*
|
2004-11-12 |
2008-08-19 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7411657B2
(en)
|
2004-11-17 |
2008-08-12 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
TWI654661B
(zh)
*
|
2004-11-18 |
2019-03-21 |
Nikon Corporation |
位置測量方法、位置控制方法、測量方法、裝載方法、曝光方法及曝光裝置、及元件製造方法
|
|
US7230681B2
(en)
*
|
2004-11-18 |
2007-06-12 |
International Business Machines Corporation |
Method and apparatus for immersion lithography
|
|
US7362412B2
(en)
*
|
2004-11-18 |
2008-04-22 |
International Business Machines Corporation |
Method and apparatus for cleaning a semiconductor substrate in an immersion lithography system
|
|
EP1814146A4
(en)
*
|
2004-11-19 |
2009-02-11 |
Nikon Corp |
MAINTENANCE METHOD, EXPOSURE METHOD, EXPOSURE DEVICE AND COMPONENT MANUFACTURING METHOD
|
|
US7145630B2
(en)
*
|
2004-11-23 |
2006-12-05 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7256121B2
(en)
*
|
2004-12-02 |
2007-08-14 |
Texas Instruments Incorporated |
Contact resistance reduction by new barrier stack process
|
|
US7161654B2
(en)
*
|
2004-12-02 |
2007-01-09 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7446850B2
(en)
*
|
2004-12-03 |
2008-11-04 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7397533B2
(en)
*
|
2004-12-07 |
2008-07-08 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7248334B2
(en)
*
|
2004-12-07 |
2007-07-24 |
Asml Netherlands B.V. |
Sensor shield
|
|
US7196770B2
(en)
*
|
2004-12-07 |
2007-03-27 |
Asml Netherlands B.V. |
Prewetting of substrate before immersion exposure
|
|
US7365827B2
(en)
|
2004-12-08 |
2008-04-29 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7352440B2
(en)
*
|
2004-12-10 |
2008-04-01 |
Asml Netherlands B.V. |
Substrate placement in immersion lithography
|
|
US7403261B2
(en)
*
|
2004-12-15 |
2008-07-22 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
WO2006064851A1
(ja)
*
|
2004-12-15 |
2006-06-22 |
Nikon Corporation |
基板保持装置、露光装置、及びデバイス製造方法
|
|
JP2006173527A
(ja)
*
|
2004-12-20 |
2006-06-29 |
Sony Corp |
露光装置
|
|
US7528931B2
(en)
|
2004-12-20 |
2009-05-05 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7880860B2
(en)
|
2004-12-20 |
2011-02-01 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7405805B2
(en)
|
2004-12-28 |
2008-07-29 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7491661B2
(en)
*
|
2004-12-28 |
2009-02-17 |
Asml Netherlands B.V. |
Device manufacturing method, top coat material and substrate
|
|
US20060147821A1
(en)
|
2004-12-30 |
2006-07-06 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7450217B2
(en)
*
|
2005-01-12 |
2008-11-11 |
Asml Netherlands B.V. |
Exposure apparatus, coatings for exposure apparatus, lithographic apparatus, device manufacturing method, and device manufactured thereby
|
|
EP1681597B1
(en)
|
2005-01-14 |
2010-03-10 |
ASML Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
SG124351A1
(en)
|
2005-01-14 |
2006-08-30 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
|
JP2006202825A
(ja)
*
|
2005-01-18 |
2006-08-03 |
Jsr Corp |
液浸型露光装置
|
|
WO2006078292A1
(en)
*
|
2005-01-21 |
2006-07-27 |
Nikon Corporation |
Offset partial ring seal in immersion lithographic system
|
|
WO2006080516A1
(ja)
*
|
2005-01-31 |
2006-08-03 |
Nikon Corporation |
露光装置及びデバイス製造方法
|
|
US8692973B2
(en)
*
|
2005-01-31 |
2014-04-08 |
Nikon Corporation |
Exposure apparatus and method for producing device
|
|
CN102360170B
(zh)
|
2005-02-10 |
2014-03-12 |
Asml荷兰有限公司 |
浸没液体、曝光装置及曝光方法
|
|
US20070258068A1
(en)
*
|
2005-02-17 |
2007-11-08 |
Hiroto Horikawa |
Exposure Apparatus, Exposure Method, and Device Fabricating Method
|
|
US7378025B2
(en)
|
2005-02-22 |
2008-05-27 |
Asml Netherlands B.V. |
Fluid filtration method, fluid filtered thereby, lithographic apparatus and device manufacturing method
|
|
US8018573B2
(en)
*
|
2005-02-22 |
2011-09-13 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7224431B2
(en)
*
|
2005-02-22 |
2007-05-29 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7282701B2
(en)
|
2005-02-28 |
2007-10-16 |
Asml Netherlands B.V. |
Sensor for use in a lithographic apparatus
|
|
JP2006270057A
(ja)
*
|
2005-02-28 |
2006-10-05 |
Canon Inc |
露光装置
|
|
US7428038B2
(en)
|
2005-02-28 |
2008-09-23 |
Asml Netherlands B.V. |
Lithographic apparatus, device manufacturing method and apparatus for de-gassing a liquid
|
|
US7324185B2
(en)
|
2005-03-04 |
2008-01-29 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7684010B2
(en)
*
|
2005-03-09 |
2010-03-23 |
Asml Netherlands B.V. |
Lithographic apparatus, device manufacturing method, seal structure, method of removing an object and a method of sealing
|
|
TWI424260B
(zh)
*
|
2005-03-18 |
2014-01-21 |
尼康股份有限公司 |
A board member, a substrate holding device, an exposure apparatus and an exposure method, and a device manufacturing method
|
|
US7330238B2
(en)
*
|
2005-03-28 |
2008-02-12 |
Asml Netherlands, B.V. |
Lithographic apparatus, immersion projection apparatus and device manufacturing method
|
|
US7411654B2
(en)
|
2005-04-05 |
2008-08-12 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7291850B2
(en)
*
|
2005-04-08 |
2007-11-06 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
USRE43576E1
(en)
|
2005-04-08 |
2012-08-14 |
Asml Netherlands B.V. |
Dual stage lithographic apparatus and device manufacturing method
|
|
US20060232753A1
(en)
*
|
2005-04-19 |
2006-10-19 |
Asml Holding N.V. |
Liquid immersion lithography system with tilted liquid flow
|
|
WO2006115186A1
(ja)
|
2005-04-25 |
2006-11-02 |
Nikon Corporation |
露光方法及び露光装置、並びにデバイス製造方法
|
|
JP4752320B2
(ja)
*
|
2005-04-28 |
2011-08-17 |
株式会社ニコン |
基板保持装置及び露光装置、基板保持方法、露光方法、並びにデバイス製造方法
|
|
US8236467B2
(en)
|
2005-04-28 |
2012-08-07 |
Nikon Corporation |
Exposure method, exposure apparatus, and device manufacturing method
|
|
US8248577B2
(en)
*
|
2005-05-03 |
2012-08-21 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7317507B2
(en)
*
|
2005-05-03 |
2008-01-08 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7433016B2
(en)
|
2005-05-03 |
2008-10-07 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
EP2660854B1
(en)
|
2005-05-12 |
2017-06-21 |
Nikon Corporation |
Projection optical system, exposure apparatus and exposure method
|
|
JP2006339448A
(ja)
|
2005-06-02 |
2006-12-14 |
Canon Inc |
受光ユニットを有する露光装置
|
|
US7751027B2
(en)
|
2005-06-21 |
2010-07-06 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7652746B2
(en)
*
|
2005-06-21 |
2010-01-26 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
JP4708876B2
(ja)
*
|
2005-06-21 |
2011-06-22 |
キヤノン株式会社 |
液浸露光装置
|
|
US7834974B2
(en)
|
2005-06-28 |
2010-11-16 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7468779B2
(en)
*
|
2005-06-28 |
2008-12-23 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7474379B2
(en)
*
|
2005-06-28 |
2009-01-06 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7170583B2
(en)
*
|
2005-06-29 |
2007-01-30 |
Asml Netherlands B.V. |
Lithographic apparatus immersion damage control
|
|
US7535644B2
(en)
*
|
2005-08-12 |
2009-05-19 |
Asml Netherlands B.V. |
Lens element, lithographic apparatus, device manufacturing method, and device manufactured thereby
|
|
US8054445B2
(en)
*
|
2005-08-16 |
2011-11-08 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7751026B2
(en)
*
|
2005-08-25 |
2010-07-06 |
Nikon Corporation |
Apparatus and method for recovering fluid for immersion lithography
|
|
US8202460B2
(en)
*
|
2005-09-22 |
2012-06-19 |
International Business Machines Corporation |
Microelectronic substrate having removable edge extension element
|
|
US7357768B2
(en)
*
|
2005-09-22 |
2008-04-15 |
William Marshall |
Recliner exerciser
|
|
JP3997244B2
(ja)
*
|
2005-10-04 |
2007-10-24 |
キヤノン株式会社 |
露光装置及びデバイス製造方法
|
|
JP3997245B2
(ja)
*
|
2005-10-04 |
2007-10-24 |
キヤノン株式会社 |
露光装置及びデバイス製造方法
|
|
US7411658B2
(en)
|
2005-10-06 |
2008-08-12 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
JP4125315B2
(ja)
*
|
2005-10-11 |
2008-07-30 |
キヤノン株式会社 |
露光装置及びデバイス製造方法
|
|
JP2007123525A
(ja)
*
|
2005-10-27 |
2007-05-17 |
Toshiba Corp |
液浸露光装置及び半導体装置の製造方法
|
|
WO2007055237A1
(ja)
*
|
2005-11-09 |
2007-05-18 |
Nikon Corporation |
露光装置及び露光方法、並びにデバイス製造方法
|
|
US7804577B2
(en)
|
2005-11-16 |
2010-09-28 |
Asml Netherlands B.V. |
Lithographic apparatus
|
|
US7864292B2
(en)
*
|
2005-11-16 |
2011-01-04 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7656501B2
(en)
*
|
2005-11-16 |
2010-02-02 |
Asml Netherlands B.V. |
Lithographic apparatus
|
|
US7633073B2
(en)
|
2005-11-23 |
2009-12-15 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7773195B2
(en)
*
|
2005-11-29 |
2010-08-10 |
Asml Holding N.V. |
System and method to increase surface tension and contact angle in immersion lithography
|
|
US8125610B2
(en)
*
|
2005-12-02 |
2012-02-28 |
ASML Metherlands B.V. |
Method for preventing or reducing contamination of an immersion type projection apparatus and an immersion type lithographic apparatus
|
|
US20070124987A1
(en)
*
|
2005-12-05 |
2007-06-07 |
Brown Jeffrey K |
Electronic pest control apparatus
|
|
KR100768849B1
(ko)
*
|
2005-12-06 |
2007-10-22 |
엘지전자 주식회사 |
계통 연계형 연료전지 시스템의 전원공급장치 및 방법
|
|
EP2768016B1
(en)
|
2005-12-08 |
2017-10-25 |
Nikon Corporation |
Exposure apparatus and method
|
|
US7420194B2
(en)
|
2005-12-27 |
2008-09-02 |
Asml Netherlands B.V. |
Lithographic apparatus and substrate edge seal
|
|
US7839483B2
(en)
*
|
2005-12-28 |
2010-11-23 |
Asml Netherlands B.V. |
Lithographic apparatus, device manufacturing method and a control system
|
|
US7649611B2
(en)
|
2005-12-30 |
2010-01-19 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
JPWO2007083592A1
(ja)
*
|
2006-01-17 |
2009-06-11 |
株式会社ニコン |
基板保持装置及び露光装置、並びにデバイス製造方法
|
|
US7446859B2
(en)
*
|
2006-01-27 |
2008-11-04 |
International Business Machines Corporation |
Apparatus and method for reducing contamination in immersion lithography
|
|
JP2007201252A
(ja)
*
|
2006-01-27 |
2007-08-09 |
Canon Inc |
露光装置及びデバイス製造方法
|
|
US20070177119A1
(en)
*
|
2006-02-02 |
2007-08-02 |
Keiko Chiba |
Exposure apparatus and device manufacturing method
|
|
US20070182943A1
(en)
*
|
2006-02-06 |
2007-08-09 |
Francis Goodwin |
Debris apparatus, system, and method
|
|
US7787101B2
(en)
*
|
2006-02-16 |
2010-08-31 |
International Business Machines Corporation |
Apparatus and method for reducing contamination in immersion lithography
|
|
US7893047B2
(en)
*
|
2006-03-03 |
2011-02-22 |
Arch Chemicals, Inc. |
Biocide composition comprising pyrithione and pyrrole derivatives
|
|
US8045134B2
(en)
|
2006-03-13 |
2011-10-25 |
Asml Netherlands B.V. |
Lithographic apparatus, control system and device manufacturing method
|
|
US7310132B2
(en)
*
|
2006-03-17 |
2007-12-18 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7760324B2
(en)
*
|
2006-03-20 |
2010-07-20 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
JP2007266074A
(ja)
*
|
2006-03-27 |
2007-10-11 |
Toshiba Corp |
半導体装置の製造方法及び液浸リソグラフィーシステム
|
|
US8027019B2
(en)
*
|
2006-03-28 |
2011-09-27 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
JP2007266504A
(ja)
|
2006-03-29 |
2007-10-11 |
Canon Inc |
露光装置
|
|
EP1843206B1
(en)
*
|
2006-04-06 |
2012-09-05 |
ASML Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US9477158B2
(en)
|
2006-04-14 |
2016-10-25 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
DE102006021797A1
(de)
*
|
2006-05-09 |
2007-11-15 |
Carl Zeiss Smt Ag |
Optische Abbildungseinrichtung mit thermischer Dämpfung
|
|
US8144305B2
(en)
*
|
2006-05-18 |
2012-03-27 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7969548B2
(en)
*
|
2006-05-22 |
2011-06-28 |
Asml Netherlands B.V. |
Lithographic apparatus and lithographic apparatus cleaning method
|
|
TW200818256A
(en)
*
|
2006-05-22 |
2008-04-16 |
Nikon Corp |
Exposure method and apparatus, maintenance method, and device manufacturing method
|
|
US20070273856A1
(en)
|
2006-05-25 |
2007-11-29 |
Nikon Corporation |
Apparatus and methods for inhibiting immersion liquid from flowing below a substrate
|
|
JP2008034801A
(ja)
*
|
2006-06-30 |
2008-02-14 |
Canon Inc |
露光装置およびデバイス製造方法
|
|
WO2008026593A1
(en)
|
2006-08-30 |
2008-03-06 |
Nikon Corporation |
Exposure apparatus, device production method, cleaning method, and cleaning member
|
|
WO2008029884A1
(en)
*
|
2006-09-08 |
2008-03-13 |
Nikon Corporation |
Cleaning member, cleaning method and device manufacturing method
|
|
US7946303B2
(en)
|
2006-09-29 |
2011-05-24 |
Lam Research Corporation |
Carrier for reducing entrance and/or exit marks left by a substrate-processing meniscus
|
|
US20080100812A1
(en)
*
|
2006-10-26 |
2008-05-01 |
Nikon Corporation |
Immersion lithography system and method having a wafer chuck made of a porous material
|
|
US8208116B2
(en)
*
|
2006-11-03 |
2012-06-26 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Immersion lithography system using a sealed wafer bath
|
|
US8253922B2
(en)
|
2006-11-03 |
2012-08-28 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Immersion lithography system using a sealed wafer bath
|
|
US8237085B2
(en)
*
|
2006-11-17 |
2012-08-07 |
Semiconductor Energy Laboratory Co., Ltd. |
Beam homogenizer, laser irradiation apparatus, and laser irradiation method
|
|
US8045135B2
(en)
*
|
2006-11-22 |
2011-10-25 |
Asml Netherlands B.V. |
Lithographic apparatus with a fluid combining unit and related device manufacturing method
|
|
US8013975B2
(en)
*
|
2006-12-01 |
2011-09-06 |
Nikon Corporation |
Exposure apparatus, exposure method, and method for producing device
|
|
US20080156356A1
(en)
|
2006-12-05 |
2008-07-03 |
Nikon Corporation |
Cleaning liquid, cleaning method, liquid generating apparatus, exposure apparatus, and device fabricating method
|
|
US9632425B2
(en)
*
|
2006-12-07 |
2017-04-25 |
Asml Holding N.V. |
Lithographic apparatus, a dryer and a method of removing liquid from a surface
|
|
US8634053B2
(en)
|
2006-12-07 |
2014-01-21 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US20080137055A1
(en)
*
|
2006-12-08 |
2008-06-12 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US7791709B2
(en)
*
|
2006-12-08 |
2010-09-07 |
Asml Netherlands B.V. |
Substrate support and lithographic process
|
|
JP2008147577A
(ja)
*
|
2006-12-13 |
2008-06-26 |
Canon Inc |
露光装置及びデバイス製造方法
|
|
US8634052B2
(en)
|
2006-12-13 |
2014-01-21 |
Asml Netherlands B.V. |
Lithographic apparatus and method involving a ring to cover a gap between a substrate and a substrate table
|
|
US8416383B2
(en)
|
2006-12-13 |
2013-04-09 |
Asml Netherlands B.V. |
Lithographic apparatus and method
|
|
US7755740B2
(en)
*
|
2007-02-07 |
2010-07-13 |
Canon Kabushiki Kaisha |
Exposure apparatus
|
|
US8817226B2
(en)
|
2007-02-15 |
2014-08-26 |
Asml Holding N.V. |
Systems and methods for insitu lens cleaning using ozone in immersion lithography
|
|
US8654305B2
(en)
|
2007-02-15 |
2014-02-18 |
Asml Holding N.V. |
Systems and methods for insitu lens cleaning in immersion lithography
|
|
US20080198348A1
(en)
*
|
2007-02-20 |
2008-08-21 |
Nikon Corporation |
Apparatus and methods for minimizing force variation from immersion liquid in lithography systems
|
|
US7692765B2
(en)
*
|
2007-02-21 |
2010-04-06 |
Asml Netherlands B.V. |
Lithographic apparatus and method of removing liquid
|
|
US8760621B2
(en)
|
2007-03-12 |
2014-06-24 |
Asml Netherlands B.V. |
Lithographic apparatus and method
|
|
US8237911B2
(en)
*
|
2007-03-15 |
2012-08-07 |
Nikon Corporation |
Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine
|
|
US7900641B2
(en)
*
|
2007-05-04 |
2011-03-08 |
Asml Netherlands B.V. |
Cleaning device and a lithographic apparatus cleaning method
|
|
US8947629B2
(en)
*
|
2007-05-04 |
2015-02-03 |
Asml Netherlands B.V. |
Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
|
|
US8011377B2
(en)
|
2007-05-04 |
2011-09-06 |
Asml Netherlands B.V. |
Cleaning device and a lithographic apparatus cleaning method
|
|
US7866330B2
(en)
*
|
2007-05-04 |
2011-01-11 |
Asml Netherlands B.V. |
Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
|
|
KR20100031694A
(ko)
|
2007-05-28 |
2010-03-24 |
가부시키가이샤 니콘 |
노광 장치, 디바이스 제조 방법, 세정 장치, 및 클리닝 방법 그리고 노광 방법
|
|
US8514365B2
(en)
*
|
2007-06-01 |
2013-08-20 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US20080304025A1
(en)
*
|
2007-06-08 |
2008-12-11 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Apparatus and method for immersion lithography
|
|
US8264662B2
(en)
*
|
2007-06-18 |
2012-09-11 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
In-line particle detection for immersion lithography
|
|
US20090009733A1
(en)
*
|
2007-07-06 |
2009-01-08 |
Canon Kabushiki Kaisha |
Exposure apparatus
|
|
US8705010B2
(en)
*
|
2007-07-13 |
2014-04-22 |
Mapper Lithography Ip B.V. |
Lithography system, method of clamping and wafer table
|
|
TWI450047B
(zh)
*
|
2007-07-13 |
2014-08-21 |
瑪波微影Ip公司 |
微影系統、夾緊方法及晶圓台
|
|
JP4961299B2
(ja)
*
|
2007-08-08 |
2012-06-27 |
キヤノン株式会社 |
露光装置およびデバイス製造方法
|
|
US8144309B2
(en)
*
|
2007-09-05 |
2012-03-27 |
Asml Netherlands B.V. |
Imprint lithography
|
|
US8681308B2
(en)
*
|
2007-09-13 |
2014-03-25 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
|
US8451427B2
(en)
|
2007-09-14 |
2013-05-28 |
Nikon Corporation |
Illumination optical system, exposure apparatus, optical element and manufacturing method thereof, and device manufacturing method
|
|
NL1035942A1
(nl)
*
|
2007-09-27 |
2009-03-30 |
Asml Netherlands Bv |
Lithographic Apparatus and Method of Cleaning a Lithographic Apparatus.
|
|
JP5267029B2
(ja)
|
2007-10-12 |
2013-08-21 |
株式会社ニコン |
照明光学装置、露光装置及びデバイスの製造方法
|
|
CN101681123B
(zh)
|
2007-10-16 |
2013-06-12 |
株式会社尼康 |
照明光学系统、曝光装置以及元件制造方法
|
|
SG185313A1
(en)
|
2007-10-16 |
2012-11-29 |
Nikon Corp |
Illumination optical system, exposure apparatus, and device manufacturing method
|
|
US8379187B2
(en)
|
2007-10-24 |
2013-02-19 |
Nikon Corporation |
Optical unit, illumination optical apparatus, exposure apparatus, and device manufacturing method
|
|
US9116346B2
(en)
|
2007-11-06 |
2015-08-25 |
Nikon Corporation |
Illumination apparatus, illumination method, exposure apparatus, and device manufacturing method
|
|
NL1036187A1
(nl)
*
|
2007-12-03 |
2009-06-04 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method.
|
|
NL1036186A1
(nl)
*
|
2007-12-03 |
2009-06-04 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method.
|
|
NL1036211A1
(nl)
|
2007-12-03 |
2009-06-04 |
Asml Netherlands Bv |
Lithographic Apparatus and Device Manufacturing Method.
|
|
NL1036194A1
(nl)
*
|
2007-12-03 |
2009-06-04 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method.
|
|
JP5369443B2
(ja)
|
2008-02-05 |
2013-12-18 |
株式会社ニコン |
ステージ装置、露光装置、露光方法、及びデバイス製造方法
|
|
US20090218743A1
(en)
*
|
2008-02-29 |
2009-09-03 |
Nikon Corporation |
Substrate holding apparatus, exposure apparatus, exposing method, device fabricating method, plate member, and wall
|
|
KR101448152B1
(ko)
*
|
2008-03-26 |
2014-10-07 |
삼성전자주식회사 |
수직 포토게이트를 구비한 거리측정 센서 및 그를 구비한입체 컬러 이미지 센서
|
|
NL1036709A1
(nl)
*
|
2008-04-24 |
2009-10-27 |
Asml Netherlands Bv |
Lithographic apparatus and a method of operating the apparatus.
|
|
EP2282188B1
(en)
|
2008-05-28 |
2015-03-11 |
Nikon Corporation |
Illumination optical system and exposure apparatus
|
|
EP2131242A1
(en)
*
|
2008-06-02 |
2009-12-09 |
ASML Netherlands B.V. |
Substrate table, lithographic apparatus and device manufacturing method
|
|
NL1036924A1
(nl)
*
|
2008-06-02 |
2009-12-03 |
Asml Netherlands Bv |
Substrate table, lithographic apparatus and device manufacturing method.
|
|
NL2003363A
(en)
*
|
2008-09-10 |
2010-03-15 |
Asml Netherlands Bv |
Lithographic apparatus, method of manufacturing an article for a lithographic apparatus and device manufacturing method.
|
|
NL2003470A
(en)
*
|
2008-10-07 |
2010-04-08 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method.
|
|
US8634055B2
(en)
*
|
2008-10-22 |
2014-01-21 |
Nikon Corporation |
Apparatus and method to control vacuum at porous material using multiple porous materials
|
|
US8477284B2
(en)
*
|
2008-10-22 |
2013-07-02 |
Nikon Corporation |
Apparatus and method to control vacuum at porous material using multiple porous materials
|
|
NL2003575A
(en)
*
|
2008-10-29 |
2010-05-03 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method.
|
|
NL2003638A
(en)
|
2008-12-03 |
2010-06-07 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method.
|
|
JP2010140958A
(ja)
*
|
2008-12-09 |
2010-06-24 |
Canon Inc |
露光装置及びデバイス製造方法
|
|
EP2196857A3
(en)
*
|
2008-12-09 |
2010-07-21 |
ASML Netherlands BV |
Lithographic apparatus and device manufacturing method
|
|
NL2004807A
(en)
*
|
2009-06-30 |
2011-01-04 |
Asml Netherlands Bv |
Substrate table for a lithographic apparatus, litographic apparatus, method of using a substrate table and device manufacturing method.
|
|
US8913230B2
(en)
*
|
2009-07-02 |
2014-12-16 |
Canon Nanotechnologies, Inc. |
Chucking system with recessed support feature
|
|
DE102010038748A1
(de)
|
2009-08-07 |
2011-03-24 |
Carl Zeiss Smt Gmbh |
Verfahren zur Herstellung eines Spiegels mit wenigstens zwei Spiegelflächen, Spiegel einer Projektionsbelichtungsanlage der Mikrolithographie und Projektionsbelichtungsanlage
|
|
NL2005126A
(en)
*
|
2009-09-21 |
2011-03-22 |
Asml Netherlands Bv |
Lithographic apparatus, coverplate and device manufacturing method.
|
|
NL2005207A
(en)
*
|
2009-09-28 |
2011-03-29 |
Asml Netherlands Bv |
Heat pipe, lithographic apparatus and device manufacturing method.
|
|
NL1038213C2
(en)
*
|
2010-03-04 |
2012-10-08 |
Mapper Lithography Ip Bv |
Substrate support structure, clamp preparation unit, and lithography system.
|
|
NL2006244A
(en)
*
|
2010-03-16 |
2011-09-19 |
Asml Netherlands Bv |
Lithographic apparatus, cover for use in a lithographic apparatus and method for designing a cover for use in a lithographic apparatus.
|
|
NL2006203A
(en)
*
|
2010-03-16 |
2011-09-19 |
Asml Netherlands Bv |
Cover for a substrate table, substrate table for a lithographic apparatus, lithographic apparatus, and device manufacturing method.
|
|
EP2381310B1
(en)
|
2010-04-22 |
2015-05-06 |
ASML Netherlands BV |
Fluid handling structure and lithographic apparatus
|
|
JP5313293B2
(ja)
|
2010-05-19 |
2013-10-09 |
エーエスエムエル ネザーランズ ビー.ブイ. |
リソグラフィ装置、リソグラフィ装置で使用する流体ハンドリング構造およびデバイス製造方法
|
|
NL2007768A
(en)
|
2010-12-14 |
2012-06-18 |
Asml Netherlands Bv |
Substrate holder, lithographic apparatus, device manufacturing method, and method of manufacturing a substrate holder.
|
|
JP2012134290A
(ja)
*
|
2010-12-21 |
2012-07-12 |
Nikon Corp |
露光装置、露光装置のステージ製造方法及びデバイス製造方法
|
|
NL2007802A
(en)
|
2010-12-21 |
2012-06-25 |
Asml Netherlands Bv |
A substrate table, a lithographic apparatus and a device manufacturing method.
|
|
NL2008980A
(en)
|
2011-07-11 |
2013-01-14 |
Asml Netherlands Bv |
A fluid handling structure, a lithographic apparatus and a device manufacturing method.
|
|
NL2008979A
(en)
|
2011-07-11 |
2013-01-14 |
Asml Netherlands Bv |
A fluid handling structure, a lithographic apparatus and a device manufacturing method.
|
|
JP5778093B2
(ja)
|
2011-08-10 |
2015-09-16 |
エーエスエムエル ネザーランズ ビー.ブイ. |
基板テーブルアセンブリ、液浸リソグラフィ装置及びデバイス製造方法
|
|
KR101979893B1
(ko)
|
2012-05-29 |
2019-05-17 |
에이에스엠엘 네델란즈 비.브이. |
대상물 홀더 및 리소그래피 장치
|
|
JP5973064B2
(ja)
*
|
2012-05-29 |
2016-08-23 |
エーエスエムエル ネザーランズ ビー.ブイ. |
支持装置、リソグラフィ装置及びデバイス製造方法
|
|
JP2014045090A
(ja)
*
|
2012-08-27 |
2014-03-13 |
Toshiba Corp |
液浸露光装置
|
|
JP6171293B2
(ja)
*
|
2012-09-13 |
2017-08-02 |
株式会社ニコン |
露光装置及びデバイス製造方法
|
|
US9177849B2
(en)
*
|
2012-12-18 |
2015-11-03 |
Intermolecular, Inc. |
Chuck for mounting a semiconductor wafer for liquid immersion processing
|
|
US9583363B2
(en)
*
|
2012-12-31 |
2017-02-28 |
Sunedison Semiconductor Limited (Uen201334164H) |
Processes and apparatus for preparing heterostructures with reduced strain by radial distension
|
|
JP6400120B2
(ja)
*
|
2014-12-12 |
2018-10-03 |
キヤノン株式会社 |
基板保持装置、リソグラフィ装置、及び物品の製造方法
|
|
EP3387491B1
(en)
*
|
2015-12-08 |
2020-01-01 |
ASML Netherlands B.V. |
Substrate table, lithographic apparatus and method of operating a lithographic apparatus
|
|
NL2017698A
(en)
*
|
2015-12-15 |
2017-06-26 |
Asml Netherlands Bv |
A Substrate Holder, a Lithographic Apparatus and Method of Manufacturing Devices
|
|
WO2017194247A1
(en)
|
2016-05-12 |
2017-11-16 |
Asml Netherlands B.V. |
Extraction body for lithographic apparatus
|
|
US10978332B2
(en)
*
|
2016-10-05 |
2021-04-13 |
Prilit Optronics, Inc. |
Vacuum suction apparatus
|
|
JP6477793B2
(ja)
*
|
2017-07-05 |
2019-03-06 |
株式会社ニコン |
露光装置及びデバイス製造方法
|
|
WO2019072504A1
(en)
*
|
2017-10-12 |
2019-04-18 |
Asml Netherlands B.V. |
SUBSTRATE CARRIER FOR USE IN A LITHOGRAPHIC APPARATUS
|
|
US10907787B2
(en)
|
2018-10-18 |
2021-02-02 |
Marche International Llc |
Light engine and method of simulating a flame
|
|
JP2019070861A
(ja)
*
|
2019-02-06 |
2019-05-09 |
株式会社ニコン |
露光装置及び露光方法並びにデバイス製造方法
|
|
CN112304572B
(zh)
*
|
2019-07-30 |
2022-01-28 |
华为技术有限公司 |
波前标定方法和装置
|
|
WO2023143909A1
(en)
*
|
2022-01-31 |
2023-08-03 |
Asml Netherlands B.V. |
Substrate table, lithographic apparatus, sticker, cover ring and method of operating a lithographic apparatus
|
|
EP4689795A1
(en)
*
|
2023-04-05 |
2026-02-11 |
ASML Netherlands B.V. |
Cover ring, substrate support and lithographic apparatus
|