CN1573564B - 光刻装置和器件制造方法 - Google Patents

光刻装置和器件制造方法 Download PDF

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Publication number
CN1573564B
CN1573564B CN2004100476989A CN200410047698A CN1573564B CN 1573564 B CN1573564 B CN 1573564B CN 2004100476989 A CN2004100476989 A CN 2004100476989A CN 200410047698 A CN200410047698 A CN 200410047698A CN 1573564 B CN1573564 B CN 1573564B
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China
Prior art keywords
sensor
substrate
radiation
liquid
edge seal
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Expired - Lifetime
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CN2004100476989A
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English (en)
Chinese (zh)
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CN1573564A (zh
Inventor
J·洛夫
H·布特勒
S·N·L·当德斯
A·科勒斯辰科
E·R·鲁普斯特拉
H·J·M·梅杰
J·C·H·穆肯斯
R·A·S·里特塞马
F·范沙克
T·F·森格斯
K·西蒙
J·T·德斯米特
A·斯特拉艾杰
B·斯特里科克
E·T·M·比拉尔特
C·A·胡根达姆
H·范桑坦
M·A·范德科霍夫
M·克鲁恩
A·J·登博夫
J·J·奥坦斯
J·J·S·M·梅坦斯
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ASML Holding NV
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ASML Holding NV
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Publication date
Priority claimed from EP03257068.1A external-priority patent/EP1429188B1/en
Application filed by ASML Holding NV filed Critical ASML Holding NV
Publication of CN1573564A publication Critical patent/CN1573564A/zh
Application granted granted Critical
Publication of CN1573564B publication Critical patent/CN1573564B/zh
Anticipated expiration legal-status Critical
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
CN2004100476989A 2003-06-09 2004-06-09 光刻装置和器件制造方法 Expired - Lifetime CN1573564B (zh)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
EP03253636 2003-06-09
EP03253636.9 2003-06-09
EP03255395.0 2003-08-29
EP03255395 2003-08-29
EP03257068.1A EP1429188B1 (en) 2002-11-12 2003-11-10 Lithographic projection apparatus
EP03257068.1 2003-11-10

Related Child Applications (1)

Application Number Title Priority Date Filing Date
CN2011100833350A Division CN102147574B (zh) 2003-06-09 2004-06-09 光刻装置和器件制造方法

Publications (2)

Publication Number Publication Date
CN1573564A CN1573564A (zh) 2005-02-02
CN1573564B true CN1573564B (zh) 2011-05-18

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Family Applications (2)

Application Number Title Priority Date Filing Date
CN2011100833350A Expired - Lifetime CN102147574B (zh) 2003-06-09 2004-06-09 光刻装置和器件制造方法
CN2004100476989A Expired - Lifetime CN1573564B (zh) 2003-06-09 2004-06-09 光刻装置和器件制造方法

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Application Number Title Priority Date Filing Date
CN2011100833350A Expired - Lifetime CN102147574B (zh) 2003-06-09 2004-06-09 光刻装置和器件制造方法

Country Status (6)

Country Link
US (8) US7213963B2 (enExample)
JP (7) JP4199699B2 (enExample)
KR (1) KR100683263B1 (enExample)
CN (2) CN102147574B (enExample)
SG (2) SG116555A1 (enExample)
TW (2) TWI424275B (enExample)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US8629418B2 (en) 2005-02-28 2014-01-14 Asml Netherlands B.V. Lithographic apparatus and sensor therefor

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