ATE441937T1 - Belichtungsgerät und bauelemente- herstellungsverfahren - Google Patents

Belichtungsgerät und bauelemente- herstellungsverfahren

Info

Publication number
ATE441937T1
ATE441937T1 AT05758280T AT05758280T ATE441937T1 AT E441937 T1 ATE441937 T1 AT E441937T1 AT 05758280 T AT05758280 T AT 05758280T AT 05758280 T AT05758280 T AT 05758280T AT E441937 T1 ATE441937 T1 AT E441937T1
Authority
AT
Austria
Prior art keywords
production method
exposure device
component production
liquid
base member
Prior art date
Application number
AT05758280T
Other languages
English (en)
Inventor
Makoto Shibuta
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Family has litigation
First worldwide family litigation filed litigation Critical https://patents.darts-ip.com/?family=35783905&utm_source=google_patent&utm_medium=platform_link&utm_campaign=public_patent_search&patent=ATE441937(T1) "Global patent litigation dataset” by Darts-ip is licensed under a Creative Commons Attribution 4.0 International License.
Application filed by Nikon Corp filed Critical Nikon Corp
Application granted granted Critical
Publication of ATE441937T1 publication Critical patent/ATE441937T1/de

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
    • G03F7/70916—Pollution mitigation, i.e. mitigating effect of contamination or debris, e.g. foil traps

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Health & Medical Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
  • Magnetic Heads (AREA)
  • Looms (AREA)
  • Crystals, And After-Treatments Of Crystals (AREA)
AT05758280T 2004-07-12 2005-07-11 Belichtungsgerät und bauelemente- herstellungsverfahren ATE441937T1 (de)

Applications Claiming Priority (2)

Application Number Priority Date Filing Date Title
JP2004205009 2004-07-12
PCT/JP2005/012776 WO2006006565A1 (ja) 2004-07-12 2005-07-11 露光装置及びデバイス製造方法

Publications (1)

Publication Number Publication Date
ATE441937T1 true ATE441937T1 (de) 2009-09-15

Family

ID=35783905

Family Applications (1)

Application Number Title Priority Date Filing Date
AT05758280T ATE441937T1 (de) 2004-07-12 2005-07-11 Belichtungsgerät und bauelemente- herstellungsverfahren

Country Status (7)

Country Link
US (3) US8384874B2 (de)
EP (1) EP1780772B1 (de)
JP (4) JP4894515B2 (de)
KR (3) KR101342330B1 (de)
AT (1) ATE441937T1 (de)
DE (1) DE602005016429D1 (de)
WO (1) WO2006006565A1 (de)

Families Citing this family (9)

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JP5295855B2 (ja) * 2009-04-28 2013-09-18 住友重機械工業株式会社 反力処理機構
US9862168B2 (en) 2011-01-27 2018-01-09 Nippon Steel & Sumikin Stainless Steel Corporation Alloying element-saving hot rolled duplex stainless steel material, clad steel plate having duplex stainless steel as cladding material therefor, and production method for same
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US10649347B2 (en) 2013-10-29 2020-05-12 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
JP6286024B2 (ja) * 2014-03-07 2018-02-28 富士フイルム株式会社 トランジスタの製造方法

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