FR2890742B1 - Equipement et procede de surveillance d'un dispositif lithographique a immersion. - Google Patents

Equipement et procede de surveillance d'un dispositif lithographique a immersion.

Info

Publication number
FR2890742B1
FR2890742B1 FR0509269A FR0509269A FR2890742B1 FR 2890742 B1 FR2890742 B1 FR 2890742B1 FR 0509269 A FR0509269 A FR 0509269A FR 0509269 A FR0509269 A FR 0509269A FR 2890742 B1 FR2890742 B1 FR 2890742B1
Authority
FR
France
Prior art keywords
monitoring
equipment
immersion device
lithographic
lithographic immersion
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0509269A
Other languages
English (en)
Other versions
FR2890742A1 (fr
Inventor
Jean Philippe Piel
Jean Louis Stehle
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
PRODUCTION ET DE RECH S APPLIQ
Original Assignee
PRODUCTION ET DE RECH S APPLIQ
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by PRODUCTION ET DE RECH S APPLIQ filed Critical PRODUCTION ET DE RECH S APPLIQ
Priority to FR0509269A priority Critical patent/FR2890742B1/fr
Priority to JP2008530562A priority patent/JP2009508348A/ja
Priority to PCT/FR2006/002077 priority patent/WO2007031630A1/fr
Priority to US11/991,613 priority patent/US7714992B2/en
Priority to EP06808103A priority patent/EP1931968A1/fr
Priority to KR1020087005964A priority patent/KR20080050410A/ko
Publication of FR2890742A1 publication Critical patent/FR2890742A1/fr
Application granted granted Critical
Publication of FR2890742B1 publication Critical patent/FR2890742B1/fr
Expired - Fee Related legal-status Critical Current
Anticipated expiration legal-status Critical

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/41—Refractivity; Phase-affecting properties, e.g. optical path length
    • G01N21/43—Refractivity; Phase-affecting properties, e.g. optical path length by measuring critical angle
    • G01N21/431—Dip refractometers, e.g. using optical fibres
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
    • G03F7/70591—Testing optical components

Landscapes

  • General Physics & Mathematics (AREA)
  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Analytical Chemistry (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Toxicology (AREA)
  • Atmospheric Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Environmental & Geological Engineering (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
FR0509269A 2005-09-12 2005-09-12 Equipement et procede de surveillance d'un dispositif lithographique a immersion. Expired - Fee Related FR2890742B1 (fr)

Priority Applications (6)

Application Number Priority Date Filing Date Title
FR0509269A FR2890742B1 (fr) 2005-09-12 2005-09-12 Equipement et procede de surveillance d'un dispositif lithographique a immersion.
JP2008530562A JP2009508348A (ja) 2005-09-12 2006-09-11 液浸リソグラフィ装置を監視する機器および方法
PCT/FR2006/002077 WO2007031630A1 (fr) 2005-09-12 2006-09-11 Equipement et procede de surveillance d'un dispositif lithographique a immersion
US11/991,613 US7714992B2 (en) 2005-09-12 2006-09-11 Equipment and method for monitoring an immersion lithography device
EP06808103A EP1931968A1 (fr) 2005-09-12 2006-09-11 Equipement et procede de surveillance d'un dispositif lithographique a immersion
KR1020087005964A KR20080050410A (ko) 2005-09-12 2006-09-11 이머젼 리소그래피 소자를 모니터링 하기 위한 장치 및방법

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
FR0509269A FR2890742B1 (fr) 2005-09-12 2005-09-12 Equipement et procede de surveillance d'un dispositif lithographique a immersion.

Publications (2)

Publication Number Publication Date
FR2890742A1 FR2890742A1 (fr) 2007-03-16
FR2890742B1 true FR2890742B1 (fr) 2007-11-30

Family

ID=36320196

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0509269A Expired - Fee Related FR2890742B1 (fr) 2005-09-12 2005-09-12 Equipement et procede de surveillance d'un dispositif lithographique a immersion.

Country Status (6)

Country Link
US (1) US7714992B2 (fr)
EP (1) EP1931968A1 (fr)
JP (1) JP2009508348A (fr)
KR (1) KR20080050410A (fr)
FR (1) FR2890742B1 (fr)
WO (1) WO2007031630A1 (fr)

Family Cites Families (7)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
GB2141223A (en) * 1983-06-11 1984-12-12 Plessey Co Plc Optical arrangements for monitoring refractive index of fluid
US7213963B2 (en) * 2003-06-09 2007-05-08 Asml Netherlands B.V. Lithographic apparatus and device manufacturing method
US7006209B2 (en) * 2003-07-25 2006-02-28 Advanced Micro Devices, Inc. Method and apparatus for monitoring and controlling imaging in immersion lithography systems
US6844206B1 (en) * 2003-08-21 2005-01-18 Advanced Micro Devices, Llp Refractive index system monitor and control for immersion lithography
CN100594430C (zh) * 2004-06-04 2010-03-17 卡尔蔡司Smt股份公司 用于测量光学成像系统的图像质量的系统
TW200628995A (en) * 2004-10-13 2006-08-16 Nikon Corp Exposure device, exposure method, and device manufacturing method
US7196770B2 (en) * 2004-12-07 2007-03-27 Asml Netherlands B.V. Prewetting of substrate before immersion exposure

Also Published As

Publication number Publication date
FR2890742A1 (fr) 2007-03-16
US20090116001A1 (en) 2009-05-07
WO2007031630A1 (fr) 2007-03-22
JP2009508348A (ja) 2009-02-26
KR20080050410A (ko) 2008-06-05
US7714992B2 (en) 2010-05-11
EP1931968A1 (fr) 2008-06-18

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Legal Events

Date Code Title Description
ST Notification of lapse

Effective date: 20140530