FR2849955B1 - Dispositif de micro-fabrication et procede de micro-fabrication - Google Patents

Dispositif de micro-fabrication et procede de micro-fabrication

Info

Publication number
FR2849955B1
FR2849955B1 FR0308792A FR0308792A FR2849955B1 FR 2849955 B1 FR2849955 B1 FR 2849955B1 FR 0308792 A FR0308792 A FR 0308792A FR 0308792 A FR0308792 A FR 0308792A FR 2849955 B1 FR2849955 B1 FR 2849955B1
Authority
FR
France
Prior art keywords
micro
manufacturing
manufacturing device
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
FR0308792A
Other languages
English (en)
Other versions
FR2849955A1 (fr
Inventor
Muneyuki Fukuda
Satoshi Tomimatsu
Hiroyasu Shichi
Osamu Watanabe
Current Assignee (The listed assignees may be inaccurate. Google has not performed a legal analysis and makes no representation or warranty as to the accuracy of the list.)
Hitachi High Tech Corp
Original Assignee
Hitachi High Technologies Corp
Hitachi High Tech Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Hitachi High Technologies Corp, Hitachi High Tech Corp filed Critical Hitachi High Technologies Corp
Publication of FR2849955A1 publication Critical patent/FR2849955A1/fr
Application granted granted Critical
Publication of FR2849955B1 publication Critical patent/FR2849955B1/fr
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

Links

Classifications

    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/30—Electron-beam or ion-beam tubes for localised treatment of objects
    • H01J37/305—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching
    • H01J37/3053—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching
    • H01J37/3056—Electron-beam or ion-beam tubes for localised treatment of objects for casting, melting, evaporating or etching for evaporating or etching for microworking, e.g. etching of gratings, trimming of electrical components
    • H—ELECTRICITY
    • H01—ELECTRIC ELEMENTS
    • H01J—ELECTRIC DISCHARGE TUBES OR DISCHARGE LAMPS
    • H01J37/00—Discharge tubes with provision for introducing objects or material to be exposed to the discharge, e.g. for the purpose of examination or processing thereof
    • H01J37/02—Details
    • H01J37/20—Means for supporting or positioning the objects or the material; Means for adjusting diaphragms or lenses associated with the support
FR0308792A 2003-01-15 2003-07-18 Dispositif de micro-fabrication et procede de micro-fabrication Expired - Fee Related FR2849955B1 (fr)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2003006505A JP3996856B2 (ja) 2003-01-15 2003-01-15 試料作製装置と試料作製方法

Publications (2)

Publication Number Publication Date
FR2849955A1 FR2849955A1 (fr) 2004-07-16
FR2849955B1 true FR2849955B1 (fr) 2015-05-15

Family

ID=32588506

Family Applications (1)

Application Number Title Priority Date Filing Date
FR0308792A Expired - Fee Related FR2849955B1 (fr) 2003-01-15 2003-07-18 Dispositif de micro-fabrication et procede de micro-fabrication

Country Status (3)

Country Link
US (1) US6894287B2 (fr)
JP (1) JP3996856B2 (fr)
FR (1) FR2849955B1 (fr)

Families Citing this family (8)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
US7356900B2 (en) * 2003-10-27 2008-04-15 Sii Nanotechnology Inc. Manipulator needle portion repairing method
US7571638B1 (en) * 2005-05-10 2009-08-11 Kley Victor B Tool tips with scanning probe microscopy and/or atomic force microscopy applications
US9423693B1 (en) 2005-05-10 2016-08-23 Victor B. Kley In-plane scanning probe microscopy tips and tools for wafers and substrates with diverse designs on one wafer or substrate
DE102008042179B9 (de) * 2008-09-17 2013-10-10 Carl Zeiss Microscopy Gmbh Verfahren zur Analyse einer Probe
JP5152111B2 (ja) * 2009-06-22 2013-02-27 新日鐵住金株式会社 集束イオンビーム加工装置用プローブ、プローブ装置、及びプローブの製造方法
JP5537653B2 (ja) 2010-04-16 2014-07-02 株式会社日立ハイテクノロジーズ イオンビーム装置およびイオンビーム加工方法
US9778572B1 (en) 2013-03-15 2017-10-03 Victor B. Kley In-plane scanning probe microscopy tips and tools for wafers and substrates with diverse designs on one wafer or substrate
CN208969129U (zh) * 2018-09-29 2019-06-11 Fei公司 晶片、微操纵器、用于制备微操纵器的系统

Family Cites Families (2)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
WO1999005506A1 (fr) * 1997-07-22 1999-02-04 Hitachi, Ltd. Procede et dispositif de preparation d'echantillons
JP4200665B2 (ja) * 2001-05-08 2008-12-24 株式会社日立製作所 加工装置

Also Published As

Publication number Publication date
FR2849955A1 (fr) 2004-07-16
JP3996856B2 (ja) 2007-10-24
US6894287B2 (en) 2005-05-17
US20040135096A1 (en) 2004-07-15
JP2004219236A (ja) 2004-08-05

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