TWI412814B - 空間光調變器及其製造方法 - Google Patents

空間光調變器及其製造方法 Download PDF

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TWI412814B
TWI412814B TW098106746A TW98106746A TWI412814B TW I412814 B TWI412814 B TW I412814B TW 098106746 A TW098106746 A TW 098106746A TW 98106746 A TW98106746 A TW 98106746A TW I412814 B TWI412814 B TW I412814B
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optical compensation
optical
compensation structure
spatial light
light modulator
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TW200947017A (en
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Chui Clarence
Jeffrey B Sampsell
William J Cummings
Ming-Hau Tung
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Qualcomm Mems Technologies Inc
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    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/21—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  by interference
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B26/00—Optical devices or arrangements for the control of light using movable or deformable optical elements
    • G02B26/001—Optical devices or arrangements for the control of light using movable or deformable optical elements based on interference in an adjustable optical cavity
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/136—Liquid crystal cells structurally associated with a semi-conducting layer or substrate, e.g. cells forming part of an integrated circuit
    • G—PHYSICS
    • G02—OPTICS
    • G02F—OPTICAL DEVICES OR ARRANGEMENTS FOR THE CONTROL OF LIGHT BY MODIFICATION OF THE OPTICAL PROPERTIES OF THE MEDIA OF THE ELEMENTS INVOLVED THEREIN; NON-LINEAR OPTICS; FREQUENCY-CHANGING OF LIGHT; OPTICAL LOGIC ELEMENTS; OPTICAL ANALOGUE/DIGITAL CONVERTERS
    • G02F1/00—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics
    • G02F1/01—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour 
    • G02F1/13—Devices or arrangements for the control of the intensity, colour, phase, polarisation or direction of light arriving from an independent light source, e.g. switching, gating or modulating; Non-linear optics for the control of the intensity, phase, polarisation or colour  based on liquid crystals, e.g. single liquid crystal display cells
    • G02F1/133—Constructional arrangements; Operation of liquid crystal cells; Circuit arrangements
    • G02F1/1333—Constructional arrangements; Manufacturing methods
    • G02F1/1335—Structural association of cells with optical devices, e.g. polarisers or reflectors
    • G02F1/13356—Structural association of cells with optical devices, e.g. polarisers or reflectors characterised by the placement of the optical elements

Description

空間光調變器及其製造方法
本申請案聲明在2004年2月3日提出之第60/541,607號美國專利暫時申請案；在2004年9月27日提出之第60/613,482號美國專利暫時申請案；在2004年9月27日提出之第60/613,536號美國專利暫時申請案；及在2004年9月27日提出之第60/613,542號美國專利暫時申請案等之優先權。
本發明關於空間光調變器，例如干涉調變器者，其在製造及性能上之改良。
空間光調變器係含有複數個可個別定址光調變元件陣列之顯示裝置。空間光調變器之實例包括液晶顯示器及干涉調變器陣列。在諸裝置中之光調變元件典型上係藉由將反射或透射通過個別元件之光線之特徵改變而發揮功能，由此而改變顯示器之外觀。
隨著空間光調變器日趨複雜，本發明人預想到有關於其利用現有製程流製造之困難亦將增加。據此，本發明人已研發出具有整合光學補償結構之空間光調變器及其製造方法。
一實施例提供一種空間光調變器，其包括一基板；複數個可個別定址光調變元件，係配置於該基板上且被建構用於將透射通過該基板之光線調變；及一光學補償結構；其中該光學補償結構係配置於該基板與該等複數個可個別定 址光調變元件之間。在特定實施例中，該光學補償結構係一被動光學補償結構。
一實施例提供一種空間光調變器，其包括一基板；複數個可個別定址光調變元件，係配置於該基板上且被建構用於將透射通過該基板之光線調變；及一光學補償結構；其中該等複數個可個別定址光調變元件係配置於該基板與該光學補償結構之間。該光學補償結構包含一濾色片、黑色遮罩、及抗反射層其中至少一者。
另一實施例提供一種製造一空間光調變器之方法，其包括將一光學補償結構製於一透明基板上；及將複數個可個別定址光調變元件製於該光學補償結構上，該等可個別定址光調變元件係建構用於將透射通過該透明基板之光線調變。在特定實施例中，製造該光學補償結構包括製造一被動光學補償結構。
另一實施例提供一種製造一空間光調變器之方法，其包括將複數個可個別定址光調變元件製於一基板上；及將一光學補償結構製於該等複數個可個別定址光調變元件上，該等可個別定址光調變元件係建構用於將透射通過該光學補償結構之光線調變，該光學補償結構包含一濾色片、遮罩、及抗反射層其中至少一者。
另一實施例提供一種空間光調變器，其包括一透明基板；複數個可個別定址干涉光調變元件，係配置於該透明基板上且被建構用於將透射通過該透明基板之光線調變，該干涉光調變元件包含一孔穴及一可動壁面；及至少一光 學補償結構，係配置於該透明基板與該等複數個可個別定址干涉光調變元件之間，該光學補償結構包含一黑色遮罩、濾色片、或散光片。
另一實施例提供一種空間光調變器，其包括一基板；一調變構件，其用於將透射通過或反射自該基板之光線調變；及一補償構件，其用於將透射通過或反射自該基板之光線補償；其中該用於補償光線之構件係在操作上配置於該基板與該用於將透射通過或反射自該基板之光線調變的構件之間。在特定實施例中，該用於將透射通過或反射自該基板之光線補償的構件係一用於將透射通過或反射自該基板之光線被動地補償的構件。
另一實施例提供一種空間光調變器，其包括一基板；一調變構件，其用於將透射通過或反射自該基板之光線調變；及一補償構件，其用於將透射通過或反射自該基板之光線補償；其中該用於將透射通過或反射自該基板之光線調變的構件係在操作上配置於該基板與該用於補償光線之構件之間。該用於將透射通過或反射自該基板之光線補償的構件包含一濾色片、黑色遮罩、及抗反射層其中至少一者。
另一實施例提供一種利用一方法製造之空間光調變器，該方法包括將一光學補償結構製於一透明基板上；及將複數個可個別定址光調變元件製於該光學補償結構上，該等可個別定址光調變元件係建構用於將透射通過該透明基板之光線調變。
另一實施例提供一種利用一方法製造之空間光調變器，該方法包括將複數個可個別定址光調變元件製於一基板上；及將一光學補償結構製於該等複數個可個別定址光調變元件上，該等可個別定址光調變元件係建構用於將透射通過該光學補償結構之光線調變。該光學補償結構包含一濾色片、黑色遮罩及抗反射層其中一者。
本文內所述之其他實施例亦可在某些例子中被提供用於簡化製造。
在另一實施例中，一顯示區域包含一黑色與白色光調變元件。該黑色與白色光調變元件包括第一及第二反射表面與一設於其間之孔穴。該第二表面可以相關於該第一表面而移動。濾色片係建構用於當以白色光照射時可令有色光透過。該濾色片係相關於該光調變元件而定位，以致於自該光調變元件輸出之光線係由該濾色片過濾。
該黑色與白色光調變元件可包含一黑色與白色干涉調變器。該黑色與白色光調變元件可包含在一其他光調變元件陣列內，例如其他黑色與白色光調變元件。其他濾色片，可能呈一陣列，亦可包括在內。具有不同反應之濾色片可用於不同光調變元件，以產生不同顏色(例如紅色、綠色、及藍色)。
在另一實施例中，一顯示區域包含複數個光調變元件，該等光調變元件各包括第一及第二反射表面與一設於其間之孔穴。該第二表面可以相關於該第一表面而移動。該顯示區域尚包含複數個濾色片元件，係建構用於當以一寬範 圍波長照射時可令一窄範圍波長透過。該等濾色片元件係相關於該等光調變元件而定位，以致於自該等光調變元件輸出之光線係由該等濾色片元件過濾。當該等光調變元件輸出光線時(例如白色光)，該第一反射表面係與該第二反射表面相隔一針對該等複數個光調變元件之各者而言實質上相等之距離。
該等光調變元件可包含黑色與白色光調變元件。該等光調變元件可包含複數個干涉調變器或其他類型之調變器。該等光調變元件可以例如在一反射狀態時輸出光線。
該等複數個濾色片元件可包括二或三或多個濾色片元件，其係建構以產生不同顏色輸出(例如紅色、綠色、及藍色)。該等濾色片元件包含當以一寬範圍波長照射時，可令一窄範圍波長透過之材料(例如像染色光阻劑之染色材料)。在不同之實施例中，此材料可在以白色光照射時令有色光透過。
在另一實施例中，一顯示區域包含複數個光調變元件及一濾色片陣列。該等光調變元件各包括第一及第二反射表面與一設於其間之孔穴。該第二表面可以相關於該第一表面而移動。該濾色片陣列包含複數個濾色片元件，係建構用於當以一寬範圍波長照射時可令一窄範圍波長透過。該濾色片陣列係相關於該等光調變元件而定位，以致於自該等光調變元件輸出之光線係由該等濾色片元件過濾。當該等光調變元件輸出光線時(例如白色光)，該第一反射表面係與該第二反射表面相隔一針對該等複數個光調變元件之 各者而言實質上相等之距離。該等濾色片元件之至少二者係建構以產生不同顏色輸出。
另一實施例包括一種製造一顯示裝置之方法。在此方法中，提供一黑色與白色光調變元件。所提供之黑色與白色光調變元件包括第一及第二光學表面，其中該第二光學表面可以相關於該第一光學表面而移動。一濾色片係相關於該光調變元件而定位，因此自該光調變元件輸出之光線係由該濾色片過濾。該濾色片係建構用於當以白色光照射時可令有色光透過。
該黑色與白色光調變元件可包含一黑色與白色干涉調變器。該黑色與白色光調變元件可包含在一其他光調變元件陣列內，例如其他黑色與白色光調變元件。其他濾色片，可能呈一陣列，亦可包括在內。具有不同反應之濾色片可用於不同光調變元件，以產生不同顏色(例如紅色、綠色、及藍色)。
另一實施例包括一種製造一顯示區域之方法。在此方法中，提供複數個光調變元件，該等光調變元件各包括第一及第二光學表面與一設於其間之孔穴。當該等光調變元件輸出光線時，該第一反射表面係與該第二反射表面相隔一針對該等複數個光調變元件之各者而言實質上相等之距離。複數個濾色片元件係相關於該等光調變元件而定位，因此自該等光調變元件輸出之光線係由各該等濾色片元件過濾。在不同之實施例中，該等濾色片元件所包括之材料係建構用於當以一寬範圍波長照射時可令一窄範圍波長透 過。在特定實施例中，該等濾色片元件係包括在一陣列內。該陣列可包括至少二濾色片元件，係建構以產生不同顏色輸出。
該等光調變元件可包含黑色與白色光調變元件。該等光調變元件可包含複數個干涉調變器或其他類型之調變器。該等光調變元件可以例如在一反射狀態時輸出光線。
該等複數個濾色片元件可包括二或三或多個濾色片元件，其係建構以產生不同顏色輸出(例如紅色、綠色、藍色)。該等濾色片元件可包含材料，例如一像染色光阻劑之染色材料。該材料可在以白色光照射時令顏色透過。
另一實施例包括一種顯示裝置，其包含用於產生一調變白色光信號之構件，該構件包括第一及第二光學表面，其中該第二光學表面可以相關於該第一光學表面而移動。該顯示裝置尚包含過濾構件，其用於過濾該調變白色光信號，以利於將該白色光信號轉換成一有色光信號。
上述及其他實施例將詳細說明於後。
一較佳實施例係一干涉調變器，其包括至少一整合光學補償結構。在一些結構中，光學補償結構係配置於干涉調變器之基板與光調變元件之間。在其他結構中，光調變元件係配置於基板與光學補償結構之間。
干涉調變器之多項實例係揭述於第2002/0126364 A1號美國專利公告案中。圖1、2說明一典型干涉調變器之一些特徵(請參閱第2002/0126364 A1號美國專利公告案之圖1、 2及對應之原文)。請參閱圖1A、1B及2，二干涉調變器結構114、116各包括一次級面鏡102，該次級面鏡具有一利用多種習知技術之任一者而蝕刻至其上(外)表面103內之波形圖案104。該波形並未延伸通過供面鏡形成於上之膜片106，因此面鏡之內表面108仍呈平滑狀。圖1B顯示該次級面鏡上之蝕刻波形104之圖案及蝕刻後仍保留之平滑內表面112。可被形成多種幾何形狀(例如長方形、金字塔形、錐形)之該波形圖案提供了面鏡之結構性勁度、使其免於材料應力之變化、減少總質量、及在該面鏡致動時可免於變形。
大體上，無電壓施加、或具有一些較為穩態電壓、或偏壓電壓施加之一干涉調變器皆被視為處於靜止狀態，且將反射一特定顏色，即一靜止色。如第2002/0126364 A1號美國專利公告案所述，該靜止色係由供該次級面鏡製於其上之犧牲性填隙物之厚度所決定。
各干涉調變器114、116呈長方形，且在其四個角隅處透過支撐臂如120、122，以連接於桿件118。在一些例子中(如第2002/0126364 A1號美國專利公告案所述)，該干涉調變器陣列將以一選定之固定偏壓電壓操作。在這些例子中，次級面鏡102大體上維持一靜止狀態，即其較接近於對應之初級面鏡128，而非毫無任何偏壓電壓施加。製成備有不同尺寸支撐臂之該干涉調變器容許各干涉調變器之機械性回復力由其幾何形狀決定。因此，藉由施加於多數個干涉調變器之相同偏壓電壓，各干涉調變器可以透過該 支撐臂尺寸及其所生成彈性係數之控制，而維持在一不同之彈壓位置(相隔於初級面鏡有一距離)。支撐臂越厚，其彈性係數越大。因此不同顏色(例如紅、綠、及藍色)可由不同干涉調變器顯示，不需要沉積不同厚度之填隙物。取而代之的是，可以使用一沉積且隨後在製造期間去除之單一填隙物，同時顏色係藉由在用於界定該臂之單一微影步驟期間變更支撐臂尺寸而決定。例如，在圖2中，該等干涉調變器114、116皆被揭示於靜止狀態中且有相同之偏壓電壓施加。惟，由於各自支撐臂之較大尺寸，干涉調變器114所用之間隙126係較大於干涉調變器116所用之間隙128。該干涉調變器之多種其他實例亦屬習知。
第2002/0126364 A1號美國專利公告案亦揭述多種被動光學補償結構，以將隨著入射角變化之顏色位移(此為典型干涉結構之特徵)減到最小，及主動光學補償結構，以供給補充照明。例如，如圖3A-3F所示(請參閱第2002/0126364 A1號美國專利公告案之圖6A-6F)，一光學補償膜可以製於基板之相對表面上，該表面可供光調變元件陣列設置。此膜可用多種方式設計及製造，且可彼此相關聯地使用。
在圖3A中，一被動光學補償膜600係一體積或表面釋放全像膜。一體積全像膜可以藉由將一光敏性聚合物曝露於由二或多個連貫光源(例如雷射)相交所生之干涉圖案而產生。利用適當頻率及光束方向，該膜內之任意週期性折射指數圖案即可產生。一表面釋放全像膜可以利用習於此技 者熟知之任意數量微製造技術產生一金屬原件而製成。該原件隨後用於將該膜圖案化。該等膜可用於在一可界定之角度錐體內增進光之透射及反射，因而將離軸光線最小化。沿一軸上光線所視之一顯示器之顏色及亮度皆增強且顏色位移減少，因為錐體外之亮度明顯下降。
在圖3B中，另一方式係說明用於一裝置604，其中一被動光學補償結構606製於基板上。可利用第2002/0126364 A1號美國專利公告案內所述技術製成之該等結構可以考慮光子晶體，如John D.Joannopoulos多人在"光子晶體"一書內所述者。基本上其係三維式干涉陣列，以說明來自所有角度之干涉。此舉提供了設計出可執行多項功能之波導的能力，諸功能包括將特定頻率之入射光通往適當顏色像素、或將一特定入射角之光線改變成一新入射角、或以上二者之某些組合。
在一被動光學補償結構之另一例子中，如圖3C所示，一三層式聚合膜610含有懸浮顆粒。該顆粒實際上為單一或多層式介電性面鏡，其已製成顯微板形式。例如，該等板可以藉由將多層式介電性膜沉積於一聚合物片上而製成，當該聚合物片溶解時即留下一可依某一方式"研磨"而產生該等板之膜。該等板接著混合於一液體塑膠前驅物。藉由在固化期間電場之施加，該等板之方向即可在製造期間固定。該等面鏡可經設計使其僅以一擦過角度範圍反射。因此，光線係依據相關於面鏡之入射角而反射或透射。在圖3C中，層612係經定向以將進入較接近於垂直方向之膜610 之高入射光線609反射。層614則將低入射光線613反射至一較為垂直之路徑。層616修正更低角度入射之光線615。因為該等層以最小程度影響趨近於垂直方向之光線，故其各自作為一分離之"角度選擇性入射過濾片"，結果無定向之入射光即以一較高角度或垂直地耦合於該基板。此舉可將透過此膜所見之一顯示器之顏色位移減到最小。
在一被動光學補償結構之另一例子中，如圖3D所示，微透鏡622係以陣列型式使用於裝置620中。各透鏡622可以藉由有效放大各像素之主動區而增進顯示器之填充因數。此方式可以自行或與其他顏色位移補償膜同時使用。
在一主動光學補償結構之例子中，如圖3E所示，裝置624使用一前光陣列型式之補充性照明。在此例子中一有機發光材料626，例如鋁羥基喹啉(Alq)/雙胺結構及聚苯基烯乙烯，其可在該基板上沉積及製圖。俯視圖，亦即圖3F，其揭露一對應於下方干涉調變器陣列之圖案627。亦即，發光區626係經設計以遮蔽該干涉調變器之間之非主動區，及容許在其餘區域內有一透明孔。光線主動地射入該干涉調變器上之該基板內，且隨後反射回到觀看者。反之，一圖案化之放射膜可被施加於顯示器之背板，且光線向前透射通過子像素之間之間隙。藉由將一面鏡圖案化於顯示器前方，此光線可以反射回到該干涉調變器上。相關聯於該等膜而依賴內部全反射之沿周邊安裝式光源係又一方式。第6,055,090號美國專利亦揭露一種具有一主動光學補償結構之干涉調變器，該光學補償結構包括一補充性前 光源。
圖4說明一干涉調變器10包含一被動光學補償膜(即一散光片22)，該光學補償膜製於基板之相對表面上，該表面可供一光調變元件設置。該散光片22大體上補償於一未補償空間光調變器陣列之鏡面外觀，其例如藉由使該反射型陣列看起來較不像一面鏡而較像紙。在圖4中，一光調變元件8包含一可動壁面或元件16、一孔穴20、及一支撐桿18。如圖4中所示，可動壁面16係藉由支撐桿18以支持於孔穴20上方。一光學堆疊14形成孔穴20之一壁面且相對於可動壁面16。光學堆疊14可被視為光調變元件8之組件。光學堆疊14製於一透明基板12上，而散光片22製於與光調變元件8相對之基板12側面上。操作時，可動壁面16移動通過多數個平行於孔穴20前壁面之平面。可動壁面16係高反射性且典型上包含一金屬。當可動壁面16移向該孔穴20相對側上之光學堆疊14時，孔穴20內即發生光線(其典型上進入透明基板12及光學堆疊14)之自我干涉。通過透明基板12及光學堆疊14而離開孔穴之反射光之顏色可以藉由改變光學堆疊14與可動壁面16之間之距離而被控制。接觸於光學堆疊14之透明基板12表面係供光調變元件8製於其上之表面。散光片22典型上係在光調變元件8製成後才製於或貼附於透明基板12之相對表面。
如圖4中所示及藉由第2002/0126364 A1號美國專利公告案之揭露，用於空間光調變器之被動光學補償結構典型上係製於基板之相對表面上，且該表面可供光調變元件陣列 設置，以利於現有之製程流。整體顯示系統之製造典型上牽涉到分別製成不同組件，諸如被動光學補償結構、干涉調變器結構、驅動器電子、圖形控制功能、等等，及在製程流之一後續階段中將其整合。分別製成不同組件及隨後在一後續階段中將其整合即可將製造該光調變元件之麻煩作業簡化，因為其不需要複雜之沉積及微製造方案。
隨著空間光調變器日趨複雜，可以預想到有關於其利用現有製程流製造之困難亦將增加。據此，具有整合光學補償結構之空間光調變器及其製造方法即應運而生。一實施例提供具有一整合光學補償結構之空間光調變器，例如一設於基板與光調變元件之間之光學補償結構，或一設於與基板相對之光調變元件側上之光學補償結構。該光學補償結構可以依需要而呈主動或被動。在本文中，一"被動"光學補償結構係一不供給一補充性前光源者。
如上所述，圖4說明一被動光學補償膜(即一散光片22)製於基板之相對表面上，該表面可供一光調變元件設置。在圖4中，光調變元件8係一干涉調變器，其包含可動壁面或元件16、孔穴20、支撐桿18。光學堆疊14係製於透明基板12上，及散光片22製於與光調變元件8相對之基板12側面上。光學堆疊14可被視為光調變元件8之組件。習於此技者可以瞭解的是，在一些實施例中，一干涉調變器可以在一黑色或吸收狀態與一反射狀態之間調變。反射狀態係一以非干涉為主之狀態，其呈現白色。儘管諸實施例中之白色狀態並未特別依存於調變器之干涉特徵，調變元件較 佳為具有一相似於依賴干涉特徵且在此供作參考之該等干涉調變器實施例者之結構。干涉調變器可以在一吸收狀態與一干涉狀態之間、一吸收狀態與一反射狀態之間、一反射狀態與一干涉狀態之間、或二不同干涉狀態之間調變。
圖5A說明一空間光調變器40之實施例，其中一被動光學補償結構(即一散光片41)係配置於一基板42與一光調變元件44之間，而非如圖4所示在相對於光調變元件之基板側上。在圖5A所示之實施例中，光調變元件44係一干涉調變器，其包含一孔穴45、一可動壁面46、一光學堆疊43、及一支撐桿47。光學堆疊43位於與可動壁面46相對之孔穴45壁面上。在所示之實施例中，空間光調變器40尚包含一設於基板42與光學堆疊43之間之偏光層48。可動壁面46與光學堆疊43皆為反射型，因此空間光調變器40之操作大體上相似於圖4所示之空間光調變器10者。典型上，基板42係至少一部分呈透明。習於此技者將瞭解到光調變元件44可建構於一包含複數個可個別定址光調變元件在內且配置於一透明基板上之陣列中，及可建構以將透射通過透明基板之光線調變。
習於此技者亦將瞭解到圖5A中所示之散光片41即多種光學補償結構(主動性及被動性)之代表，其可配置於基板與複數個可個別定址光調變元件之間。例如，一主動光學補償結構可以供給一補充性前光源。被動光學補償結構之非限定實例包括一抗反射層、一繞射光學元件、一將光線散射之結構、一黑色遮罩、一濾色片、一微透鏡陣列、一全 像膜(例如相關於透射通過透明基板之一光線入射角而將反射色之位移緩和)、或上述者之一組合。在圖5中，光調變元件44包含一干涉調變器，但是其他空間光調變器亦可被採用。
圖5B說明一空間光調變器33之實施例，其中一被動光學補償結構(即黑色遮罩32)係配置於一透明基板12與一反射元件31之間。該反射元件可為一光學堆疊。該等黑色遮罩如黑色遮罩32者可用於遮蔽不想讓觀看者看見之空間光調變器結構部分。一或多個光調變元件(例如複數個可個別定址光調變元件)係在圖5B中被刪略以利圖面清楚，但是吾人可以瞭解到其應配置於透明基板12上方，且被建構以將透射通過透明基板12之光線調變。例如，圖5B之光調變元件可包含複數個如圖5A所示配置於反射元件31上方之可個別定址光調變元件。空間光調變器33可包括一拋光層30，其係如圖5B所示設於黑色遮罩32與反射元件31之間。
圖5C說明一空間光調變器37之實施例，其中一被動光學補償結構(包含濾色元件34、36、38)係配置於一透明基板12與一反射元件39之間。如圖5B所示，反射元件39可為一光學堆疊。在所示之實施例中，濾色元件34、36、38分別為紅色、綠色及藍色，但是其他顏色亦可由習於此技者選擇，使生成之空間光調變器產生所需之顏色。如同在圖5B中者，一或多個光調變元件(例如複數個可個別定址光調變元件)係在圖5C中被刪略以利圖面清楚，但是吾人可以瞭解到其應配置於透明基板12上方，且被建構以將透射通 過透明基板12之光線調變。例如，圖5C之光調變元件可包含複數個如圖5A所示配置於該光學堆疊上方之可個別定址光調變元件。空間光調變器37可包括一拋光層30，其係如圖5C所示設於濾色元件34、36、38與光學堆疊39之間。
僅產生黑色與白色之干涉調變器可以組合於濾色片而使用，以產生色光。干涉調變器可以藉由改變該孔穴尺寸而被製成用於產生不同顏色。惟，改變該孔穴尺寸牽涉到改變製造過程，例如，製造一不同尺寸孔穴以用於一可產生綠色光之干涉調變器，而非用於一可產生紅色光之干涉調變器。黑色與白色干涉調變器組合於濾色片之使用方式可以實質上簡化製造過程。製造過程上之其他改良係藉由將濾色片整合於干涉調變器內而達成，如圖5C所示。
圖6說明一空間光調變器100之實施例，其中一被動光學補償結構105(即一含有一散射元件110之拋光層)係配置於一透明基板115與一光調變元件120之間。在圖6所示之實施例中，光調變元件120係一干涉調變器，其包含一孔穴130、一可動壁面125、及一光學堆疊135。光學堆疊135位於與可動壁面125相對之孔穴130壁面上。可動壁面125與光學堆疊135皆為反射型(光學堆疊135為局部反射型)，因此空間光調變器100之操作大體上相似於圖4所示之空間光調變器10者。光線140通過可動壁面125內之一長孔150且自散射元件110反射，以致於將光線140散射回到可動壁面125(且在一些例子中是再次回到散射元件110)，最後通過透明基板115及離開160、165，如圖6所示。較佳為，散射 元件110係經成形以令光線140無定向地散射。為了清楚起見，單一散射元件110及單一長孔150揭示於圖6中，但是可以瞭解的是空間光調變器100可包含複數個散射元件及長孔，其係配置用於提供所需之散射光線量。
圖7A、7B說明含有整合光學補償結構之不同組合方式的空間光調變器實施例。圖7A說明一空間光調變器60之實施例，其中一被動光學補償結構(其包含一濾色元件34及一黑色遮罩32)係配置於一透明基板12與一光學堆疊61之間。圖7B說明一空間光調變器62之實施例，其中一第一被動光學補償結構(其包含一濾色元件34及一黑色遮罩32)及一第二被動光學補償結構(其包含一散光片26)係配置於一透明基板12與一光學堆疊63之間。如同在圖5B、5C中者，一或多個光調變元件(例如複數個可個別定址光調變元件)係在圖7A、7B中被刪略以利圖面清楚，但是吾人可以瞭解到其應配置於透明基板12上方，且被建構以將透射通過透明基板之光線調變。空間光調變器60、62可包括一拋光層30，其係如圖7A所示設於該被動光學補償結構(其包含濾色元件34及黑色遮罩32)與光學堆疊61之間，或者如圖7B所示設於該等第一及第二被動光學補償結構之間。空間光調變器可包括另一拋光層，例如圖7B所示之一設於該第一被動光學補償結構(其包含一濾色元件34及一黑色遮罩32)與光學堆疊63之間之拋光層35。
空間光調變器可包含一執行一或多項功能(如圖7A所示之一濾色元件及一黑色遮罩)之光學補償結構，及/或該光 學補償結構可包含多數層，其選項性地藉由拋光層(如圖7B所示者)而彼此分隔。習於此技者將瞭解到該"光學補償結構"一詞可用於指一具有一特定功能(例如散光片26)之結構、一具有多項功能(例如包含濾色元件34及黑色遮罩32)之層、或如圖7B所示多數個各具有一或多項功能之層，其選項性地包括(一或多個)拋光層。因此，該空間光調變器可包含該等主動及/或被動光學補償結構之任意組合型式，例如一黑色遮罩與一濾色元件；一黑色遮罩與一散光片；一濾色元件與一散光片；一黑色遮罩、一濾色元件及一散光片，等等。用於將透射通過透明基板之光線補償的構件包括文內所述之該等光學補償結構。
含有一光學補償結構之該等空間光調變器可以藉由將該光學補償結構之製造整合於該空間光調變器之製造過程中而製成。此一製程之實例說明於圖8中。該製程開始於在步驟50提供該基板。典型上，該基板為玻璃、塑膠或其他透明基板。習於此技者將瞭解到文內所用之"透明"一詞包含對於該空間光調變器操作波長實質上呈透明之材料，且該透明基板因而不需要透射所有波長之光線及其可吸收該空間光調變器操作波長之光線部分。例如，若針對一特定應用而有需要時，該透明基板可呈淡色或偏光化。因此，該基板之透明度及反射率可以依據構型及所需之功能而改變。在一些實施例中，該基板至少一部分呈透明且可實質上呈透明。在其他實施例中，該基板至少一部分呈反射型且可實質上呈反射型。可以瞭解的是一基板可以一部分呈 透明且一部分呈反射型。
圖8所示之製程係在步驟52繼續該光學補償結構之製造。依據結構，用於此製造之材料及方法可以改變。例如，使用相容於該可個別定址光調變元件之製造的技術及方法通常較方便於製成該光學補償結構，例如利用旋塗及/或化學氣體沉積技術。例如，一散光膜可以藉由使用一聚合物或聚合物溶液旋塗該基板而製成，該溶液內含有散佈之散射元件。例如，該聚合物可為一聚醯亞胺而該散射元件可為顯微玻璃珠。該濾色元件及黑色遮罩可為適當染色之光阻聚合物，其使用習知光阻劑沉積及遮蔽技術而製於該基板上。該黑色遮罩亦可為無機材料，例如氧化鉻，亦俗稱為黑鉻，其使用習知沉積及遮蔽技術而製於該基板上。
圖8所示之製程係在步驟54繼續一拋光層之沉積。該一或多拋光層典型上為聚合物，例如聚醯亞胺，且其可以使用習知沉積及遮蔽技術沉積。一拋光層之沉積係選項性，但是通常為較佳者，因為其生成一用於後續處理步驟之適當基板。圖8所示之製程係在步驟56繼續該可個別定址光調變元件(例如干涉調變器元件)在該光學補償結構上之製造，且若存在的話，其即該拋光層。該干涉調變器通常使用薄膜沉積過程製成，如第5,835,255及6,055,090號美國專利與第2002/0126364 A1號美國專利申請案中所示。同樣說明於圖8中之此製程之一變化型式牽涉到在步驟58之另一拋光層之製造，接著為在步驟59之另一光學補償結構之 製造。在步驟59之製造後，製造過程可以回到步驟58、59，以用於其他一或多拋光層與一或多光學補償結構之製造，或者可以進行到步驟54、56，以用於該拋光層與該等可個別定址光調變元件之製造。習於此技者將瞭解到圖8所示之製程或其變化型式可用於製成本文內所述之該空間光調變器，其包括且不限定的有圖5-7所示之該等空間光調變器。用於將透射通過該透明基板之光線調變的構件包括干涉調變器及液晶顯示器。
圖9說明一空間光調變器200之實施例，其中一光調變元件205係配置於一基板210與一光學補償結構215之間。在圖9所示之實施例中，光調變元件205係一干涉調變器，其包含一孔穴220、一可動壁面225、一光學堆疊230、及支撐桿235。光學堆疊230位於與可動壁面225相對之孔穴220壁面上。光學補償結構215可為本文內所述該等光學補償結構之任一者，例如，一可以供給一補充性前光源之主動光學補償結構，及/或一被動光學補償結構，諸如，一抗反射層、一繞射光學元件、一將光線散射之結構、一黑色遮罩、一濾色片、一散光片、一微透鏡陣列、一相關於透射通過基板之一光線入射角而將反射色之位移緩和的全像膜、或上述者之一組合。在圖9中，光調變元件205包含一干涉調變器，但是其他空間光調變器亦可被採用。
一種將一光調變元件配置於一基板與一光學補償結構之間的空間光調變器(如圖9所示)可由一相似於圖8所示者之製程製造，不同的是該等可個別定址光調變元件係製於基 板上，隨後為一或多個光學補償結構在該等可個別定址光調變元件上之製造(例如圖8中之步驟56係在步驟50之後且在步驟52之前進行)。選項性地，一拋光層可以製於該等可個別定址光調變元件上，隨後為一或多個光學補償結構在該拋光層上之製造。
儘管以上詳細說明已做揭述，並且指出本發明施加於多項實施例時之新穎性，可以瞭解的是在不脫離本發明範疇下，習於此技者仍可在上述裝置或方法之形式及細節上達成刪略、替換及改變。可知的是，本發明可在一未提供本文內所述諸特性與利益之形式中實施，因為有些特性可以分別由其他特性使用或實施。
8、44、120、205‧‧‧光調變元件
10‧‧‧干涉調變器
12、42、210‧‧‧基板
14、43、61、63、135、230‧‧‧光學堆疊
16、46、125、225‧‧‧可動壁面
18、47、235‧‧‧支撐桿
20、45、130、220‧‧‧孔穴
22、26、41‧‧‧散光片
30、35、48‧‧‧拋光層
31、39‧‧‧反射元件
32‧‧‧黑色遮罩
33、37、40、60、62、100、200‧‧‧空間光調變器
34、36、38‧‧‧濾色元件
102‧‧‧次級面鏡
103‧‧‧上(外)表面
104‧‧‧波形圖案
105、215、606‧‧‧光學補償結構
106‧‧‧膜片
108、112‧‧‧內表面
110‧‧‧散射元件
114、116‧‧‧干涉調變器結構
118‧‧‧桿件
115‧‧‧透明基板
120、122‧‧‧支撐臂
126‧‧‧間隙
128‧‧‧初級面鏡
140、609、613‧‧‧光線
150‧‧‧長孔
160、165‧‧‧離開
600‧‧‧光學補償膜
604、620、624‧‧‧裝置
610‧‧‧聚合膜
612、614、616‧‧‧層
615‧‧‧入射光
622‧‧‧微透鏡
626‧‧‧有機發光材料
627‧‧‧圖案
本發明之上述及其他觀點可由以上說明及附圖得知，諸圖式係用於揭示而非拘限本發明，且其中：圖1A、1B說明一典型干涉調變器之一些特徵(請參閱第2002/0126364 A1號美國專利公告案之圖1A、1B)。
圖2說明一典型干涉調變器之一些特徵(請參閱第2002/0126364 A1號美國專利公告案之圖2)。
圖3A-3F說明光學補償膜製於基板之相對表面上，該表面可供一光調變元件陣列設置(請參閱第2002/0126364 A1號美國專利公告案之圖6A-6F)。
圖4說明一光學補償膜(散光片)製於基板之相對表面上，該表面可供一光調變元件設置。
圖5A至5C說明含有整合光學補償結構之空間光調變器 之多項實施例。
圖6說明一含有一整合光學補償結構以散射光線之空間光調變器之實施例。
圖7A、7B說明含有整合光學補償結構之空間光調變器之多項實施例。
圖8說明一用於製造含有整合光學補償結構之空間光調變器之製程流程圖之實施例。
圖9說明一含有一整合光學補償結構之空間光調變器之實施例。
40‧‧‧空間光調變器
41‧‧‧散光片
42‧‧‧基板
43‧‧‧光學堆疊
44‧‧‧光調變元件
45‧‧‧孔穴
46‧‧‧可動壁面
47‧‧‧支撐桿
48‧‧‧拋光層

Claims (89)

  1. 一種空間光調變器，包含：一基板；在該基板上之複數個光調變元件，該等光調變元件經組態以將透射通過該基板之光線干涉調變；一於該基板之下之第一光學補償結構；及一於該基板與該等光調變元件之間之第二光學補償結構，面對該複數個光調變元件之該第二光學補償結構之至少一部分係非平坦的；及一於該第二光學補償結構與該複數個光調變元件之間之平坦層，該平坦層接觸該第二光學補償結構之該非平坦的部分。
  2. 如請求項1之空間光調變器，其中該基板對光線呈透明。
  3. 如請求項1之空間光調變器，其中該第一光學補償結構包含一漫射片。
  4. 如請求項1之空間光調變器，其中該第二光學補償結構包含複數個散射元件。
  5. 如請求項1之空間光調變器，其中該第二光學補償結構包含一微透鏡陣列。
  6. 如請求項1之空間光調變器，其中該第二光學補償結構包含一繞射光學元件。
  7. 如請求項1之空間光調變器，其中該第二光學補償結構包含一散射元件。
  8. 如請求項1之空間光調變器，其中該第一光學補償結構係一被動光學補償結構。
  9. 如請求項1之空間光調變器，其中該第二光學補償結構係一被動光學補償結構。
  10. 如請求項1之空間光調變器，其中該第二光學補償結構包含一或多個由複數個散射元件、一微透鏡陣列、一漫射片以及一繞射光學元件組成之族群。
  11. 如請求項10之空間光調變器，其中該第一光學補償結構包含一或多個由一散光片、一濾色片、一黑色遮罩、複數個散射元件、一微透鏡陣列、一全像膜以及一繞射光學元件組成之族群。
  12. 如請求項1之空間光調變器，其中該等光調變元件之每一者包含一孔穴及一可動壁面，該可動壁面包含一反射性金屬。
  13. 如請求項1之空間光調變器，其中該第一光學補償結構經組態以具有不同於該第二光學補償結構之一光學效果。
  14. 如請求項1之空間光調變器，其中該第一光學補償結構實質上係非平坦的。
  15. 如請求項1之空間光調變器，其中該第二光學補償結構係在該等光調變元件與該空間光調變器之一觀看者之間。
  16. 如請求項1之空間光調變器，其中該第二光學補償結構係在該等光調變元件與該空間光調變器之一前表面之 間。
  17. 如請求項1之空間光調變器，其中該平坦層形成用於隨後製造步驟之一支撐層。
  18. 如請求項1之空間光調變器，其中該平坦層藉由一薄膜沉積程序而製成於該第二光學補償結構上。
  19. 一種顯示裝置，其包含：一基板；一顯示像素陣列，其經組態以形成一影像，每一顯示像素包含安置於該基板上且經組態以干涉調變入射可見光之至少一個別定址光調變元件，該至少一個別定址光調變元件包含：一光學推疊，其包括置放於該基板上之一反射層；一可移動元件；及介於該反射層與該可移動元件之間之一空氣間隔，其形成一光學空腔，以該可移動元件之移動來改變該光學空腔之尺寸，因此干涉調變入射可見光而形成該影像之部分；及一光學補償結構；其中該顯示像素陣列被放置於該基板與該光學補償結構之間，及其中對該至少一個別定址光調變元件而言，該光學堆疊較接近該基板而該可移動元件較接近該光學補償結構及延伸自該光學堆疊至該光學補償結構之一光學路徑經過僅以該可移動元件之移動來改變尺寸之一個空氣間 隔，因此干涉調變入射可見光而形成該影像之部分。
  20. 如請求項19之顯示裝置，其中該光學補償結構包含一黑色遮罩。
  21. 如請求項19之顯示裝置，其中該光學補償結構包含一濾色片。
  22. 如請求項19之顯示裝置，其中該光學補償結構包含一漫射片。
  23. 如請求項19之顯示裝置，其中該光學補償結構包含一抗反射層。
  24. 如請求項19之顯示裝置，其中該光學補償結構包含複數個散射元件。
  25. 如請求項19之顯示裝置，其中該光學補償結構包含一微透鏡陣列。
  26. 如請求項19之顯示裝置，其中該光學補償結構包含一繞射光學元件。
  27. 如請求項19之顯示裝置，其中該光學補償結構包含一平坦層，該平坦層包含一散射元件。
  28. 如請求項19之顯示裝置，其中該光學補償結構包含一全像攝影軟片，其減輕有關經由該基板傳輸之該光的入射之一角度的反射色彩中之一位移。
  29. 如請求項19之顯示裝置，其中該光學補償結構包含一黑色遮罩及一濾色片。
  30. 如請求項19之顯示裝置，其中該光學補償結構包含一黑色遮罩及一漫射片。
  31. 如請求項19之顯示裝置，其中該光學補償結構包含一濾色片及一漫射片。
  32. 如請求項19之顯示裝置，進一步包含一平坦層。
  33. 如請求項19之顯示裝置，其中該基板係至少部分反射的。
  34. 如請求項19之顯示裝置，其中該光學補償結構為一被動光學補償結構。
  35. 如請求項19之顯示裝置，其中該基板係至少部分透明的。
  36. 如請求項19之顯示裝置，其中該基板係至少部分透明的且至少部分反射的。
  37. 如請求項19之顯示裝置，其中該光等調變元件係反射的。
  38. 一種空間光調變器，其包含：一基板；複數個個別定址干涉光調變元件，其放置於該基板上且經組態以調變入射可見光，每一該等干涉光調變元件包含一光學推疊，該光學堆疊包含放置於該基板上之一反射層、包含一空氣間隔及放置於該光學堆疊及一可動壁面之間之一空腔，該空腔經組態以該可動壁面之移動來改變尺寸，因此干涉調變入射可見光而形成一影像之至少一部份；及至少一光學補償結構，該複數個個別定址干涉光調變元件被放置於該基板與該光學補償結構之間，該光學補 償結構包含被選自於一抗反射層、一繞射光學元件、散射光之一結構、一漫射片、一微透鏡陣列及一全像攝影軟片中所組成之一群組中之一結構，其中對每一該等別定址光調變元件而言，該光學堆疊較接近該基板而該可移動元件較接近該光學補償結構及延伸自該光學堆疊至該光學補償結構之一光學路徑經過僅以該可移動元件之移動來改變尺寸之一個空氣間隔，因此干涉調變入射可見光而形成該影像之至少一部分。
  39. 如請求項38之空間光調變器，其中該至少一光學補償結構包含一黑色遮罩。
  40. 如請求項38之空間光調變器，其中該至少一光學補償結構包含一濾色片。
  41. 如請求項38之空間光調變器，進一步包含一平坦層。
  42. 如請求項38之空間光調變器，其中該基板係至少部分反射的。
  43. 如請求項38之空間光調變器，其中該光學補償結構係一被動光學補償結構。
  44. 如請求項38之空間光調變器，其中該基板係至少部分透明的。
  45. 如請求項38之空間光調變器，其中該基板係至少部分反射的及部分透明的。
  46. 一種顯示裝置，其包含：一基板；一顯示像素陣列，其經組態以形成一影像，每一顯示 像素包含用於干涉調變光之一干涉光調變構件，該干涉光調變構件包含：一光學推疊，其包含放置於該基板上之一反射層；一可移動元件；一光學空腔，其被置放於該光學堆疊及該可移動構件之間，該光學空腔包含一空氣間隔，該空氣間隔以該可移動元件之移動來改變尺寸，因此干涉調變入射可見光而形成該影像之部分；及用於補償光之構件；其中該顯示像素陣列被操作地放置於該基板與該用於補償光之構件之間；其中對該用於干涉調變光之構件而言，該光學堆疊較接近該基板而該可移動元件較接近該光學補償結構及延伸自該光學堆疊至該用於補償光之構件之一光學路徑經過僅以該可移動元件之移動來改變尺寸之一個空氣間隔，因此干涉調變入射可見光而形成該影像之部分。
  47. 如請求項46之顯示裝置，其中用於調變光之構件包含至少一干涉調變器。
  48. 如請求項46之顯示裝置，其中該用於補償光之構件包含選自於一繞射光學元件、一漫射片、一抗反射層、複數個散射元件、一微透鏡陣列及一全像攝影軟片中所組成之一群組中之一結構。
  49. 如請求項46之顯示裝置，其中該用於補償光之構件包含 一漫射片。
  50. 如請求項46之顯示裝置，其中該用於補償光之構件包含一黑色遮罩。
  51. 如請求項46之顯示裝置，其中用於補償該光之構件包含一濾色片。
  52. 一種空間光調變器，包含：一基板；在該基板上之複數個光調變元件，該等光調變元件經組態以將透射通過該基板之光線干涉調變；一於該基板之下之第一光學補償結構；及一具有一非平坦的部分且配置於該基板與該等光調變元件之間之第二光學補償結構，其中該第二光學補償結構包含一或多個由複數個散射元件、一微透鏡陣列、一漫射片以及一繞射光學元件組成之族群；及一於該第二光學補償結構與該複數個光調變元件之間之平坦層，該平坦層接觸該第二光學補償結構之該非平坦的部分。
  53. 如請求項52之空間光調變器，其中該第二光學補償結構係在該等光調變元件與該空間光調變器之一觀看者之間。
  54. 如請求項52之空間光調變器，其中該第二光學補償結構係在該等光調變元件與該空間光調變器之一前表面之間。
  55. 如請求項52之空間光調變器，其中該等光調變元件之每 一者包含一孔穴及一可動壁面，該可動壁面包含一反射性金屬。
  56. 如請求項52之空間光調變器，其中該平坦層形成用於隨後製造步驟之一支撐層。
  57. 如請求項52之空間光調變器，其中該平坦層藉由一薄膜沉積程序而製成於該第二光學補償結構上。
  58. 如請求項52之空間光調變器，其中該第二光學補償結構包含複數個散射元件。
  59. 如請求項52之空間光調變器，其中該第二光學補償結構包含一微透鏡陣列。
  60. 如請求項52之空間光調變器，其中該第二光學補償結構包含一漫射片。
  61. 如請求項52之空間光調變器，其中該第二光學補償結構包含一繞射光學元件。
  62. 一種空間光調變器，包含：一基板；在該基板上之複數個光調變元件，該等光調變元件經組態以將透射通過該基板之光線干涉調變；一於該基板之下之第一光學補償結構；及一配置於該基板與該等光調變元件之間之第二光學補償結構，其中該第一光學補償結構經組態以達成不同於該第二光學補償結構之一光學效果；及一於該第二光學補償結構與該複數個光調變元件之間之平坦層，該平坦層接觸該第二光學補償結構之該非平 坦的部分。
  63. 如請求項62之空間光調變器，其中該第二光學補償結構係在該等光調變元件與該空間光調變器之一觀看者之間。
  64. 如請求項62之空間光調變器，其中該第二光學補償結構係在該等光調變元件與該空間光調變器之一前表面之間。
  65. 如請求項62之空間光調變器，其中該等光調變元件之每一者包含一孔穴及一可動壁面，該可動壁面包含一反射性金屬。
  66. 如請求項62之空間光調變器，其中該平坦層形成用於隨後製造步驟之一支撐層。
  67. 如請求項62之空間光調變器，其中該平坦層藉由一薄膜沉積程序而製成於該第二光學補償結構上。
  68. 一種空間光調變器，其包含：一基板；複數個個別定址干涉光調變元件，其經組態以將透射通過該基板之光線調變，該等干涉光調變元件包括一可移動反射層；及在該基板與該複數個個別定址干涉光調變元件之間之複數個光學補償結構，該等光學補償結構中之至少一者包括一漫射片。
  69. 如請求項68之空間光調變器，其中該等光學補償結構中之至少一者包含一黑色遮罩。
  70. 如請求項68之空間光調變器，其中該等光學補償結構中之至少一者包含一濾色片。
  71. 如請求項68之空間光調變器，其中該等光學補償結構中之至少一者包含一抗反射層。
  72. 如請求項68之空間光調變器，其中該等光學補償結構中之至少一者包含複數個散射元件。
  73. 如請求項68之空間光調變器，其中該等光學補償結構中之至少一者包含一微透鏡陣列。
  74. 如請求項68之空間光調變器，其中該等光學補償結構中之至少一者包含一全像攝影軟片。
  75. 如請求項68之空間光調變器，其中該等光學補償結構中之至少一者包含一繞射光學元件。
  76. 如請求項68之空間光調變器，其中該等光學補償結構中之至少一者包含一平坦層，該平坦層包含一散射元件。
  77. 如請求項68之空間光調變器，其中該等光學補償結構中之至少一者包含一被動光學補償結構。
  78. 如請求項68之空間光調變器，進一步包含一平坦層。
  79. 如請求項68之空間光調變器，其中該基板係部分透明的。
  80. 如請求項68之空間光調變器，其中該等光學補償結構中之至少一者係在該漫射片與該複數個個別定址干涉光調變元件之間。
  81. 如請求項68之空間光調變器，其中該漫射片係在該等光學補償結構中之至少一者與該複數個個別定址干涉光調 變元件之間。
  82. 如請求項68之空間光調變器，進一步包含驅動器電子。
  83. 一種空間光調變器，其包含：一基板；用於將透射通過之光干涉調變之一構件；及用於補償透射通過該基板之該光之複數個構件，該複數個光補償構件係在該基板與該光調變構件之間，該複數個光補償構件中之至少一者包含一漫射片。
  84. 如請求項83之空間光調變器，其中該光調變構件包含複數個干涉調變器。
  85. 如請求項84之空間光調變器，其中該複數個干涉調變器之每一者包含一可移動反射層。
  86. 如請求項83之空間光調變器，其中該複數個光補償構件包含下列中之至少一者：一黑色遮罩、一濾色片、一抗反射層、複數個散射元件、一微透鏡陣列、一全像攝影軟片、一繞射光學元件及包含一散射元件之一平坦層。
  87. 如請求項83之空間光調變器，其中該等光補償構件中之至少一者包含一被動光學補償結構。
  88. 如請求項83之空間光調變器，其中該基板係部分透明的。
  89. 如請求項83之空間光調變器，進一步包含一平坦層。
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