JP5769356B2 - 中間像を有するカタジオプトリック投影対物レンズ - Google Patents

中間像を有するカタジオプトリック投影対物レンズ Download PDF

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Publication number
JP5769356B2
JP5769356B2 JP2007517043A JP2007517043A JP5769356B2 JP 5769356 B2 JP5769356 B2 JP 5769356B2 JP 2007517043 A JP2007517043 A JP 2007517043A JP 2007517043 A JP2007517043 A JP 2007517043A JP 5769356 B2 JP5769356 B2 JP 5769356B2
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Prior art keywords
concave mirror
lens
mirror
objective
field
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Expired - Fee Related
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Japanese (ja)
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JP2007538277A (ja
Inventor
ドドック アウレリアン
ドドック アウレリアン
ウルリッヒ ヴィルヘルム
ウルリッヒ ヴィルヘルム
エップル アレキサンダー
エップル アレキサンダー
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カール・ツァイス・エスエムティー・ゲーエムベーハー
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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0804—Catadioptric systems using two curved mirrors
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/02—Catoptric systems, e.g. image erecting and reversing system
    • G02B17/06—Catoptric systems, e.g. image erecting and reversing system using mirrors only, i.e. having only one curved mirror
    • G—PHYSICS
    • G02—OPTICS
    • G02B—OPTICAL ELEMENTS, SYSTEMS OR APPARATUS
    • G02B17/00—Systems with reflecting surfaces, with or without refracting elements
    • G02B17/08—Catadioptric systems
    • G02B17/0892—Catadioptric systems specially adapted for the UV
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/7015—Details of optical elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70225—Optical aspects of catadioptric systems, i.e. comprising reflective and refractive elements
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70275—Multiple projection paths, e.g. array of projection systems, microlens projection systems or tandem projection systems

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Optics & Photonics (AREA)
  • Lenses (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
JP2007517043A 2004-05-17 2005-05-13 中間像を有するカタジオプトリック投影対物レンズ Expired - Fee Related JP5769356B2 (ja)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
US57153304P 2004-05-17 2004-05-17
US60/571,533 2004-05-17
PCT/EP2005/005250 WO2005111689A2 (en) 2004-05-17 2005-05-13 Catadioptric projection objective with intermediate images

Related Child Applications (1)

Application Number Title Priority Date Filing Date
JP2013248395A Division JP2014044445A (ja) 2004-05-17 2013-11-29 中間像を有するカタジオプトリック投影対物レンズ

Publications (2)

Publication Number Publication Date
JP2007538277A JP2007538277A (ja) 2007-12-27
JP5769356B2 true JP5769356B2 (ja) 2015-08-26

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Family Applications (7)

Application Number Title Priority Date Filing Date
JP2007517043A Expired - Fee Related JP5769356B2 (ja) 2004-05-17 2005-05-13 中間像を有するカタジオプトリック投影対物レンズ
JP2013248395A Pending JP2014044445A (ja) 2004-05-17 2013-11-29 中間像を有するカタジオプトリック投影対物レンズ
JP2015184063A Pending JP2016027416A (ja) 2004-05-17 2015-09-17 中間像を有するカタジオプトリック投影対物レンズ
JP2015204468A Pending JP2016014900A (ja) 2004-05-17 2015-10-16 中間像を有するカタジオプトリック投影対物レンズ
JP2017036980A Withdrawn JP2017102481A (ja) 2004-05-17 2017-02-28 中間像を有するカタジオプトリック投影対物レンズ
JP2017161404A Withdrawn JP2018010311A (ja) 2004-05-17 2017-08-24 中間像を有するカタジオプトリック投影対物レンズ
JP2018165282A Withdrawn JP2018194868A (ja) 2004-05-17 2018-09-04 中間像を有するカタジオプトリック投影対物レンズ

Family Applications After (6)

Application Number Title Priority Date Filing Date
JP2013248395A Pending JP2014044445A (ja) 2004-05-17 2013-11-29 中間像を有するカタジオプトリック投影対物レンズ
JP2015184063A Pending JP2016027416A (ja) 2004-05-17 2015-09-17 中間像を有するカタジオプトリック投影対物レンズ
JP2015204468A Pending JP2016014900A (ja) 2004-05-17 2015-10-16 中間像を有するカタジオプトリック投影対物レンズ
JP2017036980A Withdrawn JP2017102481A (ja) 2004-05-17 2017-02-28 中間像を有するカタジオプトリック投影対物レンズ
JP2017161404A Withdrawn JP2018010311A (ja) 2004-05-17 2017-08-24 中間像を有するカタジオプトリック投影対物レンズ
JP2018165282A Withdrawn JP2018194868A (ja) 2004-05-17 2018-09-04 中間像を有するカタジオプトリック投影対物レンズ

Country Status (7)

Country Link
US (7) US8107162B2 (OSRAM)
EP (1) EP1751601B1 (OSRAM)
JP (7) JP5769356B2 (OSRAM)
KR (10) KR101213831B1 (OSRAM)
CN (1) CN100483174C (OSRAM)
DE (1) DE602005003665T2 (OSRAM)
WO (1) WO2005111689A2 (OSRAM)

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