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기판 유지 장치 및 그것을 구비하는 노광 장치, 노광 방법, 디바이스 제조 방법, 그리고 발액 플레이트
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KR101330922B1
(ko)
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2004-06-21 |
2013-11-18 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
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US8102512B2
(en)
*
|
2004-09-17 |
2012-01-24 |
Nikon Corporation |
Substrate holding device, exposure apparatus, and device manufacturing method
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TWI436403B
(zh)
*
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2004-10-26 |
2014-05-01 |
尼康股份有限公司 |
A cleaning method, a substrate processing method, an exposure apparatus, and an element manufacturing method
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US7230681B2
(en)
*
|
2004-11-18 |
2007-06-12 |
International Business Machines Corporation |
Method and apparatus for immersion lithography
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JP2006270057A
(ja)
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2005-02-28 |
2006-10-05 |
Canon Inc |
露光装置
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JP5125505B2
(ja)
*
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2005-04-25 |
2013-01-23 |
株式会社ニコン |
露光方法及び露光装置、並びにデバイス製造方法
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US20070177119A1
(en)
*
|
2006-02-02 |
2007-08-02 |
Keiko Chiba |
Exposure apparatus and device manufacturing method
|