JP6978840B2 - 基板処理装置および基板保持装置 - Google Patents
基板処理装置および基板保持装置 Download PDFInfo
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- JP6978840B2 JP6978840B2 JP2017036726A JP2017036726A JP6978840B2 JP 6978840 B2 JP6978840 B2 JP 6978840B2 JP 2017036726 A JP2017036726 A JP 2017036726A JP 2017036726 A JP2017036726 A JP 2017036726A JP 6978840 B2 JP6978840 B2 JP 6978840B2
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- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/6838—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping with gripping and holding devices using a vacuum; Bernoulli devices
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B25—HAND TOOLS; PORTABLE POWER-DRIVEN TOOLS; MANIPULATORS
- B25B—TOOLS OR BENCH DEVICES NOT OTHERWISE PROVIDED FOR, FOR FASTENING, CONNECTING, DISENGAGING OR HOLDING
- B25B11/00—Work holders not covered by any preceding group in the subclass, e.g. magnetic work holders, vacuum work holders
- B25B11/005—Vacuum work holders
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- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C14/00—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material
- C23C14/22—Coating by vacuum evaporation, by sputtering or by ion implantation of the coating forming material characterised by the process of coating
- C23C14/50—Substrate holders
- C23C14/505—Substrate holders for rotation of the substrates
-
- C—CHEMISTRY; METALLURGY
- C23—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; CHEMICAL SURFACE TREATMENT; DIFFUSION TREATMENT OF METALLIC MATERIAL; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL; INHIBITING CORROSION OF METALLIC MATERIAL OR INCRUSTATION IN GENERAL
- C23C—COATING METALLIC MATERIAL; COATING MATERIAL WITH METALLIC MATERIAL; SURFACE TREATMENT OF METALLIC MATERIAL BY DIFFUSION INTO THE SURFACE, BY CHEMICAL CONVERSION OR SUBSTITUTION; COATING BY VACUUM EVAPORATION, BY SPUTTERING, BY ION IMPLANTATION OR BY CHEMICAL VAPOUR DEPOSITION, IN GENERAL
- C23C16/00—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes
- C23C16/44—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating
- C23C16/458—Chemical coating by decomposition of gaseous compounds, without leaving reaction products of surface material in the coating, i.e. chemical vapour deposition [CVD] processes characterised by the method of coating characterised by the method used for supporting substrates in the reaction chamber
- C23C16/4582—Rigid and flat substrates, e.g. plates or discs
- C23C16/4583—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally
- C23C16/4584—Rigid and flat substrates, e.g. plates or discs the substrate being supported substantially horizontally the substrate being rotated
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67017—Apparatus for fluid treatment
- H01L21/67023—Apparatus for fluid treatment for general liquid treatment, e.g. etching followed by cleaning
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/67005—Apparatus not specifically provided for elsewhere
- H01L21/67011—Apparatus for manufacture or treatment
- H01L21/67126—Apparatus for sealing, encapsulating, glassing, decapsulating or the like
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/6875—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a plurality of individual support members, e.g. support posts or protrusions
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68764—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by a movable susceptor, stage or support, others than those only rotating on their own vertical axis, e.g. susceptors on a rotating caroussel
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L21/00—Processes or apparatus adapted for the manufacture or treatment of semiconductor or solid state devices or of parts thereof
- H01L21/67—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere
- H01L21/683—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping
- H01L21/687—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches
- H01L21/68714—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support
- H01L21/68785—Apparatus specially adapted for handling semiconductor or electric solid state devices during manufacture or treatment thereof; Apparatus specially adapted for handling wafers during manufacture or treatment of semiconductor or electric solid state devices or components ; Apparatus not specifically provided for elsewhere for supporting or gripping using mechanical means, e.g. chucks, clamps or pinches the wafers being placed on a susceptor, stage or support characterised by the mechanical construction of the susceptor, stage or support
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- Engineering & Computer Science (AREA)
- Chemical & Material Sciences (AREA)
- Manufacturing & Machinery (AREA)
- Physics & Mathematics (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- General Physics & Mathematics (AREA)
- Mechanical Engineering (AREA)
- Chemical Kinetics & Catalysis (AREA)
- Materials Engineering (AREA)
- Metallurgy (AREA)
- Organic Chemistry (AREA)
- General Chemical & Material Sciences (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Cleaning Or Drying Semiconductors (AREA)
- Weting (AREA)
Description
6 吸引部
9 基板
31 基板保持部
33 基板回転機構
35 吸引ポート
36 支持部
37 シール部
91 (基板の)上面
92 (基板の)下面
341 (ベース部の)上面
342 (ベース部の)中央部
361 第1支持部
362 第2支持部
363 第3支持部
364,365,366 線状部
367 突起部
371 (シール部の)上端部
J1 中心軸
Claims (7)
- 基板を処理する基板処理装置であって、
基板を水平状態で下側から保持する基板保持部と、
前記基板保持部と前記基板との間に存在するガスを吸引して前記基板を前記基板保持部に吸着させる吸引部と、
上下方向を向く中心軸を中心として前記基板保持部を回転する基板回転機構と、
を備え、
前記基板保持部が、
前記中心軸に垂直な上面を有する板状のベース部と、
前記ベース部の前記上面に配置されて前記吸引部に接続される吸引ポートと、
前記ベース部の中央部の周囲において周状に配置され、前記ベース部の前記上面から上方に突出して前記基板の下面を支持する支持部と、
前記支持部の周囲に全周に亘って配置され、上端部が前記支持部よりも上側に位置する可撓性のシール部と、
を備え、
前記基板保持部が前記基板を吸着する際に、前記シール部の前記上端部が前記基板の前記下面に接触した状態で、前記ベース部と前記基板との間に存在するガスが前記吸引ポートを介して吸引されることにより、前記シール部を下向きに撓ませつつ前記基板が前記ベース部に近づいて前記支持部に接触し、
前記支持部が、
前記ベース部の前記中央部の外周に隣接して周状に配置される内側支持部と、
前記シール部の内周に隣接して周状に配置される外側支持部と、
を備え、
前記シール部の内周部が、前記外側支持部と前記ベース部との間で上下方向に挟まれて固定されていることを特徴とする基板処理装置。 - 請求項1に記載の基板処理装置であって、
前記支持部が、前記ベース部の前記中央部の外周に隣接して周状に配置される内側支持部を備え、
前記内側支持部が、それぞれが前記中心軸を中心とする円弧状である複数の線状部を備えることを特徴とする基板処理装置。 - 請求項1に記載の基板処理装置であって、
前記支持部が、前記ベース部の前記中央部の外周に隣接して周状に配置される内側支持部を備え、
前記内側支持部が、前記基板の前記下面に点接触する複数の突起部を備えることを特徴とする基板処理装置。 - 請求項1ないし3のいずれか1つに記載の基板処理装置であって、
前記外側支持部の上端が、前記内側支持部の上端よりも上側に位置することを特徴とする基板処理装置。 - 請求項1ないし4のいずれか1つに記載の基板処理装置であって、
前記シール部のうち前記基板との接触部の表面が、フッ素樹脂製またはシリコーン樹脂製であることを特徴とする基板処理装置。 - 請求項1ないし5のいずれか1つに記載の基板処理装置であって、
前記支持部および前記ベース部が導電性材料製であることを特徴とする基板処理装置。 - 基板を水平状態で下側から保持する基板保持装置であって、
上下方向を向く中心軸に垂直な上面を有する板状のベース部と、
前記ベース部の前記上面に配置され、前記ベース部と基板との間に存在するガスを吸引する吸引部に接続される吸引ポートと、
前記ベース部の中央部の周囲において周状に配置され、前記ベース部の前記上面から上方に突出して前記基板の下面を支持する支持部と、
前記支持部の周囲に全周に亘って配置され、上端部が前記支持部よりも上側に位置する可撓性のシール部と、
を備え、
前記基板を吸着する際に、前記シール部の前記上端部が前記基板の前記下面に接触した状態で、前記ベース部と前記基板との間に存在するガスが前記吸引ポートを介して吸引されることにより、前記シール部を下向きに撓ませつつ前記基板が前記ベース部に近づいて前記支持部に接触し、
前記支持部が、
前記ベース部の前記中央部の外周に隣接して周状に配置される内側支持部と、
前記シール部の内周に隣接して周状に配置される外側支持部と、
を備え、
前記シール部の内周部が、前記外側支持部と前記ベース部との間で上下方向に挟まれて固定されていることを特徴とする基板保持装置。
Priority Applications (5)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2017036726A JP6978840B2 (ja) | 2017-02-28 | 2017-02-28 | 基板処理装置および基板保持装置 |
KR1020180014485A KR102102033B1 (ko) | 2017-02-28 | 2018-02-06 | 기판 처리 장치 및 기판 유지 장치 |
US15/895,165 US10410908B2 (en) | 2017-02-28 | 2018-02-13 | Substrate processing apparatus and substrate holding device |
TW107106190A TWI657530B (zh) | 2017-02-28 | 2018-02-23 | 基板處理裝置及基板保持裝置 |
CN201810160847.4A CN108511383B (zh) | 2017-02-28 | 2018-02-27 | 基板处理装置及基板保持装置 |
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JP2017036726A JP6978840B2 (ja) | 2017-02-28 | 2017-02-28 | 基板処理装置および基板保持装置 |
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JP2018142647A JP2018142647A (ja) | 2018-09-13 |
JP6978840B2 true JP6978840B2 (ja) | 2021-12-08 |
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US (1) | US10410908B2 (ja) |
JP (1) | JP6978840B2 (ja) |
KR (1) | KR102102033B1 (ja) |
CN (1) | CN108511383B (ja) |
TW (1) | TWI657530B (ja) |
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KR102361710B1 (ko) * | 2014-05-21 | 2022-02-10 | 어플라이드 머티어리얼스, 인코포레이티드 | 열 처리 서셉터 |
CN111383979B (zh) * | 2018-12-27 | 2023-03-03 | 上海微电子装备(集团)股份有限公司 | 翘曲片的预对准装置及方法 |
JP7469810B2 (ja) | 2021-05-17 | 2024-04-17 | 有限会社コネクト電機 | 洗浄装置 |
CN114927459B (zh) * | 2022-07-19 | 2022-11-15 | 上海隐冠半导体技术有限公司 | 一种多气路吸附装置 |
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2017
- 2017-02-28 JP JP2017036726A patent/JP6978840B2/ja active Active
-
2018
- 2018-02-06 KR KR1020180014485A patent/KR102102033B1/ko active IP Right Grant
- 2018-02-13 US US15/895,165 patent/US10410908B2/en active Active
- 2018-02-23 TW TW107106190A patent/TWI657530B/zh active
- 2018-02-27 CN CN201810160847.4A patent/CN108511383B/zh active Active
Also Published As
Publication number | Publication date |
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TWI657530B (zh) | 2019-04-21 |
KR20180099466A (ko) | 2018-09-05 |
TW201838079A (zh) | 2018-10-16 |
US20180247854A1 (en) | 2018-08-30 |
JP2018142647A (ja) | 2018-09-13 |
CN108511383A (zh) | 2018-09-07 |
US10410908B2 (en) | 2019-09-10 |
KR102102033B1 (ko) | 2020-04-17 |
CN108511383B (zh) | 2022-09-20 |
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