TW200511388A - Exposure method, substrate stage, exposure apparatus and method for manufacturing device - Google Patents
Exposure method, substrate stage, exposure apparatus and method for manufacturing deviceInfo
- Publication number
- TW200511388A TW200511388A TW093116810A TW93116810A TW200511388A TW 200511388 A TW200511388 A TW 200511388A TW 093116810 A TW093116810 A TW 093116810A TW 93116810 A TW93116810 A TW 93116810A TW 200511388 A TW200511388 A TW 200511388A
- Authority
- TW
- Taiwan
- Prior art keywords
- exposure
- substrate
- substrate stage
- manufacturing device
- liquid
- Prior art date
Links
Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
- G03B27/00—Photographic printing apparatus
- G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
- G03B27/52—Details
- G03B27/58—Baseboards, masking frames, or other holders for the sensitive material
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
- G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
Applications Claiming Priority (3)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP2003169904 | 2003-06-13 | ||
JP2003383887 | 2003-11-13 | ||
JP2004039654 | 2004-02-17 |
Publications (2)
Publication Number | Publication Date |
---|---|
TW200511388A true TW200511388A (en) | 2005-03-16 |
TWI352375B TWI352375B (zh) | 2011-11-11 |
Family
ID=33556144
Family Applications (7)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW100137115A TWI409853B (zh) | 2003-06-13 | 2004-06-11 | An exposure method, a substrate stage, an exposure apparatus, and an element manufacturing method |
TW107102421A TW201818451A (zh) | 2003-06-13 | 2004-06-11 | 曝光裝置、元件製造方法 |
TW98124811A TWI467634B (zh) | 2003-06-13 | 2004-06-11 | An exposure method, a substrate stage, an exposure apparatus, and an element manufacturing method |
TW105104740A TWI607292B (zh) | 2003-06-13 | 2004-06-11 | Exposure device, exposure method, and device manufacturing method |
TW093116810A TW200511388A (en) | 2003-06-13 | 2004-06-11 | Exposure method, substrate stage, exposure apparatus and method for manufacturing device |
TW103128271A TW201445617A (zh) | 2003-06-13 | 2004-06-11 | 基板載台、曝光裝置 |
TW105128062A TWI619148B (zh) | 2003-06-13 | 2004-06-11 | 曝光裝置、元件製造方法 |
Family Applications Before (4)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW100137115A TWI409853B (zh) | 2003-06-13 | 2004-06-11 | An exposure method, a substrate stage, an exposure apparatus, and an element manufacturing method |
TW107102421A TW201818451A (zh) | 2003-06-13 | 2004-06-11 | 曝光裝置、元件製造方法 |
TW98124811A TWI467634B (zh) | 2003-06-13 | 2004-06-11 | An exposure method, a substrate stage, an exposure apparatus, and an element manufacturing method |
TW105104740A TWI607292B (zh) | 2003-06-13 | 2004-06-11 | Exposure device, exposure method, and device manufacturing method |
Family Applications After (2)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
TW103128271A TW201445617A (zh) | 2003-06-13 | 2004-06-11 | 基板載台、曝光裝置 |
TW105128062A TWI619148B (zh) | 2003-06-13 | 2004-06-11 | 曝光裝置、元件製造方法 |
Country Status (7)
Country | Link |
---|---|
US (9) | US7483119B2 (zh) |
EP (5) | EP3104396B1 (zh) |
JP (11) | JP4415939B2 (zh) |
KR (9) | KR101940892B1 (zh) |
HK (3) | HK1196900A1 (zh) |
TW (7) | TWI409853B (zh) |
WO (1) | WO2004112108A1 (zh) |
Families Citing this family (136)
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US10503084B2 (en) | 2002-11-12 | 2019-12-10 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
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2013
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2014
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2015
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2016
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2017
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2018
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2019
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