DE221563C
(fr)
|
|
|
|
|
DE206607C
(fr)
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|
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DE242880C
(fr)
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|
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DE224448C
(fr)
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GB1242527A
(en)
|
1967-10-20 |
1971-08-11 |
Kodak Ltd |
Optical instruments
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US3573975A
(en)
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1968-07-10 |
1971-04-06 |
Ibm |
Photochemical fabrication process
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JPS5033866B2
(fr)
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1972-06-21 |
1975-11-04 |
|
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JPS5033866A
(fr)
|
1973-07-24 |
1975-04-01 |
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US3903413A
(en)
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1973-12-06 |
1975-09-02 |
Polaroid Corp |
Glass-filled polymeric filter element
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JPS6021986B2
(ja)
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1975-01-13 |
1985-05-30 |
帝人株式会社 |
ハロアルコ−ル誘導体の製造法
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US4056880A
(en)
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1976-07-09 |
1977-11-08 |
Westinghouse Electric Corporation |
Method for connecting dynamoelectric machine coils
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JPS5916696B2
(ja)
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1976-07-28 |
1984-04-17 |
岩崎電気株式会社 |
高圧放電灯の製造方法
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JPS5919912Y2
(ja)
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1978-08-21 |
1984-06-08 |
清水建設株式会社 |
複合熱交換器
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JPS5571727A
(en)
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1978-11-24 |
1980-05-30 |
Shin Etsu Chem Co Ltd |
Foamable vinyl chloride resin composition
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ATE1462T1
(de)
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1979-07-27 |
1982-08-15 |
Werner W. Dr. Tabarelli |
Optisches lithographieverfahren und einrichtung zum kopieren eines musters auf eine halbleiterscheibe.
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JPS5645021A
(en)
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1979-09-19 |
1981-04-24 |
Hitachi Ltd |
Moving apparatus
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FR2474708B1
(fr)
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1980-01-24 |
1987-02-20 |
Dme |
Procede de microphotolithographie a haute resolution de traits
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JPS5754317A
(en)
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1980-09-19 |
1982-03-31 |
Hitachi Ltd |
Method and device for forming pattern
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US4509852A
(en)
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1980-10-06 |
1985-04-09 |
Werner Tabarelli |
Apparatus for the photolithographic manufacture of integrated circuit elements
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US4346164A
(en)
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1980-10-06 |
1982-08-24 |
Werner Tabarelli |
Photolithographic method for the manufacture of integrated circuits
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JPS57117238A
(en)
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1981-01-14 |
1982-07-21 |
Nippon Kogaku Kk <Nikon> |
Exposing and baking device for manufacturing integrated circuit with illuminometer
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US4390273A
(en)
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1981-02-17 |
1983-06-28 |
Censor Patent-Und Versuchsanstalt |
Projection mask as well as a method and apparatus for the embedding thereof and projection printing system
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JPS57153433A
(en)
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1981-03-18 |
1982-09-22 |
Hitachi Ltd |
Manufacturing device for semiconductor
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JPS57153433U
(fr)
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1981-03-20 |
1982-09-27 |
|
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JPS58116735A
(ja)
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1981-12-29 |
1983-07-12 |
Canon Inc |
投影焼付方法
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JPS58202448A
(ja)
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1982-05-21 |
1983-11-25 |
Hitachi Ltd |
露光装置
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DD206607A1
(de)
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1982-06-16 |
1984-02-01 |
Mikroelektronik Zt Forsch Tech |
Verfahren und vorrichtung zur beseitigung von interferenzeffekten
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DE3318980C2
(de)
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1982-07-09 |
1986-09-18 |
Perkin-Elmer Censor Anstalt, Vaduz |
Vorrichtung zum Justieren beim Projektionskopieren von Masken
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JPS5916696A
(ja)
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1982-07-16 |
1984-01-27 |
Mitsubishi Heavy Ind Ltd |
溶接開先の自動合せ装置
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JPS5919912A
(ja)
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1982-07-26 |
1984-02-01 |
Hitachi Ltd |
液浸距離保持装置
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JPS59109465A
(ja)
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1982-12-16 |
1984-06-25 |
Mazda Motor Corp |
サスペンシヨンとステアリングの総合制御装置
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DD242880A1
(de)
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1983-01-31 |
1987-02-11 |
Kuch Karl Heinz |
Einrichtung zur fotolithografischen strukturuebertragung
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GB8317846D0
(en)
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1983-06-30 |
1983-08-03 |
Sandoz Products Ltd |
Organic compounds
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DD221563A1
(de)
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1983-09-14 |
1985-04-24 |
Mikroelektronik Zt Forsch Tech |
Immersionsobjektiv fuer die schrittweise projektionsabbildung einer maskenstruktur
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DD224448A1
(de)
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1984-03-01 |
1985-07-03 |
Zeiss Jena Veb Carl |
Einrichtung zur fotolithografischen strukturuebertragung
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JPS61113376A
(ja)
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1984-11-07 |
1986-05-31 |
Sony Corp |
テレビジヨン信号の動き検出装置
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US4853880A
(en)
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1985-08-23 |
1989-08-01 |
Canon Kabushiki Kaisha |
Device for positioning a semi-conductor wafer
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US4887904A
(en)
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1985-08-23 |
1989-12-19 |
Canon Kabushiki Kaisha |
Device for positioning a semi-conductor wafer
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JPH0247515Y2
(fr)
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1985-08-28 |
1990-12-13 |
|
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JPS6265326A
(ja)
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1985-09-18 |
1987-03-24 |
Hitachi Ltd |
露光装置
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JPS6265326U
(fr)
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1985-10-16 |
1987-04-23 |
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US5162642A
(en)
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1985-11-18 |
1992-11-10 |
Canon Kabushiki Kaisha |
Device for detecting the position of a surface
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JPS62121417A
(ja)
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1985-11-22 |
1987-06-02 |
Hitachi Ltd |
液浸対物レンズ装置
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JPS62121417U
(fr)
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1986-01-24 |
1987-08-01 |
|
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JPS63157419A
(ja)
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1986-12-22 |
1988-06-30 |
Toshiba Corp |
微細パタ−ン転写装置
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JPS63157419U
(fr)
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1987-03-31 |
1988-10-14 |
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US5040020A
(en)
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1988-03-31 |
1991-08-13 |
Cornell Research Foundation, Inc. |
Self-aligned, high resolution resonant dielectric lithography
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US5523193A
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1988-05-31 |
1996-06-04 |
Texas Instruments Incorporated |
Method and apparatus for patterning and imaging member
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JPH0228312A
(ja)
*
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1988-07-18 |
1990-01-30 |
Nikon Corp |
露光装置
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JPH0247515A
(ja)
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1988-08-09 |
1990-02-16 |
Mitsubishi Electric Corp |
光学式エンコーダ
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US5231291A
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1989-08-01 |
1993-07-27 |
Canon Kabushiki Kaisha |
Wafer table and exposure apparatus with the same
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JP2737010B2
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1989-08-01 |
1998-04-08 |
キヤノン株式会社 |
露光装置
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JPH03209479A
(ja)
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1989-09-06 |
1991-09-12 |
Sanee Giken Kk |
露光方法
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EP0527166B1
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1990-05-02 |
1995-06-14 |
Fraunhofer-Gesellschaft Zur Förderung Der Angewandten Forschung E.V. |
Dispositif d'exposition a la lumiere
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JP2559076B2
(ja)
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1990-06-28 |
1996-11-27 |
キヤノン株式会社 |
プリアライメント装置
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JP2928603B2
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1990-07-30 |
1999-08-03 |
キヤノン株式会社 |
X線露光装置用ウエハ冷却装置
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US5121256A
(en)
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1991-03-14 |
1992-06-09 |
The Board Of Trustees Of The Leland Stanford Junior University |
Lithography system employing a solid immersion lens
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JPH04305917A
(ja)
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1991-04-02 |
1992-10-28 |
Nikon Corp |
密着型露光装置
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JPH04305915A
(ja)
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1991-04-02 |
1992-10-28 |
Nikon Corp |
密着型露光装置
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JPH0525144A
(ja)
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1991-04-15 |
1993-02-02 |
Nissan Chem Ind Ltd |
ウラシル誘導体及び有害生物防除剤
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1991-04-25 |
1993-09-07 |
Nikon Corporation |
Projection exposure apparatus having an off-axis alignment system and method of alignment therefor
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JP3218478B2
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1992-09-04 |
2001-10-15 |
株式会社ニコン |
投影露光装置及び方法
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JPH0562877A
(ja)
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1991-09-02 |
1993-03-12 |
Yasuko Shinohara |
光によるlsi製造縮小投影露光装置の光学系
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1991-10-08 |
2000-06-20 |
Nikon Corporation |
Projection exposure apparatus and method involving variation and correction of light intensity distributions, detection and control of imaging characteristics, and control of exposure
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1992-01-10 |
1994-11-08 |
Ultratech Stepper, Inc. |
Apparatus for measuring a departure from flatness or straightness of a nominally-plane mirror for a precision X-Y movable-stage
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1992-01-21 |
1993-07-20 |
Hughes Aircraft Company |
Exposure device including an electrically aligned electronic mask for micropatterning
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JPH05251544A
(ja)
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1992-03-05 |
1993-09-28 |
Fujitsu Ltd |
搬送装置
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JPH05304072A
(ja)
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1992-04-08 |
1993-11-16 |
Nec Corp |
半導体装置の製造方法
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JPH06124873A
(ja)
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1992-10-09 |
1994-05-06 |
Canon Inc |
液浸式投影露光装置
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JP2753930B2
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1992-11-27 |
1998-05-20 |
キヤノン株式会社 |
液浸式投影露光装置
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JP2520833B2
(ja)
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1992-12-21 |
1996-07-31 |
東京エレクトロン株式会社 |
浸漬式の液処理装置
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JPH06196381A
(ja)
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1992-12-22 |
1994-07-15 |
Canon Inc |
基板保持装置
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JP3747958B2
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1995-04-07 |
2006-02-22 |
株式会社ニコン |
反射屈折光学系
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1993-06-10 |
1997-08-05 |
Nikon Corporation |
Projection exposure apparatus having an alignment sensor for aligning a mask image with a substrate
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JPH07220990A
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1994-01-28 |
1995-08-18 |
Hitachi Ltd |
パターン形成方法及びその露光装置
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1995-04-04 |
1999-02-23 |
Nikon Corporation |
Window frame-guided stage mechanism
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1994-04-01 |
1996-06-18 |
Nikon Precision, Inc. |
Guideless stage with isolated reaction stage
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1994-05-20 |
1996-05-14 |
Prime View Hk Limited |
System for protection of drive circuits formed on a substrate of a liquid crystal display
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1994-07-18 |
1997-05-27 |
Sheem; Sang K. |
Face-lock interconnection means for optical fibers and other optical components and manufacturing methods of the same
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1994-10-19 |
1997-04-29 |
Nikon Precision Inc. |
Precision motion stage with single guide beam and follower stage
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JP3387075B2
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1994-12-12 |
2003-03-17 |
株式会社ニコン |
走査露光方法、露光装置、及び走査型露光装置
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JPH08171054A
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1994-12-16 |
1996-07-02 |
Nikon Corp |
反射屈折光学系
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JPH08316124A
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1995-05-19 |
1996-11-29 |
Hitachi Ltd |
投影露光方法及び露光装置
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JPH08316125A
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1995-05-19 |
1996-11-29 |
Hitachi Ltd |
投影露光方法及び露光装置
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JP3287761B2
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1995-06-19 |
2002-06-04 |
日本電信電話株式会社 |
真空吸着装置および加工装置
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JPH09184787A
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1995-12-28 |
1997-07-15 |
Olympus Optical Co Ltd |
光学レンズ用解析評価装置
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1996-02-29 |
2005-03-30 |
キヤノン株式会社 |
位置決め装置および露光装置
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1996-03-06 |
2008-04-16 |
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差分干渉計システム及びこのシステムを具えたリソグラフステップアンドスキャン装置
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KR970067585A
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1996-03-25 |
1997-10-13 |
오노 시게오 |
결상특성의 측정방법 및 투영노광방법
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JPH1020195A
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1996-06-28 |
1998-01-23 |
Nikon Corp |
反射屈折光学系
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JP3661291B2
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1996-08-01 |
2005-06-15 |
株式会社ニコン |
露光装置
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JPH1060582A
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1996-08-16 |
1998-03-03 |
Nkk Corp |
耐錆剥離性に優れた煙突・煙道用鋼
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WO1998009278A1
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1996-08-26 |
1998-03-05 |
Digital Papyrus Technologies |
Procede et appareillage de couplage d'une lentille optique a un disque, a travers un milieu de couplage possedant un indice de refraction relativement eleve
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JPH1092728A
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1996-09-11 |
1998-04-10 |
Canon Inc |
基板保持装置およびこれを用いた露光装置
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1996-10-07 |
1998-10-20 |
Nikon Precision Inc. |
Focusing and tilting adjustment system for lithography aligner, manufacturing apparatus or inspection apparatus
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JPH10135316A
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1996-10-28 |
1998-05-22 |
Sony Corp |
薄板状基板の真空吸着方法及びその真空吸着テーブル装置
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JPH10160582A
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1996-12-02 |
1998-06-19 |
Nikon Corp |
透過波面測定用干渉計
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EP0890136B9
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1996-12-24 |
2003-12-10 |
ASML Netherlands B.V. |
Dispositif de positionnement bidimensionnellement equilibre a deux porte-objets, et dispositif lithographique comportant ledit dispositif
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1997-01-29 |
2002-09-05 |
Micronic Laser Systems Ab Taeb |
Verfahren und gerät zur erzeugung eines musters auf einem mit fotoresist beschichteten substrat mittels fokusiertem laserstrahl
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JP3612920B2
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1997-02-14 |
2005-01-26 |
ソニー株式会社 |
光学記録媒体の原盤作製用露光装置
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1997-02-28 |
1998-11-30 |
Micronic Laser Systems Ab |
Dataomvandlingsmetod för en laserskrivare med flera strålar för mycket komplexa mikrokolitografiska mönster
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1997-03-10 |
2006-03-09 |
Asml Netherlands B.V. |
Lithographiegerät mit einer positioniervorrichtung mit zwei objekthaltern
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JPH10255319A
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1997-03-12 |
1998-09-25 |
Hitachi Maxell Ltd |
原盤露光装置及び方法
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JPH10260009A
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1997-03-21 |
1998-09-29 |
Nikon Corp |
座標測定装置
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JP3747566B2
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1997-04-23 |
2006-02-22 |
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液浸型露光装置
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JP3817836B2
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1997-06-10 |
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株式会社ニコン |
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1997-06-25 |
1999-01-22 |
Nikon Corp |
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1997-07-03 |
1999-05-04 |
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Method for optical inspection and lithography
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1997-09-30 |
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Hofmann Mes Und Auswuchttechni |
Verfahren zum Auswuchten eines Rotationskörpers
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1997-10-22 |
2004-02-09 |
株式会社湯山製作所 |
薬剤分割包装装置
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JPH11145034A
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1997-11-07 |
1999-05-28 |
Nikon Corp |
投影露光装置およびパルス発光方法
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JPH11176727A
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1997-12-11 |
1999-07-02 |
Nikon Corp |
投影露光装置
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1997-12-12 |
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Procede d'exposition par projection et graveur a projection
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1997-12-22 |
2001-03-27 |
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Method and apparatus for repetitively projecting a mask pattern on a substrate, using a time-saving height measurement
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1998-01-29 |
1999-08-16 |
Nikon Corporation |
Illumination meter and exposure system
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1998-02-26 |
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基板処理装置
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1998-03-26 |
1999-10-18 |
Nikon Corporation |
Projection exposure method and system
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1998-04-09 |
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Nikon Corp |
投影露光装置および該装置を用いた半導体デバイスの製造方法
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Moving mirror switch
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1998-05-05 |
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Microchamber
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1998-06-30 |
2000-01-21 |
Seiko Epson Corp |
半導体製造装置
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1998-08-11 |
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Nikon Corp |
投影露光装置及び露光方法
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1998-09-22 |
2000-04-07 |
Nikon Corp |
干渉計
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1998-10-14 |
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Nikon Corporation |
Procede et dispositif de mesure de forme, procede de commande de position, dispositif a etage, appareil d'exposition et procede de production dudit appareil d'exposition et dispositif et procede de fabrication du dispositif
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Extreme-UV lithography vacuum chamber zone seal
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干渉計を搭載した投影露光装置
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1999-03-31 |
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Hoya Corp |
基板保持チャックとその製造方法、露光方法、半導体装置の製造方法及び露光装置
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Gas bearings for use in vacuum chambers and their application in lithographic projection apparatus
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1999-04-19 |
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Asml Netherlands Bv |
Moveable support in a vacuum chamber and its application in lithographic projection apparatus
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ステージ装置
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2004-10-26 |
Canon Kabushiki Kaisha |
Substrate attracting and holding system for use in exposure apparatus
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1999-08-26 |
2001-03-16 |
Kobe Steel Ltd |
表面形状測定装置
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Nikon Corporation |
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WO2007049603A1
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2005-10-24 |
2007-05-03 |
Nikon Corporation |
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2005-12-27 |
2008-09-02 |
Asml Netherlands B.V. |
Lithographic apparatus and substrate edge seal
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*
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2005-12-30 |
2010-01-19 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
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CA2573585A1
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2006-02-16 |
2007-08-16 |
Sulzer Metco Coatings B.V. |
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2009-11-11 |
Asml Netherlands Bv |
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