HK1196900A1 - Exposure method, substrate stage, exposure apparatus, and device manufacturing method - Google Patents

Exposure method, substrate stage, exposure apparatus, and device manufacturing method

Info

Publication number
HK1196900A1
HK1196900A1 HK14110233.0A HK14110233A HK1196900A1 HK 1196900 A1 HK1196900 A1 HK 1196900A1 HK 14110233 A HK14110233 A HK 14110233A HK 1196900 A1 HK1196900 A1 HK 1196900A1
Authority
HK
Hong Kong
Prior art keywords
exposure
device manufacturing
substrate stage
exposure apparatus
exposure method
Prior art date
Application number
HK14110233.0A
Other languages
English (en)
Chinese (zh)
Inventor
Soichi Owa
Nobutaka Magome
Shigeru Hirukawa
Yoshihiko Kudo
Jiro Inoue
Hirotaka Kohno
Masahiro Nei
Motokatsu Imai
Hiroyuki Nagasaka
Kenichi Shiraishi
Yasufumi Nishii
Hiroaki Takaiwa
Original Assignee
Nikon Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Nikon Corp filed Critical Nikon Corp
Publication of HK1196900A1 publication Critical patent/HK1196900A1/xx

Links

Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03B—APPARATUS OR ARRANGEMENTS FOR TAKING PHOTOGRAPHS OR FOR PROJECTING OR VIEWING THEM; APPARATUS OR ARRANGEMENTS EMPLOYING ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ACCESSORIES THEREFOR
    • G03B27/00—Photographic printing apparatus
    • G03B27/32—Projection printing apparatus, e.g. enlarger, copying camera
    • G03B27/52—Details
    • G03B27/58—Baseboards, masking frames, or other holders for the sensitive material
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G03F7/2041—Exposure; Apparatus therefor in the presence of a fluid, e.g. immersion; using fluid cooling means
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/707—Chucks, e.g. chucking or un-chucking operations or structural details
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70691—Handling of masks or workpieces
    • G03F7/70716—Stages
HK14110233.0A 2003-06-13 2014-10-14 Exposure method, substrate stage, exposure apparatus, and device manufacturing method HK1196900A1 (en)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
JP2003169904 2003-06-13
JP2003383887 2003-11-13
JP2004039654 2004-02-17

Publications (1)

Publication Number Publication Date
HK1196900A1 true HK1196900A1 (en) 2014-12-24

Family

ID=33556144

Family Applications (3)

Application Number Title Priority Date Filing Date
HK14110233.0A HK1196900A1 (en) 2003-06-13 2014-10-14 Exposure method, substrate stage, exposure apparatus, and device manufacturing method
HK16102657.2A HK1214680A1 (zh) 2003-06-13 2016-03-08 曝光方法、基片台、曝光設備以及器件製造方法
HK19100965.0A HK1258606A1 (zh) 2003-06-13 2019-01-18 曝光設備以及裝置製造方法

Family Applications After (2)

Application Number Title Priority Date Filing Date
HK16102657.2A HK1214680A1 (zh) 2003-06-13 2016-03-08 曝光方法、基片台、曝光設備以及器件製造方法
HK19100965.0A HK1258606A1 (zh) 2003-06-13 2019-01-18 曝光設備以及裝置製造方法

Country Status (7)

Country Link
US (9) US7483119B2 (xx)
EP (5) EP2937893B1 (xx)
JP (11) JP4415939B2 (xx)
KR (9) KR20180112884A (xx)
HK (3) HK1196900A1 (xx)
TW (7) TW200511388A (xx)
WO (1) WO2004112108A1 (xx)

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