SG185343A1 - Stage drive method and stage unit, exposure apparatus, and device manufacturing method - Google Patents
Stage drive method and stage unit, exposure apparatus, and device manufacturing method Download PDFInfo
- Publication number
- SG185343A1 SG185343A1 SG2012080503A SG2012080503A SG185343A1 SG 185343 A1 SG185343 A1 SG 185343A1 SG 2012080503 A SG2012080503 A SG 2012080503A SG 2012080503 A SG2012080503 A SG 2012080503A SG 185343 A1 SG185343 A1 SG 185343A1
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- Singapore
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Links
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Classifications
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70716—Stages
- G03F7/70725—Stages control
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70483—Information management; Active and passive control; Testing; Wafer monitoring, e.g. pattern monitoring
- G03F7/70605—Workpiece metrology
- G03F7/70653—Metrology techniques
- G03F7/70666—Aerial image, i.e. measuring the image of the patterned exposure light at the image plane of the projection system
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70733—Handling masks and workpieces, e.g. exchange of workpiece or mask, transport of workpiece or mask
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70758—Drive means, e.g. actuators, motors for long- or short-stroke modules or fine or coarse driving
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70691—Handling of masks or workpieces
- G03F7/70775—Position control, e.g. interferometers or encoders for determining the stage position
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70808—Construction details, e.g. housing, load-lock, seals or windows for passing light in or out of apparatus
- G03F7/70833—Mounting of optical systems, e.g. mounting of illumination system, projection system or stage systems on base-plate or ground
-
- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
- G03F7/70908—Hygiene, e.g. preventing apparatus pollution, mitigating effect of pollution or removing pollutants from apparatus
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49155—Manufacturing circuit on or in base
Landscapes
- Physics & Mathematics (AREA)
- General Physics & Mathematics (AREA)
- Health & Medical Sciences (AREA)
- Epidemiology (AREA)
- Public Health (AREA)
- Engineering & Computer Science (AREA)
- Environmental & Geological Engineering (AREA)
- Life Sciences & Earth Sciences (AREA)
- Atmospheric Sciences (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Container, Conveyance, Adherence, Positioning, Of Wafer (AREA)
- Condensed Matter Physics & Semiconductors (AREA)
- Manufacturing & Machinery (AREA)
- Computer Hardware Design (AREA)
- Microelectronics & Electronic Packaging (AREA)
- Power Engineering (AREA)
- Liquid Crystal (AREA)
- Design And Manufacture Of Integrated Circuits (AREA)
- Eyeglasses (AREA)
- Prostheses (AREA)
- Optics & Photonics (AREA)
Applications Claiming Priority (2)
| Application Number | Priority Date | Filing Date | Title |
|---|---|---|---|
| JP2004025837 | 2004-02-02 | ||
| JP2004300566 | 2004-10-14 |
Publications (1)
| Publication Number | Publication Date |
|---|---|
| SG185343A1 true SG185343A1 (en) | 2012-11-29 |
Family
ID=34829444
Family Applications (5)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG2012080503A SG185343A1 (en) | 2004-02-02 | 2005-01-27 | Stage drive method and stage unit, exposure apparatus, and device manufacturing method |
| SG200903000-8A SG152291A1 (en) | 2004-02-02 | 2005-01-27 | Stage drive method and stage unit, exposure apparatus, and device manufacturing method |
| SG2012080495A SG185342A1 (en) | 2004-02-02 | 2005-01-27 | Stage drive method and stage unit, exposure apparatus, and device manufacturing method |
| SG200903003-2A SG152294A1 (en) | 2004-02-02 | 2005-01-27 | Stage drive method and stage unit, exposure apparatus, and device manufacturing method |
| SG2013076823A SG195559A1 (en) | 2004-02-02 | 2005-01-27 | Stage drive method and stage unit, exposure apparatus, and device manufacturing method |
Family Applications After (4)
| Application Number | Title | Priority Date | Filing Date |
|---|---|---|---|
| SG200903000-8A SG152291A1 (en) | 2004-02-02 | 2005-01-27 | Stage drive method and stage unit, exposure apparatus, and device manufacturing method |
| SG2012080495A SG185342A1 (en) | 2004-02-02 | 2005-01-27 | Stage drive method and stage unit, exposure apparatus, and device manufacturing method |
| SG200903003-2A SG152294A1 (en) | 2004-02-02 | 2005-01-27 | Stage drive method and stage unit, exposure apparatus, and device manufacturing method |
| SG2013076823A SG195559A1 (en) | 2004-02-02 | 2005-01-27 | Stage drive method and stage unit, exposure apparatus, and device manufacturing method |
Country Status (11)
| Country | Link |
|---|---|
| US (15) | US7589822B2 (enExample) |
| EP (9) | EP2980834B1 (enExample) |
| JP (16) | JP4910394B2 (enExample) |
| KR (16) | KR101476015B1 (enExample) |
| CN (1) | CN101685263B (enExample) |
| AT (1) | ATE493753T1 (enExample) |
| DE (1) | DE602005025596D1 (enExample) |
| IL (7) | IL226838A (enExample) |
| SG (5) | SG185343A1 (enExample) |
| TW (14) | TWI437376B (enExample) |
| WO (1) | WO2005074014A1 (enExample) |
Families Citing this family (198)
| Publication number | Priority date | Publication date | Assignee | Title |
|---|---|---|---|---|
| SG121822A1 (en) | 2002-11-12 | 2006-05-26 | Asml Netherlands Bv | Lithographic apparatus and device manufacturing method |
| US10503084B2 (en) | 2002-11-12 | 2019-12-10 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US9482966B2 (en) | 2002-11-12 | 2016-11-01 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| SG139733A1 (en) | 2003-04-11 | 2008-02-29 | Nikon Corp | Apparatus having an immersion fluid system configured to maintain immersion fluid in a gap adjacent an optical assembly |
| TWI543235B (zh) * | 2003-06-19 | 2016-07-21 | å°¼åŗ·č”份ęéå ¬åø | A method of manufacturing an exposure apparatus and an element |
| SG145780A1 (en) * | 2003-08-29 | 2008-09-29 | Nikon Corp | Exposure apparatus and device fabricating method |
| US7589822B2 (en) | 2004-02-02 | 2009-09-15 | Nikon Corporation | Stage drive method and stage unit, exposure apparatus, and device manufacturing method |
| US20070030467A1 (en) * | 2004-02-19 | 2007-02-08 | Nikon Corporation | Exposure apparatus, exposure method, and device fabricating method |
| JP4220423B2 (ja) * | 2004-03-24 | 2009-02-04 | ę Ŗå¼ä¼ē¤¾ę±č | ć¬ćøć¹ćććæć¼ć³å½¢ęę¹ę³ |
| WO2005093792A1 (ja) * | 2004-03-25 | 2005-10-06 | Nikon Corporation | é²å č£ ē½®åć³é²å ę¹ę³ćäø¦ć³ć«ććć¤ć¹č£½é ę¹ę³ |
| KR101245070B1 (ko) * | 2004-06-21 | 2013-03-18 | ź°ė¶ģķ¤ź°ģ“ģ¤ ėģ½ | ė øź“ ģ„ģ¹ ė° ź·ø ė¶ģ¬ģ ģøģ ė°©ė², ė øź“ ģ„ģ¹ģ ė©ģøķ°ėģ¤ ė°©ė², ė©ģøķ°ėģ¤ źø°źø°, ź·øė¦¬ź³ ėė°ģ“ģ¤ ģ ģ”° ė°©ė² |
| WO2006041100A1 (ja) | 2004-10-15 | 2006-04-20 | Nikon Corporation | é²å č£ ē½®åć³ććć¤ć¹č£½é ę¹ę³ |
| US7119876B2 (en) * | 2004-10-18 | 2006-10-10 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| KR101318037B1 (ko) * | 2004-11-01 | 2013-10-14 | ź°ė¶ģķ¤ź°ģ“ģ¤ ėģ½ | ė øź“ ģ„ģ¹ ė° ėė°ģ“ģ¤ ģ ģ”° ė°©ė² |
| TWI649790B (zh) * | 2004-11-18 | 2019-02-01 | ę„åå°¼åŗ·č”份ęéå ¬åø | ä½ē½®ęø¬éę¹ę³ćä½ē½®ę§å¶ę¹ę³ćęø¬éę¹ę³ćč£č¼ę¹ę³ćęå ę¹ę³åęå č£ē½®ćåå ä»¶č£½é ę¹ę³ |
| KR20070100865A (ko) * | 2004-12-06 | 2007-10-12 | ź°ė¶ģķ¤ź°ģ“ģ¤ ėģ½ | źø°ķ ģ²ė¦¬ ė°©ė², ė øź“ ė°©ė², ė øź“ ģ„ģ¹ ė° ėė°ģ“ģ¤ ģ ģ”°ė°©ė² |
| US7528931B2 (en) | 2004-12-20 | 2009-05-05 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US20070258068A1 (en) * | 2005-02-17 | 2007-11-08 | Hiroto Horikawa | Exposure Apparatus, Exposure Method, and Device Fabricating Method |
| USRE43576E1 (en) * | 2005-04-08 | 2012-08-14 | Asml Netherlands B.V. | Dual stage lithographic apparatus and device manufacturing method |
| WO2006118258A1 (ja) | 2005-04-28 | 2006-11-09 | Nikon Corporation | é²å ę¹ę³åć³é²å č£ ē½®ćäø¦ć³ć«ććć¤ć¹č£½é ę¹ę³ |
| WO2007018127A1 (ja) * | 2005-08-05 | 2007-02-15 | Nikon Corporation | ć¹ćć¼ćøč£ ē½®åć³é²å č£ ē½® |
| SG170060A1 (en) * | 2005-09-09 | 2011-04-29 | Nikon Corp | Exposure apparatus, exposure method, and device production method |
| US7633073B2 (en) | 2005-11-23 | 2009-12-15 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
| US7871933B2 (en) * | 2005-12-01 | 2011-01-18 | International Business Machines Corporation | Combined stepper and deposition tool |
| US8953148B2 (en) | 2005-12-28 | 2015-02-10 | Nikon Corporation | Exposure apparatus and making method thereof |
| EP1975982A1 (en) | 2005-12-28 | 2008-10-01 | Nikon Corporation | Pattern formation method and pattern formation apparatus, exposure metho and exposure apparatus, and device manufacturing method |
| WO2007080523A1 (en) * | 2006-01-10 | 2007-07-19 | Koninklijke Philips Electronics N.V. | Maglev object positioning apparatus and method for positioning an object and maintaining position with high stability |
| EP1983555B1 (en) | 2006-01-19 | 2014-05-28 | Nikon Corporation | Movable body drive method, movable body drive system, pattern formation method, pattern forming apparatus, exposure method, exposure apparatus and device manufacturing method |
| EP3267259A1 (en) | 2006-02-21 | 2018-01-10 | Nikon Corporation | Exposure apparatus, exposure method, and device manufacturing method |
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- 2007-04-20 US US11/785,860 patent/US8045136B2/en not_active Expired - Fee Related
- 2007-06-22 US US11/812,919 patent/US9632431B2/en not_active Expired - Fee Related
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2009
- 2009-05-08 US US12/453,386 patent/US20090231564A1/en not_active Abandoned
- 2009-08-05 US US12/461,246 patent/US8547528B2/en not_active Expired - Fee Related
- 2009-08-05 US US12/461,244 patent/US8553203B2/en not_active Expired - Fee Related
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2010
- 2010-01-22 JP JP2010012364A patent/JP4952803B2/ja not_active Expired - Fee Related
- 2010-01-22 JP JP2010012363A patent/JP4952802B2/ja not_active Expired - Fee Related
- 2010-03-24 US US12/659,894 patent/US9665016B2/en not_active Expired - Fee Related
- 2010-10-07 US US12/923,784 patent/US8711328B2/en not_active Expired - Fee Related
- 2010-10-07 US US12/923,786 patent/US8736808B2/en active Active
- 2010-10-07 US US12/923,783 patent/US8724079B2/en active Active
- 2010-10-07 US US12/923,785 patent/US8705002B2/en not_active Expired - Fee Related
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2011
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- 2011-02-14 JP JP2011028991A patent/JP5287896B2/ja not_active Expired - Fee Related
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2012
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2013
- 2013-04-08 JP JP2013080851A patent/JP5488741B2/ja not_active Expired - Fee Related
- 2013-06-09 IL IL226838A patent/IL226838A0/en unknown
- 2013-06-09 IL IL226841A patent/IL226841A0/en unknown
- 2013-06-09 IL IL226840A patent/IL226840A/en active IP Right Grant
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- 2013-12-26 JP JP2013268680A patent/JP5630557B2/ja not_active Expired - Fee Related
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2014
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2015
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2016
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2017
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2018
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