JP6253982B2 - 電気活性材料 - Google Patents
電気活性材料 Download PDFInfo
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- JP6253982B2 JP6253982B2 JP2013526547A JP2013526547A JP6253982B2 JP 6253982 B2 JP6253982 B2 JP 6253982B2 JP 2013526547 A JP2013526547 A JP 2013526547A JP 2013526547 A JP2013526547 A JP 2013526547A JP 6253982 B2 JP6253982 B2 JP 6253982B2
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- electroactive
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- 239000011263 electroactive material Substances 0.000 title claims description 71
- 239000002245 particle Substances 0.000 claims description 272
- XUIMIQQOPSSXEZ-UHFFFAOYSA-N Silicon Chemical compound [Si] XUIMIQQOPSSXEZ-UHFFFAOYSA-N 0.000 claims description 255
- 229910052710 silicon Inorganic materials 0.000 claims description 248
- 239000010703 silicon Substances 0.000 claims description 248
- 239000000203 mixture Substances 0.000 claims description 184
- 239000000835 fiber Substances 0.000 claims description 102
- 239000000463 material Substances 0.000 claims description 81
- 238000004519 manufacturing process Methods 0.000 claims description 47
- 239000011230 binding agent Substances 0.000 claims description 43
- -1 silicon nitrides Chemical class 0.000 claims description 26
- 239000012634 fragment Substances 0.000 claims description 23
- 229910052751 metal Inorganic materials 0.000 claims description 22
- 239000002184 metal Substances 0.000 claims description 22
- 239000004020 conductor Substances 0.000 claims description 18
- 239000003792 electrolyte Substances 0.000 claims description 14
- 229910052752 metalloid Inorganic materials 0.000 claims description 13
- 150000002738 metalloids Chemical class 0.000 claims description 13
- 239000007822 coupling agent Substances 0.000 claims description 11
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 claims description 10
- 229910052718 tin Inorganic materials 0.000 claims description 10
- 239000004034 viscosity adjusting agent Substances 0.000 claims description 10
- 239000002318 adhesion promoter Substances 0.000 claims description 9
- 239000000945 filler Substances 0.000 claims description 9
- 238000002156 mixing Methods 0.000 claims description 9
- 229910000676 Si alloy Inorganic materials 0.000 claims description 8
- GNPVGFCGXDBREM-UHFFFAOYSA-N germanium atom Chemical compound [Ge] GNPVGFCGXDBREM-UHFFFAOYSA-N 0.000 claims description 8
- 229910052732 germanium Inorganic materials 0.000 claims description 7
- 239000011800 void material Substances 0.000 claims description 6
- 239000004615 ingredient Substances 0.000 claims description 3
- 229910052814 silicon oxide Inorganic materials 0.000 claims description 2
- LIVNPJMFVYWSIS-UHFFFAOYSA-N silicon monoxide Chemical class [Si-]#[O+] LIVNPJMFVYWSIS-UHFFFAOYSA-N 0.000 claims 1
- OKTJSMMVPCPJKN-UHFFFAOYSA-N Carbon Chemical compound [C] OKTJSMMVPCPJKN-UHFFFAOYSA-N 0.000 description 51
- 238000000034 method Methods 0.000 description 42
- 239000007772 electrode material Substances 0.000 description 34
- 239000011148 porous material Substances 0.000 description 34
- 239000011856 silicon-based particle Substances 0.000 description 31
- 238000000576 coating method Methods 0.000 description 28
- 229910052799 carbon Inorganic materials 0.000 description 26
- 239000011248 coating agent Substances 0.000 description 23
- HBBGRARXTFLTSG-UHFFFAOYSA-N Lithium ion Chemical compound [Li+] HBBGRARXTFLTSG-UHFFFAOYSA-N 0.000 description 22
- 239000002131 composite material Substances 0.000 description 22
- 229910002804 graphite Inorganic materials 0.000 description 22
- 239000010439 graphite Substances 0.000 description 22
- 229910001416 lithium ion Inorganic materials 0.000 description 22
- 229920002125 Sokalan® Polymers 0.000 description 17
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 17
- 238000012856 packing Methods 0.000 description 17
- 229910052782 aluminium Inorganic materials 0.000 description 16
- 239000010405 anode material Substances 0.000 description 16
- 239000004584 polyacrylic acid Substances 0.000 description 15
- 239000002210 silicon-based material Substances 0.000 description 15
- 239000002904 solvent Substances 0.000 description 15
- 239000000758 substrate Substances 0.000 description 15
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 description 14
- 238000005530 etching Methods 0.000 description 14
- 229910052744 lithium Inorganic materials 0.000 description 14
- WHXSMMKQMYFTQS-UHFFFAOYSA-N Lithium Chemical compound [Li] WHXSMMKQMYFTQS-UHFFFAOYSA-N 0.000 description 13
- 239000006229 carbon black Substances 0.000 description 13
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- 239000010410 layer Substances 0.000 description 10
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- 229920000642 polymer Polymers 0.000 description 8
- 230000002829 reductive effect Effects 0.000 description 8
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 7
- 239000006183 anode active material Substances 0.000 description 7
- 229910052802 copper Inorganic materials 0.000 description 7
- 239000010949 copper Substances 0.000 description 7
- 229910021420 polycrystalline silicon Inorganic materials 0.000 description 7
- 239000011135 tin Substances 0.000 description 7
- XEEYBQQBJWHFJM-UHFFFAOYSA-N Iron Chemical compound [Fe] XEEYBQQBJWHFJM-UHFFFAOYSA-N 0.000 description 6
- MUBZPKHOEPUJKR-UHFFFAOYSA-N Oxalic acid Chemical compound OC(=O)C(O)=O MUBZPKHOEPUJKR-UHFFFAOYSA-N 0.000 description 6
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 6
- 239000002086 nanomaterial Substances 0.000 description 6
- 230000008569 process Effects 0.000 description 6
- 239000007784 solid electrolyte Substances 0.000 description 6
- 238000007600 charging Methods 0.000 description 5
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- 238000009830 intercalation Methods 0.000 description 5
- 230000002687 intercalation Effects 0.000 description 5
- 229910003002 lithium salt Inorganic materials 0.000 description 5
- 159000000002 lithium salts Chemical class 0.000 description 5
- 239000011159 matrix material Substances 0.000 description 5
- 239000012798 spherical particle Substances 0.000 description 5
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 4
- 239000004698 Polyethylene Substances 0.000 description 4
- 239000004372 Polyvinyl alcohol Substances 0.000 description 4
- 229910052783 alkali metal Inorganic materials 0.000 description 4
- 230000015572 biosynthetic process Effects 0.000 description 4
- 239000000919 ceramic Substances 0.000 description 4
- 150000001875 compounds Chemical class 0.000 description 4
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- 238000001035 drying Methods 0.000 description 4
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- PQXKHYXIUOZZFA-UHFFFAOYSA-M lithium fluoride Chemical compound [Li+].[F-] PQXKHYXIUOZZFA-UHFFFAOYSA-M 0.000 description 4
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- NNMHYFLPFNGQFZ-UHFFFAOYSA-M sodium polyacrylate Chemical compound [Na+].[O-]C(=O)C=C NNMHYFLPFNGQFZ-UHFFFAOYSA-M 0.000 description 4
- 239000000126 substance Substances 0.000 description 4
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- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 4
- WEVYAHXRMPXWCK-UHFFFAOYSA-N Acetonitrile Chemical compound CC#N WEVYAHXRMPXWCK-UHFFFAOYSA-N 0.000 description 3
- 229920002134 Carboxymethyl cellulose Polymers 0.000 description 3
- JLVVSXFLKOJNIY-UHFFFAOYSA-N Magnesium ion Chemical compound [Mg+2] JLVVSXFLKOJNIY-UHFFFAOYSA-N 0.000 description 3
- ZMXDDKWLCZADIW-UHFFFAOYSA-N N,N-Dimethylformamide Chemical compound CN(C)C=O ZMXDDKWLCZADIW-UHFFFAOYSA-N 0.000 description 3
- 239000002033 PVDF binder Substances 0.000 description 3
- RTAQQCXQSZGOHL-UHFFFAOYSA-N Titanium Chemical group [Ti] RTAQQCXQSZGOHL-UHFFFAOYSA-N 0.000 description 3
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 3
- 239000011149 active material Substances 0.000 description 3
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- 239000008112 carboxymethyl-cellulose Substances 0.000 description 3
- 238000005119 centrifugation Methods 0.000 description 3
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- 125000000524 functional group Chemical group 0.000 description 3
- 238000010438 heat treatment Methods 0.000 description 3
- 229910052742 iron Inorganic materials 0.000 description 3
- 229910001425 magnesium ion Inorganic materials 0.000 description 3
- 230000014759 maintenance of location Effects 0.000 description 3
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- 239000011255 nonaqueous electrolyte Substances 0.000 description 3
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- 239000011863 silicon-based powder Substances 0.000 description 3
- 238000012360 testing method Methods 0.000 description 3
- AZUYLZMQTIKGSC-UHFFFAOYSA-N 1-[6-[4-(5-chloro-6-methyl-1H-indazol-4-yl)-5-methyl-3-(1-methylindazol-5-yl)pyrazol-1-yl]-2-azaspiro[3.3]heptan-2-yl]prop-2-en-1-one Chemical compound ClC=1C(=C2C=NNC2=CC=1C)C=1C(=NN(C=1C)C1CC2(CN(C2)C(C=C)=O)C1)C=1C=C2C=NN(C2=CC=1)C AZUYLZMQTIKGSC-UHFFFAOYSA-N 0.000 description 2
- YEJRWHAVMIAJKC-UHFFFAOYSA-N 4-Butyrolactone Chemical compound O=C1CCCO1 YEJRWHAVMIAJKC-UHFFFAOYSA-N 0.000 description 2
- IJGRMHOSHXDMSA-UHFFFAOYSA-N Atomic nitrogen Chemical compound N#N IJGRMHOSHXDMSA-UHFFFAOYSA-N 0.000 description 2
- ZOXJGFHDIHLPTG-UHFFFAOYSA-N Boron Chemical compound [B] ZOXJGFHDIHLPTG-UHFFFAOYSA-N 0.000 description 2
- IAZDPXIOMUYVGZ-UHFFFAOYSA-N Dimethylsulphoxide Chemical compound CS(C)=O IAZDPXIOMUYVGZ-UHFFFAOYSA-N 0.000 description 2
- 239000004593 Epoxy Substances 0.000 description 2
- ZHNUHDYFZUAESO-UHFFFAOYSA-N Formamide Chemical compound NC=O ZHNUHDYFZUAESO-UHFFFAOYSA-N 0.000 description 2
- DGAQECJNVWCQMB-PUAWFVPOSA-M Ilexoside XXIX Chemical compound C[C@@H]1CC[C@@]2(CC[C@@]3(C(=CC[C@H]4[C@]3(CC[C@@H]5[C@@]4(CC[C@@H](C5(C)C)OS(=O)(=O)[O-])C)C)[C@@H]2[C@]1(C)O)C)C(=O)O[C@H]6[C@@H]([C@H]([C@@H]([C@H](O6)CO)O)O)O.[Na+] DGAQECJNVWCQMB-PUAWFVPOSA-M 0.000 description 2
- WMFOQBRAJBCJND-UHFFFAOYSA-M Lithium hydroxide Chemical compound [Li+].[OH-] WMFOQBRAJBCJND-UHFFFAOYSA-M 0.000 description 2
- 229910019142 PO4 Inorganic materials 0.000 description 2
- XLOMVQKBTHCTTD-UHFFFAOYSA-N Zinc monoxide Chemical compound [Zn]=O XLOMVQKBTHCTTD-UHFFFAOYSA-N 0.000 description 2
- 238000009825 accumulation Methods 0.000 description 2
- WNLRTRBMVRJNCN-UHFFFAOYSA-N adipic acid Chemical compound OC(=O)CCCCC(O)=O WNLRTRBMVRJNCN-UHFFFAOYSA-N 0.000 description 2
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- 229910045601 alloy Inorganic materials 0.000 description 2
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- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 2
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- AMXOYNBUYSYVKV-UHFFFAOYSA-M lithium bromide Chemical compound [Li+].[Br-] AMXOYNBUYSYVKV-UHFFFAOYSA-M 0.000 description 2
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- 229910000625 lithium cobalt oxide Inorganic materials 0.000 description 2
- BFZPBUKRYWOWDV-UHFFFAOYSA-N lithium;oxido(oxo)cobalt Chemical group [Li+].[O-][Co]=O BFZPBUKRYWOWDV-UHFFFAOYSA-N 0.000 description 2
- BDAGIHXWWSANSR-UHFFFAOYSA-N methanoic acid Natural products OC=O BDAGIHXWWSANSR-UHFFFAOYSA-N 0.000 description 2
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- Y02E60/10—Energy storage using batteries
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- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y02—TECHNOLOGIES OR APPLICATIONS FOR MITIGATION OR ADAPTATION AGAINST CLIMATE CHANGE
- Y02P—CLIMATE CHANGE MITIGATION TECHNOLOGIES IN THE PRODUCTION OR PROCESSING OF GOODS
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- Y02P70/50—Manufacturing or production processes characterised by the final manufactured product
Description
V T = V Si + V B + V C + V G + V p
ここで、VTはアノード材料の合計容積;VSiは前記アノード材料中の前記最小多孔性電気活性シリコン要素の合計容積;VBはバインダーの合計容積;VCは導電性材料(存在すれば)の容積;VGは、追加の電気活性材料(存在すればグラファイトなど)の合計容積および、VPは、アノード材料内のポア又は空隙で占められる合計容積である。材料の全ポア容積VPは、又は多孔度として知られており、全容積VTのパーセントとして表現される。
Vu Si − Vu Sig = VG(1−1/α)
ここで、Vu Sigは、シリコン及び非シリコン含有電気活性材料を含む電極活性材料を含む電気活性材料を含む荷電されていない材料のポアにより占められる容積、Vu Siは、電気活性シリコン含有材料のみを含む荷電されていない材料のポアにより占められる容積、VGは前記追加の電気活性材料の容積、及びαは、シリコン含有電気活性材料の容積膨張因子(言い換えると、シリコン含有電気活性材料の容積Vは、リチウムイオンの挿入により放電サイクルの最後でαVへ増加する)である。この計算は、前記シリコン含有電気活性材料が、それぞれの場合に同じ容積膨張因子を持ち、さらなる電気活性材料の容積膨張は最小であり、且つ、無視でき、かつ最終充電状態でのそれぞれのアノードミックスの多孔性が同じであることが仮定されている。
用語、ピラー化粒子は、その表面上に与えられた1以上のピラーを持つ粒子を含み、そこで前記ピラーは1から100μmの長さを持つ。かかるピラーは、粒子コアと一体で形成されてもよく、又は粒子コアとは別に形成され得る。全直径が20から30μm、好ましくは25μm、ピラー長さが10μmまで、好ましくは4から6μm、を持つシリコン含有ピラー化粒子が好ましい。
追加の成分が、本発明の第1の側面による材料の製造に使用され得る。本発明の第2の側面の第1の実施態様では、本発明の第1の側面による組成物を製造する方法が提供され、前記方法は、複数の細長い要素シリコン含有要素と複数のシリコン含有粒子を混合し、及びそこに、バインダー、導電性材料、粘度調節剤、フィラー、クロスリンク促進剤、カップリング剤及び接着性促進剤からなる群から選択される1以上の成分を添加することを含む。この第1の実施態様により製造された材料は、電極、好ましくはリチウムイオン電池で使用されるアノードの製造に使用され得る。本発明の第2の側面の好ましい実施態様では、前記方法は、複数の細長いシリコン含有要素を複数のシリコン含有粒子及びバインダとを混合することを含む。
好適なリチウム塩の例は、LiCl、LiBr、LiI、LiClO4、LiBF4、LiB10C20、LiPF6、LiCF3SO3、LiAsF6、LiSbF6、LiAlCl4、CH3SO3Li及びCF3SO3Liを含む。
実施例1a − ファイバ
ファイバは、p又はn−タイプシリコンウェハのいずれかをエッチングして、約10μmの高さ及び直径が100から200nmのピラーを製造した。米国特許第402829号、又は米国特許出願第2010/0151324号に記載の方法を使用し、及び次いで前記ウェハから超音波でピラーを剥がしてファイバを製造した。生成したシリコンファイバは、BET値が約10から11m2/gで特徴付けられる。
これらは供給されたまま使用された。特にp−タイプのドープド冶金グレードシリコンを含み、純度99.8%、1から8μmの範囲の直径を有し、D50 4μm、BET値 約5m2/gであるシリコン粒子が、本発明の第1の側面の組成物の製造において使用された。前記粒子は、Silgrain(R)J230として販売され、ノルウェイのElkem社から供給された。
ピラー化粒子は、米国特許出願公開第2011/0067228号、国際公開第2010040985号、又は国際公開第2010040986号に記載の方法に従い、純度99.8%及び14から40μmの範囲の直径を有し、D50 24μmを持つp−タイプ冶金グレードシリコン粉末粒子をエッチングすることにより製造された。前記ピラー化粒子の製造で出発材料として使用されたシリコン粉末粒子は、ノルウェイのElkem社から入手し、且つ、Silgrain(R)J320として販売されていた。製造されたピラー化粒子は、全直径が14から40μmの範囲、D50が24μmとして特徴付けられた。
実施例2a − アノード1
シリコンミックス(1)を、前記の生シリコン粒子90重量%を、前記実施例1aで記載した手順で製造したシリコンファイバ10重量%と混合して製造した。
シリコンミックス(2)を、前記実施例1bで記載された生シリコン粒子10重量%を、前記実施例1aで記載した手順で製造したシリコンファイバ90重量%と混合して製造した。
シリコンミックス(3)を、前記の生シリコン粒子50重量%を、前記実施例1cで記載されたピラー化粒子50重量%と、前記実施例1bで記載した生シリコン粒子50重量%と混合して製造した。
陰極(アノード)1、2及び3は前記の通り製造した。電極片を必要なサイズに切断し、その後一晩真空オーブン中で120℃、ダイナミックバキュームで乾燥した。標準リチウムイオンカソード材料の少し小さい小片を類似の方法で製造した(リチウムコバルト酸化物又は混合金属酸化物(MMO)、即ちLiNi0.80Co0.15Al0.05O2のいずれかを活性成分とした)。タグを、2つの電極片上に銅及びアルミニウムの暴露された領域に超音波溶接した。その後、電極を、多孔性ポリエチレンセパレーター(Tonen)の連続層間に包み込み、2つの電極の間にある1つの層のセパレーターとした。巻線(winding)アルミニウムラミネートバッグ内に置き、前記タグを1端部に沿って熱シールした。前記セルに必要な量の電解質を部分的に真空にして充填し、電解質をポア内に浸透させた。次いでバッグを真空シールし、前記セルをサイクル試験を開始する前にさらに30分間浸透させた。得られた袋を真空シールし、前記セルをサイクル試験を開始する前にさらに30分間浸透させた。陰極1、2、3から製造したセル1、2、3を以下に記載のように試験した。
実施例3で製造されたセルは、一定容量充電/放電方法を用いて、Arbin電池サイクルユニットを用いてサイクルさせた。1200mAh/g(セル1)、1900mAh/g(セル2)及び1000mAh/g(セル3)のいずれかに近い放電容量が、130サイクルを超えて維持された。表1は、MMOカソードを含み、前記のように製造され、及び1200mAh/g(セル1)、1900mAh/g(セル2)及び1000mAh/g(セル3)での一定容量でセルが故障する(fails)までサイクルされた、セル1、2及び3(4リピート)の放電容量(放電容量が初回サイクル放電容量の80%未満に下がるまでのサイクル数)を示す。
Claims (19)
- 複数の細長い要素と複数の粒子とを含む電気活性材料であって、前記細長い要素及び粒子が、いずれも、シリコン、スズ、及びゲルマニウム又はそれらの混合物を含む群の1以上から選択される金属又は半金属を含み、
(a)前記細長い要素が、ファイバ、チューブ、リボン及びフレークを含む群の1以上から選択されるが、前記細長い要素がシリコン含有である場合、前記細長い要素は少なくとも50nmの直径を有し、及び
(b)前記粒子が、80nmから15μmの範囲の平均直径を有し、ピラー化粒子、多孔性粒子及び多孔性粒子断片を含む群の1以上から選択される、
電気活性材料。 - 前記粒子は、
(a)1以上の別々の又は相互接続された空隙空間又はチャンネルを持つ、直線的、分岐又は層状の細長い要素のランダムなもしくは規則的なネットワークを有する多孔性粒子であって、前記空隙空間又はチャンネルは、前記ネットワークの前記直線的、分岐又は層状の細長い要素の間に定められる、多孔性粒子;
(b)5から15μmの主直径を持つピラー化粒子;及び
(c)10μmまでのピラー長さを持つピラー化粒子;
の1以上から選択される粒子を含む、請求項1に記載の電気活性材料。 - 前記細長い要素が:
(a)150から200nmの範囲の直径及び10から15μmの範囲の長さを持つファイバ;
(b)0.08μmから1μmの範囲の厚さ、240nmから300nmの範囲の幅、0.8μmから20μmの範囲の長さ、及びより大きい寸法と最小寸法との10:1から200:1の範囲のアスペクト比を持つリボン;
(c)80nmから100nmの範囲の厚さ、0.8μmから10μmの範囲の幅、0.8μmから20μmの範囲の長さ、及びより大きい寸法と最小寸法との10:1から200:1の範囲のアスペクト比を持つフレーク;及び
(d)0.08μmから2μmの範囲の壁厚、前記壁厚よりも2.5から100倍大きい外部壁直径、及び前記壁厚の10から500倍の長さを持つチューブ、
の1以上から選択される、請求項1乃至2のいずれか一項に記載の電気活性材料。 - 前記粒子の直径が、前記細長い要素の直径の少なくとも3倍であり、及び細長い要素と粒子との重量比は9:1から1:9の範囲である、請求項1乃至3のいずれか一項に記載の電気活性材料。
- 前記粒子の直径が前記細長い要素の直径の3倍以下であり、及び
前記粒子と細長い要素との体積比が、2:1から0.5:1の範囲である、請求項1乃至4のいずれか一項に記載の電気活性材料。 - (a)前記細長い要素の体積が前記粒子の体積よりも大きく;及び
(b)前記粒子の直径が、前記細長い要素の長さの2倍よりも小さい、
請求項1乃至4のいずれか一項に記載の電気活性材料。 - 請求項1乃至6のいずれか一項に記載の電気活性材料であり、前記細長い要素及び粒子は、いずれも、実質的に純粋なシリコン、シリコン合金、及びシリコン酸化物、シリコン窒化物及びシリコンホウ素化物又はこれらの混合物から選択されるシリコン含有材料を含み、前記細長い要素又は粒子の少なくとも一部が、90%から99.95%の範囲の純度でシリコンを含む、電気活性材料。
- 請求項1〜7のいずれか一項に記載の電気活性材料50から90重量%と、
バインダー、導電性材料及びシリコンを含まない電気活性材料から選択される1以上の成分と、
を含む、電気活性材料としての使用のための組成物。 - (a)少なくとも50nmの直径を有するファイバ、チューブ、リボン及びフレークを含む群の1以上から選択される複数の金属又は半金属含有細長い要素と、
(b)80nmから15μmの範囲の平均直径を有するピラー化粒子、多孔性粒子及び多孔性粒子断片を含む群の1以上から選択される複数の金属又は半金属含有粒子と、
を混合するステップであって、但し前記細長い要素がファイバである場合、これらファイバは、100から500nmの範囲の直径を持つ、ステップと、
(c)(a)及び(b)に記載の細長い要素及び粒子を、バインダーと、又は導電性材料、粘性調整剤、フィラー、クロスリンク促進剤、カップリング剤及び接着促進剤を含む群から選択される1以上の成分と組み合わせるステップと、
を含み、及び
前記金属又は半金属含有細長い要素又は粒子がシリコン含有細長い要素又は粒子である、
請求項1乃至7のいずれか一項に記載の電気活性材料の製造方法。 - 請求項8に記載の組成物の、二次電池の製造における、使用。
- 集電体と、請求項8に記載の組成物とを含む、電極。
- カソードと、請求項8に記載の組成物を含むアノードと、電解質とを含む、電池。
- 請求項12に記載の電池を使用する装置。
- 電気活性材料を含む電極組成物であって、前記電気活性材料は、複数の電気活性細長い要素と、複数の電気活性粒子とを含み、前記細長い要素及び粒子が、いずれも、シリコン、スズ、及びゲルマニウム又はそれらの混合物を含む群の1以上から選択される金属又は半金属を含み、
(a)前記細長い要素が、ファイバ、チューブ、リボン及びフレークを含む群の1以上から選択されるが、前記細長い要素がシリコン含有である場合、前記細長い要素は少なくとも50nmの直径を有し;及び
(b)前記粒子が、80nmから15μmの範囲の平均直径を有し、ピラー化粒子、多孔性粒子及び多孔性粒子断片を含む群の1以上から選択され;及び
(c)前記粒子の直径が、前記細長い要素の直径の3倍以下であり;及び
(d)前記粒子と細長い要素との体積比は2:1から0.5:1の範囲である、
電極組成物。 - 前記粒子が、少なくとも前記細長い要素の直径と同じ大きさの直径を持つ、請求項14に記載の電極組成物。
- 前記電気活性材料と、追加の電気活性材料とを、これら2つを合わせて50から90重量%の量で含み、前記電気活性材料の前記複数の電気活性細長い要素及び複数の電気活性粒子が、いずれも、シリコンを含む、請求項14に記載の電極組成物。
- 1から6mg/cm2の厚さで集電体表面の片側又は両面に適用される、請求項14に記載の電極組成物を含む電極。
- 電気活性材料を含む電極組成物であって、前記電気活性材料は、複数の電気活性細長い要素と、複数の電気活性粒子とを含み、前記細長い要素及び粒子が、いずれも、シリコン、スズ、及びゲルマニウム又はそれらの混合物を含む群の1以上から選択される金属又は半金属を含み、
(a)前記細長い要素が、ファイバ、チューブ、リボン及びフレークを含む群の1以上から選択されるが、前記細長い要素がシリコン含有である場合、前記細長い要素は少なくとも50nmの直径を有し;及び
(b)前記粒子が、80nmから15μmの範囲の平均直径を有し、ピラー化粒子、多孔性粒子及び多孔性粒子断片を含む群の1以上から選択され;及び
(c)前記粒子の直径が、前記細長い要素の直径の3倍を超え;及び
(d)前記細長い要素の平均長さが、前記粒子の直径の半分より大きく;及び
(e)前記細長い要素の体積が前記粒子の体積よりも大きい、
電極組成物。 - 前記電気活性材料と、追加の電気活性材料とを、これら2つを合わせて50から90重量%の量で含み、前記電気活性材料の前記複数の電気活性細長い要素及び複数の電気活性粒子が、いずれも、シリコンを含む、請求項18に記載の電極組成物。
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KR20150091415A (ko) | 2015-08-10 |
JP2013541806A (ja) | 2013-11-14 |
CN103189313A (zh) | 2013-07-03 |
SG188387A1 (en) | 2013-04-30 |
EP2611733A1 (en) | 2013-07-10 |
JP2016105422A (ja) | 2016-06-09 |
KR20130067299A (ko) | 2013-06-21 |
WO2012028858A1 (en) | 2012-03-08 |
GB2483373B (en) | 2015-03-18 |
EP2611733B1 (en) | 2015-01-07 |
US20170133669A1 (en) | 2017-05-11 |
US9947920B2 (en) | 2018-04-17 |
CA2810331A1 (en) | 2012-03-08 |
GB2483373A (en) | 2012-03-07 |
GB201014707D0 (en) | 2010-10-20 |
CA2810331C (en) | 2015-05-12 |
KR101633636B1 (ko) | 2016-06-27 |
KR101718963B1 (ko) | 2017-03-22 |
US20130224583A1 (en) | 2013-08-29 |
US9647263B2 (en) | 2017-05-09 |
CN103189313B (zh) | 2016-08-10 |
TWI502795B (zh) | 2015-10-01 |
GB201115264D0 (en) | 2011-10-19 |
HK1182686A1 (en) | 2013-12-06 |
TW201228082A (en) | 2012-07-01 |
RU2013109773A (ru) | 2014-10-10 |
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