KR100855530B1 - 다층프린트배선판 및 그 제조방법 - Google Patents
다층프린트배선판 및 그 제조방법 Download PDFInfo
- Publication number
- KR100855530B1 KR100855530B1 KR1020077015082A KR20077015082A KR100855530B1 KR 100855530 B1 KR100855530 B1 KR 100855530B1 KR 1020077015082 A KR1020077015082 A KR 1020077015082A KR 20077015082 A KR20077015082 A KR 20077015082A KR 100855530 B1 KR100855530 B1 KR 100855530B1
- Authority
- KR
- South Korea
- Prior art keywords
- layer
- resin
- hole
- copper
- plating
- Prior art date
Links
- 238000000034 method Methods 0.000 title claims description 138
- 238000004519 manufacturing process Methods 0.000 title claims description 111
- 239000004020 conductor Substances 0.000 claims description 283
- 239000000758 substrate Substances 0.000 claims description 198
- 229910052751 metal Inorganic materials 0.000 claims description 137
- 239000002184 metal Substances 0.000 claims description 137
- 229910000679 solder Inorganic materials 0.000 claims description 98
- CURLTUGMZLYLDI-UHFFFAOYSA-N Carbon dioxide Chemical compound O=C=O CURLTUGMZLYLDI-UHFFFAOYSA-N 0.000 claims description 83
- 229910002092 carbon dioxide Inorganic materials 0.000 claims description 41
- 239000001569 carbon dioxide Substances 0.000 claims description 40
- 230000008018 melting Effects 0.000 claims description 19
- 238000002844 melting Methods 0.000 claims description 19
- 238000005476 soldering Methods 0.000 claims description 19
- 230000001678 irradiating effect Effects 0.000 claims description 18
- 229910052718 tin Inorganic materials 0.000 claims description 9
- 229910052709 silver Inorganic materials 0.000 claims description 7
- 229910052745 lead Inorganic materials 0.000 claims description 4
- 239000010410 layer Substances 0.000 abstract description 477
- 229920005989 resin Polymers 0.000 abstract description 370
- 239000011347 resin Substances 0.000 abstract description 370
- RYGMFSIKBFXOCR-UHFFFAOYSA-N Copper Chemical compound [Cu] RYGMFSIKBFXOCR-UHFFFAOYSA-N 0.000 abstract description 332
- 238000005530 etching Methods 0.000 abstract description 143
- 239000011229 interlayer Substances 0.000 abstract description 115
- 239000011889 copper foil Substances 0.000 abstract description 114
- 238000009413 insulation Methods 0.000 abstract description 15
- 230000007423 decrease Effects 0.000 abstract description 7
- 239000010949 copper Substances 0.000 description 226
- 238000007747 plating Methods 0.000 description 223
- 229910052802 copper Inorganic materials 0.000 description 222
- 239000010408 film Substances 0.000 description 179
- 238000007772 electroless plating Methods 0.000 description 81
- 230000008569 process Effects 0.000 description 74
- 238000007788 roughening Methods 0.000 description 63
- 239000000243 solution Substances 0.000 description 61
- PXHVJJICTQNCMI-UHFFFAOYSA-N Nickel Chemical compound [Ni] PXHVJJICTQNCMI-UHFFFAOYSA-N 0.000 description 57
- 239000000203 mixture Substances 0.000 description 51
- 239000002245 particle Substances 0.000 description 51
- 238000012360 testing method Methods 0.000 description 50
- HEMHJVSKTPXQMS-UHFFFAOYSA-M Sodium hydroxide Chemical compound [OH-].[Na+] HEMHJVSKTPXQMS-UHFFFAOYSA-M 0.000 description 48
- 239000003822 epoxy resin Substances 0.000 description 46
- 229920000647 polyepoxide Polymers 0.000 description 46
- 229920001187 thermosetting polymer Polymers 0.000 description 39
- 238000009713 electroplating Methods 0.000 description 38
- RAXXELZNTBOGNW-UHFFFAOYSA-N imidazole Natural products C1=CNC=N1 RAXXELZNTBOGNW-UHFFFAOYSA-N 0.000 description 35
- 239000002585 base Substances 0.000 description 34
- 239000000126 substance Substances 0.000 description 34
- 239000000945 filler Substances 0.000 description 33
- 238000010586 diagram Methods 0.000 description 32
- 230000004048 modification Effects 0.000 description 30
- 238000012986 modification Methods 0.000 description 30
- 238000005498 polishing Methods 0.000 description 29
- 239000003795 chemical substances by application Substances 0.000 description 28
- 239000011162 core material Substances 0.000 description 28
- 239000003054 catalyst Substances 0.000 description 27
- 239000007788 liquid Substances 0.000 description 27
- KDLHZDBZIXYQEI-UHFFFAOYSA-N palladium Substances [Pd] KDLHZDBZIXYQEI-UHFFFAOYSA-N 0.000 description 27
- 239000000853 adhesive Substances 0.000 description 26
- 229920006015 heat resistant resin Polymers 0.000 description 26
- 229910052759 nickel Inorganic materials 0.000 description 26
- 239000002253 acid Substances 0.000 description 25
- 239000000178 monomer Substances 0.000 description 25
- 150000007524 organic acids Chemical class 0.000 description 25
- CDBYLPFSWZWCQE-UHFFFAOYSA-L Sodium Carbonate Chemical compound [Na+].[Na+].[O-]C([O-])=O CDBYLPFSWZWCQE-UHFFFAOYSA-L 0.000 description 24
- 239000007789 gas Substances 0.000 description 24
- 238000010438 heat treatment Methods 0.000 description 24
- JVTAAEKCZFNVCJ-UHFFFAOYSA-N lactic acid Chemical compound CC(O)C(O)=O JVTAAEKCZFNVCJ-UHFFFAOYSA-N 0.000 description 24
- 230000001070 adhesive effect Effects 0.000 description 23
- 239000011888 foil Substances 0.000 description 23
- 229920005992 thermoplastic resin Polymers 0.000 description 23
- 239000000843 powder Substances 0.000 description 22
- -1 halogen ions Chemical class 0.000 description 21
- 239000011135 tin Substances 0.000 description 21
- QTBSBXVTEAMEQO-UHFFFAOYSA-N Acetic acid Chemical compound CC(O)=O QTBSBXVTEAMEQO-UHFFFAOYSA-N 0.000 description 19
- 230000000052 comparative effect Effects 0.000 description 18
- 239000012790 adhesive layer Substances 0.000 description 17
- 239000000463 material Substances 0.000 description 17
- MHAJPDPJQMAIIY-UHFFFAOYSA-N Hydrogen peroxide Chemical compound OO MHAJPDPJQMAIIY-UHFFFAOYSA-N 0.000 description 16
- 239000007864 aqueous solution Substances 0.000 description 15
- 239000004593 Epoxy Substances 0.000 description 14
- 239000010931 gold Substances 0.000 description 14
- KWYUFKZDYYNOTN-UHFFFAOYSA-M Potassium hydroxide Chemical compound [OH-].[K+] KWYUFKZDYYNOTN-UHFFFAOYSA-M 0.000 description 13
- ZMJMGLPNNZPRAX-UHFFFAOYSA-N hydrogen peroxide;2-hydroxypropanoic acid Chemical compound OO.CC(O)C(O)=O ZMJMGLPNNZPRAX-UHFFFAOYSA-N 0.000 description 13
- 230000003647 oxidation Effects 0.000 description 13
- 238000007254 oxidation reaction Methods 0.000 description 13
- XLYOFNOQVPJJNP-UHFFFAOYSA-N water Substances O XLYOFNOQVPJJNP-UHFFFAOYSA-N 0.000 description 13
- NIXOWILDQLNWCW-UHFFFAOYSA-N 2-Propenoic acid Natural products OC(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-N 0.000 description 12
- AEMRFAOFKBGASW-UHFFFAOYSA-N Glycolic acid Chemical compound OCC(O)=O AEMRFAOFKBGASW-UHFFFAOYSA-N 0.000 description 12
- 229910018104 Ni-P Inorganic materials 0.000 description 12
- 229910018536 Ni—P Inorganic materials 0.000 description 12
- ORTQZVOHEJQUHG-UHFFFAOYSA-L copper(II) chloride Chemical compound Cl[Cu]Cl ORTQZVOHEJQUHG-UHFFFAOYSA-L 0.000 description 12
- 229910052737 gold Inorganic materials 0.000 description 12
- 239000004310 lactic acid Substances 0.000 description 12
- 235000014655 lactic acid Nutrition 0.000 description 12
- 229910000029 sodium carbonate Inorganic materials 0.000 description 12
- 238000006467 substitution reaction Methods 0.000 description 12
- 150000003851 azoles Chemical class 0.000 description 11
- KRVSOGSZCMJSLX-UHFFFAOYSA-L chromic acid Substances O[Cr](O)(=O)=O KRVSOGSZCMJSLX-UHFFFAOYSA-L 0.000 description 11
- AWJWCTOOIBYHON-UHFFFAOYSA-N furo[3,4-b]pyrazine-5,7-dione Chemical compound C1=CN=C2C(=O)OC(=O)C2=N1 AWJWCTOOIBYHON-UHFFFAOYSA-N 0.000 description 11
- 229910052763 palladium Inorganic materials 0.000 description 11
- 230000008859 change Effects 0.000 description 10
- 239000011521 glass Substances 0.000 description 10
- PCHJSUWPFVWCPO-UHFFFAOYSA-N gold Chemical compound [Au] PCHJSUWPFVWCPO-UHFFFAOYSA-N 0.000 description 10
- 238000002156 mixing Methods 0.000 description 10
- 238000012545 processing Methods 0.000 description 10
- UMGDCJDMYOKAJW-UHFFFAOYSA-N thiourea Chemical compound NC(N)=S UMGDCJDMYOKAJW-UHFFFAOYSA-N 0.000 description 10
- JYEUMXHLPRZUAT-UHFFFAOYSA-N 1,2,3-triazine Chemical compound C1=CN=NN=C1 JYEUMXHLPRZUAT-UHFFFAOYSA-N 0.000 description 9
- SECXISVLQFMRJM-UHFFFAOYSA-N N-Methylpyrrolidone Chemical compound CN1CCCC1=O SECXISVLQFMRJM-UHFFFAOYSA-N 0.000 description 9
- 239000004734 Polyphenylene sulfide Substances 0.000 description 9
- 239000002131 composite material Substances 0.000 description 9
- 238000005553 drilling Methods 0.000 description 9
- LNEPOXFFQSENCJ-UHFFFAOYSA-N haloperidol Chemical compound C1CC(O)(C=2C=CC(Cl)=CC=2)CCN1CCCC(=O)C1=CC=C(F)C=C1 LNEPOXFFQSENCJ-UHFFFAOYSA-N 0.000 description 9
- 239000007800 oxidant agent Substances 0.000 description 9
- 229920000069 polyphenylene sulfide Polymers 0.000 description 9
- VEXZGXHMUGYJMC-UHFFFAOYSA-N Hydrochloric acid Chemical compound Cl VEXZGXHMUGYJMC-UHFFFAOYSA-N 0.000 description 8
- WCUXLLCKKVVCTQ-UHFFFAOYSA-M Potassium chloride Chemical compound [Cl-].[K+] WCUXLLCKKVVCTQ-UHFFFAOYSA-M 0.000 description 8
- IISBACLAFKSPIT-UHFFFAOYSA-N bisphenol A Chemical compound C=1C=C(O)C=CC=1C(C)(C)C1=CC=C(O)C=C1 IISBACLAFKSPIT-UHFFFAOYSA-N 0.000 description 8
- 230000000536 complexating effect Effects 0.000 description 8
- 238000011161 development Methods 0.000 description 8
- 230000018109 developmental process Effects 0.000 description 8
- 238000001035 drying Methods 0.000 description 8
- 238000011049 filling Methods 0.000 description 8
- 229910052736 halogen Inorganic materials 0.000 description 8
- 239000011133 lead Substances 0.000 description 8
- 230000002829 reductive effect Effects 0.000 description 8
- KWSLGOVYXMQPPX-UHFFFAOYSA-N 5-[3-(trifluoromethyl)phenyl]-2h-tetrazole Chemical compound FC(F)(F)C1=CC=CC(C2=NNN=N2)=C1 KWSLGOVYXMQPPX-UHFFFAOYSA-N 0.000 description 7
- ATJFFYVFTNAWJD-UHFFFAOYSA-N Tin Chemical compound [Sn] ATJFFYVFTNAWJD-UHFFFAOYSA-N 0.000 description 7
- 229910045601 alloy Inorganic materials 0.000 description 7
- 239000000956 alloy Substances 0.000 description 7
- QVGXLLKOCUKJST-UHFFFAOYSA-N atomic oxygen Chemical compound [O] QVGXLLKOCUKJST-UHFFFAOYSA-N 0.000 description 7
- 230000015572 biosynthetic process Effects 0.000 description 7
- 230000005587 bubbling Effects 0.000 description 7
- 230000006378 damage Effects 0.000 description 7
- 238000000151 deposition Methods 0.000 description 7
- 230000000694 effects Effects 0.000 description 7
- 230000001590 oxidative effect Effects 0.000 description 7
- 239000001301 oxygen Substances 0.000 description 7
- 229910052760 oxygen Inorganic materials 0.000 description 7
- 238000002360 preparation method Methods 0.000 description 7
- 239000002994 raw material Substances 0.000 description 7
- 229910001379 sodium hypophosphite Inorganic materials 0.000 description 7
- 239000007858 starting material Substances 0.000 description 7
- NIXOWILDQLNWCW-UHFFFAOYSA-M Acrylate Chemical compound [O-]C(=O)C=C NIXOWILDQLNWCW-UHFFFAOYSA-M 0.000 description 6
- KRHYYFGTRYWZRS-UHFFFAOYSA-M Fluoride anion Chemical compound [F-] KRHYYFGTRYWZRS-UHFFFAOYSA-M 0.000 description 6
- KRKNYBCHXYNGOX-UHFFFAOYSA-N citric acid Chemical compound OC(=O)CC(O)(C(O)=O)CC(O)=O KRKNYBCHXYNGOX-UHFFFAOYSA-N 0.000 description 6
- 239000008139 complexing agent Substances 0.000 description 6
- 239000000805 composite resin Substances 0.000 description 6
- QSHDDOUJBYECFT-UHFFFAOYSA-N mercury Chemical compound [Hg] QSHDDOUJBYECFT-UHFFFAOYSA-N 0.000 description 6
- 229910052753 mercury Inorganic materials 0.000 description 6
- 229920001721 polyimide Polymers 0.000 description 6
- 239000007921 spray Substances 0.000 description 6
- 244000025254 Cannabis sativa Species 0.000 description 5
- XSQUKJJJFZCRTK-UHFFFAOYSA-N Urea Natural products NC(N)=O XSQUKJJJFZCRTK-UHFFFAOYSA-N 0.000 description 5
- 238000007796 conventional method Methods 0.000 description 5
- KUNSUQLRTQLHQQ-UHFFFAOYSA-N copper tin Chemical group [Cu].[Sn] KUNSUQLRTQLHQQ-UHFFFAOYSA-N 0.000 description 5
- 229960003280 cupric chloride Drugs 0.000 description 5
- 229910052731 fluorine Inorganic materials 0.000 description 5
- 239000011737 fluorine Substances 0.000 description 5
- 238000010030 laminating Methods 0.000 description 5
- 150000002739 metals Chemical class 0.000 description 5
- 230000036961 partial effect Effects 0.000 description 5
- 238000009832 plasma treatment Methods 0.000 description 5
- 229920006393 polyether sulfone Polymers 0.000 description 5
- 239000009719 polyimide resin Substances 0.000 description 5
- 229920005672 polyolefin resin Polymers 0.000 description 5
- 229920001955 polyphenylene ether Polymers 0.000 description 5
- 238000007639 printing Methods 0.000 description 5
- 238000011160 research Methods 0.000 description 5
- 239000002904 solvent Substances 0.000 description 5
- BTJPUDCSZVCXFQ-UHFFFAOYSA-N 2,4-diethylthioxanthen-9-one Chemical compound C1=CC=C2C(=O)C3=CC(CC)=CC(CC)=C3SC2=C1 BTJPUDCSZVCXFQ-UHFFFAOYSA-N 0.000 description 4
- ULKLGIFJWFIQFF-UHFFFAOYSA-N 5K8XI641G3 Chemical compound CCC1=NC=C(C)N1 ULKLGIFJWFIQFF-UHFFFAOYSA-N 0.000 description 4
- XKRFYHLGVUSROY-UHFFFAOYSA-N Argon Chemical compound [Ar] XKRFYHLGVUSROY-UHFFFAOYSA-N 0.000 description 4
- 229920002799 BoPET Polymers 0.000 description 4
- YCKRFDGAMUMZLT-UHFFFAOYSA-N Fluorine atom Chemical compound [F] YCKRFDGAMUMZLT-UHFFFAOYSA-N 0.000 description 4
- ISWSIDIOOBJBQZ-UHFFFAOYSA-N Phenol Chemical compound OC1=CC=CC=C1 ISWSIDIOOBJBQZ-UHFFFAOYSA-N 0.000 description 4
- 239000004697 Polyetherimide Substances 0.000 description 4
- VYPSYNLAJGMNEJ-UHFFFAOYSA-N Silicium dioxide Chemical compound O=[Si]=O VYPSYNLAJGMNEJ-UHFFFAOYSA-N 0.000 description 4
- FAPWRFPIFSIZLT-UHFFFAOYSA-M Sodium chloride Chemical compound [Na+].[Cl-] FAPWRFPIFSIZLT-UHFFFAOYSA-M 0.000 description 4
- 239000000654 additive Substances 0.000 description 4
- 229910052782 aluminium Inorganic materials 0.000 description 4
- 239000002518 antifoaming agent Substances 0.000 description 4
- WPYMKLBDIGXBTP-UHFFFAOYSA-N benzoic acid Chemical compound OC(=O)C1=CC=CC=C1 WPYMKLBDIGXBTP-UHFFFAOYSA-N 0.000 description 4
- VFFQCUJVGMRYIF-UHFFFAOYSA-N copper;1h-imidazole Chemical compound [Cu+2].C1=CNC=N1 VFFQCUJVGMRYIF-UHFFFAOYSA-N 0.000 description 4
- SPOCRUOICRJFPC-UHFFFAOYSA-N copper;2-hydroxypropanoic acid Chemical compound [Cu].CC(O)C(O)=O SPOCRUOICRJFPC-UHFFFAOYSA-N 0.000 description 4
- 230000008021 deposition Effects 0.000 description 4
- XBDQKXXYIPTUBI-UHFFFAOYSA-N dimethylselenoniopropionate Natural products CCC(O)=O XBDQKXXYIPTUBI-UHFFFAOYSA-N 0.000 description 4
- 230000005012 migration Effects 0.000 description 4
- 238000013508 migration Methods 0.000 description 4
- 230000003472 neutralizing effect Effects 0.000 description 4
- PIBWKRNGBLPSSY-UHFFFAOYSA-L palladium(II) chloride Chemical compound Cl[Pd]Cl PIBWKRNGBLPSSY-UHFFFAOYSA-L 0.000 description 4
- 238000000206 photolithography Methods 0.000 description 4
- 239000003504 photosensitizing agent Substances 0.000 description 4
- BASFCYQUMIYNBI-UHFFFAOYSA-N platinum Chemical compound [Pt] BASFCYQUMIYNBI-UHFFFAOYSA-N 0.000 description 4
- 229920001601 polyetherimide Polymers 0.000 description 4
- 229920000642 polymer Polymers 0.000 description 4
- 239000001103 potassium chloride Substances 0.000 description 4
- 235000011164 potassium chloride Nutrition 0.000 description 4
- 239000000047 product Substances 0.000 description 4
- 230000007261 regionalization Effects 0.000 description 4
- 239000011734 sodium Substances 0.000 description 4
- 238000003756 stirring Methods 0.000 description 4
- 239000004094 surface-active agent Substances 0.000 description 4
- 229920002397 thermoplastic olefin Polymers 0.000 description 4
- SMZOUWXMTYCWNB-UHFFFAOYSA-N 2-(2-methoxy-5-methylphenyl)ethanamine Chemical compound COC1=CC=C(C)C=C1CCN SMZOUWXMTYCWNB-UHFFFAOYSA-N 0.000 description 3
- ZWEHNKRNPOVVGH-UHFFFAOYSA-N 2-Butanone Chemical compound CCC(C)=O ZWEHNKRNPOVVGH-UHFFFAOYSA-N 0.000 description 3
- PURTUPNWTLPILZ-UHFFFAOYSA-N 2-hydroxypropanoic acid;nickel Chemical compound [Ni].CC(O)C(O)=O.CC(O)C(O)=O PURTUPNWTLPILZ-UHFFFAOYSA-N 0.000 description 3
- LXBGSDVWAMZHDD-UHFFFAOYSA-N 2-methyl-1h-imidazole Chemical compound CC1=NC=CN1 LXBGSDVWAMZHDD-UHFFFAOYSA-N 0.000 description 3
- QTWJRLJHJPIABL-UHFFFAOYSA-N 2-methylphenol;3-methylphenol;4-methylphenol Chemical compound CC1=CC=C(O)C=C1.CC1=CC=CC(O)=C1.CC1=CC=CC=C1O QTWJRLJHJPIABL-UHFFFAOYSA-N 0.000 description 3
- 229910017755 Cu-Sn Inorganic materials 0.000 description 3
- 229910017927 Cu—Sn Inorganic materials 0.000 description 3
- 229910021578 Iron(III) chloride Inorganic materials 0.000 description 3
- 229920012266 Poly(ether sulfone) PES Polymers 0.000 description 3
- 239000004695 Polyether sulfone Substances 0.000 description 3
- BQCADISMDOOEFD-UHFFFAOYSA-N Silver Chemical compound [Ag] BQCADISMDOOEFD-UHFFFAOYSA-N 0.000 description 3
- JUWOETZNAMLKMG-UHFFFAOYSA-N [P].[Ni].[Cu] Chemical compound [P].[Ni].[Cu] JUWOETZNAMLKMG-UHFFFAOYSA-N 0.000 description 3
- 230000000996 additive effect Effects 0.000 description 3
- XAGFODPZIPBFFR-UHFFFAOYSA-N aluminium Chemical compound [Al] XAGFODPZIPBFFR-UHFFFAOYSA-N 0.000 description 3
- PNEYBMLMFCGWSK-UHFFFAOYSA-N aluminium oxide Inorganic materials [O-2].[O-2].[O-2].[Al+3].[Al+3] PNEYBMLMFCGWSK-UHFFFAOYSA-N 0.000 description 3
- 239000011324 bead Substances 0.000 description 3
- 230000005540 biological transmission Effects 0.000 description 3
- 229940106691 bisphenol a Drugs 0.000 description 3
- 238000005345 coagulation Methods 0.000 description 3
- 230000015271 coagulation Effects 0.000 description 3
- 239000011248 coating agent Substances 0.000 description 3
- 238000000576 coating method Methods 0.000 description 3
- 150000004699 copper complex Chemical class 0.000 description 3
- 229930003836 cresol Natural products 0.000 description 3
- 239000013078 crystal Substances 0.000 description 3
- 238000005238 degreasing Methods 0.000 description 3
- 230000002500 effect on skin Effects 0.000 description 3
- 230000006870 function Effects 0.000 description 3
- 239000010954 inorganic particle Substances 0.000 description 3
- RBTARNINKXHZNM-UHFFFAOYSA-K iron trichloride Chemical compound Cl[Fe](Cl)Cl RBTARNINKXHZNM-UHFFFAOYSA-K 0.000 description 3
- 230000033116 oxidation-reduction process Effects 0.000 description 3
- 239000005011 phenolic resin Substances 0.000 description 3
- 239000000049 pigment Substances 0.000 description 3
- 238000003672 processing method Methods 0.000 description 3
- 230000009467 reduction Effects 0.000 description 3
- 238000000926 separation method Methods 0.000 description 3
- 239000001509 sodium citrate Substances 0.000 description 3
- NLJMYIDDQXHKNR-UHFFFAOYSA-K sodium citrate Chemical compound O.O.[Na+].[Na+].[Na+].[O-]C(=O)CC(O)(CC([O-])=O)C([O-])=O NLJMYIDDQXHKNR-UHFFFAOYSA-K 0.000 description 3
- 238000005507 spraying Methods 0.000 description 3
- 238000004544 sputter deposition Methods 0.000 description 3
- 238000004326 stimulated echo acquisition mode for imaging Methods 0.000 description 3
- BJEPYKJPYRNKOW-REOHCLBHSA-N (S)-malic acid Chemical compound OC(=O)[C@@H](O)CC(O)=O BJEPYKJPYRNKOW-REOHCLBHSA-N 0.000 description 2
- VZXTWGWHSMCWGA-UHFFFAOYSA-N 1,3,5-triazine-2,4-diamine Chemical compound NC1=NC=NC(N)=N1 VZXTWGWHSMCWGA-UHFFFAOYSA-N 0.000 description 2
- PQAMFDRRWURCFQ-UHFFFAOYSA-N 2-ethyl-1h-imidazole Chemical compound CCC1=NC=CN1 PQAMFDRRWURCFQ-UHFFFAOYSA-N 0.000 description 2
- ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 2-phenyl-1h-imidazole Chemical compound C1=CNC(C=2C=CC=CC=2)=N1 ZCUJYXPAKHMBAZ-UHFFFAOYSA-N 0.000 description 2
- NLXLAEXVIDQMFP-UHFFFAOYSA-N Ammonia chloride Chemical compound [NH4+].[Cl-] NLXLAEXVIDQMFP-UHFFFAOYSA-N 0.000 description 2
- 239000005711 Benzoic acid Substances 0.000 description 2
- 229930185605 Bisphenol Natural products 0.000 description 2
- FERIUCNNQQJTOY-UHFFFAOYSA-N Butyric acid Chemical compound CCCC(O)=O FERIUCNNQQJTOY-UHFFFAOYSA-N 0.000 description 2
- QPLDLSVMHZLSFG-UHFFFAOYSA-N Copper oxide Chemical compound [Cu]=O QPLDLSVMHZLSFG-UHFFFAOYSA-N 0.000 description 2
- 239000005751 Copper oxide Substances 0.000 description 2
- RTZKZFJDLAIYFH-UHFFFAOYSA-N Diethyl ether Chemical compound CCOCC RTZKZFJDLAIYFH-UHFFFAOYSA-N 0.000 description 2
- 229920006063 Lamide® Polymers 0.000 description 2
- 229910021586 Nickel(II) chloride Inorganic materials 0.000 description 2
- 229910001096 P alloy Inorganic materials 0.000 description 2
- ZLMJMSJWJFRBEC-UHFFFAOYSA-N Potassium Chemical compound [K] ZLMJMSJWJFRBEC-UHFFFAOYSA-N 0.000 description 2
- OFOBLEOULBTSOW-UHFFFAOYSA-N Propanedioic acid Natural products OC(=O)CC(O)=O OFOBLEOULBTSOW-UHFFFAOYSA-N 0.000 description 2
- WTKZEGDFNFYCGP-UHFFFAOYSA-N Pyrazole Chemical class C=1C=NNC=1 WTKZEGDFNFYCGP-UHFFFAOYSA-N 0.000 description 2
- 229910004298 SiO 2 Inorganic materials 0.000 description 2
- 229920001807 Urea-formaldehyde Polymers 0.000 description 2
- 230000009471 action Effects 0.000 description 2
- 230000003213 activating effect Effects 0.000 description 2
- 230000002411 adverse Effects 0.000 description 2
- 239000003513 alkali Substances 0.000 description 2
- BJEPYKJPYRNKOW-UHFFFAOYSA-N alpha-hydroxysuccinic acid Natural products OC(=O)C(O)CC(O)=O BJEPYKJPYRNKOW-UHFFFAOYSA-N 0.000 description 2
- 150000001412 amines Chemical class 0.000 description 2
- 229920003180 amino resin Polymers 0.000 description 2
- 238000004458 analytical method Methods 0.000 description 2
- 229910052786 argon Inorganic materials 0.000 description 2
- 230000008901 benefit Effects 0.000 description 2
- 235000010233 benzoic acid Nutrition 0.000 description 2
- RWCCWEUUXYIKHB-UHFFFAOYSA-N benzophenone Chemical compound C=1C=CC=CC=1C(=O)C1=CC=CC=C1 RWCCWEUUXYIKHB-UHFFFAOYSA-N 0.000 description 2
- 239000012965 benzophenone Substances 0.000 description 2
- PXKLMJQFEQBVLD-UHFFFAOYSA-N bisphenol F Chemical compound C1=CC(O)=CC=C1CC1=CC=C(O)C=C1 PXKLMJQFEQBVLD-UHFFFAOYSA-N 0.000 description 2
- 239000004842 bisphenol F epoxy resin Substances 0.000 description 2
- 238000006243 chemical reaction Methods 0.000 description 2
- 239000011247 coating layer Substances 0.000 description 2
- 239000000084 colloidal system Substances 0.000 description 2
- 238000001816 cooling Methods 0.000 description 2
- 229910000431 copper oxide Inorganic materials 0.000 description 2
- DYROSKSLMAPFBZ-UHFFFAOYSA-L copper;2-hydroxypropanoate Chemical compound [Cu+2].CC(O)C([O-])=O.CC(O)C([O-])=O DYROSKSLMAPFBZ-UHFFFAOYSA-L 0.000 description 2
- MTHSVFCYNBDYFN-UHFFFAOYSA-N diethylene glycol Chemical compound OCCOCCO MTHSVFCYNBDYFN-UHFFFAOYSA-N 0.000 description 2
- 238000007598 dipping method Methods 0.000 description 2
- 238000004090 dissolution Methods 0.000 description 2
- FUZZWVXGSFPDMH-UHFFFAOYSA-N hexanoic acid Chemical compound CCCCCC(O)=O FUZZWVXGSFPDMH-UHFFFAOYSA-N 0.000 description 2
- 238000007654 immersion Methods 0.000 description 2
- 230000006872 improvement Effects 0.000 description 2
- 239000003999 initiator Substances 0.000 description 2
- 239000011810 insulating material Substances 0.000 description 2
- 150000002500 ions Chemical class 0.000 description 2
- 238000004898 kneading Methods 0.000 description 2
- VZCYOOQTPOCHFL-UPHRSURJSA-N maleic acid Chemical compound OC(=O)\C=C/C(O)=O VZCYOOQTPOCHFL-UPHRSURJSA-N 0.000 description 2
- 239000011976 maleic acid Substances 0.000 description 2
- 239000001630 malic acid Substances 0.000 description 2
- 235000011090 malic acid Nutrition 0.000 description 2
- 229910021645 metal ion Inorganic materials 0.000 description 2
- 239000002923 metal particle Substances 0.000 description 2
- QMMRZOWCJAIUJA-UHFFFAOYSA-L nickel dichloride Chemical compound Cl[Ni]Cl QMMRZOWCJAIUJA-UHFFFAOYSA-L 0.000 description 2
- 229910000510 noble metal Inorganic materials 0.000 description 2
- 229920003986 novolac Polymers 0.000 description 2
- 230000006911 nucleation Effects 0.000 description 2
- 238000010899 nucleation Methods 0.000 description 2
- 230000000149 penetrating effect Effects 0.000 description 2
- 230000002093 peripheral effect Effects 0.000 description 2
- 229920002120 photoresistant polymer Polymers 0.000 description 2
- 238000005240 physical vapour deposition Methods 0.000 description 2
- 239000011591 potassium Substances 0.000 description 2
- 229910052700 potassium Inorganic materials 0.000 description 2
- 239000010970 precious metal Substances 0.000 description 2
- 238000003825 pressing Methods 0.000 description 2
- 235000019260 propionic acid Nutrition 0.000 description 2
- IUVKMZGDUIUOCP-BTNSXGMBSA-N quinbolone Chemical compound O([C@H]1CC[C@H]2[C@H]3[C@@H]([C@]4(C=CC(=O)C=C4CC3)C)CC[C@@]21C)C1=CCCC1 IUVKMZGDUIUOCP-BTNSXGMBSA-N 0.000 description 2
- 229910052703 rhodium Inorganic materials 0.000 description 2
- 239000000377 silicon dioxide Substances 0.000 description 2
- 239000011780 sodium chloride Substances 0.000 description 2
- 239000007787 solid Substances 0.000 description 2
- 238000007711 solidification Methods 0.000 description 2
- 230000008023 solidification Effects 0.000 description 2
- 239000012798 spherical particle Substances 0.000 description 2
- 239000002344 surface layer Substances 0.000 description 2
- 230000008961 swelling Effects 0.000 description 2
- 230000008719 thickening Effects 0.000 description 2
- 239000010409 thin film Substances 0.000 description 2
- 229910052719 titanium Inorganic materials 0.000 description 2
- 239000010936 titanium Substances 0.000 description 2
- VZCYOOQTPOCHFL-UHFFFAOYSA-N trans-butenedioic acid Natural products OC(=O)C=CC(O)=O VZCYOOQTPOCHFL-UHFFFAOYSA-N 0.000 description 2
- 238000012546 transfer Methods 0.000 description 2
- 150000003852 triazoles Chemical class 0.000 description 2
- 238000007740 vapor deposition Methods 0.000 description 2
- RRQYJINTUHWNHW-UHFFFAOYSA-N 1-ethoxy-2-(2-ethoxyethoxy)ethane Chemical compound CCOCCOCCOCC RRQYJINTUHWNHW-UHFFFAOYSA-N 0.000 description 1
- RTBFRGCFXZNCOE-UHFFFAOYSA-N 1-methylsulfonylpiperidin-4-one Chemical compound CS(=O)(=O)N1CCC(=O)CC1 RTBFRGCFXZNCOE-UHFFFAOYSA-N 0.000 description 1
- HECLRDQVFMWTQS-RGOKHQFPSA-N 1755-01-7 Chemical compound C1[C@H]2[C@@H]3CC=C[C@@H]3[C@@H]1C=C2 HECLRDQVFMWTQS-RGOKHQFPSA-N 0.000 description 1
- NECRQCBKTGZNMH-UHFFFAOYSA-N 3,5-dimethylhex-1-yn-3-ol Chemical compound CC(C)CC(C)(O)C#C NECRQCBKTGZNMH-UHFFFAOYSA-N 0.000 description 1
- JYLNVJYYQQXNEK-UHFFFAOYSA-N 3-amino-2-(4-chlorophenyl)-1-propanesulfonic acid Chemical compound OS(=O)(=O)CC(CN)C1=CC=C(Cl)C=C1 JYLNVJYYQQXNEK-UHFFFAOYSA-N 0.000 description 1
- ROFVEXUMMXZLPA-UHFFFAOYSA-N Bipyridyl Chemical group N1=CC=CC=C1C1=CC=CC=N1 ROFVEXUMMXZLPA-UHFFFAOYSA-N 0.000 description 1
- BVKZGUZCCUSVTD-UHFFFAOYSA-L Carbonate Chemical compound [O-]C([O-])=O BVKZGUZCCUSVTD-UHFFFAOYSA-L 0.000 description 1
- VEXZGXHMUGYJMC-UHFFFAOYSA-M Chloride anion Chemical compound [Cl-] VEXZGXHMUGYJMC-UHFFFAOYSA-M 0.000 description 1
- 229910000570 Cupronickel Inorganic materials 0.000 description 1
- KCXVZYZYPLLWCC-UHFFFAOYSA-N EDTA Chemical compound OC(=O)CN(CC(O)=O)CCN(CC(O)=O)CC(O)=O KCXVZYZYPLLWCC-UHFFFAOYSA-N 0.000 description 1
- WSFSSNUMVMOOMR-UHFFFAOYSA-N Formaldehyde Chemical compound O=C WSFSSNUMVMOOMR-UHFFFAOYSA-N 0.000 description 1
- CERQOIWHTDAKMF-UHFFFAOYSA-N Methacrylic acid Chemical compound CC(=C)C(O)=O CERQOIWHTDAKMF-UHFFFAOYSA-N 0.000 description 1
- 241000238413 Octopus Species 0.000 description 1
- 244000137852 Petrea volubilis Species 0.000 description 1
- OAICVXFJPJFONN-UHFFFAOYSA-N Phosphorus Chemical compound [P] OAICVXFJPJFONN-UHFFFAOYSA-N 0.000 description 1
- 206010034972 Photosensitivity reaction Diseases 0.000 description 1
- 239000005062 Polybutadiene Substances 0.000 description 1
- 239000004698 Polyethylene Substances 0.000 description 1
- 239000004642 Polyimide Substances 0.000 description 1
- 229920000265 Polyparaphenylene Polymers 0.000 description 1
- 239000004743 Polypropylene Substances 0.000 description 1
- 239000004793 Polystyrene Substances 0.000 description 1
- 239000006087 Silane Coupling Agent Substances 0.000 description 1
- 229910000831 Steel Inorganic materials 0.000 description 1
- RAHZWNYVWXNFOC-UHFFFAOYSA-N Sulphur dioxide Chemical compound O=S=O RAHZWNYVWXNFOC-UHFFFAOYSA-N 0.000 description 1
- 238000010521 absorption reaction Methods 0.000 description 1
- 238000010306 acid treatment Methods 0.000 description 1
- 150000001252 acrylic acid derivatives Chemical class 0.000 description 1
- 230000004913 activation Effects 0.000 description 1
- 125000002723 alicyclic group Chemical group 0.000 description 1
- 235000019270 ammonium chloride Nutrition 0.000 description 1
- 238000004873 anchoring Methods 0.000 description 1
- JFCQEDHGNNZCLN-UHFFFAOYSA-N anhydrous glutaric acid Natural products OC(=O)CCCC(O)=O JFCQEDHGNNZCLN-UHFFFAOYSA-N 0.000 description 1
- 239000011230 binding agent Substances 0.000 description 1
- 229910052797 bismuth Inorganic materials 0.000 description 1
- 239000004841 bisphenol A epoxy resin Substances 0.000 description 1
- 239000000919 ceramic Substances 0.000 description 1
- 239000002738 chelating agent Substances 0.000 description 1
- 239000013043 chemical agent Substances 0.000 description 1
- 238000003486 chemical etching Methods 0.000 description 1
- 239000000460 chlorine Substances 0.000 description 1
- 229910052801 chlorine Inorganic materials 0.000 description 1
- 229910052804 chromium Inorganic materials 0.000 description 1
- 239000013065 commercial product Substances 0.000 description 1
- 230000008602 contraction Effects 0.000 description 1
- 230000008094 contradictory effect Effects 0.000 description 1
- 229920001577 copolymer Polymers 0.000 description 1
- 150000001879 copper Chemical class 0.000 description 1
- YOCUPQPZWBBYIX-UHFFFAOYSA-N copper nickel Chemical compound [Ni].[Cu] YOCUPQPZWBBYIX-UHFFFAOYSA-N 0.000 description 1
- 238000005336 cracking Methods 0.000 description 1
- 238000002788 crimping Methods 0.000 description 1
- 238000004132 cross linking Methods 0.000 description 1
- LDHQCZJRKDOVOX-NSCUHMNNSA-N crotonic acid Chemical compound C\C=C\C(O)=O LDHQCZJRKDOVOX-NSCUHMNNSA-N 0.000 description 1
- 230000007547 defect Effects 0.000 description 1
- 238000001514 detection method Methods 0.000 description 1
- 230000006866 deterioration Effects 0.000 description 1
- 229940019778 diethylene glycol diethyl ether Drugs 0.000 description 1
- 238000009792 diffusion process Methods 0.000 description 1
- SBZXBUIDTXKZTM-UHFFFAOYSA-N diglyme Chemical compound COCCOCCOC SBZXBUIDTXKZTM-UHFFFAOYSA-N 0.000 description 1
- 238000002845 discoloration Methods 0.000 description 1
- 230000008030 elimination Effects 0.000 description 1
- 238000003379 elimination reaction Methods 0.000 description 1
- 230000001804 emulsifying effect Effects 0.000 description 1
- 229920006351 engineering plastic Polymers 0.000 description 1
- 125000003700 epoxy group Chemical group 0.000 description 1
- LYCAIKOWRPUZTN-UHFFFAOYSA-N ethylene glycol Natural products OCCO LYCAIKOWRPUZTN-UHFFFAOYSA-N 0.000 description 1
- 238000002474 experimental method Methods 0.000 description 1
- 239000012765 fibrous filler Substances 0.000 description 1
- 238000007667 floating Methods 0.000 description 1
- 239000004811 fluoropolymer Substances 0.000 description 1
- 229920002313 fluoropolymer Polymers 0.000 description 1
- 238000009499 grossing Methods 0.000 description 1
- 230000020169 heat generation Effects 0.000 description 1
- 239000012761 high-performance material Substances 0.000 description 1
- 238000007731 hot pressing Methods 0.000 description 1
- WGCNASOHLSPBMP-UHFFFAOYSA-N hydroxyacetaldehyde Natural products OCC=O WGCNASOHLSPBMP-UHFFFAOYSA-N 0.000 description 1
- 150000002460 imidazoles Chemical class 0.000 description 1
- 229910052738 indium Inorganic materials 0.000 description 1
- 238000009776 industrial production Methods 0.000 description 1
- 239000011261 inert gas Substances 0.000 description 1
- 239000012784 inorganic fiber Substances 0.000 description 1
- 230000002452 interceptive effect Effects 0.000 description 1
- 238000010884 ion-beam technique Methods 0.000 description 1
- 229910052742 iron Inorganic materials 0.000 description 1
- 239000002648 laminated material Substances 0.000 description 1
- 238000003475 lamination Methods 0.000 description 1
- 239000007791 liquid phase Substances 0.000 description 1
- 230000007774 longterm Effects 0.000 description 1
- 239000011159 matrix material Substances 0.000 description 1
- 238000005259 measurement Methods 0.000 description 1
- 239000000155 melt Substances 0.000 description 1
- 239000012528 membrane Substances 0.000 description 1
- 238000001465 metallisation Methods 0.000 description 1
- XLSZMDLNRCVEIJ-UHFFFAOYSA-N methylimidazole Natural products CC1=CNC=N1 XLSZMDLNRCVEIJ-UHFFFAOYSA-N 0.000 description 1
- LGQLOGILCSXPEA-UHFFFAOYSA-L nickel sulfate Chemical compound [Ni+2].[O-]S([O-])(=O)=O LGQLOGILCSXPEA-UHFFFAOYSA-L 0.000 description 1
- 229910000363 nickel(II) sulfate Inorganic materials 0.000 description 1
- 239000004745 nonwoven fabric Substances 0.000 description 1
- 239000004843 novolac epoxy resin Substances 0.000 description 1
- 230000003287 optical effect Effects 0.000 description 1
- 229910052698 phosphorus Inorganic materials 0.000 description 1
- 239000011574 phosphorus Substances 0.000 description 1
- IEQIEDJGQAUEQZ-UHFFFAOYSA-N phthalocyanine Chemical compound N1C(N=C2C3=CC=CC=C3C(N=C3C4=CC=CC=C4C(=N4)N3)=N2)=C(C=CC=C2)C2=C1N=C1C2=CC=CC=C2C4=N1 IEQIEDJGQAUEQZ-UHFFFAOYSA-N 0.000 description 1
- 229910052697 platinum Inorganic materials 0.000 description 1
- 229920002857 polybutadiene Polymers 0.000 description 1
- 229920000573 polyethylene Polymers 0.000 description 1
- 239000004848 polyfunctional curative Substances 0.000 description 1
- 229920001195 polyisoprene Polymers 0.000 description 1
- 239000011116 polymethylpentene Substances 0.000 description 1
- 229920000098 polyolefin Polymers 0.000 description 1
- 229920001155 polypropylene Polymers 0.000 description 1
- NNFCIKHAZHQZJG-UHFFFAOYSA-N potassium cyanide Chemical compound [K+].N#[C-] NNFCIKHAZHQZJG-UHFFFAOYSA-N 0.000 description 1
- 230000002265 prevention Effects 0.000 description 1
- 238000004080 punching Methods 0.000 description 1
- 238000011946 reduction process Methods 0.000 description 1
- 230000002787 reinforcement Effects 0.000 description 1
- 239000012779 reinforcing material Substances 0.000 description 1
- 239000011342 resin composition Substances 0.000 description 1
- 238000006748 scratching Methods 0.000 description 1
- 230000002393 scratching effect Effects 0.000 description 1
- 230000035939 shock Effects 0.000 description 1
- 239000004332 silver Substances 0.000 description 1
- SUKJFIGYRHOWBL-UHFFFAOYSA-N sodium hypochlorite Chemical compound [Na+].Cl[O-] SUKJFIGYRHOWBL-UHFFFAOYSA-N 0.000 description 1
- PFUVRDFDKPNGAV-UHFFFAOYSA-N sodium peroxide Chemical compound [Na+].[Na+].[O-][O-] PFUVRDFDKPNGAV-UHFFFAOYSA-N 0.000 description 1
- 239000004071 soot Substances 0.000 description 1
- 241000894007 species Species 0.000 description 1
- 239000010959 steel Substances 0.000 description 1
- 230000003746 surface roughness Effects 0.000 description 1
- 229910052716 thallium Inorganic materials 0.000 description 1
- LDHQCZJRKDOVOX-UHFFFAOYSA-N trans-crotonic acid Natural products CC=CC(O)=O LDHQCZJRKDOVOX-UHFFFAOYSA-N 0.000 description 1
- 229910052725 zinc Inorganic materials 0.000 description 1
Images
Classifications
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
- H05K3/4652—Adding a circuit layer by laminating a metal foil or a preformed metal foil pattern
-
- B—PERFORMING OPERATIONS; TRANSPORTING
- B23—MACHINE TOOLS; METAL-WORKING NOT OTHERWISE PROVIDED FOR
- B23K—SOLDERING OR UNSOLDERING; WELDING; CLADDING OR PLATING BY SOLDERING OR WELDING; CUTTING BY APPLYING HEAT LOCALLY, e.g. FLAME CUTTING; WORKING BY LASER BEAM
- B23K26/00—Working by laser beam, e.g. welding, cutting or boring
- B23K26/36—Removing material
- B23K26/38—Removing material by boring or cutting
- B23K26/382—Removing material by boring or cutting by boring
- B23K26/389—Removing material by boring or cutting by boring of fluid openings, e.g. nozzles, jets
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
- H05K3/0026—Etching of the substrate by chemical or physical means by laser ablation
- H05K3/0032—Etching of the substrate by chemical or physical means by laser ablation of organic insulating material
- H05K3/0035—Etching of the substrate by chemical or physical means by laser ablation of organic insulating material of blind holes, i.e. having a metal layer at the bottom
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
- H05K3/0026—Etching of the substrate by chemical or physical means by laser ablation
- H05K3/0032—Etching of the substrate by chemical or physical means by laser ablation of organic insulating material
- H05K3/0038—Etching of the substrate by chemical or physical means by laser ablation of organic insulating material combined with laser drilling through a metal layer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/382—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal
- H05K3/383—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal by microetching
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4602—Manufacturing multilayer circuits characterized by a special circuit board as base or central core whereon additional circuit layers are built or additional circuit boards are laminated
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4611—Manufacturing multilayer circuits by laminating two or more circuit boards
- H05K3/4623—Manufacturing multilayer circuits by laminating two or more circuit boards the circuit boards having internal via connections between two or more circuit layers before lamination, e.g. double-sided circuit boards
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2224/00—Indexing scheme for arrangements for connecting or disconnecting semiconductor or solid-state bodies and methods related thereto as covered by H01L24/00
- H01L2224/01—Means for bonding being attached to, or being formed on, the surface to be connected, e.g. chip-to-package, die-attach, "first-level" interconnects; Manufacturing methods related thereto
- H01L2224/10—Bump connectors; Manufacturing methods related thereto
- H01L2224/15—Structure, shape, material or disposition of the bump connectors after the connecting process
- H01L2224/16—Structure, shape, material or disposition of the bump connectors after the connecting process of an individual bump connector
- H01L2224/161—Disposition
- H01L2224/16151—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive
- H01L2224/16221—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked
- H01L2224/16225—Disposition the bump connector connecting between a semiconductor or solid-state body and an item not being a semiconductor or solid-state body, e.g. chip-to-substrate, chip-to-passive the body and the item being stacked the item being non-metallic, e.g. insulating substrate with or without metallisation
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/1517—Multilayer substrate
- H01L2924/15172—Fan-out arrangement of the internal vias
- H01L2924/15174—Fan-out arrangement of the internal vias in different layers of the multilayer substrate
-
- H—ELECTRICITY
- H01—ELECTRIC ELEMENTS
- H01L—SEMICONDUCTOR DEVICES NOT COVERED BY CLASS H10
- H01L2924/00—Indexing scheme for arrangements or methods for connecting or disconnecting semiconductor or solid-state bodies as covered by H01L24/00
- H01L2924/15—Details of package parts other than the semiconductor or other solid state devices to be connected
- H01L2924/151—Die mounting substrate
- H01L2924/153—Connection portion
- H01L2924/1531—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface
- H01L2924/15311—Connection portion the connection portion being formed only on the surface of the substrate opposite to the die mounting surface being a ball array, e.g. BGA
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K1/00—Printed circuits
- H05K1/02—Details
- H05K1/0201—Thermal arrangements, e.g. for cooling, heating or preventing overheating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/01—Dielectrics
- H05K2201/0183—Dielectric layers
- H05K2201/0195—Dielectric or adhesive layers comprising a plurality of layers, e.g. in a multilayer structure
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0335—Layered conductors or foils
- H05K2201/0352—Differences between the conductors of different layers of a multilayer
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/03—Conductive materials
- H05K2201/0332—Structure of the conductor
- H05K2201/0335—Layered conductors or foils
- H05K2201/0358—Resin coated copper [RCC]
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/06—Thermal details
- H05K2201/062—Means for thermal insulation, e.g. for protection of parts
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/09—Shape and layout
- H05K2201/09209—Shape and layout details of conductors
- H05K2201/095—Conductive through-holes or vias
- H05K2201/09536—Buried plated through-holes, i.e. plated through-holes formed in a core before lamination
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/09—Shape and layout
- H05K2201/09209—Shape and layout details of conductors
- H05K2201/095—Conductive through-holes or vias
- H05K2201/0959—Plated through-holes or plated blind vias filled with insulating material
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/09—Shape and layout
- H05K2201/09818—Shape or layout details not covered by a single group of H05K2201/09009 - H05K2201/09809
- H05K2201/09827—Tapered, e.g. tapered hole, via or groove
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/09—Shape and layout
- H05K2201/09818—Shape or layout details not covered by a single group of H05K2201/09009 - H05K2201/09809
- H05K2201/09863—Concave hole or via
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2201/00—Indexing scheme relating to printed circuits covered by H05K1/00
- H05K2201/09—Shape and layout
- H05K2201/09818—Shape or layout details not covered by a single group of H05K2201/09009 - H05K2201/09809
- H05K2201/09881—Coating only between conductors, i.e. flush with the conductors
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/03—Metal processing
- H05K2203/0307—Providing micro- or nanometer scale roughness on a metal surface, e.g. by plating of nodules or dendrites
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/03—Metal processing
- H05K2203/0353—Making conductive layer thin, e.g. by etching
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/05—Patterning and lithography; Masks; Details of resist
- H05K2203/0548—Masks
- H05K2203/0554—Metal used as mask for etching vias, e.g. by laser ablation
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/07—Treatments involving liquids, e.g. plating, rinsing
- H05K2203/0756—Uses of liquids, e.g. rinsing, coating, dissolving
- H05K2203/0773—Dissolving the filler without dissolving the matrix material; Dissolving the matrix material without dissolving the filler
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/10—Using electric, magnetic and electromagnetic fields; Using laser light
- H05K2203/107—Using laser light
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K2203/00—Indexing scheme relating to apparatus or processes for manufacturing printed circuits covered by H05K3/00
- H05K2203/12—Using specific substances
- H05K2203/121—Metallo-organic compounds
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0017—Etching of the substrate by chemical or physical means
- H05K3/0026—Etching of the substrate by chemical or physical means by laser ablation
- H05K3/0032—Etching of the substrate by chemical or physical means by laser ablation of organic insulating material
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0011—Working of insulating substrates or insulating layers
- H05K3/0055—After-treatment, e.g. cleaning or desmearing of holes
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/0094—Filling or covering plated through-holes or blind plated vias, e.g. for masking or for mechanical reinforcement
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/10—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern
- H05K3/108—Apparatus or processes for manufacturing printed circuits in which conductive material is applied to the insulating support in such a manner as to form the desired conductive pattern by semi-additive methods; masks therefor
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/22—Secondary treatment of printed circuits
- H05K3/28—Applying non-metallic protective coatings
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/381—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the substrate
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/38—Improvement of the adhesion between the insulating substrate and the metal
- H05K3/382—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal
- H05K3/384—Improvement of the adhesion between the insulating substrate and the metal by special treatment of the metal by plating
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/40—Forming printed elements for providing electric connections to or between printed circuits
- H05K3/42—Plated through-holes or plated via connections
- H05K3/425—Plated through-holes or plated via connections characterised by the sequence of steps for plating the through-holes or via connections in relation to the conductive pattern
- H05K3/427—Plated through-holes or plated via connections characterised by the sequence of steps for plating the through-holes or via connections in relation to the conductive pattern initial plating of through-holes in metal-clad substrates
-
- H—ELECTRICITY
- H05—ELECTRIC TECHNIQUES NOT OTHERWISE PROVIDED FOR
- H05K—PRINTED CIRCUITS; CASINGS OR CONSTRUCTIONAL DETAILS OF ELECTRIC APPARATUS; MANUFACTURE OF ASSEMBLAGES OF ELECTRICAL COMPONENTS
- H05K3/00—Apparatus or processes for manufacturing printed circuits
- H05K3/46—Manufacturing multilayer circuits
- H05K3/4644—Manufacturing multilayer circuits by building the multilayer layer by layer, i.e. build-up multilayer circuits
- H05K3/4661—Adding a circuit layer by direct wet plating, e.g. electroless plating; insulating materials adapted therefor
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49126—Assembling bases
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49128—Assembling formed circuit to base
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/4913—Assembling to base an electrical component, e.g., capacitor, etc.
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49155—Manufacturing circuit on or in base
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49155—Manufacturing circuit on or in base
- Y10T29/49156—Manufacturing circuit on or in base with selective destruction of conductive paths
-
- Y—GENERAL TAGGING OF NEW TECHNOLOGICAL DEVELOPMENTS; GENERAL TAGGING OF CROSS-SECTIONAL TECHNOLOGIES SPANNING OVER SEVERAL SECTIONS OF THE IPC; TECHNICAL SUBJECTS COVERED BY FORMER USPC CROSS-REFERENCE ART COLLECTIONS [XRACs] AND DIGESTS
- Y10—TECHNICAL SUBJECTS COVERED BY FORMER USPC
- Y10T—TECHNICAL SUBJECTS COVERED BY FORMER US CLASSIFICATION
- Y10T29/00—Metal working
- Y10T29/49—Method of mechanical manufacture
- Y10T29/49002—Electrical device making
- Y10T29/49117—Conductor or circuit manufacturing
- Y10T29/49124—On flat or curved insulated base, e.g., printed circuit, etc.
- Y10T29/49155—Manufacturing circuit on or in base
- Y10T29/49165—Manufacturing circuit on or in base by forming conductive walled aperture in base
Applications Claiming Priority (17)
Application Number | Priority Date | Filing Date | Title |
---|---|---|---|
JP24938298A JP2000077851A (ja) | 1998-09-03 | 1998-09-03 | 多層プリント配線板の製造方法 |
JPJP-P-1998-00249382 | 1998-09-03 | ||
JPJP-P-1998-00281940 | 1998-09-16 | ||
JP28194098A JP2000091742A (ja) | 1998-09-16 | 1998-09-16 | プリント配線板の製造方法 |
JPJP-P-1998-00281942 | 1998-09-16 | ||
JP28194298A JP2000091750A (ja) | 1998-09-16 | 1998-09-16 | スルーホールの形成方法、多層プリント配線板の製造方法、およびスルーホール形成基板、多層プリント配線板 |
JPJP-P-1998-00303247 | 1998-10-09 | ||
JP30324798A JP2000114727A (ja) | 1998-10-09 | 1998-10-09 | 多層プリント配線板 |
JP04351499A JP4127441B2 (ja) | 1999-02-22 | 1999-02-22 | 多層ビルドアップ配線板の製造方法 |
JPJP-P-1999-00043514 | 1999-02-22 | ||
JPJP-P-1999-00043515 | 1999-02-22 | ||
JP04351599A JP4127442B2 (ja) | 1999-02-22 | 1999-02-22 | 多層ビルドアップ配線板及びその製造方法 |
JPJP-P-1999-00060240 | 1999-03-08 | ||
JP6024099A JP2000261149A (ja) | 1999-03-08 | 1999-03-08 | 多層プリント配線板およびその製造方法 |
JPJP-P-1999-00116246 | 1999-04-23 | ||
JP11624699A JP4137279B2 (ja) | 1999-04-23 | 1999-04-23 | プリント配線板及びその製造方法 |
KR1020017002801A KR20010088796A (ko) | 1998-09-03 | 1999-07-30 | 다층프린트배선판 및 그 제조방법 |
Related Parent Applications (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020017002801A Division KR20010088796A (ko) | 1998-09-03 | 1999-07-30 | 다층프린트배선판 및 그 제조방법 |
Publications (2)
Publication Number | Publication Date |
---|---|
KR20070086861A KR20070086861A (ko) | 2007-08-27 |
KR100855530B1 true KR100855530B1 (ko) | 2008-09-01 |
Family
ID=27572302
Family Applications (8)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020017002801A KR20010088796A (ko) | 1998-09-03 | 1999-07-30 | 다층프린트배선판 및 그 제조방법 |
KR1020077015085A KR20070086863A (ko) | 1998-09-03 | 1999-07-30 | 다층프린트배선판 및 그 제조방법 |
KR1020077015087A KR20070086864A (ko) | 1998-09-03 | 1999-07-30 | 다층프린트배선판 및 그 제조방법 |
KR1020077015083A KR20070086862A (ko) | 1998-09-03 | 1999-07-30 | 다층프린트배선판 및 그 제조방법 |
KR1020077015080A KR100855529B1 (ko) | 1998-09-03 | 1999-07-30 | 다층프린트배선판 및 그 제조방법 |
KR1020077015081A KR20070086860A (ko) | 1998-09-03 | 1999-07-30 | 다층프린트배선판 및 그 제조방법 |
KR1020077015082A KR100855530B1 (ko) | 1998-09-03 | 1999-07-30 | 다층프린트배선판 및 그 제조방법 |
KR1020077015079A KR100855528B1 (ko) | 1998-09-03 | 1999-07-30 | 다층프린트배선판 및 그 제조방법 |
Family Applications Before (6)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020017002801A KR20010088796A (ko) | 1998-09-03 | 1999-07-30 | 다층프린트배선판 및 그 제조방법 |
KR1020077015085A KR20070086863A (ko) | 1998-09-03 | 1999-07-30 | 다층프린트배선판 및 그 제조방법 |
KR1020077015087A KR20070086864A (ko) | 1998-09-03 | 1999-07-30 | 다층프린트배선판 및 그 제조방법 |
KR1020077015083A KR20070086862A (ko) | 1998-09-03 | 1999-07-30 | 다층프린트배선판 및 그 제조방법 |
KR1020077015080A KR100855529B1 (ko) | 1998-09-03 | 1999-07-30 | 다층프린트배선판 및 그 제조방법 |
KR1020077015081A KR20070086860A (ko) | 1998-09-03 | 1999-07-30 | 다층프린트배선판 및 그 제조방법 |
Family Applications After (1)
Application Number | Title | Priority Date | Filing Date |
---|---|---|---|
KR1020077015079A KR100855528B1 (ko) | 1998-09-03 | 1999-07-30 | 다층프린트배선판 및 그 제조방법 |
Country Status (6)
Families Citing this family (182)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
KR100791281B1 (ko) | 1998-05-19 | 2008-01-04 | 이비덴 가부시키가이샤 | 프린트배선판 및 프린트배선판의 제조방법 |
KR20010088796A (ko) * | 1998-09-03 | 2001-09-28 | 엔도 마사루 | 다층프린트배선판 및 그 제조방법 |
MY139405A (en) * | 1998-09-28 | 2009-09-30 | Ibiden Co Ltd | Printed circuit board and method for its production |
US20030039106A1 (en) * | 2000-04-14 | 2003-02-27 | Tatsunori Koyanagi | Double-sided wiring board and its manufacture method |
CA2413759A1 (en) * | 2000-06-28 | 2002-12-20 | Shigeki Naitoh | Resin composition for insulation material, resin composition for adhesive and adhesion sheet |
JP2002252446A (ja) * | 2001-02-23 | 2002-09-06 | Sony Chem Corp | フレキシブル配線基板の製造方法 |
JP4000796B2 (ja) * | 2001-08-08 | 2007-10-31 | 株式会社豊田自動織機 | ビアホールの銅メッキ方法 |
JP3941433B2 (ja) * | 2001-08-08 | 2007-07-04 | 株式会社豊田自動織機 | ビアホールのスミア除去方法 |
EP1915041A1 (en) | 2001-09-28 | 2008-04-23 | Ibiden Co., Ltd. | Printed wiring board and printed wiring board manufacturing method |
US6395625B1 (en) * | 2001-10-12 | 2002-05-28 | S & S Technology Corporation | Method for manufacturing solder mask of printed circuit board |
US6753480B2 (en) * | 2001-10-12 | 2004-06-22 | Ultratera Corporation | Printed circuit board having permanent solder mask |
US6818464B2 (en) * | 2001-10-17 | 2004-11-16 | Hymite A/S | Double-sided etching technique for providing a semiconductor structure with through-holes, and a feed-through metalization process for sealing the through-holes |
JP2003234572A (ja) * | 2002-02-06 | 2003-08-22 | Nitto Denko Corp | 両面配線基板の製造方法 |
WO2003083543A1 (fr) * | 2002-04-01 | 2003-10-09 | Ibiden Co., Ltd. | Substrat support de puce a circuit integre, procede de fabrication de substrat support de puce a circuit integre, dispositif de communication optique et procede de fabrication de dispositif de communication optique |
US20040012097A1 (en) * | 2002-07-17 | 2004-01-22 | Chien-Wei Chang | Structure and method for fine pitch flip chip substrate |
TWI290016B (en) * | 2002-10-14 | 2007-11-11 | Atotech Deutschland Gmbh | A process and an apparatus for coating printed circuit boards with laser-structurable, thermally curable solder stop lacquers and electroresists |
US6839965B2 (en) * | 2003-02-06 | 2005-01-11 | R-Tec Corporation | Method of manufacturing a resistor connector |
JP4029759B2 (ja) * | 2003-04-04 | 2008-01-09 | 株式会社デンソー | 多層回路基板およびその製造方法 |
US6759318B1 (en) * | 2003-04-15 | 2004-07-06 | Kinsus Interconnect Technology Corp. | Translation pad flip chip (TPFC) method for improving micro bump pitch IC substrate structure and manufacturing process |
JP4133560B2 (ja) * | 2003-05-07 | 2008-08-13 | インターナショナル・ビジネス・マシーンズ・コーポレーション | プリント配線基板の製造方法およびプリント配線基板 |
US7476813B2 (en) * | 2003-05-14 | 2009-01-13 | Rambus Inc. | Multilayer flip-chip substrate interconnect layout |
JP2004363478A (ja) * | 2003-06-06 | 2004-12-24 | Sanyo Electric Co Ltd | 半導体装置の製造方法 |
JP2005101506A (ja) * | 2003-08-21 | 2005-04-14 | Seiko Epson Corp | 電子部品実装体の製造方法、電気光学装置の製造方法、電子部品実装体、電気光学装置 |
JPWO2005025857A1 (ja) * | 2003-09-10 | 2006-11-16 | 日本ゼオン株式会社 | 樹脂複合フィルム |
JP4226981B2 (ja) * | 2003-09-24 | 2009-02-18 | 三井金属鉱業株式会社 | プリント配線板の製造方法及びその製造方法で得られたプリント配線板 |
JP2005150552A (ja) * | 2003-11-18 | 2005-06-09 | Ngk Spark Plug Co Ltd | 配線基板の製造方法 |
JP2005158848A (ja) * | 2003-11-21 | 2005-06-16 | Nitto Denko Corp | 配線回路基板の製造方法 |
WO2005055680A1 (en) * | 2003-12-05 | 2005-06-16 | The Commonwealth Of Australia | Method of manufacturing an electrical component |
JP2005183720A (ja) * | 2003-12-19 | 2005-07-07 | Brother Ind Ltd | 素子実装基板の製造方法及びプリント基板 |
US7622844B1 (en) * | 2003-12-30 | 2009-11-24 | Hipercon, Llc | Metal fiber brush interface conditioning |
JP4516320B2 (ja) * | 2004-01-08 | 2010-08-04 | シチズン電子株式会社 | Led基板 |
TW200541434A (en) * | 2004-04-30 | 2005-12-16 | Hitachi Via Mechanics Ltd | Printed circuit board and method for processing printed circuit board and method for manufacturing printed circuit board |
JP4536430B2 (ja) * | 2004-06-10 | 2010-09-01 | イビデン株式会社 | フレックスリジッド配線板 |
US20060022339A1 (en) * | 2004-07-30 | 2006-02-02 | Texas Instruments Incorporated | Solder ball opening protrusion for semiconductor assembly |
JP4028863B2 (ja) * | 2004-09-10 | 2007-12-26 | 富士通株式会社 | 基板製造方法 |
JP4346541B2 (ja) * | 2004-11-26 | 2009-10-21 | 日東電工株式会社 | 配線回路基板およびその製造方法 |
JP4955263B2 (ja) * | 2004-12-15 | 2012-06-20 | イビデン株式会社 | プリント配線板 |
WO2006080073A1 (ja) * | 2005-01-27 | 2006-08-03 | Matsushita Electric Industrial Co., Ltd. | 多層回路基板の製造方法、多層回路基板 |
CN101826496B (zh) * | 2005-05-23 | 2015-03-18 | 揖斐电株式会社 | 印刷线路板及其制造方法 |
JP2007067216A (ja) * | 2005-08-31 | 2007-03-15 | Sanyo Electric Co Ltd | 半導体装置およびその製造方法、回路基板およびその製造方法 |
JP2007103816A (ja) * | 2005-10-07 | 2007-04-19 | Nec Electronics Corp | 配線基板および電子回路装置 |
JP2007123531A (ja) * | 2005-10-27 | 2007-05-17 | Toshiba Corp | プリント配線基板及びこれを用いたプリント回路基板 |
JP4287458B2 (ja) * | 2005-11-16 | 2009-07-01 | サムソン エレクトロ−メカニックス カンパニーリミテッド. | ペーストバンプを用いた印刷回路基板およびその製造方法 |
WO2007086568A1 (ja) * | 2006-01-30 | 2007-08-02 | Kyocera Corporation | 樹脂フィルム、接着シート、配線基板および電子装置 |
JP5021216B2 (ja) | 2006-02-22 | 2012-09-05 | イビデン株式会社 | プリント配線板およびその製造方法 |
KR100717909B1 (ko) * | 2006-02-24 | 2007-05-14 | 삼성전기주식회사 | 니켈층을 포함하는 기판 및 이의 제조방법 |
JP2007307599A (ja) * | 2006-05-20 | 2007-11-29 | Sumitomo Electric Ind Ltd | スルーホール成形体およびレーザー加工方法 |
JP4917361B2 (ja) * | 2006-06-13 | 2012-04-18 | 株式会社ディスコ | ビアホールの加工方法 |
KR100744005B1 (ko) * | 2006-06-29 | 2007-07-30 | 주식회사 하이닉스반도체 | 반도체 소자의 금속 패턴 형성방법 |
US8071883B2 (en) | 2006-10-23 | 2011-12-06 | Ibiden Co., Ltd. | Flex-rigid wiring board including flexible substrate and non-flexible substrate and method of manufacturing the same |
US7982135B2 (en) * | 2006-10-30 | 2011-07-19 | Ibiden Co., Ltd. | Flex-rigid wiring board and method of manufacturing the same |
JP5029026B2 (ja) * | 2007-01-18 | 2012-09-19 | 富士通株式会社 | 電子装置の製造方法 |
KR100843368B1 (ko) * | 2007-03-02 | 2008-07-03 | 삼성전기주식회사 | 다층 인쇄회로기판의 제조방법 |
TW200906263A (en) * | 2007-05-29 | 2009-02-01 | Matsushita Electric Ind Co Ltd | Circuit board and method for manufacturing the same |
US8440916B2 (en) * | 2007-06-28 | 2013-05-14 | Intel Corporation | Method of forming a substrate core structure using microvia laser drilling and conductive layer pre-patterning and substrate core structure formed according to the method |
KR100841987B1 (ko) * | 2007-07-10 | 2008-06-27 | 삼성전기주식회사 | 다층 인쇄회로기판 제조방법 |
EP2170028A4 (en) * | 2007-07-10 | 2011-07-20 | Ibiden Co Ltd | WELDING SUBSTRATE AND METHOD FOR THE PRODUCTION THEREOF |
US8044306B2 (en) | 2007-07-11 | 2011-10-25 | Ibiden Co., Ltd. | Wiring board and method of manufacturing the same |
KR100929839B1 (ko) * | 2007-09-28 | 2009-12-04 | 삼성전기주식회사 | 기판제조방법 |
JP5125389B2 (ja) * | 2007-10-12 | 2013-01-23 | 富士通株式会社 | 基板の製造方法 |
JP2009099589A (ja) * | 2007-10-12 | 2009-05-07 | Elpida Memory Inc | ウエハまたは回路基板およびその接続構造体 |
JP2009099621A (ja) * | 2007-10-12 | 2009-05-07 | Fujitsu Ltd | 基板の製造方法 |
US20090114430A1 (en) * | 2007-11-06 | 2009-05-07 | Industry Academic Cooperation Foundation Of Kukmin University | Method for patterning of conductive polymer |
US8309856B2 (en) * | 2007-11-06 | 2012-11-13 | Ibiden Co., Ltd. | Circuit board and manufacturing method thereof |
US7759787B2 (en) * | 2007-11-06 | 2010-07-20 | International Business Machines Corporation | Packaging substrate having pattern-matched metal layers |
WO2009113202A1 (ja) | 2008-03-10 | 2009-09-17 | イビデン株式会社 | フレキシブル配線板及びその製造方法 |
US8263878B2 (en) * | 2008-03-25 | 2012-09-11 | Ibiden Co., Ltd. | Printed wiring board |
KR101044103B1 (ko) * | 2008-04-03 | 2011-06-28 | 삼성전기주식회사 | 다층 인쇄회로기판 및 그 제조방법 |
EP2288965A4 (en) * | 2008-05-01 | 2011-08-10 | Advanced Tech Materials | LOW PH MIXTURES FOR REMOVAL OF HIGH DENSITY IMPLANTED RESERVE |
JP2009277916A (ja) * | 2008-05-15 | 2009-11-26 | Shinko Electric Ind Co Ltd | 配線基板及びその製造方法並びに半導体パッケージ |
JP5138459B2 (ja) * | 2008-05-15 | 2013-02-06 | 新光電気工業株式会社 | 配線基板の製造方法 |
JP2009283739A (ja) * | 2008-05-23 | 2009-12-03 | Shinko Electric Ind Co Ltd | 配線基板および配線基板の製造方法 |
US20100006334A1 (en) * | 2008-07-07 | 2010-01-14 | Ibiden Co., Ltd | Printed wiring board and method for manufacturing the same |
US7542302B1 (en) * | 2008-07-14 | 2009-06-02 | International Business Machines Corporation | Minimizing thickness of deadfronted display assemblies |
US8132321B2 (en) * | 2008-08-13 | 2012-03-13 | Unimicron Technology Corp. | Method for making embedded circuit structure |
CN102132639A (zh) * | 2008-11-06 | 2011-07-20 | 揖斐电株式会社 | 电子部件内置线路板及其制造方法 |
US8431833B2 (en) * | 2008-12-29 | 2013-04-30 | Ibiden Co., Ltd. | Printed wiring board and method for manufacturing the same |
US8872329B1 (en) * | 2009-01-09 | 2014-10-28 | Amkor Technology, Inc. | Extended landing pad substrate package structure and method |
US8410374B2 (en) * | 2009-02-27 | 2013-04-02 | Ibiden Co., Ltd. | Printed wiring board |
JPWO2010113806A1 (ja) * | 2009-04-01 | 2012-10-11 | 住友ベークライト株式会社 | プリント配線板の製造方法、プリント配線板、多層プリント配線板、および半導体パッケージ |
KR101019642B1 (ko) * | 2009-04-27 | 2011-03-07 | 삼성전기주식회사 | 인쇄회로기판 제조 방법 |
WO2010138493A1 (en) | 2009-05-28 | 2010-12-02 | Hsio Technologies, Llc | High performance surface mount electrical interconnect |
US9276336B2 (en) | 2009-05-28 | 2016-03-01 | Hsio Technologies, Llc | Metalized pad to electrical contact interface |
US9536815B2 (en) | 2009-05-28 | 2017-01-03 | Hsio Technologies, Llc | Semiconductor socket with direct selective metalization |
US9613841B2 (en) | 2009-06-02 | 2017-04-04 | Hsio Technologies, Llc | Area array semiconductor device package interconnect structure with optional package-to-package or flexible circuit to package connection |
US8987886B2 (en) | 2009-06-02 | 2015-03-24 | Hsio Technologies, Llc | Copper pillar full metal via electrical circuit structure |
US8988093B2 (en) | 2009-06-02 | 2015-03-24 | Hsio Technologies, Llc | Bumped semiconductor wafer or die level electrical interconnect |
WO2010147934A1 (en) | 2009-06-16 | 2010-12-23 | Hsio Technologies, Llc | Semiconductor die terminal |
WO2010141298A1 (en) | 2009-06-02 | 2010-12-09 | Hsio Technologies, Llc | Composite polymer-metal electrical contacts |
US9184527B2 (en) | 2009-06-02 | 2015-11-10 | Hsio Technologies, Llc | Electrical connector insulator housing |
US8928344B2 (en) | 2009-06-02 | 2015-01-06 | Hsio Technologies, Llc | Compliant printed circuit socket diagnostic tool |
US9276339B2 (en) | 2009-06-02 | 2016-03-01 | Hsio Technologies, Llc | Electrical interconnect IC device socket |
US9930775B2 (en) | 2009-06-02 | 2018-03-27 | Hsio Technologies, Llc | Copper pillar full metal via electrical circuit structure |
US9318862B2 (en) | 2009-06-02 | 2016-04-19 | Hsio Technologies, Llc | Method of making an electronic interconnect |
US9136196B2 (en) | 2009-06-02 | 2015-09-15 | Hsio Technologies, Llc | Compliant printed circuit wafer level semiconductor package |
WO2010141295A1 (en) | 2009-06-02 | 2010-12-09 | Hsio Technologies, Llc | Compliant printed flexible circuit |
US8610265B2 (en) | 2009-06-02 | 2013-12-17 | Hsio Technologies, Llc | Compliant core peripheral lead semiconductor test socket |
US9699906B2 (en) | 2009-06-02 | 2017-07-04 | Hsio Technologies, Llc | Hybrid printed circuit assembly with low density main core and embedded high density circuit regions |
US9603249B2 (en) | 2009-06-02 | 2017-03-21 | Hsio Technologies, Llc | Direct metalization of electrical circuit structures |
WO2010141266A1 (en) | 2009-06-02 | 2010-12-09 | Hsio Technologies, Llc | Compliant printed circuit peripheral lead semiconductor package |
WO2010141316A1 (en) | 2009-06-02 | 2010-12-09 | Hsio Technologies, Llc | Compliant printed circuit wafer probe diagnostic tool |
US8525346B2 (en) * | 2009-06-02 | 2013-09-03 | Hsio Technologies, Llc | Compliant conductive nano-particle electrical interconnect |
US9184145B2 (en) | 2009-06-02 | 2015-11-10 | Hsio Technologies, Llc | Semiconductor device package adapter |
WO2010141311A1 (en) | 2009-06-02 | 2010-12-09 | Hsio Technologies, Llc | Compliant printed circuit area array semiconductor device package |
US9196980B2 (en) | 2009-06-02 | 2015-11-24 | Hsio Technologies, Llc | High performance surface mount electrical interconnect with external biased normal force loading |
WO2012074963A1 (en) | 2010-12-01 | 2012-06-07 | Hsio Technologies, Llc | High performance surface mount electrical interconnect |
WO2012078493A1 (en) | 2010-12-06 | 2012-06-14 | Hsio Technologies, Llc | Electrical interconnect ic device socket |
US8618649B2 (en) | 2009-06-02 | 2013-12-31 | Hsio Technologies, Llc | Compliant printed circuit semiconductor package |
US9231328B2 (en) | 2009-06-02 | 2016-01-05 | Hsio Technologies, Llc | Resilient conductive electrical interconnect |
US9232654B2 (en) | 2009-06-02 | 2016-01-05 | Hsio Technologies, Llc | High performance electrical circuit structure |
WO2010141318A1 (en) | 2009-06-02 | 2010-12-09 | Hsio Technologies, Llc | Compliant printed circuit peripheral lead semiconductor test socket |
US8803539B2 (en) | 2009-06-03 | 2014-08-12 | Hsio Technologies, Llc | Compliant wafer level probe assembly |
US8981568B2 (en) | 2009-06-16 | 2015-03-17 | Hsio Technologies, Llc | Simulated wirebond semiconductor package |
US9320144B2 (en) | 2009-06-17 | 2016-04-19 | Hsio Technologies, Llc | Method of forming a semiconductor socket |
US8981809B2 (en) | 2009-06-29 | 2015-03-17 | Hsio Technologies, Llc | Compliant printed circuit semiconductor tester interface |
US8984748B2 (en) | 2009-06-29 | 2015-03-24 | Hsio Technologies, Llc | Singulated semiconductor device separable electrical interconnect |
DE102009038674B4 (de) * | 2009-08-24 | 2012-02-09 | Epcos Ag | Trägervorrichtung, Anordnung mit einer solchen Trägervorrichtung sowie Verfahren zur Herstellung eines mindestens eine keramische Schicht umfassenden struktururierten Schichtstapels |
TW201110839A (en) * | 2009-09-04 | 2011-03-16 | Advanced Semiconductor Eng | Substrate structure and method for manufacturing the same |
JP5001395B2 (ja) * | 2010-03-31 | 2012-08-15 | イビデン株式会社 | 配線板及び配線板の製造方法 |
US9689897B2 (en) | 2010-06-03 | 2017-06-27 | Hsio Technologies, Llc | Performance enhanced semiconductor socket |
US8758067B2 (en) | 2010-06-03 | 2014-06-24 | Hsio Technologies, Llc | Selective metalization of electrical connector or socket housing |
US9350093B2 (en) | 2010-06-03 | 2016-05-24 | Hsio Technologies, Llc | Selective metalization of electrical connector or socket housing |
US10159154B2 (en) | 2010-06-03 | 2018-12-18 | Hsio Technologies, Llc | Fusion bonded liquid crystal polymer circuit structure |
JP5580135B2 (ja) * | 2010-08-03 | 2014-08-27 | 三井金属鉱業株式会社 | プリント配線板の製造方法及びプリント配線板 |
JP5471987B2 (ja) * | 2010-09-07 | 2014-04-16 | 株式会社大真空 | 電子部品パッケージ用封止部材、電子部品パッケージ、及び電子部品パッケージ用封止部材の製造方法 |
JP5447316B2 (ja) * | 2010-09-21 | 2014-03-19 | 株式会社大真空 | 電子部品パッケージ用封止部材、及び電子部品パッケージ |
US8572840B2 (en) * | 2010-09-30 | 2013-11-05 | International Business Machines Corporation | Method of attaching an electronic module power supply |
JP5602584B2 (ja) * | 2010-10-28 | 2014-10-08 | 新光電気工業株式会社 | 配線基板及びその製造方法 |
US8693203B2 (en) * | 2011-01-14 | 2014-04-08 | Harris Corporation | Method of making an electronic device having a liquid crystal polymer solder mask laminated to an interconnect layer stack and related devices |
GB2492542B (en) * | 2011-03-31 | 2014-03-12 | Fusion Optix Inc | Optical element and collimating optical assembly |
WO2012166405A1 (en) * | 2011-06-01 | 2012-12-06 | E. I. Du Pont De Nemours And Company | Low temperature co-fired ceramic structure for high frequency applications and process for making same |
JP5953681B2 (ja) * | 2011-09-09 | 2016-07-20 | イビデン株式会社 | プリント配線板の製造方法 |
US9101061B2 (en) | 2011-09-22 | 2015-08-04 | Hitachi Chemical Company, Ltd. | Laminate body, laminate plate, multilayer laminate plate, printed wiring board, and method for manufacture of laminate plate |
US9050780B2 (en) | 2011-09-22 | 2015-06-09 | Hitachi Chemical Company, Ltd. | Laminate body, laminate plate, multilayer laminate plate, printed wiring board, and method for manufacture of laminate plate |
DE102011088256A1 (de) * | 2011-12-12 | 2013-06-13 | Zf Friedrichshafen Ag | Multilayer-Leiterplatte sowie Anordnung mit einer solchen |
JP6011074B2 (ja) | 2012-01-20 | 2016-10-19 | 富士通株式会社 | 電子装置の製造方法及び電子装置の製造装置 |
DE102012200915A1 (de) | 2012-01-23 | 2013-07-25 | Robert Bosch Gmbh | Verfahren zur Herstellung eines strukturierten Mehrschichtsystems |
CN103298247A (zh) * | 2012-02-24 | 2013-09-11 | 宏恒胜电子科技(淮安)有限公司 | 电路板及其制作方法 |
TWI504322B (zh) * | 2012-03-29 | 2015-10-11 | Taiwan Green Point Entpr Co | 雙面電路板及其製備方法 |
US20130293482A1 (en) * | 2012-05-04 | 2013-11-07 | Qualcomm Mems Technologies, Inc. | Transparent through-glass via |
US9761520B2 (en) | 2012-07-10 | 2017-09-12 | Hsio Technologies, Llc | Method of making an electrical connector having electrodeposited terminals |
TWI536508B (zh) * | 2012-08-24 | 2016-06-01 | Ngk Spark Plug Co | Wiring board |
US20140106179A1 (en) * | 2012-10-17 | 2014-04-17 | Raytheon Company | Plating design and process for improved hermeticity and thermal conductivity of gold-germanium solder joints |
JP2014086651A (ja) * | 2012-10-26 | 2014-05-12 | Ibiden Co Ltd | プリント配線板及びプリント配線板の製造方法 |
US10028394B2 (en) * | 2012-12-17 | 2018-07-17 | Intel Corporation | Electrical interconnect formed through buildup process |
US8953171B1 (en) * | 2012-12-18 | 2015-02-10 | Bruker Nano Inc | Signal sectioning for profiling printed-circuit-board vias with vertical scanning interferometry |
US9664509B2 (en) * | 2012-12-18 | 2017-05-30 | Bruker Nano Inc. | Signal sectioning for profiling printed-circuit-bord vias with vertical scanning interferometry |
KR101396704B1 (ko) | 2012-12-20 | 2014-05-16 | 삼성전기주식회사 | 회로 기판 및 그 제조 방법 |
CN103182608B (zh) * | 2013-04-03 | 2015-12-23 | 大族激光科技产业集团股份有限公司 | Pcb板开盖的加工方法 |
JP6162458B2 (ja) * | 2013-04-05 | 2017-07-12 | 新光電気工業株式会社 | 配線基板、半導体装置及び配線基板の製造方法 |
US10667410B2 (en) | 2013-07-11 | 2020-05-26 | Hsio Technologies, Llc | Method of making a fusion bonded circuit structure |
US10506722B2 (en) | 2013-07-11 | 2019-12-10 | Hsio Technologies, Llc | Fusion bonded liquid crystal polymer electrical circuit structure |
CN104349609A (zh) * | 2013-08-08 | 2015-02-11 | 北大方正集团有限公司 | 印刷线路板及其制作方法 |
CN104378907B (zh) * | 2013-08-12 | 2017-06-30 | 富葵精密组件(深圳)有限公司 | 电路板及其制作方法 |
KR101548421B1 (ko) * | 2013-08-27 | 2015-08-28 | 삼성전기주식회사 | 다층인쇄회로기판의 제조방법 |
KR20150033979A (ko) * | 2013-09-25 | 2015-04-02 | 삼성전기주식회사 | 인터포저 기판 및 인터포저 기판 제조 방법 |
JP6316609B2 (ja) | 2014-02-05 | 2018-04-25 | 新光電気工業株式会社 | 配線基板及び半導体装置と配線基板の製造方法及び半導体装置の製造方法 |
CN105657988B (zh) * | 2014-11-21 | 2019-04-23 | 宏启胜精密电子(秦皇岛)有限公司 | 柔性电路板及其制作方法 |
US9559447B2 (en) | 2015-03-18 | 2017-01-31 | Hsio Technologies, Llc | Mechanical contact retention within an electrical connector |
CN105163520A (zh) * | 2015-08-19 | 2015-12-16 | 深圳市迅捷兴电路技术有限公司 | 机械盲、埋孔精细线路印制电路板制作方法 |
JP6834121B2 (ja) * | 2015-09-17 | 2021-02-24 | 味の素株式会社 | 配線板の製造方法 |
US10211071B2 (en) * | 2016-01-29 | 2019-02-19 | Nxp B.V. | IC packaging method and a packaged IC device |
JP2017152536A (ja) * | 2016-02-24 | 2017-08-31 | イビデン株式会社 | プリント配線板及びその製造方法 |
WO2018043682A1 (ja) * | 2016-09-01 | 2018-03-08 | 旭硝子株式会社 | 配線基板およびその製造方法 |
KR101952864B1 (ko) | 2016-09-30 | 2019-02-27 | 삼성전기주식회사 | 팬-아웃 반도체 패키지 |
US10283445B2 (en) | 2016-10-26 | 2019-05-07 | Invensas Corporation | Bonding of laminates with electrical interconnects |
KR20180095350A (ko) * | 2017-02-17 | 2018-08-27 | 삼성전기주식회사 | 기판 및 기판의 제조방법 |
US10892671B2 (en) * | 2017-07-25 | 2021-01-12 | GM Global Technology Operations LLC | Electrically conductive copper components and joining processes therefor |
JP7011946B2 (ja) * | 2017-10-27 | 2022-01-27 | 京セラ株式会社 | 配線基板 |
US10405421B2 (en) | 2017-12-18 | 2019-09-03 | International Business Machines Corporation | Selective dielectric resin application on circuitized core layers |
CN108235591B (zh) * | 2018-01-08 | 2020-08-18 | 昆山首源电子科技有限公司 | 5g通讯高频信号板镀金蚀刻工艺 |
TWI651991B (zh) * | 2018-03-02 | 2019-02-21 | 李俊豪 | 導電線路之製作方法 |
JP7075481B2 (ja) * | 2018-04-12 | 2022-05-25 | 株式会社Fuji | プリント基板形成方法、およびプリント基板形成装置 |
TWI667946B (zh) * | 2018-05-29 | 2019-08-01 | 夏爾光譜股份有限公司 | 軟式電路板基材及其製作方法 |
TWI705536B (zh) * | 2018-11-16 | 2020-09-21 | 欣興電子股份有限公司 | 載板結構及其製作方法 |
EP3709779A1 (en) * | 2019-03-12 | 2020-09-16 | AT & S Austria Technologie & Systemtechnik Aktiengesellschaft | Component carrier and method of manufacturing the same |
CA3136480A1 (en) | 2019-04-08 | 2020-10-15 | Nano-Dimension Technologies, Ltd. | Systems and methods for additive manufacturing of smt mounting sockets |
JP2021036554A (ja) * | 2019-08-30 | 2021-03-04 | イビデン株式会社 | プリント配線板の製造方法 |
DE102019132314B4 (de) * | 2019-11-28 | 2022-03-03 | Infineon Technologies Ag | Package mit Einkapselung unter Kompressionsbelastung |
CN112363640A (zh) * | 2020-11-12 | 2021-02-12 | 业成科技(成都)有限公司 | 触控感测模组与形成其之方法 |
US20240121888A1 (en) * | 2021-01-18 | 2024-04-11 | Vayyar Imaging Ltd. | Systems and methods for improving high frequency transmission in printed circuit boards |
WO2022246708A1 (zh) * | 2021-05-26 | 2022-12-01 | 深南电路股份有限公司 | 一种线路板制备方法以及线路板 |
Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0084480A2 (fr) * | 1982-01-18 | 1983-07-27 | Commissariat à l'Energie Atomique | Piéce d'extrémité d'assemblage combustible de réacteurs nucléaires dans laquelle les parois latérales sont élastiques |
US5055321A (en) * | 1988-04-28 | 1991-10-08 | Ibiden Co., Ltd. | Adhesive for electroless plating, printed circuit boards and method of producing the same |
JPH06120139A (ja) * | 1992-10-05 | 1994-04-28 | Ricoh Co Ltd | 半導体材料製造装置 |
KR950034727A (ko) * | 1994-05-16 | 1995-12-28 | 가나이 쯔또무 | 전자부품, 전자부품조립체 및 전자부품유닛 |
JPH09321432A (ja) * | 1996-05-28 | 1997-12-12 | Matsushita Electric Works Ltd | 多層プリント配線板の製造方法 |
Family Cites Families (83)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
CH504830A (de) | 1966-06-28 | 1971-03-15 | Photocircuits Corp | Verfahren zur Herstellung einer gedruckten Schaltungsplatte aus Isoliermaterial |
JPS5123266B2 (US07415761-20080826-C00001.png) * | 1972-04-21 | 1976-07-15 | ||
US4211603A (en) * | 1978-05-01 | 1980-07-08 | Tektronix, Inc. | Multilayer circuit board construction and method |
JPS5746679A (en) | 1980-09-01 | 1982-03-17 | Toshiba Corp | Power converter |
JPS58129684A (ja) * | 1982-01-29 | 1983-08-02 | Toshiba Corp | パタ−ン認識装置 |
JPS6199596A (ja) | 1984-10-22 | 1986-05-17 | Hitachi Ltd | 基板の穴あけ方法 |
JPS61207584A (ja) * | 1985-03-11 | 1986-09-13 | Sumitomo Electric Ind Ltd | 回路基板の製造方法 |
JPS6273937A (ja) * | 1985-09-26 | 1987-04-04 | 富士通株式会社 | 多層プリント板 |
JPS62237792A (ja) * | 1986-04-09 | 1987-10-17 | 株式会社日立製作所 | プリント基板のエツチング装置 |
JPS62239591A (ja) | 1986-04-11 | 1987-10-20 | キヤノン株式会社 | プリント配線板の製造方法 |
JPS62272546A (ja) * | 1986-05-20 | 1987-11-26 | Hitachi Cable Ltd | 半導体装置用フイルムキヤリア |
JPS63283098A (ja) | 1987-05-14 | 1988-11-18 | Hitachi Plant Eng & Constr Co Ltd | パタ−ン形成法 |
DE68923904T2 (de) * | 1988-05-20 | 1996-03-14 | Mitsubishi Gas Chemical Co | Verfahren zur Herstellung eines mit einer dünnen Kupferfolie kaschierten Substrats für Schaltungsplatten. |
US4978639A (en) * | 1989-01-10 | 1990-12-18 | Avantek, Inc. | Method for the simultaneous formation of via-holes and wraparound plating on semiconductor chips |
JPH0734505B2 (ja) * | 1989-01-18 | 1995-04-12 | イビデン株式会社 | 多層プリント配線板およびその製造方法 |
US5108553A (en) * | 1989-04-04 | 1992-04-28 | Olin Corporation | G-tab manufacturing process and the product produced thereby |
JPH0332100A (ja) * | 1989-06-29 | 1991-02-12 | Yokohama Rubber Co Ltd:The | 多層プリント配線板 |
US5063280A (en) * | 1989-07-24 | 1991-11-05 | Canon Kabushiki Kaisha | Method and apparatus for forming holes into printed circuit board |
US5412285A (en) * | 1990-12-06 | 1995-05-02 | Seiko Epson Corporation | Linear amplifier incorporating a field emission device having specific gap distances between gate and cathode |
JP3026580B2 (ja) | 1990-04-20 | 2000-03-27 | 旭光学工業株式会社 | データ信号復調装置 |
JPH045844A (ja) * | 1990-04-23 | 1992-01-09 | Nippon Mektron Ltd | Ic搭載用多層回路基板及びその製造法 |
US5227588A (en) * | 1991-03-25 | 1993-07-13 | Hughes Aircraft Company | Interconnection of opposite sides of a circuit board |
JPH05283866A (ja) * | 1992-04-03 | 1993-10-29 | Hitachi Ltd | ポリマ−印刷抵抗内蔵多層配線板 |
JPH06112649A (ja) | 1992-09-24 | 1994-04-22 | Mitsubishi Gas Chem Co Inc | 多層プリント板の層間接続の製造方法 |
JPH06216488A (ja) | 1993-01-19 | 1994-08-05 | Canon Inc | プリント配線板及びその加工方法 |
JPH06314869A (ja) * | 1993-04-30 | 1994-11-08 | Eastern:Kk | プリント配線板のスルーホール形成方法 |
JPH0828581B2 (ja) * | 1993-05-31 | 1996-03-21 | 日本電気株式会社 | 多層印刷配線板およびその製造方法 |
US5446247A (en) * | 1993-11-19 | 1995-08-29 | Motorola, Inc. | Electrical contact and method for making an electrical contact |
JP2781954B2 (ja) * | 1994-03-04 | 1998-07-30 | メック株式会社 | 銅および銅合金の表面処理剤 |
JPH07283538A (ja) | 1994-04-14 | 1995-10-27 | Ibiden Co Ltd | 多層プリント配線板の製造方法 |
JPH07288386A (ja) | 1994-04-19 | 1995-10-31 | Hitachi Chem Co Ltd | 多層配線板 |
US5536579A (en) | 1994-06-02 | 1996-07-16 | International Business Machines Corporation | Design of high density structures with laser etch stop |
JPH08116174A (ja) | 1994-08-25 | 1996-05-07 | Matsushita Electric Ind Co Ltd | 回路形成基板およびその製造方法 |
JPH08186376A (ja) * | 1994-12-28 | 1996-07-16 | Hitachi Ltd | 高密度薄膜多層配線基板並びにその実装構造体及びその製造方法 |
JPH08242064A (ja) * | 1995-03-01 | 1996-09-17 | Ibiden Co Ltd | プリント配線板 |
JPH0936551A (ja) | 1995-05-15 | 1997-02-07 | Ibiden Co Ltd | 多層プリント配線板用片面回路基板、および多層プリント配線板とその製造方法 |
JPH08316642A (ja) * | 1995-05-19 | 1996-11-29 | Toagosei Co Ltd | インタースティシャルバイアホールを有する多層プリント配線板およびその製造方法 |
JP3458023B2 (ja) * | 1995-08-01 | 2003-10-20 | メック株式会社 | 銅および銅合金のマイクロエッチング剤 |
JP3115987B2 (ja) * | 1995-09-14 | 2000-12-11 | 松下電工株式会社 | 多層配線板の製造方法 |
JP3172456B2 (ja) | 1995-10-23 | 2001-06-04 | イビデン株式会社 | プリント配線板 |
DE69637655D1 (de) | 1995-10-23 | 2008-10-02 | Ibiden Co Ltd | Aufgebaute mehrschichtige Leiterplatte |
JP3242009B2 (ja) | 1995-10-23 | 2001-12-25 | イビデン株式会社 | 樹脂充填剤 |
JP2773715B2 (ja) | 1995-10-31 | 1998-07-09 | 日立エーアイシー株式会社 | 多層プリント配線板の製造方法 |
US6010768A (en) * | 1995-11-10 | 2000-01-04 | Ibiden Co., Ltd. | Multilayer printed circuit board, method of producing multilayer printed circuit board and resin filler |
GB2307351A (en) * | 1995-11-16 | 1997-05-21 | Marconi Gec Ltd | Printed circuit boards and their manufacture |
WO1997024229A1 (fr) * | 1995-12-26 | 1997-07-10 | Ibiden Co., Ltd. | Corps sur lequel est lie un film metallique, couche d'agent de liaison et agent de liaison |
JPH09186460A (ja) * | 1995-12-28 | 1997-07-15 | C A D Prod:Kk | 多層プリント基板の製造方法 |
JP2773722B2 (ja) * | 1995-12-28 | 1998-07-09 | 日立エーアイシー株式会社 | 多層印刷配線板およびその製造方法 |
US5826330A (en) * | 1995-12-28 | 1998-10-27 | Hitachi Aic Inc. | Method of manufacturing multilayer printed wiring board |
JP3229923B2 (ja) * | 1996-03-01 | 2001-11-19 | イビデン株式会社 | 多層プリント配線板およびその製造方法 |
AU2993997A (en) * | 1996-05-01 | 1997-11-19 | Allied-Signal Inc. | New method of forming fine circuit lines |
TW331698B (en) * | 1996-06-18 | 1998-05-11 | Hitachi Chemical Co Ltd | Multi-layered printed circuit board |
JP3865083B2 (ja) * | 1996-06-18 | 2007-01-10 | 日立化成工業株式会社 | 多層プリント配線板の製造方法 |
JPH1027960A (ja) * | 1996-07-09 | 1998-01-27 | Mitsui Mining & Smelting Co Ltd | 多層プリント配線板の製造方法 |
US5733468A (en) * | 1996-08-27 | 1998-03-31 | Conway, Jr.; John W. | Pattern plating method for fabricating printed circuit boards |
JP3296992B2 (ja) | 1996-09-27 | 2002-07-02 | イビデン株式会社 | 多層プリント配線板の製造方法 |
SG72752A1 (en) * | 1996-10-31 | 2000-05-23 | Hitachi Chemical Co Ltd | Heat resistant resin composition and adhesive sheet using the same |
WO1998020533A2 (en) * | 1996-11-08 | 1998-05-14 | W.L. Gore & Associates, Inc. | Method for using photoabsorptive coatings to enhance both blind and through micro-via entrance quality |
US5910255A (en) * | 1996-11-08 | 1999-06-08 | W. L. Gore & Associates, Inc. | Method of sequential laser processing to efficiently manufacture modules requiring large volumetric density material removal for micro-via formation |
EP0841840A1 (en) * | 1996-11-12 | 1998-05-13 | Hewlett-Packard Company | Method for the manufacture of micro solder bumps on copper pads |
EP1802186B1 (en) * | 1996-11-20 | 2011-05-11 | Ibiden Co., Ltd. | Printed circuit board |
JP3853142B2 (ja) | 1996-11-20 | 2006-12-06 | イビデン株式会社 | ソルダーレジスト組成物およびプリント配線板の製造方法 |
JP3633252B2 (ja) * | 1997-01-10 | 2005-03-30 | イビデン株式会社 | プリント配線板及びその製造方法 |
KR100691297B1 (ko) * | 1997-02-28 | 2007-03-12 | 이비덴 가부시키가이샤 | 프린트배선판및 그 제조방법 |
JPH10242654A (ja) | 1997-03-03 | 1998-09-11 | Hitachi Chem Co Ltd | 多層プリント配線板およびその製造法 |
JPH10247784A (ja) | 1997-03-04 | 1998-09-14 | Ibiden Co Ltd | 多層プリント配線板およびその製造方法 |
JPH10323777A (ja) | 1997-05-26 | 1998-12-08 | Sumitomo Heavy Ind Ltd | レーザによるプリント配線基板用穴あけ加工装置 |
KR100361565B1 (ko) * | 1997-07-08 | 2002-11-22 | 이비덴 가부시키가이샤 | 인쇄 배선판 및 이의 제조방법 |
JPH1168291A (ja) | 1997-08-12 | 1999-03-09 | Nippon Carbide Ind Co Inc | プリント配線板及びその製造方法 |
US6376049B1 (en) * | 1997-10-14 | 2002-04-23 | Ibiden Co., Ltd. | Multilayer printed wiring board and its manufacturing method, and resin composition for filling through-hole |
TW469228B (en) * | 1998-01-14 | 2001-12-21 | Mitsui Mining & Smelting Co | Method for producing multi-layer printed wiring boards having blind vias |
US6261941B1 (en) * | 1998-02-12 | 2001-07-17 | Georgia Tech Research Corp. | Method for manufacturing a multilayer wiring substrate |
SG111958A1 (en) * | 1998-03-18 | 2005-06-29 | Hitachi Cable | Semiconductor device |
US6286207B1 (en) * | 1998-05-08 | 2001-09-11 | Nec Corporation | Resin structure in which manufacturing cost is cheap and sufficient adhesive strength can be obtained and method of manufacturing it |
JP2000022337A (ja) * | 1998-06-30 | 2000-01-21 | Matsushita Electric Works Ltd | 多層配線板及びその製造方法 |
KR20010088796A (ko) * | 1998-09-03 | 2001-09-28 | 엔도 마사루 | 다층프린트배선판 및 그 제조방법 |
DE60023202T2 (de) * | 1999-02-15 | 2006-07-20 | Mitsubishi Gas Chemical Co., Inc. | Leiterplatte für Plastikhalbleitergehäuse |
TW411737B (en) * | 1999-03-09 | 2000-11-11 | Unimicron Technology Corp | A 2-stage process to form micro via |
JP3635219B2 (ja) * | 1999-03-11 | 2005-04-06 | 新光電気工業株式会社 | 半導体装置用多層基板及びその製造方法 |
JP3585796B2 (ja) * | 1999-12-17 | 2004-11-04 | 新光電気工業株式会社 | 多層配線基板の製造方法、及び半導体装置 |
JP3760101B2 (ja) * | 2001-02-13 | 2006-03-29 | 富士通株式会社 | 多層プリント配線板およびその製造方法 |
US6986454B2 (en) * | 2003-07-10 | 2006-01-17 | Delphi Technologies, Inc. | Electronic package having controlled height stand-off solder joint |
JP2006100489A (ja) * | 2004-09-29 | 2006-04-13 | Ricoh Co Ltd | プリント基板及びそのプリント基板を用いた電子ユニット並びに樹脂流出防止用ダムの形成方法 |
-
1999
- 1999-07-30 KR KR1020017002801A patent/KR20010088796A/ko not_active Application Discontinuation
- 1999-07-30 KR KR1020077015085A patent/KR20070086863A/ko not_active Application Discontinuation
- 1999-07-30 KR KR1020077015087A patent/KR20070086864A/ko not_active Application Discontinuation
- 1999-07-30 KR KR1020077015083A patent/KR20070086862A/ko not_active Application Discontinuation
- 1999-07-30 EP EP07013523A patent/EP1843649A3/en not_active Withdrawn
- 1999-07-30 EP EP07013524A patent/EP1843650B1/en not_active Expired - Lifetime
- 1999-07-30 EP EP99933214A patent/EP1121008B1/en not_active Expired - Lifetime
- 1999-07-30 KR KR1020077015080A patent/KR100855529B1/ko not_active IP Right Cessation
- 1999-07-30 KR KR1020077015081A patent/KR20070086860A/ko not_active Application Discontinuation
- 1999-07-30 KR KR1020077015082A patent/KR100855530B1/ko not_active IP Right Cessation
- 1999-07-30 WO PCT/JP1999/004142 patent/WO2000015015A1/ja active IP Right Grant
- 1999-07-30 DE DE69939221T patent/DE69939221D1/de not_active Expired - Lifetime
- 1999-07-30 KR KR1020077015079A patent/KR100855528B1/ko not_active IP Right Cessation
- 1999-09-02 MY MYPI20044181A patent/MY139553A/en unknown
- 1999-09-02 MY MYPI99003796A patent/MY123228A/en unknown
-
2001
- 2001-03-05 US US09/797,916 patent/US6591495B2/en not_active Expired - Lifetime
-
2003
- 2003-02-03 US US10/356,464 patent/US7415761B2/en not_active Expired - Lifetime
-
2007
- 2007-10-19 US US11/875,486 patent/US8148643B2/en not_active Expired - Fee Related
-
2008
- 2008-04-07 US US12/098,582 patent/US7832098B2/en not_active Expired - Fee Related
-
2012
- 2012-01-25 US US13/357,663 patent/US20120125680A1/en not_active Abandoned
Patent Citations (5)
Publication number | Priority date | Publication date | Assignee | Title |
---|---|---|---|---|
EP0084480A2 (fr) * | 1982-01-18 | 1983-07-27 | Commissariat à l'Energie Atomique | Piéce d'extrémité d'assemblage combustible de réacteurs nucléaires dans laquelle les parois latérales sont élastiques |
US5055321A (en) * | 1988-04-28 | 1991-10-08 | Ibiden Co., Ltd. | Adhesive for electroless plating, printed circuit boards and method of producing the same |
JPH06120139A (ja) * | 1992-10-05 | 1994-04-28 | Ricoh Co Ltd | 半導体材料製造装置 |
KR950034727A (ko) * | 1994-05-16 | 1995-12-28 | 가나이 쯔또무 | 전자부품, 전자부품조립체 및 전자부품유닛 |
JPH09321432A (ja) * | 1996-05-28 | 1997-12-12 | Matsushita Electric Works Ltd | 多層プリント配線板の製造方法 |
Also Published As
Publication number | Publication date |
---|---|
KR20070086858A (ko) | 2007-08-27 |
US20040025333A1 (en) | 2004-02-12 |
EP1843649A3 (en) | 2007-10-31 |
WO2000015015A1 (fr) | 2000-03-16 |
US20080189943A1 (en) | 2008-08-14 |
DE69939221D1 (de) | 2008-09-11 |
US20120125680A1 (en) | 2012-05-24 |
KR20070086864A (ko) | 2007-08-27 |
EP1843650A3 (en) | 2007-11-07 |
KR20010088796A (ko) | 2001-09-28 |
KR20070086859A (ko) | 2007-08-27 |
KR20070086860A (ko) | 2007-08-27 |
US20080173473A1 (en) | 2008-07-24 |
EP1121008A4 (en) | 2005-02-02 |
US20010042637A1 (en) | 2001-11-22 |
KR20070086862A (ko) | 2007-08-27 |
KR20070086863A (ko) | 2007-08-27 |
KR100855528B1 (ko) | 2008-09-01 |
EP1121008B1 (en) | 2008-07-30 |
EP1121008A1 (en) | 2001-08-01 |
US6591495B2 (en) | 2003-07-15 |
KR20070086861A (ko) | 2007-08-27 |
MY123228A (en) | 2006-05-31 |
MY139553A (en) | 2009-10-30 |
EP1843650B1 (en) | 2012-03-07 |
US7415761B2 (en) | 2008-08-26 |
EP1843650A2 (en) | 2007-10-10 |
EP1843649A2 (en) | 2007-10-10 |
US7832098B2 (en) | 2010-11-16 |
US8148643B2 (en) | 2012-04-03 |
KR100855529B1 (ko) | 2008-09-01 |
Similar Documents
Publication | Publication Date | Title |
---|---|---|
KR100855530B1 (ko) | 다층프린트배선판 및 그 제조방법 | |
KR100675615B1 (ko) | 프린트 배선기판 및 그 제조방법 | |
US8420300B2 (en) | Method of producing multilayer printed wiring board and photosensitive dry film used therefor | |
WO2000076281A1 (fr) | Carte a circuit imprime multicouche et procede de fabrication d'une telle carte | |
EA003263B1 (ru) | Способ изготовления многослойной печатной платы и предназначенная для этого композиционная фольга | |
US6527963B1 (en) | Method of manufacturing multilayer wiring boards | |
TW407453B (en) | Multiple layer printed circuit board and method for manufacturing the same | |
JP4180192B2 (ja) | 多層プリント配線基板の製造方法 | |
JP2000151118A (ja) | 多層プリント配線板の製造方法 | |
JP2000138456A (ja) | 多層プリント配線板およびその製造方法 | |
JP3995794B2 (ja) | 無電解めっき用接着剤およびプリント配線板 | |
JP2008252146A (ja) | 多層プリント配線板およびその製造方法 | |
JP2008306201A (ja) | 多層プリント配線板およびその製造方法 | |
JP2002076611A (ja) | 多層プリント配線板の製造方法 | |
JP2001094262A (ja) | プリント配線板、ポリオレフィン系樹脂組成物およびプリント配線板の製造方法 | |
JP2009302588A (ja) | 多層プリント配線板およびその製造方法 | |
JP2008283214A (ja) | 多層プリント配線板およびその製造方法 |
Legal Events
Date | Code | Title | Description |
---|---|---|---|
A107 | Divisional application of patent | ||
A201 | Request for examination | ||
E902 | Notification of reason for refusal | ||
E701 | Decision to grant or registration of patent right | ||
GRNT | Written decision to grant | ||
FPAY | Annual fee payment |
Payment date: 20120802 Year of fee payment: 5 |
|
FPAY | Annual fee payment |
Payment date: 20130801 Year of fee payment: 6 |
|
FPAY | Annual fee payment |
Payment date: 20150730 Year of fee payment: 8 |
|
FPAY | Annual fee payment |
Payment date: 20160727 Year of fee payment: 9 |
|
FPAY | Annual fee payment |
Payment date: 20170804 Year of fee payment: 10 |
|
FPAY | Annual fee payment |
Payment date: 20180730 Year of fee payment: 11 |
|
EXPY | Expiration of term |