KR100683263B1 - 리소그래피 장치 및 디바이스 제조방법 - Google Patents

리소그래피 장치 및 디바이스 제조방법 Download PDF

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Publication number
KR100683263B1
KR100683263B1 KR1020040041848A KR20040041848A KR100683263B1 KR 100683263 B1 KR100683263 B1 KR 100683263B1 KR 1020040041848 A KR1020040041848 A KR 1020040041848A KR 20040041848 A KR20040041848 A KR 20040041848A KR 100683263 B1 KR100683263 B1 KR 100683263B1
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KR
South Korea
Prior art keywords
sensor
substrate
radiation
seal member
projection
Prior art date
Legal status (The legal status is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the status listed.)
Expired - Fee Related
Application number
KR1020040041848A
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English (en)
Korean (ko)
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KR20040105621A (ko
Inventor
로프요에리
버틀러한스
돈더스소예르트니콜라스람베르투스
콜레스니첸코알렉세이
루프스트라에릭로엘로프
마이예르헨드리쿠스요한네스마리아
물켄스요한네스카타리누스후베르투스
리트세마로엘로프아에일코지에브란트
판샤이크프랑크
센게르스티모세우스프란시스쿠스
지몬클라우스
데슈미트요아네스데오도르
스타이예르알렉산더
스트리프케르크밥
비요라트에릭데오도루스마리아
후겐담크리스티안알렉산더
판산텐헬마르
판데케르크호프마르쿠스아드리아누스
크룬마르크
예프레이 덴보에프아리에
오텐스요스트예뢴
메르텐스예뢴요한네스소피아마리아
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에이에스엠엘 네델란즈 비.브이.
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
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Publication date
Priority claimed from EP03257068.1A external-priority patent/EP1429188B1/en
Application filed by 에이에스엠엘 네델란즈 비.브이. filed Critical 에이에스엠엘 네델란즈 비.브이.
Publication of KR20040105621A publication Critical patent/KR20040105621A/ko
Application granted granted Critical
Publication of KR100683263B1 publication Critical patent/KR100683263B1/ko
Anticipated expiration legal-status Critical
Expired - Fee Related legal-status Critical Current

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    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
KR1020040041848A 2003-06-09 2004-06-08 리소그래피 장치 및 디바이스 제조방법 Expired - Fee Related KR100683263B1 (ko)

Applications Claiming Priority (6)

Application Number Priority Date Filing Date Title
EP03253636.9 2003-06-09
EP03253636 2003-06-09
EP03255395.0 2003-08-29
EP03255395 2003-08-29
EP03257068.1 2003-11-10
EP03257068.1A EP1429188B1 (en) 2002-11-12 2003-11-10 Lithographic projection apparatus

Publications (2)

Publication Number Publication Date
KR20040105621A KR20040105621A (ko) 2004-12-16
KR100683263B1 true KR100683263B1 (ko) 2007-02-15

Family

ID=34108333

Family Applications (1)

Application Number Title Priority Date Filing Date
KR1020040041848A Expired - Fee Related KR100683263B1 (ko) 2003-06-09 2004-06-08 리소그래피 장치 및 디바이스 제조방법

Country Status (6)

Country Link
US (8) US7213963B2 (https=)
JP (7) JP4199699B2 (https=)
KR (1) KR100683263B1 (https=)
CN (2) CN1573564B (https=)
SG (2) SG152931A1 (https=)
TW (2) TWI424275B (https=)

Families Citing this family (141)

* Cited by examiner, † Cited by third party
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