CN101382738B
(zh)
|
2002-11-12 |
2011-01-12 |
Asml荷兰有限公司 |
光刻投射装置
|
US7110081B2
(en)
|
2002-11-12 |
2006-09-19 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US9482966B2
(en)
|
2002-11-12 |
2016-11-01 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US10503084B2
(en)
|
2002-11-12 |
2019-12-10 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
DE60335595D1
(de)
|
2002-11-12 |
2011-02-17 |
Asml Netherlands Bv |
Lithographischer Apparat mit Immersion und Verfahren zur Herstellung einer Vorrichtung
|
SG121822A1
(en)
|
2002-11-12 |
2006-05-26 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
JP3977324B2
(ja)
|
2002-11-12 |
2007-09-19 |
エーエスエムエル ネザーランズ ビー.ブイ. |
リソグラフィ装置
|
KR100588124B1
(ko)
|
2002-11-12 |
2006-06-09 |
에이에스엠엘 네델란즈 비.브이. |
리소그래피장치 및 디바이스제조방법
|
SG131766A1
(en)
|
2002-11-18 |
2007-05-28 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
SG121829A1
(en)
|
2002-11-29 |
2006-05-26 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
EP1571697A4
(de)
|
2002-12-10 |
2007-07-04 |
Nikon Corp |
Belichtungssystem und bauelementeherstellungsverfahren
|
US7948604B2
(en)
|
2002-12-10 |
2011-05-24 |
Nikon Corporation |
Exposure apparatus and method for producing device
|
AU2003289271A1
(en)
|
2002-12-10 |
2004-06-30 |
Nikon Corporation |
Exposure apparatus, exposure method and method for manufacturing device
|
KR101085372B1
(ko)
|
2002-12-10 |
2011-11-21 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
JP4352874B2
(ja)
|
2002-12-10 |
2009-10-28 |
株式会社ニコン |
露光装置及びデバイス製造方法
|
WO2004053953A1
(ja)
|
2002-12-10 |
2004-06-24 |
Nikon Corporation |
露光装置及びデバイス製造方法
|
US7242455B2
(en)
|
2002-12-10 |
2007-07-10 |
Nikon Corporation |
Exposure apparatus and method for producing device
|
DE10261775A1
(de)
|
2002-12-20 |
2004-07-01 |
Carl Zeiss Smt Ag |
Vorrichtung zur optischen Vermessung eines Abbildungssystems
|
TW200500813A
(en)
|
2003-02-26 |
2005-01-01 |
Nikon Corp |
Exposure apparatus and method, and method of producing device
|
KR101181688B1
(ko)
|
2003-03-25 |
2012-09-19 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
JP4902201B2
(ja)
|
2003-04-07 |
2012-03-21 |
株式会社ニコン |
露光装置、露光方法及びデバイス製造方法
|
KR101177331B1
(ko)
|
2003-04-09 |
2012-08-30 |
가부시키가이샤 니콘 |
액침 리소그래피 유체 제어 시스템
|
EP2921905B1
(de)
|
2003-04-10 |
2017-12-27 |
Nikon Corporation |
Ablaufweg zum sammeln von flüssigkeiten für eine immersionslithografievorrichtung
|
SG2012050829A
(en)
|
2003-04-10 |
2015-07-30 |
Nippon Kogaku Kk |
Environmental system including vacuum scavange for an immersion lithography apparatus
|
JP4650413B2
(ja)
|
2003-04-10 |
2011-03-16 |
株式会社ニコン |
液浸リソグフラフィ装置用の移送領域を含む環境システム
|
WO2004092830A2
(en)
|
2003-04-11 |
2004-10-28 |
Nikon Corporation |
Liquid jet and recovery system for immersion lithography
|
KR101225884B1
(ko)
|
2003-04-11 |
2013-01-28 |
가부시키가이샤 니콘 |
액침 리소그래피 머신에서 웨이퍼 교환동안 투영 렌즈 아래의 갭에서 액침 액체를 유지하는 장치 및 방법
|
SG185136A1
(en)
|
2003-04-11 |
2012-11-29 |
Nikon Corp |
Cleanup method for optics in immersion lithography
|
WO2004095135A2
(en)
|
2003-04-17 |
2004-11-04 |
Nikon Corporation |
Optical arrangement of autofocus elements for use with immersion lithography
|
TWI295414B
(en)
|
2003-05-13 |
2008-04-01 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
TW200509205A
(en)
|
2003-05-23 |
2005-03-01 |
Nippon Kogaku Kk |
Exposure method and device-manufacturing method
|
TWI470671B
(zh)
|
2003-05-23 |
2015-01-21 |
尼康股份有限公司 |
Exposure method and exposure apparatus, and device manufacturing method
|
KR101728664B1
(ko)
|
2003-05-28 |
2017-05-02 |
가부시키가이샤 니콘 |
노광 방법, 노광 장치, 및 디바이스 제조 방법
|
TWI347741B
(en)
|
2003-05-30 |
2011-08-21 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
US7213963B2
(en)
|
2003-06-09 |
2007-05-08 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
EP2261741A3
(de)
|
2003-06-11 |
2011-05-25 |
ASML Netherlands B.V. |
Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
|
KR101940892B1
(ko)
|
2003-06-13 |
2019-01-21 |
가부시키가이샤 니콘 |
노광 방법, 기판 스테이지, 노광 장치, 및 디바이스 제조 방법
|
US6867844B2
(en)
|
2003-06-19 |
2005-03-15 |
Asml Holding N.V. |
Immersion photolithography system and method using microchannel nozzles
|
KR101289979B1
(ko)
|
2003-06-19 |
2013-07-26 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조방법
|
US6809794B1
(en)
|
2003-06-27 |
2004-10-26 |
Asml Holding N.V. |
Immersion photolithography system and method using inverted wafer-projection optics interface
|
EP1498778A1
(de)
|
2003-06-27 |
2005-01-19 |
ASML Netherlands B.V. |
Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
|
EP1491956B1
(de)
|
2003-06-27 |
2006-09-06 |
ASML Netherlands B.V. |
Lithographischer Apparat und Verfahren zur Herstellung eines Artikels
|
EP1975721A1
(de)
|
2003-06-30 |
2008-10-01 |
ASML Netherlands B.V. |
Lithographischer Apparat und Verfahren zur Herstellung eines Artikels
|
EP1494074A1
(de)
|
2003-06-30 |
2005-01-05 |
ASML Netherlands B.V. |
Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
|
EP2853943B1
(de)
|
2003-07-08 |
2016-11-16 |
Nikon Corporation |
Waferplatte für die Immersionslithografie
|
CN102944981A
(zh)
|
2003-07-09 |
2013-02-27 |
株式会社尼康 |
曝光装置、器件制造方法
|
WO2005006418A1
(ja)
|
2003-07-09 |
2005-01-20 |
Nikon Corporation |
露光装置及びデバイス製造方法
|
EP2264532B1
(de)
|
2003-07-09 |
2012-10-31 |
Nikon Corporation |
Belichtungsapparat und Verfahren zur Herstellung einer Vorrichtung
|
SG109000A1
(en)
|
2003-07-16 |
2005-02-28 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
EP1500982A1
(de)
|
2003-07-24 |
2005-01-26 |
ASML Netherlands B.V. |
Lithographischer Apparat und Verfahren zur Herstellung eines Artikels
|
EP1650787A4
(de)
|
2003-07-25 |
2007-09-19 |
Nikon Corp |
Untersuchungsverfahren und untersuchungseinrichtung für ein optisches projektionssystem und herstellungsverfahren für ein optisches projektionssystem
|
US7175968B2
(en)
|
2003-07-28 |
2007-02-13 |
Asml Netherlands B.V. |
Lithographic apparatus, device manufacturing method and a substrate
|
EP1503244A1
(de)
|
2003-07-28 |
2005-02-02 |
ASML Netherlands B.V. |
Lithographischer Projektionsapparat und Verfahren zur Herstellung einer Vorrichtung
|
EP2264534B1
(de)
|
2003-07-28 |
2013-07-17 |
Nikon Corporation |
Belichtungsapparat, Verfahren zur Herstellung einer Vorrichtung, und Verfahren zur Steuerung des Apparats
|
US7779781B2
(en)
|
2003-07-31 |
2010-08-24 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US8149381B2
(en)
|
2003-08-26 |
2012-04-03 |
Nikon Corporation |
Optical element and exposure apparatus
|
TW200513805A
(en)
|
2003-08-26 |
2005-04-16 |
Nippon Kogaku Kk |
Optical device and exposure apparatus
|
TWI263859B
(en)
|
2003-08-29 |
2006-10-11 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
SG145780A1
(en)
|
2003-08-29 |
2008-09-29 |
Nikon Corp |
Exposure apparatus and device fabricating method
|
US6954256B2
(en)
|
2003-08-29 |
2005-10-11 |
Asml Netherlands B.V. |
Gradient immersion lithography
|
TWI245163B
(en)
|
2003-08-29 |
2005-12-11 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
EP2261740B1
(de)
|
2003-08-29 |
2014-07-09 |
ASML Netherlands BV |
Lithographischer Apparat
|
KR20170070264A
(ko)
|
2003-09-03 |
2017-06-21 |
가부시키가이샤 니콘 |
액침 리소그래피용 유체를 제공하기 위한 장치 및 방법
|
WO2005029559A1
(ja)
|
2003-09-19 |
2005-03-31 |
Nikon Corporation |
露光装置及びデバイス製造方法
|
TW201809911A
(zh)
|
2003-09-29 |
2018-03-16 |
尼康股份有限公司 |
曝光裝置及曝光方法、以及元件製造方法
|
EP1519231B1
(de)
|
2003-09-29 |
2005-12-21 |
ASML Netherlands B.V. |
Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
|
EP1519230A1
(de)
|
2003-09-29 |
2005-03-30 |
ASML Netherlands B.V. |
Lithographischer Apparat und Methode zur Herstellung einer Vorrichtung
|
US7158211B2
(en)
|
2003-09-29 |
2007-01-02 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
KR101319109B1
(ko)
|
2003-10-08 |
2013-10-17 |
가부시키가이샤 자오 니콘 |
기판 반송 장치 및 기판 반송 방법, 노광 장치 및 노광 방법, 디바이스 제조 방법
|
WO2005036623A1
(ja)
|
2003-10-08 |
2005-04-21 |
Zao Nikon Co., Ltd. |
基板搬送装置及び基板搬送方法、露光装置及び露光方法、デバイス製造方法
|
TWI598934B
(zh)
|
2003-10-09 |
2017-09-11 |
Nippon Kogaku Kk |
Exposure apparatus, exposure method, and device manufacturing method
|
EP1524557A1
(de)
|
2003-10-15 |
2005-04-20 |
ASML Netherlands B.V. |
Lithographischer Apparat und Methode zur Herstellung einer Vorrichtung
|
EP1524558A1
(de)
|
2003-10-15 |
2005-04-20 |
ASML Netherlands B.V. |
Lithographischer Apparat und Verfahren zur Herstellung einer Vorrichtung
|
US7411653B2
(en)
|
2003-10-28 |
2008-08-12 |
Asml Netherlands B.V. |
Lithographic apparatus
|
US7352433B2
(en)
|
2003-10-28 |
2008-04-01 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
WO2005041276A1
(ja)
|
2003-10-28 |
2005-05-06 |
Nikon Corporation |
露光装置、露光方法、デバイスの製造方法
|
JP4295712B2
(ja)
|
2003-11-14 |
2009-07-15 |
エーエスエムエル ネザーランズ ビー.ブイ. |
リソグラフィ装置及び装置製造方法
|
US7545481B2
(en)
|
2003-11-24 |
2009-06-09 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
TWI440981B
(zh)
|
2003-12-03 |
2014-06-11 |
尼康股份有限公司 |
Exposure apparatus, exposure method, and device manufacturing method
|
KR101941351B1
(ko)
|
2003-12-15 |
2019-01-22 |
가부시키가이샤 니콘 |
스테이지 장치, 노광 장치, 및 노광 방법
|
WO2005059654A1
(en)
|
2003-12-15 |
2005-06-30 |
Carl Zeiss Smt Ag |
Objective as a microlithography projection objective with at least one liquid lens
|
US7589818B2
(en)
|
2003-12-23 |
2009-09-15 |
Asml Netherlands B.V. |
Lithographic apparatus, alignment apparatus, device manufacturing method, and a method of converting an apparatus
|
US7394521B2
(en)
|
2003-12-23 |
2008-07-01 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
JP4843503B2
(ja)
*
|
2004-01-20 |
2011-12-21 |
カール・ツァイス・エスエムティー・ゲーエムベーハー |
マイクロリソグラフィ投影露光装置および投影レンズのための測定装置
|
US7589822B2
(en)
|
2004-02-02 |
2009-09-15 |
Nikon Corporation |
Stage drive method and stage unit, exposure apparatus, and device manufacturing method
|
EP1713114B1
(de)
|
2004-02-03 |
2018-09-19 |
Nikon Corporation |
Belichtungsvorrichtung und verfahren zur herstellung einer vorrichtung
|
US7050146B2
(en)
|
2004-02-09 |
2006-05-23 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
CN100592210C
(zh)
|
2004-02-13 |
2010-02-24 |
卡尔蔡司Smt股份公司 |
微平版印刷投影曝光装置的投影物镜
|
US20070165198A1
(en)
*
|
2004-02-13 |
2007-07-19 |
Carl Zeiss Smt Ag |
Projection objective for a microlithographic projection exposure apparatus
|
KR101851511B1
(ko)
|
2004-03-25 |
2018-04-23 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
US7227619B2
(en)
|
2004-04-01 |
2007-06-05 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7034917B2
(en)
|
2004-04-01 |
2006-04-25 |
Asml Netherlands B.V. |
Lithographic apparatus, device manufacturing method and device manufactured thereby
|
US7295283B2
(en)
|
2004-04-02 |
2007-11-13 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7898642B2
(en)
|
2004-04-14 |
2011-03-01 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
JP4677986B2
(ja)
|
2004-04-19 |
2011-04-27 |
株式会社ニコン |
ノズル部材、露光方法、露光装置及びデバイス製造方法
|
US7379159B2
(en)
|
2004-05-03 |
2008-05-27 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US20060244938A1
(en)
*
|
2004-05-04 |
2006-11-02 |
Karl-Heinz Schuster |
Microlitographic projection exposure apparatus and immersion liquid therefore
|
WO2005111722A2
(en)
|
2004-05-04 |
2005-11-24 |
Nikon Corporation |
Apparatus and method for providing fluid for immersion lithography
|
US7616383B2
(en)
|
2004-05-18 |
2009-11-10 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7486381B2
(en)
|
2004-05-21 |
2009-02-03 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
WO2005119368A2
(en)
|
2004-06-04 |
2005-12-15 |
Carl Zeiss Smt Ag |
System for measuring the image quality of an optical imaging system
|
CN103605262B
(zh)
|
2004-06-09 |
2016-06-29 |
株式会社尼康 |
曝光装置及其维护方法、以及元件制造方法
|
WO2005122220A1
(ja)
|
2004-06-10 |
2005-12-22 |
Nikon Corporation |
露光装置及び露光方法、並びにデバイス製造方法
|
US8717533B2
(en)
|
2004-06-10 |
2014-05-06 |
Nikon Corporation |
Exposure apparatus, exposure method, and method for producing device
|
US8508713B2
(en)
|
2004-06-10 |
2013-08-13 |
Nikon Corporation |
Exposure apparatus, exposure method, and method for producing device
|
WO2005122221A1
(ja)
|
2004-06-10 |
2005-12-22 |
Nikon Corporation |
露光装置、露光方法及びデバイス製造方法
|
US8373843B2
(en)
|
2004-06-10 |
2013-02-12 |
Nikon Corporation |
Exposure apparatus, exposure method, and method for producing device
|
US7481867B2
(en)
|
2004-06-16 |
2009-01-27 |
Edwards Limited |
Vacuum system for immersion photolithography
|
US7463330B2
(en)
|
2004-07-07 |
2008-12-09 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
JP4894515B2
(ja)
|
2004-07-12 |
2012-03-14 |
株式会社ニコン |
露光装置、デバイス製造方法、及び液体検出方法
|
US7161663B2
(en)
|
2004-07-22 |
2007-01-09 |
Asml Netherlands B.V. |
Lithographic apparatus
|
US7304715B2
(en)
|
2004-08-13 |
2007-12-04 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
JP4983257B2
(ja)
|
2004-08-18 |
2012-07-25 |
株式会社ニコン |
露光装置、デバイス製造方法、計測部材、及び計測方法
|
US7701550B2
(en)
|
2004-08-19 |
2010-04-20 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
TWI417940B
(zh)
|
2004-09-17 |
2013-12-01 |
尼康股份有限公司 |
Exposure apparatus, exposure method, and device manufacturing method
|
US7133114B2
(en)
|
2004-09-20 |
2006-11-07 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7522261B2
(en)
|
2004-09-24 |
2009-04-21 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7355674B2
(en)
|
2004-09-28 |
2008-04-08 |
Asml Netherlands B.V. |
Lithographic apparatus, device manufacturing method and computer program product
|
US7894040B2
(en)
|
2004-10-05 |
2011-02-22 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7209213B2
(en)
|
2004-10-07 |
2007-04-24 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7379155B2
(en)
|
2004-10-18 |
2008-05-27 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7119876B2
(en)
|
2004-10-18 |
2006-10-10 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
JP4665712B2
(ja)
|
2004-10-26 |
2011-04-06 |
株式会社ニコン |
基板処理方法、露光装置及びデバイス製造方法
|
US7423720B2
(en)
*
|
2004-11-12 |
2008-09-09 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7251013B2
(en)
|
2004-11-12 |
2007-07-31 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7414699B2
(en)
|
2004-11-12 |
2008-08-19 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7583357B2
(en)
|
2004-11-12 |
2009-09-01 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7411657B2
(en)
|
2004-11-17 |
2008-08-12 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7145630B2
(en)
|
2004-11-23 |
2006-12-05 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7161654B2
(en)
|
2004-12-02 |
2007-01-09 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7446850B2
(en)
|
2004-12-03 |
2008-11-04 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7248334B2
(en)
|
2004-12-07 |
2007-07-24 |
Asml Netherlands B.V. |
Sensor shield
|
US7196770B2
(en)
|
2004-12-07 |
2007-03-27 |
Asml Netherlands B.V. |
Prewetting of substrate before immersion exposure
|
US7397533B2
(en)
|
2004-12-07 |
2008-07-08 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7365827B2
(en)
|
2004-12-08 |
2008-04-29 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
JP4752473B2
(ja)
|
2004-12-09 |
2011-08-17 |
株式会社ニコン |
露光装置、露光方法及びデバイス製造方法
|
US7352440B2
(en)
|
2004-12-10 |
2008-04-01 |
Asml Netherlands B.V. |
Substrate placement in immersion lithography
|
US7403261B2
(en)
|
2004-12-15 |
2008-07-22 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7880860B2
(en)
|
2004-12-20 |
2011-02-01 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7528931B2
(en)
|
2004-12-20 |
2009-05-05 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7405805B2
(en)
|
2004-12-28 |
2008-07-29 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7491661B2
(en)
|
2004-12-28 |
2009-02-17 |
Asml Netherlands B.V. |
Device manufacturing method, top coat material and substrate
|
US20060147821A1
(en)
|
2004-12-30 |
2006-07-06 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
SG124359A1
(en)
|
2005-01-14 |
2006-08-30 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
SG124351A1
(en)
*
|
2005-01-14 |
2006-08-30 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method
|
KR101440617B1
(ko)
|
2005-01-31 |
2014-09-15 |
가부시키가이샤 니콘 |
노광 장치 및 디바이스 제조 방법
|
US8692973B2
(en)
|
2005-01-31 |
2014-04-08 |
Nikon Corporation |
Exposure apparatus and method for producing device
|
CN102360170B
(zh)
|
2005-02-10 |
2014-03-12 |
Asml荷兰有限公司 |
浸没液体、曝光装置及曝光方法
|
US8018573B2
(en)
|
2005-02-22 |
2011-09-13 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7378025B2
(en)
|
2005-02-22 |
2008-05-27 |
Asml Netherlands B.V. |
Fluid filtration method, fluid filtered thereby, lithographic apparatus and device manufacturing method
|
US7224431B2
(en)
|
2005-02-22 |
2007-05-29 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7428038B2
(en)
|
2005-02-28 |
2008-09-23 |
Asml Netherlands B.V. |
Lithographic apparatus, device manufacturing method and apparatus for de-gassing a liquid
|
US7282701B2
(en)
|
2005-02-28 |
2007-10-16 |
Asml Netherlands B.V. |
Sensor for use in a lithographic apparatus
|
US7324185B2
(en)
|
2005-03-04 |
2008-01-29 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7684010B2
(en)
|
2005-03-09 |
2010-03-23 |
Asml Netherlands B.V. |
Lithographic apparatus, device manufacturing method, seal structure, method of removing an object and a method of sealing
|
US7330238B2
(en)
|
2005-03-28 |
2008-02-12 |
Asml Netherlands, B.V. |
Lithographic apparatus, immersion projection apparatus and device manufacturing method
|
US7411654B2
(en)
|
2005-04-05 |
2008-08-12 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
USRE43576E1
(en)
|
2005-04-08 |
2012-08-14 |
Asml Netherlands B.V. |
Dual stage lithographic apparatus and device manufacturing method
|
US7291850B2
(en)
|
2005-04-08 |
2007-11-06 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US20060232753A1
(en)
|
2005-04-19 |
2006-10-19 |
Asml Holding N.V. |
Liquid immersion lithography system with tilted liquid flow
|
EP2527921A3
(de)
|
2005-04-28 |
2017-10-18 |
Nikon Corporation |
Belichtungsverfahren und Belichtungsapparat
|
US7317507B2
(en)
|
2005-05-03 |
2008-01-08 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7433016B2
(en)
|
2005-05-03 |
2008-10-07 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US8248577B2
(en)
|
2005-05-03 |
2012-08-21 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7751027B2
(en)
|
2005-06-21 |
2010-07-06 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7652746B2
(en)
|
2005-06-21 |
2010-01-26 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7474379B2
(en)
|
2005-06-28 |
2009-01-06 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7834974B2
(en)
|
2005-06-28 |
2010-11-16 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7468779B2
(en)
|
2005-06-28 |
2008-12-23 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7535644B2
(en)
|
2005-08-12 |
2009-05-19 |
Asml Netherlands B.V. |
Lens element, lithographic apparatus, device manufacturing method, and device manufactured thereby
|
US8054445B2
(en)
|
2005-08-16 |
2011-11-08 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7411658B2
(en)
|
2005-10-06 |
2008-08-12 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US20070127135A1
(en)
*
|
2005-11-01 |
2007-06-07 |
Nikon Corporation |
Exposure apparatus, exposure method and device manufacturing method
|
US7656501B2
(en)
|
2005-11-16 |
2010-02-02 |
Asml Netherlands B.V. |
Lithographic apparatus
|
US7804577B2
(en)
|
2005-11-16 |
2010-09-28 |
Asml Netherlands B.V. |
Lithographic apparatus
|
US7864292B2
(en)
|
2005-11-16 |
2011-01-04 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7633073B2
(en)
|
2005-11-23 |
2009-12-15 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7773195B2
(en)
|
2005-11-29 |
2010-08-10 |
Asml Holding N.V. |
System and method to increase surface tension and contact angle in immersion lithography
|
US7420194B2
(en)
|
2005-12-27 |
2008-09-02 |
Asml Netherlands B.V. |
Lithographic apparatus and substrate edge seal
|
US7839483B2
(en)
|
2005-12-28 |
2010-11-23 |
Asml Netherlands B.V. |
Lithographic apparatus, device manufacturing method and a control system
|
US7649611B2
(en)
|
2005-12-30 |
2010-01-19 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US8045134B2
(en)
|
2006-03-13 |
2011-10-25 |
Asml Netherlands B.V. |
Lithographic apparatus, control system and device manufacturing method
|
EP1995768A4
(de)
|
2006-03-13 |
2013-02-06 |
Nikon Corp |
Belichtungsvorrichtung, wartungsverfahren, belichtungsverfahren sowie herstellungsverfahren für die vorrichtung
|
US9477158B2
(en)
|
2006-04-14 |
2016-10-25 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
DE102006021797A1
(de)
|
2006-05-09 |
2007-11-15 |
Carl Zeiss Smt Ag |
Optische Abbildungseinrichtung mit thermischer Dämpfung
|
CN102298274A
(zh)
|
2006-05-18 |
2011-12-28 |
株式会社尼康 |
曝光方法及装置、维护方法、以及组件制造方法
|
CN101385125B
(zh)
|
2006-05-22 |
2011-04-13 |
株式会社尼康 |
曝光方法及装置、维修方法、以及组件制造方法
|
US7969548B2
(en)
|
2006-05-22 |
2011-06-28 |
Asml Netherlands B.V. |
Lithographic apparatus and lithographic apparatus cleaning method
|
SG172613A1
(en)
|
2006-05-23 |
2011-07-28 |
Nikon Corp |
Maintenance method, exposure method and apparatus, and device manufacturing method
|
KR20090033170A
(ko)
|
2006-06-30 |
2009-04-01 |
가부시키가이샤 니콘 |
메인터넌스 방법, 노광 방법 및 장치 및 디바이스 제조 방법
|
US8045135B2
(en)
|
2006-11-22 |
2011-10-25 |
Asml Netherlands B.V. |
Lithographic apparatus with a fluid combining unit and related device manufacturing method
|
US9632425B2
(en)
|
2006-12-07 |
2017-04-25 |
Asml Holding N.V. |
Lithographic apparatus, a dryer and a method of removing liquid from a surface
|
US8634053B2
(en)
|
2006-12-07 |
2014-01-21 |
Asml Netherlands B.V. |
Lithographic apparatus and device manufacturing method
|
US7791709B2
(en)
|
2006-12-08 |
2010-09-07 |
Asml Netherlands B.V. |
Substrate support and lithographic process
|
US8237911B2
(en)
|
2007-03-15 |
2012-08-07 |
Nikon Corporation |
Apparatus and methods for keeping immersion fluid adjacent to an optical assembly during wafer exchange in an immersion lithography machine
|
US8947629B2
(en)
|
2007-05-04 |
2015-02-03 |
Asml Netherlands B.V. |
Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
|
US7866330B2
(en)
|
2007-05-04 |
2011-01-11 |
Asml Netherlands B.V. |
Cleaning device, a lithographic apparatus and a lithographic apparatus cleaning method
|
US7900641B2
(en)
|
2007-05-04 |
2011-03-08 |
Asml Netherlands B.V. |
Cleaning device and a lithographic apparatus cleaning method
|
US8164736B2
(en)
|
2007-05-29 |
2012-04-24 |
Nikon Corporation |
Exposure method, exposure apparatus, and method for producing device
|
NL1036253A1
(nl)
*
|
2007-12-10 |
2009-06-11 |
Asml Netherlands Bv |
Lithographic apparatus and device manufacturing method.
|
EP2128703A1
(de)
|
2008-05-28 |
2009-12-02 |
ASML Netherlands BV |
Lithographische Vorrichtung und Betriebsverfahren für die Vorrichtung
|
NL2005207A
(en)
|
2009-09-28 |
2011-03-29 |
Asml Netherlands Bv |
Heat pipe, lithographic apparatus and device manufacturing method.
|
EP2381310B1
(de)
|
2010-04-22 |
2015-05-06 |
ASML Netherlands BV |
Flüssigkeitshandhabungsstruktur und lithographischer Apparat
|
JP6809928B2
(ja)
*
|
2017-02-09 |
2021-01-06 |
Hoya株式会社 |
光照射装置
|