TW200628902A - Coordinates detection apparatus and subject inspection apparatus - Google Patents

Coordinates detection apparatus and subject inspection apparatus

Info

Publication number
TW200628902A
TW200628902A TW095100331A TW95100331A TW200628902A TW 200628902 A TW200628902 A TW 200628902A TW 095100331 A TW095100331 A TW 095100331A TW 95100331 A TW95100331 A TW 95100331A TW 200628902 A TW200628902 A TW 200628902A
Authority
TW
Taiwan
Prior art keywords
glass substrate
guide bar
spot light
axis
subject
Prior art date
Application number
TW095100331A
Other languages
Chinese (zh)
Other versions
TWI342967B (en
Inventor
Hiroshi Kato
Original Assignee
Olympus Corp
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Application filed by Olympus Corp filed Critical Olympus Corp
Publication of TW200628902A publication Critical patent/TW200628902A/en
Application granted granted Critical
Publication of TWI342967B publication Critical patent/TWI342967B/en

Links

Classifications

    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/17—Systems in which incident light is modified in accordance with the properties of the material investigated
    • G01N21/47—Scattering, i.e. diffuse reflection
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/8851—Scan or image signal processing specially adapted therefor, e.g. for scan signal adjustment, for detecting different kinds of defects, for compensating for structures, markings, edges
    • G01N2021/8854—Grading and classifying of flaws
    • G01N2021/8861—Determining coordinates of flaws
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N21/00—Investigating or analysing materials by the use of optical means, i.e. using sub-millimetre waves, infrared, visible or ultraviolet light
    • G01N21/84—Systems specially adapted for particular applications
    • G01N21/88—Investigating the presence of flaws or contamination
    • G01N21/95—Investigating the presence of flaws or contamination characterised by the material or shape of the object to be examined
    • G01N2021/9513—Liquid crystal panels
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2201/00—Features of devices classified in G01N21/00
    • G01N2201/06—Illumination; Optics
    • G01N2201/061—Sources
    • G01N2201/06113—Coherent sources; lasers
    • G—PHYSICS
    • G01—MEASURING; TESTING
    • G01N—INVESTIGATING OR ANALYSING MATERIALS BY DETERMINING THEIR CHEMICAL OR PHYSICAL PROPERTIES
    • G01N2223/00—Investigating materials by wave or particle radiation
    • G01N2223/40—Imaging
    • G01N2223/417—Imaging recording with co-ordinate markings

Landscapes

  • Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Chemical & Material Sciences (AREA)
  • Analytical Chemistry (AREA)
  • Biochemistry (AREA)
  • General Health & Medical Sciences (AREA)
  • General Physics & Mathematics (AREA)
  • Immunology (AREA)
  • Pathology (AREA)
  • Investigating Materials By The Use Of Optical Means Adapted For Particular Applications (AREA)
  • Length Measuring Devices By Optical Means (AREA)

Abstract

To stably detect the coordinates of the location of a subject with high accuracy by directly irradiating spot light to the subject. A glass substrate 8 is placed on an oscillating holder 9 of a subject inspection apparatus. A guide bar 40 is provided which is movable in the direction of an X-axis over the surface of the glass substrate 8. A laser head 44 which irradiates spot light to a defect of the glass substrate 8 and which is movable in the direction of a Y-axis by means of a second belt 42, is provided on the guide bar 40. The luminous flux of the spot light is irradiated at an angle a. In order to perform a macroscopic observation, the guide bar 40 and the laser head 44 are respectively moved in the directions of the X-axis and the Y-axis by means of an operation section, thereby moving the spot light to the defect on the glass substrate 8. A coordinates detection section determines coordinates data using drive amounts of respective motors for moving the guide bar 40 and the laser head 44 as location information. In order to perform a microscopic observation of the defect, an observation section having a microscope function is moved to a location specified by the coordinates data. 3
TW095100331A 2005-01-18 2006-01-04 Coordinates detection apparatus and subject inspection apparatus TWI342967B (en)

Applications Claiming Priority (1)

Application Number Priority Date Filing Date Title
JP2005010239A JP4653500B2 (en) 2005-01-18 2005-01-18 Coordinate detection apparatus and subject inspection apparatus

Publications (2)

Publication Number Publication Date
TW200628902A true TW200628902A (en) 2006-08-16
TWI342967B TWI342967B (en) 2011-06-01

Family

ID=36840076

Family Applications (1)

Application Number Title Priority Date Filing Date
TW095100331A TWI342967B (en) 2005-01-18 2006-01-04 Coordinates detection apparatus and subject inspection apparatus

Country Status (4)

Country Link
JP (1) JP4653500B2 (en)
KR (1) KR100827342B1 (en)
CN (1) CN100516771C (en)
TW (1) TWI342967B (en)

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI474068B (en) * 2010-05-05 2015-02-21 Hon Hai Prec Ind Co Ltd Displacement measuring device

Families Citing this family (16)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JP4517354B2 (en) * 2004-11-08 2010-08-04 株式会社ニコン Exposure apparatus and device manufacturing method
CN101446699B (en) * 2008-12-30 2010-06-02 友达光电股份有限公司 Detection device and method for same
CN102253506B (en) * 2010-05-21 2019-05-14 京东方科技集团股份有限公司 The manufacturing method and detection repair apparatus of liquid crystal display substrate
CN102393576A (en) * 2011-08-03 2012-03-28 深圳市华星光电技术有限公司 Visual checking machine of glass baseplate in liquid crystal display and checking method thereof
US8854616B2 (en) 2011-08-03 2014-10-07 Shenzhen China Star Optoelectronics Technology Co., Ltd. Visual inspection apparatus for glass substrate of liquid crystal display and inspection method thereof
CN102927928B (en) * 2012-10-30 2016-08-17 三峡大学 Solid object upper end face scanner and scan method
CN103075970B (en) * 2012-12-27 2015-07-01 深圳市华星光电技术有限公司 Method of compensating orthogonal degree of length measuring device and length measuring device using the same
US9080865B2 (en) 2012-12-27 2015-07-14 Shenzhen China Star Optoelectronics Technology Co., Ltd Orthogonality compensation method for length measurement device and length measurement device using same
KR101751801B1 (en) * 2016-05-18 2017-06-29 한국기계연구원 Defect inspecting device for substrate and inspecting method using the same
JP2018059830A (en) * 2016-10-06 2018-04-12 川崎重工業株式会社 Exterior appearance inspection method
CN106770355A (en) * 2016-12-09 2017-05-31 武汉华星光电技术有限公司 The detection device for foreign matter and method of a kind of CF coating machines, CF coating machines
CN106773189A (en) * 2017-03-27 2017-05-31 武汉华星光电技术有限公司 The method that macroscopical automatic check machine and lifting display abnormal area measure efficiency
CN107014826A (en) * 2017-04-12 2017-08-04 武汉华星光电技术有限公司 CF substrate micro examination machines
CN108613990A (en) * 2018-07-13 2018-10-02 江苏东旭亿泰智能装备有限公司 A kind of microcosmic and compound check machine of macroscopic view
CN109141303B (en) * 2018-08-14 2020-06-19 哈尔滨工业大学 Component geometric defect detection system and detection method
CN116448371B (en) * 2023-06-16 2023-08-25 苗疆(武汉)机器人科技有限公司 Industrial robot multi-angle detection device

Family Cites Families (10)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
JPH01201144A (en) * 1988-02-05 1989-08-14 Nikon Corp Scattered light detector
JP3190406B2 (en) * 1992-02-18 2001-07-23 オリンパス光学工業株式会社 Defect inspection equipment
JPH10206121A (en) 1997-01-23 1998-08-07 Laser Tec Kk Detecting apparatus for rotation of x-y stage
JPH1134299A (en) * 1997-07-18 1999-02-09 Shinohara Tekkosho:Kk Method for detecting register mark
JP2000266511A (en) * 1999-03-19 2000-09-29 Olympus Optical Co Ltd Inspection device
JP2002082067A (en) * 2000-09-05 2002-03-22 Olympus Optical Co Ltd Substrate inspecting device
JP2002267620A (en) * 2001-03-09 2002-09-18 Hitachi Kokusai Electric Inc Apparatus for visually examining plate-shaped object
JP4690584B2 (en) * 2001-06-06 2011-06-01 有限会社ユナテック Surface evaluation apparatus and surface evaluation method
JP2003002934A (en) * 2001-06-25 2003-01-08 Toagosei Co Ltd Aqueous resin dispersion, method for producing the same and use of the same
JP4347028B2 (en) * 2003-12-01 2009-10-21 株式会社日立国際電気 Visual inspection device

Cited By (1)

* Cited by examiner, † Cited by third party
Publication number Priority date Publication date Assignee Title
TWI474068B (en) * 2010-05-05 2015-02-21 Hon Hai Prec Ind Co Ltd Displacement measuring device

Also Published As

Publication number Publication date
JP4653500B2 (en) 2011-03-16
CN1808055A (en) 2006-07-26
KR20060083890A (en) 2006-07-21
CN100516771C (en) 2009-07-22
JP2006200917A (en) 2006-08-03
TWI342967B (en) 2011-06-01
KR100827342B1 (en) 2008-05-06

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Legal Events

Date Code Title Description
MM4A Annulment or lapse of patent due to non-payment of fees