JP2006511011A - 層上にスポットを照射する方法及び装置 - Google Patents
層上にスポットを照射する方法及び装置 Download PDFInfo
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- JP2006511011A JP2006511011A JP2004561744A JP2004561744A JP2006511011A JP 2006511011 A JP2006511011 A JP 2006511011A JP 2004561744 A JP2004561744 A JP 2004561744A JP 2004561744 A JP2004561744 A JP 2004561744A JP 2006511011 A JP2006511011 A JP 2006511011A
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/70—Microphotolithographic exposure; Apparatus therefor
- G03F7/70216—Mask projection systems
- G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/12—Heads, e.g. forming of the optical beam spot or modulation of the optical beam
- G11B7/135—Means for guiding the beam from the source to the record carrier or from the record carrier to the detector
- G11B7/1381—Non-lens elements for altering the properties of the beam, e.g. knife edges, slits, filters or stops
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- G—PHYSICS
- G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
- G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
- G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
- G03F7/20—Exposure; Apparatus therefor
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/12—Heads, e.g. forming of the optical beam spot or modulation of the optical beam
- G11B7/122—Flying-type heads, e.g. analogous to Winchester type in magnetic recording
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- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/12—Heads, e.g. forming of the optical beam spot or modulation of the optical beam
- G11B7/135—Means for guiding the beam from the source to the record carrier or from the record carrier to the detector
- G11B7/1372—Lenses
- G11B7/1374—Objective lenses
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
-
- G—PHYSICS
- G11—INFORMATION STORAGE
- G11B—INFORMATION STORAGE BASED ON RELATIVE MOVEMENT BETWEEN RECORD CARRIER AND TRANSDUCER
- G11B7/00—Recording or reproducing by optical means, e.g. recording using a thermal beam of optical radiation by modifying optical properties or the physical structure, reproducing using an optical beam at lower power by sensing optical properties; Record carriers therefor
- G11B7/24—Record carriers characterised by shape, structure or physical properties, or by the selection of the material
- G11B7/26—Apparatus or processes specially adapted for the manufacture of record carriers
- G11B7/261—Preparing a master, e.g. exposing photoresist, electroforming
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- B—PERFORMING OPERATIONS; TRANSPORTING
- B82—NANOTECHNOLOGY
- B82Y—SPECIFIC USES OR APPLICATIONS OF NANOSTRUCTURES; MEASUREMENT OR ANALYSIS OF NANOSTRUCTURES; MANUFACTURE OR TREATMENT OF NANOSTRUCTURES
- B82Y10/00—Nanotechnology for information processing, storage or transmission, e.g. quantum computing or single electron logic
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- Optics & Photonics (AREA)
- Engineering & Computer Science (AREA)
- Manufacturing & Machinery (AREA)
- General Physics & Mathematics (AREA)
- Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
- Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
- Nanotechnology (AREA)
- Chemical & Material Sciences (AREA)
- Crystals, And After-Treatments Of Crystals (AREA)
- Optical Head (AREA)
- Recrystallisation Techniques (AREA)
- Mathematical Physics (AREA)
- Theoretical Computer Science (AREA)
- Manufacturing Optical Record Carriers (AREA)
- Crystallography & Structural Chemistry (AREA)
- Heating, Cooling, Or Curing Plastics Or The Like In General (AREA)
Abstract
Description
Claims (15)
- 少なくとも1つの光学素子によって放射ビームを層上のスポットに向けて焦点を合わせ、
前記少なくとも1つの光学素子と関連する層の相対的動きを引き起こし、連続的に前記層の異なる部分が照射され、前記層に最も近い前記少なくとも1つの光学素子の表面の間の空間が維持され、
前記層上の前記スポットに前記放射が照射される際に通過する前記空間の少なくとも一部を液体で満たして維持し、前記液体は、供給管を介して供給される工程を含み、
少なくとも前記液体の一部が、前記放射が前記スポットを照射する際に通るリセスを満たすことを特徴とする、
層の照射方法。 - 前記リセスは、前記スポットを照射する前記放射の周りに延びている前記層に最も近いリム部を有することを特徴とする請求項1記載の方法。
- 前記リセスは、前記層に最も近い前記少なくとも1つの光学素子の表面との間の壁の通路と、前記層に最も近い前記少なくとも1つの光学素子と、によって境が限られていることを特徴とする請求項1又は2記載の方法。
- 前記通路を介して液体流出が維持されていることを特徴とする請求項3記載の方法。
- 前記空間の最も小さな厚さは、3−1500μmに維持されることを特徴とする請求項1乃至4いずれか一項記載の方法。
- 前記リセスは、前記層に最も近い前記少なくとも1つの光学素子の前記表面の凹部を含むことを特徴とする請求項1乃至5記載の方法。
- 前記液体は、前記層に向けて開口している少なくとも1つの流路の形態で少なくとも1つの流出口から流出し、
前記流路は、前記流路に沿って長手方向に供給された液体を分配し、分配された液体を前記層に向けて分配する、
ことを特徴とする請求項1乃至6いずれか一項記載の方法。 - 前記層と前記層に最も近い前記少なくとも1つの光学素子の前記表面との間の前記空間は厚さHを有し、
前記層と前記少なくとも1つの光学素子は互いに相対的に速度Vで移動し、
前記層と平行な面において計測された幅Wを有する流出口を介して液体が、αが1から10の間の定数でβが1から3の定数のときに0.5*β*H(W+α*H)*Vという流動度で供給される、
ことを特徴とする請求項1乃至7いずれか一項記載の方法。 - 放射線源から発せられた放射を、層上のスポットに焦点を合わせる少なくとも1つの光学素子と、
連続的に前記層の異なる部分が照射され、前記層と前記スポットに最も近い前記少なくとも1つの光学素子の表面との間の空間が維持されるよう、前記少なくとも1つの光学素子に関連する前記層の相対的動きを引き起こす変位構造と、
前記層上の前記スポットに前記放射が照射される際に通過する前記空間の少なくとも一部に液体を供給する流出口を有し、
面におけるリセスが前記スポットに対向し、
前記リセスの内面は、前記放射が前記スポットを照射する際に通る前記空間の少なくとも前記部分の境を限ることを特徴とする、
層へ放射を向けさせる装置。 - 前記リセスは、前記スポットを照射する前記放射の周りに延びている前記層に最も近いリム部を有することを特徴とする請求項9記載の装置。
- 前記リセスは、前記層に最も近い前記少なくとも1つの光学素子の表面との間の壁の通路と、前記層に最も近い前記少なくとも1つの光学素子と、によって境が限られていることを特徴とする請求項9又は10記載の装置。
- 前記通路を介して液体流出を維持するために前記通路と連結する液体供給構造を更に有することを特徴とする請求項11記載の装置。
- 前記空間の最も小さな厚さは、3−1500μmに維持されることを特徴とする請求項9乃至12いずれか一項記載の装置。
- 前記リセスは、前記層に最も近い前記少なくとも1つの光学素子の前記表面の凹部を含むことを特徴とする請求項9乃至13いずれか一項記載の装置。
- 供給された液体を流路に沿って長手方向に分配し、分配された液体を前記層に向けて分配すべく、前記少なくとも1つの流出口が、前記層に向けて開口している少なくとも1つの前記流路によって形成されていることを特徴とする請求項9乃至14いずれか一項記載の装置。
Applications Claiming Priority (2)
Application Number | Priority Date | Filing Date | Title |
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EP02080392 | 2002-12-19 | ||
PCT/IB2003/005344 WO2004057589A1 (en) | 2002-12-19 | 2003-11-20 | Method and device for irradiating spots on a layer |
Publications (2)
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JP2006511011A true JP2006511011A (ja) | 2006-03-30 |
JP4364805B2 JP4364805B2 (ja) | 2009-11-18 |
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JP2004561744A Expired - Fee Related JP4364805B2 (ja) | 2002-12-19 | 2003-11-20 | 層上にスポットを照射する方法及び装置 |
Country Status (10)
Country | Link |
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US (3) | USRE48515E1 (ja) |
EP (1) | EP1579435B1 (ja) |
JP (1) | JP4364805B2 (ja) |
KR (1) | KR100971440B1 (ja) |
CN (1) | CN1316482C (ja) |
AT (1) | ATE365962T1 (ja) |
AU (1) | AU2003295177A1 (ja) |
DE (1) | DE60314668T2 (ja) |
TW (1) | TWI288404B (ja) |
WO (1) | WO2004057589A1 (ja) |
Cited By (2)
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JP2009117879A (ja) * | 2004-11-12 | 2009-05-28 | Asml Netherlands Bv | リソグラフィ装置及びデバイス製造方法 |
JP2009141359A (ja) * | 2007-12-10 | 2009-06-25 | Asml Netherlands Bv | リソグラフィ装置及びデバイス製造方法 |
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JP2009117879A (ja) * | 2004-11-12 | 2009-05-28 | Asml Netherlands Bv | リソグラフィ装置及びデバイス製造方法 |
US8817231B2 (en) | 2004-11-12 | 2014-08-26 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method involving a liquid confinement structure |
US9261797B2 (en) | 2004-11-12 | 2016-02-16 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method involving a liquid confinement structure |
US9645507B2 (en) | 2004-11-12 | 2017-05-09 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
US9798247B2 (en) | 2004-11-12 | 2017-10-24 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method involving a liquid confinement structure |
US9964861B2 (en) | 2004-11-12 | 2018-05-08 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method involving a liquid confinement structure |
US10274832B2 (en) | 2004-11-12 | 2019-04-30 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method involving a liquid confinement structure |
US10620546B2 (en) | 2004-11-12 | 2020-04-14 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method involving a liquid confinement structure |
JP2009141359A (ja) * | 2007-12-10 | 2009-06-25 | Asml Netherlands Bv | リソグラフィ装置及びデバイス製造方法 |
US8218126B2 (en) | 2007-12-10 | 2012-07-10 | Asml Netherlands B.V. | Lithographic apparatus and device manufacturing method |
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Publication number | Publication date |
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JP4364805B2 (ja) | 2009-11-18 |
DE60314668T2 (de) | 2008-03-06 |
TWI288404B (en) | 2007-10-11 |
US7514699B2 (en) | 2009-04-07 |
ATE365962T1 (de) | 2007-07-15 |
USRE46433E1 (en) | 2017-06-13 |
EP1579435B1 (en) | 2007-06-27 |
EP1579435A1 (en) | 2005-09-28 |
CN1729521A (zh) | 2006-02-01 |
TW200421297A (en) | 2004-10-16 |
KR20050088127A (ko) | 2005-09-01 |
US20070052936A1 (en) | 2007-03-08 |
USRE48515E1 (en) | 2021-04-13 |
DE60314668D1 (de) | 2007-08-09 |
WO2004057589A1 (en) | 2004-07-08 |
CN1316482C (zh) | 2007-05-16 |
KR100971440B1 (ko) | 2010-07-21 |
AU2003295177A1 (en) | 2004-07-14 |
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