TWI424275B - 曝光裝置、曝光方法及元件製造方法 - Google Patents

曝光裝置、曝光方法及元件製造方法 Download PDF

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Publication number
TWI424275B
TWI424275B TW097135382A TW97135382A TWI424275B TW I424275 B TWI424275 B TW I424275B TW 097135382 A TW097135382 A TW 097135382A TW 97135382 A TW97135382 A TW 97135382A TW I424275 B TWI424275 B TW I424275B
Authority
TW
Taiwan
Prior art keywords
substrate
reference mark
light
exposure apparatus
light receiving
Prior art date
Application number
TW097135382A
Other languages
English (en)
Chinese (zh)
Other versions
TW200905418A (en
Inventor
Joeri Lof
Hans Butler
Sjoerd Nicolaas Lambertus Donders
Aleksey Kolesnychenko
Erik Roelof Loopstra
Hendricus Johannes Maria Meijer
Roelof Aeiko Siebrand Ritsema
Schaik Frank Van
Timotheus Franciscus Sengers
Klaus Simon
Smit Joannes Theodoor De
Bob Streefkerk
Erik Theodorus Maria Bijlaart
Christiaan Alexander Hoogendam
Santen Helmar Van
De Kerkhof Marcus Adrianus Van
Mark Kroon
Boef Arie Jeffrey Den
Joost Jeroen Ottens
Johannes Catharinus Hubertus Mulkens
Alexander Straaijer
Jeroen Johannes Sophia Maria Mertens
Original Assignee
Asml Netherlands Bv
Priority date (The priority date is an assumption and is not a legal conclusion. Google has not performed a legal analysis and makes no representation as to the accuracy of the date listed.)
Filing date
Publication date
Priority claimed from EP03257068.1A external-priority patent/EP1429188B1/en
Application filed by Asml Netherlands Bv filed Critical Asml Netherlands Bv
Publication of TW200905418A publication Critical patent/TW200905418A/zh
Application granted granted Critical
Publication of TWI424275B publication Critical patent/TWI424275B/zh

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Classifications

    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70058—Mask illumination systems
    • G03F7/70141—Illumination system adjustment, e.g. adjustments during exposure or alignment during assembly of illumination system
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/20—Exposure; Apparatus therefor
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/70216—Mask projection systems
    • G03F7/70341—Details of immersion lithography aspects, e.g. exposure media or control of immersion liquid supply
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/7085—Detection arrangement, e.g. detectors of apparatus alignment possibly mounted on wafers, exposure dose, photo-cleaning flux, stray light, thermal load
    • G—PHYSICS
    • G03—PHOTOGRAPHY; CINEMATOGRAPHY; ANALOGOUS TECHNIQUES USING WAVES OTHER THAN OPTICAL WAVES; ELECTROGRAPHY; HOLOGRAPHY
    • G03F—PHOTOMECHANICAL PRODUCTION OF TEXTURED OR PATTERNED SURFACES, e.g. FOR PRINTING, FOR PROCESSING OF SEMICONDUCTOR DEVICES; MATERIALS THEREFOR; ORIGINALS THEREFOR; APPARATUS SPECIALLY ADAPTED THEREFOR
    • G03F7/00—Photomechanical, e.g. photolithographic, production of textured or patterned surfaces, e.g. printing surfaces; Materials therefor, e.g. comprising photoresists; Apparatus specially adapted therefor
    • G03F7/70—Microphotolithographic exposure; Apparatus therefor
    • G03F7/708—Construction of apparatus, e.g. environment aspects, hygiene aspects or materials
    • G03F7/70858—Environment aspects, e.g. pressure of beam-path gas, temperature
    • G03F7/70883—Environment aspects, e.g. pressure of beam-path gas, temperature of optical system

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  • Physics & Mathematics (AREA)
  • General Physics & Mathematics (AREA)
  • Health & Medical Sciences (AREA)
  • Engineering & Computer Science (AREA)
  • Environmental & Geological Engineering (AREA)
  • Epidemiology (AREA)
  • Public Health (AREA)
  • Life Sciences & Earth Sciences (AREA)
  • Atmospheric Sciences (AREA)
  • Toxicology (AREA)
  • Exposure And Positioning Against Photoresist Photosensitive Materials (AREA)
  • Exposure Of Semiconductors, Excluding Electron Or Ion Beam Exposure (AREA)
TW097135382A 2003-06-09 2004-06-08 曝光裝置、曝光方法及元件製造方法 TWI424275B (zh)

Applications Claiming Priority (3)

Application Number Priority Date Filing Date Title
EP03253636 2003-06-09
EP03255395 2003-08-29
EP03257068.1A EP1429188B1 (en) 2002-11-12 2003-11-10 Lithographic projection apparatus

Publications (2)

Publication Number Publication Date
TW200905418A TW200905418A (en) 2009-02-01
TWI424275B true TWI424275B (zh) 2014-01-21

Family

ID=34108333

Family Applications (2)

Application Number Title Priority Date Filing Date
TW097135382A TWI424275B (zh) 2003-06-09 2004-06-08 曝光裝置、曝光方法及元件製造方法
TW093116432A TWI304159B (en) 2003-06-09 2004-06-08 Lithographic apparatus and device manufacturing method

Family Applications After (1)

Application Number Title Priority Date Filing Date
TW093116432A TWI304159B (en) 2003-06-09 2004-06-08 Lithographic apparatus and device manufacturing method

Country Status (6)

Country Link
US (8) US7213963B2 (https=)
JP (7) JP4199699B2 (https=)
KR (1) KR100683263B1 (https=)
CN (2) CN1573564B (https=)
SG (2) SG152931A1 (https=)
TW (2) TWI424275B (https=)

Families Citing this family (141)

* Cited by examiner, † Cited by third party
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TW200519544A (en) 2005-06-16
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