|
US2439689A
(en)
|
|
1948-04-13 |
|
Method of rendering glass |
|
CH251213A
(fr)
|
1946-02-05 |
1947-10-15 |
Hanvag Ges Fuer Tech Vervollko |
Pompe à membrane.
|
|
US2625886A
(en)
|
1947-08-21 |
1953-01-20 |
American Brake Shoe Co |
Pump
|
|
US2617719A
(en)
|
1950-12-29 |
1952-11-11 |
Stanolind Oil & Gas Co |
Cleaning porous media
|
|
FR1499491A
(fr)
|
1966-09-30 |
1967-10-27 |
Albert Handtmann Metallgiesser |
Robinet de passage et de fermeture, en particulier pour boisson
|
|
US3642020A
(en)
|
1969-11-17 |
1972-02-15 |
Cameron Iron Works Inc |
Pressure operated{13 positive displacement shuttle valve
|
|
US3744660A
(en)
|
1970-12-30 |
1973-07-10 |
Combustion Eng |
Shield for nuclear reactor vessel
|
|
FR2128426B1
(enExample)
|
1971-03-02 |
1980-03-07 |
Cnen |
|
|
US3890176A
(en)
|
1972-08-18 |
1975-06-17 |
Gen Electric |
Method for removing photoresist from substrate
|
|
US3968885A
(en)
|
1973-06-29 |
1976-07-13 |
International Business Machines Corporation |
Method and apparatus for handling workpieces
|
|
US4341592A
(en)
|
1975-08-04 |
1982-07-27 |
Texas Instruments Incorporated |
Method for removing photoresist layer from substrate by ozone treatment
|
|
US4029517A
(en)
|
1976-03-01 |
1977-06-14 |
Autosonics Inc. |
Vapor degreasing system having a divider wall between upper and lower vapor zone portions
|
|
US4091643A
(en)
|
1976-05-14 |
1978-05-30 |
Ama Universal S.P.A. |
Circuit for the recovery of solvent vapor evolved in the course of a cleaning cycle in dry-cleaning machines or plants, and for the de-pressurizing of such machines
|
|
GB1594935A
(en)
|
1976-11-01 |
1981-08-05 |
Gen Descaling Co Ltd |
Closure for pipe or pressure vessel and seal therefor
|
|
DE2741024A1
(de)
|
1977-09-12 |
1979-03-22 |
Wilms Gmbh |
Membranpumpe
|
|
JPS5448172A
(en)
|
1977-09-24 |
1979-04-16 |
Tokyo Ouka Kougiyou Kk |
Plasma reaction processor
|
|
US4219333A
(en)
|
1978-07-03 |
1980-08-26 |
Harris Robert D |
Carbonated cleaning solution
|
|
US4349415A
(en)
|
1979-09-28 |
1982-09-14 |
Critical Fluid Systems, Inc. |
Process for separating organic liquid solutes from their solvent mixtures
|
|
US4367140A
(en)
|
1979-11-05 |
1983-01-04 |
Sykes Ocean Water Ltd. |
Reverse osmosis liquid purification apparatus
|
|
JPS56142629A
(en)
|
1980-04-09 |
1981-11-07 |
Nec Corp |
Vacuum device
|
|
US4355937A
(en)
|
1980-12-24 |
1982-10-26 |
International Business Machines Corporation |
Low shock transmissive antechamber seal mechanisms for vacuum chamber type semi-conductor wafer electron beam writing apparatus
|
|
DE3112434A1
(de)
|
1981-03-28 |
1982-10-07 |
Depa GmbH, 4000 Düsseldorf |
Druckluftgetriebene doppelmembran-pumpe
|
|
JPS6117151Y2
(enExample)
|
1981-05-19 |
1986-05-26 |
|
|
|
US4682937A
(en)
|
1981-11-12 |
1987-07-28 |
The Coca-Cola Company |
Double-acting diaphragm pump and reversing mechanism therefor
|
|
DE3145815C2
(de)
|
1981-11-19 |
1984-08-09 |
AGA Gas GmbH, 2102 Hamburg |
Verfahren zum Entfernen von ablösungsfähigen Materialschichten von beschichteten Gegenständen,
|
|
US4522788A
(en)
|
1982-03-05 |
1985-06-11 |
Leco Corporation |
Proximate analyzer
|
|
FR2536433A1
(fr)
|
1982-11-19 |
1984-05-25 |
Privat Michel |
Procede et installation de nettoyage et decontamination particulaire de vetements, notamment de vetements contamines par des particules radioactives
|
|
JPS604007U
(ja)
|
1983-06-20 |
1985-01-12 |
株式会社ヨコオ |
伸縮多段ロツドアンテナ
|
|
US4626509A
(en)
|
1983-07-11 |
1986-12-02 |
Data Packaging Corp. |
Culture media transfer assembly
|
|
US4865061A
(en)
|
1983-07-22 |
1989-09-12 |
Quadrex Hps, Inc. |
Decontamination apparatus for chemically and/or radioactively contaminated tools and equipment
|
|
US4549467A
(en)
|
1983-08-03 |
1985-10-29 |
Wilden Pump & Engineering Co. |
Actuator valve
|
|
US4475993A
(en)
|
1983-08-15 |
1984-10-09 |
The United States Of America As Represented By The United States Department Of Energy |
Extraction of trace metals from fly ash
|
|
GB8332394D0
(en)
|
1983-12-05 |
1984-01-11 |
Pilkington Brothers Plc |
Coating apparatus
|
|
US4877530A
(en)
|
1984-04-25 |
1989-10-31 |
Cf Systems Corporation |
Liquid CO2 /cosolvent extraction
|
|
JPS60246635A
(ja)
|
1984-05-22 |
1985-12-06 |
Anelva Corp |
自動基板処理装置
|
|
JPS60192333U
(ja)
|
1984-05-31 |
1985-12-20 |
日本メクトロン株式会社 |
キ−ボ−ドスイツチ
|
|
US4693777A
(en)
|
1984-11-30 |
1987-09-15 |
Kabushiki Kaisha Toshiba |
Apparatus for producing semiconductor devices
|
|
US4960140A
(en)
|
1984-11-30 |
1990-10-02 |
Ishijima Industrial Co., Ltd. |
Washing arrangement for and method of washing lead frames
|
|
JPS61231166A
(ja)
|
1985-04-08 |
1986-10-15 |
Hitachi Ltd |
複合超高真空装置
|
|
US4788043A
(en)
|
1985-04-17 |
1988-11-29 |
Tokuyama Soda Kabushiki Kaisha |
Process for washing semiconductor substrate with organic solvent
|
|
US4778356A
(en)
|
1985-06-11 |
1988-10-18 |
Hicks Cecil T |
Diaphragm pump
|
|
US4749440A
(en)
|
1985-08-28 |
1988-06-07 |
Fsi Corporation |
Gaseous process and apparatus for removing films from substrates
|
|
US4925790A
(en)
|
1985-08-30 |
1990-05-15 |
The Regents Of The University Of California |
Method of producing products by enzyme-catalyzed reactions in supercritical fluids
|
|
US5044871A
(en)
|
1985-10-24 |
1991-09-03 |
Texas Instruments Incorporated |
Integrated circuit processing system
|
|
US4827867A
(en)
|
1985-11-28 |
1989-05-09 |
Daikin Industries, Ltd. |
Resist developing apparatus
|
|
JPS6299619U
(enExample)
|
1985-12-13 |
1987-06-25 |
|
|
|
JPS62111442U
(enExample)
|
1985-12-28 |
1987-07-16 |
|
|
|
DE3608783A1
(de)
|
1986-03-15 |
1987-09-17 |
Telefunken Electronic Gmbh |
Gasphasen-epitaxieverfahren und vorrichtung zu seiner durchfuehrung
|
|
CA1287594C
(en)
|
1986-04-04 |
1991-08-13 |
Miroslav Eror |
Method and apparatus for handling and processing wafer like materials
|
|
US4917556A
(en)
|
1986-04-28 |
1990-04-17 |
Varian Associates, Inc. |
Modular wafer transport and processing system
|
|
GB8709064D0
(en)
|
1986-04-28 |
1987-05-20 |
Varian Associates |
Wafer handling arm
|
|
US4670126A
(en)
|
1986-04-28 |
1987-06-02 |
Varian Associates, Inc. |
Sputter module for modular wafer processing system
|
|
WO1987007309A1
(en)
|
1986-05-19 |
1987-12-03 |
Novellus Systems, Inc. |
Deposition apparatus with automatic cleaning means and method of use
|
|
US4951601A
(en)
|
1986-12-19 |
1990-08-28 |
Applied Materials, Inc. |
Multi-chamber integrated process system
|
|
JPS63252439A
(ja)
|
1986-12-19 |
1988-10-19 |
アプライド マテリアルズインコーポレーテッド |
多チャンバの統合処理システム
|
|
JPS63157870A
(ja)
|
1986-12-19 |
1988-06-30 |
Anelva Corp |
基板処理装置
|
|
US5882165A
(en)
|
1986-12-19 |
1999-03-16 |
Applied Materials, Inc. |
Multiple chamber integrated process system
|
|
US4759917A
(en)
|
1987-02-24 |
1988-07-26 |
Monsanto Company |
Oxidative dissolution of gallium arsenide and separation of gallium from arsenic
|
|
JPS63256326A
(ja)
|
1987-04-15 |
1988-10-24 |
Hitachi Ltd |
真空チヤツクおよびその製造方法
|
|
US4879004A
(en)
|
1987-05-07 |
1989-11-07 |
Micafil Ag |
Process for the extraction of oil or polychlorinated biphenyl from electrical parts through the use of solvents and for distillation of the solvents
|
|
JPS63303059A
(ja)
|
1987-05-30 |
1988-12-09 |
Tokuda Seisakusho Ltd |
真空処理装置
|
|
US4924892A
(en)
|
1987-07-28 |
1990-05-15 |
Mazda Motor Corporation |
Painting truck washing system
|
|
DE3725565A1
(de)
|
1987-08-01 |
1989-02-16 |
Peter Weil |
Verfahren und anlage zum entlacken von gegenstaenden mit einem tauchbehaelter mit loesungsmittel
|
|
DE3725611A1
(de)
|
1987-08-01 |
1989-02-09 |
Henkel Kgaa |
Verfahren zur gemeinsamen abtrennung von stoerelementen aus wertmetall-elektrolytloesungen
|
|
US5105556A
(en)
|
1987-08-12 |
1992-04-21 |
Hitachi, Ltd. |
Vapor washing process and apparatus
|
|
US4838476A
(en)
|
1987-11-12 |
1989-06-13 |
Fluocon Technologies Inc. |
Vapour phase treatment process and apparatus
|
|
EP0343233B1
(en)
|
1987-11-27 |
1994-02-02 |
Battelle Memorial Institute |
Supercritical fluid reverse micelle separation
|
|
US4933404A
(en)
|
1987-11-27 |
1990-06-12 |
Battelle Memorial Institute |
Processes for microemulsion polymerization employing novel microemulsion systems
|
|
US5266205A
(en)
|
1988-02-04 |
1993-11-30 |
Battelle Memorial Institute |
Supercritical fluid reverse micelle separation
|
|
US4789077A
(en)
|
1988-02-24 |
1988-12-06 |
Public Service Electric & Gas Company |
Closure apparatus for a high pressure vessel
|
|
JP2663483B2
(ja)
|
1988-02-29 |
1997-10-15 |
勝 西川 |
レジストパターン形成方法
|
|
JPH01246835A
(ja)
|
1988-03-29 |
1989-10-02 |
Toshiba Corp |
ウエハ処理装置
|
|
US4823976A
(en)
|
1988-05-04 |
1989-04-25 |
The United States Of America As Represented By The Administrator Of The National Aeronautics And Space Administration |
Quick actuating closure
|
|
US5224504A
(en)
|
1988-05-25 |
1993-07-06 |
Semitool, Inc. |
Single wafer processor
|
|
US5185296A
(en)
|
1988-07-26 |
1993-02-09 |
Matsushita Electric Industrial Co., Ltd. |
Method for forming a dielectric thin film or its pattern of high accuracy on a substrate
|
|
DE3836731A1
(de)
|
1988-10-28 |
1990-05-03 |
Henkel Kgaa |
Verfahren zur abtrennung von stoerelementen aus wertmetall-elektrolytloesungen
|
|
JP2927806B2
(ja)
|
1988-11-30 |
1999-07-28 |
山形日本電気株式会社 |
半導体装置の製造装置
|
|
US5013366A
(en)
|
1988-12-07 |
1991-05-07 |
Hughes Aircraft Company |
Cleaning process using phase shifting of dense phase gases
|
|
US5051135A
(en)
|
1989-01-30 |
1991-09-24 |
Kabushiki Kaisha Tiyoda Seisakusho |
Cleaning method using a solvent while preventing discharge of solvent vapors to the environment
|
|
JPH02209729A
(ja)
|
1989-02-09 |
1990-08-21 |
Matsushita Electric Ind Co Ltd |
半導体装置の製造方法及び異物除去装置
|
|
DE3904514C2
(de)
|
1989-02-15 |
1999-03-11 |
Oeffentliche Pruefstelle Und T |
Verfahren zum Reinigen bzw. Waschen von Bekleidungsteilen o. dgl.
|
|
DE4004111C2
(de)
|
1989-02-15 |
1999-08-19 |
Deutsches Textilforschzentrum |
Verfahren zur Vorbehandlung von textilen Flächengebilden oder Garnen
|
|
EP0409972B1
(en)
|
1989-02-16 |
1992-10-21 |
PAWLISZYN, Janusz B. |
Apparatus and method for delivering supercritical fluid
|
|
DE3906735C2
(de)
|
1989-03-03 |
1999-04-15 |
Deutsches Textilforschzentrum |
Verfahren zum Bleichen
|
|
DE3906724C2
(de)
|
1989-03-03 |
1998-03-12 |
Deutsches Textilforschzentrum |
Verfahren zum Färben von textilen Substraten
|
|
DE3906737A1
(de)
|
1989-03-03 |
1990-09-13 |
Deutsches Textilforschzentrum |
Verfahren zum mercerisieren, laugieren oder abkochen
|
|
US4879431A
(en)
|
1989-03-09 |
1989-11-07 |
Biomedical Research And Development Laboratories, Inc. |
Tubeless cell harvester
|
|
US5213485A
(en)
|
1989-03-10 |
1993-05-25 |
Wilden James K |
Air driven double diaphragm pump
|
|
US5169296A
(en)
|
1989-03-10 |
1992-12-08 |
Wilden James K |
Air driven double diaphragm pump
|
|
US5068040A
(en)
|
1989-04-03 |
1991-11-26 |
Hughes Aircraft Company |
Dense phase gas photochemical process for substrate treatment
|
|
US5288333A
(en)
|
1989-05-06 |
1994-02-22 |
Dainippon Screen Mfg. Co., Ltd. |
Wafer cleaning method and apparatus therefore
|
|
DE3915586A1
(de)
|
1989-05-12 |
1990-11-15 |
Henkel Kgaa |
Verfahren zur zweiphasen-extraktion von metallionen aus feste metalloxide enthaltenden phasen, mittel und verwendung
|
|
US5186718A
(en)
|
1989-05-19 |
1993-02-16 |
Applied Materials, Inc. |
Staged-vacuum wafer processing system and method
|
|
JPH02304941A
(ja)
|
1989-05-19 |
1990-12-18 |
Seiko Epson Corp |
半導体装置の製造方法
|
|
US4923828A
(en)
|
1989-07-07 |
1990-05-08 |
Eastman Kodak Company |
Gaseous cleaning method for silicon devices
|
|
JP2888253B2
(ja)
|
1989-07-20 |
1999-05-10 |
富士通株式会社 |
化学気相成長法およびその実施のための装置
|
|
US5062770A
(en)
|
1989-08-11 |
1991-11-05 |
Systems Chemistry, Inc. |
Fluid pumping apparatus and system with leak detection and containment
|
|
US4983223A
(en)
|
1989-10-24 |
1991-01-08 |
Chenpatents |
Apparatus and method for reducing solvent vapor losses
|
|
US5226441A
(en)
|
1989-11-13 |
1993-07-13 |
Cmb Industries |
Backflow preventor with adjustable outflow direction
|
|
US5213619A
(en)
|
1989-11-30 |
1993-05-25 |
Jackson David P |
Processes for cleaning, sterilizing, and implanting materials using high energy dense fluids
|
|
US5196134A
(en)
|
1989-12-20 |
1993-03-23 |
Hughes Aircraft Company |
Peroxide composition for removing organic contaminants and method of using same
|
|
US5269850A
(en)
|
1989-12-20 |
1993-12-14 |
Hughes Aircraft Company |
Method of removing organic flux using peroxide composition
|
|
US5169408A
(en)
|
1990-01-26 |
1992-12-08 |
Fsi International, Inc. |
Apparatus for wafer processing with in situ rinse
|
|
US5186594A
(en)
|
1990-04-19 |
1993-02-16 |
Applied Materials, Inc. |
Dual cassette load lock
|
|
US5217043A
(en)
|
1990-04-19 |
1993-06-08 |
Milic Novakovic |
Control valve
|
|
ES2062595T3
(es)
|
1990-04-20 |
1994-12-16 |
Applied Materials Inc |
Aparato y metodo de una valvula de hendidura.
|
|
US5370741A
(en)
|
1990-05-15 |
1994-12-06 |
Semitool, Inc. |
Dynamic semiconductor wafer processing using homogeneous chemical vapors
|
|
DE4018464A1
(de)
|
1990-06-08 |
1991-12-12 |
Ott Kg Lewa |
Membran fuer eine hydraulisch angetriebene membranpumpe
|
|
US5071485A
(en)
|
1990-09-11 |
1991-12-10 |
Fusion Systems Corporation |
Method for photoresist stripping using reverse flow
|
|
US5236669A
(en)
|
1990-09-12 |
1993-08-17 |
E. I. Du Pont De Nemours And Company |
Pressure vessel
|
|
US5167716A
(en)
|
1990-09-28 |
1992-12-01 |
Gasonics, Inc. |
Method and apparatus for batch processing a semiconductor wafer
|
|
DE4106180A1
(de)
|
1990-10-08 |
1992-04-09 |
Dirk Dipl Ing Budde |
Doppel-membranpumpe
|
|
US5279771A
(en)
|
1990-11-05 |
1994-01-18 |
Ekc Technology, Inc. |
Stripping compositions comprising hydroxylamine and alkanolamine
|
|
JP2782560B2
(ja)
|
1990-12-12 |
1998-08-06 |
富士写真フイルム株式会社 |
安定化処理液及びハロゲン化銀カラー写真感光材料の処理方法
|
|
US5306350A
(en)
|
1990-12-21 |
1994-04-26 |
Union Carbide Chemicals & Plastics Technology Corporation |
Methods for cleaning apparatus using compressed fluids
|
|
US5143103A
(en)
|
1991-01-04 |
1992-09-01 |
International Business Machines Corporation |
Apparatus for cleaning and drying workpieces
|
|
CA2059841A1
(en)
|
1991-01-24 |
1992-07-25 |
Ichiro Hayashida |
Surface treating solutions and cleaning method
|
|
US5185058A
(en)
|
1991-01-29 |
1993-02-09 |
Micron Technology, Inc. |
Process for etching semiconductor devices
|
|
US5201960A
(en)
|
1991-02-04 |
1993-04-13 |
Applied Photonics Research, Inc. |
Method for removing photoresist and other adherent materials from substrates
|
|
AT395951B
(de)
|
1991-02-19 |
1993-04-26 |
Union Ind Compr Gase Gmbh |
Reinigung von werkstuecken mit organischen rueckstaenden
|
|
CH684402A5
(de)
|
1991-03-04 |
1994-09-15 |
Xorella Ag Wettingen |
Vorrichtung zum Verschieben und Schwenken eines Behälter-Verschlusses.
|
|
JPH04284648A
(ja)
|
1991-03-14 |
1992-10-09 |
Fujitsu Ltd |
ウエーハ支持用ドライチャックラバー
|
|
EP0514337B1
(de)
|
1991-05-17 |
1995-11-22 |
Ciba-Geigy Ag |
Verfahren zum Färben von hydrophobem Textilmaterial mit Dispersionsfarbstoffen aus überkritischem CO2
|
|
US5195878A
(en)
|
1991-05-20 |
1993-03-23 |
Hytec Flow Systems |
Air-operated high-temperature corrosive liquid pump
|
|
US5225173A
(en)
|
1991-06-12 |
1993-07-06 |
Idaho Research Foundation, Inc. |
Methods and devices for the separation of radioactive rare earth metal isotopes from their alkaline earth metal precursors
|
|
US5730874A
(en)
|
1991-06-12 |
1998-03-24 |
Idaho Research Foundation, Inc. |
Extraction of metals using supercritical fluid and chelate forming legand
|
|
US5356538A
(en)
|
1991-06-12 |
1994-10-18 |
Idaho Research Foundation, Inc. |
Supercritical fluid extraction
|
|
US5274129A
(en)
|
1991-06-12 |
1993-12-28 |
Idaho Research Foundation, Inc. |
Hydroxamic acid crown ethers
|
|
US5965025A
(en)
|
1991-06-12 |
1999-10-12 |
Idaho Research Foundation, Inc. |
Fluid extraction
|
|
US5279615A
(en)
|
1991-06-14 |
1994-01-18 |
The Clorox Company |
Method and composition using densified carbon dioxide and cleaning adjunct to clean fabrics
|
|
US5243821A
(en)
|
1991-06-24 |
1993-09-14 |
Air Products And Chemicals, Inc. |
Method and apparatus for delivering a continuous quantity of gas over a wide range of flow rates
|
|
US5174917A
(en)
|
1991-07-19 |
1992-12-29 |
Monsanto Company |
Compositions containing n-ethyl hydroxamic acid chelants
|
|
US5251776A
(en)
|
1991-08-12 |
1993-10-12 |
H. William Morgan, Jr. |
Pressure vessel
|
|
US5320742A
(en)
|
1991-08-15 |
1994-06-14 |
Mobil Oil Corporation |
Gasoline upgrading process
|
|
US5431843A
(en)
|
1991-09-04 |
1995-07-11 |
The Clorox Company |
Cleaning through perhydrolysis conducted in dense fluid medium
|
|
JP3040212B2
(ja)
|
1991-09-05 |
2000-05-15 |
株式会社東芝 |
気相成長装置
|
|
GB2259525B
(en)
|
1991-09-11 |
1995-06-28 |
Ciba Geigy Ag |
Process for dyeing cellulosic textile material with disperse dyes
|
|
US5213622A
(en)
|
1991-10-11 |
1993-05-25 |
Air Products And Chemicals, Inc. |
Cleaning agents for fabricating integrated circuits and a process for using the same
|
|
DE9112761U1
(de)
|
1991-10-14 |
1992-04-09 |
Krones Ag Hermann Kronseder Maschinenfabrik, 8402 Neutraubling |
Gefäßverschließmaschine
|
|
US5221019A
(en)
|
1991-11-07 |
1993-06-22 |
Hahn & Clay |
Remotely operable vessel cover positioner
|
|
EP0543779A1
(de)
|
1991-11-20 |
1993-05-26 |
Ciba-Geigy Ag |
Verfahren zum optischen Aufhellen von hydrophobem Textilmaterial mit dispersen optischen Aufhellern in überkritischem CO2
|
|
KR930019861A
(ko)
|
1991-12-12 |
1993-10-19 |
완다 케이. 덴슨-로우 |
조밀상 기체를 이용한 코팅 방법
|
|
US5550211A
(en)
|
1991-12-18 |
1996-08-27 |
Schering Corporation |
Method for removing residual additives from elastomeric articles
|
|
US5190373A
(en)
|
1991-12-24 |
1993-03-02 |
Union Carbide Chemicals & Plastics Technology Corporation |
Method, apparatus, and article for forming a heated, pressurized mixture of fluids
|
|
DE4200352A1
(de)
|
1992-01-09 |
1993-08-19 |
Deutsches Textilforschzentrum |
Verfahren zum aufbringen von substanzen auf fasermaterialien und textile substrate
|
|
US5474812A
(en)
|
1992-01-10 |
1995-12-12 |
Amann & Sohne Gmbh & Co. |
Method for the application of a lubricant on a sewing yarn
|
|
DE4200498A1
(de)
|
1992-01-10 |
1993-07-15 |
Amann & Soehne |
Verfahren zum auftragen einer avivage
|
|
DE69334213T2
(de)
|
1992-03-27 |
2009-06-18 |
University Of North Carolina At Chapel Hill |
Verfahren zur Herstellung von Fluoropolymeren
|
|
US5240390A
(en)
|
1992-03-27 |
1993-08-31 |
Graco Inc. |
Air valve actuator for reciprocable machine
|
|
US5688879A
(en)
|
1992-03-27 |
1997-11-18 |
The University Of North Carolina At Chapel Hill |
Method of making fluoropolymers
|
|
US5404894A
(en)
|
1992-05-20 |
1995-04-11 |
Tokyo Electron Kabushiki Kaisha |
Conveyor apparatus
|
|
US5313965A
(en)
|
1992-06-01 |
1994-05-24 |
Hughes Aircraft Company |
Continuous operation supercritical fluid treatment process and system
|
|
JPH0613361A
(ja)
|
1992-06-26 |
1994-01-21 |
Tokyo Electron Ltd |
処理装置
|
|
US5401322A
(en)
|
1992-06-30 |
1995-03-28 |
Southwest Research Institute |
Apparatus and method for cleaning articles utilizing supercritical and near supercritical fluids
|
|
US6165282A
(en)
|
1992-06-30 |
2000-12-26 |
Southwest Research Institute |
Method for contaminant removal using natural convection flow and changes in solubility concentration by temperature
|
|
US5352327A
(en)
|
1992-07-10 |
1994-10-04 |
Harris Corporation |
Reduced temperature suppression of volatilization of photoexcited halogen reaction products from surface of silicon wafer
|
|
US5370742A
(en)
|
1992-07-13 |
1994-12-06 |
The Clorox Company |
Liquid/supercritical cleaning with decreased polymer damage
|
|
US5267455A
(en)
|
1992-07-13 |
1993-12-07 |
The Clorox Company |
Liquid/supercritical carbon dioxide dry cleaning system
|
|
US5285352A
(en)
|
1992-07-15 |
1994-02-08 |
Motorola, Inc. |
Pad array semiconductor device with thermal conductor and process for making the same
|
|
US5368171A
(en)
|
1992-07-20 |
1994-11-29 |
Jackson; David P. |
Dense fluid microwave centrifuge
|
|
US5746008A
(en)
|
1992-07-29 |
1998-05-05 |
Shinko Electric Co., Ltd. |
Electronic substrate processing system using portable closed containers
|
|
KR100304127B1
(ko)
|
1992-07-29 |
2001-11-30 |
이노마다 시게오 |
가반식 밀폐 컨테이너를 사용한 전자기판 처리시스템과 그의 장치
|
|
US5316591A
(en)
|
1992-08-10 |
1994-05-31 |
Hughes Aircraft Company |
Cleaning by cavitation in liquefied gas
|
|
US5339844A
(en)
|
1992-08-10 |
1994-08-23 |
Hughes Aircraft Company |
Low cost equipment for cleaning using liquefiable gases
|
|
US5456759A
(en)
|
1992-08-10 |
1995-10-10 |
Hughes Aircraft Company |
Method using megasonic energy in liquefied gases
|
|
US5261965A
(en)
|
1992-08-28 |
1993-11-16 |
Texas Instruments Incorporated |
Semiconductor wafer cleaning using condensed-phase processing
|
|
DE4230485A1
(de)
|
1992-09-11 |
1994-03-17 |
Linde Ag |
Anlage zur Reinigung mit verflüssigten oder überkritischen Gasen
|
|
US5589224A
(en)
|
1992-09-30 |
1996-12-31 |
Applied Materials, Inc. |
Apparatus for full wafer deposition
|
|
EP0591595A1
(en)
|
1992-10-08 |
1994-04-13 |
International Business Machines Corporation |
Molecular recording/reproducing method and recording medium
|
|
US5337446A
(en)
|
1992-10-27 |
1994-08-16 |
Autoclave Engineers, Inc. |
Apparatus for applying ultrasonic energy in precision cleaning
|
|
US5355901A
(en)
|
1992-10-27 |
1994-10-18 |
Autoclave Engineers, Ltd. |
Apparatus for supercritical cleaning
|
|
US5294261A
(en)
|
1992-11-02 |
1994-03-15 |
Air Products And Chemicals, Inc. |
Surface cleaning using an argon or nitrogen aerosol
|
|
US5328722A
(en)
|
1992-11-06 |
1994-07-12 |
Applied Materials, Inc. |
Metal chemical vapor deposition process using a shadow ring
|
|
JP2548062B2
(ja)
|
1992-11-13 |
1996-10-30 |
日本エー・エス・エム株式会社 |
縦型熱処理装置用ロードロックチャンバー
|
|
US5514220A
(en)
|
1992-12-09 |
1996-05-07 |
Wetmore; Paula M. |
Pressure pulse cleaning
|
|
WO1994014240A1
(en)
|
1992-12-11 |
1994-06-23 |
The Regents Of The University Of California |
Microelectromechanical signal processors
|
|
KR100251873B1
(ko)
|
1993-01-21 |
2000-04-15 |
마쓰바 구니유키 |
종형 열처리 장치
|
|
NZ260144A
(en)
|
1993-04-12 |
1995-10-26 |
Colgate Palmolive Co |
Cleaning composition; contains three liquid phases which merge at a tricritical point; use for removing tar or grease from articles
|
|
US5403665A
(en)
|
1993-06-18 |
1995-04-04 |
Regents Of The University Of California |
Method of applying a monolayer lubricant to micromachines
|
|
JPH07142333A
(ja)
|
1993-06-29 |
1995-06-02 |
Kawasaki Steel Corp |
レジストの現像・リンス方法及びその装置
|
|
US5312882A
(en)
|
1993-07-30 |
1994-05-17 |
The University Of North Carolina At Chapel Hill |
Heterogeneous polymerization in carbon dioxide
|
|
JP3338134B2
(ja)
|
1993-08-02 |
2002-10-28 |
株式会社東芝 |
半導体ウエハ処理方法
|
|
US5364497A
(en)
|
1993-08-04 |
1994-11-15 |
Analog Devices, Inc. |
Method for fabricating microstructures using temporary bridges
|
|
DE4429470A1
(de)
|
1993-08-23 |
1995-03-02 |
Ciba Geigy Ag |
Verfahren zur Verbesserung der Stabilität von Färbungen auf hydrophoben Textilmaterial
|
|
US5433334A
(en)
|
1993-09-08 |
1995-07-18 |
Reneau; Raymond P. |
Closure member for pressure vessel
|
|
US5377705A
(en)
|
1993-09-16 |
1995-01-03 |
Autoclave Engineers, Inc. |
Precision cleaning system
|
|
US5370740A
(en)
|
1993-10-01 |
1994-12-06 |
Hughes Aircraft Company |
Chemical decomposition by sonication in liquid carbon dioxide
|
|
US5656097A
(en)
|
1993-10-20 |
1997-08-12 |
Verteq, Inc. |
Semiconductor wafer cleaning system
|
|
US5417768A
(en)
|
1993-12-14 |
1995-05-23 |
Autoclave Engineers, Inc. |
Method of cleaning workpiece with solvent and then with liquid carbon dioxide
|
|
US5509431A
(en)
|
1993-12-14 |
1996-04-23 |
Snap-Tite, Inc. |
Precision cleaning vessel
|
|
DE4344021B4
(de)
|
1993-12-23 |
2006-06-29 |
Deutsches Textilforschungszentrum Nord-West E.V. |
Färbung von beschlichteten textilen Flächengebilden aus Synthesefasermaterial in überkritischem Medien
|
|
TW274630B
(enExample)
|
1994-01-28 |
1996-04-21 |
Wako Zunyaku Kogyo Kk |
|
|
US5872257A
(en)
|
1994-04-01 |
1999-02-16 |
University Of Pittsburgh |
Further extractions of metals in carbon dioxide and chelating agents therefor
|
|
US5641887A
(en)
|
1994-04-01 |
1997-06-24 |
University Of Pittsburgh |
Extraction of metals in carbon dioxide and chelating agents therefor
|
|
DE69523208T2
(de)
|
1994-04-08 |
2002-06-27 |
Texas Instruments Inc., Dallas |
Verfahren zur Reinigung von Halbleiterscheiben mittels verflüssigter Gase
|
|
JP3320549B2
(ja)
|
1994-04-26 |
2002-09-03 |
岩手東芝エレクトロニクス株式会社 |
被膜除去方法および被膜除去剤
|
|
US5467492A
(en)
|
1994-04-29 |
1995-11-21 |
Hughes Aircraft Company |
Dry-cleaning of garments using liquid carbon dioxide under agitation as cleaning medium
|
|
US5934856A
(en)
|
1994-05-23 |
1999-08-10 |
Tokyo Electron Limited |
Multi-chamber treatment system
|
|
KR0137841B1
(ko)
|
1994-06-07 |
1998-04-27 |
문정환 |
식각잔류물 제거방법
|
|
US5482564A
(en)
|
1994-06-21 |
1996-01-09 |
Texas Instruments Incorporated |
Method of unsticking components of micro-mechanical devices
|
|
US5504042A
(en)
|
1994-06-23 |
1996-04-02 |
Texas Instruments Incorporated |
Porous dielectric material with improved pore surface properties for electronics applications
|
|
US5637151A
(en)
|
1994-06-27 |
1997-06-10 |
Siemens Components, Inc. |
Method for reducing metal contamination of silicon wafers during semiconductor manufacturing
|
|
US5522938A
(en)
|
1994-08-08 |
1996-06-04 |
Texas Instruments Incorporated |
Particle removal in supercritical liquids using single frequency acoustic waves
|
|
US5501761A
(en)
|
1994-10-18 |
1996-03-26 |
At&T Corp. |
Method for stripping conformal coatings from circuit boards
|
|
EP0711864B1
(en)
|
1994-11-08 |
2001-06-13 |
Raytheon Company |
Dry-cleaning of garments using gas-jet agitation
|
|
DE69520687T2
(de)
|
1994-11-09 |
2001-08-23 |
R.R. Street & Co., Inc. |
Verfahren und system zur aufbereitung von unter druck stehenden flüssigen lösungsmitteln zur reinigung von substraten
|
|
US5505219A
(en)
|
1994-11-23 |
1996-04-09 |
Litton Systems, Inc. |
Supercritical fluid recirculating system for a precision inertial instrument parts cleaner
|
|
DE4443778A1
(de)
|
1994-12-08 |
1996-06-20 |
Abel Gmbh & Co |
Doppelmembranpumpe
|
|
JPH08186140A
(ja)
|
1994-12-27 |
1996-07-16 |
Toshiba Corp |
樹脂封止型半導体装置の製造方法および製造装置
|
|
US5556497A
(en)
|
1995-01-09 |
1996-09-17 |
Essef Corporation |
Fitting installation process
|
|
US5629918A
(en)
|
1995-01-20 |
1997-05-13 |
The Regents Of The University Of California |
Electromagnetically actuated micromachined flap
|
|
DE69610652T2
(de)
|
1995-01-26 |
2001-05-10 |
Texas Instruments Inc., Dallas |
Verfahren zur Entfernung von Oberflächenkontamination
|
|
WO1996025760A1
(en)
|
1995-02-15 |
1996-08-22 |
Hitachi, Ltd. |
Method and device for manufacturing semiconductor
|
|
JPH08222508A
(ja)
|
1995-02-15 |
1996-08-30 |
Fuji Photo Film Co Ltd |
感光性組成物のパターン形成方法
|
|
JP3277114B2
(ja)
|
1995-02-17 |
2002-04-22 |
インターナショナル・ビジネス・マシーンズ・コーポレーション |
陰画調レジスト像の作製方法
|
|
EP0727711A3
(en)
|
1995-02-17 |
1997-04-09 |
Ocg Microelectronic Materials |
Photoresist compositions containing supercritical fluid fractionated polymeric resin binders
|
|
DE19506404C1
(de)
|
1995-02-23 |
1996-03-14 |
Siemens Ag |
Verfahren zum Freiätzen (Separieren) und Trocknen mikromechanischer Komponenten
|
|
WO1996027704A1
(en)
|
1995-03-06 |
1996-09-12 |
Unilever N.V. |
Dry cleaning system using densified carbon dioxide and a surfactant adjunct
|
|
US5683977A
(en)
|
1995-03-06 |
1997-11-04 |
Lever Brothers Company, Division Of Conopco, Inc. |
Dry cleaning system using densified carbon dioxide and a surfactant adjunct
|
|
US5676705A
(en)
|
1995-03-06 |
1997-10-14 |
Lever Brothers Company, Division Of Conopco, Inc. |
Method of dry cleaning fabrics using densified carbon dioxide
|
|
US5681398A
(en)
|
1995-03-17 |
1997-10-28 |
Purex Co., Ltd. |
Silicone wafer cleaning method
|
|
JPH08264500A
(ja)
|
1995-03-27 |
1996-10-11 |
Sony Corp |
基板の洗浄方法
|
|
US5644855A
(en)
|
1995-04-06 |
1997-07-08 |
Air Products And Chemicals, Inc. |
Cryogenically purged mini environment
|
|
JPH08306632A
(ja)
|
1995-04-27 |
1996-11-22 |
Shin Etsu Handotai Co Ltd |
気相エピタキシャル成長装置
|
|
US6097015A
(en)
|
1995-05-22 |
2000-08-01 |
Healthbridge, Inc. |
Microwave pressure vessel and method of sterilization
|
|
JP3983831B2
(ja)
|
1995-05-30 |
2007-09-26 |
シグマメルテック株式会社 |
基板ベーキング装置及び基板ベーキング方法
|
|
JPH08330266A
(ja)
|
1995-05-31 |
1996-12-13 |
Texas Instr Inc <Ti> |
半導体装置等の表面を浄化し、処理する方法
|
|
US6454945B1
(en)
|
1995-06-16 |
2002-09-24 |
University Of Washington |
Microfabricated devices and methods
|
|
WO1997000442A1
(en)
|
1995-06-16 |
1997-01-03 |
The University Of Washington |
Microfabricated differential extraction device and method
|
|
JP2676334B2
(ja)
|
1995-07-31 |
1997-11-12 |
住友重機械工業株式会社 |
ロボットアーム
|
|
US6239038B1
(en)
|
1995-10-13 |
2001-05-29 |
Ziying Wen |
Method for chemical processing semiconductor wafers
|
|
US5783082A
(en)
|
1995-11-03 |
1998-07-21 |
University Of North Carolina |
Cleaning process using carbon dioxide as a solvent and employing molecularly engineered surfactants
|
|
US5807607A
(en)
|
1995-11-16 |
1998-09-15 |
Texas Instruments Incorporated |
Polyol-based method for forming thin film aerogels on semiconductor substrates
|
|
US6037277A
(en)
|
1995-11-16 |
2000-03-14 |
Texas Instruments Incorporated |
Limited-volume apparatus and method for forming thin film aerogels on semiconductor substrates
|
|
US5736425A
(en)
|
1995-11-16 |
1998-04-07 |
Texas Instruments Incorporated |
Glycol-based method for forming a thin-film nanoporous dielectric
|
|
US6380105B1
(en)
|
1996-11-14 |
2002-04-30 |
Texas Instruments Incorporated |
Low volatility solvent-based method for forming thin film nanoporous aerogels on semiconductor substrates
|
|
US5955140A
(en)
|
1995-11-16 |
1999-09-21 |
Texas Instruments Incorporated |
Low volatility solvent-based method for forming thin film nanoporous aerogels on semiconductor substrates
|
|
US6159295A
(en)
|
1995-11-16 |
2000-12-12 |
Texas Instruments Incorporated |
Limited-volume apparatus for forming thin film aerogels on semiconductor substrates
|
|
US5679169A
(en)
|
1995-12-19 |
1997-10-21 |
Micron Technology, Inc. |
Method for post chemical-mechanical planarization cleaning of semiconductor wafers
|
|
US5992680A
(en)
|
1996-01-29 |
1999-11-30 |
Smith; Philip E. |
Slidable sealing lid apparatus for subsurface storage containers
|
|
JPH09213772A
(ja)
|
1996-01-30 |
1997-08-15 |
Dainippon Screen Mfg Co Ltd |
基板保持装置
|
|
US5717178A
(en)
*
|
1996-02-06 |
1998-02-10 |
Eaton Corporation |
Locking mechanism for electrical switches
|
|
US6232417B1
(en)
|
1996-03-07 |
2001-05-15 |
The B. F. Goodrich Company |
Photoresist compositions comprising polycyclic polymers with acid labile pendant groups
|
|
US5804607A
(en)
|
1996-03-21 |
1998-09-08 |
International Business Machines Corporation |
Process for making a foamed elastomeric polymer
|
|
US5726211A
(en)
|
1996-03-21 |
1998-03-10 |
International Business Machines Corporation |
Process for making a foamed elastometric polymer
|
|
JP3955340B2
(ja)
|
1996-04-26 |
2007-08-08 |
株式会社神戸製鋼所 |
高温高圧ガス処理装置
|
|
DK9600149U3
(da)
|
1996-05-01 |
1997-09-12 |
Moerch & Soenner A S |
Dækselaggregat
|
|
US5766367A
(en)
|
1996-05-14 |
1998-06-16 |
Sandia Corporation |
Method for preventing micromechanical structures from adhering to another object
|
|
JPH09303557A
(ja)
|
1996-05-21 |
1997-11-25 |
Kobe Steel Ltd |
高圧容器の密封装置
|
|
US5618751A
(en)
|
1996-05-23 |
1997-04-08 |
International Business Machines Corporation |
Method of making single-step trenches using resist fill and recess
|
|
US6203582B1
(en)
|
1996-07-15 |
2001-03-20 |
Semitool, Inc. |
Modular semiconductor workpiece processing tool
|
|
US5868856A
(en)
|
1996-07-25 |
1999-02-09 |
Texas Instruments Incorporated |
Method for removing inorganic contamination by chemical derivitization and extraction
|
|
US5669251A
(en)
|
1996-07-30 |
1997-09-23 |
Hughes Aircraft Company |
Liquid carbon dioxide dry cleaning system having a hydraulically powered basket
|
|
US5868862A
(en)
|
1996-08-01 |
1999-02-09 |
Texas Instruments Incorporated |
Method of removing inorganic contamination by chemical alteration and extraction in a supercritical fluid media
|
|
US5706319A
(en)
|
1996-08-12 |
1998-01-06 |
Joseph Oat Corporation |
Reactor vessel seal and method for temporarily sealing a reactor pressure vessel from the refueling canal
|
|
US6270948B1
(en)
|
1996-08-22 |
2001-08-07 |
Kabushiki Kaisha Toshiba |
Method of forming pattern
|
|
US5798438A
(en)
|
1996-09-09 |
1998-08-25 |
University Of Massachusetts |
Polymers with increased order
|
|
US5881577A
(en)
|
1996-09-09 |
1999-03-16 |
Air Liquide America Corporation |
Pressure-swing absorption based cleaning methods and systems
|
|
US5908510A
(en)
|
1996-10-16 |
1999-06-01 |
International Business Machines Corporation |
Residue removal by supercritical fluids
|
|
US5928389A
(en)
|
1996-10-21 |
1999-07-27 |
Applied Materials, Inc. |
Method and apparatus for priority based scheduling of wafer processing within a multiple chamber semiconductor wafer processing tool
|
|
US5797719A
(en)
|
1996-10-30 |
1998-08-25 |
Supercritical Fluid Technologies, Inc. |
Precision high pressure control assembly
|
|
US5888050A
(en)
|
1996-10-30 |
1999-03-30 |
Supercritical Fluid Technologies, Inc. |
Precision high pressure control assembly
|
|
US5725987A
(en)
|
1996-11-01 |
1998-03-10 |
Xerox Corporation |
Supercritical processes
|
|
US5714299A
(en)
|
1996-11-04 |
1998-02-03 |
Xerox Corporation |
Processes for toner additives with liquid carbon dioxide
|
|
JPH10144757A
(ja)
|
1996-11-08 |
1998-05-29 |
Dainippon Screen Mfg Co Ltd |
基板処理システム
|
|
JPH10144650A
(ja)
|
1996-11-11 |
1998-05-29 |
Mitsubishi Electric Corp |
半導体材料の洗浄装置
|
|
AU6135298A
(en)
|
1997-01-27 |
1998-08-26 |
California Institute Of Technology |
Mems electrospray nozzle for mass spectroscopy
|
|
US5906866A
(en)
|
1997-02-10 |
1999-05-25 |
Tokyo Electron Limited |
Process for chemical vapor deposition of tungsten onto a titanium nitride substrate surface
|
|
JP3437734B2
(ja)
|
1997-02-26 |
2003-08-18 |
富士通株式会社 |
製造装置
|
|
US5896870A
(en)
|
1997-03-11 |
1999-04-27 |
International Business Machines Corporation |
Method of removing slurry particles
|
|
US6309975B1
(en)
|
1997-03-14 |
2001-10-30 |
Micron Technology, Inc. |
Methods of making implanted structures
|
|
JPH10261687A
(ja)
|
1997-03-18 |
1998-09-29 |
Furontetsuku:Kk |
半導体等製造装置
|
|
JP4246804B2
(ja)
|
1997-03-26 |
2009-04-02 |
株式会社神戸製鋼所 |
加熱・加圧処理装置
|
|
JPH10288158A
(ja)
|
1997-04-10 |
1998-10-27 |
Kobe Steel Ltd |
ピストン式ガス圧縮機及びガス圧縮設備
|
|
US6149828A
(en)
|
1997-05-05 |
2000-11-21 |
Micron Technology, Inc. |
Supercritical etching compositions and method of using same
|
|
US6500605B1
(en)
|
1997-05-27 |
2002-12-31 |
Tokyo Electron Limited |
Removal of photoresist and residue from substrate using supercritical carbon dioxide process
|
|
JP3764247B2
(ja)
|
1997-05-27 |
2006-04-05 |
株式会社神戸製鋼所 |
板状物の加圧処理装置
|
|
US6306564B1
(en)
|
1997-05-27 |
2001-10-23 |
Tokyo Electron Limited |
Removal of resist or residue from semiconductors using supercritical carbon dioxide
|
|
US6114044A
(en)
|
1997-05-30 |
2000-09-05 |
Regents Of The University Of California |
Method of drying passivated micromachines by dewetting from a liquid-based process
|
|
US6344243B1
(en)
|
1997-05-30 |
2002-02-05 |
Micell Technologies, Inc. |
Surface treatment
|
|
US6164297A
(en)
|
1997-06-13 |
2000-12-26 |
Tokyo Electron Limited |
Cleaning and drying apparatus for objects to be processed
|
|
US5900354A
(en)
|
1997-07-03 |
1999-05-04 |
Batchelder; John Samuel |
Method for optical inspection and lithography
|
|
TW524873B
(en)
|
1997-07-11 |
2003-03-21 |
Applied Materials Inc |
Improved substrate supporting apparatus and processing chamber
|
|
US5975492A
(en)
|
1997-07-14 |
1999-11-02 |
Brenes; Arthur |
Bellows driver slot valve
|
|
US5893756A
(en)
|
1997-08-26 |
1999-04-13 |
Lsi Logic Corporation |
Use of ethylene glycol as a corrosion inhibitor during cleaning after metal chemical mechanical polishing
|
|
US6270531B1
(en)
|
1997-08-29 |
2001-08-07 |
Micell Technologies, Inc. |
End functionalized polysiloxane surfactants in carbon dioxide formulations
|
|
JP3194036B2
(ja)
|
1997-09-17 |
2001-07-30 |
東京エレクトロン株式会社 |
乾燥処理装置及び乾燥処理方法
|
|
US6056008A
(en)
|
1997-09-22 |
2000-05-02 |
Fisher Controls International, Inc. |
Intelligent pressure regulator
|
|
US6235634B1
(en)
|
1997-10-08 |
2001-05-22 |
Applied Komatsu Technology, Inc. |
Modular substrate processing system
|
|
US6099619A
(en)
|
1997-10-09 |
2000-08-08 |
Uop Llc |
Purification of carbon dioxide
|
|
US5872061A
(en)
|
1997-10-27 |
1999-02-16 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Plasma etch method for forming residue free fluorine containing plasma etched layers
|
|
US6005226A
(en)
|
1997-11-24 |
1999-12-21 |
Steag-Rtp Systems |
Rapid thermal processing (RTP) system with gas driven rotating substrate
|
|
DE69839935D1
(de)
|
1997-11-25 |
2008-10-09 |
Nec Lcd Technologies Ltd |
Aktiv-Matrix-Flüssigkristallanzeige und deren Herstellungsverfahren
|
|
US5904737A
(en)
|
1997-11-26 |
1999-05-18 |
Mve, Inc. |
Carbon dioxide dry cleaning system
|
|
JPH11200035A
(ja)
|
1998-01-19 |
1999-07-27 |
Anelva Corp |
スパッタ化学蒸着複合装置
|
|
US5934991A
(en)
|
1998-02-01 |
1999-08-10 |
Fortrend Engineering Corporation |
Pod loader interface improved clean air system
|
|
US6067728A
(en)
|
1998-02-13 |
2000-05-30 |
G.T. Equipment Technologies, Inc. |
Supercritical phase wafer drying/cleaning system
|
|
US6100198A
(en)
|
1998-02-27 |
2000-08-08 |
Micron Technology, Inc. |
Post-planarization, pre-oxide removal ozone treatment
|
|
US6122566A
(en)
|
1998-03-03 |
2000-09-19 |
Applied Materials Inc. |
Method and apparatus for sequencing wafers in a multiple chamber, semiconductor wafer processing system
|
|
US6244121B1
(en)
|
1998-03-06 |
2001-06-12 |
Applied Materials, Inc. |
Sensor device for non-intrusive diagnosis of a semiconductor processing system
|
|
KR100287173B1
(ko)
|
1998-03-13 |
2001-06-01 |
윤종용 |
포토레지스트제거방법및이들을이용한반도체장치의제조방법
|
|
US6453924B1
(en)
|
2000-07-24 |
2002-09-24 |
Advanced Technology Materials, Inc. |
Fluid distribution system and process, and semiconductor fabrication facility utilizing same
|
|
US6846789B2
(en)
*
|
1998-03-30 |
2005-01-25 |
The Regents Of The University Of California |
Composition and method for removing photoresist materials from electronic components
|
|
WO1999049998A1
(en)
|
1998-03-30 |
1999-10-07 |
The Regents Of The University Of California |
Composition and method for removing photoresist materials from electronic components
|
|
KR100452542B1
(ko)
|
1998-04-14 |
2004-10-12 |
가부시끼가이샤가이죠 |
세정물 건조장치 및 건조방법
|
|
ATE436043T1
(de)
|
1998-05-18 |
2009-07-15 |
Mallinckrodt Baker Inc |
Alkalische, silikat enthaltende reinigungslösungen für mikroelektronische substrate
|
|
US6200943B1
(en)
|
1998-05-28 |
2001-03-13 |
Micell Technologies, Inc. |
Combination surfactant systems for use in carbon dioxide-based cleaning formulations
|
|
US6021791A
(en)
|
1998-06-29 |
2000-02-08 |
Speedfam-Ipec Corporation |
Method and apparatus for immersion cleaning of semiconductor devices
|
|
US6017820A
(en)
|
1998-07-17 |
2000-01-25 |
Cutek Research, Inc. |
Integrated vacuum and plating cluster system
|
|
US6085935A
(en)
|
1998-08-10 |
2000-07-11 |
Alliance Laundry Systems Llc |
Pressure vessel door operating apparatus
|
|
JP3248492B2
(ja)
|
1998-08-14 |
2002-01-21 |
日本電気株式会社 |
半導体装置及びその製造方法
|
|
US6780765B2
(en)
|
1998-08-14 |
2004-08-24 |
Avery N. Goldstein |
Integrated circuit trenched features and method of producing same
|
|
US6242165B1
(en)
|
1998-08-28 |
2001-06-05 |
Micron Technology, Inc. |
Supercritical compositions for removal of organic material and methods of using same
|
|
US6358673B1
(en)
|
1998-09-09 |
2002-03-19 |
Nippon Telegraph And Telephone Corporation |
Pattern formation method and apparatus
|
|
US6492277B1
(en)
|
1999-09-10 |
2002-12-10 |
Hitachi, Ltd. |
Specimen surface processing method and apparatus
|
|
US6277753B1
(en)
|
1998-09-28 |
2001-08-21 |
Supercritical Systems Inc. |
Removal of CMP residue from semiconductors using supercritical carbon dioxide process
|
|
JP2000106358A
(ja)
|
1998-09-29 |
2000-04-11 |
Mitsubishi Electric Corp |
半導体製造装置および半導体基板の処理方法
|
|
US6110232A
(en)
|
1998-10-01 |
2000-08-29 |
Taiwan Semiconductor Manufacturing Company, Ltd. |
Method for preventing corrosion in load-lock chambers
|
|
US6449428B2
(en)
|
1998-12-11 |
2002-09-10 |
Mattson Technology Corp. |
Gas driven rotating susceptor for rapid thermal processing (RTP) system
|
|
DE19860084B4
(de)
|
1998-12-23 |
2005-12-22 |
Infineon Technologies Ag |
Verfahren zum Strukturieren eines Substrats
|
|
US6344174B1
(en)
|
1999-01-25 |
2002-02-05 |
Mine Safety Appliances Company |
Gas sensor
|
|
EP1024524A2
(en)
|
1999-01-27 |
2000-08-02 |
Matsushita Electric Industrial Co., Ltd. |
Deposition of dielectric layers using supercritical CO2
|
|
US6232238B1
(en)
|
1999-02-08 |
2001-05-15 |
United Microelectronics Corp. |
Method for preventing corrosion of bonding pad on a surface of a semiconductor wafer
|
|
US6305677B1
(en)
|
1999-03-30 |
2001-10-23 |
Lam Research Corporation |
Perimeter wafer lifting
|
|
US6241825B1
(en)
|
1999-04-16 |
2001-06-05 |
Cutek Research Inc. |
Compliant wafer chuck
|
|
KR100421034B1
(ko)
|
1999-04-21 |
2004-03-04 |
삼성전자주식회사 |
레지스트 조성물과 이를 이용한 미세패턴 형성방법
|
|
KR100290852B1
(ko)
|
1999-04-29 |
2001-05-15 |
구자홍 |
에칭 방법
|
|
US6128830A
(en)
|
1999-05-15 |
2000-10-10 |
Dean Bettcher |
Apparatus and method for drying solid articles
|
|
US6245849B1
(en)
|
1999-06-02 |
2001-06-12 |
Sandia Corporation |
Fabrication of ceramic microstructures from polymer compositions containing ceramic nanoparticles
|
|
US6436824B1
(en)
|
1999-07-02 |
2002-08-20 |
Chartered Semiconductor Manufacturing Ltd. |
Low dielectric constant materials for copper damascene
|
|
US6508259B1
(en)
|
1999-08-05 |
2003-01-21 |
S.C. Fluids, Inc. |
Inverted pressure vessel with horizontal through loading
|
|
US6334266B1
(en)
|
1999-09-20 |
2002-01-01 |
S.C. Fluids, Inc. |
Supercritical fluid drying system and method of use
|
|
AU6893600A
(en)
|
1999-08-05 |
2001-03-05 |
S. C. Fluids, Inc. |
Inverted pressure vessel with horizontal through loading
|
|
US6251250B1
(en)
|
1999-09-03 |
2001-06-26 |
Arthur Keigler |
Method of and apparatus for controlling fluid flow and electric fields involved in the electroplating of substantially flat workpieces and the like and more generally controlling fluid flow in the processing of other work piece surfaces as well
|
|
US6228563B1
(en)
|
1999-09-17 |
2001-05-08 |
Gasonics International Corporation |
Method and apparatus for removing post-etch residues and other adherent matrices
|
|
US6355072B1
(en)
|
1999-10-15 |
2002-03-12 |
R.R. Street & Co. Inc. |
Cleaning system utilizing an organic cleaning solvent and a pressurized fluid solvent
|
|
CA2387341A1
(en)
|
1999-11-02 |
2001-05-10 |
Tokyo Electron Limited |
Method and apparatus for supercritical processing of multiple workpieces
|
|
US6286231B1
(en)
|
2000-01-12 |
2001-09-11 |
Semitool, Inc. |
Method and apparatus for high-pressure wafer processing and drying
|
|
US6361696B1
(en)
|
2000-01-19 |
2002-03-26 |
Aeronex, Inc. |
Self-regenerative process for contaminant removal from liquid and supercritical CO2 fluid streams
|
|
WO2001055628A1
(en)
|
2000-01-26 |
2001-08-02 |
Tokyo Electron Limited |
High pressure lift valve for use in semiconductor processing environment
|
|
WO2001068279A2
(en)
|
2000-03-13 |
2001-09-20 |
The Deflex Llc |
Dense fluid cleaning centrifugal phase shifting separation process and apparatus
|
|
WO2001074538A1
(en)
|
2000-03-13 |
2001-10-11 |
The Deflex Llc |
Dense fluid spray cleaning process and apparatus
|
|
JP2001291713A
(ja)
|
2000-04-07 |
2001-10-19 |
Canon Sales Co Inc |
成膜方法及び半導体装置
|
|
US6558475B1
(en)
|
2000-04-10 |
2003-05-06 |
International Business Machines Corporation |
Process for cleaning a workpiece using supercritical carbon dioxide
|
|
EP1425115A4
(en)
|
2000-04-18 |
2006-03-01 |
S C Fluids Inc |
SUPERCRITICAL FLUID DELIVERY AND RECOVERY SYSTEM FOR PROCESSING SEMICONDUCTOR WAFERS
|
|
AU2001255656A1
(en)
|
2000-04-25 |
2001-11-07 |
Tokyo Electron Limited |
Method of depositing metal film and metal deposition cluster tool including supercritical drying/cleaning module
|
|
US6492090B2
(en)
|
2000-04-28 |
2002-12-10 |
Shin-Etsu Chemical Co., Ltd. |
Polymers, resist compositions and patterning process
|
|
AU2001257564A1
(en)
|
2000-05-08 |
2001-11-20 |
Tokyo Electron Limited |
Method and apparatus for agitation of workpiece in high pressure environment
|
|
WO2001094782A2
(en)
|
2000-06-02 |
2001-12-13 |
Tokyo Electron Limited |
Dual diaphragm pump
|
|
US6319858B1
(en)
|
2000-07-11 |
2001-11-20 |
Nano-Architect Research Corporation |
Methods for reducing a dielectric constant of a dielectric film and for forming a low dielectric constant porous film
|
|
JP4724353B2
(ja)
|
2000-07-26 |
2011-07-13 |
東京エレクトロン株式会社 |
半導体基板のための高圧処理チャンバー
|
|
AU2001279136A1
(en)
|
2000-07-31 |
2002-02-13 |
The Deflex Corporation |
Near critical and supercritical ozone substrate treatment and apparatus for same
|
|
WO2002009894A2
(en)
|
2000-08-01 |
2002-02-07 |
The Deflex Llc |
Gas-vapor cleaning method and system therefor
|
|
JP3591827B2
(ja)
*
|
2000-08-11 |
2004-11-24 |
株式会社東芝 |
微細構造を有する成形体の製造方法
|
|
AU2000266442A1
(en)
|
2000-08-14 |
2002-02-25 |
Tokyo Electron Limited |
Removal of photoresist and photoresist residue from semiconductors using supercritical carbon dioxide process
|
|
US6486078B1
(en)
|
2000-08-22 |
2002-11-26 |
Advanced Micro Devices, Inc. |
Super critical drying of low k materials
|
|
AU2001288402A1
(en)
|
2000-08-23 |
2002-03-04 |
Deflex Llc |
Surface cleaning and modification processes, methods and apparatus using physicochemically modified dense fluid sprays
|
|
US6413852B1
(en)
|
2000-08-31 |
2002-07-02 |
International Business Machines Corporation |
Method of forming multilevel interconnect structure containing air gaps including utilizing both sacrificial and placeholder material
|
|
NZ524685A
(en)
|
2000-09-07 |
2004-10-29 |
Cmb Ind |
Short-length reduced-pressure backflow preventor
|
|
US6388317B1
(en)
|
2000-09-25 |
2002-05-14 |
Lockheed Martin Corporation |
Solid-state chip cooling by use of microchannel coolant flow
|
|
US6777312B2
(en)
|
2000-11-02 |
2004-08-17 |
California Institute Of Technology |
Wafer-level transfer of membranes in semiconductor processing
|
|
US6623355B2
(en)
|
2000-11-07 |
2003-09-23 |
Micell Technologies, Inc. |
Methods, apparatus and slurries for chemical mechanical planarization
|
|
US6418956B1
(en)
|
2000-11-15 |
2002-07-16 |
Plast-O-Matic Valves, Inc. |
Pressure controller
|
|
US6673521B2
(en)
|
2000-12-12 |
2004-01-06 |
Lnternational Business Machines Corporation |
Supercritical fluid(SCF) silylation process
|
|
US6576138B2
(en)
|
2000-12-14 |
2003-06-10 |
Praxair Technology, Inc. |
Method for purifying semiconductor gases
|
|
US6656666B2
(en)
|
2000-12-22 |
2003-12-02 |
International Business Machines Corporation |
Topcoat process to prevent image collapse
|
|
US6425956B1
(en)
|
2001-01-05 |
2002-07-30 |
International Business Machines Corporation |
Process for removing chemical mechanical polishing residual slurry
|
|
US20020117391A1
(en)
|
2001-01-31 |
2002-08-29 |
Beam Craig A. |
High purity CO2 and BTEX recovery
|
|
JP2002237481A
(ja)
|
2001-02-09 |
2002-08-23 |
Kobe Steel Ltd |
微細構造体の洗浄方法
|
|
US6669916B2
(en)
|
2001-02-12 |
2003-12-30 |
Praxair Technology, Inc. |
Method and apparatus for purifying carbon dioxide feed streams
|
|
US6596093B2
(en)
|
2001-02-15 |
2003-07-22 |
Micell Technologies, Inc. |
Methods for cleaning microelectronic structures with cyclical phase modulation
|
|
US6613157B2
(en)
|
2001-02-15 |
2003-09-02 |
Micell Technologies, Inc. |
Methods for removing particles from microelectronic structures
|
|
US6905555B2
(en)
|
2001-02-15 |
2005-06-14 |
Micell Technologies, Inc. |
Methods for transferring supercritical fluids in microelectronic and other industrial processes
|
|
US6641678B2
(en)
|
2001-02-15 |
2003-11-04 |
Micell Technologies, Inc. |
Methods for cleaning microelectronic structures with aqueous carbon dioxide systems
|
|
US6562146B1
(en)
|
2001-02-15 |
2003-05-13 |
Micell Technologies, Inc. |
Processes for cleaning and drying microelectronic structures using liquid or supercritical carbon dioxide
|
|
US6635565B2
(en)
|
2001-02-20 |
2003-10-21 |
United Microelectronics Corp. |
Method of cleaning a dual damascene structure
|
|
US6451510B1
(en)
|
2001-02-21 |
2002-09-17 |
International Business Machines Corporation |
Developer/rinse formulation to prevent image collapse in resist
|
|
US6685903B2
(en)
|
2001-03-01 |
2004-02-03 |
Praxair Technology, Inc. |
Method of purifying and recycling argon
|
|
US6503837B2
(en)
|
2001-03-29 |
2003-01-07 |
Macronix International Co. Ltd. |
Method of rinsing residual etching reactants/products on a semiconductor wafer
|
|
US20030116176A1
(en)
*
|
2001-04-18 |
2003-06-26 |
Rothman Laura B. |
Supercritical fluid processes with megasonics
|
|
US6561220B2
(en)
|
2001-04-23 |
2003-05-13 |
International Business Machines, Corp. |
Apparatus and method for increasing throughput in fluid processing
|
|
US6958123B2
(en)
|
2001-06-15 |
2005-10-25 |
Reflectivity, Inc |
Method for removing a sacrificial material with a compressed fluid
|
|
US6509136B1
(en)
|
2001-06-27 |
2003-01-21 |
International Business Machines Corporation |
Process of drying a cast polymeric film disposed on a workpiece
|
|
US6890855B2
(en)
*
|
2001-06-27 |
2005-05-10 |
International Business Machines Corporation |
Process of removing residue material from a precision surface
|
|
US6583067B2
(en)
|
2001-07-03 |
2003-06-24 |
United Microelectronics Corp. |
Method of avoiding dielectric layer deterioration with a low dielectric constant
|
|
US6979654B2
(en)
|
2001-07-03 |
2005-12-27 |
United Microelectronics Corp. |
Method of avoiding dielectric layer deterioation with a low dielectric constant during a stripping process
|
|
US6564826B2
(en)
|
2001-07-24 |
2003-05-20 |
Der-Fan Shen |
Flow regulator for water pump
|
|
US6561767B2
(en)
|
2001-08-01 |
2003-05-13 |
Berger Instruments, Inc. |
Converting a pump for use in supercritical fluid chromatography
|
|
US6561481B1
(en)
|
2001-08-13 |
2003-05-13 |
Filonczuk Michael A |
Fluid flow control apparatus for controlling and delivering fluid at a continuously variable flow rate
|
|
US6838015B2
(en)
|
2001-09-04 |
2005-01-04 |
International Business Machines Corporation |
Liquid or supercritical carbon dioxide composition
|
|
US6748966B1
(en)
|
2001-09-04 |
2004-06-15 |
Steven G. Dvorak |
Combination air gap for dish washer and soap dispenser
|
|
US20040040660A1
(en)
|
2001-10-03 |
2004-03-04 |
Biberger Maximilian Albert |
High pressure processing chamber for multiple semiconductor substrates
|
|
JP3978023B2
(ja)
|
2001-12-03 |
2007-09-19 |
株式会社神戸製鋼所 |
高圧処理方法
|
|
US6550484B1
(en)
|
2001-12-07 |
2003-04-22 |
Novellus Systems, Inc. |
Apparatus for maintaining wafer back side and edge exclusion during supercritical fluid processing
|
|
US7326673B2
(en)
|
2001-12-31 |
2008-02-05 |
Advanced Technology Materials, Inc. |
Treatment of semiconductor substrates using long-chain organothiols or long-chain acetates
|
|
US20040003828A1
(en)
*
|
2002-03-21 |
2004-01-08 |
Jackson David P. |
Precision surface treatments using dense fluids and a plasma
|
|
US6521466B1
(en)
|
2002-04-17 |
2003-02-18 |
Paul Castrucci |
Apparatus and method for semiconductor wafer test yield enhancement
|
|
US20030196679A1
(en)
|
2002-04-18 |
2003-10-23 |
International Business Machines Corporation |
Process and apparatus for contacting a precision surface with liquid or supercritical carbon dioxide
|
|
US6764552B1
(en)
|
2002-04-18 |
2004-07-20 |
Novellus Systems, Inc. |
Supercritical solutions for cleaning photoresist and post-etch residue from low-k materials
|
|
US6669785B2
(en)
|
2002-05-15 |
2003-12-30 |
Micell Technologies, Inc. |
Methods and compositions for etch cleaning microelectronic substrates in carbon dioxide
|
|
US20040050406A1
(en)
*
|
2002-07-17 |
2004-03-18 |
Akshey Sehgal |
Compositions and method for removing photoresist and/or resist residue at pressures ranging from ambient to supercritical
|
|
TW200417628A
(en)
*
|
2002-09-09 |
2004-09-16 |
Shipley Co Llc |
Improved cleaning composition
|
|
US20040055621A1
(en)
*
|
2002-09-24 |
2004-03-25 |
Air Products And Chemicals, Inc. |
Processing of semiconductor components with dense processing fluids and ultrasonic energy
|
|
US6953041B2
(en)
*
|
2002-10-09 |
2005-10-11 |
Micell Technologies, Inc. |
Compositions of transition metal species in dense phase carbon dioxide and methods of use thereof
|
|
JP2004141704A
(ja)
*
|
2002-10-22 |
2004-05-20 |
Sony Corp |
洗浄装置および洗浄方法
|
|
US6989358B2
(en)
|
2002-10-31 |
2006-01-24 |
Advanced Technology Materials, Inc. |
Supercritical carbon dioxide/chemical formulation for removal of photoresists
|
|
US6997197B2
(en)
|
2002-12-13 |
2006-02-14 |
International Business Machines Corporation |
Apparatus and method for rapid thermal control of a workpiece in liquid or dense phase fluid
|
|
US20040177867A1
(en)
|
2002-12-16 |
2004-09-16 |
Supercritical Systems, Inc. |
Tetra-organic ammonium fluoride and HF in supercritical fluid for photoresist and residue removal
|
|
US20040112409A1
(en)
|
2002-12-16 |
2004-06-17 |
Supercritical Sysems, Inc. |
Fluoride in supercritical fluid for photoresist and residue removal
|
|
US8017568B2
(en)
|
2003-02-28 |
2011-09-13 |
Intel Corporation |
Cleaning residues from semiconductor structures
|
|
KR20060014388A
(ko)
*
|
2003-05-02 |
2006-02-15 |
이케이씨 테크놀로지, 인코포레이티드 |
반도체 공정에서의 에칭후 잔류물의 제거 방법
|
|
US7119052B2
(en)
|
2003-06-24 |
2006-10-10 |
Advanced Technology Materials, Inc. |
Compositions and methods for high-efficiency cleaning/polishing of semiconductor wafers
|
|
US20050006310A1
(en)
|
2003-07-10 |
2005-01-13 |
Rajat Agrawal |
Purification and recovery of fluids in processing applications
|